US8389304B2 - Method for producing group III nitride semiconductor light-emitting device - Google Patents
Method for producing group III nitride semiconductor light-emitting device Download PDFInfo
- Publication number
- US8389304B2 US8389304B2 US13/067,142 US201113067142A US8389304B2 US 8389304 B2 US8389304 B2 US 8389304B2 US 201113067142 A US201113067142 A US 201113067142A US 8389304 B2 US8389304 B2 US 8389304B2
- Authority
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- United States
- Prior art keywords
- type layer
- embossment
- stripe
- substrate
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related, expires
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 50
- 150000004767 nitrides Chemical class 0.000 title claims abstract description 43
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 29
- 239000000758 substrate Substances 0.000 claims abstract description 77
- 238000000034 method Methods 0.000 claims abstract description 25
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 claims abstract description 12
- 239000002994 raw material Substances 0.000 claims description 10
- 238000000347 anisotropic wet etching Methods 0.000 claims description 6
- 239000000203 mixture Substances 0.000 abstract description 16
- 239000010410 layer Substances 0.000 description 208
- 239000007789 gas Substances 0.000 description 31
- 239000013078 crystal Substances 0.000 description 8
- 238000001312 dry etching Methods 0.000 description 8
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000000605 extraction Methods 0.000 description 4
- 239000011229 interlayer Substances 0.000 description 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910052594 sapphire Inorganic materials 0.000 description 3
- 239000010980 sapphire Substances 0.000 description 3
- 238000011144 upstream manufacturing Methods 0.000 description 3
- 238000001039 wet etching Methods 0.000 description 3
- 229910002704 AlGaN Inorganic materials 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000005253 cladding Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 229910001316 Ag alloy Inorganic materials 0.000 description 1
- MHYQBXJRURFKIN-UHFFFAOYSA-N C1(C=CC=C1)[Mg] Chemical compound C1(C=CC=C1)[Mg] MHYQBXJRURFKIN-UHFFFAOYSA-N 0.000 description 1
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 1
- 239000011358 absorbing material Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 229910052795 boron group element Inorganic materials 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910000069 nitrogen hydride Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 229910052696 pnictogen Inorganic materials 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 1
- XCZXGTMEAKBVPV-UHFFFAOYSA-N trimethylgallium Chemical compound C[Ga](C)C XCZXGTMEAKBVPV-UHFFFAOYSA-N 0.000 description 1
- IBEFSUTVZWZJEL-UHFFFAOYSA-N trimethylindium Chemical compound C[In](C)C IBEFSUTVZWZJEL-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/20—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
- H01L33/24—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate of the light emitting region, e.g. non-planar junction
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
- H01L33/0062—Processes for devices with an active region comprising only III-V compounds
- H01L33/0066—Processes for devices with an active region comprising only III-V compounds with a substrate not being a III-V compound
- H01L33/007—Processes for devices with an active region comprising only III-V compounds with a substrate not being a III-V compound comprising nitride compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/0237—Materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/0237—Materials
- H01L21/02373—Group 14 semiconducting materials
- H01L21/02381—Silicon, silicon germanium, germanium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/02428—Structure
- H01L21/0243—Surface structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02436—Intermediate layers between substrates and deposited layers
- H01L21/02439—Materials
- H01L21/02455—Group 13/15 materials
- H01L21/02458—Nitrides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02436—Intermediate layers between substrates and deposited layers
- H01L21/02494—Structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02436—Intermediate layers between substrates and deposited layers
- H01L21/02516—Crystal orientation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02538—Group 13/15 materials
- H01L21/0254—Nitrides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02656—Special treatments
- H01L21/02658—Pretreatments
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/38—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
- H01L33/382—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape the electrode extending partially in or entirely through the semiconductor body
Definitions
- the n-type layer may be undulated so as to contour the embossment.
- the embossment may be provided only on the surface of the n-type layer on the side of the light-emitting layer.
