US3244855A - System for correcting the shift of an electron-gun beam from the desired region of impingement - Google Patents

System for correcting the shift of an electron-gun beam from the desired region of impingement Download PDF

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US3244855A
US3244855A US296320A US29632063A US3244855A US 3244855 A US3244855 A US 3244855A US 296320 A US296320 A US 296320A US 29632063 A US29632063 A US 29632063A US 3244855 A US3244855 A US 3244855A
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electron
crucible
shift
impingement
correcting
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US296320A
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Thomas K Cauley
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United States Steel Corp
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United States Steel Corp
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Priority to US296320A priority Critical patent/US3244855A/en
Priority to GB28213/64A priority patent/GB1061469A/en
Priority to BE650653A priority patent/BE650653A/xx
Priority to NL6408137A priority patent/NL6408137A/xx
Priority to FR982050A priority patent/FR1409439A/en
Priority to DEU10900A priority patent/DE1295311B/en
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K15/00—Electron-beam welding or cutting
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching

Definitions

  • This invention relates to a system for correcting the tendency of a beam of electrons from a so-called electron gun, to wander from the desired area of impingement.
  • Electron-beam guns have found extensive use in indus try for surface heating by bombardment.
  • One instance is the art of coating with metal by vapor deposition in a vacuum, where the beam from the gun is directed onto the surface of a mass of coating metal to vaporize it.
  • the crucible used to hold the coating metal e.g., aluminum, is disposed transversely of the path of the strip in order to cover the entire strip width. This means that the crucible must be narrow or the mass of coating metal will be excessive.
  • the source of the beam is usually a filamentary cathode and the beam is therefore wide in the direction of the cathode length but is concentrated by shielding to a small dimension in the direction normal to the cathode.
  • the source is usually on one side of the crucible and the beam is bent by a transverse magnetic field or an accelerating voltage so it will curve downwardly onto the metal in the crucible, as shown in Simons, Jr., United States Patent No. 3,046,936.
  • the object of my invention is to provide a system for controlling the magnetic field or the accelerating voltage so that the curvature imparted to the beam will be such as to cause impingement of electrons principally along the center line of the crucible and the mass of metal contained in the recess or cavity therein.
  • I employ elongated sensing electrodes extending along each side of the crucible cavity so they will be subject to the impingence of electrons should the beam wander from the desired condition of alinement with the cavity.
  • I provide means responsive to the resulting current in the sensing electrodes for varying the magnetic field or accelerating potential so as to increase or decrease the curvature of the beam to bring its area of impingence back to its normal position along the center line of the mass of metal in the crucible.
  • FIGURE 1 is a diagrammatic showing of the invention incorporating a known arrangement of crucible and an electron gun for heating the metal therein;
  • FIGURES 2 and 3 are similar diagrams showing modifications.
  • an elongated crucible of refractory material such as boron nitride
  • a recess or cavity in its top face adapted to contain a charge of metal 11, such as aluminum, to be vaporized and deposited on a strip (not shown) passing above the crucible in a direction normal thereto.
  • An electron gun 12 extends along the crucible on one side thereof. It comice prises a tungsten-filament cathode 13 extending between suitable supports (not shown), a focussing electrode 14 and a grounded accelerating anode 15.
  • a transformer 16 furnishes heating current to cathode 13.
  • Crucible 10 is grounded as is also the anode 15.
  • Cathode 13 is maintained at a negative voltage of, say 10,000 volts, and electrode 14 at a somewhat greater negative voltage by connections as shown to a direct-current source 19.
  • the metal charge 11 in crucible 10 is the main anode toward which electrons from the cathode flow.
