TWI826520B - Light attenuation device and method of light attenuation - Google Patents
Light attenuation device and method of light attenuation Download PDFInfo
- Publication number
- TWI826520B TWI826520B TW108132672A TW108132672A TWI826520B TW I826520 B TWI826520 B TW I826520B TW 108132672 A TW108132672 A TW 108132672A TW 108132672 A TW108132672 A TW 108132672A TW I826520 B TWI826520 B TW I826520B
- Authority
- TW
- Taiwan
- Prior art keywords
- filter
- light
- housing
- openings
- light attenuation
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 13
- 238000001816 cooling Methods 0.000 claims description 8
- 238000005286 illumination Methods 0.000 claims description 4
- 229910000881 Cu alloy Inorganic materials 0.000 claims description 3
- 230000005855 radiation Effects 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 2
- 239000012530 fluid Substances 0.000 claims 4
- 239000004020 conductor Substances 0.000 claims 2
- 239000002826 coolant Substances 0.000 claims 2
- 230000003287 optical effect Effects 0.000 description 19
- 238000010586 diagram Methods 0.000 description 16
- 235000012431 wafers Nutrition 0.000 description 7
- 238000007689 inspection Methods 0.000 description 4
- 230000008859 change Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 239000012809 cooling fluid Substances 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000006978 adaptation Effects 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000000825 ultraviolet detection Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/33—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using ultraviolet light
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/02—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light
- G02B26/023—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light comprising movable attenuating elements, e.g. neutral density filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/006—Filter holders
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/008—Mountings, adjusting means, or light-tight connections, for optical elements with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/30—Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Optical Filters (AREA)
- Optical Elements Other Than Lenses (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
Abstract
Description
所描述實施例大體上係關於光衰減且更特定言之係關於用於高功率紫外線檢測工具集之光衰減解決方案。 The described embodiments relate generally to light attenuation and more specifically to light attenuation solutions for high power UV detection toolsets.
晶圓缺陷檢測系統在檢測程序期間使用紫外線(UV)光來照明晶圓。所檢測之晶圓之紫外線照明係有益的，此係因為紫外線光提供比習知使用之白光更短之一波長。一較短波長結合一更密集照明提供一較小檢測像素大小及較高偵測敏感度。因此需要對高功率紫外線光之可靠及精確控制以引導高品質晶圓檢測。 Wafer defect inspection systems use ultraviolet (UV) light to illuminate the wafer during the inspection process. Ultraviolet illumination of the wafers being inspected is beneficial because ultraviolet light provides a shorter wavelength than conventionally used white light. A shorter wavelength combined with a denser illumination provides a smaller detection pixel size and higher detection sensitivity. Therefore, reliable and precise control of high-power UV light is needed to guide high-quality wafer inspection.
當前存在用於控制高功率紫外線光之兩種主要技術，即，反射或吸收濾波及單徑向梯度狹縫濾波。 There are currently two main techniques for controlling high power UV light, namely reflective or absorptive filtering and single radial gradient slit filtering.
在第一方法中，紫外線光之光衰減由反射或吸收光學濾波器元件達成。徑向反射或吸收梯度塗層常用於此等光學濾波器。光衰減藉由逐漸阻擋(反射或吸收)入射光而達成。光學濾波器衰減之此方法具有均勻輸出之優點，但通常具有一相當低損壞臨限值。憑藉增加功率及損壞紫外線波長光源，此等光學濾波器類型之相對低功率損壞臨限值變為一主要限制。換言之，此等類型之光學濾波器被高功率紫外線光迅速損壞且因此 並非用於高功率紫外線設計之一可靠解決方案。 In a first approach, light attenuation of UV light is achieved by reflective or absorptive optical filter elements. Radially reflective or absorptive gradient coatings are commonly used in these optical filters. Light attenuation is achieved by gradually blocking (reflecting or absorbing) incident light. This method of optical filter attenuation has the advantage of uniform output, but usually has a fairly low damage threshold. By increasing power and damaging ultraviolet wavelength light sources, the relatively low power damage threshold of these optical filter types becomes a major limitation. In other words, these types of optical filters are rapidly damaged by high-power UV light and therefore Not a reliable solution for high power UV designs.
在第二方法中，光衰減由一單梯度狹縫濾波器達成。從此單梯度狹縫濾波器輸出之功率由狹縫之開口之大小控管。然而，光輪廓跨淨孔徑係不均勻的。單梯度狹縫濾波器亦無法提供具有高解析度之高光衰減。此使一單梯度狹縫濾波器不適於高功率紫外線設計。 In the second method, light attenuation is achieved by a single gradient slit filter. The power output from the single gradient slit filter is controlled by the size of the slit opening. However, the light profile is not uniform across the clear aperture. Single gradient slit filters also cannot provide high light attenuation with high resolution. This makes a single gradient slit filter unsuitable for high power UV designs.
在一第一新穎態樣中，一種光衰減裝置包含：一外殼；一第一濾波器；一第一馬達，其經組態以移動該第一濾波器；及一氣動致動器，其經組態以移動該第一濾波器以與該外殼接觸或不與該外殼接觸。 In a first novel aspect, a light attenuating device includes: a housing; a first filter; a first motor configured to move the first filter; and a pneumatic actuator. Configured to move the first filter into contact with the housing or out of contact with the housing.
在一個實例中，該濾波器包含在寬度上變化之多個狹縫開口，使得通過該多個狹縫開口之光量隨著該第一濾波器移動而變化。 In one example, the filter includes a plurality of slit openings that vary in width such that the amount of light passing through the plurality of slit openings changes as the first filter moves.
在另一實例中，該濾波器包含在直徑上變化之多個圓形開口，使得通過該多個圓形開口之光量隨著該濾波器移動而變化。 In another example, the filter includes a plurality of circular openings that vary in diameter such that the amount of light passing through the plurality of circular openings changes as the filter moves.
在又另一實例中，該濾波器包含多個狹縫開口及圓形開口，使得通過該多個狹縫開口及該多個圓形開口之光量隨著該濾波器移動而變化。 In yet another example, the filter includes a plurality of slit openings and a circular opening, such that the amount of light passing through the slit openings and the circular openings changes as the filter moves.
