UA64008C2 - A furnace for the manufacture of ingots of synthetic transparent quartz glass and a method for preparing the shaped article from the synthetic transparent quartz glass - Google Patents

A furnace for the manufacture of ingots of synthetic transparent quartz glass and a method for preparing the shaped article from the synthetic transparent quartz glass Download PDF

Info

Publication number: UA64008C2
Authority: UA; Ukraine
Prior art keywords: ingot; quartz glass; transparent quartz; glass; synthetic transparent
Prior art date: 1998-07-15

Application number

UA2001021047A

Other languages

English (en)

Ukrainian (uk)

Original Assignee

Saint Gobin Quartz Pls

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1998-07-15

Filing date

1999-07-15

Publication date

2004-02-16

1999-07-15 Application filed by Saint Gobin Quartz Pls filed Critical Saint Gobin Quartz Pls

2004-02-16 Publication of UA64008C2 publication Critical patent/UA64008C2/uk

Links

VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 91
238000000034 method Methods 0.000 title claims abstract description 26
238000004519 manufacturing process Methods 0.000 title claims abstract description 15
239000000377 silicon dioxide Substances 0.000 claims abstract description 27
230000015572 biosynthetic process Effects 0.000 claims abstract description 16
239000000155 melt Substances 0.000 claims abstract description 14
238000003786 synthesis reaction Methods 0.000 claims abstract description 14
238000005245 sintering Methods 0.000 claims abstract 2
239000011521 glass Substances 0.000 claims description 41
238000001125 extrusion Methods 0.000 claims description 20
238000000151 deposition Methods 0.000 claims description 15
230000008021 deposition Effects 0.000 claims description 12
-1 silica compound Chemical class 0.000 claims description 9
MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 7
239000007789 gas Substances 0.000 claims description 7
238000010438 heat treatment Methods 0.000 claims description 6
230000004927 fusion Effects 0.000 claims description 5
229910052710 silicon Inorganic materials 0.000 claims description 5
239000010703 silicon Substances 0.000 claims description 5
238000003892 spreading Methods 0.000 claims description 4
238000007740 vapor deposition Methods 0.000 claims description 4
238000010924 continuous production Methods 0.000 claims description 3
HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 claims description 3
RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 3
239000003870 refractory metal Substances 0.000 claims description 3
XMSXQFUHVRWGNA-UHFFFAOYSA-N Decamethylcyclopentasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 XMSXQFUHVRWGNA-UHFFFAOYSA-N 0.000 claims description 2
239000011148 porous material Substances 0.000 claims description 2
UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 claims 1
BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 claims 1
229910052727 yttrium Inorganic materials 0.000 claims 1
VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 claims 1
239000000047 product Substances 0.000 description 13
239000007858 starting material Substances 0.000 description 9
239000011449 brick Substances 0.000 description 8
239000011819 refractory material Substances 0.000 description 8
238000002844 melting Methods 0.000 description 7
230000008018 melting Effects 0.000 description 7
239000000463 material Substances 0.000 description 6
239000010453 quartz Substances 0.000 description 6
ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 5
239000000460 chlorine Substances 0.000 description 5
229910052801 chlorine Inorganic materials 0.000 description 5
239000000843 powder Substances 0.000 description 5
229910021487 silica fume Inorganic materials 0.000 description 5
239000000758 substrate Substances 0.000 description 5
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
229910052751 metal Inorganic materials 0.000 description 4
239000002184 metal Substances 0.000 description 4
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
239000001257 hydrogen Substances 0.000 description 3
229910052739 hydrogen Inorganic materials 0.000 description 3
239000011859 microparticle Substances 0.000 description 3
238000002156 mixing Methods 0.000 description 3
239000006060 molten glass Substances 0.000 description 3
230000003287 optical effect Effects 0.000 description 3
239000001301 oxygen Substances 0.000 description 3
229910052760 oxygen Inorganic materials 0.000 description 3
150000003377 silicon compounds Chemical class 0.000 description 3
VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 2
IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
230000006835 compression Effects 0.000 description 2
238000007906 compression Methods 0.000 description 2
238000011109 contamination Methods 0.000 description 2
238000001816 cooling Methods 0.000 description 2
238000009826 distribution Methods 0.000 description 2
239000005350 fused silica glass Substances 0.000 description 2
239000008187 granular material Substances 0.000 description 2
125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
239000005049 silicon tetrachloride Substances 0.000 description 2
239000000126 substance Substances 0.000 description 2
238000004017 vitrification Methods 0.000 description 2
239000002699 waste material Substances 0.000 description 2
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
239000005046 Chlorosilane Substances 0.000 description 1
ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
238000010923 batch production Methods 0.000 description 1
YXTPWUNVHCYOSP-UHFFFAOYSA-N bis($l^{2}-silanylidene)molybdenum Chemical compound [Si]=[Mo]=[Si] YXTPWUNVHCYOSP-UHFFFAOYSA-N 0.000 description 1
239000006227 byproduct Substances 0.000 description 1
239000001569 carbon dioxide Substances 0.000 description 1
229910002092 carbon dioxide Inorganic materials 0.000 description 1
238000005266 casting Methods 0.000 description 1
238000005524 ceramic coating Methods 0.000 description 1
KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
238000004140 cleaning Methods 0.000 description 1
230000003749 cleanliness Effects 0.000 description 1
150000001875 compounds Chemical class 0.000 description 1
239000013078 crystal Substances 0.000 description 1
229910021419 crystalline silicon Inorganic materials 0.000 description 1
238000005520 cutting process Methods 0.000 description 1
125000004122 cyclic group Chemical group 0.000 description 1
238000009792 diffusion process Methods 0.000 description 1
KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
230000000694 effects Effects 0.000 description 1
230000003628 erosive effect Effects 0.000 description 1
239000000835 fiber Substances 0.000 description 1
239000000446 fuel Substances 0.000 description 1
239000000156 glass melt Substances 0.000 description 1
229910002804 graphite Inorganic materials 0.000 description 1
239000010439 graphite Substances 0.000 description 1
238000000265 homogenisation Methods 0.000 description 1
230000007062 hydrolysis Effects 0.000 description 1
238000006460 hydrolysis reaction Methods 0.000 description 1
239000012535 impurity Substances 0.000 description 1
239000000203 mixture Substances 0.000 description 1
229910052750 molybdenum Inorganic materials 0.000 description 1
239000011733 molybdenum Substances 0.000 description 1
229910021343 molybdenum disilicide Inorganic materials 0.000 description 1
238000000465 moulding Methods 0.000 description 1
239000003345 natural gas Substances 0.000 description 1
229910052757 nitrogen Inorganic materials 0.000 description 1
230000010355 oscillation Effects 0.000 description 1
238000013021 overheating Methods 0.000 description 1
230000003647 oxidation Effects 0.000 description 1
238000007254 oxidation reaction Methods 0.000 description 1
239000002245 particle Substances 0.000 description 1
238000000206 photolithography Methods 0.000 description 1
239000005373 porous glass Substances 0.000 description 1
239000002244 precipitate Substances 0.000 description 1
238000003825 pressing Methods 0.000 description 1
239000002994 raw material Substances 0.000 description 1
230000001105 regulatory effect Effects 0.000 description 1
239000004065 semiconductor Substances 0.000 description 1
238000007711 solidification Methods 0.000 description 1
230000008023 solidification Effects 0.000 description 1
231100000331 toxic Toxicity 0.000 description 1
230000002588 toxic effect Effects 0.000 description 1
239000011882 ultra-fine particle Substances 0.000 description 1
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1484—Means for supporting, rotating or translating the article being formed
- C03B19/1492—Deposition substrates, e.g. targets
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B17/00—Forming molten glass by flowing-out, pushing-out, extruding or drawing downwardly or laterally from forming slits or by overflowing over lips
- C03B17/04—Forming tubes or rods by drawing from stationary or rotating tools or from forming nozzles
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/09—Other methods of shaping glass by fusing powdered glass in a shaping mould
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1407—Deposition reactors therefor
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/50—Multiple burner arrangements
- C03B2207/52—Linear array of like burners

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Organic Chemistry (AREA)
Manufacturing & Machinery (AREA)
Chemical Kinetics & Catalysis (AREA)
Glass Melting And Manufacturing (AREA)
Silicon Compounds (AREA)
Glass Compositions (AREA)

UA2001021047A 1998-07-15 1999-07-15 A furnace for the manufacture of ingots of synthetic transparent quartz glass and a method for preparing the shaped article from the synthetic transparent quartz glass UA64008C2 (en)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
GBGB9815357.0A GB9815357D0 (en)	1998-07-15	1998-07-15	Improvements in and relating to the manufacture of synthetic vitreous silica ingot
PCT/GB1999/002278 WO2000003955A1 (en)	1998-07-15	1999-07-15	Process and apparatus for manufacturing a glass ingot from synthetic silica

Publications (1)

Publication Number	Publication Date
UA64008C2 true UA64008C2 (en)	2004-02-16

Family

ID=10835565

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
UA2001021047A UA64008C2 (en)	1998-07-15	1999-07-15	A furnace for the manufacture of ingots of synthetic transparent quartz glass and a method for preparing the shaped article from the synthetic transparent quartz glass

Country Status (12)

Country	Link
US (1)	US6763682B1 (ja)
EP (1)	EP1097110B1 (ja)
JP (1)	JP4639274B2 (ja)
KR (1)	KR100637027B1 (ja)
CN (1)	CN1227171C (ja)
AT (1)	ATE265990T1 (ja)
AU (1)	AU4922599A (ja)
DE (1)	DE69917035T2 (ja)
GB (1)	GB9815357D0 (ja)
RU (1)	RU2240988C2 (ja)
UA (1)	UA64008C2 (ja)
WO (1)	WO2000003955A1 (ja)

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JP2001342026A (ja) *	2000-05-30	2001-12-11	Tosoh Quartz Corp	石英ガラスの製造方法及び製造装置
JP4509342B2 (ja) *	2000-09-21	2010-07-21	東ソー・クォーツ株式会社	長尺石英ガラスの製造方法及びその装置
US6997015B2 (en) *	2001-11-27	2006-02-14	Corning Incorporated	EUV lithography glass structures formed by extrusion consolidation process
US7299657B2 (en) *	2002-07-12	2007-11-27	Corning Incorporated	Method of making high strain point glass
US20040118155A1 (en) *	2002-12-20	2004-06-24	Brown John T	Method of making ultra-dry, Cl-free and F-doped high purity fused silica
DE10337388B4 (de) *	2003-08-13	2006-04-20	Heraeus Quarzglas Gmbh & Co. Kg	Vertikal-Tiegelziehverfahren zur Herstellung eines zylinderförmigen Quarzglaskörpers und Vorrichtung zur Durchführung des Verfahrens
GB0605461D0 (en) *	2006-03-17	2006-04-26	Saint Gobain Quartz Plc	Manufacture of large articles in synthetic vitreous silica
US8062986B2 (en) *	2007-07-27	2011-11-22	Corning Incorporated	Fused silica having low OH, OD levels and method of making
GB2478307A (en)	2010-03-02	2011-09-07	Heraeus Quartz Uk Ltd	Manufacture of silica glass
US9120700B2 (en) *	2010-03-26	2015-09-01	Corning Incorporated	Non-contact etching of moving glass sheets
DE102010033408B3 (de) *	2010-08-05	2011-06-16	Heraeus Quarzglas Gmbh & Co. Kg	Ziehverfahren zur Herstellung zylinderförmiger Bauteile aus Quarzglas
GB201106015D0 (en)	2011-04-08	2011-05-25	Heraeus Quartz Uk Ltd	Production of silica soot bodies
CN102701568B (zh) *	2012-06-11	2014-07-09	山东理工大学	高纯石英连续熔融炉用陶瓷内胆的制备方法及连续熔融炉
GB2514118B (en)	2013-05-13	2015-11-11	Heraeus Quartz Uk Ltd	Froth floatation separation and analysis
WO2016064806A1 (en) *	2014-10-20	2016-04-28	Navus Automation, Inc.	Fused silica furnace system & method for continuous production of fused silica
CN106007356B (zh) *	2015-03-24	2018-09-18	信越化学工业株式会社	烧结装置及烧结方法
CN104926088B (zh) *	2015-07-16	2018-04-10	中国建筑材料科学研究总院	高均匀合成石英玻璃砣的制备方法
CN104926087B (zh) *	2015-07-16	2018-03-27	中国建筑材料科学研究总院	制备合成石英玻璃砣的沉积炉
TWI808933B (zh)	2015-12-18	2023-07-21	德商何瑞斯廓格拉斯公司	石英玻璃體、二氧化矽顆粒、光導、施照體、及成型體及其製備方法
CN108698888A (zh)	2015-12-18	2018-10-23	贺利氏石英玻璃有限两合公司	在石英玻璃制备中作为中间物的经碳掺杂的二氧化硅颗粒的制备
TWI733723B (zh)	2015-12-18	2021-07-21	德商何瑞斯廓格拉斯公司	不透明石英玻璃體的製備
JP6881777B2 (ja)	2015-12-18	2021-06-02	ヘレウスクワルツグラスゲーエムベーハーウントコンパニーカーゲー	合成石英ガラス粒の調製
TWI788278B (zh)	2015-12-18	2023-01-01	德商何瑞斯廓格拉斯公司	由均質石英玻璃製得之玻璃纖維及預成型品
WO2017103160A1 (de)	2015-12-18	2017-06-22	Heraeus Quarzglas Gmbh & Co. Kg	Herstellung von quarzglaskörpern aus siliziumdioxidgranulat
WO2017103123A2 (de)	2015-12-18	2017-06-22	Heraeus Quarzglas Gmbh & Co. Kg	Herstellung von quarzglaskörpern mit taupunktkontrolle im schmelzofen
US10730780B2 (en)	2015-12-18	2020-08-04	Heraeus Quarzglas Gmbh & Co. Kg	Preparation of a quartz glass body in a multi-chamber oven
US11299417B2 (en)	2015-12-18	2022-04-12	Heraeus Quarzglas Gmbh & Co. Kg	Preparation of a quartz glass body in a melting crucible of refractory metal
WO2017103124A2 (de)	2015-12-18	2017-06-22	Heraeus Quarzglas Gmbh & Co. Kg	Erhöhen des siliziumgehalts bei der herstellung von quarzglas
KR20200018631A (ko)	2017-06-14	2020-02-19	헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지	석영 유리체의 제조
EP3656744A1 (en) *	2018-11-23	2020-05-27	Heraeus Conamic UK Limited	On-line annealing of large fused quartz ingots
EP3656746B1 (en)	2018-11-23	2024-06-05	Heraeus Conamic UK Limited	Method and apparatus for cutting a hollow quartz glass ingot
CN114349310B (zh) *	2021-12-29	2023-06-23	中建材衢州金格兰石英有限公司	一种大直径石英砣熔制炉

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FR1363233A (fr)	1963-04-16	1964-06-12	Corning Glass Works	Procédé de fabrication de masses pleines, notamment de verres et céramiques, et appareil de mise en oeuvre
JPS63288906A (ja)	1987-05-20	1988-11-25	Nkk Corp	ケイ酸の製造方法
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JPS649823A (en) *	1987-06-30	1989-01-13	Nippon Kokan Kk	Production of silicic acid
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DE4212099C2 (de) *	1992-04-10	1994-07-21	Heraeus Quarzglas	Verfahren und Vorrichtung zur Herstellung eines Verbundkörpers aus Glas
EP0850199B1 (en)	1995-09-12	2005-12-28	Corning Incorporated	Method and Furnace for the Production of Silica Glass containing less striae
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JPH10167741A (ja) *	1996-12-16	1998-06-23	Nikon Corp	合成石英ガラスの製造方法、合成石英ガラスの製造装置および合成石英ガラス

1998
- 1998-07-15 GB GBGB9815357.0A patent/GB9815357D0/en not_active Ceased
1999
- 1999-07-15 RU RU2001104345/03A patent/RU2240988C2/ru not_active IP Right Cessation
- 1999-07-15 EP EP99933050A patent/EP1097110B1/en not_active Expired - Lifetime
- 1999-07-15 UA UA2001021047A patent/UA64008C2/uk unknown
- 1999-07-15 WO PCT/GB1999/002278 patent/WO2000003955A1/en active IP Right Grant
- 1999-07-15 JP JP2000560067A patent/JP4639274B2/ja not_active Expired - Lifetime
- 1999-07-15 AT AT99933050T patent/ATE265990T1/de not_active IP Right Cessation
- 1999-07-15 KR KR1020017000581A patent/KR100637027B1/ko not_active IP Right Cessation
- 1999-07-15 DE DE69917035T patent/DE69917035T2/de not_active Expired - Fee Related
- 1999-07-15 US US09/743,623 patent/US6763682B1/en not_active Expired - Lifetime
- 1999-07-15 AU AU49225/99A patent/AU4922599A/en not_active Abandoned
- 1999-07-15 CN CNB998098531A patent/CN1227171C/zh not_active Expired - Fee Related

Also Published As

Publication number	Publication date
US6763682B1 (en)	2004-07-20
AU4922599A (en)	2000-02-07
RU2240988C2 (ru)	2004-11-27
JP4639274B2 (ja)	2011-02-23
EP1097110A1 (en)	2001-05-09
CN1313839A (zh)	2001-09-19
JP2002520249A (ja)	2002-07-09
KR100637027B1 (ko)	2006-10-20
KR20010074714A (ko)	2001-08-09
DE69917035D1 (de)	2004-06-09
ATE265990T1 (de)	2004-05-15
EP1097110B1 (en)	2004-05-06
GB9815357D0 (en)	1998-09-16
WO2000003955A1 (en)	2000-01-27
DE69917035T2 (de)	2005-04-28
CN1227171C (zh)	2005-11-16

Publication	Publication Date	Title
UA64008C2 (en)	2004-02-16	A furnace for the manufacture of ingots of synthetic transparent quartz glass and a method for preparing the shaped article from the synthetic transparent quartz glass
RU2103232C1 (ru)	1998-01-27	Индукционная печь, устройство с использованием этой печи, способ тепловой обработки синтетических кремнийдиоксидных масс и способы получения кремнийдиоксидного стекла
JP2007161573A (ja)	2007-06-28	溶融シリカを製造するための方法および装置
RU2217391C2 (ru)	2003-11-27	Способ образования трубчатого элемента для производства оптического волокна с использованием плазменного внешнего осаждения из паровой фазы
EP0045599B1 (en)	1985-03-27	Process and apparatus for the production of silicon bodies by continuous chemical vapor deposition
EP2024289B1 (en)	2016-06-15	Method for producing a semifinished product from synthetic quartz glass
US6698248B2 (en)	2004-03-02	Methods and furnaces for fused silica production
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