TWM609508U

TWM609508U - Atomic layer deposition device for particles

Info

Publication number: TWM609508U
Application number: TW109215381U
Authority: TW
Inventors: 林俊成; 張容華; 郭大豪; 古家誠
Original assignee: 天虹科技股份有限公司
Priority date: 2020-11-20
Filing date: 2020-11-20
Publication date: 2021-03-21

Abstract

本新型提供一種微粒的原子層沉積裝置，主要包括一真空腔體、一軸封裝置及一驅動單元，其中驅動單元經由軸封裝置連接並驅動真空腔體轉動。真空腔體包括一反應空間，用以容納複數個微粒，其中反應空間為多邊形柱狀體或圓形波浪狀柱狀體。一抽氣管線及一進氣管線流體連接真空腔體，其中進氣管線用以將前驅物氣體及非反應氣體輸送至反應空間，配合反應空間的特殊形狀，可透過非反應氣體有效翻攪反應空間內的微粒，以利於透過原子層沉積製程在微粒的表面形成厚度均勻的薄膜。The invention provides an atomic layer deposition device for particles, which mainly includes a vacuum chamber, a shaft sealing device and a driving unit, wherein the driving unit is connected via the shaft sealing device and drives the vacuum chamber to rotate. The vacuum chamber includes a reaction space for accommodating a plurality of particles, wherein the reaction space is a polygonal columnar body or a circular wavy columnar body. An air extraction line and an air intake line are fluidly connected to the vacuum chamber, where the air intake line is used to transport the precursor gas and non-reactive gas to the reaction space. With the special shape of the reaction space, it can effectively stir the reaction through the non-reactive gas The particles in the space facilitate the formation of a thin film with uniform thickness on the surface of the particles through the atomic layer deposition process.

Description

微粒的原子層沉積裝置Atomic layer deposition device for particles

本新型有關於一種微粒的原子層沉積裝置，其中真空腔體的反應空間為多邊形柱狀體或圓形波浪狀柱狀體，使得輸送至真空腔體的非反應氣體可有效翻攪微粒，並有利於在微粒的表面形成厚度均勻的薄膜。The present invention relates to an atomic layer deposition device for particles, in which the reaction space of the vacuum chamber is a polygonal columnar body or a circular wavy columnar body, so that the non-reactive gas delivered to the vacuum chamber can effectively stir the particles, and It is beneficial to form a thin film with uniform thickness on the surface of the particles.

奈米顆粒(nanoparticle)一般被定義為在至少一個維度上小於100奈米的顆粒，奈米顆粒與宏觀物質在物理及化學上的特性截然不同。一般而言，宏觀物質的物理特性與本身的尺寸無關，但奈米顆粒則非如此，奈米顆粒在生物醫學、光學和電子等領域都具有潛在的應用。Nanoparticles are generally defined as particles smaller than 100 nanometers in at least one dimension. Nanoparticles and macroscopic substances have completely different physical and chemical properties. Generally speaking, the physical properties of macroscopic substances have nothing to do with their size, but nano particles are not the case. Nano particles have potential applications in biomedicine, optics, and electronics.

量子點(Quantum Dot)是半導體的奈米顆粒，目前研究的半導體材料為II-VI材料，如ZnS、CdS、CdSe等，其中又以CdSe最受到矚目。量子點的尺寸通常在2至50奈米之間，量子點被紫外線照射後，量子點中的電子會吸收能量，並從價帶躍遷到傳導帶。被激發的電子從傳導帶回到價帶時，會通過發光釋放出能量。Quantum dots (Quantum Dot) are semiconductor nano-particles. The currently studied semiconductor materials are II-VI materials, such as ZnS, CdS, CdSe, etc., of which CdSe has attracted the most attention. The size of quantum dots is usually between 2 and 50 nanometers. After the quantum dots are irradiated with ultraviolet light, the electrons in the quantum dots will absorb energy and transition from the valence band to the conduction band. When the excited electron returns from the conduction band to the valence band, it releases energy through light emission.

量子點的能隙與尺寸大小相關，量子點的尺寸越大能隙越小，經照射後會發出波長較長的光，量子點的尺寸越小則能隙越大，經照射後會發出波長較短的光。例如5到6奈米的量子點會發出橘光或紅光，而2到3奈米的量子點則會發出藍光或綠光，當然光色取決於量子點的材料組成。The energy gap of a quantum dot is related to the size. The larger the size of the quantum dot, the smaller the energy gap, and will emit light with a longer wavelength after irradiation. The smaller the size of the quantum dot, the larger the energy gap, and the wavelength will be emitted after irradiation. Shorter light. For example, quantum dots of 5 to 6 nanometers emit orange or red light, while quantum dots of 2 to 3 nanometers emit blue or green light. Of course, the light color depends on the material composition of the quantum dots.

應用量子點的發光二極體(LED)產生的光可接近連續光譜，同時具有高演色性，並有利於提高發光二極體的發光品質。此外亦可透過改變量子點的尺寸調整發射光的波長，使得量子點成為新一代發光裝置及顯示器的發展重點。Light-emitting diodes (LEDs) using quantum dots produce light that can be close to a continuous spectrum, have high color rendering properties, and help improve the luminous quality of the light-emitting diodes. In addition, the wavelength of the emitted light can be adjusted by changing the size of the quantum dots, making the quantum dots the development focus of a new generation of light-emitting devices and displays.

量子點雖然具有上述的優點及特性，但在製造的過程中容易產生團聚現象。此外量子點具有較高的表面活性，並容易與空氣及水氣發生反應，進而縮短量子點的壽命。Although quantum dots have the above-mentioned advantages and characteristics, they are prone to agglomeration during the manufacturing process. In addition, quantum dots have high surface activity, and easily react with air and water vapor, thereby shortening the lifespan of quantum dots.

具體來說，將量子點製作成為發光二極體的密封膠的過程中，可能會產生團聚效應，而降低了量子點的光學性能。此外，量子點在製作成發光二極體的密封膠後，外界的氧或水氣仍可能會穿過密封膠而接觸量子點的表面，導致量子點氧化，並縮短量子點及發光二極體的效能或使用壽命。此外量子點的表面缺陷及懸空鍵(dangling bonds)亦可能造成非輻射復合(nonradiative recombination)。Specifically, in the process of making quantum dots into a sealant for light-emitting diodes, agglomeration effect may occur, which reduces the optical performance of the quantum dots. In addition, after quantum dots are made into the sealant of light-emitting diodes, external oxygen or water vapor may still pass through the sealant and contact the surface of the quantum dots, causing the quantum dots to oxidize and shorten the quantum dots and light-emitting diodes. The effectiveness or service life of the product. In addition, the surface defects and dangling bonds of quantum dots may also cause nonradiative recombination.

目前業界會透過原子層沉積(atomic layer deposition，ALD)在量子點的表面形成一層奈米厚度的薄膜，或者是在量子點的表面形成多層薄膜，以形成量子井結構。At present, the industry will form a nano-thick film on the surface of quantum dots through atomic layer deposition (ALD), or form a multilayer film on the surface of quantum dots to form a quantum well structure.

原子層沉積可以在基板上形成均勻厚度的薄膜，並可有效控制薄膜的厚度，理論上亦適用於三維的量子點。量子點靜置在承載盤時，相鄰的量子點之間會存在接觸點，使得原子層沉積的前驅物氣體無法接觸這些接觸點，並導致無法在所有的奈米顆粒的表面皆形成厚度均勻的薄膜。Atomic layer deposition can form a thin film with a uniform thickness on a substrate, and can effectively control the thickness of the thin film. In theory, it is also suitable for three-dimensional quantum dots. When the quantum dots are placed on the carrier plate, there will be contact points between adjacent quantum dots, so that the precursor gas deposited by the atomic layer cannot contact these contact points, and it is impossible to form a uniform thickness on the surface of all nano particles.的膜。 The film.

為了解決上述先前技術的問題，本新型提出一種微粒的原子層沉積裝置，主要透過反應空間的特殊形狀設計，使得輸入反應空間的非反應氣體可充份攪拌微粒，以利於透過原子層沉積製程在各個微粒的表面上形成厚度均勻的薄膜。In order to solve the above-mentioned problems of the prior art, the present invention proposes a particle atomic layer deposition device, which is designed mainly through the special shape of the reaction space, so that the non-reactive gas input into the reaction space can fully agitate the particles, so as to facilitate the penetration of the atomic layer deposition process. A thin film of uniform thickness is formed on the surface of each particle.

本新型的一目的，在於提供一種微粒的原子層沉積裝置，主要包括一驅動單元、一軸封裝置及一真空腔體，其中驅動單元透過軸封裝置連接並驅動真空腔體轉動。真空腔體包括一反應空間，用以容納複數個微粒，其中反應空間為多邊形柱狀體或圓形波浪狀柱狀體。當真空腔體轉動及輸送非反應氣體至反應空間時，反應空間內的微粒可以被充份及均勻的翻攪，以避免微粒發生團聚現象，並有利於在各個微粒的表面形成厚度均勻的薄膜。An object of the present invention is to provide a particle atomic layer deposition device, which mainly includes a driving unit, a shaft sealing device and a vacuum chamber, wherein the driving unit is connected through the shaft sealing device and drives the vacuum chamber to rotate. The vacuum chamber includes a reaction space for accommodating a plurality of particles, wherein the reaction space is a polygonal columnar body or a circular wavy columnar body. When the vacuum chamber rotates and transports the non-reactive gas to the reaction space, the particles in the reaction space can be sufficiently and uniformly stirred to avoid agglomeration of the particles and facilitate the formation of a uniform thickness film on the surface of each particle .

本新型的一目的，在於提供一種微粒的原子層沉積裝置，主要將至少一抽氣管線、至少一進氣管線、至少一非反應氣體輸送管線、至少一加熱器及/或至少一溫度感測單元設置在軸封裝置內。抽氣管線用以抽出反應空間內的氣體，進氣管線用以將前驅物氣體及/或非反應氣體輸送至反應空間，以在微粒的表面形成薄膜。在進行原子層沉積時，透過驅動單元帶動真空腔體轉動，並可透過進氣管線或非反應氣體輸送管線將非反應氣體輸送至真空腔體，配合反應空間的特殊形狀，使得微粒被翻攪並擴散到反應空間內的各個區域，而有利在各個微粒的表面形成厚度均勻的薄膜。An object of the present invention is to provide a particle atomic layer deposition device, which mainly combines at least one gas extraction pipeline, at least one gas inlet pipeline, at least one non-reactive gas delivery pipeline, at least one heater and/or at least one temperature sensor The unit is arranged in the shaft sealing device. The air extraction line is used to extract the gas in the reaction space, and the air intake line is used to transport the precursor gas and/or non-reactive gas to the reaction space to form a thin film on the surface of the particles. During atomic layer deposition, the drive unit drives the vacuum chamber to rotate, and the non-reactive gas can be transported to the vacuum chamber through the gas inlet line or the non-reactive gas delivery line. The special shape of the reaction space makes the particles agitated. And it diffuses to each area in the reaction space, and it is beneficial to form a thin film with uniform thickness on the surface of each particle.

本新型的一目的，在於提供一種微粒的原子層沉積裝置，主要包括一驅動單元、一軸封裝置及一真空腔體，其中驅動單元透過軸封裝置連接真空腔體，並驅動真空腔體轉動。真空腔體包括一蓋板及一腔體，當蓋板覆蓋腔體時會在兩者之間形成多邊形柱狀體或圓形波浪狀柱狀體的反應空間，以利於反應空間內的微粒擴散的各個區域。An object of the present invention is to provide a particle atomic layer deposition device, which mainly includes a driving unit, a shaft sealing device and a vacuum chamber, wherein the driving unit is connected to the vacuum chamber through the shaft sealing device and drives the vacuum chamber to rotate. The vacuum chamber includes a cover plate and a cavity. When the cover plate covers the cavity, a reaction space of a polygonal column or a circular wavy column is formed between the two to facilitate the diffusion of particles in the reaction space. Of the various regions.

為了達到上述的目的，本新型提出一種微粒的原子層沉積裝置，包括：一真空腔體，包括一反應空間，並用以容置複數個微粒，其中反應空間為一多邊形柱狀體；一軸封裝置；一驅動單元，透過軸封裝置連接真空腔體，並經由軸封裝置帶動真空腔體轉動，以攪拌反應空間內的微粒；至少一抽氣管線，位於軸封裝置內，流體連接真空腔體的反應空間，並用以抽出反應空間內的一氣體；至少一進氣管線，位於軸封裝置內，流體連接真空腔體的反應空間，並用以將一前驅物或一非反應氣體輸送至反應空間，其中非反應氣體用以吹動反應空間內的微粒；及一加熱器，位於軸封裝置內，並用以加熱軸封裝置內的抽氣管線及進氣管線。In order to achieve the above objective, the present invention proposes an atomic layer deposition device for particles, which includes: a vacuum chamber, including a reaction space, and used for accommodating a plurality of particles, wherein the reaction space is a polygonal columnar body; and a shaft sealing device ; A driving unit, connected to the vacuum chamber through the shaft sealing device, and driven by the shaft sealing device to rotate the vacuum chamber to agitate the particles in the reaction space; at least one pumping line, located in the shaft sealing device, fluidly connected to the vacuum chamber The reaction space is used to extract a gas in the reaction space; at least one gas inlet line is located in the shaft seal device, fluidly connected to the reaction space of the vacuum chamber, and is used to transport a precursor or a non-reactive gas to the reaction space , Wherein the non-reactive gas is used to blow the particles in the reaction space; and a heater is located in the shaft sealing device and is used to heat the air suction line and the air inlet pipe in the shaft sealing device.

本新型提出一種微粒的原子層沉積裝置，包括：一真空腔體，包括一反應空間，並用以容置複數個微粒，其中反應空間為一圓形波浪狀柱狀體；一軸封裝置；一驅動單元，透過軸封裝置連接真空腔體，並經由軸封裝置帶動真空腔體轉動；至少一抽氣管線，位於軸封裝置內，流體連接真空腔體的反應空間，並用以抽出反應空間內的一氣體；及至少一進氣管線，位於軸封裝置內，流體連接真空腔體的反應空間，並用以將一前驅物或一非反應氣體輸送至反應空間，其中非反應氣體用以吹動反應空間內的微粒；及一加熱器，位於軸封裝置內，並用以加熱軸封裝置內的抽氣管線及進氣管線。The present invention proposes an atomic layer deposition device for particles, which includes: a vacuum chamber, including a reaction space, and used for accommodating a plurality of particles, wherein the reaction space is a circular wavy cylindrical body; a shaft sealing device; and a drive The unit is connected to the vacuum chamber through the shaft sealing device, and the vacuum chamber is driven to rotate through the shaft sealing device; at least one pumping pipeline is located in the shaft sealing device, and is fluidly connected to the reaction space of the vacuum chamber and used to extract the reaction space in the reaction space. A gas; and at least one gas inlet line located in the shaft seal device, fluidly connected to the reaction space of the vacuum chamber, and used to transport a precursor or a non-reactive gas to the reaction space, wherein the non-reactive gas is used to blow the reaction Particles in the space; and a heater located in the shaft sealing device and used for heating the air extraction line and the air intake line in the shaft sealing device.

所述的微粒的原子層沉積裝置，其中真空腔體包括一蓋板及一腔體，蓋板的內表面設置一多邊形的凹槽，而腔體則具有一多邊形空間，蓋板的多邊形的凹槽及腔體的多邊形空間形成多邊形柱狀體。In the atomic layer deposition device for particles, the vacuum chamber includes a cover plate and a cavity, the inner surface of the cover plate is provided with a polygonal groove, and the cavity has a polygonal space, and the polygonal recess of the cover plate The polygonal space of the groove and the cavity forms a polygonal columnar body.

所述的微粒的原子層沉積裝置，其中進氣管線包括至少一非反應氣體輸送管線，流體連接真空腔體的反應空間，並用以將非反應氣體輸送至真空腔體的反應空間內，以吹動反應空間內的微粒。In the atomic layer deposition device for particles, the gas inlet pipeline includes at least one non-reactive gas delivery pipeline, fluidly connected to the reaction space of the vacuum chamber, and used to deliver the non-reactive gas into the reaction space of the vacuum chamber for blowing Particles in the dynamic reaction space.

所述的微粒的原子層沉積裝置，其中軸封裝置包括一外管體及一內管體，外管體具有一容置空間，用以容置內管體，而內管體則具有一連接空間，用以容置抽氣管線、進氣管線及非反應氣體輸送管線。In the atomic layer deposition device for particles, the shaft sealing device includes an outer tube body and an inner tube body, the outer tube body has an accommodating space for accommodating the inner tube body, and the inner tube body has a connection The space is used for accommodating the gas extraction pipeline, the gas inlet pipeline and the non-reactive gas delivery pipeline.

所述的微粒的原子層沉積裝置，其中部分內管體由外管體的容置空間延伸至真空腔體的反應空間，並形成一凸出管部。In the atomic layer deposition device for particles, part of the inner tube extends from the accommodating space of the outer tube to the reaction space of the vacuum chamber and forms a protruding tube.

所述的微粒的原子層沉積裝置，其中真空腔體包括一蓋板及一腔體，蓋板的內表面設置一圓形波浪狀的凹槽，而腔體則具有一圓形波浪狀空間，蓋板的圓形波浪狀的凹槽及腔體的圓形波浪狀空間形成圓形波浪狀柱狀體。In the atomic layer deposition device for particles, the vacuum chamber includes a cover plate and a cavity. The inner surface of the cover plate is provided with a circular wave-shaped groove, and the cavity has a circular wave-shaped space. The circular wave-shaped groove of the cover plate and the circular wave-shaped space of the cavity form a circular wave-shaped columnar body.

請參閱圖1、圖2、圖3及圖4，分別為本新型微粒的原子層沉積裝置一實施例的立體示意圖、剖面示意圖、部分構造的剖面示意圖及微粒的原子層沉積裝置的真空腔體一實施例的立體示意圖。如圖所示，微粒的原子層沉積裝置10主要包括一真空腔體11、一軸封裝置13及一驅動單元15，其中驅動單元15透過軸封裝置13連接真空腔體11，並帶動真空腔體11轉動。Please refer to Fig. 1, Fig. 2, Fig. 3 and Fig. 4, which are the three-dimensional schematic diagram, the cross-sectional schematic diagram, the cross-sectional schematic diagram of the partial structure and the vacuum chamber of the particle atomic layer deposition apparatus of an embodiment of the novel particle atomic layer deposition apparatus, respectively A three-dimensional schematic diagram of an embodiment. As shown in the figure, the particle atomic layer deposition apparatus 10 mainly includes a vacuum chamber 11, a shaft sealing device 13 and a driving unit 15. The driving unit 15 is connected to the vacuum chamber 11 through the shaft sealing device 13 and drives the vacuum chamber. 11 rotation.

真空腔體11具有一反應空間12，用以容置複數個微粒121，其中粉末121可以是量子點(Quantum Dot)，例如ZnS、CdS、CdSe等II-VI半導體材料，而形成在量子點上的薄膜可以是三氧化二鋁(Al2O3)。在本新型實施例中，如圖4所示，真空腔體11包括一蓋板111及一腔體113，其中真空腔體11內的反應空間12的外觀為一圓形波浪狀柱狀體。The vacuum chamber 11 has a reaction space 12 for accommodating a plurality of particles 121. The powder 121 can be a quantum dot (Quantum Dot), such as II-VI semiconductor materials such as ZnS, CdS, CdSe, etc., which are formed on the quantum dots. The film can be aluminum oxide (Al2O3). In the embodiment of the present invention, as shown in FIG. 4, the vacuum cavity 11 includes a cover 111 and a cavity 113, wherein the reaction space 12 in the vacuum cavity 11 has an appearance of a circular wavy column.

至少一抽氣管線171、至少一進氣管線173及/或至少一非反應氣體輸送管線175流體連接真空腔體11的反應空間12，例如抽氣管線171、進氣管線173、非反應氣體輸送管線175、一加熱器177及/或一溫度感測單元179可設置在軸封裝置13內，如圖3所示。抽氣管線171流體連接真空腔體11的反應空間12，並用以抽出反應空間12內的氣體，使得反應空間12為真空狀態，以進行後續的原子層沉積製程。具體而言抽氣管線171可連接一幫浦，並透過幫浦抽出反應空間12內的氣體。At least one air extraction line 171, at least one air inlet line 173, and/or at least one non-reactive gas delivery line 175 is fluidly connected to the reaction space 12 of the vacuum chamber 11, such as air extraction line 171, air inlet line 173, and non-reactive gas delivery The pipeline 175, a heater 177 and/or a temperature sensing unit 179 may be arranged in the shaft sealing device 13, as shown in FIG. 3. The gas extraction line 171 is fluidly connected to the reaction space 12 of the vacuum chamber 11 and is used to extract gas in the reaction space 12 so that the reaction space 12 is in a vacuum state for subsequent atomic layer deposition processes. Specifically, the pumping line 171 can be connected to a pump, and the gas in the reaction space 12 can be pumped out through the pump.

進氣管線173流體連接真空腔體11的反應空間12，並用以將一前驅物或一非反應氣體輸送至反應空間12。例如進氣管線173可透過閥件組連接一前驅物儲存槽及一非反應氣體儲存槽，並透過閥件組將前驅物氣體輸送至反應空間12內，使得前驅物氣體沉積在微粒121表面。在實際應用時，進氣管線173可能會將一載送氣體(carrier gas)及前驅物氣體一起輸送到反應空間12內。而後透過閥件組將非反應氣體輸送至反應空間12內，並透過抽氣管線171抽氣，以去除反應空間12內未反應的前驅物氣體。在本新型一實施例中，進氣管線173可連接複數個分枝管線，並分別透過各個分枝管線將不同的前驅物氣體依序輸送至反應空間12內。The gas inlet line 173 is fluidly connected to the reaction space 12 of the vacuum chamber 11 and is used to transport a precursor or a non-reactive gas to the reaction space 12. For example, the gas inlet line 173 may be connected to a precursor storage tank and a non-reactive gas storage tank through a valve assembly, and the precursor gas can be transported into the reaction space 12 through the valve assembly, so that the precursor gas is deposited on the surface of the particles 121. In practical applications, the gas inlet line 173 may transport a carrier gas and precursor gas into the reaction space 12 together. Then, the non-reactive gas is transported into the reaction space 12 through the valve assembly, and is pumped through the gas extraction line 171 to remove the unreacted precursor gas in the reaction space 12. In an embodiment of the present invention, the gas inlet pipeline 173 can be connected to a plurality of branch pipelines, and different precursor gases can be sequentially delivered into the reaction space 12 through each branch pipeline.

此外可增大進氣管線173輸送至反應空間12的非反應氣體的流量，並透過非反應氣體吹動反應空間12內的微粒121，使得微粒121受到非反應氣體的帶動，而擴散到反應空間12的各個區域。In addition, the flow rate of the non-reactive gas delivered by the gas inlet line 173 to the reaction space 12 can be increased, and the particles 121 in the reaction space 12 can be blown through the non-reactive gas, so that the particles 121 are driven by the non-reactive gas and diffuse into the reaction space. 12 various areas.

在本新型一實施例中，進氣管線173可包括至少一非反應氣體輸送管線175流體連接真空腔體11的反應空間12，並用以將非反應氣體輸送至反應空間12，例如非反應氣體輸送管線175可透過閥件組連接一氮氣儲存槽，並透過閥件組將氮氣輸送至反應空間12。非反應氣體用以吹動反應空間12內的微粒121，配合驅動單元15驅動真空腔體11轉動，將可有效且均勻的翻攪反應空間12內的微粒121，並在各個微粒121的表面沉積厚度均勻的薄膜。In an embodiment of the present invention, the gas inlet line 173 may include at least one non-reactive gas delivery line 175 fluidly connected to the reaction space 12 of the vacuum chamber 11, and is used to deliver the non-reactive gas to the reaction space 12, for example, non-reactive gas delivery The pipeline 175 can be connected to a nitrogen storage tank through the valve assembly, and transport nitrogen to the reaction space 12 through the valve assembly. The non-reactive gas is used to blow the particles 121 in the reaction space 12 and cooperate with the driving unit 15 to drive the vacuum chamber 11 to rotate, which can effectively and uniformly stir the particles 121 in the reaction space 12 and deposit them on the surface of each particle 121 Thin film of uniform thickness.

微粒的原子層沉積裝置10的進氣管線173及非反應氣體輸送管線175都是用以將非反應氣體輸送至反應空間12，其中進氣管線173輸送的非反應氣體的流量較小，並用以去除反應空間12內的前驅物氣體，而非反應氣體輸送管線175輸送的非反應氣體的流量較大，並用以吹動反應空間12內的微粒121。此外進氣管線173及非反應氣體輸送管線175所傳輸的非反應氣體可以是不同的氣體。The gas inlet line 173 and the non-reactive gas delivery line 175 of the particle atomic layer deposition apparatus 10 are both used to deliver the non-reactive gas to the reaction space 12, and the flow rate of the non-reactive gas delivered by the gas inlet line 173 is small and is used for The precursor gas in the reaction space 12 is removed, and the non-reactive gas transported by the non-reactive gas delivery line 175 has a relatively large flow rate and is used to blow the particles 121 in the reaction space 12. In addition, the non-reactive gas transmitted by the gas inlet line 173 and the non-reactive gas delivery line 175 may be different gases.

進氣管線173及非反應氣體輸送管線175將非反應氣體輸送至反應空間12的時間點不同，因此在實際應用時可不設置非反應氣體輸送管線175，並調整進氣管線173在不同時間點輸送的非反應氣體的流量。具體而言，在去除反應空間12內的前驅物氣體時，可降低進氣管線173輸送至反應空間12的非反應氣體的流量，而要吹動反應空間12內的微粒121時，則增加進氣管線173輸送至反應空間12的非反應氣體的流量。The intake line 173 and the non-reactive gas delivery line 175 transport the non-reactive gas to the reaction space 12 at different time points. Therefore, in actual application, the non-reactive gas delivery line 175 may not be provided, and the intake line 173 should be adjusted to deliver at different time points. The flow rate of non-reactive gas. Specifically, when removing the precursor gas in the reaction space 12, the flow rate of the non-reactive gas delivered by the gas inlet line 173 to the reaction space 12 can be reduced, and when the particles 121 in the reaction space 12 are to be blown, the flow rate of the non-reactive gas can be increased. The gas line 173 conveys the flow rate of the non-reactive gas to the reaction space 12.

在本新型一實施例中，軸封裝置13包括一外管體131及一內管體133，其中外管體131具有一容置空間132，而內管體133則具有一連接空間134，例如外管體131及內管體133可為空心柱狀體。外管體131的容置空間132用以容置內管體133，其中外管體131及內管體133同軸設置。In an embodiment of the present invention, the shaft sealing device 13 includes an outer tube body 131 and an inner tube body 133, wherein the outer tube body 131 has a accommodating space 132, and the inner tube body 133 has a connecting space 134, for example The outer tube body 131 and the inner tube body 133 may be hollow cylindrical bodies. The accommodating space 132 of the outer tube body 131 is used for accommodating the inner tube body 133, wherein the outer tube body 131 and the inner tube body 133 are coaxially arranged.

本新型所述的軸封裝置13可以是一般常見的軸封或磁流體軸封，主要用以隔離真空腔體11的反應空間12與外部的空間，以維持反應空間12的真空。The shaft seal device 13 of the present invention can be a common shaft seal or a magnetic fluid shaft seal, and is mainly used to isolate the reaction space 12 of the vacuum chamber 11 from the external space, so as to maintain the vacuum of the reaction space 12.

在本新型一實施例中，內管體133連接反應空間12的一端可設置一過濾單元139，其中抽氣管線171經由過濾單元139流體連接反應空間12，並經由過濾單元139抽出反應空間12內的氣體。過濾單元139主要用以過濾反應空間12內的微粒121，以避免微粒121在抽氣的過程中進入抽氣管線171內，而造成微粒121的損耗。In an embodiment of the present invention, one end of the inner tube 133 connected to the reaction space 12 may be provided with a filter unit 139, wherein the suction line 171 is fluidly connected to the reaction space 12 via the filter unit 139, and is drawn out of the reaction space 12 via the filter unit 139 gas. The filtering unit 139 is mainly used to filter the particles 121 in the reaction space 12 to prevent the particles 121 from entering the air extraction line 171 during the air extraction process, which may cause the loss of the particles 121.

驅動單元15透過外管體131動力連接真空腔體11，並透過外管體131帶動真空腔體11轉動。此外驅動單元15並未連接內管體133，因此驅動單元15帶動外管體131及真空腔體11轉動時，內管體133不會隨著轉動，有利於維持內管體133內的抽氣管線171、進氣管線173及/或非反應氣體輸送管線175抽氣或供氣的穩定。The driving unit 15 is dynamically connected to the vacuum chamber 11 through the outer tube body 131, and drives the vacuum chamber 11 to rotate through the outer tube body 131. In addition, the driving unit 15 is not connected to the inner tube body 133, so when the driving unit 15 drives the outer tube body 131 and the vacuum chamber 11 to rotate, the inner tube body 133 will not rotate with it, which is beneficial to maintain the suction in the inner tube body 133. The pipeline 171, the inlet pipeline 173, and/or the non-reactive gas delivery pipeline 175 are stable in pumping or supplying gas.

驅動單元15可帶動外管體131及真空腔體11以同一方向持續轉動，例如順時針或逆時針方向持續轉動。在不同實施例中驅動單元15可帶動外管體131及真空腔體11以順時針的方向旋轉一特定角度後，再以逆時針的方向旋轉特定角度，例如特定角度可為360度。真空腔體11轉動時，會攪拌反應空間12內的微粒121，以利於微粒121與前驅物氣體接觸。The driving unit 15 can drive the outer tube body 131 and the vacuum chamber 11 to continuously rotate in the same direction, for example, in a clockwise or counterclockwise direction. In different embodiments, the driving unit 15 can drive the outer tube body 131 and the vacuum chamber 11 to rotate a specific angle in a clockwise direction, and then rotate a specific angle in a counterclockwise direction, for example, the specific angle may be 360 degrees. When the vacuum chamber 11 rotates, it will agitate the particles 121 in the reaction space 12 to facilitate contact between the particles 121 and the precursor gas.

在本新型一實施例中，驅動單元15可為馬達，透過至少一齒輪14連接外管體131，並經由齒輪14帶動外管體131及真空腔體11相對於內管體133轉動。抽氣管線171、進氣管線173、非反應氣體輸送管線175、加熱器177及/或溫度感測單元179可設置在內管體133的連接空間134，如圖2及圖3所示。In an embodiment of the present invention, the driving unit 15 may be a motor, which is connected to the outer tube body 131 through at least one gear 14 and drives the outer tube body 131 and the vacuum chamber 11 to rotate relative to the inner tube body 133 via the gear 14. The air extraction line 171, the air intake line 173, the non-reactive gas delivery line 175, the heater 177, and/or the temperature sensing unit 179 can be arranged in the connection space 134 of the inner tube body 133, as shown in FIGS. 2 and 3.

位於軸封裝置13的加熱器177用以加熱連接空間134及內管體133，並透過加熱器177加熱內管體133內的抽氣管線171、進氣管線173及/或非反應氣體輸送管線175，以提高抽氣管線171、進氣管線173及/或非反應氣體輸送管線175內的氣體的溫度。例如可提高進氣管線173輸送至反應空間12的非反應氣體及/或前驅物氣體的溫度，並可提高非反應氣體輸送管線175輸送至反應空間12的非反應氣體的溫度。使得非反應氣體及/或前驅物氣體進入反應空間12時，不會造成反應空間12的溫度大幅下降或改變。此外可透過溫度感測單元179量測加熱器177或連接空間134的溫度，以得知加熱器177的工作狀態。當然在真空腔體11的內部、外部或周圍通常會設置另一個加熱裝置，其中加熱裝置鄰近或接觸真空腔體11，並用以加熱真空腔體11及反應空間12。The heater 177 located in the shaft sealing device 13 is used to heat the connecting space 134 and the inner tube body 133, and heat the air extraction line 171, the air inlet line 173 and/or the non-reactive gas delivery line in the inner tube body 133 through the heater 177 175 to increase the temperature of the gas in the gas extraction pipeline 171, the gas inlet pipeline 173, and/or the non-reactive gas delivery pipeline 175. For example, the temperature of the non-reactive gas and/or the precursor gas delivered by the gas inlet line 173 to the reaction space 12 can be increased, and the temperature of the non-reactive gas delivered by the non-reactive gas delivery line 175 to the reaction space 12 can be increased. When the non-reactive gas and/or precursor gas enters the reaction space 12, the temperature of the reaction space 12 will not drop or change significantly. In addition, the temperature of the heater 177 or the connecting space 134 can be measured through the temperature sensing unit 179 to know the working state of the heater 177. Of course, another heating device is usually arranged inside, outside or around the vacuum cavity 11, wherein the heating device is adjacent to or in contact with the vacuum cavity 11 and is used to heat the vacuum cavity 11 and the reaction space 12.

本新型的反應空間12是圓形波浪狀柱狀體，由進氣管線173或非反應氣體輸送管線175輸送至反應空間12的非反應氣體，會經由圓形波浪狀柱狀體的反應空間12傳送到各個區域，並揚起反應空間12內的微粒121，使得微粒121均勻的擴散到反應空間12的各個區域。反應空間12內的微粒121可以被均勻加熱，並於微粒121的表面形成厚度均勻的薄膜。The reaction space 12 of the present invention is a circular wavy cylindrical body. The non-reactive gas transported to the reaction space 12 by the gas inlet line 173 or the non-reactive gas delivery pipeline 175 will pass through the reaction space 12 of the circular wavy cylindrical body. It is transported to various areas and lifts the particles 121 in the reaction space 12 so that the particles 121 uniformly diffuse to the various areas of the reaction space 12. The particles 121 in the reaction space 12 can be uniformly heated, and a thin film of uniform thickness is formed on the surface of the particles 121.

具體而言，可於真空腔體11的內側表面112上形成複數個半圓柱狀構造或弧形柱狀構造，如圖4所示，其中半圓柱狀構造或弧形柱狀構造沿著內側表面112連續設置，使得反應空間12的截面為圓形波浪狀。Specifically, a plurality of semi-cylindrical structures or arc-shaped columnar structures can be formed on the inner surface 112 of the vacuum chamber 11, as shown in FIG. 4, wherein the semi-cylindrical structure or the arc-shaped columnar structure is along the inner surface 112 is continuously arranged so that the cross section of the reaction space 12 is circular and wavy.

真空腔體11的內底表面114及內頂表面可設置對應的凹槽115/117，例如真空腔體11的蓋板111的內表面116可設置圓形波浪狀的凹槽117，而腔體113的內底表面114則設置對應的圓形波浪狀的凹槽115，其中圓形波浪狀的凹槽115/117對應真空腔體11的內側表面112上的圓形波浪狀空間，使得蓋板111的圓形波浪狀的凹槽117及腔體113的圓形波浪狀空間形成圓形波浪柱狀體。凹槽115/117的邊緣可為弧形，以利於引導進入反應空間12的非反應氣體及被非反應氣體帶動的微粒121。The inner bottom surface 114 and the inner top surface of the vacuum chamber 11 may be provided with corresponding grooves 115/117. For example, the inner surface 116 of the cover plate 111 of the vacuum chamber 11 may be provided with a circular wave-shaped groove 117, and the chamber The inner bottom surface 114 of 113 is provided with a corresponding circular wave-shaped groove 115, wherein the circular wave-shaped groove 115/117 corresponds to the circular wave-shaped space on the inner surface 112 of the vacuum chamber 11, so that the cover plate The circular wave-shaped groove 117 of the 111 and the circular wave-shaped space of the cavity 113 form a circular wave columnar body. The edges of the grooves 115/117 may be arc-shaped to facilitate the introduction of the non-reactive gas into the reaction space 12 and the particles 121 driven by the non-reactive gas.

位於內側表面112的半圓柱狀構造或弧形柱狀構造內的微粒121會隨著真空腔體11轉動，直到半圓柱狀構造或弧形柱狀構造內的微粒121轉動到一特定角度後，才會因為重力的作用而逐漸落下。如此可進一步均勻且充分地翻攪反應空間12內的微粒121，使得各個微粒121均勻受熱，並在微粒121的表面形成厚度均勻的薄膜。The particles 121 in the semi-cylindrical structure or arc-shaped columnar structure located on the inner surface 112 will rotate with the vacuum chamber 11 until the particles 121 in the semi-cylindrical structure or arc-shaped columnar structure rotate to a specific angle, Will gradually fall because of gravity. In this way, the particles 121 in the reaction space 12 can be further uniformly and fully stirred, so that the individual particles 121 are evenly heated, and a thin film with uniform thickness is formed on the surface of the particles 121.

在本新型另一實施例中，如圖5所示，真空腔體11內的反應空間12可為多邊形柱狀體，例如六邊形柱狀體。具體而言，真空腔體11的蓋板111的內表面116可設置多邊形的凹槽117，對應真空腔體11的內側表面112上的多邊形空間，其中蓋板111的多邊形的凹槽117及腔體113的多邊形空間形成多邊形柱狀體。在不同實施例中，蓋板111的內表面116上可不設置凹槽。In another embodiment of the present invention, as shown in FIG. 5, the reaction space 12 in the vacuum chamber 11 may be a polygonal columnar body, such as a hexagonal columnar body. Specifically, the inner surface 116 of the cover plate 111 of the vacuum chamber 11 may be provided with a polygonal groove 117 corresponding to the polygonal space on the inner surface 112 of the vacuum chamber 11, wherein the polygonal groove 117 and the cavity of the cover plate 111 The polygonal space of the body 113 forms a polygonal columnar body. In different embodiments, the inner surface 116 of the cover plate 111 may not be provided with grooves.

腔體113的內底表面114上設置一穿孔119，如圖4及圖5所示，並將部分的軸封裝置13設置在穿孔119內，例如可將軸封裝置13的內管體133的一端貼附在穿孔119上，如圖2所示。在不同實施例中，部分的軸封裝置13可穿過穿孔119並位於反應空間12內，例如軸封裝置13的部分內管體133穿過穿孔119，並延伸反應空間12內，以在反應空間內形成一凸出管部130，如圖6所示。A perforation 119 is provided on the inner bottom surface 114 of the cavity 113, as shown in Figures 4 and 5, and part of the shaft sealing device 13 is set in the perforation 119. For example, the inner tube 133 of the shaft sealing device 13 One end is attached to the perforation 119, as shown in Figure 2. In different embodiments, part of the shaft sealing device 13 may pass through the perforation 119 and be located in the reaction space 12. For example, a part of the inner tube 133 of the shaft seal device 13 passes through the perforation 119 and extends into the reaction space 12 to be in the reaction space. A protruding pipe portion 130 is formed in the space, as shown in FIG. 6.

在本新型一實施例中，微粒的原子層沉積裝置10亦可包括一承載板191及至少一固定架193，其中承載板191可為一板體，用以承載驅動單元15、真空腔體11及軸封裝置13。例如承載板191連接驅動單元15，並透過驅動單元15連接軸封裝置13及真空腔體11。此外軸封裝置13及/或真空腔體11亦可透過至少一支撐架連接承載板191，以提高連接的穩定度。In an embodiment of the present invention, the particle atomic layer deposition apparatus 10 may also include a carrying plate 191 and at least one fixing frame 193, wherein the carrying plate 191 may be a plate for carrying the driving unit 15 and the vacuum chamber 11 And shaft sealing device 13. For example, the carrier board 191 is connected to the driving unit 15, and the shaft sealing device 13 and the vacuum chamber 11 are connected through the driving unit 15. In addition, the shaft sealing device 13 and/or the vacuum chamber 11 can also be connected to the carrying plate 191 through at least one support frame to improve the stability of the connection.

承載板191可透過至少一連接軸195連接固定架193，其中固定架193的數量可為兩個，並分別設置在承載板191的兩側。承載板191可以連接軸195為軸心相對於固定架193轉動，以改變驅動單元15、軸封裝置13及真空腔體11的仰角，以利於在各個微粒121的表面形成厚度均勻的薄膜。The carrying plate 191 can be connected to the fixing frame 193 through at least one connecting shaft 195, wherein the number of the fixing frame 193 can be two, and the fixing frames 193 can be respectively arranged on both sides of the carrying plate 191. The bearing plate 191 can rotate relative to the fixed frame 193 with the shaft 195 as the axis to change the elevation angle of the driving unit 15, the shaft sealing device 13 and the vacuum chamber 11 to facilitate the formation of a thin film of uniform thickness on the surface of each particle 121.

以上所述者，僅為本新型之一較佳實施例而已，並非用來限定本新型實施之範圍，即凡依本新型申請專利範圍所述之形狀、構造、特徵及精神所為之均等變化與修飾，均應包括於本新型之申請專利範圍內。The above is only one of the preferred embodiments of the present invention, and is not intended to limit the scope of implementation of the present invention, that is, all the equivalent changes and changes in the shape, structure, characteristics and spirit described in the scope of the patent application of the present invention Modifications should be included in the scope of the patent application for this new model.

10:微粒的原子層沉積裝置 11:真空腔體 111:蓋板 112:內側表面 113:腔體 114:內底表面 115:凹槽 116:內表面 117:凹槽 119:穿孔 12:反應空間 121:微粒 13:軸封裝置 130:凸出管部 131:外管體 132:容置空間 133:內管體 134:連接空間 14:齒輪 15:驅動單元 171:抽氣管線 173:進氣管線 175:非反應氣體輸送管線 177:加熱器 179:溫度感測單元 191:承載板 193:固定架 195:連接軸 10: Atomic layer deposition device for particles 11: Vacuum chamber 111: cover 112: Inside surface 113: Cavity 114: inner bottom surface 115: Groove 116: inner surface 117: Groove 119: Piercing 12: reaction space 121: Particles 13: Shaft seal device 130: protruding tube 131: Outer tube body 132: accommodating space 133: inner tube body 134: Connecting Space 14: Gear 15: drive unit 171: Extraction line 173: intake line 175: Non-reactive gas pipeline 177: heater 179: temperature sensing unit 191: Carrier Board 193: fixed frame 195: connecting shaft

[圖1]為本新型微粒的原子層沉積裝置一實施例的立體示意體。[Fig. 1] is a three-dimensional schematic diagram of an embodiment of the atomic layer deposition apparatus for the new type of particles.

[圖2]為本新型微粒的原子層沉積裝置一實施例的剖面示意圖。[Fig. 2] is a schematic cross-sectional view of an embodiment of the atomic layer deposition apparatus of the novel particle.

[圖3]為本新型微粒的原子層沉積裝置的部分構造一實施例的剖面示意圖。[Fig. 3] is a schematic cross-sectional view of an embodiment of a partial structure of the new type particle atomic layer deposition apparatus.

[圖4]為本新型微粒的原子層沉積裝置的真空腔體一實施例的立體示意體。[Fig. 4] is a three-dimensional schematic diagram of an embodiment of the vacuum chamber of the new type particle atomic layer deposition apparatus.

[圖5]為本新型微粒的原子層沉積裝置的真空腔體又一實施例的立體示意體。[Fig. 5] is a three-dimensional schematic diagram of another embodiment of the vacuum chamber of the atomic layer deposition apparatus of the novel particle.

[圖6]為本新型微粒的原子層沉積裝置又一實施例的剖面示意圖。[Fig. 6] is a schematic cross-sectional view of another embodiment of the atomic layer deposition apparatus for the novel particles.

10:微粒的原子層沉積裝置 10: Atomic layer deposition device for particles

11:真空腔體 11: Vacuum chamber

111:蓋板 111: cover

112:內側表面 112: Inside surface

113:腔體 113: Cavity

114:內底表面 114: inner bottom surface

116:內表面 116: inner surface

12:反應空間 12: reaction space

121:微粒 121: Particles

13:軸封裝置 13: Shaft seal device

131:外管體 131: Outer tube body

132:容置空間 132: accommodating space

133:內管體 133: inner tube body

134:連接空間 134: Connecting Space

15:驅動單元 15: drive unit

171:抽氣管線 171: Extraction line

175:非反應氣體輸送管線 175: Non-reactive gas pipeline

177:加熱器 177: heater

191:承載板 191: Carrier Board

193:固定架 193: fixed frame

195:連接軸 195: connecting shaft

Claims

一種微粒的原子層沉積裝置，包括：一真空腔體，包括一反應空間，並用以容置複數個微粒，其中該反應空間為一多邊形柱狀體；一軸封裝置；一驅動單元，透過該軸封裝置連接該真空腔體，並經由該軸封裝置帶動該真空腔體轉動；至少一抽氣管線，位於該軸封裝置內，流體連接該真空腔體的該反應空間，並用以抽出該反應空間內的一氣體；至少一進氣管線，位於該軸封裝置內，流體連接該真空腔體的該反應空間，並用以將一前驅物或一非反應氣體輸送至該反應空間，其中該非反應氣體用以吹動該反應空間內的該微粒；及一加熱器，位於該軸封裝置內，並用以加熱該軸封裝置內的該抽氣管線及該進氣管線。 A microparticle atomic layer deposition device, including: A vacuum chamber includes a reaction space and is used for accommodating a plurality of particles, wherein the reaction space is a polygonal columnar body; A shaft sealing device; A driving unit connected to the vacuum chamber through the shaft sealing device, and driving the vacuum chamber to rotate through the shaft sealing device; At least one gas extraction pipeline, located in the shaft seal device, fluidly connected to the reaction space of the vacuum chamber, and used to extract a gas in the reaction space; At least one gas inlet line is located in the shaft seal device, fluidly connected to the reaction space of the vacuum chamber, and used to transport a precursor or a non-reactive gas to the reaction space, wherein the non-reactive gas is used to blow the reaction space The particles in the reaction space; and A heater is located in the shaft sealing device and used for heating the air extraction pipeline and the air intake pipeline in the shaft sealing device.

如請求項1所述的微粒的原子層沉積裝置，其中該真空腔體包括一蓋板及一腔體，該蓋板的該內表面設置一多邊形的凹槽，而該腔體則具有一多邊形空間，該蓋板的該多邊形的凹槽及該腔體的該多邊形空間形成該多邊形柱狀體。The microparticle atomic layer deposition apparatus according to claim 1, wherein the vacuum chamber includes a cover plate and a cavity, the inner surface of the cover plate is provided with a polygonal groove, and the cavity has a polygonal shape The polygonal groove of the cover plate and the polygonal space of the cavity form the polygonal columnar body.

如請求項1所述的微粒的原子層沉積裝置，其中該進氣管線包括至少一非反應氣體輸送管線，流體連接該真空腔體的該反應空間，並用以將該非反應氣體輸送至該真空腔體的該反應空間內，以吹動該反應空間內的該微粒。The microparticle atomic layer deposition apparatus according to claim 1, wherein the gas inlet line includes at least one non-reactive gas delivery line, fluidly connected to the reaction space of the vacuum chamber, and used to deliver the non-reactive gas to the vacuum chamber In the reaction space of the body to blow the particles in the reaction space.

如請求項3所述的微粒的原子層沉積裝置，其中該軸封裝置包括一外管體及一內管體，該外管體具有一容置空間，用以容置該內管體，而該內管體則具有一連接空間，用以容置該抽氣管線、該進氣管線及該非反應氣體輸送管線。The atomic layer deposition device for particles according to claim 3, wherein the shaft sealing device includes an outer tube body and an inner tube body, the outer tube body has an accommodating space for accommodating the inner tube body, and The inner tube body has a connecting space for accommodating the gas extraction pipeline, the gas inlet pipeline, and the non-reactive gas delivery pipeline.

如請求項4所述的微粒的原子層沉積裝置，其中部分該內管體由該外管體的該容置空間延伸至該真空腔體的該反應空間，並形成一凸出管部。The microparticle atomic layer deposition apparatus according to claim 4, wherein part of the inner tube body extends from the accommodating space of the outer tube body to the reaction space of the vacuum chamber and forms a protruding tube part.

一種微粒的原子層沉積裝置，包括：一真空腔體，包括一反應空間，並用以容置複數個微粒，其中該反應空間為一圓形波浪狀柱狀體；一軸封裝置；一驅動單元，透過該軸封裝置連接該真空腔體，並經由該軸封裝置帶動該真空腔體轉動；至少一抽氣管線，位於該軸封裝置內，流體連接該真空腔體的該反應空間，並用以抽出該反應空間內的一氣體；至少一進氣管線，位於該軸封裝置內，流體連接該真空腔體的該反應空間，並用以將一前驅物或一非反應氣體輸送至該反應空間，其中該非反應氣體用以吹動該反應空間內的該微粒；及一加熱器，位於該軸封裝置內，並用以加熱該軸封裝置內的該抽氣管線及該進氣管線。 A microparticle atomic layer deposition device, including: A vacuum chamber includes a reaction space and is used for accommodating a plurality of particles, wherein the reaction space is a circular wavy cylindrical body; A shaft sealing device; A driving unit connected to the vacuum chamber through the shaft sealing device, and driving the vacuum chamber to rotate through the shaft sealing device; At least one gas extraction pipeline, located in the shaft seal device, fluidly connected to the reaction space of the vacuum chamber, and used to extract a gas in the reaction space; At least one gas inlet line is located in the shaft seal device, fluidly connected to the reaction space of the vacuum chamber, and used to transport a precursor or a non-reactive gas to the reaction space, wherein the non-reactive gas is used to blow the reaction space The particles in the reaction space; and A heater is located in the shaft sealing device and used for heating the air extraction pipeline and the air intake pipeline in the shaft sealing device.

如請求項6所述的微粒的原子層沉積裝置，其中該真空腔體包括一蓋板及一腔體，該蓋板的該內表面設置一圓形波浪狀的凹槽，而該腔體則具有一圓形波浪狀空間，該蓋板的該圓形波浪狀的凹槽及該腔體的該圓形波浪狀空間形成該圓形波浪狀柱狀體。The microparticle atomic layer deposition apparatus according to claim 6, wherein the vacuum chamber includes a cover plate and a cavity, the inner surface of the cover plate is provided with a circular wave-shaped groove, and the cavity is A circular wave-shaped space is provided, and the circular wave-shaped groove of the cover plate and the circular wave-shaped space of the cavity form the circular wave-shaped columnar body.

如請求項6所述的微粒的原子層沉積裝置，其中該進氣管線包括至少一非反應氣體輸送管線，流體連接該真空腔體的該反應空間，並用以將該非反應氣體輸送至該真空腔體的該反應空間內，以吹動該反應空間內的該微粒。The atomic layer deposition apparatus for particulates according to claim 6, wherein the gas inlet line includes at least one non-reactive gas delivery line, fluidly connected to the reaction space of the vacuum chamber, and used to deliver the non-reactive gas to the vacuum chamber In the reaction space of the body to blow the particles in the reaction space.

如請求項8所述的微粒的原子層沉積裝置，其中該軸封裝置包括一外管體及一內管體，該外管體具有一容置空間，用以容置該內管體，而該內管體則具有一連接空間，用以容置該抽氣管線、該進氣管線及該非反應氣體輸送管線。The atomic layer deposition device for particles according to claim 8, wherein the shaft sealing device includes an outer tube body and an inner tube body, the outer tube body has an accommodating space for accommodating the inner tube body, and The inner tube body has a connecting space for accommodating the gas extraction pipeline, the gas inlet pipeline, and the non-reactive gas delivery pipeline.

如請求項9所述的微粒的原子層沉積裝置，其中部分該內管體由該外管體的該容置空間延伸至該真空腔體的該反應空間，並形成一凸出管部。The microparticle atomic layer deposition apparatus according to claim 9, wherein part of the inner tube body extends from the accommodating space of the outer tube body to the reaction space of the vacuum chamber, and forms a protruding tube portion.