在一第二新穎態樣中，一種光衰減裝置包含：一外殼；一第一濾波器；一第一馬達，其經組態以移動該第一濾波器；一第二濾波器；一第二馬達，其經組態以移動該第二濾波器；及一氣動致動器，其經組態以移動該第一濾波器以與該外殼接觸或不與該外殼接觸。 In a second novel aspect, a light attenuating device includes: a housing; a first filter; a first motor configured to move the first filter; a second filter; a second a motor configured to move the second filter; and a pneumatic actuator configured to move the first filter into contact with the housing or out of contact with the housing.
在一第一實例中，該第一濾波器及該第二濾波器係同軸的。 In a first example, the first filter and the second filter are coaxial.
在一第二實例中，該第一濾波器及該第二濾波器並非同 軸。 In a second example, the first filter and the second filter are not the same axis.
在一第三實例中，該第一濾波器之圖案正交於該第二濾波器之圖案。 In a third example, the pattern of the first filter is orthogonal to the pattern of the second filter.
在一第四實例中，該第一濾波器及該第二濾波器同步地旋轉。 In a fourth example, the first filter and the second filter rotate synchronously.
在一第五實例中，該第一濾波器及該第二濾波器非同步地旋轉。 In a fifth example, the first filter and the second filter rotate asynchronously.
在一第三新穎態樣中，一種光衰減方法包含：調整一濾波器之位置，使得由一輻射光束照射該濾波器之一部分；及在維持該濾波器之該部分之該照射時，移動該濾波器以與一導熱物件接觸。 In a third novel aspect, a light attenuation method includes: adjusting the position of a filter so that a portion of the filter is illuminated by a radiation beam; and while maintaining the illumination of the portion of the filter, moving the The filter is in contact with a thermally conductive object.
在下文實施方式中描述進一步細節及實施例以及技術。本發明內容不旨在定義本發明。本發明由發明申請專利範圍定義。 Further details and examples and techniques are described in the following description. This summary is not intended to define the invention. The invention is defined by the patent scope of the invention application.
1:光衰減系統 1:Light attenuation system
2:光源 2:Light source
3:外殼 3: Shell
4:濾波器 4: Filter
5:外殼開口 5: Shell opening
6:經照射元件 6: Irradiated components
7:發射光 7: Emit light
8:濾波光 8: Filtered light
11:光衰減系統 11:Light attenuation system
12:光源 12:Light source
13:外殼 13: Shell
14:濾波器 14: Filter
15:外殼開口 15: Shell opening
16:經照射元件 16: Irradiated components
17:發射光 17: Emit light
18:濾波光 18:Filtered light
21:光衰減系統 21:Light attenuation system
22:光源 22:Light source
23:外殼 23: Shell
24:濾波器 24:Filter
25:外殼開口 25: Shell opening
26:經照射元件 26:Irradiated components
27:發射光 27: Emit light
28:濾波光 28:Filtered light
30:濾波器 30:Filter
31:圖表 31: Chart
32:濾波器 32: Filter
33:濾波器 33:Filter
40:光衰減系統 40:Light attenuation system
41:濾光器 41: Optical filter
42:外殼 42: Shell
43:濾波器移動驅動系統 43:Filter mobile drive system
44:夾持板 44: Clamping plate
45:氣動致動器 45:Pneumatic actuator
100:流程圖 100:Flowchart
101:步驟 101: Steps
102:步驟 102: Steps
103:步驟 103: Steps
104:步驟 104:Step
105:步驟 105: Steps
200:流程圖 200:Flowchart
202:步驟 202:Step
203:步驟 203:Step
204:步驟 204:Step
205:步驟 205:Step
206:步驟 206:Step
207:步驟 207:Step
隨附圖式(其中相同數字指示相同組件)繪示本發明之實施例。 The accompanying drawings, in which like numbers refer to like components, illustrate embodiments of the invention.
圖1係包含一單一濾波器之一光衰減系統1之一圖。 Figure 1 is a diagram of a light attenuation system 1 including a single filter.
圖2係包含多個同軸濾波器之一光衰減系統11之一圖。 Figure 2 is a diagram of an optical attenuation system 11 including a plurality of coaxial filters.
圖3係包含多個非同軸濾波器之一光衰減系統21之一圖。 Figure 3 is a diagram of an optical attenuation system 21 including a plurality of non-coaxial filters.
圖4係具有多個徑向變體狹縫之一濾波器之一二維圖。 Figure 4 is a two-dimensional diagram of a filter with multiple radial variant slits.
圖5係具有多個徑向變體狹縫之一濾波器之一三維圖。 Figure 5 is a three-dimensional diagram of a filter with multiple radial variant slits.
圖6係繪示具有多個徑向變體狹縫之一濾波器之光強度輸出與位置之關係之一圖表。 Figure 6 is a graph illustrating light intensity output versus position for a filter having multiple radially variant slits.
圖7係具有多個變體半徑孔之一濾波器之一二維圖。 Figure 7 is a two-dimensional diagram of a filter with multiple holes of varying radii.
圖8係具有多個離散孔大小區之一濾波器之一二維圖。 Figure 8 is a two-dimensional diagram of a filter having multiple discrete hole size regions.
圖9係未夾持位置中之具有濾波器之一光衰減系統40之一圖。 Figure 9 is a diagram of a light attenuation system 40 with a filter in an unclamped position.
圖10係夾持位置中之具有濾波器冷卻之一光衰減系統40之一圖。 Figure 10 is a diagram of a light attenuation system 40 with filter cooling in a clamped position.
圖11係描述包含一單一濾波器之一光衰減系統之操作之一流程圖100。 Figure 11 is a flow chart 100 describing the operation of an optical attenuation system including a single filter.
圖12係描述包含兩個濾波器之一光衰減系統之操作之一流程圖200。 Figure 12 is a flow chart 200 describing the operation of an optical attenuation system including two filters.
