TWI683700B - CVD or PVD reactor for coating large substrates - Google Patents
CVD or PVD reactor for coating large substrates Download PDFInfo
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- TWI683700B TWI683700B TW104138547A TW104138547A TWI683700B TW I683700 B TWI683700 B TW I683700B TW 104138547 A TW104138547 A TW 104138547A TW 104138547 A TW104138547 A TW 104138547A TW I683700 B TWI683700 B TW I683700B
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
- C23C16/45565—Shower nozzles
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
- B01J3/02—Feed or outlet devices therefor
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
- B01J3/03—Pressure vessels, or vacuum vessels, having closure members or seals specially adapted therefor
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
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- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Vapour Deposition (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
本發明係有關於一種CVD或PVD塗佈裝置,其包含殼體(1、2)及固定在該殼體(1、2)上之具有進氣機構(7)之組件(23),該進氣機構包含具有排氣口(8)之在一排氣平面內延伸的排氣面(7'),該組件透過固定件(13、14)在該殼體(1)之上區段上固定在多個懸掛位置(6')上,其中設有調溫構件(9),該進氣機構(7)可透過該等調溫構件自大致上相當於該殼體(1、2)之溫度的第一溫度調溫至與該殼體溫度不同之第二溫度,其中該等固定件(13、14)具有力傳遞構件(26.1、26.2、26.3、26.4;27、28、29),在該調溫所引起之組件(23)之尺寸變化時,該等力傳遞構件發生變形或者彼此相對移動。該組件包括保持裝置(3),該進氣機構(7)藉由多個分散佈置在該整個水平延伸面上的吊架(6)固定在該保持裝置上,以及,該保持裝置(3)僅以其邊緣透過該等力傳遞構件(26.1、26.2、26.3、26.4;27、28、29)固定在該殼體(1)上。 The invention relates to a CVD or PVD coating device, which comprises a casing (1, 2) and a component (23) with an air inlet mechanism (7) fixed on the casing (1, 2). The gas mechanism includes an exhaust surface (7') with an exhaust port (8) extending in an exhaust plane, and the assembly is fixed on the upper section of the housing (1) through fixing members (13, 14) At a plurality of suspension positions (6'), a temperature regulating member (9) is provided, and the air intake mechanism (7) can pass through the temperature regulating members to substantially correspond to the temperature of the housing (1,2) The first temperature is adjusted to a second temperature different from the temperature of the housing, wherein the fixing members (13, 14) have a force transmission member (26.1, 26.2, 26.3, 26.4; 27, 28, 29), in the When the size of the component (23) caused by temperature adjustment changes, the force transmission members deform or move relative to each other. The assembly includes a holding device (3), the air intake mechanism (7) is fixed on the holding device by a plurality of hangers (6) dispersedly arranged on the entire horizontal extension surface, and the holding device (3) It is fixed to the housing (1) only with its edges through the force transmission members (26.1, 26.2, 26.3, 26.4; 27, 28, 29).
Description
本發明係有關於一種CVD或PVD塗佈裝置,其包含殼體及固定在該殼體上之進氣機構,該進氣機構包含一具有排氣口之排氣面,該塗佈裝置還包含固定在該殼體之上區段上的保持裝置,在該保持裝置上,該進氣機構固定在多個懸掛位置上。 The invention relates to a CVD or PVD coating device, which includes a housing and an air intake mechanism fixed on the housing, the air intake mechanism includes an exhaust surface with an exhaust port, and the coating device further includes A holding device fixed on the upper section of the housing, on which the air intake mechanism is fixed in a plurality of hanging positions.
EP 1 815 493 B1描述一種同類型之塗佈裝置,此案示出塗佈裝置之殼體,在此塗佈裝置中佈置有保持進氣機構之保持裝置。US 2008/0317973 A1描述過一種類似裝置。
同類型之塗佈裝置具有用於容置待塗佈之基板之基座及執行氣體分配器之功能之進氣機構,製程氣體可透過此進氣機構被導入在氣體分配器之底面與基座間延伸之製程室。此氣體分配器在其底面上具有多個排氣口,製程氣體可穿過此等排氣口進入製程室。在氣體分配器內部設有用於將製程氣體分配至排氣口之腔室。DE 10 2013 101 534 A1例如描述過此種類型之氣體分配器。 The same type of coating device has a base for accommodating the substrate to be coated and an air intake mechanism that performs the function of a gas distributor. Process gas can be introduced through the air intake mechanism between the bottom surface of the gas distributor and the base Extended process room. The gas distributor has a plurality of exhaust ports on its bottom surface, and the process gas can enter the process chamber through these exhaust ports. Inside the gas distributor, a chamber for distributing process gas to the exhaust port is provided. DE 10 2013 101 534 A1 describes, for example, a gas distributor of this type.
為沈積OLED,藉由載氣將氣態有機起始材料輸入加熱之氣體分配器中。此等氣態起始材料穿過排氣口進入製程室,以便在為此而放置在冷卻之基座上的基板上進行冷凝。此等基板可具有大於1m2之表面。需要製造基座對角線為2m至3m之CVD或PVD反應器。由於此進氣機構必須在基座之整個表面上延伸,故需 要提供對角線為2m至3m之進氣機構。此製程室具有數厘米之製程室高度。為能在整個基板表面之範圍內沈積層厚及層品質不變之層,在緊公差內,此製程室高度必須在整個製程室之範圍中保持恆定之值。此沈積過程發生在低壓範圍中,亦即在大氣壓力對殼體壁施加極大之變形力之範圍中。在壓力減小時,殼體不可避免地變形。此外還將進氣機構加熱,因而除機械作用力外,亦需將熱膨脹現象考慮在內。 To accumulate OLED, the gaseous organic starting material is fed into the heated gas distributor by carrier gas. These gaseous starting materials enter the process chamber through the exhaust port to condense on the substrate placed on the cooled pedestal for this purpose. These substrates may have a surface greater than 1 m 2 . A CVD or PVD reactor with a pedestal diagonal of 2m to 3m is required. Since this air intake mechanism must extend over the entire surface of the base, it is necessary to provide an air intake mechanism with a diagonal of 2m to 3m. The process chamber has a process chamber height of several centimeters. In order to be able to deposit layers with constant layer thickness and layer quality over the entire surface of the substrate, within tight tolerances, the height of the process chamber must remain constant throughout the range of the process chamber. This deposition process occurs in the low pressure range, that is, in the range where the atmospheric pressure exerts a great deformation force on the shell wall. When the pressure is reduced, the casing inevitably deforms. In addition, the air intake mechanism is heated, so in addition to mechanical forces, thermal expansion needs to be considered.
本發明之目的在於,改良同類型之塗佈裝置,使得該製程室高度在該基座之整個面或者該進氣機構之排氣面的範圍中僅在緊公差內變化。 The purpose of the present invention is to improve the coating device of the same type, so that the height of the process chamber changes only within a close tolerance within the entire surface of the base or the exhaust surface of the intake mechanism.
本發明用以達成上述目的之解決方案為請求項所給予的發明,其中每個請求項原則上皆為達成上述目的之一項獨創解決方案。 The solution of the present invention for achieving the above-mentioned object is the invention given by the request item, wherein each request item is in principle an original solution for achieving the above-mentioned object.
