US3924126A - Electron microscopes - Google Patents

Electron microscopes Download PDF

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Publication number
US3924126A
US3924126A US483126A US48312674A US3924126A US 3924126 A US3924126 A US 3924126A US 483126 A US483126 A US 483126A US 48312674 A US48312674 A US 48312674A US 3924126 A US3924126 A US 3924126A
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Prior art keywords
pole pieces
plate
gaps
specimen
condenser
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Expired - Lifetime
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US483126A
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English (en)
Inventor
Kenneth Anderson
Kenneth Arthur Brookes
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Associated Electrical Industries Ltd
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Associated Electrical Industries Ltd
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/295—Electron or ion diffraction tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/14—Lenses magnetic
    • H01J37/141—Electromagnetic lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation

Definitions

  • ABSTRACT [30] Foreign A li ti P i it D t A combined condenser and objective electric lens for June 28 1973 United Kingdom” 30764/73 an electron microscope is disclosed.
  • the lens includes two apertured wound pole pieces and an apertured 52 US. Cl 250/311- 250/396 Plate between them the P016 Pieces and Plate having 51 Int. Cl. 110m 37/26 axial aperturesaxial spaces between the Plate 58 Field of Search 250/396 397 307 311 and Pole Pieces define d ser and objective gaps, 250/310 1 1 the specimen being positionable in the objective gap.
  • the pole pieces are oppositely wound to [56] References Cited generate opposing flux which tends to cancel in the UNITED STATES PATENTS plate, avoiding'magnetic saturation of the plate.
  • the specimen by a condenser lens.
  • the specimen is usually, situated within the magnetic field of an objective lens which forms, with the electrons transmitted through the specimen, a magnified image of the specimen. This image is then projected by one or more projector lenses I onto a fluorescent screen.
  • the intensity of illumination of the specimen i.e., the electron current density
  • the condenser lens is controlled by the condenser lens, being at a maximum when the condenser lens is set so as to form a focused image of the illumination source on the specimen.
  • the current density can be reduced by either reducing the gun brightness, reducing the size of the condenser aperture, or by spreading the illumination over a larger area by changing the focus of the condenser lens, this latter being the normal method for frequent changes.
  • the minimum probe size i.e., size of the area illuminated at the specimen
  • the probe size is given by the product of initial source size and condenser lens magnification.
  • the working distance of the condenser lens i.e., the distance from condenser lens to specimen
  • the working distance of the condenser lens is usually comparable to the 'distance from condenser lens to the source so that 'the condenser lens magnification is approximately unity, giving a probe size of the same order as the source size, e.g., of the order of 50 microns for a thermionic hairpin source.
  • the present invention provides an improved electron microscope with a combined condenser and objective lens in which the condenser and objective lenses are separately provided with energising coils and in which the combined lens includes an apertured plate which is clamped so as to separate the condenser and objective lens.
  • the condenser lens portion of the combined lens can thus be used with a very short working distance, since the condenser and objective lenses are separated only by the thickness of the apertured plate.
  • the apertured plate should preferably be made as thin as possible. However, there is a limit to how thin this plate can be made, since if it is made too thin magnetic saturation will tend to occur within the plate.
  • This difficulty is overcome in a preferred form of the invention by providing a power supply for energising the magnetic coils, the power supply being so arranged that the magnetic fluxes induced by the coils fiow in opposite senses through the apertured plate, thereby tending to cancel each other out within the plate. This reduces the net magnetic flux within the plate and therefore permits the plate to be thinner than it could otherwise have been.
  • FIG. 1 is a schematic sectional elevation of the microscope, including a combined condenser and objective lens, which is shown in somewhat simplified form in this Figure;
  • FIG. 2 is a sectional elevation of the combined condenser and objective lens in greater detail.
  • FIG. 3 is a sectional elevation illustrating a modified form of the combined lens of FIG. 2.
  • the microscope basically comprises an elongated evacuable column 10, constructed from a number of lens elements 11, 12 and 13 and a number of tubular spacing members 14, clamped together by suitable means.
  • the axis of the column is indicated in the drawing by the reference numeral 15.
