TWI718263B - 相位偏移光罩基底、相位偏移光罩及顯示裝置之製造方法 - Google Patents
相位偏移光罩基底、相位偏移光罩及顯示裝置之製造方法 Download PDFInfo
- Publication number
- TWI718263B TWI718263B TW106106563A TW106106563A TWI718263B TW I718263 B TWI718263 B TW I718263B TW 106106563 A TW106106563 A TW 106106563A TW 106106563 A TW106106563 A TW 106106563A TW I718263 B TWI718263 B TW I718263B
- Authority
- TW
- Taiwan
- Prior art keywords
- phase shift
- film
- light
- etching
- pattern
- Prior art date
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/80—Etching
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
- H01L21/76829—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing characterised by the formation of thin functional dielectric layers, e.g. dielectric etch-stop, barrier, capping or liner layers
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP??2016-059487 | 2016-03-24 | ||
JP2016059487 | 2016-03-24 | ||
JP2017013100A JP2017182052A (ja) | 2016-03-24 | 2017-01-27 | 位相シフトマスクブランク、位相シフトマスク及び表示装置の製造方法 |
JP??2017-013100 | 2017-01-27 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201735161A TW201735161A (zh) | 2017-10-01 |
TWI718263B true TWI718263B (zh) | 2021-02-11 |
Family
ID=60004581
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW106106563A TWI718263B (zh) | 2016-03-24 | 2017-02-24 | 相位偏移光罩基底、相位偏移光罩及顯示裝置之製造方法 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2017182052A (ko) |
KR (1) | KR20170113083A (ko) |
TW (1) | TWI718263B (ko) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7062377B2 (ja) * | 2017-05-31 | 2022-05-16 | アルバック成膜株式会社 | 位相シフトマスクの製造方法および位相シフトマスク |
JP7154572B2 (ja) * | 2018-09-12 | 2022-10-18 | Hoya株式会社 | マスクブランク、転写用マスク、及び半導体デバイスの製造方法 |
JP6756796B2 (ja) * | 2018-10-09 | 2020-09-16 | アルバック成膜株式会社 | マスクブランクス、ハーフトーンマスク、製造方法 |
JP7217620B2 (ja) * | 2018-11-22 | 2023-02-03 | アルバック成膜株式会社 | マスクブランクスおよびマスク |
KR20200145954A (ko) | 2019-06-21 | 2020-12-31 | 삼성디스플레이 주식회사 | 표시 장치 |
JP6987912B2 (ja) * | 2020-03-16 | 2022-01-05 | アルバック成膜株式会社 | マスクブランクス、位相シフトマスク、製造方法 |
JP7511067B1 (ja) | 2023-09-22 | 2024-07-04 | 株式会社エスケーエレクトロニクス | フォトマスクの製造方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW201443550A (zh) * | 2013-02-26 | 2014-11-16 | Hoya Corp | 相移光罩基底及其製造方法、相移光罩及其製造方法、與顯示裝置之製造方法 |
TW201510640A (zh) * | 2013-08-30 | 2015-03-16 | Hoya Corp | 顯示裝置製造用光罩、該光罩之製造方法、圖案轉印方法及顯示裝置之製造方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6089604B2 (ja) * | 2012-11-06 | 2017-03-08 | 大日本印刷株式会社 | 位相シフトマスクの製造方法 |
JP6324756B2 (ja) * | 2013-03-19 | 2018-05-16 | Hoya株式会社 | 位相シフトマスクブランク及びその製造方法、位相シフトマスクの製造方法、並びに表示装置の製造方法 |
JP6198238B2 (ja) * | 2013-04-17 | 2017-09-20 | アルバック成膜株式会社 | 位相シフトマスクの製造方法 |
KR101414556B1 (ko) * | 2013-12-13 | 2014-07-01 | 주식회사 피케이엘 | 평판 디스플레이 소자의 해상력 및 생산성 향상을 위한 포토 마스크 및 그 제조 방법 |
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2017
- 2017-01-27 JP JP2017013100A patent/JP2017182052A/ja active Pending
- 2017-02-24 TW TW106106563A patent/TWI718263B/zh active
- 2017-03-03 KR KR1020170027795A patent/KR20170113083A/ko not_active Application Discontinuation
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW201443550A (zh) * | 2013-02-26 | 2014-11-16 | Hoya Corp | 相移光罩基底及其製造方法、相移光罩及其製造方法、與顯示裝置之製造方法 |
TW201510640A (zh) * | 2013-08-30 | 2015-03-16 | Hoya Corp | 顯示裝置製造用光罩、該光罩之製造方法、圖案轉印方法及顯示裝置之製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JP2017182052A (ja) | 2017-10-05 |
KR20170113083A (ko) | 2017-10-12 |
TW201735161A (zh) | 2017-10-01 |
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