在該殼體之上區段上固定有一組件。該組件包括進氣機構,其包含具有排氣口之排氣面。該排氣面在一特別是水平之排氣平面上延伸。該組件透過多個懸掛位置固定在該殼體上。設有調溫構件,該進氣機構可透過該等調溫構件自大致上相當於該殼體溫度之第一溫度調溫至與該殼體溫度不同之第二溫度。此點可藉由加熱該進氣機構實現,為此,該進氣機構配設有加熱裝置。在未加熱之狀態下,該進氣機構具有該殼體之溫度。在加熱之狀態下,該進氣機構具有高於該殼體之溫度。該進氣機構亦可透過冷卻裝置降溫至低於該殼體溫度之溫度。該等調溫構件可為該進氣機構中之供調溫液體(即熱或冷之液體)流過之通道。由於該組件之組成部分的調 溫及其所引發之溫度變化,該組件之尺寸發生變化。至少該進氣機構之尺寸由於該熱膨脹而發生變化。該等固定件以某種方式構建,使得該等固定件在該組件發生此種尺寸變化時發生變形或者具有在尺寸變化時彼此相對移動之元件。為此,該等固定件具有力傳遞構件,該等力傳遞構件將該組件之重力傳遞至該殼體。該等力傳遞構件特別是可彈性變形或者具有可較佳無磨損地彼此相對移動之元件。該等固定件較佳僅固定在該組件之外部水平邊緣上,特定言之,僅固定在保持裝置上。該等力傳遞構件較佳僅沿該水平方向運動/變形,而不是沿該垂直方向。較佳在一多邊形之角上實現該固定。該多邊形係指虛擬多邊形,其定義出若干角點,該等角點在水平之平面上佈置在該保持裝置之邊緣上。在該虛擬多邊形之角點上實現該固定。該多邊形可為三角形或四邊形。兩個固定點例如可被分配給該保持裝置之角點,例如一窄邊之該二個角點。第三角點可佈置在相對該窄邊之窄邊的中心。該等固定點亦可空間上被分配給寬邊角或寬邊。該等力傳遞構件可分別為一彎曲元件。該彎曲元件與殼體側之固定元件及組件側之固定元件連接。該彎曲元件可為矩形薄板。該佈置在角區中之彎曲板以某種方式相對該組件或該保持裝置定向,使得該組件或該保持裝置既可沿寬邊延伸方向擴展,亦可沿窄邊延伸方向擴展。較佳地,該撓曲彈性之板件處於一垂直平面內且具有一面法線,該面法線在該保持裝置或組件之窄邊及寬邊的側壁之夾角的角平分線上延伸。該面法線較佳朝向該幾何重心,特別是該組件之處於該水平面內的平面重心,使得該組件在該固定位置上之熱膨脹方向與該力傳遞構件之主彎曲方向一致。因此,就具有正方形輪廓之保持裝置或組件而言,該等彎曲板較佳以與寬邊 或窄邊成45°角之方式延伸。因此,該二個分別佈置在鄰近之角上的彎曲板各在一平面內延伸,其中該二個垂直平面以90°之角相交。第三固定板大約佈置在相對該二個固定位置之側壁之中心。該同樣在一垂直平面內延伸之該處的彎曲板平行於該保持裝置或該組件之側壁延伸。就非正方形之輪廓而言,該力傳遞構件之主彎曲方向,即特別是平面狀彎曲元件之面法線,指向該組件之重心,特別是該進氣機構或其保持裝置之重心。補充性地,可設有橫向於彎曲移動方向之浮動支承結構。為此,較佳設有螺栓,該螺栓透過水平之移動間隙伸入一開口。特定言之,設有固定銷,特別是該彎曲板,該力傳遞構件透過該固定銷固定在固定件上,其中該固定銷具有支承側邊,該支承側邊支承在位於支承面上之滑動元件上,使得該固定銷可橫向於該彎曲元件之主變形方向相對該支承面相對移動。補充性地,可設有安全裝置,在該力傳遞構件斷裂時,特別是在彎曲元件斷裂時,該安全裝置防止該組件(特別是該進氣機構)掉落。為此,安全銷可以垂直及/或水平之運動距離穿過安全開口。在熱膨脹時,該安全銷可自由地穿過該安全開口運動。佈置在該保持裝置或該組件之角區的固定件可由沿垂直方向延伸之桿件或繩索構成,亦可在該二個角點之間,將該固定件固定在該保持裝置或該組件之側壁上。該實心或空心之桿件具有較佳固定在該殼體上之上端以及較佳固定在該保持裝置或該組件上之下端。形式為實心或空心桿件之彎曲元件亦可佈置在該組件之側壁上。該等彎曲元件亦可具有其他形狀。在該等彎曲元件允許該組件或該保持裝置以摩擦最小之方式水平運動時係較有利。該固定可透過角元件實現。佈置在角區中之固定件亦可藉由橫樑固定在殼體上。在本發明之一種方案 中,該等固定元件具有彼此相對展開之元件。第一元件可牢固地固定在該殼體上。第二元件可牢固地固定在該組件或該保持裝置上,第三元件可將該第一及第二元件相連。亦可設有兩個或多個元件,該等元件將該牢固地固定在殼體上之固定元件與該牢固地固定在組件上之固定元件相連。在此較佳係指鏈節。該等展開之固定元件的佈置方案參閱關於該等彎曲元件之實施方案。該實施方案特別是就該等展開之固定元件的運動方向而言。 A component is fixed on the upper section of the housing. The assembly includes an intake mechanism that includes an exhaust surface with an exhaust port. The exhaust surface extends on a particularly horizontal exhaust plane. The assembly is fixed on the housing through a plurality of hanging positions. A temperature adjusting member is provided, and the air intake mechanism can adjust the temperature from the first temperature substantially corresponding to the temperature of the housing to a second temperature different from the temperature of the housing through the temperature adjusting members. This can be achieved by heating the air intake mechanism. To this end, the air intake mechanism is equipped with a heating device. In an unheated state, the air intake mechanism has the temperature of the housing. In the heated state, the air intake mechanism has a higher temperature than the housing. The air intake mechanism can also be cooled to a temperature lower than the temperature of the housing through the cooling device. The temperature regulating members may be channels for the temperature regulating liquid (that is, hot or cold liquid) to flow through in the air intake mechanism. Due to the adjustment of the components of the component The temperature and the temperature change caused by it change the size of the component. At least the size of the air intake mechanism changes due to the thermal expansion. The fixing members are constructed in a manner such that the fixing members deform when the assembly undergoes such a dimensional change or have elements that move relative to each other when the dimensional change occurs. To this end, the fixtures have a force transmission member that transmits the gravity of the assembly to the housing. In particular, the force transmission members are elastically deformable or have elements that can move relative to one another without wear. The fixing members are preferably fixed only on the outer horizontal edge of the assembly, in particular, only on the holding device. The force transmission member preferably moves/deforms only in the horizontal direction, not in the vertical direction. The fixing is preferably achieved at the corner of a polygon. The polygon refers to a virtual polygon, which defines a number of corner points, which are arranged on the edge of the holding device in a horizontal plane. The fixation is achieved at the corner of the virtual polygon. The polygon can be triangular or quadrilateral. For example, two fixed points can be assigned to the corner points of the holding device, for example the two corner points of a narrow side. The third triangle point may be arranged at the center of the narrow side relative to the narrow side. These fixed points can also be spatially allocated to wide corners or wide sides. The force transmission member may be a bending element. The bending element is connected to the fixing element on the housing side and the fixing element on the component side. The bending element may be a rectangular thin plate. The curved plate arranged in the corner area is oriented in a manner relative to the assembly or the holding device such that the assembly or the holding device can be expanded in both the broad-side extension direction and the narrow-side extension direction. Preferably, the flexurally elastic plate is in a vertical plane and has a surface normal that extends on the angle bisector of the angle between the narrow and wide side walls of the holding device or component. The surface normal is preferably oriented toward the geometric center of gravity, especially the center of gravity of the component in the horizontal plane, so that the direction of thermal expansion of the component at the fixed position coincides with the main bending direction of the force transmitting member. Therefore, in the case of holding devices or components with a square profile, the curved plates are preferably Or the narrow side extends at an angle of 45°. Therefore, the two curved plates respectively arranged at adjacent corners each extend in a plane, wherein the two vertical planes intersect at an angle of 90°. The third fixing plate is arranged approximately at the center of the side wall opposite to the two fixing positions. The curved plate extending there also in a vertical plane extends parallel to the side wall of the holding device or the assembly. As far as the non-square contour is concerned, the main bending direction of the force transmission member, in particular the surface normal of the planar bending element, points to the center of gravity of the assembly, especially the center of gravity of the air intake mechanism or its holding device. Additionally, a floating support structure may be provided transverse to the direction of bending movement. For this purpose, bolts are preferably provided, which extend into an opening through the horizontal movement gap. In particular, there is a fixing pin, in particular the curved plate, through which the force transmission member is fixed on the fixing piece, wherein the fixing pin has a supporting side, which is supported on a slide located on the supporting surface On the element, the fixing pin can move relative to the bearing surface transversely to the main deformation direction of the bending element. In addition, a safety device may be provided, which prevents the assembly (particularly the air intake mechanism) from falling when the force transmission member breaks, especially when the bending element breaks. For this purpose, the safety pin can pass through the safety opening with a vertical and/or horizontal movement distance. During thermal expansion, the safety pin can move freely through the safety opening. The fixing member arranged in the corner area of the holding device or the assembly can be composed of a rod or a rope extending in the vertical direction, and can also fix the fixing member on the holding device or the assembly between the two corner points On the side wall. The solid or hollow rod has an upper end that is preferably fixed on the housing and an upper and lower end that is preferably fixed on the holding device or the assembly. Bending elements in the form of solid or hollow rods can also be arranged on the side walls of the assembly. The curved elements can also have other shapes. It is advantageous when the bending elements allow the assembly or the holding device to move horizontally with minimal friction. This fixation can be achieved through corner elements. The fixing member arranged in the corner area can also be fixed on the shell by the cross beam. In a solution of the invention In these, the fixing elements have elements that are deployed relative to each other. The first element can be firmly fixed on the housing. The second element can be firmly fixed on the assembly or the holding device, and the third element can connect the first and second elements. Two or more elements may also be provided, which connect the fixing element firmly fixed to the housing with the fixing element firmly fixed to the assembly. Here, it is preferably referred to as a chain link. For the arrangement of the unfolded fixing elements, please refer to the implementation of the bending elements. This embodiment relates in particular to the direction of movement of the deployed fixing elements.
