US20140252647A1 - Warpage Reduction and Adhesion Improvement of Semiconductor Die Package - Google Patents
Warpage Reduction and Adhesion Improvement of Semiconductor Die Package Download PDFInfo
- Publication number
- US20140252647A1 US20140252647A1 US13/790,739 US201313790739A US2014252647A1 US 20140252647 A1 US20140252647 A1 US 20140252647A1 US 201313790739 A US201313790739 A US 201313790739A US 2014252647 A1 US2014252647 A1 US 2014252647A1
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- semiconductor die
- package
- layer
- compressive dielectric
- die package
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Definitions
- Semiconductor devices are used in a variety of electronic applications, such as personal computers, cell phones, digital cameras, and other electronic equipment, as examples. Semiconductor devices are typically fabricated by sequentially depositing insulating or dielectric layers, conductive layers, and semiconductive layers of materials over a semiconductor substrate, and patterning the various material layers using lithography to form circuit components and elements thereon.
- PoP package on package
- FIG. 1A is a perspective view of a package structure, in accordance with some embodiments.
- FIG. 1B show a cross-sectional view of a die package, in accordance with some embodiments.
- FIGS. 2A-2I show cross-sectional views of a sequential process flow of preparing a die package, in accordance with some embodiments.
- FIGS. 3A-3C show cross-sectional views of die packages with different redistribution structures, in accordance with some embodiments.
- FIG. 4 shows a cross-sectional view of a package on package (PoP) structure, in accordance with some embodiments.
- Three-dimensional integrated circuits have been therefore created to resolve the above-discussed limitations.
- two or more die packages each including one or more semiconductor dies, are formed.
- the die packages are then bonded together.
- Through package vias also referred to as through molding vias (TMVs), through assembly vias (TAVs) or through substrate vias (TSVs)
- TSVs through package vias
- TSVs through molding vias
- TSVs through assembly vias
- TSVs through substrate vias
- TPVs are increasingly used as a way of implementing 3D ICs.
- TPVs are often used in 3D ICs and stacked dies to provide electrical connections and/or to assist in heat dissipation.
- FIG. 1A is a perspective view of a package structure 100 including a package 110 bonded to another package 120 , which is further bonded to another substrate 130 in accordance with some embodiments.
- Each of die packages 110 and 120 includes at least a semiconductor die (not shown).
- the semiconductor die includes a semiconductor substrate as employed in a semiconductor integrated circuit fabrication, and integrated circuits may be formed therein and/or thereupon.
- the semiconductor substrate refers to any construction comprising semiconductor materials, including, but not limited to, bulk silicon, a semiconductor wafer, a silicon-on-insulator (SOI) substrate, or a silicon germanium substrate. Other semiconductor materials including group III, group IV, and group V elements may also be used.
- the semiconductor substrate may further comprise a plurality of isolation features (not shown), such as shallow trench isolation (STI) features or local oxidation of silicon (LOCOS) features.
- the isolation features may define and isolate the various microelectronic elements.
- the various microelectronic elements that may be formed in the semiconductor substrate include transistors (e.g., metal oxide semiconductor field effect transistors (MOSFET), complementary metal oxide semiconductor (CMOS) transistors, bipolar junction transistors (BJT), high voltage transistors, high frequency transistors, p-channel and/or n-channel field effect transistors (PFETs/NFETs), etc.); resistors; diodes; capacitors; inductors; fuses; and other suitable elements.
- MOSFET metal oxide semiconductor field effect transistors
- CMOS complementary metal oxide semiconductor
- BJT bipolar junction transistors
- resistors diodes
- capacitors inductors
- fuses and other suitable elements.
- microelectronic elements including deposition, etching, implantation, photolithography, annealing, and/or other suitable processes.
- the microelectronic elements are interconnected to form the integrated circuit device, such as a logic device, memory device (e.g., SRAM), RF device, input/output (I/O) device, system-on-chip (SoC) device, combinations thereof, and other suitable types of devices.
- Package 120 includes through substrate vias (TPVs) and function as an interposer, in accordance with some embodiments.
- Substrate 130 may be made of bismaleimide triazine (BT) resin, FR-4 (a composite material composed of woven fiberglass cloth with an epoxy resin binder that is flame resistant), ceramic, glass, plastic, tape, film, or other supporting materials that may carry the conductive pads or lands needed to receive conductive terminals.
- substrate 130 is a multiple-layer circuit board.
- Package 110 is bonded to package 120 via connectors 115
- package 120 is bonded to substrate 130 via external connectors 145 .
- the external connectors 145 are bonded bump structures, such as bonded solder bumps, or bonded copper posts with a joining solder layer.
- FIG. 1B show a cross-sectional view of die package 120 , in accordance with some embodiments.
- Package 120 includes a semiconductor die 121 and TPVs 122 , which surround die 121 and are located near the edges of package 120 .
- Package 120 also includes a first redistribution structure 124 and a second redistribution structure 125 .
- Each of first redistribution structure 124 and second redistribution structure 125 includes one or more redistribution layers (RDLs), which are metal interconnect layers and are surrounded by dielectric material(s).
- RDLs redistribution layers
- TPVs 122 are connected to both first redistribution structure 124 and second redistribution structure 125 .
- Die 121 is connected to first redistribution structure 124 on one side and to second redistribution structure 125 on the other side via connectors 127 .
- connectors 127 are surrounded by a molding compound 128 .
- molding compound 128 is made of a polymer, such as epoxy, polyimide, polybenzoxazole (PBO), etc.
- the molding compound 128 includes solid fillers, such as silica, or other applicable materials, to increase its strength.
- connectors 127 are surrounded by an underfill, instead of a molding compound.
- first redistribution structure 124 and second redistribution structure 125 enable fan-out of die 121 .
- Package 110 bonded to package 120 may include one or more dies, which may be placed beyond the boundary of die 121 due to fan-out enabled by first redistribution structure 124 .
- the second redistribution structure 125 is connected to contact structures 127 , such as conductive bumps.
- the conductive bumps include copper posts.
- the space between first redistribution structure 124 and second redistribution structure 125 is filled with a molding compound 123 .
- the molding compound 123 is made of a polymer, such as epoxy.
- the molding compound 123 includes a filler, such as silica, to increase strength of the molding compound 123 .
- package 120 bows upward at the edges, as shown in FIG. 1B in accordance with some embodiments.
- the way package 120 bows (or warps) upward at the edges is similar to die bowing due to having a tensile film on the die.
- Such bowing (or warpage) is not desirable for forming package on package (PoP) structure, because bowing could cause metal/dielectric interfacial delamination to affect reliability of connections between 120 and 110 .
- bowing of package 120 could break portions of RDLs in first redistribution structure 124 and/or second redistribution structure 125 to degrade yield. Therefore, it is desirable to reduce bowing during formation of package 120 .
- FIGS. 2A-2I show cross-sectional views of a sequential process flow of preparing a die package 120 ′, in accordance with some embodiments.
- Package 120 ′ which is similar to package 120 , has less bowing than package 120 described above in FIG. 1B .
- package 120 ′ has no observable bowing.
- FIG. 2A shows an adhesive layer 202 , which is over carrier 201 .
- Carrier 201 is made of glass, in accordance with some embodiments. However, other materials may also be used for carrier 201 .
- Adhesive layer 202 is deposited or laminated over carrier 201 , in some embodiments.
- Adhesive layer 202 may be formed of a glue, or may be a lamination layer formed of a foil.
- adhesive layer 202 is photosensitive and is easily detached from carrier 201 by shining ultra-violet (UV) light on carrier 201 after package 120 ′ is formed.
- adhesive layer 202 may be a light-to-heat-conversion (LTHC) coating made by 3M Company of St. Paul, Minn.
- a cushion layer 203 is then formed over the adhesive layer.
- the cushion layer 203 is dielectric and is made of a polymer, such as polyimide, polybenzoxazole (PBO), or benzocyclobutene (BCB), in some embodiments.
- the cushion layer 203 has thickness in a range from about 5 ⁇ m to about 10 ⁇ m.
- a diffusion barrier and copper seed dual layer 204 is formed on the cushion layer 203 .
- the diffusion barrier layer is made of Ti and the copper seed layer is made of copper.
- the diffusion barrier layer may be made of other materials, such as TaN, or other applicable materials.
- the dual layer 204 is formed by a physical vapor deposition process, or sputter process in accordance with some embodiment.
- the diffusion barrier layer has thickness in a range from about 0.05 ⁇ m to about 0.1 ⁇ m.
- the copper seed layer has thickness in a range from about 0.3 ⁇ m to about 0.5 ⁇ m.
- a photoresist layer 205 is formed over dual layer 204 , as shown in FIG. 2B in accordance with some embodiments.
- the photoresist layer 205 may be formed by a wet process, such as a spin-on process, or by a dry process, such as by a dry film.
- the photoresist layer 205 is patterned to formed openings 206 , which are filled to form TSVs 122 described above in FIG. 1B .
- the processes involved include photolithography and resist development.
- the width W of openings 206 is in a range from about 40 ⁇ m to about 90 ⁇ m.
- the depth D of openings 206 is in a range from about 80 ⁇ m to about 120 ⁇ m.
- a copper-containing conductive layer 207 is plated to fill openings 206 , in accordance with some embodiments.
- the copper-containing conductive layer 207 may be made of copper or copper alloy.
- the thickness of the copper-containing layer 207 deposited is in a range from about 80 ⁇ m to about 120 ⁇ m.
- CMP chemical-mechanical polishing
- a planarization process such as chemical-mechanical polishing (CMP) process is applied on carrier 201 to remove excess copper-containing conductive layer 207 outside openings 206 .
- CMP chemical-mechanical polishing
- the photoresist layer 205 is removed by an etching process, which may be a dry or a wet process.
- FIG. 2C shows a cross-sectional view of the structure on carrier 201 after the photoresist layer 205 is removed and conductive material in the openings 206 are exposed as (conductive) columns 122 ′′, in accordance with some embodiments.
- Glue layer 210 is made of a die attach film (DAF), in accordance with some embodiments. DAF may be made of epoxy resin, phenol resin, acrylic rubber, silica filler, or a combination thereof.
- DAF die attach film
- a liquid molding compound material is then applied on the exposed surface over carrier 201 to fill the space between columns 122 and die 121 and to cover die 121 and columns 122 ′′.
- a thermal process is then applied to harden the molding compound material and to transform it into molding compound 123 .
- Columns 122 become TPVs 122 after the molding compound 123 is formed to surround them.
- a planarization process is applied to remove excess molding compound 123 to expose TPVs 122 and connectors 127 of die 121 , as shown in FIG. 2E in accordance with some embodiments.
- the planarization process is a grinding process.
- a second redistribution structure 125 ′ is formed, as will be described in more detail below.
- a redistribution structure such as first redistribution structure 124 or second redistribution structure 125 , includes one or more redistribution layers (RDLs), which are metal interconnect layers and are surrounded by dielectric material(s).
- the RDL(s) is insulated by one or more dielectric layers, which are called passivation layers.
- passivation layers are made of polymers, such as polyimide, polybenzoxazole (PBO), or benzocyclobutene (BCB). Passivation layers made of polymers further increase warpage (or bowing) of the die package, as illustrated and described in FIG. 1B .
- a compressive dielectric layer 212 is formed on post-planarization surface 211 as a passivation layer, as shown in FIG. 2F in accordance with some embodiments.
- the stress and film thickness of the compressive dielectric layer 212 are tuned to counter the bowing effect described above.
- the compressive dielectric layer 212 is made of SiN by plasma-enhanced chemical vapor deposition (PECVD).
- PECVD plasma-enhanced chemical vapor deposition
- a compressive SiN layer may be formed by a low-temperature (LT) PECVD process at about 250° C.
- LT low-temperature PECVD
- a low-temperature PECVD is preferred due to existing metal structures on carrier 201 . Metal structures that include copper, copper alloy, or aluminum could deform at temperature close to or above 400° C.
- the compressive stress of dielectric layer 212 reduces warpage or bowing of the die package.
- the stress of the compressive dielectric layer 212 is in a range from about 300 MPa to about 700 MPa.
- the thickness of layer 212 is in a range from about 0.5 ⁇ m to about 7 ⁇ m, in accordance with some embodiments.
- the compressive dielectric layer 212 formed by a PECVD process adheres well to molding compound 123 and the copper-containing conductive layer 207 that come in contact with layer 212 .
- the adhesion between compressive dielectric layer 212 and molding compound 123 and conductive layer 207 is better than the adhesion between a polymer passivation layer and molding compound 123 and conductive layer 207 .
- the plasma in the PECVD process may play a role in treating the surfaces of molding compound 123 and conductive layer 207 to improve the adhesion.
