TWI710821B - Display device having positioning and alignment patterns - Google Patents

Display device having positioning and alignment patterns Download PDF

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Publication number
TWI710821B
TWI710821B TW108119395A TW108119395A TWI710821B TW I710821 B TWI710821 B TW I710821B TW 108119395 A TW108119395 A TW 108119395A TW 108119395 A TW108119395 A TW 108119395A TW I710821 B TWI710821 B TW I710821B
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Taiwan
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plate
pattern
lines
slits
alignment group
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TW108119395A
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Chinese (zh)
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TW202045989A (en
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黃功傑
蘇家正
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緯創資通股份有限公司
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Priority to CN201910588031.6A priority patent/CN112033281B/en
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Publication of TW202045989A publication Critical patent/TW202045989A/en

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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques

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  • General Physics & Mathematics (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

A display device and method for obtaining shift amount of the display device are provided to deal with the positioning shift of two pieces by installing two sets of patterns respectively on the pieces and obtaining the shift amount from the relative position between the two patterns. Once the two pieces are assembled, the metal layer on one piece covers most of the colored blocks on the other piece and reveals only a portion of the blocks through the slits. No block is revealed if the two pieces are fully aligned. For a misaligned assembly, the revealed blocks increase indicating larger misalignment/shift between the two assembled pieces. The number of blocks revealed in the slits is therefore used for quick and accurate evaluation of overall shift amount between the pieces.

Description

具有對位校準圖樣的面板裝置Panel device with alignment calibration pattern

本發明有關一種面板裝置,尤指一種在兩片板件上設置對位校準圖樣的面板裝置。The invention relates to a panel device, in particular to a panel device in which alignment patterns are set on two plates.

一般觸控面板或顯示面板通常是由兩層或是兩層以上的玻璃元件或電路元件堆疊起來的結構,不同層的元件在堆疊組裝時必須彼此對位才能正常運作。目前習知的作法是在其中一層元件設置第一校準部(例如一個圓圈的圖樣),在另一層元件對應的位置設置第二校準部(例如一個穿孔),當兩層元件在堆疊時,以肉眼檢查圓圈圖樣的第一校準部是否有落在第二校準部的穿孔裡(或者是否可透過穿孔看到圓圈圖樣),以判別此兩層元件是否有對位。很顯然地,此種對位校準的方式精確度不高,無法明確得知每一堆疊成品的偏移量的變化,也就無法有效進行統計製程控制(SPC),以及對製程能力進行監督。目前在品管檢查中,實務上僅能執行上述這種簡單的肉眼判斷,並無法在講求效率的前提下進行更加精確的偏移量測。相對地,若要進行統計製程控制(SPC)以及對製程能力進行監督,那麼以光學顯微鏡去作更精確的偏移量測檢查雖可達到此目的,但卻因耗時過長,往往僅能以抽檢的方式進行。Generally, a touch panel or a display panel is a structure in which two or more layers of glass elements or circuit elements are stacked, and the elements of different layers must be aligned with each other during stacking and assembly to operate normally. The current conventional method is to provide a first calibration part (such as a circle pattern) on one layer of components, and a second calibration part (such as a perforation) at a position corresponding to the other layer of components. When two layers of components are stacked, Visually check whether the first calibration part of the circle pattern falls in the perforation of the second calibration part (or whether the circle pattern can be seen through the perforation) to determine whether the two layers of components are aligned. Obviously, the accuracy of this alignment calibration method is not high, it is impossible to clearly know the change of the offset of each stacked product, and it is impossible to effectively perform statistical process control (SPC) and supervise the process capability. At present, in quality control inspections, the above-mentioned simple visual judgment can only be performed in practice, and more accurate offset measurement cannot be carried out on the premise of stressing efficiency. In contrast, if statistical process control (SPC) and process capability are to be monitored, a more accurate offset measurement inspection with an optical microscope can achieve this goal, but because it takes too much time, often it can only Carried out by random inspection.

本發明的實施例中提供了一種具有對位校準圖樣的面板裝置以解決上述問題。The embodiment of the present invention provides a panel device with alignment pattern to solve the above-mentioned problem.

本發明的實施例提供了一種具有對位校準圖樣的面板裝置,包含有第一板件、第二板件以及第一對位組。第二板件與第一板件對位疊合以形成面板裝置。第一對位組包含第一圖樣以及第二圖樣,第一圖樣設置於第一板件的一角落,第一圖樣包含沿一第一方向等間隔分佈的複數個線條,第二圖樣設置於第二板件對應第一板件的角落處,第二圖樣包含沿第一方向等間隔分佈的複數個狹縫。當第二板件與第一板件疊合時,複數個線條沿第一方向於複數個狹縫露出的數量決定第二板件相對第一板件沿第一方向所產生的偏移量。The embodiment of the present invention provides a panel device with an alignment calibration pattern, which includes a first plate, a second plate, and a first alignment group. The second board is aligned and overlapped with the first board to form a panel device. The first alignment group includes a first pattern and a second pattern. The first pattern is arranged on a corner of the first plate, the first pattern includes a plurality of lines distributed at equal intervals along a first direction, and the second pattern is arranged on the first The two plates correspond to the corners of the first plate, and the second pattern includes a plurality of slits distributed at equal intervals along the first direction. When the second plate is overlapped with the first plate, the number of lines exposed in the plurality of slits along the first direction determines the offset of the second plate relative to the first plate along the first direction.

根據本發明的實施例,其中第一板件的周圍具有不透光的一深色塗層,複數個線條為在該深色塗層上的白色線條,且複數個白色線條沿第一方向的寬度相等於複數個白色線條彼此之間的間隔;其中第二板件的周圍具有金屬塗層,複數個狹縫為金屬塗層上的鏤空狹縫。According to an embodiment of the present invention, a dark coating that does not transmit light is provided around the first plate, the plurality of lines are white lines on the dark coating, and the plurality of white lines run along the first direction The width is equal to the interval between the plurality of white lines; wherein the second plate is surrounded by a metal coating, and the plurality of slits are hollow slits on the metal coating.

根據本發明的實施例,其中複數個線條的數量為Nw,複數個狹縫的數量為Ns,且Nw = Gb/R+2-Gs以及Ns = Gb/R+1-Gs。其中Gb為相鄰兩個線條的間隔,Gs為相鄰兩個狹縫的間隔,R為第二板件相對第一板件產生的偏移量的設定解析度。第一圖樣的等效長度為Lw,且Lw = 2Gb 2/R-2GbGs+3Gb。該第一圖樣的線條節距為2Gb,第二圖樣的狹縫節距為Ps,且Ps = 2Gb-R。 According to the embodiment of the present invention, the number of the plurality of lines is Nw, the number of the plurality of slits is Ns, and Nw=Gb/R+2-Gs and Ns=Gb/R+1-Gs. Where Gb is the interval between two adjacent lines, Gs is the interval between two adjacent slits, and R is the setting resolution of the offset of the second plate relative to the first plate. The equivalent length of the first pattern is Lw, and Lw = 2Gb 2 /R-2GbGs+3Gb. The line pitch of the first pattern is 2Gb, the slit pitch of the second pattern is Ps, and Ps=2Gb-R.

