TWI792095B

TWI792095B - Fluid control valve

Info

Publication number: TWI792095B
Application number: TW109140053A
Authority: TW
Inventors: 山田教巨; 鍋井立視
Original assignee: 日商Ｃｋｄ股份有限公司
Priority date: 2019-11-21
Filing date: 2020-11-17
Publication date: 2023-02-11
Also published as: JP2021089070A; TW202129180A; JP7472000B2

Abstract

A regulator performing fluid control includes an annular protruding portion having a valve seat on its leading end and an annular diameter-decreasing surface formed by decreasing an inner diameter of the annular protruding portion toward a valve hole. The regulator includes a valve element provided with a contact surface to be in contact with the valve seat and a columnar step portion provided on an inner peripheral side of the valve seat protruding from the contact surface toward the valve hole, the step portion having a diameter larger than an inner diameter of the valve hole and being coaxially formed with the valve hole. An annular ridge is formed by an outer peripheral surface of the step portion intersecting an end face of the step portion on the valve-hole side with the annular diameter-decreasing surface to constitute a passage narrowing portion.

Description

流體控制閥fluid control valve

本發明涉及一種流體控制閥，具有閥體、容納閥體的上游側的閥室、與閥室連通的下游側的閥孔、以及沿閥孔的外周從閥室的閥孔側內表面突出設置且在頂端具有閥座的環狀突出部，藉由閥體與閥座抵接分離來進行流體控制。The invention relates to a fluid control valve, which has a valve body, a valve chamber on the upstream side accommodating the valve body, a valve hole on the downstream side communicating with the valve chamber, and protruding from the inner surface of the valve hole side of the valve chamber along the outer periphery of the valve hole. And there is an annular protruding part of the valve seat at the top, and fluid control is performed by the valve body abutting and separating from the valve seat.

作為藉由閥體與閥座抵接分離來進行流體控制的流體控制裝置，例如日本特許公開2009-230259號公報中公開的流量控制閥、以及第4圖所示的調節閥50等被認為是這樣的裝置。調節閥50是對用於半導體製造工程中的諸如純水或藥液之類的控制流體進行壓力控制的裝置。調節閥50具有連通了輸入埠511、閥室513、下游側流體室516a和輸出埠512的流路，在閥主體51的內部，藉由被導入到壓力作用室516b的操作空氣，與薄膜構件55連接的閥體54的抵接面54a係與閥座515抵接分離，由此對從輸入埠511輸入並從輸出埠512輸出的控制流體進行壓力控制。As a fluid control device that performs fluid control by abutting and separating the valve body and the valve seat, for example, the flow control valve disclosed in Japanese Patent Laid-Open No. 2009-230259 and the regulating valve 50 shown in FIG. such a device. The regulator valve 50 is a device that controls the pressure of a control fluid such as pure water or chemical liquid used in semiconductor manufacturing processes. The regulator valve 50 has a flow path connecting the input port 511, the valve chamber 513, the downstream side fluid chamber 516a, and the output port 512. Inside the valve main body 51, the operating air introduced into the pressure action chamber 516b and the diaphragm member The abutting surface 54a of the valve body 54 connected to the valve body 55 abuts and separates from the valve seat 515, thereby controlling the pressure of the control fluid input from the input port 511 and output from the output port 512.

然而，上述習知技術存在如下問題。由於壓力控制，在輸入側與輸出側的控制流體壓力壓差大至例如200kPa左右，在此情況下，抵接面54a與閥座515分離的距離（即，閥開度）小至例如0.035mm左右，通過這樣小的間隙的控制流體的流速變快。由於流速的增加，在閥座515的下游側，控制流體的壓力減小（伯努利定理），產生負壓區域。於是，在控制流體中，產生由沸騰引起的冒泡現象（空蝕現象）。然後，由空蝕現象引起的氣泡破裂，並且氣泡破裂引起的衝擊波在調節閥50處引發振動。另外，因空蝕現象而氣化的控制流體的體積增加，但是增加的體積因氣泡破裂而回到原本的體積。控制流體的體積的這種增大減小使下游側流體室516a產生壓力振動。這些衝擊波導致的振動或壓力振動還傳遞到與調節閥50連接的管線，這可能成為雜訊的原因。However, the above conventional technology has the following problems. Due to pressure control, the control fluid pressure difference between the input side and the output side is as large as about 200kPa, in this case, the distance between the abutment surface 54a and the valve seat 515 (that is, the valve opening) is as small as 0.035mm Right or left, the flow rate of the control fluid through such a small gap becomes fast. Due to the increase in flow velocity, on the downstream side of the valve seat 515, the pressure of the control fluid decreases (Bernoulli's theorem), creating a negative pressure region. Then, in the control fluid, a bubbling phenomenon (cavitation phenomenon) caused by boiling occurs. Then, the bubbles caused by the cavitation phenomenon collapse, and shock waves caused by the bubble collapse induce vibration at the regulating valve 50 . Also, the volume of the vaporized control fluid increases due to the cavitation phenomenon, but the increased volume returns to the original volume due to the collapse of the bubbles. This increase and decrease in the volume of the control fluid generates pressure oscillations in the downstream side fluid chamber 516a. The vibration or pressure vibration caused by these shock waves is also transmitted to the pipeline connected to the regulator valve 50, which may cause noise.

另外，控制流體通過閥開度0.035mm左右的抵接面54a與閥座515的間隙時，由於控制流體的流速變快，因此在閥座515的下游側發生噴射流。此噴射流沿著抵接面54a流動，因此存在使閥體54振動的風險，並且此振動還傳遞到與調節閥50連接的管線，這可能成為雜訊的原因。In addition, when the control fluid passes through the gap between the contact surface 54 a and the valve seat 515 with a valve opening of about 0.035 mm, the flow velocity of the control fluid increases, so that jet flow is generated on the downstream side of the valve seat 515 . This jet flows along the abutment surface 54a, so there is a risk of vibrating the valve body 54, and this vibration is also transmitted to the pipeline connected to the regulating valve 50, which may cause noise.

近年來，由於半導體製造裝置的小型化、高密度化，因此要求流體控制閥的小型化。習知的調節閥50被認為即使發生空蝕現象或噴射流導致的振動，也能藉由與閥體54連接的薄膜構件55來吸收，但是由於小型化，薄膜構件55與以往相比直徑減小，下游側流體室516a和壓力作用室516b的容積變小，因此被認為無法再吸收空蝕現象導致的振動，被認為容易發生振動。In recent years, in order to reduce the size and increase the density of semiconductor manufacturing equipment, the size reduction of fluid control valves is required. In the conventional control valve 50, it is considered that even if vibration caused by cavitation or jet flow occurs, the film member 55 connected to the valve body 54 can absorb it. Smaller, the volumes of the downstream side fluid chamber 516a and the pressure application chamber 516b become smaller, so it is considered that the vibration caused by the cavitation phenomenon can no longer be absorbed, and it is considered that the vibration is likely to occur.

本發明是鑒於上述問題而完成的，目的在於提供一種流體控制閥，能夠防止或抑制因控制流體的流動而產生的振動。The present invention has been made in view of the above problems, and an object of the present invention is to provide a fluid control valve capable of preventing or suppressing vibration caused by controlling the flow of fluid.

為了解決上述課題，本發明的流體控制閥具有如下構造。In order to solve the above-mentioned problems, the fluid control valve of the present invention has the following structure.

該流體控制閥具有閥體、容納閥體的上游側的閥室、與閥室連通的下游側的閥孔、以及沿閥孔的外周從閥室的閥孔側內表面突出設置且在頂端具有閥座的環狀突出部，藉由閥體與閥座抵接分離來進行流體控制，其特徵在於：環狀突出部在環狀突出部的內徑側整個圓周具有使環狀突出部的內徑向閥孔縮徑的環狀縮徑面；閥體具有與閥座抵接的抵接面，在閥座的內周側具有從抵接面向閥孔側突出設置、具有比閥孔的內徑大的直徑、並且與閥孔同軸的圓柱狀的階梯部；階梯部的外周面與階梯部的閥孔之側的端面相交的環狀稜線位於環狀縮徑面附近，形成流路節流部。 The fluid control valve has a valve body, a valve chamber on the upstream side accommodating the valve body, a valve hole on the downstream side communicating with the valve chamber, and a The annular protruding part of the valve seat is used for fluid control by the abutment and separation of the valve body and the valve seat. The annular diameter reducing surface of the radial valve hole is reduced; the valve body has an abutting surface that abuts against the valve seat, and on the inner peripheral side of the valve seat, there is a protruding setting from the abutting surface to the valve hole side, and has an inner surface that is larger than the valve hole. The cylindrical stepped part with a large diameter and coaxial with the valve hole; the annular ridge line where the outer peripheral surface of the stepped part intersects with the end surface on the side of the valve hole of the stepped part is located near the annular shrinking surface, forming a flow path throttling department.

根據上述記載的流體控制閥，從閥室向閥孔流動的流體依序通過以下位置：流路面積被閥體和閥座節流的位置；流路面積被由環狀縮徑面、抵接面以及階梯部的外周面所包圍的空間擴大的位置；以及流路面積被流路節流部縮小的位置。申請人藉由實驗發現，由此減輕了閥座115a的下游側的負壓狀態。 According to the fluid control valve described above, the fluid flowing from the valve chamber to the valve hole passes through the following positions sequentially: the position where the flow path area is throttled by the valve body and the valve seat; The position where the space surrounded by the surface and the outer peripheral surface of the stepped portion expands; and the position where the flow path area is reduced by the flow path narrowing portion. The applicant found through experiments that the negative pressure state on the downstream side of the valve seat 115a is thus relieved.

由於減輕了負壓狀態，因此可以抑制空蝕現象的發生，並且即使發生了空蝕現象，也能縮短從氣泡發生到消失的時間。藉此能夠抑制空蝕現象導致的振動的發生，並且能夠抑制該振動導致的雜訊的產生。 Since the negative pressure state is reduced, the occurrence of cavitation phenomenon can be suppressed, and even if cavitation phenomenon occurs, the time from bubble generation to disappearance can be shortened. This can suppress the occurrence of vibration due to the cavitation phenomenon, and suppress the generation of noise due to the vibration.