- a first RDL 213 is formed over layer 212 , as shown in FIG. 2G in accordance with some embodiments.
- the formation of RDL 213 involves patterning the dielectric layer 212 to form openings in layer 212 to enable direct contact with conductive layer 207 of TPVs 122 and connectors 127 coupled to die 121 .
- the RDL 213 is made of a conductive material and directly contacts TPVs 122 and connectors 127 of die 121 .
- the RDL 213 is made of aluminum, aluminum alloy, copper, or copper-alloy. However, RDL 213 may be made of other types of conductive materials.
- the formation of RDL 213 also involves depositing a metal layer and patterning the metal layer to form RDL 213 .
- a polymer-based passivation layer 214 is formed over RDL 213 .
- the polymer-based passivation layer 214 may be made of polymers, such as polyimide, polybenzoxazole (PBO), or benzocyclobutene (BCB).
- the polymer-based passivation layer 214 can protect the die package and absorb stress induced on the die package during bonding with another die package.
- the polymer-based passivation layer 214 is then patterned to expose portions of RDL 213 to enable external connectors to connect RDL 213 .
- Compressive dielectric layer 212 , RDL 213 and polymer-based passivation layer 214 are part of the second redistribution layer 125 .
- FIG. 2G also shows that external connectors 126 include contact pads 215 with solder balls 216 .
- a under bump metallurgy (UBM) layer (not shown) is formed between the interface between RDL 213 and contact pads 215 .
- the UBM layer also lines the sidewalls of openings of passivation layer 214 used to form contact pads 215 .
- RDL 213 and contact pads 215 are made of aluminum, aluminum alloy, copper, or copper-alloy.
- RDL 213 and contact pads 215 can be made of different materials. For example, RDL is made or aluminum and contact pads 215 are made of copper, and vice versa.
- the external connectors 126 with contact pads 215 and solder balls 216 described above are merely examples. Other external connectors may also be used. Exemplary details of redistribution structures and bonding structures, and methods of forming them are described in U.S. application Ser. No. 13/427,753, entitled “Bump Structures for Multi-Chip Packaging,” filed on Mar. 22, 2012 (Attorney Docket No. TSM11-1339), and U.S. application Ser. No. 13/338,820, entitled “Packaged Semiconductor Device and Method of Packaging the Semiconductor Device,” filed on Dec. 28, 2011 (Attorney Docket No. TSM11-1368). Both above-mentioned applications are incorporated herein by reference in their entireties.
- a glue 217 is applied on the surface of external connectors 126 of structure of FIG. 2G and the structure is flipped to be glued to another carrier 220 , as shown in FIG. 2H in accordance with some embodiments.
- the cushion layer 203 , the dual layer 204 , and the glue layer 210 are removed to expose TPVs 122 and die 121 by a planarization process.
- the planarization process is a grinding process.
- the first redistribution layer 124 is formed over surface 218 of molding compound of FIG. 2H , as shown in FIG. 2I in accordance with some embodiments.
- FIG. 2I shows that the first redistribution layer 124 include a RDL 222 , which is sandwiched between two passivation layers 219 and 221 .
- the RDL 222 is made of a conductive material and directly contacts TPVs 122 .
- the RDL 222 is made of aluminum, aluminum alloy, copper, or copper-alloy.
- RDL 222 may be made of other types of conductive materials.
- the passivation layers 219 and 221 are made of dielectric material(s) and provide stress relief for bonding stress incurred during bonding with package die 110 .
- the passivation layers 219 and 221 are made of polymers, such as polyimide, polybenzoxazole (PBO), or benzocyclobutene (BCB).
- passivation layer 219 is made of a compressive dielectric material similar to compressive dielectric layer 212 described above. The ranges of film stress and thickness of the compressive dielectric material also help reducing warpage (or bowing) of die package formed.
- External connectors 230 are be formed over the first redistribution structure 124 , in accordance with some embodiments.
- external connectors 230 include contact pads 231 and solder balls 232 , which are formed over passivation layer 221 to contact RDL 222 .
- the structure above carrier 220 is then removed from carrier 220 and the glue layer 217 is also removed.
- the structure above carrier 220 could include multiple die packages 120 ′, in accordance with some embodiments.
- the structure may be attached to a tape to undergo sawing to singulate die packages 120 ′ into individual die, as shown in FIG. 2I in accordance with some embodiments.
- die package 120 ′ does not bow upward or downward at the edges, in accordance with some embodiments.
- package 120 ′ exhibit small degree of bowing.
- the degree of bowing is much reduced compared to similar die package formed without the compressive dielectric layers.
- Package 120 ′ described above is merely an example.
- only layer 212 of redistribution structure 125 is made of a compressive dielectric film and layer 219 of redistribution structure 124 is a polymer-based passivation layer. The degree of bowing or warpage is reduced by using a compressive dielectric layer in one of the two redistribution structures.
- FIG. 3A shows a portion of packaged die 120 A with a second redistribution structure 125 A having three RDLs, 213 I , 213 II , and 213 III , in accordance with some embodiments.
- the three RDLs, 213 I , 213 II , and 213 III are similar to RDL 213 described above.
- the second redistribution structure 125 A has a compressive dielectric layer 212 and three polymer-based passivation layers, 214 I , 214 II , and 214 III .
- the polymer-based passivation layers, 214 I , 214 II , and 214 III are similar to polymer-based passivation layer 214 described above.
- the compressive dielectric layer 212 reduces warpage of the die package.
- Passivation layers, 214 I , 214 II , and 214 III protect die package and also absorb stress exerted on the die package during bonding.
- An external connector 126 with contact pad 215 and a solder ball 216 is also shown in FIG. 3A .
- An under bump metallurgy (UBM) layer 240 is formed between contact pad 215 and solder ball 216 to assist bonding, in accordance with some embodiments.
- UBM under bump metallurgy
- FIG. 3B shows a portion of packaged die 120 B with a second redistribution structure 125 B having three RDLs, 213 I , 213 II , and 213 III , in accordance with some embodiments.
- the three RDLs, 213 I , 213 II , and 213 III are similar to RDL 213 described above.
- the second redistribution structure 125 B has two compressive dielectric layers 212 I and 212 II formed next to each other, with layer 212 I formed first.
- the second redistribution structure 125 B also has two polymer-based passivation layers, 214 I , 214 II , formed over compressive dielectric layer 212 II .
- the compressive dielectric layers 212 I and 212 II are similar to layer 212 described above.
