TWI811714B - Drawing apparatus - Google Patents

Drawing apparatus Download PDF

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Publication number
TWI811714B
TWI811714B TW110123244A TW110123244A TWI811714B TW I811714 B TWI811714 B TW I811714B TW 110123244 A TW110123244 A TW 110123244A TW 110123244 A TW110123244 A TW 110123244A TW I811714 B TWI811714 B TW I811714B
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Taiwan
Prior art keywords
substrate
moving mechanism
stage
balance weight
moving
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TW110123244A
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Chinese (zh)
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TW202213452A (en
Inventor
藤田雄也
原望
福田浩士
早川直人
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日商斯庫林集團股份有限公司
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Control And Other Processes For Unpacking Of Materials (AREA)
  • Confectionery (AREA)
  • Formation And Processing Of Food Products (AREA)

Abstract

A first moving mechanism 22a horizontally moves a first stage 21a in the Y direction below a pattern drawing unit 4. A second moving mechanism 22b horizontally moves a second stage 21b in the Y direction below the pattern drawing unit 4. The second moving mechanism 22b is arranged side by side with the first moving mechanism 22a in the X direction. A frame 7 supports the first moving mechanism 22a and the second moving mechanism 22b. A counterweight 51 is attached to the frame 7 so as to be movable in the X direction intersecting the substrate moving direction. A weight movement control unit control a weight moving mechanism 52 based on the positions of the first stage 21a and the second stage 21b in the Y direction so as to arrange the counterweight 51 at a position for suppressing deformation of the frame 7 due to the weight of the first stage 21a and the second stage 21b. As a result, drawing on a substrate 9 can be performed with high accuracy.

Description

描繪裝置depicting device

本發明係有關於一種用以對基板進行描繪之描繪裝置。 The present invention relates to a drawing device for drawing a substrate.

[相關申請案的參照] [Reference to related applications]

本申請案係主張2020年9月23日所申請的日本專利申請案JP2020-158317的優先權的權利，將日本專利申請案JP2020-158317的全部的揭示內容援用於本申請案。 This application claims priority to Japanese Patent Application JP2020-158317 filed on September 23, 2020, and the entire disclosure content of Japanese Patent Application JP2020-158317 is incorporated into this application.

以往，對形成於半導體基板、印刷基板、有機EL(electroluminescence；電致發光)顯示裝置或者液晶顯示裝置用的玻璃基板等(以下稱為「基板」)之感光材料照射光線，藉此進行圖案(pattern)的描繪。在此種描繪裝置中，依序進行基板的搬入、基板的對準(alignment)、對於基板的描繪以及基板的搬出。 Conventionally, a photosensitive material formed on a semiconductor substrate, a printed circuit board, an organic EL (electroluminescence) display device, a glass substrate for a liquid crystal display device, etc. (hereinafter referred to as "substrate") is irradiated with light, thereby patterning ( pattern) description. In this type of drawing apparatus, loading of the substrate, alignment of the substrate, drawing of the substrate, and unloading of the substrate are performed in this order.

近年來，已提出一種技術：為了提升描繪裝置的產出量(throughput)，於一台描繪裝置內設置兩個台(stage)、兩個對準檢測系統以及一個曝光頭，在對於一方的台上的基板的描繪中，進行另一方的台上的基板的更換以及對準。 In recent years, a technology has been proposed: in order to improve the throughput of the drawing device, two stages, two alignment detection systems and an exposure head are provided in one drawing device. During the drawing of the substrate on the other stage, the substrate on the other stage is replaced and aligned.

例如，在國際公開第2003/010802號(文獻1)的步進掃描(step and scan)方式的掃瞄型投影曝光裝置中已提出一種技術：在對一方的台上的基板的曝光中進行另一方的台的移動之情形中，為了防止該移動所致使之振動等傳播至曝光中的台導致曝光動作的控制性能降低，於另一方的台的移動速度以及移動時的加速度設置上限。 For example, a technology has been proposed in a step-and-scan scanning projection exposure apparatus of International Publication No. 2003/010802 (Document 1): while exposing a substrate on one stage, another technique is proposed. When one stage is moving, in order to prevent vibrations caused by the movement from being transmitted to the stage being exposed, thereby degrading the control performance of the exposure operation, upper limits are set for the movement speed and acceleration of the other stage during movement.

此外，在文獻1的曝光裝置中，由於台的移動速度被限制，因此會有曝光裝置的產出量降低之虞。此外，當因為台的移動導致兩個台的位置關係變化時，會有於曝光裝置產生應變等之變形從而導致對於基板的曝光處理的精度降低之虞。 Furthermore, in the exposure apparatus of Document 1, since the movement speed of the stage is limited, there is a risk that the throughput of the exposure apparatus may be reduced. In addition, when the positional relationship between the two stages changes due to the movement of the stage, deformation such as strain may occur in the exposure device, resulting in a risk of lowering the accuracy of the exposure process for the substrate.

本發明係著眼於用以對基板進行描繪之描繪裝置，目的在於精度佳地對基板進行描繪。 The present invention focuses on a drawing device for drawing a substrate, and aims to draw the substrate with high accuracy.

本發明的較佳形態之一的描繪裝置係具備：圖案描繪部，係對在下方水平移動之基板的上側的主表面照射光線並描繪圖案；第一基板保持部；第一移動機構，係在前述圖案描繪部的下方將前述第一基板保持部於基板移動方向水平移動；第二基板保持部，係與前述第一基板保持部鄰接地配置；第二移動機構，係在與前述基板移動方向交叉之方向中與前述第一移動機構排列地配置，在前述圖案描繪部的下方將前述第二基板保持部於前述基板移動方向水平移動；框架(frame)，係支撐前述第一移動機構以及前述第二移動機構；平衡配重(counter weight)，係能夠於與前述基板移動方向交叉之配重(weight)移動方向移動地安裝於前述框架；配重移動機構，係將前述平衡配重於前述配重移動 方向移動；以及配重移動控制部，係基於前述基板移動方向中的前述第一基板保持部以及前述第二基板保持部的位置來控制前述配重移動機構，俾使前述平衡配重配置於抑制前述第一基板保持部以及前述第二基板保持部的重量所致使之前述框架的變形之位置。 A drawing device according to a preferred aspect of the present invention is provided with: a pattern drawing unit that irradiates light onto the upper main surface of a substrate that moves horizontally below to draw a pattern; a first substrate holding unit; and a first moving mechanism that The first substrate holding part is moved horizontally under the pattern drawing part in the substrate moving direction; the second substrate holding part is arranged adjacent to the first substrate holding part; and the second moving mechanism is in the substrate moving direction. The first moving mechanism is arranged in the intersecting direction, and the second substrate holding part is moved horizontally in the substrate moving direction below the pattern drawing part; a frame supports the first moving mechanism and the The second moving mechanism; the counter weight is movably installed on the frame in a moving direction of the weight that crosses the moving direction of the base plate; the counter weight moving mechanism moves the counter weight on the Counterweight movement Directional movement; and a counterweight movement control unit that controls the counterweight movement mechanism based on the positions of the first substrate holding portion and the second substrate holding portion in the substrate movement direction, so that the balance weight is arranged to suppress The position where the frame is deformed due to the weight of the first substrate holding part and the second substrate holding part.

依據上述描繪裝置，能精度佳地對基板進行描繪。 According to the above-mentioned drawing device, the substrate can be drawn with high accuracy.

較佳為，前述配重移動方向係與前述基板移動方向垂直。 Preferably, the moving direction of the counterweight is perpendicular to the moving direction of the substrate.

較佳為，前述平衡配重的重心係在上下方向中位於比前述第一基板保持部的上表面以及前述第二基板保持部的上表面還下側。 Preferably, the center of gravity of the balance weight is located lower than the upper surface of the first substrate holding part and the upper surface of the second substrate holding part in the up-down direction.

較佳為，前述平衡配重的上端係在上下方向中位於比前述第一基板保持部的前述上表面以及前述第二基板保持部的前述上表面還下側。 Preferably, the upper end of the balance weight is located lower than the upper surface of the first substrate holding part and the upper surface of the second substrate holding part in the up-down direction.

較佳為，前述框架係具備：高架部(gantry)，係跨越前述第一移動機構以及前述第二移動機構，並支撐前述圖案描繪部。前述高架部係從前述第一移動機構以及前述第二移動機構的前述基板移動方向中的中央部的上方朝前述基板移動方向的一側延伸。前述第一移動機構以及前述第二移動機構係從前述高架部朝前述基板移動方向的另一側突出。前述平衡配重係於前述基板移動方向的另一側與前述第一移動機構以及前述第二移動機構鄰接地配置。 Preferably, the frame includes a gantry that spans the first moving mechanism and the second moving mechanism and supports the pattern drawing part. The elevated portion extends from above a central portion of the first moving mechanism and the second moving mechanism in the substrate moving direction toward one side in the substrate moving direction. The first moving mechanism and the second moving mechanism protrude from the elevated portion toward the other side in the substrate moving direction. The balance weight is disposed adjacent to the first moving mechanism and the second moving mechanism on the other side in the moving direction of the substrate.

較佳為，前述框架的剛性係以前述第一移動機構以及前述第二移動機構的前述基板移動方向中的一側的端部、中央部以及另一側的端部之順序降低。前述平衡配重係於前述基板移動方向的前述另一側與前述第一移動機構以及前述第二移動機構鄰接地配置。前述第一基板保持部係在位於進行前述圖案描繪部所為的描繪之位置的狀態下，在前述第二基板保持部位於前述基板移動方向中的前述一側的端部時，前述平衡配重係位於前述配重移動方向中的前 述第一移動機構與前述第二移動機構之間的中央的基準位置；在前述第二基板保持部位於前述基板移動方向中的前述中央部時，前述平衡配重係位於比前述基準位置還靠近前述第一移動機構的第一位置；在前述第二基板保持部位於前述基板移動方向中的前述另一側的端部時，前述平衡配重係位於比前述第一位置還靠近前述第一移動機構的第二位置。前述第二基板保持部係在位於進行前述圖案描繪部所為的描繪之位置的狀態下，在前述第一基板保持部位於前述基板移動方向中的前述一側的端部時，前述平衡配重係位於前述基準位置；在前述第一基板保持部位於前述基板移動方向中的前述中央部時，前述平衡配重係位於比前述基準位置還靠近前述第二移動機構的第三位置；在前述第一基板保持部位於前述基板移動方向中的前述另一側的端部時，前述平衡配重係位於比前述第三位置還靠近前述第二移動機構的第四位置。 Preferably, the rigidity of the frame decreases in the order of one end, a center, and the other end of the first moving mechanism and the second moving mechanism in the substrate moving direction. The balance weight is disposed adjacent to the first moving mechanism and the second moving mechanism on the other side in the moving direction of the substrate. The first substrate holding part is in a state where the pattern drawing part performs drawing, and when the second substrate holding part is located at the end of the side in the direction of movement of the substrate, the balance weight is Located in the front direction of movement of the aforementioned counterweight a reference position in the center between the first moving mechanism and the second moving mechanism; when the second substrate holding portion is located at the center portion in the substrate moving direction, the balance weight is located closer to the reference position The first position of the first moving mechanism; when the second substrate holding portion is located at the other end of the substrate moving direction, the balance weight is located closer to the first movement than the first position. The second position of the institution. The second substrate holding part is in a state where the pattern drawing part performs drawing, and when the first substrate holding part is located at the end of the side in the direction of movement of the substrate, the balance weight is is located at the aforementioned reference position; when the aforementioned first substrate holding portion is located at the aforementioned center portion in the direction of movement of the substrate, the aforementioned balance weight is located at a third position closer to the aforementioned second moving mechanism than the aforementioned reference position; in the aforementioned first When the substrate holding portion is located at the other end in the substrate moving direction, the balance weight is located at a fourth position closer to the second moving mechanism than the third position.

較佳為，前述框架的剛性係以前述第一移動機構以及前述第二移動機構的前述基板移動方向中的一側的端部、中央部以及另一側的端部之順序降低。前述平衡配重係於前述基板移動方向的前述另一側與前述第一移動機構以及前述第二移動機構鄰接地配置。在前述第一基板保持部以及前述第二基板保持部位於前述基板移動方向中的相同的位置時，前述平衡配重係位於前述配重移動方向中的前述第一移動機構與前述第二移動機構之間的中央的基準位置。在前述第二基板保持部位於比前述第一基板保持部還靠近前述基板移動方向中的前述另一側時，前述平衡配重係位於比前述基準位置還靠近前述第一移動機構的位置。在前述第二基板保持部位於比前述第一基板保持部還靠近前述基板移動方向中的前述一側時，前述平衡配重係位於比前述基準位置還靠近前述第二移動機構的位置。 Preferably, the rigidity of the frame decreases in the order of one end, a center, and the other end of the first moving mechanism and the second moving mechanism in the substrate moving direction. The balance weight is disposed adjacent to the first moving mechanism and the second moving mechanism on the other side in the moving direction of the substrate. When the first substrate holding part and the second substrate holding part are located at the same position in the substrate moving direction, the balance weight is the first moving mechanism and the second moving mechanism located in the counterweight moving direction. the central reference position between. When the second substrate holding portion is located closer to the other side in the substrate moving direction than the first substrate holding portion, the balance weight is located closer to the first moving mechanism than the reference position. When the second substrate holding portion is located closer to the side in the substrate moving direction than the first substrate holding portion, the balance weight is located closer to the second moving mechanism than the reference position.

較佳為，前述圖案描繪部係具備：描繪頭，係朝向下方照射光線；以及描繪頭移動機構，係在前述第一移動機構的上方的第一描繪位置與前述第二移動機構的上方的第二描繪位置之間移動前述描繪頭。 Preferably, the pattern drawing unit includes: a drawing head that irradiates light downward; and a drawing head moving mechanism that is connected to a first drawing position above the first moving mechanism and a third drawing position above the second moving mechanism. Move the aforementioned drawing head between two drawing positions.

參照隨附的圖式並藉由以下所進行的本發明的詳細的說明，更明瞭上述目的以及其他的目的、特徵、態樣以及優點。 The above objects and other objects, features, aspects and advantages will become more apparent from the following detailed description of the present invention with reference to the accompanying drawings.

1,1a:描繪裝置 1,1a:Drawing device

2a:第一搬運機構 2a: First transport mechanism

2b:第二搬運機構 2b: Second transport mechanism

3:拍攝部 3:Photography Department

4:圖案描繪部 4:Pattern drawing department

7:框架 7:Frame

9:基板 9:Substrate

10:控制部 10:Control Department

21a:第一台 21a:The first channel

21b:第二台 21b:Second channel

22a:第一移動機構 22a: First mobile mechanism

22b:第二移動機構 22b: Second mobile mechanism

31:拍攝頭 31:Camera head

32:拍攝頭移動機構 32: Shooting head moving mechanism

41:描繪頭 41: Draw the head

42:描繪頭移動機構 42: Drawing head moving mechanism

51:平衡配重 51: Balance weight

52:配重移動機構 52: Counterweight moving mechanism

53:配重要素 53:Coordinating factors

71:基台 71:Abutment

72:第一高架部 72:First elevated section

73:第二高架部 73:Second Elevated Section

74:高架部 74: Elevated part

75:配重支撐部 75: Counterweight support part

91:上表面 91: Upper surface

100:電腦 100:Computer

101:處理器 101: Processor

102:記憶體 102:Memory

103:輸入輸出部 103: Input and output department

104:匯流排 104:Bus

105:鍵盤 105:Keyboard

106:滑鼠 106:Mouse

107:顯示器 107:Display

111:記憶部 111:Memory department

112:拍攝控制部 112:Photography Control Department

113:檢測部 113:Testing Department

114:描繪控制部 114:Description Control Department

115:配重移動控制部 115: Counterweight movement control department

221a,221b:導軌 221a,221b: Guide rail

[圖1]係顯示實施形態之一的描繪裝置之立體圖。 [Fig. 1] is a perspective view showing a drawing device according to one embodiment.

[圖2]係顯示電腦的構成之圖。 [Figure 2] is a diagram showing the structure of a computer.

[圖3]係顯示控制部的功能之方塊圖。 [Fig. 3] is a block diagram showing the functions of the control unit.

[圖4A]係顯示描繪處理的流程之圖。 [Fig. 4A] is a diagram showing the flow of drawing processing.

[圖4B]係顯示描繪處理的流程之圖。 [Fig. 4B] is a diagram showing the flow of drawing processing.

[圖5]係顯示第一台以及第二台的位置之圖。 [Figure 5] is a diagram showing the positions of the first and second stations.

[圖6]係顯示第一台以及第二台的位置之圖。 [Figure 6] is a diagram showing the positions of the first and second stations.

[圖7]係顯示第一台以及第二台的位置之圖。 [Figure 7] is a diagram showing the positions of the first and second stations.

[圖8]係顯示第一台以及第二台的位置之圖。 [Figure 8] is a diagram showing the positions of the first and second stations.

[圖9]係顯示第一台以及第二台的位置之圖。 [Figure 9] is a diagram showing the positions of the first and second stations.

[圖10]係顯示第一台以及第二台的位置之圖。 [Figure 10] is a diagram showing the positions of the first and second stations.

[圖11]係顯示平衡配重的位置之圖。 [Figure 11] is a diagram showing the position of the balance weight.

[圖12]係顯示平衡配重的位置調節的流程之圖。 [Fig. 12] is a diagram showing the flow of position adjustment of the balance weight.

[圖13]係顯示第一台、第二台以及平衡配重的位置之圖。 [Figure 13] is a diagram showing the positions of the first stage, the second stage and the balance weight.

