TWI754615B

TWI754615B - Methods and apparatuses for edge finishing glass substrates

Info

Publication number: TWI754615B
Application number: TW105122840A
Authority: TW
Inventors: 詹姆斯威廉布朗; 尤瑟夫凱德庫羅許; 夏伊尼蓋芙賽菲; 唐玉銀; 乃越周
Original assignee: 美商康寧公司
Priority date: 2015-07-21
Filing date: 2016-07-20
Publication date: 2022-02-11
Also published as: TWI792229B; CN107921601B; TW202140203A; KR20180021914A; WO2017015205A1; JP2018522810A; TW201714851A; US20180215008A1; CN107921601A

Abstract

A glass support system for a glass edge finishing apparatus includes a vacuum member that is configured to extend lengthwise in a glass feed direction and along an edge of a glass substrate. The vacuum member has a vacuum body that includes a pressure chamber located therein and a support surface having an array of vacuum openings extending therethrough and in communication with the pressure chamber. The array of vacuum openings is arranged in multiple, side-by-side rows with substantially uniform spacing between the vacuum openings along each one of the multiple rows.

Description

用於邊緣加工玻璃基板的方法及裝置Method and apparatus for edge processing glass substrates

本揭示案關於用於邊緣加工玻璃基板的方法及裝置，且更具體而言是關於用以增加邊緣斜切對稱性的方法及裝置。The present disclosure relates to methods and apparatus for edge processing glass substrates, and more particularly, to methods and apparatus for increasing edge bevel symmetry.

已主要是針對相對於較薄的玻璃基板具有相對高剛性之相對厚的玻璃基板發展傳統的玻璃邊緣加工裝置。作為一個示例，在已使用機械刻痕及斷裂程序來形成之後的玻璃片一般具有使用磨料磨輪來磨圓的邊緣。在某些應用中（例如在汽車工業中），提供在玻璃片的外周邊上具有圓頭輪廓的玻璃片邊緣可能是理想的。Conventional glass edge processing devices have been developed primarily for relatively thick glass substrates with relatively high rigidity relative to thinner glass substrates. As one example, glass sheets after they have been formed using a mechanical scoring and breaking procedure typically have edges that are rounded using an abrasive wheel. In certain applications, such as in the automotive industry, it may be desirable to provide a glass sheet edge with a rounded profile on the outer periphery of the glass sheet.

平板顯示器及其他應用相較於汽車工業中所採用的通常使用遠遠較薄的玻璃片。較薄的玻璃片相較於較厚的玻璃片可具有減少的剛性及增加的可撓性。邊緣加工具有減少的剛性及增加的可撓性的如此薄玻璃片可能至少部分地由於邊緣加工處理中所涉及的力而引入挑戰。據此，存在用於邊緣加工包括相對薄之玻璃基板的玻璃基板的方法及裝置的需要。Flat panel displays and other applications typically use much thinner sheets of glass than those used in the automotive industry. Thinner glass sheets may have reduced stiffness and increased flexibility compared to thicker glass sheets. Edge machining such thin glass sheets with reduced stiffness and increased flexibility may introduce challenges due, at least in part, to the forces involved in the edge machining process. Accordingly, a need exists for a method and apparatus for edge processing glass substrates including relatively thin glass substrates.

一個用以改良可撓玻璃基板之機械可靠性的技術是輪磨及拋光可撓玻璃基板的邊緣，以移除可撓玻璃層中不想要的破裂及斷裂，例如以達成預定的邊緣強度。為此，本文中描述用於加工玻璃基板的方法及裝置，其中邊緣加工裝置用以有效地加工玻璃基板，同時在本文中稱為斜切的處理中提供邊緣圓頭的形狀。One technique used to improve the mechanical reliability of flexible glass substrates is to wheel and polish the edges of the flexible glass substrate to remove unwanted cracks and breaks in the flexible glass layer, eg, to achieve a predetermined edge strength. To this end, methods and apparatus for processing glass substrates are described herein, wherein the edge processing apparatus is used to efficiently process the glass substrate while providing the shape of the edge rounding in a process referred to herein as chamfering.

依據一個實施例，一種用於一玻璃邊緣加工裝置的玻璃支撐系統，該玻璃邊緣加工裝置包括一真空構件（例如一真空夾），該真空構件配置為縱向地以一玻璃饋送方向且沿一玻璃基板的一邊緣延伸。該真空構件包括一真空主體，該真空主體包括一壓力腔室及一支撐面，該壓力腔室位於該真空主體中，該支撐面包括一真空開口陣列，該真空開口陣列延伸通過該支撐面且與該壓力腔室連通。該真空開口陣列佈置於多個、並排的列中，該多個列沿該多個列中的各者在該等真空開口之間包括實質均勻的間隔。According to one embodiment, a glass support system for a glass edge processing device including a vacuum member (eg, a vacuum clamp) configured longitudinally in a glass feed direction and along a glass An edge of the substrate extends. The vacuum member includes a vacuum body including a pressure chamber and a support surface, the pressure chamber being located in the vacuum body, the support surface including an array of vacuum openings extending through the support surface and communicate with the pressure chamber. The array of vacuum openings is arranged in a plurality of side-by-side columns including substantially uniform spacing between the vacuum openings along each of the plurality of columns.

依據另一實施例，一種玻璃邊緣加工裝置包括一玻璃輸送系統及一玻璃支撐系統，該玻璃支撐系統由該玻璃輸送系統以一玻璃饋送方向移動。該玻璃支撐系統可配置為支撐具有不大於約0.7 mm之一厚度的一玻璃基板。該玻璃基板包括一大致平坦的表面及正交於該大致平坦的表面的一平面外方向。該玻璃饋送方向正交於該平面外方向。該玻璃支撐系統可包括一真空構件（例如一真空夾），該真空構件配置為縱向地以該玻璃饋送方向及沿該玻璃基板的一邊緣延伸。該真空構件包括一真空主體，該真空主體包括一壓力腔室且可進一步包括一支撐面，該壓力腔室位於該真空主體中，該支撐面包括一真空開口陣列，該真空開口陣列延伸通過該支撐面且與該壓力腔室連通。該真空開口陣列可包括至少約每100 cm² 的支撐面區域25個開口。According to another embodiment, a glass edge processing apparatus includes a glass conveying system and a glass supporting system moved by the glass conveying system in a glass feeding direction. The glass support system may be configured to support a glass substrate having a thickness of no greater than about 0.7 mm. The glass substrate includes a substantially flat surface and an out-of-plane direction normal to the substantially flat surface. The glass feed direction is orthogonal to the out-of-plane direction. The glass support system may include a vacuum member (eg, a vacuum clamp) configured to extend longitudinally in the glass feed direction and along an edge of the glass substrate. The vacuum member includes a vacuum body that includes a pressure chamber and may further include a support surface in which the pressure chamber is located, the support surface including an array of vacuum openings extending through the vacuum body The support surface is in communication with the pressure chamber. The array of vacuum openings may include at least about 25 openings per 100 cm ² of support surface area.

依據又另一實施例，提供了一種加工具有等於或小於約0.7 mm之一厚度之一玻璃基板的一邊緣的方法。該方法包括以下步驟：將該玻璃基板支撐於一玻璃支撐系統上。該玻璃基板包括一大致平坦的表面、正交於該大致平坦的表面的一平面外方向及正交於該平面外方向的一玻璃饋送方向。該玻璃支撐系統可包括一真空構件（例如一真空夾），該真空構件配置為縱向地以該玻璃饋送方向及沿該玻璃基板的一邊緣延伸。該真空構件可包括一真空主體，該真空主體包括一壓力腔室及一支撐面，該壓力腔室位於該真空主體中，該支撐面包括一真空開口陣列，該真空開口陣列延伸通過該支撐面且與該壓力腔室連通。該真空開口陣列可包括至少約每100 cm² 的支撐面區域25個開口。可通過該真空開口陣列向面向該真空構件之該大致平坦的表面施加一負壓。可使用一磨輪組件斜切該玻璃基板的該邊緣。According to yet another embodiment, a method of processing an edge of a glass substrate having a thickness equal to or less than about 0.7 mm is provided. The method includes the steps of: supporting the glass substrate on a glass support system. The glass substrate includes a substantially flat surface, an out-of-plane direction normal to the substantially flat surface, and a glass feed direction normal to the out-of-plane direction. The glass support system may include a vacuum member (eg, a vacuum clamp) configured to extend longitudinally in the glass feed direction and along an edge of the glass substrate. The vacuum member may include a vacuum body including a pressure chamber and a support surface, the pressure chamber being located in the vacuum body, the support surface including an array of vacuum openings extending through the support surface and communicate with the pressure chamber. The array of vacuum openings may include at least about 25 openings per 100 cm ² of support surface area. A negative pressure can be applied to the generally flat surface facing the vacuum member through the array of vacuum openings. The edge of the glass substrate can be chamfered using a grinding wheel assembly.

依據又另一實施例，一種玻璃邊緣加工裝置包括一玻璃輸送系統及一玻璃支撐系統，該玻璃支撐系統由該玻璃輸送系統以一玻璃饋送方向移動。該玻璃支撐系統可配置為支撐具有不大於約0.7 mm之一厚度的一玻璃基板。該玻璃基板包括一大致平坦的表面及正交於該大致平坦的表面的一平面外方向。該玻璃饋送方向正交於該平面外方向。該玻璃支撐系統可包括一真空構件（例如一真空夾），該真空構件配置為縱向地以該玻璃饋送方向及沿該玻璃基板的一邊緣延伸。該真空構件可包括一真空主體，該真空主體包括一壓力腔室及一支撐面，該壓力腔室位於該真空主體中，該支撐面具有複數個真空開口，該複數個真空構件延伸通過該支撐面且與該壓力腔室連通。亦可提供一種磨輪組件，該磨輪組件配置為在該玻璃基板藉由該玻璃輸送系統由該磨輪組件以該玻璃饋送方向移動時，斜切該玻璃基板的該邊緣。一種邊緣引導組件可位於該磨輪組件及該真空構件之間，且可包括一上邊緣引導構件及一下邊緣引導構件，該下邊緣引導構件隔離自該上邊緣引導構件以提供一路徑，該玻璃基板可前行通過該路徑。According to yet another embodiment, a glass edge processing apparatus includes a glass conveying system and a glass support system moved by the glass conveying system in a glass feeding direction. The glass support system may be configured to support a glass substrate having a thickness of no greater than about 0.7 mm. The glass substrate includes a substantially flat surface and an out-of-plane direction normal to the substantially flat surface. The glass feed direction is orthogonal to the out-of-plane direction. The glass support system may include a vacuum member (eg, a vacuum clamp) configured to extend longitudinally in the glass feed direction and along an edge of the glass substrate. The vacuum member may include a vacuum body including a pressure chamber and a support surface, the pressure chamber being located in the vacuum body, the support surface having a plurality of vacuum openings, the plurality of vacuum members extending through the support face and communicate with the pressure chamber. A grinding wheel assembly can also be provided that is configured to chamfer the edge of the glass substrate as the glass substrate is moved by the glass conveying system by the grinding wheel assembly in the glass feeding direction. An edge guide assembly can be located between the grinding wheel assembly and the vacuum member, and can include an upper edge guide member and a lower edge guide member isolated from the upper edge guide member to provide a path, the glass substrate You can go forward through this path.

本文中所述的額外特徵及優點將闡述於隨後的詳細說明中，且本領域中具技藝者將從該說明容易理解部分的該等特徵及優點，或藉由實行本文中所述之實施例辨識該等特徵及優點，該等實施例包括了隨後的詳細說明、請求項以及隨附的繪圖。Additional features and advantages described herein will be set forth in the detailed description that follows, and some of those features and advantages will be readily understood by those skilled in the art from this description, or by practicing the embodiments described herein. Recognizing these features and advantages, the embodiments include the following detailed description, claims, and accompanying drawings.

要了解的是，上述的一般說明及以下的詳細說明兩者描述各種實施例，且係欲提供概觀或架構以供了解所請標的的本質及特質。隨附的繪圖被包括來提供各種實施例的進一步了解，且被併入此說明書且建構此說明書的一部分。該等繪圖繪示本文中所述的各種實施例，且與說明書一起用以解釋所請標的的原理及操作。It is to be understood that both the foregoing general description and the following detailed description describe various embodiments and are intended to provide an overview or framework for understanding the nature and nature of the claimed subject matter. The accompanying drawings are included to provide a further understanding of the various embodiments, and are incorporated into and constitute a part of this specification. The drawings illustrate various embodiments described herein, and together with the description serve to explain the principles and operation of the claims.

雖然玻璃是先天強力的材料，其強度及機械可靠性為其表面缺陷或瑕疵尺寸密度分佈及將材料隨時間累積暴露於應力的函數。邊緣強度可為玻璃基板之機械可靠性的重要因素。在整個產品生命週期期間，玻璃基板可能經受各種種類的靜態及動態的機械應力。本文中所述的實施例大致關於用於加工玻璃基板的方法及裝置，其中邊緣加工裝置用以有效地加工玻璃基板且改良玻璃基板的邊緣強度及機械可靠性。Although glass is an inherently strong material, its strength and mechanical reliability are a function of its surface defect or flaw size density distribution and cumulative exposure of the material to stress over time. Edge strength can be an important factor in the mechanical reliability of glass substrates. During the entire product life cycle, glass substrates may experience various types of static and dynamic mechanical stresses. Embodiments described herein generally relate to methods and apparatus for processing glass substrates, wherein edge processing apparatuses are used to efficiently process glass substrates and improve edge strength and mechanical reliability of the glass substrates.

從玻璃條帶或從更大的玻璃基板裁切的玻璃基板傾向於具有在裁切操作期間所形成的尖銳邊緣。玻璃基板的尖銳邊緣在處置期間容易受到損傷。邊緣瑕玼（例如碎屑、破裂等等）可能減少玻璃的強度。玻璃基板的邊緣可經處理以藉由輪磨及調整形狀（例如斜切）以消除容易損傷的尖銳邊緣，來移除尖銳邊緣。藉由從玻璃基板移除尖銳邊緣，玻璃基板中的瑕玼可被最小化，藉此減少在處置期間對於玻璃板之損傷的可能性。Glass substrates cut from glass ribbons or from larger glass substrates tend to have sharp edges formed during the cutting operation. The sharp edges of glass substrates are susceptible to damage during handling. Edge imperfections (eg chips, cracks, etc.) may reduce the strength of the glass. The edges of the glass substrate can be treated to remove sharp edges by grinding and shaping (eg, beveling) to eliminate sharp edges that are prone to damage. By removing sharp edges from the glass substrate, defects in the glass substrate can be minimized, thereby reducing the likelihood of damage to the glass sheet during handling.

各種磨輪可用以輪磨及塑形玻璃基板的邊緣，包括使用「杯形」輪及「形成的」輪。杯形輪在形狀上大致為圓形，且包括從杯形輪周圍隔開的凹入的中心區域。係使杯形輪與玻璃基板接觸，其中杯形輪的平坦面接觸玻璃基板，同時杯形輪的周圍面從玻璃基板隔開。成形輪（formed wheel）包括定位於成形輪之周圍面之邊緣中的溝槽。溝槽包括相對應於基板邊緣之經處理形狀的輪廓。係使成形輪的溝槽與玻璃基板的邊緣接觸，以輪磨及塑形該等邊緣。A variety of grinding wheels are available for grinding and shaping the edges of glass substrates, including the use of "cup" wheels and "formed" wheels. The cup wheel is generally circular in shape and includes a concave central region spaced from the circumference of the cup wheel. The cup wheel is brought into contact with the glass substrate, wherein the flat surface of the cup wheel contacts the glass substrate, while the surrounding surface of the cup wheel is spaced from the glass substrate. The formed wheel includes grooves positioned in the edge of the peripheral face of the formed wheel. The grooves include contours corresponding to the processed shape of the edge of the substrate. The grooves of the forming wheel are brought into contact with the edges of the glass substrate to grind and shape the edges.

參照圖1（繪示示例性基板邊緣12），用語「第一表面」及其其他變化在本文中用以表示玻璃基板10之第一的、相對扁平的區域。第一表面由圖1中的14所標示。類似地，用語「第二表面」及其其他變化在本文中用以表示基板10之第二的、相對扁平的表面區域，該表面區域實質平行於第一表面14。第二表面由圖1中的16所標示。Referring to FIG. 1 (showing an exemplary substrate edge 12 ), the term “first surface” and other variations are used herein to refer to a first, relatively flat region of the glass substrate 10 . The first surface is designated by 14 in FIG. 1 . Similarly, the term "second surface" and other variations are used herein to refer to a second, relatively flat surface area of substrate 10 that is substantially parallel to first surface 14 . The second surface is designated by 16 in FIG. 1 .

用語「第一斜面」、「第一斜面區段」及其其他變化在本文中用以表示基板邊緣的第一部分，其位於第一表面14及基板邊緣12的頂點18之間。第一斜面由圖1中的20所標示。類似地，用語「第二斜面」及「第二斜面區段」及其其他變化在本文中用以表示基板邊緣的第二部分，其位於第二表面16及頂點18之間。第二斜面由圖1中的22所標示。在某些實施例中，第一及第二斜面20及22可為彎曲的，如圖1中所示；然而，第一及第二斜面在其他非限制性的實施例中可為相對平面的。The terms "first bevel," "first bevel segment," and other variations are used herein to refer to the first portion of the substrate edge that is located between the first surface 14 and the apex 18 of the substrate edge 12 . The first slope is designated by 20 in FIG. 1 . Similarly, the terms "second bevel" and "second bevel section" and other variations are used herein to refer to the second portion of the edge of the substrate, which is located between the second surface 16 and the apex 18 . The second slope is indicated by 22 in FIG. 1 . In certain embodiments, the first and second bevels 20 and 22 may be curved, as shown in FIG. 1; however, the first and second bevels may be relatively planar in other non-limiting embodiments .

用語「頂點」及其其他變化在本文中用以表示基板邊緣12的末端區域，第一及第二斜面20及22收斂於該末端區域處。注意的是，圖1將頂點18描繪為具有給定長度的扁平區域；然而，頂點18亦可為第一及第二斜面相會的有限點，使得基板12邊緣從表面14到表面16為實質連續的曲線。The term "apex" and other variations are used herein to denote the end region of the substrate edge 12 where the first and second chamfers 20 and 22 converge. Note that FIG. 1 depicts apex 18 as a flat area of a given length; however, apex 18 may also be a finite point where the first and second chamfers meet such that the edge of substrate 12 is substantial from surface 14 to surface 16 continuous curve.

用語「第一斜面-表面介面」及其其他變化在本文中用以表示第一斜面區段相會相對扁平的第一表面14的區域。第一斜面-表面介面由圖1中的26所標示。類似地，用語「第二斜面-表面介面」及其其他變化在本文中用以表示第二斜面區段相會相對扁平的第二表面16的區域。第二斜面-表面介面由圖1中的28所標示。The term "first bevel-surface interface" and other variations thereof are used herein to refer to the region of the first surface 14 where the first bevel segments meet relatively flat. The first bevel-surface interface is designated 26 in FIG. 1 . Similarly, the term "second bevel-surface interface" and other variations are used herein to denote the region where the second bevel segments meet the relatively flat second surface 16 . The second bevel-surface interface is designated by 28 in FIG. 1 .

玻璃基板10可為具有約0.3 mm或更少之厚度30的可撓玻璃基板，包括（但不限於）例如從約0.01至約0.200 mm之範圍中的厚度，例如在從約0.05 mm至約0.1 mm、從約0.1至約0.15 mm、從約0.15至約0.3 mm、從約0.100至約0.200 mm的範圍中，包括其間的所有範圍及子範圍。示例性厚度可包括0.3、0.275、0.25、0.225、0.2、0.19、0.18、0.17、0.16、0.15、0.14、0.13、0.12、0.11、0.10、0.09、0.08、0.07、0.06、0.05、0.04、0.03、0.02或0.01 mm。在某些實施例中，玻璃基板10可具有等於或小於約0.7 mm的厚度30。玻璃基板10可以玻璃、玻璃陶瓷、或其合成物形成。形成高品質玻璃基板的熔融處理（例如下拉製處理）可用於各種裝置中，且一個這樣的應用是平板顯示器。熔融處理中所產生的玻璃基板具有表面，該等表面在相較於由其他方法所產生的玻璃基板時具有優越的扁平度及平滑度。熔融處理係描述於序號第3,338,696及3,682,609號的美國專利。其他合適的玻璃基板形成方法包括浮製處理、上拉製及槽拉方法。The glass substrate 10 may be a flexible glass substrate having a thickness 30 of about 0.3 mm or less, including but not limited to, for example, thicknesses in the range of from about 0.01 to about 0.200 mm, such as from about 0.05 mm to about 0.1 mm, from about 0.1 to about 0.15 mm, from about 0.15 to about 0.3 mm, from about 0.100 to about 0.200 mm, including all ranges and subranges therebetween. Exemplary thicknesses may include 0.3, 0.275, 0.25, 0.225, 0.2, 0.19, 0.18, 0.17, 0.16, 0.15, 0.14, 0.13, 0.12, 0.11, 0.10, 0.09, 0.08, 0.07, 0.06, 0.05, 0.04, 0.03, 0.02 or 0.01 mm. In certain embodiments, the glass substrate 10 may have a thickness 30 equal to or less than about 0.7 mm. The glass substrate 10 may be formed of glass, glass ceramics, or a composite thereof. Fusion processes, such as down-draw processes, to form high-quality glass substrates can be used in a variety of devices, and one such application is flat panel displays. The glass substrates produced in fusion processing have surfaces that have superior flatness and smoothness when compared to glass substrates produced by other methods. Melt processing is described in US Patent Nos. 3,338,696 and 3,682,609. Other suitable glass substrate formation methods include float processing, up-draw and slot-draw methods.

在不希望被理論束縛的情況下，對於相對薄的玻璃基板10（等於或小於約0.7 mm）而言，水平定向之玻璃基板10之關於第一斜面-表面介面26及第二斜面-表面介面28的對稱形狀特性可具有對於彎曲玻璃基板10期間之塑膠變形之邊緣抗性上的直接效應。第一斜面區段20及第二斜面區段22之間的邊緣不對稱性（在本文中有時稱為「邊緣斜面不對稱性」）直接相關於玻璃基板10的邊緣強度。邊緣斜面不對稱性可由基板厚度30的方向上相對於頂點18之第一及第二斜面區段20及22的各別寬度W₁ 及W₂ 所測量。在斜切處理期間將基板邊緣12徧斜出玻璃基板10的平面（垂直位移）可產生邊緣斜面不對稱性。圖2繪示針對具有約0.5 mm之厚度之玻璃基板10之基板邊緣12的徧斜及造成之邊緣斜面不對稱性之間的示例性關係。如可見的，於位置範圍R處，基板邊緣12的徧斜實質增加（如由線31所示），造成邊緣斜面不對稱性上的增加（如由線32及40所示）。Without wishing to be bound by theory, for relatively thin glass substrates 10 (equal to or less than about 0.7 mm), the horizontal orientation of glass substrate 10 with respect to first bevel-surface interface 26 and second bevel-surface interface The symmetrical shape properties of 28 may have a direct effect on edge resistance to plastic deformation during bending of glass substrate 10 . The edge asymmetry between the first bevel section 20 and the second bevel section 22 (sometimes referred to herein as "edge bevel asymmetry") is directly related to the edge strength of the glass substrate 10 . The edge bevel asymmetry can be measured by the respective widths W ₁ and W ₂ of the first and second bevel sections 20 and 22 relative to the vertex 18 in the direction of the substrate thickness 30 . Beveling the substrate edge 12 out of the plane of the glass substrate 10 in passes (vertical displacement) during the beveling process can create edge bevel asymmetry. FIG. 2 illustrates an exemplary relationship between the overall bevel of the substrate edge 12 and the resulting edge bevel asymmetry for a glass substrate 10 having a thickness of about 0.5 mm. As can be seen, at position range R, the pervasive slope of substrate edge 12 increases substantially (as shown by line 31), resulting in an increase in edge bevel asymmetry (as shown by lines 32 and 40).

邊緣水平扁平度（亦即最小垂直位移）（特別是對於薄的玻璃基板10而言）可受斜切處理期間的支撐效應影響。參照圖3，適於執行斜切處理的玻璃邊緣加工裝置40包括支撐裝置42，該支撐裝置42包括玻璃輸送系統44及玻璃支撐系統46。玻璃輸送系統44可以饋送方向移動（例如平移）玻璃支撐系統46，該饋送方向可大致對準（平行）於玻璃基板50的邊緣48。可以饋送方向以玻璃輸送系統44承載或在其他情況下由玻璃輸送系統44移動玻璃支撐系統46。玻璃支撐系統46包括真空系統52，該真空系統52包括邊緣真空構件54及56（例如真空夾），該等邊緣真空構件54及56沿玻璃基板50的相反邊緣48及58延伸，且在某些實施例中實質上以饋送方向沿玻璃基板50的整個長度延伸。在某些實施例中，真空構件54及56可形成自單一的、伸長的真空構件。在其他實施例中，可使用多個真空構件，且該等真空構件例如以饋送方向並排地對準。雖然僅繪示邊緣真空構件54及56，亦可利用內側的真空構件（參照圖14）。Edge horizontal flatness (ie, minimum vertical displacement), especially for thin glass substrates 10, can be affected by support effects during the bevel process. Referring to FIG. 3 , a glass edge processing apparatus 40 suitable for performing a beveling process includes a support apparatus 42 that includes a glass delivery system 44 and a glass support system 46 . The glass delivery system 44 can move (eg, translate) the glass support system 46 in a feed direction that can be generally aligned (parallel) to the edge 48 of the glass substrate 50 . The glass support system 46 may be carried by or otherwise moved by the glass delivery system 44 in the feed direction. The glass support system 46 includes a vacuum system 52 that includes edge vacuum members 54 and 56 (eg, vacuum clamps) that extend along opposite edges 48 and 58 of the glass substrate 50 and in some The embodiment extends substantially along the entire length of the glass substrate 50 in the feed direction. In certain embodiments, vacuum members 54 and 56 may be formed from a single, elongated vacuum member. In other embodiments, multiple vacuum members may be used and aligned side-by-side, eg, in the feed direction. Although only marginal vacuum members 54 and 56 are shown, inner vacuum members may also be utilized (see Figure 14).

圖4繪示真空構件56及玻璃基板50的細節圖。真空構件56可施用足以抑制玻璃基板50的邊緣48在斜切處理期間移動（水平及垂直）的真空吸力。如本文中所使用的，「真空吸力」指的是真空構件56之所有真空開口的累積區域乘以吸入壓力。如可見的，真空吸力可由玻璃基板50之邊緣48附近且與隔離自該邊緣48的真空構件56所施用。真空構件56的此位置形成具有懸伸距離D_OH 之玻璃基板50的懸伸區域60，該懸伸距離以垂直於邊緣48的方向（或饋送方向）測量自懸伸開始之真空構件56的外緣62至邊緣48。在某些實施例中，懸伸距離D_OH 可不小於約6 mm，例如不小於約10 mm、例如不小於約15 mm，例如不小於約20 mm。在某些實施例中，懸伸距離D_OH 可在約5 mm及約30 mm之間。FIG. 4 is a detailed view of the vacuum member 56 and the glass substrate 50 . The vacuum member 56 may apply vacuum suction sufficient to inhibit movement (horizontal and vertical) of the edge 48 of the glass substrate 50 during the beveling process. As used herein, "vacuum suction" refers to the cumulative area of all vacuum openings of vacuum member 56 multiplied by suction pressure. As can be seen, vacuum suction may be applied by vacuum member 56 near and isolated from edge 48 of glass substrate 50 . This location of the vacuum member 56 forms an overhang region 60 of the glass substrate 50 with an overhang distance _DOH measured outside the vacuum member 56 from which the overhang begins in a direction (or feed direction) perpendicular to the edge 48. edge 62 to edge 48. In certain embodiments, the overhang distance D _OH may be not less than about 6 mm, such as not less than about 10 mm, such as not less than about 15 mm, such as not less than about 20 mm. In certain embodiments, the overhang distance _DOH may be between about 5 mm and about 30 mm.

如以下將描述的，真空構件56被提供為具有真空開口66的陣列64，其中陣列64的一或更多個區域可具有整齊的、規律的或均勻的真空開口66的分佈（例如列及/或行）。真空開口66之陣列64的如此佈置可在斜切或其他邊緣加工處理期間針對自由懸掛邊緣48產生相對扁平的玻璃基板50的邊緣48，這可針對水平定向的玻璃基板50（圖1）改良第一斜面-表面介面26及第二斜面-表面介面28之間的對稱性。例如，圖5繪示不同懸伸距離及壓力值處之具有0.5 mm及0.3 mm厚度之玻璃基板的邊緣扁平度。如可見的，可達成玻璃邊緣之最小化的垂直位移，例如在玻璃基板長度的至少一部分、大部分或所有部分上小於約0.1 mm。As will be described below, the vacuum members 56 are provided as an array 64 having vacuum openings 66, wherein one or more regions of the array 64 may have a regular, regular, or uniform distribution of vacuum openings 66 (eg, columns and/or or line). Such arrangement of the array 64 of vacuum openings 66 may result in a relatively flat edge 48 of the glass substrate 50 for free hanging edges 48 during chamfering or other edge processing processes, which may improve the first step for a horizontally oriented glass substrate 50 (FIG. 1). Symmetry between a bevel-surface interface 26 and a second bevel-surface interface 28 . For example, Figure 5 shows the edge flatness of glass substrates with thicknesses of 0.5 mm and 0.3 mm at different overhang distances and pressure values. As can be seen, minimal vertical displacement of the glass edge can be achieved, eg, less than about 0.1 mm over at least a portion, most or all of the length of the glass substrate.

參照圖6，真空構件56被單獨繪示，且包括提供壓力腔室及真空開口66之陣列64的真空主體70，該壓力腔室位於該真空主體70中。真空開口66與通道67連通（圖8）且與位於真空主體70內的壓力腔室連通，該等通道67延伸自真空構件56的支撐面72。簡要參照圖7及8，在某些實施例中，支撐面72可由形成為層一層順應材料（例如聚矽氧、橡膠、軟塑膠等等）的順應構件74所提供，該層順應材料適於在無損傷的情況下接觸玻璃基板50及將玻璃基板支撐於其上。順應構件74可包括真空開口66的陣列64，該等真空開口66同由真空主體70所提供的開口陣列76呈現（register）以提供真空開口66及壓力腔室78之間的通道67（圖8）。在其他實施例中，真空主體可包括槽及/或開口，該等槽及/或開口不匹配支撐面72之真空開口66之陣列64，但可從壓力腔室78向該陣列64分佈負壓。由箭頭75所表示的出口可被提供為從壓力腔室78抽取空氣或其他合適的氣體。Referring to FIG. 6 , the vacuum member 56 is shown alone and includes a vacuum body 70 that provides an array 64 of pressure chambers and vacuum openings 66 in which the pressure chambers are located. The vacuum openings 66 communicate with passages 67 extending from the support surface 72 of the vacuum member 56 ( FIG. 8 ) and with pressure chambers located within the vacuum body 70 . Referring briefly to Figures 7 and 8, in certain embodiments, the support surface 72 may be provided by a compliant member 74 formed as a layer of a compliant material (eg, polysiloxane, rubber, soft plastic, etc.) suitable for The glass substrate 50 is contacted and supported without damage. The compliant member 74 may include an array 64 of vacuum openings 66 that register with an array 76 of openings provided by the vacuum body 70 to provide passages 67 between the vacuum openings 66 and the pressure chamber 78 (FIG. 8 ). In other embodiments, the vacuum body may include slots and/or openings that do not match the array 64 of vacuum openings 66 of the support surface 72, but may distribute negative pressure from the pressure chamber 78 to the array 64 . An outlet, represented by arrow 75 , may be provided to draw air or other suitable gas from pressure chamber 78 .

真空構件可為單件式或多件式配置。參照圖9，例如，真空構件81可具有真空主體83，該真空主體83具有單件式的單塊配置。真空主體83可包括提供於其中的壓力腔室85及連接佈置87，該連接佈置87形成為真空主體83的一部分、分離自壓力腔室85且允許真空構件82連接至玻璃輸送系統。入口77及出口79可向壓力腔室85供應正及負壓。圖10繪示多件式配置，其中真空構件91包括由腔室收容構件95及蓋構件97所形成的真空主體93。連接佈置99可提供為用於將真空構件91連接至玻璃輸送系統。The vacuum member may be in a one-piece or multi-piece configuration. 9, for example, the vacuum member 81 may have a vacuum body 83 having a one-piece monolithic configuration. The vacuum body 83 may include a pressure chamber 85 provided therein and a connection arrangement 87 formed as part of the vacuum body 83, separate from the pressure chamber 85 and allowing the vacuum member 82 to connect to the glass delivery system. Inlet 77 and outlet 79 may supply positive and negative pressure to pressure chamber 85 . FIG. 10 shows a multi-piece configuration in which the vacuum member 91 includes a vacuum body 93 formed by a chamber receiving member 95 and a cover member 97 . A connection arrangement 99 may be provided for connecting the vacuum member 91 to the glass delivery system.

再次參照圖6，陣列64的真空開口66可位於列R₁ -R_x 及行C₁ -C_x 兩者中，藉此提供局部化的吸引點。在此示例中，特定列R中的真空開口66具有實質相同的寬度或在此示例中具有實質相同的半徑（例如不大於約5 mm，例如2 mm或更少），且相等地沿特定列R彼此隔開。在其他實施例中，真空開口中的一或更多者可具有一或更多者不同的半徑。作為一個示例，相鄰的真空開口66可相等地跨特定列R隔離約20 mm。在其他實施例中，相鄰真空開口66之間的間隔可小於20 mm，例如約15 mm或約10 mm或甚至更少，例如取決於玻璃基板尺寸、加工操作的類型等等。在圖6的實施例中，真空開口66中心對中心相等地隔開10 mm，如由S₁ 所表示。Referring again to FIG. 6, the vacuum openings 66 of the array 64 may be located in both columns R1- _{Rx and rows C1-Cx} _, _thereby _providing localized points of attraction. In this example, the vacuum openings 66 in a particular row R have substantially the same width, or in this example, have substantially the same radius (eg, no greater than about 5 mm, eg, 2 mm or less), and are equally along the particular row R are separated from each other. In other embodiments, one or more of the vacuum openings may have one or more different radii. As one example, adjacent vacuum openings 66 may be equally separated across a particular column R by about 20 mm. In other embodiments, the separation between adjacent vacuum openings 66 may be less than 20 mm, eg, about 15 mm or about 10 mm or even less, eg, depending on glass substrate size, type of processing operation, and the like. In the embodiment of FIG. 6 , the vacuum openings 66 are equally spaced 10 mm center-to-center, as indicated by S ₁ .

特定行C中的真空開口66具有實質相同的半徑（例如不大於約5 mm，例如約2 mm或更少），且各相等地沿特定行C彼此隔開。在其他實施例中，真空開口中的一或更多者可具有一或更多者不同的半徑。作為一個示例，相鄰的真空開口66可相等地沿特定行C隔開約20 mm。在其他實施例中，相鄰真空開口66沿特定行C之間的間隔可小於20 mm，例如約15 mm或約10 mm或甚至更少，例如取決於玻璃基板的尺寸、加工操作的類型等等。在圖6的實施例中，真空開口66如由S₂ 所表示中心對中心相等地隔開10 mm，形成真空開口的矩形矩陣。The vacuum openings 66 in a particular row C have substantially the same radius (eg, no greater than about 5 mm, eg, about 2 mm or less), and are each equally spaced from each other along the particular row C. In other embodiments, one or more of the vacuum openings may have one or more different radii. As one example, adjacent vacuum openings 66 may be equally spaced along a particular row C by about 20 mm. In other embodiments, the spacing between adjacent vacuum openings 66 along a particular row C may be less than 20 mm, eg, about 15 mm or about 10 mm or even less, eg, depending on the size of the glass substrate, the type of processing operation, etc. Wait. In the embodiment of Figure 6, the vacuum openings 66 are equally spaced 10 mm center-to _- center as indicated by S2, forming a rectangular matrix of vacuum openings.

可使用任何形成局部化吸引點的合適真空開口陣列。在某些實施例中，可提供每100 cm² 具有約25個真空開口至約200個真空開口的陣列，該等真空開口具有不大於約10 mm（例如4 mm或更少）的寬度（或直徑）。在圖6的實施例中，陣列64每100 cm² 具有約100個真空開口66。Any suitable array of vacuum openings that form localized points of attraction can be used. In certain embodiments, arrays may be provided having from about 25 vacuum openings to about ²⁰⁰ vacuum openings per 100 cm, the vacuum openings having a width of no greater than about 10 mm (eg, 4 mm or less) (or diameter). In the embodiment of Figure 6, the array 64 has about 100 vacuum openings 66 per 100 cm< ² >.

圖11-13繪示具有用於真空開口之其他陣列配置的其他真空構件實施例。在圖11的實施例中，真空構件80包括以上針對真空構件56所述的許多特徵。在此示例性實施例中，真空構件80包括位於列R₁ -R_x 及行C₁ -C_x 兩者中之真空開口84的陣列，藉此提供局部化的吸引點。然而，在此實施例中，列間隔S₁ 大於沿行的行間隔S₂ 。圖12繪示真空構件81的另一示例性實施例，其中沿列的列間隔S₁ 大於沿行的行間隔S₂ 。圖13繪示真空構件86的另一實施例，其中沿列的列間隔S₁ 大於沿行的行間隔S₂ 。在此實施例中，列彼此徧移而形成對角行。以下的表格繪示使用0.2 mm厚之玻璃基板之50 KPa的經施加壓力下之由圖5及圖11-13所描繪之真空構件實施例的某些屬性。這些值僅為示例性的，且不意味著是限制性的。

表格：真空構件實施例11-13 illustrate other vacuum member embodiments with other array configurations for vacuum openings. In the embodiment of FIG. 11 , vacuum member 80 includes many of the features described above for vacuum member 56 . In this exemplary embodiment, vacuum member 80 includes an array of vacuum openings 84 in both columns R1- _{Rx and rows C1-Cx} _, _thereby _providing localized points of attraction. However, in this embodiment, the column spacing S ₁ is greater than the row spacing S ₂ along the row. FIG. 12 illustrates another exemplary embodiment of a vacuum member 81 in which the column spacing S ₁ along the columns is greater than the row spacing S ₂ along the rows. FIG. 13 illustrates another embodiment of the vacuum member 86 in which the column spacing S ₁ along the columns is greater than the row spacing S ₂ along the rows. In this embodiment, the columns are shifted over each other to form diagonal rows. The following table depicts certain properties of the vacuum member embodiments depicted in Figures 5 and 11-13 at an applied pressure of 50 KPa using a 0.2 mm thick glass substrate. These values are exemplary only and are not meant to be limiting.

Table: Examples of vacuum components

如可從表格所見，使用有限元素分析（FEA）來決定的最大主應力可在使用期間造成小於20MPa的應力，這可減少玻璃基板邊緣附近或處之玻璃損傷的可能性。最大主應力是玻璃基板上之總張應力效應的指示。As can be seen from the table, the maximum principal stress determined using finite element analysis (FEA) can result in stresses of less than 20 MPa during use, which can reduce the likelihood of glass damage near or at the edge of the glass substrate. The maximum principal stress is an indication of the effect of the total tensile stress on the glass substrate.

參照圖14，示例玻璃支撐系統100（例如用於圖3的加工裝置中）繪示為包括多個真空構件102、104、106及108。作為一示例，真空構件可為上述之真空構件中的任何一者或更多者。如可見的，真空構件102及108是最靠近玻璃基板114的最近邊緣110及112的最外真空構件，而真空構件104及106為離邊緣110及112最遠的最內真空構件。真空構件102、104、106及108可全具有相同的尺度（或不同尺度），且可實質上沿玻璃基板114的整個長度延伸。懸伸區域116及118可提供（如上所述）為用於玻璃加工操作。Referring to FIG. 14 , an example glass support system 100 (eg, used in the processing apparatus of FIG. 3 ) is shown including a plurality of vacuum members 102 , 104 , 106 and 108 . As an example, the vacuum member may be any one or more of the above-described vacuum members. As can be seen, vacuum members 102 and 108 are the outermost vacuum members closest to the closest edges 110 and 112 of the glass substrate 114 , while vacuum members 104 and 106 are the innermost vacuum members farthest from the edges 110 and 112 . The vacuum members 102 , 104 , 106 , and 108 may all have the same dimensions (or different dimensions), and may extend along substantially the entire length of the glass substrate 114 . Overhang regions 116 and 118 may be provided (as described above) for glass processing operations.

參照回圖3，一旦玻璃基板50受玻璃支撐系統46支撐，玻璃基板50及玻璃支撐系統46藉由玻璃輸送系統44向加工裝置40的邊緣輪磨系統120平移。邊緣輪磨系統120可大致包括位於玻璃基板50之相反邊緣48及58處的磨輪組件122及124。在其他實施例中，可只使用單一的磨輪組件，或可存在高達四個磨輪組件或玻璃基板50的每個邊緣48、58、126及128一個磨輪組件。Referring back to FIG. 3 , once the glass substrate 50 is supported by the glass support system 46 , the glass substrate 50 and the glass support system 46 are translated by the glass transport system 44 toward the edge grinding system 120 of the processing apparatus 40 . Edge wheel grinding system 120 may generally include grinding wheel assemblies 122 and 124 located at opposite edges 48 and 58 of glass substrate 50 . In other embodiments, only a single grinding wheel assembly may be used, or there may be up to four grinding wheel assemblies or one grinding wheel assembly for each edge 48 , 58 , 126 and 128 of the glass substrate 50 .

磨輪組件122及124可各包括磨輪127及馬達129，該磨輪127用以輪磨及塑形玻璃基板50的邊緣48及58，該馬達129用以旋轉磨輪127。在某些實施例中，磨輪組件122及124可各更包括驅動機構130，該等驅動機構130可用以朝向及遠離各別邊緣48及58而移動磨輪127。控制器135可提供為控制磨輪組件122及124、玻璃支撐系統46及玻璃輸送系統44的操作。在所繪示的實施例中，磨輪127為成形輪。然而，可使用其他磨輪。簡要參照圖15，成形輪127具有大致圓柱形的形狀，且包括一或更多個凹部132，該等凹部132具有互補於各別邊緣48、58所需之輪廓的輪廓，且充當成形輪127的磨面。在其他實施例中，磨輪127中的一或兩者可包括杯形輪對偶，該杯形輪對偶以它們的平坦面接觸玻璃基板50的邊緣。The grinding wheel assemblies 122 and 124 may each include a grinding wheel 127 for grinding and shaping the edges 48 and 58 of the glass substrate 50 and a motor 129 for rotating the grinding wheel 127 . In certain embodiments, the grinding wheel assemblies 122 and 124 may each further include a drive mechanism 130 that may be used to move the grinding wheel 127 toward and away from the respective edges 48 and 58 . A controller 135 may be provided to control the operation of the grinding wheel assemblies 122 and 124 , the glass support system 46 and the glass delivery system 44 . In the illustrated embodiment, the grinding wheel 127 is a shaping wheel. However, other grinding wheels can be used. Referring briefly to FIG. 15 , the forming wheel 127 has a generally cylindrical shape and includes one or more recesses 132 having contours complementary to the desired contours of the respective edges 48 , 58 and serving as the forming wheel 127 grinding surface. In other embodiments, one or both of the grinding wheels 127 may include a cup-shaped wheel pair that contacts the edge of the glass substrate 50 with their flat surfaces.

再次參照圖3，在玻璃基板50受包括真空構件54及56的玻璃支撐系統46支撐的情況下，玻璃輸送系統44向磨輪組件122及124平移支援系統46及玻璃基板50，其中磨輪127接合玻璃基板50的邊緣48及58。現參照圖16，一表示性圖表繪示由真空開口的規律分佈（例如由圖6的真空構件56所展現的）所提供之減少的邊緣斜面不對稱性。如可見的，真空構件56進一步穩定邊緣48，這在第一斜面-表面介面26（由線140所表示）及第二斜面-表面介面28（由線142所表示）之間維持了相對高度的對稱性。由線144所表示，不對稱因素（FOA）繪示第一斜面-表面介面26及第二斜面-表面介面28間之對稱性上相對小的改變。FOA等於第一斜面-表面介面26及第二斜面-表面介面28及玻璃基板50之厚度之間的斜面差量（斜面寬度上的差異）。FOA越高，第一斜面-表面介面26及第二斜面-表面介面28之間的對稱性越少。Referring again to FIG. 3, with glass substrate 50 supported by glass support system 46 including vacuum members 54 and 56, glass delivery system 44 translates support system 46 and glass substrate 50 toward grinding wheel assemblies 122 and 124, wherein grinding wheel 127 engages the glass Edges 48 and 58 of substrate 50 . Referring now to FIG. 16 , a representative graph depicts the reduced edge bevel asymmetry provided by the regular distribution of vacuum openings, such as exhibited by vacuum member 56 of FIG. 6 . As can be seen, the vacuum member 56 further stabilizes the edge 48, which maintains a relative height between the first bevel-surface interface 26 (represented by line 140 ) and the second bevel-surface interface 28 (represented by line 142 ). symmetry. Represented by line 144 , the factor of asymmetry (FOA) depicts a relatively small change in symmetry between the first bevel-surface interface 26 and the second bevel-surface interface 28 . FOA is equal to the bevel difference (difference in bevel width) between the thicknesses of the first bevel-surface interface 26 and the second bevel-surface interface 28 and the glass substrate 50 . The higher the FOA, the less symmetry between the first bevel-surface interface 26 and the second bevel-surface interface 28 .

仍參照圖16，可見的是，FOA可能傾向於在玻璃基板50的前區域150及背區域152處（亦即於角落處）增加。參照圖17，這可能是因為邊緣48及58的剛性在前導及尾端角落154、156、158及160處相對於整體懸伸邊緣48及58（圖3）而言是相對較低的（例如低到高達百分之60）。進一步地，如由圖18所繪示，抗撓剛度（D）對於小於約0.6 mm的玻璃基板厚度（於約0.25 mm處變得相對扁平）而言傾向於維持相對低的。抗撓剛度（D）是楊氏模量（E）、厚度（t）及泊松比（υ）的函數，且由以下等式所給定：

除了具有轉低剛性以外，玻璃基板50之（圖3）輸入的前導角落154及156可經受冷卻流體（例如水）的直接噴射及磨輪127的突然衝擊，這可在斜切處理期間造成玻璃基板50更大的垂直位移。在某些實例中，靠近角落154、156、158及160的邊緣品質可能由於邊緣斜面不對稱性而低於所期望的品質，這可導致玻璃斷裂及破裂問題，尤其是在處置期間。Still referring to FIG. 16 , it can be seen that the FOA may tend to increase at the front region 150 and the back region 152 of the glass substrate 50 (ie, at the corners). Referring to Figure 17, this may be because the stiffness of

edges

48 and 58 is relatively low at leading and trailing

corners

154, 156, 158 and 160 relative to the overall overhanging edges 48 and 58 (Figure 3) (eg as low as as high as 60 percent). Further, as depicted by Figure 18, the flexural stiffness (D) tends to remain relatively low for glass substrate thicknesses of less than about 0.6 mm (becomes relatively flat at about 0.25 mm). Flexural stiffness (D) is a function of Young's modulus (E), thickness (t), and Poisson's ratio (υ), and is given by the following equation:

In addition to having low stiffness, the leading

corners

154 and 156 of the input of the glass substrate 50 (FIG. 3) may experience direct injection of cooling fluid (eg, water) and sudden impact of the grinding wheel 127, which may cause the glass substrate during the beveling process 50 greater vertical displacement. In some instances, edge quality near

corners

154, 156, 158, and 160 may be lower than desired due to edge bevel asymmetry, which may lead to glass breakage and cracking problems, especially during handling.

參照回圖3，加工裝置40可包括邊緣引導組件170，該等邊緣引導組件170於輪/玻璃介面處向玻璃邊緣48及58提供局部支撐。如可見的，邊緣引導組件170可位於或定位於真空構件54及56外面，相對於玻璃輸送系統44是靜止的，且在真空構件54及56及它們各別的磨輪127之間，以供增加玻璃邊緣48及58的垂直支撐。圖19圖示磨輪127及邊緣引導組件170的示意說明。在此實施例中，接觸及支撐玻璃基板的引導長度L小於或等於磨輪的輪直徑D。與玻璃基板50接觸之邊緣引導組件170及磨輪127之間的距離T可至少部分地基於玻璃厚度來調整，以最小化懸伸距離D_OH ，這可提供增加的邊緣穩定性。Referring back to FIG. 3, the processing apparatus 40 may include edge guide assemblies 170 that provide localized support to the glass edges 48 and 58 at the wheel/glass interface. As can be seen, edge guide assembly 170 may be located or positioned outside vacuum members 54 and 56, stationary relative to glass delivery system 44, and between vacuum members 54 and 56 and their respective grinding wheels 127 for augmentation Vertical support for glass edges 48 and 58. FIG. 19 shows a schematic illustration of the grinding wheel 127 and edge guide assembly 170 . In this embodiment, the guide length L for contacting and supporting the glass substrate is less than or equal to the wheel diameter D of the grinding wheel. The distance T between the edge guide member 170 in contact with the glass substrate 50 and the grinding wheel 127 can be adjusted based at least in part on the glass thickness to minimize the overhang distance D _OH , which can provide increased edge stability.

參照圖20，邊緣引導組件170的示意說明包括下邊緣引導構件172及上邊緣引導構件174。下邊緣引導構件172包括引導面176，該引導面176佈置為接觸玻璃基板50的廣面178。上邊緣引導構件174亦包括面向引導面176的引導面180，該引導面180佈置為接觸玻璃基板50的廣面182。引導面176及180可為固形的，或可形成自移動元件，例如輥、帶等等，如以下將描述的。引導面176及180可形成自用於接觸及引導玻璃基板50的任何合適材料。邊緣引導組件可進一步包括一或更多個定位致動器184及186（例如氣壓缸），該等定位致動器184及186可在關閉及開啟配置（由虛線所示）之間朝向彼此及遠離彼此移動上邊緣引導構件174及下邊緣引導構件172中的一或兩者，以供在斜切處理期間定位玻璃基板50。在其他實施例中，上邊緣引導構件174及下邊緣引導構件172中的一或兩者可相對於彼此固定到位。Referring to FIG. 20 , a schematic illustration of an edge guide assembly 170 includes a lower edge guide member 172 and an upper edge guide member 174 . The lower edge guide member 172 includes a guide surface 176 arranged to contact the broad surface 178 of the glass substrate 50 . The upper edge guide member 174 also includes a guide surface 180 facing the guide surface 176 arranged to contact the broad surface 182 of the glass substrate 50 . The guide surfaces 176 and 180 may be solid, or may form self-moving elements such as rollers, belts, etc., as will be described below. Guide surfaces 176 and 180 may be formed from any suitable material for contacting and guiding glass substrate 50 . The edge guide assembly may further include one or more positioning actuators 184 and 186 (eg, pneumatic cylinders), which may be oriented toward each other and between closed and open configurations (shown by dashed lines) One or both of the upper edge guide member 174 and the lower edge guide member 172 are moved away from each other for positioning the glass substrate 50 during the beveling process. In other embodiments, one or both of the upper edge guide member 174 and the lower edge guide member 172 may be fixed in place relative to each other.

參照圖21及22，加工裝置200被繪示為包括磨輪組件202，該磨輪組件202包括磨輪204及支撐結構206，該支撐結構206以所繪示的升起的、水平的定向支撐磨輪204。加工裝置200可更包括邊緣引導組件208。邊緣引導組件208可包括下邊緣引導構件210及上邊緣引導構件212。下邊緣引導構件210及上邊緣引導構件212兩者包括輥205、215（205在圖21中而215在圖22中），該等輥205、215形成配置為接觸及引導玻璃基板之邊緣的動態支撐面。在圖21繪示的示例中，邊緣引導組件208圖示為處於開啟配置下，其中上邊緣引導構件212藉由致動器組件214從下邊緣引導構件210回縮。下邊緣引導構件210可被固定到位。在某些實施例中，邊緣引導組件208可至少部分地受支撐磨輪204的支撐結構206支撐。在某些實施例中，邊緣引導組件208的至少一部分包括其本身獨立於支撐結構206的支撐結構。致動器組件214可向較靠近下邊緣引導構件210的延伸位置移動上邊緣引導構件212，以如以上所討論地支撐玻璃基板的邊緣（圖22）。21 and 22, a processing apparatus 200 is shown including a grinding wheel assembly 202 that includes a grinding wheel 204 and a support structure 206 that supports the grinding wheel 204 in the depicted raised, horizontal orientation. The processing apparatus 200 may further include an edge guide assembly 208 . The edge guide assembly 208 may include a lower edge guide member 210 and an upper edge guide member 212 . Both the lower edge guide member 210 and the upper edge guide member 212 include rollers 205, 215 (205 in Figure 21 and 215 in Figure 22) that form a dynamic configuration configured to contact and guide the edge of the glass substrate support surface. In the example depicted in FIG. 21 , the edge guide assembly 208 is shown in an open configuration with the upper edge guide member 212 retracted from the lower edge guide member 210 by the actuator assembly 214 . The lower edge guide member 210 may be secured in place. In certain embodiments, edge guide assembly 208 may be at least partially supported by support structure 206 that supports grinding wheel 204 . In certain embodiments, at least a portion of edge guide assembly 208 includes a support structure that is itself separate from support structure 206 . The actuator assembly 214 can move the upper edge guide member 212 toward an extended position closer to the lower edge guide member 210 to support the edge of the glass substrate as discussed above (FIG. 22).

參照圖23及24，另一加工裝置220包括磨輪組件222，該磨輪組件222包括磨輪224及支撐結構226，該支撐結構226以所繪示的升起的、水平的定向支撐磨輪224。加工裝置220更包括邊緣引導組件228。邊緣引導組件228包括下邊緣引導構件230及上邊緣引導構件232。下邊緣引導構件230及上邊緣引導構件232兩者包括輥235，該等輥235形成配置為接觸及引導玻璃基板236之邊緣234的動態支撐面。在圖23及24繪示的示例中，邊緣引導組件228圖示為處於經關閉或關閉的配置下，其中下邊緣引導構件230藉由致動器組件238朝上邊緣引導構件232延伸。上邊緣引導構件232可被固定到位。23 and 24, another processing apparatus 220 includes a grinding wheel assembly 222 that includes a grinding wheel 224 and a support structure 226 that supports the grinding wheel 224 in the depicted raised, horizontal orientation. The processing device 220 further includes an edge guide assembly 228 . The edge guide assembly 228 includes a lower edge guide member 230 and an upper edge guide member 232 . Both the lower edge guide member 230 and the upper edge guide member 232 include rollers 235 that form a dynamic support surface configured to contact and guide the edge 234 of the glass substrate 236 . In the example depicted in FIGS. 23 and 24 , the edge guide assembly 228 is illustrated in a closed or closed configuration with the lower edge guide member 230 extending toward the upper edge guide member 232 by the actuator assembly 238 . The upper edge guide member 232 may be secured in place.

參照圖25，另一邊緣引導組件250被繪示，且可包括下引導構件252及上引導構件254。在此實施例中，下及上引導構件252及254中的兩者包括帶組件256及258。下引導構件252的帶組件256包括帶260，該帶260具有適於接觸及引導玻璃基板的引導面262。帶260可由端輥264及266以及中間輥268所驅動及支撐，帶260前行於端輥264及266周圍，該等中間輥268可支撐端輥264及266之間的帶260的區段。上引導構件254的帶組件258包括帶269，該帶269具有適於接觸及引導玻璃基板的引導面270。在不使用中間輥的情況下，帶269由端輥272及274所驅動及支撐，帶260前行於該等端輥272及274周圍。雖然邊緣引導組件250繪示具有不同輥佈置的下及上引導構件252及254，它們可具有相同的輥佈置。Referring to FIG. 25 , another edge guide assembly 250 is shown, and may include a lower guide member 252 and an upper guide member 254 . In this embodiment, both of the lower and upper guide members 252 and 254 include strap assemblies 256 and 258 . The belt assembly 256 of the lower guide member 252 includes a belt 260 having a guide surface 262 adapted to contact and guide the glass substrate. Belt 260 may be driven and supported by end rollers 264 and 266, and belt 260 may advance around end rollers 264 and 266, and intermediate rollers 268, which may support sections of belt 260 between end rollers 264 and 266. The belt assembly 258 of the upper guide member 254 includes a belt 269 having a guide surface 270 adapted to contact and guide the glass substrate. Without the use of intermediate rollers, belt 269 is driven and supported by end rollers 272 and 274 around which belt 260 travels. Although edge guide assembly 250 is depicted as having lower and upper guide members 252 and 254 having different roller arrangements, they may have the same roller arrangement.

參照圖26，另一邊緣引導組件280被繪示，且包括下引導構件282及上引導構件284。在此實施例中，下及上引導構件282及284中的兩者可形成為適於接觸玻璃基板之材料的固體棒286及288。下引導構件282及上引導構件284可彼此隔離，形成以饋送方向延伸且經調整尺寸以接收玻璃基板的整個厚度的溝槽290。在某些實施例中，溝槽290可包括導入部分292及導出部分294。導入部分292及導出部分294可寬於其間之溝槽290的其餘部分，以將玻璃基板引導進及出溝槽。Referring to FIG. 26 , another edge guide assembly 280 is shown and includes a lower guide member 282 and an upper guide member 284 . In this embodiment, both of the lower and upper guide members 282 and 284 may be formed as solid rods 286 and 288 of material suitable for contacting the glass substrate. The lower guide member 282 and the upper guide member 284 may be isolated from each other, forming a trench 290 that extends in the feed direction and is sized to receive the entire thickness of the glass substrate. In some embodiments, groove 290 may include lead-in portion 292 and lead-out portion 294 . Lead-in portion 292 and lead-out portion 294 may be wider than the remainder of trench 290 therebetween to guide the glass substrate into and out of the trench.

參照圖27，另一邊緣引導組件300被繪示，且包括下引導構件302及上引導構件304。在此實施例中，上引導構件304形成為適於接觸玻璃基板之材料的固體棒306。下引導構件302具有由輥310所形成的動態引導面308。在其他實施例中，上及/或下引導構件可使用空氣軸承、空氣/壓力軸承或超音波非接觸式軸承來形成。Referring to FIG. 27 , another edge guide assembly 300 is shown and includes a lower guide member 302 and an upper guide member 304 . In this embodiment, the upper guide member 304 is formed as a solid rod 306 of material suitable for contacting the glass substrate. The lower guide member 302 has a dynamic guide surface 308 formed by rollers 310 . In other embodiments, the upper and/or lower guide members may be formed using air bearings, air/pressure bearings, or ultrasonic non-contact bearings.

圖28繪示一表示性圖表，圖示通過使用邊緣引導組件（例如如由圖27之邊緣引導組件300所展現的）所提供之減少的邊緣斜面不對稱性。如可見的，邊緣引導組件300進一步穩定邊緣，這在第一斜面-表面介面（由線312所表示）及第二斜面-表面介面（由線314所表示）之間維持了相對高度的對稱性。由線316所表示，FOA繪示第一斜面-表面介面及第二斜面-表面介面間之對稱性上相對小的改變。FIG. 28 depicts a representative graph illustrating the reduced edge bevel asymmetry provided by the use of an edge guide assembly (eg, as exhibited by the edge guide assembly 300 of FIG. 27 ). As can be seen, edge guide assembly 300 further stabilizes the edge, which maintains a relatively high degree of symmetry between the first bevel-surface interface (represented by line 312 ) and the second bevel-surface interface (represented by line 314 ). . Represented by line 316, FOA depicts a relatively small change in symmetry between the first bevel-surface interface and the second bevel-surface interface.

上述玻璃支撐系統及方法可提供具有規律分隔之局部化吸引點之陣列的真空構件以及可用以在斜切或其他加工處理期間減少玻璃邊緣不對稱性的邊緣引導組件中的一或兩者。可藉由減少玻璃基板的平面外徧斜及將扁平的邊緣呈現至磨輪來完成玻璃邊緣不對稱性上的減少。改良玻璃邊緣對稱性可改良玻璃邊緣強度，這可減少玻璃斷裂或破裂的可能性。The glass support systems and methods described above can provide one or both of a vacuum member having a regularly spaced array of localized attraction points and an edge guide assembly that can be used to reduce glass edge asymmetry during chamfering or other processing. The reduction in glass edge asymmetry can be accomplished by reducing the out-of-plane slope of the glass substrate and presenting a flat edge to the grinding wheel. Improving glass edge symmetry improves glass edge strength, which reduces the likelihood of glass breaking or cracking.

對於本領域中具技藝者而言將是清楚的是，可在不脫離所請標的之精神及範圍的情況下對本文中所述的實施例作出各種更改及變化。因此，意欲者為，本說明書涵蓋本文中所述之各種實施例的更改及變化，若是這樣的更改及變化落於隨附請求項及它們等效物的範圍內的話。It will be apparent to those skilled in the art that various modifications and variations of the embodiments described herein can be made without departing from the spirit and scope of the claims. Therefore, it is intended that this specification covers modifications and variations of the various embodiments described herein, to the extent that such modifications and variations fall within the scope of the appended claims and their equivalents.

10‧‧‧玻璃基板 12‧‧‧基板邊緣 14‧‧‧第一表面 16‧‧‧第二表面 18‧‧‧頂點 20‧‧‧第一斜面 22‧‧‧第二斜面 26‧‧‧第一斜面-表面介面 28‧‧‧第二斜面-表面介面 30‧‧‧厚度 31‧‧‧線 32‧‧‧線 40‧‧‧玻璃邊緣加工裝置 42‧‧‧支撐裝置 44‧‧‧玻璃輸送系統 46‧‧‧玻璃支撐系統 48‧‧‧邊緣 50‧‧‧玻璃基板 52‧‧‧真空系統 54‧‧‧邊緣真空構件 56‧‧‧邊緣真空構件 58‧‧‧邊緣 60‧‧‧懸伸區域 62‧‧‧外緣 64‧‧‧陣列 66‧‧‧真空開口 70‧‧‧真空主體 72‧‧‧支撐面 74‧‧‧順應構件 75‧‧‧出口 74‧‧‧順應構件 76‧‧‧開口陣列 77‧‧‧入口 78‧‧‧壓力腔室 79‧‧‧出口 80‧‧‧真空構件 81‧‧‧真空構件 83‧‧‧真空主體 84‧‧‧真空開口 85‧‧‧壓力腔室 86‧‧‧真空構件 87‧‧‧連接佈置 91‧‧‧真空構件 93‧‧‧真空主體 95‧‧‧腔室收容構件 97‧‧‧蓋構件 99‧‧‧連接佈置 100‧‧‧玻璃支撐系統 102‧‧‧真空構件 104‧‧‧真空構件 106‧‧‧真空構件 108‧‧‧真空構件 110‧‧‧邊緣 112‧‧‧邊緣 114‧‧‧玻璃基板 116‧‧‧懸伸區域 118‧‧‧懸伸區域 120‧‧‧邊緣輪磨系統 122‧‧‧磨輪組件 124‧‧‧磨輪組件 126‧‧‧邊緣 127‧‧‧磨輪 128‧‧‧邊緣 129‧‧‧馬達 130‧‧‧驅動機構 132‧‧‧凹部 135‧‧‧控制器 140‧‧‧線 142‧‧‧線 144‧‧‧線 150‧‧‧前區域 152‧‧‧背區域 154‧‧‧角落 156‧‧‧角落 158‧‧‧角落 160‧‧‧角落 170‧‧‧邊緣引導組件 172‧‧‧下邊緣引導構件 174‧‧‧上邊緣引導構件 176‧‧‧引導面 178‧‧‧廣面 180‧‧‧引導面 182‧‧‧廣面 184‧‧‧定位致動器 186‧‧‧定位致動器 200‧‧‧加工裝置 202‧‧‧磨輪組件 204‧‧‧磨輪 205‧‧‧輥 206‧‧‧支撐結構 208‧‧‧邊緣引導組件 210‧‧‧下邊緣引導構件 212‧‧‧上邊緣引導構件 214‧‧‧致動器組件 215‧‧‧輥 220‧‧‧加工裝置 222‧‧‧磨輪組件 224‧‧‧磨輪 226‧‧‧支撐結構 228‧‧‧邊緣引導組件 230‧‧‧下邊緣引導構件 232‧‧‧上邊緣引導構件 234‧‧‧邊緣 235‧‧‧輥 236‧‧‧玻璃基板 238‧‧‧致動器組件 250‧‧‧邊緣引導組件 252‧‧‧下引導構件 254‧‧‧上引導構件 256‧‧‧帶組件 258‧‧‧帶組件 260‧‧‧帶 262‧‧‧引導面 264‧‧‧端輥 266‧‧‧端輥 268‧‧‧中間輥 269‧‧‧帶 270‧‧‧引導面 272‧‧‧端輥 274‧‧‧端輥 280‧‧‧邊緣引導組件 282‧‧‧下引導構件 284‧‧‧上引導構件 286‧‧‧固體棒 288‧‧‧固體棒 290‧‧‧溝槽 292‧‧‧導入部分 294‧‧‧導出部分 300‧‧‧邊緣引導組件 302‧‧‧下引導構件 304‧‧‧上引導構件 306‧‧‧固體棒 308‧‧‧動態引導面 310‧‧‧輥 312‧‧‧線 314‧‧‧線 316‧‧‧線 C₁‧‧‧行 C_x‧‧‧行 D‧‧‧直徑 L‧‧‧引導長度 R₁‧‧‧列 R_x‧‧‧列 S₁‧‧‧間隔 S₂‧‧‧間隔 T‧‧‧距離 W₁‧‧‧寬度 W₂‧‧‧寬度10‧‧‧Glass substrate 12‧‧‧Substrate edge 14‧‧‧First surface 16‧‧‧Second surface 18‧‧‧Top 20‧‧‧First slope 22‧‧‧Second slope 26‧‧‧First One Bevel-Surface Interface 28‧‧‧Second Bevel-Surface Interface 30‧‧‧Thickness 31‧‧‧Line 32‧‧‧Line 40‧‧‧Glass Edge Processing Device 42‧‧‧Support Device 44‧‧‧Glass Conveying System 46‧‧‧Glass Support System 48‧‧‧Edge 50‧‧‧Glass Substrate 52‧‧‧Vacuum System 54‧‧‧Edge Vacuum Member 56‧‧‧Edge Vacuum Member 58‧‧‧Edge 60‧‧‧Overhang Area 62‧‧‧Outer Rim 64‧‧‧Array 66‧‧‧Vacuum Opening 70‧‧‧Vacuum Body 72‧‧‧Support Surface 74‧‧‧Compliant Member 75‧‧‧Outlet 74‧‧‧Compliant Member 76‧‧ ‧Opening array 77‧‧‧Inlet 78‧‧‧Pressure chamber 79‧‧‧Outlet 80‧‧‧Vacuum member 81‧‧‧Vacuum member 83‧‧‧Vacuum body 84‧‧‧Vacuum opening 85‧‧‧Pressure chamber Chamber 86‧‧‧Vacuum Member 87‧‧‧Connection Arrangement 91‧‧‧Vacuum Member 93‧‧‧Vacuum Body 95‧‧‧Chamber Receiving Member 97‧‧‧Cover Member 99‧‧‧Connection Arrangement 100‧‧‧Glass Support system 102‧‧‧Vacuum member 104‧‧‧Vacuum member 106‧‧‧Vacuum member 108‧‧‧Vacuum member 110‧‧‧Edge 112‧‧‧Edge 114‧‧‧Glass substrate 116‧‧‧Overhang area 118 ‧‧‧Overhang area 120‧‧‧Edge grinding system 122‧‧‧Wheel assembly 124‧‧‧Wheel assembly 126‧‧‧Edge 127‧‧‧Wheel 128‧‧‧Edge 129‧‧‧Motor 130‧‧‧ Drive Mechanism 132‧‧‧Recess 135‧‧‧Controller 140‧‧‧Line 142‧‧‧Line 144‧‧‧Line 150‧‧‧Front Area 152‧‧‧Back Area 154‧‧‧Corner 156‧‧‧Corner 158‧‧‧Corner 160‧‧‧Corner 170‧‧‧Edge guide assembly 172‧‧‧Lower edge guide member 174‧‧‧Upper edge guide member 176‧‧‧Guide surface 178‧‧‧Wide surface 180‧‧‧Guide Surface 182‧‧‧Wide Surface 184‧‧‧Locating Actuator 186‧‧‧Locating Actuator200‧‧‧Processing Device 202‧‧‧Wheel Assembly 204‧‧‧Wheel 205‧‧‧Roller 206‧‧‧Support Structure 208‧‧‧Edge Guide Assembly 210‧‧‧Lower Edge Guide Member 212‧‧‧Upper Edge Guide Member 214‧‧‧Actuator Assembly 215‧‧‧Roller 220‧‧‧Processing Device 222‧‧‧Wheel Assembly 224 ‧‧‧Wheel 226‧‧‧Support structure 228‧‧‧Edge guide assembly 230‧‧‧Lower edge guide member 232‧‧‧Upper edge guide member 234‧‧‧Edge 235‧‧‧Roller 236‧‧‧Glass substrate 238 ‧‧‧Actuator Assembly 250‧‧‧Edge Guide Assembly 252‧‧‧Lower guide member 254‧‧‧Upper guide member 256‧‧‧belt assembly 258‧‧‧belt assembly 260‧‧‧belt 262‧‧‧guide surface 264‧‧‧end roller 266‧‧‧end roller 268 ‧‧‧Intermediate Roller 269‧‧‧Belt 270‧‧‧Guide Surface 272‧‧‧End Roller 274‧‧‧End Roller 280‧‧‧Edge Guide Assembly 282‧‧‧Lower Guide Member 284‧‧‧Upper Guide Member 286 ‧‧‧Solid rod 288‧‧‧Solid rod 290‧‧‧Groove 292‧‧‧Introduction section 294‧‧‧Outlet section 300‧‧‧Edge guide assembly 302‧‧‧Lower guide member 304‧‧‧Upper guide member 306‧‧‧Solid Rod 308‧‧‧Dynamic Guide Surface 310‧‧‧Roller 312‧‧‧Line 314‧‧‧Line 316‧‧‧Line C ₁ ‧‧‧Line C _x ‧‧‧Line D‧‧‧Diameter L‧‧‧Leading length R ₁ ‧‧‧Column R _x ‧‧‧Column S ₁ ‧‧‧Interval S ₂ ‧‧‧Interval T‧‧‧Distance W ₁ ‧‧‧Width W ₂ ‧‧‧Width

在參照隨附繪圖來閱讀以下的本揭示案詳細說明時，本揭示案的這些及其他特徵、態樣及優點被更佳地了解，在該等繪圖中：These and other features, aspects and advantages of the present disclosure are better understood when reading the following detailed description of the disclosure with reference to the accompanying drawings, in which:

圖1繪示玻璃基板的斜切邊緣；FIG. 1 shows a beveled edge of a glass substrate;

圖2繪示一圖表，圖示玻璃邊緣之平面外垂直位移及造成之邊緣斜面不對稱性之間的關係；Figure 2 depicts a graph illustrating the relationship between out-of-plane vertical displacement of a glass edge and the resulting edge bevel asymmetry;

圖3為玻璃加工裝置的示意說明；Figure 3 is a schematic illustration of a glass processing device;

圖4為用於圖3之加工裝置中之真空構件及玻璃基板的細節圖；FIG. 4 is a detailed view of the vacuum member and glass substrate used in the processing apparatus of FIG. 3;

圖5繪示一圖表，圖示玻璃邊緣扁平度；Figure 5 shows a graph illustrating glass edge flatness;

圖6為單獨圖示之圖4之真空構件的頂視圖；Figure 6 is a top view of the vacuum member of Figure 4 shown separately;

圖7繪示示例性真空構件的透視圖；7 depicts a perspective view of an exemplary vacuum member;

圖8繪示圖7之真空構件的截面圖；8 is a cross-sectional view of the vacuum member of FIG. 7;

圖9繪示另一示例性真空構件的截面圖；9 depicts a cross-sectional view of another exemplary vacuum member;

圖10繪示另一示例性真空構件的截面圖；10 depicts a cross-sectional view of another exemplary vacuum member;

圖11繪示另一示例性真空構件的頂視圖；11 depicts a top view of another exemplary vacuum member;

圖12繪示又另一示例性真空構件的頂視圖；12 depicts a top view of yet another exemplary vacuum member;

圖13繪示另一示例性真空構件的頂視圖；13 depicts a top view of another exemplary vacuum member;

圖14為包括多個真空構件之玻璃支撐結構的示意說明；14 is a schematic illustration of a glass support structure including a plurality of vacuum members;

圖15繪示用於圖3之玻璃加工裝置中之磨輪的示意細節圖；Figure 15 shows a schematic detail view of a grinding wheel used in the glass processing apparatus of Figure 3;

圖16為一圖表，繪示通過使用真空開口的規律分佈所提供之減少的邊緣斜面不對稱性；16 is a graph illustrating the reduced edge bevel asymmetry provided by the use of a regular distribution of vacuum openings;

圖17為玻璃剛性對上沿玻璃基板之位置的圖表；Figure 17 is a diagram of the position of the glass rigidity against the upper edge of the glass substrate;

圖18為一圖表，繪示玻璃基板的抗撓剛度對上玻璃基板的厚度；18 is a graph showing the flexural stiffness of a glass substrate versus the thickness of the upper glass substrate;

圖19為邊緣引導組件及磨輪的示意說明；Figure 19 is a schematic illustration of the edge guide assembly and grinding wheel;

圖20為邊緣引導組件的示意說明；Figure 20 is a schematic illustration of an edge guide assembly;

圖21繪示玻璃邊緣加工裝置；Figure 21 shows a glass edge processing device;

圖22繪示圖21之玻璃邊緣加工裝置的另一視圖；FIG. 22 shows another view of the glass edge processing apparatus of FIG. 21;

圖23繪示另一玻璃邊緣加工裝置；Figure 23 illustrates another glass edge processing device;

圖24繪示圖23之玻璃邊緣加工裝置的另一視圖；FIG. 24 shows another view of the glass edge processing apparatus of FIG. 23;

圖25為邊緣引導組件的示意說明；Figure 25 is a schematic illustration of an edge guide assembly;

圖26為邊緣引導組件的另一說明；Figure 26 is another illustration of the edge guide assembly;

圖27為邊緣引導組件的另一說明；及Figure 27 is another illustration of the edge guide assembly; and

圖28繪示一表示性圖表，繪示通過使用邊緣引導組件所提供之減少的邊緣斜面不對稱性。Figure 28 depicts a representative graph illustrating the reduced edge bevel asymmetry provided by the use of edge guide components.

國內寄存資訊 (請依寄存機構、日期、號碼順序註記) 無Domestic storage information (please note in the order of storage institution, date and number) None

國外寄存資訊 (請依寄存國家、機構、日期、號碼順序註記) 無Foreign deposit information (please note in the order of deposit country, institution, date and number) None

(請換頁單獨記載) 無(Please change the page and record it separately) None

40‧‧‧玻璃邊緣加工裝置 40‧‧‧Glass edge processing device

42‧‧‧支撐裝置 42‧‧‧Support

44‧‧‧玻璃輸送系統 44‧‧‧Glass Conveying System

46‧‧‧玻璃支撐系統 46‧‧‧Glass Support System

48‧‧‧邊緣 48‧‧‧Edge

50‧‧‧玻璃基板 50‧‧‧Glass Substrate

52‧‧‧真空系統 52‧‧‧Vacuum System

54‧‧‧邊緣真空構件 54‧‧‧Edge vacuum components

56‧‧‧邊緣真空構件 56‧‧‧Edge vacuum components

58‧‧‧邊緣 58‧‧‧Edge

120‧‧‧邊緣輪磨系統 120‧‧‧Edge grinding system

122‧‧‧磨輪組件 122‧‧‧Wheel assembly

124‧‧‧磨輪組件 124‧‧‧Wheel assembly

126‧‧‧邊緣 126‧‧‧Edge

127‧‧‧磨輪 127‧‧‧Wheel

128‧‧‧邊緣 128‧‧‧Edge

129‧‧‧馬達 129‧‧‧Motor

130‧‧‧驅動機構 130‧‧‧Drive mechanism

135‧‧‧控制器 135‧‧‧Controller

154‧‧‧角落 154‧‧‧ Corner

156‧‧‧角落 156‧‧‧ Corner

158‧‧‧角落 158‧‧‧ Corner

160‧‧‧角落 160‧‧‧ Corner

170‧‧‧邊緣引導組件 170‧‧‧Edge Guide Components

Claims

一種玻璃支撐系統，包括：一真空構件，配置為沿一玻璃基板的一邊緣縱向地以一玻璃饋送方向延伸，該真空構件包括一真空主體，該真空主體包括一壓力腔室及一支撐面，該壓力腔室位於該真空主體中，該支撐面包括一真空開口陣列，該真空開口陣列延伸通過該支撐面且與該壓力腔室連通；一邊緣引導組件，該邊緣引導組件包括一上邊緣引導構件及一下邊緣引導構件，該下邊緣引導構件隔離自該上邊緣引導構件以提供一路徑，該玻璃基板可前行通過該路徑，其中該上邊緣引導構件或該下邊緣引導構件中的至少一者包括輥，該等輥形成配置為接觸該玻璃基板的一動態支撐面；及其中該真空開口陣列佈置於多個、並排的列中，且沿該多個列中的各者以該等真空開口間之實質均勻的間隔佈置，且該真空開口陣列具有至少每100cm²的支撐面區域25個開口的一開口密度。 A glass support system includes: a vacuum member configured to extend longitudinally in a glass feed direction along an edge of a glass substrate, the vacuum member including a vacuum body including a pressure chamber and a support surface, The pressure chamber is located in the vacuum body, the support surface includes an array of vacuum openings extending through the support surface and in communication with the pressure chamber, and an edge guide assembly including an upper edge guide member and a lower edge guide member isolated from the upper edge guide member to provide a path through which the glass substrate can advance, wherein at least one of the upper edge guide member or the lower edge guide member One includes rollers that form a dynamic support surface configured to contact the glass substrate; and wherein the array of vacuum openings are arranged in multiple, side-by-side rows, and the vacuums are applied along each of the multiple rows with the vacuum The openings are arranged with substantially uniform spacing, and the vacuum opening array has an opening density of at least 25 openings per 100 cm ² of support surface area.

如請求項1所述之玻璃支撐系統，其中該真空開口陣列佈置於多個、並排的行中，該多個行沿該多個行中的各者在該等真空開口之間具有實質均勻的間隔。 The glass support system of claim 1, wherein the array of vacuum openings is arranged in a plurality of, side-by-side rows, the plurality of rows having substantially uniformity between the vacuum openings along each of the plurality of rows interval.

如請求項1或請求項2所述之玻璃支撐系統，其中該上邊緣引導構件或該下邊緣引導構件中的至少一者包括配置為接觸該玻璃基板之一材料的一棒。 The glass support system of claim 1 or claim 2, wherein at least one of the upper edge guide member or the lower edge guide member includes a rod configured to contact a material of the glass substrate.

如請求項1或請求項2所述之玻璃支撐系統，其中該上邊緣引導構件或該下邊緣引導構件中的至少一者包括一帶組件，該帶組件包括一帶，該帶包括配置為接觸該玻璃基板的一引導面。 The glass support system of claim 1 or claim 2, wherein at least one of the upper edge guide member or the lower edge guide member includes a belt assembly including a belt configured to contact the glass a guide surface of the substrate.

一種玻璃邊緣加工裝置，包括：一玻璃輸送系統；及一玻璃支撐系統，由該玻璃輸送系統以一玻璃饋送方向移動，該玻璃支撐系統配置為支撐具有不大於0.7mm之一厚度的一玻璃基板，該玻璃基板包括一大致平坦的表面及正交於該大致平坦的表面的一平面外方向，該玻璃支撐系統包括：一真空構件，配置為縱向地以該玻璃饋送方向且沿該玻璃基板的一邊緣延伸，該真空構件包括一真空主體及一支撐面，該真空主體包括位於其中的一壓力腔室，該支撐面包括一真空開口陣列，該真空開口陣列具有至少每100cm²的支撐面區域25個開口的一開口密度，該真空開口陣列延伸通過該支撐面且與該壓力腔室連通。 A glass edge processing apparatus, comprising: a glass conveying system; and a glass supporting system moved in a glass feeding direction by the glass conveying system, the glass supporting system configured to support a glass substrate having a thickness not greater than 0.7 mm , the glass substrate includes a substantially flat surface and an out-of-plane direction orthogonal to the substantially flat surface, the glass support system includes: a vacuum member configured to be longitudinally in the glass feed direction and along the glass substrate An edge extension, the vacuum member includes a vacuum body including a pressure chamber located therein and a support surface including an array of vacuum openings having a support surface area at least per 100 ^cm2 An opening density of 25 openings, the array of vacuum openings extending through the support surface and communicating with the pressure chamber.

如請求項5所述之玻璃邊緣加工裝置，更包括一邊緣引導組件，該邊緣引導組件包括一上邊緣引導構件及一下邊緣引導構件，該下邊緣引導構件隔離自該上邊緣引導構件以提供一路徑，該玻璃基板可前行通過該路徑。 The glass edge processing apparatus of claim 5, further comprising an edge guide assembly, the edge guide assembly including an upper edge guide member and a lower edge guide member, the lower edge guide member being isolated from the upper edge guide member to provide a A path through which the glass substrate can travel.

如請求項6所述之玻璃邊緣加工裝置，其中該上邊緣引導構件或該下邊緣引導構件中的至少一者包括輥，該等輥形成配置為接觸該玻璃基板的一動態支撐面。 The glass edge processing apparatus of claim 6, wherein at least one of the upper edge guide member or the lower edge guide member includes rollers that form a dynamic support surface configured to contact the glass substrate.

如請求項6所述之玻璃邊緣加工裝置，其中該上邊緣引導構件或該下邊緣引導構件中的至少一者包括配置為接觸該玻璃基板之一材料的一棒。 The glass edge processing apparatus of claim 6, wherein at least one of the upper edge guide member or the lower edge guide member includes a rod configured to contact a material of the glass substrate.

如請求項6所述之玻璃邊緣加工裝置，其中該上邊緣引導構件或該下邊緣引導構件中的至少一者包括一帶組件，該帶組件包括一帶，該帶包括配置為接觸該玻璃基板的一引導面。 The glass edge processing apparatus of claim 6, wherein at least one of the upper edge guide member or the lower edge guide member includes a belt assembly including a belt that includes a belt configured to contact the glass substrate guide surface.

一種加工一玻璃基板之一邊緣的方法，該方法包括以下步驟：將該玻璃基板支撐在一玻璃支撐系統上，該玻璃基板包括一大致平坦的表面及等於或小於0.7mm的厚度及正交於該大致平坦的表面的一平面外方向，該玻璃支撐系統包括：一真空構件，配置為縱向地以該玻璃饋送方向且沿該玻璃基板的一邊緣延伸，該真空構件包括一真空主體，該真空主體包括一壓力腔室及一支撐面，該壓力腔室位於該真空主體中，該支撐面包括一真空開口陣列，該真空開口陣列具有至少每100cm²25個開口的一開口密度，該真空開口陣列延伸通過該支撐面且與該壓力腔室連通；通過該真空開口陣列向該大致平坦的表面施加一負壓；以一玻璃輸送系統將該玻璃基板和該玻璃支撐系統以一玻璃饋送方向向一邊緣輪磨系統平移；及使用該邊緣輪磨系統的一磨輪組件斜切該玻璃基板的該邊緣。 A method of processing an edge of a glass substrate, the method comprising the steps of: supporting the glass substrate on a glass support system, the glass substrate comprising a substantially flat surface and a thickness equal to or less than 0.7 mm and perpendicular to An out-of-plane orientation of the substantially flat surface, the glass support system includes: a vacuum member configured to extend longitudinally in the glass feed direction and along an edge of the glass substrate, the vacuum member including a vacuum body, the vacuum The body includes a pressure chamber and a support surface, the pressure chamber is located in the vacuum body, the support surface includes an array of vacuum openings, the vacuum opening array has an opening density of at least 25 openings per 100cm ² , the vacuum openings array extending through the support surface and in communication with the pressure chamber; applying a negative pressure to the substantially flat surface through the array of vacuum openings; moving the glass substrate and the glass support system in a glass feed direction with a glass delivery system An edge grinding system translates; and chamfering the edge of the glass substrate using a grinding wheel assembly of the edge grinding system.

如請求項10所述之方法，更包括以下步驟：使用一邊緣引導組件來支撐該玻璃基板，該邊緣引導組件包括一上邊緣引導構件及一下邊緣引導構件，該下邊緣引導構件隔離自該上邊緣引導構件以提供一路徑，該玻璃基板可前行通過該路徑。 The method of claim 10, further comprising the step of using an edge guide assembly to support the glass substrate, the edge guide assembly including an upper edge guide member and a lower edge guide member, the lower edge guide member isolated from the upper edge guide member The edge guide member provides a path through which the glass substrate can advance.

如請求項10或請求項11所述之方法，其中該真空開口陣列佈置於多個、並排的行中，該多個行沿該多個行中的各者在該等真空開口之間具有實質均勻的間隔。 The method of claim 10 or claim 11, wherein the array of vacuum openings is arranged in a plurality of, side-by-side rows, the plurality of rows having substantially between the vacuum openings along each of the plurality of rows evenly spaced.

如請求項12所述之方法，其中該真空開口陣列佈置於多個、並排的列中，該多個列沿該多個列中的各者在該等真空開口之間具有實質均勻的間隔。The method of claim 12, wherein the array of vacuum openings is arranged in a plurality of side-by-side columns, the plurality of columns having substantially uniform spacing between the vacuum openings along each of the plurality of columns.