M407438 五、新型說明： 【新型所屬之技術領域】 本創作涉及—種透日_域應ϋ結構，尤指-種可提升透光 率均-性並踢低雜訊電容_透_控錢器結構。 【先前技術】 按，透明難面板通常是被配置在電㈣顯轉伽㈣)上 使用，讓制者可進行互動式輸人操作，以達改善人與機器之間 溝通介面的親善性並提升輪人齡解之目的；而如所知者，觸 控面板是域應ϋ、控制H及軟體所制組成，其巾感應器依其 =作原理與結構不同略可區分為電阻式、電容式、紅外線式及超 音波式等’而目前主流性的龍性電子產品大都逐漸改採用具有 多點訊號錢魏的電容域應ϋ，以提升難操作魏，並避 免以往單點式感應器易受刮損及破裂而不堪使用的缺失；一般電 ，式感絲的轉都具有二層絕緣設㈣義導電_，例如是 乳化銦錫(ITO)㈣，並在各料電_上設置所㈣電極圖形， 例如疋複數的X械麟跡(Χ_τ·)與γ減絲跡(γ·Τ_)， 通书疋利祕職程以去除導電細上不要的部分以形成所需 的X、Υ軸感應線跡’並使各鑛應線跡之職此保持適當寬度 的間隙’以魏緣設置之目m因為該導電細上這些設 置感應線跡的電極區和侧去除材料的廢勤m(亦即該導電薄膜 的鏤工#位)具有不同的透光率(Transmittance)，所以造成穿透該導 、薄膜的光線折射不均，這結果將會導致人眼觀察時會有明顯的 M407438 圖形產生’尤其當配置在齡幕前使㈣，就會造成螢幕影像變 形核糊失真的困擾；而為避免前述缺失，有些做法是將導電薄 膜上的賴刻區内的材料保留不去除，以降低該導電薄膜各部透 光率的差異性，上料絲有助提於升導電薄朗透光率均一 仁如果廢银刻區内的圖形布局不當，例如：設置面積太大、 、、邑緣叹置不良·.·等，運作時會產生雜電容值 '電磁干擾(EMI)等 見象導致電極區的感應訊號被干擾或產生誤訊號，甚至整個感 應器都無法使用。 【新型内容】 有4α於此，本創作的主要是提供一種可增進瞻視性的透明觸 控感應器結構，其於透明導麵上以精_絕緣線界定出所需的 電極圖形，並在㈣非雜_區域設置減彼此不相連接的小 面積，據此提升該透明觸控感應器的外觀平整度以及透光率的均 -性，並降健雜__訊電容值，贿得優良的電氣特性。 為了達成上述創作目的’本創作所提供之透明觸控感應器結 構其至少包含第-軸感應層、第二減應層以及―輕在第一與 第二軸感應層之_絕緣層；在該等感應層上由第一絕緣線在該 等透明導電薄膜上界電極區㈤⑽牆繼)以及廢姓刻區 (Waste etching 以及由第二絕緣線在該廢侧區界定出仿飾 圖紋(dummy pattern) ’該電極區包含複數感應電極及/或訊號導 路’而該仿侧紋由複數彼此不树接的小面積組成。 特別是’該等小面積可為三角形、矩形、梯形、長條形、多 M407438 邊形、圓形…等各種幾何圖形， 何形面積共同組成。 而該仿飾圖紋可由—或複數種幾 鏤空溝槽或是填 特別是，前述第-絕緣線與第二絕緣線可為 充於鏤空溝槽中的絕緣物質。 特別是，第-絕緣線為線徑寬度斷χ下的鏤空溝槽，而 第二絕緣線為線徑寬度__以下的鏤輯槽；前述鐘空溝曰槽的M407438 V. New description: [New technical field] This creation involves a kind of transparent _ domain ϋ structure, especially - can increase the transmittance of light - and kick the low noise capacitor _ through _ control structure. [Prior Art] Press, the transparent hard panel is usually configured to be used on the electric (four) display gamma (4), allowing the system to perform interactive input operations to improve the friendliness and improvement of the communication interface between the person and the machine. The purpose of the wheel is to solve the problem of human age; as is known, the touch panel is composed of domain response, control H and software. The towel sensor can be distinguished into resistive and capacitive according to its principle and structure. Infrared and ultra-sonic, etc., and most of the mainstream long-term electronic products are gradually adopting the capacitive domain with multi-point signal Qian Wei to enhance the difficult operation and avoid the previous single-point sensor Scratch and rupture are unsatisfactory; the general electric, the type of filament change has two layers of insulation (four) sense conduction _, such as emulsified indium tin (ITO) (four), and set the (four) electrode on each material Graphics, such as the X-axis of the complex number (Χ_τ·) and the γ-reduced trace (γ·Τ_), through the secret process to remove the unnecessary parts of the conductive fine to form the desired X, Υ axis induction Stitch 'and keep the gaps of the appropriate width for each mine 'The purpose of setting the edge of the Wei edge is because the conductive electrode is finely connected to the electrode area of the sensing trace and the waste m of the side removing material (that is, the finished material of the conductive film) has different transmittance (Transmittance). Therefore, the light that penetrates the guide and the film is not refracted unevenly. This result will cause obvious M407438 pattern generation when the human eye observes. Especially when the configuration is in front of the screen (4), the screen image will be deformed. In order to avoid the aforementioned defects, in some cases, the material in the etching region on the conductive film is not removed, so as to reduce the difference in transmittance of the conductive film, and the feeding wire helps to promote the conduction. If the layout of the thin silver is uniform, for example, if the layout area is too large, and the edge is too bad, etc., the capacitance value will be generated during operation, and the electromagnetic interference (EMI) will occur. When the image causes the sensing signal of the electrode area to be disturbed or generates an error signal, even the entire sensor cannot be used. [New content] There is 4α here, the main purpose of this creation is to provide a transparent touch sensor structure that can enhance the visibility, which defines the desired electrode pattern on the transparent guide surface with fine-insulated lines, and (4) The non-miscellaneous_regional setting reduces the small area that is not connected to each other, thereby improving the flatness of the transparent touch sensor and the uniformity of the light transmittance, and reducing the capacitance value of the __ signal capacitor. Electrical characteristics. In order to achieve the above-mentioned creative purpose, the transparent touch sensor structure provided by the present invention includes at least a first-axis sensing layer, a second alleviating layer, and an insulating layer that is lightly on the first and second axis sensing layers; The first sensing line is bounded by the first insulated wire on the upper conductive electrode region (5) (10) wall and the waste etching region (Waste etching and the second insulated wire defines the imitation pattern in the waste side region (dummy) Pattern) 'The electrode area includes a plurality of sensing electrodes and/or signal paths' and the imitation side pattern is composed of a plurality of small areas that are not connected to each other. In particular, the small areas may be triangular, rectangular, trapezoidal, or long. Shape, multi-M407438, shape, circle, etc., various geometric shapes, which are composed of the same area. The imitation pattern can be made up of - or a plurality of hollow grooves or filling, especially the first-insulated wire and the second The insulated wire may be an insulating material filled in the hollow trench. In particular, the first insulated wire is a hollow trench under a wire diameter width break, and the second insulated wire is a fine groove having a wire diameter width __ or less; The aforementioned bell hollow groove
設置深度恰可將該感應層的導電_完全_，使導電薄膜^分 隔出絕緣的二個部份；該鏤空溝槽係藉由_製程以形成在導^ 薄媒上，而該_製程可以採用乾式侧製程，例如雷射侧、 電祕刻.··等，亦或是使用濕絲刻製程，例如印職刻、黃光 钱刻、噴墨姓刻…等技術手段。 特別是，前述第-域簡及第二減簡為具有良好導電 特性的透料f跡細料是選自魏仙卿η—他 ITO)、氧化銦鋅(Indium Zinc 〇xide, IZ〇)、氣化辞辦施⑻麵Setting the depth just allows the conductive layer to be completely _, so that the conductive film ^ is separated from the two portions of the insulation; the hollow trench is formed by the process to form a thin medium, and the process can be Use dry side process, such as laser side, electric secret engraving, etc., or use wet wire engraving process, such as printing job engraving, Huangguang money engraving, inkjet surname... and other technical means. In particular, the first-domain simplification and the second reduction are as follows: the fine-grained fine material having good electrical conductivity is selected from the group consisting of Wei Xianqing η-he ITO, indium zinc oxide (Indium Zinc 〇xide, IZ〇), gasification Resigning (8)
Oxide，AZO)或聚乙稽二氧喧吩(pED〇T)等，但實施的材料範圍 不以前述材料為限。 特別是，該絕緣層為絕緣性的透明硬質薄板、軟質薄膜或絕 緣性的透_㈣層之—或錄制組成，前述透明硬質薄板或 軟質薄膜為—平面式或非平面式的薄層，其材料是選自於玻璃 (Si02)或聚碳酸醋(pc)、聚酯(pET)、聚甲基丙烯酸甲酯(pMMA) 或環稀煙共聚合物(c〇c)·"等，但實施的材料範圍不以前述材料為 限’各類軟性或硬性、透明或半透明基板均適用；前述透明黏膠 薄層使用的材料係選自於紫外線光硬化樹脂⑽adhesive)、光學 #P_y Adhesive ’ 0CA)或異戊二烯橡膠(is〇p_Oxide, AZO) or polydithiophene (pED〇T), etc., but the range of materials to be implemented is not limited to the above materials. In particular, the insulating layer is an insulating transparent hard thin plate, a soft film or an insulating transparent layer or a recording composition, and the transparent hard thin plate or the soft film is a flat layer or a non-planar thin layer. The material is selected from the group consisting of glass (SiO 2 ) or polycarbonate (pc), polyester (pET), polymethyl methacrylate (pMMA) or ring smoky copolymer (c〇c) · " The range of materials to be implemented is not limited to the above materials. 'All kinds of soft or rigid, transparent or translucent substrates are applicable; the materials used for the thin transparent adhesive layer are selected from ultraviolet light curing resin (10) adhesive, optical #P_y Adhesive ' 0CA) or isoprene rubber (is〇p_
Rubber)··.等，但實施的材料範財以前述材料為限。 此將於下文中進-步_本創作的其他功能及技術特徵，熟 習本技術者熟敎巾的制後即可據以實現本創作。 【實施方式】 在以下貝加例中將以電容式觸控面板作為範例說明，但本創 作實施範圍並不侷限於使用電容式觸控面板，例如使用電阻式觸 控面板或電磁式觸控面板亦可適用，合先陳明。 如第-至二圖所示係本創作之一較佳實施例，該電容式觸控 感應器結構係包含-底基板丨與上面板2，在該底基板丨及上面板 2的一主要表面上分別各設一電容感應層3、4，並藉由一膠合層5 將二板疊合黏接成一透明板體；其中，該底基板丨及上面板2可 選用具有高透絲的玻鱗板或是聚賴，碰膠合層5為具有 絕緣特性的透明UV膠。 如第二圖所示，於該底基板1上表面的下方感應層3為—氧 化銦錫材質的透明導電薄膜，且藉由蝕刻手段在透明導電膜上形 成的精細溝槽以劃分出電極區31以及廢蝕刻區32，以及在該廢蝕 刻區形成仿飾圖紋(dummy pattern) ’其中，該電極區係由複數道彼 此平行排列的X軸感應線跡31a陣列組成，且令前述各x轴線跡 之％緣分別電接於設在該底基板1邊緣的訊號導路35 ;同樣 的如第四圖所示，在該上面板2底表面的上方感應層4亦為— M407438 氧化鑛材質的透料電_，减由_手段錢明導電膜上 形成的精細溝槽關分出所形；而詳如第五至六圖所示， 棚案化導電膜上係由第—絕緣線C1界定出的電極區41以及廢 侧區42 ’並於雜糊區内以第二絕緣線c2界定出仿飾圖紋 (dummy pattern) ’其該電極區41係由複紐彼此平行排列的 Y轴感應線跡41a陣列組成，且令前述各Y軸線跡之-端緣分別 •電接於設在該底基板2邊緣的訊號導路45，而在這個實施例中， •前述仿飾，則是由多數個均勻排列的六角形小面積似所組 成’以及剛述第-絕緣線C1是被設為線徑寬度約的鏤空 '溝槽’第二絕緣線C2設為線徑寬麟3G^m的鏤空溝槽，且其 • a置冰雜可將麵明導賴完域斷，使導賴可被分隔出絕 緣的二個部份(如第六圖所示）。 此外’如帛-及二_聯’還在該上面板2的絲面與該上 方感應層4之間且靠近外周緣部位設有金屬濺鍍形成之不透明的 顏色雜6’其恰可肋遮蔽設在上面板2減基板1邊緣的訊號 導路35、45。 上述構件植合時，是在前述上方感應層4與下方感應層3之 間隔著該絕緣性的膠合層5而疊置黏合成一透明板體 ，並使Y軸 感應線跡41a與X軸線跡31&之間呈正交設置，而其上、下方感 應層所觸發的感應訊號可經由該等訊號導路35、45傳送到後續的 訊號處理電路。 而本創作實施例在透明導電膜的廢細區ΜΑ内設置由複 7 M407438 數、’田小面積組成的仿飾圖紋，因此可大幅減少電容感應層3、4上 之鏤空部分的比例，從而以提升觸控面板外觀的平整度以及透光 率的均勻度’改善顯像模糊失真的缺失；又，其利用將該等廢姓 刻區分割成不_的小面鮮元，亦可有效降低雜訊電容值，達 避免雜訊干擾之目的。 本創作並非侷限於以上所述形式，很明顯參考上述說明後， 能有更多技術均等性的改良與變化，例如是：雖然，在前述實施 例中該等廢㈣區⑽仿飾圖紋是由複數六角形的小面積所組 成’但可以理解的’該等小面積並不侷限於使用六角形的，事實 上，也可以採用三角形面積(如壯圖所示）、矩形面積(如第八圖 所不）、長條形、多邊形、圓形等各種幾何圖形，亦可搭配另一 疊合感應層__實鱗同佈局的冊(如第九圖所朴因 此所述據以組成仿飾圖紋的小面積可由前述幾何形面積之一或複 數種共同組成；而如前述變更設置均達成與前揭實施例同一或類 似之效能’故軸本_前揭技術屬實質_ ;如，凡有在相 同之創作精神下所作有關本創作之任何修飾或變更，皆仍應包括 在本創作意圖保護之範嗜。 【圖式簡單說明】 第-圖為本創作實施例之構件組合的平面圖； 第二圖為本_實_之構纽合_面剖示圖； 第二圖為本創作實施例之底基板的平面圖； 第四圖為本創作實施例之上面板辭面圖； 第五圖為第四圖的A部放大的示意圖； 第八圖為第五圖㈣面線部位賴面剖示圖； 第七圖為在廢蝴區蘭仿細紋之另-種佈局示意圖； 第八圖為在廢侧區内的仿飾圖紋之再一種佈局示意圖；以及 第九圖為在廢_區内的仿飾圖紋之又—種佈局示意圖，顯示該 仿飾圖紋之佈局是搭配另一疊合感應層的圖案而設置的。 【主要元件符號說明】 底基板1 上面板2 下方感應層3 電極區31 X軸感應線跡31a 廢蝕刻區32 訊號導路35 上方感應層4 電極區41 Y車由感應線跡41 廢姓刻區42 小面積42a 訊號導路45 膠合層5 顏色邊框6 第二絕緣線C2 第一絕緣線C1Rubber)···etc., but the material of the implementation is limited to the above materials. This will be further exemplified below by the other functions and technical features of the present invention, which can be realized by those skilled in the art. [Embodiment] A capacitive touch panel will be described as an example in the following example, but the scope of the present invention is not limited to the use of a capacitive touch panel, such as a resistive touch panel or an electromagnetic touch panel. It can also be applied. As shown in the first to second embodiments, the capacitive touch sensor structure comprises a base substrate and an upper panel 2, and a main surface of the base substrate and the upper panel 2 A capacitive sensing layer 3, 4 is respectively disposed on each of the two, and the two plates are laminated and bonded into a transparent plate body by a bonding layer 5; wherein the bottom substrate and the upper panel 2 are provided with a high-silver scale The board or the glazing layer 5 is a transparent UV glue with insulating properties. As shown in the second figure, the lower sensing layer 3 on the upper surface of the base substrate 1 is a transparent conductive film made of indium tin oxide, and a fine trench formed on the transparent conductive film by etching means to define an electrode region. 31 and a waste etching region 32, and forming a dummy pattern in the waste etching region, wherein the electrode region is composed of an array of X-axis sensing stitches 31a arranged in parallel with each other in a plurality of tracks, and each of the foregoing x The % edge of the axis trace is electrically connected to the signal guide 35 provided at the edge of the base substrate 1; similarly, as shown in the fourth figure, the sensing layer 4 above the bottom surface of the upper panel 2 is also - M407438 oxidized ore The material of the material is _, which is divided by the fine groove formed on the conductive film of the method, and as shown in the fifth to sixth figures, the insulating film on the shed is made of the first insulated wire C1. The defined electrode region 41 and the waste side region 42' define a dummy pattern in the paste region with a second insulated line c2. The electrode region 41 is a Y-axis arranged in parallel with each other. The array of sensing traces 41a is composed, and the edge of each of the aforementioned Y-axis traces is respectively Connected to the signal guide 45 provided at the edge of the base substrate 2, and in this embodiment, the aforementioned imitation is composed of a plurality of uniformly arranged hexagonal small areas, and the first-insulated line C1 is a hollowed-out trench with a width of about 2, and the second insulated wire C2 is set as a hollow trench with a line diameter of 3G^m, and the a-wind can be used to guide the surface. The guide can be separated from the two parts of the insulation (as shown in Figure 6). In addition, 'such as 帛-and _ 联 联 ′′ is also provided with an opaque color 6' formed by metal sputtering between the surface of the upper panel 2 and the upper sensing layer 4 and near the outer peripheral edge. The signal guides 35, 45 are provided on the upper panel 2 to reduce the edge of the substrate 1. When the above-mentioned members are implanted, the insulating layer 5 is stacked on the upper sensing layer 4 and the lower sensing layer 3 to form a transparent plate, and the Y-axis sensing stitch 41a and the X-axis trace 31 & The signals are orthogonally arranged, and the sensing signals triggered by the upper and lower sensing layers can be transmitted to the subsequent signal processing circuits via the signal guiding paths 35 and 45. In the present embodiment, the imitation pattern composed of the complex 7 M407438 number and the small area of the field is disposed in the waste fine area of the transparent conductive film, so that the proportion of the hollow portion on the capacitive sensing layers 3 and 4 can be greatly reduced. Therefore, the flatness of the appearance of the touch panel and the uniformity of the light transmittance are improved to improve the lack of development blur distortion. Moreover, it is also effective to divide the waste surname into a small noodle. Reduce the noise capacitor value to avoid noise interference. The present invention is not limited to the above-described forms, and it is obvious that with reference to the above description, there can be more improvements and changes in technical equivalence, for example, although, in the foregoing embodiments, the waste (four) area (10) imitation pattern is It consists of a small area of a plurality of hexagons, but it is understandable that these small areas are not limited to the use of hexagonal shapes. In fact, it is also possible to use a triangular area (as shown in the figure) and a rectangular area (such as Various figures in the eight figures, long strips, polygons, circles, etc., can also be combined with another stack of sensing layers __ real scales and layouts (such as the ninth figure) so the composition is based on The small area of the decorative pattern may be composed of one or a plurality of the aforementioned geometrical areas; and if the foregoing modification is set, the same or similar performance as the previous embodiment is achieved, so that the technique is the essence _; Any modification or modification of this creation made under the same creative spirit should still be included in the protection of this creative intention. [Simplified Schematic] The first plan is a plan view of the component combination of the creative embodiment. ; 2 is a cross-sectional view of the _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ The enlarged view of the A part of the fourth figure; the eighth figure is the cross-sectional view of the upper part of the fifth figure (4); the seventh picture is the layout of the other type of blue imitation fine lines in the waste butterfly area; Another layout diagram of the imitation pattern in the waste side area; and the ninth picture is a layout diagram of the imitation pattern in the waste area, showing that the layout of the imitation pattern is matched with another The pattern of the sensing layer is superimposed. [Main component symbol description] Base substrate 1 Upper panel 2 Lower sensing layer 3 Electrode region 31 X-axis sensing stitch 31a Waste etching region 32 Signal guiding channel 35 Upper sensing layer 4 Electrode region 41 Y car by induction stitch 41 waste surname area 42 small area 42a signal guide 45 glue layer 5 color frame 6 second insulation line C2 first insulation line C1