US20160243600A1 - Cleaning device - Google Patents
Cleaning device Download PDFInfo
- Publication number
- US20160243600A1 US20160243600A1 US14/417,814 US201514417814A US2016243600A1 US 20160243600 A1 US20160243600 A1 US 20160243600A1 US 201514417814 A US201514417814 A US 201514417814A US 2016243600 A1 US2016243600 A1 US 2016243600A1
- Authority
- US
- United States
- Prior art keywords
- cleaning device
- baffles
- cleaning
- cleaned
- working chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/04—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by a combination of operations
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
- B05B1/28—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means with integral means for shielding the discharged liquid or other fluent material, e.g. to limit area of spray; with integral means for catching drips or collecting surplus liquid or other fluent material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B12/00—Arrangements for controlling delivery; Arrangements for controlling the spray area
- B05B12/16—Arrangements for controlling delivery; Arrangements for controlling the spray area for controlling the spray area
- B05B12/32—Shielding elements, i.e. elements preventing overspray from reaching areas other than the object to be sprayed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
- B08B11/04—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto specially adapted for plate glass, e.g. prior to manufacture of windshields
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B17/00—Methods preventing fouling
- B08B17/02—Preventing deposition of fouling or of dust
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
- B08B3/022—Cleaning travelling work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/041—Cleaning travelling work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B5/00—Cleaning by methods involving the use of air flow or gas flow
- B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
- B08B5/023—Cleaning travelling work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
- B08B7/0057—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by ultraviolet radiation
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0075—Cleaning of glass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B2203/00—Details of cleaning machines or methods involving the use or presence of liquid or steam
- B08B2203/005—Details of cleaning machines or methods involving the use or presence of liquid or steam the liquid being ozonated
Definitions
- the present disclosure relates to a cleaning device, and in particular, to a cleaning device for cleaning a glass substrate and a semi-finished array substrate.
- a glass substrate is first to be made into a semi-finished array substrate before being manufactured into a finished array substrate.
- the cleaning device can comprise a first cleaning unit which can remove organics from an object to be cleaned using ultraviolet light; a second cleaning unit which can remove particles from the object to be cleaned using water and gases; a third cleaning unit which can remove organics and metal ions from the object to be cleaned using ozone water, or can oxidize amorphous silicon (i.e., a-Si) on the object to be cleaned using ozone water, so as to form a silicon oxide (i.e., SiOx) layer on a surface of the a-Si; a fourth cleaning unit which can remove the SiOx layer through hydrofluoric acid etching; a fifth cleaning unit for second removal of particles from the object to be cleaned using hydrogen water; a sixth cleaning unit which can oxidize the surface of the a-Si on the object to be cleaned into a homogeneous and compact SiOx layer using ozone water; a seventh cleaning unit which can remove particles from the object to be cleaned using water and a gas; and an air-dying unit which can
- the cleaning device When the cleaning device is used to clean a glass object to be cleaned, such as a glass substrate, it is only necessary for the glass object to be successively cleaned by the first, the second, the third, and the seventh cleaning units, and the air-dying unit, while the fourth, the fifth, and the sixth cleaning units will be left unused. In the entire cleaning procedure, however, the object to be cleaned has to pass through the fourth, the fifth, and the sixth cleaning units as well, which, after being frequently used, would very likely be subjected to liquid leakage. As a result, liquid leakages thereof might drip onto the glass substrate passing therethrough. As the hydrofluoric acid of the fourth cleaning unit can corrode a glass substrate, where the hydrofluoric acid drips onto the glass substrate, the glass substrate after being cleaned will become useless.
- the present disclosure provides a cleaning device, which can prevent liquid leakages dripping from non-used cleaning units from dripping onto an object to be cleaned, thus preventing the liquid leakages from harming or affecting the object to be cleaned.
- the present disclosure provides a cleaning device, comprising a plurality of cleaning units, and a conveyor which is used for connecting the plurality of cleaning units and capable of conveying an object to be cleaned.
- Each of the plurality of cleaning units includes a body, a working chamber formed within the body, and a liquid spray unit arranged in the working chamber and capable of spraying liquid to the object to be cleaned.
- the conveyor runs through the working chamber and is located below the liquid spray unit, and at least one of the plurality of cleaning units comprises a plurality of baffles arranged between the liquid spray unit and the conveyor, and a driving mechanism arranged in the working chamber.
- the driving mechanism is configured to actuate each of the plurality of baffles into rotation along a first direction to overlap with adjacent baffles, so as to prevent liquid leakages dripping from the liquid spray unit from dripping onto the object to be cleaned, and further actuate each of the plurality of baffles into rotation along an opposite direction of the first direction, so as to open the liquid spray unit wide.
- the driving mechanism comprises a lifting part that can rise and fall along a vertical direction, and a plurality of pull rods, each of which has one end hinged to a corresponding baffle, and another end fixedly connected to the lifting part.
- two ends of each of the plurality of baffles are respectively connected to the lifting part by means of corresponding pull rods.
- the lifting part is connected to a top wall of the working chamber by means of a translation member, so as to be actuated for a lifting movement.
- the cleaning device further comprises a plurality of support rods, each of which has a bottom end hinged to a corresponding baffle, and a top end connected to a side wall of the working chamber by means of a shifting bar.
- the shifting pair comprises a waist-shaped hole arranged at a top end of a corresponding support rod, and a pin fixed on the side wall of the working chamber and capable of being engaged into the waist-shaped hole.
- a hinge position of any one of the plurality of pull rods to a corresponding baffle is lower than a hinge position of a corresponding support rod to the corresponding baffle.
- an overlapping surface of any two adjacent baffles is in the form of an inclined surface, a curved surface, or a bend surface.
