TWI810027B - Wafer surface cleaning system for preventing blockage and improving metal recycling efficiency - Google Patents
Wafer surface cleaning system for preventing blockage and improving metal recycling efficiency Download PDFInfo
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本創作關於一種晶圓表面清洗系統，尤指一種避免堵塞並提升金屬回收效率的晶圓表面清洗系統。 This work is about a wafer surface cleaning system, especially a wafer surface cleaning system that avoids clogging and improves metal recovery efficiency.
針對晶圓表面圖案較複雜之光阻去除(Photoresist Stripping)或金屬剝除(Metal Lift-off)製程，一般會先將晶圓批次放入在浸泡槽(Soaking Tank)進行批次晶圓浸泡清洗，去除大部份金屬與光阻，後續使用單晶圓旋轉清洗設備(Single Wafer Spin Processor)清洗殘留物。 For photoresist stripping or metal lift-off processes with complex wafer surface patterns, the wafer batches are generally put into the soaking tank (Soaking Tank) for batch wafer soaking Cleaning to remove most of the metal and photoresist, and then use a single wafer spin processor (Single Wafer Spin Processor) to clean the residue.
在採用浸泡槽清洗的過程中，若從晶圓表面剝除下來的為小尺寸金屬碎屑與光阻碎屑，則可順利隨藥液流動，帶有這些金屬碎屑及光阻碎屑的藥液可藉由與浸泡槽連接的管路流動到過濾器進行雜質過濾，以便能回收藥液供重覆使用。然而，若由晶圓剝除下來的為大塊片狀金屬塊與光阻塊時，這些塊體則時常滯留堵塞於浸泡槽(Soaking Tank)之下槽體處，進而造成光阻去除或金屬剝除製程無法順利進行。此乃因自晶圓上剝落金屬塊及光阻塊呈現大塊片狀，除不易在藥液中流動外，也不利於通過相對狹小的管路，導致該剝落的 大塊片狀金屬塊和光阻塊容易堆積於該浸泡槽的內表面，且較下方的金屬塊和光阻塊頻繁堵塞於下槽體與其下方的管路，進而造成清洗製程需中斷以解決堵塞問題，使得清洗製程無法反覆順暢實施，除降低了晶圓清洗的效率外，也降低了晶圓的產率。 In the process of cleaning with the soaking tank, if the small-sized metal debris and photoresist debris are peeled off from the wafer surface, they can flow smoothly with the chemical liquid. The liquid medicine can flow to the filter through the pipeline connected with the immersion tank for impurity filtration, so that the liquid medicine can be recovered for reuse. However, if the stripped metal pieces and photoresist blocks are large flakes, these blocks often stay and block the tank under the soaking tank, which will cause photoresist removal or metal The stripping process cannot be carried out smoothly. This is because the metal blocks and photoresist blocks peeled off from the wafer are in the form of large sheets, which are not easy to flow in the liquid, and are also not conducive to passing through relatively narrow pipelines, resulting in the peeling. Large flaky metal blocks and photoresist blocks are easy to accumulate on the inner surface of the soaking tank, and the lower metal blocks and photoresist blocks frequently block the lower tank and the pipeline below it, causing the cleaning process to be interrupted to solve the clogging problem , so that the cleaning process cannot be implemented repeatedly and smoothly, which not only reduces the efficiency of wafer cleaning, but also reduces the yield of wafers.
本創作主要目的在於提供一種避免堵塞並提升金屬回收效率的晶圓表面清洗系統，其可防止晶圓浸泡到浸泡槽內用於剝離晶圓表面上金屬與光阻的藥液後，剝落的之大塊片狀金屬塊與光阻塊堵塞下槽體與循環管路，並回收有用的金屬。 The main purpose of this creation is to provide a wafer surface cleaning system that avoids clogging and improves metal recovery efficiency, which can prevent the wafer from being peeled off after the wafer is immersed in the soaking tank to strip the metal and photoresist on the wafer surface. Large flake metal blocks and photoresist blocks block the lower tank and circulation pipeline, and recover useful metals.