進而，藉由從抵接面向閥孔側突出設置的階梯部，噴射流被引導至閥孔側，並從閥體剝離。藉由將噴射流從閥體剝離，能夠抑制噴射流導致的閥體振動的產生，並且使得能夠抑制雜訊的產生。 Furthermore, the jet flow is guided to the valve hole side by the stepped portion protruding from the abutting surface toward the valve hole side, and is separated from the valve body. By stripping the jet flow from the valve body, it is possible to suppress the generation of vibration of the valve body caused by the jet flow, and it becomes possible to suppress the generation of noise.

根據本發明的流體控制閥，能夠防止或抑制因控制流體的流動而產生的振動。 According to the fluid control valve of the present invention, it is possible to prevent or suppress vibration generated by controlling the flow of fluid.

參照附圖，對本發明的流體控制閥的實施方式進行詳細說明。 Embodiments of the fluid control valve of the present invention will be described in detail with reference to the drawings.

本實施方式的流體控制裝置是調節閥1，對用於半導體製造工程中的藥液或純水等控制流體進行壓力控制，如第1圖所示，調節閥1具備閥主體11、上蓋(蓋構件的一個示例)12和下蓋13，並且相對於閥主體11，上蓋12和下蓋13從與閥體14跟閥座115a(參照第2圖)抵接分離的方向平行的方向進行組裝。閥主體11處形成有輸入控制流體的輸入埠111和輸出控制流體的輸出埠112。作為與液體接觸的構件的閥主體11，例如由耐腐蝕性高的氟系合成樹脂成形，並且作為不與液體接觸的構件的上蓋12和下蓋13，例如由聚丙烯樹脂成形。The fluid control device of this embodiment is a regulating valve 1, which controls the pressure of a control fluid such as a chemical solution or pure water used in a semiconductor manufacturing process. As shown in FIG. An example of the member) 12 and the lower cover 13, and with respect to the valve main body 11, the upper cover 12 and the lower cover 13 are assembled from a direction parallel to the direction in which the valve body 14 abuts and separates from the valve seat 115a (see FIG. 2 ). An input port 111 through which control fluid is input and an output port 112 through which control fluid is output are formed at the valve main body 11 . The valve main body 11 as a member in contact with liquid is formed of, for example, a highly corrosion-resistant fluorine-based synthetic resin, and the upper cover 12 and lower cover 13 as members not in contact with liquid are formed of, for example, polypropylene resin.

在閥主體11的中央部，從閥主體11的下蓋13側的端面向上蓋12側，穿鑿設置有藉由輸入流路111a與輸入埠111連通的閥室113。而且，閥孔114與閥室113連通，並且在閥室113的閥孔側內表面113a上突出設置有沿閥孔114的外周的環狀突出部115。In the central portion of the valve body 11 , a valve chamber 113 communicating with the input port 111 through the input channel 111 a is drilled from the end surface of the valve body 11 on the lower cover 13 side to the upper cover 12 side. Also, the valve hole 114 communicates with the valve chamber 113 , and an annular protrusion 115 along the outer periphery of the valve hole 114 is protrudingly provided on the valve hole-side inner surface 113 a of the valve chamber 113 .

如第2圖所示，在環狀突出部115的頂端形成有與後述的閥體14抵接分離的閥座115a，並且在環狀突出部115的內徑側的整個圓周上形成有環狀縮徑面115b，其使環狀突出部115的內徑向著閥孔114的方向縮徑。而且，環狀縮徑面115b與閥孔114的內周面藉由環狀凹陷部117而連接，環狀凹陷部117從環狀縮徑面115b向閥孔114之側穿鑿設置，並且與閥孔114同軸。As shown in FIG. 2, a valve seat 115a that abuts and separates from the valve body 14 described later is formed at the tip of the annular protruding portion 115, and an annular protruding portion 115 is formed with an annular The reduced-diameter surface 115 b reduces the diameter of the inner diameter of the annular protrusion 115 toward the direction of the valve hole 114 . Moreover, the ring-shaped reduced-diameter surface 115b is connected to the inner peripheral surface of the valve hole 114 by an annular concave portion 117, and the annular concave portion 117 is drilled from the annular-shaped reduced-diameter surface 115b to the side of the valve hole 114, and is connected with the valve hole. Holes 114 are coaxial.

進而，如第1圖所示，在閥主體11處，在上蓋12側的端面上穿鑿設置有與閥孔114連通的開口部116。開口部116被後述的薄膜構件15分割成藉由輸出流路112a與輸出埠112連通的下游側流體室116a、和壓力作用室116b。另外，輸入流路111a、閥室113、閥孔114、下游側流體室116a和輸出流路112a構成從輸入埠111到輸出埠112的流路。Furthermore, as shown in FIG. 1 , in the valve body 11 , an opening 116 communicating with the valve hole 114 is drilled on the end surface on the side of the upper cover 12 . The opening 116 is divided into a downstream side fluid chamber 116a communicating with the output port 112 via an output flow path 112a and a pressure acting chamber 116b by a thin film member 15 described later. In addition, the input flow path 111 a , the valve chamber 113 , the valve hole 114 , the downstream side fluid chamber 116 a , and the output flow path 112 a constitute a flow path from the input port 111 to the output port 112 .

在閥室113處容納有圓柱狀閥體14，其可在平行於上蓋12和下蓋13的組裝方向的方向上往復運動。在閥體14處，在其軸線方向的中央部形成有直徑比其他部分的直徑大的擴徑部141。如第2圖所示，擴徑部141的與閥座115a相對的端面成為與閥座115a抵接的抵接面141a。當閥體14移動到環狀突出部115側時，抵接面141a與閥座115a抵接，並且截斷從輸入埠111到輸出埠112的流路。另一方面，當閥體14移動到與環狀突出部115側相反的一側時，抵接面141a從閥座115a分離，並且從輸入埠111到輸出埠112的流路連通。A cylindrical valve body 14 is accommodated at the valve chamber 113 , which can reciprocate in a direction parallel to the assembly direction of the upper cover 12 and the lower cover 13 . In the valve body 14 , an enlarged diameter portion 141 having a larger diameter than other portions is formed at the central portion in the axial direction. As shown in FIG. 2 , the end surface of the enlarged diameter portion 141 that faces the valve seat 115 a serves as a contact surface 141 a that contacts the valve seat 115 a. When the valve body 14 moves to the side of the annular protrusion 115 , the contact surface 141 a contacts the valve seat 115 a and blocks the flow path from the input port 111 to the output port 112 . On the other hand, when the valve body 14 moves to the side opposite to the annular protrusion 115 side, the contact surface 141a is separated from the valve seat 115a, and the flow path from the input port 111 to the output port 112 is communicated.

另外，在抵接面141a上，在閥座115a的內周側、向著閥孔114側突出設置有圓柱狀的階梯部143。階梯部143具有比閥孔114的內徑大的直徑，並且位於與閥孔114同軸。In addition, on the contact surface 141a, a columnar stepped portion 143 is protrudingly provided on the inner peripheral side of the valve seat 115a toward the valve hole 114 side. The stepped portion 143 has a diameter larger than the inner diameter of the valve hole 114 and is located coaxially with the valve hole 114 .

如第3圖所示，環狀凹陷部117的內周面與環狀縮徑面115b相交的第三環狀稜線118位於階梯部143的外周面與階梯部143的閥孔114側的端面（上端面）相交的第一環狀稜線145（環狀稜線的一個示例）附近，並且第一環狀稜線145和第三環狀稜線118形成流路節流部17。藉由抵接面141a和閥座115a而變窄的流路的橫截面積，在藉由由抵接面141a、階梯部143的外周面和環狀縮徑面115b包圍的空間（第一空間）而擴大一次之後，藉由流路節流部17再次變窄。As shown in FIG. 3, the third annular ridgeline 118 where the inner peripheral surface of the annular recessed portion 117 intersects with the annular reduced-diameter surface 115b is located between the outer peripheral surface of the stepped portion 143 and the end surface of the stepped portion 143 on the valve hole 114 side ( upper end surface) near the first annular ridgeline 145 (an example of an annular ridgeline), and the first annular ridgeline 145 and the third annular ridgeline 118 form the flow path restriction 17 . The cross-sectional area of the flow path narrowed by the abutment surface 141a and the valve seat 115a is in the space (the first space) surrounded by the abutment surface 141a, the outer peripheral surface of the stepped portion 143, and the annular reduced diameter surface 115b. ) and expanded once, narrowed again by the flow path restriction part 17.

進而，如第2圖所示，在階梯部143的上端面上，具有比階梯部143的外徑更小的直徑的圓柱狀第二階梯部144向閥孔114之側突出設置。第二階梯部144的位置與閥孔114同軸。Furthermore, as shown in FIG. 2 , on the upper end surface of the stepped portion 143 , a cylindrical second stepped portion 144 having a diameter smaller than the outer diameter of the stepped portion 143 protrudes toward the valve hole 114 side. The position of the second stepped portion 144 is coaxial with the valve hole 114 .

如第3圖所示，環狀凹陷部117的閥孔114側的內表面與閥孔114的內周面相交的第四環狀稜線119位於第二階梯部144的外周面與第二階梯部144的閥孔114側的端面（上端面）相交的第二環狀稜線146附近，並且第二環狀稜線146和第四環狀稜線119形成第二流路節流部18。藉由流路節流部17而變窄的流路的橫截面積，在藉由圍在階梯部143的上端面、第二階梯部144的外周面和環狀凹陷部117圍成的空間（第二空間）而擴大之後，藉由第二流路節流部18而再次變窄。As shown in FIG. 3, the fourth annular ridgeline 119 where the inner surface of the valve hole 114 side of the annular recess 117 intersects with the inner peripheral surface of the valve hole 114 is located between the outer peripheral surface of the second stepped portion 144 and the second stepped portion. 144 near the second annular ridgeline 146 where the end surface (upper end surface) on the valve hole 114 side intersects, and the second annular ridgeline 146 and the fourth annular ridgeline 119 form the second flow path narrowing portion 18 . The cross-sectional area of the flow path narrowed by the flow path throttling portion 17 is within the space surrounded by the upper end surface of the stepped portion 143, the outer peripheral surface of the second stepped portion 144, and the annular recessed portion 117 ( After the second space) is enlarged, it is narrowed again by the second flow path restriction 18 .

