WO2003001272A3 - Objektiv - Google Patents

Objektiv Download PDF

Info

Publication number
WO2003001272A3
WO2003001272A3 PCT/EP2002/006798 EP0206798W WO03001272A3 WO 2003001272 A3 WO2003001272 A3 WO 2003001272A3 EP 0206798 W EP0206798 W EP 0206798W WO 03001272 A3 WO03001272 A3 WO 03001272A3
Authority
WO
WIPO (PCT)
Prior art keywords
lens
lens group
refractive power
achromatising
group
Prior art date
Application number
PCT/EP2002/006798
Other languages
English (en)
French (fr)
Other versions
WO2003001272A2 (de
Inventor
Robert Brunner
Knut Hage
Hans-Juergen Dobschal
Klaus Rudolf
Reinhard Steiner
Original Assignee
Zeiss Carl Jena Gmbh
Robert Brunner
Knut Hage
Hans-Juergen Dobschal
Klaus Rudolf
Reinhard Steiner
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Jena Gmbh, Robert Brunner, Knut Hage, Hans-Juergen Dobschal, Klaus Rudolf, Reinhard Steiner filed Critical Zeiss Carl Jena Gmbh
Priority to JP2003507611A priority Critical patent/JP4252447B2/ja
Priority to EP02760189A priority patent/EP1397716A2/de
Priority to US10/481,208 priority patent/US20040174607A1/en
Publication of WO2003001272A2 publication Critical patent/WO2003001272A2/de
Publication of WO2003001272A3 publication Critical patent/WO2003001272A3/de

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00Microscopes
    • G02B21/02Objectives

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Abstract

Bei einem Objektiv (1), insbesondere einem Mikroskopobjektiv, wobei das Objektiv eine objektseitige erste Optikgruppe (5) mit positiver Brechkraft und eine der ersten Optikgruppe (5) nachgeschaltete zweite Optikgruppe (6) mit negativer Brechkraft aufweist und wobei die erste Optikgruppe (5) mehrere refraktive Elemente (7, 8, 9, 10) umfaßt, enthält die erste Optikgruppe (5) zumindest ein diffraktives Element (11), das brechungsverstärkend und achromatisierend wirkt.
PCT/EP2002/006798 2001-06-22 2002-06-19 Objektiv WO2003001272A2 (de)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2003507611A JP4252447B2 (ja) 2001-06-22 2002-06-19 対物レンズ
EP02760189A EP1397716A2 (de) 2001-06-22 2002-06-19 Objektiv
US10/481,208 US20040174607A1 (en) 2001-06-22 2002-06-19 Lens

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10130212A DE10130212A1 (de) 2001-06-22 2001-06-22 Objektiv
DE10130212.6 2001-06-22

Publications (2)

Publication Number Publication Date
WO2003001272A2 WO2003001272A2 (de) 2003-01-03
WO2003001272A3 true WO2003001272A3 (de) 2003-11-20

Family

ID=7689120

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2002/006798 WO2003001272A2 (de) 2001-06-22 2002-06-19 Objektiv

Country Status (6)

