TWI791124B - laminate - Google Patents
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- TWI791124B TWI791124B TW108129216A TW108129216A TWI791124B TW I791124 B TWI791124 B TW I791124B TW 108129216 A TW108129216 A TW 108129216A TW 108129216 A TW108129216 A TW 108129216A TW I791124 B TWI791124 B TW I791124B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/02—Physical, chemical or physicochemical properties
- B32B7/022—Mechanical properties
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/02—Physical, chemical or physicochemical properties
- B32B7/023—Optical properties
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/04—Interconnection of layers
- B32B7/06—Interconnection of layers permitting easy separation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/04—Interconnection of layers
- B32B7/12—Interconnection of layers using interposed adhesives or interposed materials with bonding properties
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/40—Adhesives in the form of films or foils characterised by release liners
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/40—Properties of the layers or laminate having particular optical properties
- B32B2307/42—Polarizing, birefringent, filtering
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/70—Other properties
- B32B2307/748—Releasability
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/30—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
- C09J2301/312—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier parameters being the characterizing feature
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Laminated Bodies (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Adhesive Tapes (AREA)
- Polarising Elements (AREA)
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Abstract
本發明之積層體(101)具備:於光學膜(11)固著積層有黏著劑層(12)之黏著光學膜(10)、暫時黏於黏著劑層(12)之表面之離型膜(70)、及暫時黏於光學膜(11)之表面保護膜(50)。離型膜(70)及表面保護膜(50)存在伸出至較黏著光學膜(10)之外周緣更外側之區域,表面保護膜(50)之黏著劑層(52)與離型膜(70)相接。黏著光學膜(10)及表面保護膜(50)相對於丙烯酸系樹脂板之接著力分別為特定範圍,離型膜(70)及表面保護膜(50)之三點彎曲荷重分別為特定範圍。The laminate (101) of the present invention comprises: an adhesive optical film (10) with an adhesive layer (12) fixed and laminated on the optical film (11), and a release film temporarily attached to the surface of the adhesive layer (12). 70), and the surface protective film (50) temporarily adhered to the optical film (11). The release film (70) and the surface protection film (50) exist to protrude to the area outside the periphery of the adhesive optical film (10), the adhesive layer (52) of the surface protection film (50) and the release film ( 70) Connect. The adhesive force of the adhesive optical film (10) and the surface protection film (50) to the acrylic resin plate are respectively in specific ranges, and the three-point bending loads of the release film (70) and the surface protection film (50) are respectively in specific ranges.
Description
本發明係關於一種具備暫時黏於黏著光學膜之表面之離型膜及表面保護膜之積層體。The present invention relates to a laminate with a release film temporarily adhered to the surface of an adhesive optical film and a surface protection film.
顯示器等光學裝置具備偏光板、相位差膜、防反射膜及硬塗膜等光學膜。該等光學膜作為在一面積層有黏著劑層之黏著光學膜而貼合於圖像顯示單元等。黏著光學膜在貼合於圖像顯示單元等被黏著體之前之期間,於黏著劑層之表面暫時黏有離型膜。又,於光學膜之表面,為了防止光學膜之損傷等而暫時黏有表面保護膜。將黏著光學膜貼合於被黏著體時,自黏著劑層之表面剝離離型膜,並將露出之黏著劑層貼合於圖像顯示單元等被黏著體。此後,自光學膜剝離去除表面保護膜。Optical devices such as displays include optical films such as polarizing plates, retardation films, antireflection films, and hard coat films. These optical films are bonded to an image display unit or the like as an adhesive optical film having an adhesive layer layered on one surface. Before the adhesive optical film is attached to an adherend such as an image display unit, a release film is temporarily attached to the surface of the adhesive layer. In addition, a surface protection film is temporarily attached to the surface of the optical film in order to prevent damage to the optical film. When attaching the adhesive optical film to an adherend, the release film is peeled off from the surface of the adhesive layer, and the exposed adhesive layer is attached to an adherend such as an image display unit. Thereafter, the surface protection film was peeled off from the optical film.
通常將黏著光學膜切斷為與圖像顯示裝置之圖像尺寸等相符合之形狀、大小之單片。若使用湯姆遜刀(Thomson blade)等對在黏著光學膜上暫時黏有離型膜及表面保護膜之積層體進行沖裁,則表面保護膜、黏著光學膜及離型膜會被切為相同之形狀大小,成為各端面對齊之狀態。若黏著光學膜之端面與表面保護膜及離型膜之端面對齊,則黏著劑層露出至端面,因此存在成為導致糊劑污染、糊劑缺損之原因之情形。又,存在因黏著劑自端面之滲出導致發生積層體黏連、或者使離型膜或表面保護膜之剝離作業變得困難之情形。Usually, the adhesive optical film is cut into a single piece having a shape and a size conforming to the image size of an image display device. If a laminate with a release film and a surface protection film temporarily attached to an adhesive optical film is punched using a Thomson blade, etc., the surface protection film, adhesive optical film, and release film will be cut into the same The shape and size of each end face are aligned. If the end faces of the adhesive optical film are aligned with the end faces of the surface protection film and the release film, the adhesive layer will be exposed to the end faces, which may cause contamination of the paste or chipping of the paste. In addition, there are cases where the laminate is blocked due to seepage of the adhesive from the end surface, or the peeling operation of the release film or the surface protection film becomes difficult.
於專利文獻1中揭示有如下設計之積層體:使尺寸大於黏著光學膜之離型膜及表面保護膜貼合於黏著光學膜,從而使離型膜及表面保護膜伸出至黏著光學膜之外周緣之外側。藉由使離型膜及表面保護膜之端面位於較黏著光學膜之端面更外側,能夠解決黏著劑自端面之滲出所導致之問題。
[先前技術文獻]
[專利文獻]
[專利文獻1]日本專利特開2002-303730號公報[Patent Document 1] Japanese Patent Laid-Open No. 2002-303730
[發明所欲解決之問題][Problem to be solved by the invention]
貼合於黏著光學膜之表面保護膜具備固著積層於膜基材之表面之黏著劑層,經由該黏著劑層與光學膜貼合。若表面保護膜被設計成伸出至黏著光學膜之外側,則成為表面保護膜之黏著劑層露出之狀態。若表面保護膜之黏著劑層露出,則存在產生如下問題之情形:由附著沈澱於黏著劑層之異物等所導致之污染,或者,由黏著劑層附著於其他之構件或搬送裝置等所導致之糊劑污染或表面保護膜之剝離等。因此,於專利文獻1中,表面保護膜之伸出量設定為5 mm以下。The surface protection film bonded to the adhesive optical film has an adhesive layer fixedly laminated on the surface of the film substrate, and is bonded to the optical film through the adhesive layer. If the surface protection film is designed to protrude to the outside of the adhesive optical film, the adhesive layer of the surface protection film will be exposed. If the adhesive layer of the surface protection film is exposed, the following problems may occur: contamination caused by foreign matter deposited on the adhesive layer, or adhesion of the adhesive layer to other components or conveying equipment, etc. Paste pollution or peeling of the surface protective film, etc. Therefore, in
即使於表面保護膜之伸出量較小之情形時,亦難以完全消除因表面保護膜之黏著劑層之露出導致之汚染或剝離之問題。另一方面,若與專利文獻1之公開相反地有意地增大表面保護膜及離型膜之伸出量,則在自黏著光學膜之外周緣伸出之區域中,表面保護膜之黏著劑層會與離型膜密接,因此可防止黏著劑層之露出。Even when the protruding amount of the surface protection film is small, it is difficult to completely eliminate the problem of contamination or peeling due to the exposure of the adhesive layer of the surface protection film. On the other hand, if contrary to the disclosure of
但是,若表面保護膜之黏著劑層與離型膜密接,則自黏著光學膜剝離離型膜時,存在難以選擇性地剝離離型膜之情形。具體而言,存在黏著光學膜之黏著劑層與離型膜之界面處之剝離變得困難、或者於表面保護膜與光學膜之界面處發生剝離之情形,有光學膜於被黏著體之貼合作業之效率降低之傾向。However, if the pressure-sensitive adhesive layer of the surface protection film is in close contact with the release film, it may be difficult to selectively peel the release film when peeling the release film from the adhesive optical film. Specifically, there is a case where peeling at the interface between the adhesive layer and the release film that adheres the optical film becomes difficult, or peeling occurs at the interface between the surface protection film and the optical film, and there is a case where the optical film is attached to the adherend. Tendency to reduce the efficiency of cooperative business.
鑒於上述情況,本發明之目的在於提供一種於黏著光學膜暫時黏有表面保護膜之狀態下能夠容易地進行離型膜之剝離作業的積層體。 [解決問題之技術手段]In view of the above circumstances, an object of the present invention is to provide a laminate in which a release film can be easily peeled off in a state where a surface protective film is temporarily attached to an optical film. [Technical means to solve the problem]
本發明人等進行研究,結果發現,藉由將黏著光學膜之黏著劑層之接著力、表面保護膜之黏著劑層之接著力、表面保護膜之機械特性及離型膜之機械特性分別設定為特定範圍,可解決上述課題。The inventors of the present invention conducted research and found that by setting the adhesive force of the adhesive layer on the optical film, the adhesive force of the adhesive layer on the surface protection film, the mechanical properties of the surface protection film, and the mechanical properties of the release film, respectively For a specific range, the above-mentioned problems can be solved.
本發明之積層體具備:於光學膜固著積層有第一黏著劑層之黏著光學膜、暫時黏於第一黏著劑層之表面之離型膜、及暫時黏於光學膜之表面保護膜。表面保護膜具備膜基材及固著積層於膜基材之第二黏著劑層,表面保護膜之第二黏著劑層暫時黏於光學膜之第二主面。離型膜及表面保護膜存在伸出至較黏著光學膜之外周緣更外側之區域,表面保護膜之黏著劑層與離型膜相接。The laminate of the present invention includes: an adhesive optical film in which the first adhesive layer is fixedly laminated on the optical film, a release film temporarily adhered to the surface of the first adhesive layer, and a surface protection film temporarily adhered to the optical film. The surface protection film has a film substrate and a second adhesive layer fixedly laminated on the film substrate, and the second adhesive layer of the surface protection film is temporarily adhered to the second main surface of the optical film. The release film and the surface protection film have a region protruding outside the outer periphery of the adhesive optical film, and the adhesive layer of the surface protection film is in contact with the release film.
關於積層體,較佳為於黏著光學膜之整個外周,離型膜及表面保護膜伸出至較黏著光學膜之外周緣更外側。表面保護膜較佳為自黏著光學膜之外周緣向外側伸出5 mm以上。離型膜可存在伸出至較表面保護膜之外周緣更外側之區域。Regarding the laminate, it is preferable that the release film and the surface protection film protrude outside the outer periphery of the adhesive optical film over the entire periphery of the adhesive optical film. The surface protection film preferably protrudes outward by more than 5 mm from the outer periphery of the adhesive optical film. The release film may have a region protruding outside the outer periphery of the surface protection film.
黏著光學膜之第一黏著劑層相對於丙烯酸系樹脂板之拉伸速度0.3 m/分鐘下之180°剝離力為3 N/25 mm以上。表面保護膜之第二黏著劑層相對於丙烯酸系樹脂板之拉伸速度0.3 m/分鐘下之180°剝離力為1 N/25 mm以下。黏著光學膜之第一黏著劑層相對於丙烯酸系樹脂板之接著力較佳為表面保護膜之第二黏著劑層相對於丙烯酸系樹脂板之接著力之20倍以上。The 180° peel force of the first adhesive layer adhering the optical film to the acrylic resin plate at a tensile speed of 0.3 m/min is 3 N/25 mm or more. The 180° peel force of the second adhesive layer of the surface protection film relative to the acrylic resin plate at a tensile speed of 0.3 m/min is 1 N/25 mm or less. The adhesive force of the first adhesive layer of the optical film to the acrylic resin plate is preferably more than 20 times the adhesive force of the second adhesive layer of the surface protection film to the acrylic resin plate.
離型膜之三點彎曲荷重為1 g以下。表面保護膜之三點彎曲荷重為1.2 g以上。表面保護膜之三點彎曲荷重較佳為離型膜之三點彎曲荷重之3倍以上。表面保護膜之膜基材之厚度較佳為60 μm以上。 [發明之效果]The three-point bending load of the release film is 1 g or less. The three-point bending load of the surface protection film is 1.2 g or more. The three-point bending load of the surface protection film is preferably more than three times the three-point bending load of the release film. The thickness of the film substrate of the surface protection film is preferably 60 μm or more. [Effect of Invention]
於本發明之積層體中,由於離型膜及表面保護膜以伸出至較黏著光學膜之外周緣更外側之方式設置,因此能夠抑制因黏著劑於黏著光學膜之端面之滲出所導致之不良情況。又,於離型膜及表面保護膜伸出至較黏著光學膜之外周緣更外側之區域中,由於離型膜與表面保護膜之黏著劑層相接,故而黏著劑之露出得以抑制。黏著光學膜及表面保護膜各自相對於丙烯酸系樹脂板之接著力為特定範圍,離型膜及表面保護膜各自之三點彎曲荷重為特定範圍,因此,於在黏著光學膜暫時黏有表面保護膜之狀態下,可以容易地進行離型膜之剝離作業。In the laminated body of the present invention, since the release film and the surface protection film are provided in such a manner as to protrude to the outside of the outer periphery of the adhesive optical film, it is possible to suppress leakage of the adhesive from the end surface of the adhesive optical film. bad situation. Also, in the area where the release film and the surface protection film protrude outside the outer periphery of the adhesive optical film, since the release film is in contact with the adhesive layer of the surface protection film, exposure of the adhesive is suppressed. The adhesive strength of the adhesive optical film and the surface protection film to the acrylic resin board is within a specific range, and the three-point bending load of the release film and the surface protection film is within a specific range. Therefore, when the optical film is temporarily adhered to the surface protection In the state of the film, the peeling operation of the release film can be easily performed.
[積層體之積層構成]
圖1係於黏著光學膜10暫時黏結積層有表面保護膜50及離型膜70之積層體101之剖視圖。黏著光學膜10具備固著積層於光學膜11之第一主面之黏著劑層12。於第一黏著劑層12暫時黏有離型膜70。表面保護膜50具備固著積層於膜基材51之表面之第二黏著劑層52,第二黏著劑層52貼合於光學膜11之第二主面。[Layered composition of laminated body]
FIG. 1 is a cross-sectional view of a
再者,「固著」係指積層之2個層牢固地接著,且不可能或不易發生兩者界面處之剝離之狀態。「暫時黏結」係指積層之2個層間之接著力較小,且在兩者之界面可容易地剝離之狀態。Furthermore, "adhesion" refers to a state in which two layers of a laminate are firmly bonded, and peeling at the interface between the two is impossible or difficult to occur. "Temporary adhesion" refers to the state in which the adhesive force between the two layers of the laminate is relatively small and can be easily peeled off at the interface between the two.
