WO2002068127A8 - Manifolded fluid delivery system - Google Patents

Manifolded fluid delivery system

Info

Publication number
WO2002068127A8
WO2002068127A8 PCT/US2002/006302 US0206302W WO02068127A8 WO 2002068127 A8 WO2002068127 A8 WO 2002068127A8 US 0206302 W US0206302 W US 0206302W WO 02068127 A8 WO02068127 A8 WO 02068127A8
Authority
WO
WIPO (PCT)
Prior art keywords
high purity
delivery system
fluid
fluid streams
streams
Prior art date
Application number
PCT/US2002/006302
Other languages
French (fr)
Other versions
WO2002068127A3 (en
WO2002068127A2 (en
Inventor
George K Porter
Seth B Wolf
Charles W Albrecht
Original Assignee
Porter Instr Company Inc
George K Porter
Seth B Wolf
Charles W Albrecht
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Porter Instr Company Inc, George K Porter, Seth B Wolf, Charles W Albrecht filed Critical Porter Instr Company Inc
Priority to DE60215471T priority Critical patent/DE60215471T2/en
Priority to JP2002567474A priority patent/JP2004524148A/en
Priority to EP02707937A priority patent/EP1372864B1/en
Priority to AU2002242304A priority patent/AU2002242304A1/en
Publication of WO2002068127A2 publication Critical patent/WO2002068127A2/en
Publication of WO2002068127A3 publication Critical patent/WO2002068127A3/en
Publication of WO2002068127A8 publication Critical patent/WO2002068127A8/en

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F22—STEAM GENERATION
    • F22B—METHODS OF STEAM GENERATION; STEAM BOILERS
    • F22B27/00—Instantaneous or flash steam boilers
    • F22B27/16—Instantaneous or flash steam boilers involving spray nozzles for sprinkling or injecting water particles on to or into hot heat-exchange elements, e.g. into tubes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/10—Mixing gases with gases
    • B01F23/12—Mixing gases with gases with vaporisation of a liquid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20—Mixing gases with liquids
    • B01F23/21—Mixing gases with liquids by introducing liquids into gaseous media
    • B01F23/213—Mixing gases with liquids by introducing liquids into gaseous media by spraying or atomising of the liquids
    • B01F23/2132—Mixing gases with liquids by introducing liquids into gaseous media by spraying or atomising of the liquids using nozzles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/30—Injector mixers
    • B01F25/31—Injector mixers in conduits or tubes through which the main component flows
    • B01F25/312—Injector mixers in conduits or tubes through which the main component flows with Venturi elements; Details thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K27/00—Construction of housing; Use of materials therefor
    • F16K27/003—Housing formed from a plurality of the same valve elements
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F22—STEAM GENERATION
    • F22B—METHODS OF STEAM GENERATION; STEAM BOILERS
    • F22B27/00—Instantaneous or flash steam boilers
    • F22B27/14—Instantaneous or flash steam boilers built-up from heat-exchange elements arranged within a confined chamber having heat-retaining walls
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F2101/00—Mixing characterised by the nature of the mixed materials or by the application field
    • B01F2101/58—Mixing semiconducting materials, e.g. during semiconductor or wafer manufacturing processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B67—OPENING, CLOSING OR CLEANING BOTTLES, JARS OR SIMILAR CONTAINERS; LIQUID HANDLING
    • B67D—DISPENSING, DELIVERING OR TRANSFERRING LIQUIDS, NOT OTHERWISE PROVIDED FOR
    • B67D2210/00—Indexing scheme relating to aspects and details of apparatus or devices for dispensing beverages on draught or for controlling flow of liquids under gravity from storage containers for dispensing purposes
    • B67D2210/00028—Constructional details
    • B67D2210/00047—Piping
    • B67D2210/0006—Manifolds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/877—With flow control means for branched passages
    • Y10T137/87885—Sectional block structure

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Thermal Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Drying Of Semiconductors (AREA)
  • Nozzles (AREA)
  • Valve Housings (AREA)
  • Measuring Volume Flow (AREA)
  • Flow Control (AREA)