本申請案根據35 U.S.C.§119規定主張2018年9月11日申請之標題為「LIGHT ATTENUATION DEVICE FOR HIGH POWER UV INSPECTION TOOL」之美國臨時專利申請案第62/729,827號之優先權，該案之標的物以引用的方式併入本文中。 This application claims priority under 35 U.S.C. §119 of U.S. Provisional Patent Application No. 62/729,827, filed on September 11, 2018, entitled "LIGHT ATTENUATION DEVICE FOR HIGH POWER UV INSPECTION TOOL", the subject matter of which Materials are incorporated herein by reference.
現將詳細參考本發明之背景實例及一些實施例，其等之實例在隨附圖式中加以繪示。在下文描述及發明申請專利範圍中，諸如「頂部」、「下部」、「上」、「下」、「頂部」、「底部」、「左」及「右」之關係術語可用於描述一所描述結構之不同部分之間的相對定向，且應理解，所描述之整個結構可實際上以任何方式定向在三維空間中。 Reference will now be made in detail to background examples and some embodiments of the invention, examples of which are illustrated in the accompanying drawings. In the following description and invention claims, relative terms such as "top", "lower", "upper", "lower", "top", "bottom", "left" and "right" may be used to describe an The relative orientations between different portions of the structure are described, and it is understood that the entire structure described may be oriented in virtually any manner in three-dimensional space.
圖1係包含一單一濾波器之一光衰減系統1之一圖。光衰減系統1包含容置一濾波器4之一外殼3。在操作中，一光源2發射一高功率紫外線光(發射光7)，該高功率紫外線光行進通過外殼中之一開口(外殼開 口5)且照射濾波器4之一部分。未由濾波器4濾波之發射光7之一部分通過濾波器4(濾波光8)且經引導朝向待照射之一元件(經照射元件6)。在一項實施例中，經照射元件6係一晶圓。藉由調整濾波器相對於發射光7之位置而控制由發射光7照射之濾波器之部分。若由濾波器提供之光衰減跨濾波器位置而變化，則可藉由定位濾波器4使得發射光7在其中濾波器提供所要衰減之一位置處照射濾波器而達成所要光衰減。 Figure 1 is a diagram of a light attenuation system 1 including a single filter. The light attenuation system 1 includes a housing 3 housing a filter 4 . In operation, a light source 2 emits a high-power UV light (emitted light 7) that travels through an opening in the housing (housing opening Port 5) and illuminate part of filter 4. A portion of the emitted light 7 that is not filtered by the filter 4 passes through the filter 4 (filtered light 8) and is directed towards an element to be illuminated (irradiated element 6). In one embodiment, irradiated element 6 is a wafer. The portion of the filter illuminated by the emitted light 7 is controlled by adjusting the position of the filter relative to the emitted light 7 . If the light attenuation provided by a filter varies across the filter position, the desired light attenuation can be achieved by positioning the filter 4 so that the emitted light 7 strikes the filter at a position where the filter provides the desired attenuation.
在一個實例中，濾波器具有圓形形狀且藉由一馬達(未展示)繞其中心旋轉。由一電子控制電路(未展示)控制馬達。以此方式，光衰減系統1可控制濾波器之旋轉且藉此控制由來自光源2之發射光束照射之濾波器之部分。 In one example, the filter has a circular shape and is rotated about its center by a motor (not shown). The motor is controlled by an electronic control circuit (not shown). In this way, the light attenuation system 1 can control the rotation of the filter and thereby the portion of the filter illuminated by the emitted beam from the light source 2 .
圖2係包含多個同軸濾波器之一光衰減系統11之一圖。光衰減系統11包含容置多個濾波器14之一外殼13。多個濾波器14同軸地定位。在操作中，一光源12發射一高功率紫外線光(發射光17)，該高功率紫外線光行進通過外殼中之一開口(外殼開口15)且照射多個濾波器14之一部分。未由多個濾波器14濾波之發射光17之一部分通過多個濾波器14(濾波光18)且經引導朝向待照射之一元件(經照射元件16)。在一項實施例中，經照射元件16係一晶圓。藉由調整多個濾波器14之各者相對於發射光17之位置而控制由發射光17照射之多個濾波器14之各者之部分。若由濾波器提供之光衰減跨濾波器位置而變化，則可藉由定位多個濾波器14使得發射光17在其中多個濾波器提供所要衰減之一位置處照射多個濾波器14之各者而達成所要光衰減。使用多個濾波器容許衰減範圍之一增加以及衰減解析度之一增加兩者。 Figure 2 is a diagram of an optical attenuation system 11 including a plurality of coaxial filters. The light attenuation system 11 includes a housing 13 housing a plurality of filters 14 . A plurality of filters 14 are coaxially positioned. In operation, a light source 12 emits a high-power UV light (emitted light 17) that travels through an opening in the housing (housing opening 15) and illuminates a portion of the filters 14. A portion of the emitted light 17 that is not filtered by the filters 14 passes through the filters 14 (filtered light 18) and is directed towards an element to be illuminated (illuminated element 16). In one embodiment, irradiated element 16 is a wafer. The portion of each of the plurality of filters 14 illuminated by the emitted light 17 is controlled by adjusting the position of each of the plurality of filters 14 relative to the emitted light 17 . If the light attenuation provided by a filter varies across filter locations, the plurality of filters 14 can be positioned so that the emitted light 17 strikes each of the plurality of filters 14 at a location where the plurality of filters provides the desired attenuation. to achieve the desired light attenuation. Using multiple filters allows for both an increase in attenuation range and an increase in attenuation resolution.
在一個實例中，濾波器具有圓形形狀且藉由一或多個馬達 (未展示)繞其等之中心旋轉。由一電子控制電路(未展示)控制(若干)馬達。以此方式，光衰減系統1可控制濾波器之旋轉且藉此控制由來自光源2之發射光束照射之濾波器之部分。 In one example, the filter has a circular shape and is driven by one or more motors (not shown) rotates around its center. The motor(s) are controlled by an electronic control circuit (not shown). In this way, the light attenuation system 1 can control the rotation of the filter and thereby the portion of the filter illuminated by the emitted beam from the light source 2 .