Country Link
US (1) US20040174607A1 (de)
EP (1) EP1397716A2 (de)
JP (1) JP4252447B2 (de)
DE (1) DE10130212A1 (de)
TW (1) TWI226938B (de)
WO (1) WO2003001272A2 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10318560A1 (de) * 2003-04-24 2004-11-11 Carl Zeiss Sms Gmbh Anordnung zur Inspektion von Objekten, insbesondere von Masken in der Mikrolithographie
DE10319269A1 (de) 2003-04-25 2004-11-25 Carl Zeiss Sms Gmbh Abbildungssystem für ein, auf extrem ultravioletter (EUV) Strahlung basierendem Mikroskop
DE102004009212B4 (de) * 2004-02-25 2015-08-20 Carl Zeiss Meditec Ag Kontaktelement für Laserbearbeitung und Laserbearbeitungsvorrichtung
DE102005042005A1 (de) 2004-12-23 2006-07-06 Carl Zeiss Smt Ag Hochaperturiges Objektiv mit obskurierter Pupille
DE102005062237A1 (de) * 2005-12-22 2007-07-05 Carl Zeiss Jena Gmbh Verfahren und Vorrichtung zur Untersuchung des Abbildungsverhaltens einer Abbildungsoptik
WO2007093433A1 (de) 2006-02-17 2007-08-23 Carl Zeiss Smt Ag Beleuchtungssystem für die mikro-lithographie, projektionsbelichtungsanlage mit einem derartigen beleuchtungssystem
DE102007023411A1 (de) 2006-12-28 2008-07-03 Carl Zeiss Smt Ag Optisches Element, Beleuchtungsoptik für die Mikrolithographie mit mindestens einem derartigen optischen Element sowie Beleuchtungssystem mit einer derartigen Beleuchtungsoptik
DE102007043896A1 (de) 2007-09-14 2009-04-02 Carl Zeiss Smt Ag Mikrooptik zur Messung der Position eines Luftbildes
EP2584391B1 (de) 2010-06-16 2020-12-02 Nikon Corporation Mikroskopobjektivlinse
JP5829212B2 (ja) * 2010-08-25 2015-12-09 株式会社ニコン 顕微鏡光学系の製造方法
DE102019124919B4 (de) 2019-09-17 2021-08-26 Ri Research Instruments Gmbh Mikroskopisches System zur Prüfung von Strukturen und Defekten auf EUV-Lithographie-Photomasken
WO2021090720A1 (ja) * 2019-11-06 2021-05-14 ソニー株式会社 光学測定装置及びレンズ構造体
CN116670493A (zh) * 2021-01-14 2023-08-29 索尼集团公司 粒子分析器、粒子分析方法和光学测量装置

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4032259A1 (de) * 1990-10-11 1992-04-16 Jenoptik Jena Gmbh Mikroskopobjektiv
US5627679A (en) * 1991-06-10 1997-05-06 Olympus Optical Co., Ltd. Optical systems making use of phase type fresnel zone plates
JPH09197283A (ja) * 1996-01-12 1997-07-31 Olympus Optical Co Ltd 対物レンズ
US5748372A (en) * 1995-04-17 1998-05-05 Olympus Optical Company Limited High numerical aperture and long working distance objective system using diffraction-type optical elements
JPH11326772A (ja) * 1998-05-13 1999-11-26 Olympus Optical Co Ltd 対物レンズ
US5995286A (en) * 1997-03-07 1999-11-30 Minolta Co., Ltd. Diffractive optical element, an optical system having a diffractive optical element, and a method for manufacturing a diffractive optical element

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5349471A (en) * 1993-02-16 1994-09-20 The University Of Rochester Hybrid refractive/diffractive achromatic lens for optical data storage systems
JP3746894B2 (ja) * 1998-02-05 2006-02-15 ペンタックス株式会社 色消しレンズ系
JP3950571B2 (ja) * 1999-03-10 2007-08-01 キヤノン株式会社 撮影光学系
JP2001100017A (ja) * 1999-09-29 2001-04-13 Canon Inc 光学素子

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4032259A1 (de) * 1990-10-11 1992-04-16 Jenoptik Jena Gmbh Mikroskopobjektiv
US5627679A (en) * 1991-06-10 1997-05-06 Olympus Optical Co., Ltd. Optical systems making use of phase type fresnel zone plates
US5748372A (en) * 1995-04-17 1998-05-05 Olympus Optical Company Limited High numerical aperture and long working distance objective system using diffraction-type optical elements
JPH09197283A (ja) * 1996-01-12 1997-07-31 Olympus Optical Co Ltd 対物レンズ
US5995286A (en) * 1997-03-07 1999-11-30 Minolta Co., Ltd. Diffractive optical element, an optical system having a diffractive optical element, and a method for manufacturing a diffractive optical element
JPH11326772A (ja) * 1998-05-13 1999-11-26 Olympus Optical Co Ltd 対物レンズ

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 1997, no. 11 28 November 1997 (1997-11-28) *
PATENT ABSTRACTS OF JAPAN vol. 2000, no. 02 29 February 2000 (2000-02-29) *

Also Published As

Publication number Publication date
JP2004530937A (ja) 2004-10-07
DE10130212A1 (de) 2003-01-02
WO2003001272A2 (de) 2003-01-03
TWI226938B (en) 2005-01-21
EP1397716A2 (de) 2004-03-17
US20040174607A1 (en) 2004-09-09
JP4252447B2 (ja) 2009-04-08

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