TWI750418B - Display device and manufacturing method thereof - Google Patents

Display device and manufacturing method thereof Download PDF

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Publication number
TWI750418B
TWI750418B TW107136159A TW107136159A TWI750418B TW I750418 B TWI750418 B TW I750418B TW 107136159 A TW107136159 A TW 107136159A TW 107136159 A TW107136159 A TW 107136159A TW I750418 B TWI750418 B TW I750418B
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spacers
substrate
material layer
surface modification
light
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TW107136159A
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Chinese (zh)
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TW202016661A (en
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裴鍇
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友達光電股份有限公司
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Priority to CN201811586703.1A priority patent/CN109521608B/en
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Optical Filters (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

A display device and a manufacturing method thereof are provided. The manufacturing method of display device includes following steps. A plurality of spacers are formed on a first substrate. A photosensitive material layer covering the spacers is formed on the first substrate. An exposure process is performed on the photosensitive material layer by patterned mask, wherein a light for the exposure process is irradiated to the top surface or the bottom surface of each spacers, and the light is irradiated to the photosensitive material layer on the sidewalls of each spacers from the inner portion of each spacers. The photosensitive material layer not irradiated by the light is removed by a development, so as to form a surface modification layer on the top surface and the sidewalls of each spacers. A second substrate is formed on the surface modification layer, wherein one of the first and second substrates includes a pixel array.

Description

顯示器及其製造方法Display and method of manufacturing the same

本發明是有關於一種顯示器及其製造方法，且特別是有關於一種包括感光間隔物的顯示器及其製造方法。 The present invention relates to a display and a method of manufacturing the same, and more particularly, to a display including a photospacer and a method of manufacturing the same.

隨著科技的進步，輕、薄、短、小的平面顯示器(Flat Panel Display,FPD)逐漸取代傳統厚重的陰極映像管顯示器(Cathode Ray Tube,CRT)。舉例來說，已經開發之平面顯示器可包括液晶顯示器(LCD)、有機發光顯示器(OLED)、電泳顯示器(EPD)等。 With the advancement of technology, light, thin, short and small flat panel displays (Flat Panel Display, FPD) gradually replace the traditional thick cathode picture tube display (Cathode Ray Tube, CRT). For example, flat panel displays that have been developed may include liquid crystal displays (LCDs), organic light emitting displays (OLEDs), electrophoretic displays (EPDs), and the like.

一般來說，上述顯示器通常會包括黑色矩陣(black matrix)，以防止畫素之間的漏光現象，並增加色彩的對比性。然而，由於黑色矩陣通常是使用感光材料以黃光微影製程(photolithography)的方式形成，當其高度需達到一定程度時，例如黑色光阻間隔物(black photoresistance spacer,BPS)或者黑色柱間隔物(black column spacer,BCS)，易產生光罩對位不佳或是易剝離的問題，進而造成顯示器的穩定性不佳。 Generally, the above-mentioned displays usually include a black matrix to prevent light leakage between pixels and to increase color contrast. However, since the black matrix is usually formed by photolithography using a photosensitive material, when its height needs to reach a certain level, such as a black photoresist spacer (BPS) or a black column spacer (black column spacer, BCS), it is easy to cause the problem of poor alignment or easy peeling of the mask, which in turn results in poor stability of the display.

本發明提供一種顯示器及其製造方法，其目的之一可具有良好的穩定性。 The present invention provides a display and a manufacturing method thereof, one of the objects of which can have good stability.

本發明之一實施例的顯示器的製造方法包括以下步驟。於第一基板上形成多個間隔物。於第一基板上形成覆蓋間隔物的感光材料層。藉由圖案化罩幕對感光材料層進行曝光製程，其中用於曝光製程中的光線照射至各間隔物的頂面或是底面，並且透過各間隔物使得光線能夠從各間隔物內部照射至各間隔物的側壁上的感光材料層。在對感光材料層進行曝光製程之後，藉由顯影製程來移除未被光線所曝照到的感光材料層，以於各間隔物的頂面和側壁形成表面修飾層。於表面修飾層上覆蓋第二基板，其中第一基板或第二基板包括畫素陣列。 A method for manufacturing a display according to an embodiment of the present invention includes the following steps. A plurality of spacers are formed on the first substrate. A photosensitive material layer covering the spacers is formed on the first substrate. The photosensitive material layer is subjected to an exposure process through a patterned mask, wherein the light used in the exposure process is irradiated to the top surface or the bottom surface of each spacer, and the light can be irradiated from the inside of each spacer to each spacer through each spacer. A layer of photosensitive material on the sidewalls of the spacers. After the exposure process is performed on the photosensitive material layer, the photosensitive material layer not exposed to light is removed by a development process, so as to form a surface modification layer on the top surface and sidewalls of each spacer. A second substrate is covered on the surface modification layer, wherein the first substrate or the second substrate includes a pixel array.

本發明之另一實施例的顯示器的製造方法包括以下步驟。於第一基板上形成多個間隔物。於第一基板上形成覆蓋間隔物的遮光材料層。於第一基板上形成覆蓋遮光材料層和間隔物的感光材料層。藉由圖案化罩幕對感光材料層進行曝光製程和顯影製程，以於各該間隔物上形成表面修飾層，其中表面修飾層形成於覆蓋各間隔物之頂面和側壁的遮光材料層上，且表面修飾層暴露部分遮光材料層。移除表面修飾層所暴露的部分遮光材料層，以形成遮光層，其中遮光層形成於各間隔物和表面修飾層之間，且遮光層覆蓋各間隔物的頂面和側壁且延伸至第一基板和表面修飾層之間。 A method for manufacturing a display according to another embodiment of the present invention includes the following steps. A plurality of spacers are formed on the first substrate. A light-shielding material layer covering the spacers is formed on the first substrate. A photosensitive material layer covering the light-shielding material layer and the spacer is formed on the first substrate. performing an exposure process and a development process on the photosensitive material layer through the patterned mask to form a surface modification layer on each of the spacers, wherein the surface modification layer is formed on the light-shielding material layer covering the top surface and sidewalls of each spacer, And the surface modification layer exposes part of the light-shielding material layer. removing part of the light-shielding material layer exposed by the surface modification layer to form a light-shielding layer, wherein the light-shielding layer is formed between each spacer and the surface modification layer, and the light-shielding layer covers the top surface and sidewall of each spacer and extends to the first between the substrate and the surface modification layer.

本發明之再一實施例的顯示器的製造方法包括以下步驟。於第一基板上形成無機材料層。於無機材料層上形成多個有機間隔物。於無機材料層上形成覆蓋有機間隔物的材料層。進行改質製程(modified process)，使得部分材料層與有機間隔物產生熱交聯反應或氧化還原反應。在進行改質製程之後，藉由顯影製程來移除材料層中未與有機間隔物產生熱交聯反應或氧化還原反應的部分，以於各有機間隔物的頂面和側壁上形成表面修飾層。於表面修飾層上覆蓋第二基板，其中第一基板或第二基板包括畫素陣列。 A method for manufacturing a display according to another embodiment of the present invention includes the following steps. An inorganic material layer is formed on the first substrate. A plurality of organic spacers are formed on the inorganic material layer. A material layer covering the organic spacers is formed on the inorganic material layer. A modified process is performed so that a thermal crosslinking reaction or a redox reaction occurs between a part of the material layer and the organic spacer. After the modification process, the part of the material layer that has not undergone thermal crosslinking reaction or redox reaction with the organic spacers is removed by a developing process, so as to form a surface modification layer on the top surface and sidewall of each organic spacer . A second substrate is covered on the surface modification layer, wherein the first substrate or the second substrate includes a pixel array.

本發明之一實施例的顯示器包括第一基板、多個間隔物、多個表面修飾層以及第二基板。間隔物設置於第一基板上，其中間隔物能夠允許至少部分藍光與至少部分紫外光通過。表面修飾層分別覆蓋各間隔物的頂面和側壁，其中表面修飾層的可見光穿透率小於或等於20%。第二基板覆蓋於表面修飾層上，其中第一基板或第二基板包括畫素陣列。 A display according to an embodiment of the present invention includes a first substrate, a plurality of spacers, a plurality of surface modification layers, and a second substrate. The spacer is disposed on the first substrate, wherein the spacer can allow at least part of blue light and at least part of ultraviolet light to pass through. The surface modification layer covers the top surface and the side wall of each spacer respectively, wherein the visible light transmittance of the surface modification layer is less than or equal to 20%. The second substrate covers the surface modification layer, wherein the first substrate or the second substrate includes a pixel array.

本發明之另一實施例的顯示器包括第一基板、多個間隔物、多個表面修飾層、多個遮光層以及第二基板。間隔物設置於第一基板上，其中間隔物能夠允許至少部分藍光與至少部分紫外光通過。表面修飾層分別覆蓋各間隔物的頂面和側壁。遮光層分別設置於間隔物和表面修飾層之間，其中遮光層覆蓋各間隔物的頂面和側壁且延伸至第一基板和表面修飾層之間。第二基板覆蓋於表面修飾層上，其中第一基板或第二基板包括畫素陣列。 A display of another embodiment of the present invention includes a first substrate, a plurality of spacers, a plurality of surface modification layers, a plurality of light shielding layers, and a second substrate. The spacer is disposed on the first substrate, wherein the spacer can allow at least part of blue light and at least part of ultraviolet light to pass through. The surface modification layer covers the top surface and the sidewall of each spacer, respectively. The light shielding layers are respectively disposed between the spacers and the surface modification layers, wherein the light shielding layers cover the top surfaces and sidewalls of each spacer and extend between the first substrate and the surface modification layers. The second substrate covers the surface modification layer, wherein the first substrate or the second substrate includes a pixel array.

本發明之再一實施例的顯示器包括第一基板、多個間隔物、多個表面修飾層以及第二基板。間隔物設置於第一基板上，其中間隔物能夠允許至少部分藍光與至少部分紫外光通過。表面修飾層分別覆蓋各間隔物的頂面和側壁，其中間隔物和表面修飾層於疊置的部分具有小於或等於5%之可見光穿透率。第二基板覆蓋於表面修飾層上，其中第一基板或第二基板包括畫素陣列。 A display of yet another embodiment of the present invention includes a first substrate, a plurality of spacers, a plurality of surface modification layers, and a second substrate. The spacer is disposed on the first substrate, wherein the spacer can allow at least part of blue light and at least part of ultraviolet light to pass through. The surface modification layer covers the top surface and the sidewall of each spacer respectively, wherein the spacer and the surface modification layer have a visible light transmittance of less than or equal to 5% at the overlapping portion. The second substrate covers the surface modification layer, wherein the first substrate or the second substrate includes a pixel array.

基於上述，在本發明之至少一實施例所提供的顯示器的製造方法中，由於用於曝光製程中的光線能夠透過各間隔物並從各間隔物內部照射至各間隔物的側壁上的感光材料層，如此可使得光線能夠良好地照射至感光材料層中欲曝光之部分，致使交聯反應完全，以避免後續形成之表面修飾層易產生剝離的問題，進而讓顯示器具有良好的穩定性。 Based on the above, in the method for manufacturing a display provided by at least one embodiment of the present invention, since the light used in the exposure process can pass through each spacer and irradiate from the inside of each spacer to the photosensitive material on the sidewall of each spacer In this way, the light can be well irradiated to the part to be exposed in the photosensitive material layer, so that the cross-linking reaction is complete, so as to avoid the problem of peeling off of the surface modification layer formed later, so that the display has good stability.

在本發明之至少一實施例所提供的顯示器的製造方法中，材料層形成於無機材料層上並覆蓋有機間隔物，經改質製程後，部分材料層與有機間隔物產生熱交聯反應或氧化還原反應，如此可使得後續經顯影製程而形成之表面修飾層不易產生剝離的間題，使得顯示器具有良好的穩定性。 In the method for manufacturing a display provided by at least one embodiment of the present invention, the material layer is formed on the inorganic material layer and covers the organic spacer. Redox reaction, so that the surface modification layer formed by the subsequent development process is not easy to peel off, so that the display has good stability.

在本發明之至少一實施例所提供的顯示器及其製造方法中，由於遮光層形成於各間隔物和表面修飾層之間，且遮光層覆蓋各間隔物的頂面和側壁且延伸至第一基板和些表面修飾層之間，如此可避免畫素間產生漏光的現象，使得顯示器具有良好的穩定性。 In the display and the manufacturing method thereof provided by at least one embodiment of the present invention, since the light shielding layer is formed between each spacer and the surface modification layer, and the light shielding layer covers the top surface and sidewall of each spacer and extends to the first Between the substrate and some surface modification layers, the phenomenon of light leakage between pixels can be avoided, so that the display has good stability.

在本發明之至少一實施例所提供的顯示器中，表面修飾層分別覆蓋各間隔物的頂面和側壁，其中表面修飾層的可見光穿透率小於或等於20%，如此可避免畫素間產生漏光的現象，使得顯示器具有良好的穩定性。 In the display provided by at least one embodiment of the present invention, the surface modification layer covers the top surface and the sidewall of each spacer respectively, wherein the visible light transmittance of the surface modification layer is less than or equal to 20%, so as to avoid generation between pixels The phenomenon of light leakage makes the display have good stability.

在本發明之至少一實施例所提供的顯示器中，由於表面修飾層分別覆蓋各間隔物的頂面和側壁，其中間隔物和表面修飾層於疊置的部分具有小於或等於5%之可見光穿透率，如此可避免畫素間產生漏光的現象，使得顯示器具有良好的穩定性。 In the display provided by at least one embodiment of the present invention, since the surface modification layer covers the top surface and sidewall of each spacer respectively, the spacer and the surface modification layer in the overlapping portion have a visible light transmission rate of less than or equal to 5% Transmittance, so that the phenomenon of light leakage between pixels can be avoided, so that the display has good stability.

為讓本發明的上述特徵和優點能更明顯易懂，下文特舉實施例，並配合所附圖式作詳細說明如下。 In order to make the above-mentioned features and advantages of the present invention more obvious and easy to understand, the following embodiments are given and described in detail with the accompanying drawings as follows.

100:顯示器 100: Monitor

S1、S11:第一基板 S1, S11: the first substrate

S2:第二基板 S2: Second substrate

SB1、SB2:基材 SB1, SB2: Substrate

PS:間隔物 PS: Spacer

OPS:有機間隔物 OPS: Organic Spacer

CE:色彩轉換層 CE: Color Conversion Layer

AM:對位標記 AM: registration mark

PL:平坦層 PL: flat layer

IOPL:無機材料層 IOPL: inorganic material layer

PM:感光材料層 PM: photosensitive material layer

ML:材料層 ML: Material Layer

MS:圖案化罩幕 MS: Patterned Mask

SML1、SML2、SML3:表面修飾層 SML1, SML2, SML3: Surface modification layers

PX:畫素陣列 PX: pixel array

BM:黑色矩陣 BM: black matrix

LSM:遮光材料層 LSM: light-shielding material layer

LS:遮光層 LS: shading layer

T:高度 T: height

L:光線 L: light

MP:改質製程 MP: Modified Process

P:微粒 P: Particles

圖1A至圖1D為本發明一實施例的顯示器的製造方法的剖面示意圖。 1A to 1D are schematic cross-sectional views of a method for manufacturing a display according to an embodiment of the present invention.

圖2A和圖2B為本發明另一實施例的顯示器的製造方法的剖面示意圖。 2A and 2B are schematic cross-sectional views of a method for manufacturing a display according to another embodiment of the present invention.

圖3A至圖3C為本發明再一實施例的顯示器的製造方法的剖面示意圖。 3A to 3C are schematic cross-sectional views of a method for manufacturing a display according to still another embodiment of the present invention.

圖4A和圖4B為本發明又一實施例的顯示器的製造方法的剖面示意圖。 4A and 4B are schematic cross-sectional views of a method for manufacturing a display according to still another embodiment of the present invention.

圖5為本發明一實施例的顯示器的剖面示意圖。 5 is a schematic cross-sectional view of a display according to an embodiment of the present invention.

以下將參照本實施例之圖式以更全面地闡述本發明。然而，本發明亦可以各種不同的形式體現，而不應限於本文中所述之實施例。在附圖中，為了清楚起見，放大了層、膜、面板、區域等的厚度。在整個說明書中，相同的附圖標記表示相同的元件。應當理解，當諸如層、膜、區域或基板的元件被稱為在另一元件「上」或「連接到」另一元件時，其可以直接在另一元件上或與另一元件連接，或者中間元件可以也存在。相反，當元件被稱為「直接在另一元件上」或「直接連接到」另一元件時，不存在中間元件。如本文所使用的，「連接」可以指物理及/或電性連接。再者，「電性連接」或「耦合」係可為二元件間存在其它元件。 The present invention will be more fully described below with reference to the drawings of this embodiment. However, the present invention may be embodied in various forms and should not be limited to the embodiments described herein. In the drawings, the thickness of layers, films, panels, regions, etc., are exaggerated for clarity. The same reference numerals refer to the same elements throughout the specification. It will be understood that when an element such as a layer, film, region or substrate is referred to as being "on" or "connected to" another element, it can be directly on or connected to the other element, or Intermediate elements may also be present. In contrast, when an element is referred to as being "directly on" or "directly connected to" another element, there are no intervening elements present. As used herein, "connected" may refer to a physical and/or electrical connection. Furthermore, "electrically connected" or "coupled" may refer to the existence of other elements between the two elements.

本文使用的「約」、「近似」、或「實質上」包括所述值和在本領域普通技術人員確定的特定值的可接受的偏差範圍內的平均值，考慮到所討論的測量和與測量相關的誤差的特定數量(即，測量系統的限制)。例如，「約」可以表示在所述值的一個或多個標準偏差內，或±30%、±20%、±10%、±5%內。再者，本文使用的「約」、「近似」或「實質上」可依光學性質、蝕刻性質或其它性質，來選擇較可接受的偏差範圍或標準偏差，而可不用一個標準偏差適用全部性質。 As used herein, "about", "approximately", or "substantially" includes the stated value and the average value within an acceptable deviation of the particular value as determined by one of ordinary skill in the art, considering the measurement in question and the A specified amount of measurement-related error (ie, a limitation of the measurement system). For example, "about" can mean within one or more standard deviations of the stated value, or within ±30%, ±20%, ±10%, ±5%. Furthermore, as used herein, "about", "approximately" or "substantially" may be used to select a more acceptable range of deviation or standard deviation depending on optical properties, etching properties or other properties, and not one standard deviation may apply to all properties. .

除非另有定義，本文使用的所有術語(包括技術和科學術語)具有與本發明所屬領域的普通技術人員通常理解的相同的含義。將進一步理解的是，諸如在通常使用的字典中定義的那些術語 應當被解釋為具有與它們在相關技術和本發明的上下文中的含義一致的含義，並且將不被解釋為理想化的或過度正式的意義，除非本文中明確地這樣定義。 Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. It will be further understood that terms such as those defined in commonly used dictionaries They should be construed as having meanings that are consistent with their meanings in the context of the related art and the present invention, and are not to be construed in an idealized or overly formal sense unless explicitly defined as such herein.

圖1A至圖1D為本發明一實施例的顯示器的製造方法的剖面示意圖。圖5為本發明一實施例的顯示器的剖面示意圖。 1A to 1D are schematic cross-sectional views of a method for manufacturing a display according to an embodiment of the present invention. 5 is a schematic cross-sectional view of a display according to an embodiment of the present invention.

請參照圖1A，於第一基板S1上形成多個間隔物PS。第一基板S1可為主動陣列基板、色彩轉換基板或其組合。舉例而言，第一基板S1可包括畫素陣列、色彩轉換層或其組合。在本實施例中，第一基板S1是以色彩轉換基板為例進行說明，也就是說，第一基板S1可包括至少一個色彩轉換層CE。如圖1A所示，第一基板S1可包括基材SB1和形成於基材SB1上的多個色彩轉換層CE。基材SB1可包括玻璃基材、石英基材、有機聚合物基材或其組合。色彩轉換層CE可為彩色濾光層、波長轉換層或其組合。彩色濾光層例如為紅色色阻、綠色色阻、藍色色阻或其組合。波長轉換層例如為紅色螢光材料、紅色磷光材料、紅色量子點材料、綠色螢光材料、綠色磷光材料、綠色量子點材料、藍色螢光材料、藍色磷光材料、藍色量子點材料或其組合。然不限於此，可視實際需求調整。在一些實施例中，色彩轉換層CE可設置於相鄰的兩個間隔物PS之間。 Referring to FIG. 1A , a plurality of spacers PS are formed on the first substrate S1 . The first substrate S1 may be an active array substrate, a color conversion substrate, or a combination thereof. For example, the first substrate S1 may include a pixel array, a color conversion layer, or a combination thereof. In this embodiment, the first substrate S1 is described by taking a color conversion substrate as an example, that is, the first substrate S1 may include at least one color conversion layer CE. As shown in FIG. 1A , the first substrate S1 may include a substrate SB1 and a plurality of color conversion layers CE formed on the substrate SB1 . The substrate SB1 may include a glass substrate, a quartz substrate, an organic polymer substrate, or a combination thereof. The color conversion layer CE may be a color filter layer, a wavelength conversion layer, or a combination thereof. The color filter layer is, for example, a red color resist, a green color resist, a blue color resist, or a combination thereof. The wavelength conversion layer is, for example, a red fluorescent material, a red phosphorescent material, a red quantum dot material, a green fluorescent material, a green phosphorescent material, a green quantum dot material, a blue fluorescent material, a blue phosphorescent material, a blue quantum dot material or its combination. However, it is not limited to this, and can be adjusted according to actual needs. In some embodiments, the color conversion layer CE may be disposed between two adjacent spacers PS.

在一些實施例中，第一基板S1更可包括對位標記(alignment mark)AM，以確保後續曝光製程中所使用之圖案化罩幕MS的對位精準度。舉例而言，間隔物PS中的其中一者可形成 於對位標記AM之上並且與對位標記AM重疊，如此可將重疊於對位標記AM之間隔物PS視為對位標記AM的延伸部分，以改善對位標記AM被位於其上之膜層覆蓋而導致對位精準度降低的問題。 In some embodiments, the first substrate S1 may further include an alignment mark AM to ensure the alignment accuracy of the patterned mask MS used in the subsequent exposure process. For example, one of the spacers PS can be formed On top of the alignment mark AM and overlapping with the alignment mark AM, the spacer PS overlapping the alignment mark AM can be regarded as an extension of the alignment mark AM to improve the film on which the alignment mark AM is located. The problem of reduced alignment accuracy due to layer coverage.

在一些實施例中，第一基板S1更可包括平坦層PL，其覆蓋於色彩轉換層CE和基材SB1之上。平坦層PL的材料可為有機絕緣材料、無機絕緣材料或其組合。舉例而言，有機絕緣材料可為聚醯亞胺(polyimide,PI)、聚醯胺酸(polyamic acid,PAA)、聚醯胺(polyamide,PA)、聚乙烯醇(polyvinyl alcohol,PVA)、聚乙烯醇肉桂酸酯(polyvinyl cinnamate,PVCi)、聚甲基丙烯酸甲酯(poly(methyl methacrylate))或其他適合的光阻材料或其組合。無機絕緣材料可為氧化矽、氮化矽、氮氧化矽、矽氧烷或其組合。 In some embodiments, the first substrate S1 may further include a flat layer PL covering the color conversion layer CE and the substrate SB1. The material of the flat layer PL may be an organic insulating material, an inorganic insulating material or a combination thereof. For example, the organic insulating material can be polyimide (PI), polyamic acid (PAA), polyamide (PA), polyvinyl alcohol (PVA), polyamide Vinyl cinnamate (polyvinyl cinnamate, PVCi), poly(methyl methacrylate) or other suitable photoresist materials or combinations thereof. The inorganic insulating material may be silicon oxide, silicon nitride, silicon oxynitride, siloxane, or a combination thereof.

間隔物PS可經由以下步驟形成：首先，例如以旋塗的方式將間隔物材料層(未繪示)形成於第一基板S1上；之後，藉由微影的方式來圖案化上述的間隔物材料層，以形成間隔物PS，然本發明不以此為限。間隔物PS的材料可為有機光阻材料。間隔物PS的高度T可大於或等於15μm。在一些實施例中，間隔物PS能夠允許至少部分藍光與至少部分紫外光通過。 The spacers PS can be formed through the following steps: first, for example, a spacer material layer (not shown) is formed on the first substrate S1 by spin coating; then, the above-mentioned spacers are patterned by lithography material layer to form the spacer PS, but the present invention is not limited to this. The material of the spacer PS may be an organic photoresist material. The height T of the spacer PS may be greater than or equal to 15 μm. In some embodiments, the spacer PS is capable of allowing at least a portion of the blue light and at least a portion of the ultraviolet light to pass therethrough.

請參照圖1B，於第一基板S1上形成覆蓋間隔物PS的感光材料層PM。感光材料層PM的材料可為有機材料、無機材料或其組合。感光材料層PM的形成方法例如是旋塗法。在一些實施例中，感光材料層PM的可見光穿透率可小於或等於20%。 Referring to FIG. 1B , a photosensitive material layer PM covering the spacers PS is formed on the first substrate S1 . The material of the photosensitive material layer PM may be an organic material, an inorganic material or a combination thereof. The method of forming the photosensitive material layer PM is, for example, a spin coating method. In some embodiments, the visible light transmittance of the photosensitive material layer PM may be less than or equal to 20%.

接著，藉由圖案化罩幕MS對感光材料PM層進行曝光製程，其中用於曝光製程中的光線L照射至各間隔物PS的頂面TS或是底面BS，並且光線L能夠透過間隔物PS，從各間隔物PS的內部照射至位在間隔物PS側壁SW上的感光材料層PM(也就是說，從上視的角度來看，圖案化罩幕MS只暴露出位於各間隔物PS的頂面TS上的感光材料層PM而未暴露出位於各間隔物PS的側壁上的感光材料層PM，如圖1B所示)。如此一來，即便感光材料層PM具有一定的厚度(例如大於間隔物PS的高度T)，光線L仍能夠良好地照射至覆蓋於間隔物PS表面上的感光材料層PM(即感光材料層PM中欲曝光之部分)，致使交聯反應完全，以避免後續形成之表面修飾層易產生剝離(peeling)或是底切(undercut)的問題，進而讓顯示器具有良好的穩定性。 Next, an exposure process is performed on the photosensitive material PM layer through the patterned mask MS, wherein the light L used in the exposure process is irradiated to the top surface TS or the bottom surface BS of each spacer PS, and the light L can pass through the spacer PS , irradiate from the inside of each spacer PS to the photosensitive material layer PM located on the sidewall SW of the spacer PS (that is, from the top view point of view, the patterned mask MS only exposes the photosensitive material layer PM located on the sidewall SW of each spacer PS The photosensitive material layer PM on the top surface TS does not expose the photosensitive material layer PM on the sidewalls of each spacer PS, as shown in FIG. 1B ). In this way, even if the photosensitive material layer PM has a certain thickness (for example, greater than the height T of the spacer PS), the light L can still be well irradiated to the photosensitive material layer PM (that is, the photosensitive material layer PM) covering the surface of the spacer PS. The part to be exposed in the middle), so that the cross-linking reaction is complete, so as to avoid the problem of peeling or undercut of the surface modification layer formed later, so that the display has good stability.

在一些實施例中，在進行曝光製程之前，可選擇性地對感光材料層PM進行前處理製程，其中前處理製程可包括烘烤製程、真空乾燥製程或其組合。舉例而言，可對未曝光之感光材料層PM進行預烘烤(pre-bake)和/或真空乾燥，使得經前處理製程後之感光材料層PM的輪廓與間隔物PS和第一基板S1的表面所構成之輪廓較相似，以使之後曝光製程效果更好。 In some embodiments, before performing the exposure process, a pre-treatment process may be selectively performed on the photosensitive material layer PM, wherein the pre-treatment process may include a baking process, a vacuum drying process or a combination thereof. For example, pre-bake and/or vacuum drying can be performed on the unexposed photosensitive material layer PM, so that the outline of the photosensitive material layer PM after the pretreatment process is consistent with the spacer PS and the first substrate S1 The contours formed by the surface are more similar, so that the effect of the subsequent exposure process is better.

在一些實施例中，可選擇性地於各間隔物PS中形成多個微粒P(僅於圖1D繪示舉例)，使得曝光製程中所採用的光線L能夠更均勻地從各間隔物PS的內部照射至位在間隔物PS側壁SW上的感光材料層PM。 In some embodiments, a plurality of particles P can be selectively formed in each spacer PS (only an example is shown in FIG. 1D ), so that the light L used in the exposure process can be more uniformly emitted from each spacer PS. The interior is irradiated to the photosensitive material layer PM located on the sidewall SW of the spacer PS.

請同時參照圖1B和圖1C，在對感光材料層PM進行曝光製程之後，藉由顯影製程來移除未被光線L所曝照到的感光材料層PM，以於各間隔物PS的頂面TS和側壁SW形成表面修飾層SML1。表面修飾層SML1的可見光穿透率小於或等於20%，如此可防止畫素之間的漏光現象。除此之外，由於前述曝光製程可改善光線L難以傳遞至感光材料層PM中鄰近第一基板S1的部分(即曝光深度較深)，因此，經顯影製程後所形成之表面修飾層SML1與第一基板S1和間隔物PS之間具有良好的附著性，使得表面修飾層SML1不易產生剝離或是底切的問題，進而讓顯示器具有良好的穩定性。也就是說，由於曝光製程中所採用的光線L能夠透過間隔物PS而從間隔物PS的內部照射至位在間隔物PS側壁上的感光材料層PM。如此一來，即便感光材料層PM具有一定的厚度，光線L仍能夠良好地照射至覆蓋於間隔物PS表面上的感光材料層PM，致使交聯反應完全，以避免經顯影製程後續形成的表面修飾層SML1易產生剝離或是底切的問題，進而讓顯示器100具有良好的穩定性。 Please refer to FIG. 1B and FIG. 1C at the same time, after the exposure process is performed on the photosensitive material layer PM, the photosensitive material layer PM that is not exposed to the light L is removed by the development process, so that the top surface of each spacer PS is removed. The TS and the sidewalls SW form a surface modification layer SML1. The visible light transmittance of the surface modification layer SML1 is less than or equal to 20%, which can prevent light leakage between pixels. In addition, since the aforementioned exposure process can improve the difficulty in transmitting the light L to the portion of the photosensitive material layer PM adjacent to the first substrate S1 (ie, the exposure depth is deep), the surface modification layer SML1 formed after the development process and The first substrate S1 and the spacer PS have good adhesion, so that the surface modification layer SML1 is less likely to be peeled off or undercut, so that the display has good stability. That is, since the light L used in the exposure process can pass through the spacer PS and irradiate from the inside of the spacer PS to the photosensitive material layer PM located on the sidewall of the spacer PS. In this way, even if the photosensitive material layer PM has a certain thickness, the light L can still be well irradiated to the photosensitive material layer PM covering the surface of the spacer PS, so that the cross-linking reaction is complete, so as to avoid the surface formed by the development process. The modification layer SML1 is prone to peel off or undercut, so that the display 100 has good stability.

在一些實施例中，在進行顯影製程之後，可選擇性地對表面修飾層SML1進行後烘烤(post-bake)製程，以進一步去除殘存的水氣及溶劑，使得表面修飾層SML1的附著性更佳。 In some embodiments, after the developing process, a post-bake process can be selectively performed on the surface modification layer SML1 to further remove the remaining moisture and solvent, so as to improve the adhesion of the surface modification layer SML1 better.

在一些實施例中，間隔物PS能夠允許至少部分藍光與部分紫外光通過，而間隔物PS和表面修飾層SML1於疊置的部分具有小於或等於5%之可見光穿透率。舉例而言，間隔物PS和表面 修飾層SML1其中之一可為藍色色阻，而間隔物PS和表面修飾層SML1其中之另一可為紅色色阻或黃色色阻。如此一來，可見光在穿過間隔物PS(例如藍色色阻)和表面修飾層SML1(例如紅色或黃色色阻)時會被隔絕，亦即，藍色色阻與紅色色阻(或是藍色色阻與黃色色阻)的組合可具有類似黑色光阻間隔物(BPS)之功效。在其他實施例中，間隔物PS和表面修飾層SML1其中之一可為洋紅色色阻，而間隔物PS和表面修飾層SML1其中之另一可為綠色色阻。如此一來，可見光在穿過間隔物PS(例如洋紅色色阻)和表面修飾層SML1(例如綠色色阻)時會被隔絕，亦即，洋紅色色阻與綠色色阻的搭配可具有黑色光阻間隔物(BPS)之功效。基於上述，藉由間隔物PS和表面修飾層SML1由不同色阻材料的搭配來達到黑色光阻間隔物(BPS)之功效，使得感光材料層PM在材料選用上不需侷限在低可見光穿透率之材料(例如小於或等於20%)，致使在曝光製程中，光線L能夠良好地照射至覆蓋於間隔物PS表面上的感光材料層PM，致使交聯反應完全，以避免經顯影製程後續形成的表面修飾層SML1易產生剝離或是底切的問題，進而讓顯示器100具有良好的穩定性。在本實施例中，間隔物PS可為藍色色阻，而表面修飾層SML1可為紅色色阻。 In some embodiments, the spacer PS can allow at least part of the blue light and part of the ultraviolet light to pass, and the overlapping part of the spacer PS and the surface modification layer SML1 has a visible light transmittance of less than or equal to 5%. For example, the spacer PS and the surface One of the modification layers SML1 can be a blue color resist, and the other of the spacer PS and the surface modification layer SML1 can be a red color resist or a yellow color resist. In this way, visible light is blocked when passing through the spacer PS (eg, blue color resist) and the surface modification layer SML1 (eg, red or yellow color resist), that is, blue color resist and red color resist (or blue color resist) The combination of photoresist and yellow color resist) can have a similar effect as black photoresist spacer (BPS). In other embodiments, one of the spacer PS and the surface modification layer SML1 may be a magenta color resist, and the other of the spacer PS and the surface modification layer SML1 may be a green color resist. In this way, visible light is blocked when passing through the spacer PS (such as the magenta color resist) and the surface modification layer SML1 (such as the green color resist), that is, the combination of the magenta color resist and the green color resist can have black color. The efficacy of photoresist spacers (BPS). Based on the above, the effect of the black photoresist spacer (BPS) is achieved by the combination of the spacer PS and the surface modification layer SML1 with different color resist materials, so that the material selection of the photosensitive material layer PM does not need to be limited to low visible light penetration The ratio of the material (for example, less than or equal to 20%), so that in the exposure process, the light L can be well irradiated to the photosensitive material layer PM covering the surface of the spacer PS, so that the cross-linking reaction is complete, so as to avoid the subsequent development process. The formed surface modification layer SML1 is prone to peel off or undercut, so that the display 100 has good stability. In this embodiment, the spacer PS can be a blue color resist, and the surface modification layer SML1 can be a red color resist.

請參照圖1D，於表面修飾層SML1上覆蓋第二基板S2。第二基板S2可為主動陣列基板、色彩轉換基板或其組合。舉例而言，第二基板S2可包括畫素陣列、色彩轉換層或其組合。在本實施例中，第二基板S2是以主動陣列基板為例進行說明，也就是說， 第二基板S1可包括畫素陣列PX。如圖1D所示，第二基板S2可包括基材SB2和形成於基材SB2上的畫素陣列PX。基材SB2可包括玻璃基材、石英基材、有機聚合物基材或其組合。在另一些實施例中，第一基板S1也可以是主動陣列基板(如圖5所示)。換句話說，第一基板S1或第二基板S2中的其中一者可包括畫素陣列。 Referring to FIG. 1D , the second substrate S2 is covered on the surface modification layer SML1 . The second substrate S2 may be an active array substrate, a color conversion substrate, or a combination thereof. For example, the second substrate S2 may include a pixel array, a color conversion layer, or a combination thereof. In this embodiment, the second substrate S2 is described by taking an active array substrate as an example, that is to say, The second substrate S1 may include a pixel array PX. As shown in FIG. 1D, the second substrate S2 may include a substrate SB2 and a pixel array PX formed on the substrate SB2. The substrate SB2 may comprise a glass substrate, a quartz substrate, an organic polymer substrate, or a combination thereof. In other embodiments, the first substrate S1 may also be an active array substrate (as shown in FIG. 5 ). In other words, one of the first substrate S1 or the second substrate S2 may include a pixel array.

圖2A和圖2B為本發明另一實施例的顯示器的製造方法的剖面示意圖，其中圖2A和圖2B所示的顯示器的製造方法大致相似於圖1B和圖1C所示的顯示器的製造方法，其不同之處在於曝光製程是以色彩轉換層CE作為圖案化罩幕，其餘構件之連接關係、材料及其製程已於前文中進行詳盡地描述，故於下文中不再重複贅述。 2A and 2B are schematic cross-sectional views of a manufacturing method of a display according to another embodiment of the present invention, wherein the manufacturing method of the display shown in FIGS. 2A and 2B is substantially similar to the manufacturing method of the display shown in FIGS. 1B and 1C , The difference is that the exposure process uses the color conversion layer CE as a patterned mask, and the connection relationship, materials and manufacturing processes of other components have been described in detail above, so they will not be repeated below.

請參照圖2A和圖2B，第一基板S11包括多個色彩轉換層CE，各色彩轉換層設CE置於相鄰的兩個間隔物PS之間，且色彩轉換層CE做為曝光製程中所使用的圖案化罩幕。換句話說，在本實施例中，色彩轉換層CE暴露出間隔物PS的底面BS(又可稱為背曝)。如此一來，曝光製程中所採用的光線L能夠透過間隔物PS而從間隔物PS的內部照射至位在間隔物PS側壁SW上的感光材料層PM。如此一來，即便感光材料層PM具有一定的厚度，光線L仍能夠良好地照射至覆蓋於間隔物PS表面上的感光材料層PM，致使交聯反應完全，以避免經顯影製程後所形成之表面修飾層SML1易產生剝離或是底切的問題，進而讓顯示器具有良好的 穩定性。 2A and FIG. 2B, the first substrate S11 includes a plurality of color conversion layers CE, each color conversion layer CE is disposed between two adjacent spacers PS, and the color conversion layer CE is used in the exposure process. The patterned mask used. In other words, in this embodiment, the color conversion layer CE exposes the bottom surface BS of the spacer PS (also referred to as back exposure). In this way, the light L used in the exposure process can pass through the spacer PS and irradiate from the inside of the spacer PS to the photosensitive material layer PM located on the sidewall SW of the spacer PS. In this way, even if the photosensitive material layer PM has a certain thickness, the light L can still be well irradiated to the photosensitive material layer PM covering the surface of the spacer PS, so that the crosslinking reaction is complete, so as to avoid the formation of the photosensitive material layer after the development process. The surface modification layer SML1 is prone to peeling or undercutting, so that the display has a good stability.

除此之外，由於曝光製程是以色彩轉換層CE作為圖案畫罩幕，故可省略一道光罩(例如圖1B所示的圖案化罩幕MS)，以降低顯示器的製造成本。 In addition, since the color conversion layer CE is used as a pattern mask in the exposure process, a mask (eg, the pattern mask MS shown in FIG. 1B ) can be omitted to reduce the manufacturing cost of the display.

在一些實施例中，第一基板S11可選擇性地包括黑色矩陣BM，其中黑色矩陣BM形成於各色彩轉換層CE的側壁且暴露出各間隔物PS的底面BS，如此可使得曝光製程所採用的光線L能夠良好地從間隔物PS的內部照射至位在間隔物PS側壁SW上的感光材料層PM。 In some embodiments, the first substrate S11 can selectively include a black matrix BM, wherein the black matrix BM is formed on the sidewalls of each color conversion layer CE and exposes the bottom surface BS of each spacer PS, so that the exposure process can use The light L can be well irradiated from the inside of the spacer PS to the photosensitive material layer PM located on the sidewall SW of the spacer PS.

圖3A至圖3C為本發明另一實施例的顯示器的製造方法的剖面示意圖，其中圖3A至圖3C所示的顯示器的製造方法大致相似於圖1B和圖1C所示的顯示器的製造方法，其不同之處在於遮光材料層LSM形成於第一基板S1和間隔物PS的表面上之後，才於第一基板S1上形成覆蓋遮光材料層LSM和間隔物PS的感光材料層PM，其餘構件之連接關係、材料及其製程已於前文中進行詳盡地描述，故於下文中不再重複贅述。 3A to 3C are schematic cross-sectional views of a method for manufacturing a display according to another embodiment of the present invention, wherein the method for manufacturing the display shown in FIGS. 3A to 3C is substantially similar to the method for manufacturing the display shown in FIGS. 1B and 1C , The difference is that after the light-shielding material layer LSM is formed on the surfaces of the first substrate S1 and the spacer PS, the photosensitive material layer PM covering the light-shielding material layer LSM and the spacer PS is formed on the first substrate S1, and the rest of the components are formed. The connection relationship, materials, and manufacturing process thereof have been described in detail above, so they will not be repeated hereinafter.

請參照圖3A，首先，於第一基板S1上形成多個間隔物PS。接著，於第一基板S1上形成覆蓋間隔物PS的遮光材料層LSM。遮光材料層LSM的材料可為金屬。在一些實施例中，可採用物理氣相沉積(PVD)的方式形成遮光材料層LSM。之後，於第一基板S1上形成覆蓋遮光材料層LSM和間隔物PS的感光材料層PM。 Referring to FIG. 3A , first, a plurality of spacers PS are formed on the first substrate S1 . Next, a light shielding material layer LSM covering the spacers PS is formed on the first substrate S1. The material of the light shielding material layer LSM may be metal. In some embodiments, the light-shielding material layer LSM may be formed by physical vapor deposition (PVD). After that, a photosensitive material layer PM covering the light shielding material layer LSM and the spacer PS is formed on the first substrate S1.

然後，請同時參照圖3A和圖3B，藉由圖案化罩幕MS對 感光材料層PM進行曝光和顯影製程，以於各間隔物PS上形成表面修飾層SML2，其中表面修飾層SML2形成於覆蓋各間隔物之頂面TS和側壁SW的遮光材料層LSM上。在本實施例中，表面修飾層SML2暴露部分遮光材料層LSM，例如表面修飾層SML2暴露出位於相鄰的兩個間隔物PS之間的遮光材料層LSM的一部分。 Then, referring to FIG. 3A and FIG. 3B at the same time, by patterning the mask MS The photosensitive material layer PM is exposed and developed to form a surface modification layer SML2 on each spacer PS, wherein the surface modification layer SML2 is formed on the light shielding material layer LSM covering the top surface TS and sidewall SW of each spacer. In this embodiment, the surface modification layer SML2 exposes a part of the light shielding material layer LSM, for example, the surface modification layer SML2 exposes a part of the light shielding material layer LSM between two adjacent spacers PS.

在一些實施例中，遮光材料層LSM可選擇性地包括反射層，使得曝光製程所採用的光線L能夠良好地照射至位於遮光材料層LSM表面的感光材料層PM，致使交聯反應完全，以避免經顯影製程後所形成之表面修飾層SML2易產生剝離或是底切的問題，進而讓顯示器具有良好的穩定性。舉例來說，即便光線L照射至感光材料層PM中鄰近遮光材料層LSM的部分(曝光深度較深)的強度小於光線L照射至感光材料層PM表面的強度(較接近曝光源)，但由於遮光材料層LSM包括了反射層的緣故，故感光材料層PM中遠離曝光源的部分仍能夠進行良好的光交聯反應。 In some embodiments, the light-shielding material layer LSM can optionally include a reflective layer, so that the light L used in the exposure process can be well irradiated to the photosensitive material layer PM on the surface of the light-shielding material layer LSM, so that the cross-linking reaction is completed, so as to The problem that the surface modification layer SML2 formed after the developing process is easily peeled off or undercut is avoided, so that the display has good stability. For example, even if the intensity of the light L irradiated to the portion of the photosensitive material layer PM adjacent to the light-shielding material layer LSM (deeper exposure depth) is smaller than the intensity of the light L irradiated to the surface of the photosensitive material layer PM (closer to the exposure source), due to Since the light-shielding material layer LSM includes a reflective layer, a portion of the photosensitive material layer PM far from the exposure source can still perform a good photocrosslinking reaction.

而後，請參照圖3C，移除該表面修飾層SML2所暴露的部分遮光材料層LSM以形成遮光層LS。在本實施例中，遮光層LS形成於各間隔物PS和表面修飾層SML2之間，且遮光層LS覆蓋各間隔物PS的頂面TS和側壁SW且延伸至第一基板S1和表面修飾層SML2之間，如此可進一步避免畫素間產生漏光的現象，使得顯示器具有良好的穩定性。 Then, referring to FIG. 3C , part of the light shielding material layer LSM exposed by the surface modification layer SML2 is removed to form a light shielding layer LS. In this embodiment, the light shielding layer LS is formed between each spacer PS and the surface modification layer SML2, and the light shielding layer LS covers the top surface TS and sidewall SW of each spacer PS and extends to the first substrate S1 and the surface modification layer Between SML2s, the phenomenon of light leakage between pixels can be further avoided, so that the display has good stability.

圖4A和圖4B為本發明另一實施例的顯示器的製造方法的剖面示意圖，其中圖4A和圖4B所示的顯示器的製造方法的概 念大致相似於圖1A至和圖1C所示的顯示器的製造方法，其不同之處在於利用熱交聯或氧化還原反應的方式來形成表面修飾層SML3，其餘構件之連接關係、材料及其製程已於前文中進行詳盡地描述，故於下文中不再重複贅述。 4A and 4B are schematic cross-sectional views of a method for manufacturing a display according to another embodiment of the present invention, wherein the method for manufacturing a display shown in FIGS. 4A and 4B is an overview The concept is roughly similar to the manufacturing method of the display shown in FIG. 1A to FIG. 1C, the difference lies in that the surface modification layer SML3 is formed by means of thermal crosslinking or redox reaction, and the connection relationship, materials and process of other components are It has been described in detail above, so it will not be repeated hereafter.

請參照圖4A，於基材SB1上形成無機材料層IOPL。在一些實施例中，也可於第一基板S1上形成無機材料層IOPL。接著，於無機材料層IOPL上形成多個有機間隔物OPS。之後，於無機材料層IOPL上形成覆蓋有機間隔物OPS的材料層ML。而後，進行改質製程MP，使得部分材料層ML與有機間隔物OPS產生熱交聯反應或氧化還原反應，如此可避免曝光光線的強度隨著曝光深度越大而逐漸降低的問題，使得後續經顯影製程而形成之表面修飾層不易產生剝離的問題，使得顯示器具有良好的穩定性。 Referring to FIG. 4A, an inorganic material layer IOPL is formed on the substrate SB1. In some embodiments, the inorganic material layer IOPL may also be formed on the first substrate S1. Next, a plurality of organic spacers OPS are formed on the inorganic material layer IOPL. After that, a material layer ML covering the organic spacer OPS is formed on the inorganic material layer IOPL. Then, the modification process MP is carried out, so that part of the material layer ML and the organic spacer OPS undergo thermal cross-linking reaction or redox reaction, so as to avoid the problem that the intensity of the exposure light gradually decreases as the exposure depth increases, so that the subsequent The surface modification layer formed by the developing process is not easy to peel off, so that the display has good stability.

在本實施例中，材料層ML為有機材料層，上述的改質製程MP使得部分有機材料層與有機間隔物OPS產生熱交聯反應。應注意的是，上述的熱交聯反應只會發生在有機材料之間的界面(interface)，而不會發生在有機材料和無機材料之間的界面，因此，在進行改質製程MP之後，材料層ML不會與無機材料層IOPL產生交聯。在另一些實施例中，材料層ML為液體層，上述的改質製程MP使得部分液體層與有機間隔物OPS產生氧化還原反應(例如無電電鍍)。應注意的是，上述的氧化還原反應只會發生在液體層和有機材料之間的界面，而不會發生在液體層和無機材料之間的界面，因此，在進行改質製程MP之後，材料層ML不會與無機 材料層IOPL產生氧化還原反應。 In this embodiment, the material layer ML is an organic material layer, and the above-mentioned modification process MP causes a part of the organic material layer and the organic spacer OPS to undergo thermal cross-linking reaction. It should be noted that the above-mentioned thermal crosslinking reaction only occurs at the interface between organic materials, but not at the interface between organic materials and inorganic materials. Therefore, after the modification process MP, The material layer ML is not cross-linked with the inorganic material layer IOPL. In other embodiments, the material layer ML is a liquid layer, and the above-mentioned modification process MP causes a redox reaction between a part of the liquid layer and the organic spacer OPS (eg, electroless plating). It should be noted that the above-mentioned redox reaction only occurs at the interface between the liquid layer and the organic material, but not at the interface between the liquid layer and the inorganic material. Therefore, after the modification process MP, the material Layer ML will not work with inorganic The material layer IOPL produces a redox reaction.

請同時參照圖4A圖和4B，在進行改質製程MP之後，藉由顯影製程來移除材料層ML中未與有機間隔物OPS產生熱交聯反應或氧化還原反應的部分，以於各有機間隔物的頂面和側壁上形成表面修飾層SML3。表面修飾層SML3的可見光穿透率例如小於或等於20%，如此可防止畫素之間的漏光現象。除此之外，由於前述改質製程MP可避免曝光光線的強度隨著曝光深度越大而逐漸降低的問題，因此，經顯影製程後所形成之表面修飾層SML3與第一基板S1和有機間隔物OPS之間具有良好的附著性，使得表面修飾層SML3不易產生剝離或是底切的間題，進而讓顯示器具有良好的穩定性。 Referring to FIGS. 4A and 4B at the same time, after the modification process MP is performed, the portion of the material layer ML that has not undergone thermal crosslinking reaction or redox reaction with the organic spacer OPS is removed by a developing process, so that each organic spacer A surface modification layer SML3 is formed on the top surface and sidewall of the spacer. The visible light transmittance of the surface modification layer SML3 is, for example, less than or equal to 20%, which can prevent light leakage between pixels. In addition, since the aforementioned modification process MP can avoid the problem that the intensity of the exposure light gradually decreases with the increase of the exposure depth, the surface modification layer SML3 formed after the development process is separated from the first substrate S1 and the organic space It has good adhesion between the materials and OPS, so that the surface modification layer SML3 is not easy to be peeled off or undercut, so that the display has good stability.

以下，將藉由圖1D來說明本實施例的顯示器。此外，本實施例的顯示器的製造方法雖然是以上述製造方法為例進行說明，但不以此為限。 Hereinafter, the display of this embodiment will be described with reference to FIG. 1D. In addition, although the manufacturing method of the display of the present embodiment is described by taking the above-mentioned manufacturing method as an example, it is not limited thereto.

請參照圖1D，顯示器100包括第一基板S1、多個間隔物PS、多個表面修飾層SML1以及第二基板S2。間隔物PS設置於第一基板S1上，其中間隔物PS能夠允許至少部分藍光與部分紫外光通過。表面修飾層SML1分別覆蓋各間隔物PS的頂面和側壁，其中表面修飾層SML1的可見光穿透率小於或等於20%。第二基板S2覆蓋於表面修飾層SML1上，其中第一基板S1或第二基板S2包括畫素陣列PX。 Referring to FIG. 1D , the display 100 includes a first substrate S1 , a plurality of spacers PS, a plurality of surface modification layers SML1 and a second substrate S2 . The spacer PS is disposed on the first substrate S1, wherein the spacer PS can allow at least part of blue light and part of ultraviolet light to pass through. The surface modification layer SML1 covers the top surface and sidewall of each spacer PS respectively, wherein the visible light transmittance of the surface modification layer SML1 is less than or equal to 20%. The second substrate S2 covers the surface modification layer SML1, wherein the first substrate S1 or the second substrate S2 includes a pixel array PX.

在上述一實施例的顯示器的製造方法中，由於用於曝光 製程中的光線能夠透過各間隔物並從各間隔物內部照射至各間隔物的側壁上的感光材料層，如此可使得光線能夠良好地照射至感光材料層中欲曝光之部分，致使交聯反應完全，以避免後續形成之表面修飾層易產生剝離的問題，進而讓顯示器具有良好的穩定性。 In the manufacturing method of the display of the above-mentioned embodiment, since the exposure The light in the process can pass through each spacer and irradiate from the inside of each spacer to the photosensitive material layer on the sidewall of each spacer, so that the light can be well irradiated to the part to be exposed in the photosensitive material layer, resulting in a cross-linking reaction. Completely, in order to avoid the problem of easy peeling off of the surface modification layer formed later, so that the display has good stability.

在上述另一實施例的顯示器的製造方法中，材料層形成於無機材料層上並覆蓋有機間隔物，經改質製程後，部分材料層與有機間隔物產生熱交聯反應或氧化還原反應，如此可使得後續經顯影製程而形成之表面修飾層不易產生剝離的問題，使得顯示器具有良好的穩定性。 In the manufacturing method of the display according to the above-mentioned another embodiment, the material layer is formed on the inorganic material layer and covers the organic spacer. In this way, the surface modification layer formed by the subsequent development process is less likely to be peeled off, so that the display has good stability.

在上述又一實施例的顯示器的製造方法中，由於遮光層形成於各間隔物和表面修飾層之間，且遮光層覆蓋各間隔物的頂面和側壁且延伸至第一基板和些表面修飾層之間，如此可避免畫素間產生漏光的現象，使得顯示器具有良好的穩定性。 In the manufacturing method of the display of the above-mentioned still another embodiment, since the light shielding layer is formed between each spacer and the surface modification layer, and the light shielding layer covers the top surface and sidewall of each spacer and extends to the first substrate and some surface modification layers In this way, the phenomenon of light leakage between pixels can be avoided, so that the display has good stability.

在上述一實施例的顯示器中，表面修飾層分別覆蓋各間隔物的頂面和側壁，其中表面修飾層的可見光穿透率小於或等於20%，如此可避免畫素間產生漏光的現象，使得顯示器具有良好的穩定性。 In the display of the above-mentioned embodiment, the surface modification layer covers the top surface and sidewall of each spacer respectively, wherein the visible light transmittance of the surface modification layer is less than or equal to 20%, so that the phenomenon of light leakage between pixels can be avoided, so that the The display has good stability.

在上述另一實施例的顯示器中，由於遮光層形成於各間隔物和表面修飾層之間，且遮光層覆蓋各間隔物的頂面和側壁且延伸至第一基板和些表面修飾層之間，如此可避免畫素間產生漏光的現象，使得顯示器具有良好的穩定性。 In the above-mentioned display of another embodiment, since the light shielding layer is formed between each spacer and the surface modification layer, and the light shielding layer covers the top surface and sidewall of each spacer and extends between the first substrate and some surface modification layers , so that the phenomenon of light leakage between pixels can be avoided, so that the display has good stability.

在上述又一實施例的顯示器中，由於表面修飾層分別覆 蓋各間隔物的頂面和側壁，其中間隔物和表面修飾層於疊置的部分具有小於或等於5%之可見光穿透率，如此可避免畫素間產生漏光的現象，使得顯示器具有良好的穩定性。 In the display of the above-mentioned still another embodiment, since the surface modification layer covers the Cover the top surface and sidewall of each spacer, wherein the spacer and the surface modification layer have a visible light transmittance of less than or equal to 5% in the overlapping part, so that the phenomenon of light leakage between pixels can be avoided, so that the display has a good performance. stability.

雖然本發明已以實施例揭露如上，然其並非用以限定本發明，任何所屬技術領域中具有通常知識者，在不脫離本發明的精神和範圍內，當可作些許的更動與潤飾，故本發明的保護範圍當視後附的申請專利範圍所界定者為準。 Although the present invention has been disclosed above by the embodiments, it is not intended to limit the present invention. Anyone with ordinary knowledge in the technical field can make some changes and modifications without departing from the spirit and scope of the present invention. Therefore, The protection scope of the present invention shall be determined by the scope of the appended patent application.

100:顯示器 100: Monitor

S1:第一基板 S1: the first substrate

S2:第二基板 S2: Second substrate

SB1、SB2:基材 SB1, SB2: Substrate

PS:間隔物 PS: Spacer

CE:色彩轉換層 CE: Color Conversion Layer

PL:平坦層 PL: flat layer

SML1:表面修飾層 SML1: Surface modification layer

PX:畫素陣列 PX: pixel array

P:微粒 P: Particles

Claims (15)

一種顯示器的製造方法，包括：於一第一基板上形成多個間隔物，其中該些間隔物的高度大於或等於15μm；於該第一基板上形成覆蓋該些間隔物的一感光材料層；藉由一圖案化罩幕對該感光材料層進行一曝光製程，其中用於該曝光製程中的一光線照射至各該間隔物的一頂面或是一底面，並且透過各該間隔物使得該光線能夠從各該間隔物內部照射至各該間隔物的一側壁上的該感光材料層，從上視的角度來看，該圖案化罩幕只暴露出位於各該間隔物的該頂面上的該感光材料層而未暴露出位於各該間隔物的該側壁上的該感光材料層；在對該感光材料層進行該曝光製程之後，藉由一顯影製程來移除未被該光線所曝照到的該感光材料層，以於各該間隔物的該頂面和該側壁形成一表面修飾層；以及於該些表面修飾層上覆蓋一第二基板，其中該第一基板或該第二基板包括一畫素陣列。 A method for manufacturing a display, comprising: forming a plurality of spacers on a first substrate, wherein the height of the spacers is greater than or equal to 15 μm; forming a photosensitive material layer covering the spacers on the first substrate; An exposure process is performed on the photosensitive material layer through a patterned mask, wherein a light used in the exposure process is irradiated to a top surface or a bottom surface of each of the spacers, and through each of the spacers, the Light can be irradiated from the interior of each spacer to the photosensitive material layer on one side wall of each spacer. From a top-view point of view, the patterned mask is only exposed on the top surface of each spacer The photosensitive material layer on the sidewall of each spacer is not exposed; after the exposure process is performed on the photosensitive material layer, a developing process is used to remove the photosensitive material layer that is not exposed to the light. The photosensitive material layer is illuminated to form a surface modification layer on the top surface and the sidewall of each of the spacers; and a second substrate is covered on the surface modification layers, wherein the first substrate or the second substrate The substrate includes a pixel array. 如申請專利範圍第1項所述的顯示器的製造方法，更包括：於各該間隔物中形成多個微粒。 The method for manufacturing a display according to claim 1, further comprising: forming a plurality of particles in each of the spacers. 如申請專利範圍第1項所述的顯示器的製造方法，其中該第一基板包括一對位標記，該些間隔物中的其中一者形成於該對位標記之上並且與該對位標記重疊。 The method for manufacturing a display according to claim 1, wherein the first substrate includes a pair of alignment marks, and one of the spacers is formed on and overlapped with the alignment mark . 如申請專利範圍第1項所述的顯示器的製造方法，其中該第一基板包括多個色彩轉換層，各該色彩轉換層設置於該些間隔物中的相鄰二者之間，且該些色彩轉換層做為該曝光製程中所使用的該圖案化罩幕。 The method for manufacturing a display as claimed in claim 1, wherein the first substrate comprises a plurality of color conversion layers, each of the color conversion layers is disposed between adjacent two of the spacers, and the The color conversion layer serves as the patterned mask used in the exposure process. 如申請專利範圍第4項所述的顯示器的製造方法，其中該第一基板包括一黑色矩陣，該黑色矩陣形成於各該色彩轉換層的一側壁且暴露出各該間隔物的該底面。 The method for manufacturing a display as claimed in claim 4, wherein the first substrate comprises a black matrix, and the black matrix is formed on a sidewall of each of the color conversion layers and exposes the bottom surface of each of the spacers. 如申請專利範圍第1項所述的顯示器的製造方法，更包括：在進行該曝光製程之前，對該感光材料層進行一前處理製程，該前處理製程包括烘烤製程、真空乾燥製程或其組合。 The method for manufacturing a display according to item 1 of the claimed scope further comprises: before performing the exposure process, performing a pre-treatment process on the photosensitive material layer, the pre-treatment process including a baking process, a vacuum drying process or the like. combination. 一種顯示器的製造方法，包括：於一第一基板上形成多個間隔物，其中該些間隔物的高度大於或等於15μm；於該第一基板上形成覆蓋該些間隔物的一遮光材料層，其中該遮光材料層包括一反射層；於該第一基板上形成覆蓋該遮光材料層和該些間隔物的一感光材料層；藉由一圖案化罩幕對該感光材料層進行一曝光製程和一顯影製程，以於各該間隔物上形成一表面修飾層，其中該表面修飾層形成於覆蓋各該間隔物之一頂面和一側壁的該遮光材料層上，且該表面修飾層暴露部分該遮光材料層； 移除該表面修飾層所暴露的部分該遮光材料層，以形成一遮光層，其中該遮光層形成於各該間隔物和該表面修飾層之間，且該遮光層覆蓋各該間隔物的該頂面和該側壁且延伸至該第一基板和該些表面修飾層之間。 A method for manufacturing a display, comprising: forming a plurality of spacers on a first substrate, wherein the height of the spacers is greater than or equal to 15 μm; forming a light-shielding material layer covering the spacers on the first substrate, Wherein the light-shielding material layer includes a reflective layer; a photosensitive material layer is formed on the first substrate covering the light-shielding material layer and the spacers; an exposure process and a developing process to form a surface modification layer on each of the spacers, wherein the surface modification layer is formed on the light-shielding material layer covering a top surface and a side wall of each of the spacers, and the surface modification layer exposes a portion the light-shielding material layer; removing part of the light-shielding material layer exposed by the surface modification layer to form a light-shielding layer, wherein the light-shielding layer is formed between each of the spacers and the surface-modified layer, and the light-shielding layer covers the The top surface and the sidewalls extend between the first substrate and the surface modification layers. 一種顯示器的製造方法，包括：於一第一基板上形成一無機材料層；於該無機材料層上形成多個有機間隔物，其中該些有機間隔物的高度大於或等於15μm；於該無機材料層上形成覆蓋該些有機間隔物的一材料層；進行一改質製程，使得部分該材料層與該些有機間隔物產生熱交聯反應或氧化還原反應，該熱交聯反應或該氧化還原反應只會發生在該材料層和該些有機間隔物之間的界面；在進行該改質製程之後，藉由一顯影製程來移除該材料層中未與該些有機間隔物產生熱交聯反應或氧化還原反應的部分，以於各該有機間隔物的一頂面和一側壁上形成一表面修飾層；以及於該些表面修飾層上覆蓋一第二基板，其中該第一基板或該第二基板包括一畫素陣列。 A method for manufacturing a display, comprising: forming an inorganic material layer on a first substrate; forming a plurality of organic spacers on the inorganic material layer, wherein the height of the organic spacers is greater than or equal to 15 μm; A material layer covering the organic spacers is formed on the layer; a modification process is performed, so that a part of the material layer and the organic spacers generate thermal crosslinking reaction or redox reaction, the thermal crosslinking reaction or the redox reaction The reaction only occurs at the interface between the material layer and the organic spacers; after the modification process, a developing process is used to remove the thermal cross-linking of the material layer with the organic spacers part of the reaction or redox reaction to form a surface modification layer on a top surface and a side wall of each of the organic spacers; and cover a second substrate on the surface modification layers, wherein the first substrate or the The second substrate includes a pixel array. 如申請專利範圍第8項所述的顯示器的製造方法，其中該材料層為一有機材料層，該改質製程使得部分該有機材料層與該些有機間隔物產生熱交聯反應。 The method for manufacturing a display as claimed in claim 8, wherein the material layer is an organic material layer, and the modification process causes a thermal crosslinking reaction between a part of the organic material layer and the organic spacers. 如申請專利範圍第8項所述的顯示器的製造方法，其中該材料層為一液體層，使得部分該液體層與該些有機間隔物產生氧化還原反應。 The method for manufacturing a display according to claim 8, wherein the material layer is a liquid layer, so that a part of the liquid layer and the organic spacers undergo a redox reaction. 一種顯示器，包括：一第一基板；多個間隔物，設置於該第一基板上，其中該些間隔物彼此間隔開來且能夠允許至少部分藍光與至少部分紫外光通過，其中該些間隔物的高度大於或等於15μm，且各該間隔物包括形成於其中的多個微粒；多個表面修飾層，分別覆蓋各該間隔物的一頂面和一側壁，其中該些表面修飾層的可見光穿透率小於或等於20%；以及一第二基板，覆蓋於該些表面修飾層上，其中該第一基板或該第二基板包括一畫素陣列。 A display, comprising: a first substrate; a plurality of spacers disposed on the first substrate, wherein the spacers are spaced apart from each other and can allow at least part of blue light and at least part of ultraviolet light to pass, wherein the spacers The height of the spacer is greater than or equal to 15 μm, and each of the spacers includes a plurality of particles formed therein; a plurality of surface modification layers respectively cover a top surface and a side wall of each of the spacers, wherein the visible light of the surface modification layers passes through The transmittance is less than or equal to 20%; and a second substrate covers the surface modification layers, wherein the first substrate or the second substrate includes a pixel array. 如申請專利範圍第11項所述的顯示器，更包括：多個遮光層，分別設置於該些間隔物和該些表面修飾層之間，其中該些遮光層覆蓋各該間隔物的該頂面和該側壁且延伸至該第一基板和該些表面修飾層之間。 The display according to claim 11, further comprising: a plurality of light-shielding layers respectively disposed between the spacers and the surface modification layers, wherein the light-shielding layers cover the top surfaces of the spacers and the sidewall and extending between the first substrate and the surface modification layers. 一種顯示器，包括：一第一基板；多個間隔物，設置於該第一基板上，其中該些間隔物能夠允許至少部分藍光與至少部分紫外光通過，且該些間隔物的高度大於或等於15μm； 多個表面修飾層，分別覆蓋各該些間隔物的一頂面和一側壁；多個遮光層，分別設置於該些間隔物和該些表面修飾層之間，其中該些遮光層覆蓋各該間隔物的該頂面和該側壁且延伸至該第一基板和該些表面修飾層之間，其中各該遮光層包括一反射層；以及一第二基板，覆蓋於該些表面修飾層上，其中該第一基板或該第二基板包括一畫素陣列。 A display, comprising: a first substrate; a plurality of spacers disposed on the first substrate, wherein the spacers can allow at least part of blue light and at least part of ultraviolet light to pass through, and the height of the spacers is greater than or equal to 15μm; a plurality of surface modification layers, respectively covering a top surface and a side wall of each of the spacers; a plurality of light shielding layers, respectively disposed between the spacers and the surface modification layers, wherein the light shielding layers cover each of the The top surface and the sidewall of the spacer extend between the first substrate and the surface modification layers, wherein each of the light shielding layers includes a reflective layer; and a second substrate covers the surface modification layers, Wherein the first substrate or the second substrate includes a pixel array. 一種顯示器，包括：一第一基板；多個間隔物，設置於該第一基板上，其中該些間隔物彼此間隔開來且能夠允許至少部分藍光與至少部分紫外光通過，且該些間隔物的高度大於或等於15μm；多個表面修飾層，分別覆蓋各該間隔物的一頂面和一側壁，其中該些間隔物和該些表面修飾層於疊置的部分具有小於或等於5%之可見光穿透率；以及一第二基板，覆蓋於該些表面修飾層上，其中該第一基板或該第二基板包括一畫素陣列，其中該些間隔物和該些表面修飾層的其中一者為藍色色阻，該些間隔物和該些表面修飾層的其中另一者為紅色色阻或黃色色阻。 A display, comprising: a first substrate; a plurality of spacers disposed on the first substrate, wherein the spacers are spaced apart from each other and can allow at least part of blue light and at least part of ultraviolet light to pass, and the spacers The height of the spacer is greater than or equal to 15 μm; a plurality of surface modification layers respectively cover a top surface and a side wall of each spacer, wherein the spacers and the surface modification layers in the overlapping part have a ratio of less than or equal to 5% Visible light transmittance; and a second substrate covering the surface modification layers, wherein the first substrate or the second substrate includes a pixel array, wherein the spacers and one of the surface modification layers One is a blue color resist, and the other of the spacers and the surface modification layers is a red color resist or a yellow color resist. 一種顯示器，包括：一第一基板； 多個間隔物，設置於該第一基板上，其中該些間隔物彼此間隔開來且能夠允許至少部分藍光與至少部分紫外光通過，且該些間隔物的高度大於或等於15μm；多個表面修飾層，分別覆蓋各該間隔物的一頂面和一側壁，其中該些間隔物和該些表面修飾層於疊置的部分具有小於或等於5%之可見光穿透率；以及一第二基板，覆蓋於該些表面修飾層上，其中該第一基板或該第二基板包括一畫素陣列，其中該些間隔物和該些表面修飾層其中之一為洋紅色色阻，該些間隔物和該些表面修飾層其中之另一為綠色色阻。 A display, comprising: a first substrate; A plurality of spacers, disposed on the first substrate, wherein the spacers are spaced apart from each other and can allow at least part of blue light and at least part of ultraviolet light to pass through, and the height of the spacers is greater than or equal to 15 μm; a plurality of surfaces a modification layer covering a top surface and a side wall of each of the spacers respectively, wherein the spacers and the surface modification layers have a visible light transmittance of less than or equal to 5% at the overlapping part; and a second substrate , covering the surface modification layers, wherein the first substrate or the second substrate includes a pixel array, wherein one of the spacers and the surface modification layers is a magenta color resist, and the spacers and the other one of the surface modification layers is a green color resist.
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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200844494A (en) * 2007-02-02 2008-11-16 Lg Chemical Ltd Color filter and method for manufacturing thereof
CN101498858A (en) * 2009-03-05 2009-08-05 福建华映显示科技有限公司 Production method of colorful optical filtering substrate and LCD panel
TW201214367A (en) * 2010-09-30 2012-04-01 Wei-Chuan Chen Structure of touch panel
CN102902108A (en) * 2012-09-17 2013-01-30 京东方科技集团股份有限公司 Columnar shock insulator, manufacturing method and liquid crystal display panel
TW201725482A (en) * 2016-01-12 2017-07-16 友達光電股份有限公司 Display module having double-sided illumination design
US20180113335A1 (en) * 2016-10-25 2018-04-26 Japan Display Inc. Liquid crystal display device

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4132528B2 (en) * 2000-01-14 2008-08-13 シャープ株式会社 Manufacturing method of liquid crystal display device
JP4081643B2 (en) * 2001-08-01 2008-04-30 株式会社日立製作所 Liquid crystal display
KR20060019819A (en) * 2004-08-30 2006-03-06 삼성전자주식회사 Liquid crystal display device
CN101246285A (en) * 2007-02-14 2008-08-20 展茂光电股份有限公司 Method for producing light sensitive spacer
CN101303522A (en) * 2007-05-10 2008-11-12 比亚迪股份有限公司 Colored filter with spacer, liquid crystal display device and method for making the same
CN101566763A (en) * 2008-04-25 2009-10-28 奇美电子股份有限公司 Manufacture method of liquid crystal display panel and liquid crystal display device
JP2010139555A (en) * 2008-12-09 2010-06-24 Sony Corp Liquid crystal panel and liquid crystal display device
CN101901077B (en) * 2010-07-15 2014-05-21 友达光电股份有限公司 Touch display panel and touch sensing structure thereof
CN202025167U (en) * 2011-03-22 2011-11-02 京东方科技集团股份有限公司 Color film substrate
CN102540581A (en) * 2012-02-06 2012-07-04 深圳市瑞福达液晶显示技术股份有限公司 Liquid crystal box for three-dimensional (3D) liquid crystal spectacles
CN103149745B (en) * 2013-02-20 2016-05-18 北京京东方光电科技有限公司 Chock insulator matter manufacture method on substrate
TWI557772B (en) * 2014-04-10 2016-11-11 友達光電股份有限公司 Device substrate and fabricating method thereof
CN104880883A (en) * 2015-06-12 2015-09-02 武汉华星光电技术有限公司 Blue-phase liquid crystal display panel and production method thereof

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200844494A (en) * 2007-02-02 2008-11-16 Lg Chemical Ltd Color filter and method for manufacturing thereof
CN101498858A (en) * 2009-03-05 2009-08-05 福建华映显示科技有限公司 Production method of colorful optical filtering substrate and LCD panel
TW201214367A (en) * 2010-09-30 2012-04-01 Wei-Chuan Chen Structure of touch panel
CN102902108A (en) * 2012-09-17 2013-01-30 京东方科技集团股份有限公司 Columnar shock insulator, manufacturing method and liquid crystal display panel
TW201725482A (en) * 2016-01-12 2017-07-16 友達光電股份有限公司 Display module having double-sided illumination design
US20180113335A1 (en) * 2016-10-25 2018-04-26 Japan Display Inc. Liquid crystal display device

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