  • the curvature of their paths indicated at 13a depends on the voltage applied to cathode 13 and the intensity of a magnetic field indicated at 17 between the poles of an electromagnet 18.
  • the apparatus described above is conventional and is disposed within a suitable enclosure (not shown) evacuated to a high degree, i.e., to a pressure less than 30 microns.
  • I provide crucible 10 with parallel sensing electrodes 20 and 21 extending therealong, one on each side of the recess or cavity therein containing charge 11.
  • electrodes 20 and 21 are connected to the control windings 23 and 24, respectively, of a magnetic amplifier 25 of known type such as the Norbatrol Electronic Corporations Linear Power controller model 104C101, having a bias winding 26 thereon connected to a direct-current source 27.
  • the output of amplifier 25, as modulated by current from electrodes 20 and 21 through windings 23 and 24, is applied to the winding of electromagnet 18.
  • a bias current applied to winding 26 of amplifier 25 is provided by source 27 under the control of an adjustable bias resistor 28 to set the norminal value of magnetizing-current output from the amplifier. Resistor 28 is adjusted so that the electron beam impinges on charge 11 centrally between the electrodes 20 and 21 when the control windings 23 and 24 are carrying equal currents. If, for any reason, the beam should wander toward one of the electrodes 20, 21, the resulting current in such electrode will produce a control current adding to or subtracting from the nominal value of the magnetizing current and move the beam away from that sensing electrode and toward the other. In this manner, the magnetic field is controlled so as to center and aline the electron beam with area 22..
  • FIGURE 1 uses a single electron gun and magnetic field.
  • the several electron beams cannot be individually regulated by varying the intensity of the magnetic field, because this would affect the electron beams from all the guns.
  • Effective control can be obtained, however, by regulating the accelerating potential of each gun on the basis of signals indicating the extent and direction of the wandering of its electron beam from the desired area of impingence.
  • An arrangement suitable for this purpose is shown in FIG- URE 2.
  • I have shown therein two magnetic amplifiers 25, each one controlling one of the high-voltage sources 19 to vary the accelerating effects of the cathodes 13 of their electron-beam guns 12 and 12a, respectively.
  • the sensing electrodes 20 and 21 will be subjected to vapor deposition from charge 11 as well as intense heating. Preferably, therefore, they should be made from a refractory metal, such as tungsten, and supported in any convenient manner to prevent their sagging.
  • FIG- URE 3 Another embodiment of my invention is shown in FIG- URE 3 including means for establishing two low-current electron beams 29 and 30 between cathodes 31 and anodes 32. These beams replace the tungsten electrodes 20 and 21. Electrons are emitted from hot cathodes 31 and are accelerated by suitable voltage sources 33, along paths 29 and 30 parallel to the crucible, to anodes 32. The line of travel of each of these secondary electron beams is located substantially where one of the sensing electrodes 20 and 21 would be placed.
  • the main beam 13a of charge-heating electrons is diverted by any means to cross the path of the secondary electron beams, the space charge which the main beam produces in the path of the secondary beam, lowers the current carried in the latter. Since this current passes through one of the control windings of a magnetic amplifier 25 in the manner previously described, the electromagnetic field, created by magnet 18 for bending the main beam, is altered to force it back toward the center line of crucible 10.
  • my invention affords simple yet effective means for preventing wandering of the area of impingence of an electron beam from the desired location, thereby improving the eificiency of vaporizing coating metal and protecting the crucible from excessive heating.
  • the improvement comprising means responsive to a shift in the area of impingence of said beam on said charge and means controlled by said last-mentioned means for compensatorily adjusting said curvature-maintaining means, said shift-responsive means comprising means for maintaining a pair of electron beams extending along opposite sides of said crucible, in positions to be affected by the space charge of said first-mentioned beam on a lateral shift of said impingence area from its normal position.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Description