- the plurality of baffles is in the form of a plurality of rectangles, which can facilitate manufacture and cost saving thereof.
- the object to be cleaned is a glass substrate or a semi-finished array substrate.
- At least one of the plurality of cleaning units is provided with a plurality of rotatable baffles therein.
- the baffles can form a complete plane after being overlapped with one another, to receive liquid leakages dripping from the liquid spray unit arranged in the cleaning unit. This can prevent the liquid leakages from continuously flowing downward to drip onto the object to be cleaned.
- the liquid leakages dripping from non-used cleaning units can be prevented from dripping onto the object to be cleaned, thus avoiding the object to be cleaned from being harmed or affected by the liquid leakages.
- the cleaning device according to the present disclosure can be easily assembled and safely used, thus facilitating implementations of promotion and use thereof.
- FIG. 1 schematically shows the structure of a cleaning device according to the present disclosure
- FIG. 2 schematically shows the structure of a cleaning unit of the cleaning device according to the present disclosure
- FIG. 3 schematically shows the structure of the cleaning unit of the cleaning device according to the present disclosure, in which a plurality of baffles is in a closed state;
- FIG. 4 schematically shows the structure of the cleaning unit of the cleaning device according to the present disclosure, in which the plurality of baffles is in an open state;
- FIG. 5 is a perspective view of the cleaning unit of the cleaning device according to the present disclosure, in which the plurality of baffles is in a closed state;
- FIG. 6 is a perspective view of the cleaning unit of the cleaning device according to the present disclosure, in which the plurality of baffles is in an open state.
- FIGS. 3-6 indicates a body or a working chamber of the cleaning unit of the cleaning device. Moreover, in the drawings, the same components are indicated with the same reference signs. The figures are not drawn in accordance with an actual scale.
- FIG. 1 shows a cleaning device 50 according to the present disclosure.
- the cleaning device 50 comprises a plurality of cleaning units, and a conveyor which is used for connecting the plurality of cleaning units and capable of conveying an object to be cleaned.
- the conveyor can be used to connect the plurality of cleaning units, so as to facilitate conveyance of the object to be cleaned to each of the cleaning units successively.
- the cleaning device 50 can be one used for cleaning a glass substrate and a semi-finished array substrate, and can absolutely be one used for cleaning other products and workpieces that need cleaning. In the following, the present disclosure will be explained in detail, with the cleaning device 50 used for cleaning a glass substrate and a semi-finished array substrate as an example.
- the cleaning device 50 comprises seven cleaning units, respectively as a first cleaning unit 51 which can remove organics from an object to be cleaned using ultraviolet light; a second cleaning unit 52 which can remove particles from the object to be cleaned using water and gases; a third cleaning unit 53 which can remove organics and metal ions from the object to be cleaned using ozone water, or can oxidize amorphous silicon on the object to be cleaned using ozone water, so as to form a silicon oxide layer on a surface of the amorphous silicon; a fourth cleaning unit 54 which can remove the silicon oxide layer through hydrofluoric acid etching; a fifth cleaning unit 55 which can be used for second removal of particles from the object to be cleaned using hydrogen water; a sixth cleaning unit 56 which can oxidize the surface of the amorphous silicon into a homogeneous and compact silicon oxide layer using ozone water; a seventh cleaning unit 57 which can remove particles from the object to be cleaned using water and gases; an air-dying unit 58 , and a conveyor 59 .
- the conveyor 59 can be used to connect all of the plurality of cleaning units in series, so as to facilitate conveyance of the object to be cleaned to each of the plurality of cleaning units, successively.
- the plurality of cleaning units and the conveyor 59 are each well known in the art, and therefore will not be explained in detail herein.
- the fourth cleaning unit 54 When the cleaning device 50 is used to clean a glass substrate, although the fourth cleaning unit 54 is unnecessary in cleaning of the glass substrate, liquid leakages having dripped onto the glass substrate therefrom will corrode the glass substrate. This will prevent the glass substrate from working properly. Therefore, it will be necessary for the fourth cleaning unit 54 to have a mechanism or structure that can prevent the liquid leakages therefrom from dripping onto the glass substrate. In addition, when the cleaning device 50 is used to clean a semi-finished array substrate or other products, other cleaning units or combinations of cleaning units can also be left unused, and therefore will need a mechanism or structure that can prevent a liquid leakage from dripping onto the object to be cleaned.
- a simplest solution is to arrange such a mechanism or structure that can prevent a liquid leakage from dripping onto the object to be cleaned in each of the plurality of cleaning units, whereby a corresponding mechanism can be activated where necessary.
- FIG. 2 shows a cleaning unit 10 , which can be any one of the plurality of cleaning units arranged in the cleaning device 50 .
- the cleaning unit 10 comprises a body 8 , a working chamber 9 formed within the body 8 , and a liquid spray unit 3 arranged in the working chamber 9 and capable of spraying liquid to an object 1 to be cleaned.
- the conveyor 59 which runs through the working chamber 9 and is located below the liquid spray unit 3 , can convey the object 1 to be cleaned from a previous cleaning unit to a subsequent cleaning unit.
- the liquid spray unit 3 can comprise a plurality of liquid spray members 3 a, which can be selected as spray nozzles capable of spraying liquid on a surface of the object 1 to be cleaned, so as to achieve a cleaning or etching function of the cleaning unit 10 .
- the cleaning unit 10 can further comprise a plurality of rotatable baffles 5 arranged between the liquid spray unit 3 and the conveyor 59 , and a driving mechanism 6 that is configured to actuate each of the plurality of baffles 5 into rotation.
- the baffles 5 can be in the form of rectangles, which can facilitate manufacture and cost saving thereof.
- the liquid leakage as aforementioned refers to a liquid dripping from the liquid spray unit 3 when it is not working.
