US9818687B2 - Semiconductor module and method of manufacturing semiconductor module - Google Patents

Semiconductor module and method of manufacturing semiconductor module Download PDF

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Publication number
US9818687B2
US9818687B2 US15/177,658 US201615177658A US9818687B2 US 9818687 B2 US9818687 B2 US 9818687B2 US 201615177658 A US201615177658 A US 201615177658A US 9818687 B2 US9818687 B2 US 9818687B2
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insulating substrate
principal surface
conductive plate
ion gel
ionic liquid
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US15/177,658
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US20170025344A1 (en
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Naoyuki Kanai
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Fuji Electric Co Ltd
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Fuji Electric Co Ltd
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Assigned to FUJI ELECTRIC CO., LTD. reassignment FUJI ELECTRIC CO., LTD. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: KANAI, NAOYUKI
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Definitions

  • the present invention relates to a semiconductor module that includes a power semiconductor device and to a method of manufacturing the semiconductor module.
  • Semiconductor modules that include a power semiconductor device exhibit excellent power conversion efficiency and are widely used in renewable energy fields such as solar power generation and wind power generation, automobiles such as hybrid automobiles and electric automobiles, railway applications such as electric trains, and more.
  • a variety of protective measures are employed not only in the semiconductor device but also in the insulating substrate in order to prevent dielectric breakdown even if high voltages are applied.
  • Patent Document 1 discloses such a semiconductor device in which a protective treatment is applied to the insulating substrate.
  • This semiconductor device includes a power plate on which a semiconductor element is mounted; an insulating substrate on which the power plate is mounted; a filler that covers the surfaces of the semiconductor element, the power plate, and the insulating substrate; and a creeping breakdown prevention member that is arranged only between the edge regions of the power plate and the insulating substrate, that has a higher breakdown voltage than the filler, and that exhibits stronger adhesion with the insulating substrate than the filler.
  • this creeping breakdown prevention member has a higher relative permittivity than the filler (which is a silicone gel, for example) and alleviates concentration of electric fields at the edges of the power plate.
  • Specific examples of this surface damage prevention member include epoxy resins, epoxy resins in which aluminum oxide powder is mixed, epoxy resins in which aluminum nitride powder is mixed, epoxy resins in which mica powder is mixed, polyester resins, silicone gels in which aluminum oxide powder is mixed, silicone gels in which aluminum nitride powder is mixed, and silicone gels in which mica powder is mixed.
  • the relative permittivity of the creeping breakdown voltage prevention member disclosed in Patent Document 1 is only 8.8 (aluminum nitride) at best.
  • this type of material cannot be used to sufficiently reduce of the magnitude of the electric fields present.
  • reducing the thickness of the insulating substrate for example, only makes the insulating substrate more prone to creeping breakdown when exposed to stronger electric fields. Therefore, the thickness of the insulating substrate cannot be reduced, and meanwhile, using thick insulating substrates results in increased production costs.
  • the present invention aims to provide a semiconductor module that alleviates concentration of local electric fields at intersections between the principal surface of an insulating substrate and the side faces of a conductive plate arranged on the principal surface of the insulating substrate and that has an improved dielectric breakdown voltage, as well as a method of manufacturing such a semiconductor module. Accordingly, the present invention is directed to a scheme that substantially obviates one or more of the problems due to limitations and disadvantages of the related art.
  • the present disclosure provides aa semiconductor module, including: an insulated circuit board that includes an insulating substrate, a first conductive plate arranged on a first principal surface of the insulating substrate and within outer edges of the insulating substrate, and a second conductive plate arranged on a second principal surface of the insulating substrate and within the outer edges of the insulating substrate, the second principal surface opposing the first principal surface; an ion gel containing an ionic liquid and formed covering boundary edges of side faces of the first conductive plate where the side faces meet the first principal surface of the insulating substrate; a semiconductor device bonded on the first conductive plate; and a sealing material that covers the insulated circuit board, the ion gel, and the semiconductor device.