April 5, 1966 T. K. CAULEY SYSTEM FOR CORRECTING THE SHIFT OF AN ELECTRON-GUN BEAM FROM THE DESIRED REGION OF IMPINGEMENT Filed July 19, 1963 2 Sheets-Sheet l IN VE/V TOR. THOMAS K. CAULEY WK? w;
Attorney April 5, 1966 T. K. CAULEY 3,244,855
SYSTEM FOR CORRECTING THE SHIFT OF AN ELECTRON-GUN BEAM FROM THE DESIRED REGION OF IMPINGEMENT Filed July 19, 1963 Y 2 Sheets-Sheet 2 INVENTOR THOMAS K. CAULEY A Harney United States Patent 3,244,855 SYSTEM FOR CORRECTING THE SHIFT OF AN ELECTRON-GUN BEAM FROM THE DESIRED REGION OF IMPINGEMENT Thomas K. Cauley, West Miiflin Borough, Pa., assiguor to United States Steel Corporation, a corporation of New Jersey Filed July 19, 1963, Ser. No. 296,320 1 Claim. (Cl. 219-121) This invention relates to a system for correcting the tendency of a beam of electrons from a so-called electron gun, to wander from the desired area of impingement.
Electron-beam guns have found extensive use in indus try for surface heating by bombardment. One instance is the art of coating with metal by vapor deposition in a vacuum, where the beam from the gun is directed onto the surface of a mass of coating metal to vaporize it. In the continuous coating of strip by this method, the crucible used to hold the coating metal, e.g., aluminum, is disposed transversely of the path of the strip in order to cover the entire strip width. This means that the crucible must be narrow or the mass of coating metal will be excessive.
In heating the surface of an elongated narrow crucible by electron bombardment, it is important to keep the electron beam constantly in close alinement with the center line of the crucible, both to assure efficient heating and to prevent damage to the crucible. The source of the beam is usually a filamentary cathode and the beam is therefore wide in the direction of the cathode length but is concentrated by shielding to a small dimension in the direction normal to the cathode. The source is usually on one side of the crucible and the beam is bent by a transverse magnetic field or an accelerating voltage so it will curve downwardly onto the metal in the crucible, as shown in Simons, Jr., United States Patent No. 3,046,936.
The object of my invention is to provide a system for controlling the magnetic field or the accelerating voltage so that the curvature imparted to the beam will be such as to cause impingement of electrons principally along the center line of the crucible and the mass of metal contained in the recess or cavity therein. In a preferred embodiment, I employ elongated sensing electrodes extending along each side of the crucible cavity so they will be subject to the impingence of electrons should the beam wander from the desired condition of alinement with the cavity. I provide means responsive to the resulting current in the sensing electrodes for varying the magnetic field or accelerating potential so as to increase or decrease the curvature of the beam to bring its area of impingence back to its normal position along the center line of the mass of metal in the crucible.
A complete understanding of the invention may be obtained from the following detailed description and explanation which refer to the accompanying drawings illustrating the present preferred embodiment. In the drawings:
FIGURE 1 is a diagrammatic showing of the invention incorporating a known arrangement of crucible and an electron gun for heating the metal therein; and
FIGURES 2 and 3 are similar diagrams showing modifications.
Referring now in detail to the drawings and, for the moment, to FIGURE I particularly, an elongated crucible of refractory material, such as boron nitride, has a recess or cavity in its top face adapted to contain a charge of metal 11, such as aluminum, to be vaporized and deposited on a strip (not shown) passing above the crucible in a direction normal thereto. An electron gun 12 extends along the crucible on one side thereof. It comice prises a tungsten-filament cathode 13 extending between suitable supports (not shown), a focussing electrode 14 and a grounded accelerating anode 15.
A transformer 16 furnishes heating current to cathode 13. Crucible 10 is grounded as is also the anode 15. Cathode 13 is maintained at a negative voltage of, say 10,000 volts, and electrode 14 at a somewhat greater negative voltage by connections as shown to a direct-current source 19. The metal charge 11 in crucible 10 is the main anode toward which electrons from the cathode flow. The curvature of their paths indicated at 13a depends on the voltage applied to cathode 13 and the intensity of a magnetic field indicated at 17 between the poles of an electromagnet 18. The apparatus described above is conventional and is disposed within a suitable enclosure (not shown) evacuated to a high degree, i.e., to a pressure less than 30 microns.