根據本發明的實施例,其中第一對位組由複數個子區段組成,複數個子區段沿垂直於第一方向的方向橫向排列,其中任一子區段內含的第一圖樣中的首二個線條與前一子區段內含的第一圖樣中的末二個線條為同樣的兩個線條,任一子區段內含的第二圖樣中的首二個狹縫與前一子區段內含的第二圖樣中的末二個狹縫為同樣的兩個狹縫。According to an embodiment of the present invention, the first alignment group is composed of a plurality of sub-sections, and the plurality of sub-sections are arranged horizontally along a direction perpendicular to the first direction, and the first pattern contained in any sub-section is The two lines are the same two lines as the last two lines in the first pattern contained in the previous subsection. The first two slits in the second pattern contained in any subsection are the same as the previous one. The last two slits in the second pattern contained in the section are the same two slits.

根據本發明的實施例,其中第一對位組另包含第三圖樣以及第四圖樣,第三圖樣設置於第一板件的該角落,第三圖樣包含沿第一方向等間隔分佈的複數個進位線條,第四圖樣設置於第二板件對應第一板件的該角落處,第四圖樣包含沿第一方向等間隔分佈的複數個進位狹縫。其中當第二板件與第一板件疊合時,複數個進位線條沿第一方向於複數個進位狹縫露出的數量決定第二板件相對第一板件沿第一方向所產生的進位偏移量。其中Gb’為相鄰兩個進位線條的間隔,Gs’為相鄰兩個進位狹縫的間隔,R’為第二板件相對第一板件產生的偏移量的進位解析度,且Gb’大於Gb,Gs’大於Gs,R’大於R。According to an embodiment of the present invention, the first alignment group further includes a third pattern and a fourth pattern, the third pattern is disposed at the corner of the first plate, and the third pattern includes a plurality of patterns distributed at equal intervals along the first direction. The carry line, the fourth pattern is arranged at the corner of the second plate corresponding to the first plate, and the fourth pattern includes a plurality of carry slits distributed at equal intervals along the first direction. When the second plate is superimposed with the first plate, the number of carry lines exposed in the plurality of carry slits along the first direction determines the carry generated by the second plate relative to the first plate in the first direction Offset. Where Gb' is the interval between two adjacent carry lines, Gs' is the interval between two adjacent carry slits, R'is the carry resolution of the offset of the second plate relative to the first plate, and Gb 'Greater than Gb, Gs' greater than Gs, R'greater than R.

根據本發明的實施例,該面板裝置另包含第二對位組,包含第一圖樣以及第二圖樣,第二對位組設置於第一板件以及第二板件的該角落上異於第一對位組的位置,第二對位組的第一圖樣包含沿第二方向等間隔分佈的複數個線條,第二對位組的第二圖樣包含沿第二方向等間隔分佈的複數個狹縫。當第二板件與第一板件疊合時,第二對位組的複數個線條沿第二方向於第二對位組的複數個狹縫露出的數量決定第二板件相對第一板件沿第二方向所產生的偏移量。其中第一方向垂直於第二方向。According to an embodiment of the present invention, the panel device further includes a second alignment group including a first pattern and a second pattern, and the second alignment group is disposed on the corner of the first plate and the second plate different from that of the first plate. The position of a pair of bit groups, the first pattern of the second bit group includes a plurality of lines equally spaced along the second direction, and the second pattern of the second bit group includes a plurality of narrow lines equally spaced along the second direction Sew. When the second plate is overlapped with the first plate, the number of lines of the second alignment group exposed in the plurality of slits of the second alignment group along the second direction determines the number of the second plate relative to the first plate The offset of the piece in the second direction. The first direction is perpendicular to the second direction.

本發明的實施例的面板裝置另包含第三對位組,包含第一圖樣以及第二圖樣,第三對位組設置於第一板件以及第二板件相對角落的對角角落上,第三對位組的第一圖樣包含沿第一方向等間隔分佈的複數個線條,第三對位組的第二圖樣包含沿該第一方向等間隔分佈的複數個狹縫。The panel device of the embodiment of the present invention further includes a third alignment group including a first pattern and a second pattern. The third alignment group is disposed on the opposite corners of the first plate and the second plate. The first pattern of the three alignment group includes a plurality of lines distributed at equal intervals along the first direction, and the second pattern of the third alignment group includes a plurality of slits distributed at equal intervals along the first direction.

根據本發明的實施例,其中面板裝置為顯示面板裝置或觸控面板裝置。According to an embodiment of the present invention, the panel device is a display panel device or a touch panel device.

本發明的實施例另提供了一種用來對面板裝置取得對位校準偏移量的方法,包含步驟:將第一對位組的第一圖樣設置於第一板件的一角落,將第一對位組的第二圖樣設置於第二板件對應第一板件的角落處,其中第一圖樣包含沿第一方向等間隔分佈的複數個線條,第二圖樣包含沿第一方向等間隔分佈的複數個狹縫;將第二板件與第一板件對位疊合以形成一面板裝置;以及當第二板件與第一板件疊合時,依據複數個線條沿該第一方向於複數個狹縫露出的數量決定第二板件相對第一板件沿第一方向所產生的偏移量。The embodiment of the present invention also provides a method for obtaining the alignment offset of the panel device, which includes the steps of: arranging the first pattern of the first alignment group on a corner of the first plate, and placing the first The second pattern of the alignment group is arranged at the corner of the second plate corresponding to the first plate, wherein the first pattern includes a plurality of lines distributed at equal intervals along the first direction, and the second pattern includes the same intervals distributed along the first direction A plurality of slits; the second plate and the first plate are aligned and overlapped to form a panel device; and when the second plate and the first plate are overlapped, the plurality of lines are along the first direction The number exposed in the plurality of slits determines the offset amount of the second plate relative to the first plate along the first direction.

根據本發明的實施例所揭露的方法,其中第一對位組由複數個子區段組成,該方法包含:將複數個子區段沿垂直於第一方向的方向橫向排列,其中任一子區段內含的第一圖樣中的首二個線條與前一子區段內含的第一圖樣中的末二個線條為同樣的兩個線條,任一子區段內含的第二圖樣中的首二個狹縫與前一子區段內含的第二圖樣中的末二個狹縫為同樣的兩個狹縫。According to the method disclosed in the embodiment of the present invention, the first alignment group is composed of a plurality of sub-segments, and the method includes: arranging the plurality of sub-segments horizontally in a direction perpendicular to the first direction, wherein any sub-segment The first two lines in the first pattern contained and the last two lines in the first pattern contained in the previous subsection are the same two lines. The second pattern contained in any subsection is the same The first two slits and the last two slits in the second pattern contained in the previous subsection are the same two slits.