[圖14]係顯示第一台、第二台以及平衡配重的位置之圖。 [Figure 14] is a diagram showing the positions of the first stage, the second stage and the balance weight.

[圖15]係顯示第一台、第二台以及平衡配重的位置之圖。 [Figure 15] is a diagram showing the positions of the first stage, the second stage and the balance weight.

[圖16]係顯示第一台、第二台以及平衡配重的位置之圖。 [Figure 16] is a diagram showing the positions of the first stage, the second stage and the balance weight.

[圖17]係顯示第一台、第二台以及平衡配重的位置之圖。 [Figure 17] is a diagram showing the positions of the first stage, the second stage and the balance weight.

[圖18]係顯示第一台、第二台以及平衡配重的位置之圖。 [Figure 18] is a diagram showing the positions of the first stage, the second stage and the balance weight.

[圖19]係顯示平衡配重的位置調節的流程之圖。 [Fig. 19] is a diagram showing the flow of position adjustment of the balance weight.

[圖20]係顯示第一台、第二台以及平衡配重的位置之圖。 [Figure 20] is a diagram showing the positions of the first stage, the second stage and the balance weight.

[圖21]係顯示第一台、第二台以及平衡配重的位置之圖。 [Figure 21] is a diagram showing the positions of the first stage, the second stage and the balance weight.

[圖22]係顯示第一台、第二台以及平衡配重的位置之圖。 [Figure 22] is a diagram showing the positions of the first stage, the second stage and the balance weight.

[圖23]係顯示第一台、第二台以及平衡配重的位置之圖。 [Figure 23] is a diagram showing the positions of the first stage, the second stage and the balance weight.

[圖24]係顯示第一台、第二台以及平衡配重的位置之圖。 [Figure 24] is a diagram showing the positions of the first stage, the second stage and the balance weight.

[圖25]係顯示第一台、第二台以及平衡配重的位置之圖。 [Figure 25] is a diagram showing the positions of the first stage, the second stage and the balance weight.

[圖26]係顯示第一台、第二台以及平衡配重的位置之圖。 [Figure 26] is a diagram showing the positions of the first stage, the second stage and the balance weight.

[圖27]係顯示第一台、第二台以及平衡配重的位置之圖。 [Figure 27] is a diagram showing the positions of the first stage, the second stage and the balance weight.

[圖28]係顯示第一台、第二台以及平衡配重的位置之圖。 [Figure 28] is a diagram showing the positions of the first stage, the second stage and the balance weight.

[圖29]係顯示第一台、第二台以及平衡配重的位置之圖。 [Figure 29] is a diagram showing the positions of the first stage, the second stage and the balance weight.

[圖30]係顯示第一台、第二台以及平衡配重的位置之圖。 [Figure 30] is a diagram showing the positions of the first stage, the second stage and the balance weight.

[圖31]係顯示第一台、第二台以及平衡配重的位置之圖。 [Figure 31] is a diagram showing the positions of the first stage, the second stage and the balance weight.

[圖32]係顯示描繪裝置的其他例子之側視圖。 [Fig. 32] is a side view showing another example of the drawing device.

圖1係顯示本發明的實施形態之一的描繪裝置1之立體圖。描繪裝置1為下述雙台型(twin stage type)的直接描繪裝置：將經過空間調變的略束(beam)狀的光線照射至基板9上的感光材料，在基板9上掃描該光線的照射區域，藉此進行圖案的描繪。在圖1中以箭頭顯示彼此正交的三個方向作為X方向、Y方向以及Z方向。在圖1所示的例子中，X方向以及Y方向為彼此垂直的水平方向，Z方向為鉛直方向。在其他的圖式中亦同樣。 FIG. 1 is a perspective view of a drawing device 1 according to one embodiment of the present invention. The drawing device 1 is a twin stage type direct drawing device: a spatially modulated beam-shaped light is irradiated onto the photosensitive material on the substrate 9 , and the pattern of the light is scanned on the substrate 9 Irradiate the area to draw the pattern. In FIG. 1 , three mutually orthogonal directions are shown by arrows as the X direction, the Y direction, and the Z direction. In the example shown in FIG. 1 , the X direction and the Y direction are horizontal directions perpendicular to each other, and the Z direction is a vertical direction. The same goes for other schemas.

基板9係例如為俯視觀看時為略矩形狀的板狀構件。基板9係例如為印刷基板。在基板9的(+Z)側以及(-Z)側的主表面(以下稱為「上表面91」)中，於銅層上設置有藉由感光材料所形成的阻劑(resist)膜。在描繪裝置1中，於基板9的該阻劑膜描繪(亦即形成)有電路圖案。此外，基板9的種類以及形狀等亦可變更成各種種類以及形狀等。 The substrate 9 is, for example, a plate-shaped member having a substantially rectangular shape when viewed from above. The substrate 9 is, for example, a printed circuit board. On the main surfaces on the (+Z) side and the (-Z) side of the substrate 9 (hereinafter referred to as "upper surface 91"), a resist film formed of a photosensitive material is provided on the copper layer. In the drawing device 1, a circuit pattern is drawn (that is, formed) on the resist film of the substrate 9. In addition, the type, shape, etc. of the substrate 9 may be changed into various types, shapes, etc.

描繪裝置1係具備第一搬運機構2a、第二搬運機構2b、拍攝部3、圖案描繪部4、框架7以及控制部10。控制部10係控制第一搬運機構2a、第二搬運機構2b、拍攝部3以及圖案描繪部4。 The drawing device 1 includes a first conveyance mechanism 2a, a second conveyance mechanism 2b, an imaging unit 3, a pattern drawing unit 4, a frame 7, and a control unit 10. The control unit 10 controls the first conveyance mechanism 2a, the second conveyance mechanism 2b, the imaging unit 3, and the pattern drawing unit 4.

框架7為安裝有描繪裝置1的各個構成之本體基座部。框架7係具備：略立方體狀的基台71；以及門形的第一高架部72與第二高架部73，係跨越基台71。第二高架部73係接近地配置於第一高架部72的(+Y)側。在以下的說明中，亦將第一高架部72以及第二高架部73統稱為「高架部74」。於基台71上安裝有第一搬運機構2a以及第二搬運機構2b。第一高架部72係支撐拍攝部3。第二高架部73係支撐圖案描繪部4。框架7係載置於省略圖示的台坐上。 The frame 7 is a main body base portion on which various components of the drawing device 1 are mounted. The frame 7 includes a substantially cubic base 71 and door-shaped first elevated portions 72 and second elevated portions 73 spanning the base 71 . The second elevated portion 73 is disposed close to the (+Y) side of the first elevated portion 72 . In the following description, the first elevated portion 72 and the second elevated portion 73 are also collectively referred to as the "overhead portion 74". The first conveyance mechanism 2a and the second conveyance mechanism 2b are installed on the base 71. The first elevated portion 72 supports the imaging unit 3 . The second elevated portion 73 supports the pattern drawing portion 4 . The frame 7 is placed on a stand (not shown).

第一搬運機構2a以及第二搬運機構2b係分別為下述機構：在拍攝部3以及圖案描繪部4的下方(亦即(-Z)側)保持以及移動基板9。第二搬運機構2b 係鄰接地配置於第一搬運機構2a的(+X)側。第一搬運機構2a與第二搬運機構2b係具有略相同的構造。 The first conveyance mechanism 2 a and the second conveyance mechanism 2 b are mechanisms that respectively hold and move the substrate 9 below the imaging unit 3 and the pattern drawing unit 4 (that is, on the (-Z) side). Second transport mechanism 2b They are arranged adjacent to the (+X) side of the first conveyance mechanism 2a. The first conveyance mechanism 2a and the second conveyance mechanism 2b have substantially the same structure.

第一搬運機構2a係具備第一台21a以及第一移動機構22a。第一台21a為略平板狀的第一基板保持部，用以從下側保持略水平狀態的基板9。第一台21a係例如為真空夾具(vacuum chuck)，用以吸附並保持基板9的下表面。第一台21a亦可具有真空夾具以外的構造。載置於第一台21a上的基板9的上表面91係與Z方向(亦即上下方向)略垂直，且與X方向以及Y方向略平行。 The first conveying mechanism 2a includes a first stage 21a and a first moving mechanism 22a. The first stage 21a is a substantially flat-shaped first substrate holding portion, and is used to hold the substrate 9 in a substantially horizontal state from the lower side. The first stage 21a is, for example, a vacuum chuck, which is used to adsorb and hold the lower surface of the substrate 9 . The first stage 21a may have a structure other than a vacuum clamp. The upper surface 91 of the substrate 9 placed on the first stage 21a is approximately perpendicular to the Z direction (that is, the up and down direction), and approximately parallel to the X direction and the Y direction.

第一移動機構22a為第一台移動機構，用以將第一台21a相對於拍攝部3以及圖案描繪部4於略水平方向(亦即與基板9的上表面91略平行的方向)相對性地移動。第一移動機構22a係在拍攝部3以及圖案描繪部4的下方將被支撐在導軌(guide rail)221a上的第一台21a沿著導軌221a於Y方向直線移動。藉此，被保持於第一台21a的基板9係於Y方向移動。在以下的說明中，亦將Y方向稱為「基板移動方向」。第一移動機構22a的驅動源係例如為線性伺服馬達(linear servo motor)或者於滾珠螺桿(ball screw)安裝有馬達的驅動源。第一移動機構22a的構造亦可變更成各種構造。 The first moving mechanism 22a is a first stage moving mechanism used to move the first stage 21a relative to the photographing part 3 and the pattern drawing part 4 in a substantially horizontal direction (that is, a direction substantially parallel to the upper surface 91 of the substrate 9). move. The first moving mechanism 22a moves the first stage 21a supported on the guide rail 221a linearly in the Y direction along the guide rail 221a below the imaging unit 3 and the pattern drawing unit 4. Thereby, the substrate 9 held by the first stage 21a moves in the Y direction. In the following description, the Y direction is also referred to as the "substrate movement direction." The driving source of the first moving mechanism 22a is, for example, a linear servo motor or a driving source with a motor installed on a ball screw. The structure of the first moving mechanism 22a can also be changed into various structures.

第二搬運機構2b係具備第二台21b以及第二移動機構22b。第二台21b為略平板狀的第二基板保持部，用以從下側保持略水平狀態的基板9。第二台21b係鄰接地配置於第一台21a的側方(亦即(+X側))。第二台21b的上表面係在上下方向(亦即Z方向)中位於與第一台21a的上表面相同的高度。第二台21b係例如為真空夾具，用以吸附並保持基板9的下表面。第二台21b亦可具有真空夾具以外的構造。被載置於第二台21b上的基板9的上表面91係與Z方向略垂直，且與X方向以及Y方向略平行。被保持於第二台21b之基板9的上表面91係位於與被保 持於第一台21a之基板9的上表面91在上下方向中的略相同的高度(亦即Z方向中的略相同的位置)。 The second conveying mechanism 2b includes a second stage 21b and a second moving mechanism 22b. The second stage 21b is a substantially flat second substrate holding portion for holding the substrate 9 in a substantially horizontal state from the lower side. The second stage 21b is arranged adjacent to the side of the first stage 21a (that is, (+X side)). The upper surface of the second stage 21b is located at the same height as the upper surface of the first stage 21a in the up-down direction (ie, Z direction). The second stage 21b is, for example, a vacuum clamp, used to adsorb and hold the lower surface of the substrate 9 . The second unit 21b may have a structure other than the vacuum clamp. The upper surface 91 of the substrate 9 placed on the second stage 21b is approximately perpendicular to the Z direction, and approximately parallel to the X direction and the Y direction. The upper surface 91 of the substrate 9 held on the second stage 21b is located between the The upper surface 91 of the substrate 9 held on the first stage 21a is at approximately the same height in the up and down direction (that is, at approximately the same position in the Z direction).

第二移動機構22b為第二台移動機構，用以將第二台21b相對於拍攝部3以及圖案描繪部4於略水平方向(亦即與基板9的上表面91略平行的方向)相對性地移動。第二移動機構22b係在拍攝部3以及圖案描繪部4的下方將被支撐在導軌221b上的第二台21b沿著導軌221b於Y方向(亦即基板移動方向)直線移動。藉此，被保持於第二台21b的基板9係於Y方向移動。第二移動機構22b所為的第二台21b的移動方向為與第一移動機構22a所為的第一台21a的移動方向略平行。第二移動機構22b的驅動源係例如為線性伺服馬達或者於滾珠螺桿安裝有馬達的驅動源。第二移動機構22b的構造亦可變更成各種構造。 The second moving mechanism 22b is a second stage moving mechanism used to move the second stage 21b relative to the photographing part 3 and the pattern drawing part 4 in a substantially horizontal direction (that is, a direction substantially parallel to the upper surface 91 of the substrate 9). move. The second moving mechanism 22b linearly moves the second stage 21b supported on the guide rail 221b in the Y direction (that is, the substrate moving direction) along the guide rail 221b below the imaging unit 3 and the pattern drawing unit 4. Thereby, the substrate 9 held by the second stage 21b moves in the Y direction. The moving direction of the second stage 21b moved by the second moving mechanism 22b is substantially parallel to the moving direction of the first stage 21a moved by the first moving mechanism 22a. The driving source of the second moving mechanism 22b is, for example, a linear servo motor or a driving source with a motor mounted on a ball screw. The structure of the second moving mechanism 22b can also be changed into various structures.

第一移動機構22a與第二移動機構22b係排列地配置於與基板移動方向(亦即Y方向)交叉之方向。在圖1所示的例子中，第一移動機構22a與第二移動機構22b係排列地配置於X方向，第二移動機構22b係鄰接於第一移動機構22a的(+X)側的側方。第一移動機構22a與第二移動機構22b係位於上下方向的略相同的高度。 The first moving mechanism 22a and the second moving mechanism 22b are arranged in a direction crossing the substrate moving direction (ie, Y direction). In the example shown in FIG. 1 , the first moving mechanism 22 a and the second moving mechanism 22 b are arranged side by side in the X direction, and the second moving mechanism 22 b is adjacent to the (+X) side of the first moving mechanism 22 a. . The first moving mechanism 22a and the second moving mechanism 22b are located at approximately the same height in the up-down direction.

第一移動機構22a以及第二移動機構22b係被框架7的基台71從下方支撐。第一移動機構22a以及第二移動機構22b係從比第二高架部73還從(+Y)側朝(-Y)側方向延伸，並通過被第二高架部73支撐的圖案描繪部4的下方以及被第一高架部72支撐的拍攝部3的下方從第一高架部72朝(-)Y側突出。第一高架部72係在Y方向中位於與第一移動機構22a以及第二移動機構22b的Y方向中的中央部略相同的位置。換言之，高架部74係從第一移動機構22a以及第二移動機構22b的Y方向中的中央部的上方朝(+Y)方向延伸。因此，框架7的剛性係以第一移動 機構22a以及第二移動機構22b的(+Y)側的端部、Y方向中的中央部以及(-Y)側的端部依序變低。 The first moving mechanism 22 a and the second moving mechanism 22 b are supported from below by the base 71 of the frame 7 . The first moving mechanism 22a and the second moving mechanism 22b extend from the (+Y) side toward the (-Y) side of the second elevated portion 73, and pass through the pattern drawing portion 4 supported by the second elevated portion 73. The lower part and the lower part of the imaging unit 3 supported by the first elevated part 72 protrude toward the (-) Y side from the first elevated part 72 . The first elevated portion 72 is located at substantially the same position in the Y direction as the central portions of the first moving mechanism 22 a and the second moving mechanism 22 b in the Y direction. In other words, the elevated portion 74 extends in the (+Y) direction from above the central portions of the first moving mechanism 22a and the second moving mechanism 22b in the Y direction. Therefore, the rigidity of the frame 7 is determined by the first movement The end portions on the (+Y) side, the center portion in the Y direction, and the end portions on the (-Y) side of the mechanism 22a and the second moving mechanism 22b become lower in this order.

在描繪裝置1中，在第一台21a位於比第一高架部72還靠近(-Y)側的狀態下，對第一台21a進行基板9的搬入以及搬出。此外，在第二台21b位於比第一高架部72還靠近(-Y)側的狀態下，對第二台21b進行基板9的搬入以及搬出。 In the drawing apparatus 1 , the substrate 9 is loaded into and unloaded from the first table 21 a in a state where the first table 21 a is located closer to the (-Y) side than the first elevated portion 72 . In addition, in a state where the second stage 21b is located closer to the (-Y) side than the first elevated portion 72, the substrate 9 is loaded into and unloaded from the second stage 21b.

如上所述，第一高架部72以及第二高架部73係跨越第一搬運機構2a以及第二搬運機構2b而設置。第一高架部72係具備：兩根支柱部，係在第一搬運機構2a以及第二搬運機構2b的X方向的兩側處朝Z方向延伸；以及梁部，係連接兩根支柱部的上端部。該梁部係在第一搬運機構2a以及第二搬運機構2b的上方處朝X方向延伸。第一高架部72的兩根支柱部係在(-Z)側的端部處與基台71連接。第二高架部73係具備：兩根支柱部，係在第一搬運機構2a以及第二搬運機構2b的X方向的兩側處朝Z方向延伸；以及梁部，係連接兩根支柱部的上端部。該梁部係在第一搬運機構2a以及第二搬運機構2b的上方處朝X方向延伸。第二高架部73的兩根支柱部係在(-Z)側的端部處與基台71連接。 As described above, the first elevated portion 72 and the second elevated portion 73 are provided across the first conveying mechanism 2a and the second conveying mechanism 2b. The first elevated portion 72 is provided with: two pillar portions extending in the Z direction on both sides of the first conveyance mechanism 2a and the second conveyance mechanism 2b in the X direction; and a beam portion connecting the upper ends of the two pillar portions. department. This beam portion extends in the X direction above the first conveyance mechanism 2a and the second conveyance mechanism 2b. The two support pillars of the first elevated portion 72 are connected to the base 71 at the ends on the (-Z) side. The second elevated portion 73 is provided with: two pillar portions extending in the Z direction on both sides of the first conveyance mechanism 2a and the second conveyance mechanism 2b in the X direction; and a beam portion connecting the upper ends of the two pillar portions. department. This beam portion extends in the X direction above the first conveyance mechanism 2a and the second conveyance mechanism 2b. The two pillar portions of the second elevated portion 73 are connected to the base 71 at the ends on the (-Z) side.

