TWI728534B - Multi-station flexible tape exposure device and exposure method - Google Patents
Multi-station flexible tape exposure device and exposure method Download PDFInfo
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- TWI728534B TWI728534B TW108139535A TW108139535A TWI728534B TW I728534 B TWI728534 B TW I728534B TW 108139535 A TW108139535 A TW 108139535A TW 108139535 A TW108139535 A TW 108139535A TW I728534 B TWI728534 B TW I728534B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
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Abstract
本發明提供一種多工位柔性捲帶曝光裝置及曝光方法，工件台具有多個設置柔性捲帶的工位，對曝光區上的柔性捲帶曝光時同步對測量區上的柔性捲帶進行對位測量和/或焦面測量，完成曝光的柔性捲帶自曝光區傳出的同時將完成對位測量和/或焦面測量的柔性捲帶從測量區傳送至曝光區，在傳送的過程中控制單元控制光罩調整單元對光罩進行調整，並在後一個柔性捲帶到達曝光區後控制曝光單元對後一個柔性捲帶進行曝光。本發明採用多工位並行的模式，測量區上的柔性捲帶的對位測量和/或焦面測量與曝光區上的柔性捲帶的曝光同步進行，在工位切換的過程中，完成對光罩的調整，多工位同時對柔性捲帶進行處理，減少曝光步驟的耗時，有利於提高產能。The invention provides a multi-station flexible tape exposure device and an exposure method. The workpiece table has a plurality of stations for setting the flexible tape, and when exposing the flexible tape on the exposure area, the flexible tape on the measurement area is synchronized. Position measurement and/or focal plane measurement, the flexible tape that has completed the exposure is transmitted from the exposure area, and the flexible tape that has completed the alignment measurement and/or focal surface measurement is transported from the measurement area to the exposure area, during the transfer process The control unit controls the mask adjustment unit to adjust the mask, and controls the exposure unit to expose the latter flexible web after the latter flexible web reaches the exposure area. The present invention adopts a multi-station parallel mode. The alignment measurement and/or focal plane measurement of the flexible web on the measurement area is performed synchronously with the exposure of the flexible web on the exposure area. The alignment is completed during the process of station switching. The adjustment of the photomask and the simultaneous processing of flexible tapes in multiple stations can reduce the time-consuming of the exposure step and help increase productivity.
Description
本發明係關於光刻技術領域，特別是關於一種多工位柔性捲帶曝光裝置及曝光方法。The present invention relates to the field of lithography technology, and particularly relates to a multi-station flexible tape exposure device and an exposure method.
由帶狀柔性捲帶製成的薄膜電路基板廣泛應用於移動電話、液晶螢幕以及智能卡等領域中。由帶狀柔性捲帶製成薄膜電路基板的過程通常包括：在帶狀柔性捲帶上塗布光阻的步驟、將光罩上的圖案轉移到光阻上的曝光和顯影步驟、將光阻上的圖案轉移到帶狀柔性捲帶上的蝕刻步驟。帶狀柔性捲帶通常纏繞在捲軸上，在各步驟中，帶狀柔性捲帶從捲軸上卷出至對應的工件台上，進行相應的加工，完成加工後再次捲繞在捲軸上。Thin-film circuit substrates made of ribbon-shaped flexible rolls are widely used in mobile phones, liquid crystal screens, smart cards and other fields. The process of making a thin film circuit substrate from a tape-shaped flexible tape usually includes: the step of coating a photoresist on the tape-shaped flexible tape, the step of exposing and developing the pattern on the photomask to the photoresist, and the step of applying the photoresist to the photoresist. The pattern is transferred to the etching step on the flexible tape. The strip-shaped flexible reel is usually wound on a reel. In each step, the strip-shaped flexible reel is reeled from the reel to the corresponding work table, processed accordingly, and then wound on the reel again after the processing is completed.
本發明的目的在於提供一種多工位柔性捲帶曝光裝置及曝光方法，減少曝光步驟的製程時間，提高產能。The purpose of the present invention is to provide a multi-station flexible tape-reel exposure device and an exposure method, which can reduce the process time of the exposure step and increase the productivity.
為解决上述技術問題，本發明提供一種多工位柔性捲帶曝光裝置，包括：In order to solve the above technical problems, the present invention provides a multi-station flexible tape web exposure device, including:
照明單元，用於射出光束；Illumination unit for emitting light beams;
光罩台，用於承載光罩；Mask stage, used to carry the mask;
物鏡單元，用於將經過所述光罩的光束傳遞至所述柔性捲帶上進行曝光；An objective lens unit for transmitting the light beam passing through the mask to the flexible web for exposure;
工件台，具有多個用於承載所述柔性捲帶的工位；A workpiece table having a plurality of stations for carrying the flexible tape;
測量單元，用於對所述工件台上承載的所述柔性捲帶進行對位測量和/或焦面測量；A measuring unit for performing alignment measurement and/or focal plane measurement of the flexible web carried on the workpiece table;
傳送單元，用於向所述工件台傳送所述柔性捲帶；A conveying unit for conveying the flexible web to the workpiece table;
所述物鏡單元下方的區域定義為曝光區，所述測量單元下方的區域定義為測量區；所述工件台的至少兩個所述工位能夠分別且同時位於所述曝光區和所述測量區，以使得不同所述工位上的不同的所述柔性捲帶分別且同時進行曝光和測量；其中，根據所述柔性捲帶在所述測量區通過所述測量單元獲得的測量結果，使同一所述柔性捲帶移動到所述曝光區後，能夠處於所述物鏡單元的焦深度範圍內和/或能夠實現曝光對準。The area under the objective lens unit is defined as an exposure area, and the area under the measurement unit is defined as a measurement area; at least two of the workstations of the workpiece table can be located in the exposure area and the measurement area separately and at the same time , So that the different flexible webs on different stations are exposed and measured separately and at the same time; wherein, according to the measurement results of the flexible webs obtained by the measurement unit in the measurement area, the same After the flexible web is moved to the exposure area, it can be within the focal depth range of the objective lens unit and/or can achieve exposure alignment.
可選的，當位於所述曝光區的柔性捲帶完成曝光後，位於所述測量區的柔性捲帶能夠移動至所述曝光區，且所述曝光區的柔性捲帶曝光之前，根據所述測量單元的測量結果，使所述曝光區的柔性捲帶在所述物鏡單元的焦深度範圍內和/或實現曝光對準。Optionally, after the flexible web located in the exposure area is exposed, the flexible web located in the measurement area can be moved to the exposure area, and before the flexible web in the exposure area is exposed, according to the The measurement result of the measurement unit makes the flexible web of the exposure zone within the focal depth range of the objective lens unit and/or achieves exposure alignment.
可選的，所述柔性捲帶上設置有第一對位標記；Optionally, a first alignment mark is provided on the flexible web;
所述測量單元包括：第一光源、對位標記單元、用於承載所述對位標記單元的承載台和第一圖像獲取單元，所述對位標記單元上設置有與所述第一對位標記相對應的第二對位標記；The measurement unit includes: a first light source, an alignment mark unit, a bearing platform for carrying the alignment mark unit, and a first image acquisition unit, and the alignment mark unit is provided with a first pair of The second alignment mark corresponding to the position mark;
所述第一光源用於提供對位光線，所述對位光線依次照射至所述第二對位標記和所述第一對位標記並經所述測量區上的所述柔性捲帶反射，反射的所述光線穿過所述對位標記單元至所述第一圖像獲取單元以獲得對位數據。The first light source is used to provide alignment light, which irradiates the second alignment mark and the first alignment mark in sequence and is reflected by the flexible web on the measurement area, The reflected light passes through the alignment mark unit to the first image acquisition unit to obtain alignment data.
可選的，所述測量單元還包括：第二光源、投影鏡組件、探測鏡組件和第二圖像獲取單元，所述第二光源用於提供測量光線，所述測量光線經所述投影鏡組件照射至所述測量區上的所述柔性捲帶表面並被反射，反射的所述光線經所述探測鏡組件後至所述第二圖像獲取單元以獲得焦面測量數據。Optionally, the measurement unit further includes: a second light source, a projection lens assembly, a detection mirror assembly, and a second image acquisition unit. The second light source is used to provide a measurement light that passes through the projection mirror. The component irradiates the surface of the flexible web on the measurement area and is reflected, and the reflected light passes through the probe mirror component to the second image acquisition unit to obtain focal plane measurement data.
可選的，所述多工位柔性捲帶曝光裝置還包括：Optionally, the multi-station flexible tape web exposure device further includes:
光罩調整單元，用於根據所述測量單元的測量結果調整所述光罩以使所述曝光區的柔性捲帶處於所述物鏡單元的焦深度範圍內。The mask adjustment unit is used to adjust the mask according to the measurement result of the measurement unit so that the flexible web of the exposure area is within the focal depth range of the objective lens unit.
可選的，所述多工位柔性捲帶曝光裝置還包括：Optionally, the multi-station flexible tape web exposure device further includes:
控制單元，與所述測量單元、所述光罩調整單元和所述傳送單元分別訊號連接，用於根據所述測量單元的測量結果控制所述光罩調整單元調整所述光罩以使所述曝光區的柔性捲帶在所述物鏡單元的焦深度範圍內。The control unit is signally connected to the measurement unit, the photomask adjustment unit, and the transmission unit, and is used to control the photomask adjustment unit to adjust the photomask according to the measurement result of the measurement unit to make the photomask The flexible roll of the exposure zone is within the focal depth range of the objective lens unit.