  • the ionic liquid contained in the ion gel moves within the ion gel according to the resulting electric potential gradient and gets distributed near the surface of the first conductive plate and/or near the surface of the insulating substrate at the intersections (boundary edges) between the first principal surface of the insulating substrate and the side faces of the first conductive plate, thereby terminating local lines of electric force.
  • This alleviates electric field concentration at the intersections and improves the dielectric breakdown voltage.
  • this improvement in the dielectric breakdown voltage of the insulating substrate makes it possible to reduce the thickness of the insulating substrate, thereby making it possible to reduce production costs.
  • the ion gel be a polymer resin gel material that contains an ambient temperature molten salt ionic liquid containing a combination of organic cations and organic anions or a combination of organic cations and inorganic anions. This makes it possible for the cations and anions in the ionic liquid to move within the polymer resin ion gel according to the electric potential gradient even at normal temperatures.
  • an amount of the ionic liquid mixed into the ion gel be set such that a resulting capacitance of the ion gel per unit area is greater than or equal to 1 ⁇ F/cm 2 and less than or equal to 20 ⁇ F/cm 2 . This makes it possible to terminate lines of electric force near the surface of the first conductive plate or near the surface of the insulating substrate.
  • the present disclosure provides a method of manufacturing a semiconductor module including an insulated circuit board that includes an insulating substrate, a first conductive plate arranged on a first principal surface of the insulating substrate and within outer edges of the insulating substrate, and a second conductive plate arranged on a second principal surface of the insulating substrate and within the outer edges of the insulating substrate, the second principal surface opposing the first principal surface, the method including: applying a precursor material of an ion gel containing an ionic liquid to boundary edges of side faces of the first conductive plate where the side faces meet the first principal surface of the insulating substrate; curing the precursor material of the ion gel, thereby forming the ion gel; bonding a semiconductor device on the first conductive plate; and covering the insulated circuit board, the ion gel, and the semiconductor device with a sealing material.
  • the intersections (boundary edges) between the first principal surface of the insulating substrate and the side faces of the first conductive plate are covered by the ion gel that contains the ionic liquid, thereby making it possible to alleviate electric field concentration near the insulating substrate and improve the dielectric breakdown voltage of the insulating substrate.
  • the precursor material of the ion gel containing the ionic liquid is applied using an inkjet method or a dispensing method. This makes it possible to reliably apply the ion gel covering the stair-shaped portion where the first principal surface of the insulating substrate and the side faces of the first conductive plate intersect, thereby making it possible to prevent formation of pinholes due to irregular application of the ion gel.
  • the ionic liquid contained in the ion gel moves within the ion gel according to the resulting electric potential gradient and gets distributed near the surface of the first conductive plate and/or near the surface of the insulating substrate at the intersections between the first principal surface of the insulating substrate and the side faces of the first conductive plate, thereby terminating local lines of electric force.
  • this improvement in the dielectric breakdown voltage of the insulating substrate makes it possible to reduce the thickness of the insulating substrate, thereby making it possible to reduce production costs.
  • FIG. 1 is a cross-sectional view illustrating a semiconductor module according to an embodiment of the present invention.
  • FIG. 2 illustrates a simulation model used in an electromagnetic field simulation.
  • FIG. 3 is a graph showing the relationship between the thickness of an insulating substrate 1 and the resulting electric field strength ratio at intersections A as obtained from an electromagnetic field simulation.
  • FIG. 4 is a graph showing the relationship between the relative permittivity of a sealing material 14 and the resulting electric field strength ratio at intersections A as obtained from an electromagnetic field simulation.
  • FIG. 5 illustrates an example of a method of manufacturing a semiconductor module according to the present invention.
  • FIG. 6 is a cross-sectional view illustrating a semiconductor module used in a dielectric breakdown voltage evaluation.
  • FIG. 1 is a cross-sectional view illustrating a semiconductor module according to an embodiment of the present invention.
  • This semiconductor module 100 includes an insulated circuit board 4 that includes an insulating substrate 1 , a first conductive plate 2 arranged on a first principal surface (top surface) of the insulating substrate 1 and within the outer edges of the insulating substrate 1 , and a second conductive plate 3 arranged within the outer edges of the insulating substrate on a second principal surface (the bottom surface) of the insulating substrate that faces the first principal surface. Furthermore, intersections A (which correspond to the edges of a conductor; boundary edges) between the first principal surface of the insulating substrate 1 and the side faces of the first conductive plate 2 are covered by an ion gel 5 that contains an ionic liquid.
  • a semiconductor device 7 is bonded to the first conductive plate 2 using solder 6
  • a base plate 9 that functions as a heat transfer surface is bonded to the second conductive plate 3 using solder 8 .
  • the semiconductor module 100 includes wires 10 that electrically connect the semiconductor device 7 to the first conductive plate 2 (or to another semiconductor device 7 (not illustrated in the figure)) and external connection terminals 11 .
  • the configuration described above is housed in a case 12 .
  • the case 12 is filled with a sealing material 14 and then sealed airtight using a lid 13 .
  • the first conductive plate 2 is divided into a plurality of island-shaped regions, and the semiconductor device 7 and the external connection terminals 11 are bonded to these regions to form an electrical circuit.
  • the second conductive plate 3 is thermally bonded to a cooler (not illustrated in the figure) via the solder 8 and the base plate 9 .
  • the second conductive plate 3 is grounded to ground potential or is set to a floating potential that is substantially equal to ground potential such that during operation of the circuit, a voltage is applied to prescribed island-shaped regions of the first conductive plate 2 .
  • the semiconductor device 7 is an N-channel insulated-gate bipolar transistor (IGBT).
  • IGBT insulated-gate bipolar transistor
  • a first conductive plate 2 a is connected to a collector electrode arranged on the rear surface of the semiconductor device 7 via the solder 6 and that a first conductive plate 2 b is connected to an emitter electrode arranged on the front surface of the semiconductor device 7 via the wires 10 .
  • the emitter electrode is grounded and a voltage is applied to the collector electrode.
  • the first conductive plate 2 b is grounded and a voltage is applied to the first conductive plate 2 a .
  • the electric field created at intersections B between the first principal surface of the insulating substrate 1 and the side faces of the first conductive plate 2 b that is connected to the emitter electrode is substantially equal to 0 in magnitude
  • the electric field created at the intersections A between the first principal surface of the insulating substrate 1 and the side faces of the first conductive plate 2 a can be very strong in some cases. For example, if a surge voltage is applied or a counter-electromotive force is generated due to the inductance of the collector, the applied voltage can become extremely high, which can in some cases cause dielectric breakdown starting at the intersections A.
  • conductor edges intersections A
  • electric field concentration The surface of a conductor is an equipotential surface, and lines of electric force must be orthogonal to all points on an equipotential surface. As a result, at the edges of the conductor, the lines of electric force bend and increase in density in order to remain orthogonal, which always creates a strong electric field at the conductor edges simply due to the geometry thereof.
  • the ion gel 5 is arranged along the intersections A (the points that become more prone to dielectric breakdown due to electric field concentration) between the first principal surface of the insulating substrate 1 and the side faces of the prescribed island-shaped regions of the first conductive plate 2 a to which a high voltage is applied, thereby alleviating electric field concentration at the points within the insulating substrate 1 that are in contact with the intersections A. This makes it possible to improve the dielectric breakdown voltage of the insulating substrate 1 .
  • the ion gel 5 may also be arranged along the intersections B between the first principal surface of the insulating substrate 1 and the side faces of the island-shaped regions of the first conductive plate 2 b.
  • the ion gel 5 may also be arranged along intersections A′ between the second principal surface of the insulating substrate 1 and the side faces of the second conductive plate 3 .
  • the ion gel 5 alleviates local electric field concentration in the insulating substrate 1 and thereby makes it possible to improve the dielectric breakdown voltage (as will be described in more detail later).
  • the insulating substrate 1 can withstand high voltage operation even when the thickness thereof is less than or equal to 1 mm (such as 0.625 mm), for example. Setting the thickness of the insulating substrate 1 to a value less than 1 mm makes it possible to reduce material costs.