為達上述目的，本創作提供一種避免堵塞並提升金屬回收效率的晶圓表面清洗系統，包括：一浸泡槽，用於承載藥液，且包括一上槽體以及一下槽體，該上槽體內形成一上腔室，該下槽體連接於該上槽體的底端，該下槽體包括一上開口端以及一下開口端，該下開口端的直徑小於該上開口端直徑，在該下槽體內形成有一連通該上腔室的下腔室，該下腔室的內表面的至少一部分為一傾斜面而與一水平線之間形成一傾斜角；一晶圓振動裝置，設置在該浸泡槽中，且包括一振動平台，該振動平台設置在該浸泡槽中，且該振動平台的底部高於該下槽體的該上開口端；一粗過濾裝置，通過一管路連接在該浸泡槽的該下槽體的該下開口端，且用於對該藥液進行過濾；以及 一泵浦，連接在該管路上，且用於輸送該藥液以使該藥液沿著由該浸泡槽至該粗過濾裝置的方向流動；其中，該晶圓振動裝置與該浸泡槽彼此不直接接觸。 In order to achieve the above purpose, this creation provides a wafer surface cleaning system that avoids clogging and improves metal recovery efficiency, including: a soaking tank, used to carry the liquid medicine, and includes an upper tank and a lower tank, the upper tank An upper chamber is formed, the lower trough is connected to the bottom end of the upper trough, the lower trough includes an upper open end and a lower open end, the diameter of the lower open end is smaller than the diameter of the upper open end, in the lower trough A lower chamber communicating with the upper chamber is formed in the body, at least a part of the inner surface of the lower chamber is an inclined surface forming an inclined angle with a horizontal line; a wafer vibrating device is arranged in the soaking tank , and includes a vibrating platform, the vibrating platform is set in the soaking tank, and the bottom of the vibrating platform is higher than the upper opening end of the lower tank body; a coarse filter is connected to the soaking tank through a pipeline the lower open end of the lower tank body, and is used for filtering the liquid medicine; and a pump, connected to the pipeline, and used to deliver the liquid medicine so that the liquid medicine flows along the direction from the soaking tank to the coarse filter device; wherein, the wafer vibrating device and the soaking tank are separated from each other direct contact.
於本創作較佳實施例中，該振動平台的該底部與該下槽體的該上開口端的間距為5至10mm。 In a preferred embodiment of the present invention, the distance between the bottom of the vibrating platform and the upper opening of the lower tank is 5 to 10 mm.
於本創作較佳實施例中，該振動平台用於上下振動，且該振動平台於振動時的最低點高於該下槽體的該上開口端。 In a preferred embodiment of the present invention, the vibrating platform is used to vibrate up and down, and the lowest point of the vibrating platform during vibration is higher than the upper opening end of the lower tank.
於本創作較佳實施例中，該振動平台連接到一振動驅動機構，該振動驅動機構用於輸出動力以驅動該振動平台進行振動。 In a preferred embodiment of the present invention, the vibration platform is connected to a vibration driving mechanism, and the vibration driving mechanism is used to output power to drive the vibration platform to vibrate.
於本創作較佳實施例中，該管路為一循環管路，用於使該藥液自該浸泡槽流出後回流至該浸泡槽中。 In a preferred embodiment of the present invention, the pipeline is a circulation pipeline, which is used to make the medicinal liquid flow back into the soaking tank after flowing out from the soaking tank.
於本創作較佳實施例中，該晶圓表面清洗系統進一步包括一精過濾裝置，該精過濾裝置用於對該藥液進行過濾，該精過濾裝置上形成一入口端以通過該管路與該泵浦連接，該精過濾裝置上形成一出口端以通過該管路與該浸泡槽的該上槽體連接，且該精過濾裝置上形成一回收出口端。 In a preferred embodiment of the present invention, the wafer surface cleaning system further includes a fine filter device, which is used to filter the liquid medicine, and an inlet port is formed on the fine filter device to pass through the pipeline and The pump is connected, an outlet port is formed on the fine filter device to connect with the upper tank body of the soaking tank through the pipeline, and a recovery outlet port is formed on the fine filter device.
於本創作較佳實施例中，該精過濾裝置的雜質過濾尺寸小於該粗過濾裝置的雜質過濾尺寸。 In a preferred embodiment of the present invention, the impurity filtering size of the fine filtering device is smaller than the impurity filtering size of the rough filtering device.
於本創作較佳實施例中，該粗過濾裝置用於過濾片狀或塊狀雜質，該精過濾裝置用於過濾粒狀雜質。 In a preferred embodiment of the present invention, the coarse filter is used to filter flake or massive impurities, and the fine filter is used to filter granular impurities.
於本創作較佳實施例中，該精過濾裝置為一旋渦流離心過濾裝置，該旋渦流離心過濾裝置為一無濾芯結構，且用於對該藥液施加旋轉離心力而分離出該藥液中的金屬。 In a preferred embodiment of the present invention, the fine filter device is a vortex centrifugal filter device, which has a structure without a filter core, and is used to apply a rotating centrifugal force to the medicinal liquid to separate the liquid from the medicinal liquid. Metal.
於本創作較佳實施例中，該晶圓表面清洗系統進一步包括一過濾物蒐集回收容器，該過濾物蒐集回收容器連接到該精過濾裝置的該回收出口端，用於收集自該精過濾裝置所濾出的該藥液中的金屬。 In a preferred embodiment of the present invention, the wafer surface cleaning system further includes a filtrate collection and recovery container, the filtrate collection and recovery container is connected to the recovery outlet port of the fine filter device for collecting Metals in the filtered liquid.
於本創作較佳實施例中，該浸泡槽進一步包括至少一噴嘴，該噴嘴設置在該上槽體內壁，連接到該管路，且用於將該藥液噴灑到該振動平台上方。 In a preferred embodiment of the present invention, the soaking tank further includes at least one nozzle, the nozzle is arranged on the inner wall of the upper tank, connected to the pipeline, and used for spraying the liquid medicine onto the vibrating platform.
於本創作較佳實施例中，該浸泡槽的該噴嘴為兩組噴嘴，該兩組噴嘴以非對稱方式設置在該上槽體的內壁。 In a preferred embodiment of the present invention, the nozzles of the soaking tank are two groups of nozzles, and the two groups of nozzles are asymmetrically arranged on the inner wall of the upper tank body.
於本創作較佳實施例中，該浸泡槽進一步包括一溢流槽體，該溢流槽體圍繞設置在該上槽體的外側，在該溢流槽體內形成一溢流腔室以容納藥液，且該溢流腔室的底端高於該上腔室的底端。 In a preferred embodiment of the present invention, the soaking tank further includes an overflow tank body, the overflow tank body is arranged around the outer side of the upper tank body, and an overflow chamber is formed in the overflow tank body to accommodate medicine liquid, and the bottom end of the overflow chamber is higher than the bottom end of the upper chamber.
於本創作較佳實施例中，該傾斜角為50至60度。 In a preferred embodiment of the present invention, the inclination angle is 50 to 60 degrees.
於本創作較佳實施例中，該下槽體呈錐體狀。 In a preferred embodiment of the present invention, the lower tank is in the shape of a cone.
於本創作較佳實施例中，該下槽體呈圓錐體狀或呈角錐體狀。 In a preferred embodiment of the present invention, the lower tank body is in the shape of a cone or a pyramid.
於本創作較佳實施例中，該上槽體的內壁與該振動平台的外側邊之間具有一間隙。 In a preferred embodiment of the present invention, there is a gap between the inner wall of the upper tank and the outer side of the vibrating platform.
於本創作較佳實施例中，該上槽體的內壁與該振動平台的外側邊之間的該間隙為10至15mm。 In a preferred embodiment of the present invention, the gap between the inner wall of the upper tank and the outer side of the vibrating platform is 10 to 15mm.
於本創作較佳實施例中，該粗過濾裝置內設置有一濾芯，在該粗過濾裝置上設置有一清洗排放管。 In a preferred embodiment of the present invention, a filter element is arranged in the coarse filter device, and a cleaning discharge pipe is arranged on the coarse filter device.
本創作另一目的在於提供一種避免堵塞並提升金屬回收效率的晶圓表面清洗系統，包括： 一浸泡槽，用於承載藥液，且包括一上槽體以及一下槽體，該上槽體內形成一上腔室，該下槽體連接於該上槽體的底端，該下槽體包括一上開口端以及一下開口端，該下開口端的直徑小於該上開口端直徑，該下槽體呈圓錐體狀或呈角錐體狀，在該下槽體內形成有一連通該上腔室的下腔室，該下腔室的內表面的至少一部分為一傾斜面而與一水平線之間形成一傾斜角，該傾斜角為50至60度；一晶圓振動裝置，設置在該浸泡槽中，且包括一振動平台，該振動平台設置在該浸泡槽中，且該振動平台的底部高於該下槽體的該上開口端，其中該上槽體的內壁與該振動平台的外側邊之間具有一間隙，且該間隙為10至15mm；一粗過濾裝置，通過一管路連接在該浸泡槽的該下槽體的該下開口端，且用於對該藥液進行過濾；以及一泵浦，連接在該管路上，且用於輸送該藥液以使該藥液沿著由該浸泡槽至該粗過濾裝置的方向流動；其中，該晶圓振動裝置與該浸泡槽彼此不直接接觸。 Another purpose of this creation is to provide a wafer surface cleaning system that avoids clogging and improves metal recovery efficiency, including: A soaking tank, used to carry medicinal liquid, and includes an upper tank body and a lower tank body, an upper chamber is formed in the upper tank body, the lower tank body is connected to the bottom end of the upper tank body, and the lower tank body includes An upper opening end and a lower opening end, the diameter of the lower opening end is smaller than the diameter of the upper opening end, the lower tank body is in the shape of a cone or a pyramid, and a lower opening communicating with the upper chamber is formed in the lower tank body. a chamber, at least a part of the inner surface of the lower chamber is an inclined surface forming an inclined angle with a horizontal line, and the inclined angle is 50 to 60 degrees; a wafer vibrating device is arranged in the soaking tank, And includes a vibrating platform, the vibrating platform is set in the soaking tank, and the bottom of the vibrating platform is higher than the upper opening end of the lower tank, wherein the inner wall of the upper tank and the outer side of the vibrating platform There is a gap between them, and the gap is 10 to 15mm; a coarse filter device is connected to the lower opening end of the lower tank body of the soaking tank through a pipeline, and is used to filter the medicinal liquid; and a pump, connected to the pipeline, and used to deliver the liquid medicine so that the liquid medicine flows along the direction from the soaking tank to the coarse filter device; wherein, the wafer vibrating device and the soaking tank are separated from each other direct contact.
藉由上述技術手段，本創作至少具備下列優點： With the above-mentioned technical means, this creation has at least the following advantages:
1、本創作將該下槽體的傾斜面採用高傾斜角度(50至60度)設計，防止剝離下來之片狀金屬塊呈現偏橫躺狀態而滯留於該下槽體表面，促使片狀金屬塊能快速往該下槽體底部之管路流動，可有效避免金屬塊剝除物堵塞下槽體以及管路。後續經管路上的粗過濾裝置和精過濾裝置將片狀金屬塊與光阻塊攔截，其中該精過濾裝置採用旋渦流離心過濾裝置，金屬塊與光阻塊會流向該旋渦流離心過濾裝置底部，可從該旋渦流離心過濾裝置的回收出口端有效 回收金屬塊(尤其是貴重金屬，金的回收)，經過濾之乾淨藥液由該旋渦流離心過濾裝置上部流回該上槽體以繼續重複進行金屬剝除製程。藉此，本創作能夠大幅減少片狀金屬及光阻塊在該浸泡槽內阻塞，減少金屬剝除製程中斷對浸泡槽進行清淤的頻率，有效提升金屬剝除製程的順暢度。 1. In this creation, the inclined surface of the lower tank body is designed with a high inclination angle (50 to 60 degrees) to prevent the stripped sheet metal block from lying on the surface of the lower tank body in a partial lying state, and to promote the sheet metal The block can quickly flow to the pipeline at the bottom of the lower tank, which can effectively prevent the stripped metal block from blocking the lower tank and pipeline. Subsequent interception of sheet-shaped metal blocks and photoresist blocks by the coarse filter device and fine filter device on the pipeline, wherein the fine filter device adopts a vortex flow centrifugal filter device, the metal block and photoresist block will flow to the bottom of the vortex flow centrifugal filter device, Effective from the recovery outlet port of the vortex flow centrifugal filter unit Metal blocks are recovered (especially precious metals, gold recovery), and the filtered clean chemical solution flows back to the upper tank from the upper part of the vortex centrifugal filter device to continue the metal stripping process repeatedly. In this way, the invention can greatly reduce the blockage of sheet metal and photoresist blocks in the soaking tank, reduce the frequency of dredging the soaking tank when the metal stripping process is interrupted, and effectively improve the smoothness of the metal stripping process.
2、本創作承載複數晶圓之振動平台的底部與下槽體之間的垂直距離控制短為5至10mm，藉此有效避免片狀金屬塊及片狀光阻塊在過大的垂直距離中水平橫躺到該下槽體的該上開口端處，而造成該下槽體的上開口端處被水平橫躺的片狀金屬塊和光阻所輕易阻塞。藉此，本創作能夠大幅減少片狀金屬及光阻塊在該浸泡槽內阻塞，減少金屬剝除製程中斷對浸泡槽進行清淤的頻率，有效提升金屬剝除製程的順暢度。 2. In this creation, the vertical distance between the bottom of the vibration platform carrying multiple wafers and the lower tank is controlled to be as short as 5 to 10mm, so as to effectively prevent the sheet metal block and the sheet photoresist block from being horizontal in an excessive vertical distance. Lying horizontally to the upper opening end of the lower tank body, the upper opening end of the lower tank body is easily blocked by the horizontally lying sheet metal block and photoresist. In this way, the invention can greatly reduce the blockage of sheet metal and photoresist blocks in the soaking tank, reduce the frequency of dredging the soaking tank when the metal stripping process is interrupted, and effectively improve the smoothness of the metal stripping process.
3、該上槽體與該振動平台之間的間隙為10至15mm，即該上槽體與該振動平台之間的間隙僅一線之隔，藉此，可限制片狀金屬塊及片狀光阻塊僅能以自身最薄的方向(垂直或是立起的方向)通過該間隙，而不會隨意水平橫躺於該間隙中，而造成該間隙被水平橫躺的片狀金屬塊和光阻所輕易阻塞，進而使該振動平台上晶圓所剝離之光阻與金屬能順暢地往該下槽體掉落。藉此，本創作能夠大幅減少片狀金屬及光阻塊在該浸泡槽內阻塞，減少金屬剝除製程中斷對浸泡槽進行清淤的頻率，有效提升金屬剝除製程的順暢度。 3. The gap between the upper tank body and the vibrating platform is 10 to 15mm, that is, the gap between the upper tank body and the vibrating platform is only separated by a line, so that the sheet metal block and sheet light can be restricted. The blocking block can only pass through the gap in its thinnest direction (vertical or standing direction), and will not lie horizontally in the gap at will, causing the gap to be covered by the horizontally lying sheet metal block and photoresist. It is easily blocked, so that the photoresist and metal stripped from the wafer on the vibration platform can smoothly fall to the lower groove. In this way, the invention can greatly reduce the blockage of sheet metal and photoresist blocks in the soaking tank, reduce the frequency of dredging the soaking tank when the metal stripping process is interrupted, and effectively improve the smoothness of the metal stripping process.
4、本創作非對稱排列之複數噴嘴用於噴灑藥液於浸泡槽使液面產生擾動波，促進晶圓之光阻去除與金屬剝離。此外，根據製程需求，本創作亦可調整複數噴嘴之噴出角度，以達到最佳清洗效率。 4. The multiple nozzles arranged asymmetrically in this invention are used to spray the liquid medicine in the immersion tank to generate disturbance waves on the liquid surface to promote the photoresist removal and metal stripping of the wafer. In addition, according to the requirements of the process, this creation can also adjust the spray angles of multiple nozzles to achieve the best cleaning efficiency.
10:浸泡槽 10: soaking tank
11:上槽體 11: Upper tank body
110:上腔室 110: upper chamber
12:下槽體 12: Lower tank body
12a:圓錐體狀下槽體 12a: Conical lower tank body
12b:角錐狀下槽體 12b: Pyramidal lower tank body
120:下腔室 120: lower chamber
121:開口端 121: Open end
1210:傾斜面 1210: Inclined surface
122:下開口端 122: Lower open end
13:溢流槽體 13: Overflow tank body
130:溢流腔室 130: overflow chamber
15:交界 15: Junction
17:噴嘴 17: Nozzle
20:晶圓振動裝置 20:Wafer vibration device
21:振動平台 21: Vibration platform
23:連接臂 23: connecting arm
25:振動驅動機構 25: Vibration drive mechanism
211:晶圓定位槽 211: Wafer positioning groove
30:粗過濾裝置 30: Coarse filter device
31:濾芯 31: filter element
32:清洗排放管 32:Clean the discharge pipe
40:泵浦 40: pump
50:精過濾裝置 50: fine filter device
51:入口端 51: Entry port
52:出口端 52: Export port
53:回收出口端 53: Recycling the outlet port
60:過濾物蒐集回收容器 60: Filtrate collection and recovery container
70:管路 70: pipeline
80:藥液 80: liquid medicine
90:晶圓 90: Wafer
91:片狀金屬塊 91: sheet metal block
92:片狀光阻塊 92: Sheet photoresist block
θ:傾斜角 θ: tilt angle
D:間隙 D: Gap
H:間距 H: Spacing
圖1為本創作避免堵塞並提升金屬回收效率的晶圓表面清洗系統的正面示意圖。 Figure 1 is a schematic front view of the wafer surface cleaning system that avoids clogging and improves metal recovery efficiency.
圖2為本創作浸泡槽的俯視圖。 Fig. 2 is the top view of the soaking tank of this creation.
圖3為本創作下槽體一實施例的立體外觀圖。 Fig. 3 is a three-dimensional appearance view of an embodiment of the lower tank body of the present invention.
圖4為本創作的該下槽體另一實施例的立體外觀圖。 Fig. 4 is a three-dimensional appearance view of another embodiment of the lower tank body of the present invention.
圖5為本創作的粗過濾裝置的立體外觀圖。 Fig. 5 is a three-dimensional appearance view of the coarse filter device of the present invention.
圖6為本創作的精過濾裝置的側面示意圖。 Fig. 6 is a schematic side view of the fine filter device of the present invention.
請參照圖1及圖2，本創作避免堵塞並提升金屬回收效率的晶圓表面清洗系統包括：一浸泡槽10、一晶圓振動裝置20、一粗過濾裝置30、以及一泵浦40。
Please refer to FIG. 1 and FIG. 2 , the wafer surface cleaning system for avoiding clogging and improving metal recovery efficiency of the present invention includes: a soaking
該浸泡槽10用於承載藥液80，且包括一上槽體11以及一下槽體12，該上槽體11內形成一上腔室110，該下槽體12連接於該上槽體11的底端，該下槽體12包括一上開口端121以及一下開口端122，該下開口端122的直徑小於該上開口端121直徑，在該下槽體12內形成有一連通該上腔室110的下腔室120，該下腔室120的內表面的至少一部分為一傾斜面1210而與一水平線之間形成一傾斜角θ。
The soaking
該晶圓振動裝置20設置在該浸泡槽10中，且包括一振動平台21，該振動平台21設置在該浸泡槽10中，且該振動平台21底部高於該下槽體12的該上開口端121。此外，該振動平台21上可形成有多個晶圓定位槽211以供擺放晶圓90。
The
該粗過濾裝置30通過一管路70連接在該浸泡槽10的該下槽體12的該下開口端122，且用於對該藥液80進行過濾。
The
該泵浦40連接在該管路70上，且用於輸送該藥液80以使該藥液80沿著由該浸泡槽10至該粗過濾裝置30的方向流動。
The
於本創作較佳實施例中，該振動平台21底部與該下槽體12的該上開口端121的間距H為5至10mm。
In a preferred embodiment of the present invention, the distance H between the bottom of the vibrating
於本創作較佳實施例中，該振動平台21用於上下振動，且該振動平台21於振動時的最低點高於該下槽體12的該上開口端121。
In a preferred embodiment of the present invention, the vibrating
於本創作較佳實施例中，該振動平台21可通過一連接臂23而連接到一振動驅動機構25，該振動驅動機構25用於輸出動力以驅動該振動平台21進行振動。此外，該振動驅動機構25可以是任何已知的動力裝置，例如馬達、電磁閥、氣壓缸、液壓缸等等，只要能夠驅動振動平台21往復振動即可。
In a preferred embodiment of the present invention, the vibrating
於本創作較佳實施例中，該管路70為一循環管路70，用於使該藥液80自該浸泡槽10流出後最終回流至該浸泡槽10中。
In a preferred embodiment of the present invention, the
於本創作較佳實施例中，該晶圓表面清洗系統進一步包括一精過濾裝置50，該精過濾裝置50用於對該藥液80進行過濾，該精過濾裝置50上形成一入口端51以通過該管路70與該泵浦40連接，該精過濾裝置50上形成一出口端52以通過該管路70與該浸泡槽10的該上槽體11連接，且該精過濾裝置50上形成一回收出口端53。
In a preferred embodiment of this invention, the wafer surface cleaning system further includes a
請參照圖6，於本創作較佳實施例中，該精過濾裝置50的雜質過濾尺寸小於該粗過濾裝置30的雜質過濾尺寸。於本創作較佳實施例中，該粗過濾裝置30用於過濾片狀或塊狀雜質，即是片狀金屬塊91或是片狀光阻塊92，該
精過濾裝置50用於過濾粒狀雜質。於本創作較佳實施例中，該精過濾裝置50為一旋渦流離心過濾裝置，該旋渦流離心過濾裝置為一無濾芯結構，且用於對該藥液80施加旋轉離心力而分離出該藥液80中的金屬。
Please refer to FIG. 6 , in a preferred embodiment of the present invention, the impurity filtering size of the
於本創作較佳實施例中，該晶圓表面清洗系統進一步包括一過濾物蒐集回收容器60，該過濾物蒐集回收容器60連接到該精過濾裝置50的該回收出口端53，用於收集自該精過濾裝置50所濾出的該藥液80中的金屬。
In a preferred embodiment of the present creation, the wafer surface cleaning system further includes a filtrate collection and
由於本創作的該精過濾裝置50採用旋渦流離心過濾裝置，其可將顆粒較小之金屬與光阻攔截進行第二次過濾，旋渦流離心過濾裝置基於重力及離心力的工作原理，清除重量高於藥液80的金屬與光阻等固體顆粒。藥液80由進水管之切向進入該旋渦流離心過濾裝置，由旋轉產生離心力，離心力推動光阻及金屬固體沿管壁流動，形成旋流使光阻和金屬顆粒進入過濾器底部的過濾物蒐集回收容器60，以有效回收金屬(尤其是貴重金屬，金的回收)，而經過濾之乾淨藥液80則順流沿旋渦流離心過濾裝置上部出水口流出，乾淨藥液80循環回槽體繼續進行光阻去除或金屬剝除製程。
Since the
於本創作較佳實施例中，該浸泡槽10進一步包括至少一噴嘴17，該噴嘴17設置在該上槽體11內壁，連接到該管路70，且用於將該藥液80噴灑到該振動平台21上方。
In a preferred embodiment of the present invention, the soaking
請復參照圖2，於本創作較佳實施例中，該浸泡槽10的該噴嘴17為兩組噴嘴17，各組噴嘴17可包括一或多個該噴嘴17，且該兩組噴嘴17以非對稱方式設置在該上槽體11的內壁。
Please refer to Fig. 2 again, in the present creation preferred embodiment, this
於本創作較佳實施例中，該浸泡槽10進一步包括一溢流槽體13，該溢流槽體13圍繞設置在該上槽體11的外側，在該溢流槽體13內形成一溢
流腔室130以容納藥液80，此外，該溢流腔室130的底端高於該上腔室110的底端。