拍攝部3係具備拍攝頭移動機構32以及複數個(在圖1所示的例子中為兩個)拍攝頭31。複數個拍攝頭31係排列於X方向，且能夠移動地安裝於第一高架部72的梁部。拍攝頭移動機構32係安裝於梁部，並將複數個拍攝頭31沿著梁部於X方向移動。拍攝頭移動機構32的驅動源係例如為線性伺服馬達或者於滾珠螺桿安裝有馬達的驅動源。在圖1所示的例子中，兩個拍攝頭31的X方向中的間隔係能夠變更。此外，在拍攝部3中，拍攝頭31的數量亦可為一個，或亦可為三個以上。 The imaging unit 3 includes an imaging head moving mechanism 32 and a plurality of imaging heads 31 (two in the example shown in FIG. 1 ). The plurality of imaging heads 31 are arranged in the X direction and are movably mounted on the beam portion of the first elevated portion 72 . The imaging head moving mechanism 32 is installed on the beam and moves the plurality of imaging heads 31 along the beam in the X direction. The driving source of the imaging head moving mechanism 32 is, for example, a linear servo motor or a driving source with a motor mounted on a ball screw. In the example shown in FIG. 1 , the distance between the two imaging heads 31 in the X direction can be changed. In addition, in the imaging unit 3, the number of imaging heads 31 may be one, or may be three or more.

各個拍攝頭31為攝影機(camera)，係具備省略圖示的拍攝感測器以及光學系統。各個拍攝頭31係例如為區域攝影機(area camera)，用以取得例如二維的影像。拍攝感測器係例如具備矩陣(matrix)狀排列的複數個CCD(Charge Coupled Device；電荷耦合元件)等元件。在各個拍攝頭31中，從省略圖示的光源朝基板9的上表面91被導引的照明光的反射光係經由光學系統朝拍攝感測器被導引。拍攝感測器係接收來自基板9的上表面91的反射光，並取得略矩形狀的拍攝區域的影像。作為上述光源，能夠利用LED(Light Emitting Diode；發光二極體)等各種光源。此外，各個拍攝頭31亦可為線列式攝影機(line camera)等其他種類的攝影機。 Each imaging head 31 is a camera and is equipped with a photographing sensor and an optical system (not shown). Each imaging head 31 is, for example, an area camera, and is used to obtain, for example, a two-dimensional image. The imaging sensor is, for example, provided with a plurality of CCD (Charge Coupled Devices) and other elements arranged in a matrix. In each imaging head 31 , the reflected light of the illumination light guided toward the upper surface 91 of the substrate 9 from a light source (not shown) is guided toward the imaging sensor via the optical system. The imaging sensor receives the reflected light from the upper surface 91 of the substrate 9 and acquires an image of a substantially rectangular imaging area. As the light source, various light sources such as LED (Light Emitting Diode) can be used. In addition, each photographing head 31 may also be a line camera or other types of cameras.

在描繪裝置1中，藉由拍攝頭移動機構32，複數個拍攝頭31係在第一搬運機構2a的上方的第一拍攝位置與第二搬運機構2b的上方的第二拍攝位置之間移動。在圖1中，複數個拍攝頭31係位於第一拍攝位置。複數個拍攝頭31係在第一拍攝位置中拍攝第一台21a上的基板9的上表面91。此外，複數個拍攝頭31係在第二拍攝位置中拍攝第二台21b上的基板9的上表面91。 In the drawing device 1, the imaging head moving mechanism 32 moves the plurality of imaging heads 31 between the first imaging position above the first transportation mechanism 2a and the second imaging position above the second transportation mechanism 2b. In FIG. 1 , a plurality of photographing heads 31 are located at the first photographing position. The plurality of imaging heads 31 image the upper surface 91 of the substrate 9 on the first stage 21a in the first imaging position. In addition, the plurality of imaging heads 31 image the upper surface 91 of the substrate 9 on the second stage 21b in the second imaging position.

圖案描繪部4係具備描繪頭移動機構42以及複數個(在圖1所示的例子中為六個)描繪頭41。複數個描繪頭41係排列於X方向，並能夠移動地安裝於第二高架部73的梁部。描繪頭移動機構42係安裝於梁部，並將複數個描繪頭41沿著梁部於X方向一體性地移動。描繪頭移動機構42的驅動源係例如為線性伺服馬達或者於滾珠螺桿安裝有馬達的驅動源。此外，在圖案描繪部4中，描繪頭41的數量亦可為一個，或亦可為複數個。 The pattern drawing unit 4 includes a drawing head moving mechanism 42 and a plurality of drawing heads 41 (six in the example shown in FIG. 1 ). The plurality of drawing heads 41 are arranged in the X direction and are movably mounted on the beam portion of the second elevated portion 73 . The drawing head moving mechanism 42 is installed on the beam portion, and moves the plurality of drawing heads 41 integrally in the X direction along the beam portion. The driving source of the drawing head moving mechanism 42 is, for example, a linear servo motor or a driving source with a motor mounted on a ball screw. In addition, in the pattern drawing section 4, the number of the drawing heads 41 may be one or a plurality of drawing heads 41 may be provided.

各個描繪頭41係具備省略圖示的光源、光學系統以及空間光線調變元件。作為空間光線調變元件係能夠利用DMD(Digital Micro Mirror Device； 數位微鏡元件)或者GLV(Grating Light Valve；柵光閥)(Silicon Light Machines公司(森尼韋爾(Sunnyvale)、加利福尼亞(California))的註冊商標)等各種元件。作為光源，能夠利用LD(Laser Diode：雷射二極體)等各種光源。複數個描繪頭41係具有略相同的構造。 Each drawing head 41 is equipped with a light source, an optical system, and a spatial light modulation element (not shown). As a spatial light modulation element, DMD (Digital Micro Mirror Device) can be used; Various components such as digital micromirror components) or GLV (Grating Light Valve) (registered trademark of Silicon Light Machines, Inc. (Sunnyvale, California)). As the light source, various light sources such as LD (Laser Diode) can be used. The plurality of drawing heads 41 have approximately the same structure.

在描繪裝置1中，藉由描繪頭移動機構42，複數個描繪頭41係在第一搬運機構2a的上方的第一描繪位置與第二搬運機構2b的上方的第二描繪位置之間移動。在圖1中，複數個描繪頭41係位於第二描繪位置。複數個描繪頭41係在第一描繪位置中對第一台21a上的基板9的上表面91描繪圖案。此外，複數個描繪頭41係在第二描繪位置中對第二台21b上的基板9的上表面91描繪圖案。 In the drawing device 1, the drawing head moving mechanism 42 moves the plurality of drawing heads 41 between the first drawing position above the first conveyance mechanism 2a and the second drawing position above the second conveyance mechanism 2b. In FIG. 1 , the plurality of drawing heads 41 are located at the second drawing position. The plurality of drawing heads 41 draw patterns on the upper surface 91 of the substrate 9 on the first stage 21a in the first drawing position. In addition, the plurality of drawing heads 41 draws patterns on the upper surface 91 of the substrate 9 on the second stage 21b in the second drawing position.

第一描繪位置以及第二描繪位置係在Y方向中位於與第一移動機構22a以及第二移動機構22b的Y方向中的中央部略相同的位置。此外，上述第一拍攝位置以及第二拍攝位置亦在Y方向中位於與第一移動機構22a以及第二移動機構22b的Y方向中的中央部略相同的位置。換言之，圖案描繪部4的複數個描繪頭41以及拍攝部3的複數個拍攝頭31係在Y方向中位於與第一移動機構22a以及第二移動機構22b的Y方向中的中央部略相同的位置。 The first drawing position and the second drawing position are located at substantially the same position in the Y direction as the center portions of the first moving mechanism 22 a and the second moving mechanism 22 b in the Y direction. In addition, the first photographing position and the second photographing position are also located in the Y direction at substantially the same position as the central portions of the first moving mechanism 22 a and the second moving mechanism 22 b in the Y direction. In other words, the plurality of drawing heads 41 of the pattern drawing unit 4 and the plurality of imaging heads 31 of the imaging unit 3 are located at substantially the same central portion in the Y direction of the first moving mechanism 22a and the second moving mechanism 22b. Location.

在第一描繪位置中描繪圖案時，從圖案描繪部4的複數個描繪頭41朝向下方的第一台21a上的基板9照射經過調變(亦即空間調變)的光線。而且，與該光線的照射並行地，藉由第一移動機構22a將基板9於Y方向(亦即基板移動方向)水平移動。藉此，來自複數個描繪頭41的光線的照射區域在基板9上於Y方向掃描，對基板9進行圖案(例如電路圖案)的描繪。第一移動機構22a為掃描機構，用以將來自各個掃描頭41的光線的照射區域在基板9上於Y方向移動。 When drawing a pattern in the first drawing position, modulated (that is, spatially modulated) light is irradiated from the plurality of drawing heads 41 of the pattern drawing unit 4 toward the substrate 9 on the first stage 21a below. In parallel with the irradiation of the light, the substrate 9 is horizontally moved in the Y direction (that is, the substrate moving direction) by the first moving mechanism 22a. Thereby, the irradiation area of the light from the plurality of drawing heads 41 is scanned on the substrate 9 in the Y direction, and a pattern (for example, a circuit pattern) is drawn on the substrate 9 . The first moving mechanism 22 a is a scanning mechanism used to move the irradiation area of the light from each scanning head 41 on the substrate 9 in the Y direction.

在圖1所示的例子中，對於基板9的描繪係以單程(single pass)(單向(one pass))方式進行。具體而言，藉由第一移動機構22a，第一台21a係相對於複數個描繪頭41於Y方向相對移動，來自複數個描繪頭41的光線的照射區域在基板9的上表面91上於Y方向僅掃描一次。藉此，結束對於基板9的描繪。此外，在描繪裝置1中，亦可藉由重複地進行第一台21a朝向Y方向的移動以及第一台21a朝向X方向的步階移動(step shift)之多程(multi pass)方式對基板9進行描繪。第二描繪位置中的圖案的描繪係排除第一台21a以及第一移動機構22a被變更成第二台21b以及第二移動機構22b之點除外，與上述第一描繪位置中的圖案的描繪同樣。 In the example shown in FIG. 1 , the drawing of the substrate 9 is performed in a single pass (one pass) manner. Specifically, by the first moving mechanism 22a, the first stage 21a moves relative to the plurality of drawing heads 41 in the Y direction, and the irradiation area of the light from the plurality of drawing heads 41 is on the upper surface 91 of the substrate 9. The Y direction is scanned only once. This completes the drawing of the substrate 9 . In addition, in the drawing device 1, the substrate can also be processed by a multi-pass method in which the first stage 21a moves in the Y direction and the first stage 21a moves in the X direction repeatedly. 9 to draw. The pattern drawing in the second drawing position is the same as the pattern drawing in the first drawing position except that the first stage 21a and the first moving mechanism 22a are changed to the second stage 21b and the second moving mechanism 22b. .

描繪裝置1係進一步具備平衡配重51以及配重移動機構52。平衡配重51為較重的構件，安裝於框架7，控制框架7的應變等變形。平衡配重51係藉由金屬等之比重較大的材料所形成。平衡配重51係例如為略立方體狀的一個構造體，該構造體係層疊並固定有鐵製的複數個板構件。 The drawing device 1 further includes a balance weight 51 and a weight moving mechanism 52 . The balance weight 51 is a relatively heavy component and is installed on the frame 7 to control the strain and other deformations of the frame 7 . The balance weight 51 is formed of a material with a large specific gravity such as metal. The balance weight 51 is, for example, a substantially cubic structure in which a plurality of iron plate members are laminated and fixed.

平衡配重51係能夠移動地安裝於框架7的配重支撐部75。配重支撐部75為略角柱狀的構件，設置於基台71的(-Y)側的端部且於X方向延伸。配重支撐部75係例如支撐平衡配重51的上下方向的中央部。配重支撐部75係相對於第一移動機構22a的導軌221a的(-Y)側的端部以及第二移動機構22b的導軌221b的(-Y)側的端部設置於鄰接於(-Y)側的位置。因此，平衡配重51係於(-Y)側與第一移動機構22a以及第二移動機構22b鄰接地配置。 The balance weight 51 is movably mounted on the weight support portion 75 of the frame 7 . The weight support part 75 is a substantially rectangular prism-shaped member and is provided at the (-Y) side end of the base 71 and extends in the X direction. The weight support part 75 supports, for example, the center part of the balance weight 51 in the up-down direction. The counterweight support part 75 is provided adjacent to the (-Y) side end of the guide rail 221a of the first moving mechanism 22a and the (-Y) side end of the guide rail 221b of the second moving mechanism 22b. ) side position. Therefore, the balance weight 51 is disposed adjacent to the first moving mechanism 22a and the second moving mechanism 22b on the (-Y) side.

配重移動機構52係安裝於配重支撐部75，將平衡配重51沿著配重支撐部75於X方向水平移動。在以下的說明中，亦將X方向稱為「配重移動方向」。配重移動方向為與上述基板移動方向(亦即Y方向)交叉之方向。在圖1所示的例子中，配重移動方向係與基板移動方向略垂直。配重移動機構52的驅動源 係例如為線性伺服馬達或者於滾珠螺桿安裝有馬達的驅動源。配重移動機構52的構造亦可變更成各種構造。 The counterweight moving mechanism 52 is installed on the counterweight support part 75 and moves the balance weight 51 horizontally in the X direction along the counterweight support part 75 . In the following description, the X direction is also referred to as the "counterweight movement direction." The direction of movement of the counterweight is a direction intersecting with the direction of movement of the above-mentioned substrate (that is, the Y direction). In the example shown in Figure 1, the moving direction of the counterweight is approximately perpendicular to the moving direction of the substrate. Driving source of counterweight moving mechanism 52 The driving source is, for example, a linear servo motor or a motor mounted on a ball screw. The structure of the counterweight moving mechanism 52 can also be changed into various structures.

在圖1中，平衡配重51係位於X方向中的第一移動機構22a與第二移動機構22b之間的中央(以下亦稱為「基準位置」)。配重移動機構52係使平衡配重51從基準位置朝(-X)方向移動並位於第一移動機構22a的(-Y)側，且使平衡配重51從基準位置朝(+X)方向移動並位於第二移動機構22b的(-Y)側。 In FIG. 1 , the balance weight 51 is located in the center between the first moving mechanism 22 a and the second moving mechanism 22 b in the X direction (hereinafter also referred to as the "reference position"). The weight moving mechanism 52 moves the balance weight 51 from the reference position in the (-X) direction and is located on the (-Y) side of the first movement mechanism 22a, and moves the balance weight 51 from the reference position in the (+X) direction. moves and is located on the (-Y) side of the second moving mechanism 22b.

從降低因為平衡配重51的移動時的振動而施加至第一搬運機構2a以及第二搬運機構2b的力矩(moment)等之觀點來看，較佳為平衡配重51的重心位置係於上下方向離第一搬運機構2a以及第二搬運機構2b不會太遠，且更佳為在配重支撐部75附近。具體而言，較佳為平衡配重51的重心係在上下方向中位於比第一台21a的上表面以及第二台21b的上表面還下方。藉此，能降低上述力矩等，且能防止或者抑制因為平衡配重51的移動時的振動導致對於被保持於第一台21a以及第二台21b的基板9之處理的精度降低。此外，亦能抑制因為第一台21a、第二台21b的移動時等中的框架7的振動導致平衡配重51振動。此外，在圖1所示的例子中，平衡配重51的重心係在上下方向中位於比基台71的上下方向的中心還上側。 From the viewpoint of reducing the moment applied to the first conveyance mechanism 2a and the second conveyance mechanism 2b due to vibration during movement of the balance weight 51, it is preferable that the center of gravity of the balance weight 51 is positioned up and down. The direction is not too far from the first conveyance mechanism 2a and the second conveyance mechanism 2b, and is preferably near the counterweight support part 75. Specifically, it is preferable that the center of gravity of the balance weight 51 is located lower than the upper surface of the first stage 21a and the upper surface of the second stage 21b in the up-down direction. Thereby, the above-mentioned moment etc. can be reduced, and the vibration of the balance weight 51 when moving can be prevented or suppressed, which leads to the degradation of the processing accuracy of the board|substrate 9 held by the 1st stage 21a and the 2nd stage 21b. In addition, it is also possible to suppress vibration of the balance weight 51 due to vibration of the frame 7 during movement of the first stage 21a and the second stage 21b. In the example shown in FIG. 1 , the center of gravity of the balance weight 51 is located above the center of the base 71 in the vertical direction.

