TWI655971B - Application apparatus, application head and application method - Google Patents

Application apparatus, application head and application method Download PDF

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Publication number
TWI655971B
TWI655971B TW104136143A TW104136143A TWI655971B TW I655971 B TWI655971 B TW I655971B TW 104136143 A TW104136143 A TW 104136143A TW 104136143 A TW104136143 A TW 104136143A TW I655971 B TWI655971 B TW I655971B
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coating
substrate
head
liquid
film forming
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TW104136143A
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Chinese (zh)
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TW201622832A (en
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勇
吉秀人
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日商埃納科技股份有限公司
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C13/00—Means for manipulating or holding work, e.g. for separate articles
    • B05C13/02—Means for manipulating or holding work, e.g. for separate articles for particular articles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C21/00—Accessories or implements for use in connection with applying liquids or other fluent materials to surfaces, not provided for in groups B05C1/00 - B05C19/00
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/26—Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings

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  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Coating Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)

Abstract

本發明之目的在於提供一種能夠在基板之包括端面的周緣部以較薄且均勻之膜厚塗敷膜形成液，能夠穩定地形成膜厚變動少的塗膜之塗敷裝置，塗敷裝置1係在基板2之周緣部塗敷液體之塗敷裝置，具有：支撐基板2的支撐台10；具有一對塗敷頭21的塗敷單元20；使塗敷單元20移動之移動單元40；對塗敷頭21供給膜形成液51之液體供給單元50；控制部70，用來控制移動單元40，在基板2的端部***塗敷頭21的空隙的狀態下，使塗敷頭21沿著基板2的周緣部移動；塗敷頭21係裝設有用來積存膜形成液51之液體積存部22a、23a、以及將通過液體積存部22a、23a之基板2的端部所附著之膜形成液51塗敷加工成薄膜狀之塗工部(上側抹子構件22c、下側抹子構件23c)。 It is an object of the present invention to provide a coating apparatus capable of coating a film forming liquid with a thin and uniform film thickness on a peripheral portion including an end surface of a substrate, and capable of stably forming a coating film having a small variation in film thickness. a coating device for applying a liquid to a peripheral portion of the substrate 2, comprising: a support table 10 for supporting the substrate 2; a coating unit 20 having a pair of coating heads 21; and a moving unit 40 for moving the coating unit 20; The coating head 21 supplies the liquid supply unit 50 of the film forming liquid 51; the control unit 70 controls the moving unit 40, and in the state where the end of the substrate 2 is inserted into the gap of the coating head 21, the coating head 21 is caused to follow The peripheral portion of the substrate 2 is moved; the coating head 21 is provided with liquid storage portions 22a and 23a for storing the film forming liquid 51, and a film forming liquid to which the ends of the substrate 2 passing through the liquid storage portions 22a and 23a are attached. 51 is applied to a film-form coating portion (upper smear member 22c, lower smear member 23c).

Description

塗敷裝置、塗敷頭及塗敷方法 Coating device, coating head and coating method

本發明關於一種塗敷裝置、塗敷頭及塗敷方法，更具體地，係關於在基板周緣部塗敷液體之塗敷裝置、塗敷頭及塗敷方法。 The present invention relates to a coating apparatus, an application head, and a coating method, and more particularly to a coating apparatus, an application head, and a coating method for applying a liquid to a peripheral portion of a substrate.

一般將使用了玻璃環氧樹脂構件之印刷基板作為電子構件的安裝用基板使用。玻璃環氧樹脂構件係在重疊的玻璃纖維布上含浸環氧樹脂形成者。因此在切斷玻璃環氧樹脂構件時，產生由環氧樹脂或者玻璃纖維組成之細微塵埃。這些細微塵埃可能引起基板電路接觸不良或者品質下降等問題。因此有必要在製造印刷基板時就除去切斷基板時所產生之塵埃。 A printed circuit board using a glass epoxy resin member is generally used as a mounting substrate for an electronic component. The glass epoxy resin member is formed by impregnating an epoxy resin on an overlapping glass fiber cloth. Therefore, when the glass epoxy resin member is cut, fine dust composed of epoxy resin or glass fiber is generated. These fine dusts may cause problems such as poor contact of the substrate circuit or deterioration in quality. Therefore, it is necessary to remove dust generated when the substrate is cut at the time of manufacturing the printed substrate.

但是，即使從印刷基板之端面除去了塵埃，由於印刷基板之端面部分非常脆，所以還會有端面部分損壞進一步又產生塵埃之問題。 However, even if dust is removed from the end surface of the printed substrate, since the end surface portion of the printed substrate is very brittle, there is a problem that the end portion is damaged and dust is further generated.

於是本發明人已經在先提出了藉由在印刷基板之端面上塗敷膜形成液形成膜，能夠防止端面部分損壞之塗敷裝置(專利文獻1)。 Then, the present inventors have previously proposed a coating device capable of preventing the end surface portion from being damaged by coating a film forming liquid on the end surface of the printed substrate (Patent Document 1).

