US20120132530A1 - Tin plating solution - Google Patents
Tin plating solution Download PDFInfo
- Publication number
- US20120132530A1 US20120132530A1 US13/279,280 US201113279280A US2012132530A1 US 20120132530 A1 US20120132530 A1 US 20120132530A1 US 201113279280 A US201113279280 A US 201113279280A US 2012132530 A1 US2012132530 A1 US 2012132530A1
- Authority
- US
- United States
- Prior art keywords
- tin
- plating
- surfactant
- plating solution
- tin plating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 0 C.C.[1*]C(=O)N(CCO)CCN([2*]C(O)O)[3*]C(O)O.[Na+].[Na+] Chemical compound C.C.[1*]C(=O)N(CCO)CCN([2*]C(O)O)[3*]C(O)O.[Na+].[Na+] 0.000 description 8
- JTMDNVKRXCGNIP-UHFFFAOYSA-O CCCC([NH3+])NC Chemical compound CCCC([NH3+])NC JTMDNVKRXCGNIP-UHFFFAOYSA-O 0.000 description 1
- DXOGJTJCCJZEQI-PQBRBDCOSA-M [H]/C(CCCCCCCC)=C(\[H])CCCCCCCC(=O)N(C)CCS(=O)(=O)[Na]O Chemical compound [H]/C(CCCCCCCC)=C(\[H])CCCCCCCC(=O)N(C)CCS(=O)(=O)[Na]O DXOGJTJCCJZEQI-PQBRBDCOSA-M 0.000 description 1
- ROFVEXUMMXZLPA-UHFFFAOYSA-N c1ccc(-c2ccccn2)nc1 Chemical compound c1ccc(-c2ccccn2)nc1 ROFVEXUMMXZLPA-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/30—Electroplating: Baths therefor from solutions of tin
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/30—Electroplating: Baths therefor from solutions of tin
- C25D3/32—Electroplating: Baths therefor from solutions of tin characterised by the organic bath constituents used
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/061—Etching masks
- H05K3/062—Etching masks consisting of metals or alloys or metallic inorganic compounds
Definitions
- the present invention relates to a tin plating solution, specifically, a tin plating solution used for a matte tin plating of a metal resist for a printed board.
- Tin plating or tin-lead alloy plating has been used for soldering or etching resists.
- wiring pattern of printed board becomes more complex, so that the form of goods to be plated also becomes more complex.
- it is required to form uniform plating films on both fine parts and broad parts at same time.
- the printed board to be plated has through-holes, the formation of a uniform plated film even within the through-holes is desired.
- the conventional tin plating solution which can form a uniform plating film inside through-holes contains a strong suppressor, the precipitated particles becomes bigger, and burn deposits, dendritic precipitation or powder precipitation, readily occur in sections of high current density.
- the amount of metal ions has been increased and the temperature of the plating bath has been raised, the thicknesses of plating film on fine parts and broad parts becomes quite different, and so-called film thickness distribution on a plate becomes acceptable and the burn deposit in high current density does not occur.
- lowering the current density reduces burn deposits, but it is not practical because the plating efficiency per time falls.
- JP3336621 discloses a composition for tin plating bath comprising a metal ion, a conductive acid or a salt thereof, non-ionic surfactant and at least one phenanthroline compounds, the acidity of the bath is acid or weak acid.
- non-ionic surfactants are used as the surfactants, the thickness of plating film becomes thin in the section of low current density, so that the film thickness distribution of a plate becomes worse.
- U.S. Pat. No. 4,923,576 discloses a tin-lead alloy plating solution comprising a heterocyclic-ring compound having at least two nitrogen atoms. However, as discussed later, some compounds with at least two nitrogen atoms described in the patent would still cause the problem of forming a non-uniform plating appearance on a printed board having through-holes.
- the present invention was devised in light of aforementioned problems with conventional technology.
- the object of the present invention is to provide a tin plating solution having outstanding uniformity of through-hole plating, outstanding uniformity of film thickness distribution and no burn deposits even in plating for the recent printed boards having complexity of wiring patterns.
- the inventors have researched tin plating solutions and perfected the current invention by discovering that a tin plating solution including the combination of some specific compounds known as a components of plating solution itself achieves uniform film thickness distribution, without burn deposits and with outstanding plating uniformity within through-holes, i.e. throwing power.
- the present invention relates to a tin plating solution including a tin ion source, at least one non-ionic surfactant, imidazoline dicarboxylate and 1,10-phenanthroline.
- Non-ionic surfactants preferably would be non-ionic surfactants containing a polyalkylene oxide substituent in the molecule.
- the tin plating solution pursuant to the present invention could comprise antioxidants.
- the tin plating solution of the present invention includes a tin ion source, at least one type of non-ionic surfactant, imidazoline dicarboxylate and 1,10-phenanthroline.
- tin ion source can be used as long as the tin ion source can form tin ions when the tin ion source are dissolved in a plating solution.
- Inorganic or organic tin salts may be used.
- tin ion sources include tin sulfate, tin borofluoride, tin halides, tin methanesulfonate, tin ethane sulfonate, tin propanesulfonate, tin 2-hydroxyethane-1-sulfonate, tin 2-hydroxypropane-1-sulfonate, tin 1-hydroxypropane-2-sulfonic acid. These may be used alone or in combinations of two or more.
- the concentration of the tin ion source in the plating solution is preferably in the range of 5 to 35 g/L as metallic tin, more preferably 10 to 30 g/L, most preferably 15 to 25 g/L.
- non-ionic surfactant can be used.
- non-ionic surfactants include polyoxyalkylene alkyl phenyl ether-based surfactants and polyoxyalkylene glycol-based surfactants. More specifically, polyethylene glycol, polyoxyethylene nonyl phenyl ether, and polyoxyethylene propylene copolymer.
- a non-ionic surfactant having a polyalkylene oxide substituent in the molecule would be preferable. More specifically, alkyl alcohol ethylene oxide adducts containing 7 or more moles of ethylene oxide substituents in a molecule, preferably 7 to 20 moles, would be preferred.
- the concentration of non-ionic surfactant in the plating solution preferably would be in the range of 1 to 4.5 g/L, more preferably 1.5 to 3 g/L, and most preferably 2 to 2.5 g/L.
- the imidazoline dicarboxylate used in the present invention would be a compound having the following structure.
- the imidazoline dicarboxylate in the following structural formula is represented as a sodium salt, but the imidazoline dicarboxylate used in the present invention is not restricted to a sodium salt. Arbitrary salts may be used.
- R 1 represents an alkyl group having 1 to 20 carbon atoms
- R 2 and R 3 represent alkylene groups with direct bonds or 1 to 5 carbon atoms that may be identical or mutually different.
- concentration of imidazoline dicarboxylate in the plating solution preferably would be in the range of 0.2 to 1.0 g/L, more preferably 0.3 to 0.7 g/L, most preferably 0.4 to 0.6 g/L.
- 1,10-phenanthroline can be used.
- concentration of 1,10-phenanthroline in the plating solution preferably would be 0.5 to 4 ppm based on weight, more preferably 1 to 3 ppm, and most preferably 1.5 to 2.5 ppm.
- the tin plating solution of the present invention can also comprising antioxidants, pH regulators, foam inhibitors, and defoaming agents as needed.
- Antioxidants commonly used in plating solutions can be used.
- Preferable antioxidants include catechol, hydroxybenzene sulfonate and ascorbic acid.
- the tin plating solution of the present invention can be used as a plating solution for etching resist of printed boards. Etching resists of printed boards act as protective films against alkali etching solutions used in circuit formation.
- the tin plating solution of the present invention is used to the printed board conducted drilling a hole, cleaning, etching the surface, electroconductive treatment by electroless copper plating, patterning with plating resist and electric copper plating, pattern plating, to protect circuit wiring from etching solution. That would be followed by peeling of the plating resist and etching using etching solution. Subsequently, the plating layer would be peeled off and appropriate processing would be carried out as required and the product would be mounted.
- Hull cell tests and slit hull cell tests were carried out under the following conditions in order to evaluate the performance of plating solution prepared in each examples and comparative examples. In addition, the throwing power was measured in order to evaluate the plating uniformity on through-holes.
- the hull cell test is a test method for evaluating the plating appearance over a broad range of current densities as well as the film thickness distribution.
- the slit hull cell test is a test method for evaluating the precipitation properties at low current density.
- Tin plating solutions having the formulations shown in Table 1 below were prepared and used in hull cell tests and plating tests on test boards.
- the plating tests on test boards confirmed the precipitation states in high current density sections as well as in low current density sections through electroplating that was carried out using circuit boards that have both so-called solid sections and broad land sections, ground area, as well as independent sections, isolated areas.
- Table 1 shows the results.
- the examples that do not comprise surfactant B did not provide good results in measurements of the throwing power.
- examples that did not use 1,10-phenanthroline did not provide good results in measurements of the throwing power.
- examples that did not use 1,10-phenanthroline did not use 1,10-phenanthroline (comparative examples 4-6)
- burn deposit was observed in all hull cell tests.
- Comparative Example 6 the plating precipitation state of the ground area was poor while the throwing power measurement results in comparative example 5 were poor.
