US20110279403A1 - Capacitive touch panel and a method of reducing the visibility of metal conductors in capacitive touch panel - Google Patents

Capacitive touch panel and a method of reducing the visibility of metal conductors in capacitive touch panel Download PDF

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Publication number
US20110279403A1
US20110279403A1 US13/075,197 US201113075197A US2011279403A1 US 20110279403 A1 US20110279403 A1 US 20110279403A1 US 201113075197 A US201113075197 A US 201113075197A US 2011279403 A1 US2011279403 A1 US 2011279403A1
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United States
Prior art keywords
touch panel
low
capacitive touch
electrodes
reflection layer
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Abandoned
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US13/075,197
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Yuh-Wen Lee
Ching-Shan Lin
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TPK Touch Solutions Xiamen Inc
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TPK Touch Solutions Xiamen Inc
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Assigned to TPK TOUCH SOLUTIONS (XIAMEN) INC. reassignment TPK TOUCH SOLUTIONS (XIAMEN) INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: LEE, YUH-WEN, LIN, CHING-SHAN
Publication of US20110279403A1 publication Critical patent/US20110279403A1/en
Priority to US15/909,931 priority Critical patent/US10331283B2/en
Abandoned legal-status Critical Current

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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0443—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04111—Cross over in capacitive digitiser, i.e. details of structures for connecting electrodes of the sensing pattern where the connections cross each other, e.g. bridge structures comprising an insulating layer, or vias through substrate
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49155—Manufacturing circuit on or in base

Definitions

  • the present invention relates to a capacitive touch panel with a single layer of transparent conductive structure with low visibility of metal conductors and a method of reducing the visibility of metal conductors in capacitive touch panel.
  • touch panels are widely used in many electronic products, such as cell phones, personal digital assistants (PDAs), game input interfaces, or computer touch screens.
  • PDAs personal digital assistants
  • the touch panel is always integrated with a display panel. It is convenient for a user to select an option by touching a displayed image on the display panel to start its corresponding operation.
  • touch panels such as resistance touch panel, capacitive touch panel, infrared sensing touch panel, electromagnetic sensing touch panel, and acoustic wave sensing touch panel.
  • the capacitive touch panel is comparatively better because of its high sensitivity, low cost, and simple structure.
  • the capacitive touch panel works by sensing capacitance of human bodies. When a user touches the capacitive touch panel, partial electric charges will be taken away to generate electrical current signals, which are then sent to a controller. The controller will compute the touch position by using the received signals.
  • a conventional capacitive touch panel comprises a substantially transparent substrate, a transparent sensing pattern on the substantially transparent substrate, and a passivation layer.
  • the transparent sensing pattern for detecting touch signals, comprises a plurality of electrodes disposed on the substantially transparent substrate.
  • the transparent sensing pattern may be formed by coating, etching, or printing a substantially transparent conductive layer which is made of a substantially transparent conductive material, e.g. Indium Tin Oxide (ITO) or antimony tin oxide (ATO).
  • ITO Indium Tin Oxide
  • ATO antimony tin oxide
  • the transparent sensing pattern may comprise a plurality of electrodes with a plurality of conductor cells and electrical conductors connecting two of such conductor cells.
  • These conductor cells may be arranged in many different ways, such as in two perpendicular directions of the right angle coordinate system, in parallel directions, or in radiant-type directions.
  • the way of running in two directions has two types of arrangements of the conductor cells and the electrical conductors.
  • One is single layer ITO structure and the other is double layer ITO structure.
  • the conductor cells in two directions are disposed on the same layer.
  • the conductor cells are disposed on two different layers.
  • a capacitive touch panel with single layer ITO structure comprises a substantially transparent substrate, a transparent sensing pattern, an insulating layer and a passivation layer.
  • the passivation layer is an outer layer disposed on the transparent sensing pattern.
  • the transparent sensing pattern comprises a plurality of first electrodes and a plurality of second electrodes respectively disposed on the same side of the substantially transparent substrate in two different directions.
  • the insulating layer comprises a plurality of insulators located at corresponding intersections of the first electrodes and the second electrodes to provide insulation. The electrodes, both the first electrodes and the second electrodes, are connected by electrical conductors at the intersections.
  • metal materials such as copper or aluminum
  • metal conductors are often used to make metal conductors as the electrical conductors in a capacitive touch panel.
  • the metal conductors have a certain width, users can always see the metal conductors in such a transparent environment composed of substantially transparent substrate and transparent sensing pattern. The visibility of metal conductors is not desirable.
  • the first one is to reduce the size of metal conductors and limit the width within a very small value
  • the second one is to use transparent conductive material (e.g. ITO) as electrical conductors to replace the metal conductors.
  • ITO transparent conductive material
  • the first method is hard to achieve and cannot eliminate the problem of visibility of metal conductors completely.
  • the second method it is required to add another ITO photo-etching process (including an ITO coating process, a photolithography exposure process and an etching stripping process) and use a higher-cost material (ITO), leading to an obvious increase in the manufacturing costs.
  • an objective of the present invention is to provide a capacitive touch panel with the low visibility of metal conductors and good optical performance as reflection from the metal conductors is reduced.
  • Another objective of the present invention is to provide a method of reducing the visibility of metal conductors in capacitive touch panel.
  • the present invention can be practiced as a convenient solution with high yield rate and low cost, and can help achieve better optical performance.
  • a capacitive touch panel comprises a substantially transparent substrate, and a transparent sensing pattern for detecting touch signals.
  • the transparent sensing pattern comprises at least one metal conductor disposed on the substantially transparent substrate; and at least one low-reflection layer formed on at least one metal conductor.
  • a method of reducing the visibility of metal conductors in a capacitive touch panel comprises the step of forming a low-reflection layer on the metal conductors.
  • the capacitive touch panel comprises a substantially transparent substrate with a transparent sensing pattern.
  • the transparent sensing pattern comprises at least one metal conductor disposed on the substantially transparent substrate.
  • the present invention provides the method of coating a low-reflection layer on each metal conductor to reduce the reflected lights from metal conductors. In this way, there is no need to reduce the width of the metal conductor. Also this makes it easier to achieve high yield rate in the manufacturing process. Furthermore, compared to the second method of adding another ITO photo-etching process (including an ITO coating process, a photolithography exposure process and an etching stripping process), the present invention only adds a photolithography exposure process in the original process. Thus, the manufacturing process can be simplified, and the cost can be reduced.
  • FIG. 1 is a sectional view of first embodiment of the present invention
  • FIG. 2 is a cross-sectional view taken on the line B-B of FIG. 1 ;
  • FIG. 3 is a partial plan view of first embodiment of the present invention.
  • FIG. 4 is a partial plan view of the transparent sensing pattern structure with a plurality of first conductor cells, second conductor cells and first electrical conductors on the substantially transparent substrate;
  • FIG. 5 is a partial plan view of the transparent sensing pattern structure with the insulating layer on the first electrical conductors
  • FIG. 6 is a partial plan perspective view of second embodiment of the present invention.
  • FIG. 7 is a sectional view of second embodiment of the present invention.
  • a capacitive touch panel 10 in accordance with the first embodiment comprises a substantially transparent substrate 1 , a transparent sensing pattern 2 , an insulating layer 3 , a passivation layer 4 and a low-reflection layer 5 .
  • the transparent sensing pattern 2 detects touch signals. It is formed on the substantially transparent substrate 1 .
  • the transparent sensing pattern 2 comprises a plurality of first electrodes 21 and second electrodes 22 arranged in two directions respectively and disposed on the same side of the substantially transparent substrate 1 . Generally, the first direction may be perpendicular to the second one.
  • the insulating layer 3 comprises a plurality of insulators 31 . It is located at corresponding intersections of the first electrodes 21 and the second electrodes 22 to provide insulation.
  • the passivation layer 4 is an outer layer disposed on the transparent sensing pattern 2 .
  • each first electrode 21 comprises a plurality of first conductor cells 211 and a plurality of first electrical conductors 212 , wherein each first electrical conductor 212 connects two adjacent first conductor cells 211 .
  • Each second electrode 22 comprises a plurality of second conductor cells 221 and a plurality of second electrical conductors 222 , wherein each second electrical conductor 222 connects two adjacent second conductor cells 221 .
  • the second electrical conductors 222 and the first electrical conductors 212 are insulated via the insulators 31 .
  • the second electrical conductors 222 are metal conductors made of metal conductive materials, such as silver, copper or aluminum.
  • the low-reflection layer 5 comprises a plurality of low-reflection strips 5 a disposed on each second electrical conductor 222 , as shown in FIG. 1 and FIG. 2 .
  • the reflectivity of the low-reflection layer 5 is less than about 80%.
  • the low-reflection layer 5 can reduce the reflected light therefore reducing the visibility of the metal conductors. This embodiment provides a capacitive touch panel with better optical performance.
  • the low-reflection layer 5 can be made of oxide material, nitride material, a mixture of oxide and nitride material, a dark UV-sensitive organic material, etc.
  • the oxide material may be metal oxide, such as chromium oxide (CrO), titanium oxide (TiO) or zirconium oxide (ZrO).
  • the nitride material may be metal nitride, such as chromium nitride (CrN), titanium nitride (TiN) or zirconium nitride (ZrN).
  • the dark UV-sensitive organic material may be brown, gray, or black photoresist.
  • the first conductor cells 211 , the second conductor cells 221 and the first electrical conductors 212 are made of a substantially transparent conductive material, such as Indium Tin Oxide (ITO) or antimony tin oxide (ATO).
  • the insulating layer is made of transparent insulation material, such as silica.
  • the capacitive touch panel further comprises a processing circuit (not shown) for receiving and processing the touch signals and a plurality of metal traces for carrying the touch signals to the processing circuit.
  • the metal traces are metal conductors and comprise a plurality of first metal traces 23 and second metal traces 24 , as shown in FIG. 3 .
  • the first metal traces 23 connect the first electrodes 21 to the processing circuit.
  • the second metal traces 24 connect the second electrodes 22 to the processing circuit.
  • the manufacturing method includes the following steps.
  • Step 1 referring to FIG. 4 , a sensing pattern 2 is formed on the substantially transparent substrate 1 . More specifically, Step 1 further comprises: coating a transparent conductive material layer on a substantially transparent substrate 1 , and etching the transparent conductive material layer to form a plurality of first conductor cells 211 and a plurality of second conductor cells 221 respectively and a plurality of first electrical conductors 212 . Each first electrical conductor 212 connects two adjacent first conductor cells 211 .
  • Step 2 referring to FIG. 5 , a plurality of insulators 31 is formed on the sensing pattern 2 . More specifically, this step further comprises: coating a insulating layer 3 on the sensing pattern 2 and etching the insulating layer 3 to form a plurality of insulators 31 on the corresponding first electrical conductor 212 .
  • Step 3 referring to FIG. 3 , a plurality of second electrical conductors 222 is formed on the insulators 31 as well as the low-reflection strips 5 a .
  • the second electrical conductors 222 are metal conductors with good conductivity and connect between two adjacent second conductor cells 221 . There are three kinds of methods to execute Step 3.
  • the first method comprises: coating a metal layer on the substantially transparent substrate; coating a low-reflection layer 5 made of either metal nitride material or metal oxide material on the metal layer by Physical Vapor Deposition (PVD) sputter coating; and etching the low-reflection layer 5 and the metal layer at the same time by photolithography to form metal conductors as the second electrical conductors 222 . After this step is finished, a plurality of low-reflection strips 5 a of the low-reflection layer 5 are formed on the metal conductors.
  • PVD Physical Vapor Deposition
  • the second method comprises: coating a metal layer on the substantially transparent substrate; coating a low-reflection layer 5 on the metal layer; exposing the low-reflection layer 5 by photolithography to form a plurality of low-reflection strips 5 a ; and etching the metal layer to form the metal conductors by using the low-reflection strips 5 a as etching mask.
  • the low-reflection strips 5 a of the low-reflection layer 5 are disposed on the metal conductors.
  • the low-reflection layer 5 is made of dark UV-sensitive organic material, such as black photoresist.
  • the third method comprises: coating a metal layer on the substantially transparent substrate; etching the metal layer to form the metal conductors as the second electrical conductors 222 ; coating a low-reflection layer 5 on the metal conductors; and exposing the low-reflection layer 5 by photolithography to form the low-reflection strips 5 a . After this step is finished, a plurality of low-reflection strips 5 a of the low-reflection layer 5 are formed on the metal conductors.
  • the low-reflection layer 5 is made of dark UV-sensitive organic material, such as black photoresist.
  • Step 4 a passivation layer 4 is coated on the transparent sensing pattern 2 .
  • the step 1 and step 3 of the manufacturing process can be exchanged.
  • the quantity of the first electrodes and the second electrodes can be increased or decreased according to the resolution of capacitive touch panel.
  • a low-reflection layer 5 can be formed on the first metal traces 23 and the second metal traces 24 to reduce the visibility of the metal traces.
  • a capacitive touch panel 10 in accordance with the second embodiment comprises a substantially transparent substrate 1 , a transparent sensing pattern 2 , an insulating layer 3 , a passivation layer 4 and a low-reflection layer 5 .
  • the transparent sensing pattern 2 is disposed on the substantially transparent substrate 1 .
  • the transparent sensing pattern 2 comprises a plurality of first electrodes 21 and a plurality of second electrodes 22 respectively disposed on the same layer in two directions.
  • Each first electrode 21 comprises a plurality of first conductor cells 211 and a plurality of first electrical conductors 212 which connect two adjacent first conductor cells 211 of the same electrode.
  • Each second electrode 22 comprises a plurality of second conductor cells 221 .
  • the insulating layer 3 comprises a plurality of through holes 32 and covers the transparent sensing pattern 2 .
  • a plurality of second electrical conductors 222 are disposed on the other surface of the insulating layer 3 and connect two adjacent second conductor cells 221 via through holes 32 .
  • the second electrical conductors 222 are also metal conductors made of metal conductive materials, such as silver, copper or aluminum.
  • the low-reflection layer 5 comprises a plurality of low-reflection strips 5 a disposed on each second electrical conductor 222 .
  • the reflectivity of the low-reflection layer 5 is less than about 80%.
  • the low-reflection layer 5 can reduce the reflected light therefore reducing the visibility of the metal conductors. This embodiment provides a capacitive touch panel with better optical performance.
  • the capacitive touch panel further comprises a processing circuit (not shown) for receiving and processing the touch signals and a plurality of metal traces for carrying the touch signals to the processing circuit.
  • the metal traces are metal conductors and comprise a plurality of first metal traces 23 and a plurality of second metal traces 24 , as shown in FIG. 6 .
  • the first metal traces 23 connect the first electrodes 21 to the processing circuit.
  • the second metal traces 24 connect the second electrodes 22 to the processing circuit.
  • the manufacturing process of the second embodiment is similar to that of the first embodiment as described.
  • the difference between these two embodiments is the way of setting the insulating layer.

Abstract

The present invention discloses a capacitive touch panel, comprises a substantially transparent substrate and a transparent sensing pattern. The transparent sensing pattern, which detects touch signals, is formed on the substantially transparent substrate. The transparent sensing pattern comprises a plurality of conductor cells and at least one metal conductor disposed on the substantially transparent substrate. The at least one metal conductor connects two adjacent conductor cells. At least one low-reflection layer is formed on the at least one metal conductor. The low-reflection layer can reduce the reflected light therefore reducing the visibility of the metal conductors.

Description

  • This application claims the benefit of People's Republic of China Application No. 201010176328.0 filed on May 16, 2010.
    • FIELD OF THE INVENTION
  • The present invention relates to a capacitive touch panel with a single layer of transparent conductive structure with low visibility of metal conductors and a method of reducing the visibility of metal conductors in capacitive touch panel.
    • BACKGROUND OF THE INVENTION
  • Nowadays, with the development of touch technology, touch panels are widely used in many electronic products, such as cell phones, personal digital assistants (PDAs), game input interfaces, or computer touch screens. The touch panel is always integrated with a display panel. It is convenient for a user to select an option by touching a displayed image on the display panel to start its corresponding operation.
  • According to different technology principles, there are many types of touch panels, such as resistance touch panel, capacitive touch panel, infrared sensing touch panel, electromagnetic sensing touch panel, and acoustic wave sensing touch panel. Herein, the capacitive touch panel is comparatively better because of its high sensitivity, low cost, and simple structure. Theoretically, the capacitive touch panel works by sensing capacitance of human bodies. When a user touches the capacitive touch panel, partial electric charges will be taken away to generate electrical current signals, which are then sent to a controller. The controller will compute the touch position by using the received signals.
  • Generally, a conventional capacitive touch panel comprises a substantially transparent substrate, a transparent sensing pattern on the substantially transparent substrate, and a passivation layer. The transparent sensing pattern, for detecting touch signals, comprises a plurality of electrodes disposed on the substantially transparent substrate. The transparent sensing pattern may be formed by coating, etching, or printing a substantially transparent conductive layer which is made of a substantially transparent conductive material, e.g. Indium Tin Oxide (ITO) or antimony tin oxide (ATO). The transparent sensing pattern may comprise a plurality of electrodes with a plurality of conductor cells and electrical conductors connecting two of such conductor cells. These conductor cells may be arranged in many different ways, such as in two perpendicular directions of the right angle coordinate system, in parallel directions, or in radiant-type directions. Among these different ways, the way of running in two directions has two types of arrangements of the conductor cells and the electrical conductors. One is single layer ITO structure and the other is double layer ITO structure. As to the single layer ITO structure, the conductor cells in two directions are disposed on the same layer. As to the double layer ITO structure, the conductor cells are disposed on two different layers.
  • A capacitive touch panel with single layer ITO structure comprises a substantially transparent substrate, a transparent sensing pattern, an insulating layer and a passivation layer. The passivation layer is an outer layer disposed on the transparent sensing pattern. The transparent sensing pattern comprises a plurality of first electrodes and a plurality of second electrodes respectively disposed on the same side of the substantially transparent substrate in two different directions. The insulating layer comprises a plurality of insulators located at corresponding intersections of the first electrodes and the second electrodes to provide insulation. The electrodes, both the first electrodes and the second electrodes, are connected by electrical conductors at the intersections.
  • In practice, due to the good conductivity and low cost, metal materials (such as copper or aluminum) are often used to make metal conductors as the electrical conductors in a capacitive touch panel. However, because the metal conductors have a certain width, users can always see the metal conductors in such a transparent environment composed of substantially transparent substrate and transparent sensing pattern. The visibility of metal conductors is not desirable.
  • Therefore, in the past, two methods have been used to solve the problem of visibility of metal conductors. The first one is to reduce the size of metal conductors and limit the width within a very small value, and the second one is to use transparent conductive material (e.g. ITO) as electrical conductors to replace the metal conductors. However, in practical production, the first method is hard to achieve and cannot eliminate the problem of visibility of metal conductors completely. As to the second method, it is required to add another ITO photo-etching process (including an ITO coating process, a photolithography exposure process and an etching stripping process) and use a higher-cost material (ITO), leading to an obvious increase in the manufacturing costs.
    • SUMMARY OF THE INVENTION
  • Therefore, an objective of the present invention is to provide a capacitive touch panel with the low visibility of metal conductors and good optical performance as reflection from the metal conductors is reduced.
  • Another objective of the present invention is to provide a method of reducing the visibility of metal conductors in capacitive touch panel. The present invention can be practiced as a convenient solution with high yield rate and low cost, and can help achieve better optical performance.
  • A capacitive touch panel comprises a substantially transparent substrate, and a transparent sensing pattern for detecting touch signals. The transparent sensing pattern comprises at least one metal conductor disposed on the substantially transparent substrate; and at least one low-reflection layer formed on at least one metal conductor.
  • A method of reducing the visibility of metal conductors in a capacitive touch panel comprises the step of forming a low-reflection layer on the metal conductors. The capacitive touch panel comprises a substantially transparent substrate with a transparent sensing pattern. The transparent sensing pattern comprises at least one metal conductor disposed on the substantially transparent substrate.
  • The present invention provides the method of coating a low-reflection layer on each metal conductor to reduce the reflected lights from metal conductors. In this way, there is no need to reduce the width of the metal conductor. Also this makes it easier to achieve high yield rate in the manufacturing process. Furthermore, compared to the second method of adding another ITO photo-etching process (including an ITO coating process, a photolithography exposure process and an etching stripping process), the present invention only adds a photolithography exposure process in the original process. Thus, the manufacturing process can be simplified, and the cost can be reduced.
    • BRIEF DESCRIPTION OF THE DRAWINGS
  • Skilled persons in the art will understand that the drawings, described below, are for illustration purposes only and do not limit the scope of the present invention in any way. In the drawings, like reference numerals designate corresponding parts throughout the several views.
  • FIG. 1 is a sectional view of first embodiment of the present invention;
  • FIG. 2 is a cross-sectional view taken on the line B-B of FIG. 1;
  • FIG. 3 is a partial plan view of first embodiment of the present invention;
  • FIG. 4 is a partial plan view of the transparent sensing pattern structure with a plurality of first conductor cells, second conductor cells and first electrical conductors on the substantially transparent substrate;
  • FIG. 5 is a partial plan view of the transparent sensing pattern structure with the insulating layer on the first electrical conductors;
  • FIG. 6 is a partial plan perspective view of second embodiment of the present invention;
  • FIG. 7 is a sectional view of second embodiment of the present invention.
    •  DETAILED DESCRIPTION OF THE DRAWINGS
  • Referring to FIG. 1, FIG. 2 and FIG. 3, a capacitive touch panel 10 in accordance with the first embodiment comprises a substantially transparent substrate 1, a transparent sensing pattern 2, an insulating layer 3, a passivation layer 4 and a low-reflection layer 5. The transparent sensing pattern 2 detects touch signals. It is formed on the substantially transparent substrate 1. The transparent sensing pattern 2 comprises a plurality of first electrodes 21 and second electrodes 22 arranged in two directions respectively and disposed on the same side of the substantially transparent substrate 1. Generally, the first direction may be perpendicular to the second one. The insulating layer 3 comprises a plurality of insulators 31. It is located at corresponding intersections of the first electrodes 21 and the second electrodes 22 to provide insulation. The passivation layer 4 is an outer layer disposed on the transparent sensing pattern 2.
  • Furthermore, each first electrode 21 comprises a plurality of first conductor cells 211 and a plurality of first electrical conductors 212, wherein each first electrical conductor 212 connects two adjacent first conductor cells 211. Each second electrode 22 comprises a plurality of second conductor cells 221 and a plurality of second electrical conductors 222, wherein each second electrical conductor 222 connects two adjacent second conductor cells 221. The second electrical conductors 222 and the first electrical conductors 212 are insulated via the insulators 31. In this embodiment, the second electrical conductors 222 are metal conductors made of metal conductive materials, such as silver, copper or aluminum. The low-reflection layer 5 comprises a plurality of low-reflection strips 5 a disposed on each second electrical conductor 222, as shown in FIG. 1 and FIG. 2. The reflectivity of the low-reflection layer 5 is less than about 80%. The low-reflection layer 5 can reduce the reflected light therefore reducing the visibility of the metal conductors. This embodiment provides a capacitive touch panel with better optical performance.
  • The low-reflection layer 5 can be made of oxide material, nitride material, a mixture of oxide and nitride material, a dark UV-sensitive organic material, etc. The oxide material may be metal oxide, such as chromium oxide (CrO), titanium oxide (TiO) or zirconium oxide (ZrO). The nitride material may be metal nitride, such as chromium nitride (CrN), titanium nitride (TiN) or zirconium nitride (ZrN). The dark UV-sensitive organic material may be brown, gray, or black photoresist.
  • The first conductor cells 211, the second conductor cells 221 and the first electrical conductors 212 are made of a substantially transparent conductive material, such as Indium Tin Oxide (ITO) or antimony tin oxide (ATO). The insulating layer is made of transparent insulation material, such as silica.
  • The capacitive touch panel further comprises a processing circuit (not shown) for receiving and processing the touch signals and a plurality of metal traces for carrying the touch signals to the processing circuit. The metal traces are metal conductors and comprise a plurality of first metal traces 23 and second metal traces 24, as shown in FIG. 3. The first metal traces 23 connect the first electrodes 21 to the processing circuit. The second metal traces 24 connect the second electrodes 22 to the processing circuit.
  • In this section, a manufacturing process of making the capacitive touch panel in accordance with the first embodiment will be depicted. The manufacturing method includes the following steps.
  • Step 1, referring to FIG. 4, a sensing pattern 2 is formed on the substantially transparent substrate 1. More specifically, Step 1 further comprises: coating a transparent conductive material layer on a substantially transparent substrate 1, and etching the transparent conductive material layer to form a plurality of first conductor cells 211 and a plurality of second conductor cells 221 respectively and a plurality of first electrical conductors 212. Each first electrical conductor 212 connects two adjacent first conductor cells 211.
  • Step 2, referring to FIG. 5, a plurality of insulators 31 is formed on the sensing pattern 2. More specifically, this step further comprises: coating a insulating layer 3 on the sensing pattern 2 and etching the insulating layer 3 to form a plurality of insulators 31 on the corresponding first electrical conductor 212.
  • Step 3, referring to FIG. 3, a plurality of second electrical conductors 222 is formed on the insulators 31 as well as the low-reflection strips 5 a. The second electrical conductors 222 are metal conductors with good conductivity and connect between two adjacent second conductor cells 221. There are three kinds of methods to execute Step 3.
  • The first method comprises: coating a metal layer on the substantially transparent substrate; coating a low-reflection layer 5 made of either metal nitride material or metal oxide material on the metal layer by Physical Vapor Deposition (PVD) sputter coating; and etching the low-reflection layer 5 and the metal layer at the same time by photolithography to form metal conductors as the second electrical conductors 222. After this step is finished, a plurality of low-reflection strips 5 a of the low-reflection layer 5 are formed on the metal conductors.
  • The second method comprises: coating a metal layer on the substantially transparent substrate; coating a low-reflection layer 5 on the metal layer; exposing the low-reflection layer 5 by photolithography to form a plurality of low-reflection strips 5 a; and etching the metal layer to form the metal conductors by using the low-reflection strips 5 a as etching mask. Thus, the low-reflection strips 5 a of the low-reflection layer 5 are disposed on the metal conductors. The low-reflection layer 5 is made of dark UV-sensitive organic material, such as black photoresist.
  • The third method comprises: coating a metal layer on the substantially transparent substrate; etching the metal layer to form the metal conductors as the second electrical conductors 222; coating a low-reflection layer 5 on the metal conductors; and exposing the low-reflection layer 5 by photolithography to form the low-reflection strips 5 a. After this step is finished, a plurality of low-reflection strips 5 a of the low-reflection layer 5 are formed on the metal conductors. The low-reflection layer 5 is made of dark UV-sensitive organic material, such as black photoresist.
  • Step 4, a passivation layer 4 is coated on the transparent sensing pattern 2.
  • As described above, the step 1 and step 3 of the manufacturing process can be exchanged. And the quantity of the first electrodes and the second electrodes can be increased or decreased according to the resolution of capacitive touch panel.
  • In the same way, a low-reflection layer 5 can be formed on the first metal traces 23 and the second metal traces 24 to reduce the visibility of the metal traces.
  • Referring to FIG. 6 and FIG. 7, a capacitive touch panel 10 in accordance with the second embodiment comprises a substantially transparent substrate 1, a transparent sensing pattern 2, an insulating layer 3, a passivation layer 4 and a low-reflection layer 5. The transparent sensing pattern 2 is disposed on the substantially transparent substrate 1. The transparent sensing pattern 2 comprises a plurality of first electrodes 21 and a plurality of second electrodes 22 respectively disposed on the same layer in two directions. Each first electrode 21 comprises a plurality of first conductor cells 211 and a plurality of first electrical conductors 212 which connect two adjacent first conductor cells 211 of the same electrode. Each second electrode 22 comprises a plurality of second conductor cells 221. The insulating layer 3 comprises a plurality of through holes 32 and covers the transparent sensing pattern 2. A plurality of second electrical conductors 222 are disposed on the other surface of the insulating layer 3 and connect two adjacent second conductor cells 221 via through holes 32. In this embodiment, the second electrical conductors 222 are also metal conductors made of metal conductive materials, such as silver, copper or aluminum. The low-reflection layer 5 comprises a plurality of low-reflection strips 5 a disposed on each second electrical conductor 222. The reflectivity of the low-reflection layer 5 is less than about 80%. The low-reflection layer 5 can reduce the reflected light therefore reducing the visibility of the metal conductors. This embodiment provides a capacitive touch panel with better optical performance.
  • The capacitive touch panel further comprises a processing circuit (not shown) for receiving and processing the touch signals and a plurality of metal traces for carrying the touch signals to the processing circuit. The metal traces are metal conductors and comprise a plurality of first metal traces 23 and a plurality of second metal traces 24, as shown in FIG. 6. The first metal traces 23 connect the first electrodes 21 to the processing circuit. The second metal traces 24 connect the second electrodes 22 to the processing circuit.
  • The manufacturing process of the second embodiment is similar to that of the first embodiment as described. The difference between these two embodiments is the way of setting the insulating layer.
  • Although certain embodiments of the present invention have been fully described with reference to the accompanying drawings, it is to be noted that various changes and modifications will become apparent to those skilled in the art. Such changes and modifications are to be understood as being included within the scope of embodiments of this invention as defined by the appended claims. It is to be understood that the present invention has been described by way of illustration and not limitations.