在另一實例中，濾波器之圖案經組態為正交的，使得各濾波器可分別在兩個方向上衰減。此提供與一單一濾波器設計相比可加倍之一衰減範圍。 In another example, the pattern of filters is configured to be orthogonal so that each filter attenuates in two directions. This provides an attenuation range that is doubled compared to a single filter design.
在又另一實例中，濾波器可同步或非同步地旋轉。此實現不同衰減效能曲線以及不同熱管理策略。例如，以此方式，第一濾波器可移動至其中第一濾波器吸收來自發射光之大部分熱能之一位置而第二濾波器僅用於衰減之微調且因此不吸收非常多熱能。 In yet another example, the filters may rotate synchronously or asynchronously. This enables different attenuation performance curves and different thermal management strategies. For example, in this way, the first filter can be moved to a position where the first filter absorbs most of the thermal energy from the emitted light while the second filter is only used for fine tuning of the attenuation and therefore does not absorb very much thermal energy.
圖3係包含多個非同軸濾波器之一光衰減系統21之一圖。光衰減系統21包含容置多個濾波器24之一外殼23。多個濾波器24非同軸地定位。在操作中，一光源22發射一高功率紫外線光(發射光27)，該高功率紫外線光行進通過外殼中之一開口(外殼開口25)且照射多個濾波器24之一部分。未由多個濾波器24濾波之發射光27之一部分通過多個濾波器24(濾波光28)且經引導朝向待照射之一元件(經照射元件26)。在一項實施例中，經照射元件26係一晶圓。藉由調整多個濾波器24之各者相對於發射光27之位置而控制由發射光27照射之多個濾波器24之各者之部分。若由濾波器提供之光衰減跨濾波器位置而變化，則可藉由定位多個濾波器24使得發射光27在其中多個濾波器提供所要衰減之一位置處照射多個濾波器24之各者而達成所要光衰減。使用多個濾波器容許衰減範圍之一增加以及衰減解析度之一增加兩者。 Figure 3 is a diagram of an optical attenuation system 21 including a plurality of non-coaxial filters. The light attenuation system 21 includes a housing 23 housing a plurality of filters 24 . The plurality of filters 24 are positioned non-coaxially. In operation, a light source 22 emits a high-power UV light (emitted light 27) that travels through an opening in the housing (housing opening 25) and illuminates a portion of the filters 24. A portion of the emitted light 27 that is not filtered by the filters 24 passes through the filters 24 (filtered light 28) and is directed towards an element to be illuminated (illuminated element 26). In one embodiment, irradiated element 26 is a wafer. The portion of each of the plurality of filters 24 illuminated by the emitted light 27 is controlled by adjusting the position of each of the plurality of filters 24 relative to the emitted light 27 . If the light attenuation provided by a filter varies across filter locations, the plurality of filters 24 can be positioned so that the emitted light 27 illuminates each of the plurality of filters 24 at a location where the plurality of filters provides the desired attenuation. to achieve the desired light attenuation. Using multiple filters allows for both an increase in attenuation range and an increase in attenuation resolution.
在一個實例中，濾波器具有圓形形狀且藉由一或多個馬達 (未展示)繞其等之中心旋轉。由一電子控制電路(未展示)控制(若干)馬達。以此方式，光衰減系統1可控制濾波器之旋轉且藉此控制由來自光源2之發射光束照射之濾波器之部分。 In one example, the filter has a circular shape and is driven by one or more motors (not shown) rotates around its center. The motor(s) are controlled by an electronic control circuit (not shown). In this way, the light attenuation system 1 can control the rotation of the filter and thereby the portion of the filter illuminated by the emitted beam from the light source 2 .
在另一實例中，濾波器之圖案經組態為正交的，使得各濾波器可分別在兩個方向上衰減。此提供與一單一濾波器設計相比可加倍之一衰減範圍。 In another example, the pattern of filters is configured to be orthogonal so that each filter attenuates in two directions. This provides an attenuation range that is doubled compared to a single filter design.
在又另一實例中，濾波器可同步或非同步地旋轉。此實現不同衰減效能曲線以及不同熱管理策略。例如，以此方式，第一濾波器可移動至其中第一濾波器吸收來自發射光之大部分熱能之一位置而第二濾波器僅用於衰減之微調且因此不吸收非常多熱能。 In yet another example, the filters may rotate synchronously or asynchronously. This enables different attenuation performance curves and different thermal management strategies. For example, in this way, the first filter can be moved to a position where the first filter absorbs most of the thermal energy from the emitted light while the second filter is only used for fine tuning of the attenuation and therefore does not absorb very much thermal energy.
圖4係具有多個徑向變體狹縫之一濾波器30之一二維圖。濾波器經設計以繞其中心旋轉。在濾波器之頂部左手側開始，濾波器包含一完全閉合區。此係不具有開口之濾波器之一區，藉此不容許任何光通過濾波器之此區。此區之面積大於發射光之光束面積。順時針移動至濾波器之頂部中心，濾波器包含一完全敞開區。此係具有一連續大開口之濾波器之一區，藉此不阻擋此區中之任何光。此區之面積大於發射光之光束面積。沿濾波器進一步順時針移動，濾波器包含一低衰減區。此低衰減區包含多個徑向變體狹縫。狹縫開口從大開口轉變至完全閉合。在一個實例中，各狹縫開口之寬度在相同角位置處係相同的且由以下函數控管以遞送線性衰減輸出。 Figure 4 is a two-dimensional view of a filter 30 with a plurality of radially variant slits. The filter is designed to rotate about its center. Starting at the top left hand side of the filter, the filter contains a completely closed region. This is a region of the filter that has no openings, thereby not allowing any light to pass through this region of the filter. The area of this area is larger than the beam area of the emitted light. Moving clockwise to the top center of the filter, the filter contains a completely open area. This is a region of the filter that has a continuous large opening, thereby not blocking any light in this region. The area of this area is larger than the beam area of the emitted light. Moving further clockwise along the filter, the filter contains a region of low attenuation. This low-attenuation zone contains multiple radial variant slits. The slit opening changes from wide open to completely closed. In one example, the width of each slit opening is the same at the same angular position and is governed by the following function to deliver a linear attenuation output.
w=bθ+a w=bθ +a
其中w係狹縫開口之寬度，θ係角位置，且「a」及「b」係判定狹縫開口之邊界條件之常數。 Where w is the width of the slit opening, θ is the angular position, and "a" and "b" are constants that determine the boundary conditions of the slit opening.
