WO1997049479A1 - Method of removing, from a stream of gas, fluorinated compounds which contribute to destruction of the ozone layer and/or changes in climate, and use of the method - Google Patents
Method of removing, from a stream of gas, fluorinated compounds which contribute to destruction of the ozone layer and/or changes in climate, and use of the method Download PDFInfo
- Publication number
- WO1997049479A1 WO1997049479A1 PCT/EP1997/003318 EP9703318W WO9749479A1 WO 1997049479 A1 WO1997049479 A1 WO 1997049479A1 EP 9703318 W EP9703318 W EP 9703318W WO 9749479 A1 WO9749479 A1 WO 9749479A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- gas
- sorbent
- fluorinated
- aluminum oxide
- cleaned
- Prior art date
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C3/00—Electrolytic production, recovery or refining of metals by electrolysis of melts
- C25C3/06—Electrolytic production, recovery or refining of metals by electrolysis of melts of aluminium
- C25C3/22—Collecting emitted gases
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/68—Halogens or halogen compounds
- B01D53/70—Organic halogen compounds
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
- Y02C20/00—Capture or disposal of greenhouse gases
- Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]
Definitions
- the invention relates to a method for removing fluorinated ozone-depleting and / or climate-effective fluorinated compounds from a gas stream which is passed through a solid, heated sorbent. It also relates to applications of this method.
- ODP ozone depletion potential
- GWP Greenhouse Warming Potential
- a method according to the preamble of claim 1 is already known from DE 44 04 329 C1.
- a phyllosilicate containing iron oxide is used as the sorbent.
- the known method has largely been retained.
- the sorbent must be heated to a relatively high temperature, for example for the sorption of CF4 up to 350 ° C.
- the sorption capacity of the sorbent also leaves something to be desired.
- EP 0 412 456 A2 to decompose fluorocarbons with steam at 350 to 1000 ° C. over an aluminum oxide catalyst to give hydrogen chloride, hydrogen fluoride, carbon dioxide and carbon monoxide and other compounds such as chlorofluorosacetic acid.
- the object of the invention is to remove fluorinated prebonds from a gas stream with little effort.
- the gas stream containing the fluorinated compounds is passed through a sorbent made of ⁇ - (gamma) - aluminum oxide.
- the gas flow and the ⁇ -alumina must be water-free.
- the fluorine contained in the very inert, ozone-depleting and / or climate-effective fluorinated compound is bound quantitatively to the ⁇ -aluminum oxide sorbent, and that at a rather moderate temperature of e.g. 200 to 400 ° C. If the fluorinated compound is a chlorofluorocarbon, a quantitative binding of the chlorine together with the fluorine to the sorbent can be determined in the same way.
- ozone-depleting and / or climate-active fluorinated compounds can be adsorbed.
- fluorinated hydrocarbons which, besides fluorine, are halogenated with other halogen atoms, in particular with chlorine , ie perhalogenated (CFCs) such as partially (CFCs), saturated and unsaturated, fluorochlorohydrocarbons with 1 to 4 carbon atoms per molecule, in particular trichlorofluoromethane, dichlorodifluoromethane, bromochlorodifluoromoromethane, dibromodifluorotrifluoromethane , Tetrafluoromethane, dichlorofluoromethane, chlorodifluoromethane, trifluoromethane (HFC) or partially fluorinated (HFC) saturated or unsaturated hydrocarbons with 1 to 4 carbon atoms in the molecule, but also those fluorinated hydrocarbons which, besides fluorine, are halogenated
- perfluorinated hydrocarbons are also referred to as “FK” (fluorocarbons), and partially fluorinated as “FKW” (fluorocarbons).
- the method according to the invention is particularly suitable for removing tetrafluoromethane (CF 4 ) and hexafluoroethane (C 2 F 6 ).
- the process according to the invention can be used to remove nitrogen fluoride (NF 3 ) and sulfur hexafluoride (SF 6 ).
- the fluorine in the fluorinated compound is reacted quantitatively with the ⁇ -aluminum oxide sorbent.
- the reaction takes place with tetrafluoromethane, for example according to the following reaction equation:
- ie CO 2 is formed as a fission product, but, as can be seen from the table above, has a GWP that is several orders of magnitude lower than the tetrafluoromethane to be removed, so that the CO 2 released in the process according to the invention increases in terms of GWP neglect
- the content of the fluorinated compounds according to the process of the invention is reduced by at least 99%, in particular 99.9%, when passing through the ⁇ -alumina sorbent, even that of the particularly inert CF 4 .
- the fluorinated compound can be supplied to the sorbent with a carrier gas.
- An inert gas such as nitrogen or an inert gas can be used as the carrier gas.
- the carrier gas can also be another gas, such as air or oxygen.
- Oxygen is added in particular if an HFC is to be converted with more than one carbon atom per molecule. For example, the conversion of hexafluoroethane takes place according to the following reaction equation:
- reaction temperature is also significantly reduced by the addition of oxygen or air.
- the carrier gas should be anhydrous. This means that it can be a technical gas, possibly also ambient air. In any case, care must be taken to ensure that the carrier gas does not absorb any further moisture. If the gas to be cleaned contains traces of water, these are preferably removed with a molecular sieve before the gas is fed to the ⁇ -aluminum sorbent.
- the gas to be purified preferably contains less than 1000 ppm, in particular less than 100 ppm, of water. In any case, the drier the carrier gas, the greater the proportion of fluorine in the fluorinated compound that is sorbed on the ⁇ -aluminum oxide.
- the aluminum oxide is kept in a sufficiently dry state by being heated to well above 100 ° C. during sorption.
- the ⁇ -alumina preferably has a purity of more than 99.0%.
- a ⁇ -aluminum oxide with a BET surface area of more than 50 m 2 / g, in particular more than 200 m 2 / g and a pore volume of more than 0.2 cmVg is preferably used.
- the average pore diameter can be, for example, 2-50 nm amount, especially 5 - 15 nm.
- the aluminum oxide can be used in pure form or in combination with other substances.
- mixtures of zeolites and aluminum oxide and / or aluminum hydroxide can be used.
- the proportion of aluminum oxide and / or aluminum hydroxide in the sorbent should, however, be at least 10% by weight, preferably at least 30% by weight.
- the aluminum oxide or aluminum hydroxide can be doped with metals from groups la, Ha, IVa, Ib, Ilb, IVb, VIb, Vllb and Vlllb.
- the sorbent can also contain additives from oxides and other compounds of these metals.
- the sorbent can be a fixed bed or a fluid bed.
- the sorbent can be heated to a temperature of up to 1000 ° C.
- the process according to the invention is preferably carried out with a temperature of the sorbent between room temperature and 600 ° C.
- the temperature of the sorbent depends on the fluorinated compound to be absorbed. For example, tetrafluoromethane is already absorbed at approximately 150 ° C. by the process according to the invention, and hexafluoroethane from approximately 180 ° C. In general, the temperature of the sorbent is between 250 and 450 ° C.
- the method according to the invention is preferably carried out at atmospheric pressure. However, it can also be carried out with negative pressure or with a pressure of, for example, up to 20 bar.
- the space velocity can be for example 10 to 1000 h (total flow rate 1 / h / volume of catalyst 1), which corresponds to h a Verwcilzeit 0.1 to 0.001 Vorzugswei ⁇ se the space velocity is between 50 and 500 h "or the residence time is between 0.02 and 0.002 h.
- the fluorinated compound is preferably supplied with a carrier gas, the concentration of the fluorinated compound in the carrier gas being able to fluctuate greatly, for example between 0.001 to 20 vol.
- the method according to the invention can be used for the disposal of ozone-depleting and / or climate-effective fluorinated compounds.
- fluorinated compounds to be disposed of are bound quantitatively and irreversibly by the solid sorbent. This means that there are no ozone-depleting and, apart from a negligibly small amount of carbon dioxide, no climate-effective decomposition or reaction products. Even if the sorbent is saturated, no such decomposition and reaction products are released.
- the emerging fluorinated compound can be bound with the sorbent, for example with a downstream fixed bed, that is to say, for example, a further container filled with solid sorbent in accordance with DE-41 02 969 Cl.
- the method according to the invention can be carried out with a reactor of any size which normally only needs to be heatable. It can therefore also be carried out discontinuously and decentrally, for example in the context of municipal waste disposal.
- Men ⁇ gen be of perfluorinated compounds used, which are also referred to as PFC (Perfluo ⁇ nated Compounds).
- PFC Perfluo ⁇ nated Compounds.
- Gehö by ⁇ ren in particular carbon tetrafluoride (CF 4), trifluoromethane (CHF 3), hexafluoroethane (C 2 F 6) and sulfur hexafluoride (SF 6) and nitrogen trifluoride (NF 3).
- Fluorine is formed from these connections, for example by electrical discharge, with which the semiconductor substrate, for example an silicon wafer, is etched.
- These perfluorinated compounds are extremely inert. They are therefore generating plants from the exhaust gas cleaning ⁇ that used in the semiconductor industry were ⁇ the not detected and thus released into the atmosphere.
- the invention is therefore particularly applicable to exhaust gas purification systems in the semiconductor industry.
- Particularly suitable for cleaning exhaust gases which contain ozone-depleting and / or climate-effective fluorinated compounds is a device which has a sorption device with two chambers, each of which has a fixed, stationary sorbent according to the invention for the ozone-depleting and / or kli ⁇ contain active fluorinated compounds and communicate with one another via a heating device.
- the two chambers can alternately be connected to the gas supply for the exhaust gas to be cleaned.
- This device is described in German patent application 195 32 279.7.
- the sorbent in one of the two chambers is at least partially heated to a temperature necessary for the decomposition of the ozone-depleting and / or climate-active fluorinated compounds, b) the gas to be cleaned is ⁇ direction is switched on the Schuein to this temperature a heated, first chamber is supplied, and purified therein,
- the cleaned exhaust gas emerging from the second chamber flows after heating in the heating device into the first chamber until its sorbent has at least partially reached the temperature required for the decomposition of the ozone-depleting and / or climate-effective fluorinated compounds,
- Step (a) is carried out by supplying an inert carrier gas to the second chamber when the heating device is switched on.
- the fused salt electrolysis is carried out in tubs, serving de ⁇ ren side walls and floor with a cathode as Coal feed is lined, for example a coal-tar mixture.
- Carbon blocks are used as anodes, which are attached to a supporting framework connected to the positive current of the current source in the molten cryolite, that is to say Na 3 [A1F 6 ] or 3NaF.
- Hang AIF 3 in which about 15 to 20% by weight of aluminum oxide is dissolved at a bath temperature of about 950 ° C.
- the fluorohydrocarbon emerging from the cryolith / aluminum oxide melt can be bound with the aluminum oxide and / or aluminum hydroxide sorbent.
- the melt electrolysis is carried out in a closed trough or similar vessel which is provided with at least one gas outlet opening for the fluorocarbon formed in the melt, which is passed through the aluminum oxide and / or aluminum hydroxide sorbent, which is applied to a for absorption of the Fluorocarbon sufficient temperature is heated.
- an air or other gas stream can also be passed over the melt pool, for example by connecting a blower to the outlet of the container containing the sorbent, which draws air or another gas over the melt pool.
- a blower to the outlet of the container containing the sorbent, which draws air or another gas over the melt pool.
- the aluminum oxide and / or aluminum hydroxide sorbent converted to aluminum fluoride umye with the fluorocarbon can then be added to the cryolite / AJ uminium oxide melt in order to replace cryolite consumed in the electrolysis.
- the method according to the invention is particularly suitable for cleaning gases which are cryogenically obtained from the air, that is to say by air liquefaction and fractional distillation of the liquefied air.
- This includes in particular the noble gases, ie helium, neon, argon, krypton and xenon, but also oxygen and nitrogen.
- these gases can thus be obtained as high-purity gases in which the content of the fluorinated compounds is less than 10 ppm, preferably less than 1 ppm or even less than 0.1 ppm.
- high-purity gases such as oxygen or Nitrogen
- the inventive method can, for. B. for the extraction of krypton and xenon in a cryogenic air separation plant are used, krypton and xenon being enriched to a krypton and xenon concentrate, and krypton and / or xenon being obtained from the krypton-xenon concentrate by distillation .
- the krypton-xenon concentrate or the krypton or the xenon are then cleaned in a solid sorbent made of ⁇ -aluminum oxide, the fluorinated impurities, in particular fluorocarbons, such as CF 4 , and. From the krypton-xenon concentrate or the krypton or xenon / or SF 6 .
- the per- or partially fluorinated hydrocarbons are sorbed on the ⁇ -alumina sorbent as a gaseous decomposition product C0 2 .
- the thus formed can C0 2 by a switched nachge ⁇ C0 2 sorbent from the removed gas to be purified, for example by a molecular sieve, a zeolite insbesonde ⁇ re.
- CO can also be formed, and with SF 6 z. B. S0 2 , which can be removed in the same way.
- the following examples serve to further explain the invention.
- a heatable fixed bed microreactor is made with ⁇ -aluminum oxide (purity> 99.6% by weight) with traces of S1O 2 , Na 2 ⁇ and Ti0 2 (total ⁇ 0.4% by weight), a BET surface area of 250 - 255 m 2 / g, a pore volume of 0.70 - 0.90 m 3 / g and an average pore diameter of 8 - 9 nm.
- Tetrafluoromethane (CF 4 ) with a concentration of 1% by volume in helium is supplied to the microreactor as the carrier gas.
- the space velocity is 158 h "1 , the total mass flow is 35 sccm (standard cubic centimeters).
- the temperature of the sorbent is heated from room temperature to 520 ° C.
- the gas composition is determined using a gas chromatograph with a molecular sieve (MS04) and a Porablot Q-column (PQ08).
- FIG. 1 shows the absorption of the CF 4 . It can be seen that absorption begins at around 140 ° C and proceeds quantitatively at around 290 ° C.
- Example 1 is repeated, except that instead of CF 4, hexafluoroethane (C 2 F 6 ) is fed to the microreactor.
- C 2 F 6 hexafluoroethane
- the absorption of C 2 F 6 begins at approximately 180 ° C. and is quantitative from 480 ° C.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Biomedical Technology (AREA)
- Analytical Chemistry (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Electrochemistry (AREA)
- Environmental & Geological Engineering (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Treating Waste Gases (AREA)
- Separation Of Gases By Adsorption (AREA)
Abstract
Description
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP97930395A EP0907402B1 (en) | 1996-06-26 | 1997-06-24 | Method of removing, from a stream of gas, fluorinated compounds which contribute to destruction of the ozone layer and/or changes in climate, and use of the method |
JP50234998A JP2001505477A (en) | 1996-06-26 | 1997-06-24 | Method for removing ozone depleted and / or climatically active fluorinated compounds from a gas stream, and application of the method |
DE59703604T DE59703604D1 (en) | 1996-06-26 | 1997-06-24 | METHOD FOR REMOVING OZONE-DEGRADING AND / OR CLIMATE-EFFECTIVE FLUORINATED COMPOUNDS FROM A GAS FLOW, AND USE OF THE METHOD |
US09/214,081 US6110436A (en) | 1996-06-26 | 1997-06-24 | Process for removing ozone-depleting and/or climate-active fluorinated compounds from a gas stream and application of the process |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19625607.0 | 1996-06-26 | ||
DE19625607 | 1996-06-26 | ||
DE1997119834 DE19719834A1 (en) | 1997-05-12 | 1997-05-12 | Quantitative removal of fluorinated compound from gas by sorption at moderate temperature |
DE19719834.1 | 1997-05-12 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO1997049479A1 true WO1997049479A1 (en) | 1997-12-31 |
WO1997049479B1 WO1997049479B1 (en) | 1998-02-19 |
Family
ID=26026952
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP1997/003318 WO1997049479A1 (en) | 1996-06-26 | 1997-06-24 | Method of removing, from a stream of gas, fluorinated compounds which contribute to destruction of the ozone layer and/or changes in climate, and use of the method |
Country Status (5)
Country | Link |
---|---|
US (1) | US6110436A (en) |
EP (1) | EP0907402B1 (en) |
JP (1) | JP2001505477A (en) |
DE (1) | DE59703604D1 (en) |
WO (1) | WO1997049479A1 (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0885648A1 (en) * | 1997-06-20 | 1998-12-23 | Hitachi, Ltd. | A treatment method for decomposing fluorine compounds, and catalyst and apparatus therefor |
EP0898999A2 (en) * | 1997-08-18 | 1999-03-03 | Air Products And Chemicals, Inc. | Abatement of NF3 using small particle fluidized bed |
EP0948990A1 (en) * | 1998-03-27 | 1999-10-13 | Abb Research Ltd. | Process for disposing of a fluorinated gas, which is enclosed in a container, and apparatus for carrying out the process |
WO2002058824A1 (en) * | 2001-01-24 | 2002-08-01 | Ineos Fluor Holdings Limited | Decomposition of fluorine containing compounds |
SG95625A1 (en) * | 2000-02-08 | 2003-04-23 | Air Liquide | Perfluoro compounds decomposition method and decomposition apparatus therefor |
US6855305B2 (en) | 1997-01-14 | 2005-02-15 | Hitachi, Ltd. | Process for treating fluorine compound-containing gas |
US7700049B2 (en) | 2005-10-31 | 2010-04-20 | Applied Materials, Inc. | Methods and apparatus for sensing characteristics of the contents of a process abatement reactor |
US7736599B2 (en) | 2004-11-12 | 2010-06-15 | Applied Materials, Inc. | Reactor design to reduce particle deposition during process abatement |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6676913B2 (en) | 1996-06-12 | 2004-01-13 | Guild Associates, Inc. | Catalyst composition and method of controlling PFC and HFC emissions |
US6509511B1 (en) | 1998-10-07 | 2003-01-21 | Guild Associates, Inc. | Process for the conversion of perfluoroalkanes, a catalyst for use therein and a method for its preparation |
US6069291A (en) | 1996-06-12 | 2000-05-30 | Guild Associates, Inc. | Catalytic process for the decomposition of perfluoroalkanes |
US6673326B1 (en) | 2000-08-07 | 2004-01-06 | Guild Associates, Inc. | Catalytic processes for the reduction of perfluorinated compounds and hydrofluorocarbons |
US6514471B1 (en) | 2000-10-31 | 2003-02-04 | Air Products And Chemicals, Inc. | Removing fluorine from semiconductor processing exhaust gas |
DE602004003471T2 (en) * | 2003-01-29 | 2007-09-20 | Showa Denko K.K. | PROCESS FOR DECOMPOSING FLUOROUS COMPOUNDS |
DE102004062620A1 (en) * | 2004-12-24 | 2006-07-06 | Volkswagen Ag | Preparing molten magnesium in furnace under protective gas atmosphere, employs hydrogen-containing, environmentally-acceptable fluorocarbon in inert carrier gas |
DE102005037576A1 (en) * | 2005-08-09 | 2007-02-15 | Linde Ag | Method and apparatus for obtaining krypton and / or xenon |
JP5202836B2 (en) * | 2006-12-01 | 2013-06-05 | 日本エア・リキード株式会社 | Xenon recovery system and recovery device |
TW200920721A (en) * | 2007-07-13 | 2009-05-16 | Solvay Fluor Gmbh | Preparation of halogen and hydrogen containing alkenes over metal fluoride catalysts |
US20090266745A1 (en) * | 2008-04-23 | 2009-10-29 | Kanazirev Vladislav I | Method for removing hydrofluoric acid and organic fluorides from a fluid stream |
GB0918069D0 (en) | 2009-10-15 | 2009-12-02 | Ineos Fluor Holdings Ltd | Process |
DE102014212907A1 (en) * | 2014-07-03 | 2016-01-07 | Siemens Aktiengesellschaft | A method of purifying an exhaust gas from a metal reduction process |
US20220332575A1 (en) * | 2021-04-14 | 2022-10-20 | Applied Materials, Inc. | Portable fluorine generator for on-site calibration |
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1997
- 1997-06-24 DE DE59703604T patent/DE59703604D1/en not_active Expired - Fee Related
- 1997-06-24 JP JP50234998A patent/JP2001505477A/en active Pending
- 1997-06-24 US US09/214,081 patent/US6110436A/en not_active Expired - Fee Related
- 1997-06-24 EP EP97930395A patent/EP0907402B1/en not_active Expired - Lifetime
- 1997-06-24 WO PCT/EP1997/003318 patent/WO1997049479A1/en active IP Right Grant
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Cited By (13)
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US6855305B2 (en) | 1997-01-14 | 2005-02-15 | Hitachi, Ltd. | Process for treating fluorine compound-containing gas |
US7347980B2 (en) | 1997-01-14 | 2008-03-25 | Hitachi, Ltd. | Process for treating fluorine compound-containing gas |
US6942841B2 (en) | 1997-01-14 | 2005-09-13 | Hitachi, Ltd. | Process for treating fluorine compound-containing gas |
EP0885648A1 (en) * | 1997-06-20 | 1998-12-23 | Hitachi, Ltd. | A treatment method for decomposing fluorine compounds, and catalyst and apparatus therefor |
EP0898999A2 (en) * | 1997-08-18 | 1999-03-03 | Air Products And Chemicals, Inc. | Abatement of NF3 using small particle fluidized bed |
EP0898999A3 (en) * | 1997-08-18 | 1999-03-24 | Air Products And Chemicals, Inc. | Abatement of NF3 using small particle fluidized bed |
EP0948990A1 (en) * | 1998-03-27 | 1999-10-13 | Abb Research Ltd. | Process for disposing of a fluorinated gas, which is enclosed in a container, and apparatus for carrying out the process |
SG95625A1 (en) * | 2000-02-08 | 2003-04-23 | Air Liquide | Perfluoro compounds decomposition method and decomposition apparatus therefor |
WO2002058824A1 (en) * | 2001-01-24 | 2002-08-01 | Ineos Fluor Holdings Limited | Decomposition of fluorine containing compounds |
US7736599B2 (en) | 2004-11-12 | 2010-06-15 | Applied Materials, Inc. | Reactor design to reduce particle deposition during process abatement |
US7985379B2 (en) | 2004-11-12 | 2011-07-26 | Applied Materials, Inc. | Reactor design to reduce particle deposition during process abatement |
US7700049B2 (en) | 2005-10-31 | 2010-04-20 | Applied Materials, Inc. | Methods and apparatus for sensing characteristics of the contents of a process abatement reactor |
US7736600B2 (en) | 2005-10-31 | 2010-06-15 | Applied Materials, Inc. | Apparatus for manufacturing a process abatement reactor |
Also Published As
Publication number | Publication date |
---|---|
JP2001505477A (en) | 2001-04-24 |
US6110436A (en) | 2000-08-29 |
EP0907402B1 (en) | 2001-05-23 |
EP0907402A1 (en) | 1999-04-14 |
DE59703604D1 (en) | 2001-06-28 |
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