該組件較佳具有固定在該殼體之上區段上的保持裝置。其為可溫度穩定及機械穩定之保持裝置。該進氣機構透過多個懸掛位置固定在該形狀穩定之保持裝置上。該等懸掛位置大致上均勻地分佈在該進氣機構之整個延伸面上。該等懸掛位置間的間距較該進氣機構之對角延伸度至少減小3倍,較佳減小4倍或5倍。兩個鄰近之懸掛位置間的最大間距亦可最大為該進氣機構之對角延伸度的十分之一。為實現機械穩定,該保持裝置可具有機械穩定元件。該等機械穩定元件可由垂直壁構成。該保持裝置較佳形成由相交叉之垂直壁構成的桁架。兩個垂直且視情況亦彼此平行延伸之垂直壁之間距較該進氣機構之對角距離減小至少3倍,4倍,較佳5倍。沿垂直方向延伸之柱形氣室具有一基面,其較佳最大相當於該進氣機構之基面的百分之一並且可具有棋盤形或蜂窩狀輪廓。該保持裝置較佳僅透過水平邊緣固定在殼體上。該保持裝置之水平邊緣固定在該殼體上。該保持裝置之整個中央表面區段自由地繃緊該進氣機構,在多個大致上均勻分佈在該面上的位置上與進氣機構穩定連接。該保持裝置係溫度穩定。為此,可設有主動或被動之溫度穩定裝置。該保持裝置以某種方式實現溫度穩定,使得在與進氣機構 之溫度差發生變化時,該保持裝置之溫度在水平方向及垂直方向上皆不發生顯著變化。較佳地,該溫度在該整個由保持裝置所構成之主體內部發生變化,亦即較佳在該桁架內部在+/-5度之範圍內變化。較佳地,最冷點與最熱點之溫差最大為5度。為被動地穩定溫度,隔熱板可例如配設反射表面或絕緣體。為主動地穩定溫度,可使用穿過調溫通道流動之調溫介質,例如調溫液體。該等調溫通道可佈置在該保持裝置內部。該等調溫通道較佳設置在該保持裝置上方或下方。若由於該進氣機構之溫度在塗佈過程期間保持在較高溫度上,必須在調溫時使該保持裝置冷卻,則較佳使用主動調溫元件,其佈置在進氣機構與保持裝置間之區域中。此外,該保持裝置之使其具有桁架之形狀的蜂窩狀或箱形結構還實現機械穩定性。該等固定件係指該前述之彈性固定件,該保持裝置之邊緣區域透過該等彈性固定件固定在殼體上。在一種較佳設計方案中,在該進氣機構與該保持裝置間存在垂直之間隙。多個吊架用於將進氣機構固定在該保持裝置上。該等吊架可為長條形金屬或陶瓷拉力元件,該等拉力元件以其上端固定在該保持裝置上且以其下端固定在該進氣機構之固定位置上。該等吊架可進行高度調整。如此便能在任一懸掛位置上,對排氣面與基座頂面間之間距,即該製程室高度,進行調整。該等吊架較佳由具有較低之熱膨脹係數的材料製成。該進氣機構之壁部配設有調溫通道。特定言之,該進氣機構之形成排氣面之壁部及該與其遠離之壁部配設有供調溫劑(例如較熱之液體)流過之通道。不僅該保持裝置之形狀有助於實現其溫度穩定性。該保持裝置構建為輕型組件。該等用以主動減少自進氣機構至保持裝置之熱輸送之措施可包括在進氣機構與保持裝置間的間隙中佈置一或 多個隔熱板。該等隔熱板為面狀物體,其以平行於該進氣機構之面積延伸的方式設置在間隙中。該等面狀物體之表面可具有高反射性。作為替代方案,亦可在間隙中佈置有絕緣體。主動冷卻至少一隔熱板。該主動冷卻之隔熱板較佳緊鄰該保持裝置。該主動冷卻之隔熱板可為面積延伸約相當於該保持裝置之面積延伸或該進氣機構之面積延伸的板件。供冷卻劑流過之冷卻劑通道在該板件內部延伸。因此,該保持裝置可保持在恆定之溫度上。若對該進氣機構進行加熱,則該保持裝置基本上保持其溫度。該製程室高度在該裝置工作期間可變化之距離在1mm以下。該殼體之表面溫度約為30℃。可將該保持裝置之溫度穩定在50℃之值。為此,將該主動隔熱板冷卻至溫度為約50℃。在溫度例如為450℃時,該構建為蓮蓬頭之進氣機構工作,該基板降溫至溫度為20℃。藉由一或多個處於該主動隔熱板與該進氣機構間之被動隔熱板減少自進氣機構至主動冷卻之隔熱板的熱通量。緊鄰該進氣機構之隔熱板的表面溫度例如可為350℃。該隔熱板可由金屬或陶瓷材料構成。在該被動隔熱板與該主動隔熱板之間可佈置有另一被動隔熱板,其同樣由金屬板或陶瓷板構成。該隔熱板之溫度在工作時約為270℃。在該進氣機構與該主動冷卻之隔熱板之間亦可設有兩個以上之被動隔熱板。該等隔熱板之表面可具有較小之光學發射率。該等表面可為拋光之反射表面。可使用該等吊架,以便保持該等隔熱板。亦可僅該等吊架穿過該等隔熱板之開口而突出,使得該等隔熱板之變形不會影響該進氣機構在腔室中之位置。根據本發明,該保持裝置不易變形。在此係指由溫度變化及/或壓力變化所引起之變形。該等隔熱板可懸掛在獨立之懸掛裝置上,該懸掛裝置固定在該殼體頂部或該保持裝置 上。此外,本發明亦有關於一種操作此種裝置之方法。 The assembly preferably has a holding device fixed on the upper section of the housing. It is a holding device that is stable in temperature and mechanically stable. The air intake mechanism is fixed on the stable holding device through a plurality of hanging positions. The suspension positions are substantially evenly distributed on the entire extension surface of the air intake mechanism. The distance between the suspension positions is reduced by at least 3 times, preferably by 4 times or 5 times, the diagonal extension of the air intake mechanism. The maximum distance between two adjacent hanging positions can also be a maximum of one-tenth of the diagonal extension of the air intake mechanism. To achieve mechanical stability, the holding device may have mechanical stabilization elements. Such mechanical stabilization elements can be formed by vertical walls. The holding device preferably forms a truss composed of intersecting vertical walls. The distance between the two vertical walls, which also extend parallel to each other as appropriate, is reduced by at least 3 times, 4 times, and preferably 5 times the diagonal distance of the intake mechanism. The cylindrical gas chamber extending in the vertical direction has a base surface, which preferably corresponds to at most one percent of the base surface of the air intake mechanism and may have a checkerboard or honeycomb contour. The holding device is preferably fixed to the housing only through horizontal edges. The horizontal edge of the holding device is fixed on the housing. The entire central surface section of the holding device freely tightens the air intake mechanism, and is stably connected to the air intake mechanism at a plurality of positions substantially evenly distributed on the surface. The holding device is stable in temperature. For this purpose, active or passive temperature stabilization devices can be provided. The holding device achieves temperature stabilization in a certain way When the temperature difference changes, the temperature of the holding device does not change significantly in both the horizontal and vertical directions. Preferably, the temperature changes within the entire body composed of the holding device, that is, within the range of +/- 5 degrees within the truss. Preferably, the temperature difference between the coldest spot and the hottest spot is at most 5 degrees. In order to passively stabilize the temperature, the heat shield can be provided with a reflective surface or an insulator, for example. To actively stabilize the temperature, a temperature-regulating medium flowing through the temperature-regulating channel, such as a temperature-regulating liquid, can be used. The temperature adjustment channels may be arranged inside the holding device. The temperature adjustment channels are preferably arranged above or below the holding device. If the temperature of the air intake mechanism is maintained at a higher temperature during the coating process, it is necessary to cool the holding device during temperature adjustment, it is preferable to use an active temperature adjustment element, which is arranged between the air intake mechanism and the holding device In the area. In addition, the honeycomb or box-like structure of the holding device which has the shape of a truss also achieves mechanical stability. The fixing members refer to the aforementioned elastic fixing members, and the edge area of the holding device is fixed to the housing through the elastic fixing members. In a preferred design, there is a vertical gap between the air intake mechanism and the holding device. A plurality of hangers are used to fix the air intake mechanism on the holding device. The hangers may be elongated metal or ceramic tension elements, the tension elements of which are fixed on the holding device with their upper ends and fixed on the fixed position of the air intake mechanism with their lower ends. These hangers can be adjusted in height. In this way, at any suspension position, the distance between the exhaust surface and the top surface