WO2002069365A3 - Vessel for processing microelectronic workpieces - Google Patents
Vessel for processing microelectronic workpieces Download PDFInfo
- Publication number
- WO2002069365A3 WO2002069365A3 PCT/US2002/005158 US0205158W WO02069365A3 WO 2002069365 A3 WO2002069365 A3 WO 2002069365A3 US 0205158 W US0205158 W US 0205158W WO 02069365 A3 WO02069365 A3 WO 02069365A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- microelectronic workpieces
- vessel
- processing
- rotatable fixture
- processing microelectronic
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67075—Apparatus for fluid treatment for etching for wet etching
- H01L21/6708—Apparatus for fluid treatment for etching for wet etching using mainly spraying means, e.g. nozzles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Drying Of Semiconductors (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU2002244101A AU2002244101A1 (en) | 2001-02-27 | 2002-02-21 | Vessel for processing microelectronic workpieces |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US79577601A | 2001-02-27 | 2001-02-27 | |
US09/795,776 | 2001-02-27 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2002069365A2 WO2002069365A2 (en) | 2002-09-06 |
WO2002069365A3 true WO2002069365A3 (en) | 2002-12-19 |
Family
ID=25166412
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2002/005158 WO2002069365A2 (en) | 2001-02-27 | 2002-02-21 | Vessel for processing microelectronic workpieces |
Country Status (2)
Country | Link |
---|---|
AU (1) | AU2002244101A1 (en) |
WO (1) | WO2002069365A2 (en) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4403567A (en) * | 1980-08-21 | 1983-09-13 | Commonwealth Scientific Corporation | Workpiece holder |
US5672212A (en) * | 1994-07-01 | 1997-09-30 | Texas Instruments Incorporated | Rotational megasonic cleaner/etcher for wafers |
EP0805483A1 (en) * | 1995-10-17 | 1997-11-05 | Asm Japan K.K. | Semiconductor treatment apparatus |
WO1999036588A1 (en) * | 1998-01-15 | 1999-07-22 | Torrex Equipment Corporation | Method and apparatus for improved chemical vapor deposition processes using tunable temperature controlled gas injectors |
-
2002
- 2002-02-21 AU AU2002244101A patent/AU2002244101A1/en not_active Abandoned
- 2002-02-21 WO PCT/US2002/005158 patent/WO2002069365A2/en not_active Application Discontinuation
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4403567A (en) * | 1980-08-21 | 1983-09-13 | Commonwealth Scientific Corporation | Workpiece holder |
US5672212A (en) * | 1994-07-01 | 1997-09-30 | Texas Instruments Incorporated | Rotational megasonic cleaner/etcher for wafers |
EP0805483A1 (en) * | 1995-10-17 | 1997-11-05 | Asm Japan K.K. | Semiconductor treatment apparatus |
WO1999036588A1 (en) * | 1998-01-15 | 1999-07-22 | Torrex Equipment Corporation | Method and apparatus for improved chemical vapor deposition processes using tunable temperature controlled gas injectors |
Also Published As
Publication number | Publication date |
---|---|
WO2002069365A2 (en) | 2002-09-06 |
AU2002244101A1 (en) | 2002-09-12 |
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