流路節流部17的第一環狀稜線145的直徑方向的間隙尺寸C1期望設定為使得間隙尺寸C1乘以在閥座115a的中心部（中心線CL11）處的環狀突出部115的直徑尺寸D1（參照第2圖）的值為0.6至1.2之間，例如在本實施方式中，使該乘積值為0.83。The gap dimension C1 in the diameter direction of the first annular ridgeline 145 of the flow path restriction portion 17 is desirably set such that the gap dimension C1 is multiplied by the diameter of the annular protrusion 115 at the center portion (centerline CL11 ) of the valve seat 115 a The value of the dimension D1 (see FIG. 2 ) is between 0.6 and 1.2. For example, in this embodiment, the value of the product is 0.83.

此外，第二流路節流部18的第二環狀稜線146的直徑方向的間隙尺寸C2期望設定為使得間隙尺寸C2乘以在閥座115a的中心部（中心部CL11）處的環狀突出部115的直徑尺寸D1的值在0.6至1.2之間，例如在本實施方式中，使該乘積值為0.83。In addition, the gap dimension C2 in the diameter direction of the second annular ridgeline 146 of the second flow path restricting portion 18 is desirably set such that the gap dimension C2 is multiplied by the annular protrusion at the center portion (center portion CL11 ) of the valve seat 115 a The value of the diameter dimension D1 of the portion 115 is between 0.6 and 1.2. For example, in this embodiment, the product value is 0.83.

從閥座115a的中心部（中心線CL11）到階梯部143的外周面的距離d1期望處於0.4mm到0.8mm的範圍內，例如在本實施方式中為0.5mm。另外，從階梯部143的外周面到第二階梯部144的外周面的距離d2期望處於0.4mm到0.8mm的範圍內，例如在本實施方式中為0.4mm。The distance d1 from the center portion (center line CL11 ) of the valve seat 115 a to the outer peripheral surface of the stepped portion 143 is desirably in the range of 0.4 mm to 0.8 mm, for example, 0.5 mm in the present embodiment. In addition, the distance d2 from the outer peripheral surface of the stepped portion 143 to the outer peripheral surface of the second stepped portion 144 is desirably in the range of 0.4 mm to 0.8 mm, for example, 0.4 mm in this embodiment.

從閥座115a到環狀凹陷部117的閥孔114側的內表面的距離d3期望比從抵接面141a到第二階梯部144的上端面的距離d4小0.03mm至0.13mm，例如在本實施方式中設定為小0.1mm。The distance d3 from the valve seat 115a to the inner surface of the valve hole 114 side of the annular recess 117 is expected to be 0.03mm to 0.13mm smaller than the distance d4 from the contact surface 141a to the upper end surface of the second stepped portion 144. In the embodiment, it is set to be smaller than 0.1 mm.

進而，如第1圖所示，閥體14在下蓋13側的端部具有與閥體14一體成型的薄膜部142，同時在上蓋12側的端部處結合有具有薄膜部152的薄膜構件15。閥體14的薄膜部142和薄膜構件15的薄膜部152隨著閥體14與閥座115a抵接分離的運動而彈性變形。另外，作為與液體接觸的構件的閥體14和薄膜構件15的耐腐蝕性高，藉由例如氟系合成樹脂成形。Furthermore, as shown in FIG. 1 , the valve body 14 has a film portion 142 integrally formed with the valve body 14 at the end portion on the lower cover 13 side, and a film member 15 having a film portion 152 is combined at the end portion on the upper cover 12 side. . The thin film portion 142 of the valve body 14 and the thin film portion 152 of the thin film member 15 are elastically deformed as the valve body 14 abuts and separates from the valve seat 115 a. In addition, the valve body 14 and the film member 15, which are members in contact with liquid, have high corrosion resistance and are molded of, for example, a fluorine-based synthetic resin.

薄膜構件15在與閥體14結合的中央部151的外周上具有薄膜部152，進而沿著薄膜部152的外周具有環狀固定部153。環狀固定部153具有環狀缺口部153c，除了上蓋12側的端部（上端面153b），該環狀缺口部153c沿著外周的整個圓周從外周面到閥主體11側的端面（下端面）進行開口。在環狀固定部153的下端面上設有壓入部153a，能夠壓入到閥主體11的開口部116中。上蓋12和閥主體11從閥體14與閥座115a抵接分離的方向的兩側夾持環狀固定部153，由此固定被壓入開口部116的薄膜構件15。在環狀固定部153的上端面153b與上蓋12之間配設有O形環19，以保持壓力作用室116b的氣密。The thin film member 15 has a thin film portion 152 on the outer periphery of a central portion 151 coupled to the valve body 14 , and further has an annular fixing portion 153 along the outer periphery of the thin film portion 152 . The annular fixing portion 153 has an annular notch portion 153c, which extends from the outer peripheral surface to the end surface (lower end surface 153b) on the side of the valve main body 11 along the entire circumference of the outer periphery except for the end portion (upper end surface 153b) on the side of the upper cover 12. ) to open. A press-fit portion 153 a is provided on a lower end surface of the annular fixing portion 153 , and can be press-fit into the opening 116 of the valve main body 11 . The upper cover 12 and the valve body 11 sandwich the ring-shaped fixing portion 153 from both sides in the direction in which the valve body 14 abuts and separates from the valve seat 115 a , thereby fixing the film member 15 pressed into the opening 116 . An O-ring 19 is arranged between the upper end surface 153b of the annular fixing portion 153 and the upper cover 12 to keep the pressure application chamber 116b airtight.

藉由設有環狀缺口部153c，閥主體11的壁厚t11能夠與環狀缺口部153c將環狀固定部153開口的程度成比例地增厚，並且能夠保持閥主體11的強度。此外，由於環狀切口部153c從外周面至下端面開槽口而留下了環狀固定部153的上端面153b，因此在上端面153b處能夠確保被上蓋12壓住的面積。By providing the annular notch portion 153c, the thickness t11 of the valve body 11 can be increased in proportion to the extent to which the annular notch portion 153c opens the annular fixing portion 153, and the strength of the valve body 11 can be maintained. In addition, since the annular notch portion 153c is notched from the outer peripheral surface to the lower end surface to leave the upper end surface 153b of the annular fixing portion 153, an area pressed by the upper cover 12 can be ensured at the upper end surface 153b.

在下蓋13處，在閥室113的相反側形成有彈簧容納室131，薄膜部142夾在其間。壓縮螺旋彈簧16容納在彈簧容納室131中。藉由此壓縮螺旋彈簧16的推壓力，閥體14通常被推壓向與閥座115a抵接的方向。藉此來保持閥體14的抵接面141a與閥座115a抵接的狀態。At the lower cover 13 , a spring housing chamber 131 is formed on the opposite side of the valve chamber 113 with the thin film portion 142 sandwiched therebetween. The compression coil spring 16 is housed in the spring housing chamber 131 . By the pushing force of the compressed coil spring 16 , the valve body 14 is usually pushed in a direction to abut against the valve seat 115 a. This maintains the state where the contact surface 141a of the valve body 14 is in contact with the valve seat 115a.

在上蓋12處形成有與壓力作用室116b連通的導入埠121，並且操作空氣通過導入埠121導入到壓力作用室116b。藉由控制壓力作用室116b的操作空氣的壓力來調節閥體14的位置。An introduction port 121 communicating with the pressure action chamber 116 b is formed at the upper cover 12 , and operating air is introduced into the pressure action chamber 116 b through the introduction port 121 . The position of the valve body 14 is adjusted by controlling the pressure of the operating air in the pressure acting chamber 116b.

以下對具有如上結構的調節閥1的閥體14的抵接面141a和閥座115a附近的控制流體的流動狀況進行說明。The flow of the control fluid in the vicinity of the contact surface 141a of the valve body 14 and the valve seat 115a of the regulating valve 1 having the above structure will be described below.

首先，使用第5圖至第8圖對習知技術中帶來問題的空蝕現象的發生進行說明。First, the generation of cavitation phenomenon which causes problems in the conventional technique will be described using FIGS. 5 to 8 .

第5圖和第6圖所示的是在調節閥1的輸入側和輸出側的控制流體壓力的壓差被控制為例如200kPa左右、並且閥開度為0.035mm左右時的抵接面141a與閥座115a附近的壓力分佈圖，其表示使用電腦的有限元素法進行解析的結果。此外，第7圖是在習知技術的調節閥50中在閥開度為0.035mm左右時的抵接面54a與閥座515附近的壓力分佈圖，其表示使用電腦的有限元素法進行解析的結果。在第5圖至第7圖中，點密度高的部分表示控制流體的壓力低的部分，點密度低的部分表示控制流體的壓力高的部分。Figures 5 and 6 show the pressure difference between the control fluid pressure on the input side and the output side of the regulating valve 1 being controlled to be, for example, about 200 kPa, and the valve opening is about 0.035 mm when the abutment surface 141a and The pressure distribution diagram near the valve seat 115a shows the result of analysis using the finite element method of a computer. In addition, FIG. 7 is a pressure distribution diagram near the contact surface 54a and the valve seat 515 when the valve opening is about 0.035mm in the regulating valve 50 of the conventional technology, which shows the analysis using the finite element method of the computer. result. In FIGS. 5 to 7 , a portion with a high dot density indicates a portion where the pressure of the control fluid is low, and a portion with a low dot density indicates a portion where the pressure of the control fluid is high.

另外，閥座115a的下游側的壓力越低，越易發生空蝕現象，例如，壓力值P11（參照第8圖）以下的狀態是易於發生空蝕現象的狀態。In addition, the lower the pressure on the downstream side of the valve seat 115a, the more likely the cavitation phenomenon will occur. For example, the state below the pressure value P11 (see FIG. 8 ) is a state where the cavitation phenomenon is likely to occur.

在閥開度為0.035mm左右時，通過這樣小的間隙的控制流體的流速變快。可知在控制流體的流速變快的情況下，例如，如第7圖所示，當在測定點A21、A22和A23這三個點處觀察壓力分佈圖中習知技術的調節閥50的閥座515的下游側處的控制流體的壓力時，可以看到它們全部處於負壓狀態。這是因為由於流速的增加，壓力降低(伯努利定理)。而且，如第8圖的圖表所示，可知測定點A21、A22和A23的壓力值全部為壓力值P11以下，處於易於發生空蝕現象的狀態。 When the valve opening is about 0.035 mm, the flow velocity of the control fluid passing through such a small gap increases. It can be seen that when the flow velocity of the control fluid becomes faster, for example, as shown in FIG. When the pressure of the control fluid at the downstream side of 515, it can be seen that they are all under negative pressure. This is because as the flow rate increases, the pressure decreases (Bernoulli's theorem). Furthermore, as shown in the graph of FIG. 8, it can be seen that the pressure values at the measurement points A21, A22, and A23 are all below the pressure value P11, and the cavitation phenomenon is likely to occur.

另一方面，在本實施方式的調節閥1中，如第5圖所示，儘管在閥體14與閥座115a之間的間隙附近為負壓狀態，但是在對應於測量點A21的位置的第一空間中的測量點A11處觀察壓力分佈圖，消除了負壓狀態，壓力值為正值。這在第8圖所示的圖表中也很清楚。 On the other hand, in the regulating valve 1 of the present embodiment, as shown in FIG. 5 , although the vicinity of the gap between the valve body 14 and the valve seat 115a is in a negative pressure state, at the position corresponding to the measurement point A21 Observing the pressure distribution diagram at the measurement point A11 in the first space, the negative pressure state is eliminated, and the pressure value is positive. This is also clear in the graph shown in Figure 8.

此外，在與測量點A22的位置相對應的第二空間中的測量點A12處觀察壓力分佈圖中，消除了負壓狀態，並且壓力值變為正值。這在第8圖所示的圖表中也很清楚。 Further, observing the pressure distribution diagram at the measurement point A12 in the second space corresponding to the position of the measurement point A22, the negative pressure state is eliminated, and the pressure value becomes a positive value. This is also clear in the graph shown in Figure 8.

在與測量點A23的位置相對應的測量點A13處，當觀察壓力分佈圖時，雖然可知為負壓狀態，但是如第8圖的圖表所示，該值超過壓力值P11，可以說容易發生空蝕現象的狀態已經消除。 At the measurement point A13 corresponding to the position of the measurement point A23, when looking at the pressure distribution diagram, it can be seen that it is a negative pressure state, but as shown in the graph of Fig. 8, the value exceeds the pressure value P11, and it can be said that it is easy to occur The state of cavitation phenomenon has been eliminated.

即，在本實施方式的調節閥1中，測量點A11、A12和A13全部都顯示出壓力值P11以上的壓力，並且處於不易發生空蝕現象的狀態。 That is, in the regulator valve 1 of the present embodiment, all of the measurement points A11, A12, and A13 show pressures equal to or greater than the pressure value P11, and are in a state where cavitation is unlikely to occur.

在此，如上所述，對於流路節流部17的第一環狀稜線145的徑向的間隙尺寸C1，期望間隙尺寸C1乘以環狀突出部115的閥座115a的中心部(中心線CL11)的直徑尺寸D1值在0.6至1.2之間，對於第二流路節流部18的第二環狀稜線146的徑向方向上的間隙尺寸C2，期望間隙尺寸C2乘以環狀突出部115的閥座115a的中心部(中心線CL11)中的直徑尺寸D1的值在0.6至1.2之間。例如，在增大間隙尺寸C2，使間隙尺寸C2乘以環狀突出部115的閥座115a的中心部(中心線CL11)處的直徑尺寸D1的值脫離0.6至1.2的範圍的情況下，如第6圖所示，第一空間中的測量點A11和第二空間中的測量點A12分別處於負壓狀態。而且，如第8圖所示（放大的C2），測量點A11和測量點A12的壓力值低於P11，可知存在發生空蝕現象的風險。Here, as described above, for the gap dimension C1 in the radial direction of the first annular ridgeline 145 of the flow path narrowing portion 17, it is desirable to multiply the gap dimension C1 by the center portion (centerline CL11) has a diameter dimension D1 value between 0.6 and 1.2, for the gap dimension C2 in the radial direction of the second annular ridgeline 146 of the second flow path restriction 18, the expected gap dimension C2 is multiplied by the annular protrusion The value of the diameter dimension D1 in the central portion (central line CL11 ) of the valve seat 115a of the valve seat 115 is between 0.6 and 1.2. For example, when the clearance dimension C2 is increased so that the value of the clearance dimension C2 multiplied by the diameter dimension D1 at the center portion (centerline CL11) of the valve seat 115a of the annular protrusion 115 is out of the range of 0.6 to 1.2, as As shown in FIG. 6, the measurement point A11 in the first space and the measurement point A12 in the second space are respectively in a negative pressure state. Furthermore, as shown in Fig. 8 (enlarged C2), the pressure values at measurement points A11 and A12 are lower than P11, indicating that there is a risk of cavitation.

另外，可以像第12圖所示的第一變型例的調節閥那樣，不在環狀縮徑面115b上設置環狀凹陷部117。在此情況下，儘管在第二空間中為負壓狀態，但是在第一空間和閥孔114附近，壓力值保持不發生空蝕現象的水準，這對於抑制空蝕現象的發生是有效的。In addition, like the regulator valve of the first modified example shown in FIG. 12 , the annular concave portion 117 may not be provided on the annular diameter-reducing surface 115b. In this case, although the second space is in a negative pressure state, the pressure value in the vicinity of the first space and the valve hole 114 is maintained at a level at which cavitation does not occur, which is effective for suppressing the occurrence of cavitation.

接下來，將參照第9圖至第11圖說明在習知技術中帶來的問題的噴射流的發生。第9圖和第10圖示出了表示調節閥1的輸入側和輸出側的控制流體壓力的壓差被控制為例如大200kPa左右、並且閥開度為0.035mm左右的抵接面141a和閥座115a附近的控制流體的流速的分佈圖，表示使用電腦的有限元素法進行分析的結果。此外，第11圖是習知技術的調節閥50中閥開度為035mm左右的抵接面54a和閥座515附近的控制流體的流速的分佈圖，表示使用電腦的有限元素法進行分析的結果。在第9圖至第11圖中，點密度高的部分表示控制流體的流速快的部分，點密度低的部分表示控制流體的流速慢的部分。Next, the generation of the jet stream, which is a problem caused in the conventional art, will be described with reference to FIGS. 9 to 11 . Figures 9 and 10 show the abutment surface 141a and the valve opening of about 0.035mm for the differential pressure of the control fluid pressure on the input side and the output side of the regulator valve 1, which is controlled to be, for example, about 200kPa larger. The distribution diagram of the flow velocity of the control fluid in the vicinity of the seat 115a shows the results of analysis using the finite element method using a computer. In addition, FIG. 11 is a distribution diagram of the flow velocity of the control fluid in the vicinity of the abutment surface 54a and the valve seat 515 with a valve opening of about 0.35 mm in the conventional control valve 50, showing the results of analysis using the finite element method of a computer. . In FIGS. 9 to 11 , a portion with a high dot density indicates a portion with a high flow velocity of the control fluid, and a portion with a low dot density indicates a portion with a slow flow velocity of the control fluid.

當觀察第11圖所示的習知的調節閥50的分析結果時，可知控制流體中流速高的部分沿閥體54的抵接面54a延伸。這表示沿著抵接面54a發生了噴射流。沿抵接面54a發生的噴射流是使閥體54振動的原因。When looking at the analysis results of the conventional control valve 50 shown in FIG. 11 , it can be seen that the portion of the control fluid with a high flow velocity extends along the contact surface 54 a of the valve body 54 . This indicates that a jet flow has occurred along the abutment surface 54a. The jet flow generated along the contact surface 54 a causes the valve body 54 to vibrate.

另一方面，可知在本實施方式的調節閥1中，如第9圖所示，控制流體的流速高的部分從抵接面141a與閥座115a之間的間隙沿著環狀縮徑面115b延伸，消除了習知技術中沿抵接面54a發生噴射流的狀態。這是因為階梯部143將噴射流引導向閥孔114並且將其從閥體14分離。藉由使噴射流從閥體14分離，能夠抑制噴射流引起的閥體14的振動的發生。On the other hand, in the control valve 1 of the present embodiment, as shown in FIG. 9 , the portion where the flow velocity of the control fluid is high extends from the gap between the contact surface 141a and the valve seat 115a along the annular diameter-reduced surface 115b. The extension eliminates the state of jet flow occurring along the abutment surface 54a in the prior art. This is because the stepped portion 143 guides the jet flow toward the valve hole 114 and separates it from the valve body 14 . By separating the jet flow from the valve body 14 , it is possible to suppress the vibration of the valve body 14 caused by the jet flow.

在此，如上所述，從閥座115a的中心部（中心線CL11）到階梯部143的外周面的距離d1期望在0.4至0.8mm的範圍內，並且從階梯部143的外周面到第二階梯部144的外周面的距離d2期望在0.4毫米至0.8mm的範圍內。例如，在距離d1擴大，使其脫離0.4mm至0.8mm的範圍的情況下，如第10圖所示，可知控制流體的流速高的部分沿著閥體14的抵接面141a延伸，並且噴射流不從閥體14分離。在這種狀態下，可能無法抑制由於噴射流引起的閥體14的振動的發生。 Here, as described above, the distance d1 from the center portion (center line CL11) of the valve seat 115a to the outer peripheral surface of the stepped portion 143 is desirably in the range of 0.4 to 0.8mm, and from the outer peripheral surface of the stepped portion 143 to the second The distance d2 of the outer peripheral surface of the stepped portion 144 is desirably in the range of 0.4 mm to 0.8 mm. For example, when the distance d1 is enlarged to deviate from the range of 0.4mm to 0.8mm, as shown in FIG. The flow is not separated from the valve body 14 . In this state, it may not be possible to suppress the occurrence of vibration of the valve body 14 due to the jet flow.

另外，作為本實施例的第二變型例，如第13圖和第14圖所示，可以使與設置在閥主體21的環狀突起215的頂端處的閥座215a抵接、且設置在閥體24的擴徑部241上的抵接面241a相對於閥體24的軸心傾斜。此外，也可以使環狀凹陷部217的閥孔214側的內表面、階梯部243及第二階梯部244的閥孔214側的端面(上端面)傾斜。 In addition, as a second modified example of this embodiment, as shown in FIGS. 13 and 14, the valve seat 215a provided at the tip of the annular protrusion 215 of the valve main body 21 may abut against and be provided on the valve body. The contact surface 241 a on the enlarged diameter portion 241 of the body 24 is inclined relative to the axis of the valve body 24 . In addition, the inner surface of the annular recessed portion 217 on the valve hole 214 side and the end surfaces (upper end surfaces) of the stepped portion 243 and the second stepped portion 244 on the valve hole 214 side may be inclined.

此時，在階梯部243的外周面與階梯部243的上端面相交的第一環狀稜線245(環狀稜線的一個例子)附近，環狀凹陷部217的內周面與環狀縮徑面215b相交的第三環狀稜線218位於此處，第一環狀稜線245和第三環狀稜線218形成流路節流部27。進而，在第二階梯部244的外周面與第二階梯部244的上端面相交的第二環狀稜線246附近，環狀凹陷部217的閥孔214側的內表面與閥孔214的內周面相交的第四環狀稜線219位於此處，形成第二流路節流部28。 At this time, in the vicinity of the first annular ridgeline 245 (an example of an annular ridgeline) where the outer peripheral surface of the stepped portion 243 intersects with the upper end surface of the stepped portion 243, the inner peripheral surface of the annular concave portion 217 and the annular reduced diameter surface The third annular ridgeline 218 where 215 b intersects is located here, and the first annular ridgeline 245 and the third annular ridgeline 218 form the flow path restriction 27 . Furthermore, in the vicinity of the second annular ridgeline 246 where the outer peripheral surface of the second stepped portion 244 intersects with the upper end surface of the second stepped portion 244 , the inner surface of the annular recess 217 on the side of the valve hole 214 and the inner periphery of the valve hole 214 The intersecting fourth annular ridgeline 219 is located here to form the second flow path restriction 28 .

進而，作為第三變形例，如第15圖和第16圖所示，可以藉由設置第三階梯部345和第二環狀凹陷部318來設置第三流路節流部39。 Furthermore, as a third modified example, as shown in FIGS. 15 and 16 , the third flow path restriction 39 can be provided by providing the third stepped portion 345 and the second annular recessed portion 318 .

首先，對閥主體31進行說明，閥主體31具有環狀突出部315，在頂端具有閥座315a，且具有環狀縮徑面315b和環狀凹陷部317，這方面與上述的第一實施方式相同。閥主體31具有第二環狀凹陷部318，該第二環狀凹陷部318從環狀凹陷部317的閥孔314側的內表面至閥孔314側穿鑿設置。 First, the valve main body 31 will be described. The valve main body 31 has an annular protruding portion 315, a valve seat 315a at the tip, and an annular reduced-diameter surface 315b and an annular concave portion 317. same. The valve main body 31 has a second annular recessed portion 318 that is drilled from the inner surface of the annular recessed portion 317 on the valve hole 314 side to the valve hole 314 side.

接著，對閥體34進行說明，閥體34具有擴徑部341，擴徑部341具有與閥座315a抵接的抵接面341a，且階梯部343從該抵接面341a至閥孔314側突出設置，第二階梯部344從階梯部343的閥孔314側的端面（上端面）向閥孔314側突出設置，這方面與上述的第一實施方式相同。第三階梯部345從第二階梯部344的閥孔314側的端面（上端面）向閥孔314側突出設置，具有比第二階梯部344小的直徑，且位置與閥孔314同軸。Next, the valve body 34 will be described. The valve body 34 has an enlarged diameter portion 341, the enlarged diameter portion 341 has an abutment surface 341a abutting against the valve seat 315a, and the stepped portion 343 extends from the abutment surface 341a to the valve hole 314 side. The second stepped portion 344 protrudes from the valve hole 314 side end surface (upper end surface) of the stepped portion 343 toward the valve hole 314 side, which is the same as the first embodiment described above. The third stepped portion 345 protrudes from the valve hole 314 side end surface (upper end surface) of the second stepped portion 344 toward the valve hole 314 side, has a smaller diameter than the second stepped portion 344 , and is positioned coaxially with the valve hole 314 .

此時，在階梯部343的外周面與階梯部343的上端面相交的第一環狀稜線346（環狀稜線的一個例子）附近，環狀凹陷部317的內周面與環狀縮徑面315b相交的第三環狀稜線319位於此處，第一環狀稜線346和第三環狀稜線319形成流路節流部37。此外，在第二階梯部344的外周面與第二階梯部344的上端面相交的第二環狀稜線347附近，環狀凹陷部317的閥孔314側的內表面與第二環狀凹陷部318的內周面相交的第四環狀稜線320位於此處，並且第二環狀稜線347和第四環狀稜線320形成第二流路節流部38。進而，在第三階梯部345的外周面與第三階梯部345的閥孔314側的端面相交的第五環狀稜線348附近，第二環狀凹陷部318的閥孔314側的內表面與閥孔314的內周面相交的第六環狀稜線322位於此處，並且第五環狀稜線348和第六環狀稜線322形成第三流路節流部39。At this time, in the vicinity of the first annular ridgeline 346 (an example of an annular ridgeline) where the outer peripheral surface of the stepped portion 343 intersects with the upper end surface of the stepped portion 343, the inner peripheral surface of the annular concave portion 317 and the annular reduced diameter surface The third annular ridgeline 319 where 315b intersects is located here, and the first annular ridgeline 346 and the third annular ridgeline 319 form the flow path restriction 37 . In addition, in the vicinity of the second annular ridgeline 347 where the outer peripheral surface of the second stepped portion 344 intersects the upper end surface of the second stepped portion 344, the inner surface of the annular recessed portion 317 on the side of the valve hole 314 and the second annular recessed portion The fourth annular ridgeline 320 where the inner peripheral surfaces of 318 intersect is located there, and the second annular ridgeline 347 and the fourth annular ridgeline 320 form the second flow path restriction 38 . Furthermore, in the vicinity of the fifth annular ridgeline 348 where the outer peripheral surface of the third stepped portion 345 intersects with the end surface of the third stepped portion 345 on the valve hole 314 side, the inner surface of the second annular recessed portion 318 on the valve hole 314 side is in contact with the third stepped portion 345 . The sixth annular ridgeline 322 where the inner peripheral surfaces of the valve hole 314 intersect is located there, and the fifth annular ridgeline 348 and the sixth annular ridgeline 322 form the third flow path restriction 39 .

如上所述，根據本實施方式的調節閥1，（1）具有閥體14、容納閥體14的上游側的閥室113、與閥室113連通的下游側的閥孔114、以及沿閥孔114的外周從閥室113的閥孔114側內表面突出設置且在頂端具有閥座115a的環狀突出部115，閥體14與閥座115a抵接分離來進行流體控制的調節閥1，其特徵在於：環狀突出部115在環狀突出部115的內徑側整個圓周具有使環狀突出部115的內徑向閥孔114縮徑的環狀縮徑面115b；閥體14具有與閥座115a抵接的抵接面141a，在閥座115a的內周側具有從抵接面141a向閥孔114側突出設置、具有比閥孔114的內徑大的直徑、並且與閥孔114同軸的圓柱狀的階梯部143；階梯部143的外周面與階梯部143的閥孔114側的端面相交的第一環狀稜線145位於環狀縮徑面115b附近，形成流路節流部17。As described above, the regulating valve 1 according to the present embodiment (1) has the valve body 14, the valve chamber 113 on the upstream side accommodating the valve body 14, the valve hole 114 on the downstream side communicating with the valve chamber 113, and the valve hole 114 along the valve hole. The outer periphery of 114 protrudes from the inner surface of the valve hole 114 side of the valve chamber 113 and has an annular protrusion 115 with a valve seat 115a at the top end. The valve body 14 abuts and separates from the valve seat 115a to perform fluid control. It is characterized in that: the annular protruding portion 115 has an annular diameter-reducing surface 115b that reduces the diameter of the inner diameter of the annular protruding portion 115 to the valve hole 114 on the entire circumference of the inner diameter side of the annular protruding portion 115; The abutment surface 141a that the seat 115a abuts on has a diameter larger than the inner diameter of the valve hole 114 and is coaxial with the valve hole 114, protruding from the abutment surface 141a toward the valve hole 114 side on the inner peripheral side of the valve seat 115a. The cylindrical stepped portion 143; the first annular ridgeline 145 where the outer peripheral surface of the stepped portion 143 intersects with the end surface on the valve hole 114 side of the stepped portion 143 is located near the annular reduced diameter surface 115b, forming a flow path restriction 17.

根據（1）中所述的調節閥1，從閥室113向閥孔114流動的控制流體依序通過以下位置：流路面積被閥體14和閥座115a節流的位置、流路面積被由環狀縮徑面115b、抵接面141a和階梯部143的外周面所包圍的空間（第一空間）擴大的位置、流路面積被流路節流部17縮小的位置。申請人藉由實驗發現，由此減輕了閥座115a的下游側的負壓狀態。According to the regulating valve 1 described in (1), the control fluid flowing from the valve chamber 113 to the valve hole 114 passes through the following positions sequentially: the position where the flow path area is throttled by the valve body 14 and the valve seat 115a, the position where the flow path area is restricted by the The position where the space (first space) surrounded by the annular reduced-diameter surface 115 b , the contact surface 141 a , and the outer peripheral surface of the stepped portion 143 is enlarged, and the position where the flow path area is reduced by the flow path narrowing portion 17 . The applicant found through experiments that the negative pressure state on the downstream side of the valve seat 115a is thus relieved.

由於減輕了負壓狀態，因此可以抑制空蝕現象的發生，並且即使發生了空蝕現象，也能縮短從氣泡發生到消失的時間。藉此能夠抑制空蝕現象導致的振動的發生，並且能夠抑制該振動導致的雜訊的產生。Since the negative pressure state is reduced, the occurrence of cavitation phenomenon can be suppressed, and even if cavitation phenomenon occurs, the time from bubble generation to disappearance can be shortened. This can suppress the occurrence of vibration due to the cavitation phenomenon, and suppress the generation of noise due to the vibration.

進而，噴射流被從抵接面141a向閥孔114側突出設置的階梯部143引導至閥孔114側，從閥體14分離。藉由將噴射流從閥體14分離，能夠抑制噴射流引起的閥體14的振動的發生，並且能夠抑制噪音的產生。Furthermore, the jet flow is guided to the valve hole 114 side by the step portion 143 protruding from the contact surface 141 a toward the valve hole 114 side, and separated from the valve body 14 . By separating the jet flow from the valve body 14, the occurrence of vibration of the valve body 14 caused by the jet flow can be suppressed, and the generation of noise can be suppressed.

（2）根據（1）所述的調節閥1，其特徵在於，流路節流部17的第一環狀稜線145的徑向方向的間隙尺寸C1乘以環狀突出部115的閥座115a的中心部（中心線CL11）的直徑尺寸D1的值在0.6至1.2之間。(2) The regulating valve 1 according to (1), wherein the clearance dimension C1 in the radial direction of the first annular ridgeline 145 of the flow-path restricting portion 17 is multiplied by the valve seat 115a of the annular protrusion 115 The value of the diameter dimension D1 of the central portion (centerline CL11) is between 0.6 and 1.2.

申請人藉由實驗發現，根據（2）所述的調節閥1，能夠得到在抑制由空蝕現象引起的振動方面優異的調節閥1。The applicant found out through experiments that according to the regulating valve 1 described in (2), the regulating valve 1 excellent in suppressing the vibration caused by the cavitation phenomenon can be obtained.

（3）根據（1）或（2）所述的調節閥1，其特徵在於，從閥座115a的中心部（中心線CL11）到階梯部143的外周面的距離在0.4mm至0.8mm的範圍內。(3) The regulating valve 1 according to (1) or (2), characterized in that the distance from the center portion (center line CL11 ) of the valve seat 115 a to the outer peripheral surface of the stepped portion 143 is between 0.4 mm and 0.8 mm. within range.

申請人藉由實驗發現，根據（3）所述的調節閥1，能夠得到在抑制噴射流引起的振動方面優異的調節閥1。The applicant found out through experiments that according to the regulating valve 1 described in (3), the regulating valve 1 excellent in suppressing the vibration caused by the jet flow can be obtained.

（4）根據（1）至（3）中任一項所述的調節閥1，其特徵在於，閥體14具有從階梯部143的閥孔114側的端面向閥孔114側突出設置的、具有比階梯部143的外徑小的直徑、並且與閥孔114同軸的第二階梯部144；第二階梯部144的外周面與第二階梯部144的閥孔114側的端面相交的第二環狀稜線146位於閥孔114的內周面附近，形成第二流路節流部18。(4) The regulator valve 1 according to any one of (1) to (3), wherein the valve body 14 has a protruding portion protruding from the end face of the stepped portion 143 on the valve hole 114 side, The second stepped portion 144 having a diameter smaller than the outer diameter of the stepped portion 143 and coaxial with the valve hole 114; The annular ridgeline 146 is located near the inner peripheral surface of the valve hole 114 and forms the second flow path narrowing portion 18 .

根據（4）所述的調節閥1，從閥室113向閥孔114流動的控制流體依序通過以下位置：流路面積被閥體14和閥座115a節流的位置、流路面積被環狀縮徑面115b、抵接面141a和階梯部143的外周面所包圍的空間（第一空間）拓寬的位置、流路面積被流路節流部17節流的位置之後，進而依序通過以下位置：流路面積被階梯部143的閥孔114側的端面和第二階梯部144的外周面擴大的位置、流路面積被第二流路節流部18節流的位置。申請人藉由實驗發現，由此進一步減小了閥座115a的下游側的負壓狀態。According to the regulating valve 1 described in (4), the control fluid flowing from the valve chamber 113 to the valve hole 114 passes through the following positions sequentially: the position where the flow path area is throttled by the valve body 14 and the valve seat 115 a After the position where the space (first space) surrounded by the reduced-diameter surface 115b, the contact surface 141a, and the outer peripheral surface of the stepped portion 143 widens, and the position where the flow path area is throttled by the flow path throttling portion 17, then pass through the Positions where the flow path area is enlarged by the end surface of the stepped portion 143 on the valve hole 114 side and the outer peripheral surface of the second stepped portion 144 , and where the flow path area is narrowed by the second flow path narrowing portion 18 . The applicant found through experiments that the negative pressure state on the downstream side of the valve seat 115a is further reduced.

藉由降低負壓狀態，能夠抑制空蝕現象的發生。如果能夠抑制空蝕現象的發生，則可以抑制空蝕現象引起的振動的發生，並且能夠抑制該振動引起的雜訊的產生。By reducing the negative pressure state, the occurrence of cavitation can be suppressed. If the occurrence of the cavitation phenomenon can be suppressed, the occurrence of vibration due to the cavitation phenomenon can be suppressed, and the generation of noise due to the vibration can be suppressed.

（5）根據（4）所述的調節閥1，其特徵在於，第二流路節流部18的第二環狀稜線146的徑向方向的間隙尺寸C2乘以環狀突出部115的閥座115a的中心部（中心線CL11）的直徑尺寸D1的值在0.6至1.2之間。(5) The regulating valve 1 according to (4), characterized in that the gap dimension C2 in the radial direction of the second annular ridgeline 146 of the second flow-path restricting portion 18 is multiplied by the valve diameter of the annular protrusion 115 The value of the diameter dimension D1 of the center portion (center line CL11 ) of the seat 115 a is between 0.6 and 1.2.

申請人藉由實驗發現，根據（5）所述的調節閥1，能夠得到在抑制空蝕現象引起的振動方面優異的流體控制閥。The applicant found through experiments that according to the regulating valve 1 described in (5), a fluid control valve excellent in suppressing vibration caused by cavitation can be obtained.

（6）根據（4）或（5）所述的調節閥1，其特徵在於，環狀縮徑面115b與閥孔114的內周面，係藉由從環狀縮徑面115b向閥孔114側穿鑿設置、並且與閥孔114同軸的環狀凹陷部117而連接，環狀凹陷部117的內周面與環狀縮徑面115b相交的第三環狀稜線118位於第一環狀稜線145附近，與第一環狀稜線145共同形成流路節流部17；環狀凹陷部117的閥孔114側的內表面與閥孔114的內周面相交的第四環狀稜線119位於第二環狀稜線146附近，與第二環狀稜線146共同形成第二流路節流部18。(6) The regulating valve 1 described in (4) or (5), is characterized in that the ring-shaped diameter-reducing surface 115b and the inner peripheral surface of the valve hole 114 are formed by connecting the ring-shaped diameter-reducing surface 115b to the valve hole. 114 is pierced and connected to the annular recessed part 117 coaxial with the valve hole 114, and the third annular ridgeline 118 where the inner peripheral surface of the annular recessed part 117 intersects with the annular reducing surface 115b is located on the first annular ridgeline Near 145, together with the first annular ridgeline 145, the flow path restriction 17 is formed; the fourth annular ridgeline 119 where the inner surface of the annular recess 117 on the side of the valve hole 114 intersects with the inner peripheral surface of the valve hole 114 is located at the second In the vicinity of the second annular ridgeline 146 , together with the second annular ridgeline 146 , the second flow path restriction portion 18 is formed.

申請人藉由實驗發現，根據（6）所述的調節閥1，環狀凹陷部117將流路節流部17與第二流路節流部18之間的空間（第二空間）擴大，抑制空蝕現象引起的振動，由此能夠得到優異的調節閥1。The applicant found through experiments that, according to the regulating valve 1 described in (6), the annular recess 117 expands the space (second space) between the flow path restriction 17 and the second flow path restriction 18 , Vibration caused by the cavitation phenomenon can be suppressed to obtain an excellent regulator valve 1 .

（7）根據（6）所述的調節閥1，其特徵在於，從閥座115a的中心部（中心線CL11）到環狀凹陷部117的閥孔114側的內表面的距離比從抵接面141a到第二階梯部144的閥孔114側的端面的距離小0.03mm至0.13mm。(7) The regulator valve 1 according to (6), wherein the distance from the center portion (center line CL11 ) of the valve seat 115 a to the inner surface of the annular recess 117 on the side of the valve hole 114 is greater than the distance from the abutment The distance from the surface 141 a to the end surface of the second stepped portion 144 on the valve hole 114 side is smaller by 0.03 mm to 0.13 mm.

根據（7）所述的調節閥1，在閥座115a的下游側，即使在容易產生負壓區域的閥開度（例如0.035mm左右），第四環狀稜線119也切實位於第二環狀稜線146附近，並且能夠形成第二流路節流部18，能夠得到在抑制空蝕現象導致的振動的方面優異的調節閥1。According to the regulating valve 1 described in (7), on the downstream side of the valve seat 115a, even at the valve opening degree (for example, about 0.035 mm) in the region where negative pressure is likely to be generated, the fourth annular ridgeline 119 is reliably located in the second annular shape. Near the ridge line 146, and the second flow path narrowing portion 18 can be formed, and the control valve 1 excellent in suppressing vibration caused by the cavitation phenomenon can be obtained.

（8）根據（4）至（7）中任一項所述的調節閥1，其特徵在於，從階梯部143的外周面到第二階梯部144的外周面的距離在0.4mm至0.8mm的範圍內。(8) The regulating valve 1 according to any one of (4) to (7), wherein the distance from the outer peripheral surface of the stepped portion 143 to the outer peripheral surface of the second stepped portion 144 is 0.4 mm to 0.8 mm In the range.

申請人藉由實驗發現，根據（8）所述的調節閥1，噴射流被可靠地引導到閥孔114側，並且噴射流引起的閥體14的振動的發生被抑制，由此能夠使調節閥1優異。The applicant found through experiments that, according to the regulating valve 1 described in (8), the jet flow is reliably guided to the valve hole 114 side, and the occurrence of vibration of the valve body 14 caused by the jet flow is suppressed, thereby enabling the regulation Valve 1 is excellent.

（9）根據（1）至（8）中任一項所述的調節閥1，其特徵在於，其具有：在內部具有閥室113和閥孔114的閥主體11、從與閥體14的抵接分離方向平行的方向堆疊在閥主體11上的上蓋12、具有在中央部151與閥體14連接且在與中央部151的外周進行閥體14的抵接分離時彈性變形的薄膜部152的薄膜構件15；閥主體11在上蓋12側具有安裝薄膜構件15的開口部116，薄膜構件15沿薄膜部152的外周具有環狀固定部153，藉由將環狀固定部153壓入開口部116中而安裝在開口部116的薄膜構件15係藉由上蓋12和閥主體11從抵接分離方向的兩側夾持環狀固定部153來進行固定；環狀固定部153沿著外周的整個圓周，除了上蓋12側的端部，具有從外周面至閥主體11側的端面進行開口的環狀缺口部153c。 (9) The regulating valve 1 according to any one of (1) to (8), is characterized in that it has: a valve body 11 having a valve chamber 113 and a valve hole 114 inside; The upper cover 12 stacked on the valve main body 11 in a direction parallel to the abutment and separation direction has a film portion 152 that is connected to the valve body 14 at the central portion 151 and elastically deformed when the valve body 14 is abutted and separated from the outer periphery of the central portion 151 The film member 15; the valve main body 11 has an opening 116 for installing the film member 15 on the side of the upper cover 12, and the film member 15 has an annular fixing part 153 along the outer periphery of the film part 152, by pressing the annular fixing part 153 into the opening In 116, the film member 15 installed in the opening 116 is fixed by the upper cover 12 and the valve body 11 clamping the ring-shaped fixing part 153 from both sides of the abutting and separating direction; the ring-shaped fixing part 153 is fixed along the entire outer circumference. The circumference has an annular notch 153c opening from the outer peripheral surface to the end surface on the valve main body 11 side except for the end on the upper cover 12 side.

根據(9)所述的調節閥1，上蓋12和閥主體11從抵接分離方向的兩側夾持的環狀固定部153沿外周整個圓周，除了上蓋12側的端部，從外周面至閥主體11側的端面具有開口的環狀缺口部153c，因此環狀固定部153的上蓋12側的上端面153b能夠確保被上蓋12蓋住的面積。藉由在環狀固定部153確保藉由上蓋12蓋住的面積，能夠可靠地固定薄膜構件15，並且能夠抑制與薄膜構件15連接的閥體14發生的振動。此外，能夠隨著環狀固定部153在環狀缺口部153c進行開口的程度來確保閥主體11的壁厚，能夠提高閥主體11的強度。 According to the regulating valve 1 described in (9), the upper cover 12 and the valve main body 11 clamp the ring-shaped fixing portion 153 from both sides in the abutting and separating direction along the entire circumference of the outer circumference, except for the end portion on the upper cover 12 side, from the outer peripheral surface to the The end surface on the side of the valve body 11 has an open annular notch 153c, so the upper end surface 153b on the side of the upper cover 12 of the annular fixing portion 153 can secure an area covered by the upper cover 12 . By ensuring the area covered by the upper cover 12 in the ring-shaped fixing portion 153 , the diaphragm member 15 can be securely fixed, and vibration of the valve body 14 connected to the diaphragm member 15 can be suppressed. In addition, the thickness of the valve main body 11 can be ensured to the extent that the annular fixing portion 153 opens in the annular notch 153c, and the strength of the valve main body 11 can be increased.

另外，上述的實施方式僅作為示例，並不對本發明進行任何限定。因此，理所當然地，本發明能夠在不脫離其要旨的範圍內進行各種改進、變形。 In addition, the above-mentioned embodiment is only an example, and does not limit the present invention in any way. Therefore, of course, various improvements and deformation|transformation are possible for this invention in the range which does not deviate from the summary.

例如，在本實施方式中，第一環狀稜線145，第二環狀稜線146，第三環狀稜線118和第四環狀稜線119以銳利形狀進行圖示，但是可以被作為圓角狀或倒角狀。 For example, in this embodiment, the first circular ridgeline 145, the second circular ridgeline 146, the third circular ridgeline 118, and the fourth circular ridgeline 119 are shown as sharp shapes, but they may be rounded or rounded. chamfered.

1:調節閥(流體控制閥的一例) 1: Control valve (an example of a fluid control valve)

11:閥主體 11: Valve body

12:上蓋 12: Upper cover

13:下蓋 13: Lower cover

14:閥體 14: valve body

15:薄膜構件 15: Film component

16:壓縮螺旋彈簧 16: Compression coil spring

17:流路節流部17: Flow path throttling part

18:第二流路節流部18: The second flow path throttling part

19:O形環19: O-ring

21:閥主體21: Valve body

24:閥體24: valve body

27:節流部27: Throttling department

28:第二流路節流部28: The second flow path throttling part

31:閥主體31: Valve body

34:閥體34: valve body

37:節流部37: Throttling department

38:第二流路節流部38: The second flow path throttling part

39:第三流路節流部39: The throttling part of the third flow path

111:輸入埠111: input port

111a:輸入流路111a: input flow path

112:輸出埠112: output port

112a:輸出流路112a: output flow path

113:閥室113: valve chamber

113a:閥孔側內表面113a: Inner surface of valve hole side

114:閥孔114: valve hole

115:環狀突出部115: annular protrusion

115a:閥座115a: valve seat

115b:環狀縮徑面115b: Annular reducing surface

116:開口部116: opening

116a:下游側流體室116a: downstream side fluid chamber

116b:壓力作用室116b: Pressure application chamber

117:環狀凹陷部117: Annular depression

118:第三環狀稜線118: The third circular ridge

119:第四環狀稜線119: The fourth circular ridge

121:導入埠121: import port

131:彈簧容納室131: spring accommodation room

141:擴徑部141: Diameter expansion part

141a:抵接面141a: abutment surface

142:薄膜部142: film department

143:階梯部143: Ladder Department

144:第二階梯部144: The second step

145:第一環狀稜線（環狀稜線的一例）145: The first circular ridgeline (an example of a circular ridgeline)

146:第二環狀稜線146: Second circular ridge

151:中央部151: central part

152:薄膜部152: film department

153:環狀固定部153: Ring fixed part

153a:壓入部153a: Press-in part

153b:上端面153b: upper end face

153c:環狀缺口部153c: Annular notch

214:閥孔214: valve hole

215:環狀突起215: ring protrusion

215a:閥座215a: valve seat

215b:環狀縮徑面215b: Annular reducing surface

217:環狀凹陷部217: Annular depression

218:第三環狀稜線 218: The third circular ridge

219:第四環狀稜線 219: The fourth circular ridge

241:擴徑部 241: Expanding part

241a:抵接面 241a: abutment surface

243:階梯部 243: Ladder department

244:第二階梯部 244: The second step

245:第一環狀稜線(環狀稜線的一個例子) 245: The first circular ridgeline (an example of circular ridgeline)

246:第二環狀稜線 246: Second circular ridge

314:閥孔 314: valve hole

315:環狀突出部 315: ring protrusion

315a:閥座 315a: valve seat

315b:環狀縮徑面 315b: Annular reducing surface

317:環狀凹陷部 317: Annular depression

318:第二環狀凹陷部 318: the second annular depression

319:第三環狀稜線 319: The third circular ridge

320:第四環狀稜線 320: The fourth circular ridge

322:第六環狀稜線 322: The sixth circular ridge

341:擴徑部 341: expansion part

341a:抵接面 341a: abutment surface

343:階梯部 343: Ladder department

344:第二階梯部 344: The second step

345:第三階梯部 345: The third step

346:第一環狀稜線(環狀稜線的一個例子) 346: The first circular ridgeline (an example of a circular ridgeline)

347:第二環狀稜線 347: Second circular ridge

348:第五環狀稜線348: Fifth circular ridge

d1~d4:距離d1~d4: distance

t11:壁厚t11: wall thickness

CL11:中心線CL11: Centerline

C1,C2:間隙尺寸C1, C2: gap size

D1:直徑尺寸D1: diameter size

E11:部分E11: part

E12:部分E12: part

E21:部分E21: part

E31:部分E31: part

第1圖係示出了本實施方式的調節閥的剖視圖。 FIG. 1 is a cross-sectional view showing a regulating valve according to this embodiment.

第2圖係示出了第1圖的部分E11的局部放大圖。 FIG. 2 shows a partially enlarged view of part E11 of FIG. 1 .

第3圖係示出了第2圖的部分E12的局部放大圖。 FIG. 3 shows a partially enlarged view of part E12 of FIG. 2 .

第4圖係示出了習知技術的調節閥的剖視圖。 Fig. 4 is a sectional view showing a regulating valve of the prior art.

第5圖係表示本實施方式的調節閥的閥座附近的控制流體的壓力分佈圖。 Fig. 5 is a diagram showing the pressure distribution of the control fluid in the vicinity of the valve seat of the regulating valve according to the present embodiment.

第6圖係表示在第二流路節流部的間隙尺寸擴大的情況下閥座附近的控制流體的壓力分佈圖。 FIG. 6 is a graph showing the pressure distribution of the control fluid in the vicinity of the valve seat when the gap size of the second flow path narrowing portion is enlarged.

第7圖係表示習知技術的調節閥的閥座附近的控制流體的壓力分佈圖。 Fig. 7 is a graph showing the pressure distribution of the control fluid in the vicinity of the valve seat of the conventional control valve.

第8圖係示出比較閥座附近的控制流體的壓力值的圖表。 FIG. 8 is a graph showing the comparison of the pressure values of the control fluid in the vicinity of the valve seat.

第9圖係表示本實施方式的調節閥的閥座附近的控制流體的流速的分佈圖。 Fig. 9 is a distribution diagram showing the flow velocity distribution of the control fluid in the vicinity of the valve seat of the regulating valve according to the present embodiment.

第10圖係表示在閥座與階梯部的距離擴大的情況下閥座附近的控制流體的流速的分佈圖。 FIG. 10 is a distribution diagram showing the flow velocity of the control fluid in the vicinity of the valve seat when the distance between the valve seat and the stepped portion increases.

第11圖係表示習知技術的調節閥的閥座附近的控制流體的流速的分佈圖。 Fig. 11 is a diagram showing the distribution of the flow velocity of the control fluid in the vicinity of the valve seat of the conventional control valve.

第12圖係表示本實施方式的調節閥的第一變型示例中的閥座附近的控制流體的壓力分佈圖。 FIG. 12 is a pressure distribution diagram of the control fluid in the vicinity of the valve seat in the first modified example of the regulating valve of the present embodiment.

第13圖是本實施方式的調節閥的第二變型示例中的局部放大圖。 Fig. 13 is a partially enlarged view of a second modified example of the regulating valve of the present embodiment.