- a p-type layer formed on the light-emitting layer may be undulated so as to contour the embossment, as in the case of the light-emitting layer.
- the surface of the p-type layer on the side opposite the side of the light-emitting layer may be a flat surface having no embossment.
- the direction of gas flow may be controlled by, for example, rotating the wafer in a plane parallel with the wafer so that the direction of gas flow is identical to the stripe direction.
- the angle of deflection of gas flow is controlled so as to fall within a range of ⁇ 30° to 30° with respect to a direction parallel with the direction of the stripe of the embossment, so that the n-type layer 102 , the light-emitting layer 103 , and the p-type layer 104 have more uniform thickness and composition.
- the substrate 201 has a flat surface (i.e., no embossment) on the side of the n-type layer 202 .
- a stripe-pattern embossment on an n-type layer may be carried out through another method; for example, a method in which a stripe-pattern mask is formed on a substrate, and an n-type layer is formed through selective growth on the substrate, to thereby form a stripe-pattern embossment on a surface of the n-type layer; or a method in which a flat n-type layer is processed directly by dry etching or a similar technique, to thereby form an embossment on the n-type layer, and another n-type layer is grown thereon so as to contour the embossment.
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Led Devices (AREA)
- Chemical Vapour Deposition (AREA)
- Weting (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010111947A JP5229270B2 (ja) | 2010-05-14 | 2010-05-14 | Iii族窒化物半導体発光素子の製造方法 |
JP2010-111947 | 2010-05-14 |
Publications (2)
Publication Number | Publication Date |
---|---|
US20110281381A1 US20110281381A1 (en) | 2011-11-17 |
US8389304B2 true US8389304B2 (en) | 2013-03-05 |
Family
ID=44912137
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US13/067,142 Expired - Fee Related US8389304B2 (en) | 2010-05-14 | 2011-05-11 | Method for producing group III nitride semiconductor light-emitting device |
Country Status (2)
Country | Link |
---|---|
US (1) | US8389304B2 (ja) |
JP (1) | JP5229270B2 (ja) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5533791B2 (ja) * | 2011-06-20 | 2014-06-25 | 豊田合成株式会社 | Iii族窒化物半導体発光素子の製造方法 |
CN103137816B (zh) | 2011-12-03 | 2015-09-30 | 清华大学 | 发光二极管 |
JP5980668B2 (ja) * | 2011-12-03 | 2016-08-31 | ツィンファ ユニバーシティ | 発光ダイオード |
CN103137803B (zh) * | 2011-12-03 | 2015-08-26 | 清华大学 | 发光二极管 |
CN103137804B (zh) | 2011-12-03 | 2015-09-30 | 清华大学 | 发光二极管 |
JP5980667B2 (ja) * | 2011-12-03 | 2016-08-31 | ツィンファ ユニバーシティ | 発光ダイオード |
CN103137812B (zh) * | 2011-12-03 | 2015-11-25 | 清华大学 | 发光二极管 |
CN103137811B (zh) | 2011-12-03 | 2015-11-25 | 清华大学 | 发光二极管 |
JP5980669B2 (ja) * | 2011-12-03 | 2016-08-31 | ツィンファ ユニバーシティ | 発光ダイオード |