  • An electron gun 16 is positioned at one end of the column, and comprises a V-shaped tungsten filament 17 surrounded by a cup-shaped anode 18. In operation, electrons are emitted thermionically from the filament 17 and are accelerated along the direction of the axis by virtue of a positive voltage applied to the anode with respect to the filament.
  • the electrons from the gun 16 are focused by means of the lens element 11, which is referred to as the first condenser lens.
  • This lens 11 is an electromagnetic electron optical lens, and since such lenses are well known in the art, it will not be described in detail herein. Briefly, however, this lens comprises a magnetic iron structure 19 which defines a gap 20, and contains a magnetic coil 21. When the coil 21 is energised, a magnetic flux is produced within the iron 19 and across the gap 20. It is this magnetic field within the gap which has the focusing effect on the electrons. in operation,
  • the lens 11 acts to form a demagnified electron image of the emitting tip of the tungsten filament 17, the position of this image being indicated by the reference numeral 22 in the drawing.
  • the combined lens 12 comprises two tubular iron pole pieces 23 and 24, the bores of which are aligned with the axis 15. Between these pole pieces is positioned an iron plate 25, having an aperture 26 formed therein, this aperture also being aligned with the axis 15.
  • the two pole pieces 23 and 24 and the apertured plate 25 thus define two gaps, which respectively serve as the second condenser lens gap 27 and the objective lens gap 28.
  • the pole pieces 23, 24 and the plate 25 are magnetically coupled by means of tubular iron members 29, 30, formed integrally with the respective pole pieces and providing a magnetic yoke for the combined lens.
  • Separate magnetic coils 31 and 32 are positioned within the members 29, 30, and it will be seen that energisation of these coils 31 and 32 respectively produce magnetic fields in the second condenser lens gap 27 and the objective lens gap 28.
  • Power supply means for the magnetic coils 31, 32 is shown diagrammatically at 40 and may be for example a switched controllable d.c. supply.
  • the magnetic coils 31, 32 are connected to the power supply 40 by respective pairs of conductors 41, 42.
  • a specimen holder 33 is provided for supporting a specimen for examination in the microscope in the objective lens gap 28.
  • Vacuum pumping means is shown diagrammatically at 43 which may be any suitable commercial vacuum pump such as an oil diffusion pump backed by a rotary pump.
  • the energisation current in the second condenser lens coil 31 is set at a value such that the magnetic field in the second condenser lens gap 27 focuses the electrons from the first condenser lens 11, so as to produce a greatly demagnified electron image of the image 22, on the surface of the specimen in the specimen holder 33.
  • the large demagnification of the second condenser lens is possible because of the very short working distance of this lens, which in turn is due to the fact that the second condenser lens and the objective lens effectively share a common pole piece, i.e., the plate 25, and are therefore separated only by the thickness of that plate.
  • the short working distance reduces the spherical aberration in the second condenser lens.
  • the second condenser lens forms a very fine probe for illuminating the specimen.
  • the size of this probe is of the order of 0.1 micron.
  • the energisation current in the objective lens coil 32 is set at a value such that the magnetic field within the objective lens gap 28 focuses those electrons which pass through the specimen to form a magnified intermediate image 34 of the area of the specimen which is illuminated by the probe.
  • the lens 13 acts as a projector lens for further magnifying this image 34 to produce a final image on a fluorescent viewing screen 35 at the lower end of the microscope column.
  • the projector lens 13 will not be described in detail herein, since such lenses are well known in the art. It should be appreciated. however, that in other embodiments of the invention, a plurality of projector lens may be employed, instead of one as shown in the drawing.
  • FIG. 1 shows the structure of the combined condenser and objective lens 12 in somewhat simplified form in FIG. 1.
  • FIG. 2 shows the combined lens 12 in greater detail and on an enlarged scale.
  • the plate 25 is not flat as shown in FIG. 1, but is dished so as to leave more room for a mechanism 36 for positioning the specimen support 33.
  • the thickness of the plate 25 must be sufficient to carry the magnetic flux entering this plate from the rest of the iron circuit (constituted by the pole pieces 23, 24 and the magnetic yoke 29, 30) without the material of the plate 25 being taken into magnetic saturation.
  • the magnetic flux lines from the pole pieces 23, 24 to the plate 25 enter the plate over all its surface so that the flux within the plate increases in the radially outward direction with increasing distance from the axis 15.
  • the minimum thickness of the plate depends on the distance from the lens axis. In practice, however, a uniform thickness may be used.