第14圖係示出了第13圖的部分E21的局部放大圖。 FIG. 14 shows a partially enlarged view of part E21 of FIG. 13 .

第15圖是本實施方式的調節閥的第三變型示例中的局部放大圖。 Fig. 15 is a partially enlarged view of a third modified example of the regulating valve of the present embodiment.

第16圖係示出了第15圖的部分E31的局部放大圖。 FIG. 16 shows a partially enlarged view of part E31 of FIG. 15 .

11:閥主體 11: Valve body

14:閥體 14: valve body

113a:閥孔側內表面 113a: Inner surface of valve hole side

113:閥室 113: valve chamber

114:閥孔 114: valve hole

115:環狀突出部 115: annular protrusion

115a:閥座 115a: valve seat

115b:環狀縮徑面 115b: Annular reducing surface

117:環狀凹陷部 117: Annular depression

141:擴徑部 141: Diameter expansion part

141a:抵接面 141a: abutment surface

143:階梯部 143: Ladder Department

144:第二階梯部 144: The second step

d1~d4:距離 d1~d4: distance

CL11:中心線 CL11: Centerline

C1,C2:間隙尺寸 C1, C2: gap size

E11:部分 E11: part

E12:部分 E12: part

D1:直徑尺寸 D1: diameter size

Claims

一種流體控制閥，其特徵在於，包括閥體（14）、容納所述閥體的上游閥室（113）、與所述閥室連通的下游閥孔（114）、以及沿著所述閥孔的外周從所述閥室的閥孔側內表面突出設置、且在頂端具有閥座的環狀突出部（115），藉由使所述閥體與所述閥座抵接分離來進行流體控制，所述環狀突出部在所述環狀突出部的內徑側的整個圓周具有使所述環狀突出部的內徑向所述閥孔縮徑的環狀縮徑面（115b），所述閥體具有與所述閥座抵接的抵接面（141a），在所述閥座的內周側具有從所述抵接面向所述閥孔側突出設置的、具有比所述閥孔的內徑大的直徑、並且與所述閥孔同軸的圓柱狀的階梯部（143），所述階梯部的外周面與所述階梯部的所述閥孔之側的端面相交的環狀環狀稜線（145）位於所述環狀縮徑面附近，形成流路節流部（17）。A fluid control valve, characterized by comprising a valve body (14), an upstream valve chamber (113) accommodating the valve body, a downstream valve hole (114) communicating with the valve chamber, and a The outer circumference protrudes from the inner surface of the valve hole side of the valve chamber, and has an annular protrusion (115) with a valve seat at the top end, and fluid control is performed by making the valve body abut and separate from the valve seat. , the annular protrusion has an annular diameter-reducing surface (115b) on the entire circumference of the inner diameter side of the annular protrusion to reduce the diameter of the inner diameter of the annular protrusion to the valve hole, so The valve body has an abutment surface (141a) that abuts against the valve seat, and on the inner peripheral side of the valve seat, there is a valve hole that protrudes from the abutment surface to the side of the valve hole and has a A cylindrical stepped part (143) with a large inner diameter and coaxial with the valve hole, an annular ring whose outer peripheral surface intersects the end surface of the stepped part on the side of the valve hole The shaped ridgeline (145) is located near the ring-shaped diameter-reducing surface, forming a flow path throttling part (17).

如請求項1所述的流體控制閥，其中，所述流路節流部（17）的所述環狀稜線（145）的徑向方向的間隙尺寸乘以所述環狀突出部的所述閥座（115a）的中心部的直徑尺寸的值在0.6至1.2之間。The fluid control valve according to claim 1, wherein the gap size in the radial direction of the annular ridgeline (145) of the flow path restriction (17) is multiplied by the The value of the diameter dimension of the central portion of the valve seat (115a) is between 0.6 and 1.2.

如請求項1所述的流體控制閥，其中，從所述閥座（115a）的中心部至所述階梯部（143）的外周面的距離為0.4mm至0.8mm的範圍內。The fluid control valve according to claim 1, wherein the distance from the central part of the valve seat (115a) to the outer peripheral surface of the stepped part (143) is in the range of 0.4 mm to 0.8 mm.

如請求項2所述的流體控制閥，其中，從所述閥座（115a）的中心部至所述階梯部（143）的外周面的距離為0.4mm至0.8mm的範圍內。The fluid control valve according to claim 2, wherein the distance from the central part of the valve seat (115a) to the outer peripheral surface of the stepped part (143) is in the range of 0.4 mm to 0.8 mm.

如請求項1所述的流體控制閥，其中，所述閥體（14）具有從所述階梯部（143）的所述閥孔（114）之側的端面向所述閥孔之側突出設置的、具有比所述階梯部（143）的外徑小的直徑、並且與所述閥孔同軸的圓柱狀的第二階梯部（144），所述第二階梯部的外周面與所述第二階梯部的所述閥孔之側的端面相交的第二環狀稜線（146）位於所述閥孔的內周面附近，形成第二縮流路窄部（18）。The fluid control valve according to claim 1, wherein the valve body (14) protrudes from the end of the stepped portion (143) on the side of the valve hole (114) toward the side of the valve hole a cylindrical second stepped portion (144) having a diameter smaller than the outer diameter of the stepped portion (143) and coaxial with the valve hole, the outer peripheral surface of the second stepped portion is in contact with the first stepped portion The second annular ridgeline (146) where the end surfaces on the side of the valve hole of the two-step part intersect is located near the inner peripheral surface of the valve hole, forming a second constricted flow passage narrow part (18).

如請求項5所述的流體控制閥，其中，所述第二流路節流部（18）的所述第二環狀稜線（146）的徑向方向的間隙尺寸乘以所述環狀突出部的所述閥座（115a）的中心部的直徑尺寸的值在0.6至1.2之間。The fluid control valve according to claim 5, wherein the gap size in the radial direction of the second annular ridgeline (146) of the second flow path restriction (18) is multiplied by the annular protrusion The value of the diameter of the central part of the valve seat (115a) is between 0.6 and 1.2.

如請求項5所述的流體控制閥，其中，所述環狀縮徑面（115b）與所述閥孔（114）的內周面藉由從所述環狀縮徑面向所述閥孔之側穿鑿設置的、與所述閥孔同軸的環狀凹陷部（117）而連接，所述環狀凹陷部的內周面與所述環狀縮徑面相交的第三環狀稜線（118）位於所述環狀稜線附近，與所述環狀稜線（145）共同形成流路節流部（17），所述環狀凹陷部的所述閥孔之側的內表面與所述閥孔的內周面相交的第四環狀稜線（119）位於所述第二環狀稜線附近，與所述第二環狀稜線共同形成所述第二流路節流部（18）。The fluid control valve according to claim 5, wherein, the annular diameter-reducing surface (115b) and the inner peripheral surface of the valve hole (114) The ring-shaped recessed part (117) coaxial with the valve hole is provided through side drilling, and the third ring-shaped ridge line (118) where the inner peripheral surface of the ring-shaped recessed part intersects with the ring-shaped diameter-reducing surface It is located near the annular ridgeline and together with the annular ridgeline (145) forms a flow path restriction (17), the inner surface of the annular depression on the side of the valve hole and the valve hole The fourth annular ridgeline (119) intersecting the inner peripheral surfaces is located near the second annular ridgeline, and together with the second annular ridgeline forms the second flow path restriction (18).

如請求項7所述的流體控制閥，其中，從所述閥座（115a）至所述環狀凹陷部（117）的所述閥孔（114）之側的內表面的距離（d3）比從所述抵接面（141a）至所述第二階梯部（144）的所述閥孔之側的端面的距離（d4）小0.03mm至0.13mm。The fluid control valve according to claim 7, wherein the distance (d3) from the valve seat (115a) to the inner surface of the annular recess (117) on the side of the valve hole (114) is greater than A distance ( d4 ) from the abutting surface ( 141 a ) to an end surface of the second stepped portion ( 144 ) on the side of the valve hole is 0.03 mm to 0.13 mm smaller.

如請求項5所述的流體控制閥，其中，從所述階梯部（143）的外周面至所述第二階梯部（144）的外周面的距離（d2）在0.4mm至0.8mm的範圍內。The fluid control valve according to claim 5, wherein the distance (d2) from the outer peripheral surface of the stepped portion (143) to the outer peripheral surface of the second stepped portion (144) is in the range of 0.4 mm to 0.8 mm Inside.

如請求項1所述的流體控制閥，其中，更包括：在內部具有所述閥室（113）和所述閥孔（114）的閥主體（11）、從相對於所述閥體（14）的抵接分離方向平行的方向堆疊在所述閥主體上的蓋構件（12）、以及薄膜構件（15），具有在中央部與所述閥體連接、且在與所述中央部的外周進行所述閥體的抵接分離時彈性變形的薄膜部（152），所述閥主體在所述蓋構件之側具有安裝所述薄膜構件的開口部（116），所述薄膜構件沿所述薄膜部的外周具有環狀固定部（153），藉由將所述環狀固定部壓入所述開口部中而安裝在所述開口部的所述薄膜構件係藉由所述蓋構件和所述閥主體從抵接分離方向的兩側夾持所述環狀固定部來進行固定，所述環狀固定部沿著外周的整個圓周、除了所述蓋構件側的端部，具有從外周面至所述閥主體之側的端面進行開口的環狀缺口部（153c）。The fluid control valve according to claim 1, further comprising: a valve main body (11) having the valve chamber (113) and the valve hole (114) inside, and the valve body (14) ) The cover member (12) and the film member (15) stacked on the valve body in a direction parallel to the abutting and separating direction have a central part connected to the valve body and an outer periphery connected to the central part The thin film portion (152) elastically deforms when the valve body is abutted and separated. The valve main body has an opening portion (116) for installing the thin film member on the side of the cover member. The outer periphery of the film part has a ring-shaped fixing part (153), and the film member installed in the opening part by pressing the ring-shaped fixing part into the opening part is connected by the cover member and the The valve main body is clamped and fixed from both sides in the abutment and separation direction by the ring-shaped fixing portion, which has a ring-shaped fixing portion extending from the outer peripheral surface along the entire circumference of the outer circumference except for the end portion on the side of the cover member. An annular notch (153c) opening to the end surface on the side of the valve main body.