WO1984001664A1 - Controlled porosity dispenser cathode - Google Patents

Controlled porosity dispenser cathode Download PDF

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Publication number
WO1984001664A1
WO1984001664A1 PCT/US1983/001572 US8301572W WO8401664A1 WO 1984001664 A1 WO1984001664 A1 WO 1984001664A1 US 8301572 W US8301572 W US 8301572W WO 8401664 A1 WO8401664 A1 WO 8401664A1
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WO
WIPO (PCT)
Prior art keywords
mandrel
coating
dispenser
reservoir
housing
Prior art date
Application number
PCT/US1983/001572
Other languages
French (fr)
Inventor
Louis R Falce
Glenn S Breeze
Original Assignee
Hughes Aircraft Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hughes Aircraft Co filed Critical Hughes Aircraft Co
Priority to DE8383903655T priority Critical patent/DE3374738D1/en
Publication of WO1984001664A1 publication Critical patent/WO1984001664A1/en

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02Main electrodes
    • H01J1/13Solid thermionic cathodes
    • H01J1/20Cathodes heated indirectly by an electric current; Cathodes heated by electron or ion bombardment
    • H01J1/28Dispenser-type cathodes, e.g. L-cathode
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02Manufacture of electrodes or electrode systems
    • H01J9/04Manufacture of electrodes or electrode systems of thermionic cathodes

