AU2002356606A8 - Mirror facet and facetted mirror - Google Patents

Mirror facet and facetted mirror

Info

Publication number
AU2002356606A8
AU2002356606A8 AU2002356606A AU2002356606A AU2002356606A8 AU 2002356606 A8 AU2002356606 A8 AU 2002356606A8 AU 2002356606 A AU2002356606 A AU 2002356606A AU 2002356606 A AU2002356606 A AU 2002356606A AU 2002356606 A8 AU2002356606 A8 AU 2002356606A8
Authority
AU
Australia
Prior art keywords
mirror
facetted
facet
mirror facet
facetted mirror
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002356606A
Other versions
AU2002356606A1 (en
Inventor
Hubert Holderer
Markus Weiss
Frank Melzer
Andreas Heisler
Wolfgang Singer
Andreas Seifert
Heinz Mann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of AU2002356606A8 publication Critical patent/AU2002356606A8/en
Publication of AU2002356606A1 publication Critical patent/AU2002356606A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/085—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting means being moved or deformed by electromagnetic means
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/1821—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors for rotating or oscillating mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/1822—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors comprising means for aligning the optical axis
    • G02B7/1824—Manual alignment
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/198—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors with means for adjusting the mirror relative to its support
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70175—Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Electromagnetism (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
AU2002356606A 2001-12-12 2002-11-15 Mirror facet and facetted mirror Abandoned AU2002356606A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10160932 2001-12-12
DE10160932.9 2001-12-12
PCT/EP2002/012792 WO2003050586A2 (en) 2001-12-12 2002-11-15 Mirror facet and facetted mirror

Publications (2)

Publication Number Publication Date
AU2002356606A8 true AU2002356606A8 (en) 2003-06-23
AU2002356606A1 AU2002356606A1 (en) 2003-06-23

Family

ID=7708871

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002356606A Abandoned AU2002356606A1 (en) 2001-12-12 2002-11-15 Mirror facet and facetted mirror

Country Status (2)

Country Link
AU (1) AU2002356606A1 (en)
WO (1) WO2003050586A2 (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10302664A1 (en) * 2003-01-24 2004-07-29 Carl Zeiss Smt Ag Facetted mirror and holder and production process for a microlithographic projection unit in extreme ultraviolet determines and corrects deviations in mounting
US7246909B2 (en) 2003-01-24 2007-07-24 Carl Zeiss Smt Ag Method for the production of a facetted mirror
DE102005056914A1 (en) 2005-11-29 2007-05-31 Carl Zeiss Smt Ag Projection illumination system for use with production of e.g. integrated circuit, has interferometer arrangement examining optical components by measuring radiation that strikes on optical surface at specific angle of incidence
DE102006031654A1 (en) * 2006-04-24 2007-10-25 Carl Zeiss Smt Ag Facet mirror e.g. field facet mirror, for projection illumination system, has mirror segments provided with reflective surfaces, arranged on mirror carrier, and formed with individually formed angle of inclination in two different planes
DE102006056035A1 (en) 2006-11-28 2008-05-29 Carl Zeiss Smt Ag Illumination optics for EUV projection microlithography, illumination system with such illumination optics, projection exposure apparatus with such an illumination system, method for producing a microstructured component and microstructured component produced by the method
DE102007008448A1 (en) * 2007-02-19 2008-08-21 Carl Zeiss Smt Ag Method of producing mirror facets for a facet mirror
DE102012202047A1 (en) * 2012-02-10 2013-01-17 Carl Zeiss Smt Gmbh Method for manufacturing e.g. facet mirror, for extreme UV projection exposure system for microlithography, involves pressing optical functional body by applying pneumatic pressure on base body during reaction of reactive multi-layers
DE102012223754A1 (en) * 2012-12-19 2014-05-15 Carl Zeiss Smt Gmbh Method for manufacturing facet mirror for projection exposure system, involves arranging facet mirror elements on facet mirror base by robot, where each facet mirror element is provided with unique identification code
DE102013203035A1 (en) 2013-02-25 2014-08-28 Carl Zeiss Smt Gmbh OPTICAL MODULE
DE102013212363A1 (en) * 2013-06-27 2014-07-31 Carl Zeiss Smt Gmbh Facet mirror for illumination optics of optical system of lighting system in projection exposure system for EUV projection lithography at lighting field, has facet main assembly plane arranged in facet mirror surfaces of reflecting facets
EP3704546A1 (en) * 2017-10-30 2020-09-09 ASML Holding N.V. Assembly for use in semiconductor photolithography and method of manufacturing same
DE102021203475A1 (en) * 2021-04-08 2022-10-13 Carl Zeiss Smt Gmbh Process for producing a mirror of a projection exposure system for microlithography

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6254210A (en) * 1985-09-03 1987-03-09 Canon Inc Angle adjusting device
JPH07199038A (en) * 1994-01-10 1995-08-04 Sumitomo Heavy Ind Ltd Flapping adjusting device for concave mirror
JPH0996757A (en) * 1995-10-02 1997-04-08 Olympus Optical Co Ltd Optical path deflection device
DE29617111U1 (en) * 1996-10-01 1996-12-05 O'Hara-Smith, Stephen C., Celbridge, Co. Kildare Adjustable reflector
EP0916984A1 (en) * 1997-11-15 1999-05-19 Canon Kabushiki Kaisha Light deflection device and array thereof
JP2000167683A (en) * 1998-12-03 2000-06-20 Mitsubishi Electric Corp Device for adjusting optical path by reflection mirror

Also Published As

Publication number Publication date
WO2003050586A2 (en) 2003-06-19
AU2002356606A1 (en) 2003-06-23
WO2003050586A3 (en) 2003-12-18

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase