WO1997049479A1 - Method of removing, from a stream of gas, fluorinated compounds which contribute to destruction of the ozone layer and/or changes in climate, and use of the method - Google Patents

Method of removing, from a stream of gas, fluorinated compounds which contribute to destruction of the ozone layer and/or changes in climate, and use of the method Download PDF

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Publication number
WO1997049479A1
WO1997049479A1 PCT/EP1997/003318 EP9703318W WO9749479A1 WO 1997049479 A1 WO1997049479 A1 WO 1997049479A1 EP 9703318 W EP9703318 W EP 9703318W WO 9749479 A1 WO9749479 A1 WO 9749479A1
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WO
WIPO (PCT)
Prior art keywords
gas
sorbent
fluorinated
aluminum oxide
cleaned
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PCT/EP1997/003318
Other languages
German (de)
French (fr)
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WO1997049479B1 (en
Inventor
Christoph Scholz
Walter Holzinger
Karl Markert
Eckard Kopatzki
Original Assignee
Cs-Gmbh Halbleiter- Und Solartechnologie
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Publication date
Priority claimed from DE1997119834 external-priority patent/DE19719834A1/en
Application filed by Cs-Gmbh Halbleiter- Und Solartechnologie filed Critical Cs-Gmbh Halbleiter- Und Solartechnologie
Priority to EP97930395A priority Critical patent/EP0907402B1/en
Priority to JP50234998A priority patent/JP2001505477A/en
Priority to DE59703604T priority patent/DE59703604D1/en
Priority to US09/214,081 priority patent/US6110436A/en
Publication of WO1997049479A1 publication Critical patent/WO1997049479A1/en
Publication of WO1997049479B1 publication Critical patent/WO1997049479B1/en

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Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25CPROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C3/00Electrolytic production, recovery or refining of metals by electrolysis of melts
    • C25C3/06Electrolytic production, recovery or refining of metals by electrolysis of melts of aluminium
    • C25C3/22Collecting emitted gases
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34Chemical or biological purification of waste gases
    • B01D53/46Removing components of defined structure
    • B01D53/68Halogens or halogen compounds
    • B01D53/70Organic halogen compounds
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02CCAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00Capture or disposal of greenhouse gases
    • Y02C20/30Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]

Definitions

  • the invention relates to a method for removing fluorinated ozone-depleting and / or climate-effective fluorinated compounds from a gas stream which is passed through a solid, heated sorbent. It also relates to applications of this method.
  • ODP ozone depletion potential
  • GWP Greenhouse Warming Potential
  • a method according to the preamble of claim 1 is already known from DE 44 04 329 C1.
  • a phyllosilicate containing iron oxide is used as the sorbent.
  • the known method has largely been retained.
  • the sorbent must be heated to a relatively high temperature, for example for the sorption of CF4 up to 350 ° C.
  • the sorption capacity of the sorbent also leaves something to be desired.
  • EP 0 412 456 A2 to decompose fluorocarbons with steam at 350 to 1000 ° C. over an aluminum oxide catalyst to give hydrogen chloride, hydrogen fluoride, carbon dioxide and carbon monoxide and other compounds such as chlorofluorosacetic acid.
  • the object of the invention is to remove fluorinated prebonds from a gas stream with little effort.
  • the gas stream containing the fluorinated compounds is passed through a sorbent made of ⁇ - (gamma) - aluminum oxide.
  • the gas flow and the ⁇ -alumina must be water-free.
  • the fluorine contained in the very inert, ozone-depleting and / or climate-effective fluorinated compound is bound quantitatively to the ⁇ -aluminum oxide sorbent, and that at a rather moderate temperature of e.g. 200 to 400 ° C. If the fluorinated compound is a chlorofluorocarbon, a quantitative binding of the chlorine together with the fluorine to the sorbent can be determined in the same way.
  • ozone-depleting and / or climate-active fluorinated compounds can be adsorbed.
  • fluorinated hydrocarbons which, besides fluorine, are halogenated with other halogen atoms, in particular with chlorine , ie perhalogenated (CFCs) such as partially (CFCs), saturated and unsaturated, fluorochlorohydrocarbons with 1 to 4 carbon atoms per molecule, in particular trichlorofluoromethane, dichlorodifluoromethane, bromochlorodifluoromoromethane, dibromodifluorotrifluoromethane , Tetrafluoromethane, dichlorofluoromethane, chlorodifluoromethane, trifluoromethane (HFC) or partially fluorinated (HFC) saturated or unsaturated hydrocarbons with 1 to 4 carbon atoms in the molecule, but also those fluorinated hydrocarbons which, besides fluorine, are halogenated
  • perfluorinated hydrocarbons are also referred to as “FK” (fluorocarbons), and partially fluorinated as “FKW” (fluorocarbons).
  • the method according to the invention is particularly suitable for removing tetrafluoromethane (CF 4 ) and hexafluoroethane (C 2 F 6 ).
  • the process according to the invention can be used to remove nitrogen fluoride (NF 3 ) and sulfur hexafluoride (SF 6 ).
  • the fluorine in the fluorinated compound is reacted quantitatively with the ⁇ -aluminum oxide sorbent.
  • the reaction takes place with tetrafluoromethane, for example according to the following reaction equation:
  • ie CO 2 is formed as a fission product, but, as can be seen from the table above, has a GWP that is several orders of magnitude lower than the tetrafluoromethane to be removed, so that the CO 2 released in the process according to the invention increases in terms of GWP neglect
  • the content of the fluorinated compounds according to the process of the invention is reduced by at least 99%, in particular 99.9%, when passing through the ⁇ -alumina sorbent, even that of the particularly inert CF 4 .
  • the fluorinated compound can be supplied to the sorbent with a carrier gas.
  • An inert gas such as nitrogen or an inert gas can be used as the carrier gas.
  • the carrier gas can also be another gas, such as air or oxygen.
  • Oxygen is added in particular if an HFC is to be converted with more than one carbon atom per molecule. For example, the conversion of hexafluoroethane takes place according to the following reaction equation:
  • reaction temperature is also significantly reduced by the addition of oxygen or air.
  • the carrier gas should be anhydrous. This means that it can be a technical gas, possibly also ambient air. In any case, care must be taken to ensure that the carrier gas does not absorb any further moisture. If the gas to be cleaned contains traces of water, these are preferably removed with a molecular sieve before the gas is fed to the ⁇ -aluminum sorbent.
  • the gas to be purified preferably contains less than 1000 ppm, in particular less than 100 ppm, of water. In any case, the drier the carrier gas, the greater the proportion of fluorine in the fluorinated compound that is sorbed on the ⁇ -aluminum oxide.
  • the aluminum oxide is kept in a sufficiently dry state by being heated to well above 100 ° C. during sorption.
  • the ⁇ -alumina preferably has a purity of more than 99.0%.
  • a ⁇ -aluminum oxide with a BET surface area of more than 50 m 2 / g, in particular more than 200 m 2 / g and a pore volume of more than 0.2 cmVg is preferably used.
  • the average pore diameter can be, for example, 2-50 nm amount, especially 5 - 15 nm.
  • the aluminum oxide can be used in pure form or in combination with other substances.
  • mixtures of zeolites and aluminum oxide and / or aluminum hydroxide can be used.
  • the proportion of aluminum oxide and / or aluminum hydroxide in the sorbent should, however, be at least 10% by weight, preferably at least 30% by weight.
  • the aluminum oxide or aluminum hydroxide can be doped with metals from groups la, Ha, IVa, Ib, Ilb, IVb, VIb, Vllb and Vlllb.
  • the sorbent can also contain additives from oxides and other compounds of these metals.
  • the sorbent can be a fixed bed or a fluid bed.
  • the sorbent can be heated to a temperature of up to 1000 ° C.
  • the process according to the invention is preferably carried out with a temperature of the sorbent between room temperature and 600 ° C.
  • the temperature of the sorbent depends on the fluorinated compound to be absorbed. For example, tetrafluoromethane is already absorbed at approximately 150 ° C. by the process according to the invention, and hexafluoroethane from approximately 180 ° C. In general, the temperature of the sorbent is between 250 and 450 ° C.
  • the method according to the invention is preferably carried out at atmospheric pressure. However, it can also be carried out with negative pressure or with a pressure of, for example, up to 20 bar.
  • the space velocity can be for example 10 to 1000 h (total flow rate 1 / h / volume of catalyst 1), which corresponds to h a Verwcilzeit 0.1 to 0.001 Vorzugswei ⁇ se the space velocity is between 50 and 500 h "or the residence time is between 0.02 and 0.002 h.
  • the fluorinated compound is preferably supplied with a carrier gas, the concentration of the fluorinated compound in the carrier gas being able to fluctuate greatly, for example between 0.001 to 20 vol.
  • the method according to the invention can be used for the disposal of ozone-depleting and / or climate-effective fluorinated compounds.
  • fluorinated compounds to be disposed of are bound quantitatively and irreversibly by the solid sorbent. This means that there are no ozone-depleting and, apart from a negligibly small amount of carbon dioxide, no climate-effective decomposition or reaction products. Even if the sorbent is saturated, no such decomposition and reaction products are released.
  • the emerging fluorinated compound can be bound with the sorbent, for example with a downstream fixed bed, that is to say, for example, a further container filled with solid sorbent in accordance with DE-41 02 969 Cl.
  • the method according to the invention can be carried out with a reactor of any size which normally only needs to be heatable. It can therefore also be carried out discontinuously and decentrally, for example in the context of municipal waste disposal.
  • Men ⁇ gen be of perfluorinated compounds used, which are also referred to as PFC (Perfluo ⁇ nated Compounds).
  • PFC Perfluo ⁇ nated Compounds.
  • Gehö by ⁇ ren in particular carbon tetrafluoride (CF 4), trifluoromethane (CHF 3), hexafluoroethane (C 2 F 6) and sulfur hexafluoride (SF 6) and nitrogen trifluoride (NF 3).
  • Fluorine is formed from these connections, for example by electrical discharge, with which the semiconductor substrate, for example an silicon wafer, is etched.
  • These perfluorinated compounds are extremely inert. They are therefore generating plants from the exhaust gas cleaning ⁇ that used in the semiconductor industry were ⁇ the not detected and thus released into the atmosphere.
  • the invention is therefore particularly applicable to exhaust gas purification systems in the semiconductor industry.
  • Particularly suitable for cleaning exhaust gases which contain ozone-depleting and / or climate-effective fluorinated compounds is a device which has a sorption device with two chambers, each of which has a fixed, stationary sorbent according to the invention for the ozone-depleting and / or kli ⁇ contain active fluorinated compounds and communicate with one another via a heating device.
  • the two chambers can alternately be connected to the gas supply for the exhaust gas to be cleaned.
  • This device is described in German patent application 195 32 279.7.
  • the sorbent in one of the two chambers is at least partially heated to a temperature necessary for the decomposition of the ozone-depleting and / or climate-active fluorinated compounds, b) the gas to be cleaned is ⁇ direction is switched on the Schuein to this temperature a heated, first chamber is supplied, and purified therein,
  • the cleaned exhaust gas emerging from the second chamber flows after heating in the heating device into the first chamber until its sorbent has at least partially reached the temperature required for the decomposition of the ozone-depleting and / or climate-effective fluorinated compounds,
  • Step (a) is carried out by supplying an inert carrier gas to the second chamber when the heating device is switched on.
  • the fused salt electrolysis is carried out in tubs, serving de ⁇ ren side walls and floor with a cathode as Coal feed is lined, for example a coal-tar mixture.
  • Carbon blocks are used as anodes, which are attached to a supporting framework connected to the positive current of the current source in the molten cryolite, that is to say Na 3 [A1F 6 ] or 3NaF.
  • Hang AIF 3 in which about 15 to 20% by weight of aluminum oxide is dissolved at a bath temperature of about 950 ° C.
  • the fluorohydrocarbon emerging from the cryolith / aluminum oxide melt can be bound with the aluminum oxide and / or aluminum hydroxide sorbent.
  • the melt electrolysis is carried out in a closed trough or similar vessel which is provided with at least one gas outlet opening for the fluorocarbon formed in the melt, which is passed through the aluminum oxide and / or aluminum hydroxide sorbent, which is applied to a for absorption of the Fluorocarbon sufficient temperature is heated.
  • an air or other gas stream can also be passed over the melt pool, for example by connecting a blower to the outlet of the container containing the sorbent, which draws air or another gas over the melt pool.
  • a blower to the outlet of the container containing the sorbent, which draws air or another gas over the melt pool.
  • the aluminum oxide and / or aluminum hydroxide sorbent converted to aluminum fluoride umye with the fluorocarbon can then be added to the cryolite / AJ uminium oxide melt in order to replace cryolite consumed in the electrolysis.
  • the method according to the invention is particularly suitable for cleaning gases which are cryogenically obtained from the air, that is to say by air liquefaction and fractional distillation of the liquefied air.
  • This includes in particular the noble gases, ie helium, neon, argon, krypton and xenon, but also oxygen and nitrogen.
  • these gases can thus be obtained as high-purity gases in which the content of the fluorinated compounds is less than 10 ppm, preferably less than 1 ppm or even less than 0.1 ppm.
  • high-purity gases such as oxygen or Nitrogen
  • the inventive method can, for. B. for the extraction of krypton and xenon in a cryogenic air separation plant are used, krypton and xenon being enriched to a krypton and xenon concentrate, and krypton and / or xenon being obtained from the krypton-xenon concentrate by distillation .
  • the krypton-xenon concentrate or the krypton or the xenon are then cleaned in a solid sorbent made of ⁇ -aluminum oxide, the fluorinated impurities, in particular fluorocarbons, such as CF 4 , and. From the krypton-xenon concentrate or the krypton or xenon / or SF 6 .
  • the per- or partially fluorinated hydrocarbons are sorbed on the ⁇ -alumina sorbent as a gaseous decomposition product C0 2 .
  • the thus formed can C0 2 by a switched nachge ⁇ C0 2 sorbent from the removed gas to be purified, for example by a molecular sieve, a zeolite insbesonde ⁇ re.
  • CO can also be formed, and with SF 6 z. B. S0 2 , which can be removed in the same way.
  • the following examples serve to further explain the invention.
  • a heatable fixed bed microreactor is made with ⁇ -aluminum oxide (purity> 99.6% by weight) with traces of S1O 2 , Na 2 ⁇ and Ti0 2 (total ⁇ 0.4% by weight), a BET surface area of 250 - 255 m 2 / g, a pore volume of 0.70 - 0.90 m 3 / g and an average pore diameter of 8 - 9 nm.
  • Tetrafluoromethane (CF 4 ) with a concentration of 1% by volume in helium is supplied to the microreactor as the carrier gas.
  • the space velocity is 158 h "1 , the total mass flow is 35 sccm (standard cubic centimeters).
  • the temperature of the sorbent is heated from room temperature to 520 ° C.
  • the gas composition is determined using a gas chromatograph with a molecular sieve (MS04) and a Porablot Q-column (PQ08).
  • FIG. 1 shows the absorption of the CF 4 . It can be seen that absorption begins at around 140 ° C and proceeds quantitatively at around 290 ° C.
  • Example 1 is repeated, except that instead of CF 4, hexafluoroethane (C 2 F 6 ) is fed to the microreactor.
  • C 2 F 6 hexafluoroethane
  • the absorption of C 2 F 6 begins at approximately 180 ° C. and is quantitative from 480 ° C.