of the base, that is, the height of the process chamber, can be adjusted. The hangers are preferably made of materials with a low coefficient of thermal expansion. The wall part of the air intake mechanism is provided with a temperature adjustment channel. In particular, the wall portion of the air intake mechanism forming the exhaust surface and the wall portion far away therefrom are provided with passages through which a temperature control agent (for example, a hot liquid) flows. Not only the shape of the holding device helps to achieve its temperature stability. The holding device is constructed as a lightweight component. Such measures for actively reducing the heat transfer from the air intake mechanism to the holding device may include arranging a or in the gap between the air intake mechanism and the holding device Multiple heat shields. The heat insulating plates are planar objects, which are arranged in the gap in a manner extending parallel to the area of the air intake mechanism. The surface of the planar objects may have high reflectivity. As an alternative, an insulator can also be arranged in the gap. Actively cool at least one insulation board. The actively cooled heat shield is preferably immediately adjacent to the holding device. The actively cooled heat insulation plate may be a plate member whose area extends approximately equal to that of the holding device or that of the air intake mechanism. The coolant passage through which the coolant flows extends inside the plate. Therefore, the holding device can be kept at a constant temperature. If the air intake mechanism is heated, the holding device basically maintains its temperature. The process chamber height can be changed by less than 1 mm during the operation of the device. The surface temperature of the casing is about 30°C. The temperature of the holding device can be stabilized at a value of 50°C. To this end, the active heat shield is cooled to a temperature of about 50°C. When the temperature is, for example, 450°C, the air intake mechanism constructed as a shower head works, and the substrate is cooled to a temperature of 20°C. The heat flux from the air intake mechanism to the actively cooled heat insulation plate is reduced by one or more passive heat insulation plates between the active heat insulation plate and the air intake mechanism. The surface temperature of the heat insulation board adjacent to the air intake mechanism may be 350°C, for example. The heat shield may be composed of metal or ceramic material. Between the passive heat insulation plate and the active heat insulation plate, another passive heat insulation plate may be arranged, which is also composed of a metal plate or a ceramic plate. The temperature of the insulation board is about 270°C during operation. More than two passive heat insulation plates may also be provided between the air intake mechanism and the actively cooled heat insulation plates. The surface of the heat insulation boards may have a small optical emissivity. These surfaces may be polished reflective surfaces. These hangers can be used in order to maintain these insulation boards. It is also possible that only the hangers protrude through the openings of the heat insulation boards, so that the deformation of the heat insulation boards does not affect the position of the air intake mechanism in the chamber. According to the invention, the holding device is not easily deformed. Here it refers to the deformation caused by temperature changes and/or pressure changes. The heat insulation boards can be hung on an independent suspension device, which is fixed on the top of the housing or the holding device on. In addition, the invention also relates to a method of operating such a device.
1‧‧‧殼體上部件 1‧‧‧Housing upper part
2‧‧‧殼體下部件 2‧‧‧Lower case parts
3‧‧‧保持裝置 3‧‧‧ Holding device
3'‧‧‧組件之邊緣 3'‧‧‧Edge of the component
4‧‧‧垂直壁 4‧‧‧Vertical wall
5‧‧‧垂直壁 5‧‧‧Vertical wall
6‧‧‧吊架,固定元件 6‧‧‧ Hanger, fixing element
6'‧‧‧固定元件 6'‧‧‧Fixed element
6"‧‧‧頭部 6"‧‧‧Head
7‧‧‧進氣機構 7‧‧‧ Intake mechanism
7'‧‧‧排氣面 7'‧‧‧ exhaust surface
8‧‧‧排氣口 8‧‧‧Exhaust
9‧‧‧調溫通道,調溫構件 9‧‧‧Temperature adjustment channel, temperature adjustment member
10‧‧‧被動隔熱板 10‧‧‧Passive heat insulation board
11‧‧‧主動隔熱板 11‧‧‧Active heat insulation board
12‧‧‧冷卻劑通道 12‧‧‧coolant channel
13‧‧‧固定件 13‧‧‧Fixed parts
13.1‧‧‧固定件 13.1‧‧‧Fixed parts
13.2‧‧‧固定件 13.2‧‧‧Fixed parts
13.3‧‧‧固定件 13.3‧‧‧Fittings
13.4‧‧‧固定件 13.4‧‧‧Fixed parts
14‧‧‧固定件 14‧‧‧Fixed parts
15‧‧‧基座 15‧‧‧Dock
16‧‧‧冷卻劑通道 16‧‧‧coolant channel
17‧‧‧筋部 17‧‧‧ tendon
18‧‧‧筋部 18‧‧‧ tendon
19‧‧‧開口 19‧‧‧ opening
20‧‧‧上水平壁 20‧‧‧Upper horizontal wall
21‧‧‧下水平壁 21‧‧‧Lower horizontal wall
22‧‧‧開口 22‧‧‧ opening
23‧‧‧組件 23‧‧‧ Components
24.1‧‧‧殼體側之固定元件 24.1‧‧‧Fixed element on the shell side
242‧‧‧殼體側之固定元件 242‧‧‧Fixed element on the shell side
24.3‧‧‧殼體側之固定元件 24.3‧‧‧Fixed element on the shell side
24.4‧‧‧殼體側之固定元件 24.4‧‧‧Fixed element on the shell side
25.1‧‧‧組件側之固定元件 25.1‧‧‧ Fixing element on the module side
25.2‧‧‧組件側之固定元件 25.2‧‧‧Fixed element on the module side
25.3‧‧‧組件側之固定元件 25.3‧‧‧Fixed element on the module side
25.4‧‧‧組件側之固定元件 25.4‧‧‧Fixed element on the module side
26.1‧‧‧中間元件,彎曲元件 26.1‧‧‧Intermediate element, bending element
26.2‧‧‧中間元件,彎曲元件 26.2‧‧‧Intermediate element, bending element
26.3‧‧‧中間元件 26.3‧‧‧Intermediate components
26.4‧‧‧中間元件,彎曲元件 26.4‧‧‧Intermediate element, bending element
27‧‧‧鏈節,殼體側 27‧‧‧Link, shell side
28‧‧‧鏈節,中間 28‧‧‧ link, middle
29‧‧‧鏈節,組件側 29‧‧‧Link, component side
30‧‧‧橫樑 30‧‧‧beam
31‧‧‧螺栓 31‧‧‧bolt
32‧‧‧固定銷 32‧‧‧Fixed pin
33‧‧‧安全銷 33‧‧‧ safety pin
34‧‧‧安全開口 34‧‧‧Safe opening
35‧‧‧固定開口 35‧‧‧Fixed opening
36‧‧‧保持開口 36‧‧‧Keep opening
38‧‧‧支承側邊 38‧‧‧support side
39‧‧‧滑動元件 39‧‧‧Sliding element
40‧‧‧支承面 40‧‧‧Support surface
41‧‧‧調整體 41‧‧‧Adjustment
42‧‧‧調整螺釘 42‧‧‧Adjustment screw
M‧‧‧中心,平面重心 M‧‧‧center, center of gravity
h‧‧‧熱膨脹方向 h‧‧‧direction of thermal expansion
下面結合實施例對本發明進行進一步說明。 The present invention will be further described below with reference to examples.