- Embodiments 1 to 3 the hull cell test ground area plating precipitation state as well as the throwing power measurement results were all good.
- Tin plating solutions having the formulation shown in Table 2 below were prepared, and both hull cell tests and plating on the test circuit board were carried out.
- Table 2 shows the results.
- Tin plating solutions having the formulation shown in Table 3 below were prepared, and both hull cell tests and slit hull cell tests were carried out.
- the plating film thickness at sites of low current density was measured in hull cell tests and slit hull cell tests.
- the plating film thickness was measured using a fluorescent X-ray micro-coating thickness gauge at a total of nine points in hull cell panels at 1 cm separations to the right beginning at sections 1 cm from the left and 1 cm from the bottom.
- the film thickness at the ninth point is shown in Table 3 as #9 film thickness.
- Surfactant H Imidazoline monokarboxylate (trade name: NISSAN ANONTM GLM-R, product of Nichiyu Inc.)
- Chemical Formula 8 Surfactant I: 1-methyl-1-hydroxyethyl-2-tallow alkyl imidazolinium chloride (cationic surfactant, trade name: NISSAN CATIONTM AR-4, product of Nichiyu Inc.)
- Chemical Formula 9 Imidazoline monokarboxylate (trade name: NISSAN ANONTM GLM-R, product of Nichiyu Inc.)
- Surfactant I 1-methyl-1-hydroxyethyl-2-tallow alkyl imidazolinium chloride (cationic surfactant, trade name: NISSAN CATIONTM AR-4, product of Nichiyu Inc.)
- Chemical Formula 9
Abstract
To provide a tin plating solution having uniformity of through-hole plating, uniformity of film thickness distribution and no burn deposits even. The tin plating solution include a tin ion source, at least one non-ionic surfactant, imidazoline dicarboxylate and 1,10-phenanthroline.
Description
- The present invention relates to a tin plating solution, specifically, a tin plating solution used for a matte tin plating of a metal resist for a printed board.
- Tin plating or tin-lead alloy plating has been used for soldering or etching resists. However, according to the recent technical development, wiring pattern of printed board becomes more complex, so that the form of goods to be plated also becomes more complex. As a result, it is required to form uniform plating films on both fine parts and broad parts at same time. Furthermore, when the printed board to be plated has through-holes, the formation of a uniform plated film even within the through-holes is desired.
- Since the conventional tin plating solution which can form a uniform plating film inside through-holes contains a strong suppressor, the precipitated particles becomes bigger, and burn deposits, dendritic precipitation or powder precipitation, readily occur in sections of high current density. To prevent such problems, the amount of metal ions has been increased and the temperature of the plating bath has been raised, the thicknesses of plating film on fine parts and broad parts becomes quite different, and so-called film thickness distribution on a plate becomes acceptable and the burn deposit in high current density does not occur. Furthermore, lowering the current density reduces burn deposits, but it is not practical because the plating efficiency per time falls.
- Although high throw baths, low metal concentration/high acid concentration, can deliver good thickness uniformity, the baths require operations under low current density because the limiting current density falls in high throw baths.
- JP3336621 discloses a composition for tin plating bath comprising a metal ion, a conductive acid or a salt thereof, non-ionic surfactant and at least one phenanthroline compounds, the acidity of the bath is acid or weak acid. However, as discussed later, even if non-ionic surfactants are used as the surfactants, the thickness of plating film becomes thin in the section of low current density, so that the film thickness distribution of a plate becomes worse.
- U.S. Pat. No. 4,923,576 discloses a tin-lead alloy plating solution comprising a heterocyclic-ring compound having at least two nitrogen atoms. However, as discussed later, some compounds with at least two nitrogen atoms described in the patent would still cause the problem of forming a non-uniform plating appearance on a printed board having through-holes.
- The present invention was devised in light of aforementioned problems with conventional technology. The object of the present invention is to provide a tin plating solution having outstanding uniformity of through-hole plating, outstanding uniformity of film thickness distribution and no burn deposits even in plating for the recent printed boards having complexity of wiring patterns.
- The inventors have researched tin plating solutions and perfected the current invention by discovering that a tin plating solution including the combination of some specific compounds known as a components of plating solution itself achieves uniform film thickness distribution, without burn deposits and with outstanding plating uniformity within through-holes, i.e. throwing power.
- Specifically, the present invention relates to a tin plating solution including a tin ion source, at least one non-ionic surfactant, imidazoline dicarboxylate and 1,10-phenanthroline. Non-ionic surfactants preferably would be non-ionic surfactants containing a polyalkylene oxide substituent in the molecule. In addition, the tin plating solution pursuant to the present invention could comprise antioxidants.