In carrying out my invention, I provide crucible 10 with parallel sensing electrodes 20 and 21 extending therealong, one on each side of the recess or cavity therein containing charge 11. In the event of displacement of electron beam for any reason, from the desired area of impingence on charge 11, indicated at 22, electrons will collect on one or the other of electrodes 20 and 21. These electrodes are connected to the control windings 23 and 24, respectively, of a magnetic amplifier 25 of known type such as the Norbatrol Electronic Corporations Linear Power controller model 104C101, having a bias winding 26 thereon connected to a direct-current source 27. The output of amplifier 25, as modulated by current from electrodes 20 and 21 through windings 23 and 24, is applied to the winding of electromagnet 18.
A bias current applied to winding 26 of amplifier 25 is provided by source 27 under the control of an adjustable bias resistor 28 to set the norminal value of magnetizing-current output from the amplifier. Resistor 28 is adjusted so that the electron beam impinges on charge 11 centrally between the electrodes 20 and 21 when the control windings 23 and 24 are carrying equal currents. If, for any reason, the beam should wander toward one of the electrodes 20, 21, the resulting current in such electrode will produce a control current adding to or subtracting from the nominal value of the magnetizing current and move the beam away from that sensing electrode and toward the other. In this manner, the magnetic field is controlled so as to center and aline the electron beam with area 22..
The embodiment of FIGURE 1 uses a single electron gun and magnetic field. For long crucibles, it may be necessary to use several guns disposed end-to-end along the crucible length. With this arrangement, the several electron beams cannot be individually regulated by varying the intensity of the magnetic field, because this would affect the electron beams from all the guns. Effective control can be obtained, however, by regulating the accelerating potential of each gun on the basis of signals indicating the extent and direction of the wandering of its electron beam from the desired area of impingence. An arrangement suitable for this purpose is shown in FIG- URE 2. For purposes of description, I have shown therein two magnetic amplifiers 25, each one controlling one of the high-voltage sources 19 to vary the accelerating effects of the cathodes 13 of their electron-beam guns 12 and 12a, respectively.
It may be noted that the sensing electrodes 20 and 21 will be subjected to vapor deposition from charge 11 as well as intense heating. Preferably, therefore, they should be made from a refractory metal, such as tungsten, and supported in any convenient manner to prevent their sagging.
Another embodiment of my invention is shown in FIG- URE 3 including means for establishing two low- current electron beams 29 and 30 between cathodes 31 and anodes 32. These beams replace the tungsten electrodes 20 and 21. Electrons are emitted from hot cathodes 31 and are accelerated by suitable voltage sources 33, along paths 29 and 30 parallel to the crucible, to anodes 32. The line of travel of each of these secondary electron beams is located substantially where one of the sensing electrodes 20 and 21 would be placed. When the main beam 13a of charge-heating electrons is diverted by any means to cross the path of the secondary electron beams, the space charge which the main beam produces in the path of the secondary beam, lowers the current carried in the latter. Since this current passes through one of the control windings of a magnetic amplifier 25 in the manner previously described, the electromagnetic field, created by magnet 18 for bending the main beam, is altered to force it back toward the center line of crucible 10.
It will be evident that my invention affords simple yet effective means for preventing wandering of the area of impingence of an electron beam from the desired location, thereby improving the eificiency of vaporizing coating metal and protecting the crucible from excessive heating.
Although I have disclosed herein the preferred embodiment of my invention, I intend to cover as well any change or modification therein which may be made without departing from the spirit and scope of the invention.
I claim:
In the combination with an elongated crucible containing a charge of metal to be vaporized, of an electron-beam gun extending alongside said crucible adapted to deliver an arcuate beam of electrons onto the top of said charge and means maintaining the curvature of the paths of electrons making up said beam, the improvement comprising means responsive to a shift in the area of impingence of said beam on said charge and means controlled by said last-mentioned means for compensatorily adjusting said curvature-maintaining means, said shift-responsive means comprising means for maintaining a pair of electron beams extending along opposite sides of said crucible, in positions to be affected by the space charge of said first-mentioned beam on a lateral shift of said impingence area from its normal position.
References Cited by the Examiner UNITED STATES PATENTS 2,640,948 6/ 1953 Burrill.
3,046,936 7/1962 Simons.
3,112,391 11/1963 Sciaky 219-124 3,146,335 8/ 1964 Samuelson.
3,152,238 10/1964 Anderson 219-121 RICHARD M. WOOD, Primary Examiner.
JOSEPH V. TRUHE, SR., Examiner.
US296320A 1963-07-19 1963-07-19 System for correcting the shift of an electron-gun beam from the desired region of impingement Expired - Lifetime US3244855A (en)