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Abstract

In order to remove, from a stream of gas, fluorinated compounds which contribute to destruction of the ozone layer and/or changes in climate, the gas stream is passed through a η-aluminium oxide absorber unit. The gas stream and η-aluminium oxide are dry. The fluorine in the fluorinated compound is bound quantitatively to the η-aluminium oxide.

Description

Verfahren zur Entfernung ozonabbauender und/oder klimawirksamer fluorierter Verbindungen aus einem Process for removing ozone-depleting and / or climate-effective fluorinated compounds from a
Gasström sowie Anwendung des VerfahrensGasström and application of the method
Die Erfindung bezieht sich auf ein Verfahren zur Entfernung fluorierter ozonabbauender und/oder klimawirksamer fluorier¬ ter Verbindungen aus einem Gasstrom, welcher durch ein festes erwärmtes Sorbens geleitet wird. Sie hat auch Anwendungen dieses Verfahrens zum Gegenstand.The invention relates to a method for removing fluorinated ozone-depleting and / or climate-effective fluorinated compounds from a gas stream which is passed through a solid, heated sorbent. It also relates to applications of this method.
Fluorkohlenwasserstoffe, und zwar sowohl perfluorierte (FKW) wie teilfluorierte (H-FKW) und Fluorchlorkohlenwasserstoffe (FCKW und H-FCKW) werden seit Jahrzehnten als Treibmittel, Kältemittel, Bläh- und Trennmittel, Lose- und Reinigungsmit¬ tel und anderes mehr m großem Umfang eingesetzt.Hydrofluorocarbons, both perfluorinated (HFC) and partially fluorinated (HFC) and chlorofluorocarbons (CFC and HCFC) have been used for decades as blowing agents, refrigerants, blowing and separating agents, detergents and cleaning agents and other more on a large scale used.
Sie weisen jedoch ein hohes ODP (Ozone Depletion Potential), also ozonabbauendes Potential auf und werden deshalb maßgeb¬ lich für den Abbau der Ozonschicht in der Atmosphäre verant¬ wortlich gemacht. Durch ihr Infrarot-Absorptionsspektrum und die z. T. extrem lange atmosphärische Lebensdauer besitzen sie ferner ein hohes GWP (Greenhouse Warming Potential), d.h. sie haben am Treibhauseffekt einen wesentlichen Anteil. Dazu ist auf folgende Tabelle hinzuweisen: Atmosphärische Lebensdauer und Treibhauspotential (GWP) von FKWs und H-FKWs und anderen GasenHowever, they have a high ODP (ozone depletion potential), that is to say ozone-depleting potential, and are therefore largely responsible for the degradation of the ozone layer in the atmosphere. Due to their infrared absorption spectrum and the z. T. extremely long atmospheric life they also have a high GWP (Greenhouse Warming Potential), ie they have a significant share in the greenhouse effect. Please refer to the following table: Atmospheric service life and global warming potential (GWP) of HFCs and HFCs and other gases
Subs tan z Lebensdauer GWPSubstance Life time GWP
( J ahre ) Integr ert über 100 Jahre)(Years) Integr er over 100 years)
C02 ( Re l erenz ) 100 1C0 2 (reference) 100 1
C F4 50000 6300CF 4 50000 6300
C2FC 10000 12500C 2 F C 10000 12500
S F6 3200 24900SF 6 3200 24900
NF3 180 9720NF 3 180 9720
CHF3 250 12100CHF 3 250 12100
CH2F2 6 485CH 2 F 2 6 485
C2HF5 36 2740C 2 HF 5 36 2740
C2H2F4 18 1330C2H2F4 18 1330
(vgl. Michael T. Mocella, DuPont Fluoroproducts „Long-Lived and Greenhouse Gases in the Semiconductor Industry: A Review of Science, Policy, and Technology" Journal of the Semicon¬ ductor Safety Association, Band 8, Nr. 4, Seite 13, Dezember 1994 sowie "Radiative Forcing of Climate Change", veröffent¬ licht in Climate Change - The IPCC Scientific Assessment, Herausgeber J.T. Houghton, G.J. Jenkins, and J.J. Ephraums, Cambridge University Press, Cambridge, November 1994.)(see Michael T. Mocella, DuPont Fluoroproducts "Long-Lived and Greenhouse Gases in the Semiconductor Industry: A Review of Science, Policy, and Technology" Journal of the Semiconductor Product Safety Association, Volume 8, No. 4, page 13 , December 1994 and "Radiative Forcing of Climate Change", published in Climate Change - The IPCC Scientific Assessment, published by JT Houghton, GJ Jenkins, and JJ Ephraums, Cambridge University Press, Cambridge, November 1994.)
Aus DE 44 04 329 Cl ist bereits ein Verfahren nach dem Ober¬ begriff des Anspruchs 1 bekannt. Dabei wird als Sorbens ein Phyllosil ikat verwendet, das Eisenoxid enthält. Das bekannte Verfahren hat sich zwar im Großen und Ganzen bewahrt. Jedoch muß das Sorben auf eine relativ hohe Temperatur erwärmt wer¬ den, beispielsweise zur Sorption von CF4 bis auf 350° C. Auch läßt die Sorptionskapazitat des Sorbens noch zu wünschen üb¬ rig. Aus EP 0 412 456 A2 ist es bekannt, Fluorkohlenwasserstoffe mit Wd'jserdampf bei 350 bis 1000°C an einem Aluminiurnoxid- Katalysator zu Chlorwasserstoff, Fluorwasserstoff, Kohlendi¬ oxid und Kohlenmonoxid sowie weiteren Verbindungen, wie Tnf- luoressigsaurechJ orid, zu zersetzen. Die Entfernung und Ent¬ sorgung dieser zum Teil sehr aggressiven und toxischen Zer¬ setzungsprodukte ist jedoch mit einem erheblichen Aufwand verounden.A method according to the preamble of claim 1 is already known from DE 44 04 329 C1. A phyllosilicate containing iron oxide is used as the sorbent. The known method has largely been retained. However, the sorbent must be heated to a relatively high temperature, for example for the sorption of CF4 up to 350 ° C. The sorption capacity of the sorbent also leaves something to be desired. It is known from EP 0 412 456 A2 to decompose fluorocarbons with steam at 350 to 1000 ° C. over an aluminum oxide catalyst to give hydrogen chloride, hydrogen fluoride, carbon dioxide and carbon monoxide and other compounds such as chlorofluorosacetic acid. However, the removal and disposal of these, in some cases, very aggressive and toxic decomposition products requires considerable effort.
Aufgabe der Erfindung ist es, fluorierte Vorbindungen mit ge¬ ringem Aufwand aus einem Gasstrom zu entfernen.The object of the invention is to remove fluorinated prebonds from a gas stream with little effort.
Dies wird erfindungsgemaß mit dem im Anspruch 1 gekennzeich¬ neten Verfahren erreicht. In den Ansprüchen 2 bis 5 sind vor¬ teilhafte Ausgestaltungen des erfindungsgemaßen Verfahrens wiedergegeben. Die Ansprüche 6 bis 14 haben bevorzugte Anwen¬ dungen des erfindungsgemaßen Verfahrens zum Gegenstand.This is achieved according to the invention with the method characterized in claim 1. Advantageous embodiments of the method according to the invention are given in claims 2 to 5. Claims 6 to 14 relate to preferred applications of the method according to the invention.
Nach der Erfindung wird der Gasstrom, der die fluorierten Verbindungen enthalt, durch ein Sorbens aus γ-(gamma)- Aluminiumoxid geleitet. Der Gasstrom und das γ-Aluminiumoxid müssen dabei wasserfrei sein. Überraschenderweise wird damit das in der sehr inerten, ozonabbauenden und/oder klimawirksa- men fluorierten Verbindung enthaltene Fluor quantitativ an dem γ-Aluminiumoxid-Sorbens gebunden, und zwar bei einer eher moderaten Temperatur von z.B. 200 bis 400°C. Falls es sich bei der fluorierten Verbindung um einen Fluorchlorkohlenwas- serstoff handelt, ist in gleicher Weise eine quantitative Bindung des Chlors zusammen mit dem Fluor an dem Sorbens festzustellen.According to the invention, the gas stream containing the fluorinated compounds is passed through a sorbent made of γ- (gamma) - aluminum oxide. The gas flow and the γ-alumina must be water-free. Surprisingly, the fluorine contained in the very inert, ozone-depleting and / or climate-effective fluorinated compound is bound quantitatively to the γ-aluminum oxide sorbent, and that at a rather moderate temperature of e.g. 200 to 400 ° C. If the fluorinated compound is a chlorofluorocarbon, a quantitative binding of the chlorine together with the fluorine to the sorbent can be determined in the same way.