在圖1所示的例子中，平衡配重51的上端(亦即(+Z)側的端面)係在上下方向中位於比第一台21a的上表面以及第二台21b的上表面還下側。藉此，能防止在基板9朝第一台21a以及第二台21b搬出以及搬入時因為平衡配重51而阻礙基板9的移動。 In the example shown in FIG. 1 , the upper end of the balance weight 51 (that is, the end surface on the (+Z) side) is located lower than the upper surface of the first stage 21 a and the upper surface of the second stage 21 b in the up-down direction. side. This can prevent the balance weight 51 from hindering the movement of the substrate 9 when the substrate 9 is carried out and carried into the first stage 21a and the second stage 21b.

圖2係顯示控制部10所具備的電腦100的構成之圖。電腦100為具備有處理器(processor)101、記憶體102、輸入輸出部103以及匯流排(bus)104之一 般的電腦。匯流排104為用以連接處理器101、記憶體102以及輸入輸出部103之訊號電路。記憶體102係記憶程式以及各種資訊。處理器101係依循記憶於記憶體102的程式等，一邊利用記憶體102等一邊執行各種處理(例如數值計算、影像處理)。輸入輸出部103係具備：鍵盤105以及滑鼠106，係接受來自操作者的輸入；以及顯示器107，係顯示來自處理器101的輸出等。此外，控制部10係可為可程式邏輯控制器(PLC；Programmable Logic Controller)或者電路基板等，亦可為這些構件與一個以上的電腦的組合。 FIG. 2 is a diagram showing the structure of the computer 100 included in the control unit 10 . The computer 100 is one of including a processor 101, a memory 102, an input/output unit 103, and a bus 104. Like a computer. The bus 104 is a signal circuit used to connect the processor 101, the memory 102, and the input/output unit 103. The memory 102 stores programs and various information. The processor 101 follows the programs stored in the memory 102 and performs various processes (such as numerical calculations and image processing) while using the memory 102 and the like. The input/output unit 103 includes a keyboard 105 and a mouse 106 for accepting input from the operator, and a display 107 for displaying output from the processor 101 and the like. In addition, the control unit 10 may be a programmable logic controller (PLC; Programmable Logic Controller) or a circuit substrate, or a combination of these components and one or more computers.

圖3係顯示藉由電腦100所實現的控制部10的功能之方塊圖。在圖3中亦一併顯示控制部10以外的構成。控制部10係具備記憶部111、拍攝控制部112、檢測部113、描繪控制部114以及配重移動控制部115。記憶部111係主要藉由記憶體102所實現，預先記憶被描繪至基板9之預定的圖案的資料(亦即描繪用資料)以及與平衡配重51的移動相關之資訊等的各種資訊。 FIG. 3 is a block diagram showing the functions of the control unit 10 implemented by the computer 100. FIG. 3 also shows components other than the control unit 10 . The control unit 10 includes a memory unit 111, an imaging control unit 112, a detection unit 113, a drawing control unit 114, and a weight movement control unit 115. The memory unit 111 is mainly realized by the memory 102 and stores in advance various information such as data of a predetermined pattern drawn on the substrate 9 (that is, drawing data) and information related to the movement of the balance weight 51 .

拍攝控制部112、檢測部113、描繪控制部114以及配重移動控制部115係主要藉由處理器101所實現。拍攝控制部112係控制拍攝部3、第一移動機構22a以及第二移動機構22b，藉此使拍攝部3拍攝第一台21a以及第二台21b上的基板9的上表面91並取得影像。該影像係被傳送並被儲存於記憶部111。檢測部113係使用該影像來檢測基板9的位置。描繪控制部114係基於檢測部113所檢測的基板9的位置以及預先記憶於記憶部111的描繪用資料等，控制圖案描繪部4、第一移動機構22a以及第二移動機構22b，藉此使圖案描繪部4進行對於第一台21a以及第二台21b上的基板9的描繪。如後所述，配重移動控制部115係基於Y方向中的第一台21a以及第二台21b的位置控制配重移動機構52，藉此調整平衡配重51的位置。 The imaging control unit 112, the detection unit 113, the drawing control unit 114, and the weight movement control unit 115 are mainly implemented by the processor 101. The imaging control unit 112 controls the imaging unit 3, the first moving mechanism 22a and the second moving mechanism 22b, thereby causing the imaging unit 3 to photograph the upper surface 91 of the substrate 9 on the first stage 21a and the second stage 21b and obtain an image. The image is transmitted and stored in the memory unit 111 . The detection unit 113 uses this image to detect the position of the substrate 9 . The drawing control unit 114 controls the pattern drawing unit 4, the first moving mechanism 22a and the second moving mechanism 22b based on the position of the substrate 9 detected by the detection unit 113 and drawing data stored in the memory unit 111 in advance, thereby causing The pattern drawing unit 4 draws the substrate 9 on the first stage 21a and the second stage 21b. As will be described later, the counterweight movement control unit 115 controls the counterweight movement mechanism 52 based on the positions of the first stage 21 a and the second stage 21 b in the Y direction, thereby adjusting the position of the balance weight 51 .

接著，說明圖1所示的描繪裝置1所為的朝基板9的圖案的描繪之流程。在描繪裝置1中，大概在對被保持於第一台21a以及第二台21b中的一方的台上的基板9進行描繪的期間，將基板9搬入至另一方的台上並進行對準處理等。而且，當結束對於被保持於上述一方的台上的基板9之描繪時，開始對被保持於上述另一方的台上的基板9之描繪。此外，在對該另一方的台上的基板9進行描繪的期間，從一方的台上搬出描繪完畢的基板9，並將新的基板9搬入至該一方的台上並進行對準處理等。 Next, the flow of drawing a pattern on the substrate 9 by the drawing device 1 shown in FIG. 1 will be described. In the drawing device 1 , while the substrate 9 held on one of the first stage 21 a and the second stage 21 b is being drawn, the substrate 9 is loaded onto the other stage and alignment processing is performed. wait. Then, when the drawing on the substrate 9 held on the one stage is completed, the drawing on the substrate 9 held on the other stage is started. In addition, while the substrate 9 on the other stage is being drawn, the patterned substrate 9 is unloaded from one stage, a new substrate 9 is loaded onto the other stage, and alignment processing is performed.

在描繪裝置1中，雖然在對基板9進行上述處理的期間中亦並行地進行配重移動機構52所為的平衡配重51的移動，然而與平衡配重51的移動相關的說明係在結束與以下的圖4A以及圖4B相關的說明後再進行。 In the drawing device 1 , the movement of the balance weight 51 by the weight moving mechanism 52 is also performed in parallel while the above-described processing is performed on the substrate 9 . However, the description of the movement of the balance weight 51 will be concluded at the end. The description related to FIG. 4A and FIG. 4B will be provided below.

圖4A以及圖4B係顯示描繪裝置1中的描繪處理的流程的一例之圖。圖4A以及圖4B中的左側的步驟S11至步驟S19係顯示朝第一台21a上的基板9的描繪處理之流程，圖4A以及圖4B中的右側的步驟S21至步驟S29係顯示朝第二台21b上的基板9的描繪處理之流程。此外，位於圖4A以及圖4B中的上下方向的相同位置之步驟係大致並行地進行。具體而言，步驟S11與步驟S21至步驟S26係大致並行地進行。此外，步驟S28與步驟S13至步驟S18係大致並行地進行。 FIGS. 4A and 4B are diagrams showing an example of the flow of rendering processing in the rendering device 1 . Steps S11 to S19 on the left side in FIGS. 4A and 4B show the flow of the drawing process on the substrate 9 on the first stage 21 a , and steps S21 to S29 on the right side in FIGS. 4A and 4B show the drawing process on the second stage 21 a . The flow of the drawing process of the substrate 9 on the stage 21b. In addition, steps located at the same position in the up-down direction in FIGS. 4A and 4B are generally performed in parallel. Specifically, step S11 and steps S21 to S26 are performed substantially in parallel. In addition, step S28 and steps S13 to S18 are performed substantially in parallel.

在圖4A以及圖4B中，從對第一搬運機構2a的第一台21a上的基板9進行圖案的描繪之狀態開始說明。此外，圖5至圖10係顯示描繪處理中的描繪裝置1中的第一台21a以及第二台21b的Y方向中的概略性的位置之概念圖。在圖5至圖10中，以實線描繪第一台21a、第一移動機構22a、第二台21b以及第二移動機構22b，以虛線描繪拍攝頭31以及描繪頭41。在後述的圖11、圖13至圖18以及圖 20至圖28中亦同樣。此外，在圖11、圖13至圖18以及圖20至圖28中亦以實線描繪平衡配重51。 In FIGS. 4A and 4B , the description starts from a state in which a pattern is drawn on the substrate 9 on the first stage 21 a of the first conveyance mechanism 2 a. In addition, FIGS. 5 to 10 are conceptual diagrams showing schematic positions of the first stage 21 a and the second stage 21 b in the Y direction in the drawing device 1 during drawing processing. In FIGS. 5 to 10 , the first stage 21 a , the first moving mechanism 22 a , the second stage 21 b and the second moving mechanism 22 b are drawn with solid lines, and the imaging head 31 and the drawing head 41 are drawn with dotted lines. In Figures 11, 13 to 18 and Figures described later The same applies to Figures 20 to 28. In addition, the balance weight 51 is also drawn with a solid line in FIGS. 11 , 13 to 18 , and 20 to 28 .

在以下的說明中，針對Y方向中的第一台21a的位置，將於上下方向與拍攝頭31以及/或者描繪頭41重疊的位置稱為「處理位置」，將在上下方向與第一移動機構22a的(-Y)側的端部重疊的位置稱為「搬出搬入位置」，將在上下方向與第一移動機構22a的(+Y)側的端部重疊的位置稱為「待機位置」。此外，針對Y方向中的第二台21b的位置，將於上下方向與拍攝頭31以及/或者描繪頭41重疊的位置稱為「處理位置」，將在上下方向與第二移動機構22b的(-Y)側的端部重疊的位置稱為「搬出搬入位置」，將在上下方向與第二移動機構22b的(+Y)側的端部重疊的位置稱為「待機位置」。此外，上述處理位置並非是指Y方向中的一點之概念，而是指拍攝部3所為的基板9的拍攝以及圖案描繪部4進行圖案的描繪之Y方向的預定的範圍(亦即處理區域)。 In the following description, regarding the position of the first stage 21a in the Y direction, the position that overlaps the imaging head 31 and/or the drawing head 41 in the vertical direction is called the "processing position", and the position that overlaps the first stage 21a in the vertical direction is called the "processing position". The position where the end of the (-Y) side of the mechanism 22a overlaps is called the "carrying-out position", and the position where the end of the first moving mechanism 22a on the (+Y) side overlaps in the vertical direction is called the "standby position" . In addition, regarding the position of the second stage 21b in the Y direction, the position that overlaps the imaging head 31 and/or the drawing head 41 in the vertical direction is called a "processing position", and the position that overlaps the second moving mechanism 22b in the vertical direction is called a "processing position". The position where the end on the -Y) side overlaps is called the "carrying-out position", and the position where the end on the (+Y) side of the second moving mechanism 22b overlaps in the vertical direction is called the "standby position". In addition, the above-mentioned processing position does not refer to the concept of a point in the Y direction, but refers to a predetermined range in the Y direction (that is, the processing area) where the imaging unit 3 photographs the substrate 9 and the pattern drawing unit 4 draws the pattern. .

如圖5所示，在描繪裝置1中，在第一台21a位於處理位置且描繪頭41位於第一描繪位置的狀態下，圖案描繪部4係對第一台21a上的基板9進行圖案的描繪(步驟S11)。在步驟S11中，藉由描繪控制部114(參照圖3)控制圖案描繪部4以及第一移動機構22a，藉此對在處理位置中朝(-Y)方向移動之基板9進行圖案的描繪。 As shown in FIG. 5 , in the drawing device 1 , in a state where the first stage 21 a is located at the processing position and the drawing head 41 is located at the first drawing position, the pattern drawing unit 4 performs patterning on the substrate 9 on the first stage 21 a. Draw (step S11). In step S11, the pattern drawing unit 4 and the first moving mechanism 22a are controlled by the drawing control unit 114 (see FIG. 3), thereby drawing a pattern on the substrate 9 moving in the (-Y) direction in the processing position.

在描繪裝置1中，與步驟S11並行地，從位於搬出搬入位置的第二台21b搬出描繪完畢的基板9，並將新的基板9搬入並保持於第二台21b上(步驟S21、S22)。接著，藉由第二移動機構22b將第二台21b朝(+Y)方向移動並位於如圖6所示的處理位置(步驟S23)。在圖6所示的狀態中，在第一台21a位於處理位置 的狀態下對第一台21a上的基板9進行圖案的描繪。此外，拍攝頭31係位於第二拍攝位置。 In the drawing device 1, in parallel with step S11, the drawn substrate 9 is unloaded from the second stage 21b located at the carry-out position, and a new substrate 9 is carried in and held on the second stage 21b (steps S21, S22) . Next, the second stage 21b is moved in the (+Y) direction by the second moving mechanism 22b and positioned at the processing position as shown in FIG. 6 (step S23). In the state shown in Figure 6, the first station 21a is located at the processing position In this state, the pattern is drawn on the substrate 9 on the first stage 21a. In addition, the shooting head 31 is located at the second shooting position.

當第二台21b位於處理位置時，藉由拍攝控制部112(參照圖3)控制拍攝部3以及第二移動機構22b，藉此進行第二台21b上的基板9的對準標記(省略圖示)之拍攝，並將所取得的影像朝檢測部113(參照圖3)輸送。在檢測部113中，對該影像進行使用了基準影像的圖案匹配(pattern matching)。該圖案匹配係例如藉由公知的圖案匹配法(例如幾何學形狀圖案匹配、正規化相關檢索等)來進行。藉此，求出該影像中的對準標記的位置，檢測出第二台21b上的基板9的位置(步驟S24)。 When the second stage 21b is located at the processing position, the imaging control unit 112 (see FIG. 3 ) controls the imaging unit 3 and the second moving mechanism 22b, thereby performing alignment marks on the substrate 9 on the second stage 21b (illustration omitted). (shown in the figure), and transport the obtained image toward the detection unit 113 (see FIG. 3 ). The detection unit 113 performs pattern matching using a reference image on the image. This pattern matching is performed, for example, by a known pattern matching method (eg, geometric shape pattern matching, normalized correlation search, etc.). Thereby, the position of the alignment mark in the image is obtained, and the position of the substrate 9 on the second stage 21b is detected (step S24).

所謂檢測部113所檢測的基板9的位置係包含第二台21b上的基板9的X方向以及Y方向中的座標、基板9的方向以及用以顯示基板9的應變等所致使之變形之資訊。此外，所謂顯示基板9的變形之資訊為已變形的基板9的形狀以及該基板9上的描繪區域的位置等之資訊。在檢測部113中，基於所檢測的基板9的位置，進行第二台21b上的基板9用的描繪資料的調節(亦即對準處理)。 The position of the substrate 9 detected by the detection unit 113 includes the coordinates of the substrate 9 in the X direction and the Y direction on the second stage 21 b, the direction of the substrate 9, and information used to display the deformation caused by the strain of the substrate 9. . In addition, the information about the deformation of the display substrate 9 is information such as the shape of the deformed substrate 9 and the position of the drawing area on the substrate 9 . In the detection unit 113, based on the detected position of the substrate 9, adjustment (that is, alignment processing) of the drawing data for the substrate 9 on the second stage 21b is performed.

當結束第二台21b上的基板9的拍攝時，藉由第二移動機構22b將第二台21b朝(+Y)方向移動並位於圖7所示的待機位置(步驟S25)。在圖7所示的狀態中，在第一台21a位於處理位置的狀態下對第一台21a上的基板9進行描繪。第二台21b係在待機位置處待機，直至結束對於第一台21a上的基板9的描繪為止(步驟S26)。 When the imaging of the substrate 9 on the second stage 21b is completed, the second stage 21b is moved in the (+Y) direction by the second moving mechanism 22b and positioned at the standby position shown in FIG. 7 (step S25). In the state shown in FIG. 7 , the substrate 9 on the first stage 21 a is drawn with the first stage 21 a located at the processing position. The second stage 21b waits at the standby position until the drawing of the substrate 9 on the first stage 21a is completed (step S26).

當結束對於第一台21a上的基板9之描繪時(步驟S11)，藉由第一移動機構22a將第一台21a朝(-Y)方向移動並位於圖8所示的搬出搬入位置(步驟S12)。此外，與步驟S12並行地，藉由第二移動機構22b將第二台21b朝(-Y)方向 移動並位於處理位置(步驟S27)。此外，拍攝頭31係從第二拍攝位置朝第一拍攝位置移動。描繪頭41係從第一描繪位置朝第二描繪位置移動。而且，基於上述對準處理完畢的描繪資料等，藉由描繪控制部114控制圖案描繪部4以及第二移動機構22b，藉此對處理位置中朝(-Y)方向移動的第二台21b上的基板9進行圖案的描繪(步驟S28)。 When the drawing of the substrate 9 on the first stage 21a is completed (step S11), the first stage 21a is moved in the (-Y) direction by the first moving mechanism 22a and positioned at the unloading and loading position shown in FIG. 8 (step S11). S12). In addition, in parallel with step S12, the second stage 21b is moved in the (-Y) direction by the second moving mechanism 22b. Move and locate at the processing position (step S27). In addition, the imaging head 31 moves from the second imaging position toward the first imaging position. The drawing head 41 moves from the first drawing position toward the second drawing position. Furthermore, based on the above-described alignment-processed drawing data, etc., the drawing control unit 114 controls the pattern drawing unit 4 and the second moving mechanism 22b, whereby the second stage 21b moving in the (-Y) direction in the processing position is The pattern is drawn on the substrate 9 (step S28).