- The following abbreviations that are used throughout the specification have the following meaning unless another meaning is clear from the context. ° C.=degrees celcius, g=grams, mL=milliliters, L=liters, wt %=weight %, A/dm2 and ASD=ampere per square decimeter, μm=micrometer.
- The tin plating solution of the present invention includes a tin ion source, at least one type of non-ionic surfactant, imidazoline dicarboxylate and 1,10-phenanthroline.
- Any tin ion source can be used as long as the tin ion source can form tin ions when the tin ion source are dissolved in a plating solution. Inorganic or organic tin salts may be used. Examples of tin ion sources include tin sulfate, tin borofluoride, tin halides, tin methanesulfonate, tin ethane sulfonate, tin propanesulfonate, tin 2-hydroxyethane-1-sulfonate, tin 2-hydroxypropane-1-sulfonate, tin 1-hydroxypropane-2-sulfonic acid. These may be used alone or in combinations of two or more.
- The concentration of the tin ion source in the plating solution is preferably in the range of 5 to 35 g/L as metallic tin, more preferably 10 to 30 g/L, most preferably 15 to 25 g/L.
- Any non-ionic surfactant can be used. Examples of non-ionic surfactants include polyoxyalkylene alkyl phenyl ether-based surfactants and polyoxyalkylene glycol-based surfactants. More specifically, polyethylene glycol, polyoxyethylene nonyl phenyl ether, and polyoxyethylene propylene copolymer. A non-ionic surfactant having a polyalkylene oxide substituent in the molecule would be preferable. More specifically, alkyl alcohol ethylene oxide adducts containing 7 or more moles of ethylene oxide substituents in a molecule, preferably 7 to 20 moles, would be preferred.
- The concentration of non-ionic surfactant in the plating solution preferably would be in the range of 1 to 4.5 g/L, more preferably 1.5 to 3 g/L, and most preferably 2 to 2.5 g/L.
- The imidazoline dicarboxylate used in the present invention would be a compound having the following structure. The imidazoline dicarboxylate in the following structural formula is represented as a sodium salt, but the imidazoline dicarboxylate used in the present invention is not restricted to a sodium salt. Arbitrary salts may be used.
- Wherein R1 represents an alkyl group having 1 to 20 carbon atoms, R2 and R3 represent alkylene groups with direct bonds or 1 to 5 carbon atoms that may be identical or mutually different. The concentration of imidazoline dicarboxylate in the plating solution preferably would be in the range of 0.2 to 1.0 g/L, more preferably 0.3 to 0.7 g/L, most preferably 0.4 to 0.6 g/L.
- Commercial 1,10-phenanthroline can be used. The concentration of 1,10-phenanthroline in the plating solution preferably would be 0.5 to 4 ppm based on weight, more preferably 1 to 3 ppm, and most preferably 1.5 to 2.5 ppm.
- The tin plating solution of the present invention can also comprising antioxidants, pH regulators, foam inhibitors, and defoaming agents as needed.
- Antioxidants commonly used in plating solutions can be used. Preferable antioxidants include catechol, hydroxybenzene sulfonate and ascorbic acid.
- The tin plating solution of the present invention can be used as a plating solution for etching resist of printed boards. Etching resists of printed boards act as protective films against alkali etching solutions used in circuit formation. For example, the tin plating solution of the present invention is used to the printed board conducted drilling a hole, cleaning, etching the surface, electroconductive treatment by electroless copper plating, patterning with plating resist and electric copper plating, pattern plating, to protect circuit wiring from etching solution. That would be followed by peeling of the plating resist and etching using etching solution. Subsequently, the plating layer would be peeled off and appropriate processing would be carried out as required and the product would be mounted.
- The present invention is explained in further detail below through examples, but the present invention is not restricted to these examples.
- Evaluation Test
- Hull cell tests and slit hull cell tests were carried out under the following conditions in order to evaluate the performance of plating solution prepared in each examples and comparative examples. In addition, the throwing power was measured in order to evaluate the plating uniformity on through-holes. The hull cell test is a test method for evaluating the plating appearance over a broad range of current densities as well as the film thickness distribution. The slit hull cell test is a test method for evaluating the precipitation properties at low current density.
- Plating time: 5 minutes
Stirring speed: 2 m/minute
Bath temperature: 23° C. - Plating time: 3 minutes
- Bath temperature: 23° C.
- Bath temperature: 23° C.
Stirring speed: 1.2 m/minute
Plating cell: Haring cell
Amount of solution: 1.5 L
Plating thickness: 7 μm
Current density: 1.5 ASD - Tin plating solutions having the formulations shown in Table 1 below were prepared and used in hull cell tests and plating tests on test boards. The plating tests on test boards confirmed the precipitation states in high current density sections as well as in low current density sections through electroplating that was carried out using circuit boards that have both so-called solid sections and broad land sections, ground area, as well as independent sections, isolated areas.
