WO2003034169A1 - Regulateur de debit par emission d'impulsions et procede de regulation de debit par emissions d'impulsions - Google Patents

Regulateur de debit par emission d'impulsions et procede de regulation de debit par emissions d'impulsions Download PDF

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Publication number
WO2003034169A1
WO2003034169A1 PCT/JP2002/010733 JP0210733W WO03034169A1 WO 2003034169 A1 WO2003034169 A1 WO 2003034169A1 JP 0210733 W JP0210733 W JP 0210733W WO 03034169 A1 WO03034169 A1 WO 03034169A1
Authority
WO
WIPO (PCT)
Prior art keywords
pulse shot
cutoff valve
shot flow
pulse
process gas
Prior art date
Application number
PCT/JP2002/010733
Other languages
English (en)
French (fr)
Inventor
Tokuhide Nawata
Yoshihisa Sudoh
Masayuki Kouketsu
Masayuki Watanabe
Hiroki Doi
Original Assignee
Ckd Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ckd Corporation filed Critical Ckd Corporation
Priority to KR1020047005666A priority Critical patent/KR100878577B1/ko
Priority to US10/491,955 priority patent/US6913031B2/en
Priority to JP2003536834A priority patent/JP4197648B2/ja
Publication of WO2003034169A1 publication Critical patent/WO2003034169A1/ja

Links

Classifications

    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
    • G05D7/0641—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means
    • G05D7/0647—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means the plurality of throttling means being arranged in series
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/0318—Processes
    • Y10T137/0324—With control of flow by a condition or characteristic of a fluid
    • Y10T137/0379—By fluid pressure
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/7722—Line condition change responsive valves
    • Y10T137/7758—Pilot or servo controlled
    • Y10T137/7759—Responsive to change in rate of fluid flow
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/7722—Line condition change responsive valves
    • Y10T137/7758—Pilot or servo controlled
    • Y10T137/7761—Electrically actuated valve
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/86389—Programmer or timer
    • Y10T137/86405—Repeating cycle
    • Y10T137/86421—Variable

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Measuring Volume Flow (AREA)
  • Flow Control (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)
PCT/JP2002/010733 2001-10-18 2002-10-16 Regulateur de debit par emission d'impulsions et procede de regulation de debit par emissions d'impulsions WO2003034169A1 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
KR1020047005666A KR100878577B1 (ko) 2001-10-18 2002-10-16 펄스 샷 타입 유량 조정 장치 및 펄스 샷 타입 유량 조정방법
US10/491,955 US6913031B2 (en) 2001-10-18 2002-10-16 Pulse shot type flow controller and pulse shot type flow controlling method
JP2003536834A JP4197648B2 (ja) 2001-10-18 2002-10-16 パルスショット式流量調整装置とパルスショット式流量調整方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001/320560 2001-10-18
JP2001320560 2001-10-18

Publications (1)

Publication Number Publication Date
WO2003034169A1 true WO2003034169A1 (fr) 2003-04-24

Family

ID=19137933

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2002/010733 WO2003034169A1 (fr) 2001-10-18 2002-10-16 Regulateur de debit par emission d'impulsions et procede de regulation de debit par emissions d'impulsions

Country Status (5)

Country Link
US (1) US6913031B2 (ja)
JP (1) JP4197648B2 (ja)
KR (1) KR100878577B1 (ja)
TW (1) TW552490B (ja)
WO (1) WO2003034169A1 (ja)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006137404A1 (ja) * 2005-06-24 2006-12-28 Ckd Corporation 流量制御弁
JP2007535617A (ja) * 2004-04-12 2007-12-06 エム　ケー　エス　インストルメンツ　インコーポレーテッド パルス化された質量流量搬送システム及び方法
JP2020173121A (ja) * 2019-04-08 2020-10-22 株式会社堀場エステック 流量算出装置、流量算出システム、及び、流量算出装置用プログラム
JP2021508129A (ja) * 2018-02-02 2021-02-25 エム ケー エス インストルメンツ インコーポレーテッドＭｋｓ Ｉｎｓｔｒｕｍｅｎｔｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 遮断弁を用いたパルスガス供給方法および装置
CN112525511A (zh) * 2020-11-30 2021-03-19 江苏大学 一种射流脉冲三通实验装置
CN113351120A (zh) * 2021-06-08 2021-09-07 哈尔滨工业大学 一种气体混合***及混合方法
WO2022065114A1 (ja) * 2020-09-24 2022-03-31 東京エレクトロン株式会社 ガスを供給する装置、基板を処理するシステム、及びガスを供給する方法
CN115675808A (zh) * 2022-10-26 2023-02-03 上海理工大学 用于喷水推进器的自循环射流扩稳控制***及方法

