TWI703735B - Semiconductor substrate, array substrate, inverter circuit, and switch circuit - Google Patents
Semiconductor substrate, array substrate, inverter circuit, and switch circuit Download PDFInfo
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Description
本發明涉及一種半導體基板、陣列基板、逆變器電路及開關電路。 The invention relates to a semiconductor substrate, an array substrate, an inverter circuit and a switch circuit.
平面顯示裝置具有機身薄、省電、無輻射等眾多優點,得到了廣泛的應用。習知的平面顯示裝置主要包括液晶顯示器(Liquid Crystal Display,LCD)及有機電致發光器件(Organic Electroluminescence Device,OELD),亦稱為有機發光二極體(Organic Light Emitting Diode,OLED)。一般而言,顯示器的陣列基板包括一基板,該基板上設置有包括複數畫素單元的畫素陣列及驅動該畫素陣列的驅動電路,該驅動電路中需要應用到薄膜電晶體。另外,顯示裝置的周邊電路亦應用到薄膜電晶體。採用低溫多晶矽技術(LTPS)製造的多晶矽薄膜電晶體的電子遷移率大於金屬氧化物薄膜電晶體的電子遷移率,然,多晶矽薄膜電晶體的漏電流高於金屬氧化物薄膜電晶體的漏電流,影響了陣列基板或者周邊電路的性能。 Flat display devices have many advantages such as thin body, power saving, and no radiation, and have been widely used. The conventional flat display device mainly includes a liquid crystal display (LCD) and an organic electroluminescence device (OELD), also known as an organic light emitting diode (OLED). Generally speaking, the array substrate of a display includes a substrate on which a pixel array including a plurality of pixel units and a driving circuit for driving the pixel array are arranged. The driving circuit needs to be applied to a thin film transistor. In addition, the peripheral circuits of display devices are also applied to thin film transistors. The electron mobility of polysilicon thin film transistors manufactured by low temperature polysilicon technology (LTPS) is greater than that of metal oxide thin film transistors. However, the leakage current of polysilicon thin film transistors is higher than that of metal oxide thin film transistors. Affect the performance of the array substrate or peripheral circuits.
鑒於此,有必要提供一種性能良好的半導體基板。 In view of this, it is necessary to provide a semiconductor substrate with good performance.
一種半導體基板,其包括基板、設置於基板上的第一薄膜電晶體以及第二薄膜電晶體,該第一薄膜電晶體為底閘型的金屬氧化物薄膜電晶體, 該第二薄膜電晶體為頂閘型的低溫多晶矽薄膜電晶體;第一薄膜電晶體包括設置於所述基板上的第一閘極、金屬氧化物半導體層及與該金屬氧化物半導體層連接且彼此間隔的第一源極與第一汲極;第二薄膜電晶體包括依次設置於所述基板上的多晶矽半導體層、第二閘極、與該多晶矽半導體層連接且彼此間隔的第二源極與第二汲極;該第一源極或第一汲極中的一者與該第二源極或第二汲極中的一者電性連接。 A semiconductor substrate includes a substrate, a first thin film transistor and a second thin film transistor disposed on the substrate, the first thin film transistor is a bottom gate type metal oxide thin film transistor, The second thin film transistor is a top gate type low-temperature polysilicon thin film transistor; the first thin film transistor includes a first gate provided on the substrate, a metal oxide semiconductor layer, and a metal oxide semiconductor layer connected to the metal oxide semiconductor layer. A first source and a first drain are spaced apart from each other; the second thin film transistor includes a polysilicon semiconductor layer, a second gate, and a second source connected to the polysilicon semiconductor layer and spaced apart from each other, which are sequentially arranged on the substrate And the second drain; one of the first source or the first drain is electrically connected to one of the second source or the second drain.
本發明還提供一種陣列基板、一種逆變器電路及一種開關電路,其包括上述的半導體基板。 The present invention also provides an array substrate, an inverter circuit and a switch circuit, which include the above-mentioned semiconductor substrate.