- the driving mechanism 6 not only can actuate rotation of each of the plurality of baffles 5 along a first direction, and enable overlapping of each of the plurality of baffles 5 with adjacent baffles (i.e., a closed state), so as to prevent a liquid leakage dripping from the liquid spray unit 3 from dripping onto the object 1 to be cleaned, but also can actuate rotation of each of the plurality of baffles 5 along an opposite direction of the first direction, so as to open the liquid spray unit 3 wide, i.e., open all of the spray nozzles 3 a arranged in the liquid spray unit 3 , an open state for short. As indicated in FIG.
- a complete plane can be formed for receiving liquid leakages dripping from the liquid spray unit 3 , so as to prevent the liquid leakages from continuously flowing down and thus dripping onto the object 1 to be cleaned. This can prevent the liquid leakages from harming or affecting the object to be cleaned.
- the driving mechanism 6 can comprise a lifting part 61 that can rise and fall along a vertical direction V, and a plurality of pull rods 62 .
- the lifting part 61 can be connected to a top wall of the working chamber 9 by means of a translation member 63 , so as to achieve rise and fall of the lifting part 61 .
- the translation member 63 can be selected as a linear motor or a hydraulic cylinder.
- Each of the plurality of pull rods 62 has one end hinged to a corresponding baffle 5 , and another end connected to the lifting part 61 . Hinge joints between the plurality of pull rods 62 and the plurality of baffles 5 can allow said plurality of baffles 5 to rotate.
- each of the plurality of baffles 5 is respectively connected to the lifting part 61 by means of corresponding pull rods 62 . This can improve stability of the baffles 5 , and prevent occurrence of deformation thereof to a certain degree.
- the plurality of baffles 5 can be disposed between the liquid spray unit 3 and the conveyor 59 by means of a plurality of vertical rods, each of which can have a top end fixed to the top wall of the working chamber 9 , and a bottom end hinged to a corresponding baffle 5 .
- the cleaning unit 10 can further comprise a plurality of support rods 7 . As shown in FIG. 5 or FIG. 6 , the number of the support rods 7 can be the same as that of the baffles 5 .
- a bottom end of each of the plurality of support rods 7 is hinged to an end portion of a corresponding baffle 5 , while a top end of each of the plurality of support rods 7 is connected to a side wall of the working chamber 9 by means of a shifting pair 12 .
- the shifting pair 12 can comprise a waist-shaped hole 12 a provided at the bottom end of a corresponding support rod 7 , and a pin 12 b fixed on a side wall 9 a of the working chamber 9 and can be engaged into the waist-shaped hole 12 a, as indicated in FIG. 2 or 3 .
- the lifting part 61 when going up, can pull the plurality of baffles 5 through the plurality of pull rods 62 .
- the plurality of baffles 5 moves upward, and meanwhile, drives the plurality of support rods 7 to move upward as well, until a bottom end of the waist-shaped hole 12 a provided on each of the plurality of support rods 7 contacts a corresponding pin 12 b.
- the lifting part 61 which is continuously rising can thus, by means of the plurality of pull rods 62 , actuate each of the plurality of baffles 5 into rotation along an opposite direction of a first direction A, until each of the plurality of baffles 5 is set free from an overlapping relationship with adjacent baffles and thus the liquid spray unit 3 is wide open. Since the plurality of baffles 5 only starts rotating after it is raised along with the plurality of support rods 7 , the baffles 5 will be rotating free from hindrance of the object to be cleaned, thus achieving smooth rotation thereof.
- a hinge position 15 between any one of the plurality of pull rods 62 and a corresponding baffle 5 is lower than a hinge position 16 between a corresponding support rod 7 and said corresponding baffle 5 , as indicated in FIG. 3 .
- each of the plurality of baffles 5 can rotate smoothly along the first direction A.
- an overlapping surface S of any two adjacent baffles 5 is in the form of an inclined surface, a curved surface, or a bend surface.
- the overlapping surface S in such forms can increase a contact surface between the baffles 5 , and improve sealing properties thereof, thus preventing continuous dripping of liquid leakages therefrom.
- At least one of the plurality of cleaning units 10 is provided with a plurality of rotatable baffles 5 therein.
- the plurality of baffles 5 can form a complete plane after being overlapped with one another, to receive liquid leakages dripping from the liquid spray unit 3 arranged in the cleaning unit 10 . This can prevent the liquid leakages from continuously flowing downward to drip onto the object 1 to be cleaned.
- the liquid leakages dripping from non-used cleaning units 10 can be prevented from dripping onto the object 1 to be cleaned, thereby avoiding the object to be cleaned from being harmed or affected by the liquid leakages.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Optics & Photonics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
Provided is a cleaning device, comprising a plurality of cleaning units, and a conveyor which is used for connecting the plurality of cleaning units. Each of the plurality of cleaning units includes a body having a working chamber, and a liquid spray unit. At least one of the plurality of cleaning units comprises a plurality of baffles arranged between the liquid spray unit and the conveyor, and a driving mechanism. The driving mechanism is configured to actuate each of the plurality of baffles into rotation along a first direction to overlap with adjacent baffles, and further actuate each of the plurality of baffles into rotation along an opposite direction of the first direction.
Description
- The present application claims benefit of Chinese patent application CN 201410797975.1, entitled “Cleaning device” and filed on Dec. 18, 2014, the entirety of which is incorporated herein by reference.
- The present disclosure relates to a cleaning device, and in particular, to a cleaning device for cleaning a glass substrate and a semi-finished array substrate.
- In a manufacturing process of an array substrate, a glass substrate is first to be made into a semi-finished array substrate before being manufactured into a finished array substrate. In such a process, it is necessary to clean objects to be cleaned, such as the glass substrate and the semi-finished array substrate, through a plurality of cleaning steps that are typically performed in one single cleaning device.