- the polymer-based passivation layers, 214 I , and 214 II are similar to polymer-based passivation layer 214 described above.
- the compressive dielectric layers 212 I and 212 II reduce warpage of the die package.
- Passivation layers, 214 I , and 214 II protect die package and also absorb stress exerted on the die package.
- FIG. 3C shows a portion of packaged die 120 C with a second redistribution structure 125 C having three RDLs, 213 I , 213 II , and 213 III , in accordance with some embodiments.
- the three RDLs, 213 I , 213 II , and 213 III are similar to RDL 213 described above.
- the second redistribution structure 125 C has compressive dielectric layers 212 I and 212 II , with layer 212 I formed first and a polymer-based passivation layer 214 I between layers 212 I and 212 II . Having a polymer-based passivation layer between two compressive dielectric layers could absorb stress exerted on the die package during bonding process.
- the second redistribution structure 125 C also has two polymer-based passivation layers, 214 I , 214 II , with layer 214 I formed over compressive dielectric layer 212 I and layer 214 II formed over layer 212 II .
- the compressive dielectric layers 212 I and 212 II are similar to layer 212 described above.
- the polymer-based passivation layers, 214 I , and 214 II are similar to polymer-based passivation layer 214 described above.
- the compressive dielectric layers 212 I and 212 II reduce warpage of the die package. Passivation layers, 214 I , and 214 II , protect die package and also absorb stress exerted on the die package.
- the embodiments described in FIGS. 2A-2I and 3 A- 3 C include two or 4 RDLs in each redistribution structure.
- the number of RDLs can be other than 2 or 4.
- the number of RDLs could be any integers, such as 1, 3, 5, or more.
- redistribution structures such as redistribution structures 124 and/or 125
- at least one polymer-based passivation layer is needed in each redistribution structure. If one or more compressive dielectric layers are used in a redistribution structure as passivation layers, one of the compressive dielectric layers is formed closest to the TPVs and semiconductor die.
- the number of compressive dielectric layers is equal to or less than the number of polymer-like passivation layers in the redistribution structure, in accordance with some embodiments. Sufficient number of layers of polymer-like passivation layers is needed to ensure good stress absorbance. One or more compressive dielectric layers are used to reduce the warpage (or bowing) of the die package.
- FIG. 4 shows a bonded structure 260 between die package 110 and die package 120 A , in accordance with some embodiments.
- Bonding structure 260 includes bonded solder layer 216 ′, which is formed by solder layer 216 of die package 120 A and a solder layer of die package 110 , which is coupled to contact pad 261 .
- the polymer-based passivation layers 124 I , 124 II , and 124 III provide cushion to stress during the formation (or bonding) of bonded structure 260 .
- the compressive dielectric layer 212 formed by PECVD reduces the bowing and yield of die package 120 A and also improves the quality of bonding between die package 110 and die package 120 A .
- the compressive layer 212 also improves the adhesion between redistribution structure 125 A and materials next to redistribution structure 125 A and surrounding the semiconductor die (not shown) in the die package.
- Various embodiments of mechanisms for forming a die package and a package on package (PoP) structure using one or more compressive dielectric layers to reduce warpage are provided.
- the compressive dielectric layer(s) is part of a redistribution structure of the die package and its compressive stress reduces or eliminates bowing of the die package.
- the one or more compressive dielectric layers improve the adhesion between redistribution structure and the materials surrounding the semiconductor die. As a result, the yield and reliability of the die package and PoP structure using the die package are improved.
- a semiconductor die package includes a semiconductor die embedded in a molding compound, and a through package via (TPV) electrically connected to the semiconductor die.
- the semiconductor die package also includes a first-side redistribution structure.
- the first-side redistribution structure includes at least one first-side redistribution layer (RDL), and a first-side compressive dielectric layer.
- the first-side compressive dielectric layer contacts the TPV and the molding compound surrounding the semiconductor die.
- the first-side redistribution structure also includes a first-side polymer-based passivation layer over the at least one first-side RDL.
- a semiconductor package on package (PoP) structure includes a first die package, and the first die package has a first semiconductor die and an external connector.
- the semiconductor PoP structure also includes a second die package.
- the second die package includes a second semiconductor die embedded in a molding compound, a through package via (TPV) electrically connected to the second semiconductor die, and a first-side redistribution structure.
- the first-side redistribution structure includes at least one first-side redistribution layer (RDL), and a first-side compressive dielectric layer. The first-side compressive dielectric layer contacts the TPV and the molding compound surrounding the semiconductor die.
- the first-side redistribution structure also includes a first-side polymer-based passivation layer over the at least one first RDL, and an external connector formed over the first-side redistribution structure.
- the external connector of the first die package is bonded to the external connector formed over the first-side redistribution structure of the second die package.
- a method of forming a die package includes forming a conductive column over a carrier, and attaching a semiconductor die to the carrier.
- the semiconductor die is disposed in parallel to the conductive column.
- the method also includes forming a molding compound to surround the semiconductor die and the conductive column, and to fill the space between the semiconductor die and the conductive column.
- the conductive column becomes a through package vias (TPV) after being surrounded by the molding compound.
- the method further includes forming a first redistribution structure over the semiconductor die and the TPV.
- the forming a first redistribution structure includes depositing a compressive dielectric layer over the semiconductor die and the TPV.
- the compressive dielectric layer decreases warpage of the die package.
- the forming a first redistribution structure also includes forming an RDL over the compressive dielectric layer, and forming a polymer-based passivation layer over the RDL.
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Abstract
Description
- This application relates to commonly assigned provisional patent application: Ser. No. 61/726,411 (Attorney Docket No. TSM12-0826), entitled “Warpage Control of Semiconductor Die Package” and filed on Nov. 14, 2012, which is incorporated herein in its entirety.
- Semiconductor devices are used in a variety of electronic applications, such as personal computers, cell phones, digital cameras, and other electronic equipment, as examples. Semiconductor devices are typically fabricated by sequentially depositing insulating or dielectric layers, conductive layers, and semiconductive layers of materials over a semiconductor substrate, and patterning the various material layers using lithography to form circuit components and elements thereon.
- The semiconductor industry continues to improve the integration density of various electronic components (e.g., transistors, diodes, resistors, capacitors, etc.) by continual reductions in minimum feature size, which allow more components to be integrated into a given area. These smaller electronic components also require smaller packages that utilize less area and/or lower height than packages of the past, in some applications.