-
TABLE 1 Working Examples Comparative Examples Components 1 2 3 1 2 3 4 5 6 Tin sulfate (g/L, as 20 15 10 20 15 10 20 15 10 metallic tin) Sulfuric acid (mL/L) 100 100 100 100 100 100 100 100 100 Surfactant A (g/L) 2.25 2.25 2.25 2.25 2.25 2.25 2.25 2.25 2.25 Surfactant B (g/L) 0.5 0.5 0.5 − − − 0.5 0.5 0.5 1,10-phenanthroline 2 2 2 2 2 2 − − − ppm Hull cell test results good good good good good good Burn Burn Burn deposit deposit deposit Ground area plating good good good good good good good good poor precipition state Throwing power +++ +++ ++++ + ++ +++ +++ + +++ measurement results*1 Surfactant A: Alkyl alcohol ethylene oxide, RO(CH2CH2O)xH, R = C10H21, X = 8 Surfactant B: Imidazoline dicarboxylate having the following structure (Trade name: AMPHOTERGE™ K-2, product of Lonza Inc.) Chemical Formula 2 *1The throwing power measurement results are represented as follows, 150 or more ++++, 90 or more +++, 80 to 89: ++, under 80: + - Table 1 shows the results. The examples that do not comprise surfactant B (Comparative Examples 1 to 3) did not provide good results in measurements of the throwing power. Furthermore, examples that did not use 1,10-phenanthroline (comparative examples 4-6), burn deposit was observed in all hull cell tests. In Comparative Example 6, the plating precipitation state of the ground area was poor while the throwing power measurement results in comparative example 5 were poor. In contrast, in the examples using the tin plating solution pursuant to the present invention, Embodiments 1 to 3, the hull cell test ground area plating precipitation state as well as the throwing power measurement results were all good.
- Tin plating solutions having the formulation shown in Table 2 below were prepared, and both hull cell tests and plating on the test circuit board were carried out.
-
TABLE 2 Working Example Comparative Examples Components 4 7 8 9 10 Tin sulfate (g/L, as 20 20 20 20 20 metallic tin) Sulfuric acid (mL/L) 100 100 100 100 100 Surfactant A (g/L) 2.25 2.25 2.25 2.25 2.25 Surfactant B (g/L) 0.5 0.5 0.5 0.5 0.5 1,10-phenanthroline 2 − − − − ppm Bipyridine ppm − 1 2 5 10 Hull cell test results good good Burn Burn Burn deposit deposit deposit Throwing power +++ + + − − measurement results*1 Surfactant A: Alkyl alcohol ethylene oxide, RO(CH2CH2O)xH, R = C10H21, X = 8 Surfactant B: Imidazoline dicarboxylate (Trade name: AMPHOTERGE™ K-2, product of Lonza Inc.) Bipyridine structure: Chemical Formula 3 - Table 2 shows the results. The examples that used bipyridine instead of 1,10-phenanthroline, Comparative Examples 7 to 10, observed burn deposit in hull cell tests of 2 ppm or more of bipyridine, while the throwing power was under 80 at concentrations of less than 2 ppm.
- Tin plating solutions having the formulation shown in Table 3 below were prepared, and both hull cell tests and slit hull cell tests were carried out. The plating film thickness at sites of low current density was measured in hull cell tests and slit hull cell tests. The plating film thickness was measured using a fluorescent X-ray micro-coating thickness gauge at a total of nine points in hull cell panels at 1 cm separations to the right beginning at sections 1 cm from the left and 1 cm from the bottom. The film thickness at the ninth point is shown in Table 3 as #9 film thickness.