圖1為示意性所示之PVD塗佈裝置之沿圖2中之I-I線的剖面圖;圖2為該塗佈裝置之俯視圖;圖3為根據圖1中之III-III線之剖面圖;圖4為第二實施例之PVD反應器的殼體上部件之大約如圖1之剖面圖;圖5為如圖4之經切割的殼體上部件之立體圖;圖6為本發明之第三實施例之如圖3之示意圖;圖7為根據圖6中之VII-VII線之剖面圖;圖8為根據圖6中之VIII-VIII線之剖面圖;圖9為作為第四實施例之另一固定件之立體圖;圖10為作為第五實施例之另一固定件之立體圖;圖11為作為第六實施例之另一固定件之立體圖;圖12為附圖中之圖11之細節圖XII;圖13a至d為固定件13在組件23上之佈置方案的變體;圖14為另一實施例之類似圖6之示意圖;圖15為圖14中之固定件13.2之俯視圖;圖16為根據圖15中之XVI-XVI線之剖面圖;圖17為根據圖16中之XVII-XVII線之剖面圖;圖18為根據圖16中之XVIII-XVIII線之剖面圖;
圖19為根據圖16中之IXX-IXX線之剖面圖;圖19a為圖19中之局部IXXa之放大圖;圖20為圖14中之固定件13.1;圖21為根據圖20中之XXI-XXI線之剖面圖;圖22為根據圖21中之XXII-XXII線之剖面圖;圖23為根據圖21中之XXIII-XXIII線之剖面圖;圖24為根據圖21中之XXIV-XXIV線之剖面圖;及圖24a為圖24中之局部XXIVa之放大圖。
1 is a schematic cross-sectional view of the PVD coating device taken along line II in FIG. 2; FIG. 2 is a top view of the coating device; FIG. 3 is a cross-sectional view according to line III-III in FIG. 1; 4 is a cross-sectional view of the upper shell part of the PVD reactor of the second embodiment, as shown in FIG. 1; FIG. 5 is a perspective view of the cut upper shell part as shown in FIG. 4; FIG. 6 is the third of the
該如圖1至3所示之裝置為用於塗佈具有有機層之大型基板之PVD裝置。該等基板可呈矩形,其對角線為大於1m,較佳大於2m或3m。殼體下部件2承載用於支承該基板之基座15。基座15具有多個冷卻劑通道16,可將冷卻劑穿過該等冷卻劑通道引入該製程室。藉由該冷卻劑將該基座保持在約為20℃之溫度上。
The devices shown in FIGS. 1 to 3 are PVD devices for coating large substrates with organic layers. The substrates may have a rectangular shape with a diagonal greater than 1m, preferably greater than 2m or 3m. The
該殼體之上部件1具有殼體頂部,其被肋狀結構17、18機械穩定。殼體下部件2具有類似之用於機械穩定該殼體端蓋之肋狀結構。在該殼體頂部中可佈置有供液態調溫介質流過的調溫劑通道,從而將該殼體頂部保持在預設之溫度上。
The housing
在該殼體頂部之邊緣上以及在殼體上部件1之側壁之邊緣上設有固定件13、14。其係指使得保持裝置3之水平邊緣固定在殼體上部件1上的彈性固定件13、14。
Fixing
保持裝置3係形式為桁架或蜂窩結構之輕型組件。該桁架具有多個沿垂直連接線相連之面元件4、5。面元件4、5形成垂直壁。根據本實施例,保持裝置3由相交叉之垂直壁4、5所形
成之保持架構成,該保持架以其邊緣3'透過固定件13、14固定在殼體1上。保持裝置3僅在其邊緣3'上與殼體1固定在一起,故在殼體1、2內部發生壓力變化時,該殼體頂部之不可避免之變形不會導致保持裝置3在殼體1、2內部發生相關的位置變化。保持裝置3之整個被邊緣3'所包圍之中央表面區域自由地襯墊殼體上部件1之平行於該表面區域延伸之頂壁。固定件13、14固定在殼體上部件1之頂壁的邊緣上。保持裝置3形成曝露或閉合之氣室結構,其中該等氣室之水平面較保持裝置3之水平面減小至少100倍。一平面之垂直高度可處於該氣室之水平面之圓當量對角線的量級內。
The holding
進氣機構7係指一壁部具有調溫通道9之空心體,該進氣機構垂直佈置在基座15上方。進氣機構7之形成排氣面7'之底面與基座15之頂面的間距為數厘米。排氣面7'具有多個以蓮蓬頭的方式佈置之排氣口8,製程氣體可穿過該等排氣口自進氣機構7之空腔流入該由基座15之頂面及進氣機構7之底面構成的製程室。將進氣機構7之溫度調至約450℃。
The
進氣機構7透過機械固定元件6固定在保持裝置3上。機械固定元件6大致上均勻地分散佈置在進氣機構7之整個延伸面上。鄰近之固定元件6間的間距小於進氣機構7之邊長或對角線。較佳地,兩個鄰近之固定元件6間的最大間距小於該進氣機構之圓當量對角線的十分之一。
The
該等機械固定元件係指某種吊架6,其透過頭部6"固定在保持裝置3上並且在與進氣機構7之垂直間隙之範圍內延伸。在懸掛位置6'上之吊架6透過其支腳固定在進氣機構7上。進氣機構7具有兩個相互平行延伸之壁部,其分別具有調溫通道9。
較佳地,較佳構建為蓮蓬頭之進氣機構7之所有六個側皆被加熱。為此,所有六個側之壁部皆具調溫元件,如電加熱裝置或供調溫液體流過之通道,使得該進氣機構之溫度可被均勻地加熱至例如450℃。固定位置6'可設置在進氣機構7之上壁上。根據本實施例,固定位置6'設在進氣機構7之具有排氣口8之壁部上。亦即,吊架6之支腳固定在進氣機構7之下壁上。
The mechanical fixing elements refer to a kind of
吊架6之頭部6"安裝在保持裝置3之頂面的開口或凹槽19中。頭部6"可由旋入螺紋中之螺釘構成,使得吊架6之長度及懸掛位置6'之垂直位置能夠透過旋轉頭部6"發生變化。頭部6"亦可由螺母或其他調整元件構成,用於局部調整該進氣機構之高度。如此便可對該製程室之高度進行局部預調整。吊架6較佳由僅具有較小之熱膨脹係數的材料構成,使得吊架6之升溫不會影響該製程室之局部高度。
The
在一種亦在如圖1及圖3所示之實施例中得到實現之較佳設計方案中,保持裝置3不僅為機械穩定之保持架,而且為溫度穩定之保持架。為此,在保持裝置3下方直接設有主動調溫之隔熱板11。隔熱板11係指由金屬或陶瓷構成之具有冷卻劑通道12之板。將冷卻劑穿過冷卻劑通道12導入,此點致使主動冷卻之隔熱板11之溫度約為50℃。亦可直接冷卻該保持裝置。
In a preferred design that is also realized in the embodiments shown in FIGS. 1 and 3, the holding
在主動冷卻之隔熱板11及進氣機構7之間可佈置有一或多個被動隔熱板。根據本實施例,設有被動隔熱板10,其亦可為金屬板或陶瓷板。該被動隔熱板之溫度處於該進氣機構之溫度與該主動隔熱板之溫度之間。該被動隔熱板之溫度可在400℃至200℃之範圍內。在使用多個彼此平行佈置之被動隔熱板時,各隔熱板
之溫度可為270℃或350℃。藉此將該保持裝置之溫度保持約為50℃。在此情況下,該殼體溫度為約30℃。被動隔熱板10較佳為具有高反射之表面的金屬板。該等表面之發射係數小於0.2。
One or more passive heat insulation plates may be arranged between the actively cooled
殼體上部件1之如圖4及圖5所示之第二實施例亦具有構建為輕型組件之保持架3,其由桁架狀之室結構構成,其中垂直室壁4、5在垂直連接線上相連。在此,室壁4、5亦可由薄金屬板構成。保持架3亦補充性地具有水平延伸之上水平壁20及下水平壁21。
The second embodiment of the
根據本實施例,亦僅保持裝置3之垂直圍繞的邊緣3'與殼體1連接。與此相關之固定件13可為彈性固定件。保持裝置3之所有壁部皆由最薄之表面材料(如板材)構成。其形成開放氣室式或封閉氣室式立體結構。保持裝置3固定在殼體上部件1之頂板的邊緣上。保持裝置3亦可整體式製成,例如自實心塊體銑削出桁架。
According to this embodiment, only the vertically surrounding
具有多個排氣口之進氣機構7透過多個大致上均勻佈置在進氣機構7之延伸面上之固定位置6'固定在保持裝置3上。該進氣機構連接有機械固定元件6,其在此亦由吊架構成。吊架之頭部6"與保持裝置3連接。吊架6之支腳在固定位置6'上與進氣機構7連接。在此,亦在保持裝置3與進氣機構7間之垂直間隙中設有多個隔熱板10、11。在此,亦設有至少一主動冷卻之隔熱板11,其直接佈置在該保持裝置下方並且平行於保持裝置3之底面延伸。多個彼此平行延伸之被動隔熱板10在主動冷卻之隔熱板11與進氣機構7之頂面間延伸。
The
根據本實施例,該等隔熱板與吊架6連接。因此,吊
架6不僅將進氣機構7保持在保持裝置3上,而且亦將隔熱板10、11保持於其垂直位置上。隔熱板10、11亦可透過獨立之吊架固定在保持裝置3上。該等隔熱板具有高反射之表面。佈置在保持裝置3下方之板件11具有冷卻劑通道12,該板件在保持裝置3之整個面積延伸之範圍內延伸,冷卻水穿過該等冷卻劑通道流入。
According to the present embodiment, the heat insulation panels are connected to the
在未繪示之實施例中,隔熱板10、11可透過獨立之懸掛裝置直接固定在殼體1上,該等隔熱板之垂直位置基本上不臨界。此等懸掛裝置可設置在隔熱板10、11之邊緣上。該等懸掛裝置亦可設置在隔熱板10、11之中央表面區域中且例如可穿過保持裝置3之通孔,以便固定在殼體上部件1之頂部上。
In an unillustrated embodiment, the
在殼體上部件1之蓋部中,可封閉之開口22佈置在加固筋17、18間之區域中。藉由打開開口22可實現通向保持裝置3之頂面以及通向上水平壁20之入口。就地設有開口19,吊架6之頭部6"插在該等開口中。頭部6"可由螺紋件構成,以便藉由旋轉頭部6"影響吊架6之有效長度。因此,該等吊架之頭部6"形成調整機構,從而局部地影響該製程室之高度,亦即進氣機構7與基座15之間距。
In the cover of the
使用該前述之裝置,以便沈積大型基板。根據該方法,將堅固之粉末狀的起始材料透過蒸發器轉化成氣態。藉由載氣將該如此形成之有機蒸汽輸送至進氣機構7,在此,該蒸汽自排氣口8逸出,從而在放置在基座15之基板的表面上進行冷凝。
Use the aforementioned device to deposit large substrates. According to this method, a solid powdery starting material is converted into a gaseous state through an evaporator. The organic vapor thus formed is transported to the
根據前述之實施例,保持裝置3連同進氣機構7形成組件23,其藉由固定件13、14固定在殼體1之上區段上。
According to the aforementioned embodiment, the holding
根據如圖6至8所示之實施例,僅示出組件23之保
持裝置3。在此,保持裝置3亦為輕型主體,如由桁架構成之框架。其具有包含四個角及連接該等角之側壁的矩形輪廓。在兩個藉由一側壁相連之角上設有固定件13.1。在該相對之側壁的中心設有另一固定件13.2,使得固定件13.1、13.2佈置在等腰三角形之角點上。
According to the embodiment shown in FIGS. 6 to 8, only the warranty of the
固定件13.1、13.2基本上由三個固定元件構成。該等固定件分別具有一固定元件24.1、24.2,固定件13.1、13.2透過該固定元件固定在殼體上部件1上。另一固定元件25.1、25.2固定在保持裝置3上。固定元件25.1為角狀元件,其包括保持裝置3之角區且具有角邊,該等角邊平面地與保持裝置3之側壁連接。固定元件25.2具有在一平面內延伸之固定側,其大約在該側壁之中心上固定在保持裝置3上。
The fixing parts 13.1, 13.2 basically consist of three fixing elements. The fixing elements respectively have a fixing element 24.1, 24.2, through which the fixing elements 13.1, 13.2 are fixed on the
該二個固定元件24.1或24.2以及25.1或25.2分別藉由中間元件26.1、26.2相連。中間元件26.1、26.2有助於力傳遞,固定元件25.1、25.2之重力透過該等中間元件傳遞至固定元件24.1、24.2。因此,中間元件26.1、26.2係指力傳遞構件,其在圖6至8之實施例中皆具矩形板件之形式。彎曲元件26.1、26.2之上區段分別與殼體側之固定元件24.1、24.2連接。中間元件26.1、26.2之下區段與組件側之固定元件25.1、25.2連接。彎曲元件26.1、26.2具有沿垂直方向延伸之彎曲面,使得該面法線指向水平方向。彎曲元件26.1之面法線大約指向保持裝置3之兩個相交於角點的側壁之角平分線的方向。而在一種較佳方案中,彎曲元件26.1之面法線指向保持裝置3之幾何重心M,使得在該固定點上之熱膨脹方向h與彎曲元件26.1之面法線一致。彎曲元件26.2之面法線沿橫向於該保持裝置之側壁之方向延伸。在保持裝置3熱膨脹時,後者可在該
水平面上膨脹。在此情況下,保持裝置3之各角的間距可增大或縮小。保持裝置3之此種尺寸變化與平面狀之彎曲元件26.1、26.2的略微彎曲關聯。
The two fixing elements 24.1 or 24.2 and 25.1 or 25.2 are connected by intermediate elements 26.1 and 26.2, respectively. The intermediate elements 26.1, 26.2 contribute to force transmission, and the gravity of the fixing elements 25.1, 25.2 is transmitted to the fixing elements 24.1, 24.2 through these intermediate elements. Therefore, the intermediate elements 26.1, 26.2 refer to force transmission members, which are in the form of rectangular plates in the embodiments of FIGS. 6 to 8. The upper sections of the bending elements 26.1 and 26.2 are connected to the fixing elements 24.1 and 24.2 on the housing side, respectively. The sections below the intermediate elements 26.1, 26.2 are connected to the fixing elements 25.1, 25.2 on the assembly side. The bending elements 26.1, 26.2 have a curved surface extending in the vertical direction so that the normal of the surface points in the horizontal direction. The surface normal of the bending element 26.1 points approximately in the direction of the angle bisector of the two side walls of the holding
該等彎曲元件可為彎曲板,其具有彼此平行之緣邊,該等緣邊分別透過固定爪固定在該殼體及該保持裝置之固定元件24.1、24.2、25.1、25.2上。本發明之力傳遞構件以某種方式設計以及固定在固定元件上,使得該等力傳遞構件允許組件23僅在該水平面上發生避讓運動,該組件特別是該進氣機構。因此,該等彎曲元件之移動距離較該彎曲元件之彎曲區段的長度減小至少一量級(10倍)。
The bending elements may be bending plates having edges parallel to each other, and the edges are respectively fixed to the fixing elements 24.1, 24.2, 25.1, and 25.2 of the housing and the holding device through fixing claws. The force transmission member of the present invention is designed and fixed on the fixing element in such a way that the force transmission member allows the
圖9示出固定件13.4之變體。撓曲彈性之中間元件26.4形式為可為實心或空心之桿件,其藉由上固定元件24.4與殼體1連接,藉由下固定元件25.4與保持裝置3連接。亦可代替桿件使用繩索。該桿件及該繩索為該等力傳遞構件,保持裝置3及該進氣機構之重力透過該等力傳遞構件傳遞至該殼體。固定元件24.1及25.4可為角元件。中間元件26.1較佳亦如中間元件26.1及26.2由金屬構成。桿件26.4沿垂直方向延伸。其亦可傾斜於垂直方向延伸。該桿件具有渾圓橫截面,亦可具有另一橫截面,例如多邊形橫截面。
Figure 9 shows a variant of the fixing element 13.4. The flex elastic middle element 26.4 is in the form of a solid or hollow rod, which is connected to the
圖10所示之實施例基本上符合圖6及8所示之角固定架。該圖示出設計為橫樑之殼體側之固定元件24.1,其透過螺釘固定在殼體上部件1之內側壁上。組件側之固定元件25.1具有兩個互成90°角之角邊,該等角邊藉由螺釘固定在組件23上。與固定元件25.1之角邊錯開45°延伸之面與撓曲彈性之中間元件26.1連接。
中間元件26.2亦如中間元件26.1係指力傳遞構件。
The embodiment shown in FIG. 10 basically corresponds to the angle fixing frame shown in FIGS. 6 and 8. The figure shows a fixing element 24.1 designed as the housing side of the crossbeam, which is fixed to the inner side wall of the
圖11及12所示之實施例示出橫樑30之連接,該橫樑被兩個殼體側之固定元件24.3、24.4承載,透過四個鏈節27、28、29與組件側之固定元件25.3連接,該固定元件為角元件。最上方之鏈元件27被橫樑30之固定螺栓保持,因而插在橫樑30之間隙中。下方之鏈元件29保持在兩個固定元件25.3之間且亦被固定螺栓穿過。設有兩個中間鏈節28,其連接上鏈節27與下鏈節29。鏈節27、28、29形成力傳遞構件,以便傳遞該重力。
The embodiments shown in FIGS. 11 and 12 show the connection of the
如圖6所示之實施例,在此亦可在角區中實現與組件23之側壁成對角線之避讓運動,其中鏈節27、28、29彼此相對展開。鏈節27及29之開口彼此錯開90°。鏈節27、28、29為在一平面上延伸之圓形物體,其分別以錯開90°角之方式相嚙合。
As shown in the embodiment shown in FIG. 6, the corner area can also be used to avoid the diagonal movement of the side wall of the
與圖6所示之實施例類似,可大約在相對該二個角區之側壁的中心上設有第三且未繪示之固定件,其亦具有多個相嚙合之鏈節27、28、29,使得該處之窄壁可沿橫向於其延伸方向之方向避讓。
Similar to the embodiment shown in FIG. 6, a third and unillustrated fixing member may be provided on the center of the side wall opposite to the two corner areas, and it also has a plurality of
圖13a示意性示出固定件13在兩個角區上以及在組件23之相對的側壁之中心上的佈置方案,使得固定件13佈置在一等腰三角形之角點上。
Fig. 13a schematically shows the arrangement of the fixing
圖13b示出固定件13在具有矩形輪廓之組件之四個角點上的佈置方案,其中固定件13在此佈置在一四邊形之角點上。
FIG. 13b shows the arrangement of the fixing
圖13c示出另一方案,根據該方案,固定件13大約佈置在組件23之互相垂直之側壁的中心上。該固定件在此係指彎曲元件,其具有垂直於該等側壁之延伸方向的彎曲方向。該等彎曲
元件以某種方式設計,使得組件23亦可沿一處於該等彎曲元件之平面內的方向膨脹。為此,該等彎曲元件不能構建為平面狀主體,而是例如採用梳子狀設計或具有輪輻。
Fig. 13c shows another solution according to which the fixing
圖13d所示之實施例示出在使用四個固定件13之情況下固定組件23,其中各兩個固定件13固定在組件23之兩個相對的側壁上。在此情況下,固定件13與該等角點間隔一定距離。該等固定件與各角點之間距例如為該側壁長度之三分之一,該等固定件分配給該等較長之側壁。在此,該等彎曲元件可由透過上端以位置固定的方式固定在殼體上之桿件構成,使得該固定在組件23上之下端可在一水平面上以撓曲彈性的方式移動。
The embodiment shown in FIG. 13d shows that the
圖14至24a示出一種尤佳實施例,根據該實施例,組件23在三個固定位置上固定在該殼體上,該組件可為保持裝置3,其具有固定在其上之進氣機構7,或者僅為進氣機構7。為此設有三個固定件13.1、13.2,該等固定件卡在組件23之水平邊緣上,進而形成組件側之固定元件25.1及25.2。組件23具有非正方形之矩形輪廓。兩個組件側之固定元件25.1固定在該矩形之較短之側的兩個角上。該二個組件側之固定元件25.1中之任一個皆與固定在該殼體上之殼體側之固定元件24.1連接,在相對該較短矩形側之較短矩形側上,第三固定件13.1設置在該矩形側之中心,該第三固定件亦具有組件側之固定件25.2及殼體側之固定件24.2。
14 to 24a show a particularly preferred embodiment, according to this embodiment, the
如圖16、圖21以及該等其中所繪之剖面所示,所有組件側之固定元件25.1、25.2皆透過中間元件26.1、26.2與殼體側之固定元件24.1、24.2連接。中間元件26.1、26.2係指形式為彎曲板之力傳遞構件。該彎曲板基本上具有矩形橫截面且在其頂面及底
面具有材料增厚。中間元件26.1、26.2之上部材料增厚具有擰入孔,該等固定螺釘穿過該等擰入孔擰入,中間元件26.1、26.2透過該等固定螺釘旋擰在殼體側之固定元件24.1、24.2上。為此,殼體側之固定元件24.1、24.2具有可垂直移動之調整體41,該力傳遞構件固定在該調整體上。藉由支承調整體41之調整螺釘42可對調整體41進行高度調節,以便如此調節進氣機構7相對基座15之間距。
As shown in FIGS. 16 and 21 and the cross-sections drawn therein, all the fixing elements 25.1 and 25.2 on the component side are connected to the fixing elements 24.1 and 24.2 on the housing side through the intermediate elements 26.1 and 26.2. Intermediate elements 26.1, 26.2 refer to force transmission members in the form of curved plates. The curved plate basically has a rectangular cross-section and at its top and bottom
The surface has a thickened material. The upper parts of the intermediate elements 26.1, 26.2 are thickened with screw holes, and the fixing screws are screwed through the screw holes, and the intermediate elements 26.1, 26.2 are screwed to the fixing elements 24.1 on the housing side through the fixing screws 24.2 on. For this purpose, the fixing elements 24.1, 24.2 on the housing side have a vertically
中間元件26.1、26.2之下部材料增厚具有支承開口36。支承開口36被固定銷32貫穿,該固定銷與組件側之固定元件25.1、25.2牢固地連接。為此,組件側之固定元件25.1、25.2具有垂直延伸之縫隙,中間元件26.1、26.2之下部材料增厚被***該縫隙。該縫隙與固定銷32所***之固定口35相交,該固定銷為螺栓31之部件。
The lower element of the intermediate elements 26.1, 26.2 is thickened and has a
保持開口36具有沿水平方向延伸之支承面40,在該支承面上設有滑動元件39。固定銷32之支承側邊38以某種方式支承在滑動元件39上,使得支承側邊38可相對支承面40沿水平方向略微移動。因而能夠平衡該熱膨脹運動之運動分量,該熱膨脹運動並非沿該構建為彎曲元件之中間元件26.1、26.2的主彎曲方向之方向延伸。
The holding
為防止中間元件26.1、26.2斷裂而設有安全裝置34、33。該安全裝置係指安全銷33,其牢固地固定在該二個組件24、25中之一上且卡入該其他固定元件之眼部34。根據本實施例,安全銷33以位置固定的方式被分配給組件側之固定元件25.1、25.2。具體而言,安全銷33由前述之螺栓31構成。該安全眼由安全開口34構成,該安全開口設置在殼體側之固定元件24.1、24.2之突起上。
In order to prevent the intermediate elements 26.1, 26.2 from breaking,
安全開口34之直徑大於安全銷33之直徑,使得安全銷33自由地伸入開口34。安全銷33之周面在其整個周長之範圍內與安全開口34之內壁間隔一定距離,使得安全銷33自由且非接觸式地伸入安全開口34。
The diameter of the
若需要使該撓曲彈性力傳遞構件斷裂,則組件23僅向下掉落如此程度,直至安全銷33碰撞開口34之壁部。
If the flexural elastic force transmitting member needs to be broken, the
本發明之安全裝置具有以周圍皆間隔一定距離之方式伸入安全開口34之安全銷33,其中安全銷33被分配給殼體側或組件側之固定元件,安全開口34被分配給該其他固定元件,其中除此之外,該組件側之固定元件及該殼體側之固定元件僅藉由實現水平避讓運動之中間元件相連。
The safety device of the present invention has a
上述實施方案有助於對本申請所綜述之發明進行闡述,此等發明亦至少藉由以下特徵組合對先前技術進行獨創性地改進,亦即:一種CVD或PVD塗佈裝置,其特徵在於,該等固定件13、14具有力傳遞構件26.1、26.2、26.3、26.4;27、28、29,在該調溫所引起之組件23之尺寸變化時,該等力傳遞構件發生變形或者彼此相對移動。
The above-mentioned embodiments help to explain the inventions summarized in this application, and these inventions also make original improvements to the prior art by at least the following feature combinations, namely: a CVD or PVD coating device, characterized in that The fixing
一種CVD或PVD塗佈裝置,其特徵在於,該組件23僅以其水平邊緣3'固定在該殼體1、2上。
A CVD or PVD coating device, characterized in that the