- Thus, new packaging technologies, such as package on package (PoP), have begun to be developed, in which a top package with a device die is bonded to a bottom package with another device die. By adopting the new packaging technologies, the integration levels of the packages may be increased. These relatively new types of packaging technologies for semiconductors face manufacturing challenges.
- For a more complete understanding of the embodiments, and the advantages thereof, reference is now made to the following descriptions taken in conjunction with the accompanying drawings, in which:
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FIG. 1A is a perspective view of a package structure, in accordance with some embodiments. -
FIG. 1B show a cross-sectional view of a die package, in accordance with some embodiments. -
FIGS. 2A-2I show cross-sectional views of a sequential process flow of preparing a die package, in accordance with some embodiments. -
FIGS. 3A-3C show cross-sectional views of die packages with different redistribution structures, in accordance with some embodiments. -
FIG. 4 shows a cross-sectional view of a package on package (PoP) structure, in accordance with some embodiments. - The making and using of the embodiments of the disclosure are discussed in detail below. It should be appreciated, however, that the embodiments provide many applicable inventive concepts that can be embodied in a wide variety of specific contexts. The specific embodiments discussed are illustrative, and do not limit the scope of the disclosure.
- Since the invention of the integrated circuit, the semiconductor industry has experienced continual rapid growth due to continuous improvements in the integration density of various electronic components (i.e., transistors, diodes, resistors, capacitors, etc.). For the most part, this improvement in integration density has come from repeated reductions in minimum feature size, allowing for the integration of more components into a given area.
- These integration improvements are essentially two-dimensional (2D) in nature, in that the volume occupied by the integrated components is essentially on the surface of the semiconductor wafer. Although dramatic improvements in lithography have resulted in considerable improvements in 2D integrated circuit formation, there are physical limits to the density that can be achieved in two dimensions. One of these limits is the minimum size needed to make these components. Also, when more devices are put into one chip, more complex designs are required.
- Three-dimensional integrated circuits (3D ICs) have been therefore created to resolve the above-discussed limitations. In some formation processes of 3D ICs, two or more die packages, each including one or more semiconductor dies, are formed. The die packages are then bonded together. Through package vias (TPVs), also referred to as through molding vias (TMVs), through assembly vias (TAVs) or through substrate vias (TSVs), are increasingly used as a way of implementing 3D ICs. TPVs are often used in 3D ICs and stacked dies to provide electrical connections and/or to assist in heat dissipation. There are challenges in forming 3D ICs of stacked packaged dies.
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FIG. 1A is a perspective view of apackage structure 100 including apackage 110 bonded to anotherpackage 120, which is further bonded to anothersubstrate 130 in accordance with some embodiments. Each of diepackages Package 120 includes through substrate vias (TPVs) and function as an interposer, in accordance with some embodiments. -
Substrate 130 may be made of bismaleimide triazine (BT) resin, FR-4 (a composite material composed of woven fiberglass cloth with an epoxy resin binder that is flame resistant), ceramic, glass, plastic, tape, film, or other supporting materials that may carry the conductive pads or lands needed to receive conductive terminals. In some embodiments,substrate 130 is a multiple-layer circuit board.Package 110 is bonded to package 120 viaconnectors 115, andpackage 120 is bonded tosubstrate 130 via external connectors 145. In some embodiments, the external connectors 145 are bonded bump structures, such as bonded solder bumps, or bonded copper posts with a joining solder layer. -
FIG. 1B show a cross-sectional view of diepackage 120, in accordance with some embodiments.Package 120 includes asemiconductor die 121 andTPVs 122, which surround die 121 and are located near the edges ofpackage 120.Package 120 also includes afirst redistribution structure 124 and asecond redistribution structure 125. Each offirst redistribution structure 124 andsecond redistribution structure 125 includes one or more redistribution layers (RDLs), which are metal interconnect layers and are surrounded by dielectric material(s). As shown inFIG. 1B ,TPVs 122 are connected to bothfirst redistribution structure 124 andsecond redistribution structure 125. Die 121 is connected tofirst redistribution structure 124 on one side and tosecond redistribution structure 125 on the other side viaconnectors 127. In some embodiments,connectors 127 are surrounded by amolding compound 128. In some embodiments,molding compound 128 is made of a polymer, such as epoxy, polyimide, polybenzoxazole (PBO), etc. In some embodiments, themolding compound 128 includes solid fillers, such as silica, or other applicable materials, to increase its strength. In some embodiments,connectors 127 are surrounded by an underfill, instead of a molding compound. - The RDLs in
first redistribution structure 124 andsecond redistribution structure 125 enable fan-out ofdie 121. Package 110 bonded to package 120 may include one or more dies, which may be placed beyond the boundary ofdie 121 due to fan-out enabled byfirst redistribution structure 124. Thesecond redistribution structure 125 is connected to contactstructures 127, such as conductive bumps. In some embodiments, the conductive bumps include copper posts. The space betweenfirst redistribution structure 124 andsecond redistribution structure 125 is filled with amolding compound 123. In some embodiments, themolding compound 123 is made of a polymer, such as epoxy. In some embodiments, themolding compound 123 includes a filler, such as silica, to increase strength of themolding compound 123. - Due to varying coefficients of thermal expansion (CTEs) of different elements on
package 120,package 120 bows upward at the edges, as shown inFIG. 1B in accordance with some embodiments. Theway package 120 bows (or warps) upward at the edges is similar to die bowing due to having a tensile film on the die. Such bowing (or warpage) is not desirable for forming package on package (PoP) structure, because bowing could cause metal/dielectric interfacial delamination to affect reliability of connections between 120 and 110. In addition, bowing ofpackage 120 could break portions of RDLs infirst redistribution structure 124 and/orsecond redistribution structure 125 to degrade yield. Therefore, it is desirable to reduce bowing during formation ofpackage 120. -
FIGS. 2A-2I show cross-sectional views of a sequential process flow of preparing adie package 120′, in accordance with some embodiments. Package 120′, which is similar topackage 120, has less bowing thanpackage 120 described above inFIG. 1B . In some embodiments,package 120′ has no observable bowing.FIG. 2A shows anadhesive layer 202, which is overcarrier 201.Carrier 201 is made of glass, in accordance with some embodiments. However, other materials may also be used forcarrier 201.Adhesive layer 202 is deposited or laminated overcarrier 201, in some embodiments.Adhesive layer 202 may be formed of a glue, or may be a lamination layer formed of a foil. In some embodiments,adhesive layer 202 is photosensitive and is easily detached fromcarrier 201 by shining ultra-violet (UV) light oncarrier 201 afterpackage 120′ is formed. For example,adhesive layer 202 may be a light-to-heat-conversion (LTHC) coating made by 3M Company of St. Paul, Minn. - A
cushion layer 203 is then formed over the adhesive layer. Thecushion layer 203 is dielectric and is made of a polymer, such as polyimide, polybenzoxazole (PBO), or benzocyclobutene (BCB), in some embodiments. In some embodiments, thecushion layer 203 has thickness in a range from about 5 μm to about 10 μm. After thecushion layer 203 is formed, a diffusion barrier and copper seeddual layer 204 is formed on thecushion layer 203. In some embodiments, the diffusion barrier layer is made of Ti and the copper seed layer is made of copper. However, the diffusion barrier layer may be made of other materials, such as TaN, or other applicable materials. Thedual layer 204 is formed by a physical vapor deposition process, or sputter process in accordance with some embodiment. In some embodiments, the diffusion barrier layer has thickness in a range from about 0.05 μm to about 0.1 μm. In some embodiments, the copper seed layer has thickness in a range from about 0.3 μm to about 0.5 μm. - Following the deposition of the
dual layer 204, aphotoresist layer 205 is formed overdual layer 204, as shown inFIG. 2B in accordance with some embodiments. Thephotoresist layer 205 may be formed by a wet process, such as a spin-on process, or by a dry process, such as by a dry film. After thephotoresist layer 205 is formed, thephotoresist layer 205 is patterned to formedopenings 206, which are filled to formTSVs 122 described above inFIG. 1B . The processes involved include photolithography and resist development. In some embodiments, the width W ofopenings 206 is in a range from about 40 μm to about 90 μm. In some embodiments, the depth D ofopenings 206 is in a range from about 80 μm to about 120 μm. - Afterwards, a copper-containing
conductive layer 207 is plated to fillopenings 206, in accordance with some embodiments. The copper-containingconductive layer 207 may be made of copper or copper alloy. In some embodiments, the thickness of the copper-containinglayer 207 deposited is in a range from about 80 μm to about 120 μm. Following the plating to gap-fill process, a planarization process, such as chemical-mechanical polishing (CMP) process is applied oncarrier 201 to remove excess copper-containingconductive layer 207outside openings 206. After the excess copper-containingconductive layer 207 is removed, thephotoresist layer 205 is removed by an etching process, which may be a dry or a wet process.FIG. 2C shows a cross-sectional view of the structure oncarrier 201 after thephotoresist layer 205 is removed and conductive material in theopenings 206 are exposed as (conductive)columns 122″, in accordance with some embodiments. - Following the removal of
photoresist layer 205, the exposed diffusion barrier and copper seeddual layer 204 is removed to prevent shorting betweencolumns 122″, as shown inFIG. 2D in accordance with some embodiments. Afterwards, semiconductor die 121 is attached to asurface 209 overcarrier 201 by aglue layer 210, as shown inFIG. 2E in accordance with some embodiments.Glue layer 210 is made of a die attach film (DAF), in accordance with some embodiments. DAF may be made of epoxy resin, phenol resin, acrylic rubber, silica filler, or a combination thereof.FIG. 2E show thatconnectors 127 are facing away from thesurface 209. A liquid molding compound material is then applied on the exposed surface overcarrier 201 to fill the space betweencolumns 122 and die 121 and to cover die 121 andcolumns 122″. A thermal process is then applied to harden the molding compound material and to transform it intomolding compound 123.Columns 122 becomeTPVs 122 after themolding compound 123 is formed to surround them. - Afterwards, a planarization process is applied to remove
excess molding compound 123 to exposeTPVs 122 andconnectors 127 ofdie 121, as shown inFIG. 2E in accordance with some embodiments. In some embodiments, the planarization process is a grinding process. Following the planarization process described above, asecond redistribution structure 125′ is formed, as will be described in more detail below. As described above, a redistribution structure, such asfirst redistribution structure 124 orsecond redistribution structure 125, includes one or more redistribution layers (RDLs), which are metal interconnect layers and are surrounded by dielectric material(s). The RDL(s) is insulated by one or more dielectric layers, which are called passivation layers. In some embodiments, passivation layers are made of polymers, such as polyimide, polybenzoxazole (PBO), or benzocyclobutene (BCB). Passivation layers made of polymers further increase warpage (or bowing) of the die package, as illustrated and described inFIG. 1B . - As mentioned earlier, the way die package, such as
package 120, bows (or warps) upward at the edges is similar to die bowing due to having a tensile film on the die. Such bowing (or warpage) is not desirable for forming package on package (PoP) structure, because bowing could cause metal/dielectric interfacial delamination to affect reliability of connections between die packages. Further, bowing of die package could break portions of RDLs in redistribution structures to degrade yield. As mentioned above, it is desirable to reduce bowing during formation of die package. - A
compressive dielectric layer 212 is formed on post-planarization surface 211 as a passivation layer, as shown inFIG. 2F in accordance with some embodiments. The stress and film thickness of thecompressive dielectric layer 212 are tuned to counter the bowing effect described above. In some embodiments, thecompressive dielectric layer 212 is made of SiN by plasma-enhanced chemical vapor deposition (PECVD). For example, a compressive SiN layer may be formed by a low-temperature (LT) PECVD process at about 250° C. A low-temperature PECVD is preferred due to existing metal structures oncarrier 201. Metal structures that include copper, copper alloy, or aluminum could deform at temperature close to or above 400° C. However, other dielectric films, such as SiON, which can be deposited with compressive stress may also be used. The compressive stress ofdielectric layer 212 reduces warpage or bowing of the die package. In some embodiment, the stress of thecompressive dielectric layer 212 is in a range from about 300 MPa to about 700 MPa. The thickness oflayer 212 is in a range from about 0.5 μm to about 7 μm, in accordance with some embodiments. - The
compressive dielectric layer 212, formed by a PECVD process adheres well tomolding compound 123 and the copper-containingconductive layer 207 that come in contact withlayer 212. The adhesion between compressivedielectric layer 212 andmolding compound 123 andconductive layer 207 is better than the adhesion between a polymer passivation layer andmolding compound 123 andconductive layer 207. Without being limited to any particular theory of operation, it is believed that the plasma in the PECVD process may play a role in treating the surfaces ofmolding compound 123 andconductive layer 207 to improve the adhesion. - After
compressive dielectric layer 212 is formed, afirst RDL 213 is formed overlayer 212, as shown inFIG. 2G in accordance with some embodiments. The formation ofRDL 213 involves patterning thedielectric layer 212 to form openings inlayer 212 to enable direct contact withconductive layer 207 ofTPVs 122 andconnectors 127 coupled to die 121. TheRDL 213 is made of a conductive material and directlycontacts TPVs 122 andconnectors 127 ofdie 121. In some embodiments, theRDL 213 is made of aluminum, aluminum alloy, copper, or copper-alloy. However,RDL 213 may be made of other types of conductive materials. The formation ofRDL 213 also involves depositing a metal layer and patterning the metal layer to formRDL 213. - After
RDL 213 is formed, a polymer-basedpassivation layer 214 is formed overRDL 213. The polymer-basedpassivation layer 214 may be made of polymers, such as polyimide, polybenzoxazole (PBO), or benzocyclobutene (BCB). The polymer-basedpassivation layer 214 can protect the die package and absorb stress induced on the die package during bonding with another die package. The polymer-basedpassivation layer 214 is then patterned to expose portions ofRDL 213 to enable external connectors to connectRDL 213.Compressive dielectric layer 212,RDL 213 and polymer-basedpassivation layer 214 are part of thesecond redistribution layer 125. - Following the formation of
second redistribution layer 125,external connectors 126 are formed oversecond redistribution layer 125, as shown inFIG. 2G .FIG. 2G also shows thatexternal connectors 126 includecontact pads 215 withsolder balls 216. In some embodiments, a under bump metallurgy (UBM) layer (not shown) is formed between the interface betweenRDL 213 andcontact pads 215. The UBM layer also lines the sidewalls of openings ofpassivation layer 214 used to formcontact pads 215. In some embodiments,RDL 213 andcontact pads 215 are made of aluminum, aluminum alloy, copper, or copper-alloy.RDL 213 andcontact pads 215 can be made of different materials. For example, RDL is made or aluminum andcontact pads 215 are made of copper, and vice versa. - The
external connectors 126 withcontact pads 215 andsolder balls 216 described above are merely examples. Other external connectors may also be used. Exemplary details of redistribution structures and bonding structures, and methods of forming them are described in U.S. application Ser. No. 13/427,753, entitled “Bump Structures for Multi-Chip Packaging,” filed on Mar. 22, 2012 (Attorney Docket No. TSM11-1339), and U.S. application Ser. No. 13/338,820, entitled “Packaged Semiconductor Device and Method of Packaging the Semiconductor Device,” filed on Dec. 28, 2011 (Attorney Docket No. TSM11-1368). Both above-mentioned applications are incorporated herein by reference in their entireties. - After the
external connectors 126 are formed, aglue 217 is applied on the surface ofexternal connectors 126 of structure ofFIG. 2G and the structure is flipped to be glued to anothercarrier 220, as shown inFIG. 2H in accordance with some embodiments. Thecushion layer 203, thedual layer 204, and theglue layer 210 are removed to exposeTPVs 122 and die 121 by a planarization process. In some embodiments, the planarization process is a grinding process. - Following the planarization process, the
first redistribution layer 124 is formed over surface 218 of molding compound ofFIG. 2H , as shown inFIG. 2I in accordance with some embodiments.FIG. 2I shows that thefirst redistribution layer 124 include a RDL 222, which is sandwiched between two passivation layers 219 and 221. The RDL 222 is made of a conductive material and directlycontacts TPVs 122. In some embodiments, the RDL 222 is made of aluminum, aluminum alloy, copper, or copper-alloy. However, RDL 222 may be made of other types of conductive materials. The passivation layers 219 and 221 are made of dielectric material(s) and provide stress relief for bonding stress incurred during bonding with package die 110. In some embodiments, the passivation layers 219 and 221 are made of polymers, such as polyimide, polybenzoxazole (PBO), or benzocyclobutene (BCB). In some embodiments, passivation layer 219 is made of a compressive dielectric material similar tocompressive dielectric layer 212 described above. The ranges of film stress and thickness of the compressive dielectric material also help reducing warpage (or bowing) of die package formed. - External connectors 230 are be formed over the
first redistribution structure 124, in accordance with some embodiments. In some embodiments, external connectors 230 include contact pads 231 and solder balls 232, which are formed over passivation layer 221 to contact RDL 222. - The structure above
carrier 220 is then removed fromcarrier 220 and theglue layer 217 is also removed. The structure abovecarrier 220 could include multiple diepackages 120′, in accordance with some embodiments. After being removed fromcarrier 220, the structure may be attached to a tape to undergo sawing to singulate diepackages 120′ into individual die, as shown inFIG. 2I in accordance with some embodiments. - As shown in
FIG. 2I , diepackage 120′ does not bow upward or downward at the edges, in accordance with some embodiments. In some embodiments,package 120′ exhibit small degree of bowing. However, the degree of bowing is much reduced compared to similar die package formed without the compressive dielectric layers. Package 120′ described above is merely an example. In some embodiments, only layer 212 ofredistribution structure 125 is made of a compressive dielectric film and layer 219 ofredistribution structure 124 is a polymer-based passivation layer. The degree of bowing or warpage is reduced by using a compressive dielectric layer in one of the two redistribution structures. - Other structures can also be incorporated in
package 120′. For example, each of theredistribution structures FIG. 3A shows a portion of packaged die 120 A with asecond redistribution structure 125 A having three RDLs, 213 I, 213 II, and 213 III, in accordance with some embodiments. The three RDLs, 213 I, 213 II, and 213 III are similar toRDL 213 described above. Thesecond redistribution structure 125 A has acompressive dielectric layer 212 and three polymer-based passivation layers, 214 I, 214 II, and 214 III. The polymer-based passivation layers, 214 I, 214 II, and 214 III are similar to polymer-basedpassivation layer 214 described above. Thecompressive dielectric layer 212 reduces warpage of the die package. Passivation layers, 214 I, 214 II, and 214 III, protect die package and also absorb stress exerted on the die package during bonding. Anexternal connector 126 withcontact pad 215 and asolder ball 216 is also shown inFIG. 3A . An under bump metallurgy (UBM)layer 240 is formed betweencontact pad 215 andsolder ball 216 to assist bonding, in accordance with some embodiments. -
FIG. 3B shows a portion of packaged die 120 B with asecond redistribution structure 125 B having three RDLs, 213 I, 213 II, and 213 III, in accordance with some embodiments. The three RDLs, 213 I, 213 II, and 213 III are similar toRDL 213 described above. Thesecond redistribution structure 125 B has two compressivedielectric layers layer 212 I formed first. Thesecond redistribution structure 125 B also has two polymer-based passivation layers, 214 I, 214 II, formed over compressivedielectric layer 212 II. The compressivedielectric layers layer 212 described above. The polymer-based passivation layers, 214 I, and 214 II, are similar to polymer-basedpassivation layer 214 described above. The compressivedielectric layers -