沿濾波器進一步順時針移動，濾波器包含一熱緩解切口。熱緩解切口防止濾波器結構歸因於在變體狹縫寬度濾波器在導致濾波器熱能增加之高衰減區中操作時發生之熱膨脹而皺縮。 Moving further clockwise along the filter, the filter contains a thermal relief cutout. Thermal relief cuts prevent the filter structure from shrinking due to thermal expansion that occurs when the variable slit width filter operates in a high attenuation region that results in increased filter thermal energy.
沿濾波器進一步順時針移動，濾波器包含一高衰減區。此高衰減區包含多個徑向變體狹縫。狹縫開口從大開口轉變至完全閉合。然而，此多個徑向變體狹縫開口小於包含於低衰減區中之多個徑向變體狹縫開口，藉此提供一較高衰減程度。 Moving further clockwise along the filter, the filter contains a region of high attenuation. This high attenuation zone contains multiple radial variant slits. The slit opening changes from wide open to completely closed. However, the plurality of radial variant slit openings are smaller than the plurality of radial variant slit openings included in the low attenuation region, thereby providing a higher degree of attenuation.
具有多個徑向變體狹縫之濾波器亦包含用於使濾波器歸位之一凹口。使濾波器歸位係其中濾波器定向與濾波器位置控制系統(即，驅動桿、驅動馬達…)對準之程序。 Filters with multiple radial variant slits also include a notch for positioning the filter. Filter homing is the process in which the filter orientation is aligned with the filter position control system (ie, drive rod, drive motor...).
圖5係具有多個徑向變體狹縫之一濾波器30之一三維圖。此3D視圖提供具有徑向變體狹縫之濾波器之一透視圖。 Figure 5 is a three-dimensional view of a filter 30 with multiple radial variant slits. This 3D view provides a perspective view of the filter with radially variant slits.
圖6係繪示具有多個徑向變體狹縫之一濾波器之光強度輸出與位置之關係之一圖表31。如上文論述，在完全敞開區中，全部光通過濾波器且不提供衰減。在低衰減區中，光隨著你沿具有多個徑向變體狹縫之濾波器順時針移動而逐漸衰減。接著，低衰減區與高衰減區之間存在過渡區。在高衰減區中，光隨著你沿具有多個徑向變體狹縫之濾波器順時針移動而愈來愈強烈地衰減。接著，如上文論述，存在完全閉合區，其中光不通過濾波器。 FIG. 6 is a graph 31 illustrating the light intensity output versus position of a filter having multiple radially variant slits. As discussed above, in the fully open region, all light passes through the filter and provides no attenuation. In the low-attenuation region, light gradually attenuates as you move clockwise along a filter with multiple radially varying slits. Then, there is a transition zone between the low attenuation zone and the high attenuation zone. In the high-attenuation region, light is attenuated more and more as you move clockwise along a filter with multiple radially varying slits. Then, as discussed above, there is a fully enclosed region where light does not pass through the filter.
圖7係具有多個變體半徑孔之一濾波器32之一二維圖。濾波器經設計以繞其中心旋轉。如圖7中展示，濾波器包含在順時針方向上增加大小之多個圓形孔。濾波器亦包含用於使濾波器歸位之一凹口。在操作中，濾波器可旋轉，使得通過濾波器之光量增加或減少。濾波器亦包含 一完全閉合區，其中光不通過濾波器。 Figure 7 is a two-dimensional diagram of a filter 32 having a plurality of holes of varying radii. The filter is designed to rotate about its center. As shown in Figure 7, the filter contains multiple circular holes of increasing size in a clockwise direction. The filter also includes a notch for retaining the filter. In operation, the filter can be rotated, causing the amount of light passing through the filter to increase or decrease. Filters also include A completely enclosed region in which light does not pass through the filter.
圖8係具有多個離散孔大小區之一濾波器33之一二維圖。濾波器經設計以繞其中心旋轉。如圖8中展示，濾波器包含在順時針方向上離散地增加大小之多個圓形孔。例如，在最高衰減區中，全部開口具有相同大小。在較高衰減區中，全部開口具有與較高衰減區中之全部其他開口相同之大小。較高衰減區中之開口大於最高衰減區中之開口。在較低衰減區中，全部開口具有與較低衰減區中之全部其他開口相同之大小。較低衰減區中之開口大於較高衰減區中之開口。在最低衰減區中，全部開口具有與最低衰減區中之全部其他開口相同之大小。最低衰減區中之開口大於低衰減區中之開口。以此方式，濾波器提供四種不同衰減位準。 Figure 8 is a two-dimensional diagram of a filter 33 having multiple discrete aperture size regions. The filter is designed to rotate about its center. As shown in Figure 8, the filter contains a plurality of circular holes that discretely increase in size in a clockwise direction. For example, in the highest attenuation zone, all openings have the same size. In the higher attenuation zone, all openings have the same size as all other openings in the higher attenuation zone. The openings in the higher attenuation zone are larger than the openings in the highest attenuation zone. In the lower attenuation zone, all openings have the same size as all other openings in the lower attenuation zone. The openings in the lower attenuation zone are larger than the openings in the higher attenuation zone. In the lowest attenuation zone, all openings have the same size as all other openings in the lowest attenuation zone. The opening in the lowest attenuation zone is larger than the opening in the low attenuation zone. In this way, the filter provides four different attenuation levels.
本文中應注意，亦可使用係圖4至圖5、圖7及圖8中繪示之濾波器之一或多者之一組合之一濾波器。例如，係徑向變體狹縫開口及變體半徑孔之一組合之一濾波器可用於達成所要衰減回應。 It should be noted herein that a filter that is a combination of one or more of the filters illustrated in Figures 4-5, 7 and 8 may also be used. For example, a filter that is a combination of radially variable slit openings and variable radius holes can be used to achieve the desired attenuation response.