相較於習知技術,本發明的半導體基板包括金屬氧化物薄膜電晶體,且金屬氧化物薄膜電晶體與低溫多晶矽薄膜電晶體共用源/汲極,可以減小使用該半導體基板的電子元件體積和漏電流。 Compared with the prior art, the semiconductor substrate of the present invention includes a metal oxide thin film transistor, and the metal oxide thin film transistor and the low temperature polysilicon thin film transistor share the source/drain, which can reduce the volume of electronic components using the semiconductor substrate And leakage current.
10:半導體基板 10: Semiconductor substrate
101:基板 101: substrate
T1:第一薄膜電晶體 T1: The first thin film transistor
T2:第二薄膜電晶體 T2: The second thin film transistor
103:緩衝層 103: buffer layer
105:第一閘極 105: first gate
205:第二閘極 205: second gate
107:閘極絕緣層 107: Gate insulation layer
1071:第一閘極絕緣層 1071: first gate insulating layer
1072:第二閘極絕緣層 1072: second gate insulating layer
109:第一源極 109: First Source
111:第一汲極 111: The first drain
113:金屬氧化物半導體層 113: metal oxide semiconductor layer
201:多晶矽半導體層 201: polysilicon semiconductor layer
209:第二源極 209: second source
211:第二汲極 211: The second drain
115:第一過孔 115: first via
215:第二過孔 215: second via
100:陣列基板 100: Array substrate
11:基材 11: Substrate
12:第一驅動電路 12: The first drive circuit
13:第二驅動電路 13: The second drive circuit
14:畫素單元 14: Pixel unit
15:畫素驅動電路 15: Pixel drive circuit
16:平坦化層 16: Flattening layer
17:第三過孔 17: third via
18:陽極 18: anode
19:畫素限定層 19: Pixel limit layer
30:逆變器電路 30: Inverter circuit
40:開關電路 40: switch circuit
圖1係本發明第一實施例的半導體基板的剖面結構示意圖。 FIG. 1 is a schematic cross-sectional structure diagram of a semiconductor substrate according to a first embodiment of the present invention.
圖2係本發明第二實施例的半導體基板的剖面結構示意圖。 2 is a schematic diagram of a cross-sectional structure of a semiconductor substrate according to a second embodiment of the present invention.
圖3係本發明第三實施例的半導體基板的剖面結構示意圖。 3 is a schematic diagram of a cross-sectional structure of a semiconductor substrate according to a third embodiment of the present invention.
圖4係應用本發明一實施例的陣列基板的平面示意圖。 4 is a schematic plan view of an array substrate to which an embodiment of the invention is applied.
圖5係本發明一實施例的畫素單元中畫素驅動電路的等效電路圖。 FIG. 5 is an equivalent circuit diagram of a pixel driving circuit in a pixel unit according to an embodiment of the present invention.
圖6係本發明一實施例的陣列基板的剖面示意圖。 6 is a schematic cross-sectional view of an array substrate according to an embodiment of the invention.
圖7係本發明一實施例的逆變器電路的等效電路圖。 Fig. 7 is an equivalent circuit diagram of an inverter circuit according to an embodiment of the present invention.
圖8係本發明一實施例的逆變器電路的平面結構示意圖。 Fig. 8 is a schematic plan view of an inverter circuit according to an embodiment of the present invention.
圖9係本發明一實施例的開關電路的等效電路圖。 Fig. 9 is an equivalent circuit diagram of a switch circuit according to an embodiment of the present invention.
請參考圖1,圖1係本發明第一實施例的半導體基板10的剖面結構示意圖。該半導體基板10包括至少兩種不同類型的薄膜電晶體(Thin Film Transistor,TFT)的複合電晶體結構,在本實施方式中,該兩種不同類型的薄膜電晶體為低溫多晶矽(Low Temperature Poly Silicon,LTPS)薄膜電晶體與金屬氧化物(Metal Oxide)薄膜電晶體。該低溫多晶矽薄膜電晶體具有高電子遷移率的特性,該金屬氧化物(Metal Oxide)薄膜電晶體具有低漏電流、體積小的特性。
Please refer to FIG. 1, which is a schematic cross-sectional structure diagram of a
如圖1所示,在本實施方式中,該半導體基板10包括基板101以及形成在所述基板101上的第一薄膜電晶體T1和第二薄膜電晶體T2。在本實施方式中,該第一薄膜電晶體T1為金屬氧化物薄膜電晶體,該第二薄膜電晶體T2為低溫多晶矽薄膜電晶體。
As shown in FIG. 1, in this embodiment, the
該第一薄膜電晶體T1為一底閘(Bottom-gate)型薄膜電晶體,其包括緩衝層103、第一閘極105、閘極絕緣層107、第一源極109、第一汲極111及金屬氧化物半導體層113。該緩衝層103、該第一閘極105、該閘極絕緣層107依次設置在該基板101上。該閘極絕緣層107受第一閘極105厚度的影響,從而對應該第一閘極105處呈一凸台形狀。該第一源極109與該第一汲極111同層分離設置,且分別設置在該閘極絕緣層107的凸台的兩相對側。該金屬氧化物半導體層113對應第一閘極105設置在該第一源極109與第一汲極111之間的該閘極絕緣層107上,並分別部分覆蓋該第一源極109與該第一汲極111。該金屬氧化物半導體層113電連接該第一源極109與該第一汲極111。在本實施方式中,該金屬氧化物半導體層113為氧化銦鎵鋅(Indium Gallium Zinc Oxide,IGZO)。在其他實施方式中,該金屬氧化物半導體層113可為含鋅、銦、鎵中的至少一種的金屬氧化物材料。
The first thin film transistor T1 is a bottom-gate type thin film transistor, which includes a
該第二薄膜電晶體T2位於該第一薄膜電晶體T1的旁邊,其為一頂閘(Top-gate)型薄膜電晶體,其包括多晶矽(Poly-silicon)半導體層201、所述緩
衝層103、第二閘極205、所述閘極絕緣層107、第二源極209與第二汲極211。該多晶矽半導體層201、該緩衝層103、該第二閘極205、該閘極絕緣層107自下而上依次層疊設置在該基板101上,且該第二閘極205對應該多晶矽半導體層201設置。該第二源極209經貫穿該緩衝層103、閘極絕緣層107的第二過孔215與該多晶矽半導體層201電連接,該第二汲極211經貫穿該緩衝層103、閘極絕緣層107的第二過孔215與該多晶矽半導體層201電連接。
The second thin film transistor T2 is located beside the first thin film transistor T1. It is a top-gate type thin film transistor, which includes a poly-silicon (Poly-silicon)
在本實施方式中,該緩衝層103、103的材料為絕緣材料,如氧化矽、氮化矽。該閘極絕緣層107包括沿遠離基板101的方向依次層疊設置的第一閘極絕緣層1071與第二閘極絕緣層1072,亦即第一閘極絕緣層1071相對更靠近所述基板101。該第一閘極絕緣層1071、1071的材料為氧化矽,該第二閘極絕緣層1072、1072的材料為氮化矽。
In this embodiment, the material of the buffer layers 103 and 103 is an insulating material, such as silicon oxide and silicon nitride. The
該第一源極109或者第一汲極111中的一者與該第二源極209或該第二汲極211中的一者電性連接。如圖1所示,在本實施例中,該第一汲極111與該第二源極209為同層設置且直接連接。在本實施例中,該第一源極109、該第一汲極111、該第二源極209以及該第二汲極211由同一導電層圖案化形成,該第一汲極111與該第二源極209為一連續的導電層。
One of the
在本實施例中,該第一薄膜電晶體T1的金屬氧化物半導體層113在該第一源極109與第一汲極111形成之後形成,從而可以避免該第二薄膜電晶體T2進行高溫氫化制程時對該金屬氧化物半導體113的損害,且該金屬氧化物半導體層113在形成該第一源極109與第一汲極111之後形成,可避免蝕刻該第一源極109與第一汲極111所在的金屬層對該金屬氧化物半導體層113的損害。
In this embodiment, the metal
在本實施例中,該第一閘極105與該第二閘極205位於同一層,該第一閘極105與該第二閘極205可以由同一導電層在同一製造工序中形成。
In this embodiment, the
為了描述方便,以下實施例中,與第一實施例結構和功能相同的元件在此不再贅述,並且沿用第一實施例中的元件符號。 For ease of description, in the following embodiments, elements with the same structure and function as the first embodiment will not be repeated here, and the component symbols in the first embodiment will be used.
請參考圖2,圖2係本發明第二實施例的半導體基板10的剖面結構示意圖。本實施例的半導體基板10的結構與第一實施例的半導體基板10的結構相似,不同之處在於:在本實施例中,該第一薄膜電晶體T1的第二閘極絕緣層1072對應該金屬氧化物半導體層113開設有貫穿其厚度方向的第一過孔115,以使第一閘極絕緣層1071露出。該金屬氧化物半導體層113藉由該第一過孔115與該第一閘極絕緣層1071直接接觸並局部覆蓋該第一源極109與第一汲極111。
Please refer to FIG. 2, which is a schematic cross-sectional structure diagram of a
在本實施例中,由於第二閘極絕緣層1072開設有貫穿其厚度方向的第一過孔115,該第一源極109、該第一汲極111與第一閘極105之間的閘極絕緣層107的厚度減小,減小了該第一源極109、該第一汲極111與第一閘極105之間的電容。
In this embodiment, since the second
請參考圖3,圖3係本發明第三實施例的半導體基板10的剖面結構示意圖。為了簡潔起見,在本實施例中,與第一實施例結構和功能相同的元件在此不再贅述。
Please refer to FIG. 3, which is a schematic cross-sectional structure diagram of a
在本實施例中,該閘極絕緣層107包括垂直並遠離基板101的方向依次層疊設置的第一閘極絕緣層1071與第二閘極絕緣層1072。該緩衝層103、該第二閘極205、該第一閘極絕緣層1071、該第一閘極105、該第二閘極絕緣層1072依次設置在該基板101上。該第二閘極205位於該第一閘極絕緣層1071遠離第二閘極絕緣層1072的一側,該第一閘極105位於該第一閘極絕緣層1071與第二閘極絕緣層1072之間。
In this embodiment, the
在本實施方式中,該第一閘極絕緣層1071、1071的材料為氮化矽,該第二閘極絕緣層1072、1072的材料為氧化矽。
In this embodiment, the material of the first
在本實施例中,該第一閘極105藉由第二閘極絕緣層1072與第一源極109、該第一汲極111間隔開來,該第一閘極105與第一源極109、該第一汲極111之間不具有第一閘極絕緣層1071,使該第一源極109、該第一汲極111與第一閘極105之間的閘極絕緣層107的厚度減小,減小了該第一源極109、該第一汲極111與第一閘極105之間的電容。
In this embodiment, the
在本實施例中,該第一閘極105與該第二閘極205位於不同的層,該第一閘極105與該第二閘極205由不同的導電層形成。
In this embodiment, the
上述第一~三實施例的半導體基板10可以應用於電子裝置中陣列基板的畫素單元內的畫素驅動電路,亦可應用於電子裝置中周邊電路中的逆變器電路或者開關電路。以下僅以第三實施例的半導體基板10的應用作說明,可以理解的,以下實施例中所應用的第三實施例的半導體基板10亦可替換為第一實施例的半導體基板10或者第二實施例的半導體基板10。
The
請參考圖4,圖4係應用本發明一實施例的陣列基板100的平面示意圖。本發明一實施例的陣列基板100為有機電致發光(OLED)顯示面板,該陣列基板100包括基材11,該基材11上設置有多條相互平行設置的掃描線S1-Sn以及多條相互平行且與該掃描線S1-Sn交叉設置的資料線D1-Dn。該多條掃描線S1-Sn分別與該第一驅動電路12電性連接,該多條資料線D1-Dn分別與該第二驅動電路13電性連接。該多條掃描線S1-Sn與該多條資料線D1-Dn垂直絕緣相交,定義出複數畫素單元14。每個畫素單元14具有一個對應的畫素驅動電路15(如圖5所示)。在本實施方式中,第一驅動電路12可包括多工電路和閘極驅動電路。第二驅動電路13為資料驅動電路。
Please refer to FIG. 4, which is a schematic plan view of an
請參考圖5,圖5係本發明一實施例的畫素單元14中畫素驅動電路15的等效電路圖。包括電源線VDD、初始端Vini、第一薄膜電晶體T1、第二薄膜電晶體T2、第三薄膜電晶體T3、第四薄膜電晶體T4、第一結點A、第二結點B、
有機發光二極體OLED、存儲電容Cs、寄生電容COLED以及接地端Vss。在本實施方式中,該第一薄膜電晶體T1為低溫多晶矽薄膜電晶體,第二薄膜電晶體T2為金屬氧化物薄膜電晶體,該第三薄膜電晶體T3以及第四薄膜電晶體T4可以為低溫多晶矽薄膜電晶體、非晶矽薄膜電晶體或有機薄膜電晶體中的任意一種。在本實施例中,該第三薄膜電晶體T3以及第四薄膜電晶體T4為低溫多晶矽薄膜電晶體。
Please refer to FIG. 5, which is an equivalent circuit diagram of the
該第三薄膜電晶體T3的閘極與第一掃描線S1電性連接,汲極與該資料線D1電性連接,源極藉由該第一結點A與該第一薄膜電晶體T1的閘極電性連接。該第一薄膜電晶體T1的汲極與該第二薄膜電晶體T2的源極電性連接,該第一薄膜電晶體T1的源極藉由第二結點B與該有機發光二極體OLED的陽極(Anode)電性連接。該第二薄膜電晶體T2的閘極與該第三掃描線S3電性連接,該第二薄膜電晶體T2的汲極與該電源線VDD電性連接。該第四薄膜電晶體T4的閘極與該第二掃描線S2電性連接,該第四薄膜電晶體T4的汲極與該第二結點B電性連接。該有機發光二極體OLED的陽極與該第一薄膜電晶體T1的源極電性連接,陰極與該接地端Vss電性連接。該存儲電容Cs電性連接於該第一薄膜電晶體T1的閘極和源極之間。該寄生電容COLED電性連接於該有機發光二極體OLED陰極和陽極之間。 The gate of the third thin film transistor T3 is electrically connected to the first scan line S1, the drain is electrically connected to the data line D1, and the source is electrically connected to the first node A and the first thin film transistor T1. The gate electrode is electrically connected. The drain of the first thin film transistor T1 is electrically connected to the source of the second thin film transistor T2, and the source of the first thin film transistor T1 is connected to the organic light emitting diode OLED through the second node B The anode (Anode) is electrically connected. The gate of the second thin film transistor T2 is electrically connected to the third scan line S3, and the drain of the second thin film transistor T2 is electrically connected to the power line VDD. The gate of the fourth thin film transistor T4 is electrically connected to the second scan line S2, and the drain of the fourth thin film transistor T4 is electrically connected to the second node B. The anode of the organic light emitting diode OLED is electrically connected to the source of the first thin film transistor T1, and the cathode is electrically connected to the ground terminal Vss. The storage capacitor Cs is electrically connected between the gate and the source of the first thin film transistor T1. The parasitic capacitor COLED is electrically connected between the cathode and the anode of the organic light emitting diode OLED.
可以理解的,該畫素單元14並不限於圖5所示的結構,還可以為5T1C的畫素結構(包括5個薄膜電晶體(Thin Film Transistor,TFT)及一個電容C)(圖未示)等等,只要其適用第一薄膜電晶體T1的第一源極109或者第一汲極111中的一者與第二薄膜電晶體T2的第二源極209或者第二汲極211中的一者電性連接的結構。
It can be understood that the
請參考圖6,圖6係本發明一實施例的陣列基板100的剖面示意圖。為了描述方便,圖6中示出了第一薄膜電晶體T1和第二薄膜電晶體T2,省略了第
三薄膜電晶體T3、第四薄膜電晶體T4等其他元件。本實施例中的陣列基板100使用前述第三實施例的半導體基板10,為了簡潔起見,對於第一薄膜電晶體T1和第二薄膜電晶體T2的結構將不再贅述。
Please refer to FIG. 6, which is a schematic cross-sectional view of an
如圖6所示,該陣列基板100還包括覆蓋該第一薄膜電晶體T1及該第二薄膜電晶體T2的平坦化層16。該平坦化層16設置有貫穿其垂直於基板101的厚度方向上的第三過孔17,該第三過孔17內填充有有機發光二極體OLED的陽極18,該平坦化層16上設置有畫素限定層19(Pixel Defining Layer,PDL),該陽極18的一端連接該第一源極109,另一端連接至該畫素限定層19。
As shown in FIG. 6, the
在本實施例的陣列基板100中,該第二薄膜電晶體T2為金屬氧化物薄膜電晶體,相較於僅採用低溫多晶矽薄膜電晶體的陣列基板,為金屬氧化物薄膜電晶體的第二薄膜電晶體T2體積更小、制程工藝更為簡單,且具有低漏電流可降低功耗,提高了陣列基板100的性能。
In the
在本實施例中,該第一汲極111與該第二源極209同層設置。該第一汲極111與該第三源/汲極為一連續的導電層,可以減小第一薄膜電晶體T2和第二薄膜電晶體T2佔用的排布空間,此外,該第二薄膜電晶體T2無需開設通孔便可以實現金屬氧化物半導體層113與第一源極109、第一汲極111的電性連接,亦能夠減小第二薄膜電晶體T2佔用的面積。
In this embodiment, the
請參考圖7和圖8,圖7係本發明一實施例的逆變器電路30的等效電路圖。圖8係本發明一實施例的逆變器電路30的平面結構示意圖。在本實施例中,該逆變器電路30應用了本發明第三實施例的半導體基板10。為了描述方便,圖8中省略了閘極絕緣層等元件。
Please refer to FIG. 7 and FIG. 8. FIG. 7 is an equivalent circuit diagram of the
如圖8所示,該逆變器電路30的第一薄膜電晶體T1的第一閘極105和第二薄膜電晶體T2的第二閘極205電性連接。如圖7所示,在本實施例中,當輸入端IN輸入高電平時,該第一薄膜電晶體T1導通,該第二薄膜電晶體T2關斷,
該第一薄膜電晶體T1輸出低電平。當輸入端IN輸入低電平時,該第二薄膜電晶體T2導通,該第一薄膜電晶體T1關斷,該第二薄膜電晶體T2輸出高電平。
As shown in FIG. 8, the
請參考圖9,圖9係本發明一實施例的開關電路40的等效電路圖。在本實施例中,該開關電路40應用了本發明第三實施例的半導體基板10。在本實施例中,該開關電路40的輸入端IN輸入信號,該第一薄膜電晶體T1的第一閘極105控制該第一薄膜電晶體T1的開關,該第二薄膜電晶體T2的第二閘極205控制該第二薄膜電晶體T2的開關。當該第一薄膜電晶體T1開啟時,該輸入端IN輸入的信號經由該第一薄膜電晶體T1輸出;當第二薄膜電晶體T2開啟時,該輸入端IN輸入的信號經由該第二薄膜電晶體T2輸出。
Please refer to FIG. 9, which is an equivalent circuit diagram of the
以上實施例僅用以說明本發明的技術方案而非限制,儘管參照較佳實施對本發明進行了詳細說明,本領域的普通技術人員應當理解,可以對本發明的技術方案進行修改或等同替換,而不脫離本發明技術方案的精神和範圍。 The above embodiments are only used to illustrate the technical solutions of the present invention and not to limit them. Although the present invention has been described in detail with reference to preferred implementations, those of ordinary skill in the art should understand that the technical solutions of the present invention can be modified or equivalently replaced. Without departing from the spirit and scope of the technical solution of the present invention.
10:半導體基板 10: Semiconductor substrate
101:基板 101: substrate
T1:第一薄膜電晶體 T1: The first thin film transistor
T2:第二薄膜電晶體 T2: The second thin film transistor
103:緩衝層 103: buffer layer
105:第一閘極 105: first gate
205:第二閘極 205: second gate
107:閘極絕緣層 107: Gate insulation layer
1071:第一閘極絕緣層 1071: first gate insulating layer
1072:第二閘極絕緣層 1072: second gate insulating layer
109:第一源極 109: First Source
111:第一汲極 111: The first drain
113:金屬氧化物半導體層 113: metal oxide semiconductor layer
201:多晶矽半導體層 201: polysilicon semiconductor layer
209:第二源極 209: second source
211:第二汲極 211: The second drain
215:第二過孔 215: second via
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