- The cleaning device can comprise a first cleaning unit which can remove organics from an object to be cleaned using ultraviolet light; a second cleaning unit which can remove particles from the object to be cleaned using water and gases; a third cleaning unit which can remove organics and metal ions from the object to be cleaned using ozone water, or can oxidize amorphous silicon (i.e., a-Si) on the object to be cleaned using ozone water, so as to form a silicon oxide (i.e., SiOx) layer on a surface of the a-Si; a fourth cleaning unit which can remove the SiOx layer through hydrofluoric acid etching; a fifth cleaning unit for second removal of particles from the object to be cleaned using hydrogen water; a sixth cleaning unit which can oxidize the surface of the a-Si on the object to be cleaned into a homogeneous and compact SiOx layer using ozone water; a seventh cleaning unit which can remove particles from the object to be cleaned using water and a gas; and an air-dying unit which can blow-dry the object to be cleaned.
- When the cleaning device is used to clean a glass object to be cleaned, such as a glass substrate, it is only necessary for the glass object to be successively cleaned by the first, the second, the third, and the seventh cleaning units, and the air-dying unit, while the fourth, the fifth, and the sixth cleaning units will be left unused. In the entire cleaning procedure, however, the object to be cleaned has to pass through the fourth, the fifth, and the sixth cleaning units as well, which, after being frequently used, would very likely be subjected to liquid leakage. As a result, liquid leakages thereof might drip onto the glass substrate passing therethrough. As the hydrofluoric acid of the fourth cleaning unit can corrode a glass substrate, where the hydrofluoric acid drips onto the glass substrate, the glass substrate after being cleaned will become useless.
- In order to solve the above problem, the present disclosure provides a cleaning device, which can prevent liquid leakages dripping from non-used cleaning units from dripping onto an object to be cleaned, thus preventing the liquid leakages from harming or affecting the object to be cleaned.
- The present disclosure provides a cleaning device, comprising a plurality of cleaning units, and a conveyor which is used for connecting the plurality of cleaning units and capable of conveying an object to be cleaned. Each of the plurality of cleaning units includes a body, a working chamber formed within the body, and a liquid spray unit arranged in the working chamber and capable of spraying liquid to the object to be cleaned. The conveyor runs through the working chamber and is located below the liquid spray unit, and at least one of the plurality of cleaning units comprises a plurality of baffles arranged between the liquid spray unit and the conveyor, and a driving mechanism arranged in the working chamber. The driving mechanism is configured to actuate each of the plurality of baffles into rotation along a first direction to overlap with adjacent baffles, so as to prevent liquid leakages dripping from the liquid spray unit from dripping onto the object to be cleaned, and further actuate each of the plurality of baffles into rotation along an opposite direction of the first direction, so as to open the liquid spray unit wide.
- In one embodiment, the driving mechanism comprises a lifting part that can rise and fall along a vertical direction, and a plurality of pull rods, each of which has one end hinged to a corresponding baffle, and another end fixedly connected to the lifting part.
- In one embodiment, two ends of each of the plurality of baffles are respectively connected to the lifting part by means of corresponding pull rods.
- In one embodiment, the lifting part is connected to a top wall of the working chamber by means of a translation member, so as to be actuated for a lifting movement.
- In one embodiment, the cleaning device further comprises a plurality of support rods, each of which has a bottom end hinged to a corresponding baffle, and a top end connected to a side wall of the working chamber by means of a shifting bar.
- In one embodiment, the shifting pair comprises a waist-shaped hole arranged at a top end of a corresponding support rod, and a pin fixed on the side wall of the working chamber and capable of being engaged into the waist-shaped hole.
- In one embodiment, after the plurality of baffles is overlapped with one another, a hinge position of any one of the plurality of pull rods to a corresponding baffle is lower than a hinge position of a corresponding support rod to the corresponding baffle.
- In one embodiment, an overlapping surface of any two adjacent baffles is in the form of an inclined surface, a curved surface, or a bend surface.
- In one embodiment, the plurality of baffles is in the form of a plurality of rectangles, which can facilitate manufacture and cost saving thereof.
- In one embodiment, the object to be cleaned is a glass substrate or a semi-finished array substrate.
- According to the cleaning device of the present disclosure, at least one of the plurality of cleaning units is provided with a plurality of rotatable baffles therein. The baffles can form a complete plane after being overlapped with one another, to receive liquid leakages dripping from the liquid spray unit arranged in the cleaning unit. This can prevent the liquid leakages from continuously flowing downward to drip onto the object to be cleaned. Thus, the liquid leakages dripping from non-used cleaning units can be prevented from dripping onto the object to be cleaned, thus avoiding the object to be cleaned from being harmed or affected by the liquid leakages.
- In addition, the cleaning device according to the present disclosure can be easily assembled and safely used, thus facilitating implementations of promotion and use thereof.
- In the following, the present disclosure will be explained in detail based on embodiments in connection with accompanying drawings, in which:
-
FIG. 1 schematically shows the structure of a cleaning device according to the present disclosure; -
FIG. 2 schematically shows the structure of a cleaning unit of the cleaning device according to the present disclosure; -
FIG. 3 schematically shows the structure of the cleaning unit of the cleaning device according to the present disclosure, in which a plurality of baffles is in a closed state; -
FIG. 4 schematically shows the structure of the cleaning unit of the cleaning device according to the present disclosure, in which the plurality of baffles is in an open state; -
FIG. 5 is a perspective view of the cleaning unit of the cleaning device according to the present disclosure, in which the plurality of baffles is in a closed state; and -
FIG. 6 is a perspective view of the cleaning unit of the cleaning device according to the present disclosure, in which the plurality of baffles is in an open state. - It should be noted that none of
FIGS. 3-6 indicates a body or a working chamber of the cleaning unit of the cleaning device. Moreover, in the drawings, the same components are indicated with the same reference signs. The figures are not drawn in accordance with an actual scale. - The present disclosure will be further explained in conjunction with the accompanying drawings.
-
FIG. 1 shows acleaning device 50 according to the present disclosure. Thecleaning device 50 comprises a plurality of cleaning units, and a conveyor which is used for connecting the plurality of cleaning units and capable of conveying an object to be cleaned. The conveyor can be used to connect the plurality of cleaning units, so as to facilitate conveyance of the object to be cleaned to each of the cleaning units successively. Thecleaning device 50 can be one used for cleaning a glass substrate and a semi-finished array substrate, and can absolutely be one used for cleaning other products and workpieces that need cleaning. In the following, the present disclosure will be explained in detail, with thecleaning device 50 used for cleaning a glass substrate and a semi-finished array substrate as an example. - The
cleaning device 50 comprises seven cleaning units, respectively as afirst cleaning unit 51 which can remove organics from an object to be cleaned using ultraviolet light; asecond cleaning unit 52 which can remove particles from the object to be cleaned using water and gases; athird cleaning unit 53 which can remove organics and metal ions from the object to be cleaned using ozone water, or can oxidize amorphous silicon on the object to be cleaned using ozone water, so as to form a silicon oxide layer on a surface of the amorphous silicon; afourth cleaning unit 54 which can remove the silicon oxide layer through hydrofluoric acid etching; afifth cleaning unit 55 which can be used for second removal of particles from the object to be cleaned using hydrogen water; asixth cleaning unit 56 which can oxidize the surface of the amorphous silicon into a homogeneous and compact silicon oxide layer using ozone water; aseventh cleaning unit 57 which can remove particles from the object to be cleaned using water and gases; an air-dyingunit 58, and aconveyor 59. Theconveyor 59 can be used to connect all of the plurality of cleaning units in series, so as to facilitate conveyance of the object to be cleaned to each of the plurality of cleaning units, successively. The plurality of cleaning units and theconveyor 59 are each well known in the art, and therefore will not be explained in detail herein. - When the
cleaning device 50 is used to clean a glass substrate, although thefourth cleaning unit 54 is unnecessary in cleaning of the glass substrate, liquid leakages having dripped onto the glass substrate therefrom will corrode the glass substrate. This will prevent the glass substrate from working properly. Therefore, it will be necessary for thefourth cleaning unit 54 to have a mechanism or structure that can prevent the liquid leakages therefrom from dripping onto the glass substrate. In addition, when thecleaning device 50 is used to clean a semi-finished array substrate or other products, other cleaning units or combinations of cleaning units can also be left unused, and therefore will need a mechanism or structure that can prevent a liquid leakage from dripping onto the object to be cleaned. One skilled in the art can select which cleaning unit is to be provided with such a mechanism or structure that can prevent a liquid leakage from dripping onto the object to be cleaned based on practical requirements. A simplest solution is to arrange such a mechanism or structure that can prevent a liquid leakage from dripping onto the object to be cleaned in each of the plurality of cleaning units, whereby a corresponding mechanism can be activated where necessary. -
FIG. 2 shows acleaning unit 10, which can be any one of the plurality of cleaning units arranged in thecleaning device 50. Thecleaning unit 10 comprises abody 8, aworking chamber 9 formed within thebody 8, and a liquid spray unit 3 arranged in theworking chamber 9 and capable of spraying liquid to anobject 1 to be cleaned. Theconveyor 59, which runs through theworking chamber 9 and is located below the liquid spray unit 3, can convey theobject 1 to be cleaned from a previous cleaning unit to a subsequent cleaning unit. The liquid spray unit 3 can comprise a plurality ofliquid spray members 3 a, which can be selected as spray nozzles capable of spraying liquid on a surface of theobject 1 to be cleaned, so as to achieve a cleaning or etching function of thecleaning unit 10. - In order to prevent a liquid leakage dripping from the liquid spray unit 3 from dripping onto the
object 1 to be cleaned, thecleaning unit 10 can further comprise a plurality ofrotatable baffles 5 arranged between the liquid spray unit 3 and theconveyor 59, and adriving mechanism 6 that is configured to actuate each of the plurality ofbaffles 5 into rotation. Thebaffles 5 can be in the form of rectangles, which can facilitate manufacture and cost saving thereof. The liquid leakage as aforementioned refers to a liquid dripping from the liquid spray unit 3 when it is not working. - As shown in
FIGS. 3-6 , thedriving mechanism 6 not only can actuate rotation of each of the plurality ofbaffles 5 along a first direction, and enable overlapping of each of the plurality ofbaffles 5 with adjacent baffles (i.e., a closed state), so as to prevent a liquid leakage dripping from the liquid spray unit 3 from dripping onto theobject 1 to be cleaned, but also can actuate rotation of each of the plurality ofbaffles 5 along an opposite direction of the first direction, so as to open the liquid spray unit 3 wide, i.e., open all of thespray nozzles 3 a arranged in the liquid spray unit 3, an open state for short. As indicated inFIG. 3 , when each of the plurality ofbaffles 5 overlaps with adjacent baffles, a complete plane can be formed for receiving liquid leakages dripping from the liquid spray unit 3, so as to prevent the liquid leakages from continuously flowing down and thus dripping onto theobject 1 to be cleaned. This can prevent the liquid leakages from harming or affecting the object to be cleaned. - As shown in