-
TABLE 3 Working Example Comparative Examples Components 5 11 12 13 14 15 16 17 Tin sulfate (g/L, as 20 20 20 20 20 20 20 20 metallic tin) Sulfuric acid (mL/L) 100 100 100 100 100 100 100 100 Surfactant A g/L 2.25 2.25 2.25 2.25 2.25 2.25 2.25 2.25 Surfactant B g/L 0.5 − − − Surfactant C g/L 0.5 Surfactant D g/L 0.5 Surfactant E g/L 0.5 Surfactant F g/L 0.5 Surfactant G g/L 0.5 Surfactant H g/L 0.5 Surfactant I g/L 0.5 1,10-phenanthroline 2 2 2 2 2 2 2 2 ppm Slit hull cell test good good good good Burn Burn good Burn results deposit deposit deposit Hull cell test #9 film 1.68 0.87 1.17 0.93 1.40 1.31 1.38 1.49 thickness μm Slit hull cell test #9 0.13 0.01 0.00 0.15 0.00 0.00 0.08 0.00 film thickness μm Surfactant A: Alkyl alcohol ethylene oxide, RO(CH2CH2O)xH, R = C10H21, X = 8 Surfactant B: Imidazoline dicarboxylate having the following structure (trade name: AMPHOTERGE™ K-2, product of Lonza Inc.) Surfactant C: Amine alkylene oxide adduct (non-ionic surfactant, trade name, ETHOMEEN™ C25, product of Lion Axo Co.), R is alkyl substituent-coconut alkyl, ethylene oxide added molar number x + y is 15, Chemical Formula 4 Surfactant E: Amine alkylene oxide adduct (non-ionic surfactant, trade name: ETHOPROPOMEEN™ C18/18, product of Lion Axo Co.), R is alkyl substituent-coconut alkyl, ethylene oxide X propylene oxide added molar number x + y + w + z is 16 Chemical Formula 5 Chemical Formula 6 Chemical Formula 7 Chemical Formula 8 Chemical Formula 9 - The results shown in Table 3. Examples using surfactants C to I instead of surfactant B, Comparative Examples 11 to 17, all produced thin plating films or did not form plating films at all. The surfactant used in Comparative Example 16, Imidazoline monocarboxylate, produced lower results than the imidazoline dicarboxylate of this application. Furthermore, the surfactant used in Comparative Example 17, cationic surfactant with an imidazole ring, did not result in any plating at all, in contrast to the present invention.
Claims (4)
1. A tin plating solution comprising a tin ion source, at least one non-ionic surfactant, imidazoline dicarboxylate and 1,10-phenanthroline.
2. The tin plating solution according to claim 1 , wherein the non-ionic surfactant comprises a polyalkylene oxide group.
3. The tin plating solution according to claim 1 or 2 , further comprising an antioxidant.
4. A method for plating on a printed board having through-holes and fine patterns, wherein the tin plating solution of any of claims 1 to 3 is used to form a metal resist.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010-237220 | 2010-10-22 | ||
JP2010237220A JP5574912B2 (en) | 2010-10-22 | 2010-10-22 | Tin plating solution |
Publications (1)
Publication Number | Publication Date |
---|---|
US20120132530A1 true US20120132530A1 (en) | 2012-05-31 |
Family
ID=44862615
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US13/279,280 Abandoned US20120132530A1 (en) | 2010-10-22 | 2011-10-22 | Tin plating solution |
Country Status (6)
Country | Link |
---|---|
US (1) | US20120132530A1 (en) |
EP (1) | EP2444527B1 (en) |
JP (1) | JP5574912B2 (en) |
KR (1) | KR101826103B1 (en) |
CN (1) | CN102660760B (en) |
TW (1) | TWI480430B (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20130277226A1 (en) * | 2011-01-13 | 2013-10-24 | Atotech Deutschland Gmbh | Immersion tin or tin alloy plating bath with improved removal of cuprous ions |
US20130309404A1 (en) * | 2011-01-28 | 2013-11-21 | Atotech Deutschland Gmbh | Autocatalytic plating bath composition for deposition of tin and tin alloys |
US20150308007A1 (en) * | 2014-04-28 | 2015-10-29 | Samsung Electronics Co., Ltd. | Tin plating solution, tin plating equipment, and method for fabricating semiconductor device using the tin plating solution |
WO2018219848A1 (en) | 2017-06-01 | 2018-12-06 | Basf Se | Composition for tin alloy electroplating comprising leveling agent |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6006683B2 (en) * | 2013-06-26 | 2016-10-12 | 株式会社Jcu | Electroplating solution for tin or tin alloy and its use |
WO2016079167A1 (en) | 2014-11-21 | 2016-05-26 | Akzo Nobel Chemicals International B.V. | Collector for froth flotation of clay minerals from potash ores |
JP6631349B2 (en) | 2015-03-26 | 2020-01-15 | 三菱マテリアル株式会社 | Plating solution using ammonium salt |