In a preferred embodiment of the present creation, the soaking
於本創作較佳實施例中，該傾斜角θ為50至60度。本創作將該下槽體12的傾斜面1210採用50至60度的高傾斜角θ度設計，防止剝離下來之片狀金屬塊91呈現偏橫躺狀態而滯留於該下槽體12表面，促使片狀金屬塊91能快速往該下槽體12底部之管路70流動，可有效避免金屬塊剝除物堵塞下槽體12以及管路70。
In a preferred embodiment of the present invention, the inclination angle θ is 50 to 60 degrees. In this creation, the
於本創作較佳實施例中，該下槽體12呈錐體狀。詳細而言，該下槽體12呈圓錐體狀或呈角錐體狀，分別如圖3的圓錐體狀下槽體12a以及如圖4所示的角錐狀下槽體12b。本創作將該下槽體12設計錐體狀而具有一個或多個傾斜面1210，不論該傾斜面1210是角錐體的傾斜平面，還是該圓錐體的傾斜弧面，均能讓片狀金屬塊91和片狀光阻塊92容易相對該傾斜面1210滑動，進而達到避免片狀金屬塊91和片狀光阻塊92滯留的效果。
In a preferred embodiment of the present invention, the
於本創作較佳實施例中，該上槽體11的內壁與該振動平台21的外側邊之間具有一間隙D。
In a preferred embodiment of the present invention, there is a gap D between the inner wall of the
於本創作較佳實施例中，該上槽體11的內壁與該振動平台21的外側邊之間的該間隙D為10至15mm。換言之，該上槽體11與該振動平台21之間的10至15mm的間隙D僅一線之隔，藉此，可限制片狀金屬塊91及片狀光阻塊92僅能以自身最薄的方向(垂直或是立起的方向)通過該間隙D，而不會隨意水平橫躺於該間隙D中，而造成該間隙D被水平橫躺的片狀金屬塊91和光阻所輕易阻塞，進而使該振動平台21上晶圓所剝離之光阻與金屬能順暢地往該下槽體12掉落。
In a preferred embodiment of the present invention, the gap D between the inner wall of the
請參照圖5，於本創作較佳實施例中，該粗過濾裝置30內設置有一濾芯31(可為濾網形式)，在該粗過濾裝置30上設置有一清洗排放管32。該濾芯31為可拆卸替換的形式，可根據製程需要而替換具適當網目尺寸的濾芯31。該清洗排放管32可供排放該粗過濾裝置30內的藥液80，以進一步對該粗過濾裝置30進行清理。本創作的該粗過濾裝置30採用過濾網設計，將顆粒較大之片狀金屬與光阻攔截與回收金屬，此外，濾芯(濾網)可為拋棄式，或者是非拋棄式，非拋棄式濾芯則可定期卸下進行清洗。經粗過濾之藥液80經由泵浦40抽取流向該精過濾裝置50進行第二次過濾。
Please refer to FIG. 5 , in a preferred embodiment of the present invention, a filter element 31 (which may be in the form of a filter screen) is arranged in the
請復參照圖1至圖5，本創作避免堵塞並提升金屬回收效率的晶圓表面清洗系統的另一實施例包括：一浸泡槽10、一晶圓振動裝置20、一粗過濾裝置30、以及一泵浦40。
Please refer again to Fig. 1 to Fig. 5, another embodiment of the wafer surface cleaning system of this creation avoids clogging and improves metal recovery efficiency includes: a
該浸泡槽10用於承載藥液80，且包括一上槽體11以及一下槽體12，該上槽體11內形成一上腔室110，該下槽體12連接於該上槽體11的底端，該下槽體12包括一上開口端121以及一下開口端122，該下開口端122的直徑小於該上開口端121直徑，該下槽體12呈圓錐體狀或呈角錐體狀，在該下槽體12內形成有一連通該上腔室110的下腔室120，該下腔室120的內表面的至少一部分為一傾斜面1210而與一水平線之間形成一傾斜角θ，該傾斜角θ為50至60度，其中該上槽體11的內壁與該振動平台21的外側邊之間具有一間隙D，且該間隙D為10至15mm。
The soaking
該晶圓振動裝置20設置在該浸泡槽10中，且包括一振動平台21，該振動平台21設置在該浸泡槽10中，且該振動平台21底部高於該下槽體12的該上開口端121(或是高於該上槽體11與該下槽體12之間的交界15)。
The
該粗過濾裝置30通過一管路70連接在該浸泡槽10的該下槽體12的該下開口端122，且用於對該藥液80進行過濾。
The
該泵浦40連接在該管路70上，且用於輸送該藥液80以使該藥液80沿著由該浸泡槽10至該粗過濾裝置30的方向流動。
The
藉由上述技術手段，本創作至少具備下列優點： With the above-mentioned technical means, this creation has at least the following advantages:
1、本創作將該下槽體12的傾斜面1210採用高傾斜角θ度(50至60度)設計，防止剝離下來之片狀金屬塊91呈現偏橫躺狀態而滯留於該下槽體12表面，促使片狀金屬塊91能快速往該下槽體12底部之管路70流動，可有效避免金屬塊剝除物堵塞下槽體12以及管路70。後續經管路70上的粗過濾裝置30和精過濾裝置50將片狀金屬塊91與片狀光阻塊92攔截，其中該精過濾裝置50採用旋渦流離心過濾裝置，金屬塊與光阻塊會流向該旋渦流離心過濾裝置底部，可從該旋渦流離心過濾裝置的回收出口端53有效回收金屬塊(尤其是貴重金屬，金的回收)，經過濾之乾淨藥液80由該旋渦流離心過濾裝置上部流回該上槽體11以繼續重複進行金屬剝除製程。藉此，本創作能夠大幅減少片狀金屬塊91及片狀光阻塊92在該浸泡槽10內阻塞，減少金屬剝除製程中斷對浸泡槽10進行清淤的頻率，有效提升金屬剝除製程的順暢度。