JP2013232478A (ja) * | 2012-04-27 | 2013-11-14 | Toshiba Corp | 半導体発光装置及びその製造方法 |
CN102842660B (zh) * | 2012-08-17 | 2015-11-11 | 圆融光电科技有限公司 | 一种氮化镓基发光二极管外延片结构及其制备方法 |
CN102842659B (zh) * | 2012-08-17 | 2015-12-09 | 圆融光电科技有限公司 | 一种氮化镓系半导体发光器件外延片的制作方法 |
JP2014060198A (ja) * | 2012-09-14 | 2014-04-03 | Oki Electric Ind Co Ltd | 窒化物半導体発光ダイオードの製造方法、及び窒化物半導体発光ダイオード |
JP6486726B2 (ja) * | 2015-03-10 | 2019-03-20 | シチズン時計株式会社 | 発光モジュール |
GB2540385B (en) * | 2015-07-15 | 2017-10-11 | C4 Carbides Ltd | Improvements in or relating to tool blades and their manufacture |
CN105489724B (zh) * | 2016-01-18 | 2018-11-20 | 厦门市三安光电科技有限公司 | 一种半极性led外延结构及其制备方法 |
JP6785455B2 (ja) * | 2018-05-11 | 2020-11-18 | パナソニックIpマネジメント株式会社 | 発光ダイオード素子、及び発光ダイオード素子の製造方法 |
CN110571311B (zh) * | 2019-07-30 | 2021-12-14 | 中国科学技术大学 | 一种多量子阱结构、光电器件外延片及光电器件 |
CN117059718A (zh) * | 2021-11-19 | 2023-11-14 | 厦门市三安光电科技有限公司 | 一种发光二极管 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6429032B1 (en) * | 1999-01-12 | 2002-08-06 | Sony Corporation | Nitride semiconductor and a method thereof, a nitride semiconductor device and a method thereof |
JP2003092426A (ja) | 2001-09-18 | 2003-03-28 | Nichia Chem Ind Ltd | 窒化物系化合物半導体発光素子およびその製造方法 |
JP2008130606A (ja) | 2006-11-16 | 2008-06-05 | Sony Corp | 半導体発光素子、半導体発光素子の製造方法、光源セルユニット、バックライト、照明装置、ディスプレイ、電子機器、半導体素子および半導体素子の製造方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1023846A (ja) * | 1996-07-09 | 1998-01-27 | Sachie Suzuki | 釣り針の糸端色付き |
JPH11340153A (ja) * | 1998-05-28 | 1999-12-10 | Toyoda Gosei Co Ltd | 化合物半導体の気相成長装置 |
JP3705142B2 (ja) * | 2001-03-27 | 2005-10-12 | ソニー株式会社 | 窒化物半導体素子及びその作製方法 |
JP2005011944A (ja) * | 2003-06-18 | 2005-01-13 | Sumitomo Electric Ind Ltd | 発光装置 |
JP2007081368A (ja) * | 2004-06-14 | 2007-03-29 | Mitsubishi Cable Ind Ltd | 窒化物系半導体発光素子 |
EP1984545A4 (en) * | 2006-02-17 | 2013-05-15 | Univ California | PROCESS FOR THE PRODUCTION OF N-TYPE SEMIPOLAR OPTOELECTRONIC DEVICES (AL, IN, GA, B) |
JP2007266577A (ja) * | 2006-03-03 | 2007-10-11 | Matsushita Electric Ind Co Ltd | 窒化物半導体装置及びその製造方法 |
-
2010
- 2010-05-14 JP JP2010111947A patent/JP5229270B2/ja not_active Expired - Fee Related
-
2011
- 2011-05-11 US US13/067,142 patent/US8389304B2/en not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6429032B1 (en) * | 1999-01-12 | 2002-08-06 | Sony Corporation | Nitride semiconductor and a method thereof, a nitride semiconductor device and a method thereof |
JP2003092426A (ja) | 2001-09-18 | 2003-03-28 | Nichia Chem Ind Ltd | 窒化物系化合物半導体発光素子およびその製造方法 |
JP2008130606A (ja) | 2006-11-16 | 2008-06-05 | Sony Corp | 半導体発光素子、半導体発光素子の製造方法、光源セルユニット、バックライト、照明装置、ディスプレイ、電子機器、半導体素子および半導体素子の製造方法 |
Also Published As
Publication number | Publication date |
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US20110281381A1 (en) | 2011-11-17 |
JP5229270B2 (ja) | 2013-07-03 |
JP2011243616A (ja) | 2011-12-01 |
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