JP6631348B2 (en) | 2015-03-26 | 2020-01-15 | 三菱マテリアル株式会社 | Plating solution using phosphonium salt |
JP6607106B2 (en) | 2015-03-26 | 2019-11-20 | 三菱マテリアル株式会社 | Plating solution using sulfonium salt |
JP7015975B2 (en) | 2017-03-27 | 2022-02-04 | 三菱マテリアル株式会社 | Tin or tin alloy plating solution |
CN110462108B (en) | 2017-03-27 | 2022-02-01 | 三菱综合材料株式会社 | Electroplating solution |
CN108103515A (en) * | 2017-12-25 | 2018-06-01 | 横琴国际知识产权交易中心有限公司 | A kind of processing method of aluminium alloy |
CN108130459A (en) * | 2017-12-25 | 2018-06-08 | 横琴国际知识产权交易中心有限公司 | A kind of corrosion resistant aluminum alloy and its processing method |
CN107937766A (en) * | 2017-12-25 | 2018-04-20 | 横琴国际知识产权交易中心有限公司 | A kind of aluminium alloy and its processing method |
CN107937942A (en) * | 2017-12-25 | 2018-04-20 | 横琴国际知识产权交易中心有限公司 | A kind of tin plating processing method of aluminium alloy electric |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4601916A (en) * | 1984-07-18 | 1986-07-22 | Kollmorgen Technologies Corporation | Process for bonding metals to electrophoretically deposited resin coatings |
US4617097A (en) * | 1983-12-22 | 1986-10-14 | Learonal, Inc. | Process and electrolyte for electroplating tin, lead or tin-lead alloys |
US4701244A (en) * | 1983-12-22 | 1987-10-20 | Learonal, Inc. | Bath and process for electroplating tin, lead and tin/alloys |
US4871429A (en) * | 1981-09-11 | 1989-10-03 | Learonal, Inc | Limiting tin sludge formation in tin or tin/lead electroplating solutions |
WO2004013382A1 (en) * | 2002-07-29 | 2004-02-12 | Micropulse Plating Concepts | Electrolytic baths for depositing tin or a tin alloy |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3772101A (en) * | 1972-05-01 | 1973-11-13 | Ibm | Landless plated-through hole photoresist making process |
US4923576A (en) * | 1988-07-06 | 1990-05-08 | Technic, Inc. | Additives for electroplating compositions and methods for their use |
JP2667323B2 (en) * | 1991-04-01 | 1997-10-27 | 川崎製鉄株式会社 | Antioxidant, auxiliary for plating bath and plating bath using the same |
JP3336621B2 (en) | 1991-12-17 | 2002-10-21 | ユケン工業株式会社 | Composition solution for plating and plating method |
JP3013150B2 (en) * | 1995-05-25 | 2000-02-28 | 石原薬品株式会社 | Tin-lead alloy plating bath for stabilizing the composition ratio of electrodeposition film |
JP3538499B2 (en) * | 1996-05-15 | 2004-06-14 | 株式会社大和化成研究所 | Tin-silver alloy electroplating bath |
JP4094143B2 (en) * | 1998-12-21 | 2008-06-04 | イビデン株式会社 | Manufacturing method of multilayer printed wiring board |
JP4077119B2 (en) * | 1999-06-30 | 2008-04-16 | エヌ・イーケムキャット株式会社 | Tin-bismuth alloy electroplating bath and plating method |
EP1091023A3 (en) * | 1999-10-08 | 2003-05-14 | Shipley Company LLC | Alloy composition and plating method |
US6322686B1 (en) * | 2000-03-31 | 2001-11-27 | Shipley Company, L.L.C. | Tin electrolyte |
JP4897187B2 (en) * | 2002-03-05 | 2012-03-14 | ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. | Tin plating method |
US6860981B2 (en) * | 2002-04-30 | 2005-03-01 | Technic, Inc. | Minimizing whisker growth in tin electrodeposits |
DE60336539D1 (en) * | 2002-12-20 | 2011-05-12 | Shipley Co Llc | Method for electroplating with reversed pulse current |
CN101151401A (en) * | 2004-05-11 | 2008-03-26 | 技术公司 | Electroplating solution for gold-tin eutectic alloy |
CN100595342C (en) * | 2005-03-24 | 2010-03-24 | 肇庆市羚光电子化学品材料科技有限公司 | Addictive for tin-electroplating solution of tin methane sulphonate series |
JP5503111B2 (en) * | 2007-04-03 | 2014-05-28 | ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. | Metal plating composition and method |
JP5622360B2 (en) * | 2009-01-16 | 2014-11-12 | ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. | Electrotin plating solution and electrotin plating method |
-
2010
- 2010-10-22 JP JP2010237220A patent/JP5574912B2/en not_active Expired - Fee Related
-
2011
- 2011-10-20 TW TW100138031A patent/TWI480430B/en active
- 2011-10-20 EP EP11185970.8A patent/EP2444527B1/en active Active
- 2011-10-21 KR KR1020110108046A patent/KR101826103B1/en active IP Right Grant
- 2011-10-22 US US13/279,280 patent/US20120132530A1/en not_active Abandoned
- 2011-10-24 CN CN201110403211.6A patent/CN102660760B/en active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4871429A (en) * | 1981-09-11 | 1989-10-03 | Learonal, Inc | Limiting tin sludge formation in tin or tin/lead electroplating solutions |