第23圖係顯示了本發明人在先提出之塗敷裝置主要部分的側視剖面圖，第24圖係為了顯示塗敷裝置內部機構而省略了框體顯示之概略前視圖。 Fig. 23 is a side sectional view showing the main part of the coating apparatus proposed by the inventors of the present invention, and Fig. 24 is a schematic front view showing the housing display omitted for displaying the internal mechanism of the coating apparatus.

橫貫框體101的輸入口101a以及輸出口101b，配設有沿前後方向延伸之傳送裝置102。傳送裝置102由支撐構件(未圖示)支撐在框體101上。在框體101上設置有具有複數個操作開關103a之操作部103。藉由操縱操作開關103a，傳送裝置102驅動和停止。 A transmission device 102 extending in the front-rear direction is disposed across the input port 101a and the output port 101b of the casing 101. The conveying device 102 is supported by the frame 101 by a support member (not shown). An operation portion 103 having a plurality of operation switches 103a is provided on the casing 101. The transport device 102 is driven and stopped by manipulating the operation switch 103a.

在框體101內之傳送裝置102的左右分別設置塗敷機構110、110。塗敷機構110係固定在與框體101的後面相向配設之固定板104上，固定板104下部與滾珠螺桿機構120連接。滾珠螺桿機構120被支撐構件(未圖示)支撐在框體101上。 The coating mechanisms 110, 110 are disposed on the left and right sides of the conveyor 102 in the casing 101, respectively. The coating mechanism 110 is fixed to a fixing plate 104 disposed opposite to the rear surface of the casing 101, and a lower portion of the fixing plate 104 is coupled to the ball screw mechanism 120. The ball screw mechanism 120 is supported by the frame 101 by a support member (not shown).

塗敷機構110具備塗敷圓盤111、馬達112、塗敷液供給圓盤113以及馬達114。用來旋轉塗敷圓盤的馬達112、112被固定在水平安裝於固定板104的支撐構件105上，其旋轉軸112a垂直向下配設。塗敷圓盤111、111沿水平方向配設，具備朝上方延伸之軸111a。在馬達112的旋轉軸112a上連接塗敷圓盤111的軸111a，藉由馬達112的驅動使塗敷圓盤111旋轉。 The coating mechanism 110 includes a coating disk 111, a motor 112, a coating liquid supply disk 113, and a motor 114. The motors 112, 112 for rotating the coating disc are fixed to the support member 105 horizontally mounted to the fixed plate 104, and the rotating shaft 112a is vertically disposed downward. The coating disks 111 and 111 are arranged in the horizontal direction and have a shaft 111a extending upward. The shaft 111a of the coating disk 111 is connected to the rotating shaft 112a of the motor 112, and the coating disk 111 is rotated by the driving of the motor 112.

用來旋轉塗敷液供給圓盤之馬達114、114係透過沿前後方向延伸之樞軸115固定於固定板104，其旋轉軸114a朝水平方向配設。塗敷液供給圓盤113、113係夾著塗敷圓盤111、111在傳送裝置102之相反一側呈垂 直方向配設，具有沿水平方向延伸之軸113a。塗敷液供給圓盤113的軸113a係與馬達114的旋轉軸114a連接，藉由馬達114的驅動，塗敷液供給圓盤113會旋轉。塗敷液供給圓盤113之軸113a係位於比塗敷圓盤111的下表面還下方的位置，塗敷液供給圓盤113的塗敷圓盤111一側的上部側面與塗敷圓盤111的周面接觸。 The motors 114 and 114 for rotating the coating liquid supply disk are fixed to the fixed plate 104 through a pivot 115 extending in the front-rear direction, and the rotating shaft 114a is disposed in the horizontal direction. The coating liquid supply disks 113 and 113 are suspended on the opposite side of the conveying device 102 with the coating disks 111 and 111 interposed therebetween. Arranged in the straight direction, there is a shaft 113a extending in the horizontal direction. The shaft 113a of the coating liquid supply disk 113 is connected to the rotating shaft 114a of the motor 114, and the coating liquid supply disk 113 is rotated by the driving of the motor 114. The shaft 113a of the coating liquid supply disk 113 is located below the lower surface of the coating disk 111, and the upper side surface of the coating liquid supply disk 113 on the side of the coating disk 111 and the coating disk 111 are provided. Weekly contact.