圖9係未夾持位置中之具有濾波器冷卻之一光衰減系統40之一圖。圖9係光衰減系統40之一二維剖視圖。光衰減系統40包含一濾光器41、一外殼42、一濾波器移動驅動系統43、一夾持板44及一氣動致動器45。濾波器移動驅動系統43可包含一馬達以導致濾波器移動。濾波器移動驅動系統43亦可包含一旋轉滾珠花鍵以容許濾波器之旋轉及軸向運動。濾波器移動驅動系統43亦可包含驅動及從動齒輪以導致濾波器移動。 Figure 9 is a diagram of a light attenuation system 40 with filter cooling in an unclamped position. FIG. 9 is a two-dimensional cross-sectional view of the light attenuation system 40. The light attenuation system 40 includes an optical filter 41 , a housing 42 , a filter moving driving system 43 , a clamping plate 44 and a pneumatic actuator 45 . The filter movement drive system 43 may include a motor to cause filter movement. The filter movement drive system 43 may also include a rotary ball spline to allow rotational and axial movement of the filter. The filter movement drive system 43 may also include drive and driven gears to cause filter movement.
如上文提及，圖9繪示未夾持狀態中之光衰減系統40。在此未夾持狀態中，夾持板44與濾光器41之間以及濾光器41與外殼42之間存在空氣。歸因於空氣之低導熱性，極大限制可從濾光器41傳遞至外殼42之熱能之量。 As mentioned above, Figure 9 illustrates the light attenuation system 40 in an unclamped state. In this unclamped state, air exists between the clamping plate 44 and the optical filter 41 and between the optical filter 41 and the housing 42 . Due to the low thermal conductivity of air, the amount of thermal energy that can be transferred from filter 41 to housing 42 is greatly limited.
圖10係夾持位置中之具有濾波器冷卻之一光衰減系統40之一圖。如上文提及，圖10繪示夾持狀態中之光衰減系統40。在此夾持狀態中，濾光器41與外殼42之間存在較少空氣或不存在空氣。此極大改良可從濾光器41傳遞至外殼42之熱能之量。可藉由由具有高導熱性之一材料(諸如一銅合金)製成濾光器41而進一步改良可傳遞之熱能之量。類似地，亦可藉由由具有高導熱性之一材料(諸如銅合金)製成外殼而進一步改良可傳遞之熱能之量。 Figure 10 is a diagram of a light attenuation system 40 with filter cooling in a clamped position. As mentioned above, Figure 10 illustrates the light attenuation system 40 in a clamped state. In this clamped state, there is little or no air between the filter 41 and the housing 42 . This greatly improves the amount of thermal energy that can be transferred from filter 41 to housing 42. The amount of heat energy that can be transferred can be further improved by making the filter 41 from a material with high thermal conductivity, such as a copper alloy. Similarly, the amount of heat energy that can be transferred can be further improved by making the housing from a material with high thermal conductivity, such as a copper alloy.
鑑於熱能從濾光器41傳遞至外殼42，外殼42需要一冷卻方法。在一第一實例中，外殼42藉由僅將熱能輻射至外殼42周圍之空氣而進行冷卻。在一第二實例中，外殼42藉由使一冷卻流體通過外殼42內之通道而進行冷卻。在此實例中，冷卻流體可為在其通過外殼42時吸收來自外殼42之熱能之冷水。以此方式，外殼42可吸收來自濾波器41之全部熱能，同時維持一相對低熱能。使用此冷卻方案，濾光器41可經受處於先前方法可經受之功率之一百倍之量值之顯著高功率。 Since heat energy is transferred from the filter 41 to the housing 42, the housing 42 requires a cooling method. In a first example, the housing 42 is cooled by simply radiating thermal energy to the air surrounding the housing 42 . In a second example, housing 42 is cooled by passing a cooling fluid through passages within housing 42 . In this example, the cooling fluid may be cold water that absorbs thermal energy from the housing 42 as it passes through the housing 42 . In this manner, housing 42 can absorb all thermal energy from filter 41 while maintaining a relatively low thermal energy. Using this cooling scheme, the optical filter 41 can withstand significantly higher powers on the order of one hundred times what previous methods could withstand.
圖9及圖10繪示僅具有一單一濾波器之一光衰減系統，然而，可容易地添加多個濾波器以提供一較高解析度光衰減系統。可使用此技術達成約5000至1(或3.74光學密度)之較高衰減範圍。 Figures 9 and 10 illustrate a light attenuation system with only a single filter, however, multiple filters can be easily added to provide a higher resolution light attenuation system. A higher attenuation range of approximately 5000 to 1 (or 3.74 optical density) can be achieved using this technique.
本文中應注意，在一多濾波器系統中，濾波器之一或多者可受益於與外殼接觸以改良冷卻。本文中亦應注意，儘管一氣動致動器被描述為提供移動濾波器以與外殼接觸之方法，然熟習此項技術者將容易地意識到，許多其他裝置可用於導致濾波器移動以與外殼接觸。 It should be noted herein that in a multi-filter system, one or more of the filters may benefit from contact with the housing to improve cooling. It should also be noted herein that although a pneumatic actuator is described as providing a means of moving the filter into contact with the housing, those skilled in the art will readily appreciate that many other means may be used to cause the filter to move into contact with the housing. get in touch with.
圖11係描述包含一單一濾波器之一光衰減系統之操作之一流程圖100。在步驟101中，相對於發射光束調整濾波器位置以設定光衰 減。在步驟102中，移動濾波器以與外殼接觸，同時維持相對於發射光束之濾波器位置。在步驟103中，移動濾波器，使得其不與外殼接觸。在步驟104中，相對於發射光束調整濾波器位置以改變光衰減。在步驟105中，移動濾波器以與外殼接觸，同時維持相對於發射光束之濾波器位置。 Figure 11 is a flow chart 100 describing the operation of an optical attenuation system including a single filter. In step 101, the filter position is adjusted relative to the emitted beam to set the light attenuation reduce. In step 102, the filter is moved into contact with the housing while maintaining the filter position relative to the emitted beam. In step 103, the filter is moved so that it is not in contact with the housing. In step 104, the filter position is adjusted relative to the emitted beam to change the light attenuation. In step 105, the filter is moved into contact with the housing while maintaining the filter position relative to the emitted beam.