FIGS. 3 to 6 , thedriving mechanism 6 can comprise a liftingpart 61 that can rise and fall along a vertical direction V, and a plurality ofpull rods 62. AsFIG. 2 indicates, the liftingpart 61 can be connected to a top wall of the workingchamber 9 by means of a translation member 63, so as to achieve rise and fall of the liftingpart 61. The translation member 63 can be selected as a linear motor or a hydraulic cylinder. Each of the plurality ofpull rods 62 has one end hinged to acorresponding baffle 5, and another end connected to the liftingpart 61. Hinge joints between the plurality ofpull rods 62 and the plurality ofbaffles 5 can allow said plurality ofbaffles 5 to rotate. As shown inFIG. 5 , two ends of each of the plurality ofbaffles 5 are respectively connected to the liftingpart 61 by means of correspondingpull rods 62. This can improve stability of thebaffles 5, and prevent occurrence of deformation thereof to a certain degree. - In one embodiment not shown, the plurality of
baffles 5 can be disposed between the liquid spray unit 3 and theconveyor 59 by means of a plurality of vertical rods, each of which can have a top end fixed to the top wall of the workingchamber 9, and a bottom end hinged to acorresponding baffle 5. In one preferred embodiment, however, thecleaning unit 10 can further comprise a plurality ofsupport rods 7. As shown inFIG. 5 orFIG. 6 , the number of thesupport rods 7 can be the same as that of thebaffles 5. A bottom end of each of the plurality ofsupport rods 7 is hinged to an end portion of acorresponding baffle 5, while a top end of each of the plurality ofsupport rods 7 is connected to a side wall of the workingchamber 9 by means of a shiftingpair 12. The shiftingpair 12 can comprise a waist-shapedhole 12 a provided at the bottom end of acorresponding support rod 7, and apin 12 b fixed on aside wall 9 a of the workingchamber 9 and can be engaged into the waist-shapedhole 12 a, as indicated inFIG. 2 or 3 . - As shown in
FIGS. 3-6 , the liftingpart 61, when going up, can pull the plurality ofbaffles 5 through the plurality ofpull rods 62. As a result, the plurality ofbaffles 5 moves upward, and meanwhile, drives the plurality ofsupport rods 7 to move upward as well, until a bottom end of the waist-shapedhole 12 a provided on each of the plurality ofsupport rods 7 contacts acorresponding pin 12 b. Afterwards, the liftingpart 61 which is continuously rising can thus, by means of the plurality ofpull rods 62, actuate each of the plurality ofbaffles 5 into rotation along an opposite direction of a first direction A, until each of the plurality ofbaffles 5 is set free from an overlapping relationship with adjacent baffles and thus the liquid spray unit 3 is wide open. Since the plurality ofbaffles 5 only starts rotating after it is raised along with the plurality ofsupport rods 7, thebaffles 5 will be rotating free from hindrance of the object to be cleaned, thus achieving smooth rotation thereof. - In one preferred embodiment, when the
baffles 5 each have been overlapped with one another, ahinge position 15 between any one of the plurality ofpull rods 62 and acorresponding baffle 5 is lower than ahinge position 16 between acorresponding support rod 7 and saidcorresponding baffle 5, as indicated inFIG. 3 . Such being the case, each of the plurality ofbaffles 5 can rotate smoothly along the first direction A. - In one preferred embodiment, an overlapping surface S of any two
adjacent baffles 5 is in the form of an inclined surface, a curved surface, or a bend surface. The overlapping surface S in such forms can increase a contact surface between thebaffles 5, and improve sealing properties thereof, thus preventing continuous dripping of liquid leakages therefrom. - According to the
cleaning device 50 of the present disclosure, at least one of the plurality of cleaningunits 10 is provided with a plurality ofrotatable baffles 5 therein. The plurality ofbaffles 5 can form a complete plane after being overlapped with one another, to receive liquid leakages dripping from the liquid spray unit 3 arranged in thecleaning unit 10. This can prevent the liquid leakages from continuously flowing downward to drip onto theobject 1 to be cleaned. Thus, the liquid leakages dripping fromnon-used cleaning units 10 can be prevented from dripping onto theobject 1 to be cleaned, thereby avoiding the object to be cleaned from being harmed or affected by the liquid leakages. - Although the present disclosure has been described with reference to preferred embodiments, various modifications and variants to the present disclosure may be made by anyone skilled in the art, without departing from the scope and spirit of the present disclosure. In particular, as long as there is no structural conflict, various embodiments as well as the respective technical features mentioned herein may be combined with one another in any manner. The present disclosure is not limited to the specific embodiments disclosed herein, but rather includes all the technical solutions falling within the scope of the claims.
Claims (16)
1. A cleaning device, comprising a plurality of cleaning units, and a conveyor which is used for connecting the plurality of cleaning units and capable of conveying an object to be cleaned,
wherein each of the plurality of cleaning units includes a body, a working chamber formed within the body, and a liquid spray unit arranged in the working chamber and capable of spraying liquid to the object to be cleaned,
wherein the conveyor runs through the working chamber and is located below the liquid spray unit, and at least one of the plurality of cleaning units comprises a plurality of baffles arranged between the liquid spray unit and the conveyor, and a driving mechanism arranged in the working chamber, and
wherein the driving mechanism is configured to actuate each of the plurality of baffles into rotation along a first direction to overlap with adjacent baffles, so as to prevent liquid leakages dripping from the liquid spray unit from dripping onto the object to be cleaned, and further actuate each of the plurality of baffles into rotation along an opposite direction of the first direction, so as to open the liquid spray unit wide.
2. The cleaning device according to claim 1 , wherein the driving mechanism comprises a lifting part that can rise and fall along a vertical direction, and a plurality of pull rods, each of which has one end hinged to a corresponding baffle, and another end fixedly connected to the lifting part.
3. The cleaning device according to claim 2 , wherein two ends of each of the plurality of baffles are respectively connected to the lifting part by means of corresponding pull rods.
4. The cleaning device according to claim 3 , wherein the lifting part is connected to a top wall of the working chamber by means of a translation member, so as to be actuated for a lifting movement.
5. The cleaning device according to claim 4 , further comprising a plurality of support rods, each of which has a bottom end hinged to a corresponding baffle, and a top end connected to a side wall of the working chamber by means of a shifting bar.
6. The cleaning device according to claim 5 , wherein the shifting pair comprises a waist-shaped hole arranged at a top end of a corresponding support rod, and a pin fixed on the side wall of the working chamber and capable of being engaged into the waist-shaped hole.
7. The cleaning device according to claim 6 , wherein after the plurality of baffles is overlapped with one another, a hinge position of any one of the plurality of pull rods to a corresponding baffle is lower than a hinge position of a corresponding support rod to the corresponding baffle.
8. The cleaning device according to claim 7 , wherein an overlapping surface of any two adjacent baffles is in the form of an inclined surface, a curved surface, or a bend surface.
9. The cleaning device according to claim 8 , wherein the plurality of baffles is in the form of a plurality of rectangles.
10. The cleaning device according to claim 7 , wherein the object to be cleaned is a glass substrate or a semi-finished array substrate.
11. The cleaning device according to claim 2 , further comprising a plurality of support rods, each of which has a bottom end hinged to a corresponding baffle, and a top end connected to a side wall of the working chamber by means of a shifting bar.
12. The cleaning device according to claim 11 , wherein the shifting pair comprises a waist-shaped hole arranged at a top end of a corresponding support rod, and a pin fixed on the side wall of the working chamber and capable of being engaged into the waist-shaped hole.
13. The cleaning device according to claim 11 , wherein after the plurality of baffles is overlapped with one another, a hinge position of any one of the plurality of pull rods to a corresponding baffle is lower than a hinge position of a corresponding support rod to the corresponding baffle.
14. The cleaning device according to claim 1 , wherein an overlapping surface of any two adjacent baffles is in the form of an inclined surface, a curved surface, or a bend surface.
15. The cleaning device according to claim 14 , wherein the plurality of baffles is in the form of a plurality of rectangles.
16. The cleaning device according to claim 1 , wherein the object to be cleaned is a glass substrate or a semi-finished array substrate.
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201410797975.1 | 2014-12-18 | ||
CN201410797975 | 2014-12-18 | ||
CN201410797975.1A CN104624568B (en) | 2014-12-18 | 2014-12-18 | A kind of cleaning equipment |
PCT/CN2015/070550 WO2016095299A1 (en) | 2014-12-18 | 2015-01-12 | Cleaning device |
Publications (2)
Publication Number | Publication Date |
---|---|
US20160243600A1 true US20160243600A1 (en) | 2016-08-25 |
US10173251B2 US10173251B2 (en) | 2019-01-08 |
Family
ID=53204081
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US14/417,814 Active 2035-10-26 US10173251B2 (en) | 2014-12-18 | 2015-01-12 | Cleaning device for cleaning a glass substrate and a semi-finished array substrate |
Country Status (3)
Country | Link |
---|---|
US (1) | US10173251B2 (en) |
CN (1) | CN104624568B (en) |
WO (1) | WO2016095299A1 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112317422A (en) * | 2020-10-15 | 2021-02-05 | 田仁霞 | Supporting plate cleaning device for baking-free brick machine |
CN112547595A (en) * | 2020-12-10 | 2021-03-26 | 王燕飞 | Glass cleaning device is used in display production |
CN113458025A (en) * | 2021-05-26 | 2021-10-01 | 申惠波 | Medical scanning equipment capable of enlarging observation visual angle of operator |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105437005A (en) * | 2015-12-16 | 2016-03-30 | 重庆嘉威特节能玻璃有限公司 | Glass grinding machine |
CN112151354A (en) * | 2019-06-26 | 2020-12-29 | 陕西坤同半导体科技有限公司 | Surface treatment method for polycrystalline silicon film |
CN111940395B (en) * | 2020-08-07 | 2022-03-25 | 江苏弘扬石英制品有限公司 | Automatic cleaning machine for quartz rod |
CN112934886B (en) * | 2021-01-29 | 2022-11-11 | 陕西硒宝科技有限公司 | Cleaning equipment for drinking water filling barrel |
CN113575444B (en) * | 2021-08-03 | 2022-11-04 | 山东中医药大学 | Intelligent forced swimming device for big and small mice |
Family Cites Families (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3726581A (en) * | 1971-06-01 | 1973-04-10 | Gen Electric | Rack level adjustment apparatus in an appliance cabinet |
JPH0592263A (en) * | 1991-10-01 | 1993-04-16 | Matsushita Electric Ind Co Ltd | Spray type flux applying device |
US5413131A (en) * | 1994-05-06 | 1995-05-09 | Medlock; Harold G. | Produce washer |
JP3171807B2 (en) * | 1997-01-24 | 2001-06-04 | 東京エレクトロン株式会社 | Cleaning device and cleaning method |
US6191428B1 (en) * | 1998-06-30 | 2001-02-20 | Joseph J. Gilberti | Ultraviolet shutter |
US7045746B2 (en) * | 2003-11-12 | 2006-05-16 | Mattson Technology, Inc. | Shadow-free shutter arrangement and method |
US20050241674A1 (en) * | 2004-04-30 | 2005-11-03 | Demchuk James W | Louvered spray guard for trapping overspray during spray washing of silk screens |
US7946302B2 (en) * | 2006-02-03 | 2011-05-24 | George Koch Sons Llc | Parts immersion apparatus and method |
JP2009004728A (en) * | 2007-05-24 | 2009-01-08 | Dainippon Screen Mfg Co Ltd | Substrate processing apparatus |
US8426778B1 (en) * | 2007-12-10 | 2013-04-23 | Novellus Systems, Inc. | Tunable-illumination reflector optics for UV cure system |
JP2009147260A (en) * | 2007-12-18 | 2009-07-02 | Dainippon Screen Mfg Co Ltd | Substrate processing apparatus |
JP5584409B2 (en) * | 2008-02-21 | 2014-09-03 | キヤノンアネルバ株式会社 | Sputtering apparatus and control method thereof |
KR101096062B1 (en) | 2009-07-09 | 2011-12-20 | 중앙산업 (주) | Shot blasting apparatus |
JP2011092891A (en) | 2009-10-30 | 2011-05-12 | Yokogawa Denshikiki Co Ltd | Substrate washing apparatus |
US8584612B2 (en) * | 2009-12-17 | 2013-11-19 | Lam Research Corporation | UV lamp assembly of degas chamber having rotary shutters |
CN201899095U (en) * | 2010-11-11 | 2011-07-20 | 高翔 | Indoor emergency seismic refuge table |
CN201921860U (en) * | 2010-11-30 | 2011-08-10 | 深圳市和科达液晶设备有限公司 | Cleaning machine box |
CN102825050B (en) * | 2012-08-14 | 2014-10-29 | 深圳市华星光电技术有限公司 | Cleaning machine for glass substrates |
KR101512560B1 (en) | 2012-08-31 | 2015-04-15 | 가부시키가이샤 스크린 홀딩스 | Substrate processing apparatus |
CN202824004U (en) | 2012-10-11 | 2013-03-27 | 京东方科技集团股份有限公司 | Base plate cleaning device |
CN102942046A (en) * | 2012-11-30 | 2013-02-27 | 无锡杰思物流设备有限公司 | Stopping mechanism for conveyor |
CN103752571B (en) * | 2013-12-27 | 2017-08-08 | 深圳市华星光电技术有限公司 | Base plate cleaning device |
CN103962346B (en) * | 2014-05-21 | 2016-08-24 | 深圳市华星光电技术有限公司 | The method of the ultraviolet rays cleaning substrate of adjustable ultraviolet radiation energy |
CN104058112B (en) * | 2014-06-30 | 2016-05-11 | 无锡特邦商业设备制造有限公司 | Automatic mounting rice machine for a kind of supermarket |
-
2014
- 2014-12-18 CN CN201410797975.1A patent/CN104624568B/en active Active
-
2015
- 2015-01-12 US US14/417,814 patent/US10173251B2/en active Active
- 2015-01-12 WO PCT/CN2015/070550 patent/WO2016095299A1/en active Application Filing
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112317422A (en) * | 2020-10-15 | 2021-02-05 | 田仁霞 | Supporting plate cleaning device for baking-free brick machine |
CN112547595A (en) * | 2020-12-10 | 2021-03-26 | 王燕飞 | Glass cleaning device is used in display production |
CN113458025A (en) * | 2021-05-26 | 2021-10-01 | 申惠波 | Medical scanning equipment capable of enlarging observation visual angle of operator |
Also Published As
Publication number | Publication date |
---|---|
CN104624568B (en) | 2016-07-27 |
US10173251B2 (en) | 2019-01-08 |
CN104624568A (en) | 2015-05-20 |
WO2016095299A1 (en) | 2016-06-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US10173251B2 (en) | Cleaning device for cleaning a glass substrate and a semi-finished array substrate | |
KR101821359B1 (en) | mobile phone auto cleaning device | |
JP2016502275A (en) | Semiconductor wafer cleaning method and semiconductor wafer cleaning apparatus | |
US10870137B2 (en) | Sheet cleaning device and method | |
US20120273463A1 (en) | Substrate treating apparatus and substrate treating method | |
CN202828949U (en) | Transfer component and transfer device and equipment with transfer device | |
CN104148306A (en) | Solar cell dust-cleaning device | |
CN103407755B (en) | With the connecting gear of cleaning assembly | |
KR100467915B1 (en) | Substrate holder, and system for cleaning and drying same | |
KR101141155B1 (en) | Substrate treating apparatus | |
US20060254625A1 (en) | Sprayer and cleaning apparatus using the same | |
US7367725B2 (en) | Method for removing developing solution | |
KR101357767B1 (en) | cassete for thin plate glass and chemical treatment | |
KR102480778B1 (en) | Apparatus for Treating Substrate | |
KR102160135B1 (en) | Apparatus for treating substrate | |
JP2014069126A (en) | Substrate treatment apparatus | |
KR101213967B1 (en) | Wafer cleaning apparatus | |
JP5202400B2 (en) | Substrate processing apparatus and substrate processing method | |
KR101486572B1 (en) | Glass Slimming Apparatus | |
KR20080035123A (en) | Decive for cleaning buffer zone in wet station | |
US20140190532A1 (en) | Nozzle cleaning device and coater provided with it | |
KR20140050863A (en) | Apparatus for treating substrate | |
CN108023980B (en) | Anti-dazzle surface treatment equipment and treatment method for special-shaped glass cover plate | |
CN111463152B (en) | High-pressure washing equipment for semiconductor substrate and using method thereof | |
KR101357771B1 (en) | process method of cassete for thin plate glass and chemical treatment |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AS | Assignment |
Owner name: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO. Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:LI, ZIJIAN;REEL/FRAME:036380/0691 Effective date: 20150318 |
|
STCF | Information on status: patent grant |
Free format text: PATENTED CASE |
|
MAFP | Maintenance fee payment |
Free format text: PAYMENT OF MAINTENANCE FEE, 4TH YEAR, LARGE ENTITY (ORIGINAL EVENT CODE: M1551); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY Year of fee payment: 4 |