WO2003050586A3 - Spiegelfacette und facettenspiegel - Google Patents

Spiegelfacette und facettenspiegel Download PDF

Info

Publication number
WO2003050586A3
WO2003050586A3 PCT/EP2002/012792 EP0212792W WO03050586A3 WO 2003050586 A3 WO2003050586 A3 WO 2003050586A3 EP 0212792 W EP0212792 W EP 0212792W WO 03050586 A3 WO03050586 A3 WO 03050586A3
Authority
WO
WIPO (PCT)
Prior art keywords
mirror
facet
facetted
mirror surface
facets
Prior art date
Application number
PCT/EP2002/012792
Other languages
English (en)
French (fr)
Other versions
WO2003050586A2 (de
Inventor
Wolfgang Singer
Markus Weiss
Andreas Seifert
Frank Melzer
Heinz Mann
Andreas Heisler
Hubert Holderer
Original Assignee
Zeiss Carl Smt Ag
Wolfgang Singer
Markus Weiss
Andreas Seifert
Frank Melzer
Heinz Mann
Andreas Heisler
Hubert Holderer
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Ag, Wolfgang Singer, Markus Weiss, Andreas Seifert, Frank Melzer, Heinz Mann, Andreas Heisler, Hubert Holderer filed Critical Zeiss Carl Smt Ag
Priority to AU2002356606A priority Critical patent/AU2002356606A1/en
Publication of WO2003050586A2 publication Critical patent/WO2003050586A2/de
Publication of WO2003050586A3 publication Critical patent/WO2003050586A3/de
Priority to US10/841,846 priority patent/US7090362B2/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/085—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting means being moved or deformed by electromagnetic means
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/1821—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors for rotating or oscillating mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/1822—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors comprising means for aligning the optical axis
    • G02B7/1824—Manual alignment
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/198—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors with means for adjusting the mirror relative to its support
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70175—Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Electromagnetism (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)

Abstract

Eine Spiegelfacette (3) für einen Facettenspiegel (1) weist eine Speigeloberfläche (4) auf. Die Spielgeloberfläche (4) der Spiegelfacette (3) ist in einer bevorzugten Ausführungsform sphärisch ausgebildet, wobei die der Spiegeloberfläche (4) abgewandte Seite der Spiegelfacette (3) ebenfalls sphärisch ausgebildet ist, und wobei die beiden Sphären verschiedene Mittelpunkte (M, M') aufweisen. Die Spiegelfacette (3) kann jedoch auch so ausgebildet sein, dass die der Spiegeloberfläche (4) abgewandte Seite plan ausgebildet ist. Die Spiegelfacetten (3) sind zu einem Facettenspiegel (1) zusammenfassbar, wobei die Spiegelfacetten (3) dann auf ein gemeinsames Trägerelement (2) aufgesetzt sind.
PCT/EP2002/012792 2001-11-09 2002-11-15 Spiegelfacette und facettenspiegel WO2003050586A2 (de)

Priority Applications (2)

Application Number Priority Date Filing Date Title
AU2002356606A AU2002356606A1 (en) 2001-12-12 2002-11-15 Mirror facet and facetted mirror
US10/841,846 US7090362B2 (en) 2001-11-09 2004-05-07 Facet mirror having a number of mirror facets

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10160932 2001-12-12
DE10160932.9 2001-12-12

Related Child Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2002/011773 Continuation-In-Part WO2003040796A1 (en) 2001-11-09 2002-10-22 Tilting mirror

Publications (2)

Publication Number Publication Date
WO2003050586A2 WO2003050586A2 (de) 2003-06-19
WO2003050586A3 true WO2003050586A3 (de) 2003-12-18

Family

ID=7708871

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2002/012792 WO2003050586A2 (de) 2001-11-09 2002-11-15 Spiegelfacette und facettenspiegel

Country Status (2)

Country Link
AU (1) AU2002356606A1 (de)
WO (1) WO2003050586A2 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10302664A1 (de) * 2003-01-24 2004-07-29 Carl Zeiss Smt Ag Verfahren zur Herstellung eines Facettenspiegels
US7246909B2 (en) 2003-01-24 2007-07-24 Carl Zeiss Smt Ag Method for the production of a facetted mirror
DE102005056914A1 (de) 2005-11-29 2007-05-31 Carl Zeiss Smt Ag Projektionsbelichtungsystem
DE102006031654A1 (de) * 2006-04-24 2007-10-25 Carl Zeiss Smt Ag Facettenspiegel mit einer Vielzahl von Spiegelsegmenten
DE102006056035A1 (de) 2006-11-28 2008-05-29 Carl Zeiss Smt Ag Beleuchtungsoptik für die EUV-Projektions-Mikrolithographie, Beleuchtungssystem mit einer derartigen Beleuchtungsoptik, Projektionsbelichtungsanlage mit einem derartigen Beleuchtungssystem, Verfahren zur Herstellung eines mikrostrukturierten Bauteils sowie durch das Verfahren hergestelltes mikrostrukturiertes Bauteil
DE102007008448A1 (de) * 2007-02-19 2008-08-21 Carl Zeiss Smt Ag Verfahren zur Herstellung von Spiegelfacetten für einen Facettenspiegel
DE102012202047A1 (de) * 2012-02-10 2013-01-17 Carl Zeiss Smt Gmbh Zerstörungsfreies stoffschlüssiges Verbinden von Komponenten zur Herstellung von optischen Elementen
DE102012223754A1 (de) * 2012-12-19 2014-05-15 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zur automatisierten Montage von Facettenspiegeln und entsprechend hergestellte Facettenspiegel
DE102013203035A1 (de) 2013-02-25 2014-08-28 Carl Zeiss Smt Gmbh Optisches modul
DE102013212363A1 (de) * 2013-06-27 2014-07-31 Carl Zeiss Smt Gmbh Facettenspiegel, insbesondere für die EUV-Projektionslithografie
EP3704546A1 (de) * 2017-10-30 2020-09-09 ASML Holding N.V. Anordnung zur verwendung in der halbleiter-fotolithografie und verfahren zu ihrer herstellung
DE102021203475A1 (de) * 2021-04-08 2022-10-13 Carl Zeiss Smt Gmbh Verfahren zur Herstellung eines Spiegels einer Projektionsbelichtungsanlage für die Mikrolithographie