FIG. 3C shows a portion of packaged die 120 C with asecond redistribution structure 125 C having three RDLs, 213 I, 213 II, and 213 III, in accordance with some embodiments. The three RDLs, 213 I, 213 II, and 213 III are similar toRDL 213 described above. Thesecond redistribution structure 125 C has compressivedielectric layers layer 212 I formed first and a polymer-basedpassivation layer 214 I betweenlayers second redistribution structure 125 C also has two polymer-based passivation layers, 214 I, 214 II, withlayer 214 I formed over compressivedielectric layer 212 I andlayer 214 II formed overlayer 212 II. The compressivedielectric layers layer 212 described above. The polymer-based passivation layers, 214 I, and 214 II, are similar to polymer-basedpassivation layer 214 described above. The compressivedielectric layers - The embodiments described in
FIGS. 2A-2I and 3A-3C include two or 4 RDLs in each redistribution structure. However, the number of RDLs can be other than 2 or 4. The number of RDLs could be any integers, such as 1, 3, 5, or more. In forming redistribution structures, such asredistribution structures 124 and/or 125, at least one polymer-based passivation layer is needed in each redistribution structure. If one or more compressive dielectric layers are used in a redistribution structure as passivation layers, one of the compressive dielectric layers is formed closest to the TPVs and semiconductor die. The number of compressive dielectric layers is equal to or less than the number of polymer-like passivation layers in the redistribution structure, in accordance with some embodiments. Sufficient number of layers of polymer-like passivation layers is needed to ensure good stress absorbance. One or more compressive dielectric layers are used to reduce the warpage (or bowing) of the die package. -
FIG. 4 shows a bondedstructure 260 betweendie package 110 and diepackage 120 A, in accordance with some embodiments.Bonding structure 260 includes bondedsolder layer 216′, which is formed bysolder layer 216 ofdie package 120 A and a solder layer ofdie package 110, which is coupled tocontact pad 261. The polymer-based passivation layers 124 I, 124 II, and 124 III provide cushion to stress during the formation (or bonding) of bondedstructure 260. Thecompressive dielectric layer 212 formed by PECVD reduces the bowing and yield ofdie package 120 A and also improves the quality of bonding betweendie package 110 and diepackage 120 A. Thecompressive layer 212 also improves the adhesion betweenredistribution structure 125 A and materials next toredistribution structure 125 A and surrounding the semiconductor die (not shown) in the die package. - Various embodiments of mechanisms for forming a die package and a package on package (PoP) structure using one or more compressive dielectric layers to reduce warpage are provided. The compressive dielectric layer(s) is part of a redistribution structure of the die package and its compressive stress reduces or eliminates bowing of the die package. In addition, the one or more compressive dielectric layers improve the adhesion between redistribution structure and the materials surrounding the semiconductor die. As a result, the yield and reliability of the die package and PoP structure using the die package are improved.
- In some embodiments, a semiconductor die package is provided. The semiconductor die package includes a semiconductor die embedded in a molding compound, and a through package via (TPV) electrically connected to the semiconductor die. The semiconductor die package also includes a first-side redistribution structure. The first-side redistribution structure includes at least one first-side redistribution layer (RDL), and a first-side compressive dielectric layer. The first-side compressive dielectric layer contacts the TPV and the molding compound surrounding the semiconductor die. The first-side redistribution structure also includes a first-side polymer-based passivation layer over the at least one first-side RDL.
- In some embodiments, a semiconductor package on package (PoP) structure is provided. The semiconductor PoP structure includes a first die package, and the first die package has a first semiconductor die and an external connector. The semiconductor PoP structure also includes a second die package. The second die package includes a second semiconductor die embedded in a molding compound, a through package via (TPV) electrically connected to the second semiconductor die, and a first-side redistribution structure. The first-side redistribution structure includes at least one first-side redistribution layer (RDL), and a first-side compressive dielectric layer. The first-side compressive dielectric layer contacts the TPV and the molding compound surrounding the semiconductor die. The first-side redistribution structure also includes a first-side polymer-based passivation layer over the at least one first RDL, and an external connector formed over the first-side redistribution structure. The external connector of the first die package is bonded to the external connector formed over the first-side redistribution structure of the second die package.
- In yet some other embodiments, a method of forming a die package is provided. The method includes forming a conductive column over a carrier, and attaching a semiconductor die to the carrier. The semiconductor die is disposed in parallel to the conductive column. The method also includes forming a molding compound to surround the semiconductor die and the conductive column, and to fill the space between the semiconductor die and the conductive column. The conductive column becomes a through package vias (TPV) after being surrounded by the molding compound. The method further includes forming a first redistribution structure over the semiconductor die and the TPV. The forming a first redistribution structure includes depositing a compressive dielectric layer over the semiconductor die and the TPV. The compressive dielectric layer decreases warpage of the die package. The forming a first redistribution structure also includes forming an RDL over the compressive dielectric layer, and forming a polymer-based passivation layer over the RDL.
- Although the embodiments and their advantages have been described in detail, it should be understood that various changes, substitutions and alterations can be made herein without departing from the spirit and scope of the embodiments as defined by the appended claims. Moreover, the scope of the present application is not intended to be limited to the particular embodiments of the process, machine, manufacture, and composition of matter, means, methods and steps described in the specification. As one of ordinary skill in the art will readily appreciate from the disclosure, processes, machines, manufacture, compositions of matter, means, methods, or steps, presently existing or later to be developed, that perform substantially the same function or achieve substantially the same result as the corresponding embodiments described herein may be utilized according to the disclosure. Accordingly, the appended claims are intended to include within their scope such processes, machines, manufacture, compositions of matter, means, methods, or steps. In addition, each claim constitutes a separate embodiment, and the combination of various claims and embodiments are within the scope of the disclosure.
Claims (20)
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US20150303158A1 (en) | 2015-10-22 |
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