本發明的實施例所揭露的方法另包含步驟:將第一對位組的第三圖樣設置於第一板件的角落,將第一對位組的第四圖樣設置於第二板件對應第一板件的角落處,其中第三圖樣包含沿第一方向等間隔分佈的複數個進位線條,第四圖樣包含沿第一方向等間隔分佈的複數個進位狹縫;當第二板件與第一板件疊合時,依據複數個進位線條沿第一方向於複數個進位狹縫露出的數量決定第二板件相對第一板件沿第一方向所產生的進位偏移量;其中Gb’為相鄰兩個進位線條的間隔,Gs’為相鄰兩個進位狹縫的間隔,R’為第二板件相對第一板件產生的偏移量的進位解析度,且Gb’大於Gb,Gs’大於Gs,R’大於R。The method disclosed in the embodiment of the present invention further includes the steps of: setting the third pattern of the first alignment group on the corner of the first plate, and setting the fourth pattern of the first alignment group on the second plate corresponding to the first At the corners of a plate, the third pattern includes a plurality of carry lines equally spaced along the first direction, and the fourth pattern includes a plurality of carry slits equally spaced along the first direction; when the second plate and the first When a plate is superimposed, the carry offset of the second plate relative to the first plate in the first direction is determined according to the number of carry lines exposed in the plurality of carry slits along the first direction; where Gb' Is the interval between two adjacent carry lines, Gs' is the interval between two adjacent carry slits, R'is the carry resolution of the offset of the second plate relative to the first plate, and Gb' is greater than Gb , Gs' is greater than Gs, R'is greater than R.

本發明的實施例所揭露的方法另包含步驟:將第二對位組設置於第一板件以及第二板件的角落上異於第一對位組的位置,其中第二對位組的第一圖樣包含沿第二方向等間隔分佈的複數個線條,第二對位組的第二圖樣包含沿第二方向等間隔分佈的複數個狹縫;以及當第二板件與第一板件疊合時,依據第二對位組的複數個線條沿第二方向於第二對位組的複數個狹縫露出的數量決定第二板件相對第一板件沿第二方向所產生的偏移量。其中第一方向垂直於第二方向。The method disclosed in the embodiment of the present invention further includes the step of: arranging the second alignment group on the first plate and the corners of the second plate at a position different from the first alignment group, wherein the second alignment group The first pattern includes a plurality of lines equally spaced along the second direction, the second pattern of the second alignment group includes a plurality of slits equally spaced along the second direction; and when the second plate and the first plate When overlapping, the deviation of the second plate relative to the first plate in the second direction is determined according to the number of lines of the second alignment group exposed in the plurality of slits of the second alignment group along the second direction. Shift. The first direction is perpendicular to the second direction.

本發明的實施例所揭露的方法另包含步驟:將第三對位組設置於第一板件以及第二板件相對角落的對角角落上,其中第三對位組的第一圖樣包含沿第一方向等間隔分佈的複數個線條,第三對位組的第二圖樣包含沿第一方向等間隔分佈的複數個狹縫。The method disclosed in the embodiment of the present invention further includes the step of: arranging the third alignment group on the opposite corners of the first plate and the second plate, wherein the first pattern of the third alignment group includes the edge A plurality of lines distributed at equal intervals in the first direction, and the second pattern of the third alignment group includes a plurality of slits distributed at equal intervals in the first direction.

本發明所揭露的面板裝置以及對面板裝置取得對位校準偏移量的方法,在生產線上實際組裝堆疊時,即可以快速得知對位精確度以及測量貼合機器的貼合能力。若是產生誤差也可以迅速判讀,以數值化的方式得知偏移量,而據以即時調整生產機台以回復到可容許的對位精確度。The panel device and the method for obtaining the alignment offset of the panel device disclosed in the present invention can quickly know the alignment accuracy and measure the bonding ability of the laminating machine when actually assembling and stacking on the production line. If there is an error, it can be quickly interpreted, and the offset can be obtained numerically, and the production machine can be adjusted in real time to restore the allowable alignment accuracy.

在說明書及後續的申請專利範圍當中使用了某些詞彙來指稱特定的元件。所屬領域中具有通常知識者應可理解,製造商可能會用不同的名詞來稱呼同一個元件。本說明書及後續的申請專利範圍並不以名稱的差異來作為區分元件的方式,而是以元件在功能上的差異來作為區分的準則。在通篇說明書及後續的請求項當中所提及的「包含」係為一開放式的用語,故應解釋成「包含但不限定於」。此外,「耦接/連接」一詞在此係包含任何直接及間接的電氣或機械連接手段。因此,若文中描述一第一裝置耦接/連接於一第二裝置,則代表該第一裝置可直接電氣/機械連接於該第二裝置,或透過其他裝置或連接手段間接地電氣/機械連接至該第二裝置。In the specification and subsequent patent applications, certain words are used to refer to specific elements. Those with ordinary knowledge in the field should understand that manufacturers may use different terms to refer to the same component. The scope of this specification and subsequent patent applications does not use differences in names as a way to distinguish elements, but uses differences in functions of elements as a criterion for distinguishing. The "include" mentioned in the entire manual and subsequent requests is an open term, so it should be interpreted as "include but not limited to". In addition, the term "coupling/connection" here includes any direct and indirect electrical or mechanical connection means. Therefore, if the text describes that a first device is coupled/connected to a second device, it means that the first device can be directly electrically/mechanically connected to the second device, or indirectly electrically/mechanically connected through other devices or connecting means To the second device.

請參考第1圖,第1圖為本發明的面板裝置的一實施例的示意圖。面板裝置5包含了彼此疊合形成的一第一板件51以及一第二板件52。面板裝置5可以是觸控面板裝置或是顯示面板裝置,當面板裝置5是觸控面板裝置時,第一板件51以及第二板件52可以是觸控面板中的透明電極層,當面板裝置5是顯示面板裝置時,第一板件51以及第二板件52可以是顯示面板中任兩個相鄰且需要對位的板型元件(例如彩色濾光片、配向膜、液晶層…等),但本發明不以此為限,對任何兩個元件,透過本發明的對位組的圖樣以進行對位以及偏移量判讀,都屬於本發明的範圍。Please refer to Figure 1. Figure 1 is a schematic diagram of an embodiment of the panel device of the present invention. The panel device 5 includes a first plate 51 and a second plate 52 formed by overlapping with each other. The panel device 5 can be a touch panel device or a display panel device. When the panel device 5 is a touch panel device, the first plate 51 and the second plate 52 can be transparent electrode layers in the touch panel. When the device 5 is a display panel device, the first plate 51 and the second plate 52 can be any two adjacent plate elements in the display panel that need to be aligned (such as color filters, alignment films, liquid crystal layers... Etc.), but the present invention is not limited to this. For any two components, the alignment and offset determination through the pattern of the alignment group of the present invention are all within the scope of the present invention.

以下進一步說明本發明的對位校準的方式。請一併參考第2圖以及第3圖,其中第2圖為第一圖樣的一實施例的示意圖,第3圖為第二圖樣的一實施例的示意圖。面板裝置5另外包含了第一對位組1,包含第一圖樣11以及第二圖樣12,其中第一圖樣11設置於第一板件51的一角落511,第二圖樣12則設置於第二板件52對應第一板件51角落511的一角落521處,而本發明即使用第一圖樣11以及第二圖樣12兩組具有不同節距(pitch)的刻度系統,透過彼此重疊後由刻度的判讀以快速精確得知彼此疊合後的第一板件51以及第二板件52之間的相對位移量。The following further describes the alignment calibration method of the present invention. Please refer to FIG. 2 and FIG. 3 together, where FIG. 2 is a schematic diagram of an embodiment of the first pattern, and FIG. 3 is a schematic diagram of an embodiment of the second pattern. The panel device 5 additionally includes a first alignment set 1, including a first pattern 11 and a second pattern 12. The first pattern 11 is arranged on a corner 511 of the first plate 51, and the second pattern 12 is arranged on the second The plate 52 corresponds to a corner 521 of the corner 511 of the first plate 51, and the present invention uses two sets of scale systems with different pitches of the first pattern 11 and the second pattern 12. Interpretation of, to quickly and accurately know the relative displacement between the first plate 51 and the second plate 52 after being superimposed on each other.

舉例而言,若面板裝置5為觸控面板裝置,則第一板件51的周圍具有不透光的一深色塗層515,而第一圖樣11則設置在角落511不透光的深色塗層515上。第二板件52為透明電極層,於周圍具有一金屬塗層525,而第二圖樣12則設置在角落521的金屬塗層525上。如第2圖以及第3圖所示,第一圖樣11包含了沿Y方向(第一方向)等間隔分佈的複數個線條111,例如在深色塗層515上的白色線條。每一個線條111沿著Y方向的寬度與兩相鄰線條111之間的間隔都是Gb,而第一圖樣11的節距則為2Gb,其中寬度Gb以及間隔Gb取決於製程的能力。第二圖樣12包含了沿Y方向(第一方向)等間隔分佈的複數個狹縫121,例如在不透明的金屬塗層525上鏤刻出來的鏤空狹縫。兩相鄰狹縫121之間沿著Y方向的間隔為Gs。為了使兩個板件之間不同的偏移量能由第一圖樣11以及第二圖樣12之間的位置對應關係精確地呈現出來,線條111的間隔Gb與狹縫121的間隔Gs並不相同,而當第二板件12與第一板件11疊合時,複數個線條111沿Y方向於複數個狹縫121露出的數量就可決定第二板件12相對第一板件11沿Y方向所產生的偏移量。For example, if the panel device 5 is a touch panel device, an opaque dark coating 515 is provided around the first plate 51, and the first pattern 11 is set at the corner 511 of an opaque dark coating. Coating 515 on. The second plate 52 is a transparent electrode layer with a metal coating 525 around it, and the second pattern 12 is disposed on the metal coating 525 at the corner 521. As shown in FIGS. 2 and 3, the first pattern 11 includes a plurality of lines 111 distributed at equal intervals along the Y direction (first direction), such as white lines on the dark coating 515. The width of each line 111 along the Y direction and the interval between two adjacent lines 111 are Gb, and the pitch of the first pattern 11 is 2Gb, where the width Gb and the interval Gb depend on the process capability. The second pattern 12 includes a plurality of slits 121 distributed at equal intervals along the Y direction (first direction), such as hollow slits carved out on the opaque metal coating 525. The interval between two adjacent slits 121 along the Y direction is Gs. In order that the different offsets between the two plates can be accurately represented by the positional correspondence between the first pattern 11 and the second pattern 12, the interval Gb of the line 111 is different from the interval Gs of the slit 121 , And when the second plate 12 and the first plate 11 are superimposed, the number of lines 111 exposed in the plurality of slits 121 along the Y direction can determine the second plate 12 relative to the first plate 11 along the Y The offset caused by the direction.

此處需要說明設定解析度R(或精準度),也就是設定能夠判別到多精細的偏移量。例如若要讓複數個狹縫121多露出一個線條111代表多了10um的偏移量,此處的解析度R即為10um,並且R的數值越小,代表解析度越高。關於第二圖樣12的節距Ps可如下得知:由設定解析度R以及由製程能力所決定的線條111寬度/間隔Gb,若在某一個偏移狀態中,第二圖樣12的第一個狹縫121上緣與第一圖樣11的第二個節距下緣對齊,而當兩板件彼此進一步產生位移R而到下一個偏移狀態時,第二圖樣12的第二個狹縫121的上緣必須是第一圖樣11的第三個節距的下緣,因此2Gb=Ps+R,而: Ps=2Gb-R。 Here you need to explain the setting resolution R (or accuracy), that is, how fine the offset can be determined. For example, if one more line 111 is required to expose a plurality of slits 121 to represent an offset of 10um, the resolution R here is 10um, and the smaller the value of R, the higher the resolution. The pitch Ps of the second pattern 12 can be known as follows: the line 111 width/interval Gb determined by the set resolution R and the process capability, if in a certain offset state, the first pattern of the second pattern 12 The upper edge of the slit 121 is aligned with the lower edge of the second pitch of the first pattern 11, and when the two plates are further displaced R from each other to the next offset state, the second slit 121 of the second pattern 12 The upper edge of must be the lower edge of the third pitch of the first pattern 11, so 2Gb=Ps+R, and: Ps=2Gb-R.

根據以上的製程能力(Gb, Gs)以及解析度(R)的需求設定,可得出所需使用白色的線條111的數量為: Nw=Gb/R+2-Gs; 而相對應鏤空的狹縫121的數量則為 Ns=Nw-1=Gb/R+1-Gs; 由上述線條111的數量,可知第一圖樣11的等效長度為Lw,且 Lw = (Nw+(Nw-1))Gb = (2Nw-1)Gb =2Gb 2/R-2GbGs+3Gb; According to the above process capability (Gb, Gs) and resolution (R) requirements setting, the number of white lines 111 required to be used is: Nw=Gb/R+2-Gs; and the corresponding hollowed-out narrow The number of slits 121 is Ns=Nw-1=Gb/R+1-Gs; from the number of lines 111 above, it can be seen that the equivalent length of the first pattern 11 is Lw, and Lw = (Nw+(Nw-1)) Gb = (2Nw-1)Gb = 2Gb 2 /R-2GbGs+3Gb;

最後根據Lw所計算的結果以在第一板件51以及第二板件52上設置適當大小的第一對位組1。Finally, according to the calculated result of Lw, an appropriate size first alignment group 1 is set on the first plate 51 and the second plate 52.

請參考第4圖至第6圖,其係為第二板件52與第一板件51疊合後具有不同的偏移量,而由第一對位組1的線條111於狹縫121露出的數量來判讀第二板件52相對第一板件51沿所產生的偏移量的示意圖。當第二板件52與第一板件51的準確對位疊合(或在合理誤差內的對位)時,則如第4圖所示,沒有任何白色的線條111在狹縫121中露出,也就是複數個狹縫121均對到線條111之間的深色塗層515,此時即可判讀第二板件52相對第一板件51沿Y方向所產生的偏移量為0um。當第二板件52與第一板件51產生偏移時,如第5圖所示,由底部的狹縫121起,約7至8個白色的線條111在狹縫121中露出,而其他的狹縫121仍對到線條111之間的深色塗層515,此時即可判讀第二板件52相對第一板件51沿Y方向的相反方向所產生的偏移量為70-80um。如第6圖所示,由頂部的狹縫121起,約13至14個白色的線條111在狹縫121中露出,而其他的狹縫121仍對到線條111之間的深色塗層515,此時即可判讀第二板件52相對第一板件51沿Y方向所產生的偏移量為130-140um。以上圖示中的偏移量數字以及方向僅為本發明用來說明的其中一種實施方式,本發明不以此為限。Please refer to Figures 4 to 6, which is that the second plate 52 and the first plate 51 have different offsets after being superimposed, and the lines 111 of the first alignment group 1 are exposed in the slit 121 A schematic diagram of the deviation of the second plate 52 relative to the first plate 51 by the number of φ. When the accurate alignment of the second plate 52 and the first plate 51 is superimposed (or the alignment within a reasonable error), as shown in Figure 4, there is no white line 111 exposed in the slit 121 , That is, the plurality of slits 121 are aligned with the dark coating 515 between the lines 111, at this time, it can be judged that the offset of the second plate 52 relative to the first plate 51 along the Y direction is 0um. When the second plate 52 is offset from the first plate 51, as shown in Figure 5, from the slit 121 at the bottom, about 7 to 8 white lines 111 are exposed in the slit 121, and the other The slit 121 is still facing the dark coating 515 between the lines 111. At this time, it can be judged that the offset of the second plate 52 relative to the first plate 51 in the opposite direction along the Y direction is 70-80um. . As shown in Figure 6, from the top slit 121, about 13 to 14 white lines 111 are exposed in the slit 121, while the other slits 121 still face the dark coating 515 between the lines 111 At this time, it can be judged that the offset of the second plate 52 relative to the first plate 51 along the Y direction is 130-140um. The offset number and direction in the above figure are only one of the embodiments used to illustrate the present invention, and the present invention is not limited thereto.

請參考第7圖。依據上述的說明以及計算的公式,於本發明的一實施例中,可設計第一圖樣11的線條111的寬度/間隔Gb為200um,第二圖樣12的狹縫121的間隔Gs為340um,且狹縫121的寬度為50um,設定解析度R為10um,以獲得一個具有17個線條111排列而成的第一圖樣11以及16個狹縫121排列而成的第二圖樣12,且即等效長度約為6.6mm,解析度10um,可量測總長為150um的第一對位組。Please refer to Figure 7. According to the above description and calculation formula, in an embodiment of the present invention, the width/interval Gb of the line 111 of the first pattern 11 can be designed to be 200um, and the gap Gs of the slit 121 of the second pattern 12 is 340um, and The width of the slit 121 is 50 um, and the resolution R is set to 10 um to obtain a first pattern 11 with 17 lines 111 arranged and a second pattern 12 with 16 slits 121 arranged, which is equivalent The length is about 6.6mm, the resolution is 10um, and the first alignment group with a total length of 150um can be measured.

請參考第1圖。於本發明的一實施例中,可在角落511,521另外設置一第二對位組2,第二對位組2所包含的第一圖樣以及第二圖樣的內容與第一對位組1實質上相同,此處不再贅述。如前所述,第一對位組1的第一圖樣11以及第二圖樣12沿著Y方向(第一方向)排列,而第二對位組2的第一圖樣以及第二圖樣則沿著X方向(第二方向)排列,於此實施例中X方向與Y方向彼此垂直,但不以此為限。如此一來,設置有第一對位組1以及第二對位組2的面板裝置5,在第一板件51以及第二板件52彼此對位疊合時,則可以由第一對位組1得知二板件沿Y方向的偏移量,並由第二對位組2得知二板件沿X方向的偏移量。Please refer to Figure 1. In an embodiment of the present invention, a second alignment group 2 may be additionally provided at the corners 511 and 521. The content of the first pattern and the second pattern included in the second alignment group 2 is substantially the same as that of the first alignment group 1. It is the same and will not be repeated here. As mentioned above, the first pattern 11 and the second pattern 12 of the first alignment group 1 are arranged along the Y direction (first direction), and the first pattern and the second pattern of the second alignment group 2 are arranged along the The X direction (second direction) is arranged. In this embodiment, the X direction and the Y direction are perpendicular to each other, but it is not limited thereto. In this way, the panel device 5 provided with the first alignment set 1 and the second alignment set 2 can be configured by the first alignment set when the first plate 51 and the second plate 52 are aligned and overlapped with each other. Group 1 knows the offset of the two plates in the Y direction, and the second alignment group 2 knows the offset of the two plates in the X direction.

請繼續參考第1圖。於本發明的另一實施例中,另可在面板裝置5相對角落511,521的對角角落512,522另外設置一第三對位組3以及一第四對位組4,其中第三對位組3所包含的第一圖樣以及第二圖樣的內容以及排列方向與第一對位組1實質上相同,第四對位組4所包含的第一圖樣以及第二圖樣的內容以及排列方向與第二對位組2實質上相同,此處不再贅述。在面板裝置5的兩個對角角落511,521,512,522(或第三個角落、第四個角落)各設置對位組,即可進一步得知第一板件51以及第二板件52彼此對位疊合時的相對旋轉的偏移量。Please continue to refer to Figure 1. In another embodiment of the present invention, a third alignment group 3 and a fourth alignment group 4 may be additionally provided at the diagonal corners 512, 522 of the opposite corners 511, 521 of the panel device 5, wherein the third alignment group 3 is The content and arrangement direction of the first pattern and the second pattern included are substantially the same as those of the first alignment group 1. The content and arrangement direction of the first pattern and the second pattern included in the fourth alignment group 4 are the same as those of the second pair. The bit group 2 is substantially the same, and will not be repeated here. Alignment groups are set at the two diagonal corners 511, 521, 512, 522 (or the third corner and the fourth corner) of the panel device 5, and then the first plate 51 and the second plate 52 are aligned and overlapped with each other. The relative rotation offset at time.

若受限於製程能力,使得在板件上所能設置的線條111的寬度/間隔Gb過大,而又需要高精度的解析度(即設定解析度R遠小於Gb),則會使得第一圖樣11的等效長度Lw過長。例如若Gb=150um,Gs=20um,而R=1um,則Lw約為4.5cm。在此種環境下,本發明的一實施例中可將一段長的對位組進行切割重排列以減少單一方向的尺寸。請參考第8圖以及第9圖,其係為本發明的對位組的另一實施例的示意圖。當對位組7的等效長度Lw過大而難以直接應用於面板裝置上時,可將對位組7切割為複數個子區段71~77(此處切割的子區段數量僅為說明示例),並且將子區段71~77沿X方向橫向排列,並且在每一個子區段71~77的兩端分別各加上其相鄰子區段71~77的前一個/次一個線條/狹縫,也就是任一子區段71~77內含的首二個線條/狹縫與前一子區段71~77內含的末二個線條/狹縫為同樣的兩個線條/狹縫,例如,在第9圖中,端部722為子區段72原本的末端,端部731為子區段73的首端,而在切割排列之後,於新的對位組7’中,子區段72的末端加上端部731,子區段73的首端加上端部722(其他端部732, 741…也以相同的方式加上),這樣當兩板件的偏移量超過某一個子區段一端的線條/狹縫時,仍有前一個/次一個子區段的線條/狹縫可作為參考進行判斷,並且也將單一方向過長的對位組重新排列為合理尺寸的對位組。If limited by the process capability, the width/interval Gb of the line 111 that can be set on the board is too large, and high-precision resolution is required (that is, the set resolution R is much smaller than Gb), then the first pattern The equivalent length Lw of 11 is too long. For example, if Gb=150um, Gs=20um, and R=1um, Lw is about 4.5cm. Under such circumstances, in an embodiment of the present invention, a long alignment group can be cut and rearranged to reduce the size in a single direction. Please refer to FIGS. 8 and 9, which are schematic diagrams of another embodiment of the alignment set of the present invention. When the equivalent length Lw of the alignment group 7 is too large to be directly applied to the panel device, the alignment group 7 can be cut into a plurality of sub-sections 71 to 77 (the number of sub-sections cut here is only an illustrative example) , And arrange the subsections 71~77 horizontally along the X direction, and add the previous/next line/narrow of the adjacent subsections 71~77 to the two ends of each subsection 71~77. Slit, that is, the first two lines/slits contained in any subsection 71~77 and the last two lines/slits contained in the previous subsection 71~77 are the same two lines/slits For example, in Figure 9, the end 722 is the original end of the sub-segment 72, and the end 731 is the head of the sub-segment 73. After cutting and arranging, in the new alignment group 7', the end Add end 731 to the end of section 72, add end 722 to the head of subsection 73 (other ends 732, 741... are also added in the same way), so that when the offset of the two plates exceeds a certain When there is a line/slit at one end of a subsection, there are still lines/slits of the previous/next subsection that can be used as a reference for judgment, and the alignment group that is too long in a single direction is rearranged into a pair of reasonable size. Bit group.

請參考第10圖以及第11圖,其係為本發明的第一對位組的另一實施例的示意圖。為了能夠具有取得大範圍偏移量,同時又維持高解析度,於第一對位組1’中另包含一第三圖樣13以及一第四圖樣14,同樣分別設置於第一板件51以及第二板件52的角落511,521。第三圖樣13包含沿Y方向等間隔Gb’分佈的複數個進位線條131,第四圖樣14包含沿Y方向等間隔Gs’分佈的複數個進位狹縫141,其中第三圖樣13的間隔Gb’大於第一圖樣11的間隔Gb,第四圖樣14的間隔Gs’大於第二圖樣12的間隔Gs,且第三圖樣13與第四圖樣14的解析度R’數值大於第一圖樣11與第二圖樣12的解析度R數值(也就是第三圖樣13與第四圖樣14具有相對低解析度)。當兩板件彼此疊合時,複數個進位線條131沿Y方向於複數個進位狹縫141露出的數量同樣決定兩板件沿Y方向所產生的進位偏移量。由於相對而言,第一圖樣11與第二圖樣12為高解析度R與小量測範圍(量測範圍為Gb)的組合,第三圖樣13與第四圖樣14為低解析度R’與大量測範圍(量測範圍為Gb’)的組合,因此可設置為當第一圖樣11與第二圖樣12的偏移量超過其量測範圍後,則於第三圖樣13與第四圖樣14產生第一段偏移量。這樣一來,透過不同的圖樣的組合,使對位組可以同時具有高解析度以及大範圍的偏移量量測能力。Please refer to FIG. 10 and FIG. 11, which are schematic diagrams of another embodiment of the first alignment group of the present invention. In order to achieve a wide range of offset while maintaining high resolution, a third pattern 13 and a fourth pattern 14 are also included in the first alignment group 1', which are also provided on the first plate 51 and The corners of the second plate 52 are 511,521. The third pattern 13 includes a plurality of carry lines 131 distributed at equal intervals Gb' along the Y direction, and the fourth pattern 14 includes a plurality of carry slits 141 distributed at equal intervals Gs' along the Y direction, wherein the intervals of the third pattern 13 are Gb' Is greater than the interval Gb of the first pattern 11, the interval Gs' of the fourth pattern 14 is greater than the interval Gs of the second pattern 12, and the resolution R'of the third pattern 13 and the fourth pattern 14 is greater than that of the first pattern 11 and the second pattern. The resolution R value of the pattern 12 (that is, the third pattern 13 and the fourth pattern 14 have relatively low resolution). When the two plates are superimposed on each other, the number of carry lines 131 exposed in the plurality of carry slits 141 along the Y direction also determines the carry offset of the two plates along the Y direction. In relative terms, the first pattern 11 and the second pattern 12 are a combination of a high resolution R and a small measurement range (the measurement range is Gb), and the third pattern 13 and the fourth pattern 14 are a combination of low resolution R'and A combination of a large number of measurement ranges (the measurement range is Gb'), so it can be set to when the offset between the first pattern 11 and the second pattern 12 exceeds the measurement range, the third pattern 13 and the fourth pattern 14 Generate the first segment offset. In this way, through the combination of different patterns, the alignment group can simultaneously have high resolution and a wide range of offset measurement capabilities.

請參考第12圖,其係為本發明一種用來對面板裝置取得對位校準偏移量的方法的流程圖,包含步驟:Please refer to Fig. 12, which is a flow chart of a method for obtaining the alignment offset of a panel device according to the present invention, including steps:

步驟202:  於一第一板件的一角落設置第一對位組的一第一圖樣,於一第二板件對應的一角落設置第一對位組的一第二圖樣;Step 202: Set a first pattern of the first alignment group at a corner of a first plate, and set a second pattern of the first alignment group at a corresponding corner of a second plate;

步驟204:  將該第二板件與該第一板件對位疊合以形成一面板裝置;Step 204: aligning and stacking the second plate and the first plate to form a panel device;

步驟206:  依據複數個線條於複數個狹縫露出的數量決定該第二板件相對該第一板件所產生的偏移量。Step 206: Determine the offset of the second plate relative to the first plate according to the number of lines exposed in the slits.

於步驟202中,其中該第一圖樣包含沿一第一方向等間隔分佈的複數個線條,該第二圖樣包含沿該第一方向等間隔分佈的複數個狹縫,亦可另外設置第二對位組,以及在對角角落設置第三對位組以及第四對位組,其具體的結構細節與前述實施例相同,此處不再贅述。In step 202, the first pattern includes a plurality of lines equally spaced along a first direction, the second pattern includes a plurality of slits equally spaced along the first direction, and a second pair of lines may be additionally provided. The bit group, and the third and fourth alignment groups are arranged at the diagonal corners. The specific structure details are the same as those in the foregoing embodiment, and will not be repeated here.

本發明的面板裝置以及對面板裝置取得對位校準偏移量的方法,應用在兩個板件貼合時的對位公差,分別在兩層板件上各設置上不同的圖樣,利用圖樣間的變化來判斷板件的偏移量。當板件層疊起來時,其中一板件的金屬層遮住大部分線條,僅局的部線條會在金屬層上的狹縫中露出。若完全對位重疊,則狹縫中完全不會露出線條。當沿某一方向偏移時,會逐漸開始出現線條,並且數量越多則偏移量越大,由此依據狹縫中露出的線條數量快速準確地判斷兩板件疊合後的偏移量。 以上所述僅為本發明之較佳實施例,凡依本發明申請專利範圍所做之均等變化與修飾,皆應屬本發明之涵蓋範圍。 The panel device and the method for obtaining the alignment offset of the panel device of the present invention are applied to the alignment tolerance when two plates are attached, and different patterns are set on the two layers of plates respectively, and the pattern is used To determine the offset of the plate. When the plates are stacked, the metal layer of one of the plates covers most of the lines, and only the partial lines will be exposed in the slits on the metal layer. If they are completely aligned and overlapped, no lines will be exposed in the slit. When shifting in a certain direction, lines will gradually begin to appear, and the more the number, the greater the offset, so according to the number of lines exposed in the slit, the offset of the two plates after being overlapped can be quickly and accurately determined . The foregoing descriptions are only preferred embodiments of the present invention, and all equivalent changes and modifications made in accordance with the scope of the patent application of the present invention shall fall within the scope of the present invention.