一種CVD或PVD塗佈裝置,其特徵在於,該組件23透過可彈性變形之力傳遞構件26.1、26.2、26.4固定在該殼體1、2上,該等力傳遞構件具有朝向該組件23之水平平面重心M之主變形方向。
A CVD or PVD coating device, characterized in that the
一種CVD或PVD塗佈裝置,其特徵在於,該進氣機構7透過多個分散佈置在該整個延伸面上之吊架6固定在組件23之透過該等固定件13、14固定在該殼體1、2上之保持裝置3上,其中該等吊架6沿垂直方向自該等懸掛位置6'延伸至該保持裝置3,在進氣機構7與保持裝置3間之垂直間隙中佈置有調溫裝置11、12及/或一或多個隔熱板10、11。
A CVD or PVD coating device, characterized in that the
一種CVD或PVD塗佈裝置,其特徵在於,該等固定件13、14、13.1、13.2、13.3、13.4在該具有矩形輪廓之組件23的邊緣上佈置在一多邊形之角點上,該多邊形特別是三角形或四邊形。
A CVD or PVD coating device, characterized in that the fixing
一種CVD或PVD塗佈裝置,其特徵在於,至少一力傳遞構件為可彈性變形之彎曲元件26.1、26.2、26.4。 A CVD or PVD coating device, characterized in that at least one force transmission member is an elastically deformable bending element 26.1, 26.2, 26.4.
一種CVD或PVD塗佈裝置,其特徵在於,該力傳遞構件26.1、26.2為矩形板件,或者,該彎曲元件26.4為實心或空心之桿件,或者,該彎曲元件為繩索。 A CVD or PVD coating device, characterized in that the force transmitting members 26.1, 26.2 are rectangular plates, or the bending element 26.4 is a solid or hollow rod, or the bending element is a rope.
一種CVD或PVD塗佈裝置,其特徵在於,至少一力傳遞構件具有彼此相對展開之元件27、28、29。
A CVD or PVD coating device, characterized in that at least one force transmission member has
一種CVD或PVD塗佈裝置,其特徵在於,在該等彼此相對展開之元件中,一第一元件27牢固地固定在該殼體1、2上,一第二元件29牢固地固定在該組件上,以及,至少一第三元件28將該第一及第二元件27、29相連。
A CVD or PVD coating device, characterized in that, among the components unfolded relative to each other, a
一種CVD或PVD塗佈裝置,其特徵在於,該等彼此相對展開之元件27、28、29為鏈節。
A CVD or PVD coating device, characterized in that the
一種CVD或PVD塗佈裝置,其特徵在於,該力傳遞
構件為中間元件26.1、26.3、26.4,該等特別是佈置在角區之固定元件24.1、24.2、24.3、24.4中之至少一個透過該中間元件26.1、26.3、26.4固定在一固定在該組件23上之固定元件25.1、25.3、25.4上。
A CVD or PVD coating device, characterized in that the force transmission
The component is an intermediate element 26.1, 26.3, 26.4, especially at least one of the fixing elements 24.1, 24.2, 24.3, 24.4 arranged in the corner area is fixed to the
一種CVD或PVD塗佈裝置,其特徵在於,彎曲元件26.4可透過其固定在組件側之固定元件25.4上的末端在水平面上以撓曲彈性之方式相對該彎曲元件之固定在殼體側之固定元件24.4上的末端移動。 A CVD or PVD coating device, characterized in that the end of the bending element 26.4 can be fixed on the component side through the end of the fixing element 25.4 on the horizontal surface in a flexural elastic manner relative to the fixing of the bending element on the housing side The end on element 24.4 moves.
一種CVD或PVD塗佈裝置,其特徵在於,該殼體側之固定元件24.1-24.3大約處於與該所屬之組件側固定元件25.1-25.3相同之垂直高度上。 A CVD or PVD coating device, characterized in that the fixing element 24.1-24.3 on the side of the housing is approximately at the same vertical height as the fixing element 25.1-25.3 on the component side to which it belongs.
一種CVD或PVD塗佈裝置,其特徵在於一安全裝置,該安全裝置在該力傳遞構件26.1、26.2、26.3、26.4;27、28、29斷裂時起作用,從而將該組件23保持在該殼體1上,特定言之,將組件側之固定元件25.1-25.4保持在殼體側之固定元件24.1、24.2、24.3、24.4上,其中特定言之,安全銷33非接觸式地卡入安全開口34。
A CVD or PVD coating device, characterized by a safety device that acts when the force transmitting member 26.1, 26.2, 26.3, 26.4; 27, 28, 29 breaks, thereby holding the
所有已揭露特徵(以其自身或多個特徵之組合)為發明本質所在。故本申請之揭露內容亦包含相關/所附優先權檔案(在先申請副本)所揭露之全部內容,該等檔案所述特徵亦一併納入本申請之請求項。附屬項以其特徵對本發明針對先前技術之改良方案予以說明,其目的主要在於在該等請求項基礎上進行分案申請。 All the disclosed features (by itself or a combination of multiple features) are the essence of the invention. Therefore, the disclosure content of this application also includes all the contents disclosed in the relevant/attached priority files (copies of previous applications), and the features described in these files are also included in the claims of this application. The subsidiary item describes the improvement scheme of the present invention with respect to the prior art based on its characteristics, and its main purpose is to make a divisional application on the basis of these request items.
1‧‧‧殼體上部件 1‧‧‧Housing upper part
3‧‧‧保持裝置 3‧‧‧ Holding device
3'‧‧‧組件之邊緣 3'‧‧‧Edge of the component
13.1‧‧‧固定件 13.1‧‧‧Fixed parts
13.2‧‧‧固定件 13.2‧‧‧Fixed parts
23‧‧‧組件 23‧‧‧ Components
24.1‧‧‧殼體側之固定元件 24.1‧‧‧Fixed element on the shell side
24.2‧‧‧殼體側之固定元件 24.2‧‧‧Fixed element on the shell side
25.1‧‧‧組件側之固定元件 25.1‧‧‧ Fixing element on the module side
25.2‧‧‧組件側之固定元件 25.2‧‧‧Fixed element on the module side
26.1‧‧‧中間元件,彎曲元件 26.1‧‧‧Intermediate element, bending element
26.2‧‧‧中間元件,彎曲元件 26.2‧‧‧Intermediate element, bending element
Claims (14)
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DE102015110440.7A DE102015110440A1 (en) | 2014-11-20 | 2015-06-29 | CVD or PVD reactor for coating large-area substrates |
DE102015110440.7 | 2015-06-29 |
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