US4617097A (en) * | 1983-12-22 | 1986-10-14 | Learonal, Inc. | Process and electrolyte for electroplating tin, lead or tin-lead alloys |
US4701244A (en) * | 1983-12-22 | 1987-10-20 | Learonal, Inc. | Bath and process for electroplating tin, lead and tin/alloys |
US4601916A (en) * | 1984-07-18 | 1986-07-22 | Kollmorgen Technologies Corporation | Process for bonding metals to electrophoretically deposited resin coatings |
WO2004013382A1 (en) * | 2002-07-29 | 2004-02-12 | Micropulse Plating Concepts | Electrolytic baths for depositing tin or a tin alloy |
Non-Patent Citations (2)
Title |
---|
Product Sheet for Amphoterge KJ2 * |
Translation of WO 2004013382 A1 * |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20130277226A1 (en) * | 2011-01-13 | 2013-10-24 | Atotech Deutschland Gmbh | Immersion tin or tin alloy plating bath with improved removal of cuprous ions |
US9057141B2 (en) * | 2011-01-13 | 2015-06-16 | Atotech Deutschland Gmbh | Immersion tin or tin alloy plating bath with improved removal of cuprous ions |
US20130309404A1 (en) * | 2011-01-28 | 2013-11-21 | Atotech Deutschland Gmbh | Autocatalytic plating bath composition for deposition of tin and tin alloys |
US8801844B2 (en) * | 2011-01-28 | 2014-08-12 | Atotech Deutschland Gmbh | Autocatalytic plating bath composition for deposition of tin and tin alloys |
US20150308007A1 (en) * | 2014-04-28 | 2015-10-29 | Samsung Electronics Co., Ltd. | Tin plating solution, tin plating equipment, and method for fabricating semiconductor device using the tin plating solution |
US9840785B2 (en) * | 2014-04-28 | 2017-12-12 | Samsung Electronics Co., Ltd. | Tin plating solution, tin plating equipment, and method for fabricating semiconductor device using the tin plating solution |
WO2018219848A1 (en) | 2017-06-01 | 2018-12-06 | Basf Se | Composition for tin alloy electroplating comprising leveling agent |
US11535946B2 (en) | 2017-06-01 | 2022-12-27 | Basf Se | Composition for tin or tin alloy electroplating comprising leveling agent |
Also Published As
Publication number | Publication date |
---|---|
KR20120042678A (en) | 2012-05-03 |
KR101826103B1 (en) | 2018-02-06 |
EP2444527A3 (en) | 2013-02-27 |
TWI480430B (en) | 2015-04-11 |
EP2444527A2 (en) | 2012-04-25 |
EP2444527B1 (en) | 2019-02-20 |
JP2012087393A (en) | 2012-05-10 |
TW201226635A (en) | 2012-07-01 |
CN102660760B (en) | 2015-09-23 |
JP5574912B2 (en) | 2014-08-20 |
CN102660760A (en) | 2012-09-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US20120132530A1 (en) | Tin plating solution | |
JP2859326B2 (en) | An acidic water bath for electrically depositing a glossy, crack-free copper coating and a method for reinforcing conductive paths in printed circuits. | |
CN102888629B (en) | Electroplating bath and method | |
TWI427066B (en) | Plating bath and method | |
KR101779414B1 (en) | Reaction products of amino acids and epoxies | |
KR101319863B1 (en) | Tin electroplating solution and tin electroplating method | |
US9725816B2 (en) | Amino sulfonic acid based polymers for copper electroplating | |
JP4258011B2 (en) | Electro-copper plating bath and semiconductor device in which copper wiring is formed by the plating bath | |
US10201097B2 (en) | Polymers containing benzimidazole moieties as levelers | |
KR101797509B1 (en) | Sulfonamide based polymers for copper electroplating | |
US9783903B2 (en) | Additives for electroplating baths | |
CN105683250A (en) | Nitrogen containing polymers as levelers | |
US10435380B2 (en) | Metal plating compositions | |
EP2620529B1 (en) | Method for producing matt copper deposits | |
US10590556B2 (en) | Copper electroplating baths containing compounds of reaction products of amines and quinones | |
US10604858B2 (en) | Copper electroplating baths containing compounds of reaction products of amines, polyacrylamides and sultones | |
EP3037572B1 (en) | Electrolytic copper plating solution |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AS | Assignment |
Owner name: ROHM AND HAAS ELECTRONIC MATERIALS LLC, MASSACHUSE Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:ROHM AND HAAS ELECTRONIC MATERIALS K.K.;REEL/FRAME:027155/0629 Effective date: 20110720 |
|
STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |