UA86366C2 - Способ осаждения первого материала на подложку, способ осаждения первого материала на титановой основе на подкложку, устройство для осаждения конденсата на подкложку, металлическая деталь - Google Patents
Способ осаждения первого материала на подложку, способ осаждения первого материала на титановой основе на подкложку, устройство для осаждения конденсата на подкложку, металлическая детальInfo
- Publication number
- UA86366C2 UA86366C2 UAA200509014A UAA200509014A UA86366C2 UA 86366 C2 UA86366 C2 UA 86366C2 UA A200509014 A UAA200509014 A UA A200509014A UA A200509014 A UAA200509014 A UA A200509014A UA 86366 C2 UA86366 C2 UA 86366C2
- Authority
- UA
- Ukraine
- Prior art keywords
- support
- deposition
- condensate
- melt
- metal part
- Prior art date
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12639—Adjacent, identical composition, components
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12778—Alternative base metals from diverse categories
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12806—Refractory [Group IVB, VB, or VIB] metal-base component
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Manufacture And Refinement Of Metals (AREA)
Abstract
Способ осаждения первого материала на подложку включает расположение подложки в камере для осаждения. Образуют расплав между подложкой и источником первого материала путем расплавления одного или нескольких вторых материалов. Поток первого материала проходит сквозь расплав и от расплава к подложке как поток пара. Практически нерасходная часть расплава включает сплав, который имеет температуру плавления, ниже температуры плавления первого материала.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/991,605 US7329436B2 (en) | 2004-11-17 | 2004-11-17 | Vapor deposition of dissimilar materials |
Publications (1)
Publication Number | Publication Date |
---|---|
UA86366C2 true UA86366C2 (ru) | 2009-04-27 |
Family
ID=35997795
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
UAA200509014A UA86366C2 (ru) | 2004-11-17 | 2005-09-23 | Способ осаждения первого материала на подложку, способ осаждения первого материала на титановой основе на подкложку, устройство для осаждения конденсата на подкложку, металлическая деталь |
Country Status (6)
Country | Link |
---|---|
US (2) | US7329436B2 (ru) |
EP (1) | EP1659192A1 (ru) |
CN (1) | CN1776001A (ru) |
MX (1) | MXPA05012357A (ru) |
SG (1) | SG122957A1 (ru) |
UA (1) | UA86366C2 (ru) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100611673B1 (ko) * | 2005-01-31 | 2006-08-10 | 삼성에스디아이 주식회사 | 박막 형성 방법 및 유기전계발광소자의 제조 방법 |
US20070125303A1 (en) * | 2005-12-02 | 2007-06-07 | Ward Ruby | High-throughput deposition system for oxide thin film growth by reactive coevaportation |
US8419857B2 (en) * | 2009-03-31 | 2013-04-16 | United Technologies Corporation | Electron beam vapor deposition apparatus and method of coating |
US20130236659A1 (en) * | 2012-03-07 | 2013-09-12 | Honeywell International Inc. | Methods for vapor depositing high temperature coatings on gas turbine engine components utilizing pre-alloyed pucks |
EP4053303A1 (en) * | 2021-03-01 | 2022-09-07 | Carl Zeiss Vision International GmbH | Vapor deposition method for coating a spectacle lens, physical vapor deposition system and crucible for physical vapor deposition |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3356487A (en) | 1966-12-06 | 1967-12-05 | Air Reduction | Prevention of splattering during vaporization processing |
US3667421A (en) * | 1970-09-17 | 1972-06-06 | United Aircraft Corp | Mechanism for controlling the thickness of a coating in a vapor deposition apparatus |
JPS4848334A (ru) | 1971-10-07 | 1973-07-09 | ||
JPS51149008A (en) * | 1975-05-23 | 1976-12-21 | Fuji Photo Film Co Ltd | Magnetic recording medium manufacturing method |
US5500301A (en) * | 1991-03-07 | 1996-03-19 | Kabushiki Kaisha Kobe Seiko Sho | A1 alloy films and melting A1 alloy sputtering targets for depositing A1 alloy films |
US5474809A (en) * | 1994-12-27 | 1995-12-12 | General Electric Company | Evaporation method |
UA21807C2 (ru) | 1996-05-17 | 2000-09-15 | Юнайтед Технолоджіз Корп. Пратт Енд Уітні | Способ высокоскоростного вакуумного выпаривания металлов и сплавов с использованием ванны-посредника |
JPH1149506A (ja) * | 1997-07-31 | 1999-02-23 | Kyocera Corp | 装飾部材 |
US6145470A (en) | 1998-12-11 | 2000-11-14 | General Electric Company | Apparatus for electron beam physical vapor deposition |
US6190473B1 (en) | 1999-08-12 | 2001-02-20 | The Boenig Company | Titanium alloy having enhanced notch toughness and method of producing same |
JP2001123255A (ja) * | 1999-10-21 | 2001-05-08 | Ykk Corp | 高強度アルミニウム合金材の製造方法 |
AU2957400A (en) | 1999-12-29 | 2001-07-16 | International Center For Electron Beam Technologies Of E.O. Paton Electric Welding Institute | A method of forming on a substrate a coating of complex alloy containing elements whose evaporation temperatures differ by more than 350 degrees |
SG106639A1 (en) * | 2000-10-10 | 2004-10-29 | Gen Electric | Apparatus and method for introducing small amounts of refractory elements into a vapor deposition coating |
US20020121702A1 (en) * | 2001-03-01 | 2002-09-05 | Siemens Dematic Electronics Assembly Systems, Inc. | Method and structure of in-situ wafer scale polymer stud grid array contact formation |
US20050205415A1 (en) * | 2004-03-19 | 2005-09-22 | Belousov Igor V | Multi-component deposition |
-
2004
- 2004-11-17 US US10/991,605 patent/US7329436B2/en active Active
-
2005
- 2005-09-23 UA UAA200509014A patent/UA86366C2/ru unknown
- 2005-11-07 EP EP05256894A patent/EP1659192A1/en not_active Withdrawn
- 2005-11-14 SG SG200508449A patent/SG122957A1/en unknown
- 2005-11-16 MX MXPA05012357A patent/MXPA05012357A/es not_active Application Discontinuation
- 2005-11-17 CN CN200510125476.9A patent/CN1776001A/zh active Pending
-
2007
- 2007-11-14 US US11/939,854 patent/US8286582B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US8286582B2 (en) | 2012-10-16 |
EP1659192A1 (en) | 2006-05-24 |
MXPA05012357A (es) | 2006-05-19 |
US20060105195A1 (en) | 2006-05-18 |
CN1776001A (zh) | 2006-05-24 |
SG122957A1 (en) | 2006-06-29 |
US20100285330A1 (en) | 2010-11-11 |
US7329436B2 (en) | 2008-02-12 |
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