可選的，所述光罩調整單元包括第一光罩調整機構和第二光罩調整機構，所述第一光罩調整機構用於根據所述焦面測量數據調整所述光罩沿垂直於所述工件台表面的方向移動，所述第二光罩調整機構用於根據所述對位數據調整所述光罩在平行於所述工件台表面的平面內移動。Optionally, the reticle adjustment unit includes a first reticle adjustment mechanism and a second reticle adjustment mechanism, and the first reticle adjustment mechanism is used to adjust the reticle along the vertical direction according to the focal plane measurement data. The direction of the surface of the workpiece table is moved, and the second mask adjustment mechanism is used for adjusting the movement of the mask in a plane parallel to the surface of the workpiece table according to the alignment data.
可選的，所述第一光罩調整機構包括：第一位移傳感器和至少一個第一調整組件，所述第一調整組件包括第一馬達和螺桿，所述第一馬達用於驅動所述螺桿在垂直於所述工件台表面的方向上移動，從而帶動固定於所述光罩台上的光罩移動，所述第一位移傳感器用於獲取所述光罩台的位移數據。Optionally, the first mask adjustment mechanism includes: a first displacement sensor and at least one first adjustment assembly, the first adjustment assembly includes a first motor and a screw, and the first motor is used to drive the screw Moving in a direction perpendicular to the surface of the workpiece table, thereby driving the photomask fixed on the photomask table to move, and the first displacement sensor is used to obtain the displacement data of the photomask table.
可選的，所述第二光罩調整機構包括：第二位移傳感器和至少兩個第二調整組件，所述第二調整組件包括第二馬達、凸輪和彈性元件，所述第二馬達用於驅動所述凸輪旋轉以使所述彈性元件帶動所述光罩台移動，從而使固定於所述光罩台上的所述光罩在平行於所述工件台表面的平面內移動。Optionally, the second photomask adjustment mechanism includes: a second displacement sensor and at least two second adjustment assemblies, the second adjustment assembly includes a second motor, a cam, and an elastic element, and the second motor is used for The cam is driven to rotate so that the elastic element drives the photomask table to move, so that the photomask fixed on the photomask table moves in a plane parallel to the surface of the workpiece table.
可選的，所述傳送單元包括：開捲滾、第一中間導滾、第二中間導滾和收捲滾，所述控制單元用於控制所述柔性捲帶從所述開捲滾傳出、經所述第一中間導滾導入所述工件台，在所述工件台上傳動後經所述第二中間導滾導入至所述收捲滾。Optionally, the conveying unit includes: an unwinding roll, a first intermediate guide roll, a second intermediate guide roll, and a rewinding roll, and the control unit is used to control the flexible web to pass from the unwinding roll , The first intermediate guide roll is introduced into the work table, and after being driven on the work table, the second intermediate guide roll is introduced to the rewinding roll.
可選的，所述多工位柔性捲帶曝光裝置還包括：Optionally, the multi-station flexible tape web exposure device further includes:
工件台調整單元，用於根據所述測量單元的測量結果調整所述工件台以使所述曝光區的所述柔性捲帶處於所述物鏡單元的焦深度範圍內。The workpiece stage adjustment unit is configured to adjust the workpiece stage according to the measurement result of the measurement unit so that the flexible web of the exposure area is within the focal depth range of the objective lens unit.
可選的，所述多工位柔性捲帶曝光裝置還包括：Optionally, the multi-station flexible tape web exposure device further includes:
控制單元，與所述測量單元、所述工件台調整單元和所述傳送單元訊號連接，所述控制單元用於根據所述測量單元的測量結果控制所述工件台調整單元調整所述工件台使所述曝光區的所述柔性捲帶處於所述物鏡單元的焦深度範圍內。The control unit is signally connected to the measurement unit, the workpiece table adjustment unit, and the transmission unit, and the control unit is used to control the workpiece table adjustment unit to adjust the workpiece table according to the measurement result of the measurement unit The flexible web of the exposure zone is within the focal depth range of the objective lens unit.
可選的，所述工件台調整單元用於根據所述焦面測量數據調整所述工件台沿垂直於所述工件台表面的方向移動，所述工件台調整單元還用於根據所述對位數據調整所述工件台在平行於所述工件台表面的平面內移動。Optionally, the workpiece table adjustment unit is used to adjust the workpiece table to move in a direction perpendicular to the surface of the workpiece table according to the focal plane measurement data, and the workpiece table adjustment unit is also used to adjust the position according to the alignment The data adjusts the movement of the workpiece table in a plane parallel to the surface of the workpiece table.
可選的，所述測量單元、所述光罩台、所述物鏡單元和所述照明單元的數量均為兩個，所述工件台的兩側各設置有一個所述測量單元、一個所述光罩台、一個所述物鏡單元和一個所述照明單元，所述工件台兩側的兩個所述物鏡單元相互正對，所述工件台兩側的兩個所述測量單元相互正對。Optionally, the number of the measurement unit, the mask stage, the objective lens unit, and the illumination unit is two, and both sides of the workpiece stage are provided with one measurement unit and one The mask stage, the objective lens unit and the illumination unit, the two objective lens units on both sides of the workpiece stage are directly opposite to each other, and the two measuring units on both sides of the workpiece stage are directly opposite to each other.
可選的，所述測量單元、所述光罩台、所述物鏡單元、所述照明單元和所述光罩調整單元的數量均為兩個，所述工件台的兩側各設置有一個所述測量單元、一個所述光罩台、一個所述物鏡單元、一個所述照明單元和一個所述光罩調整單元，所述工件台兩側的兩個所述物鏡單元相互正對，所述工件台兩側的兩個所述測量單元相互正對。Optionally, the number of the measuring unit, the photomask stage, the objective lens unit, the illumination unit, and the photomask adjustment unit are all two, and each side of the workpiece stage is provided with a The measuring unit, the photomask stage, the objective lens unit, the illumination unit, and the photomask adjustment unit, the two objective lens units on both sides of the workpiece stage are directly opposite to each other, and the The two measuring units on both sides of the workpiece table are directly opposite to each other.
可選的，所述工件台為框架結構或板狀結構。Optionally, the workpiece table has a frame structure or a plate structure.
可選的，所述工件台為矩形框架並且所述矩形框架的角落處設置有壓板。Optionally, the workpiece table is a rectangular frame and the corners of the rectangular frame are provided with pressing plates.
本發明還提供了一種多工位柔性捲帶曝光方法，照明單元射出的光束依次經過光罩台上承載的光罩和物鏡單元後，照射至工件台上承載的柔性捲帶，對所述柔性捲帶進行曝光；The present invention also provides a multi-station flexible tape exposure method. The light beams emitted by the lighting unit sequentially pass through the mask and objective lens unit carried on the mask stage, and then irradiate the flexible tape carried on the workpiece stage. Reel for exposure;
所述多工位柔性捲帶曝光方法包括如下步驟：The multi-station flexible web exposure method includes the following steps:
對位於測量單元下方的測量區的柔性捲帶進行對位測量和/或焦面測量，獲得對位數據和/或焦面測量數據，同步對位於所述物鏡單元下方的曝光區的柔性捲帶執行曝光；Perform alignment measurement and/or focal plane measurement on the flexible tape in the measurement area below the measurement unit, obtain alignment data and/or focal surface measurement data, and synchronize the flexible tape in the exposure area below the objective lens unit Perform exposure;
位於所述曝光區的柔性捲帶完成曝光後，將位於所述測量區的所述柔性捲帶移動至所述曝光區，且位於所述曝光區的所述柔性捲帶曝光之前，根據所述柔性捲帶通過所述測量單元獲得的測量結果使所述曝光區的所述柔性捲帶在所述物鏡單元的焦深度範圍內和/或實現曝光對準。After the flexible web located in the exposure area is exposed, the flexible web located in the measurement area is moved to the exposure area, and before the flexible web located in the exposure area is exposed, according to the The measurement result of the flexible web obtained by the measurement unit makes the flexible web of the exposure area within the focal depth range of the objective lens unit and/or achieves exposure alignment.
可選的，所述測量區的所述柔性捲帶移動至所述曝光區的過程中，所述工件台固定不動，所述柔性捲帶在所述工件台上傳動。Optionally, when the flexible web in the measurement area moves to the exposure area, the workpiece table is fixed and the flexible web is driven on the workpiece table.
可選的，所述工件台包括第一工位和第二工位，所述第一工位位於所述曝光區，所述第二工位位於所述測量區，所述柔性捲帶包括N個柔性捲帶子單元，N大於等於2，對第i至第N個柔性捲帶子單元的曝光過程包括：Optionally, the workpiece table includes a first station and a second station, the first station is located in the exposure area, the second station is located in the measurement area, and the flexible web includes N There are two flexible tape subunits, N is greater than or equal to 2, and the exposure process of the i-th to Nth flexible tape subunits includes:
對第一工位上的第i個柔性捲帶子單元進行曝光，並同步對所述第二工位上的第i+1個柔性捲帶子單元進行對位測量和/或焦面測量，其中i≥1；Expose the i-th flexible tape sub-unit on the first station, and simultaneously perform alignment measurement and/or focal plane measurement on the i+1-th flexible tape sub-unit on the second station, where i ≥1;
所述第i個柔性捲帶子單元完成曝光後自所述第一工位傳出，同時將完成對位測量和/或焦面測量的第i+1個柔性捲帶子單元從所述第二工位傳送至所述第一工位，在傳送的過程中根據所述第i+1個柔性捲帶子單元的測量結果調整所述光罩以使所述第i+1個柔性捲帶子單元後續到達所述第一工位後處於所述物鏡單元的焦深度範圍內；以及所述第i+1個柔性捲帶子單元到達所述第一工位後，對所述第i+1個柔性捲帶子單元進行曝光，並同步對所述第一工位上新傳入的第i+2個柔性捲帶子單元進行對位測量和/或焦面測量。After the i-th flexible webbing subunit is exposed, it is transmitted from the first station, and at the same time, the i+1th flexible webbing subunit that has completed alignment measurement and/or focal plane measurement is removed from the second work station. The position is transferred to the first station, and the photomask is adjusted according to the measurement result of the i+1th flexible tape subunit during the transfer process so that the i+1th flexible tape subunit subsequently arrives After the first station is within the focal depth range of the objective lens unit; and after the i+1th flexible tape subunit reaches the first station, the i+1th flexible tape The unit performs exposure, and synchronously performs alignment measurement and/or focal plane measurement on the i+2th flexible tape subunit newly introduced in the first station.
可選的，在對所述第一個柔性捲帶子單元進行曝光前還包括：Optionally, before exposing the first flexible tape subunit, the method further includes:
將第一個柔性捲帶子單元固定在所述第二工位上進行對位測量和/或焦面測量，所述第一個柔性捲帶子單元完成對位測量和/或焦面測量後，將所述第一個柔性捲帶子單元自所述第二工位傳送至所述第一工位，在傳送的過程中根據所述第一個柔性捲帶子單元的測量結果調整所述光罩使所述第一個柔性捲帶子單元後續到達所述第一工位後處於所述物鏡單元的焦深度範圍內；Fix the first flexible webbing subunit on the second station for alignment measurement and/or focal plane measurement. After the first flexible webbing subunit completes the alignment measurement and/or focal plane measurement, The first flexible tape winding subunit is transferred from the second station to the first station. During the transfer process, the light shield is adjusted according to the measurement result of the first flexible tape winding subunit so that all The first flexible tape winding subunit subsequently reaches the first station and is within the focal depth range of the objective lens unit;
其中，所述第一個柔性捲帶子單元到達所述第一工位後，對所述第一個柔性捲帶子單元進行曝光，並同步對所述第二工位上新傳入的第二個柔性捲帶子單元進行對位測量和/或焦面測量。Wherein, after the first flexible webbing subunit arrives at the first station, the first flexible webbing subunit is exposed, and the second newly introduced second station on the second station is synchronously exposed. The flexible tape sub-unit performs alignment measurement and/or focal plane measurement.
可選的，所述測量區的所述柔性捲帶移動至所述曝光區的過程中，所述工件台移動，且帶動固定在所述工件台上的所述柔性捲帶移動。Optionally, when the flexible web in the measurement area moves to the exposure area, the workpiece table moves and drives the flexible web fixed on the workpiece table to move.
可選的，所述工件台包括M個順次設置的工位，其中M≥3，M個所述工位上設置的柔性捲帶包括K個柔性捲帶子單元，3≤K≤M，對第i至第K-1個柔性捲帶子單元的曝光過程包括：Optionally, the workpiece table includes M stations arranged in sequence, wherein M≥3, the flexible tape set on the M stations includes K flexible tape subunits, 3≤K≤M, The exposure process from i to the K-1th flexible tape subunit includes:
對位於所述曝光區上的第i個柔性捲帶子單元進行曝光，並同步對位於所述測量區上的第i+1個柔性捲帶子單元進行對位測量和/或焦面測量，其中1≤i≤K-1；Expose the i-th flexible tape sub-unit located on the exposure area, and simultaneously perform alignment measurement and/or focal plane measurement on the i+1-th flexible tape sub-unit located on the measurement area, where 1 ≤i≤K-1;
所述第i個柔性捲帶子單元完成曝光後所述工件台移動，以將所述第i個柔性捲帶子單元自所述曝光區傳出，同時將完成對位測量和/或焦面測量的第i+1個柔性捲帶子單元從所述測量區傳送至所述曝光區，在傳送的過程中根據所述第i+1個柔性捲帶子單元的測量結果調整所述光罩以使所述第i+1個柔性捲帶子單元後續到達所述曝光區後處於所述物鏡單元的焦深度範圍內；以及After the i-th flexible tape subunit completes the exposure, the workpiece table moves to transfer the i-th flexible tape subunit from the exposure area, and at the same time, it will complete the alignment measurement and/or focal plane measurement. The i+1th flexible webbing subunit is transferred from the measurement area to the exposure area. During the transmission, the photomask is adjusted according to the measurement result of the i+1th flexible webbing subunit so that the The i+1th flexible tape subunit subsequently reaches the exposure zone and is within the focal depth range of the objective lens unit; and
所述第i+1個柔性捲帶子單元到達所述曝光區後，對所述第i+1個柔性捲帶子單元進行曝光。After the (i+1)th flexible webbing subunit reaches the exposure area, the i+1th flexible webbing subunit is exposed.
可選的，所述工件台在初始位置時，所述工件台上的第一個工位位於所述測量區，對第一個柔性捲帶子單元的測量過程包括：Optionally, when the workpiece table is in the initial position, the first station on the workpiece table is located in the measurement area, and the measurement process of the first flexible tape subunit includes:
將第一個柔性捲帶子單元固定在所述測量區的所述第一個工位上進行對位測量和/或焦面測量，所述第一個柔性捲帶子單元完成對位測量和/或焦面測量後，所述工件台移動以將所述第一個柔性捲帶子單元自所述測量區傳送至所述曝光區，在傳送的過程中根據所述第一個柔性捲帶子單元的測量結果調整所述光罩使所述第一個柔性捲帶子單元後續到達所述曝光區後處於所述物鏡單元的焦深度範圍內；Fix the first flexible webbing subunit on the first station of the measurement area to perform alignment measurement and/or focal plane measurement, and the first flexible webbing subunit completes alignment measurement and/or After the focal plane is measured, the workpiece table moves to transfer the first flexible tape subunit from the measurement area to the exposure area, and according to the measurement of the first flexible tape subunit during the transfer process As a result, the mask is adjusted so that the first flexible tape winding sub-unit subsequently reaches the exposure area and is within the focal depth range of the objective lens unit;
所述第一個柔性捲帶子單元到達所述曝光區後，對所述第一個柔性捲帶子單元進行曝光，同步對所述測量區上的第二個柔性捲帶子單元進行對位測量和/或焦面測量；After the first flexible webbing subunit reaches the exposure area, the first flexible webbing subunit is exposed, and the second flexible webbing subunit on the measurement area is synchronized to perform alignment measurement and/ Or focal plane measurement;
以及，對第K個柔性捲帶子單元的曝光過程包括：And, the exposure process of the Kth flexible tape subunit includes:
對所述第K-1個柔性捲帶子單元進行曝光時，同步對所述測量區上的第K個柔性捲帶子單元進行對位測量和/或焦面測量，所述第K個柔性捲帶子單元完成對位測量和/或焦面測量後，所述工件台移動以將所述第K個柔性捲帶子單元自所述測量區傳送至所述曝光區，在傳送的過程中根據所述第K個柔性捲帶子單元的測量結果調整所述光罩使所述第K個柔性捲帶子單元後續到達所述曝光區後處於所述物鏡單元的焦深度範圍內；When exposing the K-1th flexible tape subunit, synchronously perform alignment measurement and/or focal plane measurement on the Kth flexible tape subunit on the measurement area, the Kth flexible tape subunit After the unit completes the alignment measurement and/or focal plane measurement, the workpiece table moves to transfer the Kth flexible web subunit from the measurement area to the exposure area, and according to the first The measurement results of the K flexible webbing subunits adjust the mask so that the Kth flexible webbing subunit subsequently reaches the exposure area and is within the focal depth range of the objective lens unit;
所述第K個柔性捲帶子單元到達所述曝光區後，對所述第K個柔性捲帶子單元進行曝光；After the Kth flexible tape winding sub-unit reaches the exposure area, exposing the Kth flexible tape subunit;
所述工件台移回初始位置。The workpiece table moves back to the initial position.
可選的，所述柔性捲帶上設置有第一對位標記；所述測量單元包括：第一光源、用於承載對位標記單元的承載台和第一圖像獲取單元，所述對位標記單元上設置有與所述第一對位標記相對應的第二對位標記；Optionally, a first alignment mark is provided on the flexible web; the measurement unit includes: a first light source, a bearing platform for carrying the alignment mark unit, and a first image acquisition unit, the alignment The marking unit is provided with a second alignment mark corresponding to the first alignment mark;
獲得所述對位數據的過程包括：The process of obtaining the alignment data includes:
所述第一光源提供對位光線，所述對位光線依次照射至所述第二對位標記和所述第一對位標記並經所述測量區上的柔性捲帶反射，反射光線穿過所述對位標記單元至所述第一圖像獲取單元以獲得對位數據；The first light source provides alignment light, which irradiates the second alignment mark and the first alignment mark in sequence and is reflected by the flexible web on the measurement area, and the reflected light passes through The alignment mark unit to the first image acquisition unit to obtain alignment data;
根據所述對位數據調整所述光罩或/和所述工件台在平行於所述工件台表面的平面內移動以實現曝光對準。According to the alignment data, the mask or/and the workpiece stage are adjusted to move in a plane parallel to the surface of the workpiece stage to achieve exposure alignment.