1:第一對位組 71~77:子區段 2:第二對位組 111:線條 3:第三對位組 121:狹縫 4:第四對位組 131:進位線條 5:面板裝置 141:進位狹縫 7,7’,8:對位組 200:方法 11:第一圖樣 202~206:步驟 12:第二圖樣 515:深色塗層 13:第三圖樣 525:金屬塗層 14:第四圖樣 511,521,512,522:角落 51:第一板件 722,731,732,741:端部 52:第二板件1: The first alignment group 71~77: subsection 2: The second alignment group 111: Line 3: The third counterpoint group 121: slit 4: The fourth counterpoint group 131: Carry line 5: Panel device 141: Carry slit 7,7’,8: Counterpoint group 200: method 11: The first pattern 202~206: steps 12: The second pattern 515: Dark coating 13: The third pattern 525: Metal coating 14: Fourth pattern 511,521,512,522: corner 51: The first board 722,731,732,741: end 52: The second plate

第1圖為本發明的面板裝置的一實施例的示意圖。 第2圖為第一圖樣的一實施例的示意圖。 第3圖為第二圖樣的一實施例的示意圖。 第4圖至第6圖為第二板件與第一板件疊合後具有不同的偏移量的示意圖。 第7圖為本發明的對位組一實施例的示意圖。 第8圖以及第9圖為本發明的對位組的另一實施例的示意圖。 第10圖以及第11圖為本發明的第一對位組的另一實施例的示意圖。 第12圖為本發明一種用來對面板裝置取得對位校準偏移量的方法的流程圖。 FIG. 1 is a schematic diagram of an embodiment of the panel device of the present invention. Figure 2 is a schematic diagram of an embodiment of the first pattern. Figure 3 is a schematic diagram of an embodiment of the second pattern. Figures 4 to 6 are schematic diagrams showing different offsets between the second plate and the first plate after being superimposed. Figure 7 is a schematic diagram of an embodiment of the alignment group of the present invention. Figures 8 and 9 are schematic diagrams of another embodiment of the alignment group of the present invention. Figures 10 and 11 are schematic diagrams of another embodiment of the first alignment group of the present invention. FIG. 12 is a flowchart of a method for obtaining the alignment offset of a panel device according to the present invention.

1:第一對位組 1: The first alignment group

2:第二對位組 2: The second alignment group

3:第三對位組 3: The third counterpoint group

4:第四對位組 4: The fourth counterpoint group

5:面板裝置 5: Panel device

51:第一板件 51: The first board

52:第二板件 52: The second plate

511,521,512,522:角落 511,521,512,522: corner

Claims (10)

一種具有對位校準圖樣的面板裝置,包含有: 一第一板件; 一第二板件,與該第一板件對位疊合以形成該面板裝置;以及 一第一對位組,包含一第一圖樣以及一第二圖樣,該第一圖樣設置於該第一板件的一角落,該第一圖樣包含沿一第一方向等間隔分佈的複數個線條,該第二圖樣設置於該第二板件對應該第一板件的該角落處,該第二圖樣包含沿該第一方向等間隔分佈的複數個狹縫; 其中當該第二板件與該第一板件疊合時,該複數個線條沿該第一方向於該複數個狹縫露出的數量決定該第二板件相對該第一板件沿該第一方向所產生的偏移量。 A panel device with alignment calibration pattern, including: A first plate; A second plate, aligned and stacked with the first plate to form the panel device; and A first alignment group includes a first pattern and a second pattern, the first pattern is disposed at a corner of the first plate, and the first pattern includes a plurality of lines distributed at equal intervals along a first direction , The second pattern is disposed at the corner of the second plate corresponding to the first plate, and the second pattern includes a plurality of slits distributed at equal intervals along the first direction; Wherein when the second plate is superimposed with the first plate, the number of the plurality of lines exposed in the plurality of slits along the first direction determines that the second plate is relative to the first plate along the first plate. The offset in one direction. 如請求項1所述的面板裝置,其中該第一板件的周圍具有不透光的一深色塗層,該複數個線條為在該深色塗層上的白色線條,且該複數個白色線條沿該第一方向的寬度相等於該複數個白色線條彼此之間的間隔;其中該第二板件的周圍具有一金屬塗層,該複數個狹縫為該金屬塗層上的鏤空狹縫。The panel device according to claim 1, wherein a dark coating that does not transmit light is provided around the first plate, the plurality of lines are white lines on the dark coating, and the plurality of white The width of the line along the first direction is equal to the spacing between the plurality of white lines; wherein the second plate is surrounded by a metal coating, and the plurality of slits are hollow slits on the metal coating . 如請求項1所述的面板裝置,其中該複數個線條的數量為Nw,該複數個狹縫的數量為Ns,且Nw = Gb/R+2-Gs以及Ns = Gb/R+1-Gs; 其中Gb為相鄰兩個該線條的間隔,Gs為相鄰兩個該狹縫的間隔,R為該第二板件相對該第一板件產生的偏移量的設定解析度。 The panel device according to claim 1, wherein the number of the plurality of lines is Nw, the number of the plurality of slits is Ns, and Nw = Gb/R+2-Gs and Ns = Gb/R+1-Gs ; Where Gb is the interval between two adjacent lines, Gs is the interval between two adjacent slits, and R is the set resolution of the offset of the second plate relative to the first plate. 如請求項3所述的面板裝置,其中該第一圖樣的等效長度為Lw,且Lw = 2Gb 2/R-2GbGs+3Gb。 The panel device according to claim 3, wherein the equivalent length of the first pattern is Lw, and Lw = 2Gb 2 /R-2GbGs+3Gb. 如請求項4所述的面板裝置,其中該第一對位組由複數個子區段組成,該複數個子區段沿垂直於該第一方向的方向橫向排列,其中任一子區段內含的該第一圖樣中的首二個線條與前一子區段內含的該第一圖樣中的末二個線條為同樣的兩個線條,任一子區段內含的該第二圖樣中的首二個狹縫與前一子區段內含的該第二圖樣中的末二個狹縫為同樣的兩個狹縫。The panel device according to claim 4, wherein the first alignment group is composed of a plurality of subsections, and the plurality of subsections are arranged horizontally along a direction perpendicular to the first direction, and any of the subsections contains The first two lines in the first pattern and the last two lines in the first pattern contained in the previous subsection are the same two lines, and the second pattern contained in any subsection The first two slits and the last two slits in the second pattern contained in the previous subsection are the same two slits. 如請求項3所述的面板裝置,其中該第一圖樣的線條節距為2Gb,該第二圖樣的狹縫節距為Ps,且Ps = 2Gb-R。The panel device according to claim 3, wherein the line pitch of the first pattern is 2Gb, the slit pitch of the second pattern is Ps, and Ps=2Gb-R. 如請求項3所述的面板裝置,其中該第一對位組另包含一第三圖樣以及一第四圖樣,該第三圖樣設置於該第一板件的該角落,該第三圖樣包含沿該第一方向等間隔分佈的複數個進位線條,該第四圖樣設置於該第二板件對應該第一板件的該角落處,該第四圖樣包含沿該第一方向等間隔分佈的複數個進位狹縫; 其中當該第二板件與該第一板件疊合時,該複數個進位線條沿該第一方向於該複數個進位狹縫露出的數量決定該第二板件相對該第一板件沿該第一方向所產生的進位偏移量; 其中Gb’為相鄰兩個該進位線條的間隔,Gs’為相鄰兩個該進位狹縫的間隔,R’為該第二板件相對該第一板件產生的偏移量的進位解析度,且Gb’大於Gb,Gs’大於Gs,R’大於R。 The panel device according to claim 3, wherein the first alignment group further includes a third pattern and a fourth pattern, the third pattern is disposed at the corner of the first plate, and the third pattern includes an edge A plurality of carry lines distributed at equal intervals in the first direction, the fourth pattern is arranged at the corner of the second plate corresponding to the first plate, and the fourth pattern includes plural numbers distributed at equal intervals along the first direction Carry slit Wherein when the second plate is overlapped with the first plate, the number of the carry lines exposed in the plurality of carry slits along the first direction determines that the second plate is relative to the first plate. The carry offset generated in the first direction; Where Gb' is the interval between two adjacent carry lines, Gs' is the interval between two adjacent carry slits, and R'is the carry analysis of the offset of the second plate relative to the first plate Degree, and Gb' is greater than Gb, Gs' is greater than Gs, and R'is greater than R. 如請求項1所述的面板裝置,另包含一第二對位組,包含一第一圖樣以及一第二圖樣,該第二對位組設置於該第一板件以及該第二板件的該角落上異於該第一對位組的位置,該第二對位組的該第一圖樣包含沿一第二方向等間隔分佈的複數個線條,該第二對位組的該第二圖樣包含沿該第二方向等間隔分佈的複數個狹縫; 其中當該第二板件與該第一板件疊合時,該第二對位組的該複數個線條沿該第二方向於該第二對位組的該複數個狹縫露出的數量決定該第二板件相對該第一板件沿該第二方向所產生的偏移量。 The panel device according to claim 1, further comprising a second alignment group including a first pattern and a second pattern, and the second alignment group is disposed on the first plate and the second plate The corner is different from the position of the first alignment group, the first pattern of the second alignment group includes a plurality of lines equally spaced along a second direction, and the second pattern of the second alignment group Comprising a plurality of slits distributed at equal intervals along the second direction; Wherein when the second plate is superimposed on the first plate, the number of lines of the second alignment group exposed to the plurality of slits of the second alignment group along the second direction is determined The offset of the second plate relative to the first plate along the second direction. 如請求項8所述的面板裝置,其中該第一方向垂直於該第二方向。The panel device according to claim 8, wherein the first direction is perpendicular to the second direction. 如請求項1所述的面板裝置,另包含一第三對位組,包含一第一圖樣以及一第二圖樣,該第三對位組設置於該第一板件以及該第二板件相對該角落的對角角落上,該第三對位組的該第一圖樣包含沿該第一方向等間隔分佈的複數個線條,該第三對位組的該第二圖樣包含沿該第一方向等間隔分佈的複數個狹縫。The panel device according to claim 1, further comprising a third alignment group including a first pattern and a second pattern, and the third alignment group is arranged opposite to the first plate and the second plate On the diagonal corner of the corner, the first pattern of the third alignment group includes a plurality of lines distributed at equal intervals along the first direction, and the second pattern of the third alignment group includes lines along the first direction Plural slits distributed at equal intervals.
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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1132135C (en) * 1995-11-06 2003-12-24 索尼公司 Liquid crystal display device and mfg. method thereof
CN100514143C (en) * 2005-06-27 2009-07-15 乐金显示有限公司 Liquid crystal display device and manufacturing method thereof
CN102540491A (en) * 2010-12-23 2012-07-04 乐金显示有限公司 Align mark of stereoscopic image display, and aligning method and system using align mark
TWI371618B (en) * 2008-08-18 2012-09-01 Au Optronics Corp A liquid crystal display and an assemble precision measuring method thereof

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6042972A (en) * 1998-06-17 2000-03-28 Siemens Aktiengesellschaft Phase shift mask having multiple alignment indications and method of manufacture
JP2002350800A (en) * 2001-05-30 2002-12-04 Matsushita Electric Ind Co Ltd Method of manufacturing liquid crystal panel
KR100801151B1 (en) * 2001-10-04 2008-02-05 엘지.필립스 엘시디 주식회사 Black matrix of color filter substrate for liquid crystal display
JP2004004314A (en) * 2002-05-31 2004-01-08 Toshiba Corp Liquid crystal display
CN1226780C (en) * 2002-09-18 2005-11-09 南亚科技股份有限公司 Component and method for testing switch cell line offset in semiconductor element
TWI250084B (en) * 2004-12-08 2006-03-01 Ind Tech Res Inst Method of calibrating inkjet print head
JP2008268420A (en) * 2007-04-18 2008-11-06 Sharp Corp Method for manufacturing liquid crystal display device
US8143731B2 (en) * 2009-07-14 2012-03-27 Nanya Technology Corp. Integrated alignment and overlay mark
CN103433824B (en) * 2013-08-06 2015-08-26 昆山龙腾光电有限公司 The edging method of display panels and edger unit
CN104635440B (en) * 2013-11-14 2017-08-25 中芯国际集成电路制造(上海)有限公司 Alignment mark and its measuring method
JP2016081480A (en) * 2014-10-22 2016-05-16 株式会社ジャパンディスプレイ Touch sensor and display device having the same
CN104536259A (en) * 2014-12-26 2015-04-22 南京中电熊猫液晶显示科技有限公司 Detection method for aligning mask plate in optical alignment
CN105652492A (en) * 2015-12-25 2016-06-08 昆山国显光电有限公司 Alignment method and system of FOG technology
TWM577372U (en) * 2018-01-03 2019-05-01 中央印製廠 Overprinting plates alignment and measurement guide tool for various plates
CN109254438B (en) * 2018-10-11 2021-12-03 Tcl华星光电技术有限公司 Liquid crystal display panel and manufacturing method thereof

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1132135C (en) * 1995-11-06 2003-12-24 索尼公司 Liquid crystal display device and mfg. method thereof
CN100514143C (en) * 2005-06-27 2009-07-15 乐金显示有限公司 Liquid crystal display device and manufacturing method thereof
TWI371618B (en) * 2008-08-18 2012-09-01 Au Optronics Corp A liquid crystal display and an assemble precision measuring method thereof
CN102540491A (en) * 2010-12-23 2012-07-04 乐金显示有限公司 Align mark of stereoscopic image display, and aligning method and system using align mark

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
JP平3-60437A *

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