Claims (25)

1. A capacitive touch panel, comprising:
a substantially transparent substrate;
a transparent sensing pattern comprising at least one metal conductor disposed on the substantially transparent substrate; and
at least one low-reflection layer formed on the at least one metal conductor.
2. The capacitive touch panel according to claim 1, wherein the transparent sensing pattern comprises at least two conductor cells connected by the at least one metal conductor.
3. The capacitive touch panel according to claim 2, wherein the transparent sensing pattern comprises a plurality of first electrodes disposed in a first direction and a plurality of second electrodes disposed in a second direction, and the first direction is perpendicular to the second direction, and the first electrodes and the second electrodes are insulated from each other, and at least one electrode of the first electrodes or the second electrodes comprises the at least two conductor cells.
4. The capacitive touch panel according to claim 3, wherein the plurality of first electrodes and the plurality of second electrodes are formed on the same layer and insulated by a plurality of insulators with each insulator disposed between a corresponding first electrode and a corresponding second electrode.
5. The capacitive touch panel according to claim 3, wherein the plurality of first electrodes and the plurality of second electrodes are formed on the same surface of an insulating layer with a plurality of through holes, and each second electrode is divided into a plurality of sections by the plurality of first electrodes with each section separately located between two adjacent first electrodes, and a plurality of electrical conductors are formed on the other surface of the insulating layer with two ends of each electrical conductor respectively connected to two adjacent sections of each second electrode via two corresponding through holes.
6. The capacitive touch panel according to claim 5, wherein the insulating layer is made of transparent insulation material.
7. The capacitive touch panel according to claim 2, wherein the at least two conductor cells are made of substantially transparent conductive material.
8. The capacitive touch panel according to claim 7, wherein said transparent conductive material is selected from the group consisting of Indium Tin Oxide (ITO) and antimony tin oxide (ATO).
9. The capacitive touch panel according to claim 1, further comprising a processing circuit for receiving and processing the touch signals, and the transparent sensing pattern is connected to the processing circuit via the at least one metal conductor.
10. The capacitive touch panel according to claim 9, wherein the transparent sensing pattern comprises a plurality of first electrodes disposed in a first direction and a plurality of second electrodes disposed in a second direction, and the first direction is perpendicular to the second direction, and the first electrodes and the second electrodes are insulated from each other, and at least one electrode of the first electrodes or the second electrodes comprises the at least two conductor cells.
11. The capacitive touch panel according to claim 1, wherein the reflectivity of the low-reflection layer is less than about 80%.
12. The capacitive touch panel according to claim 1, wherein the low-reflection layer is made of material selected from the group consisting of oxide material, nitride material and dark UV-sensitive organic material.
13. The capacitive touch panel according to claim 12, wherein the oxide material is selected from the group consisting of chromium oxide, titanium oxide and zirconium oxide.
14. The capacitive touch panel according to claim 12, wherein the nitride material is selected from the group consisting of chromium nitride, titanium nitride and zirconium nitride.
15. The capacitive touch panel according to claim 12, wherein the dark UV-sensitive organic material is selected from the group consisting of brown, gray, and black photoresist.
16. The capacitive touch panel according to claim 1, further comprising a passivation layer coated on the transparent sensing pattern and the substantially transparent substrate.
17. A method of reducing the visibility of metal conductors in a capacitive touch panel, comprising a step of forming a low-reflection layer on at least one metal conductor.
18. The method according to claim 17, wherein the low-reflection layer is made of a material selected from the group consisting of oxide material and nitride material.
19. The method according to claim 18, wherein the oxide material is selected from the group consisting of chromium oxide, titanium oxide and zirconium oxide.
20. The method according to claim 18, wherein the nitride material is selected from the group consisting of chromium nitride, titanium nitride and zirconium nitride.
21. The method according to claim 17, wherein the low-reflection layer is made of dark UV-sensitive organic material.
22. The method according to claim 21, wherein the dark UV-sensitive organic material is selected from the group consisting of brown, gray, and black photoresist.
23. The method according to claim 17, wherein the step of forming a low-reflection layer on at least one metal conductor comprises the following steps:
coating a metal layer on a substantially transparent substrate;
coating a low-reflection layer on the metal layer; and
etching the metal layer and the low-reflection layer at the same time by photolithography, resulting in the low-reflection layer formed on the at least one metal conductor.
24. The method according to claim 17, wherein the step of forming a low-reflection layer on at least one metal conductor comprises the following steps:
coating a metal layer on a substantially transparent substrate;
coating a low-reflection layer on the metal layer;
exposing the low-reflection layer by photolithography; and
etching the metal layer forming the at least one metal conductor by using the low-reflection layer as etching mask resulting in the low-reflection layer formed on the at least one metal conductor.
25. The method according to claim 17, wherein the step of forming a low-reflection layer on at least one metal conductor comprises the following steps:
coating a metal layer on a substantially transparent substrate;
etching the metal layer forming at least one metal conductor;
coating a low-reflection layer on the at least one metal conductor; and
exposing the low-reflection layer on the at least one metal conductor by photolithography resulting in the low-reflection layer formed on the at least one metal conductor.
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Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110187673A1 (en) * 2010-02-03 2011-08-04 Yin Hsiang-Wei Capacitive touch sensor and fabrication method thereof and capacitive touch panel
US20130278549A1 (en) * 2012-04-18 2013-10-24 Mitsubishi Electric Corporation Display device and method for manufacturing the same
US20140225862A1 (en) * 2013-02-13 2014-08-14 Panasonic Corporation Touch panel
US20140293149A1 (en) * 2013-03-27 2014-10-02 Shenzhen O-Film Tech Co., Ltd Capacitive touch screen and manufacturing method thereof
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US20150293646A1 (en) * 2014-04-10 2015-10-15 Industrial Technology Research Institute Touch sensing structure
US9204535B2 (en) 2012-04-18 2015-12-01 Lg Chem, Ltd. Conductive structure and method for manufacturing same
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US9462682B2 (en) 2012-08-31 2016-10-04 Lg Chem, Ltd. Conductive structure and method for manufacturing same
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US9766652B2 (en) 2012-08-31 2017-09-19 Lg Chem, Ltd. Conductive structure and method for manufacturing same
US9798426B2 (en) 2013-11-06 2017-10-24 Samsung Display Co., Ltd. Touch panel and method of manufacturing thereof
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EP3510478A4 (en) * 2016-09-12 2020-04-15 BOE Technology Group Co., Ltd. Touch screen, method of manufacturing touch screen, and display device including touch screen
EP3553641A4 (en) * 2016-12-12 2020-06-24 Alps Alpine Co., Ltd. Capacitance-type sensor and device

Families Citing this family (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101415583B1 (en) * 2011-12-16 2014-07-07 엘지이노텍 주식회사 Touch panel and forming method for the same
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CN102662547A (en) * 2012-04-09 2012-09-12 天津美泰真空技术有限公司 Production method for capacitive touch screen glass cover plate without metal wires in view area
JP6324656B2 (en) * 2012-07-12 2018-05-16 大日本印刷株式会社 Touch panel substrate and display device
JP2015529899A (en) * 2012-07-31 2015-10-08 インターフレックス カンパニー リミテッド Sensor panel including antireflection layer and method of manufacturing the same
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CN103941925B (en) * 2013-01-17 2017-04-12 联咏科技股份有限公司 Touch panel
CN103941930B (en) * 2013-01-23 2017-09-05 北京京东方光电科技有限公司 Capacitive touch screen sensor and preparation method thereof
KR102044900B1 (en) * 2013-03-07 2019-11-15 삼성디스플레이 주식회사 touch screen panel
CN103412688B (en) * 2013-03-27 2014-09-17 深圳欧菲光科技股份有限公司 Capacitive touch screen and preparation method thereof
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CN103336643A (en) * 2013-06-19 2013-10-02 业成光电（深圳）有限公司 Touch panel
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US9569055B2 (en) * 2013-08-13 2017-02-14 Samsung Electronics Company, Ltd. Interaction sensing
US10042446B2 (en) 2013-08-13 2018-08-07 Samsung Electronics Company, Ltd. Interaction modes for object-device interactions
JP6157293B2 (en) * 2013-09-12 2017-07-05 株式会社アルバック Touch panel and method for manufacturing touch panel
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AT13879U1 (en) * 2013-10-04 2014-10-15 Plansee Se Touch sensor assembly
KR101548824B1 (en) * 2013-12-17 2015-08-31 삼성전기주식회사 Touch panel
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TWI563429B (en) * 2015-05-08 2016-12-21 Innolux Corp Touch pannel and applications thereof
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Citations (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5667880A (en) * 1992-07-20 1997-09-16 Fuji Photo Optical Co., Ltd. Electroconductive antireflection film
US7065319B1 (en) * 2002-10-18 2006-06-20 Hartley Shawna R Chair mountable educational device
US20060204730A1 (en) * 2005-03-09 2006-09-14 Fuji Photo Film Co., Ltd. Light-shielding image-carrying substrate, method of forming light-shielding image, transfer material, color filter, and display device
US20080088569A1 (en) * 2006-10-13 2008-04-17 Seiko Epson Corporation Electro-optical device and electronic apparatus
US20080264699A1 (en) * 2007-04-27 2008-10-30 Trendon Touch Technology Corp. Conductor pattern structure of capacitive touch panel
US20090160824A1 (en) * 2007-12-25 2009-06-25 Cando Corporation Sensory structure of touch panel
US20090277695A1 (en) * 2008-05-12 2009-11-12 Chen-Yu Liu Method of Forming Touch Sensing Circuit Pattern
US20100001973A1 (en) * 2008-07-03 2010-01-07 Apple Inc. Display with dual-function capacitive elements
TWM375934U (en) * 2009-07-14 2010-03-11 Wintek Corp Capacitance touch panel
TWM378432U (en) * 2009-08-06 2010-04-11 Ritdisplay Corp Capacitive type touch panel
TWM380535U (en) * 2009-12-03 2010-05-11 Transtouch Technology Inc Capacitive touch panel
US20100136868A1 (en) * 2008-12-03 2010-06-03 Yu-Feng Chien Method of forming a color filter touch sensing substrate
US20100233930A1 (en) * 2009-03-12 2010-09-16 Seiko Epson Corporation Manufacturing methods of touch panel, display device, and electronic apparatus
US20100283757A1 (en) * 2009-05-08 2010-11-11 Sintek Photronic Corporation Capacitive touch panel structure with high optical uniformity
US20110032207A1 (en) * 2009-08-07 2011-02-10 Ritdisplay Corporation Capacitive touch sensor
US20110267308A1 (en) * 2010-05-03 2011-11-03 Park Mi-Ae Touch screen panel and method for manufacturing the same
US8068195B2 (en) * 2008-01-14 2011-11-29 Lg Electronics Inc. Portable device including external-light-shielding sheet
US20110310037A1 (en) * 2009-02-26 2011-12-22 Moran Cristin E Touch screen sensor and patterned substrate having overlaid micropatterns with low visibility
US20120044187A1 (en) * 2009-03-29 2012-02-23 Cypress Semiconductor Corporation Capacitive Touch Screen
US8581880B2 (en) * 2010-12-30 2013-11-12 Au Optronics Corp. Capacitive touch display panel

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100685954B1 (en) * 2002-12-24 2007-02-23 엘지.필립스 엘시디 주식회사 Touch Panel
JP4610416B2 (en) * 2005-06-10 2011-01-12 日本写真印刷株式会社 Capacitive touch panel
WO2008108042A1 (en) * 2007-03-01 2008-09-12 Sharp Kabushiki Kaisha Display panel substrate, display panel, display device and method for manufacturing display panel substrate
CN201078769Y (en) * 2007-04-27 2008-06-25 宸鸿光电科技股份有限公司 Touch control drawing structure of capacitance type touch control plate
JP4998919B2 (en) * 2007-06-14 2012-08-15 ソニーモバイルディスプレイ株式会社 Capacitive input device
CN201107767Y (en) * 2007-11-27 2008-08-27 胜华科技股份有限公司 Structure of capacitance type touching control panel joint zone
CN101546241A (en) * 2008-03-28 2009-09-30 义隆电子股份有限公司 Touch control panel device
JP5788129B2 (en) * 2008-07-18 2015-09-30 日東電工株式会社 Transparent conductive film and touch panel
US8493337B2 (en) * 2008-09-22 2013-07-23 Ritfast Corporation Light transmission touch panel
CN101685841A (en) * 2008-09-26 2010-03-31 台达电子工业股份有限公司 Light emitting diode chip
JP2010086684A (en) * 2008-09-30 2010-04-15 Kuramoto Seisakusho Co Ltd Optical thin film with transparent conductive wiring film
CN201298221Y (en) * 2008-10-10 2009-08-26 达虹科技股份有限公司 Two-dimensional sensing structure of capacitive touch control panel
CN101441538B (en) * 2008-12-19 2010-11-10 友达光电股份有限公司 Structure of touch control type apparatus and touch control type display panel
CN201374687Y (en) * 2009-03-20 2009-12-30 宸鸿科技(厦门)有限公司 Capacitance touch control circuit diagram structure
CN101571779A (en) * 2009-06-05 2009-11-04 中国南玻集团股份有限公司 Capacitor type touch-control screen and process method thereof
KR100954894B1 (en) * 2009-09-10 2010-04-28 남동식 Touch panel sensor
CN201725318U (en) * 2010-05-16 2011-01-26 宸鸿科技(厦门)有限公司 Capacitance touch control panel with low-visibility metal conductor

Patent Citations (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5667880A (en) * 1992-07-20 1997-09-16 Fuji Photo Optical Co., Ltd. Electroconductive antireflection film
US7065319B1 (en) * 2002-10-18 2006-06-20 Hartley Shawna R Chair mountable educational device
US20060204730A1 (en) * 2005-03-09 2006-09-14 Fuji Photo Film Co., Ltd. Light-shielding image-carrying substrate, method of forming light-shielding image, transfer material, color filter, and display device
US20080088569A1 (en) * 2006-10-13 2008-04-17 Seiko Epson Corporation Electro-optical device and electronic apparatus
US20080264699A1 (en) * 2007-04-27 2008-10-30 Trendon Touch Technology Corp. Conductor pattern structure of capacitive touch panel
US20090160824A1 (en) * 2007-12-25 2009-06-25 Cando Corporation Sensory structure of touch panel
US8068195B2 (en) * 2008-01-14 2011-11-29 Lg Electronics Inc. Portable device including external-light-shielding sheet
US20090277695A1 (en) * 2008-05-12 2009-11-12 Chen-Yu Liu Method of Forming Touch Sensing Circuit Pattern
US20100001973A1 (en) * 2008-07-03 2010-01-07 Apple Inc. Display with dual-function capacitive elements
US20100136868A1 (en) * 2008-12-03 2010-06-03 Yu-Feng Chien Method of forming a color filter touch sensing substrate
US20110310037A1 (en) * 2009-02-26 2011-12-22 Moran Cristin E Touch screen sensor and patterned substrate having overlaid micropatterns with low visibility
US20100233930A1 (en) * 2009-03-12 2010-09-16 Seiko Epson Corporation Manufacturing methods of touch panel, display device, and electronic apparatus
US20120044187A1 (en) * 2009-03-29 2012-02-23 Cypress Semiconductor Corporation Capacitive Touch Screen
US20100283757A1 (en) * 2009-05-08 2010-11-11 Sintek Photronic Corporation Capacitive touch panel structure with high optical uniformity
TWM375934U (en) * 2009-07-14 2010-03-11 Wintek Corp Capacitance touch panel
TWM378432U (en) * 2009-08-06 2010-04-11 Ritdisplay Corp Capacitive type touch panel
US20110032207A1 (en) * 2009-08-07 2011-02-10 Ritdisplay Corporation Capacitive touch sensor
TWM380535U (en) * 2009-12-03 2010-05-11 Transtouch Technology Inc Capacitive touch panel
US20110267308A1 (en) * 2010-05-03 2011-11-03 Park Mi-Ae Touch screen panel and method for manufacturing the same
US8581880B2 (en) * 2010-12-30 2013-11-12 Au Optronics Corp. Capacitive touch display panel

Cited By (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8411067B2 (en) * 2010-02-03 2013-04-02 Wintek Technology (H.K) Ltd. Capacitive touch sensor and fabrication method thereof and capacitive touch panel
US8587558B2 (en) 2010-02-03 2013-11-19 Wintek Technology(H.K) Ltd. Capacitive touch sensor and fabrication method thereof and capacitive touch panel
US20110187673A1 (en) * 2010-02-03 2011-08-04 Yin Hsiang-Wei Capacitive touch sensor and fabrication method thereof and capacitive touch panel
TWI582648B (en) * 2011-11-29 2017-05-11 宸鴻科技（廈門）有限公司 Touch sensor panel
US20130278549A1 (en) * 2012-04-18 2013-10-24 Mitsubishi Electric Corporation Display device and method for manufacturing the same
US10716218B2 (en) * 2012-04-18 2020-07-14 Mitsubishi Electric Corporation Display device and method for manufacturing the same
US9204535B2 (en) 2012-04-18 2015-12-01 Lg Chem, Ltd. Conductive structure and method for manufacturing same
US9766652B2 (en) 2012-08-31 2017-09-19 Lg Chem, Ltd. Conductive structure and method for manufacturing same
US9462682B2 (en) 2012-08-31 2016-10-04 Lg Chem, Ltd. Conductive structure and method for manufacturing same
US20140225862A1 (en) * 2013-02-13 2014-08-14 Panasonic Corporation Touch panel
US20140293149A1 (en) * 2013-03-27 2014-10-02 Shenzhen O-Film Tech Co., Ltd Capacitive touch screen and manufacturing method thereof
CN104156127A (en) * 2013-05-13 2014-11-19 胜华科技股份有限公司 Touch panel
US9798426B2 (en) 2013-11-06 2017-10-24 Samsung Display Co., Ltd. Touch panel and method of manufacturing thereof
US9612698B2 (en) * 2014-04-10 2017-04-04 Industrial Technology Research Institute Touch sensing structure
US20150293646A1 (en) * 2014-04-10 2015-10-15 Industrial Technology Research Institute Touch sensing structure
CN105320318A (en) * 2014-06-27 2016-02-10 宸盛光电有限公司 Touch sensing unit and touch device
CN105739789A (en) * 2016-03-14 2016-07-06 东莞劲胜精密组件股份有限公司 Electronic touch control screen and coated film preparation technology
EP3510478A4 (en) * 2016-09-12 2020-04-15 BOE Technology Group Co., Ltd. Touch screen, method of manufacturing touch screen, and display device including touch screen
EP3553641A4 (en) * 2016-12-12 2020-06-24 Alps Alpine Co., Ltd. Capacitance-type sensor and device
CN109696990A (en) * 2018-11-16 2019-04-30 信利光电股份有限公司 A kind of the melanism method and metal grill touch screen of metal grill touch screen

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JP2013526741A (en) 2013-06-24
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WO2011143861A1 (en) 2011-11-24
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US20180188857A1 (en) 2018-07-05
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