圖12係描述包含兩個濾波器之一光衰減系統之操作之一流程圖200。在步驟201中，相對於發射光束調整第一濾波器位置以設定第一濾波器光衰減。在步驟202中，相對於發射光束調整第二濾波器位置以設定第二濾波器光衰減。在步驟203中，移動第一濾波器以與外殼接觸，同時維持相對於發射光束之第一濾波器位置。在步驟204中，移動第一濾波器以不與外殼接觸。在步驟205中，相對於發射光束調整第一濾波器位置以改變第一濾波器光衰減。在步驟206中，相對於發射光束調整第二濾波器位置以改變第二濾波器光衰減。在步驟207中，移動第一濾波器以與外殼接觸，同時維持相對於發射光束之第一濾波器位置。 Figure 12 is a flow chart 200 describing the operation of an optical attenuation system including two filters. In step 201, the first filter position is adjusted relative to the emitted beam to set the first filter light attenuation. In step 202, the second filter position is adjusted relative to the emitted beam to set the second filter light attenuation. In step 203, the first filter is moved into contact with the housing while maintaining the first filter position relative to the emitted beam. In step 204, the first filter is moved out of contact with the housing. In step 205, the first filter position is adjusted relative to the emitted beam to change the first filter light attenuation. In step 206, the second filter position is adjusted relative to the emitted beam to change the second filter light attenuation. In step 207, the first filter is moved into contact with the housing while maintaining the first filter position relative to the emitted beam.
儘管為指導目的在上文描述某些特定實施例，但本專利文件之教示具有一般適用性且不限於上文描述之特定實施例。因此，在不脫離如在發明申請專利範圍中闡述之本發明之範疇的情況下可實踐所描述實施例之各種特徵之各種修改、調適及組合。 Although certain specific embodiments are described above for instructional purposes, the teachings of this patent document have general applicability and are not limited to the specific embodiments described above. Accordingly, various modifications, adaptations and combinations of the various features of the described embodiments may be practiced without departing from the scope of the invention as set forth in the patent application.
21:光衰減系統 21:Light attenuation system
22:光源 22:Light source
23:外殼 23: Shell
24:濾波器 24:Filter
25:外殼開口 25: Shell opening
26:經照射元件 26:Irradiated components
27:發射光 27: Emit light
28:濾波光 28:Filtered light
Claims (23)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201862729827P | 2018-09-11 | 2018-09-11 | |
| US62/729,827 | 2018-09-11 | ||
| US16/147,558 | 2018-09-28 | ||
| US16/147,558 US11733171B2 (en) | 2018-09-11 | 2018-09-28 | Light attenuation device for high power UV inspection tool |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW202024610A TW202024610A (en) | 2020-07-01 |
| TWI826520B true TWI826520B (en) | 2023-12-21 |
Family
ID=69720697
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW108132672A TWI826520B (en) | 2018-09-11 | 2019-09-11 | Light attenuation device and method of light attenuation |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US11733171B2 (en) |
| KR (1) | KR20210043717A (en) |
| CN (1) | CN112703392A (en) |
| IL (1) | IL280874B1 (en) |
| TW (1) | TWI826520B (en) |
| WO (1) | WO2020055771A1 (en) |
Citations (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3671124A (en) * | 1970-09-04 | 1972-06-20 | Douthitt Corp | Microfilm duplicator and method of photocopying microfilms |
| US4176926A (en) * | 1976-09-28 | 1979-12-04 | Quest Automation Limited | Optical projection apparatus |
| US5751429A (en) * | 1995-08-29 | 1998-05-12 | Olympus Optical Co., Ltd. | Color classification system and method capable of automatically exchanging optical band-pass filters according to the object |
| US5774222A (en) * | 1994-10-07 | 1998-06-30 | Hitachi, Ltd. | Manufacturing method of semiconductor substrative and method and apparatus for inspecting defects of patterns on an object to be inspected |
| US6241366B1 (en) * | 1997-06-04 | 2001-06-05 | High End Systems, Inc. | Lighting system with diffusing dimmer |
| US20010017741A1 (en) * | 2000-01-26 | 2001-08-30 | Masaya Tamaru | Optical low pass filter |
| US20020176183A1 (en) * | 2001-03-12 | 2002-11-28 | Optical Coating Laboratory, Inc. | Optical attenuation filter |
| US20030025890A1 (en) * | 2000-02-25 | 2003-02-06 | Nikon Corporation | Exposure apparatus and exposure method capable of controlling illumination distribution |
| US20060043318A1 (en) * | 2004-08-25 | 2006-03-02 | Nec Lcd Technologies, Ltd. | UV-ray-curing device for curing UV-heat-curable resin in a display panel |
| US20140204558A1 (en) * | 2013-01-24 | 2014-07-24 | Texas Instruments Incorporated | Split phosphor/slit color wheel segment for color generation in solid-state illumination system |
| CN108332855A (en) * | 2018-05-16 | 2018-07-27 | 德州尧鼎光电科技有限公司 | A kind of hyperspectral imager device of Wavelength tunable |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2243048A (en) * | 1934-09-24 | 1941-05-20 | Kinatome Patents Corp | Control method and mechanism for photographic printers |
| JPH03225312A (en) | 1990-01-31 | 1991-10-04 | Anritsu Corp | Optical attenuator |
| US5091743A (en) * | 1990-03-30 | 1992-02-25 | Brother Kogyo Kabushiki Kaisha | Image recording apparatus controllable to one of exposure condition and pressure developing condition |
| US5642456A (en) * | 1993-09-14 | 1997-06-24 | Cogent Light Technologies, Inc. | Light intensity attenuator for optical transmission systems |
| DE4424274C1 (en) * | 1994-07-09 | 1996-01-11 | Jenoptik Technologie Gmbh | Device for manipulating a synchrotron beam |
| KR20020036934A (en) | 2000-11-11 | 2002-05-17 | 이충국 | Variable optical attenuator |