可選的，所述測量單元還包括：第二光源、投影鏡組件、探測鏡組件和第二圖像獲取單元；Optionally, the measurement unit further includes: a second light source, a projection mirror assembly, a detection mirror assembly, and a second image acquisition unit;
獲得焦面測量數據的過程包括：The process of obtaining focal plane measurement data includes:
所述第二光源提供測量光線，所述測量光線經所述投影鏡組件照射至所述測量區上的柔性捲帶表面並被反射，反射光線經所述探測鏡組件後至所述第二圖像獲取單元以獲得焦面測量數據；The second light source provides measurement light, the measurement light is irradiated to the surface of the flexible web on the measurement area through the projection lens assembly and is reflected, and the reflected light reaches the second image after passing through the detection mirror assembly Image acquisition unit to obtain focal plane measurement data;
根據所述焦面測量數據調整所述光罩或/和所述工件台沿垂直於所述工件台表面的方向移動，以使所述曝光區的柔性捲帶處於所述物鏡單元的焦深度範圍內。Adjust the reticle or/and the workpiece table to move in a direction perpendicular to the surface of the workpiece table according to the focal plane measurement data, so that the flexible web of the exposure area is in the focal depth range of the objective lens unit Inside.
可選的，所述測量單元、所述光罩台、所述物鏡單元和所述照明單元的數量均為兩個，所述工件台的兩側各設置有一個所述測量單元、一個所述光罩台、一個所述物鏡單元和一個所述照明單元，所述工件台兩側的兩個所述物鏡單元相互正對，所述工件台兩側的兩個所述測量單元相互正對；所述多工位柔性捲帶曝光方法用於對所述柔性捲帶進行雙面曝光。Optionally, the number of the measurement unit, the mask stage, the objective lens unit, and the illumination unit is two, and both sides of the workpiece stage are provided with one measurement unit and one A mask stage, one objective lens unit and one illumination unit, the two objective lens units on both sides of the workpiece stage are directly opposite to each other, and the two measuring units on both sides of the workpiece stage are directly opposite to each other; The multi-station flexible web exposure method is used for double-sided exposure of the flexible web.
本發明提供的多工位柔性捲帶曝光裝置及曝光方法，工件台具有多個設置柔性捲帶的工位，對曝光區上的柔性捲帶曝光的同時對測量區上的柔性捲帶進行對位測量和/或焦面測量，完成曝光的柔性捲帶自曝光區傳出的同時將完成對位測量和/或焦面測量的柔性捲帶從測量區傳送至所述曝光區以切換工位，在傳送的過程中控制單元根據所述後一個柔性捲帶的對位數據和/或焦面測量數據控制光罩調整單元對光罩進行調整，並在所述後一個柔性捲帶到達曝光區後控制曝光單元對後一個柔性捲帶進行曝光。本發明採用多工位並行的模式，測量區上的柔性捲帶進行對位測量和/或焦面測量時，曝光區上的柔性捲帶進行同步曝光，在柔性捲帶在切換工位的過程中，完成對光罩的調整，多工位同時對柔性捲帶進行處理，合理利用時間，減少曝光步驟的耗時，有利於提高產能。In the multi-station flexible tape exposure device and exposure method provided by the present invention, the workpiece table has a plurality of stations for setting the flexible tape, and the flexible tape on the exposure area is exposed while the flexible tape on the measurement area is exposed. Position measurement and/or focal plane measurement, the flexible web that has completed the exposure is transmitted from the exposure area, and the flexible web that has completed the alignment measurement and/or focal plane measurement is transferred from the measurement area to the exposure area to switch stations During the transmission process, the control unit controls the reticle adjustment unit to adjust the reticle according to the alignment data and/or focal plane measurement data of the latter flexible web, and when the latter flexible web reaches the exposure area The post-control exposure unit exposes the latter flexible tape. The present invention adopts a multi-station parallel mode. When the flexible web on the measurement area is measured for alignment and/or focal plane measurement, the flexible web on the exposure area is simultaneously exposed, and the flexible web is in the process of switching stations. In the process, the adjustment of the mask is completed, and the flexible tape is processed at the same time in multiple stations, so that the time is rationally used, and the time-consuming of the exposure step is reduced, which is beneficial to increase the production capacity.
如背景技術所述，傳統的曝光方法是對一個帶狀柔性捲帶依次進行對位測量、聚焦調整及曝光，一個帶狀柔性捲帶完成上述所有步驟之後，才對下一個帶狀柔性捲帶進行對位測量、聚焦調整及曝光，這種對位測量、聚焦調整、曝光先後串行的模式，耗時較長，導致產能較低。As mentioned in the background art, the traditional exposure method is to perform alignment measurement, focus adjustment, and exposure on a strip-shaped flexible web in sequence. After all the above steps are completed for a strip-shaped flexible web, the next web-shaped flexible web is processed. Performing alignment measurement, focus adjustment, and exposure. This mode of alignment measurement, focus adjustment, and exposure sequence takes a long time and leads to low productivity.
本發明採用多工位並行的模式，一個工件台包括多個工位，工位包括至少一個曝光場，用於固定捲帶工件，測量區上的柔性捲帶進行的對位測量和/或焦面測量的同時，曝光區上的柔性捲帶進行曝光，在柔性捲帶從測量區傳送至曝光區的過程中，完成對光罩的調整，多工位同時對柔性捲帶進行處理，合理利用時間，減少曝光步驟的耗時，有利於提高產能。The present invention adopts a multi-station parallel mode, a workpiece table includes a plurality of stations, the station includes at least one exposure field, used to fix the tape workpiece, and the flexible tape on the measurement area is used for alignment measurement and/or focus. At the same time of surface measurement, the flexible tape on the exposure area is exposed. When the flexible tape is transferred from the measurement area to the exposure area, the adjustment of the mask is completed. The flexible tape is processed at the same time in multiple stations, and it is used rationally. Time, reducing the time-consuming of the exposure step, is conducive to improving productivity.
以下結合附圖1至圖13對本發明提出的多工位柔性捲帶曝光裝置及曝光方法作進一步詳細說明。根據下面說明，本發明的優點和特徵將更清楚。需說明的是，附圖均採用非常簡化的形式且均使用非精准的比例，僅用於方便、明晰地輔助說明本發明實施例的目的。The multi-station flexible web exposure device and exposure method proposed by the present invention will be described in further detail below in conjunction with FIGS. 1 to 13. According to the following description, the advantages and features of the present invention will be clearer. It should be noted that the drawings all adopt a very simplified form and all use imprecise proportions, which are only used for the purpose of conveniently and clearly assisting in describing the embodiments of the present invention.
實施例一Example one
所述多工位柔性捲帶曝光裝置可進行雙面曝光，以提高曝光效率。圖1是一種可進行雙面曝光的多工位柔性捲帶曝光裝置的結構示意圖，如圖1所示，這種能夠進行雙面曝光的多工位柔性捲帶曝光裝置（也可稱之為雙面多工位柔性捲帶曝光裝置），包括：工件台11、傳送單元61、兩個測量單元20、兩個光罩台701、兩個曝光單元30、兩個光罩調整單元40以及控制單元50。所述控制單元50分別與所述測量單元20、所述曝光單元30、所述光罩調整單元40以及傳送單元61訊號連接；所述工件台11包括測量區111和曝光區112；所述測量區111位於與所述測量單元20相對應的位置；所述曝光區112位於與所述曝光單元30相對應的位置。The multi-station flexible tape web exposure device can perform double-sided exposure to improve exposure efficiency. Figure 1 is a schematic diagram of the structure of a multi-station flexible web exposure device capable of double-sided exposure. As shown in Figure 1, this multi-station flexible web exposure device capable of double-sided exposure (also called Double-sided multi-station flexible tape exposure device), including: workpiece table 11, conveying
所述工件台11的上下兩側各設置有一個所述測量單元20、光罩台701、曝光單元30以及光罩調整單元40。所述工件台11的兩側的曝光單元30可相互對準，定期維護期間可以實現校準，以便生產過程中能實現上下兩側的曝光單元30對柔性捲帶80同一位置正面和反面對位的一致性。本實施例中多工位柔性捲帶曝光裝置對柔性捲帶80進行雙面曝光，位於工件台11上方的測量單元20和曝光單元30實現對柔性捲帶80正面的對位和/或曝光；位於工件台11下方的測量單元20和曝光單元30實現對柔性捲帶80背面的對位和/或曝光。Each of the upper and lower sides of the workpiece table 11 is provided with a measuring
作為示例，所述柔性捲帶為帶狀柔性捲帶，所有要進行曝光的帶狀柔性捲帶可以順次連接在一起從而構成一個連續的長條狀的結構。所述柔性捲帶例如是用於形成薄膜電路基板的帶狀柔性捲帶。As an example, the flexible web is a ribbon-shaped flexible web, and all the ribbon-shaped flexible webs to be exposed can be connected together in sequence to form a continuous elongated structure. The flexible web is, for example, a belt-shaped flexible web used to form a thin-film circuit board.
所述工件台11例如是採用框架結構，所述帶狀柔性捲帶搭在所述工件台11上，所述帶狀柔性捲帶的上下表面均被暴露出來。具體的，所述工件台11可以是一矩形框架。可在矩形框架的中央位置設置橫梁，以更好地支撑柔性捲帶。還可在矩形框架的角落處設置壓板90，通過壓板90可進一步固定柔性捲帶，防止柔性捲帶移動。所述壓板90的數量例如是六個，分布於所述矩形框架的四個角落以及橫梁與矩形框架的連接處。The workpiece table 11 adopts, for example, a frame structure, the strip-shaped flexible web is laid on the workpiece table 11, and the upper and lower surfaces of the strip-shaped flexible web are exposed. Specifically, the workpiece table 11 may be a rectangular frame. A cross beam can be set in the center of the rectangular frame to better support the flexible roll. A
作為示例，所述傳送單元61包括平行設置的開捲滾611、第一中間導滾612、第二中間導滾613和收捲滾614，所述控制單元50控制所述帶狀柔性捲帶從所述開捲滾611傳出、經所述第一中間導滾612導入所述工件台後11固定，完成相應工位的步驟後鬆開，帶狀柔性捲帶經第二中間導滾613導入至所述收捲滾614。具體的所述帶狀柔性捲帶邊緣可以設置孔洞計數控制柔性捲帶的傳送長度，在其它實施例中，也可以設置位移傳感器監控帶狀柔性捲帶的傳送長度。As an example, the conveying
應理解，這種雙面多工位柔性捲帶曝光裝置，實際上也可以進行單面曝光。僅使用工件台11上方或下方在同一側的所述測量單元20、光罩台701、曝光單元30以及光罩調整單元40即可。It should be understood that this type of double-sided multi-station flexible tape web exposure device can actually perform single-sided exposure. Only the
如圖2至圖4所示，多工位柔性捲帶曝光裝置還包括用於承載對位標記單元M2的承載台702，所述對位標記單元M2上設置有與所述柔性捲帶上的第一對位標記相對應的第二對位標記M21。所述測量單元20包括第一光源201和第一圖像獲取單元202，所述第一光源201和所述第一圖像獲取單元202均位於所述對位標記單元M2遠離所述工件台11的一側。所述第一光源201用於提供對位光線，所述對位光線依次照射至所述第二對位標記M21和所述測量區111上的柔性捲帶上的所述第一對位標記並經所述測量區111上的柔性捲帶反射，反射光線穿過所述對位標記單元M2至所述第一圖像獲取單元202以獲得對位數據。As shown in Figures 2 to 4, the multi-station flexible web exposure device further includes a
所述測量單元20還包括第二光源203、投影鏡組件204、探測鏡組件205和第二圖像獲取單元206，所述第二光源203提供用於焦面測量的測量光線，所述測量光線經所述投影鏡組件204照射至所述測量區111上的柔性捲帶表面反射，反射光線經所述探測鏡組件205後至所述第二圖像獲取單元206以獲得焦面測量數據，所述焦面測量數據例如是焦面測試數據。The
如圖5和圖6所示，光罩調整單元40包括第一光罩調整機構41和第二光罩調整機構42。As shown in FIGS. 5 and 6, the
如圖5所示，第一光罩調整機構41調整光罩台701上的所述光罩M1沿垂直於所述工件台11表面的方向上移動。第一光罩調整機構41包括第一位移傳感器413和至少一個第一調整組件，所述第一調整組件包括第一馬達411和螺桿412，所述第一馬達411驅動所述螺桿412在垂直於所述工件台11表面的方向上上下移動，從而帶動固定於光罩台701上的所述光罩M1在竪直於所述工件台11表面的方向上上下移動，所述第一位移傳感器413用於測試所述光罩台701在垂直於所述工件台11表面的方向上的移動，所述第一位移傳感器413例如為光柵尺。優選地，第一光罩調整機構41包括兩個第一調整組件，分別安裝於所述光罩台701面對/背對所述工件台11的表面的兩側，即圖示位置中的上下兩側。As shown in FIG. 5, the first
如圖6所示，所述第二光罩調整機構42用於調整所述光罩台701在平行於所述工件台11表面的平面內移動。第二光罩調整機構42包括第二位移傳感器424和至少兩個第二調整組件，所述光罩台701例如為矩形，每個所述第二調整組件安裝於所述光罩台701的一個角上，當第二調整組件為兩個時，安裝於所述光罩台701的對角上。當第二調整組件為三個時，安裝於所述光罩台701的任意三個角上。每個所述第二調整組件包括第二馬達421、凸輪422和彈性元件423，所述第二馬達421驅動所述凸輪422旋轉以使所述彈性元件423帶動所述光罩台701移動，使固定於光罩台701上的所述光罩M1在平行於所述工件台11表面的平面內移動，例如為旋轉。彈性元件423例如為彈簧，起彈性支撑作用。具體的，每個凸輪422通過分布於所述光罩台701角兩側的兩個彈性元件423與所述光罩台701連接，所述凸輪422旋轉時使其中一個彈性元件423壓縮，另一個彈性元件423拉伸以驅動光罩台701旋轉。第二位移傳感器424分別測試平行於所述工件台11表面的平面內相互垂直的兩個方向（X方向和Y方向）的位移，從而得到旋轉精度。所述光罩台701例如為矩形，相鄰的矩形邊分別沿所述X方向和Y方向設置。所述位移傳感器424例如為光柵尺。As shown in FIG. 6, the second
繼續參照圖1所示，所述曝光單元30包括：第三光源301和投影透鏡302，所述光罩台701位於所述第三光源301與所述投影透鏡302之間，所述光罩M1固定在所述光罩台701上。設置第三光源301的光軸方向垂直於工件台11表面，工件台11通常水平設置。所述第三光源301用於提供曝光光線，所述曝光光線照射至所述光罩台701上的所述光罩M1，經所述投影透鏡302將光線聚焦在所述曝光區112的柔性捲帶上進行曝光，更具體的是聚焦到所述待曝光的柔性捲帶表面的光阻上。光線聚集點為焦點，焦點是經投影透鏡302聚焦後出現最佳圖像的點，焦點所在水平面為焦平面，焦深度（DOF）為能使聚焦圖像保持清晰的位於焦平面兩側的上限平面到下限平面的距離。光刻工藝中，焦點可能不是正好位於光阻的上下表面的中間，但是所述光阻的上下表面位於所述焦深度（DOF）內，這樣才能保證曝光範圍內整個厚度的光阻均成像清晰。1, the
本實施例通過調整光罩M1在垂直於所述工件台11表面的方向上移動，使位於所述曝光區112上的柔性捲帶表面的光阻上下表面均在曝光光線經所述光罩台701上的所述光罩M1到達所述投影透鏡302將光線聚焦的焦深度（DOF）範圍內，以使所述曝光區112上的柔性捲帶表面的光阻連續清晰的曝光。In this embodiment, by adjusting the photomask M1 to move in a direction perpendicular to the surface of the workpiece table 11, the upper and lower surfaces of the photoresist on the surface of the flexible web on the
本實施例中工件台11在整個工作過程中固定不動，所述控制單元50用於控制所述曝光單元30對曝光區112上的柔性捲帶進行曝光，同時控制所述測量單元20對測量區111上的柔性捲帶進行對位測量和/或焦面測量，其中，所述曝光區112上的柔性捲帶和所述測量區111上的柔性捲帶可以是同一卷柔性捲帶的不同部分，也可以是不同卷柔性捲帶；並控制所述傳送單元61將所述曝光區112上完成曝光的所述柔性捲帶自所述曝光區112傳出，同時將所述測量區111上完成對位測量和/或焦面測量的柔性捲帶從所述測量區111傳送至所述曝光區112，在傳送的過程中所述控制單元50根據所述柔性捲帶的對位數據和焦面測量數據控制所述光罩調整單元40對所述光罩M1進行調整；並在所述測量區111上的柔性捲帶到達所述曝光區112後控制所述曝光單元30進行曝光，同時控制所述測量單元20對所述測量區111上傳入的柔性捲帶進行對位測量和/或焦面測量。In this embodiment, the workpiece table 11 is fixed during the entire working process. The
應當理解，對於第一個柔性捲帶，將第一個柔性捲帶固定在所述測量區111進行對位測量和/或焦面測量，完成對位測量和/或焦面測量後將所述第一個柔性捲帶自測量區111傳送至所述曝光區112，在傳送的過程中所述控制單元50根據所述第一個柔性捲帶的對位數據和焦面測量數據控制所述光罩調整單元40對光罩M1進行調整；所述第一個柔性捲帶到達所述曝光區112後，所述控制單元50控制所述曝光單元30對所述第一個柔性捲帶進行曝光，同時控制所述測量單元20對所述測量區111上的第二個柔性捲帶進行對位測量和/或焦面測量。It should be understood that for the first flexible web, fix the first flexible web in the
完成曝光、對位測量和/或焦面測量時所述柔性捲帶80通過真空吸附固定，柔性捲帶80表面設置壓板90以防止柔性捲帶移動；完成柔性捲帶80傳送時，將所述柔性捲帶80鬆開。When the exposure, alignment measurement, and/or focal plane measurement are completed, the
所述測量單元20獲得的所述測試數據和所述對位數據通過所述控制單元50進行坐標轉換，使得對位標記單元M2上的所述第二對位標記M21與所述光罩M1上的標記精確對應與匹配。根據所述測試數據和所述對位數據，所述控制單元50匹配相應的焦面補償數據和對位偏差補償數據，控制所述光罩調整單元40調整所述光罩台701，因光罩M1固定在光罩台701上，故通過光罩調整單元40最終調整光罩M1。通過第一光罩調整機構41調整光罩台701上的所述光罩M1沿垂直於所述工件台11表面的方向上移動，以使所述曝光區112上的柔性捲帶在焦深度（DOF）範圍內能清晰曝光。通過第二光罩調整機構42調整所述光罩台701在平行於所述工件台11表面的平面內旋轉，使曝光過程精確對位。The test data and the alignment data obtained by the measuring
進一步的，柔性捲帶80在傳送過程中可能會有傾斜（例如傳送方向的柔性捲帶兩側邊緣與第一中間導滾612的軸綫不垂直，有偏移）可通過角位移傳感器測量，獲得柔性捲帶傾斜數據。此時，需要將傾斜數據通過所述控制單元50進行坐標轉換，控制單元50綜合所述焦面測量數據（例如是焦面測試數據）、對位數據以及傾斜數據匹配相應的補償數據控制光罩調整單元40調整所述光罩M1。所述光罩M1在平行於所述工件台11表面的平面內調整的誤差包括對位時相錯開引起的偏差和柔性捲帶在傳送過程中的傾斜偏差。控制單元50通過第二光罩調整機構42調整所述光罩台701在平行於所述工件台11表面的平面內旋轉，使曝光過程精確對位。控制單元50通過第一光罩調整機構41調整光罩台701上的所述光罩M1沿垂直於所述工件台11表面的方向上移動，以使所述曝光區112上的柔性捲帶在焦深度（DOF）範圍內能清晰曝光。Further, the
所述多工位柔性捲帶曝光裝置也可是一種只能進行單面曝光的裝置，以簡化機台結構，降低設備製造成本。圖7是一種可進行單面曝光的多工位柔性捲帶曝光裝置的結構示意圖，如圖7所示，這種僅能進行單面曝光的多工位柔性捲帶曝光裝置（也可稱之為單面多工位柔性捲帶曝光裝置），包括：所述測量單元20、光罩台701、曝光單元30以及光罩調整單元40的數量均為一個，且均位於所述工件台11的同一側。本實施例中多工位柔性捲帶曝光裝置對柔性捲帶80進行單面曝光。單面多工位柔性捲帶曝光裝置的工件台11可採用平板結構或框架結構。The multi-station flexible tape-reel exposure device can also be a device that can only perform single-sided exposure, so as to simplify the machine structure and reduce equipment manufacturing costs. Figure 7 is a schematic diagram of the structure of a multi-station flexible tape exposure device that can perform single-sided exposure. As shown in Figure 7, this multi-station flexible tape exposure device that can only perform single-sided exposure (also called It is a single-sided multi-station flexible tape exposure device), including: the number of the measuring
基於此，本實施例還提供一種多工位柔性捲帶曝光方法，如圖1和圖8所示，該方法基於雙工位的多工位柔性捲帶曝光裝置，所述雙工位的多工位柔性捲帶曝光裝置的工件台包括第一工位和第二工位，所述第一工位位於所述曝光區，所述第二工位位於所述測量區，所述柔性捲帶包括N（N≥2）個柔性捲帶子單元，對第i至第N個柔性捲帶的曝光過程包括：Based on this, this embodiment also provides a multi-station flexible reel exposure method, as shown in Figures 1 and 8. The method is based on a dual-station multi-station flexible reel exposure device. The work station of the station flexible tape exposure device includes a first station and a second station. The first station is located in the exposure area, the second station is located in the measurement area, and the flexible tape Including N (N≥2) flexible tape sub-units, the exposure process for the i-th to N-th flexible tapes includes:
控制單元50控制曝光單元30對第一工位上的第i（i≥1）個柔性捲帶子單元進行曝光，並且所述控制單元50同步控制測量單元20對所述第二工位上的第i+1個柔性捲帶子單元進行對位測量和/或焦面測量；The
所述第一工位上的所述第i個柔性捲帶子單元完成曝光後，所述控制單元50控制傳送單元61將完成曝光的所述第i個柔性捲帶子單元自所述第一工位傳出，同時將完成對位測量和/或焦面測量的第i+1個柔性捲帶子單元從所述第二工位傳送至所述第一工位，在傳送的過程中所述控制單元50根據所述第i+1個柔性捲帶子單元的對位數據和焦面測量數據控制光罩調整單元40對光罩M1進行調整；以及After the i-th flexible webbing subunit on the first station is exposed, the
所述第i+1個柔性捲帶子單元到達所述第一工位後，所述控制單元50控制所述曝光單元30對所述第i+1個柔性捲帶子單元進行曝光，並同步控制所述測量單元20對所述第二工位上新傳入的第i+2個柔性捲帶子單元進行對位測量和/或焦面測量。After the i+1th flexible webbing subunit reaches the first station, the
進一步的，在對第一個柔性捲帶的進行曝光前還包括：Further, before exposing the first flexible tape, it also includes:
將第一個柔性捲帶固定在所述第二工位上進行對位測量和/或焦面測量，所述第一個柔性捲帶完成對位測量和/或焦面測量後，將所述第一個柔性捲帶自所述第二工位傳送至所述第一工位，在傳送的過程中所述控制單元50根據所述第一個柔性捲帶的對位數據和焦面測量數據控制所述光罩調整單元40對光罩M1進行調整；Fix the first flexible web on the second station for alignment measurement and/or focal plane measurement. After the first flexible web has completed alignment measurement and/or focal plane measurement, the The first flexible web is transferred from the second station to the first station. During the transfer, the
所述第一個柔性捲帶到達所述第一工位後，所述控制單元50控制所述曝光單元30對所述第一個柔性捲帶進行曝光，同時控制所述測量單元20對所述第二工位上的第二個柔性捲帶進行對位測量和/或焦面測量。After the first flexible web reaches the first station, the
如圖1和圖2所示，所述測量單元20包括第一光源201和第一圖像獲取單元202；獲得所述對位數據的過程包括：所述第一光源201提供對位光線，所述對位光線依次照射至所述第二對位標記M21和所述第一對位標記並經所述測量區上的柔性捲帶反射，反射光線穿過所述對位標記單元M2至所述第一圖像獲取單元202以獲得對位數據；所述控制單元50根據所述後一個柔性捲帶的所述對位數據控制所述光罩調整單元40調整所述光罩台701上的光罩M1在平行於所述工件台11表面的平面內移動。As shown in Figures 1 and 2, the
所述測量單元20還包括：第二光源203、投影鏡組件204、探測鏡組件205和第二圖像獲取單元206；獲得焦面測量數據的過程包括：所述第二光源203用於提供測量光線，所述測量光線經所述投影鏡組件204照射至所述測量區111上的柔性捲帶表面並被反射，反射光線經所述探測鏡組件205後至所述第二圖像獲取單元206以獲得焦面測量數據；所述控制單元50根據所述後一個柔性捲帶的所述焦面測量數據控制所述光罩調整單元40調整所述光罩台701上的光罩M1沿垂直於所述工件台11表面的方向移動。The
如圖1和圖5所示，所述光罩調整單元40包括第一光罩調整機構41，所述第一光罩調整機構41包括：第一位移傳感器413和至少一個第一調整組件，所述第一調整組件包括第一馬達411和螺桿412，所述第一馬達411用於驅動所述螺桿412在垂直於所述工件台11表面的方向上移動，從而帶動固定於所述光罩台701上的光罩M1移動，所述第一位移傳感器413用於獲取所述光罩台701的位移數據。As shown in FIGS. 1 and 5, the
如圖1和圖6所示，所述光罩調整單元40還包括第二光罩調整機構42，所述第二光罩調整機構42包括：第二位移傳感器424和至少兩個第二調整組件，所述第二調整組件包括第二馬達421、凸輪422和彈性元件423，所述第二馬達421用於驅動所述凸輪422旋轉以使所述彈性元件423帶動所述光罩台701移動，從而使固定於所述光罩台701上的光罩M1在平行於所述工件台11表面的平面內移動。As shown in FIGS. 1 and 6, the
如圖1所示，所述柔性捲帶80為帶狀柔性捲帶，所述傳送單元61包括平行設置的開捲滾611、第一中間導滾612、第二中間導滾613和收捲滾614；所述控制單元50控制所述柔性捲帶80從所述開捲滾611傳出，並經所述第一中間導滾612導入所述工件台11並固定；所述柔性捲帶80自所述曝光區112傳出時，經所述第二中間導滾導613入至所述收捲滾614。As shown in FIG. 1, the
如圖1所示，所述曝光單元30包括：第三光源301和投影透鏡302，所述光罩台701位於所述第三光源301與所述投影透鏡302之間，所述曝光過程包括：所述第三光源301提供曝光光線，所述曝光光線照射至所述光罩台701上的所述光罩M1，經所述投影透鏡302聚焦在位於所述曝光區112的柔性捲帶上以進行曝光。As shown in FIG. 1, the
繼續如圖1所示，所述測量單元20、光罩台701、曝光單元30以及光罩調整單元40的數量均為兩個，所述工件台11的兩側各設置有一個所述測量單元20、光罩台701、曝光單元30以及光罩調整單元40，所述工件台11的兩側的所述曝光單元30相互正對；所述曝光方法是用於對所述柔性捲帶進行雙面曝光。Continuing as shown in FIG. 1, the number of the measuring
如圖7所示，所述測量單元20、光罩台701、曝光單元30以及光罩調整單元40的數量均為一個，且位於所述工件台11的同一側；所述曝光方法是用於對所述柔性捲帶進行單面曝光。As shown in FIG. 7, the number of the measuring
實施例二Example two
如圖9-圖12所示，本實施例中，所述多工位柔性捲帶曝光裝置包括工件台12、傳送單元61、兩個測量單元20、兩個光罩台701、兩個曝光單元30、兩個光罩調整單元40以及控制單元50。所述控制單元50分別與所述測量單元20、所述曝光單元30、所述光罩調整單元40以及傳送單元61訊號連接。與實施例一的區別在於，本實施例中，所述工件台12能夠移動，在所述測量區的柔性捲帶移動至所述曝光區的過程中，所述工件台12移動，且帶動固定在所述工件台12上的柔性捲帶移動。具體的，本實施例以單面曝光的多工位柔性捲帶曝光裝置進行舉例說明，但應理解，本實施例中的多工位柔性捲帶曝光裝置實際上也可以進行雙面曝光。As shown in Figures 9-12, in this embodiment, the multi-station flexible web exposure device includes a workpiece table 12, a
所述工件台12具有M（M≥3）個順次設置的工位，所述工件台上設置的柔性捲帶包括K（3≤K≤M）個柔性捲帶子單元，每個所述工位上均可以設置一個所述柔性捲帶子單元。如圖9所示，本實施例中所述工件台12具有3個工位，為了便於描述，令3個工位從所述曝光區至所述測量區的方向（從右至左）分別為第一工位121、第二工位122及第三工位123，所述工件台12移動時，可以切換所述第一工位121、第二工位122及第三工位123的位置，以使所述第一工位121、第二工位122及第三工位123上的柔性捲帶子單元均能夠通過測量區和曝光區。具體的，所述控制單元50用於控制所述曝光單元30對曝光區上的柔性捲帶進行曝光，同時控制所述測量單元20對測量區上的柔性捲帶進行對位測量和/或焦面測量；並控制所述工件台12向右移動以將所述曝光區上完成曝光的所述柔性捲帶自所述曝光區傳出。The workpiece table 12 has M (M≥3) stations arranged in sequence, the flexible tape set on the workpiece table includes K (3≤K≤M) flexible tape subunits, and each station One of the flexible tape subunits can be provided on each of them. As shown in FIG. 9, the workpiece table 12 in this embodiment has 3 stations. For ease of description, let the directions (from right to left) of the 3 stations from the exposure area to the measurement area be The
基於此，本實施例還提供了一種多工位柔性捲帶曝光方法，如圖9-圖13所示，該方法基於多工位（大於等於3）的多工位柔性捲帶曝光裝置，本實施例中，所述多工位柔性捲帶曝光裝置的工件台包括所述第一工位121、第二工位122及第三工位123，所述工件台12移動至初始位置時，所述第一工位121位於所述測量區，所述第二工位122及所述第三工位123都在測量和曝光範圍外，所述柔性捲帶包括N（N≥2）個柔性捲帶子單元（分別表示為N1、N2、Ni…NN），所述工件台上設置的柔性捲帶包括K（3≤K≤M）個柔性捲帶子單元（此處K=3），曝光過程包括：Based on this, this embodiment also provides a multi-station flexible reel exposure method, as shown in Figures 9-13. The method is based on a multi-station (greater than or equal to 3) multi-station flexible reel exposure device. In an embodiment, the workpiece table of the multi-station flexible tape-reel exposure device includes the
將3個柔性捲帶子單元（N1、N2、N3）依次固定在所述工件台12的第一工位121、第二工位122及第三工位123上，此時，如圖9所示，所述工件台12處於初始位置，所述第一工位121位於所述測量區的下方，接著對第一個柔性捲帶子單元（N1）進行對位測量和/或焦面測量。完成對位測量和/或焦面測量後所述工件台12向右移動，如圖10所示，使所述第一工位121位於曝光區下方，所述第二工位122位於所述測量區下方，這樣就將所述第一個柔性捲帶子單元（N1）自測量區傳送至所述曝光區，將第二個柔性捲帶子單元（N2）傳送至測量區，在所述工件台12移動的過程中，所述控制單元50根據所述第一個柔性捲帶子單元（N1）的對位數據和焦面測量數據控制所述光罩調整單元40對光罩M1進行調整，在此，所述多工位柔性捲帶曝光裝置也可以包括工件台調整單元，所述工件台調整單元根據所述測量單元的測量結果調整所述工件台以使所述曝光區的所述柔性捲帶處於所述物鏡單元的焦深度範圍內，工件台調整單元和光罩調整單元40中的第一光罩調整機構41可以只使用其中一個；所述第一個柔性捲帶子單元（N1）到達所述曝光區後，所述控制單元50控制所述曝光單元30對所述第一個柔性捲帶子單元（N1）進行曝光，並同步控制所述測量單元20對所述第二工位122上的第二個柔性捲帶子單元（N2）進行對位測量和/或焦面測量。第一個柔性捲帶子單元（N1）曝光完成且第二個柔性捲帶子單元（N2）測量完成後，如圖11所示，所述工件台12再向右移動，使所述第一工位121從所述曝光區傳出，所述第二工位122位於所述曝光區，所述第三工位123位於所述測量區，所述控制單元50控制所述曝光單元30對所述第二個柔性捲帶子單元（N2）進行曝光，並同步控制所述測量單元20對所述第三工位123上的第三個柔性捲帶子單元（N3）進行對位測量和/或焦面測量。第二個柔性捲帶子單元（N2）曝光完成且第三個柔性捲帶子單元（N3）測量完成後，如圖12所示，所述工件台12再向右移動，使所述第二工位122從所述曝光區傳出，使所述第三工位123位於所述曝光區，然後所述曝光單元30對所述第三個柔性捲帶子單元（N3）進行曝光。曝光完畢後，所述工件台12移動至所述初始位置，在移動的同時，所述傳送單元61鬆開，將所述工件台12上的三個柔性捲帶子單元（N1、N2、N3）傳出，再將後三個柔性捲帶子單元（N4、N5、N6）傳入並固定至所述工件台12上，直至N個所述柔性捲帶子單元均曝光完畢。The three flexible tape subunits (N1, N2, N3) are sequentially fixed on the
可以理解的是，由於本實施例中所述工件台12可以移動，可以在工件台上的所有柔性捲帶子單元曝光完畢後再重新上片，避免了每曝光一個柔性捲帶子單元就需要重新上片的問題，進一步提高了效率。It is understandable that, because the workpiece table 12 in this embodiment can be moved, it can be reloaded after all the flexible tape subunits on the workpiece table are exposed, avoiding the need to reload each flexible tape subunit every time it is exposed. The problem with the film has further improved efficiency.
終上，本發明對曝光區進行曝光的同時，對測量區進行對位測量和/或焦面測量，多工位並列進行；柔性捲帶傳送的過程中，完成對所述光罩的調整，多工位上同時對柔性捲帶進行處理合理利用時間，減少曝光步驟製程時間，提高產能。Finally, while exposing the exposure area, the present invention performs alignment measurement and/or focal plane measurement on the measurement area, and multiple stations are performed in parallel; during the process of flexible tape transport, the adjustment of the photomask is completed, Simultaneous processing of flexible tapes at multiple stations makes reasonable use of time, reduces the process time of the exposure step, and increases productivity.
本說明書中各個實施例採用遞進的方式描述，每個實施例重點說明的都是與其他實施例的不同之處，各個實施例之間相同相似部分互相參見即可。對於實施例公開的方法而言，由於與實施例公開的裝置相對應，所以描述的比較簡單，相關之處參見裝置部分說明即可。The various embodiments in this specification are described in a progressive manner. Each embodiment focuses on the differences from other embodiments, and the same or similar parts between the various embodiments can be referred to each other. For the method disclosed in the embodiment, since it corresponds to the device disclosed in the embodiment, the description is relatively simple, and the relevant part can be referred to the description of the device.
上述描述僅是對本發明較佳實施例的描述，並非對本發明範圍的任何限定，本發明領域的普通技術人員根據上述揭示內容做的任何變更、修飾，均屬於申請專利範圍的保護範圍。The foregoing description is only a description of the preferred embodiments of the present invention, and does not limit the scope of the present invention. Any changes or modifications made by persons of ordinary skill in the field of the present invention based on the foregoing disclosure shall fall within the protection scope of the patent application.
11、12:工件台 111:測量區 112:曝光區 121:第一工位 122:第二工位 123:第三工位 M1:光罩 M2:對位標記單元 M21:第二對位標記 20:測量單元 201:第一光源 202:第一圖像獲取單元 203:第二光源 204:投影鏡組件 205:探測鏡組件 206:第二圖像獲取單元 30:曝光單元 301:第三光源 302:投影透鏡 40:光罩調整單元 41:第一光罩調整機構 411:第一馬達 412:螺桿 413:第一位移傳感器 42:第二光罩調整機構 421:第二馬達 422:凸輪 423:彈性元件 424:第二位移傳感器 50:控制單元 61:傳送單元 611:開捲滾 612:第一中間導滾 613:第二中間導滾 614:收捲滾 701:光罩台 702:承載台 80:柔性捲帶 90:壓板 A:方向11, 12: Workpiece table 111: measurement area 112: Exposure area 121: first station 122: second station 123: third station M1: Mask M2: Alignment marking unit M21: The second alignment mark 20: Measuring unit 201: The first light source 202: The first image acquisition unit 203: second light source 204: Projection mirror assembly 205: Detector mirror assembly 206: The second image acquisition unit 30: Exposure unit 301: third light source 302: Projection lens 40: Mask adjustment unit 41: The first mask adjustment mechanism 411: First Motor 412: Screw 413: The first displacement sensor 42: The second mask adjustment mechanism 421: second motor 422: Cam 423: elastic element 424: second displacement sensor 50: control unit 61: transfer unit 611: Unwind Roll 612: The first middle guide roll 613: second intermediate guide roll 614: Rewind 701: Mask Stage 702: Carrier 80: Flexible tape 90: pressure plate A: Direction
圖1是本發明實施例一提供的可進行雙面曝光的多工位柔性捲帶曝光裝置的結構示意圖。 圖2是本發明實施例一提供的多工位柔性捲帶曝光裝置中的測量單元的結構示意圖。 圖3是本發明實施例一提供的多工位柔性捲帶曝光裝置中的測量單元的對位測量過程的示意圖。 圖4是本發明實施例一提供的多工位柔性捲帶曝光裝置的測量單元的焦面測量過程的示意圖。 圖5是本發明實施例一提供的多工位柔性捲帶曝光裝置的第一光罩調整機構的結構示意圖。 圖6是本發明實施例一提供的多工位柔性捲帶曝光裝置的第二光罩調整機構的結構示意圖。 圖7是本發明實施例一提供的可進行單面曝光的多工位柔性捲帶曝光裝置的結構示意圖。 圖8是本發明實施例一提供的多工位柔性捲帶曝光方法的流程示意圖； 圖9是本發明實施例二提供的可進行單面曝光的多工位柔性捲帶曝光裝置的工件台位於初始位置時的結構示意圖。 圖10是本發明實施例二提供的可進行單面曝光的多工位柔性捲帶曝光裝置的工件台向右移動一次後的結構示意圖。 圖11是本發明實施例二提供的可進行單面曝光的多工位柔性捲帶曝光裝置的工件台向右移動兩次後的結構示意圖。 圖12是本發明實施例二提供的可進行單面曝光的多工位柔性捲帶曝光裝置的工件台向右移動三次後的結構示意圖。 圖13是本發明實施例二提供的多工位柔性捲帶曝光方法的流程示意圖。FIG. 1 is a schematic structural diagram of a multi-station flexible tape web exposure device capable of double-sided exposure provided by the first embodiment of the present invention. FIG. 2 is a schematic structural diagram of a measuring unit in a multi-station flexible tape web exposure device provided by Embodiment 1 of the present invention. 3 is a schematic diagram of the alignment measurement process of the measurement unit in the multi-station flexible tape web exposure device provided in the first embodiment of the present invention. 4 is a schematic diagram of the focal plane measurement process of the measurement unit of the multi-station flexible web exposure device provided in the first embodiment of the present invention. FIG. 5 is a schematic structural diagram of a first mask adjusting mechanism of a multi-station flexible tape web exposure device according to Embodiment 1 of the present invention. FIG. 6 is a schematic structural diagram of a second mask adjustment mechanism of a multi-station flexible tape web exposure device according to Embodiment 1 of the present invention. FIG. 7 is a schematic structural diagram of a multi-station flexible tape web exposure device capable of single-sided exposure according to the first embodiment of the present invention. FIG. 8 is a schematic flowchart of a multi-station flexible web exposure method provided by Embodiment 1 of the present invention; FIG. 9 is a schematic diagram of the structure of the multi-station flexible tape web exposure device capable of single-sided exposure according to the second embodiment of the present invention when the workpiece stage is in the initial position. FIG. 10 is a schematic diagram of the structure after the workpiece stage of the multi-station flexible tape web exposure device capable of single-sided exposure is moved to the right once according to the second embodiment of the present invention. 11 is a schematic diagram of the structure of the multi-station flexible tape web exposure device capable of single-sided exposure provided by the second embodiment of the present invention after the workpiece stage has moved to the right twice. 12 is a schematic diagram of the structure after the workpiece stage of the multi-station flexible tape web exposure device capable of single-sided exposure is moved to the right three times according to the second embodiment of the present invention. FIG. 13 is a schematic flowchart of a multi-station flexible web exposure method according to the second embodiment of the present invention.
11:工件台 11: Workpiece table
111:測量區 111: measurement area
112:曝光區 112: Exposure area
M1:光罩 M1: Mask
20:測量單元 20: Measuring unit
30:曝光單元 30: Exposure unit
301:第三光源 301: third light source
302:投影透鏡 302: Projection lens
40:光罩調整單元 40: Mask adjustment unit
50:控制單元 50: control unit
61:傳送單元 61: transfer unit
611:開捲滾 611: Unwind Roll
612:第一中間導滾 612: The first middle guide roll
613:第二中間導滾 613: second intermediate guide roll
614:收捲滾 614: Rewind
701:光罩台 701: Mask Stage
80:柔性捲帶 80: Flexible tape
90:壓板 90: pressure plate
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| CN201910222911.1A CN109884860B (en) | 2019-03-22 | 2019-03-22 | Multi-station flexible tape exposure device and exposure method |
| CN201910222911.1 | 2019-03-22 |
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| WO (1) | WO2020192115A1 (en) |
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| CN109884860B (en) * | 2019-03-22 | 2020-12-04 | 上海微电子装备（集团）股份有限公司 | Multi-station flexible tape exposure device and exposure method |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0769726A2 (en) * | 1995-10-20 | 1997-04-23 | Ushiodenki Kabushiki Kaisha | Process for projection exposure of a workpiece with alignment marks on the rear side and device for executing the process |
| JP2004347964A (en) * | 2003-05-23 | 2004-12-09 | Ushio Inc | Double-sided projection exposure apparatus for belt-like work |
| CN101359188A (en) * | 2007-08-02 | 2009-02-04 | 优志旺电机株式会社 | Exposure apparatus of belt type workpiece and focusing regulation method thereof |
| CN201917775U (en) * | 2010-12-28 | 2011-08-03 | 北京京东方光电科技有限公司 | Exposure device |
| WO2011101187A1 (en) * | 2010-02-19 | 2011-08-25 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| CN107664924A (en) * | 2016-07-29 | 2018-02-06 | 上海微电子装备（集团）股份有限公司 | A kind of exposure device and method |
| CN109343314A (en) * | 2018-12-07 | 2019-02-15 | 苏州源卓光电科技有限公司 | A kind of exposure device for double-sided flexible circuit board |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100418511B1 (en) * | 2002-03-09 | 2004-02-14 | 삼성테크윈 주식회사 | Exposure method of substrate and apparatus the same |
| JP4491311B2 (en) * | 2004-09-30 | 2010-06-30 | 富士フイルム株式会社 | Image recording apparatus and image recording method |
| JP2010039166A (en) * | 2008-08-05 | 2010-02-18 | Hitachi Ltd | Exposure apparatus and method for manufacturing device using the same |
| CN104471486B (en) * | 2012-05-29 | 2017-11-24 | 株式会社尼康 | Lighting device, processing unit and device making method |
| CN110083018A (en) * | 2014-04-01 | 2019-08-02 | 株式会社尼康 | The method of adjustment of substrate board treatment |
| CN108508706B (en) * | 2017-02-28 | 2020-04-10 | 上海微电子装备（集团）股份有限公司 | Displacement measurement system and exposure equipment |
| CN107463069A (en) * | 2017-08-28 | 2017-12-12 | 中国科学技术大学 | A kind of large area continuous rolling moves exposure device and method |
| CN109884860B (en) * | 2019-03-22 | 2020-12-04 | 上海微电子装备（集团）股份有限公司 | Multi-station flexible tape exposure device and exposure method |
-
2019
- 2019-03-22 CN CN201910222911.1A patent/CN109884860B/en active Active
- 2019-10-31 WO PCT/CN2019/114734 patent/WO2020192115A1/en active Application Filing
- 2019-10-31 TW TW108139535A patent/TWI728534B/en active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0769726A2 (en) * | 1995-10-20 | 1997-04-23 | Ushiodenki Kabushiki Kaisha | Process for projection exposure of a workpiece with alignment marks on the rear side and device for executing the process |
| JP2004347964A (en) * | 2003-05-23 | 2004-12-09 | Ushio Inc | Double-sided projection exposure apparatus for belt-like work |
| CN101359188A (en) * | 2007-08-02 | 2009-02-04 | 优志旺电机株式会社 | Exposure apparatus of belt type workpiece and focusing regulation method thereof |
| WO2011101187A1 (en) * | 2010-02-19 | 2011-08-25 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| CN201917775U (en) * | 2010-12-28 | 2011-08-03 | 北京京东方光电科技有限公司 | Exposure device |
| CN107664924A (en) * | 2016-07-29 | 2018-02-06 | 上海微电子装备（集团）股份有限公司 | A kind of exposure device and method |
| CN109343314A (en) * | 2018-12-07 | 2019-02-15 | 苏州源卓光电科技有限公司 | A kind of exposure device for double-sided flexible circuit board |
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| Publication number | Publication date |
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| CN109884860B (en) | 2020-12-04 |
| CN109884860A (en) | 2019-06-14 |
| WO2020192115A1 (en) | 2020-10-01 |
| TW202040277A (en) | 2020-11-01 |
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