圖2係自表面保護膜50側觀察積層體101之俯視圖,圖2之I-I線處之剖視圖相當於圖1。表面保護膜50之尺寸及離型膜70之尺寸大於黏著光學膜10之尺寸。於積層體101中,以在整個外周自黏著光學膜10之端面伸出之方式設置有表面保護膜50及離型膜70。FIG. 2 is a plan view of the
於表面保護膜50及離型膜70伸出至黏著光學膜10之端面之外側之區域中,表面保護膜50之黏著劑層52成為與離型膜70相接而貼合之狀態。因此,黏著光學膜10之端面被表面保護膜50及離型膜70覆蓋,可防止黏著劑層12自光學膜11之端面之伸出所導致之糊劑缺損或糊劑污染。In the area where the
於本發明之積層體中,只要於黏著光學膜10之外周之至少一部分,表面保護膜50及離型膜70伸出至較黏著光學膜10之外周緣更外側即可。為了降低黏著劑層12在光學膜11之端面之露出,較佳為於黏著光學膜10之外周之1/3以上之區域,表面保護膜50及離型膜70伸出至較黏著光學膜10之外周緣更外側。表面保護膜50及離型膜70伸出至較黏著光學膜10之外周緣更外側之區域較佳為黏著光學膜10之外周之1/2以上、較佳為2/3以上。較佳為如圖2所示,於黏著光學膜10之整個外周,表面保護膜50及離型膜70伸出至較黏著光學膜10之外周緣更外側。In the laminate of the present invention, it is only necessary that the
表面保護膜50自黏著光學膜10之端面之伸出量L1
較佳為5 mm以上,更佳為8 mm以上,進而較佳為10 mm以上。L1
可為15 mm以上或20 mm以上。離型膜70自黏著光學膜10之端面之伸出量L2
較佳為表面保護膜50之伸出量L1
以上。The protrusion amount L 1 of the
藉由使表面保護膜50及離型膜70自黏著光學膜10之端面之伸出量較大,可確保表面保護膜50之黏著劑層52與離型膜70之接著面積,可適當地維持離型膜70與表面保護膜之接著狀態。藉由使離型膜70之伸出量L2
為表面保護膜50之伸出量L1
以上,從而成為於自黏著光學膜10伸出之整個區域在黏著劑層52暫時黏有離型膜70之狀態,因此,能夠抑制因黏著劑層52之露出所導致之不良情況。By making the protruding amount of the
於離型膜70之伸出量L2
大於表面保護膜50之伸出量L1
之情形時,可選擇性地捏取離型膜70,故而容易進行自積層體剝離離型膜70之剝離作業。於L2
大於L1
之情形時,L2
-L1
較佳為2 mm以上,更佳為3 mm以上,進而較佳為5 mm以上。L2
-L1
可為7 mm以上或10 mm以上。When the protruding amount L2 of the
表面保護膜50之伸出量L1
、及離型膜70之伸出量L2
之上限無特別之限定。若考慮作業性或面積效率等,則L1
及L2
較佳為150 mm以下,更佳為100 mm以下,進而較佳為70 mm以下。L1
及L2
可為50 mm以下、40 mm以下、30 mm以下或20 mm以下。The upper limit of the protrusion amount L 1 of the
於以提高離型膜之剝離作業性為目的而設置離型膜70之伸出量L2
大於表面保護膜50之伸出量L1
之部分之情形時,可使剝離時離型膜之捏取部分選擇性地自黏著劑層之外周緣伸出。例如,可如圖3之剖視圖及圖4之俯視圖所示之積層體103,於離型膜70之外周局部地設置伸出部77,捏住該伸出部分而可將離型膜剝離。In order to improve the peeling workability of the release film, when the part where the protruding amount L 2 of the
[黏著光學膜於被黏著體之貼合]
圖5A~5F係表示將黏著光學膜10貼合於被黏著體30之情況之概念圖。首先,自積層體101剝離離型膜70,使黏著光學膜10之黏著劑層12露出(圖5A~5C)。此後,經由黏著劑層12將光學膜11貼合於被黏著體30(圖5D)。作為被黏著體30之例,可列舉:液晶單元、有機EL單元等圖像顯示單元。被黏著體30亦可為於圖像顯示單元之表面貼合有各種光學膜或覆蓋玻璃等之圖像顯示裝置等。將黏著光學膜10貼合於被黏著體後,自光學膜11將表面保護膜50剝離去除(圖5E~5F)。由於離型膜70及表面保護膜50具有可撓性,故而於剝離該等膜時,對於接著面以特定角度賦予拉伸應力,而於將膜彎曲之狀態下進行剝離。[Adhesion of optical film to adherend]
5A to 5F are conceptual diagrams showing a state in which the adhesive
將離型膜70剝離去除時,首先,於自黏著光學膜10之外周緣伸出之區域,進行表面保護膜50之黏著劑層52與離型膜70之界面處之剝離(圖5A),此後,進行黏著光學膜10之黏著劑層12與離型膜70之界面處之剝離(圖5B)。於工業製程中,要求能夠順利地實施離型膜70自表面保護膜50之剝離、及離型膜70自黏著光學膜10之剝離兩者,能夠選擇性地將剝離離型膜70自積層體剝離。When the
於表面保護膜50之黏著劑層52與離型膜70之界面處之剝離時,如圖5A所示,藉由使離型膜70彎曲並且賦予拉伸應力來進行剝離。此時,若表面保護膜50追隨離型膜70而發生彎曲,則無法形成接著界面與離型膜70之角度(剝離角度),未賦予適當之剝離力,而難以實現離型膜70自表面保護膜50之剝離。When peeling at the interface of the
使離型膜70彎曲時,為了抑制表面保護膜50追隨而發生彎曲,較佳為表面保護膜50之三點彎曲荷重大於離型膜70之三點彎曲荷重。三點彎曲荷重依據JIS K7171,於支點間距離25 mm、壓入速度0.5 m m/分鐘、壓入量5 mm之條件下進行測定。When the
彎曲荷重係表示材料之彎曲難度之指標,與彎曲剛度成比例。彎曲剛度係藉由縱彈性模數(楊氏模數)E與剖面二次力矩I之乘積即E×I表示。於剖面如膜般為長方形狀之情形時,剖面二次力矩I與膜之厚度d之立方成比例。因此,膜之三點彎曲荷重與膜之厚度之立方成比例。The bending load is an indicator of the bending difficulty of the material, which is proportional to the bending stiffness. Bending stiffness is expressed by the product of longitudinal elastic modulus (Young's modulus) E and section secondary moment I, ie E×I. When the section is rectangular like a film, the secondary moment I of the section is proportional to the cube of the thickness d of the film. Therefore, the three-point bending load of the film is proportional to the cube of the thickness of the film.
就使離型膜70彎曲而使剝離容易之觀點而言,離型膜70之三點彎曲荷重較佳為1 g以下,更佳為0.7 g以下,進而較佳為0.5 g以下,尤佳為0.4 g以下。另一方面,若彎曲荷重過小,則有膜不易處理之傾向,因此,離型膜70之三點彎曲荷重較佳為0.005 g以上,更佳為0.01 g以上,進而較佳為0.02 g以上。From the standpoint of bending the
於使離型膜70彎曲時,為了抑制表面保護膜50追隨而彎曲,表面保護膜50之三點彎曲荷重較佳為1.2 g以上,更佳為1.5 g以上。就相同之觀點而言,表面保護膜50之三點彎曲荷重較佳為離型膜70之三點彎曲荷重之3倍以上,更佳為6倍以上,進而較佳為8倍以上,尤佳為10倍以上。When the
為了使離型膜70之剝離容易,表面保護膜50之三點彎曲荷重越大越較。另一方面,若表面保護膜50之彎曲荷重過大,則存在難以自光學膜11之表面剝離表面保護膜之情形。因此,表面保護膜50之三點彎曲荷重較佳為60 g以下,更佳為50 g以下。表面保護膜50之三點彎曲荷重可為1.8 g以上或2 g以上。表面保護膜50之三點彎曲荷重可為40 g以下、30 g以下、20 g以下、15 g以下、10 g以下、7 g以下或5 g以下。In order to make the peeling of the
自黏著光學膜10之黏著劑層12剝離離型膜70時,如圖5B所示,需要在維持表面保護膜50之黏著劑層52與光學膜11之界面處之接著狀態直接選擇性地在黏著劑層12與離型膜70之界面處進行剝離。另一方面,於自光學膜11剝離表面保護膜50時,如圖5E所示,需要在維持黏著光學膜10之黏著劑層12與被黏著體30之界面處之接著狀態下直接選擇性地在黏著劑層52與光學膜11之界面處進行剝離。When peeling off the
為了容易實現黏著劑層12與離型膜70之界面處之剝離,離型膜70較佳為於與黏著劑層12之接觸面實施離型處理。作為用於離型處理之離型劑,可列舉:矽酮系離型劑、氟系、長鏈烷基系離型劑、脂肪酸醯胺系離型劑、二氧化矽粉等。In order to easily realize the peeling at the interface between the
為了容易實現黏著劑層52與光學膜11之界面處之剝離,較佳為黏著劑層12之接著力小於黏著劑層52之接著力。接著力可藉由在丙烯酸系樹脂板貼合試樣,拉伸速度0.3 m/分鐘下進行180°剝離試驗時之剝離力進行評價。以下,只要無特別說明,則將相對於丙烯酸系樹脂板之拉伸速度0.3 m/分鐘下之180°剝離試驗之剝離力記載為「接著力」。In order to easily realize the peeling at the interface between the
表面保護膜50(第二黏著劑層52)之接著力較佳為1 N/25 mm以下。黏著光學膜10(第一黏著劑層12)之接著力較佳為3 N/25 mm以上。剝離表面保護膜50時,為了抑制黏著光學膜10自被黏著體30之剝離,第一黏著劑層12之接著力較佳為第二黏著劑層52之接著力之20倍以上,更佳為25倍以上,進而較佳為30倍以上。第一黏著劑層12之接著力可為第二黏著劑層52之接著力之40倍以上、50倍以上、60倍以上、70倍以上、80倍以上、90倍以上、或100倍以上。The adhesive force of the surface protection film 50 (second adhesive layer 52) is preferably 1 N/25 mm or less. The adhesive force of adhering the optical film 10 (the first adhesive layer 12 ) is preferably 3 N/25 mm or more. When peeling off the
就表面保護膜50表現出對於光學膜11及離型膜70之適當之接著性、並且容易剝離之觀點而言,表面保護膜50之黏著劑層52之接著力較佳為0.01~1 N/25 mm,更佳為0.03~0.6 N/25 mm,進而較佳為0.05~0.4 N/25 mm。From the viewpoint that the
為了使黏著光學膜10對於被黏著體30牢固地接著,黏著光學膜10之黏著劑層12之接著力較佳為3 N/25 mm以上,更佳為6 N/25 mm以上,進而較佳為8 N/25 mm以上。黏著光學膜10之黏著劑層12之接著力之上限無特別之限定,於要求二次加工性之情形時,接著力較佳為80 N/25 mm以下,更佳為60 N/25 mm以下,進而較佳為50 N/25 mm以下。黏著光學膜10之黏著劑層12之接著力可為10 N/25 mm以上、13 N/25 mm以上、或15 N/25 mm以上。黏著光學膜10之黏著劑層12之接著力可為40 N/25 mm以下、35 N/25 mm以下、或30 N/25 mm以下。In order to firmly adhere the adhesive
[光學膜]
作為光學膜11,可列舉:偏光板、相位差板、視角擴大膜、視角限制(防窺視)膜、增亮膜、防反射膜、反射片、透明導電膜、角柱薄片、導光板等。光學膜11可為複數個光學膜視需要經由適宜之接著劑層或黏著劑層積層而成者。[Optical film]
Examples of the
作為偏光板,通常使用於偏光元件之單面或兩面視需要貼合有適宜之透明保護膜而得者。作為偏光元件,例如可列舉:使碘或二色性染料等二色性物質吸附於聚乙烯醇系膜、部分縮甲醛化聚乙烯醇系膜、乙烯-乙酸乙烯酯共聚物系部分皂化膜等親水性高分子膜並單軸延伸者、聚乙烯醇之脫水處理物或聚氯乙烯之脫氯化氫處理物等多烯系取向膜等。As a polarizing plate, it is usually used on one or both sides of a polarizing element, and a suitable transparent protective film is attached as needed. Examples of polarizing elements include polyvinyl alcohol-based films, partially formalized polyvinyl alcohol-based films, ethylene-vinyl acetate copolymer-based partially saponified films, etc. Hydrophilic polymer film uniaxially stretched, polyene-based oriented film such as dehydration treatment of polyvinyl alcohol or dehydrochlorination treatment of polyvinyl chloride, etc.
關於作為偏光元件保護膜之透明保護膜,較佳為使用:三乙酸纖維素等纖維素系樹脂、聚酯系樹脂、聚醚碸系樹脂、聚碸系樹脂、聚碳酸酯系樹脂、聚醯胺系樹脂、聚醯亞胺系樹脂、聚烯烴系樹脂、(甲基)丙烯酸系樹脂、環狀聚烯烴系樹脂(降𦯉烯系樹脂)、聚芳酯系樹脂、聚苯乙烯系樹脂、聚乙烯醇系樹脂等透明樹脂。偏光元件保護膜之厚度無特別之限定,就強度、處理性等作業性、薄膜性等方面而言,較佳為5~100 μm左右,更佳為10~80 μm。Regarding the transparent protective film as a polarizing element protective film, it is preferable to use: cellulose-based resins such as cellulose triacetate, polyester-based resins, polyether-based resins, poly-based resins, polycarbonate-based resins, polyacrylic resins, etc. Amine resins, polyimide resins, polyolefin resins, (meth)acrylic resins, cyclic polyolefin resins (northylene resins), polyarylate resins, polystyrene resins, Transparent resins such as polyvinyl alcohol-based resins. The thickness of the polarizing element protective film is not particularly limited, but it is preferably about 5 to 100 μm, more preferably 10 to 80 μm, in terms of workability such as strength and handleability, and thin film properties.
於在偏光元件之雙面設置偏光元件保護膜時,於正面及背面可使用包含相同之樹脂材料之膜,亦可以使用包含不同之樹脂材料之膜。又,為了實現液晶單元之光學補償或視角擴大等,亦可使用相位差板(延伸膜)等光學各向異性膜作為偏光元件保護膜。亦可偏光元件保護膜為λ/4板且由偏光元件及偏光元件保護膜構成圓偏光板。例如,藉由在有機EL元件之視認側表面配置圓偏光板,可遮蔽由金屬電極等造成之外界光之反射而提高顯示之視認性。When the polarizing element protective film is provided on both sides of the polarizing element, a film made of the same resin material or a film made of different resin materials may be used for the front and back. In addition, in order to achieve optical compensation of the liquid crystal cell, expansion of the viewing angle, etc., an optically anisotropic film such as a retardation plate (stretched film) can also be used as a polarizing element protective film. The polarizing element protective film may be a λ/4 plate, and the circular polarizing plate may be constituted by the polarizing element and the polarizing element protective film. For example, by arranging a circular polarizing plate on the viewing side surface of the organic EL element, the reflection of external light caused by metal electrodes and the like can be shielded to improve the visibility of the display.
偏光元件與偏光元件保護膜較佳為經由適宜之接著劑層貼合。於PVA系偏光元件與偏光元件保護膜之貼合中使用之接著劑只要光學透明,則其材料無特別限制,可列舉環氧系樹脂、矽酮系樹脂、丙烯酸系樹脂、聚胺基甲酸酯、聚醯胺、聚醚、聚乙烯醇等。黏著劑之厚度較佳為5 μm以下,更佳為0.01~3 μm,進而較佳為0.05~2 μm。The polarizer and the protective film for the polarizer are preferably bonded via an appropriate adhesive layer. The material of the adhesive used in laminating the PVA-based polarizer and the polarizer protective film is not particularly limited as long as it is optically transparent. Examples include epoxy-based resins, silicone-based resins, acrylic-based resins, and polyurethanes. Ester, polyamide, polyether, polyvinyl alcohol, etc. The thickness of the adhesive is preferably 5 μm or less, more preferably 0.01-3 μm, and still more preferably 0.05-2 μm.
作為接著劑,可使用水系接著劑、溶劑系接著劑、熱熔接著劑系、活性能量線硬化型接著劑等各種形態者。該等之中,由於可減小接著劑層之厚度,較佳為水系接著劑或活性能量線硬化型接著劑。As the adhesive, various forms such as water-based adhesives, solvent-based adhesives, hot-melt adhesives, and active energy ray-curable adhesives can be used. Among them, a water-based adhesive or an active energy ray-curable adhesive is preferable because the thickness of the adhesive layer can be reduced.
作為水系接著劑,例如可例示:乙烯聚合物系、明膠系、乙烯系乳膠系、聚胺基甲酸酯系、異氰酸酯系、聚酯系、環氧系等包含水溶性或水分散性聚合物之接著劑。包含此種水系接著劑之接著劑層係藉由在膜上塗佈水溶液並進行乾燥而形成。製備水溶液時亦可視需要調配交聯劑或其他添加劑、酸等觸媒。Examples of water-based adhesives include vinyl polymer-based, gelatin-based, vinyl-based latex-based, polyurethane-based, isocyanate-based, polyester-based, epoxy-based, etc., including water-soluble or water-dispersible polymers. Adhesives. The adhesive layer containing such a water-based adhesive is formed by applying an aqueous solution on a film and drying it. When preparing the aqueous solution, catalysts such as cross-linking agents or other additives and acids may also be formulated as needed.
活性能量線硬化型接著劑為能夠藉由照射電子束或紫外線等活性能量線而進行自由基聚合、陽離子聚合或陰離子聚合之接著劑。其中,就能夠以低能量進行硬化之方面而言,較佳為藉由紫外線照射而開始自由基聚合之光自由基聚合性接著劑。作為自由基聚合性接著劑之單體,可列舉:具有(甲基)丙烯醯基之化合物或具有乙烯基之化合物。The active energy ray-curable adhesive is an adhesive capable of radical polymerization, cationic polymerization, or anionic polymerization by irradiating active energy rays such as electron beams or ultraviolet rays. Among them, photoradically polymerizable adhesives that start radical polymerization by ultraviolet irradiation are preferred because they can be cured with low energy. As a monomer of a radically polymerizable adhesive agent, the compound which has a (meth)acryl group, or the compound which has a vinyl group is mentioned.
於光學膜11之表面可設置防反射層、防污層、光擴散層、易接著層,防靜電層、硬塗層、防黏附層等功能性賦予層。作為防反射層,可列舉:利用基於光之多重干涉作用之反射光之抵消效果而防止反射之薄層型、或藉由對表面賦予微細結構而降低反射率類型者。作為防污層之材料,可列舉:含氟基之矽烷系化合物、含氟基之有機化合物等。又,類鑽碳等亦可用作防污層之材料。防污層之厚度例如為0.01~2 μm左右,較佳為0.05~1.5 μm。On the surface of the
為了提高對接著劑或黏著劑等之濡濕性或密接性,亦可於光學膜之表面設置易接著層。作為易接著層之材料,可列舉:環氧系樹脂、異氰酸酯系樹脂、聚胺基甲酸酯系樹脂、聚酯系樹脂、分子中包含胺基之聚合物類、酯系胺基甲酸酯系樹脂、具有㗁唑啉基之丙烯酸系樹脂等。易接著層之厚度例如為0.05~3 μm,較佳為0.1~1 μm。In order to improve the wettability or adhesion of the adhesive agent or the adhesive agent, etc., an easy-adhesive layer may be provided on the surface of the optical film. Examples of materials for the easy-adhesive layer include epoxy-based resins, isocyanate-based resins, polyurethane-based resins, polyester-based resins, polymers containing amino groups in their molecules, and ester-based urethanes. resins, acrylic resins with oxazoline groups, etc. The thickness of the easily adhesive layer is, for example, 0.05-3 μm, preferably 0.1-1 μm.
作為防靜電層,可較佳地使用於黏合劑樹脂中添加有防靜電劑者。作為防靜電劑,可列舉:離子性表面活性劑系、聚苯胺、聚噻吩、聚吡咯、聚喹㗁啉等導電性聚合物;氧化錫、氧化銻、氧化銦等金屬氧化物系等。As an antistatic layer, what added an antistatic agent to binder resin can be used preferably. Examples of the antistatic agent include ionic surfactants, conductive polymers such as polyaniline, polythiophene, polypyrrole, and polyquinoline; metal oxides such as tin oxide, antimony oxide, and indium oxide; and the like.
[表面保護膜之膜基材]
作為表面保護膜50之膜基材51,可使用塑膠膜。於將表面保護膜50貼合於光學膜11之狀態下藉由目視或檢查裝置進行檢查時,膜基材51較佳為透明。膜基材51之全光線透過率較佳為80%以上,更佳為85%以上,進而較佳為90%以上。膜基材51之霧度較佳為10%以下,更佳為5%以下,進而較佳為2%以下。構成膜基材之樹脂材料無特別之限定。作為透明樹脂材料,較佳為使用丙烯酸系樹脂、聚烯烴、環狀聚烯烴、聚酯等。[Film base material of surface protection film]
As the
膜基材51之厚度無特別之限定,為了使表面保護膜50之三點彎曲荷重為上述之範圍,膜基材51之厚度較佳為60 μm以上,更佳為65 μm以上,進而較佳為70 μm以上。表面保護膜50之彎曲荷重依存於膜基材51之楊氏模數及厚度、以及黏著劑層52之楊氏模數及厚度,但由於黏著劑層之楊氏模數遠小於膜基材,因此,表面保護膜50之彎曲荷重基本等於膜基材51之彎曲荷重。由於彎曲荷重與膜基材之厚度之立方成比例,因此,膜基材之厚度成為表面保護膜50之彎曲剛度主要支配因素。因此,為了使表面保護膜50之彎曲剛度為上述範圍,較佳為增大膜基材51之厚度。The thickness of the
膜基材51可為2片以上之樹脂膜經由黏著劑層或接著劑層貼合而成者。藉由將複數個膜積層而增大厚度,可使表面保護膜之彎曲剛度增大。於膜基材51為2片以上之樹脂膜之積層體之情形時,較佳為各樹脂膜之厚度之合計為上述範圍。用於積層複數個膜之黏著劑或接著劑無特別之限定。用於積層複數個膜之黏著劑可為與表面保護膜50之第二黏著劑層52相同之黏著劑。膜基材51為2片以上之樹脂膜之積層體時之各樹脂膜之厚度之合計不包含用於膜貼合之接著劑或黏著劑之厚度。The
膜基材51之厚度之上限無特別之限定,就容易實現表面保護膜50自具有可撓性之光學膜11之剝離之觀點而言,膜基材51之厚度較佳為300 μm以下,更佳為250 μm以下,進而較佳為220 μm以下。The upper limit of the thickness of the
於將表面保護膜50貼合於光學膜11之狀態下進行光學檢查之情形時,存在膜基材51之相位差會成為檢查光帶色之原因之情形。就防止光學檢查時之漏光、著色、虹不均等之觀點而言,膜基材51之正面延遲Re較佳為100 nm以下,更佳為50 nm以下,進而較佳為30 nm以下,尤佳為20 nm以下。藉由使膜基材51之厚度方向之延遲Rth較小,即使在自傾斜方向觀察時,亦可防止漏光、著色、虹不均等。因此,於利用固定相機之寬廣範圍之攝影圖像中,中心附近(正面方向)與周邊部(傾斜方向)之顏色或亮度之差異變小,資料處理變得容易。膜基材51之厚度方向之延遲Rth較佳為100 nm以下,更佳為50 nm以下,進而較佳為30 nm以下。When optical inspection is performed with the
正面延遲Re、及厚度方向延遲Rth如下定義,該等均為波長590 nm下之測定值。 Re=(nx-ny)×d Rth=(nx-nz)×d nx為面內遲相軸方向之折射率,ny為面內進相軸方向之折射率,nz為厚度方向之折射率,d為厚度。The front retardation Re and the thickness direction retardation Rth are defined as follows, and these are measured values at a wavelength of 590 nm. Re=(nx-ny)×d Rth=(nx-nz)×d nx is the refractive index in the direction of the slow axis in the plane, ny is the refractive index in the direction of the advancing axis in the plane, nz is the refractive index in the thickness direction, and d is the thickness.
為了使膜基材51之Re及Rth為上述範圍,作為膜基材51,較佳為使用低雙折射材料膜、無延伸或低延伸倍率之膜。作為可兼顧高透明性與低雙折射之材料,可列舉環烯烴系樹脂及丙烯酸系樹脂。In order to make the Re and Rth of the
作為環烯烴系樹脂,例如可列舉聚降𦯉烯。作為環烯烴系樹脂之市售品,可列舉:日本ZEON製造之ZEONOR及ZEONEX、JSR製造之Arton、三井化學製造之APPEL、TOPAS ADVANCED POLYMERS製造之TOPAS等。環烯烴系膜較佳為含有50重量%以上之環烯烴系樹脂者。Examples of cycloolefin-based resins include polynorthene. Examples of commercially available cycloolefin-based resins include Zeonor and Zeonex manufactured by Zeon Japan, Arton manufactured by JSR, APPEL manufactured by Mitsui Chemicals, and TOPAS manufactured by TOPAS ADVANCED POLYMERS. The cycloolefin-based film preferably contains 50% by weight or more of cycloolefin-based resin.
作為丙烯酸系樹脂,可列舉:聚甲基丙烯酸甲酯等聚(甲基)丙烯酸酯、甲基丙烯酸甲酯-(甲基)丙烯酸共聚物、甲基丙烯酸甲酯-(甲基)丙烯酸酯共聚物、甲基丙烯酸甲酯-丙烯酸酯-(甲基)丙烯酸共聚物、(甲基)丙烯酸甲酯-苯乙烯共聚物(MS樹脂等)、具有脂環族烴基之聚合物(例如,甲基丙烯酸甲酯-甲基丙烯酸環己酯共聚物、甲基丙烯酸甲酯-(甲基)丙烯酸降𦯉酯共聚物等)。作為丙烯酸系樹脂之市售品,可列舉三菱化學製造之ACRYPET。具有內脂環結構之(甲基)丙烯酸系樹脂或具有不飽和羧酸烷基酯單元及戊二醯亞胺單元之(甲基)丙烯酸系樹脂等亦可用作膜基材51之構成材料。丙烯酸系膜較佳為含有50重量%以上之丙烯酸系樹脂者。Examples of acrylic resins include poly(meth)acrylates such as polymethyl methacrylate, methyl methacrylate-(meth)acrylic acid copolymers, methyl methacrylate-(meth)acrylate copolymers, Polymers, methyl methacrylate-acrylate-(meth)acrylic acid copolymers, (meth)acrylate-styrene copolymers (MS resins, etc.), polymers with alicyclic hydrocarbon groups (for example, methyl methyl acrylate-cyclohexyl methacrylate copolymer, methyl methacrylate-northyl (meth)acrylate copolymer, etc.). As a commercial item of an acrylic resin, ACRYPET manufactured by Mitsubishi Chemical Corporation is mentioned. A (meth)acrylic resin having an inner alicyclic structure or a (meth)acrylic resin having an unsaturated alkyl carboxylate unit and a glutarimide unit can also be used as a constituent material of the
[黏著劑層]
構成黏著光學膜10之第一黏著劑層12、及表面保護膜50之第二黏著劑層52之黏著劑之組成無特別限定,可適宜地選擇使用以丙烯酸系聚合物、矽酮系聚合物、聚酯、聚胺基甲酸酯、聚醯胺、聚乙烯醚、乙酸乙烯酯/氯乙烯共聚物、改性聚烯烴、環氧系、氟系、天然橡膠、合成橡膠等橡膠系等之聚合物作為基礎聚合物者。特別是就光學透明性優異之觀點而言,較佳為使用以丙烯酸系聚合物作為基礎聚合物之丙烯酸系黏著劑。[adhesive layer]
The composition of the adhesive constituting the first
作為丙烯酸系基礎聚合物,可適宜地使用以(甲基)丙烯酸烷基酯之單體單元為主骨架者。再者,於本說明書中,「(甲基)丙烯酸」係指丙烯酸及/或甲基丙烯酸。As the acrylic base polymer, one having an alkyl (meth)acrylate monomer unit as the main skeleton can be suitably used. In addition, in this specification, "(meth)acrylic acid" means acrylic acid and/or methacrylic acid.
作為(甲基)丙烯酸烷基酯,可適宜地使用烷基之碳數為1~20之(甲基)丙烯酸烷基酯。例如可列舉:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第二丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸戊酯、(甲基)丙烯酸異戊酯、(甲基)丙烯酸新戊酯、(甲基)丙烯酸己酯、(甲基)丙烯酸庚酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸辛酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸壬酯、(甲基)丙烯酸異壬酯、(甲基)丙烯酸癸酯、(甲基)丙烯酸異癸酯、(甲基)丙烯酸十一烷基酯、(甲基)丙烯酸十二烷基酯、(甲基)丙烯酸異十三烷基酯、(甲基)丙烯酸十四烷基酯、(甲基)丙烯酸異十四烷基酯、(甲基)丙烯酸十五烷基酯、(甲基)丙烯酸鯨蠟酯、(甲基)丙烯酸十七烷基酯、(甲基)丙烯酸十八烷基酯、(甲基)丙烯酸異十八烷基酯、(甲基)丙烯酸十九烷基酯、(甲基)丙烯酸芳烷基酯等。As the alkyl (meth)acrylate, an alkyl (meth)acrylate having 1 to 20 carbon atoms in the alkyl group can be suitably used. For example, methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, isobutyl (meth)acrylate, second butyl (meth)acrylate, (meth)acrylate ) tertiary butyl acrylate, pentyl (meth) acrylate, isopentyl (meth) acrylate, neopentyl (meth) acrylate, hexyl (meth) acrylate, heptyl (meth) acrylate, ( 2-ethylhexyl methacrylate, octyl (meth)acrylate, isooctyl (meth)acrylate, nonyl (meth)acrylate, isononyl (meth)acrylate, (meth)acrylic acid Decyl ester, Isodecyl (meth)acrylate, Undecyl (meth)acrylate, Lauryl (meth)acrylate, Isotridecyl (meth)acrylate, (Meth) Myristyl acrylate, Isotetradecyl (meth)acrylate, Pentadecyl (meth)acrylate, Cetyl (meth)acrylate, Heptadecyl (meth)acrylate, Octadecyl (meth)acrylate, isostearyl (meth)acrylate, nonadecyl (meth)acrylate, aralkyl (meth)acrylate, etc.
(甲基)丙烯酸烷基酯之含量較佳為相對於構成基礎聚合物之單體成分總量為40重量%以上,更佳為50重量%以上,進而較佳為60重量%以上。丙烯酸系聚合物可為複數種(甲基)丙烯酸烷基酯之共聚物。構成單體單元之排列可為無規,亦可為嵌段。The content of the alkyl (meth)acrylate is preferably at least 40% by weight, more preferably at least 50% by weight, and still more preferably at least 60% by weight, based on the total amount of monomer components constituting the base polymer. The acrylic polymer can be a copolymer of several kinds of alkyl (meth)acrylates. The arrangement of the constituent monomer units may be random or block.
丙烯酸系聚合物較佳為含有具有可交聯之官能基之單體成分作為共聚成分。作為具有可交聯之官能基之單體,可列舉含羥基單體或含羧基單體。其中,作為基礎聚合物之共聚成分,較佳為含有含羥基單體。基礎聚合物之羥基或羧基會成為與下述交聯劑之反應點。藉由在基礎聚合物中導入交聯結構,而提高黏著劑之凝集力,表現對於被黏著體之適度之接著力。The acrylic polymer preferably contains a monomer component having a crosslinkable functional group as a copolymerization component. As a monomer which has a crosslinkable functional group, a hydroxyl group containing monomer or a carboxyl group containing monomer is mentioned. Among them, it is preferable to contain a hydroxyl group-containing monomer as a copolymerization component of the base polymer. The hydroxyl group or carboxyl group of the base polymer becomes a reaction point with the crosslinking agent described below. By introducing a cross-linked structure into the base polymer, the cohesive force of the adhesive is improved, and moderate adhesion to the adherend is exhibited.
作為含羥基單體,可列舉:(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丙酯、(甲基)丙烯酸4-羥基丁酯、(甲基)丙烯酸6-羥基己酯、(甲基)丙烯酸8-羥基辛酯、(甲基)丙烯酸10-羥基癸酯、(甲基)丙烯酸12-羥基月桂酯、丙烯酸(4-羥基甲基環己基)甲酯。作為上述含羧基單體,可列舉:(甲基)丙烯酸、(甲基)丙烯酸羧基乙酯、(甲基)丙烯酸羧基戊酯、伊康酸、馬來酸、富馬酸、丁烯酸等。Examples of hydroxyl-containing monomers include: 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, 6-hydroxy (meth)acrylate Hexyl ester, 8-hydroxyoctyl (meth)acrylate, 10-hydroxydecyl (meth)acrylate, 12-hydroxylauryl (meth)acrylate, (4-hydroxymethylcyclohexyl)methyl acrylate. Examples of the carboxyl group-containing monomer include: (meth)acrylic acid, carboxyethyl (meth)acrylate, carboxypentyl (meth)acrylate, itaconic acid, maleic acid, fumaric acid, crotonic acid, etc. .
關於丙烯酸系聚合物,除上述以外,作為共聚單體成分,還可使用:含酸酐基單體、丙烯酸之己內酯加成物、含磺酸基單體、含磷酸基單體等。又,作為改質單體,亦可使用:乙酸乙烯酯、丙酸乙烯酯、N-乙烯基吡咯啶酮、甲基乙烯基吡咯啶酮、乙烯基吡啶、乙烯基哌啶酮、乙烯基嘧啶、乙烯基哌𠯤、乙烯基吡𠯤、乙烯基吡咯、乙烯基咪唑、乙烯基㗁唑、乙烯基嗎啉、N-乙烯基羧醯胺類、苯乙烯、α-甲基苯乙烯、N-乙烯基己內醯胺等乙烯基系單體;丙烯腈、甲基丙烯腈等氰基丙烯酸酯系單體;(甲基)丙烯酸縮水甘油酯等含環氧基丙烯酸系單體;(甲基)丙烯酸聚乙二醇酯、(甲基)丙烯酸聚丙二醇酯、(甲基)丙烯酸甲氧基乙二醇酯、(甲基)丙烯酸甲氧基聚丙二醇酯等二醇系丙烯酸酯單體;(甲基)丙烯酸四氫糠酯、氟(甲基)丙烯酸酯、矽酮(甲基)丙烯酸酯或丙烯酸2-甲氧基乙酯等丙烯酸酯系單體等。Regarding the acrylic polymer, in addition to the above, as comonomer components, acid anhydride group-containing monomers, caprolactone adducts of acrylic acid, sulfonic acid group-containing monomers, phosphoric acid group-containing monomers, and the like can also be used. Also, as a modifying monomer, vinyl acetate, vinyl propionate, N-vinylpyrrolidone, methylvinylpyrrolidone, vinylpyridine, vinylpiperidone, vinylpyrimidine can also be used , vinylpyrrole, vinylpyrrole, vinylpyrrole, vinylimidazole, vinyloxazole, vinylmorpholine, N-vinylcarboxamides, styrene, α-methylstyrene, N- Vinyl-based monomers such as vinyl caprolactam; cyanoacrylate-based monomers such as acrylonitrile and methacrylonitrile; epoxy-containing acrylic monomers such as glycidyl (meth)acrylate; (meth) ) glycol-based acrylate monomers such as polyethylene glycol acrylate, polypropylene glycol (meth)acrylate, methoxyethylene glycol (meth)acrylate, and methoxypolypropylene glycol (meth)acrylate; Acrylate-based monomers such as tetrahydrofurfuryl (meth)acrylate, fluoro(meth)acrylate, silicone (meth)acrylate, or 2-methoxyethyl acrylate.
丙烯酸系聚合物中之共聚單體成分之比率無特別之限制,例如於為了導入交聯點而使用含羥基單體或含羧基單體作為共聚單體成分之情形時,含羥基單體與含羧基單體之含量之合計相對於構成基礎聚合物之單體成分之總量較佳為1~20%左右,更佳為2~15%左右。The ratio of the comonomer component in the acrylic polymer is not particularly limited. For example, when a hydroxyl-containing monomer or a carboxyl-containing monomer is used as the comonomer component in order to introduce crosslinking points, the ratio of the hydroxyl-containing monomer and the The total content of carboxyl group monomers is preferably about 1 to 20%, more preferably about 2 to 15%, based on the total amount of monomer components constituting the base polymer.
藉由利用溶液聚合、光聚合、乳化聚合、塊狀聚合、懸浮聚合等各種公知之方法使上述單體成分聚合,而獲得作為基礎聚合物之丙烯酸系聚合物。作為溶液聚合之溶劑,可使用乙酸乙酯、甲苯等。溶液濃度通常為20~80重量%左右。作為聚合起始劑,可使用偶氮系、過氧化物系等各種公知者。為了調整分子量,亦可使用鏈轉移劑。反應溫度通常為50~80℃左右,反應時間通常為1~8小時左右。The acrylic polymer as the base polymer is obtained by polymerizing the above-mentioned monomer components by various known methods such as solution polymerization, photopolymerization, emulsion polymerization, block polymerization, and suspension polymerization. As a solvent for solution polymerization, ethyl acetate, toluene and the like can be used. The solution concentration is usually about 20 to 80% by weight. As a polymerization initiator, various well-known ones, such as an azo type and a peroxide type, can be used. In order to adjust the molecular weight, chain transfer agents can also be used. The reaction temperature is usually about 50 to 80°C, and the reaction time is usually about 1 to 8 hours.
基礎聚合物之分子量係以使黏著劑層52具有期望之接著力之方式適宜地調整,例如,聚苯乙烯換算之重量平均分子量為5萬~200萬左右,較佳為7萬~180萬左右,更佳為10萬~150萬左右,進而較佳為20萬~100萬左右。再者,於在基礎聚合物中導入交聯結構之情形時,較佳為導入交聯結構前之基礎聚合物之分子量為上述範圍。The molecular weight of the base polymer is appropriately adjusted so that the
為了在常溫環境下獲得對於被黏著體具有適宜之接著性之黏著劑層52,基礎聚合物以Fox式換算之玻璃轉移溫度(Tg)較佳為0℃以下。基礎聚合物之Tg較佳為-10~-80℃,更佳為-15~-75℃,進而較佳為-20~-70℃。In order to obtain the
為了調整黏著劑層之接著力等,亦可於基礎聚合物中導入交聯結構。例如,於使基礎聚合物聚合後之溶液中添加交聯劑,視需要進行加熱,藉此導入交聯結構。作為交聯劑,可列舉:異氰酸酯系交聯劑、環氧系交聯劑、㗁唑啉系交聯劑、氮丙啶系交聯劑、碳二醯亞胺系交聯劑、金屬螯合物系交聯劑等。其中,就與基礎聚合物之羥基或羧基之反應性較高、容易導入交聯結構之觀點而言,較佳為異氰酸酯系交聯劑及環氧系交聯劑。該等交聯劑與基礎聚合物中所導入之羥基或羧基等官能基反應而形成交聯結構。In order to adjust the adhesion of the adhesive layer, etc., a cross-linked structure can also be introduced into the base polymer. For example, a crosslinking agent is added to a solution after polymerizing a base polymer, and heating is performed as necessary to introduce a crosslinked structure. Examples of the cross-linking agent include: isocyanate-based cross-linking agents, epoxy-based cross-linking agents, oxazoline-based cross-linking agents, aziridine-based cross-linking agents, carbodiimide-based cross-linking agents, metal chelate Cross-linking agent, etc. Among these, isocyanate-based crosslinking agents and epoxy-based crosslinking agents are preferred from the viewpoint of high reactivity with the hydroxyl group or carboxyl group of the base polymer and ease of introduction of a crosslinked structure. These crosslinking agents react with functional groups such as hydroxyl or carboxyl introduced into the base polymer to form a crosslinking structure.
作為異氰酸酯系交聯劑,使用1分子中具有2個以上之異氰酸基之多異氰酸酯。作為異氰酸酯系交聯劑,例如可列舉:伸丁基二異氰酸酯、六亞甲基二異氰酸酯等低級脂肪族多異氰酸酯類;伸環戊基二異氰酸酯、伸環己基二異氰酸酯、異佛爾酮二異氰酸酯等脂環族異氰酸酯類;2,4-甲苯二異氰酸酯、4,4'-二苯基甲烷二異氰酸酯、苯二亞甲基二異氰酸酯等芳香族異氰酸酯類;三羥甲基丙烷/甲苯二異氰酸酯三聚物加成物(例如,東曹製造之「CORONATE L」)、三羥甲基丙烷/六亞甲基二異氰酸酯三聚物加成物(例如,東曹製造之「CORONATE HL」)、苯二亞甲基二異氰酸酯之三羥甲基丙烷加成物(例如,三井化學製造之「TAKENATE D110N」)、六亞甲基二異氰酸酯之異氰尿酸酯體(例如,東曹製造之「CORONATE HX」)等異氰酸酯加成物等。As the isocyanate-based crosslinking agent, a polyisocyanate having two or more isocyanate groups in one molecule is used. Examples of isocyanate-based crosslinking agents include lower aliphatic polyisocyanates such as butylene diisocyanate and hexamethylene diisocyanate; cyclopentyl diisocyanate, cyclohexylene diisocyanate, and isophorone diisocyanate; Cycloaliphatic isocyanates such as 2,4-toluene diisocyanate, 4,4'-diphenylmethane diisocyanate, xylylene diisocyanate and other aromatic isocyanates; trimethylolpropane/toluene diisocyanate trimethylolpropane/toluene diisocyanate Polymer adducts (for example, "CORONATE L" manufactured by Tosoh), trimethylolpropane/hexamethylene diisocyanate trimer adducts (for example, "CORONATE HL" manufactured by Tosoh), benzene Trimethylolpropane adducts of dimethylene diisocyanate (for example, "TAKENATE D110N" manufactured by Mitsui Chemicals), isocyanurates of hexamethylene diisocyanate (for example, "CORONATE" manufactured by Tosoh HX") and other isocyanate adducts, etc.
作為環氧系交聯劑,可使用1分子中具有2個以上環氧基之多官能環氧化合物。環氧系交聯劑之環氧基可為縮水甘油基。作為環氧系交聯劑,例如可列舉:N,N,N',N'-四縮水甘油基-間苯二甲胺、二縮水甘油基苯胺、1,3-雙(N,N-二縮水甘油基胺基甲基)環己烷、1,6-己二醇二縮水甘油醚、新戊二醇二縮水甘油醚、乙二醇二縮水甘油醚、丙二醇二縮水甘油醚、聚乙二醇二縮水甘油醚、聚丙二醇二縮水甘油醚、山梨糖醇聚縮水甘油醚、甘油聚縮水甘油醚、季戊四醇聚縮水甘油醚、聚甘油聚縮水甘油醚、山梨糖醇酐聚縮水甘油醚、三羥甲基丙烷聚縮水甘油醚、己二酸二縮水甘油酯、鄰苯二甲酸二縮水甘油酯、三(2-羥基乙基)異氰尿酸三縮水甘油酯、間苯二酚二縮水甘油醚、雙酚S-二縮水甘油醚等。作為環氧系交聯劑,亦可使用Nagase ChemteX Corporation製造之「DENACOL」、三菱瓦斯化學製造之「TETRAD X」、「TETRAD C」等市售品。As an epoxy-type crosslinking agent, the polyfunctional epoxy compound which has 2 or more epoxy groups in 1 molecule can be used. The epoxy group of the epoxy-based crosslinking agent may be a glycidyl group. Examples of epoxy-based crosslinking agents include N,N,N',N'-tetraglycidyl-m-xylylenediamine, diglycidylaniline, 1,3-bis(N,N-di Glycidylaminomethyl) cyclohexane, 1,6-hexanediol diglycidyl ether, neopentyl glycol diglycidyl ether, ethylene glycol diglycidyl ether, propylene glycol diglycidyl ether, polyethylene glycol Alcohol diglycidyl ether, polypropylene glycol diglycidyl ether, sorbitol polyglycidyl ether, glycerol polyglycidyl ether, pentaerythritol polyglycidyl ether, polyglycerol polyglycidyl ether, sorbitan polyglycidyl ether, three Methylolpropane Polyglycidyl Ether, Diglycidyl Adipate, Diglycidyl Phthalate, Tris(2-Hydroxyethyl) Isocyanurate Triglycidyl Ether, Resorcinol Diglycidyl Ether , Bisphenol S-diglycidyl ether, etc. As the epoxy-based crosslinking agent, commercial items such as "DENACOL" manufactured by Nagase ChemteX Corporation, "TETRAD X" and "TETRAD C" manufactured by Mitsubishi Gas Chemical can also be used.
藉由在聚合後之基礎聚合物中添加交聯劑,而於基礎聚合物中導入交聯結構。交聯劑之用量可根據基礎聚合物之組成、分子量、目標之接著特性等適宜地調整。By adding a crosslinking agent to the polymerized base polymer, a crosslinked structure is introduced into the base polymer. The amount of cross-linking agent can be appropriately adjusted according to the composition, molecular weight, and target adhesive properties of the base polymer.
藉由輥式塗佈、接觸輥式塗佈、凹版塗佈、反向塗佈、輥刷、噴塗、浸漬輥塗、棒式塗佈、刮刀塗佈、氣刀塗佈、淋幕式塗佈、模唇塗佈、模嘴塗佈等將黏著劑組合物塗佈於基材上,視需要將溶劑乾燥去除,藉此形成黏著劑層。作為乾燥方法,可適宜地採用適當之方法。加熱乾燥溫度較佳為40℃~200℃,更佳為50℃~180℃,進而較佳為70~170℃。乾燥時間較佳為5秒~20分鐘,更佳為5秒~15分鐘,進而較佳為10秒~10分鐘,尤佳為10秒~5分鐘。By roll coating, contact roll coating, gravure coating, reverse coating, roll brush, spray coating, dip roll coating, rod coating, knife coating, air knife coating, curtain coating , lip coating, die coating, etc. The adhesive composition is applied on the substrate, and the solvent is dried and removed as necessary to form an adhesive layer. As a drying method, an appropriate method can be suitably adopted. The heating and drying temperature is preferably from 40°C to 200°C, more preferably from 50°C to 180°C, and still more preferably from 70 to 170°C. The drying time is preferably from 5 seconds to 20 minutes, more preferably from 5 seconds to 15 minutes, further preferably from 10 seconds to 10 minutes, particularly preferably from 10 seconds to 5 minutes.
於黏著劑組合物含有交聯劑之情形時,較佳為與溶劑之乾燥同時、或在溶劑乾燥之後藉由加熱或熟化使交聯進行。加熱溫度或加熱時間根據使用之交聯劑之種類適宜設定,通常藉由在20℃~160℃之範圍內加熱1分鐘至7天左右來進行交聯。用於乾燥去除溶劑之加熱亦可兼作用於交聯之加熱。When the adhesive composition contains a crosslinking agent, it is preferable to advance the crosslinking by heating or aging simultaneously with drying of the solvent or after drying of the solvent. The heating temperature or heating time is appropriately set according to the type of cross-linking agent used, and cross-linking is usually performed by heating in the range of 20° C. to 160° C. for 1 minute to about 7 days. The heating used for drying to remove the solvent can also be used as the heating for crosslinking.
黏著劑層12、52之厚度無特別之限定。黏著劑層之厚度通常為2~200 μm左右。有黏著劑層之厚度越大則對被黏著體之接著力越提高之傾向。黏著光學膜10之第一黏著劑層12之厚度較佳為5~200 μm,更佳為10~150 μm。表面保護膜50之第二黏著劑層52之厚度較佳為1~30 μm,更佳為3~25 μm。The thickness of the
如上所述,黏著光學膜10之第一黏著劑層12較佳為相對於丙烯酸系樹脂板之接著力為3 N/25 mm以上,表面保護膜50之第二黏著劑層52較佳為相對於丙烯酸系樹脂板之接著力為1 N/25 mm以下。若第一黏著劑層12相對於丙烯酸系樹脂板之接著力為3 N/25 mm以上,則對於圖像顯示單元等被黏著體之接著耐久性提高。若第二黏著劑層52相對於丙烯酸系樹脂板之接著力為1 N/25 mm以下,則可自被黏著體或光學膜之表面容易地剝離表面保護膜。As mentioned above, the adhesive strength of the first
黏著劑層之接著力可藉由基礎聚合物之組成及分子量、交聯劑之種類及交聯結構之導入量、黏著劑層之厚度等而調整至期望之範圍。The adhesion of the adhesive layer can be adjusted to a desired range by the composition and molecular weight of the base polymer, the type of crosslinking agent and the amount of crosslinking structure introduced, the thickness of the adhesive layer, and the like.
[離型膜]
作為暫時黏於第一黏著劑層12之表面之離型膜70,較佳為對與黏著劑層12之貼合面實施離型處理所得之樹脂膜。作為樹脂膜之構成材料,較佳為丙烯酸樹脂、聚烯烴、環狀聚烯烴、聚酯等。[Release film]
The
如上所述,為了容易使離型膜70自與保護膜50之接著面剝離,離型膜70之三點彎曲荷重較佳為0.01~1 g。為了使三點彎曲荷重為上述範圍,離型膜70之厚度較佳為15~55 μm,更佳為20~50 μm。又,為了使表面保護膜50之三點彎曲荷重與離型膜70之三點彎曲荷重之比為適當之範圍,離型膜70之厚度較佳為表面保護膜50之膜基材51之厚度之70%以下,更佳為60%以下,進而較佳為50%以下。As described above, in order to easily peel the
[單片積層體之製作]
藉由在光學膜11之第一主面積層第一黏著劑層12及離型膜70,在光學膜11之第二主面積層表面保護膜50,可獲得積層體。該等之積層順序無特別之限定。[Production of monolithic laminate]
A laminate can be obtained by layering the first
各層之形成及積層較佳為以卷對卷方式實施。卷對卷方式中,一面沿場邊方向搬送長條之可撓性基材,一面塗佈黏著劑組合物,視需要進行溶劑之乾燥或聚合物之硬化,藉此形成黏著劑層。膜與黏著劑層之貼合、離型膜之附設或黏貼更換等亦可藉由卷對卷方式實施。The formation and lamination of each layer are preferably carried out in a roll-to-roll manner. In the roll-to-roll method, the long flexible substrate is conveyed along the side of the field, and the adhesive composition is coated on the other side, and the solvent is dried or the polymer is hardened as necessary to form an adhesive layer. The lamination of the film and the adhesive layer, the attachment or replacement of the release film can also be implemented by roll-to-roll.
藉由卷對卷方式製作大面積之積層體(母基板)後,藉由切割成符合被黏著體之尺寸之特定尺寸,可獲得單片之積層體。該方法由於可自母基板獲得多個單片片材,故而可提高生產性。After fabricating a large-area laminate (mother substrate) by roll-to-roll, a single-sheet laminate can be obtained by cutting into a specific size that matches the size of the adherend. This method can improve productivity because a plurality of individual sheets can be obtained from the mother substrate.
單片之黏著光學膜之形狀或尺寸根據被黏著體之形狀或尺寸等進行設定。例如,於將光學膜配置於圖像顯示裝置之前面來使用時,黏著光學膜之尺寸與圖像之尺寸大致相等。黏著光學膜之面積通常為5~25000 cm2 左右。單片之黏著光學膜之面積可為10000 cm2 以下、5000 cm2 以下、3000 cm2 以下、1000 cm2 以下或500 cm2 以下。於黏著片為矩形之情形時,對角線之長度為2~250 cm左右。黏著光學膜之對角線之長度可為100 cm以下、50 cm以下、30 cm以下或20 cm以下。於黏著光學膜為矩形之情形時,可為具有長邊與短邊之長方形,亦可為4條邊之長度相等之正方形。長方形之長邊之長度通常可為短邊之長度之10倍以下、5倍以下、3倍以下或2倍以下。The shape or size of a single adhesive optical film is set according to the shape or size of the adherend. For example, when the optical film is placed on the front of an image display device and used, the size of the adhesive optical film is approximately equal to the size of the image. The area of the adhesive optical film is usually about 5 to 25000 cm 2 . The area of a single adhesive optical film can be less than 10000 cm 2 , less than 5000 cm 2 , less than 3000 cm 2 , less than 1000 cm 2 or less than 500 cm 2 . When the adhesive sheet is rectangular, the length of the diagonal is about 2 to 250 cm. The length of the diagonal of the adhesive optical film may be less than 100 cm, less than 50 cm, less than 30 cm, or less than 20 cm. When the adhesive optical film is rectangular, it may be a rectangle having a long side and a short side, or may be a square having four sides of equal length. The length of the long side of the rectangle can usually be less than 10 times, less than 5 times, less than 3 times or less than 2 times the length of the short side.
表面保護膜50及離型膜70自黏著光學膜10之外周緣伸出之積層體可藉由如下方式獲得:將黏著光學膜10切斷為特定尺寸之單片後,沿著較黏著光學膜10之外周緣更外側之切斷線切斷表面保護膜50及離型膜70。The laminate in which the
圖6A~6G係表示自母基板切出複數個單片積層體之一系列步驟之步驟概念圖。於該實施形態中,作為母基板,使用在長條之黏著光學膜1之黏著劑層之表面暫時黏有長條之離型膜7之積層體161(圖6A)。6A to 6G are conceptual diagrams showing a series of steps for cutting out a plurality of monolithic laminates from a mother substrate. In this embodiment, a laminate 161 in which a
首先,自積層體161之光學膜1側,以到達離型膜7之表面之深度進行切斷(半切割),形成切斷線61a、61b(圖6B)。切斷線61a、61b成為單片之積層體中之黏著光學膜10之外周緣。First, the
切斷方法無特別限定,可採用利用旋轉切割機、壓痕刀(例如湯姆遜刀片)、雷射切割機等適宜之切斷方式。於以下之各實施形態中,切斷方法亦無特別之限定。The cutting method is not particularly limited, and suitable cutting methods such as a rotary cutter, a creasing knife (such as a Thomson blade), and a laser cutter can be used. In each of the following embodiments, the cutting method is also not particularly limited.
於黏著光學膜之光學膜及黏著劑層,在整個厚度方向形成切斷線61a、61b。於離型膜7亦可形成未到達背面之深度之切口。藉由半切割而形成於離型膜7之切口之深度無特別之限定,只要未到達離型膜7之背面即可。就防止自黏著劑層12剝離離型膜70時之離型膜之開裂或斷裂之觀點而言,切口之深度較佳為離型膜之厚度之1/2以下,更佳為1/3以下。Cutting
形成切斷線61a、61b後,藉由自離型膜7之表面剝離去除製品區域外之黏著光學膜之切斷片,可獲得於長條之離型膜7上設置有複數個單片之黏著光學膜10之積層體162(圖6C)。以覆蓋該積層體162整體之方式在黏著光學膜10上貼合長條之表面保護膜5(圖6D)。圖6D中,以在未設置有黏著光學膜10之區域中離型膜7及表面保護膜5分離之方式圖示,但是,亦可於離型膜7之表面密接有表面保護膜5之第二黏著劑層。於下述圖7D及圖8E等中亦同樣。After the
於附設表面保護膜5後之積層體163中,在未設置黏著光學膜10之區域,於表面保護膜5形成切斷線62a、62b(圖6E)。切斷線62a、62b成為在單片之積層體中之表面保護膜50之外周緣。此時,可藉由半切割而於離型膜7形成切口。In the
於去除表面保護膜之切斷片後之積層體164中,在未設置黏著光學膜10及表面保護膜50之區域,於離型膜7形成切斷線63a、63b(圖6F)。藉此,離型膜被切斷,由長條之積層體獲得單片之積層體(圖6G)。獲得之積層體之表面保護膜50及離型膜70伸出至較黏著光學膜10之外周緣更外側,並且離型膜70伸出至較表面保護膜50更外側。In the
於在黏著光學膜10上貼合長條之表面保護膜5而形成積層體163後(圖6D),亦可如圖6H所示,以切斷表面保護膜5及離型膜7整體之方式形成切斷線64a、64b。如此,藉由同時切斷表面保護膜及離型膜,可獲得如圖6I所示之表面保護膜50之端面與離型膜70之端面對齊之積層體。After bonding the elongated
圖6A~6I中,示出將長條之離型膜7作為載體基材進行半切割而切斷黏著光學膜之例,但亦可將長條之表面保護膜5作為載體基材進行半切割。例如,於圖7A~7D所示之實施形態中,作為母基板,使用在長條之黏著光學膜1之黏著劑層之表面暫時黏有長條之離型膜9、並在光學膜暫時黏有長條之表面保護膜5之積層體181(圖7A)。離型膜9為了保護黏著光學膜之第一黏著劑層之表面而被暫時黏結,在將黏著光學膜切斷後將更換貼附為離型膜7。因此,對於積層體181中之離型膜9,只要是能夠保護黏著光學膜之黏著劑層之表面之離型膜,則無特別之限定,可為與作為製品之積層體中包含之離型膜70同種之膜,亦可為厚度、材料等不同之膜。6A to 6I show an example of cutting the adhesive optical film by half-cutting the
首先,自積層體181之離型膜9側,以到達表面保護膜5之表面之深度之方式進行半切割,從而形成切斷線81a、81b(圖7B)。切斷線81a、81b成為單片之積層體中之黏著光學膜10之外周緣。藉由該切斷步驟,於離型膜9、以及黏著光學膜之光學膜及黏著劑層之整個厚度方向上形成切斷線81a、81b。亦可於表面保護膜5形成未到達背面之深度之切口。First, half cutting is performed from the
形成切斷線81a、81b後,將製品區域外之黏著光學膜之切斷片與離型膜9一起剝離去除,藉此可獲得於長條之表面保護膜5上設置有複數個單片之黏著光學膜10之積層體182(圖7C)。以覆蓋該積層體182之整體之方式,於黏著光學膜10之黏著劑層上貼合長條之離型膜7(圖7D)。其後,與圖6E~6G、或圖6H~I同樣地切斷表面保護膜5及離型膜7,藉此獲得表面保護膜50及離型膜70伸出至較黏著光學膜10之外周緣更外側之積層體。After the
亦可使用與離型膜及表面保護膜不同之載體基材,藉由半切割來切斷黏著光學膜。圖8A~8G係表示在載體片材3上切斷母基板而形成單片之積層體之一系列步驟之概略剖視圖。作為母基板,使用與如圖7A所示之積層體181同樣地在長條之黏著光學膜1之黏著劑層之表面暫時黏有長條之離型膜9、並在光學膜暫時黏有長條之表面保護膜5之積層體。It is also possible to cut the adhesive optical film by half-cutting using a carrier substrate different from the release film and the surface protection film. 8A to 8G are schematic cross-sectional views showing a series of steps of cutting the mother substrate on the
首先,於母基板之表面保護膜5側之面貼合載體片材3(圖8A)。作為載體片材3之構成材料,較佳為塑膠膜。載體片材3較佳為卷對卷搬送時之搬送張力導致之尺寸變化較小。於切斷黏著光學膜時,以到達載體片材3之表面(與表面保護膜5之界面)之方式進行切斷(半切割)之情形時,需要防止切斷刀到達載體片材3之背面。因此,載體片材3之厚度較佳為10 μm以上,更佳為20 μm以上。First, the
於載體片材3之表面較佳為設置用於固定母基板之接著層(未圖示)。作為載體片材3,亦可使用在膜基材之表面一體成型有黏著劑層之自黏著性膜。An adhesive layer (not shown) for fixing the motherboard is preferably provided on the surface of the
自載體片材3上貼合有母基板之積層體191之離型膜9側,以到達載體片材3之表面之深度進行切斷(半切割),形成切斷線91a、91b(圖8B)。藉由該切斷步驟,於離型膜9、黏著光學膜1及表面保護膜5之整個厚度方向上形成切斷線91a、91b。亦可於載體片材3形成未到達背面之深度之切口。From the side of the
自離型膜9側,以到達表面保護膜5之表面之深度進行半切割,從而形成切斷線92a、92b(圖8C)。藉由該切斷步驟,於離型膜9及黏著光學膜1之整個厚度方向上形成切斷線92a、92b。亦可於表面保護膜5形成未到達背面之深度之切口。Half cutting is performed from the
切斷線91a、91b成為單片之積層體中之表面保護膜50之外周緣。切斷線92a、92b成為黏著光學膜10之外周緣。藉由在較切斷線92a、92b更外側設置切斷線91a、91b,可獲得以自黏著光學膜10之端面伸出之方式設置有表面保護膜50之積層體。到達載體片材3之切斷線91a、91b之形成、及到達表面保護膜5之切斷線92a、92b之形成可先進行任一者,亦可兩者同時進行。The cutting lines 91a and 91b form the outer periphery of the
自離型膜9側切斷黏著光學膜1及表面保護膜5後,剝離去除離型膜9。此時,於切斷線91a與切斷線91b之間之區域,除離型膜9以外,亦將黏著光學膜1及表面保護膜5之切斷片自載體片材3上剝離去除。於切斷線92a與切斷線92b之間之區域,除離型膜9以外,亦將黏著光學膜1之切斷片自表面保護膜5剝離去除。如此,除離型膜9以外,亦將被切斷線包圍之區域之黏著光學膜1及表面保護膜5剝離去除,藉此可獲得如圖8D所示般於載體片材3上以島狀設置有表面保護膜50與黏著光學膜10之積層物之積層體192。After cutting the adhesive
以覆蓋該積層體192之整體之方式於黏著光學膜之黏著劑層上貼合長條之離型膜7(圖8E)。沿著切斷線93a、93b切斷離型膜7(圖6F),將暫時黏於表面保護膜50之載體片材3剝離,藉此可獲得表面保護膜50及離型膜70伸出至較黏著光學膜10之外周緣更外側、並且離型膜70伸出至較表面保護膜50更外側之單片之積層體(圖8G)。A
於切斷線93a、93b之形成中,可僅切斷離型膜7,亦可除離型膜7以外還切斷載體片材3。亦可於自表面保護膜50剝離載體片材3後進行離型膜7之切斷。In forming the
如上述所說明,藉由利用載體基材上之半切割將黏著光學膜切斷成特定形狀,其後進行表面保護膜及離型膜之切斷,可由母基板獲得多個單片之積層體。該方法中,可任意地設定各切斷線之位置,因此可任意地設定黏著光學膜10之平面形狀、表面保護膜50之平面形狀、離型膜70之平面形狀。因此,可獲得表面保護膜50自黏著光學膜10之外周緣之伸出量L1
與離型膜70自黏著光學膜10之外周緣之伸出量L2
不同之積層體。
[實施例]As explained above, by cutting the adhesive optical film into a specific shape by half cutting on the carrier substrate, and then cutting the surface protection film and the release film, multiple single-piece laminates can be obtained from the mother substrate . In this method, the position of each cutting line can be set arbitrarily, so the planar shape of the adhesive
以下示出實施例來進一步說明本發明,但本發明不限定於該等例。Examples are shown below to further illustrate the present invention, but the present invention is not limited to these examples.
[黏著片之製作]
<黏著片1>
(聚合物漿液A之製備)
於具備溫度計、攪拌機、冷凝器及氮氣導入管之反應容器內,投入作為單體成分之86重量份之丙烯酸-2-乙基己酯(2EHA)及14重量份之N-乙烯基-2-吡咯啶酮(NVP)、以及作為光聚合起始劑之0.05重量份之Irgacure184(BASF製造)與0.05重量份之Irgacure651(BASF製造),然後通入氮氣,一面攪拌一面進行約1小時之氮氣置換。然後,在氮氣氣氛下,照射5mW/ cm2
之紫外線而獲得聚合率約11重量%之部分聚合物(丙烯酸系聚合物漿液A)。[Preparation of Adhesive Sheet] <
(丙烯酸低聚物之製備) 於具備溫度計、攪拌機、冷凝器及氮氣導入管之反應容器內,一併添加作為單體成分之100重量份之甲基丙烯酸雙環戊酯(日立化成工業製造之「FA-513M」)、作為鏈轉移劑之3重量份之巰基乙酸、以及100重量份之甲苯,於70℃、氮氣氣氛下攪拌1小時。其後,投入作為熱聚合起始劑之0.2重量份之2,2'-偶氮雙異丁腈(AIBN),於70℃下反應2小時,繼而在80℃下反應2小時。其後,將反應液加熱至130℃,蒸餾去除甲苯、鏈轉移劑及未反應單體,獲得固形狀之丙烯酸系低聚物(重量平均分子量4500)。(Preparation of Acrylic Oligomer) 100 parts by weight of dicyclopentanyl methacrylate ("FA-513M" manufactured by Hitachi Chemical Industry Co., Ltd.) 3 parts by weight of thioglycolic acid as a transfer agent and 100 parts by weight of toluene were stirred at 70° C. for 1 hour under a nitrogen atmosphere. Thereafter, 0.2 parts by weight of 2,2'-azobisisobutyronitrile (AIBN) was charged as a thermal polymerization initiator, and reacted at 70° C. for 2 hours, and then reacted at 80° C. for 2 hours. Thereafter, the reaction solution was heated to 130° C., and the toluene, the chain transfer agent, and the unreacted monomer were distilled off to obtain a solid acrylic oligomer (weight average molecular weight: 4,500).
(黏著劑組合物之製備) 於100重量份之丙烯酸系聚合物漿液A中添加20重量份之丙烯酸系低聚物及0.085重量份之三羥甲基丙烷三丙烯酸酯並攪拌,從而製備黏著劑組合物。(Preparation of Adhesive Composition) An adhesive composition was prepared by adding 20 parts by weight of an acrylic oligomer and 0.085 parts by weight of trimethylolpropane triacrylate to 100 parts by weight of acrylic polymer slurry A and stirring.
於隔離膜(利用矽酮對單面進行剝離處理所得之厚度38 μm之聚酯膜;三菱化學製造之「Diafoil MRF#38」)之剝離處理面塗佈上述黏著劑組合物,形成厚度25 μm之塗佈層。於黏著劑組合物之塗佈層上,將另一隔離膜(三菱化學製造之「Diafoil MRN#38」)以離型處理面與黏著劑組合物之塗佈層相接之方式積層。對該積層體,使用黑光燈照射照度5 mW/ cm2 之紫外線360秒來進行光硬化,從而獲得厚度25 μm之黏著片。Apply the above-mentioned adhesive composition to the peeling surface of a separator (polyester film with a thickness of 38 μm obtained by peeling one side with silicone; “Diafoil MRF#38” manufactured by Mitsubishi Chemical) to form a thickness of 25 μm The coating layer. On the coating layer of the adhesive composition, another release film ("Diafoil MRN#38" manufactured by Mitsubishi Chemical) was laminated so that the release-treated surface was in contact with the coating layer of the adhesive composition. The laminate was photocured by irradiating ultraviolet light with an illuminance of 5 mW/cm 2 for 360 seconds using a black light lamp, and an adhesive sheet with a thickness of 25 μm was obtained.
<黏著片2> (基礎聚合物B之製備) 於具備溫度計、攪拌機、冷凝器及氮氣導入管之反應容器內,一併添加作為單體成分之81.9重量份之丙烯酸丁酯(BA)、13.0重量份之丙烯酸苄酯(BzA)、5重量份之丙烯酸(AA)及0.1重量份之丙烯酸4-羥基丁酯(4HBA)、作為聚合起始劑之0.1份之AIBN、以及100重量份之乙酸乙酯,一面在23℃下緩慢地攪拌,一面導入氮氣來進行氮氣置換。此後,使液體溫度保持在55℃附近並進行8小時之聚合反應,製備重量平均分子量201萬之基礎聚合物B之溶液(濃度50重量%)。<Adhesive sheet 2> (Preparation of Base Polymer B) In a reaction vessel equipped with a thermometer, a stirrer, a condenser and a nitrogen gas introduction pipe, 81.9 parts by weight of butyl acrylate (BA), 13.0 parts by weight of benzyl acrylate (BzA), 5 parts by weight of Acrylic acid (AA) and 0.1 part by weight of 4-hydroxybutyl acrylate (4HBA), 0.1 part of AIBN as a polymerization initiator, and 100 parts by weight of ethyl acetate, while slowly stirring at 23 ° C, while Nitrogen gas was introduced to perform nitrogen substitution. Thereafter, the liquid temperature was maintained at around 55° C. and the polymerization reaction was carried out for 8 hours to prepare a solution (concentration: 50% by weight) of the base polymer B having a weight average molecular weight of 2.01 million.
(黏著劑組合物之製備及黏著片之製作) 於200重量份之基礎聚合物B之溶液(固形物成分100重量份)中添加以固形物成分計為0.45重量份之異氰酸酯系交聯劑(甲苯二異氰酸酯之三羥甲基丙烷加成物之75%溶液;東曹製造之「Coronate L」)、0.1重量份之過氧化物系交聯劑(日本油脂製造之「Nyper BMT」)、1重量份之聚醚化合物(Kaneka製造之「SILYL SAT10」,數量平均分子量為5000)並攪拌,製備丙烯酸系黏著劑溶液。將該丙烯酸系黏著劑溶液塗佈於隔離膜(MRF#38)之離型處理面,於130℃下加熱20秒,形成厚度20 μm之黏著片。(Preparation of adhesive composition and production of adhesive sheet) 0.45 parts by weight of an isocyanate-based crosslinking agent (trimethylolpropane adduct of toluene diisocyanate) was added to a solution of 200 parts by weight of the base polymer B (100 parts by weight of solid content). 75% solution; "Coronate L" manufactured by Tosoh), 0.1 part by weight of a peroxide-based crosslinking agent ("Nyper BMT" manufactured by NOF), 1 part by weight of a polyether compound ("SILYL SAT10 manufactured by Kaneka ", the number average molecular weight is 5000) and stirred to prepare an acrylic adhesive solution. The acrylic adhesive solution was coated on the release surface of the release film (MRF#38), and heated at 130°C for 20 seconds to form an adhesive sheet with a thickness of 20 μm.
<黏著片3>
(基礎聚合物C之製備)
於具備溫度計、攪拌機、冷凝器及氮氣導入管之反應容器內,一併添加作為單體成分之96.2重量份之丙烯酸2-乙基己酯(2EHA)及3.8重量份之丙烯酸羥基乙酯(HEA)、及作為聚合起始劑之0.2重量份之AIBN、以及150重量份之乙酸乙酯,一面在23℃下緩慢地攪拌,一面導入氮氣進行氮氣置換。其後,使液體溫度保持在60℃附近並進行6小時之聚合反應,冷卻至室溫後,利用乙酸乙酯進行稀釋,從而製備重量平均分子量為54萬之基礎聚合物C之溶液(濃度25重量%)。<
(黏著劑組合物之製備及黏著片之製作) 於400重量份之基礎聚合物C之溶液(固形物成分100重量份)中,添加以固形物成分計為0.5重量份之異氰酸酯系交聯劑(東曹製造之「CORONATE L」)、以及作為交聯觸媒之以固形物成分計為0.02重量份之二月桂酸二辛基錫之乙酸乙酯溶液(Tokyo Fine Chemical製造之「Envilizer OL-1」)並攪拌,製備丙烯酸系黏著劑溶液。將該丙烯酸系黏著劑溶液塗佈於隔離膜(MRF#38)之離型處理面,於130℃下加熱20秒,形成厚度20 μm之黏著片。(Preparation of adhesive composition and production of adhesive sheet) To a solution of 400 parts by weight of the base polymer C (100 parts by weight of solid content), 0.5 parts by weight of an isocyanate-based crosslinking agent ("CORONATE L" manufactured by Tosoh) was added in terms of solid content, and as The cross-linking catalyst was an ethyl acetate solution of 0.02 parts by weight of dioctyltin dilaurate ("Envilizer OL-1" manufactured by Tokyo Fine Chemical) in terms of solid content and stirred to prepare an acrylic adhesive solution. The acrylic adhesive solution was coated on the release surface of the release film (MRF#38), and heated at 130°C for 20 seconds to form an adhesive sheet with a thickness of 20 μm.
<黏著片4> 於400重量份之基礎聚合物C之溶液(固形物成分100重量份)中,添加以固形物成分計為4.0重量份之異氰酸酯系交聯劑(六亞甲基二異氰酸酯之異氰尿酸酯體;東曹製造之「CORONATE HX」)、以及作為交聯觸媒之以固形物成分計為0.02重量份之二月桂酸二辛基錫之乙酸乙酯溶液(Tokyo Fine Chemical製造之「Envilizer OL-1」),製備丙烯酸系黏著劑溶液。將該丙烯酸系黏著劑溶液塗佈於隔離膜(MRF#38)之離型處理面,於130℃下加熱20秒,形成厚度10 μm之黏著片。<Adhesive sheet 4> In a solution of 400 parts by weight of the base polymer C (100 parts by weight of solid content), 4.0 parts by weight of an isocyanate-based crosslinking agent (isocyanurate of hexamethylene diisocyanate) was added in terms of solid content. body; "CORONATE HX" manufactured by Tosoh), and as a crosslinking catalyst, an ethyl acetate solution of dioctyltin dilaurate ("Envilizer OL -1") to prepare an acrylic adhesive solution. The acrylic adhesive solution was coated on the release surface of the release film (MRF#38), and heated at 130°C for 20 seconds to form an adhesive sheet with a thickness of 10 μm.
[表面保護膜之製作]
<表面保護膜1>
對厚度100 μm之環烯烴膜(日本ZEON製造之「ZEONORFILM ZF-14-100」)之單面進行電暈處理,於電暈處理面貼合黏著片3,於厚度100 μm之膜設置厚度20 μm之黏著劑層,獲得於黏著劑層之表面暫時黏有隔離膜之表面保護膜。[Production of surface protection film]
<
<表面保護膜2>
對厚度40 μm之環烯烴膜(日本ZEON製造之「ZEONORFILM ZF-14-40」)之單面進行電暈處理,於電暈處理面貼合黏著片3,於厚度40 μm之膜設置厚度20 μm之黏著劑層,獲得於黏著劑層之表面暫時黏有隔離膜之表面保護膜。<Surface Protection Film 2>
Corona treatment is performed on one side of a cycloolefin film with a thickness of 40 μm (“ZEONORFILM ZF-14-40” manufactured by ZEON, Japan), and an
<表面保護膜3>
積層2片上述表面保護膜2,並依序積層厚度40 μm之膜、厚度20 μm之黏著劑層、厚度40 μm之膜及厚度20 μm之黏著劑層,獲得於黏著劑層之表面暫時黏有隔離膜之表面保護膜。<
<表面保護膜4>
於上述表面保護膜1上貼合表面保護膜2,依序積層厚度40 μm之膜、厚度20 μm之黏著劑層、厚度100 μm之膜以及厚度20 μm之黏著劑層,獲得於黏著劑層之表面暫時黏有隔離膜之表面保護膜。<Surface Protection Film 4>
Attach the surface protection film 2 on the above
<表面保護膜5>
積層2片上述表面保護膜1,依序積層厚度100 μm之膜、厚度20 μm之黏著劑層、厚度100 μm之膜以及厚度20 μm之黏著劑層,獲得於黏著劑層之表面暫時黏有隔離膜之表面保護膜。<
<表面保護膜6> 對厚度100 μm之環烯烴膜(日本ZEON製造之「ZEONORFILM ZF-14-100」)之單面進行電暈處理,於電暈處理面貼合黏著片4,於厚度100 μm之膜設置厚度10 μm之黏著劑層,獲得於黏著劑層之表面暫時黏有隔離膜之表面保護膜。<Surface protection film 6> Corona treatment is performed on one side of a cycloolefin film with a thickness of 100 μm (“ZEONORFILM ZF-14-100” manufactured by ZEON, Japan), and an adhesive sheet 4 is attached to the corona-treated surface, and a thickness of 10 is set on a film with a thickness of 100 μm. The adhesive layer of μm is obtained by temporarily adhering the surface protection film of the isolation film on the surface of the adhesive layer.
<表面保護膜7>
對厚度100 μm之雙軸延伸聚酯膜(三菱化學製造之「Diafoil T100-100」)之單面進行電暈處理,於電暈處理面貼合黏著片3,於厚度100 μm之膜設置厚度20 μm之黏著劑層,獲得於黏著劑層之表面暫時黏有隔離膜之表面保護膜。<
<表面保護膜8>
對厚度38 μm之雙軸延伸聚酯膜(三菱化學製造之「Diafoil T100C38」)之單面進行電暈處理,於電暈處理面上貼合黏著片3,於厚度100 μm之膜設置厚度20 μm之黏著劑層,獲得於黏著劑層之表面暫時黏有隔離膜之表面保護膜。積層2片該表面保護膜,依序積層厚度38 μm之膜、厚度20 μm之黏著劑層、厚度38 μm之膜及厚度20 μm之黏著劑層,獲得於黏著劑層之表面暫時黏有隔離膜之表面保護膜。<Surface protection film 8>
Corona treatment was performed on one side of a biaxially stretched polyester film ("Diafoil T100C38" manufactured by Mitsubishi Chemical) with a thickness of 38 μm, and an
[實施例1] <黏著偏光板之製作> (偏光元件) 對厚度100 μm之非晶質聚酯膜(聚對苯二甲酸/間苯二甲酸乙二酯;玻璃轉移溫度75℃)之單面實施電暈處理,於電暈處理面,在25℃下塗佈以9:1之重量比包含聚乙烯醇(聚合度4200,皂化度99.2莫耳%)及乙醯乙醯基改性聚乙烯醇(日本合成化學工業製造之「Gosefimer Z200」;聚合度1200,乙醯乙醯基改性度4.6%,皂化度99.0莫耳%以上)之水溶液並進行乾燥,製作在非晶質聚酯膜基材上設置有厚度11 μm之PVA系樹脂層之積層體。[Example 1] <Production of Adhesive Polarizer> (polarizer) Corona treatment is performed on one side of an amorphous polyester film (polyethylene terephthalate/isophthalate; glass transition temperature 75°C) with a thickness of 100 μm, and the corona-treated surface is treated at 25°C The coating contains polyvinyl alcohol (polymerization degree 4200, saponification degree 99.2 mole%) and acetoacetyl-modified polyvinyl alcohol ("Gosefimer Z200" manufactured by Japan Synthetic Chemical Industry Co., Ltd.; polymerization degree) at a weight ratio of 9:1. 1200, the degree of modification of acetoacetyl group is 4.6%, and the degree of saponification is more than 99.0 mole%), and dry it to make a laminate with a PVA-based resin layer with a thickness of 11 μm on an amorphous polyester film substrate. body.
藉由在120℃之烘箱內之空中輔助延伸,而沿長度方向將該積層體以自由端單軸延伸之方式延伸至2.0倍後,一面進行輥搬送,一面依次在30℃之4%硼酸水溶液中浸漬30秒、在30℃之染色液中(0.2%碘,1.0%碘化鉀水溶液)中浸漬60秒。繼而,一面以輥搬送之方式搬送積層體,一面在30℃之交聯液(碘化鉀3%、硼酸3%水溶液)中浸漬30秒進行交聯處理,並且,一面於70℃之硼酸4%、碘化鉀5%水溶液中浸漬,一面以總延伸倍率成為5.5倍之方式延長度方向進行自由端單軸延伸。其後,將積層體浸漬於30℃之洗淨液(4%碘化鉀水溶液)中,獲得於非晶質聚酯膜基材上設置有厚度5 μm之PVA系偏光元件之積層體。By auxiliary stretching in the air in an oven at 120°C, the laminate is stretched to 2.0 times in the longitudinal direction in the form of uniaxial stretching at the free end, and then it is conveyed by rollers while being sequentially placed in 4% boric acid aqueous solution at 30°C. Soak for 30 seconds in the staining solution at 30°C (0.2% iodine, 1.0% potassium iodide aqueous solution) for 60 seconds. Then, while transporting the laminated body by roller transport, it was immersed in a cross-linking solution (
(偏光元件保護膜之貼合) 製備如下紫外線硬化型接著劑,其包含40重量份之N-羥基乙基丙烯醯胺及60重量份之N-丙烯醯嗎啉作為硬化性成分,進而包含作為聚合起始劑之3重量份之2-甲基-1-(4-甲硫基苯基)-2-嗎啉基丙烷-1-酮(BASF製造之「Irgacure819」)。將該接著劑以約1 μm之厚度塗佈於上述積層體之偏光元件之表面,於其上貼合作為偏光元件保護膜之厚度40 μm之丙烯酸系膜,照射累積光量1000 mJ/cm2 之紫外線,而使接著劑硬化。作為丙烯酸系膜,使用與在日本專利特開2017-26939號之實施例中記載之「透明保護膜1A」同樣地製作之包含醯亞胺化MS樹脂之雙軸延伸膜。(Lamination of polarizing element protective film) The following ultraviolet curable adhesive was prepared, which contained 40 parts by weight of N-hydroxyethylacrylamide and 60 parts by weight of N-acryloylmorpholine as hardening components, and further contained as 3 parts by weight of 2-methyl-1-(4-methylthiophenyl)-2-morpholinopropan-1-one (“Irgacure 819” manufactured by BASF) as a polymerization initiator. Apply this adhesive to the surface of the polarizing element of the above-mentioned laminate with a thickness of about 1 μm, and attach an acrylic film with a thickness of 40 μm as a protective film of the polarizing element on it, and irradiate with a cumulative light intensity of 1000 mJ/cm 2 UV rays harden the adhesive. As the acrylic film, a biaxially stretched film made of imidized MS resin produced in the same manner as "transparent protective film 1A" described in Example of JP-A-2017-26939 was used.
(黏著劑層之積層)
自PVA系偏光元件之表面剝離非晶質聚酯膜基材。將暫時黏於黏著片1之一面之隔離膜(MRN#38)剝離,於PVA系偏光元件之表面貼合黏著片,從而獲得附黏著劑之偏光板。(lamination of adhesive layer)
The amorphous polyester film substrate was peeled off from the surface of the PVA-based polarizing element. The release film (MRN#38) temporarily attached to one side of the
<表面保護膜之貼合>
將暫時黏於表面保護膜1之黏著劑層之表面之隔離膜剝離,於附黏著劑之偏光板之丙烯酸系膜(偏光元件保護膜)上貼合表面保護膜。藉由以上之步驟,獲得於附黏著劑之偏光板之黏著劑層暫時黏有隔離膜、且於偏光板上暫時黏有表面保護膜之積層體(母基板)。<Lamination of surface protection film>
The release film temporarily attached to the surface of the adhesive layer of the
<切割>
於該積層體之表面保護膜側之表面貼合微黏著膜作為載體片材,根據圖8A~8C所示之製程切斷積層體後,剝離去除隔離膜(MRF#38)及切斷片。其後,於黏著光學膜之黏著劑層(黏著片1)之表面貼合隔離膜(MRF#38),對製品之尺寸進行沖裁,獲得於偏光板之一面(偏光元件側之面)貼合有黏著片1及厚度38 μm之離型膜、且於偏光板之另一面(丙烯酸系保護膜)上貼合有表面保護膜1之積層體。<Cutting>
Attach a micro-adhesive film on the surface protection film side of the laminate as a carrier sheet, cut the laminate according to the process shown in Figures 8A to 8C, peel off the separator (MRF#38) and the cut piece. Afterwards, attach a release film (MRF#38) to the surface of the adhesive layer (adhesive sheet 1) on which the optical film is attached, punch out the size of the product, and obtain a laminated film on one side of the polarizer (the side of the polarizer) A laminate comprising an
[實施例2~11及比較例1~3]
如表1所示變更在偏光板之一面設置之黏著片之種類、暫時黏於黏著片之離型膜之種類、及貼合於偏光板之另一面之表面保護膜之種類。除此之外,與實施例1同樣地進行,獲得暫時黏有離型膜及表面保護膜之黏著偏光板。再者,各實施例之離型膜均為利用矽酮對單面進行剝離處理所得之聚酯膜,使用以下之市售品。
厚度25 μm之離型膜:三菱化學製造之「Diafoil MRF#25」
厚度38 μm之離型膜:三菱化學製造之「Diafoil MRF#38」
厚度50 μm之離型膜:三菱化學製造之「Diafoil MRF#50」[Examples 2-11 and Comparative Examples 1-3]
As shown in Table 1, the type of adhesive sheet provided on one side of the polarizing plate, the type of release film temporarily attached to the adhesive sheet, and the type of surface protection film attached to the other side of the polarizing plate were changed. Other than that, it carried out similarly to Example 1, and obtained the adhesive polarizing plate to which the release film and the surface protection film were temporarily adhered. In addition, the release film of each Example was the polyester film obtained by peeling off one side with silicone, and the following commercially available products were used.
Release film with a thickness of 25 μm: "Diafoil MRF#25" manufactured by Mitsubishi Chemical
Release film with a thickness of 38 μm: "Diafoil MRF#38" manufactured by Mitsubishi Chemical
Release film with a thickness of 50 μm: "
[評價] <接著力> 將黏著偏光板及表面保護膜切成寬度25 mm、長度100 mm之尺寸,並剝離隔離膜,其後於丙烯酸系樹脂板(三菱化學製造之「Acrylite」,厚度:2 mm,寬度:70 mm,長度:100 mm)上,以壓力0.25 MPa、搬送速度0.3 m/分鐘之速度進行輥壓接。於23℃、相對濕度50%之環境下將該試樣靜置30分鐘後,在相同環境下進行剝離角度180°、拉伸速度0.3 m/分鐘之剝離試驗,測定在各拉伸速度下之180°剝離力。[evaluate] <Adhesion> Cut the adhesive polarizing plate and surface protection film into a size of 25 mm in width and 100 mm in length, peel off the separator, and place it on an acrylic resin plate ("Acrylite" manufactured by Mitsubishi Chemical, thickness: 2 mm, width: 70 mm) , Length: 100 mm), roll crimping at a pressure of 0.25 MPa and a conveying speed of 0.3 m/min. After the sample was left to stand for 30 minutes at 23°C and a relative humidity of 50%, a peeling test was performed at a peeling angle of 180° and a tensile speed of 0.3 m/min in the same environment, and the peeling test at each tensile speed was measured. 180°peel force.
<三點彎曲荷重> 將表面保護膜及離型膜切成寬度6 mm、長度50 mm之尺寸。於支點間距離25 mm之三點彎曲治具上放置該試樣,求出在23℃、相對濕度50%之環境下,使用動態黏彈性測定裝置(TA Instruments製造之「RSA-III」),以0.5 m m/秒之壓入速度將壓頭壓入至試樣5 mm之深度時之荷重。<Three-point bending load> Cut the surface protection film and release film to a size of 6 mm in width and 50 mm in length. Place the sample on a three-point bending jig with a distance of 25 mm between fulcrums, and obtain the dynamic viscoelasticity measurement device ("RSA-III" manufactured by TA Instruments) in an environment of 23°C and a relative humidity of 50%. The load when the indenter is pressed into the sample to a depth of 5 mm at a pressing speed of 0.5 mm/s.
<離型膜之剝離性> 固持住伸出至積層體之外周之離型膜並剝離離型膜。又,於在水平台上經由雙面黏著帶貼合有積層體之表面保護膜側之面之狀態下,固持住伸出至積層體之外周之離型膜並剝離離型膜。將在任何水準下均可以容易地剝離者記為◎,將雖然在水平台上固定之狀態下可以容易地剝離但在通常之作業中難以剝離者記為〇,將在任何水準下表面保護膜均會追隨離型膜而無法剝離者記為×。<Peelability of Release Film> Hold the release film protruding to the outer periphery of the laminate and peel off the release film. Also, the release film protruding to the outer periphery of the laminate is held and peeled off while the surface of the laminate on the surface protective film side is bonded via the double-sided adhesive tape on the horizontal platform. Those that can be easily peeled off at any level are marked as ◎, those that can be easily peeled off in a state fixed on a horizontal table but difficult to peel off in normal operations are marked as 0, and the surface protection film is rated at any level Those that could follow the release film and could not be peeled off were rated as x.
<表面保護膜剝離性> 自積層體剝離離型膜,於丙烯酸系樹脂板(三菱化學製造之「Acrylite」,厚度:2 mm、寬度:70 mm、長度:100 mm)上,以壓力0.25 MPa、搬送速度0.3 m/分鐘之速度進行輥壓接。於表面保護膜自黏著偏光板之外周伸出之區域(表面保護膜接著於丙烯酸系樹脂板之區域)中,將能夠容易地自丙烯酸系樹脂板剝離表面保護膜者記為〇,將剝離費力者記為×。<Surface Protection Film Peelability> Peel the release film from the laminate, and place it on an acrylic resin plate ("Acrylite" manufactured by Mitsubishi Chemical, thickness: 2 mm, width: 70 mm, length: 100 mm) at a pressure of 0.25 MPa and a conveying speed of 0.3 m/min. The speed of roller crimping. In the area where the surface protection film protrudes from the outer periphery of the adhesive polarizing plate (the area where the surface protection film is adhered to the acrylic resin plate), the area where the surface protection film can be easily peeled off from the acrylic resin plate is marked as 0, and the area where the surface protection film is easily peeled off is marked as 0. Those who were recorded as ×.
<光學膜接著耐久性> 將表面保護膜剝離性試驗後之試樣(於丙烯酸系樹脂板之表面貼合有黏著偏光板之試樣)在溫度85℃之恆溫槽內靜置5天後取出,在23℃相對濕度50%之環境下靜置30分鐘後,藉由目視觀察黏著劑層之***狀態。將在接著界面未見氣泡者記為〇,將在接著界面產生氣泡者記為×。<Optical Film Adhesion Durability> The sample after the peeling test of the surface protective film (the sample with an adhesive polarizer attached to the surface of the acrylic resin plate) was taken out after standing in a constant temperature bath at a temperature of 85°C for 5 days, and at 23°C with a relative humidity of 50 % environment for 30 minutes, by visually observing the uplift state of the adhesive layer. The case where no air bubbles were seen at the interface was marked as 0, and the case where air bubbles were formed at the interface was marked as ×.
將上述各實施例及比較例之積層體之構成(離型膜之厚度、於偏光板之表面設置之黏著劑之種類、表面保護膜之構成(膜基材之材料及膜合計厚度、黏著劑之種類及厚度))以及評‑價結果示於表1。The composition of the laminates of the above-mentioned examples and comparative examples (the thickness of the release film, the type of adhesive provided on the surface of the polarizing plate, the composition of the surface protection film (the material of the film base material and the total thickness of the film, the adhesive The type and thickness)) and evaluation results are shown in Table 1.
[表1]
如表1所示,實施例1~11之積層體之離型膜之剝離性、表面保護膜之剝離性及偏光板之接著可靠性均良好。於使用接著力較小之黏著片3作為與偏光元件相接之黏著劑層的比較例2中,偏光板之接著耐久性不充分。於使用黏著片3作為表面保護膜之黏著劑層的比較例3中,表面保護膜之剝離困難。As shown in Table 1, the peelability of the release film, the peelability of the surface protection film, and the adhesion reliability of the polarizing plate of the laminates of Examples 1 to 11 were all good. In Comparative Example 2 in which the
於表面保護膜之膜基材之厚度較小的比較例1中,由於表面保護膜之彎曲荷重較小(即,表面保護膜容易彎曲),故而若使離型膜彎曲,則表面保護膜會追隨地彎曲,導致難以自積層體剝離離型膜。於使用厚度50 μm之離型膜的實施例8及實施例11中,與其他實施例相比,離型膜之剝離性較差。認為其原因在於:離型膜之彎曲荷重與表面保護膜之彎曲荷重之差較小,表面保護膜容易追隨離型膜之彎曲而發生彎曲。In Comparative Example 1 in which the thickness of the film substrate of the surface protection film was small, since the bending load of the surface protection film was small (that is, the surface protection film was easily bent), if the release film was bent, the surface protection film would be damaged. The following bending makes it difficult to peel off the release film from the laminate. In Example 8 and Example 11 using a release film with a thickness of 50 μm, the peelability of the release film was inferior compared to other Examples. The reason for this is considered to be that the difference between the bending load of the release film and the bending load of the surface protection film is small, and the surface protection film tends to bend following the bending of the release film.
由以上之結果可知:藉由將離型膜及表面保護膜之彎曲荷重設為特定範圍,並且使兩者之彎曲荷重之差較大,而於離型膜之剝離時抑制表面保護膜追隨地發生彎曲,可獲得容易實現離型膜與表面保護膜之接著界面處之剝離之積層體。From the above results, it can be seen that by setting the bending load of the release film and the surface protection film to a specific range, and making the difference between the bending loads of the two larger, it is possible to suppress the tracking of the surface protection film when the release film is peeled off. Bending occurs to obtain a laminate that can easily achieve peeling at the bonding interface between the release film and the surface protection film.
1:黏著光學膜
3:載體片材
5:表面保護膜
7:離型膜
9:離型膜
10:黏著光學膜
11:光學膜
12:黏著劑層
30:被黏著體
50:表面保護膜
51:膜基材
52:黏著劑層
61a:切斷線
61b:切斷線
62a:切斷線
62b:切斷線
63a:切斷線
63b:切斷線
64a:切斷線
64b:切斷線
70:離型膜
77:伸出部
81a:切斷線
81b:切斷線
91a:切斷線
91b:切斷線
92a:切斷線
92b:切斷線
93a:切斷線
93b:切斷線
101:積層體
103:積層體
161:積層體
162:積層體
163:積層體
164:積層體
181:積層體
182:積層體
183:積層體
191:積層體
192:積層體
193:積層體
L1:伸出量
L2:伸出量1: Adhesive optical film 3: Carrier sheet 5: Surface protective film 7: Release film 9: Release film 10: Adhesive optical film 11: Optical film 12: Adhesive layer 30: Adhered body 50: Surface protective film 51 : film substrate 52 :
圖1係表示於黏著光學膜暫時黏有表面保護膜及離型膜之積層體之積層構成例的剖視圖。 圖2係圖1之積層體之俯視圖。 圖3係表示於黏著光學膜暫時黏有表面保護膜及離型膜之積層體之積層構成例的剖視圖。 圖4係圖3之積層體之俯視圖。 圖5A係表示自積層體剝離離型膜之情況之模式剖視圖。 圖5B係表示自積層體剝離離型膜之情況之模式剖視圖。 圖5C係剝離離型膜後之積層體之模式剖視圖。 圖5D係表示對被黏著體貼合黏著光學膜之狀態之模式剖視圖。 圖5E係表示自光學膜剝離表面保護膜之情況之模式剖視圖。 圖5F係剝離表面保護膜後之被黏著體與光學膜之積層體之模式剖視圖。 圖6A係用於製造單片積層體之積層體(母基板)之剖視圖。 圖6B係表示於積層體形成有切斷線之狀態之剖視圖。 圖6C係去除切斷片後之積層體之剖視圖。 圖6D係貼合表面保護膜後之積層體之剖視圖。 圖6E係表示於表面保護膜形成有切斷線之狀態之剖視圖。 圖6F係表示於離型膜形成有切斷線之狀態之剖視圖。 圖6G係藉由自母基板之切割而獲得之單片之積層體之剖視圖。 圖6H係表示於表面保護膜及離型膜形成有切斷線之狀態之剖視圖。 圖6I係藉由自母基板之切割而獲得之單片之積層體之剖視圖。 圖7A係用於製造單片積層體之積層體(母基板)之剖視圖。 圖7B係表示於積層體形成有切斷線之狀態之剖視圖。 圖7C係去除離型膜及切斷片後之積層體之剖視圖。 圖7D係貼合離型膜後之積層體之剖視圖。 圖8A係用於製造單片積層體之積層體(母基板)之剖視圖。 圖8B係表示於積層體形成有切斷線之狀態之剖視圖。 圖8C係表示於積層體形成有切斷線之狀態之剖視圖。 圖8D係去除離型膜及切斷片後之積層體之剖視圖。 圖8E係貼合離型膜後之積層體之剖視圖。 圖8F係表示於離型膜形成有切斷線之狀態之剖視圖。 圖8G係藉由自母基板之切割而獲得之單片之積層體之剖視圖。Fig. 1 is a cross-sectional view showing an example of a laminate structure of a laminate in which a surface protection film and a release film are temporarily adhered to an optical film. Fig. 2 is a top view of the laminated body in Fig. 1 . Fig. 3 is a cross-sectional view showing an example of a laminate structure of a laminate in which a surface protection film and a release film are temporarily adhered to an optical film. Fig. 4 is a top view of the laminated body in Fig. 3 . Fig. 5A is a schematic cross-sectional view showing a state where a release film is peeled off from a laminate. Fig. 5B is a schematic cross-sectional view showing a state where the release film is peeled off from the laminate. Fig. 5C is a schematic cross-sectional view of the laminate after peeling off the release film. Fig. 5D is a schematic cross-sectional view showing a state in which an optical film is bonded to an adherend. 5E is a schematic cross-sectional view showing a state where the surface protection film is peeled off from the optical film. FIG. 5F is a schematic cross-sectional view of a laminate of an adherend and an optical film after peeling off the surface protective film. Fig. 6A is a cross-sectional view of a laminate (mother substrate) for manufacturing a monolithic laminate. Fig. 6B is a cross-sectional view showing a state where a cutting line is formed in the laminate. Fig. 6C is a cross-sectional view of the laminate after the cut piece is removed. Fig. 6D is a cross-sectional view of the laminate after the surface protection film is attached. FIG. 6E is a cross-sectional view showing a state where a cutting line is formed on the surface protection film. FIG. 6F is a cross-sectional view showing a state where a cutting line is formed on the release film. Fig. 6G is a cross-sectional view of a monolithic laminate obtained by dicing from a mother substrate. FIG. 6H is a cross-sectional view showing a state where cutting lines are formed on the surface protection film and the release film. FIG. 6I is a cross-sectional view of a monolithic laminate obtained by dicing from a mother substrate. Fig. 7A is a cross-sectional view of a laminate (mother substrate) for manufacturing a monolithic laminate. Fig. 7B is a cross-sectional view showing a state where a cutting line is formed in the laminate. Fig. 7C is a cross-sectional view of the laminate after removing the release film and the cut sheet. Fig. 7D is a cross-sectional view of the laminate after the release film is pasted. Fig. 8A is a cross-sectional view of a laminate (mother substrate) for manufacturing a monolithic laminate. Fig. 8B is a cross-sectional view showing a state where a cutting line is formed in the laminate. Fig. 8C is a cross-sectional view showing a state where a cutting line is formed in the laminate. Fig. 8D is a cross-sectional view of the laminate after removing the release film and the cut sheet. Fig. 8E is a cross-sectional view of the laminate after the release film is bonded. FIG. 8F is a cross-sectional view showing a state where a cutting line is formed on the release film. 8G is a cross-sectional view of a monolithic laminate obtained by dicing from a mother substrate.
10:黏著光學膜 10: Adhesive optical film
11:光學膜 11: Optical film
12:黏著劑層 12: Adhesive layer
50:表面保護膜 50: surface protection film
51:膜基材 51: Membrane substrate
52:黏著劑層 52: Adhesive layer
70:離型膜 70: Release film
101:積層體 101: laminated body
L1:伸出量 L 1 : Overhang
L2:伸出量 L 2 : Overhang
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KR20220148805A (en) * | 2020-03-10 | 2022-11-07 | 수미토모 케미칼 컴퍼니 리미티드 | Laminated sheet and its manufacturing method |
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KR20230088310A (en) * | 2020-10-22 | 2023-06-19 | 세키스이가가쿠 고교가부시키가이샤 | Surface protection film for reflective polarizing film, and laminate |
US20240012179A1 (en) * | 2020-12-11 | 2024-01-11 | 3M Innovative Properties Company | Optical Lens Including Optical Film Bonded to Lens Substrate |
KR20220121070A (en) | 2021-02-24 | 2022-08-31 | 주식회사 엘지화학 | Manufacturing method of foldable backplate film |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002303730A (en) * | 2001-04-09 | 2002-10-18 | Nitto Denko Corp | Optical member |
TW200941051A (en) * | 2008-01-25 | 2009-10-01 | Nitto Denko Corp | Method of stripping optical film of pressure-sensitive adhesive type and optical film of pressure-sensitive adhesive type |
JP2013072036A (en) * | 2011-09-28 | 2013-04-22 | Furukawa Electric Co Ltd:The | Pressure-sensitive adhesive tape for working brittle wafer and grinding method using the same |
TW201343871A (en) * | 2012-03-30 | 2013-11-01 | Nitto Denko Corp | Pressure-sensitive adhesive sheets |
JP2018058218A (en) * | 2016-09-30 | 2018-04-12 | 大日本印刷株式会社 | Decorative sheet |
JP2018120120A (en) * | 2017-01-26 | 2018-08-02 | 日東電工株式会社 | Method for manufacturing optical laminate and method for manufacturing image display device |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4208187B2 (en) * | 2002-10-28 | 2009-01-14 | 日東電工株式会社 | Adhesive optical film, method for producing adhesive optical film, and image display device |
JP4335773B2 (en) * | 2004-09-27 | 2009-09-30 | 日東電工株式会社 | Film laminate manufacturing method and manufacturing apparatus used therefor |
JP2010097070A (en) * | 2008-10-17 | 2010-04-30 | Nitto Denko Corp | Transparent pressure-sensitive adhesive sheet for flat panel display, and flat panel display |
JP5749076B2 (en) * | 2011-05-19 | 2015-07-15 | 藤森工業株式会社 | Surface protective film and optical component to which it is attached |
TW201307464A (en) * | 2011-07-05 | 2013-02-16 | Sony Chem & Inf Device Corp | Resin composition for forming fluorescent sheet |
US20160185089A1 (en) * | 2013-08-01 | 2016-06-30 | Lintec Corporation | Protective Film Formation-Use Composite Sheet |
JP6488125B2 (en) * | 2013-12-26 | 2019-03-20 | 日東電工株式会社 | Laminated polarizing film, method for producing the same, laminated optical film, and image display device |
JP2016118771A (en) * | 2014-12-18 | 2016-06-30 | 住友化学株式会社 | Polarizing plate with protective film and laminate including the same |
JP6546806B2 (en) * | 2015-07-30 | 2019-07-17 | 日東電工株式会社 | Optical surface protection film with separator |
KR102641791B1 (en) * | 2015-08-24 | 2024-03-04 | 닛토덴코 가부시키가이샤 | Optical member with surface protection film |
JP6676311B2 (en) * | 2015-08-26 | 2020-04-08 | リンテック株式会社 | Protective film and laminate |
JP6148775B1 (en) * | 2016-02-25 | 2017-06-14 | 住友化学株式会社 | Method for producing laminated optical film |
JP6905312B2 (en) * | 2016-03-30 | 2021-07-21 | 日東電工株式会社 | Optical film, peeling method and manufacturing method of optical display panel |
KR101678803B1 (en) * | 2016-06-03 | 2016-11-22 | 주식회사 엘지화학 | The system and method for manufacturing optical display element |
JP2018013583A (en) * | 2016-07-20 | 2018-01-25 | 住友化学株式会社 | Optical film having separator film laminate adhesive layer |
-
2018
- 2018-08-27 JP JP2018158763A patent/JP7273472B2/en active Active
-
2019
- 2019-08-08 KR KR1020190096439A patent/KR102515728B1/en active IP Right Grant
- 2019-08-16 TW TW108129216A patent/TWI791124B/en active
- 2019-08-27 CN CN201910794460.9A patent/CN110862776B/en active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002303730A (en) * | 2001-04-09 | 2002-10-18 | Nitto Denko Corp | Optical member |
TW200941051A (en) * | 2008-01-25 | 2009-10-01 | Nitto Denko Corp | Method of stripping optical film of pressure-sensitive adhesive type and optical film of pressure-sensitive adhesive type |
JP2013072036A (en) * | 2011-09-28 | 2013-04-22 | Furukawa Electric Co Ltd:The | Pressure-sensitive adhesive tape for working brittle wafer and grinding method using the same |
TW201343871A (en) * | 2012-03-30 | 2013-11-01 | Nitto Denko Corp | Pressure-sensitive adhesive sheets |
JP2018058218A (en) * | 2016-09-30 | 2018-04-12 | 大日本印刷株式会社 | Decorative sheet |
JP2018120120A (en) * | 2017-01-26 | 2018-08-02 | 日東電工株式会社 | Method for manufacturing optical laminate and method for manufacturing image display device |
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KR102515728B1 (en) | 2023-03-30 |
KR20200024084A (en) | 2020-03-06 |
JP2020034623A (en) | 2020-03-05 |
TW202016625A (en) | 2020-05-01 |
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