  • a reduction in the thickness of the plate 25, and hence of the working distance of the second condenser lens, is achieved by arranging for the excitation currents in the second condenser and objective coils 29 and 30 to be in such senses that the magnetic fluxes in the gaps 27 and 28 are in the same direction.
  • the fluxes in the plate 25 due to these two coils will be in opposite senses, and will therefore tend to cancel each other out, thereby resulting in a very small resultant flux in the plate.
  • By suitable choice of the geometries of the gaps 2'7, 28 it is possible to balance these fluxes almost exactly so that the resulting flux is almost zero. It is not possible, however, to achieve an exact balance under all working conditions because it is required that the currents in the two coils should be independently adjustable. Nevertheless, a substantial reduction in magnetic flux, and hence in thickness of the plate 25, can still be achieved by this means.
  • four pairs of beam deflector coils (only two pairs visible in the drawing) 37 are positioned within the bore of the pole piece 23. These coils permit the electron beam to be displaced so as to permit adjustment of the beam lateral position and direction at the specimen.
  • the beam deflector coils can also be used to scan the probe over the specimen in a raster pattern, so as to permit the microscope to be used in a scanning mode.
  • the combined lens also includes an X-ray detector 38 positioned between the plate 25 and the condenser coil 31, for detecting X-rays emitted from the illuminated spot of the specimen, thereby enabling an X-ray analysis of the specimen to be performed. Placing the X-ray detector in this position ensures that it is close to the specimen as is required for good X-ray detection sensitivity and has the further advantage that the magnetic field in the gap 27 through which the X-rays pass to the detector 38 acts as a filter against secondary electrons emitted from the specimen, thus preventing these electrons from reaching the detector and giving rise to spurious signals.
  • the X rays emerge through the aperture 26 in the plate 25,and hence this aperture must be made large enough to give a direct line of sight from the specimen to the detector 28.
  • This has the disadvantage of allowing the fields in the gaps 27 and 28 to overlap to come extent, thus upsetting the independence of the focusing of the second condenser and objective lenses.
  • the condenser portion of the field does not penetrate the gap 28 significantly beyond the specimen, this is not too serious, since the method of operation can be adopted of first adjusting the current in the coil 32 so as to focus the image, allowing the focusing of the probe to be slightly affected, and then adjusting the current in the coil 31 so as to focus'the probe, this latter adjustment having little effect on the focusing of the image.
  • the aperture 26 in the plate 25 is reduced to as small a size as is feasible, so as to minimise overlapping of the fields in the gaps 27, 28.
  • the smallest aperture is typically of the order of 1 millimetre.
  • a suitable thickness for the plate 25 in the region of the aperture 26 would then be of the order of 2 millimetres.
  • the aperture 26 is too small to permit X- rays to pass from the specimen to the detector 28.
  • an auxiliary aperture 39 is bored in the plate 25 in line between the specimenand the X-ray detector 38. It is important to preserve circular symmetry in the region of the aperture 26, in order to avoid introducing astigmatism or similar aberrations, and for this reason at least three such auxiliary apertures 39 are formed, equally angularly spaced about the axis 15. In the preferred embodiment illustrated :in FIG. 3, four such auxiliary apertures are used; one for the extraction of X- rays and the other three to preserve symmetry.
  • more than one X-ray detector may be used, each receiving X-rays through one or more of the exit holes.
  • an annular X-ray detector could be used in conjunction with a number of exit holes or slots, provided always that the number of such holes or'slots is not such as to reduce the iron cross section to 'such an extent that the iron goes into magnetic saturation.
  • the electron microscope of FIG. 1 can also be used in a limited-area electron diffraction mode.
  • This mode involves the formation of an electron diffraction pattern from a small area of the specimen, the area being selected by first of all viewing the specimen in the normal imaging mode.
  • the area can be selected by use of an aperture in the plane of the intermediate image 34 of the specimen, for areas down to about 1 micron in diameter, but the aberration of the objective lens generally prevents this method from being used for areas much smaller than this.
  • the area can be selected by reducing the area illuminated by the probe.
  • the combined condenser-objective lens 12 enables the probe area to be reduced to down to a few hundred angstroms diameter.
  • a combined condenser and objective lens for an electron microscope comprising:
  • first and second pole pieces a. first and second pole pieces, said pole pieces defining, respectively, first and] second apertures, said first and second apertures being aligned on a common axis;