  • the materials used for the first conductive plate 2 and the second conductive plate 3 are not particularly limited. However, it is preferable that metal materials with excellent electrical conductivity and thermal conductivity such as Cu, a Cu alloy, Al, or an Al alloy be used. (Note that a surface treatment such as Ni plating may also be applied in order to prevent rust or the like.)
  • the film thicknesses of the first conductive plate 2 and the second conductive plate 3 are not particularly limited. However, electrical resistance increases as thickness decreases, and bonding with the insulating substrate 1 becomes more difficult as thickness increases. Therefore, it is preferable that the film thicknesses be set to a value in the range of 0.1 mm to 1 mm.
  • the method used to bond the first conductive plate 2 and the second conductive plate 3 to the insulating substrate 1 is not particularly limited. Examples of suitable methods include direct copper bonding and active metal brazing, for example.
  • the insulated circuit board 4 in which the first conductive plate 2 and the second conductive plate 3 are bonded to the insulating substrate 1 is known as a DCB substrate or an AMB substrate according to which bonding method is used.
  • the first conductive plate 2 and the second conductive plate 3 are arranged within the outer edges of the insulating substrate 1 in order to increase the creepage distance from the first conductive plate 2 around the outer edges of the insulating substrate 1 to the second conductive plate 3 , thereby making the insulating substrate less prone to creeping breakdown due to creeping discharge.
  • the ion gel 5 is a gel material that contains an ionic liquid and is arranged covering the intersections A between the first principal surface of the insulating substrate 1 and the side faces of the first conductive plate 2 .
  • the ionic liquid is an ambient temperature molten salt made solely from ions and remains a liquid across a wide range of temperatures.
  • This ionic liquid contains a combination of organic cations and organic anions or a combination of organic cations and inorganic anions.
  • the ionic liquid used in one aspect of the present invention is made from cations such as imidazolium cations, pyridinium cations, or piperidinium cations and anions such as phosphonate anions, borate anions, or sulfonate anions because this type of ionic liquid exhibits a large capacitance per unit area.
  • imidazoliums examples include 1-ethyl-3-methylimidazolium bis(trifluoromethanesulfonyl)imide (EMIM TFSI), 1-ethyl-3-methylimidazolium bis(fluorosulfonyl)imide (EMIM FSI), 1-ethyl-3-methylimidazolium bis(pentafluorosulfonyl)imide (EMIM BETI), 1-ethyl-3-methylimidazolium dicyanamide (EMIM DCA), 1-ethyl-3-methylimidazolium tetrafluoroborate (EMIM BF4), and 1-butyl-3-methylimidazolium bis(trifluoromethylsulfonyl)imide (BMIM TFSI).
  • EMIM TFSI 1-ethyl-3-methylimidazolium bis(trifluoromethanesulfonyl)imide
  • EMIM FSI 1-ethyl-3-methylimi
  • pyridiniums examples include 1-butyl-3-methylpyridinium bis(trifluoromethylsulfonyl)imide (BMP TFSI).
  • piperidiniums examples include N-methyl-N-propylpiperidinium bis(trifluoromethanesulfonyl)imide (PP13 TFSI).
  • the gel material contained in the ionic liquid is not particularly limited.
  • examples include silicone polymers, poly(styrene-b-methyl methacrylate-b-styrene) triblock copolymers (PS-PMMA-PS), poly(styrene-b-ethylene oxide-b-styrene) triblock copolymers (PS-PEO-PS), and poly(vinylidene fluoride-co-hexafluoropropylene) copolymers (PVdF-HEP).