1. In this creation, the
2、本創作承載複數晶圓之振動平台21的該底部與下槽體12之間的垂直間距H控制短為5至10mm，藉此有效避免片狀金屬塊91及片狀光阻塊92在過大的垂直間距H中水平橫躺到該下槽體12的該上開口端121處，而造成該下槽體12的上開口端121處被水平橫躺的片狀金屬塊91和光阻所輕易阻塞。藉此，本創作能夠大幅減少片狀金屬塊91及片狀光阻塊92在該浸泡槽10內阻塞，
減少金屬剝除製程中斷對浸泡槽10進行清淤的頻率，有效提升金屬剝除製程的順暢度。
2. The vertical distance H between the bottom of the vibrating
3、該上槽體11與該振動平台21之間的間隙D為10至15mm，即該上槽體11與該振動平台21之間的間隙D僅一線之隔，藉此，可限制片狀金屬塊91及片狀光阻塊92僅能以自身最薄的方向(垂直或是立起的方向)通過該間隙D，而不會隨意水平橫躺於該間隙D中，而造成該間隙D被水平橫躺的片狀金屬塊91和光阻所輕易阻塞，進而使該振動平台21上晶圓所剝離之光阻與金屬能順暢地往該下槽體12掉落。藉此，本創作能夠大幅減少片狀金屬塊91及片狀光阻塊92在該浸泡槽10內阻塞，減少金屬剝除製程中斷對浸泡槽10進行清淤的頻率，有效提升金屬剝除製程的順暢度。
3. The gap D between the
4、本創作非對稱排列之複數噴嘴17用於噴灑藥液80於浸泡槽10使液面產生擾動波，促進晶圓之光阻去除與金屬剝離。此外，根據製程需求，本創作亦可調整複數噴嘴17之噴出角度，以達到最佳清洗效率，以達到最佳清洗效率。
4. The
10:浸泡槽 10: soaking tank
11:上槽體 11: Upper tank body
110:上腔室 110: upper chamber
12:下槽體 12: Lower tank body
120:下腔室 120: lower chamber
121:開口端 121: Open end
1210:傾斜面 1210: Inclined surface
122:下開口端 122: Lower open end
13:溢流槽體 13: Overflow tank body
130:溢流腔室 130: overflow chamber
15:交界 15: Junction
17:噴嘴 17: Nozzle
20:晶圓振動裝置 20:Wafer vibration device
21:振動平台 21: Vibration platform
23:連接臂 23: connecting arm
25:振動驅動機構 25: Vibration drive mechanism
211:晶圓定位槽 211: Wafer positioning groove
30:粗過濾裝置 30: Coarse filter device
40:泵浦 40: pump
50:精過濾裝置 50: fine filter device
51:入口端 51: Entry port
52:出口端 52: Export port
53:回收出口端 53: Recycling the outlet port
60:過濾物蒐集回收容器 60: Filtrate collection and recovery container
70:管路 70: pipeline
80:藥液 80: liquid medicine
90:晶圓 90: Wafer
91:片狀金屬塊 91: sheet metal block
92:片狀光阻塊 92: Sheet photoresist block
θ:傾斜角 θ: tilt angle
D:間隙 D: Gap
H:間距 H: Spacing
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200915416A (en) * | 2007-08-08 | 2009-04-01 | Dongjin Semichem Co Ltd | Re-circulation method and device of chemical solution in semiconductor or display manufacturing process |
| CN215430469U (en) * | 2020-12-28 | 2022-01-07 | 上海新攀半导体科技有限公司 | Apparatus for cleaning semiconductor package |
| TWM626422U (en) * | 2021-11-30 | 2022-05-01 | 弘塑科技股份有限公司 | Crusher, wafer shaking device, and wafer cleaning system |
-
2022
- 2022-08-18 TW TW111131212A patent/TWI810027B/en active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200915416A (en) * | 2007-08-08 | 2009-04-01 | Dongjin Semichem Co Ltd | Re-circulation method and device of chemical solution in semiconductor or display manufacturing process |
| CN215430469U (en) * | 2020-12-28 | 2022-01-07 | 上海新攀半导体科技有限公司 | Apparatus for cleaning semiconductor package |
| TWM626422U (en) * | 2021-11-30 | 2022-05-01 | 弘塑科技股份有限公司 | Crusher, wafer shaking device, and wafer cleaning system |
Also Published As
| Publication number | Publication date |
|---|---|
| TW202408673A (en) | 2024-03-01 |
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