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JP3985899B2 (ja) * 2002-03-28 2007-10-03 株式会社日立国際電気 基板処理装置
US7628861B2 (en) * 2004-12-17 2009-12-08 Mks Instruments, Inc. Pulsed mass flow delivery system and method
JP3945519B2 (ja) * 2004-06-21 2007-07-18 東京エレクトロン株式会社 被処理体の熱処理装置、熱処理方法及び記憶媒体
US20060000509A1 (en) * 2004-07-01 2006-01-05 Pozniak Peter M Fluid flow control device and system
JP2009521655A (ja) * 2005-12-23 2009-06-04 クウォンタム・フューエル・システムズ・テクノロジーズ・ワールドワイド・インコーポレイテッド 水素貯蔵コンテナの安全警告および運転停止システムおよびその方法
WO2008041390A1 (fr) * 2006-10-03 2008-04-10 Horiba Stec, Co., Ltd. Régulateur de débit massique
JP5459895B2 (ja) * 2007-10-15 2014-04-02 Ｃｋｄ株式会社 ガス分流供給ユニット
KR101485887B1 (ko) * 2007-12-05 2015-01-26 히다치 조센 가부시키가이샤 진공 용기의 압력 제어 방법 및 압력 제어 장치
US8790464B2 (en) 2010-01-19 2014-07-29 Mks Instruments, Inc. Control for and method of pulsed gas delivery
US8997686B2 (en) * 2010-09-29 2015-04-07 Mks Instruments, Inc. System for and method of fast pulse gas delivery
US9348339B2 (en) 2010-09-29 2016-05-24 Mks Instruments, Inc. Method and apparatus for multiple-channel pulse gas delivery system
US10031531B2 (en) * 2011-02-25 2018-07-24 Mks Instruments, Inc. System for and method of multiple channel fast pulse gas delivery
US10353408B2 (en) * 2011-02-25 2019-07-16 Mks Instruments, Inc. System for and method of fast pulse gas delivery
US10126760B2 (en) 2011-02-25 2018-11-13 Mks Instruments, Inc. System for and method of fast pulse gas delivery
US9958302B2 (en) * 2011-08-20 2018-05-01 Reno Technologies, Inc. Flow control system, method, and apparatus
US9151731B2 (en) * 2012-01-19 2015-10-06 Idexx Laboratories Inc. Fluid pressure control device for an analyzer
JP5754853B2 (ja) * 2012-01-30 2015-07-29 株式会社フジキン 半導体製造装置のガス分流供給装置
JP5665793B2 (ja) * 2012-04-26 2015-02-04 株式会社フジキン 可変オリフィス型圧力制御式流量制御器
JP5868796B2 (ja) * 2012-07-03 2016-02-24 株式会社堀場エステック 圧力制御装置、流量制御装置、及び、圧力制御装置用プログラム、流量制御装置用プログラム
FR2994455B1 (fr) * 2012-08-10 2014-09-05 Faurecia Sys Echappement Ensemble de fourniture d'un flux dose de gaz, procede associe, ligne d'echappement de vehicule equipee d'un tel ensemble
JP5397525B1 (ja) * 2012-11-13 2014-01-22 Ｓｍｃ株式会社 真空調圧システム
JP6107327B2 (ja) * 2013-03-29 2017-04-05 東京エレクトロン株式会社 成膜装置及びガス供給装置並びに成膜方法
JP6336719B2 (ja) * 2013-07-16 2018-06-06 株式会社ディスコ プラズマエッチング装置
JP6158111B2 (ja) * 2014-02-12 2017-07-05 東京エレクトロン株式会社 ガス供給方法及び半導体製造装置
PL2908024T3 (pl) * 2014-02-17 2024-02-26 Special Springs S.R.L. Urządzenie do regulowanego zwiększania ciśnienia w siłownikach w postaci cylindrów gazowych
US10515783B2 (en) * 2016-02-23 2019-12-24 Lam Research Corporation Flow through line charge volume
CN105806371B (zh) * 2016-04-29 2018-03-09 国网上海市电力公司 传感器的温压动态补偿方法
US10679880B2 (en) * 2016-09-27 2020-06-09 Ichor Systems, Inc. Method of achieving improved transient response in apparatus for controlling flow and system for accomplishing same
US11144075B2 (en) 2016-06-30 2021-10-12 Ichor Systems, Inc. Flow control system, method, and apparatus
JP6786096B2 (ja) * 2016-07-28 2020-11-18 株式会社フジキン 圧力式流量制御装置
JP6978865B2 (ja) * 2017-07-05 2021-12-08 株式会社堀場エステック 流体制御装置、流体制御方法、及び、流体制御装置用プログラム
JP7107648B2 (ja) * 2017-07-11 2022-07-27 株式会社堀場エステック 流体制御装置、流体制御システム、流体制御方法、及び、流体制御装置用プログラム
US11733721B2 (en) * 2018-02-26 2023-08-22 Fujikin Incorporated Flow rate control device and flow rate control method
WO2019208417A1 (ja) * 2018-04-27 2019-10-31 株式会社フジキン 流量制御方法および流量制御装置
US11216016B2 (en) * 2018-06-26 2022-01-04 Fujikin Incorporated Flow rate control method and flow rate control device
US11404290B2 (en) * 2019-04-05 2022-08-02 Mks Instruments, Inc. Method and apparatus for pulse gas delivery
JP7122335B2 (ja) * 2020-03-30 2022-08-19 Ckd株式会社 パルスショット式流量調整装置、パルスショット式流量調整方法、及び、プログラム
JP7122334B2 (ja) 2020-03-30 2022-08-19 Ckd株式会社 パルスショット式流量調整装置、パルスショット式流量調整方法、及び、プログラム
KR20230000975A (ko) * 2021-06-25 2023-01-03 가부시키가이샤 호리바 에스텍 유체 제어 장치, 유체 제어 시스템, 유체 제어 장치용 프로그램 및 유체 제어 방법

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JPH11202945A (ja) * 1998-01-19 1999-07-30 Smc Corp マスフローコントローラの自己診断方法

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Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007535617A (ja) * 2004-04-12 2007-12-06 エム　ケー　エス　インストルメンツ　インコーポレーテッド パルス化された質量流量搬送システム及び方法
US7628860B2 (en) * 2004-04-12 2009-12-08 Mks Instruments, Inc. Pulsed mass flow delivery system and method
US7829353B2 (en) 2004-04-12 2010-11-09 Mks Instruments, Inc. Pulsed mass flow delivery system and method
KR100963937B1 (ko) 2005-06-24 2010-06-17 씨케이디 가부시키 가이샤 유량 제어 밸브
US7748684B2 (en) 2005-06-24 2010-07-06 Ckd Corporation Flow control valve
WO2006137404A1 (ja) * 2005-06-24 2006-12-28 Ckd Corporation 流量制御弁
JP2021508129A (ja) * 2018-02-02 2021-02-25 エム ケー エス インストルメンツ インコーポレーテッドＭｋｓ Ｉｎｓｔｒｕｍｅｎｔｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 遮断弁を用いたパルスガス供給方法および装置
JP2020173121A (ja) * 2019-04-08 2020-10-22 株式会社堀場エステック 流量算出装置、流量算出システム、及び、流量算出装置用プログラム
JP7273596B2 (ja) 2019-04-08 2023-05-15 株式会社堀場エステック 流量算出装置、流量算出システム、及び、流量算出装置用プログラム
WO2022065114A1 (ja) * 2020-09-24 2022-03-31 東京エレクトロン株式会社 ガスを供給する装置、基板を処理するシステム、及びガスを供給する方法
CN112525511A (zh) * 2020-11-30 2021-03-19 江苏大学 一种射流脉冲三通实验装置
CN113351120A (zh) * 2021-06-08 2021-09-07 哈尔滨工业大学 一种气体混合***及混合方法
CN113351120B (zh) * 2021-06-08 2022-09-16 哈尔滨工业大学 一种气体混合***及混合方法
CN115675808A (zh) * 2022-10-26 2023-02-03 上海理工大学 用于喷水推进器的自循环射流扩稳控制***及方法

Also Published As

Publication number Publication date
KR100878577B1 (ko) 2009-01-15
JP4197648B2 (ja) 2008-12-17
TW552490B (en) 2003-09-11
US6913031B2 (en) 2005-07-05
US20040244837A1 (en) 2004-12-09
KR20040062569A (ko) 2004-07-07
JPWO2003034169A1 (ja) 2005-02-03

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