TWI663221B - 黑矩陣用顏料分散物及含有其之黑矩陣用顏料分散光阻組成物 - Google Patents

黑矩陣用顏料分散物及含有其之黑矩陣用顏料分散光阻組成物 Download PDF

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Publication number
TWI663221B
TWI663221B TW103135764A TW103135764A TWI663221B TW I663221 B TWI663221 B TW I663221B TW 103135764 A TW103135764 A TW 103135764A TW 103135764 A TW103135764 A TW 103135764A TW I663221 B TWI663221 B TW I663221B
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TW
Taiwan
Prior art keywords
black matrix
pigment
pigment dispersion
group
black
Prior art date
Application number
TW103135764A
Other languages
English (en)
Chinese (zh)
Other versions
TW201522528A (zh
Inventor
柴田英雄
鍋田智宏
辻康人
Original Assignee
日商阪田油墨股份有限公司
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Publication of TW201522528A publication Critical patent/TW201522528A/zh
Application granted granted Critical
Publication of TWI663221B publication Critical patent/TWI663221B/zh

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/44—Carbon
    • C09C1/48—Carbon black
    • C09C1/56—Treatment of carbon black ; Purification
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C3/00—Treatment in general of inorganic materials, other than fibrous fillers, to enhance their pigmenting or filling properties
    • C09C3/10—Treatment with macromolecular organic compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D17/00—Pigment pastes, e.g. for mixing in paints
    • C09D17/001—Pigment pastes, e.g. for mixing in paints in aqueous medium
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D17/00—Pigment pastes, e.g. for mixing in paints
    • C09D17/004—Pigment pastes, e.g. for mixing in paints containing an inorganic pigment
    • C09D17/005—Carbon black
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D17/00—Pigment pastes, e.g. for mixing in paints
    • C09D17/004—Pigment pastes, e.g. for mixing in paints containing an inorganic pigment
    • C09D17/007—Metal oxide
    • C09D17/008—Titanium dioxide
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/003—Light absorbing elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Inorganic Chemistry (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Pigments, Carbon Blacks, Or Wood Stains (AREA)
  • Materials For Photolithography (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
TW103135764A 2013-10-16 2014-10-16 黑矩陣用顏料分散物及含有其之黑矩陣用顏料分散光阻組成物 TWI663221B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013215634 2013-10-16
JPJP2013-215634 2013-10-16

Publications (2)

Publication Number Publication Date
TW201522528A TW201522528A (zh) 2015-06-16
TWI663221B true TWI663221B (zh) 2019-06-21

Family

ID=52828131

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103135764A TWI663221B (zh) 2013-10-16 2014-10-16 黑矩陣用顏料分散物及含有其之黑矩陣用顏料分散光阻組成物

Country Status (5)

Country Link
JP (1) JP6516676B2 (ja)
KR (1) KR20160070763A (ja)
CN (1) CN105518087A (ja)
TW (1) TWI663221B (ja)
WO (1) WO2015056688A1 (ja)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017159634A1 (ja) * 2016-03-16 2017-09-21 株式会社Ｄｎｐファインケミカル カラーフィルタ用着色樹脂組成物、顔料分散液、カラーフィルタ、及び表示装置
WO2017209002A1 (ja) * 2016-05-31 2017-12-07 富士フイルム株式会社 感光性樹脂組成物、転写フィルム、パターンの製造方法、加飾パターン、及びタッチパネル
CN107446409A (zh) * 2017-04-01 2017-12-08 济南市塑料油墨厂 一种具有绝缘性能的哑光黑色油墨
JP6914807B2 (ja) * 2017-10-30 2021-08-04 サカタインクス株式会社 黒色着色組成物及びそれを含有する黒色着色レジスト組成物
TW202146589A (zh) * 2020-04-30 2021-12-16 日商阪田油墨股份有限公司 黑矩陣用顏料分散組成物、黑矩陣用光阻組成物、及黑矩陣
JP2021173971A (ja) 2020-04-30 2021-11-01 サカタインクス株式会社 ブラックマトリックス用顔料分散組成物、ブラックマトリックス用レジスト組成物、及び、ブラックマトリックス
JP2022083713A (ja) * 2020-11-25 2022-06-06 サカタインクス株式会社 ブラックマトリックス用顔料分散組成物、ブラックマトリックス用レジスト組成物、及び、ブラックマトリックス
CN114156329B (zh) * 2021-11-30 2023-07-04 武汉华星光电半导体显示技术有限公司 显示面板及其制作方法、显示装置
CN113956687A (zh) * 2021-11-30 2022-01-21 长沙惠科光电有限公司 负性光刻胶及其制备方法，复合炭黑及其制备方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09124969A (ja) * 1995-10-30 1997-05-13 Mitsubishi Chem Corp 絶縁性ブラックマトリックス用カーボンブラック
JPH1160988A (ja) * 1997-08-20 1999-03-05 Mitsubishi Chem Corp 樹脂被覆カーボンブラック
JP2000001522A (ja) * 1998-06-16 2000-01-07 Mitsubishi Chemicals Corp 遮光性感光性樹脂組成物及びこれを用いたカラーフィルター
JP2000056124A (ja) * 1998-08-06 2000-02-25 Mitsubishi Chemicals Corp 遮光性画素およびそれを用いたカラーフィルター
TW460489B (en) * 1995-06-14 2001-10-21 Nippon Catalytic Chem Ind Carbon black graft polymer, the production method and use thereof

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3509269B2 (ja) 1995-04-07 2004-03-22 新日鐵化学株式会社 遮光性薄膜形成用組成物及びこれを用いて形成された遮光膜
JP3559615B2 (ja) * 1995-06-15 2004-09-02 株式会社日本触媒 カーボンブラック、樹脂組成物およびブラックマトリックス
JP3856402B2 (ja) * 1995-10-13 2006-12-13 東京応化工業株式会社 遮光膜形成用感光性樹脂組成物、該遮光膜形成用感光性樹脂組成物で形成されたブラックマトリックス、及びその製造方法
JPH1180583A (ja) * 1997-08-29 1999-03-26 Mitsubishi Chem Corp 黒色レジストパターン形成用カーボンブラック
JP2004029745A (ja) * 2002-04-16 2004-01-29 Mikuni Color Ltd カラーフィルター用カーボンブラック分散液及びカーボンブラック含有樹脂組成物並びにブラックマトリックス
JP2006130911A (ja) * 2004-10-07 2006-05-25 Fuji Photo Film Co Ltd 湿し水不要平版印刷版原版の製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW460489B (en) * 1995-06-14 2001-10-21 Nippon Catalytic Chem Ind Carbon black graft polymer, the production method and use thereof
JPH09124969A (ja) * 1995-10-30 1997-05-13 Mitsubishi Chem Corp 絶縁性ブラックマトリックス用カーボンブラック
JPH1160988A (ja) * 1997-08-20 1999-03-05 Mitsubishi Chem Corp 樹脂被覆カーボンブラック
JP2000001522A (ja) * 1998-06-16 2000-01-07 Mitsubishi Chemicals Corp 遮光性感光性樹脂組成物及びこれを用いたカラーフィルター
JP2000056124A (ja) * 1998-08-06 2000-02-25 Mitsubishi Chemicals Corp 遮光性画素およびそれを用いたカラーフィルター

Also Published As

Publication number Publication date
JP6516676B2 (ja) 2019-05-22
JPWO2015056688A1 (ja) 2017-03-09
TW201522528A (zh) 2015-06-16
KR20160070763A (ko) 2016-06-20
CN105518087A (zh) 2016-04-20
WO2015056688A1 (ja) 2015-04-23

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