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6254210A (ja) * 1985-09-03 1987-03-09 Canon Inc 角度調整装置
JPH07199038A (ja) * 1994-01-10 1995-08-04 Sumitomo Heavy Ind Ltd 凹面鏡のあおり調整装置
JPH0996757A (ja) * 1995-10-02 1997-04-08 Olympus Optical Co Ltd 光路偏向装置
WO1998014815A1 (de) * 1996-10-01 1998-04-09 Hara Smith Stephen C O Justierbarer reflektor
EP0916984A1 (de) * 1997-11-15 1999-05-19 Canon Kabushiki Kaisha Lichtablenkvorrichtung und Matrix daraus
JP2000167683A (ja) * 1998-12-03 2000-06-20 Mitsubishi Electric Corp 反射鏡による光路調整装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6254210A (ja) * 1985-09-03 1987-03-09 Canon Inc 角度調整装置
JPH07199038A (ja) * 1994-01-10 1995-08-04 Sumitomo Heavy Ind Ltd 凹面鏡のあおり調整装置
JPH0996757A (ja) * 1995-10-02 1997-04-08 Olympus Optical Co Ltd 光路偏向装置
WO1998014815A1 (de) * 1996-10-01 1998-04-09 Hara Smith Stephen C O Justierbarer reflektor
EP0916984A1 (de) * 1997-11-15 1999-05-19 Canon Kabushiki Kaisha Lichtablenkvorrichtung und Matrix daraus
JP2000167683A (ja) * 1998-12-03 2000-06-20 Mitsubishi Electric Corp 反射鏡による光路調整装置

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 011, no. 248 (P - 604) 13 August 1987 (1987-08-13) *
PATENT ABSTRACTS OF JAPAN vol. 1995, no. 11 26 December 1995 (1995-12-26) *
PATENT ABSTRACTS OF JAPAN vol. 1997, no. 08 29 August 1997 (1997-08-29) *
PATENT ABSTRACTS OF JAPAN vol. 2000, no. 09 13 October 2000 (2000-10-13) *

Also Published As

Publication number Publication date
WO2003050586A2 (de) 2003-06-19
AU2002356606A8 (en) 2003-06-23
AU2002356606A1 (en) 2003-06-23

Similar Documents

Publication Publication Date Title
ATE464585T1 (de) Facettenspiegel mit mehreren spiegelfacetten
WO2003050586A3 (de) Spiegelfacette und facettenspiegel
AU2002361602A1 (en) Identity card and system for tracking the use of the card
USD437038S1 (en) Ionic air purifier
WO2005050260A3 (en) Contact lens
USD355240S (en) Chemical detergent block
USD462012S1 (en) Container
AU2002301157A1 (en) Contact center autopilot algorithms
WO2002016075A3 (en) Cmp apparatus with an oscillating polishing pad rotating in the opposite direction of the wafer
AU2001268422A1 (en) Agmatine and agmatine analogs in the treatment of epilepsy, seizure, and electroconvulsive disorders
USD428298S (en) Cocktail stirrer/cocktail maraca
ATE151609T1 (de) Entfaltbarer trinkbecher mit konkavem boden sowie mit stabilisierungsmitteln
USD403346S (en) Eyeglass retainer
USD476574S1 (en) Bottle
USD493933S1 (en) Egg carrier for an egg transportation system
USD483740S1 (en) Speaker
USD497023S1 (en) Lantern assembly
USD441423S1 (en) Sprinkler head
USD466606S1 (en) Combined oval base and yoke for high velocity fan
USD507987S1 (en) Inscribed bullion article
USD479558S1 (en) Clip
USD426767S (en) Resilient clip
USD459463S1 (en) Fan base
USD477545S1 (en) Inscribed bullion article
USD520646S1 (en) Scaffold brace

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A2

Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ PH PL PT RO RU SD SE SG SI SK SL TJ TM TR TT UA UG US UZ VN YU ZA ZW

AL Designated countries for regional patents

Kind code of ref document: A2

Designated state(s): GH GM KE LS MW MZ SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR IE IT LU MC NL PT SE SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG

121 Ep: the epo has been informed by wipo that ep was designated in this application
REG Reference to national code

Ref country code: DE

Ref legal event code: 8642

122 Ep: pct application non-entry in european phase
NENP Non-entry into the national phase

Ref country code: JP

WWW Wipo information: withdrawn in national office

Country of ref document: JP