在描繪裝置1中，與朝第二台21b上的基板9之描繪並行地，從位於搬出搬入位置的第一台21a搬出描繪完畢的基板9，並將新的基板9搬入並保持於第一台21a上(步驟S13、S14)。接著，藉由第一移動機構22a將第一台21a朝(+Y)方向移動並位於圖9所示的處理位置(步驟S15)。在圖9所示的狀態中，在第二台21b位於處理位置的狀態下對第二台21b上的基板9進行描繪。 In the drawing device 1, in parallel with the drawing on the substrate 9 on the second stage 21b, the drawn substrate 9 is unloaded from the first stage 21a located at the unloading and unloading position, and a new substrate 9 is carried in and held on the first stage 21b. on the stage 21a (steps S13, S14). Next, the first stage 21a is moved in the (+Y) direction by the first moving mechanism 22a and positioned at the processing position shown in FIG. 9 (step S15). In the state shown in FIG. 9 , the substrate 9 on the second stage 21 b is drawn with the second stage 21 b located at the processing position.

當第一台21a位於處理位置時，藉由拍攝控制部112控制拍攝部3以及第一移動機構22a，藉此藉由拍攝頭31拍攝設置在第一台21a上的基板9的對準標記(省略圖示)，並將所取得的影像朝檢測部113輸送。與步驟S24略同樣地，在檢測部113中，對該影像進行圖案匹配，檢測出第一台21a上的基板9的位置(步驟S16)。在檢測部113中，基於所檢測的基板9的位置，進行描繪至第一台21a上的基板9之預定的圖案資料的調節(亦即對準處理)。 When the first stage 21a is located at the processing position, the imaging control unit 112 controls the imaging unit 3 and the first moving mechanism 22a, thereby using the imaging head 31 to photograph the alignment mark ( (illustration omitted), and transports the acquired image toward the detection unit 113 . In roughly the same manner as step S24, the detection unit 113 performs pattern matching on the image and detects the position of the substrate 9 on the first stage 21a (step S16). In the detection unit 113, based on the detected position of the substrate 9, adjustment (ie, alignment processing) of predetermined pattern data drawn on the substrate 9 on the first stage 21a is performed.

當結束第一台21a上的基板9的拍攝時，藉由第一移動機構22a將第一台21a朝(+Y)方向移動並位於圖10所示的待機位置(步驟S17)。在圖10所示的狀態中，在第二台21b位於處理位置的狀態下對第二台21b上的基板9進行描繪。第一台21a係在待機位置處待機，直至結束對於第二台21b上的基板9的描繪為止(步驟S18)。 When the imaging of the substrate 9 on the first stage 21a is completed, the first stage 21a is moved in the (+Y) direction by the first moving mechanism 22a and positioned at the standby position shown in FIG. 10 (step S17). In the state shown in FIG. 10 , the substrate 9 on the second stage 21 b is drawn with the second stage 21 b located at the processing position. The first stage 21a waits at the standby position until the drawing of the substrate 9 on the second stage 21b is completed (step S18).

當結束對於第二台21b上的基板9之描繪時(步驟S28)，藉由第二移動機構22b將第二台21b朝(-Y)方向移動並位於圖5所示的搬出搬入位置(步驟S29)。此外，與步驟S29並行地，藉由第一移動機構22a將第一台21a朝(-Y)方向移動並位於處理位置(步驟S19)。此外，拍攝頭31係從第一拍攝位置朝第二拍攝位置移動。描繪頭41係從第二描繪位置朝第一描繪位置移動。 When the drawing of the substrate 9 on the second stage 21b is completed (step S28), the second stage 21b is moved in the (-Y) direction by the second moving mechanism 22b and positioned at the unloading and loading position shown in FIG. 5 (step S28). S29). In addition, in parallel with step S29, the first stage 21a is moved in the (-Y) direction by the first moving mechanism 22a and is located at the processing position (step S19). In addition, the imaging head 31 moves from the first imaging position toward the second imaging position. The drawing head 41 moves from the second drawing position toward the first drawing position.

接著，從步驟S19返回至步驟S11，基於上述對準處理完畢的描繪資料等，藉由描繪控制部114控制圖案描繪部4以及第一移動機構22a，藉此對處理位置中朝(-Y)方向移動的第一台21a上的基板9進行圖案的描繪(步驟S11)。此外，從步驟S29返回至步驟S21，從位於搬出搬入位置的第二台21b搬出描繪完畢的基板9，並將新的基板9搬入並保持於第二台21b上(步驟S21、S22)。在描繪裝置1中，重複步驟S11至步驟S19以及步驟S21至步驟S29，對複數個基板9依序地進行描繪。 Next, return to step S11 from step S19. Based on the above-mentioned alignment-processed drawing data, etc., the drawing control unit 114 controls the pattern drawing unit 4 and the first moving mechanism 22a, thereby aligning the processing position toward (-Y). A pattern is drawn on the substrate 9 on the first stage 21a that is moved in the direction (step S11). In addition, returning from step S29 to step S21, the drawn substrate 9 is unloaded from the second stage 21b located at the carry-out position, and a new substrate 9 is carried in and held on the second stage 21b (steps S21, S22). In the drawing device 1 , steps S11 to S19 and steps S21 to S29 are repeated to sequentially draw a plurality of substrates 9 .

如上所述，在圖1所示的描繪裝置1中，在對第一台21a上以及第二台21b上的基板9進行對準處理、描繪處理等之期間，基於第一台21a以及第二台21b的Y方向(亦即基板移動方向)中的位置，藉由配重移動控制部115(參照圖3)控制配重移動機構52，藉此調節平衡配重51的X方向(亦即與基板移動方向垂直的方向)的位置。藉此，抑制第一台21a以及第二台21b的重量所致使之框架7的變形。 As described above, in the drawing device 1 shown in FIG. 1 , while the substrate 9 on the first stage 21 a and the second stage 21 b is subjected to alignment processing, drawing processing, etc., based on the first stage 21 a and the second The position in the Y direction of the stage 21b (that is, the substrate movement direction) is controlled by the weight movement control unit 115 (see FIG. 3) to control the weight movement mechanism 52, thereby adjusting the X direction of the balance weight 51 (that is, with the (direction perpendicular to the direction of movement of the substrate). Thereby, the deformation of the frame 7 caused by the weight of the first stand 21a and the second stand 21b is suppressed.

以下，說明平衡配重51的位置調節的具體例。在以下的例子中，平衡配重51係以位於圖11中以實線以及二點鏈線所示的五個位置中的任一個位置之情形來說明。在圖11中以實線所示的平衡配重51的位置為上述基準位置(亦即X方向中的第一移動機構22a與第二移動機構22b之間的中央)。在以下的說明 中，將上述五個位置中之鄰接於基準位置的(-X)側之位置稱為「第一位置」，將上述五個位置中之鄰接於第一位置的(-X)側之位置稱為「第二位置」。此外，將上述五個位置中之鄰接於基準位置的(+X)側之位置稱為「第三位置」，將上述五個位置中之鄰接於第三位置的(+X)側之位置稱為「第四位置」。 Hereinafter, a specific example of position adjustment of the balance weight 51 will be described. In the following example, the balance weight 51 is described as being located at any one of the five positions shown by the solid line and the two-dot chain line in FIG. 11 . The position of the balance weight 51 shown by the solid line in FIG. 11 is the above-mentioned reference position (that is, the center between the first moving mechanism 22a and the second moving mechanism 22b in the X direction). In the following instructions , among the above five positions, the position on the (-X) side adjacent to the reference position is called the "first position", and among the above five positions, the position on the (-X) side adjacent to the first position is called is the "second position". In addition, among the above five positions, the position on the (+X) side adjacent to the reference position is called the "third position", and among the above five positions, the position on the (+X) side adjacent to the third position is called "the third position". It is the "fourth position".

第一位置為在X方向中比基準位置還靠近第一移動機構22a之位置，第二位置為在X方向中比第一位置還靠近第一移動機構22a之位置。第二位置為在X方向中最遠離第二移動機構22b之位置。此外，第三位置為在X方向中比基準位置還靠近第二移動機構22b之位置，第四位置為在X方向中比第三位置還靠近第二移動機構22b之位置。第四位置為在X方向中最遠離第一移動機構22a之位置。 The first position is a position closer to the first moving mechanism 22a than the reference position in the X direction, and the second position is a position closer to the first moving mechanism 22a than the first position in the X direction. The second position is the position farthest from the second moving mechanism 22b in the X direction. In addition, the third position is a position closer to the second moving mechanism 22b than the reference position in the X direction, and the fourth position is a position closer to the second moving mechanism 22b than the third position in the X direction. The fourth position is the position farthest from the first moving mechanism 22a in the X direction.

在圖11所示的例子中，第二位置為配重移動機構52所致使之平衡配重51的可動範圍中的(-X)側的端部。第一位置為第二位置與基準位置之間的X方向中的中央的位置。此外，第四位置為配重移動機構52所致使之平衡配重51的可動範圍中的(+X)側的端部。第三位置為第四位置與基準位置之間的X方向中的中央的位置。 In the example shown in FIG. 11 , the second position is the end on the (-X) side of the movable range of the balance weight 51 caused by the weight moving mechanism 52 . The first position is the center position in the X direction between the second position and the reference position. In addition, the fourth position is the end on the (+X) side of the movable range of the balance weight 51 caused by the weight moving mechanism 52 . The third position is the center position in the X direction between the fourth position and the reference position.

圖12係顯示平衡配重51的位置調節的流程的第一例之圖。在該第一例中，在正在對第一台21a以及第二台21b中之一方的台上的基板9進行描繪的狀態下，基於另一方的台的位置調節平衡配重51的位置。例如，在對第一台21a上的基板9進行描繪且第二台21b位於搬出搬入位置之狀態(與步驟S11、步驟S21至步驟S22以及圖5對應)下，如圖13所示平衡配重51係位於第二位置(步驟S31)。 FIG. 12 is a diagram showing a first example of the flow of position adjustment of the balance weight 51 . In this first example, while the substrate 9 on one of the first stage 21a and the second stage 21b is being drawn, the position of the balance weight 51 is adjusted based on the position of the other stage. For example, in a state where the substrate 9 on the first stage 21a is being drawn and the second stage 21b is in the unloading and unloading position (corresponding to step S11, step S21 to step S22 and FIG. 5), the balance weight is as shown in FIG. 13 51 is located at the second position (step S31).

此外，在對第一台21a上的基板9進行描繪且第二台21b位於處理位置的狀態(與步驟S11、步驟S24以及圖6對應)下，如圖14所示平衡配重51係位 於第一位置(步驟S32)。而且，在對第一台21a上的基板9進行描繪且第二台21b位於待機位置的狀態(與步驟S11、步驟S26以及圖7對應)下，如圖15所示平衡配重51係位於基準位置(步驟S33)。 In addition, in a state where the substrate 9 on the first stage 21a is being drawn and the second stage 21b is located at the processing position (corresponding to step S11, step S24 and FIG. 6), the balance weight 51 is positioned as shown in FIG. 14 at the first position (step S32). Furthermore, in a state where the substrate 9 on the first stage 21a is being drawn and the second stage 21b is in the standby position (corresponding to step S11, step S26 and FIG. 7), the balance weight 51 is located at the reference position as shown in FIG. 15. position (step S33).

如上述圖13所示，在第二台21b位於框架7的剛性低之搬出搬入位置之情形中，會有因為第二台21b的重量導致框架7以框架7的(+X)側及(-Y)側的部位朝下方下沉之方式產生變形(亦即應變)之可能性。因此，如步驟S31所示，使平衡配重51位於最靠近(-X)側的第二位置，藉此抵銷或者部分地消除從第二台21b被賦予至框架7之變形力矩(亦即以將在第一移動機構22a與第二移動機構22b之間的中央處於Y方向延伸之軸作為中心扭轉框架7之方式使框架7變形之力矩)，藉此防止或者抑制框架7的變形。 As shown in FIG. 13 above, when the second stand 21b is located at the move-in/out position where the rigidity of the frame 7 is low, the weight of the second stand 21b may cause the frame 7 to move from the (+X) side of the frame 7 to the (- There is a possibility of deformation (i.e. strain) caused by the part on the Y) side sinking downward. Therefore, as shown in step S31, the balance weight 51 is located at the second position closest to the (-X) side, thereby offsetting or partially eliminating the deformation moment imparted to the frame 7 from the second stage 21b (i.e. The moment (moment to deform the frame 7) is used to twist the frame 7 with the axis extending in the Y direction at the center between the first moving mechanism 22a and the second moving mechanism 22b as the center, thereby preventing or suppressing the deformation of the frame 7.

此外，如圖14所示，在第二台21b位於框架7的剛性比搬出搬入位置還高的處理位置之情形中，第二台21b的重量所致使之框架7的變形量係比圖13的狀態還小。因此，如步驟S32所示，使平衡配重51位於比第二位置還靠近基準位置的第一位置，藉此抵銷或者部分地消除從第二台21b被賦予至框架7之變形力矩，藉此防止或者抑制框架7的變形。 In addition, as shown in FIG. 14 , when the second stage 21 b is located at a processing position where the rigidity of the frame 7 is higher than the loading/unloading position, the deformation amount of the frame 7 due to the weight of the second stage 21 b is larger than that of FIG. 13 The status is still small. Therefore, as shown in step S32, the balance weight 51 is positioned at a first position that is closer to the reference position than the second position, thereby offsetting or partially eliminating the deformation moment imparted to the frame 7 from the second stage 21b. This prevents or inhibits deformation of the frame 7 .

再者，如圖15所示，在第二台21b位於框架7的剛性比處理位置還高的待機位置之情形中，幾乎不會產生第二台21b的重量所致使之框架7的變形。因此，如步驟S33所示，使平衡配重51位於基準位置，藉此能防止因為平衡配重51的重量所致使之框架7的變形。 Furthermore, as shown in FIG. 15 , when the second stage 21 b is located at the standby position where the rigidity of the frame 7 is higher than that of the processing position, the frame 7 is hardly deformed due to the weight of the second stage 21 b. Therefore, as shown in step S33, the balance weight 51 is positioned at the reference position, thereby preventing the frame 7 from deforming due to the weight of the balance weight 51.

在描繪裝置1中，在第一台21a位於處理位置且對第一台21a上的基板9進行描繪的狀態(步驟S11)下，進行步驟S31至步驟S33的平衡配重51的位置調節，從而防止或者抑制框架7的變形。結果，能防止或者抑制框架7的變形對朝 第一台21a上的基板9之描繪造成不良影響，從而能精度佳地對該基板9進行描繪。 In the drawing device 1, in a state where the first stage 21a is located at the processing position and the substrate 9 on the first stage 21a is being drawn (step S11), the position adjustment of the balance weight 51 from steps S31 to S33 is performed, so that The deformation of the frame 7 is prevented or suppressed. As a result, the deformation of the frame 7 can be prevented or suppressed. This adversely affects the drawing of the substrate 9 on the first stage 21a, so that the substrate 9 can be drawn with high accuracy.

另一方面，在對第二台21b上的基板9進行描繪且第一台21a位於搬出搬入位置之狀態(與步驟S13、步驟S14、步驟S28以及圖8對應)下，如圖16所示平衡配重51係位於第四位置(步驟S34)。此外，在對第二台21b上的基板9進行描繪且第一台21a位於處理位置之狀態(與步驟S16、步驟S28以及圖9對應)下，如圖17所示平衡配重51係位於第三位置(步驟S35)。而且，在對第二台21b上的基板9進行描繪且第一台21a位於待機位置之狀態(與步驟518、步驟S28以及圖10對應)下，如圖18所示平衡配重51係位於基準位置(步驟S36)。 On the other hand, in a state where the substrate 9 on the second stage 21b is drawn and the first stage 21a is in the carry-out position (corresponding to step S13, step S14, step S28 and FIG. 8), the balance is shown in FIG. 16 The counterweight 51 is located at the fourth position (step S34). In addition, in a state where the substrate 9 on the second stage 21b is being drawn and the first stage 21a is located at the processing position (corresponding to step S16, step S28 and FIG. 9), the balance weight 51 is located at the first stage as shown in FIG. 17. Three positions (step S35). Furthermore, when the substrate 9 on the second stage 21b is being drawn and the first stage 21a is in the standby position (corresponding to step 518, step S28 and FIG. 10), the balance weight 51 is located at the reference position as shown in FIG. 18. position (step S36).

如上述圖16所示，在第一台21a位於框架7的剛性低之搬出搬入位置之情形中，會有因為第一台21a的重量導致框架7以框架7的(-X)側及(-Y)側的部位朝下方下沉之方式產生變形(亦即應變)之可能性。因此，如步驟S34所示，使平衡配重51位於最靠近(+X)側的第四位置，藉此抵銷或者部分地消除從第一台21a被賦予至框架7之變形力矩，藉此防止或者抑制框架7的變形。 As shown in FIG. 16 above, when the first stand 21a is located at the move-in/out position where the rigidity of the frame 7 is low, the weight of the first stand 21a may cause the frame 7 to move from the (-X) side of the frame 7 to the (- There is a possibility of deformation (i.e. strain) caused by the part on the Y) side sinking downward. Therefore, as shown in step S34, the balance weight 51 is located at the fourth position closest to the (+X) side, thereby offsetting or partially eliminating the deformation moment imparted to the frame 7 from the first stage 21a, thereby The deformation of the frame 7 is prevented or suppressed.

