CN203825594U - Transparent induction layer structure of touch panel - Google Patents
Transparent induction layer structure of touch panel Download PDFInfo
- Publication number
- CN203825594U CN203825594U CN201420243570.9U CN201420243570U CN203825594U CN 203825594 U CN203825594 U CN 203825594U CN 201420243570 U CN201420243570 U CN 201420243570U CN 203825594 U CN203825594 U CN 203825594U
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- CN
- China
- Prior art keywords
- transparent
- etching line
- layer structure
- inductive layer
- contact panel
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- Expired - Fee Related
Links
- 230000006698 induction Effects 0.000 title description 3
- 238000005530 etching Methods 0.000 claims abstract description 80
- 239000000758 substrate Substances 0.000 claims abstract description 19
- 230000001939 inductive effect Effects 0.000 claims description 53
- 239000000463 material Substances 0.000 claims description 13
- 239000000615 nonconductor Substances 0.000 claims description 7
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical group [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 claims description 4
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims description 4
- 229920000728 polyester Polymers 0.000 claims description 4
- 239000004926 polymethyl methacrylate Substances 0.000 claims description 4
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 claims description 4
- YMMGRPLNZPTZBS-UHFFFAOYSA-N 2,3-dihydrothieno[2,3-b][1,4]dioxine Chemical compound O1CCOC2=C1C=CS2 YMMGRPLNZPTZBS-UHFFFAOYSA-N 0.000 claims description 3
- 229920000297 Rayon Polymers 0.000 claims description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 3
- 229920001577 copolymer Polymers 0.000 claims description 3
- 239000011521 glass Substances 0.000 claims description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 3
- 239000010931 gold Substances 0.000 claims description 3
- 229920000515 polycarbonate Polymers 0.000 claims description 3
- 239000004417 polycarbonate Substances 0.000 claims description 3
- 230000005855 radiation Effects 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- 239000004411 aluminium Substances 0.000 claims description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 2
- 238000009792 diffusion process Methods 0.000 claims description 2
- 238000003475 lamination Methods 0.000 claims description 2
- RNWHGQJWIACOKP-UHFFFAOYSA-N zinc;oxygen(2-) Chemical compound [O-2].[Zn+2] RNWHGQJWIACOKP-UHFFFAOYSA-N 0.000 claims description 2
- 238000002834 transmittance Methods 0.000 abstract description 9
- 238000010586 diagram Methods 0.000 description 7
- 239000004020 conductor Substances 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000008034 disappearance Effects 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- -1 ITO) Chemical compound 0.000 description 2
- 238000005034 decoration Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- MRNHPUHPBOKKQT-UHFFFAOYSA-N indium;tin;hydrate Chemical compound O.[In].[Sn] MRNHPUHPBOKKQT-UHFFFAOYSA-N 0.000 description 2
- LLYXJBROWQDVMI-UHFFFAOYSA-N 2-chloro-4-nitrotoluene Chemical compound CC1=CC=C([N+]([O-])=O)C=C1Cl LLYXJBROWQDVMI-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- JYMITAMFTJDTAE-UHFFFAOYSA-N aluminum zinc oxygen(2-) Chemical compound [O-2].[Al+3].[Zn+2] JYMITAMFTJDTAE-UHFFFAOYSA-N 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 238000013036 cure process Methods 0.000 description 1
- JAONJTDQXUSBGG-UHFFFAOYSA-N dialuminum;dizinc;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Al+3].[Al+3].[Zn+2].[Zn+2] JAONJTDQXUSBGG-UHFFFAOYSA-N 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Abstract
A transparent sensing structure of a touch panel comprises: a substrate and a transparent sensing layer. The transparent sensing layer is arranged on one side of the substrate and is provided with an etching line, the etching line is used for distinguishing the transparent sensing layer and is provided with a circuit area and a non-circuit area, the circuit area is provided with a plurality of sensing units and a plurality of circuits, the non-circuit area is provided with a plurality of non-sensing units, each non-sensing unit is provided with a central point, a plurality of annular etching lines, a plurality of crossed etching lines and a plurality of horizontal etching lines, and the central points, the annular etching lines, the crossed etching lines and the horizontal etching lines are used for improving the appearance flatness and the uniformity of light transmittance of the transparent sensing layer and reducing noise capacitance values so as to obtain good electrical characteristics.
Description
Technical field
The utility model relates to a kind of contact panel, espespecially a kind of transparent inductive layer structure of contact panel.
Background technology
The contact panel of transparent mode is normally positioned on the display screen of electronic ware and uses, allow user can directly click image manipulation, to reach, improve the better easy object of man-machine interface operation, the contact panel of transparent mode is in the past by inductor, controller and software form jointly, wherein inductor can be divided into resistance-type according to the summaries different from structure of its operation principles, condenser type, infrared-type and ultrasonic formula etc., consumption electronic products with current main flow mostly adopt the capacitance inductor (as panel computer or intelligent mobile phone) with multi-point signal induction usefulness.
The transparent induction structure of existing capacitance inductor has a plurality of wires (circuit) and forms, and the plurality of wire is the parallel to each other or staggered setting of insulate, makes each transparent sensing unit arrangement on wire and within being laid in the perform region of this contact panel; Conventionally wire is to adopt transparent conductive film, though be transparent material, but still lower with respect to base material penetrability is 80～90%, tin indium oxide (Indium Tin Oxide for example, ITO), CNT or organic conductive macromolecule material, utilize etch process produce wire line and mark off each transparent sensing unit.And the gap that respectively keeps each other proper width between this wire, to reach insulation object, and should these logicalnot circuit region (that is hollow out position of this conductive film) between the electrode district of transparent sensing units of wire and wire is set there is different transmittance (Transmittance) for transparent feel, so cause the light refraction inequality that penetrates this conductive film, such result has obvious figure and produces in the time of will causing eye-observation, while especially using, will cause the puzzlement of screen deformation of image, fuzzy distortion before being placed in display screen, and for avoiding aforementioned disappearance, some way is that the former transparent conductive material in the logicalnot circuit region between conductive film upper conductor is retained and do not removed, to reduce the otherness of each transmittance of this conductive film, though above-mentioned means help the transmittance homogeneity that promotes conductive film, if but the pattern layout in logicalnot circuit region is improper between wire, for example: area is set too large, insulation processing is incomplete etc., during running, can produce noise capacitance, the phenomenons such as electromagnetic interference (EMI) (EMI), cause the induced signal of electrode district disturbed or produce error signal, even whole inductor all cannot be used.
With reference to prior art for still retaining nesa coating further again to carry out etching in logicalnot circuit region between wire, but still reserve part nesa coating, as TaiWan, China letters patent book number No. M407438, to utilize logicalnot circuit region between the wire of each nesa coating will be defined as useless etching region (Waste etching area), in this useless etching region, with etching mode, produce so-called imitative decorations figure line (dummy pattern), the imitative decorations figure line in this useless etching region is comprised of a plurality of small sizes that are not connected each other.Because the current transparent sensing unit of conductive film is except strip, more there are the non-linearity structures such as rhombus, the circuit etching nonlinear type therefore forming, the optical interference effects of generation becomes more complicated; In addition, small size as described in the prior art easily produces constructive interference for the fixing geometric figure repeating; In addition, small surfaces arranges and too much can cause the long anti-complexity that causes job sequence in circuit etching path, yield is also exerted an influence.
Utility model content
Fundamental purpose of the present utility model, be to solve tradition disappearance, avoid disappearance to exist, the utility model defines circuit region and the logicalnot circuit region of required transparent inductive layer with meticulous etching line, the specific circuit etching of logicalnot circuit region division wherein, promote accordingly the flat appearance degree of this transparent inductive layer and the homogeneity of transmittance, and reduce logicalnot circuit noise region capacitance, to obtain good electrical specification.
For reaching above-mentioned purpose, the utility model provides a kind of transparent inductive layer structure of contact panel, and it comprises:
One substrate;
One transparent inductive layer, be located in this substrate one side, on it, there is an etching line, this etching line has a circuit region and a logicalnot circuit region to distinguish this transparent inductive layer, on this circuit region, there are a plurality of sensing units and be electrically connected a plurality of circuits of those sensing units, on this logicalnot circuit region, there are a plurality of non-sensing units, this non-sensing unit has a central point, a plurality of annular etching line, intersection etching line and horizontal etching line, this intersects etching line by this central point and those annular etching line, this horizontal etching line is by the central point of each this non-sensing unit, those annular etching line and those intersection etching line.
The transparent inductive layer structure of above-mentioned contact panel, wherein more includes a hardened layer on this substrate, and this hardened layer is located on the surface, one or both sides of this substrate, and between this substrate and this transparent inductive layer.
The transparent inductive layer structure of above-mentioned contact panel, the transparent viscose thin layer of transparent hard sheet, flexible film or insulativity that wherein this substrate is insulativity a kind of.
The transparent inductive layer structure of above-mentioned contact panel, wherein this transparent hard sheet or flexible film are the thin layer of a plane formula or non-planar.
The transparent inductive layer structure of above-mentioned contact panel, wherein this transparent hard sheet or its material of flexible film are polycarbonate, polyester, polymethylmethacrylate or cycloolefin co-polymer.
The transparent inductive layer structure of above-mentioned contact panel, wherein this its material of transparent hard sheet is glass.
The transparent inductive layer structure of above-mentioned contact panel, wherein the plurality of sensing unit and those circuits are longitudinal arrangement or transversely arranged, to form the sensing unit of the X-axis of simple layer.
The transparent inductive layer structure of above-mentioned contact panel, wherein the plurality of sensing unit and those circuits are longitudinal arrangement or transversely arranged, to form the sensing unit of the Y-axis of simple layer.
The transparent inductive layer structure of above-mentioned contact panel, wherein this central point is polygon or concentric circles.
Above-mentioned transparent inductive layer structure, wherein this annular etching line, by this central point outwards equidistantly to spread or radial configuration, or is outwards dredged outer close diffusion or radiation configuration with interior.
The transparent inductive layer structure of above-mentioned contact panel, wherein this annular etching line is circle, polygon or arc curve.
The transparent inductive layer structure of above-mentioned contact panel, is characterized in that, between this non-sensing unit and this non-sensing unit, has more a non-conductor area, and this non-conductor area is provided with a plurality of parallel etching line or zigzag etching line.
The transparent inductive layer structure of above-mentioned contact panel, wherein the live width of this etching line is below 50um.
The transparent inductive layer structure of above-mentioned contact panel, wherein this live width is 30um.
The transparent inductive layer structure of above-mentioned contact panel, wherein this transparent inductive layer is indium tin oxide layer, indium zinc oxide layer, zinc paste aluminium lamination, poly-ethylenedioxy thiophene layer, nano gold layer, nano-silver layer or CNT.
Effect of the present utility model is, can promote the flat appearance degree of this transparent inductive layer and the homogeneity of transmittance, and reduces noise capacitance, to obtain good electrical specification.
Below in conjunction with the drawings and specific embodiments, the utility model is described in detail, but not as to restriction of the present utility model.
Accompanying drawing explanation
The transparent inductive layer structure front schematic view of Fig. 1 contact panel of the present utility model;
Fig. 2 is the local enlarged diagram of Fig. 1;
Fig. 3 is the side schematic view of Fig. 2;
Fig. 4 another embodiment schematic diagram of the present utility model;
Fig. 5 embodiment schematic diagram more of the present utility model;
Fig. 6 another embodiment schematic diagram of the present utility model.
Wherein, Reference numeral
Substrate 1
Hardened layer 11
Transparent inductive layer 2
Etching line 21
Circuit region 22
Sensing unit 221
Circuit 222
Logicalnot circuit region 23
Non-sensing unit 231
Central point 2311
Concentric round dot 2311a
Annular etching line 211,211a
Intersection etching line 212
Horizontal etching line 213
Non-conductor area 24
Parallel etching line 241
Zigzag etching line 242
Embodiment
Hereby, about the technical content and a detailed description of the present utility model, now coordinate accompanying drawing to be described as follows:
Refer to Fig. 1, Fig. 2, Fig. 3, the transparent inductive layer structure front of contact panel of the present utility model, the part amplification of Fig. 1 and the schematic side view of Fig. 2.As shown in the figure: the transparent inductive layer structure of contact panel of the present utility model, comprising: a substrate 1 and a transparent inductive layer 2.
This substrate 1, on it, surface, one or both sides forms a hardened layer 11 through cure process.In this figure, one or more of the transparent viscose thin layer that substrate 1 is insulation course be insulativity transparent hard sheet, flexible film or insulativity forms jointly, aforementioned transparent hard sheet or flexible film are the thin layer of a plane formula or non-planar, and its material is to be selected from glass (SiO
2) or polycarbonate (PC), polyester (PET), polymethylmethacrylate (PMMA) or cycloolefin co-polymer (COC) ... Deng, but the material ranges of implementing is not limited with previous materials, all kinds of soft or rigid, transparent or semitransparent substrates are all applicable.
One transparent inductive layer 2, is to be located on the surface of this hardened layer 11, has an etching line 21 on it, and this etching line 21 has a circuit region 22 and a logicalnot circuit region 23 to distinguish this transparent inductive layer 2.This etching line 21 forms with dry-etching, as laser-induced thermal etching, on this circuit region 22, etching is formed with a plurality of sensing units 221 and is electrically connected a plurality of circuits 222 of those sensing units 221, those sensing units 221 and those circuits 222 are to be longitudinal arrangement or transversely arranged, to form the sensing unit 221 of X-axis of simple layer or the sensing unit 221 of the Y-axis of simple layer.Separately, this etching line 21 is formed with a plurality of non-sensing units 231 on this logicalnot circuit region 23, this non-sensing unit 231 has a polygonal central point 2311 and a plurality of polygonal annular etching line 211, this annular etching line 211 by this central point 2311 outwards equidistantly to spread or radial configuration, by the outside etching of this central point 2311, pass through the intersection etching line 212 of those annular etching line 211 again, and utilize horizontal etching line 213 etchings by those central points 2311 of each this non-sensing unit 231, those annular etching line 211 and those intersection etching line 212.In this figure, the live width of this etching line 21 is below 50um, take live width 30um as best; In this figure, this transparent inductive layer 2 is that inorganic, metal oxide is as tin indium oxide (Indium Tin Oxide, ITO), indium zinc oxide (Indium Zinc Oxide, IZO), zinc oxide aluminum (Aluminum Zinc Oxide, AZO) or organic conductor material if poly-ethylenedioxy thiophene (PEDOT) or nanometer conductive material are as nm of gold, Nano Silver or CNT, or the combination of above material, but the material ranges of implementing is not limited with previous materials.
Design by those the annular etching line 211 on above-mentioned logicalnot circuit region 23, those intersection etching line 212 and horizontal etching line 213, to promote transparent inductive layer 2 flat appearance degree and the transmittance homogeneity of contact panel, and reduce logicalnot circuit region 23 noise capacitances, to obtain good electrical specification.
Refer to Fig. 4, another embodiment schematic diagram of the present utility model.As shown in the figure: in the present embodiment figure, disclosed logicalnot circuit region 23 is to be that the central point 2311 of this non-sensing unit 231 is a concentric round dot 2311a with roughly the same not the existing together of above-mentioned Fig. 1 to Fig. 3, this annular etching line 211a is circular (arc curve), the annular etching line 211a of this circle also outwards falls apart or radiation configuration with close drawing together outside interior dredging with concentric round dot 2311a, those annular etching line 211a of mat, the design of those intersection etching line 212 and horizontal etching line 213, to promote transparent inductive layer 2 flat appearance degree and the transmittance homogeneity of contact panel, and reduce logicalnot circuit region 23 noise capacitances, to obtain good electrical specification.
Refer to Fig. 5, an embodiment schematic diagram more of the present utility model.As shown in the figure: in the present embodiment figure, disclosed logicalnot circuit region 23 is to be that this non-sensing unit 231 is provided with a plurality of parallel etching line 241 with the non-conductor area 24 between this non-sensing unit 231 with roughly the same not the existing together of above-mentioned Fig. 1 to Fig. 3.
Refer to Fig. 6, another embodiment schematic diagram of the present utility model.As shown in the figure: in the present embodiment figure disclosed logicalnot circuit region 23 roughly the same from above-mentioned Fig. 1 to Fig. 3 the different non-conductor area 24 that are between this non-sensing unit 231 and this non-sensing unit 231 be provided with a plurality of zigzag etching line 242.
Certainly; the utility model also can have other various embodiments; in the situation that not deviating from the utility model spirit and essence thereof; those of ordinary skill in the art are when making various corresponding changes and distortion according to the utility model, but these corresponding changes and distortion all should belong to the protection domain of the appended claim of the utility model.
Claims (15)
1. a transparent inductive layer structure for contact panel, is characterized in that, comprising:
One substrate;
One transparent inductive layer, be located in this substrate one side, on it, there is an etching line, this etching line has a circuit region and a logicalnot circuit region to distinguish this transparent inductive layer, on this circuit region, there are a plurality of sensing units and be electrically connected a plurality of circuits of those sensing units, on this logicalnot circuit region, there are a plurality of non-sensing units, this non-sensing unit has a central point, a plurality of annular etching line, intersection etching line and horizontal etching line, this intersects etching line by this central point and those annular etching line, this horizontal etching line is by the central point of each this non-sensing unit, those annular etching line and those intersection etching line.
2. the transparent inductive layer structure of contact panel according to claim 1, is characterized in that, more includes a hardened layer on this substrate, and this hardened layer is located on the surface, one or both sides of this substrate, and between this substrate and this transparent inductive layer.
3. the transparent inductive layer structure of contact panel according to claim 1, is characterized in that, the transparent viscose thin layer of transparent hard sheet, flexible film or insulativity that this substrate is insulativity a kind of.
4. the transparent inductive layer structure of contact panel according to claim 3, is characterized in that, this transparent hard sheet or flexible film are the thin layer of a plane formula or non-planar.
5. transparent inductive layer structure according to claim 4, is characterized in that, this transparent hard sheet or its material of flexible film are polycarbonate, polyester, polymethylmethacrylate or cycloolefin co-polymer.
6. the transparent inductive layer structure of contact panel according to claim 4, is characterized in that, this its material of transparent hard sheet is glass.
7. the transparent inductive layer structure of contact panel according to claim 1, is characterized in that, the plurality of sensing unit and those circuits are longitudinal arrangement or transversely arranged, to form the sensing unit of the X-axis of simple layer.
8. the transparent inductive layer structure of contact panel according to claim 1, is characterized in that, the plurality of sensing unit and those circuits are longitudinal arrangement or transversely arranged, to form the sensing unit of the Y-axis of simple layer.
9. the transparent inductive layer structure of contact panel according to claim 1, is characterized in that, this central point is polygon or concentric circles.
10. the transparent inductive layer structure of contact panel according to claim 1, is characterized in that, this annular etching line outwards equidistantly to spread or radial configuration, or is outwards dredged outer close diffusion or radiation configuration with interior by this central point.
The transparent inductive layer structure of 11. contact panels according to claim 10, is characterized in that, this annular etching line is circle, polygon or arc curve.
The transparent inductive layer structure of 12. contact panels according to claim 1, is characterized in that, between this non-sensing unit and this non-sensing unit, has more a non-conductor area, and this non-conductor area is provided with a plurality of parallel etching line or zigzag etching line.
The transparent inductive layer structure of 13. contact panels according to claim 1, is characterized in that, the live width of this etching line is below 50um.
The transparent inductive layer structure of 14. contact panels according to claim 13, is characterized in that, this live width is 30um.
The transparent inductive layer structure of 15. contact panels according to claim 1, is characterized in that, this transparent inductive layer is indium tin oxide layer, indium zinc oxide layer, zinc paste aluminium lamination, poly-ethylenedioxy thiophene layer, nano gold layer, nano-silver layer or CNT.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW103207815 | 2014-05-05 | ||
| TW103207815U TWM483490U (en) | 2014-05-05 | 2014-05-05 | Touch panel transparent sensing layer structure improvement |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203825594U true CN203825594U (en) | 2014-09-10 |
Family
ID=51481070
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201420243570.9U Expired - Fee Related CN203825594U (en) | 2014-05-05 | 2014-05-13 | Transparent induction layer structure of touch panel |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN203825594U (en) |
| TW (1) | TWM483490U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106843619A (en) * | 2017-01-23 | 2017-06-13 | 昆山国显光电有限公司 | Touch-control display panel and preparation method thereof |
| CN106896968A (en) * | 2015-12-20 | 2017-06-27 | 宝宸（厦门）光学科技有限公司 | Avoid the contact panel that circuit etching appears |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI747570B (en) * | 2020-10-23 | 2021-11-21 | 大陸商祥達光學（廈門）有限公司 | Transparent conductive electrode of touch panel |
| US11320951B1 (en) | 2020-11-04 | 2022-05-03 | Tpk Glass Solutions (Xiamen) Inc. | Transparent conductive electrode of touch panel |
-
2014
- 2014-05-05 TW TW103207815U patent/TWM483490U/en not_active IP Right Cessation
- 2014-05-13 CN CN201420243570.9U patent/CN203825594U/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106896968A (en) * | 2015-12-20 | 2017-06-27 | 宝宸（厦门）光学科技有限公司 | Avoid the contact panel that circuit etching appears |
| CN106896968B (en) * | 2015-12-20 | 2023-08-25 | 宝宸（厦门）光学科技有限公司 | Touch panel capable of avoiding exposure of etched circuit |
| CN106843619A (en) * | 2017-01-23 | 2017-06-13 | 昆山国显光电有限公司 | Touch-control display panel and preparation method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| TWM483490U (en) | 2014-08-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20140910 Termination date: 20200513 |