  • a third, relatively thin pole piece disposd intermediate of and spaced from said first and second pole I pieces for defining respective condenser and objective lens gaps between the first, third, and second pole pieces, said third pole piece defining a third aperture aligned with said common axis;
  • power supply means for inducing, in operation of said combined lens, magnetic flux through said magnetic yoke and across said first and second gaps, respectively,
  • an X-ray detector disposed adjacent the side of said third pole piece nearer to said first winding and offset from said common axis, to receive, in operation of the combined lens, X-rays emitted from the specimen in response to electrons focused by the first gap and passing through said third aperture.
  • said third pole piece is a plate which defines a plurality of additional apertures which are arranged symmetrically around said common axis.
  • An electron microscope comprising:
  • a combined condenser and objective lens comprising:
  • first and second pole pieces i. first and second pole pieces, said pole pieces defining, respectively, first and second apertures, said first and second apertures being aligned on a common axis;
  • a relatively thin magnetic plate positioned between said first and second pole pieces, said plate defining a third aperture, said third aperture being also aligned on said common axis, said first and second pole pieces and said plate thereby defining first and second gaps between said first and second pole pieces and said plate, respectively, said first and second gaps serving as condenser and objective lens gaps, respectively;
  • a power supply for inducing, in operation of said combined lens, magnetic flux through said magnetic yoke and across said first and second gaps, respectively,
  • mounting structure for mounting a specimen within said second gap so that said specimen may be illuminated by the electron beam from said electron gun.
  • said power supply being connected to said first and second windings to actuate said first and second windings to produce magnetic flux in said plate in directions having opposing components.
  • a combined condenser and objective lens for an electron microscope comprising:
  • first and second pole pieces a. first and second pole pieces, said pole pieces defining, respectively, first and second apertures, said first and second apertures being aligned on a common axis;
  • a plate positioned between said first and second pole pieces, said plate defining a third aperture, said third aperture being also aligned on said common axis, said first and second pole pieces and said plate thereby defining respective first and second gaps between said first and second pole pieces and said plate, respectively, said first and second gaps serving as condenser and objective lens gaps, respectively;
  • the thickness of said plate is selected as substantially the minimum thickness for preventing magnetic saturation of the plate for the level of flux produced within the plate during operation of the microscope.
  • said windings and said power supply are electrically connected to cause said magnetic flux across said first and second gaps, respectively, to have directional components extending in opposite directions.
  • a combined condenser and objective lens for an electron microscope comprising:
  • first and second pole pieces defining, respectively, first and second apertures which are aligned along a common axis
  • a third, relatively thin pole piece disposed intermediate of and spaced from said first and second pole pieces for defining respective condenser and objective lens gaps between the first, third, and second pole pieces, said third pole piece defining a third aperture aligned with said common axis;
  • the thickness of said third pole piece is selected to provide minimum values for said gaps and is further selected in accordance with said inducing means for assuring that the third pole piece does not become magnetically saturated during operation.
  • An electron microscope comprising: a. a specimen holder; b. a housing defining a chamber in which said specimen holder is located; c. pumping means for evacuating said chamber; d. an electron gun for directing an electron beam toward said specimen; e. a combined condenser and objective lens, comprising:
  • first and second pole pieces i. first and second pole pieces, said pole pieces defining, respectively, first and second apertures, said first and second apertures being aligned on a common axis;
  • a plate positioned between said first and second pole pieces, said plate defining a third aperture aligned on said common axis and a plurality of additional apertures arranged symmetrically around the common axis, said first and second pole pieces and said plate thereby defining first and second gaps between said first and second pole pieces and said plate, respectively, said first and second gaps serving as condenser and objective lens gaps, respectively;
  • a power supply for inducing, in operation of said combined lens, magnetic flux through said magnetic yoke and across said first and second gaps, respectively;
  • an X-ray detector disposed adjacent the side of said said specimen in response to impinging electrons.