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Application Number Priority Date Filing Date Title
US296320A US3244855A (en) 1963-07-19 1963-07-19 System for correcting the shift of an electron-gun beam from the desired region of impingement
GB28213/64A GB1061469A (en) 1963-07-19 1964-07-08 Improvements relating to electron beam furnaces
BE650653A BE650653A (en) 1963-07-19 1964-07-16
NL6408137A NL6408137A (en) 1963-07-19 1964-07-16
FR982050A FR1409439A (en) 1963-07-19 1964-07-17 Correction device to prevent the beam of an electric gun from deviating from the desired impact region
DEU10900A DE1295311B (en) 1963-07-19 1964-07-17 Device for the production of metal coatings by vacuum evaporation

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US296320A US3244855A (en) 1963-07-19 1963-07-19 System for correcting the shift of an electron-gun beam from the desired region of impingement

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FR (1) FR1409439A (en)
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NL (1) NL6408137A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3397672A (en) * 1965-11-10 1968-08-20 United States Steel Corp Control system for vapor-deposition coating apparatus
US3617684A (en) * 1970-02-24 1971-11-02 Datapax Computer Systems Corp Electronic trimming of microelectronic resistors
US3852560A (en) * 1972-05-31 1974-12-03 Cockerill Continuous electronic heating device for metallic wire and sheet metal
US3931490A (en) * 1973-09-17 1976-01-06 Robert Bosch G.M.B.H. Electron beam vaporization apparatus
FR2425720A1 (en) * 1978-05-12 1979-12-07 Philips Nv DEVICE FOR DIRECTING ELECTRICALLY CHARGED PARTICLES TO A TARGET
US4551844A (en) * 1983-04-05 1985-11-05 Jersey Nuclear-Avco Isotopes, Inc. Demodulation of vapor density
US4958059A (en) * 1988-07-06 1990-09-18 Commissariat A L'energie Atomique Electronic bombardment evaporator equipped with means to recover backscattered electrons
EP2073248A1 (en) * 2007-12-21 2009-06-24 Applied Materials, Inc. Linear electron source, evaporator using linear electron source, and applications of electron sources

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3639683A1 (en) * 1986-11-20 1988-05-26 Leybold Ag EVAPORATOR ARRANGEMENT WITH A RECTANGULAR EVAPORATOR AND MULTIPLE ELECTRON CANNON

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2640948A (en) * 1950-09-21 1953-06-02 High Voltage Engineering Corp Apparatus for utilizing a beam of high energy electrons in sterilization and in therapy
US3046936A (en) * 1958-06-04 1962-07-31 Nat Res Corp Improvement in vacuum coating apparatus comprising an ion trap for the electron gun thereof
US3112391A (en) * 1961-10-27 1963-11-26 Welding Research Inc Zeroing system for electron gun
US3146335A (en) * 1962-03-29 1964-08-25 United Aircraft Corp Focusing device for electron beams
US3152238A (en) * 1962-05-11 1964-10-06 United Aircraft Corp Electron beam centering apparatus

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH311812A (en) * 1951-11-05 1955-12-15 Zeiss Carl Fa Evaporation device.
FR1251425A (en) * 1959-12-10 1961-01-20 Improvements made to the self-regulating means of injection pumps for engines, in particular those liable to vary the injection advance

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2640948A (en) * 1950-09-21 1953-06-02 High Voltage Engineering Corp Apparatus for utilizing a beam of high energy electrons in sterilization and in therapy
US3046936A (en) * 1958-06-04 1962-07-31 Nat Res Corp Improvement in vacuum coating apparatus comprising an ion trap for the electron gun thereof
US3112391A (en) * 1961-10-27 1963-11-26 Welding Research Inc Zeroing system for electron gun
US3146335A (en) * 1962-03-29 1964-08-25 United Aircraft Corp Focusing device for electron beams
US3152238A (en) * 1962-05-11 1964-10-06 United Aircraft Corp Electron beam centering apparatus

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3397672A (en) * 1965-11-10 1968-08-20 United States Steel Corp Control system for vapor-deposition coating apparatus
US3617684A (en) * 1970-02-24 1971-11-02 Datapax Computer Systems Corp Electronic trimming of microelectronic resistors
US3852560A (en) * 1972-05-31 1974-12-03 Cockerill Continuous electronic heating device for metallic wire and sheet metal
US3931490A (en) * 1973-09-17 1976-01-06 Robert Bosch G.M.B.H. Electron beam vaporization apparatus
FR2425720A1 (en) * 1978-05-12 1979-12-07 Philips Nv DEVICE FOR DIRECTING ELECTRICALLY CHARGED PARTICLES TO A TARGET
US4551844A (en) * 1983-04-05 1985-11-05 Jersey Nuclear-Avco Isotopes, Inc. Demodulation of vapor density
US4958059A (en) * 1988-07-06 1990-09-18 Commissariat A L'energie Atomique Electronic bombardment evaporator equipped with means to recover backscattered electrons
EP2073248A1 (en) * 2007-12-21 2009-06-24 Applied Materials, Inc. Linear electron source, evaporator using linear electron source, and applications of electron sources
US20090161719A1 (en) * 2007-12-21 2009-06-25 Applied Materials, Inc. Linear electron source, evaporator using linear electron source, and applications of electron sources
WO2009080312A1 (en) * 2007-12-21 2009-07-02 Applied Materials, Inc. Linear electron source, evaporator using linear electron source, and applications of electron sources

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BE650653A (en) 1965-01-18
DE1295311B (en) 1969-05-14
NL6408137A (en) 1965-01-20
FR1409439A (en) 1965-08-27
GB1061469A (en) 1967-03-15

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