此外，如圖17所示，在第一台21a位於框架7的剛性比搬出搬入位置還高的處理位置之情形中，第一台21a的重量所致使之框架7的變形量係比圖16的狀態還小。因此，如步驟S35所示，使平衡配重51位於比第四位置還靠近基準位置的第三位置，藉此抵銷或者部分地消除從第一台21a被賦予至框架7之變形力矩，藉此防止或者抑制框架7的變形。 Furthermore, as shown in FIG. 17 , when the first stage 21 a is located at a processing position where the rigidity of the frame 7 is higher than the loading/unloading position, the deformation amount of the frame 7 due to the weight of the first stage 21 a is larger than that of FIG. 16 The status is still small. Therefore, as shown in step S35, the balance weight 51 is positioned at a third position closer to the reference position than the fourth position, thereby offsetting or partially eliminating the deformation moment imparted to the frame 7 from the first stage 21a. This prevents or inhibits deformation of the frame 7 .

再者，如圖18所示，在第一台21a位於框架7的剛性比處理位置還高的待機位置之情形中，幾乎不會產生第一台21a的重量所致使之框架7的變 形。因此，如步驟S36所示，使平衡配重51位於基準位置，藉此能防止因為平衡配重51的重量所致使之框架7的變形。 Furthermore, as shown in Fig. 18, when the first stage 21a is located at the standby position where the rigidity of the frame 7 is higher than that of the processing position, there is almost no deformation of the frame 7 due to the weight of the first stage 21a. shape. Therefore, as shown in step S36, the balance weight 51 is positioned at the reference position, thereby preventing the frame 7 from being deformed due to the weight of the balance weight 51.

在描繪裝置1中，在第二台21b位於處理位置且對第二台21b上的基板9進行描繪的狀態(步驟S28)下，進行步驟S34至步驟S36的平衡配重51的位置調節，從而防止或者抑制框架7的變形。結果，能防止或者抑制框架7的變形對朝第二台21b上的基板9之描繪造成不良影響，從而能精度佳地對該基板9進行描繪。 In the drawing device 1, in a state where the second stage 21b is located at the processing position and the substrate 9 on the second stage 21b is being drawn (step S28), the position adjustment of the balance weight 51 from steps S34 to S36 is performed, so that The deformation of the frame 7 is prevented or suppressed. As a result, it is possible to prevent or suppress deformation of the frame 7 from adversely affecting the drawing on the substrate 9 on the second stage 21 b, so that the substrate 9 can be drawn with high accuracy.

圖19係顯示平衡配重51的位置調節的流程的第二例之圖。在該第二例中，基於第一台21a以及第二台21b的Y方向中的位置的差來調節平衡配重51的位置。例如，在第一台21a位於處理位置且第二台21b位於比第一台21a還靠近(-Y)側的搬出搬入位置的狀態(與步驟S11、步驟S21至步驟S22以及圖5對應)下，如圖20所示平衡配重51係位於第一位置(步驟S41)。此外，在對第一台21a以及第二台21b位於處理位置的狀態(與步驟S11、步驟S24以及圖6對應)下，如圖21所示平衡配重51係位於基準位置(步驟S42)。 FIG. 19 is a diagram showing a second example of the flow of position adjustment of the balance weight 51 . In this second example, the position of the balance weight 51 is adjusted based on the difference in the positions of the first stage 21a and the second stage 21b in the Y direction. For example, in a state where the first stage 21a is located at the processing position and the second stage 21b is located at the carry-out position closer to the (-Y) side than the first stage 21a (corresponding to step S11, step S21 to step S22 and FIG. 5) , as shown in Figure 20, the balance weight 51 is located at the first position (step S41). In addition, when the first stage 21a and the second stage 21b are located at the processing position (corresponding to steps S11, S24 and FIG. 6), the balance weight 51 is located at the reference position as shown in FIG. 21 (step S42).

接著，在第一台21a位於處理位置且第二台21b位於比第一台21a還靠近(+Y)側的待機位置的狀態(與步驟S11、步驟S26以及圖7對應)下，如圖22所示平衡配重51係位於第三位置(步驟S43)。此外，在第一台21a位於搬出搬入位置且第二台21b位於比第一台21a還靠近(+Y)側的處理位置的狀態(與步驟S13至步驟S14、步驟S28以及圖8對應)下，如圖23所示平衡配重51係不會從第三位置移動。 Next, in a state where the first stage 21a is located at the processing position and the second stage 21b is located at the standby position closer to the (+Y) side than the first stage 21a (corresponding to step S11, step S26 and FIG. 7), as shown in FIG. 22 The balance weight 51 is shown in the third position (step S43). In addition, in a state where the first stage 21a is located at the carry-in and carry-out position and the second stage 21b is located at a processing position closer to the (+Y) side than the first stage 21a (corresponding to steps S13 to S14, step S28 and FIG. 8) , as shown in Figure 23, the balance weight 51 will not move from the third position.

接著，在第一台21a以及第二台21b位於處理位置的狀態(與步驟S16、步驟S28以及圖9對應)下，如圖24所示平衡配重51係位於基準位置(步驟 S44)。而且，在第一台21a位於待機位置且第二台21b位於比第一台21a還靠近(-Y)側的處理位置的狀態(與步驟S18、步驟S28以及圖10對應)下，如圖25所示平衡配重51係位於第一位置(步驟S45)。 Next, in a state where the first stage 21a and the second stage 21b are located at the processing position (corresponding to steps S16, S28, and FIG. 9), the balance weight 51 is located at the reference position as shown in FIG. 24 (step S16, S28, and FIG. 9). S44). Furthermore, in a state where the first stage 21a is in the standby position and the second stage 21b is in a processing position closer to the (-Y) side than the first stage 21a (corresponding to step S18, step S28 and FIG. 10), as shown in FIG. 25 The balance weight 51 is shown in the first position (step S45).

如上述圖20所示，在第二台21b相對於第一台21a位於框架7的剛性低之(-Y)側之情形中，會有因為從第一台21a被賦予至框架7的變形力矩與從第二台21b被賦予至框架7的變形力矩的差導致框架7以框架7的(+X)側及(-Y)側的部位朝下方下沉之方式產生變形(亦即應變)之可能性。因此，如步驟S41所示，使平衡配重51位於比基準位置還靠近(-X)側的第一位置，藉此抵銷或者部分地消除上述變形力矩的差，藉此防止或者抑制框架7的變形。針對圖25亦大致相同。 As shown in FIG. 20 above, when the second stand 21b is located on the (-Y) side of the frame 7 with low rigidity relative to the first stand 21a, there will be a deformation moment imparted to the frame 7 from the first stand 21a. The difference between the deformation moment imparted to the frame 7 from the second stage 21 b causes the frame 7 to deform (ie, strain) in such a manner that the (+X) side and (-Y) side parts of the frame 7 sink downward. possibility. Therefore, as shown in step S41, the balance weight 51 is positioned at a first position closer to the (-X) side than the reference position, thereby offsetting or partially eliminating the difference in deformation moment, thereby preventing or suppressing the frame 7 of deformation. The same applies to Figure 25.

此外，如圖21所示，在第一台21a與第二台21b位於Y方向的大致相同的位置之情形中，由於幾乎沒有上述變形力矩的差，因此幾乎不會產生框架7的變形。因此，如步驟S42所示，使平衡配重51位於基準位置，藉此防止平衡配重51的重量所致使之框架7的變形。針對圖24亦大致相同。 Furthermore, as shown in FIG. 21 , when the first stage 21 a and the second stage 21 b are located at substantially the same position in the Y direction, there is almost no difference in the deformation moment, so the frame 7 is hardly deformed. Therefore, as shown in step S42, the balance weight 51 is positioned at the reference position, thereby preventing the frame 7 from deforming due to the weight of the balance weight 51. The same is true for Figure 24 .

如上述圖22以及圖23所示，在第一台21a相對於第二台21b位於框架7的剛性低之(-Y)側之情形中，會有因為上述變形力矩的差導致框架7以框架7的(-X)側及(-Y)側的部位朝下方下沉之方式產生變形(亦即應變)之可能性。因此，如步驟S43所示，使平衡配重51位於比基準位置還靠近(+X)側的第三位置，藉此抵銷或者部分地消除上述變形力矩的差，藉此防止或者抑制框架7的變形。 As shown in FIGS. 22 and 23 above, when the first stand 21a is located on the (-Y) side of the frame 7 with lower rigidity relative to the second stand 21b, the frame 7 may be bent to the frame due to the difference in deformation moment. The parts on the (-X) side and (-Y) side of 7 may deform (i.e., strain) by sinking downward. Therefore, as shown in step S43, the balance weight 51 is positioned at a third position closer to the (+X) side than the reference position, thereby offsetting or partially eliminating the difference in deformation moment, thereby preventing or suppressing the frame 7 of deformation.

此外，在平衡配重51的位置調節的第二例中，步驟S41、S45中的平衡配重51的位置亦可為第二位置。此外，步驟S43中的平衡配重51的位置亦可為第四位置。 In addition, in the second example of position adjustment of the balance weight 51, the position of the balance weight 51 in steps S41 and S45 may also be the second position. In addition, the position of the balance weight 51 in step S43 may also be the fourth position.

如以上所說明般，用以對基板9進行描繪之描繪裝置1係具備圖案描繪部4、第一基板保持部(亦即第一台21a)、第一移動機構22a、第二基板保持部(亦即第二台21b)、第二移動機構22b、框架7、平衡配重51、配重移動機構52以及配重移動控制部115。圖案描繪部4係對在下方水平移動之基板9的上側的主表面(亦即上表面91)照射光線並描繪圖案。第一移動機構22a係在圖案描繪部4的下方將第一台21a於基板移動方向(在上述例子中為Y方向)水平移動。第二台21b係鄰接地配置於第一台21a。第二移動機構22b係在圖案描繪部4的下方將第二台21b於基板移動方向水平移動。第二移動機構22b係在與基板移動方向交叉之方向(在上述例子中為X方向)中與第一移動機構22a排列地配置。 As described above, the drawing device 1 for drawing the substrate 9 includes the pattern drawing part 4, the first substrate holding part (that is, the first stage 21a), the first moving mechanism 22a, the second substrate holding part ( That is, the second stage 21b), the second moving mechanism 22b, the frame 7, the balance weight 51, the counterweight moving mechanism 52 and the counterweight movement control unit 115. The pattern drawing unit 4 irradiates light onto the upper main surface (that is, the upper surface 91 ) of the substrate 9 that moves horizontally downward, and draws a pattern. The first moving mechanism 22a moves the first stage 21a horizontally in the substrate moving direction (Y direction in the above example) below the pattern drawing unit 4. The second unit 21b is arranged adjacent to the first unit 21a. The second moving mechanism 22b moves the second stage 21b horizontally in the substrate moving direction below the pattern drawing unit 4. The second moving mechanism 22b is arranged aligned with the first moving mechanism 22a in the direction intersecting the substrate moving direction (in the above example, the X direction).

框架7係支撐第一移動機構22a以及第二移動機構22b。平衡配重51係能夠於與基板移動方向交叉之配重移動方向(在上述例子中為X方向)移動地安裝於框架7。配重移動機構52係將平衡配重51於配重移動方向移動。配重移動控制部115係基於基板移動方向中的第一台21a以及第二台21b的位置來控制配重移動機構52，俾使平衡配重51配置於用以抑制第一台21a以及第二台21b的重量導致框架7的變形之位置。藉此，能抑制框架7的變形對朝基板9之描繪造成不良影響，從而能精度佳地對該基板9進行描繪。 The frame 7 supports the first moving mechanism 22a and the second moving mechanism 22b. The balance weight 51 is attached to the frame 7 so as to be movable in the weight movement direction (X direction in the above example) crossing the substrate movement direction. The counterweight moving mechanism 52 moves the balance weight 51 in the counterweight moving direction. The counterweight movement control unit 115 controls the counterweight movement mechanism 52 based on the positions of the first stage 21a and the second stage 21b in the substrate movement direction so that the balance weight 51 is disposed to suppress the first stage 21a and the second stage 21b. The weight of the table 21b causes the frame 7 to deform its position. This prevents the deformation of the frame 7 from adversely affecting the drawing on the substrate 9 and allows the substrate 9 to be drawn with high accuracy.

如上所述，較佳為配重移動方向係與基板移動方向垂直。藉此，與在從平衡配重51對框架7賦予預定的變形力矩時配重移動方向相對於基板移動方向斜向地傾斜之情形相比，能縮小平衡配重51從基準位置起的移動距離。結果，能簡化描繪裝置1的構造並抑制描繪裝置1的大型化。 As mentioned above, it is preferable that the moving direction of the counterweight is perpendicular to the moving direction of the substrate. This allows the movement distance of the balance weight 51 from the reference position to be reduced compared to the case where the weight movement direction is obliquely inclined with respect to the substrate movement direction when a predetermined deformation moment is applied from the balance weight 51 to the frame 7 . As a result, the structure of the drawing device 1 can be simplified and the increase in the size of the drawing device 1 can be suppressed.

如上所述，較佳為平衡配重51的重心係在上下方向(亦即Z方向)中位於第一台21a的上表面以及第二台21b的上表面還下側。藉此，能抑制平衡 配重51的移動所致使之框架7、第一台21a以及第二台21b的振動。結果，能提升對於基板9之描繪的精度。 As mentioned above, it is preferable that the center of gravity of the balance weight 51 is located below the upper surface of the first platform 21a and the upper surface of the second platform 21b in the up-down direction (that is, the Z direction). In this way, the balance can be suppressed The movement of the counterweight 51 causes the frame 7, the first platform 21a, and the second platform 21b to vibrate. As a result, the accuracy of drawing on the substrate 9 can be improved.

如上所述，較佳為平衡配重51的上端係在上下方向中位於比第一台21a的上表面以及第二台21b的上表面還下側。藉此，能防止因為平衡配重51阻礙基板9朝第一台21a以及第二台21b搬出以及搬入。 As mentioned above, it is preferable that the upper end of the balance weight 51 is located lower than the upper surface of the first stage 21a and the upper surface of the second stage 21b in the up-down direction. This can prevent the counterweight 51 from hindering the unloading and loading of the substrate 9 into the first stage 21a and the second stage 21b.

在上述描繪裝置1中，框架7係具備：高架部74，係跨越第一移動機構22a以及第二移動機構22b，並支撐圖案描繪部4。高架部74係從第一移動機構22a以及第二移動機構22b的基板移動方向中的中央部的上方朝基板移動方向的一側(在上述例子中為(+Y)側)延伸。第一移動機構22a以及第二移動機構22b係從高架部74朝基板移動方向的另一側(在上述例子中為(-Y)側)突出。較佳為平衡配重51係於基板移動方向的上述另一側與第一移動機構22a以及第二移動機構22b鄰接地配置。如此，將平衡配重51相對於第一移動機構22a以及第二移動機構22b之相對位置設定成框架7的剛性變得比其他的部位還低之可能性高之(-Y)側(亦即基板移動方向的上述另一側)，藉此能在第一台21a或者第二台21b朝(-Y)側移動導致框架7的變形變大之情形中效率佳地抑制框架7的變形。 In the above-mentioned drawing device 1, the frame 7 is provided with an elevated portion 74 that straddles the first moving mechanism 22a and the second moving mechanism 22b and supports the pattern drawing portion 4. The elevated portion 74 extends from above the central portion of the first moving mechanism 22 a and the second moving mechanism 22 b in the substrate moving direction toward one side in the substrate moving direction (the (+Y) side in the above example). The first moving mechanism 22a and the second moving mechanism 22b protrude from the elevated portion 74 toward the other side in the substrate moving direction (the (-Y) side in the above example). It is preferable that the balance weight 51 is disposed adjacent to the first moving mechanism 22a and the second moving mechanism 22b on the other side in the substrate moving direction. In this way, the relative position of the balance weight 51 with respect to the first moving mechanism 22a and the second moving mechanism 22b is set to the (-Y) side (that is, the possibility that the rigidity of the frame 7 becomes lower than other parts is high). (the other side of the substrate moving direction), thereby effectively suppressing the deformation of the frame 7 when the first stage 21a or the second stage 21b moves toward the (-Y) side and the deformation of the frame 7 increases.

在上述描繪裝置1中，框架7的剛性係以第一移動機構22a以及第二移動機構22b的基板移動方向中的一側(在上述例子中為(+Y)側)的端部、中央部以及另一側(在上述例子中為(-Y)側)的端部之順序降低。平衡配重51係於基板移動方向的另一側與第一移動機構22a以及第二移動機構22b鄰接地配置。 In the above-mentioned drawing device 1, the rigidity of the frame 7 is determined by the end portions and the center portion of one side (the (+Y) side in the above example) of the first moving mechanism 22a and the second moving mechanism 22b in the substrate moving direction. And the order of the end on the other side (the (-Y) side in the above example) decreases. The balance weight 51 is disposed adjacent to the first moving mechanism 22a and the second moving mechanism 22b on the other side in the substrate moving direction.