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
US483126A 1973-06-28 1974-06-26 Electron microscopes Expired - Lifetime US3924126A (en)

Applications Claiming Priority (1)

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GB3076473A GB1420803A (en) 1973-06-28 1973-06-28 Electron microscopes

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US (1) US3924126A (de)
JP (1) JPS5034462A (de)
DE (1) DE2430696A1 (de)
GB (1) GB1420803A (de)
NL (1) NL7408601A (de)

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4214162A (en) * 1975-09-19 1980-07-22 Max-Planck-Gesellschaft Zur Forderung Der Wissenschaften E.V. Corpuscular beam microscope for ring segment focusing
US4315152A (en) * 1977-03-23 1982-02-09 National Research Development Corporation Electron beam apparatus
FR2498011A1 (fr) * 1981-01-14 1982-07-16 Jeol Ltd Objectif magnetique a utiliser dans un microscope electronique a balayage
FR2499313A1 (fr) * 1981-01-30 1982-08-06 Philips Nv Microscope electronique comportant un detecteur de rayons x
US4475044A (en) * 1979-04-23 1984-10-02 Hitachi, Ltd. Apparatus for focus-deflecting a charged particle beam
US4633085A (en) * 1984-04-17 1986-12-30 Jeol Ltd. Transmission-type electron microscope
US4910399A (en) * 1988-04-01 1990-03-20 Jeol Ltd. Electron microscope having X-ray detector
US4962306A (en) * 1989-12-04 1990-10-09 Intenational Business Machines Corporation Magnetically filtered low loss scanning electron microscopy
WO1991003832A1 (en) * 1989-08-31 1991-03-21 Bell Communications Research, Inc. Electron microscope with an asymmetrical immersion lens
US5013913A (en) * 1988-07-23 1991-05-07 Carl-Zeiss-Stiftung Method of illuminating an object in a transmission electron microscope
US20070145287A1 (en) * 2005-12-09 2007-06-28 Lee, Bing-Huan Specimen box for electron microscope capable of observing general specimen and live cell
US20090114818A1 (en) * 2005-09-06 2009-05-07 Carl Zeiss Smt Ag Particle-Optical Component
US20100148064A1 (en) * 2008-12-12 2010-06-17 Fei Company X-ray detector for electron microscope
US20120160999A1 (en) * 2010-03-26 2012-06-28 Uchicago Argonne, Llc High collection efficiency x-ray spectrometer system with integrated electron beam stop, electron detector and x-ray detector for use on electron-optical beam lines and microscopes
US20120326030A1 (en) * 2010-12-27 2012-12-27 Carl Zeiss Nts Gmbh Particle Beam Microscope
WO2014123701A1 (en) 2013-02-11 2014-08-14 Novaray Medical, Inc. Method and apparatus for generation of a uniform-profile particle beam

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58161235A (ja) * 1982-03-19 1983-09-24 Internatl Precision Inc 走査型電子線装置
JP2744823B2 (ja) * 1989-11-16 1998-04-28 日本電子株式会社 電子レンズ

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2323328A (en) * 1940-10-31 1943-07-06 Rca Corp Projection lens for electron microscopes
US2418349A (en) * 1945-12-13 1947-04-01 Rca Corp Method of and means for correcting for distortion in electron lens systems
US3508049A (en) * 1967-02-27 1970-04-21 Max Planck Gesellschaft Corpuscular-ray microscope with an objective lens which also forms a condenser-lens field
US3514600A (en) * 1967-11-20 1970-05-26 Parke Davis & Co Flexible conduit means for connecting an electron microscope to a vacuum pump
US3851172A (en) * 1971-12-15 1974-11-26 Hitachi Ltd Compound electron lens for electron microscope and the like

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2323328A (en) * 1940-10-31 1943-07-06 Rca Corp Projection lens for electron microscopes
US2418349A (en) * 1945-12-13 1947-04-01 Rca Corp Method of and means for correcting for distortion in electron lens systems
US3508049A (en) * 1967-02-27 1970-04-21 Max Planck Gesellschaft Corpuscular-ray microscope with an objective lens which also forms a condenser-lens field
US3514600A (en) * 1967-11-20 1970-05-26 Parke Davis & Co Flexible conduit means for connecting an electron microscope to a vacuum pump
US3851172A (en) * 1971-12-15 1974-11-26 Hitachi Ltd Compound electron lens for electron microscope and the like