Nach dem erfindungsgemaßen Verfahren können damit im wesent¬ lichen alle ozonabbauenden und/oder klimawirksamen fluorier¬ ten Verbindungen adsorbiert werden. Dazu gehören insbesondere perfluorierte (FKW) oder teilflu- orierte (H-FKW) gesattigte oder unge ättigte Kohlenwasser¬ stoffe mit 1 bis 4 Kohlenstoffatomen im Molekül, aber auch solche fluorierten Kohlenwasserstofle, die außer mit Fluor mit anderen Halogenatomen, insbesondere mit Chlor halogeniert sind, also perhalogemerte (FCKW) wie teilha 1 ogemerte (H-FCKW) , gesattigte wie ungesättigte tluorchlorkohlenwasser- stoffe mit 1 bis 4 KohJ c nstoffatomen pro Molekül, insbesonde¬ re Trichlorfluormethan, Dichlordifluormethan, Bromchlordiflu- ormethan, Dibromdifluormethan, Chlortrifluormethan, Bromtrif- luormethan, Tetrafluormethan, Dichlorfluormethan, Chlordiflu- ormethan, Trifluormethan (Fluoroform) , Difluormethan (Methylenfluorid) , 1, 1, 2,2-Tetrachlordιfluorethan, 1,1,2- Trichlortπfluorethan, 1, 2-Dιchlortetrafluorethan, 1,2- Dibromtetrafluorethan, Chlorpentafluorethan, Hexafluorethan, 1, 2-Dιbrom-l, 1-dιfluorethan, 2-Chlor-l, 1, 1-trιfluorethan, 2- Chlor-1, 1, 1-trιfluorethan, 1-Chlor-l, 1-dιfluorethan, 1,1,1- Trifluorethan, 1, 1-Dιfluorethan, Octafluorpropan, Octaflu- orcyclobutan, Decafluorbutan, 1, 1-Dιchlordιfluorethylen, Chlortπfluorethylen (Trifluorvinylchlorid) , l-Chlor-2,2- difluorethylen, 1, 1-Dιfluorethylen (Vmylidenfluorid) .According to the method of the invention, essentially all ozone-depleting and / or climate-active fluorinated compounds can be adsorbed. These include, in particular, perfluorinated (HFC) or partially fluorinated (HFC) saturated or unsaturated hydrocarbons with 1 to 4 carbon atoms in the molecule, but also those fluorinated hydrocarbons which, besides fluorine, are halogenated with other halogen atoms, in particular with chlorine , ie perhalogenated (CFCs) such as partially (CFCs), saturated and unsaturated, fluorochlorohydrocarbons with 1 to 4 carbon atoms per molecule, in particular trichlorofluoromethane, dichlorodifluoromethane, bromochlorodifluoromoromethane, dibromodifluorotrifluoromethane , Tetrafluoromethane, dichlorofluoromethane, chlorodifluoromethane, trifluoromethane (fluoroform), difluoromethane (methylene fluoride), 1, 1, 2,2-tetrachlorodifluoroethane, 1,1,2-trichlorotπfluoroethane, 1, 2-dichlorotetrafluoromethane, 1,2- , Hexafluoroethane, 1, 2-dιbromo-l, 1-difluoroethane, 2-chloro-l, 1, 1-trifluoroethane, 2-chloro-1, 1, 1-trιfluo rethane, 1-chloro-l, 1-difluoroethane, 1,1,1-trifluoroethane, 1, 1-difluoroethane, octafluoropropane, octafluorocyclobutane, decafluorobutane, 1, 1-dichlorodifluoroethylene, chlorotπfluoroethylene (trifluorovinyl chloride), l-chloro , 2-difluoroethylene, 1, 1-difluoroethylene (Vmylidenfluorid).
In diesem Zusammenhang sei erwähnt, dass perfluorierte Koh¬ lenwasserstoffe auch als "FK" (Fluorkohlenstoffe) bezeichnet werden, und teilfluorierte als "FKW" (Fluorkohlenwasserstoffe) .In this context it should be mentioned that perfluorinated hydrocarbons are also referred to as "FK" (fluorocarbons), and partially fluorinated as "FKW" (fluorocarbons).
Wegen ihrer hohen Reaktionstragheit, die sich m ihrer atmo¬ sphärischen Lebensdauer niederschlagt, ist das erfmdungsge¬ maße Verfahren insbesondere zur Entfernung von Tetrafluor¬ methan (CF4) und Hexafluorethan (C2F6) geeignet. Zudem ist das erfa ndungsgemaße Verfahren zur Beseitigung von Stickstofft-πfluorid (NF3) und Schwofelhexafluorid (SF6) an¬ wendbar .Because of its high inertia, which is reflected in its atmospheric life, the method according to the invention is particularly suitable for removing tetrafluoromethane (CF 4 ) and hexafluoroethane (C 2 F 6 ). In addition, the process according to the invention can be used to remove nitrogen fluoride (NF 3 ) and sulfur hexafluoride (SF 6 ).
Bei dem erfindungsgemaßen Verfahren wird das Fluor in dei fluorierten Verbindung mit dem γ-Aluminiumoxid-Sorbens quan¬ titativ umgesetzt. Die Umsetzung erfolgt dabei mit Tetraflu¬ ormethan beispielsweise nach folgender Reaktionsgleichung:In the process according to the invention, the fluorine in the fluorinated compound is reacted quantitatively with the γ-aluminum oxide sorbent. The reaction takes place with tetrafluoromethane, for example according to the following reaction equation:
3 CF4 + 2 A1203 4 A1F3 t 3 C02 3 CF 4 + 2 A1 2 0 3 4 A1F 3 t 3 C0 2
d.h. es entsteht zwar CO2 als Spaltprodukt, das jedoch, wie der vorstehenden Tabelle zu entnehmen, ein um mehrere Größen¬ ordnungen geringeres GWP besitzt als das zu beseitigende Tetrafluormethan, so daß das bei dem erfindungsgemäßen Ver¬ fahren freigesetzte C02 hinsichtlich des GWP zu vernachlässi¬ie CO 2 is formed as a fission product, but, as can be seen from the table above, has a GWP that is several orders of magnitude lower than the tetrafluoromethane to be removed, so that the CO 2 released in the process according to the invention increases in terms of GWP neglect
In gleicher Weise wird bei der Entfernung von Stickstofftri- fluoπd und Schwefelhexafluorid nach dem erfindungsgemaßen Verfahren das Fluor am Sorbens quantitativ und irreversibel gebunden.In the same way, the removal of nitrogen trifluoride and sulfur hexafluoride by the process of the invention binds the fluorine to the sorbent quantitatively and irreversibly.
Wie Versuche gezeigt haben, wird der Gehalt der fluorierten Verbindungen nach dem erfindungsgemaßen Verfahren beim Durch¬ tritt durch das γ-Aluminiumoxid-Sorbens um mindestens 99%, insbesondere 99,9% reduziert, und zwar selbst der des beson¬ ders reaktionstragen CF4.As experiments have shown, the content of the fluorinated compounds according to the process of the invention is reduced by at least 99%, in particular 99.9%, when passing through the γ-alumina sorbent, even that of the particularly inert CF 4 .
Die fluorierte Verbindung kann mit einem Tragergas dem Sor¬ bens zugeführt werden. Als Tragergas kann ein Inertgas, wie Stickstoff oder ein Edelgas, eingesetzt werden. Das Tragergas kann jedoch auch em anderes Gas, wie Luft oder auch Sauerstoff sein. Insbesondere wenn ein FKW mit mehr als einem Kohlenstoffatom pro Molekül umgesetzt werden soll, wird Sauerstoff zugeführt. Beispielsweise erfolgt die Umsetzung von Hexafluorethan nach folgender Reaktionsgleichung:The fluorinated compound can be supplied to the sorbent with a carrier gas. An inert gas such as nitrogen or an inert gas can be used as the carrier gas. However, the carrier gas can also be another gas, such as air or oxygen. Oxygen is added in particular if an HFC is to be converted with more than one carbon atom per molecule. For example, the conversion of hexafluoroethane takes place according to the following reaction equation:
2 C?F6 + 2 A1203 + 02 → 4 A1F3 + 4 C02 2 C ? F 6 + 2 A1 2 0 3 + 0 2 → 4 A1F 3 + 4 C0 2
Um eine quantitative Umwandlung in CO2 zu erreichen und die Produktion von CO zu unterdrucken, werden 2 bis 20 Mol Sauer¬ stoff je C-Atom im Molekül eingesetzt. Durch den Zusatz von Sauerstoff bzw. Luft wird zugleich die Reaktionstemperatur wesentlich herabgesetzt.In order to achieve a quantitative conversion into CO 2 and to suppress the production of CO, 2 to 20 moles of oxygen are used per C atom in the molecule. The reaction temperature is also significantly reduced by the addition of oxygen or air.
Das Trägergas soll dabei wasserfrei sein. Das heißt, es kann ein technisches Gas sein, gegebenenfalls auch Umgebungsluft. Jedenfalls muß dafür Sorge getragen werden, dass das Träger¬ gas keine weitere Feuchtigkeit aufnimmt. Falls das zu reini¬ gende Gas Wasserspuren enthält, werden diese vorzugsweise mit einem Molekularsieb entfernt, bevor das Gas dem γ- Aluminiumsorbens zugeführt wird. Vorzugsweise enthält das zu reinigende Gas weniger als 1000 ppm, insbesondere weniger als 100 ppm Wasser. Jedenfalls ist der Anteil des Fluors der flu¬ orierten Verbindung, der an dem γ-Aluminiumoxid sorbiert wird, um so großer, je trockener das Trägergas ist. Das Alu¬ miniumoxid wird durch seine Erwärmung auf deutlich über 100°C während der Sorption auf einem hinreichend trockenen Zustand gehalten.The carrier gas should be anhydrous. This means that it can be a technical gas, possibly also ambient air. In any case, care must be taken to ensure that the carrier gas does not absorb any further moisture. If the gas to be cleaned contains traces of water, these are preferably removed with a molecular sieve before the gas is fed to the γ-aluminum sorbent. The gas to be purified preferably contains less than 1000 ppm, in particular less than 100 ppm, of water. In any case, the drier the carrier gas, the greater the proportion of fluorine in the fluorinated compound that is sorbed on the γ-aluminum oxide. The aluminum oxide is kept in a sufficiently dry state by being heated to well above 100 ° C. during sorption.
Das γ-Aluminiumoxid besitzt vorzugsweise eine Reinheit von mehr als 99,0 %. Vorzugsweise wird ein γ-Aluminiumoxid mit einer BET-Oberflache von mehr als 50 m2/g, insbesondere mehr als 200 m2/g und einem Porenvolumen von mehr als 0,2 cmVg verwendet. Der mittlere Porendurchmesser kann z.B. 2 - 50 nm betragen, insbesondere 5 - 15 nm. Eine große spezifischeThe γ-alumina preferably has a purity of more than 99.0%. A γ-aluminum oxide with a BET surface area of more than 50 m 2 / g, in particular more than 200 m 2 / g and a pore volume of more than 0.2 cmVg is preferably used. The average pore diameter can be, for example, 2-50 nm amount, especially 5 - 15 nm. A large specific
Oberfläche des γ-Aluminiumoxids ist erforderlich, weil dasSurface of the γ-alumina is required because that
Fluor der fluorierten Verbindung in erster Linie an der Ober¬ fläche des γ-Aluminiumoxids als Aluminiumfluorid gebunden wird.Is bound fluorine of the fluorinated compound in the first place on the upper surface of the ¬ γ-alumina as the aluminum fluoride.
Das Aluminiumoxid kann in reiner Form oder in Kombination mit anderen Substanzen eingesetzt werden. Beispielsweise können Mischungen von Zeolithen und Alumi-niumoxid und/oder Alumini¬ umhydroxid eingesetzt werden. Der Anteil des Aluminiumoxids und/oder Aluminiumhydroxids in dem Sorbens sollte jedoch we¬ nigstens 10 Gew.-%, vorzugsweise wenigstens 30 Gew.-% betra¬ gen.The aluminum oxide can be used in pure form or in combination with other substances. For example, mixtures of zeolites and aluminum oxide and / or aluminum hydroxide can be used. The proportion of aluminum oxide and / or aluminum hydroxide in the sorbent should, however, be at least 10% by weight, preferably at least 30% by weight.
Das Aluminiumoxid bzw. Aluminiumhydroxid kann mit Metallen der Gruppe la, Ha, IVa, lb, Ilb, IVb, VIb, Vllb und Vlllb dotiert sein. Auch kann das Sorbens Zuschläge aus Oxiden und anderen Verbindungen dieser Metalle enthalten.The aluminum oxide or aluminum hydroxide can be doped with metals from groups la, Ha, IVa, Ib, Ilb, IVb, VIb, Vllb and Vlllb. The sorbent can also contain additives from oxides and other compounds of these metals.
Das Sorbens kann ein Festbett oder ein Fließbett sein. Das Sorbens kann auf eine Temperatur bis 1000°C erwärmt werden. Vorzugsweise wird das erfindungsgemäße Verfahren jedoch mit einer Temperatur des Sorbens zwischen Raumtemperatur und 600°C durchgeführt. Die Temperatur des Sorbens hängt dabei von der zu absorbierenden fluorierten Verbindung ab. So wird beispielsweise Tetrafluormethan bereits bei etwa 150°C nach dem erfindungsgemäßen Verfahren absorbiert, und Hexafluor- ethan ab etwa 180° C. Im allgemeinen liegt die Temperatur des Sorbens zwischen 250 und 450°C.The sorbent can be a fixed bed or a fluid bed. The sorbent can be heated to a temperature of up to 1000 ° C. However, the process according to the invention is preferably carried out with a temperature of the sorbent between room temperature and 600 ° C. The temperature of the sorbent depends on the fluorinated compound to be absorbed. For example, tetrafluoromethane is already absorbed at approximately 150 ° C. by the process according to the invention, and hexafluoroethane from approximately 180 ° C. In general, the temperature of the sorbent is between 250 and 450 ° C.
Das erfindungsgemäße Verfahren wird vorzugsweise bei Atmo¬ sphärendruck durchgeführt. Es kann jedoch auch mit Unterdruck oder mit einem Druck von beispielsweise bis zu 20 bar durch¬ geführt werden. Die Raumgeschwindigkeit kann beispielsweise 10 bis 1000 h (Gesamtvolumenstrom 1/h/Katalysatorvolumen 1) betragen, was einer Verwcilzeit von 0,1 bis 0,001 h entspricht Vorzugswei¬ se liegt die Raumgeschwindigkeit zwischen 50 und 500 h" bzw. die Verweilzeit zwischen 0,02 und 0,002 h. Dabei wird, wie erwähnt, die fluorierte Verbindung vorzugsweise mit einem Tragergas zugeführt, wobei die Konzentration der fluorierten Verbindung in dem Tragergas stark schwanken kann, beispiels¬ weise zwischen 0,001 bis 20 Vol.- .The method according to the invention is preferably carried out at atmospheric pressure. However, it can also be carried out with negative pressure or with a pressure of, for example, up to 20 bar. The space velocity can be for example 10 to 1000 h (total flow rate 1 / h / volume of catalyst 1), which corresponds to h a Verwcilzeit 0.1 to 0.001 Vorzugswei ¬ se the space velocity is between 50 and 500 h "or the residence time is between 0.02 and 0.002 h. As mentioned, the fluorinated compound is preferably supplied with a carrier gas, the concentration of the fluorinated compound in the carrier gas being able to fluctuate greatly, for example between 0.001 to 20 vol.
Das erfmdungsgemaße Verfahren kann zur Entsorgung von ozonabbauenden und/klimawirksamen fluorierten Verbindungen verwendet werden. Nach Schätzungen sind gegenwartig weltweit mehr als 2 Millionen Tonnen fluorierter Kohlenwasserstoffe in Isolierschaumen, Kälteanlagen und in Form gebunkerter Vorrate im Umlauf. Bei dem erfindungsgemaßen Verfahren werden die zu entsorgenden fluorierten Verbindungen quantitativ und irre¬ versibel von dem festen Sorbens gebunden. Das heißt es ent¬ stehen keine ozonabbauenden und, abgesehen von einer vernach- lassigbar geringen Mengen Kohlendioxid, auch keine klimawirk- samen Zersetzungs- oder Reaktionsprodukte. Auch wenn das Sor¬ bens gesattigt ist, werden keine derartigen Zersetzungs- und Reaktionsprodukte abgegeben. Bei Sättigung des Sorbens kann die austretende fluorierte Verbindung beispielsweise mit ei¬ nem nachgeschalteten Festbett mit dem Sorbens gebunden wer¬ den, also beispielsweise einem weiteren, mit festen Sorbens gefüllten Behalter entsprechend der DE-41 02 969 Cl .The method according to the invention can be used for the disposal of ozone-depleting and / or climate-effective fluorinated compounds. According to estimates, there are currently more than 2 million tons of fluorinated hydrocarbons in circulation in insulating foams, refrigeration systems and in the form of bunkered stocks. In the process according to the invention, the fluorinated compounds to be disposed of are bound quantitatively and irreversibly by the solid sorbent. This means that there are no ozone-depleting and, apart from a negligibly small amount of carbon dioxide, no climate-effective decomposition or reaction products. Even if the sorbent is saturated, no such decomposition and reaction products are released. When the sorbent is saturated, the emerging fluorinated compound can be bound with the sorbent, for example with a downstream fixed bed, that is to say, for example, a further container filled with solid sorbent in accordance with DE-41 02 969 Cl.
Das erfmdungsgemaße Verfahren kann mit einem Reaktor belie¬ biger Große durchgeführt werden, der normalerweise lediglich beheizbar zu sein braucht. Es ist damit ohne weiteres auch diskontinuierlich und dezentral durchfuhrbar, z.B. im Rahmen der kommunalen Abfallbeseitigung. In der Halbleiterindustrie werden zum Trockenatzen große Men¬ gen von perfluorierten Verbindungen verwendet, die auch als PFC (Perfluoπnated Compounds) bezeichnet werden. Dazu gehö¬ ren insbesondere Tetrafluorkohlenstoff (CF4), Trifluormethan (CHF3) , Hexafluorethan (C2F6) sowie Schwefelhexafluorid (SF6) und Stickstofftrifluorid (NF3) . Aus diesen Verbindungen wird beispielsweise durch elektrische Entladung Fluor gebildet , mit dem das Halbleitersubstrat, beispielsweise em -Silizium- Wafer, geazt wird. Diese perfluorierten Verbindungen sind ex¬ trem reaktionstrage. Sie werden daher von den Abgasreini¬ gungsanlagen, die in der Halbleiterindustrie verwendet wer¬ den, nicht erfaßt und damit an die Atmosphäre abgegeben. Die Erfindung ist daher insbesondere auch für Abgasreinigungsan¬ lagen in der Halbleiterindustrie anwendbar.The method according to the invention can be carried out with a reactor of any size which normally only needs to be heatable. It can therefore also be carried out discontinuously and decentrally, for example in the context of municipal waste disposal. In the semiconductor industry for dry etching large Men ¬ gen be of perfluorinated compounds used, which are also referred to as PFC (Perfluoπnated Compounds). Gehö by ¬ ren in particular carbon tetrafluoride (CF 4), trifluoromethane (CHF 3), hexafluoroethane (C 2 F 6) and sulfur hexafluoride (SF 6) and nitrogen trifluoride (NF 3). Fluorine is formed from these connections, for example by electrical discharge, with which the semiconductor substrate, for example an silicon wafer, is etched. These perfluorinated compounds are extremely inert. They are therefore generating plants from the exhaust gas cleaning ¬ that used in the semiconductor industry wer¬ the not detected and thus released into the atmosphere. The invention is therefore particularly applicable to exhaust gas purification systems in the semiconductor industry.
Besonders geeignet zur Reinigung von Abgasen, die ozonabbau¬ ende und/oder klimawirksame fluorierte Verbindungen enthal¬ ten, ist eine Vorrichtung, die eine Sorptionseinrichtung mit zwei Kammern aufweist, die jeweils ein festes stationäres er¬ findungsgemäßes Sorbens für die ozonabbauenden und/oder kli¬ mawirksamen fluorierten Verbindungen enthalten und über eine Heizeinrichtung miteinander kommunizieren. Die beiden Kammern sind zur Umkehrung der Stromungsrichtung des zu reinigenden Abgases abwechselnd mit der Gaszufuhr für das zu reinigende Abgas verbindbar. Diese Vorrichtung wird in der deutschen Pa¬ tentanmeldung 195 32 279.7 beschrieben.Particularly suitable for cleaning exhaust gases which contain ozone-depleting and / or climate-effective fluorinated compounds is a device which has a sorption device with two chambers, each of which has a fixed, stationary sorbent according to the invention for the ozone-depleting and / or kli¬ contain active fluorinated compounds and communicate with one another via a heating device. To reverse the direction of flow of the exhaust gas to be cleaned, the two chambers can alternately be connected to the gas supply for the exhaust gas to be cleaned. This device is described in German patent application 195 32 279.7.
Dabei werden folgende Schritte durchgeführt:The following steps are carried out:
a) das Sorbens in einer der beiden Kammern wird zumindest teilweise auf eine zur Zersetzung der ozonabbauenden und/oder klimawirksamen fluorierten Verbindungen erfor¬ derliche Temperatur erwärmt, b) das zu reinigende Abgas wird bei eingeschalteter Heizein¬ richtung der auf diese Temperatur erwärmten einen, ersten Kammer zugeführt, und darin gereinigt,a) the sorbent in one of the two chambers is at least partially heated to a temperature necessary for the decomposition of the ozone-depleting and / or climate-active fluorinated compounds, b) the gas to be cleaned is ¬ direction is switched on the Heizein to this temperature a heated, first chamber is supplied, and purified therein,
c) das aus der ersten Kammer austretende gereinigte Abgas strömt nach Erwärmung in der Heizeinrichtung in die zwei¬ te Kammer, bis dessen Sorbens zumindest teilweise die für die Zersetzung der ozonabbauenden und/oder klimawirksamen fluorierten Verbindungen erforderliche Temperatur er¬ reicht hat,c) the cleaned exhaust gas emerging from the first chamber flows after heating in the heating device into the second chamber until its sorbent has at least partially reached the temperature required for the decomposition of the ozone-depleting and / or climate-effective fluorinated compounds,
d) das zu reinigende Abgas wird der zweiten Kammer zugeführt und dann gereinigt,d) the exhaust gas to be cleaned is fed to the second chamber and then cleaned,
e) das aus der zweiten Kammer austretende gereinigte Abgas strömt nach Erwärmung in der Heizeinrichtung in die erste Kammer, bis dessen Sorbens zumindest teilweise die für die Zersetzung der ozonabbauenden und/oder klimawirksamen fluorierten Verbindungen erforderliche Temperatur er¬ reicht hat,e) the cleaned exhaust gas emerging from the second chamber flows after heating in the heating device into the first chamber until its sorbent has at least partially reached the temperature required for the decomposition of the ozone-depleting and / or climate-effective fluorinated compounds,
f) die Schritte (b) bis (e) werden wiederholt.f) steps (b) to (e) are repeated.
Der Schritt (a) wird durchgeführt, indem bei eingeschalteter Heizeinrichtung der zweiten Kammer ein inertes Tragergas zu¬ geführt wird.Step (a) is carried out by supplying an inert carrier gas to the second chamber when the heating device is switched on.
Eine weitere wichtige Anwendung des erfindungsgemaßen Verfah¬ rens stellt die Entfernung von perfluorierten Kohlenwasser¬ stoffen dar, die bei der Aluminiumherstellung durch Elektro- lyte von Aluminiumoxid in geschmolzenem Kryolith mit kohlen¬ stoffhaltigen Elektroden gebildet werden.Another important application of the inventive procedural ¬ proceedings, the removal of perfluorinated Kohlenwasser¬ represent materials that are in aluminum production by electro lyte of alumina in molten cryolite formed kohlen¬-containing electrodes.
Die Schmelzelektrolyse wird dabei in Wannen durchgeführt, de¬ ren Seitenwande und Boden mit einem als Kathode dienenden Kohlefutter ausgekleidet sind, beispielsweise eine Kohle- Teer-Mischung . Als Anoden werden Kohleblocke verwendet, die an einem mit dem positivem Strom der St romquelle verbundenen Traggerust in den geschmolzenen Kryolith, also Na3 [A1F6] oder 3NaF . AIF3 hangen, in dem etwa 15 bis 20 Gew.-% Aluminium- oxid bei einer Badtemperatur von ungefähr 950°C gelost sind.The fused salt electrolysis is carried out in tubs, serving de ¬ ren side walls and floor with a cathode as Coal feed is lined, for example a coal-tar mixture. Carbon blocks are used as anodes, which are attached to a supporting framework connected to the positive current of the current source in the molten cryolite, that is to say Na 3 [A1F 6 ] or 3NaF. Hang AIF 3 in which about 15 to 20% by weight of aluminum oxide is dissolved at a bath temperature of about 950 ° C.
Bei dieser Schmelzelektrol yse setzt sich em Teil des Kryo¬ lith mit den kohlenstoffnaltigen Elektroden um. Dies fuhrt einerseits zu einem Kryolithverbrauch in der Schmelze und zum anderen zur Bildung von Fluorkohlenwasserstoffen, insbesonde¬ re zur Bildung von Tetrafluormethan und Hexafluorethan. Dem¬ gemäß ist die Aluminiumherstellung durch Elektrolyse von Alu- miniumoxid m geschmolzenem Kryolith mit kohlenstoffhaltigen Elektroden für über 90 % der weltweiten Tetrafluormethan- Emission verantwortlich.In this melting electrolysis, part of the cryolith is reacted with the carbon-containing electrodes. This leads on the one hand to a cryolite consumption in the melt and on the other hand to the formation of fluorocarbons, in particular to the formation of tetrafluoromethane and hexafluoroethane. Accordingly, aluminum production by electrolysis of aluminum oxide in molten cryolite with carbon-containing electrodes is responsible for over 90% of the worldwide tetrafluoromethane emission.
Nach dem erfindungsgemäßen Verfahren kann der aus der Kryo- lith/Aluminumoxidschmelze austretende Fluorkohlenwasserstoff mit dem Aluminumoxid- und/oder Aluminiumhydroxid-Sorbens ge¬ bunden werden.In the process according to the invention, the fluorohydrocarbon emerging from the cryolith / aluminum oxide melt can be bound with the aluminum oxide and / or aluminum hydroxide sorbent.
Dazu wird die Schmelzelektrolyse in einer geschlossenen Wanne oder dergleichen Gefäß durchgeführt, welches mit wenigstens einer Gasaustrittsoffnung für den in der Schmelze gebildeten Fluorkohlenwasserstoff versehen ist, welcher durch das Alumi¬ numoxid- und/oder Alummiumhydroxid-Sorbens geleitet wird, das auf eine zur Absorption des Fluorkohlenstoffs ausreichen¬ de Temperatur erwärmt wird.For this purpose, the melt electrolysis is carried out in a closed trough or similar vessel which is provided with at least one gas outlet opening for the fluorocarbon formed in the melt, which is passed through the aluminum oxide and / or aluminum hydroxide sorbent, which is applied to a for absorption of the Fluorocarbon sufficient temperature is heated.
Gegebenenfalls kann auch ein Luft- oder anderer Gas-Strom über das Schmelzbad geleitet werden, indem beispielsweise an dem Auslaß des Behalters, der das Sorbens enthalt, ein Gebla¬ se angeschlossen wird, welches Luft bzw. ein annderes Gas über das Schmelzbad saugt. Auf diese Weise wird nicht nur verhindert, dass die bei dei Aluminiumherstellung gebildeten FI uorkohlenwa^sαrstoffe in die Atmosphäre gelangen, sondern zugleich aus dem Aluminium¬ oxid bzw. Aluminiumhydroxid Aluminiumfluorid, also AlF3, ge¬ bildet, also der Bestandteil des Kryolith, der bei der Schmelzelektrolyse verbraucht wird.If necessary, an air or other gas stream can also be passed over the melt pool, for example by connecting a blower to the outlet of the container containing the sorbent, which draws air or another gas over the melt pool. In this way, not only prevents the FI formed in dei aluminum production uorkohlenwa ^ sαrstoffe released into the atmosphere, but also from the aluminum ¬ oxide or aluminum hydroxide, aluminum fluoride, so AlF 3, forms ge, ie the part of the cryolite, the is consumed in the melt electrolysis.
Das mit dem Fluorkohlenwasserstolf zu Aluminiumfluorid umye setzte Aluminiumoxid- und/oder Alummiumhydroxid-Sorbens kann dann der Kryolith/AJ uminiumoxid-Schmelze zugegeben werden, um bei der Elektrolyse verbrauchten Kryolith zu ersetzen.The aluminum oxide and / or aluminum hydroxide sorbent converted to aluminum fluoride umye with the fluorocarbon can then be added to the cryolite / AJ uminium oxide melt in order to replace cryolite consumed in the electrolysis.
Bei Gasen, die kryotechnisch, also durch Luftverflüssigung und anschließende fraktionierte Destillation der verflüs¬ sigten Luft gewonnen werden, sammeln sich diese Spurenver¬ unreinigungen in dem jeweiligen Gas mehr oder weniger stark an. Besonders hohe Verunreinigungen an diesen fluorierten Verbindungen treten naturgemäß in solchen kryotechnisch ge¬ wonnenen Gasen auf, die einerseits in der Luft nur in sehr geringer Menge vorkommen und damit entsprechend angerei¬ chert werden müssen und die andererseits durch fraktionier¬ te Destillation nicht oder nur schwer von solchen fluorier¬ ten Verbindungen getrennt werden können, die in der Luft in besonders hoher Konzentration enthalten sind. Dies gilt insbesondere für Edelgase, und zwar vor allem für Krypton und Xenon, die in der Luft nur in einer Menge von ca. I x 10"4 bzw. 8 x 10"6 Vol . % vorkommen und sich andererseits beispielsweise von CF4 und SF6, die in der Luft in einer nicht unerheblichen Menge enthalten sind, durch fraktio¬ nierte Destillation nur schwer abtrennen lassen.In the case of gases which are obtained cryotechnically, ie by air liquefaction and subsequent fractional distillation of the liquefied air, these trace impurities accumulate to a greater or lesser extent in the respective gas. Particularly high impurities in these fluorinated compounds naturally occur in such cryotechnically obtained gases which, on the one hand, occur only in very small quantities in the air and therefore have to be enriched accordingly and which, on the other hand, do not or only with difficulty from fractional distillation those fluorinated compounds which are present in the air in a particularly high concentration can be separated. This applies in particular to noble gases, especially for krypton and xenon, which are only in the air in an amount of approx. I x 10 "4 or 8 x 10 " 6 vol. % occur and, on the other hand, are difficult to separate, for example, from CF 4 and SF 6 , which are present in the air in a not inconsiderable amount, by fractional distillation.
Wahrend zur Entfernung anderer Spurenverunreinigungen, wie Kohlendioxid, Kohlenmonoxid, Kohlenwasserstoffe, Wasser¬ dampf, Sauerstoff, Stickstoff und dgl . aus einem zu reim- gendem Gas wirksame Maßnahmen, wie Molekularsiebe, soge¬ nannte Metall-Getter und dgl. zur Verfügung stehen, ist die Entfernung dieser fluorierten Veibindungen aus einem zu reinigenden Gas mit erheblichen Schwierigkeiten verbunden, da diese in der Atmosphäre sich ansammelnden Verbindungen naturgemäß extrem inert sind. Dies gilt gleichermaßen für die Nachreinigung anderer, nicht kryotechnisch hergestellte Reinstgase .While removing other trace impurities, such as carbon dioxide, carbon monoxide, hydrocarbons, water vapor, oxygen, nitrogen and the like. from rhyming too Effective measures against the gas, such as molecular sieves, so-called metal getters and the like are available, the removal of these fluorinated compounds from a gas to be cleaned is associated with considerable difficulties, since these compounds which accumulate in the atmosphere are naturally extremely inert. This applies equally to the post-purification of other non-cryogenically produced high-purity gases.
Mit dem erfindungsgemaßen Verfahren ist es nunmehr möglich, auch Gase, die fluorierte Veibindungen als Spurenveruni ^i ni- gungen enthalten, wirksam zu reinigen.With the method according to the invention, it is now possible to also effectively purify gases which contain fluorinated compounds as trace compounds.
Das erfmdungsgemaße Verfahren ist dabei insbesondere zur Reinigung von Gasen geeignet, die aus der Luft kryotech¬ nisch gewonnen werden, also durch Luftverflüssigung und fraktionierte Destillation der verflüssigten Luft. Dazu ge¬ hören insbesondere die Edelgase, also Helium, Neon, Argon, Krypton und Xenon, aber auch Sauerstoff und Stickstoff.The method according to the invention is particularly suitable for cleaning gases which are cryogenically obtained from the air, that is to say by air liquefaction and fractional distillation of the liquefied air. This includes in particular the noble gases, ie helium, neon, argon, krypton and xenon, but also oxygen and nitrogen.
Damit lassen sich diese Gase erfindungsgemaß als Reinstgase gewinnen, bei denen der Gehalt der fluorierten Verbindungen weniger als 10 ppm, vorzugsweise weniger als 1 ppm oder gar weniger als 0,1 ppm betragt.According to the invention, these gases can thus be obtained as high-purity gases in which the content of the fluorinated compounds is less than 10 ppm, preferably less than 1 ppm or even less than 0.1 ppm.
Mit dem erfmdungsgemaßen Verfahren können Reinstgase nach- gereinigt werden, die ein Reinheit von mindestens 99,9 % (= Qualitatsklasse 3.0) aufweisen. Damit ist zugleich eine Er¬ höhung der Qualitatsklassen möglich. So sind im Handel der¬ zeit beispielsweise Argon und Helium nur in der maximalen Qualitatsklasse 7,0 erhältlich, Krypton mit maximal etwa 4,5 und Neon mit maximal etwa 4,0. Durch das erfmdungsge¬ maße Verfahren kann die maximal erhältliche Qualitatsklasse der Edelgase wesentlich erhöht werden. Gleiches gilt für die Nachreinigung anderer Reinstgase, wie Sauerstoff oder Stickstoff, sowie iur solche Reinstgase, die nicht durch Luftzerlegung erhalten werden, aber dennoch geringe Mengen fluorierter Verbindungen als Fremdgasanteil enthalten.The method according to the invention can be used to purify high-purity gases which have a purity of at least 99.9% (= quality class 3.0). This also makes it possible to increase the quality classes. For example, argon and helium are currently only commercially available in the maximum quality class 7.0, krypton with a maximum of approximately 4.5 and neon with a maximum of approximately 4.0. The maximum available quality class of the noble gases can be significantly increased by the method according to the invention. The same applies to the purification of other high-purity gases, such as oxygen or Nitrogen, as well as those high-purity gases that are not obtained by air separation, but nevertheless contain small amounts of fluorinated compounds as a foreign gas component.
Das erfindungsgemaße Verfahren kann z. B. zur Gewinnung von Krypton und Xenon in einer Tieftemperaturluft- zer1egungsanlage zum Einsatz kommen, wobei Krypton und Xe¬ non zu einem Krypton- und Xenon-Konzentrat angereichert weiden und mittels Destillation Krypton und/oder Xenon aus dem Krypton-Xenon-Konzentrat gewonnen werden. Das Krypton- Xenon-Konzentrat oder das Krypton oder das Xenon werden dann in einem festen Sorbens aus γ-Aluminiumoxid gereinigt, wobei aus dem Krypton-Xenon-Konzentrat oder dem Krypton bzw. Xenon die fluorierten Verunreinigungen, insbesondere Fluorkohlenwasserstoffe, wie CF4, und/oder SF6, entfernt werden.The inventive method can, for. B. for the extraction of krypton and xenon in a cryogenic air separation plant are used, krypton and xenon being enriched to a krypton and xenon concentrate, and krypton and / or xenon being obtained from the krypton-xenon concentrate by distillation . The krypton-xenon concentrate or the krypton or the xenon are then cleaned in a solid sorbent made of γ-aluminum oxide, the fluorinated impurities, in particular fluorocarbons, such as CF 4 , and. From the krypton-xenon concentrate or the krypton or xenon / or SF 6 .
Wenn die fluorierten Verbindungen, die aus dem Reinstgas entfernt werden sollen, aus der fluorierten oder teilflu¬ orierten Kohlenwasserstoffen bestehen, entsteht bei der Sorbtion der per- oder teilfluorierten Kohlenwasserstoffe an dem γ-Aluminiumoxid-Sorbens als gasförmiges Zersetzungs¬ produkt C02. Das so gebildete C02 kann durch ein nachge¬ schaltetes C02-Sorbens aus dem zu reinigenden Gas entfernt werden, beispielsweise durch ein Molekularsieb, insbesonde¬ re einen Zeolith. Bei perfluorierten Verbindungen mit mehr als einem C-Atom kann auch CO entstehen, und bei SF6 z. B. S02, die in gleicher Weise entfernt werden können. Die nachstehenden Beispiele dienen der weiteren Erläuterung der Erfindung .If the fluorinated compounds to be removed from the ultrapure gas consist of the fluorinated or partially fluorinated hydrocarbons, the per- or partially fluorinated hydrocarbons are sorbed on the γ-alumina sorbent as a gaseous decomposition product C0 2 . The thus formed can C0 2 by a switched nachge¬ C0 2 sorbent from the removed gas to be purified, for example by a molecular sieve, a zeolite insbesonde¬ re. With perfluorinated compounds with more than one carbon atom, CO can also be formed, and with SF 6 z. B. S0 2 , which can be removed in the same way. The following examples serve to further explain the invention.
Beispiel 1example 1
Ein beheizbarer Festbett-Mikroreaktor wird mit γ- Aluminiumoxid (Reinheit > 99,6 Gew.-%) mit Spuren an S1O2, Na2υ und Ti02 (insgesamt < 0,4 Gew.-%) , einer BET-Oberflache von 250 - 255 m2/g, einem Porenvolumen von 0,70 - 0,90 m3/g und einem mittleren Porendurchmesser von 8 - 9 nm gefüllt.A heatable fixed bed microreactor is made with γ-aluminum oxide (purity> 99.6% by weight) with traces of S1O 2 , Na 2 υ and Ti0 2 (total <0.4% by weight), a BET surface area of 250 - 255 m 2 / g, a pore volume of 0.70 - 0.90 m 3 / g and an average pore diameter of 8 - 9 nm.
Dem Mikroreaktor wird Tetrafluormethan (CF4) mit einer Kon¬ zentration von 1 Vol.-% in Helium als Tragergas zugeführt. Die Raumgeschwindigkeit betragt 158 h"1, der Gesamtmassefluß 35 sccm (Standard-Kubikzentimeter) . Die Temperatur des Sor¬ bens wird von Raumtemperatur auf 520°C erwärmt. Die Gaszusam¬ mensetzung wird mit einem Gaschromatographen mit einem Mol¬ sieb- (MS04) und einer Porablot Q-Saule (PQ08) untersucht.Tetrafluoromethane (CF 4 ) with a concentration of 1% by volume in helium is supplied to the microreactor as the carrier gas. The space velocity is 158 h "1 , the total mass flow is 35 sccm (standard cubic centimeters). The temperature of the sorbent is heated from room temperature to 520 ° C. The gas composition is determined using a gas chromatograph with a molecular sieve (MS04) and a Porablot Q-column (PQ08).
In der beigefügten Fig. 1 ist die Absorption des CF4 wieder¬ gegeben. Es ist ersichtlich, dass die Absorption bei etwa 140°C beginnt und bei etwa 290°C quantitativ verlauft.The attached FIG. 1 shows the absorption of the CF 4 . It can be seen that absorption begins at around 140 ° C and proceeds quantitatively at around 290 ° C.
Beispiel 2Example 2
Das Beispiel 1 wird wiederholt, außer dass dem Mikroreaktor statt CF4 Hexafluorethan (C2F6) zugeführt wird. Wie der beige¬ fügten Fig. 2 zu entnehmen, beginnt die Absorption von C2F6 bei etwa 180°C und ist ab 480°C quantitativ. Example 1 is repeated, except that instead of CF 4, hexafluoroethane (C 2 F 6 ) is fed to the microreactor. As can be seen in FIG. 2, the absorption of C 2 F 6 begins at approximately 180 ° C. and is quantitative from 480 ° C.

Claims

Patentansprüche claims
1. Verfahren zur Entfernung von ozonabbauenden und/oder kli¬ mawirksamen fluorierten Verbindungen aus einem Gasstrom, der durch ein festes Sorbens geleitet wird, dadurch ge¬ kennzeichnet, daß als Sorbens γ-Λlummiumoxid verwendet wird und der Gasstrom und das γ-Alummiumoxid-Sorbens, durch das er geleitet wird, wasserfrei sind, wobei das in der fluorierten Verbindung enthaltene Fluor an dem γ- Aluminiumoxid-Sorbens quantitativ gebunden wird.1. A method for removing ozone-depleting and / or climate-active fluorinated compounds from a gas stream which is passed through a solid sorbent, characterized in that γ-Λ aluminum oxide is used as the sorbent and the gas stream and the γ-aluminum oxide sorbent through which it is passed are anhydrous, the fluorine contained in the fluorinated compound being quantitatively bound to the γ-alumina sorbent.
2. Verfahren nach Anspruch 1, dadurch gekennzeichnet, daß das Sorbens aus einer Mischung von γ-Aluminiumoxid und einem Zeolith besteht.2. The method according to claim 1, characterized in that the sorbent consists of a mixture of γ-aluminum oxide and a zeolite.
3. Verfahren nach Anspruch 1, dadurch gekennzeichnet, daß γ- Aluminiumoxid eine Reinheit von mindestens 99,0 Gew.-% besitzt .3. The method according to claim 1, characterized in that γ-alumina has a purity of at least 99.0 wt .-%.
4. Verfahren nach einem der vorhergehenden Ansprüche, da¬ durch gekennzeichnet, dass das Sorbens auf eine Tempera¬ tur von maximal 600°C erwärmt wird.4. The method according to any one of the preceding claims, characterized in that the sorbent is heated to a temperature of at most 600 ° C.
5. Verfahren nach Anspruch 1, dadurch gekennzeichnet, dass bei einem Fluorkohlenwasserstoff mit mehr als einem Koh¬ lenstoffatom pro Molekül als zu entfernender fluorierter Verbindung dem Sorbens Sauerstoff zugeführt wird.5. The method according to claim 1, characterized in that in the case of a fluorohydrocarbon having more than one carbon atom per molecule, oxygen is supplied to the sorbent as the fluorinated compound to be removed.
6. Anwendung des Verfahrens nach einem der vorstehenden An¬ sprüche zur Entsorgung ozonabbauender und/oder klimawirk¬ samer fluorierter Verbindungen. 6. Application of the method according to one of the preceding claims for the disposal of ozone-depleting and / or climate-active fluorinated compounds.
7. Anwendung des Verfahrens nach einem der Ansprüche 1 bis 5 zur Entfernung der bei der Alurmniumherstel 1 ung durch Elektrolyse von Aluminiumoxid in geschmolzenem Kryolith mit kohlenstoffhaltigen Elektroden gebildeten Fluorkoh¬ lenwasserstoffe.The method according to one of claims 1 to 5 bons 7. Application to remove the Fluorkoh ¬ ung formed by the electrolysis of alumina in molten cryolite with carbon-containing electrodes in the Alurmniumherstel. 1
8. Anwendung nach Anspruch 7, dadurch gekennzeichnet, dass das mit den Fluorkonlenwasserstoffen umgesetzte Alummiu- moxid-Sorbens der Kryolith/Alummiumoxid-Schmelze zugege¬8. Use according to claim 7, characterized in that the aluminum rubber sorbent reacted with the fluoroconfluorides is added to the cryolite / aluminum oxide melt
9. Anwendung des Verfahrens nach einem der Ansprüche 1 bis 5 zur Reinigung von Gasen, die fluorierte Verbindungen als Verunreinigungen enthalten.9. Application of the method according to one of claims 1 to 5 for the purification of gases containing fluorinated compounds as impurities.
10. Anwendung nach Anspruch 9, dadurch gekennzeichnet, daß das zu reinigende Gas ein aus Luft kryotechnisch gewon¬ nenes Gas ist.10. Application according to claim 9, characterized in that the gas to be cleaned is a gas cryogenically won from air.
11. Anwendung nach Anspruch 9 oder 10, dadurch gekennzeich¬ net, daß das zu reinigende Gas ein Reinstgas mit einer Reinheit von mindestens 99,9 Gew.% ist.11. Application according to claim 9 or 10, characterized gekennzeich¬ net that the gas to be cleaned is an ultrapure gas with a purity of at least 99.9% by weight.
12. Anordnung nach einem der Ansprüche 9 bis 11, dadurch gekennzeichnet, daß das zu reinigende Gas ein Edelgas oder Edelgasgemisch, Sauerstoff, Stickstoff, Wasser¬ stoff, Kohlenmonoxid oder Kohlendioxid ist.12. Arrangement according to one of claims 9 to 11, characterized in that the gas to be cleaned is a noble gas or noble gas mixture, oxygen, nitrogen, hydrogen, hydrogen, carbon monoxide or carbon dioxide.
13. Anwendung nach Anspruch 12, dadurch gekennzeichnet, daß der Gehalt der fluorierten Verbindung in dem zu reini¬ genden Gas weniger als 100 ppm betragt. 13. Use according to claim 12, characterized in that the content of the fluorinated compound in the gas to be cleaned is less than 100 ppm.
14. Anwendung nach einem der Ansprüche 9 bis 13, dadurch ge¬ kennzeichnet, daß die fluorierten Verbindungen teilweise aus perfluorierten oder teilfluorierten Kohlenwasserstof¬ fen bestehen und das bei der Sorption der per- oder teilfluorierten Kohlenwasserstoffe an dem γ- Al uminiumoxid-Sorbens entstehende Kohlendioxid durch ein nachgeschaltetes Kohlendioxid-Sorbens aus dem zu reini¬ genden Gas entfernt wird. 14. Use according to one of claims 9 to 13, characterized ge indicates that the fluorinated compounds partially consist of perfluorinated or partially fluorinated hydrocarbons and the carbon dioxide formed during the sorption of the per- or partially fluorinated hydrocarbons on the γ-aluminum oxide sorbent is removed from the gas to be cleaned by a downstream carbon dioxide sorbent.
PCT/EP1997/003318 1996-06-26 1997-06-24 Method of removing, from a stream of gas, fluorinated compounds which contribute to destruction of the ozone layer and/or changes in climate, and use of the method WO1997049479A1 (en)