而且，在平衡配重51的位置調節的第一例(參照圖12至圖18)中，第一台21a係在位於進行圖案描繪部4所為的描繪之位置的狀態下，在第二台21b位於基板移動方向中的上述一側的端部(在上述例子中為待機位置)時，平衡配重 51係位於配重移動方向(在上述例子中為X方向)中的第一移動機構22a與第二移動機構22b之間的中央的基準位置；在第二台21b位於基板移動方向中的中央部(在上述例子中為處理位置)時，平衡配重51係位於比基準位置還靠近第一移動機構22a的第一位置；在第二台21b位於基板移動方向中的上述另一側的端部(在上述例子中為搬出搬入位置)時，平衡配重51係位於比第一位置還靠近第一移動機構22a的第二位置。藉此，在對第一台21a上的基板9進行描繪之期間，與第二台21b的基板移動方向中的位置無關地能抑制框架7的變形。結果，能效率佳地對第一台21a上的基板9進行描繪。 Furthermore, in the first example of position adjustment of the balance weight 51 (refer to FIGS. 12 to 18 ), the first stage 21 a is in a state where drawing by the pattern drawing section 4 is performed, and the second stage 21 b When it is located at the end of the above-mentioned side in the direction of movement of the substrate (in the above example, the standby position), the balance weight 51 is a reference position located at the center between the first moving mechanism 22a and the second moving mechanism 22b in the direction of movement of the counterweight (in the above example, the X direction); the second stage 21b is located at the center in the direction of movement of the substrate. (in the above example, the processing position), the balance weight 51 is located at a first position closer to the first moving mechanism 22a than the reference position; when the second stage 21b is located at the other end of the substrate moving direction (In the above example, it is the carry-in position), the balance weight 51 is located at the second position closer to the first moving mechanism 22a than the first position. Thereby, while drawing the substrate 9 on the first stage 21a, deformation of the frame 7 can be suppressed regardless of the position in the substrate movement direction of the second stage 21b. As a result, the substrate 9 on the first stage 21a can be efficiently drawn.

此外，在上述第一例中，第二台21b係在位於進行圖案描繪部4所為的描繪之位置的狀態下，在第一台21a位於基板移動方向中的上述一側的端部(在上述例子中為待機位置)時，平衡配重51係位於上述基準位置；在第一台21a位於基板移動方向中的中央部(在上述例子中為處理位置)時，平衡配重51係位於比基準位置還靠近第二移動機構22b的第三位置；在第一台21a位於基板移動方向中的上述另一側的端部(在上述例子中為搬出搬入位置)時，平衡配重51係位於比第三位置還靠近第二移動機構22b的第四位置。藉此，在對第二台21b上的基板9進行描繪之期間，與第一台21a的基板移動方向中的位置無關地能抑制框架7的變形。結果，能效率佳地對第二台21b上的基板9進行描繪。 In addition, in the above-described first example, the second stage 21b is located at the position where the pattern drawing section 4 performs drawing, and the end portion of the first stage 21a located on the side in the substrate moving direction (in the above-mentioned position) When the first stage 21a is located at the center in the substrate moving direction (the processing position in the above example), the balance weight 51 is located at the reference position. The position is also close to the third position of the second moving mechanism 22b; when the first stage 21a is located at the end of the other side in the substrate moving direction (in the above example, the unloading and loading position), the balance weight 51 is located at a ratio of The third position is also close to the fourth position of the second moving mechanism 22b. Thereby, while drawing the substrate 9 on the second stage 21b, deformation of the frame 7 can be suppressed regardless of the position in the substrate movement direction of the first stage 21a. As a result, the substrate 9 on the second stage 21b can be efficiently drawn.

如上所述，框架7的剛性係以第一移動機構22a以及第二移動機構22b的基板移動方向中的一側(在上述例子中為(+Y)側)的端部、中央部以及另一側(在上述例子中為(-Y)側)的端部之順序降低。平衡配重51係於基板移動方向的另一側與第一移動機構22a以及第二移動機構22b鄰接地配置。 As described above, the rigidity of the frame 7 is determined by the end portions, the center portion and the other side of one side (the (+Y) side in the above example) of the first moving mechanism 22a and the second moving mechanism 22b in the substrate moving direction. The order of the ends of the side (the (-Y) side in the above example) decreases. The balance weight 51 is disposed adjacent to the first moving mechanism 22a and the second moving mechanism 22b on the other side in the substrate moving direction.

而且，在平衡配重51的位置調節的第二例(參照圖19至圖25)中，在第一台21a以及第二台21b位於基板移動方向中的相同的位置時，平衡配重51係位於配重移動方向(在上述例子中為X方向)中的第一移動機構22a與第二移動機構22b之間的中央的基準位置，在第二台21b位於比第一台21a還靠近基板移動方向中的上述另一側時，平衡配重51係位於比基準位置還靠近第一移動機構22a的位置(在上述例子中為第一位置)，在第二台21b位於比第一台21a還靠近基板移動方向中的上述一側時，平衡配重51係位於比基準位置還靠近第二移動機構22b的位置(在上述例子中為第三位置)。藉此，能抑制基板移動方向中的第一台21a以及第二台21b的位置的差所致使之框架7的變形。結果，能精度佳地對第一台21a上的基板9以及第二台21b上的基板9進行各種處理(例如基板9的搬出搬入、對準處理以及描繪處理)。 Furthermore, in the second example of position adjustment of the balance weight 51 (see FIGS. 19 to 25 ), when the first stage 21 a and the second stage 21 b are located at the same position in the substrate movement direction, the balance weight 51 is The reference position located in the center between the first moving mechanism 22a and the second moving mechanism 22b in the direction of movement of the counterweight (in the above example, the X direction) moves the second stage 21b closer to the substrate than the first stage 21a. On the other side of the direction, the balance weight 51 is located closer to the first moving mechanism 22a than the reference position (the first position in the above example), and the second stage 21b is located further than the first stage 21a. When approaching the above-mentioned side in the substrate moving direction, the balance weight 51 is located at a position closer to the second moving mechanism 22b than the reference position (the third position in the above example). This can suppress the deformation of the frame 7 caused by the difference in the positions of the first stage 21a and the second stage 21b in the substrate movement direction. As a result, various processes (such as loading and unloading of the substrate 9, alignment processing, and drawing processing) can be performed with high accuracy on the substrate 9 on the first stage 21a and the substrate 9 on the second stage 21b.

如上所述，較佳為圖案描繪部4係具備描繪頭41以及描繪頭移動機構42。描繪頭41係朝向下方照射光線。描繪頭移動機構42係使描繪頭41在第一移動機構22a的上方的第一描繪位置與第二移動機構22b的上方的第二描繪位置之間移動。如此，藉由共通的描繪頭41進行對於第一台21a上的基板9之描繪以及對於第二台21b上的基板9之描繪，藉此能將描繪裝置1的構造簡化從而能將描繪裝置1小型化。 As described above, it is preferable that the pattern drawing unit 4 includes the drawing head 41 and the drawing head moving mechanism 42 . The drawing head 41 irradiates light downward. The drawing head moving mechanism 42 moves the drawing head 41 between a first drawing position above the first moving mechanism 22a and a second drawing position above the second moving mechanism 22b. In this way, by using the common drawing head 41 to draw the substrate 9 on the first stage 21a and the substrate 9 on the second stage 21b, the structure of the drawing device 1 can be simplified and the drawing device 1 can be miniaturization.

在上述描繪裝置1中能夠進行各種變更。 Various modifications can be made to the above-mentioned drawing device 1 .

例如，平衡配重51的上端亦可位於比第一台21a的上表面以及第二台21b的上表面還上側或者上下方向的相同的位置。或者，平衡配重51的重心亦可位於第一台21a的上表面以及第二台21b的上表面還上側或者上下方向的相同的位置。 For example, the upper end of the balance weight 51 may be located above the upper surface of the first stage 21a and the upper surface of the second stage 21b or at the same position in the up-down direction. Alternatively, the center of gravity of the balance weight 51 may be located at the same position above the upper surface of the first base 21a and the upper surface of the second base 21b or in the up-down direction.

在描繪裝置1中，平衡配重51並不一定需要鄰接地配置於第一移動機構22a以及第二移動機構22b的(-Y)側，亦可配置於其他各種位置。例如，平衡配重51亦可配置於第一移動機構22a以及第二移動機構22b的(-Y)側的端部的鉛直下方。在此情形中，能將描繪裝置1的設置空間予以小型化。 In the drawing device 1, the balance weight 51 does not necessarily need to be disposed adjacent to the (-Y) side of the first moving mechanism 22a and the second moving mechanism 22b, and may be disposed at various other positions. For example, the balance weight 51 may be disposed vertically below the ends on the (-Y) side of the first moving mechanism 22a and the second moving mechanism 22b. In this case, the installation space of the drawing device 1 can be reduced in size.

在描繪裝置1中，用以支撐拍攝部3以及圖案描繪部4之高架部74(亦即第一高架部72以及第二高架部73)的配置並未限定於圖1所示的例子，亦可進行各種變更。例如，第一移動機構22a以及第二移動機構22b並不一定需要從高架部74朝(-Y)側突出。此外，第一高架部72以及第二高架部73亦可為一體的構件。拍攝部3以及圖案描繪部4亦可被高架部74以外的構造支撐。 In the drawing device 1 , the arrangement of the elevated portion 74 (that is, the first elevated portion 72 and the second elevated portion 73 ) for supporting the imaging unit 3 and the pattern drawing unit 4 is not limited to the example shown in FIG. 1 . Various changes are possible. For example, the first moving mechanism 22 a and the second moving mechanism 22 b do not necessarily need to protrude toward the (-Y) side from the elevated portion 74 . In addition, the first elevated portion 72 and the second elevated portion 73 may also be an integral component. The imaging unit 3 and the pattern drawing unit 4 may be supported by structures other than the elevated portion 74 .

框架7的基板移動方向中的剛性並不一定需要以(+Y)側的端部、中央部以及(-Y)側的端部依序變低，亦可進行各種變更。此外，框架7亦可為從下方例如被三點支撐之構造。當減少從下方支撐框架7之部位時，變得容易產生框架7的變形。然而，藉由平衡配重51的位置調節來抑制框架7的變形，藉此即使在以被限制的部位(例如三點)支撐框架7之情形中，亦能精度佳地對第一台21a上的基板9以及第二台21b上的基板9進行各種處理(例如基板9的搬出搬入、對準處理以及描繪處理)。 The rigidity of the frame 7 in the substrate moving direction does not necessarily need to decrease in order from the (+Y) side end, the center part, and the (-Y) side end, and may be variously changed. In addition, the frame 7 may also have a structure supported from below, for example, at three points. When the number of parts supporting the frame 7 from below is reduced, the frame 7 becomes prone to deformation. However, by adjusting the position of the balance weight 51 to suppress the deformation of the frame 7, even in the case of supporting the frame 7 at restricted positions (for example, three points), the first stage 21a can be positioned accurately. The substrate 9 and the substrate 9 on the second stage 21b are subjected to various processes (for example, loading and unloading of the substrate 9, alignment processing, and drawing processing).

平衡配重51的第二位置、第一位置、基準位置、第三位置以及第四位置係只要在配重移動方向中依序排列，則配重支撐部75上的具體性的位置亦可進行各種變更。 As long as the second position, the first position, the reference position, the third position and the fourth position of the balance weight 51 are sequentially arranged in the direction of movement of the counterweight, the specific positions on the counterweight support part 75 can also be determined. Various changes.

在圖19所示的平衡配重51的位置調節的第二例中，在第一台21a位於待機位置且第二台21b位於搬出搬入位置之情形中，平衡配重51亦可配置於 第二位置。此外，在第一台21a位於搬出搬入位置且第二台21b位於待機位置之情形中，平衡配重51亦可配置於第四位置。 In the second example of position adjustment of the balance weight 51 shown in FIG. 19 , when the first stage 21 a is in the standby position and the second stage 21 b is in the carry-out position, the balance weight 51 may be arranged at Second position. In addition, when the first stage 21a is located at the carry-out position and the second stage 21b is located at the standby position, the balance weight 51 may be arranged at the fourth position.

平衡配重51的位置調節亦可以上述第一例以及第二例以外的態樣來進行。此外，平衡配重51亦可配置於基準位置、第一位置、第二位置、第三位置以及第四位置以外的位置。 The position adjustment of the balance weight 51 can also be performed in a manner other than the first and second examples described above. In addition, the balance weight 51 may also be arranged at a position other than the reference position, the first position, the second position, the third position and the fourth position.

平衡配重51並不一定需要為金屬製，且並不一定需要為一個構造體。例如，平衡配重51亦可具備兩個以上的配重要素。在圖26所示的例子中，平衡配重51係具備能夠彼此獨立地移動之兩個配重要素53。例如，與上述圖13(亦即第一例的位置調節)同樣地，在第一台21a位於處理位置且第二台21b位於搬出搬入位置的狀態下，兩個配重要素53係位於第二位置。此外，與上述圖14同樣地，在第一台21a以及第二台21b位於處理位置的狀態下，如圖27所示一方的配重要素53係位於基準位置且另一方的配重要素53係位於第二位置。而且，與上述圖15同樣地，在第一台21a位於處理位置且第二台21b位於待機位置的狀態下，如圖28所示兩個配重要素53係位於基準位置。 The balance weight 51 does not necessarily need to be made of metal, and does not necessarily need to be a structure. For example, the balance weight 51 may also have two or more weight elements. In the example shown in FIG. 26 , the balance weight 51 includes two weight elements 53 that can move independently of each other. For example, similarly to the above-mentioned FIG. 13 (that is, the position adjustment of the first example), when the first stage 21a is located at the processing position and the second stage 21b is located at the carry-out position, the two counterweight elements 53 are located at the second stage. Location. 14 , when the first stage 21 a and the second stage 21 b are located at the processing position, as shown in FIG. 27 , one of the counterweight elements 53 is at the reference position and the other counterweight element 53 is at the reference position. Located in the second position. Moreover, similarly to the above-mentioned FIG. 15 , in a state where the first stage 21 a is located at the processing position and the second stage 21 b is located at the standby position, the two counterweight elements 53 are located at the reference position as shown in FIG. 28 .

此外，在圖29所示的例子中，平衡配重51亦具備能夠彼此獨立地移動的兩個配重要素53。圖29所示的兩個配重要素53中之一方的配重要素53(亦即(-X)側的配重要素53)係基於第二台21b的Y方向中的位置在基準位置與第二位置之間移動。另一方的配重要素53(亦即(+X)側的配重要素53)係基於第一台21a的Y方向中的位置在基準位置與第四位置之間移動。例如，與上述圖13(亦即第一例的位置調節)同樣地，在第一台21a位於處理位置且第二台21b位於搬出搬入位置的狀態下，(-X)側的配重要素53係位置於第二位置，(+X)側的配重要素53係位於第三位置。此外，與上述圖14同樣地，在第一台21a以及第二台21b位於 處理位置的狀態下，如圖30所示，(-X)側的配重要素53係位於第一位置，(+X)側的配重要素53係位於第三位置。而且，與上述圖15同樣地，在第一台21a位於處理位置且第二台21b位於待機位置的狀態下，如圖31所示，(-X)側的配重要素53係位於基準位置，(+X)側的配重要素53係位於第三位置。 In addition, in the example shown in FIG. 29 , the balance weight 51 also includes two weight elements 53 that can move independently of each other. One of the two counterweight elements 53 shown in FIG. 29 (that is, the counterweight element 53 on the (-X) side) is based on the position of the second stage 21b in the Y direction between the reference position and the second counterweight element 53. Move between two positions. The other counterweight element 53 (that is, the counterweight element 53 on the (+X) side) moves between the reference position and the fourth position based on the position in the Y direction of the first stage 21a. For example, similarly to the above-mentioned FIG. 13 (that is, the position adjustment of the first example), when the first stage 21a is located at the processing position and the second stage 21b is located at the carry-out position, the counterweight element 53 on the (-X) side The system is located at the second position, and the counterweight element 53 on the (+X) side is located at the third position. In addition, similarly to the above-mentioned FIG. 14, the first stage 21a and the second stage 21b are located In the state of the processing position, as shown in FIG. 30 , the counterweight element 53 on the (-X) side is located at the first position, and the counterweight element 53 on the (+X) side is located at the third position. 15 above, when the first stage 21a is at the processing position and the second stage 21b is at the standby position, as shown in FIG. 31, the counterweight element 53 on the (-X) side is located at the reference position. The balance element 53 on the (+X) side is located in the third position.

在描繪裝置1中，配重移動方向並不一定需要與基板移動方向垂直，亦可進行各種變更。例如，配重支撐部75亦可不是於X方向延伸的略直線狀，而是俯視觀看時於(+Y)側或者(-Y)側彎曲成凸狀且於X方向延伸的略圓弧狀。或者，兩條直線狀的配重支撐部75亦可以俯視觀看時在第一移動機構22a與第二移動機構22b之間的X方向的中央處X字狀地交叉之方式配置於第一移動機構22a以及第二移動機構22b的下方，且上述配重要素53係能夠移動地安裝於各個配重支撐部75。 In the drawing device 1, the direction of movement of the counterweight does not necessarily need to be perpendicular to the direction of movement of the substrate, and can be changed in various ways. For example, the counterweight support portion 75 may not be substantially linear extending in the X direction, but may be curved into a convex shape on the (+Y) side or (-Y) side when viewed from above and extend in the X direction. . Alternatively, the two linear weight support portions 75 may be disposed on the first moving mechanism so as to cross in an X shape at the center of the X direction between the first moving mechanism 22a and the second moving mechanism 22b when viewed from above. 22a and the second moving mechanism 22b, and the above-mentioned counterweight element 53 is movably installed on each counterweight support part 75.

