TWI800511B - 框架一體型遮罩 - Google Patents
框架一體型遮罩 Download PDFInfo
- Publication number
- TWI800511B TWI800511B TW107116303A TW107116303A TWI800511B TW I800511 B TWI800511 B TW I800511B TW 107116303 A TW107116303 A TW 107116303A TW 107116303 A TW107116303 A TW 107116303A TW I800511 B TWI800511 B TW I800511B
- Authority
- TW
- Taiwan
- Prior art keywords
- frame
- integrated mask
- mask
- integrated
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/60—Preliminary treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2059—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam
- G03F7/2063—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam for the production of exposure masks or reticles
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020170067396A KR20180130989A (ko) | 2017-05-31 | 2017-05-31 | 프레임 일체형 마스크 |
??10-2017-0067396 | 2017-05-31 | ||
KR10-2017-0067396 | 2017-05-31 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201903174A TW201903174A (zh) | 2019-01-16 |
TWI800511B true TWI800511B (zh) | 2023-05-01 |
Family
ID=64454886
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW107116303A TWI800511B (zh) | 2017-05-31 | 2018-05-14 | 框架一體型遮罩 |
Country Status (6)
Country | Link |
---|---|
US (2) | US20210140030A1 (zh) |
JP (2) | JP2020521058A (zh) |
KR (1) | KR20180130989A (zh) |
CN (1) | CN110651374A (zh) |
TW (1) | TWI800511B (zh) |
WO (1) | WO2018221852A1 (zh) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11839093B2 (en) * | 2019-05-14 | 2023-12-05 | Kopin Corporation | Image rendering in organic light emitting diode (OLED) displays, apparatuses, systems, and methods |
JP2021066949A (ja) * | 2019-10-28 | 2021-04-30 | 大日本印刷株式会社 | 蒸着マスクおよび蒸着マスクの製造方法 |
CN114555854A (zh) * | 2019-11-11 | 2022-05-27 | 韩商则舒穆公司 | 用于制造oled的掩模以及oled制造方法 |
KR102358269B1 (ko) * | 2020-01-29 | 2022-02-07 | 주식회사 오럼머티리얼 | 마스크 및 마스크의 제조 방법 |
JP2022071292A (ja) * | 2020-10-28 | 2022-05-16 | キヤノン株式会社 | 蒸着マスク、蒸着マスクを用いたデバイスの製造方法 |
TWI802974B (zh) * | 2021-08-25 | 2023-05-21 | 達運精密工業股份有限公司 | 遮罩以及遮罩的製造方法 |
KR20230121352A (ko) | 2022-02-11 | 2023-08-18 | 주식회사 한송네오텍 | 마이크로 led 제조용 마스크 프레임 어셈블리 |
KR20230121362A (ko) | 2022-02-11 | 2023-08-18 | 주식회사 한송네오텍 | 마이크로 led 제조용 마스크 프레임 어셈블리 제조방법 |
KR20230121358A (ko) | 2022-02-11 | 2023-08-18 | 주식회사 한송네오텍 | 마이크로 led 제조용 마스크 프레임 어셈블리의 패턴마스크 스트레칭 방법 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200845856A (en) * | 2007-04-16 | 2008-11-16 | Athlete Fa Corp | Mask manufacturing method of base board using the mask |
US20160043319A1 (en) * | 2013-04-22 | 2016-02-11 | Applied Materials, Inc. | Actively-aligned fine metal mask |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6384529B2 (en) * | 1998-11-18 | 2002-05-07 | Eastman Kodak Company | Full color active matrix organic electroluminescent display panel having an integrated shadow mask |
JP4072422B2 (ja) * | 2002-11-22 | 2008-04-09 | 三星エスディアイ株式会社 | 蒸着用マスク構造体とその製造方法、及びこれを用いた有機el素子の製造方法 |
JP4369199B2 (ja) * | 2003-06-05 | 2009-11-18 | 九州日立マクセル株式会社 | 蒸着マスクとその製造方法 |
KR20050013781A (ko) * | 2003-07-29 | 2005-02-05 | 주식회사 하이닉스반도체 | 노광 마스크의 제조 방법 |
JP2005302457A (ja) * | 2004-04-09 | 2005-10-27 | Toray Ind Inc | 蒸着マスクおよびその製造方法並びに有機電界発光装置の製造方法 |
JP2006185746A (ja) * | 2004-12-27 | 2006-07-13 | Toshiba Matsushita Display Technology Co Ltd | 表示装置の製造装置 |
JP2011256409A (ja) * | 2010-06-04 | 2011-12-22 | Sk Link:Kk | 支持体付きメタルマスク装置及びそれを用いた装置の製造方法 |
JP2013021165A (ja) * | 2011-07-12 | 2013-01-31 | Sony Corp | 蒸着用マスク、蒸着用マスクの製造方法、電子素子および電子素子の製造方法 |
CN103207518A (zh) * | 2012-01-16 | 2013-07-17 | 昆山允升吉光电科技有限公司 | 防止下垂的掩模框架及防止下垂的掩模组件 |
KR20140033736A (ko) * | 2012-09-10 | 2014-03-19 | 김정식 | 도금방식으로 성장시킨 메탈 마스크와 그 제작방법 |
KR20140130913A (ko) * | 2013-05-02 | 2014-11-12 | 주식회사 티지오테크 | 마스크 및 마스크 제조 방법 |
TWM508803U (zh) * | 2013-11-20 | 2015-09-11 | Applied Materials Inc | 用於製造有機發光二極體(oled)的陶瓷遮罩組件 |
CN104325222B (zh) * | 2014-09-27 | 2018-10-23 | 昆山允升吉光电科技有限公司 | 一种金属掩模板组件装配中心 |
JP6394879B2 (ja) * | 2014-09-30 | 2018-09-26 | 大日本印刷株式会社 | 蒸着マスク、蒸着マスク準備体、フレーム付き蒸着マスク、及び有機半導体素子の製造方法 |
KR102082784B1 (ko) * | 2014-12-11 | 2020-03-02 | 삼성디스플레이 주식회사 | 마스크 프레임 조립체, 그 제조 방법 및 유기 발광 표시 장치의 제조 방법 |
-
2017
- 2017-05-31 KR KR1020170067396A patent/KR20180130989A/ko not_active IP Right Cessation
-
2018
- 2018-04-12 CN CN201880033487.XA patent/CN110651374A/zh not_active Withdrawn
- 2018-04-12 WO PCT/KR2018/004272 patent/WO2018221852A1/ko active Application Filing
- 2018-04-12 US US16/618,350 patent/US20210140030A1/en not_active Abandoned
- 2018-04-12 JP JP2020514479A patent/JP2020521058A/ja active Pending
- 2018-05-14 TW TW107116303A patent/TWI800511B/zh active
-
2021
- 2021-11-05 US US17/520,212 patent/US20220127711A1/en active Pending
- 2021-11-10 JP JP2021182931A patent/JP2022024018A/ja active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200845856A (en) * | 2007-04-16 | 2008-11-16 | Athlete Fa Corp | Mask manufacturing method of base board using the mask |
US20160043319A1 (en) * | 2013-04-22 | 2016-02-11 | Applied Materials, Inc. | Actively-aligned fine metal mask |
Also Published As
Publication number | Publication date |
---|---|
TW201903174A (zh) | 2019-01-16 |
KR20180130989A (ko) | 2018-12-10 |
JP2020521058A (ja) | 2020-07-16 |
US20210140030A1 (en) | 2021-05-13 |
US20220127711A1 (en) | 2022-04-28 |
JP2022024018A (ja) | 2022-02-08 |
WO2018221852A1 (ko) | 2018-12-06 |
CN110651374A (zh) | 2020-01-03 |
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