Definitions

  • an array of apertures (46) is formed in the end wall (42) of the housing by laser drilling to create an emitter-dispenser (42).
  • This invention relates to control porosity dispenser cathodes and methods for making the same.
  • This invention is a further advance pertaining to the structure of and the method for fabricating controlled porosity dispenser cathodes.
  • Thermionic emission cathodes of the type that can be used in microwave tubes such as traveling wave tubes are, in many applications, required to have high reliability and long life. It is also desirable that all areas of the cathode surface be operated in a space charge limited mode for more stable operation.
  • cathodes such as the "B”, the "S” and the “M” types, are made of random porosity structures impregnated with barium calcium aluminate compounds and generally tend to provide a non-uniform emission over the surface of the cathode. The result is that excessive temperatures are required to assure that space charge limited emission is achieved in less active areas of the cathode surface. Consequently, the more active areas become excessively hot resulting in decreased reliability and shortened life. The end result is that emission is gradually reduced as the pores become depleted of the impregnant. Examples of these types of cathodes are disclosed in U.S. Patent No. 2,700,000, issued on January 18, 1955 to R. Levi et al and U.S. Patent No. 2,722,626, issued on November 1, 1955 to P. P. Coppola et al.
  • tha ⁇ it is directed to a structure for a controlled porosity dispenser cathode which is fabricated as a monolithic or integral piece essentially of a single material formed and integrally bonded together by a chemical vapor deposition process.
  • a mandrel is constructed of molybdenum with crossing slots formed in one end thereof. Tungsten strips are placed in these slots and are brazed in place with copper. The mandrel and strip assembly is then machined to the preferred configuration. Thereafter, the mandrel is placed in a chemical vapor deposition chamber and a thin coating of tungsten is deposited on the mandrel. Then, as required, the end of the mandrel is machined in a concave spherical radius configuration. At this time, the mandrel is returned to the depositon chamber where it receives an additional thin layer of tungsten.
  • the mandrel is then removed such as by etching it away, thereby leaving the hollow housing of tungsten which will serve as a reservoir for an activating material.
  • This housing then has an array of apertures drilled in the contoured top surface such as by a pulsed laser thereby creating a precisely porous emitter-dispenser surface.
  • the reservoir of the structure can be filled from the open end with a barium calcium aluminate compound or other barium bearing compound that will decompose when heated, thereby supplying activating material to the emitter-dispenser surface through the array of apertures.
  • the filled housing can then be attached to a heater structure to make a complete dispenser cathode.
  • This housing is featured in that it is constructed of a single material wherein the crystalline-atomic bonding of the contoured top surface and the side walls of the housing forms an essentially monolithic or single piece.
  • dispenser cathode can be operated at a lower temperature than other dispenser cathodes of the controlled porosity type as a result of the feature of the support-thermal cross members which tend to distribute the heat more deeply and uniformly into the activating material and to the emitter-dispenser surface. As a consequence, it is able to produce a higher emission density for a given temperature than was heretofore obtained and a more stable emission at these lower temperatures.
  • Still another advantage is that the structure is not likely to delaminate or fail during thermal cycling as a result of its unitary and single material construction.
  • FIG. 1 is a schematic perspective view of a mandrel onto which a thin layer of tungsten or other metal to be coated.
  • FIG. 2 is a schematic perspective view illustrating the cross member thermal-mechanical support brazed in place in the mandrel.
  • FIG. 3 is a schematic perspective view illustrating the mandrel machined to a configuration for chemical vapor deposition.
  • FIG. 4 is a cross-sectional side view taken along the line 4-4 of FIG. 3 showing the mandrel having a thin layer of metal deposited thereon.
  • FIG. 5 is a cross-sectional view with the mandrel end surface contoured in a spherical radius, concave configuration.
  • FIG. 6 is a cross-sectional view illustrating a second thin layer of metal deposited thereon to form the emitter-dispenser surface and to thicken the side wall of the emitter-reservoir housing.
  • FIG. 7 is a cross-sectional view of the hollow emitter-reservoir housing with the mandrel removed.
  • FIG. 8 is a cross-sectional view representing the housing of FIG. 7 with the emitter-dispenser surface thereof drilled to form an array of apertures.
  • FIG. 9 is a cross-sectional schematic illustration of a control porosity dispenser cathode including the housing filled with activating material and a heater assembly attached thereto.
  • FIG. 1 is illustrative of a first step of fabrication in which a mandrel is formed having a configuration generally similar to the configuration of the final emitter-reservoir housing.
  • the mandrel 20 is cylindrical and is made of molybdenum. It should be understood that the mandrel could be made of other materials which are capable of withstanding the temperatures at which the subsequent fabrication steps take place and which are otherwise compatible with these steps.
  • the end face 22 of the mandrel 20 is slotted with two inersecting slots 24 and 26 which extend into the body of the material at right angles to each other and are preferably both in a plane coextensive with or collaterial with the axis of the mandrel. In this particular embodiment, the slots 24 and 26 extend across the diameter of the mandrel.
  • These strips are of the same material that the remainder of the emitter-reservoir housing will be made from. While tunsten is used in the preferred embodiment, it could be of any other material which has an attractive work function and which is capable of withstanding the operating temperature of the control porosity dispenser cathode over extended periods of time.
  • These strips 28 and 30 are brazed together and in place by copper brazing material 32.
  • the mandrel 20 is machined down to remove the surplus brazing material 32 and the edges of the strips 28 and 30 which protrude beyond the side and end surfaces of the mandrel 20 so that the strip edges are flush with the surface of the mandrel.
  • a shoulder 34 is formed.
  • the mandrel 20 is subjected to chemical vapor deposition process in which a tungsten coating 36 (not drawn to scale) 0.004 of an inch thick is formed on the mandrel surface.
  • a tungsten coating 36 (not drawn to scale) 0.004 of an inch thick is formed on the mandrel surface.
  • This vapor deposition step can be accomplished in a quartz reaction chamber in which reactive gases of the tungsten metal compound will flow across the heated mandrel to form the deposited layer.
  • the heat for the mandrel can be supplied by an inductive type power supply and the flow rate of the gases can be controlled.
  • end surface 22 of the mandrel is machined into a spherical-radius concave surface 38 such as by electrical discharge machining.
  • This surface 38 is dependent upon the end application of the cathode and the type of beam focusing to be used. Thus, this surface 38 could have been left flat or have other configurations for certain types of applications and beam focusing.
  • tungsten 40 is formed upon the exposed surface of the first tungsten coating 36 and the exposed mandrel concave surface 38 by means of the chemical vapor deposition process.
  • the term "thin” as used herein is about 0.001 of an inch thick in the preferred embodiment. However, it could also be somewhat less or somewhat greater depending upon the structural integrity of the layer or upon the ease at which the electron emitting material is to migrate to the emitting surface. For example, the range could be between about 0.0005 of an inch and 0.005 of an inch or, in some cases, more. Care must be taken to be sure that this layer is not so thin that the activating material will readily evaporate or so thick that the activating material will not readily migrate to the emitter surface through the pores to be formed.
  • the two layers of tungsten 36 and 40 bond together by atomic crystalline growth to form a monolithic or single piece of a single material with a somewhat thickened side wall.
  • the tungsten coating which forms the concave emitter-dispenser 42 atomically bonds to the exposed edges of the strips 28 and 30 which form the mechanical- thermal supports. These strips serve to hold the thin wall emitter-dispenser 42 in its precise configuration and will subsequently serve to distribute heat into an activating material as well as to the emitter surface.
  • the end segment of the mandrel 20 holding the configured tungsten coating is cut off at about a plane coextensive with the lower edges of strips 28 and 30, and the molybdenum mandrel
  • differential solvent which has been found to be effective is nitric acid which etches the molybdenum and any remaining copper brazing material 32 but does not significantly affect the tungsten.
  • the emitter-dispenser 42 is formed through the emitter-dispenser 42 in open communication with the reservoir 44. It is preferable that these apertures be of small diameter, closely spaced and in a precise pattern. Accordingly, one way that these apertures have been formed is by laser drilling in which apertures 5.0 microns in diameter on 15.0 micron centers have been formed. This results in a precisely porous emitter-dispenser 42. Thereafter, as further illustrated in FIG. 9 the reservoir 44 of the hollow emitter-dispenser housing 48 is filled with an activating material 50 through the open end thereof.
  • One activating material 50 which has been found to be particularly useful is a mixture of 80% by weight of barium calcium aluminate having a 5:3:2 mole ratio and 20% by weight of tungsten powder. Of course, other barium bearing compounds that will decompose when heated to supply activating material to the emitter surface of the emitter-dispenser 42 can be used.
  • a controlled porosity dispenser cathode 52 is formed by attaching the filled emitter-dispenser housing 48 to a heater assembly 54.
  • the heater assembly 54 includes a hollow support member 56 made of a high temperature material such as tungsten which encloses a heater coil 58 potted in a thermally conductive material 60 such as aluminum oxide AI 2 O 3 .
  • the emitter-reservoir housing 48 is affixed to the end thereof such as by brazing.
  • heat from the heater coil 58 is conducted to the activating material 50 thereby causing barium and barium oxide to migrate both along the interspace between the emitter-dispenser 42 and the activating material 50 and directly through the apertures 46 to the emitter surface of the emitter-dispenser 42 thereby continuously replenishing the activating material on the surface as it is used up during electron emission.
  • the strips 28 and 30 also provide thermal conductivity into the activating material 50 and to the emitter surface thereby providing for efficient operation of the overall device.

Abstract

An emitter-dispenser housing (48) for a controlled porosity dispenser cathode manufactured of a single material as a unitary piece by a chemical vapor deposition process in which a configured mandrel (20) is coated with a layer of material (36 and 40) such as tungsten, for example, so that when the mandrel (20) is removed from the coating of material (36), a hollow housing (48) is formed having a side wall (36 and 40) and an end wall (42) which define a reservoir (44). In addition, intersecting strips (28 and 30) of this same material as the coating, which had been placed in the mandrel (20), extend transversely across the reservoir (44) with the edges thereof bonded by atomic-crystalline growth to the coating (36 and 40) during the chemical vapor deposition to form a unitary piece. Thereafter, an array of apertures (46) is formed in the end wall (42) of the housing by laser drilling to create an emitter-dispenser (42).

Description

PCT WORLD INTELLECTUAL PROPERTY ORGANIZATION International Bureau
INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT)
(51) International Patent Classification 3 (11) International Publication Number: WO 84/ 01 H01J 1/28, 9/04 Al
(43) International Publication Date: 26 April 1984 (26.04
(21) International Application Number: PCT/US83/01572 (81) Designated States: DE (European patent), FR (E pean patent), GB (European patent), JP, NL (E
(22) International Filing Date: 6 October 1983 (06.10.83) pean patent), SE (European patent).
(31) Priority Application Number: 433,586 Published
With international search report.
(32) Priority Date: 12 October 1982 (12.10.82) Before the expiration of the time limit for amending claims and to be republished in the event of the rec
(33) Priority Country: US of amendments.
(71) Applicant: HUGHES AIRCRAFT COMPANY [US/
US]; 200 North Sepulveda Boulevard, El Segundo, CA 90245 (US).
(72) Inventors: FALCE, Louis, R. ; 13206-G Fiji Way, Marina Del Rey, CA 90291 (US). BREEZE, Glenn, S. ; 2222 West 248th Street, Lomita, CA 90717 (US).
(74) Agents: THOMPSON, Robert et al.; Hughes Aircraft Company, Post Office Box 1042, Bldg. C2, M.S. A126, El Segundo, CA 90245 (US).
(54) Title: CONTROLLED POROSITY DISPENSER CATHODE
(57) Abstract
An emitter-dispenser housing (48) for a controlled porosity dispenser cathode manufactured of a single material as a unitary piece by a chemical vapor deposition process in which a configured mandrel (20) is coated with a layer of material (36 and 40) such as tungsten, for example, so that when the mandrel (20) is removed from the coating of material (36), a hollow housing (48) is formed having a side wall (36 and 40) and an end wall (42) which define a reservoir (44). In addition, intersecting strips (28 and 30) of this same material as the coating, which had been placed in the mandrel (20), extend transversely across the reservoir (44) with the edges thereof bonded by atomic-crystalline growth to the coating (36 and 40) during the chemical vapor deposition to form a unitary piece. Thereafter, an array of apertures (46) is formed in the end wall (42) of the housing by laser drilling to create an emitter-dispenser (42).
FOR THE PURPOSES OF INFORMATION ONLY
Codes used to identify States party to the PCT on the front pages of pamphlets publishing international applications under the PCT.
AT Austria LI Liechtenstein AU Australia LK Sri Lanka
BE Belgium LU Luxembourg
BR Brazil MC Monaco
CF Central African Republic MG Madagascar
CG Congo MR Mauritania
CH Switzerland MW Malawi
CM Cameroon NL Netherlands
DE Germany, Federal Republic of NO Norway
OK Denmark RO Romania
FI Finland SE Sweden FR France SN Senegal
GA Gabon SU Soviet Union
GB United Kingdom TD Chad
HU Hungary TG Togo JP Japan US United States of America
KP Democratic Peopie's Republic of Korea
CONTROLLED POROSITY DISPENSER CATHODE
The Government has rights to this invention pursuant to Contract Number N00014-81-C-2245.
TECHNICAL FIELD This invention relates to control porosity dispenser cathodes and methods for making the same.
BACKGROUND OF THE INVENTION This invention is a further advance pertaining to the structure of and the method for fabricating controlled porosity dispenser cathodes.
Thermionic emission cathodes of the type that can be used in microwave tubes such as traveling wave tubes are, in many applications, required to have high reliability and long life. It is also desirable that all areas of the cathode surface be operated in a space charge limited mode for more stable operation.
Conventional cathodes, such as the "B", the "S" and the "M" types, are made of random porosity structures impregnated with barium calcium aluminate compounds and generally tend to provide a non-uniform emission over the surface of the cathode. The result is that excessive temperatures are required to assure that space charge limited emission is achieved in less active areas of the cathode surface. Consequently, the more active areas become excessively hot resulting in decreased reliability and shortened life. The end result is that emission is gradually reduced as the pores become depleted of the impregnant. Examples of these types of cathodes are disclosed in U.S. Patent No. 2,700,000, issued on January 18, 1955 to R. Levi et al and U.S. Patent No. 2,722,626, issued on November 1, 1955 to P. P. Coppola et al.
In order to attain the goals of long life and reliability, a number of approaches have heretofore been used. Previously, a thin layer of porous metal was formed directly on the emitting surface of the reservoir of activating material such as by evaporation in a vacuum, by electroplating or by vapor deposition. These approaches are disclosed in U.S. Patent No. 3,155,864, issued to P. P. Coppola on November 3, 1964 and in U.S. Patents Nos. 3,243,637 and 3,243,638 issued to J. H. Affleck III on March 29, 1966.
Shortcomings in these approaches are that the porosity of the emitter surface is random rather than precise and coating directly to the activating material could block many of the pores.
One of these more recent approaches is disclosed in U.S. Patent No. 4,101,800, issued on July 18, 1978 to R. E. Thomas wherein a reservoir of activating material is covered by a perforated metal foil. The perforations enable migration of electron emitting material from the reservoir of activating material to the foil surface to coat the surface thereby providing a cathode surface of somewhat uniform emissivity.
Subsequently, an advance was made in the fabri cation of such structures as disclosed in U.S. Patent No. 4,310,603, issued on January 12, 1982 to L. R. Falce. In this approach, a perforated metal foil having an appropriate pattern of pore size apertures therein is formed. Thereafter, this foil is bonded to a generally cylindrical housing such as by brazing, welding or diffusion bonding. Several disadvantages of this last approach are that: the high temperatures associated with the bonding process cause recrystallization of the foil material; the use of dissimilar brazing materials subject the foil surface to contaminates whereupon the foil has a non-uniform work function; and the braze material can block some of the apertures in the emitter surface. On top of this, the brazing or welding with unlike materials creates a distinct possibility that the bond will fail during thermal cycling. Moreover, fabrication of this kind of device requires a large number of hand processing steps.
SUMMARY OF THE INVENTION
In order to aid in the understanding of this invention, it can be stated in essentially summary form tha± it is directed to a structure for a controlled porosity dispenser cathode which is fabricated as a monolithic or integral piece essentially of a single material formed and integrally bonded together by a chemical vapor deposition process.
In essence, a mandrel is constructed of molybdenum with crossing slots formed in one end thereof. Tungsten strips are placed in these slots and are brazed in place with copper. The mandrel and strip assembly is then machined to the preferred configuration. Thereafter, the mandrel is placed in a chemical vapor deposition chamber and a thin coating of tungsten is deposited on the mandrel. Then, as required, the end of the mandrel is machined in a concave spherical radius configuration. At this time, the mandrel is returned to the depositon chamber where it receives an additional thin layer of tungsten. After some additional machining the mandrel is then removed such as by etching it away, thereby leaving the hollow housing of tungsten which will serve as a reservoir for an activating material. This housing then has an array of apertures drilled in the contoured top surface such as by a pulsed laser thereby creating a precisely porous emitter-dispenser surface.
At this time, the reservoir of the structure can be filled from the open end with a barium calcium aluminate compound or other barium bearing compound that will decompose when heated, thereby supplying activating material to the emitter-dispenser surface through the array of apertures.
The filled housing can then be attached to a heater structure to make a complete dispenser cathode. This housing is featured in that it is constructed of a single material wherein the crystalline-atomic bonding of the contoured top surface and the side walls of the housing forms an essentially monolithic or single piece. Several advantages include control over the crystalline orientation in the top surface member which becomes the emitter-dispenser surface and the fact that there is little likelihood of contaminates forming on the emission-dispenser surface during fabrication. Consequently, the work function of the surface is generally uniform whereupon there is a high degree of emission uniformity across this surface.
Another advantage is that the dispenser cathode can be operated at a lower temperature than other dispenser cathodes of the controlled porosity type as a result of the feature of the support-thermal cross members which tend to distribute the heat more deeply and uniformly into the activating material and to the emitter-dispenser surface. As a consequence, it is able to produce a higher emission density for a given temperature than was heretofore obtained and a more stable emission at these lower temperatures.
Moreover, at these lower temperatures there is a lower evaporation rate thereby resulting in a reduced loss of the activating material barium and barium oxide (Ba+BO) .
Still another advantage is that the structure is not likely to delaminate or fail during thermal cycling as a result of its unitary and single material construction. In addition, there is dimensional stability and lack of distortion in the emitter-dispenser surface which might otherwise result from thermal cycling.
The process and structure has the added manu facturing advantages that it: reduces the number of manufacturing steps; reduces the hand work required; is suitable for large scale production; allows very thin wall structures to be readily fabricated; and results in an easily replicated, precision structure. Further purposes and advantages of this invention will become apparent from the study of the following detailed description, the attached drawings and the claims.
BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a schematic perspective view of a mandrel onto which a thin layer of tungsten or other metal to be coated.
FIG. 2 is a schematic perspective view illustrating the cross member thermal-mechanical support brazed in place in the mandrel.
FIG. 3 is a schematic perspective view illustrating the mandrel machined to a configuration for chemical vapor deposition. FIG. 4 is a cross-sectional side view taken along the line 4-4 of FIG. 3 showing the mandrel having a thin layer of metal deposited thereon.
FIG. 5 is a cross-sectional view with the mandrel end surface contoured in a spherical radius, concave configuration.
FIG. 6 is a cross-sectional view illustrating a second thin layer of metal deposited thereon to form the emitter-dispenser surface and to thicken the side wall of the emitter-reservoir housing.
FIG. 7 is a cross-sectional view of the hollow emitter-reservoir housing with the mandrel removed. FIG. 8 is a cross-sectional view representing the housing of FIG. 7 with the emitter-dispenser surface thereof drilled to form an array of apertures.
FIG. 9 is a cross-sectional schematic illustration of a control porosity dispenser cathode including the housing filled with activating material and a heater assembly attached thereto.
DETAILED DESCRIPTION OF THE INVENTION
Referring now to the drawings in more detail, FIG. 1 is illustrative of a first step of fabrication in which a mandrel is formed having a configuration generally similar to the configuration of the final emitter-reservoir housing. In this particular embodiment, the mandrel 20 is cylindrical and is made of molybdenum. It should be understood that the mandrel could be made of other materials which are capable of withstanding the temperatures at which the subsequent fabrication steps take place and which are otherwise compatible with these steps. The end face 22 of the mandrel 20 is slotted with two inersecting slots 24 and 26 which extend into the body of the material at right angles to each other and are preferably both in a plane coextensive with or collaterial with the axis of the mandrel. In this particular embodiment, the slots 24 and 26 extend across the diameter of the mandrel.
As illustrated in FIG. 2, intersecting strips 28 and 30 of tungsten 0.002 inches thick, which will eventually form thermal-support members, are slotted (not shown) to interlock together at their crossing point and are inserted into the slots 24 and 26. These strips are of the same material that the remainder of the emitter-reservoir housing will be made from. While tunsten is used in the preferred embodiment, it could be of any other material which has an attractive work function and which is capable of withstanding the operating temperature of the control porosity dispenser cathode over extended periods of time. These strips 28 and 30 are brazed together and in place by copper brazing material 32.
Thereafter, as illustrated by FIG. 3, the mandrel 20 is machined down to remove the surplus brazing material 32 and the edges of the strips 28 and 30 which protrude beyond the side and end surfaces of the mandrel 20 so that the strip edges are flush with the surface of the mandrel. In addition, in this particular embodiment, a shoulder 34 is formed.
As illustrated by FIG. 4, the mandrel 20 is subjected to chemical vapor deposition process in which a tungsten coating 36 (not drawn to scale) 0.004 of an inch thick is formed on the mandrel surface. During this chemical vapor deposition step, the edges of the strips 28 and 30 atomically bond to the tungsten coating 36. This vapor deposition step can be accomplished in a quartz reaction chamber in which reactive gases of the tungsten metal compound will flow across the heated mandrel to form the deposited layer. Generally the heat for the mandrel can be supplied by an inductive type power supply and the flow rate of the gases can be controlled.
Thereafter, as illustrated by FIG. 5, end surface 22 of the mandrel is machined into a spherical-radius concave surface 38 such as by electrical discharge machining. The particular radius and shape of this surface 38 is dependent upon the end application of the cathode and the type of beam focusing to be used. Thus, this surface 38 could have been left flat or have other configurations for certain types of applications and beam focusing.
As illustrated by FIG. 6, another thin layer of tungsten 40 is formed upon the exposed surface of the first tungsten coating 36 and the exposed mandrel concave surface 38 by means of the chemical vapor deposition process. The term "thin" as used herein is about 0.001 of an inch thick in the preferred embodiment. However, it could also be somewhat less or somewhat greater depending upon the structural integrity of the layer or upon the ease at which the electron emitting material is to migrate to the emitting surface. For example, the range could be between about 0.0005 of an inch and 0.005 of an inch or, in some cases, more. Care must be taken to be sure that this layer is not so thin that the activating material will readily evaporate or so thick that the activating material will not readily migrate to the emitter surface through the pores to be formed. During the vapor deposition, the two layers of tungsten 36 and 40 bond together by atomic crystalline growth to form a monolithic or single piece of a single material with a somewhat thickened side wall. In addition, the tungsten coating which forms the concave emitter-dispenser 42 atomically bonds to the exposed edges of the strips 28 and 30 which form the mechanical- thermal supports. These strips serve to hold the thin wall emitter-dispenser 42 in its precise configuration and will subsequently serve to distribute heat into an activating material as well as to the emitter surface. As illustrated by FIG. 7, the end segment of the mandrel 20 holding the configured tungsten coating is cut off at about a plane coextensive with the lower edges of strips 28 and 30, and the molybdenum mandrel
20 is removed such as by a differential solvent thereby forming a hollow housing with a reservoir 44 formed therein. One differential solvent which has been found to be effective is nitric acid which etches the molybdenum and any remaining copper brazing material 32 but does not significantly affect the tungsten.
Of course, if, as previously stated, other materials are used for the mandrel 20, or the housing 48, it may be necessary to use another differential solvent. In addition, it would be possible to configure the mandrel 20 such that it can be readily withdrawn from the assembled housing. One way that this could be accomplished would be by tapering the side wall of the mandrel and coating it with graphite thereby enabling the mandrel to be easily withdrawn. Moreover, there are other possible approaches that can be used. As illustrated by FIG. 8, an array of apertures
46 is formed through the emitter-dispenser 42 in open communication with the reservoir 44. It is preferable that these apertures be of small diameter, closely spaced and in a precise pattern. Accordingly, one way that these apertures have been formed is by laser drilling in which apertures 5.0 microns in diameter on 15.0 micron centers have been formed. This results in a precisely porous emitter-dispenser 42. Thereafter, as further illustrated in FIG. 9 the reservoir 44 of the hollow emitter-dispenser housing 48 is filled with an activating material 50 through the open end thereof. One activating material 50 which has been found to be particularly useful is a mixture of 80% by weight of barium calcium aluminate having a 5:3:2 mole ratio and 20% by weight of tungsten powder. Of course, other barium bearing compounds that will decompose when heated to supply activating material to the emitter surface of the emitter-dispenser 42 can be used.
As further illustrated in FIG. 9, a controlled porosity dispenser cathode 52 is formed by attaching the filled emitter-dispenser housing 48 to a heater assembly 54. The heater assembly 54 includes a hollow support member 56 made of a high temperature material such as tungsten which encloses a heater coil 58 potted in a thermally conductive material 60 such as aluminum oxide AI2O3. The emitter-reservoir housing 48 is affixed to the end thereof such as by brazing. Thereafter, heat from the heater coil 58 is conducted to the activating material 50 thereby causing barium and barium oxide to migrate both along the interspace between the emitter-dispenser 42 and the activating material 50 and directly through the apertures 46 to the emitter surface of the emitter-dispenser 42 thereby continuously replenishing the activating material on the surface as it is used up during electron emission.
As previously stated, the strips 28 and 30 also provide thermal conductivity into the activating material 50 and to the emitter surface thereby providing for efficient operation of the overall device.
Thus, although the invention has been shown and described with respect to specific methods and embodiments, nevertheless, various changes and modifications obvious, to a person skilled in the art to which the invention pertains are deemed to lie within the purview of the invention.

Claims

CLAIMSWhat is Claimed is:
1. A method for fabricating a dispenser-reservoir housing (48) for a controlled porosity dispenser cathode (52) characterized by the steps of: coating the side surface and adjacent end surface (38) of a configured mandrel (20) with a first material (36 and 40) such that the coating of material atomically bonds together by means of crystalline growth into a unitary piece; removing the mandrel (20) to form a housing (48) of the first material having a side wall (36 and
40) and an end wall (42) which define a reservoir (44); and forming an array of apertures (46) through the end wall (42) in open communication with the reservoir (44) to form an emitter-dispenser surface.
2. The method of Claim 1 in which the step of coating the mandrel (20) includes: coating the mandrel (20) with a first layer (36) of the material; removing the first layer (36) of material from the end surface (38) of the mandrel (20); configuring the end surface (38) of the mandrel; and coating the mandrel (20) with a second layer (40) of the material which is bonded to the first layer (36) of the material by atomic-crystalline growth.
3. The method of Claim 1 in which the step of coating is by chemical vapor depositon.
4. The method of Claims 1 or 3 in which the coating material is tungsten.
5. The method of Claim 3 in which the coating material (40) on the end surface (38) of the mandrel (20) has a crystalline orientation which enhances uniform electron emission.
6. The method of Claim 1 including the step of positioning at least two intersecting strips (28 and 30) of a material that is the same as the coating material within the configured mandrel (20) such that their exposed edges atomically bond to the coating material
(36 and 40) to form an integral piece therewith extending transversely across the reservoir (44).
7. The method of Claim 1 in which the end surface (38) of the mandrel (20) is configured into a concave spherical surface.
8. The method of Claim 1 in which the array of apertures (46) are laser drilled.
9. The method of Claim 1 in which the step of removing the mandrel (20) is by differential etching which dissolves the material of the mandrel (20) but does not significantly etch the material of the housing (48).
PCT/US1983/001572 1982-10-12 1983-10-06 Controlled porosity dispenser cathode WO1984001664A1 (en)

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DE8383903655T DE3374738D1 (en) 1982-10-12 1983-10-06 Method for fabricating a dispenser-reservoir housing for a dispenser cathode

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DE (1) DE3374738D1 (en)
IL (1) IL69936A (en)
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WO (1) WO1984001664A1 (en)

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FR2659794A1 (en) * 1990-03-13 1991-09-20 Sansung Electrom Devices Co Lt Cathode impregnated with electron emissive material and its method of manufacture

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Publication number Priority date Publication date Assignee Title
JP4624980B2 (en) * 2003-02-14 2011-02-02 マッパー・リソグラフィー・アイピー・ビー.ブイ. Dispenser cathode
US9056432B2 (en) * 2012-04-25 2015-06-16 Johnson & Johnson Vision Care, Inc. High-density mask for three-dimensional substrates and methods for making the same

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US2786957A (en) * 1953-04-02 1957-03-26 Csf Emissive cathodes
US2864028A (en) * 1955-08-15 1958-12-09 Philips Corp Thermionic dispenser cathode
US2931934A (en) * 1955-02-05 1960-04-05 Egyesuelt Izzolampa Indirectly heated supply cathode
US4310603A (en) * 1978-11-30 1982-01-12 Varian Associates, Inc. Dispenser cathode
US4379979A (en) * 1981-02-06 1983-04-12 The United States Of America As Represented By The Secretary Of The Navy Controlled porosity sheet for thermionic dispenser cathode and method of manufacture

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JPS50150357A (en) * 1974-05-21 1975-12-02
GB2100502B (en) * 1978-11-30 1983-08-03 Varian Associates Dispenser cathodes

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2786957A (en) * 1953-04-02 1957-03-26 Csf Emissive cathodes
US2931934A (en) * 1955-02-05 1960-04-05 Egyesuelt Izzolampa Indirectly heated supply cathode
US2864028A (en) * 1955-08-15 1958-12-09 Philips Corp Thermionic dispenser cathode
US4310603A (en) * 1978-11-30 1982-01-12 Varian Associates, Inc. Dispenser cathode
US4379979A (en) * 1981-02-06 1983-04-12 The United States Of America As Represented By The Secretary Of The Navy Controlled porosity sheet for thermionic dispenser cathode and method of manufacture

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2659794A1 (en) * 1990-03-13 1991-09-20 Sansung Electrom Devices Co Lt Cathode impregnated with electron emissive material and its method of manufacture
NL9100272A (en) * 1990-03-13 1991-10-01 Samsung Electronic Devices IMPREGNATED CATHODE, AND METHOD OF MANUFACTURE THEREFOR.

Also Published As

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IT1172332B (en) 1987-06-18
EP0121564A1 (en) 1984-10-17
IL69936A (en) 1988-02-29
DE3374738D1 (en) 1988-01-07
JPS59501887A (en) 1984-11-08
EP0121564B1 (en) 1987-11-25
IT8349128A0 (en) 1983-10-10

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