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JP50234998A JP2001505477A (en) 1996-06-26 1997-06-24 Method for removing ozone depleted and / or climatically active fluorinated compounds from a gas stream, and application of the method
DE59703604T DE59703604D1 (en) 1996-06-26 1997-06-24 METHOD FOR REMOVING OZONE-DEGRADING AND / OR CLIMATE-EFFECTIVE FLUORINATED COMPOUNDS FROM A GAS FLOW, AND USE OF THE METHOD
US09/214,081 US6110436A (en) 1996-06-26 1997-06-24 Process for removing ozone-depleting and/or climate-active fluorinated compounds from a gas stream and application of the process

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Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0885648A1 (en) * 1997-06-20 1998-12-23 Hitachi, Ltd. A treatment method for decomposing fluorine compounds, and catalyst and apparatus therefor
EP0898999A2 (en) * 1997-08-18 1999-03-03 Air Products And Chemicals, Inc. Abatement of NF3 using small particle fluidized bed
EP0948990A1 (en) * 1998-03-27 1999-10-13 Abb Research Ltd. Process for disposing of a fluorinated gas, which is enclosed in a container, and apparatus for carrying out the process
WO2002058824A1 (en) * 2001-01-24 2002-08-01 Ineos Fluor Holdings Limited Decomposition of fluorine containing compounds
SG95625A1 (en) * 2000-02-08 2003-04-23 Air Liquide Perfluoro compounds decomposition method and decomposition apparatus therefor
US6855305B2 (en) 1997-01-14 2005-02-15 Hitachi, Ltd. Process for treating fluorine compound-containing gas
US7700049B2 (en) 2005-10-31 2010-04-20 Applied Materials, Inc. Methods and apparatus for sensing characteristics of the contents of a process abatement reactor
US7736599B2 (en) 2004-11-12 2010-06-15 Applied Materials, Inc. Reactor design to reduce particle deposition during process abatement

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6676913B2 (en) 1996-06-12 2004-01-13 Guild Associates, Inc. Catalyst composition and method of controlling PFC and HFC emissions
US6509511B1 (en) 1998-10-07 2003-01-21 Guild Associates, Inc. Process for the conversion of perfluoroalkanes, a catalyst for use therein and a method for its preparation
US6069291A (en) 1996-06-12 2000-05-30 Guild Associates, Inc. Catalytic process for the decomposition of perfluoroalkanes
US6673326B1 (en) 2000-08-07 2004-01-06 Guild Associates, Inc. Catalytic processes for the reduction of perfluorinated compounds and hydrofluorocarbons
US6514471B1 (en) 2000-10-31 2003-02-04 Air Products And Chemicals, Inc. Removing fluorine from semiconductor processing exhaust gas
DE602004003471T2 (en) * 2003-01-29 2007-09-20 Showa Denko K.K. PROCESS FOR DECOMPOSING FLUOROUS COMPOUNDS
DE102004062620A1 (en) * 2004-12-24 2006-07-06 Volkswagen Ag Preparing molten magnesium in furnace under protective gas atmosphere, employs hydrogen-containing, environmentally-acceptable fluorocarbon in inert carrier gas
DE102005037576A1 (en) * 2005-08-09 2007-02-15 Linde Ag Method and apparatus for obtaining krypton and / or xenon
JP5202836B2 (en) * 2006-12-01 2013-06-05 日本エア・リキード株式会社 Xenon recovery system and recovery device
TW200920721A (en) * 2007-07-13 2009-05-16 Solvay Fluor Gmbh Preparation of halogen and hydrogen containing alkenes over metal fluoride catalysts
US20090266745A1 (en) * 2008-04-23 2009-10-29 Kanazirev Vladislav I Method for removing hydrofluoric acid and organic fluorides from a fluid stream
GB0918069D0 (en) 2009-10-15 2009-12-02 Ineos Fluor Holdings Ltd Process
DE102014212907A1 (en) * 2014-07-03 2016-01-07 Siemens Aktiengesellschaft A method of purifying an exhaust gas from a metal reduction process
US20220332575A1 (en) * 2021-04-14 2022-10-20 Applied Materials, Inc. Portable fluorine generator for on-site calibration

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2525089A1 (en) * 1974-06-06 1975-12-11 Hosokawa Micron Kk METHOD AND DEVICE FOR DRY WASHING GASES IN ALUMINUM PRODUCTION
EP0117338A1 (en) * 1981-12-04 1984-09-05 Isaias Loukos Method and apparatus for removing pollutants from aluminium plant emissions
US4528080A (en) * 1984-05-01 1985-07-09 The United States Of America As Represented By The Secretary Of The Navy Photochemical method for the separation of mixtures of xenon and krypton
EP0412456A2 (en) * 1989-08-05 1991-02-13 Dupont-Mitsui Fluorochemicals Co., Ltd. A process for the catalytic decomposition of chlorofluoro-alkanes
JPH03135410A (en) * 1989-10-20 1991-06-10 Mitsubishi Heavy Ind Ltd Pressure swing method for separating and recovering volatile organic matter
DE4311061A1 (en) * 1993-04-03 1994-10-06 Solvay Fluor & Derivate Decomposition of NF3 in exhaust gases
EP0667180A1 (en) * 1994-02-11 1995-08-16 CS-GmbH Halbleiter- und Solartechnologie Process for the disposal of halogenated hydrocarbons

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA583194A (en) * 1959-09-15 Aluminum Company Of America Recovery of fluorine values from gases evolved in the electrolytic production of aluminum
US3790143A (en) * 1972-07-31 1974-02-05 Fuller Co Removal of fluorides from gases
US5015343A (en) * 1987-12-28 1991-05-14 Aluminum Company Of America Electrolytic cell and process for metal reduction
DE4102969C1 (en) * 1991-02-01 1992-10-08 Cs Halbleiter- Und Solartechnologie Gmbh, 8000 Muenchen, De
SE503678C2 (en) * 1994-11-23 1996-07-29 Flaekt Ab Methods and apparatus for separating substances from a gaseous medium by dry adsorption
DE19532279C2 (en) * 1995-09-01 1998-07-23 Cs Halbleiter Solartech Device for cleaning gases which contain ozone-depleting and / or climate-effective halogenated compounds

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2525089A1 (en) * 1974-06-06 1975-12-11 Hosokawa Micron Kk METHOD AND DEVICE FOR DRY WASHING GASES IN ALUMINUM PRODUCTION
EP0117338A1 (en) * 1981-12-04 1984-09-05 Isaias Loukos Method and apparatus for removing pollutants from aluminium plant emissions
US4528080A (en) * 1984-05-01 1985-07-09 The United States Of America As Represented By The Secretary Of The Navy Photochemical method for the separation of mixtures of xenon and krypton
EP0412456A2 (en) * 1989-08-05 1991-02-13 Dupont-Mitsui Fluorochemicals Co., Ltd. A process for the catalytic decomposition of chlorofluoro-alkanes
JPH03135410A (en) * 1989-10-20 1991-06-10 Mitsubishi Heavy Ind Ltd Pressure swing method for separating and recovering volatile organic matter
DE4311061A1 (en) * 1993-04-03 1994-10-06 Solvay Fluor & Derivate Decomposition of NF3 in exhaust gases
EP0667180A1 (en) * 1994-02-11 1995-08-16 CS-GmbH Halbleiter- und Solartechnologie Process for the disposal of halogenated hydrocarbons
DE4404329C2 (en) * 1994-02-11 1996-07-11 Cs Halbleiter Solartech Disposal of chlorofluorocarbons and halons

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
DATABASE WPI Section Ch Week 9129, Derwent World Patents Index; Class E19, AN 91-212459, XP002044151 *

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6855305B2 (en) 1997-01-14 2005-02-15 Hitachi, Ltd. Process for treating fluorine compound-containing gas
US7347980B2 (en) 1997-01-14 2008-03-25 Hitachi, Ltd. Process for treating fluorine compound-containing gas
US6942841B2 (en) 1997-01-14 2005-09-13 Hitachi, Ltd. Process for treating fluorine compound-containing gas
EP0885648A1 (en) * 1997-06-20 1998-12-23 Hitachi, Ltd. A treatment method for decomposing fluorine compounds, and catalyst and apparatus therefor
EP0898999A2 (en) * 1997-08-18 1999-03-03 Air Products And Chemicals, Inc. Abatement of NF3 using small particle fluidized bed
EP0898999A3 (en) * 1997-08-18 1999-03-24 Air Products And Chemicals, Inc. Abatement of NF3 using small particle fluidized bed
EP0948990A1 (en) * 1998-03-27 1999-10-13 Abb Research Ltd. Process for disposing of a fluorinated gas, which is enclosed in a container, and apparatus for carrying out the process
SG95625A1 (en) * 2000-02-08 2003-04-23 Air Liquide Perfluoro compounds decomposition method and decomposition apparatus therefor
WO2002058824A1 (en) * 2001-01-24 2002-08-01 Ineos Fluor Holdings Limited Decomposition of fluorine containing compounds
US7736599B2 (en) 2004-11-12 2010-06-15 Applied Materials, Inc. Reactor design to reduce particle deposition during process abatement
US7985379B2 (en) 2004-11-12 2011-07-26 Applied Materials, Inc. Reactor design to reduce particle deposition during process abatement
US7700049B2 (en) 2005-10-31 2010-04-20 Applied Materials, Inc. Methods and apparatus for sensing characteristics of the contents of a process abatement reactor
US7736600B2 (en) 2005-10-31 2010-06-15 Applied Materials, Inc. Apparatus for manufacturing a process abatement reactor

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JP2001505477A (en) 2001-04-24
US6110436A (en) 2000-08-29
EP0907402B1 (en) 2001-05-23
EP0907402A1 (en) 1999-04-14
DE59703604D1 (en) 2001-06-28

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