| WO2003014677A2 (en) | 2001-08-09 | 2003-02-20 | Henkel Loctite Corporation | Continuous path, variable width light attenuation device for electromagnetic energy spot cure system |
| DE10154461B4 (en) * | 2001-11-08 | 2005-12-15 | Siemens Ag | Apparatus for filtering a radiation beam |
| KR100618377B1 (en) | 2005-05-23 | 2006-08-30 | 나노옵틱(주) | Optical plate for control of optical transmission and diffractive variable attenuator using the same |
| KR100685743B1 (en) * | 2005-06-22 | 2007-02-22 | 삼성전자주식회사 | Optical element holder and projection exposure apparatus having the same |
| US20070170379A1 (en) * | 2006-01-24 | 2007-07-26 | Nikon Corporation | Cooled optical filters and optical systems comprising same |
| US7924517B2 (en) * | 2006-06-21 | 2011-04-12 | Applied Materials Israel, Ltd. | Spatial filter, a system and method for collecting light from an object |
-
2018
- 2018-09-28 US US16/147,558 patent/US11733171B2/en active Active
-
2019
- 2019-09-10 WO PCT/US2019/050270 patent/WO2020055771A1/en active Application Filing
- 2019-09-10 IL IL280874A patent/IL280874B1/en unknown
- 2019-09-10 CN CN201980059355.9A patent/CN112703392A/en active Pending
- 2019-09-10 KR KR1020217010458A patent/KR20210043717A/en active Search and Examination
- 2019-09-11 TW TW108132672A patent/TWI826520B/en active
Patent Citations (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3671124A (en) * | 1970-09-04 | 1972-06-20 | Douthitt Corp | Microfilm duplicator and method of photocopying microfilms |
| US4176926A (en) * | 1976-09-28 | 1979-12-04 | Quest Automation Limited | Optical projection apparatus |
| US5774222A (en) * | 1994-10-07 | 1998-06-30 | Hitachi, Ltd. | Manufacturing method of semiconductor substrative and method and apparatus for inspecting defects of patterns on an object to be inspected |
| US5751429A (en) * | 1995-08-29 | 1998-05-12 | Olympus Optical Co., Ltd. | Color classification system and method capable of automatically exchanging optical band-pass filters according to the object |
| US6241366B1 (en) * | 1997-06-04 | 2001-06-05 | High End Systems, Inc. | Lighting system with diffusing dimmer |
| US20010017741A1 (en) * | 2000-01-26 | 2001-08-30 | Masaya Tamaru | Optical low pass filter |
| US20030025890A1 (en) * | 2000-02-25 | 2003-02-06 | Nikon Corporation | Exposure apparatus and exposure method capable of controlling illumination distribution |
| US20020176183A1 (en) * | 2001-03-12 | 2002-11-28 | Optical Coating Laboratory, Inc. | Optical attenuation filter |
| US20060043318A1 (en) * | 2004-08-25 | 2006-03-02 | Nec Lcd Technologies, Ltd. | UV-ray-curing device for curing UV-heat-curable resin in a display panel |
| US20140204558A1 (en) * | 2013-01-24 | 2014-07-24 | Texas Instruments Incorporated | Split phosphor/slit color wheel segment for color generation in solid-state illumination system |
| CN108332855A (en) * | 2018-05-16 | 2018-07-27 | 德州尧鼎光电科技有限公司 | A kind of hyperspectral imager device of Wavelength tunable |
Also Published As
| Publication number | Publication date |
|---|---|
| US20200080943A1 (en) | 2020-03-12 |
| TW202024610A (en) | 2020-07-01 |
| CN112703392A (en) | 2021-04-23 |
| IL280874B1 (en) | 2024-06-01 |
| IL280874A (en) | 2021-04-29 |
| KR20210043717A (en) | 2021-04-21 |
| US11733171B2 (en) | 2023-08-22 |
| WO2020055771A1 (en) | 2020-03-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI692012B (en) | Rotating substrate laser anneal | |
| US9777375B2 (en) | Converging mirror furnace | |
| TWI567380B (en) | Surface scanning inspection system with independently adjustable scan pitch | |
| KR20090066221A (en) | Light irradiation apparatus | |
| TWI826520B (en) | Light attenuation device and method of light attenuation | |
| JP2008288542A (en) | Ultraviolet irradiation device and ultraviolet irradiation method | |
| KR19980032118A (en) | Processing method of wiring board by laser light and device therefor | |
| CN106152008B (en) | Lamp for vehicle | |
| US5048953A (en) | Optical collimating, laser ray target position indicating and laser ray absorbing device of a laser system | |
| KR20230115245A (en) | Optical heating device and method for heat treatment | |
| CN212485350U (en) | Manufacturing device for forming selective emitter on substrate | |
| TW200807181A (en) | Optical apparatus and associated method | |
| CN115657294B (en) | Spiral adjustable high-power laser liquid cooling stop diaphragm | |
| KR100354044B1 (en) | Optic head of laser system for heating treatment | |
| EP4391030A1 (en) | Method of heating semiconductor structure | |
| JP5831575B2 (en) | Polarized light irradiation device | |
| CN115639634A (en) | Spiral adjustable laser phase change stop diaphragm | |
| KR102441503B1 (en) | Polygonal glass rod module for laser handpiece apparatus | |
| KR102627988B1 (en) | Pheripheral exposure apparatus and method | |
| DE102011100055B4 (en) | Apparatus and method for thermal treatment of substrates and apparatus for supporting substrates | |
| CN117192663A (en) | Diaphragm system and semiconductor inspection apparatus | |
| JP7085083B2 (en) | Light irradiation device | |
| KR101543605B1 (en) | Apparatus for sealing frit using laser | |
| CN117098278A (en) | Light source device, illumination adjusting method thereof, image acquisition equipment and detection system | |
| WO2017017952A1 (en) | Cooling device for laser shutter apparatus |