在描繪裝置1中，第一搬運機構2a亦可進一步具備下述一個以上的構件：移動機構，係將第一台21a於X方向移動；旋轉機構，係以於Z方向延伸的旋轉軸作為中心旋轉第一台21a；以及升降機構，係將第一台21a於Z方向移動。作為該移動機構以及升降機構，能夠利用例如線性伺服馬達。此外，作為該旋轉機構，能夠利用伺服馬達。該移動機構、旋轉機構以及升降機構亦可進行各種變更。第二搬運機構2b亦與第一搬運機構2a同樣。 In the drawing device 1, the first transport mechanism 2a may further include one or more of the following components: a moving mechanism that moves the first stage 21a in the X direction; and a rotation mechanism that is centered on a rotation axis extending in the Z direction. The rotating first stage 21a; and the lifting mechanism move the first stage 21a in the Z direction. As the moving mechanism and the lifting mechanism, for example, a linear servo motor can be used. In addition, as this rotation mechanism, a servo motor can be used. The moving mechanism, rotation mechanism, and lifting mechanism can also be modified in various ways. The second conveyance mechanism 2b is also similar to the first conveyance mechanism 2a.

在圖案描繪部4中，亦可分別設置有用以在第一描繪位置中對第一台21a上的基板9照射光線之描繪頭41以及用以在第二描繪位置中對第二台21b上的基板9照射光線之描繪頭41。在此情形中，亦可省略描繪頭移動機構42。 The pattern drawing section 4 may also be provided with a drawing head 41 for irradiating light on the substrate 9 on the first stage 21a in the first drawing position, and a drawing head 41 for irradiating light on the substrate 9 on the second stage 21b in the second drawing position. The drawing head 41 irradiates the substrate 9 with light. In this case, the drawing head moving mechanism 42 may be omitted.

在描繪裝置1中，除了設置有第一搬運機構2a以及第二搬運機構2b，亦可進一步設置有第三台以及用以將第三台於Y方向移動之第三移動機構， 且並行地對第一台21a、第二台21b以及第三台上的基板9進行各種處理(對準處理、描繪處理以及基板9的搬出與搬入)。 In the drawing device 1, in addition to the first conveying mechanism 2a and the second conveying mechanism 2b, a third stage and a third moving mechanism for moving the third stage in the Y direction may be further provided. Various processes (alignment processing, drawing processing, and unloading and loading of the substrate 9) are performed on the substrate 9 on the first stage 21a, the second stage 21b, and the third stage in parallel.

圖32係從(-Y)側觀看本發明的其他的較佳的描繪裝置1a之側視圖。在圖32中省略平衡配重51、拍攝頭31以及第一高架部72等的圖示。 Fig. 32 is a side view of another preferred drawing device 1a of the present invention as viewed from the (-Y) side. In FIG. 32 , the balance weight 51 , the imaging head 31 , the first elevated portion 72 , and the like are not shown.

在描繪裝置1a中，第一台21a以及第二台21b係鄰接地配置於上下方向。在圖32所示的例子中，第二台21b係隔開地配置於第一台21a的下側。第一移動機構22a係從側方(亦即(-X)側)支撐第一台21a。第二移動機構22b係從側方(亦即(+X)側)支撐第二台21b。 In the drawing device 1a, the first stage 21a and the second stage 21b are arranged adjacent to each other in the up-down direction. In the example shown in FIG. 32, the second stage 21b is spaced apart and arranged below the first stage 21a. The first moving mechanism 22a supports the first stage 21a from the side (that is, the (-X) side). The second moving mechanism 22b supports the second stage 21b from the side (that is, the (+X) side).

第一搬運機構2a係具備用以將第一台21a於上下方向移動之省略圖示的第一升降機構。第二搬運機構2b係具備用以將第二台21b於上下方向移動之省略圖示的第二升降機構。藉由被第二高架部73支撐的複數個描繪頭41對第一台21a上的基板9進行描繪後，在對第二台21b上的基板9進行描繪時，第一台21a係從圖32所示的狀態下降至圖中的第二台21b的位置，且第二台21b係上升至圖中的第一台21a的位置。描繪裝置1a的其他構成係與描繪裝置1中對應的構成略同樣。 The first conveying mechanism 2a is provided with a first lifting mechanism (not shown) for moving the first stage 21a in the up and down direction. The second transport mechanism 2b is provided with a second lifting mechanism (not shown) for moving the second stage 21b in the up and down direction. After the substrate 9 on the first stage 21a is drawn by the plurality of drawing heads 41 supported by the second elevated part 73, when the substrate 9 on the second stage 21b is drawn, the first stage 21a is drawn from FIG. 32 The state shown is lowered to the position of the second station 21b in the figure, and the second station 21b is raised to the position of the first station 21a in the figure. The other configurations of the drawing device 1 a are substantially the same as those of the drawing device 1 .

與上述描繪裝置1略同樣地，第一移動機構22a與第二移動機構22b係排列地配置於與基板移動方向(亦即Y方向)交叉之方向。在圖32所示的例子中，第一移動機構22a與第二移動機構22b係排列地配置於X方向，第二移動機構22b係鄰接於第一移動機構22a的(+X)側的側方。第一移動機構22a與第二移動機構22b係位於上下方向中的略相同的高度。 Almost the same as the above-mentioned drawing device 1, the first moving mechanism 22a and the second moving mechanism 22b are arranged side by side in a direction intersecting the substrate moving direction (that is, the Y direction). In the example shown in FIG. 32 , the first moving mechanism 22 a and the second moving mechanism 22 b are arranged side by side in the X direction, and the second moving mechanism 22 b is adjacent to the (+X) side of the first moving mechanism 22 a. . The first moving mechanism 22a and the second moving mechanism 22b are located at approximately the same height in the up-down direction.

在描繪裝置1a中亦與描繪裝置1同樣地，配重移動控制部115(參照圖3)係基於基板移動方向(亦即Y方向)中的第一台21a以及第二台21b的位置來控 制配重移動機構52，俾使平衡配重51(參照圖1)配置於抑制第一台21a以及第二台21b的重量導致框架7的變形之位置。藉此，能抑制框架7的變形對朝基板9的描繪造成不良影響，從而能精度佳地對該基板9進行描繪。 In the drawing device 1a, similarly to the drawing device 1, the counterweight movement control unit 115 (see FIG. 3) controls the positions of the first stage 21a and the second stage 21b in the substrate movement direction (that is, the Y direction). The weight moving mechanism 52 is constructed so that the balance weight 51 (see FIG. 1 ) is disposed at a position that suppresses deformation of the frame 7 due to the weight of the first stage 21a and the second stage 21b. This can prevent the deformation of the frame 7 from adversely affecting the drawing on the substrate 9 , so that the substrate 9 can be drawn with high accuracy.

上述基板9並未限定於印刷基板。在描繪裝置1、1a中，亦可進行例如半導體基板、液晶顯示裝置、有機EL顯示裝置等的平板面板(flat panel)顯示裝置用的玻璃基板、光罩用的玻璃基板、太陽電池面板用的基板等的位置檢測。 The above-mentioned substrate 9 is not limited to a printed circuit board. In the drawing devices 1 and 1a, for example, glass substrates for flat panel display devices such as semiconductor substrates, liquid crystal display devices, and organic EL display devices, glass substrates for photomasks, and solar cell panels can be processed. Position detection of substrates, etc.

上述實施形態以及各變化例中的構成只要相互未矛盾則亦可適當地組合。 The configurations in the above-described embodiments and modifications may be appropriately combined as long as they are not inconsistent with each other.

雖然已經詳細地描繪並說明本發明，然而這些說明是例示性的而非是限定性的。因此，只要未逸離本發明的範圍，則能夠認為有多種變化以及態樣。 While the present invention has been described and described in detail, these descriptions are illustrative and not restrictive. Therefore, various changes and aspects can be considered without departing from the scope of the present invention.

1:描繪裝置 1: Drawing device

2a:第一搬運機構 2a: First transport mechanism

2b:第二搬運機構 2b: Second transport mechanism

3:拍攝部 3:Photography Department

4:圖案描繪部 4:Pattern drawing department

7:框架 7:Frame

9:基板 9:Substrate

10:控制部 10:Control Department

21a:第一台 21a:The first channel

21b:第二台 21b:Second channel

22a:第一移動機構 22a: First mobile mechanism

22b:第二移動機構 22b: Second mobile mechanism

31:拍攝頭 31:Camera head

32:拍攝頭移動機構 32: Shooting head moving mechanism

41:描繪頭 41: Draw the head

42:描繪頭移動機構 42: Drawing head moving mechanism

51:平衡配重 51: Balance weight

52:配重移動機構 52: Counterweight moving mechanism

71:基台 71:Abutment

72:第一高架部 72:First elevated section

73:第二高架部 73:Second Elevated Section

74:高架部 74: Elevated part

75:配重支撐部 75: Counterweight support part

91:上表面 91: Upper surface

221a,221b:導軌 221a,221b: Guide rail

Claims (8)

一種描繪裝置，係用以對基板進行描繪，並具備： 圖案描繪部，係對在下方水平移動之基板的上側的主表面照射光線並描繪圖案； 第一基板保持部； 第一移動機構，係在前述圖案描繪部的下方將前述第一基板保持部於基板移動方向水平移動； 第二基板保持部，係與前述第一基板保持部鄰接地配置； 第二移動機構，係在與前述基板移動方向交叉之方向中與前述第一移動機構排列地配置，在前述圖案描繪部的下方將前述第二基板保持部於前述基板移動方向水平移動； 框架，係支撐前述第一移動機構以及前述第二移動機構； 平衡配重，係能夠於與前述基板移動方向交叉之配重移動方向移動地安裝於前述框架； 配重移動機構，係將前述平衡配重於前述配重移動方向移動；以及 配重移動控制部，係基於前述基板移動方向中的前述第一基板保持部以及前述第二基板保持部的位置來控制前述配重移動機構，俾使前述平衡配重配置於抑制前述第一基板保持部以及前述第二基板保持部的重量所致使之前述框架的變形之位置。 A drawing device is used to draw a substrate and has: The pattern drawing part irradiates light on the main surface of the upper side of the substrate that moves horizontally below and draws a pattern; the first substrate holding part; The first moving mechanism is for horizontally moving the first substrate holding part in the substrate moving direction below the pattern drawing part; The second substrate holding part is arranged adjacent to the first substrate holding part; The second moving mechanism is arranged in line with the first moving mechanism in a direction intersecting the substrate moving direction, and horizontally moves the second substrate holding part below the pattern drawing part in the substrate moving direction; A frame supports the aforementioned first moving mechanism and the aforementioned second moving mechanism; The balance weight is movably mounted on the frame in a counterweight movement direction that intersects with the movement direction of the base plate; The counterweight moving mechanism moves the aforementioned balance weight in the direction of movement of the aforementioned counterweight; and The counterweight movement control unit controls the counterweight movement mechanism based on the positions of the first substrate holding part and the second substrate holding part in the substrate movement direction so that the balance weight is arranged to suppress the first substrate The position where the frame is deformed due to the weight of the holding part and the second substrate holding part. 如請求項1所記載之描繪裝置，其中述配重移動方向係與前述基板移動方向垂直。The drawing device according to claim 1, wherein the moving direction of the counterweight is perpendicular to the moving direction of the substrate. 如請求項1所記載之描繪裝置，其中前述平衡配重的重心係在上下方向中位於比前述第一基板保持部的上表面以及前述第二基板保持部的上表面還下側。The drawing device according to claim 1, wherein the center of gravity of the balance weight is located lower than the upper surface of the first substrate holding part and the upper surface of the second substrate holding part in the up-down direction. 如請求項3所記載之描繪裝置，其中前述平衡配重的上端係在上下方向中位於比前述第一基板保持部的前述上表面以及前述第二基板保持部的前述上表面還下側。The drawing device according to claim 3, wherein an upper end of the balance weight is located lower than the upper surface of the first substrate holding portion and the upper surface of the second substrate holding portion in the up-down direction. 如請求項1所記載之描繪裝置，其中前述框架係具備：高架部，係跨越前述第一移動機構以及前述第二移動機構，並支撐前述圖案描繪部； 前述高架部係從前述第一移動機構以及前述第二移動機構的前述基板移動方向中的中央部的上方朝前述基板移動方向的一側延伸； 前述第一移動機構以及前述第二移動機構係從前述高架部朝前述基板移動方向的另一側突出； 前述平衡配重係於前述基板移動方向的另一側與前述第一移動機構以及前述第二移動機構鄰接地配置。 The drawing device according to claim 1, wherein the frame is provided with: an elevated portion that spans the first moving mechanism and the second moving mechanism and supports the pattern drawing portion; The elevated portion extends from above a central portion of the first moving mechanism and the second moving mechanism in the substrate moving direction toward one side in the substrate moving direction; The first moving mechanism and the second moving mechanism protrude from the elevated portion toward the other side in the moving direction of the substrate; The balance weight is disposed adjacent to the first moving mechanism and the second moving mechanism on the other side in the moving direction of the substrate. 如請求項1所記載之描繪裝置，其中前述框架的剛性係以前述第一移動機構以及前述第二移動機構的前述基板移動方向中的一側的端部、中央部以及另一側的端部之順序降低； 前述平衡配重係於前述基板移動方向的前述另一側與前述第一移動機構以及前述第二移動機構鄰接地配置； 前述第一基板保持部係在位於進行前述圖案描繪部所為的描繪之位置的狀態下，在前述第二基板保持部位於前述基板移動方向中的前述一側的端部時，前述平衡配重係位於前述配重移動方向中的前述第一移動機構與前述第二移動機構之間的中央的基準位置，在前述第二基板保持部位於前述基板移動方向中的前述中央部時，前述平衡配重係位於比前述基準位置還靠近前述第一移動機構的第一位置，在前述第二基板保持部位於前述基板移動方向中的前述另一側的端部時，前述平衡配重係位於比前述第一位置還靠近前述第一移動機構的第二位置； 前述第二基板保持部係在位於進行前述圖案描繪部所為的描繪之位置的狀態下，在前述第一基板保持部位於前述基板移動方向中的前述一側的端部時，前述平衡配重係位於前述基準位置，在前述第一基板保持部位於前述基板移動方向中的前述中央部時，前述平衡配重係位於比前述基準位置還靠近前述第二移動機構的第三位置，在前述第一基板保持部位於前述基板移動方向中的前述另一側的端部時，前述平衡配重係位於比前述第三位置還靠近前述第二移動機構的第四位置。 The drawing device according to claim 1, wherein the rigidity of the frame is determined by one end portion, a center portion, and the other end portion in the moving direction of the substrate of the first moving mechanism and the second moving mechanism. The order decreases; The balance weight is disposed adjacent to the first moving mechanism and the second moving mechanism on the other side in the moving direction of the substrate; The first substrate holding part is in a state where the pattern drawing part performs drawing, and when the second substrate holding part is located at the end of the side in the direction of movement of the substrate, the balance weight is The reference position is located at the center between the first moving mechanism and the second moving mechanism in the movement direction of the counterweight. When the second substrate holding portion is located at the center portion in the movement direction of the substrate, the balance weight The balance weight is located at a first position closer to the first moving mechanism than the reference position. When the second substrate holding portion is located at the other end in the substrate moving direction, the balance weight is located closer to the first moving mechanism than the reference position. One position is also close to the second position of the aforementioned first moving mechanism; The second substrate holding part is in a state where the pattern drawing part performs drawing, and when the first substrate holding part is located at the end of the side in the direction of movement of the substrate, the balance weight is At the aforementioned reference position, when the first substrate holding portion is located at the center portion in the direction of movement of the substrate, the balance weight is located at a third position closer to the second moving mechanism than the reference position. When the substrate holding portion is located at the other end in the substrate moving direction, the balance weight is located at a fourth position closer to the second moving mechanism than the third position. 如請求項1所記載之描繪裝置，其中前述框架的剛性係以前述第一移動機構以及前述第二移動機構的前述基板移動方向中的一側的端部、中央部以及另一側的端部之順序降低； 前述平衡配重係於前述基板移動方向的前述另一側與前述第一移動機構以及前述第二移動機構鄰接地配置； 在前述第一基板保持部以及前述第二基板保持部位於前述基板移動方向中的相同的位置時，前述平衡配重係位於前述配重移動方向中的前述第一移動機構與前述第二移動機構之間的中央的基準位置； 在前述第二基板保持部位於比前述第一基板保持部還靠近前述基板移動方向中的前述另一側時，前述平衡配重係位於比前述基準位置還靠近前述第一移動機構的位置； 在前述第二基板保持部位於比前述第一基板保持部還靠近前述基板移動方向中的前述一側時，前述平衡配重係位於比前述基準位置還靠近前述第二移動機構的位置。 The drawing device according to claim 1, wherein the rigidity of the frame is determined by one end portion, a center portion, and the other end portion in the moving direction of the substrate of the first moving mechanism and the second moving mechanism. The order decreases; The balance weight is disposed adjacent to the first moving mechanism and the second moving mechanism on the other side in the moving direction of the substrate; When the first substrate holding part and the second substrate holding part are located at the same position in the substrate moving direction, the balance weight is the first moving mechanism and the second moving mechanism located in the counterweight moving direction. The central reference position between; When the second substrate holding portion is located closer to the other side in the moving direction of the substrate than the first substrate holding portion, the balance weight is located at a position closer to the first moving mechanism than the reference position; When the second substrate holding portion is located closer to the side in the substrate moving direction than the first substrate holding portion, the balance weight is located closer to the second moving mechanism than the reference position. 如請求項1至7中任一項所記載之描繪裝置，其中前述圖案描繪部係具備： 描繪頭，係朝向下方照射光線；以及 描繪頭移動機構，係在前述第一移動機構的上方的第一描繪位置與前述第二移動機構的上方的第二描繪位置之間移動前述描繪頭。 The drawing device according to any one of claims 1 to 7, wherein the aforementioned pattern drawing unit includes: The drawing head is directed downwards to illuminate the light; and The drawing head moving mechanism moves the drawing head between a first drawing position above the first moving mechanism and a second drawing position above the second moving mechanism.
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