Cited By (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4214162A (en) * 1975-09-19 1980-07-22 Max-Planck-Gesellschaft Zur Forderung Der Wissenschaften E.V. Corpuscular beam microscope for ring segment focusing
US4315152A (en) * 1977-03-23 1982-02-09 National Research Development Corporation Electron beam apparatus
US4475044A (en) * 1979-04-23 1984-10-02 Hitachi, Ltd. Apparatus for focus-deflecting a charged particle beam
FR2498011A1 (fr) * 1981-01-14 1982-07-16 Jeol Ltd Objectif magnetique a utiliser dans un microscope electronique a balayage
FR2499313A1 (fr) * 1981-01-30 1982-08-06 Philips Nv Microscope electronique comportant un detecteur de rayons x
US4633085A (en) * 1984-04-17 1986-12-30 Jeol Ltd. Transmission-type electron microscope
US4910399A (en) * 1988-04-01 1990-03-20 Jeol Ltd. Electron microscope having X-ray detector
US5013913A (en) * 1988-07-23 1991-05-07 Carl-Zeiss-Stiftung Method of illuminating an object in a transmission electron microscope
WO1991003832A1 (en) * 1989-08-31 1991-03-21 Bell Communications Research, Inc. Electron microscope with an asymmetrical immersion lens
US5079428A (en) * 1989-08-31 1992-01-07 Bell Communications Research, Inc. Electron microscope with an asymmetrical immersion lens
US4962306A (en) * 1989-12-04 1990-10-09 Intenational Business Machines Corporation Magnetically filtered low loss scanning electron microscopy
US20090256075A1 (en) * 2005-09-06 2009-10-15 Carl Zeiss Smt Ag Charged Particle Inspection Method and Charged Particle System
US20090114818A1 (en) * 2005-09-06 2009-05-07 Carl Zeiss Smt Ag Particle-Optical Component
EP2267751A3 (de) * 2005-09-06 2011-01-05 Carl Zeiss SMT AG Teilchenoptische Komponente
US8039813B2 (en) 2005-09-06 2011-10-18 Carl Zeiss Smt Gmbh Charged particle-optical systems, methods and components
US20070145287A1 (en) * 2005-12-09 2007-06-28 Lee, Bing-Huan Specimen box for electron microscope capable of observing general specimen and live cell
US7476871B2 (en) * 2005-12-09 2009-01-13 Contrel Technology Co., Ltd. Specimen box for electron microscope capable of observing general specimen and live cell
US8592764B2 (en) * 2008-12-12 2013-11-26 Fei Company X-ray detector for electron microscope
US20100148064A1 (en) * 2008-12-12 2010-06-17 Fei Company X-ray detector for electron microscope
US8080791B2 (en) * 2008-12-12 2011-12-20 Fei Company X-ray detector for electron microscope
US8993963B2 (en) * 2008-12-12 2015-03-31 Fei Company Mounting structures for multi-detector electron microscopes
US20140319347A1 (en) * 2008-12-12 2014-10-30 Fei Company Mounting structures for multi-detector electron microscopes
US8410439B2 (en) 2008-12-12 2013-04-02 Pei Company X-ray detector for electron microscope
US8314386B2 (en) * 2010-03-26 2012-11-20 Uchicago Argonne, Llc High collection efficiency X-ray spectrometer system with integrated electron beam stop, electron detector and X-ray detector for use on electron-optical beam lines and microscopes
US20120160999A1 (en) * 2010-03-26 2012-06-28 Uchicago Argonne, Llc High collection efficiency x-ray spectrometer system with integrated electron beam stop, electron detector and x-ray detector for use on electron-optical beam lines and microscopes
US20120326030A1 (en) * 2010-12-27 2012-12-27 Carl Zeiss Nts Gmbh Particle Beam Microscope
WO2014123701A1 (en) 2013-02-11 2014-08-14 Novaray Medical, Inc. Method and apparatus for generation of a uniform-profile particle beam
EP2954549A4 (de) * 2013-02-11 2016-10-12 Novaray Medical Inc Verfahren und vorrichtung zur erzeugung eines teilchenstrahls mit einheitlichem profil
US9520263B2 (en) 2013-02-11 2016-12-13 Novaray Medical Inc. Method and apparatus for generation of a uniform-profile particle beam
US9953798B2 (en) 2013-02-11 2018-04-24 Novaray Medical, Inc. Method and apparatus for generation of a uniform-profile particle beam

Also Published As

Publication number Publication date
GB1420803A (en) 1976-01-14
JPS5034462A (de) 1975-04-02
DE2430696A1 (de) 1975-01-16
NL7408601A (de) 1974-12-31

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