Abstract

An integrated fluid delivery system (IFDS) (15) is provided for delivering fluid streams such as high purity fluid streams to a processing destination, such as a wafer processing chamber. The delivery system includes a first modular manifold for internally channeling the high purity fluid streams along seamless slots (18). The first modular manifold receives each of the high purity fluid streams at a corresponding porting aperture (30). At least one fluid device (12) from a group consisting of a flow controller, a valve, a filter and a pressure transducer is provided. The at least one fluid device (12) is in fluidic communication with a corresponding one of the high purity liquid streams of the first modular manifold to dispense the high purity fluid streams from the integrated liquid delivery system to the wafer processing chamber.
PCT/US2002/006302 2001-02-28 2002-02-28 Manifolded fluid delivery system WO2002068127A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
DE60215471T DE60215471T2 (en) 2001-02-28 2002-02-28 FLUID DISPENSER WITH DISTRIBUTOR
JP2002567474A JP2004524148A (en) 2001-02-28 2002-02-28 Manifold fluid delivery system
EP02707937A EP1372864B1 (en) 2001-02-28 2002-02-28 Manifolded fluid delivery system
AU2002242304A AU2002242304A1 (en) 2001-02-28 2002-02-28 Manifolded fluid delivery system

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US27194701P 2001-02-28 2001-02-28
US60/271,947 2001-02-28

Publications (3)

Publication Number Publication Date
WO2002068127A2 WO2002068127A2 (en) 2002-09-06
WO2002068127A3 WO2002068127A3 (en) 2002-11-21
WO2002068127A8 true WO2002068127A8 (en) 2003-02-27

Family

ID=23037766

Family Applications (4)

Application Number Title Priority Date Filing Date
PCT/US2002/006313 WO2002074445A2 (en) 2001-02-28 2002-02-28 Atomizer
PCT/US2002/006253 WO2002069065A2 (en) 2001-02-28 2002-02-28 Flow controller
PCT/US2002/006302 WO2002068127A2 (en) 2001-02-28 2002-02-28 Manifolded fluid delivery system
PCT/US2002/006411 WO2002068713A1 (en) 2001-02-28 2002-02-28 Vaporizer

Family Applications Before (2)

Application Number Title Priority Date Filing Date
PCT/US2002/006313 WO2002074445A2 (en) 2001-02-28 2002-02-28 Atomizer
PCT/US2002/006253 WO2002069065A2 (en) 2001-02-28 2002-02-28 Flow controller

Family Applications After (1)

Application Number Title Priority Date Filing Date
PCT/US2002/006411 WO2002068713A1 (en) 2001-02-28 2002-02-28 Vaporizer

Country Status (6)

Country Link
US (4) US6834848B2 (en)
EP (4) EP1374004A2 (en)
JP (4) JP2005506681A (en)
AU (1) AU2002242304A1 (en)
DE (3) DE60215618T2 (en)
WO (4) WO2002074445A2 (en)

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EP1372864A2 (en) 2004-01-02
WO2002068127A3 (en) 2002-11-21
JP2005506681A (en) 2005-03-03
EP1427868B1 (en) 2005-06-15
US6694809B2 (en) 2004-02-24
DE60204706T2 (en) 2006-05-18
DE60215471T2 (en) 2007-08-23
JP2004530190A (en) 2004-09-30
WO2002074445A8 (en) 2003-01-16
WO2002068713A8 (en) 2002-10-24
AU2002242304A1 (en) 2002-09-12
US20020121249A1 (en) 2002-09-05
EP1363745B1 (en) 2006-10-25
US20020148406A1 (en) 2002-10-17
EP1372864B1 (en) 2006-10-18
WO2002069065A3 (en) 2003-03-20
JP2004524150A (en) 2004-08-12
WO2002069065A2 (en) 2002-09-06
WO2002074445A2 (en) 2002-09-26
DE60215618T2 (en) 2007-08-30
WO2002068127A2 (en) 2002-09-06
EP1374004A2 (en) 2004-01-02
DE60204706D1 (en) 2005-07-21
WO2002074445A3 (en) 2002-11-28
US6604492B2 (en) 2003-08-12
JP2004524148A (en) 2004-08-12
WO2002068713A1 (en) 2002-09-06
US20020124961A1 (en) 2002-09-12
US6834848B2 (en) 2004-12-28
US20020124641A1 (en) 2002-09-12
DE60215618D1 (en) 2006-12-07
EP1427868A2 (en) 2004-06-16
US6892762B2 (en) 2005-05-17
DE60215471D1 (en) 2006-11-30
EP1363745A2 (en) 2003-11-26

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