  • PS-PMMA-PS poly(styrene-b-methyl methacrylate-b-styrene) triblock copolymers
  • PS-PEO-PS poly(styrene-b-ethylene oxide-b-styrene) triblock copolymers
  • PVdF-HEP poly(vinylidene fluoride-co-hexafluoropropylene) copolymers
  • a crosslinking agent such as N,N,N′,N′-tetra(trifluoromethanesufonyl)-hexane-1,6
  • the capacitance of the ion gel 5 may be assumed to be determined by the surface density of the ionic liquid contained in the ion gel 5 and to not depend on the film thickness with which the ion gel 5 is applied. If the amount of ionic liquid is adjusted such that the resulting capacitance per unit area of the ion gel 5 is equal to 1 ⁇ F/cm 2 to 20 ⁇ F/cm 2 , then according to Gauss's law, the majority of the lines of electric force coming out of the surface of the first conductive plate 2 are terminated by an anion in the facing layer of the ionic liquid that sandwiches the electrical double layer. Similarly, the majority of the lines of electric force going into the insulating substrate 1 are terminated by a cation in the facing layer of the ionic liquid that sandwiches the electrical double layer.
  • Gauss's law refers to the physical law that states that if a charge exists within a region, the electric flux going into (or coming out of) that region is proportional to the net negative (or positive) electric charge within that region.
  • the semiconductor device 7 is not particularly limited. Examples of devices that can be used include devices such as metal-oxide-semiconductor field-effect transistors (MOSFETs), insulated-gate bipolar transistors (IGBTs), and Schottky barrier diodes (SBDs) formed in an Si substrate, an SiC substrate, a GaN substrate, or the like.
  • MOSFETs metal-oxide-semiconductor field-effect transistors
  • IGBTs insulated-gate bipolar transistors
  • SBDs Schottky barrier diodes
  • the material used for the base plate 9 is not particularly limited. However, it is preferable that a material that has high thermal conductivity and is not prone to warping even when subjected to high temperature processes such as soldering be used, such as a Cu plate or an Al—SiC plate, for example.
  • the material used for the wires 10 is not particularly limited. Al wires, Al-plated steel wires, or Cu wires may be used, for example.
  • the diameter of the wires is not particularly limited either. However, in high current applications, it is preferable that wires of 300 ⁇ m to 500 ⁇ m in diameter be used, for example.
  • a lead frame or a wiring substrate and conductive pins may be used to electrically connect the components and form a circuit.
  • thermoplastic resin such as a PPS resin or a PBS resin may be used, for example.
  • the material used for the sealing material 14 is not particularly limited.
  • FIG. 2 illustrates the simulation model used in this simulation.
  • the relative permittivity ⁇ 1 of the insulating substrate 1 was set to 8.1
  • the thickness t 1 of the insulating substrate 1 was set to 1 mm
  • the distance d 1 from the outer edges of the insulating substrate 1 to the intersections A on the first principal surface side was set to 0.7 mm
  • the distance d 2 from the outer edges of the insulating substrate 1 to the intersections A′ on the second principal surface side was set to 0.7 mm
  • the thicknesses t 2 and t 3 of the first conductive plate 2 and the second conductive plate 3 were both set to 0.3 mm
  • the relative permittivity ⁇ 14 of the sealing material 14 was set to 3.5.
  • the electric field strength at the intersections A in models in which the values of the above parameters were changed was compared to the electric field
  • FIG. 3 is a graph showing the relationship between the thickness t 1 of the insulating substrate 1 and the resulting electric field strength ratio at the intersections A. As the insulating substrate 1 decreases in thickness, the strength of the electric field increases. Moreover, the strength of the electric field begins to increase rapidly once the thickness of the insulating substrate 1 is less than 0.6 mm.
  • FIG. 4 is a graph showing the relationship between the relative permittivity ⁇ 14 of the sealing material 14 and the resulting electric field strength ratio at the intersections A. As the relative permittivity of the sealing material 14 increases, the electric field concentration at the intersections A is reduced. However, increasing the relative permittivity from 2.8 to 10 only decreases the electric field strength ratio from 1 to 0.75.
  • the reason that increasing the relative permittivity of the sealing material 14 reduces electric field concentration is because as the relative permittivity of the sealing material 14 increases, the number of characteristic lines of electric force through the sealing material 14 decreases in an inversely proportional manner relative to the relative permittivity. As a result, the lines of electric force that gather densely near the intersections A are pushed towards the regions in which there are fewer lines of electric force. This reduces the density of lines of electric force at the intersections A and thereby reduces electric field concentration.
  • the lines of electric force are only being redistributed rather than actually being shielded by an electrical double layer like when using the ion gel, and therefore the resulting reduction in the strength of the electric field is only marginal.
  • Patent Document 1 Japanese Patent No. 3703978
  • the ion gel 5 that contains the ionic liquid is arranged covering the intersections A. If a voltage that causes the first conductive plate 2 to take a higher electric potential than the second conductive plate 3 is applied, for example, the resulting lines of electric force will extend from the first conductive plate 2 towards the second conductive plate 3 . The anions in the ionic liquid then move to the interface between the first conductive plate 2 and the ion gel 5 , where an electrical double layer is formed due to the electric polarization between the surface charge of the first conductive plate 2 and the anions.
  • the majority of the lines of electric force coming out of the insulating substrate 1 will be terminated by the cations that moved to the interface between the ion gel 5 and the insulating substrate 1 .
  • the cations and anions are therefore distributed such that the concentration of electric fields at the intersections A is less pronounced, thereby making it possible to significantly reduce the strength of the electric fields near the intersections A.
  • the cations in the ionic liquid move to and form an electrical double layer at the interface between the first conductive plate 2 and the ion gel 5
  • the anions in the ionic liquid move to and form an electrical double layer at the interface between the ion gel 5 and the insulating substrate 1 .
  • the majority of the lines of electric force coming out of the first conductive plate 2 will be terminated by the cations that moved to the interface between the first conductive plate 2 and the ion gel 5 .
  • the majority of the lines of electric force coming out of the insulating substrate 1 will be terminated by the anions that moved to the interface between the ion gel 5 and the insulating substrate 1 .
  • the cations and anions are therefore distributed such that the concentration of electric fields at the intersections A is less pronounced, thereby making it possible to significantly reduce the strength of the electric fields near the intersections A.
  • the ion gel makes it possible to achieve such an excellent reduction in the strength of the electric field in comparison with conventional high relative permittivity materials are as follows.
  • the cations and anions in the ion gel can be moved freely to change the spatial charge distribution thereof.
  • the electrical double layers formed due to the accumulation of cations and anions at the respective interfaces make it possible to easily achieve a high capacitance of 1 ⁇ F/cm 2 to 20 ⁇ F/cm 2 at those interfaces, which cannot be achieved with conventional high relative permittivity materials. Therefore, the ion gel makes it possible to move the charges contained therein to the surfaces of the first conductive plate 2 and the insulating substrate 1 in order to form an electric field shield from the resulting high-density charge distribution of the ionic liquid.
  • the ion gel 5 alleviates electric field concentration caused by the geometry of the conductor edges, thereby making it possible to reduce dielectric breakdown of the insulating substrate 1 caused by breakdown currents that originate at the intersections A and flow through the insulating substrate 1 .
  • the ion gel 5 also makes it possible to reduce creeping breakdown caused by creeping discharges that propagate along the outer edges of the insulating substrate 1 .
  • a method of manufacturing the semiconductor module 100 may include: a step S 1 in which the insulated circuit board 4 is prepared; a step S 2 in which an ion gel precursor material that contains an ionic liquid is applied to the intersections A between the first principal surface of the insulating substrate 1 and the side faces of the first conductive plate 2 ; a step S 3 in which the ion gel precursor material is cured to form the ion gel 5 ; a step S 4 in which the semiconductor device 7 is bonded to the first conductive plate 2 (this step also includes bonding the base plate 9 to the second conductive plate 3 and bonding the wires 10 ); and a step S 5 in which the insulated circuit board, the ion gel, and the semiconductor device are covered with a sealing material.
  • the method used to form the ion gel 5 is not particularly limited. However, it is preferable that an ionic liquid, a gel material, and an organic solvent (such as acetone, ethyl acetate, or toluene) be mixed together to prepare an ion gel precursor material, and then that ion gel precursor material be formed as a film on the intersections A between the first principal surface of the insulating substrate 1 and the side faces of the first conductive plate 2 using a method such as a dispensing method or an inkjet method and then heat cured to form the ion gel 5 , for example.
  • a method such as a dispensing method or an inkjet method
  • the film thickness of the ion gel 5 be 0.1 to 2 mm and more preferable that the film thickness of the ion gel 5 be 0.1 to 1.0 mm, for example. Film thicknesses less than 0.1 mm make it difficult to completely cover the intersections A.
  • FIG. 6 is a cross-sectional view illustrating a dielectric breakdown voltage evaluation sample 200 .
  • An insulated circuit board 4 (a Denka AlN plate made by Denka Company Limited) in which an Al first conductive plate 2 and an Al second conductive plate 3 both 0.2 mm in thickness were respectively layered on both surfaces of an AlN insulating substrate 1 that was 1 mm in thickness was used.
  • the minimum distance (a first edge distance) from the outer edge of the insulating substrate 1 to the first conductive plate 2 was 1.5 mm
  • the minimum distance (a second edge distance) from the outer edge of the insulating substrate 1 to the second conductive plate 3 was 0.5 mm.
  • an ion gel precursor material was prepared by mixing together 1 part by mass 1-ethyl-3-methylimidazolium bis(trifluoromethanesulfonyl)imide (EMIM TFSI) as the ionic liquid, 5 parts by mass a poly(styrene-b-methyl methacrylate-b-styrene) triblock copolymer (PS-PMMA-PS) as the gel material, and 15 parts by mass ethyl acetate as a solvent.
  • This mixture was then applied to the intersections A between the first principal surface of the insulating substrate 1 and the side faces of the first conductive plate 2 using an inkjet printer and heat cured at 100° C. to form the ion gel 5 along the intersections A.
  • the insulated circuit board 4 was bonded to an Al—SiC base plate 9 (an Alsink made by Denka Company Limited) using Sn-40Pb solder (Nihon Handa Co., Ltd.) and housed inside a case 12 having an external connection terminal 11 .
  • the case 12 was then filled with a silicone gel sealing material 14 (TSE3051SK, made by Momentive Performance Materials Japan) and heat cured at 100° C. for 1 hour.
  • a lid 13 was fixed to the case 12 using an adhesive, thereby completing the dielectric breakdown voltage evaluation sample 200 . This sample was only used to evaluate dielectric breakdown voltage, and therefore a semiconductor device was not included in the configuration.
  • Working Example 2 was produced the same as Working Example 1 except in that the thickness of the AlN insulating substrate in the insulated circuit board 4 (a Denka AlN plate made by Denka Company Limited) was set to 0.625 mm.
  • Working Example 3 was produced the same as Working Example 1 except in that an insulated circuit board 4 (a Denka SN plate made by Denka Company Limited) that included an SiN insulating substrate with a thickness of 0.625 mm was used.
  • an insulated circuit board 4 (a Denka SN plate made by Denka Company Limited) that included an SiN insulating substrate with a thickness of 0.625 mm was used.
  • Comparative Example 1 was produced the same as Working Example 1 except in that the thickness of the AlN insulating substrate 1 was set to 0.625 mm and the ion gel 5 was not formed along the intersections A.
  • Table 1 shows the results of the dielectric breakdown voltage evaluation.
  • Working Example 1 (in which the thickness of the AlN substrate 1 was 1 mm) passed the dielectric breakdown evaluation.
  • Working Example 2 the thickness of the AlN substrate 1 was reduced to 0.625 mm.
  • concentration of the electric field was alleviated and the insulating substrate 1 did not exhibit any signs of dielectric breakdown. Therefore, Working Example 2 passed the dielectric breakdown evaluation as well.
  • Comparative Example 1 the ion gel 5 was not arranged along the intersections A.
  • Example 2 Example 3
  • Example 1 Material of insulating AlN AlN SiN AlN substrate 1 Thickness of insulating 1 0.625 0.625 0.625 substrate 1 (mm) Ion gel 5 used? Yes Yes Yes Yes No Dielectric breakdown Passed Passed Passed Failed voltage (AC voltage of 6 kV applied for 1 minute)

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