在塗敷液供給圓盤113下方設置有用來收容含樹脂成分之膜形成液116的箱型液體供給容器117，塗敷液供給圓盤113的下端部從液體供給容器117上方***，並浸漬於膜形成液116中。隨著塗敷液供給圓盤113的旋轉，膜形成液116從塗敷液供給圓盤113下端部向塗敷液供給圓盤113上部移動，而供給至塗敷圓盤111的外周面。 A box-type liquid supply container 117 for accommodating the film-forming liquid 116 containing a resin component is provided below the coating liquid supply disk 113, and the lower end portion of the coating liquid supply disk 113 is inserted from above the liquid supply container 117, and is immersed in In the film forming liquid 116. As the coating liquid supply disk 113 rotates, the film forming liquid 116 moves from the lower end portion of the coating liquid supply disk 113 to the upper portion of the coating liquid supply disk 113, and is supplied to the outer peripheral surface of the coating disk 111.

在固定板104的下端部連接有滾珠螺桿機構120。滾珠螺桿機構120、120具備配置在傳送裝置102下方的馬達121、121。馬達121具有自傳送裝置102隔離之向左右水平方向延伸之旋轉軸(未圖示)，該旋轉軸上連接向左右水平方向延伸的公螺紋122。另外，公螺紋122上咬合著筒狀之母螺紋體123，固定板104下端中央部與母螺紋體123連接。藉由馬達121、121的驅動，公螺紋122旋轉，隨著公螺紋122之旋轉，與母螺紋體123連接之固定板104、104能夠左右移動。 A ball screw mechanism 120 is connected to the lower end portion of the fixed plate 104. The ball screw mechanisms 120 and 120 include motors 121 and 121 disposed below the conveyor 102. The motor 121 has a rotating shaft (not shown) that is horizontally extended from the conveyor 102, and is connected to a male screw 122 that extends in the horizontal direction in the horizontal direction. Further, the male thread 122 is engaged with the cylindrical female screw body 123, and the central portion of the lower end of the fixing plate 104 is connected to the female screw body 123. By the driving of the motors 121 and 121, the male screw 122 rotates, and the fixed plates 104 and 104 connected to the female screw body 123 can move left and right as the male screw 122 rotates.

以下說明藉由上述塗敷裝置給印刷基板130之端面130a塗敷膜形成液116之塗敷方法。首先，操 縱操作部103之操作開關103a，使馬達121正反旋轉，調整塗敷機構110、110之左右位置，使之與印刷基板130的左右寬度相吻合。然後將印刷基板130載置至搬入口101a一側的傳送裝置102上，操縱操作開關103a，驅動傳送裝置102、馬達112、112及馬達114、114。 A method of applying the film forming liquid 116 to the end surface 130a of the printed circuit board 130 by the above coating apparatus will be described below. First of all, fuck The operation switch 103a of the vertical operation unit 103 rotates the motor 121 in the forward and reverse directions, and adjusts the left and right positions of the application mechanisms 110 and 110 so as to match the left and right widths of the printed circuit board 130. Then, the printed circuit board 130 is placed on the transfer device 102 on the side of the carry-in port 101a, and the operation switch 103a is operated to drive the transfer device 102, the motors 112, 112, and the motors 114, 114.

藉由傳送裝置102將印刷基板130運送至塗敷機構110，使其左右端面130a、130a與塗敷圓盤111、111之周面111b、111b相抵接。此時附著在塗敷圓盤111、111周面111b、111b之膜形成液116被塗敷到印刷基板130之左右端面130a、130a。接著隨著印刷基板130的運送，印刷基板130左右端面130a、130a整體被膜形成液116塗敷，塗敷後，印刷基板130被從搬出口101b運出，使膜形成液116中所含之樹脂成分固化。 The printing substrate 130 is transported to the coating mechanism 110 by the transport device 102, and the left and right end faces 130a and 130a are brought into contact with the peripheral faces 111b and 111b of the coating disks 111 and 111. At this time, the film forming liquid 116 adhering to the circumferential surfaces 111b and 111b of the coating disks 111 and 111 is applied to the left and right end faces 130a and 130a of the printed circuit board 130. Then, as the printed substrate 130 is transported, the entire left and right end faces 130a and 130a of the printed circuit board 130 are coated with the film forming liquid 116. After the application, the printed circuit board 130 is carried out from the carry-out port 101b to form the resin contained in the film forming liquid 116. The ingredients are cured.

根據上述塗敷裝置，藉由塗敷圓盤111、111，在印刷基板130的兩側端面130a、130a上塗敷膜形成液116，從而能夠在印刷基板130之兩端面130a、130a上形成塗膜。 According to the above coating apparatus, the film forming liquid 116 is applied onto both end faces 130a and 130a of the printed substrate 130 by coating the disks 111 and 111, whereby a coating film can be formed on both end faces 130a and 130a of the printed substrate 130. .

但在上述塗敷裝置中，由於係膜形成液116通過供給圓盤113、113供給到塗敷圓盤111、111的外周面111b、111b，然後附著在塗敷圓盤111、111的外周面111b、111b的膜形成液116被塗敷到印刷基板130的端面130a、130a之構成，所以對於這些塗敷圓盤111之外周面111b之膜形成液116的供給狀態容易產生偏差。 However, in the above coating apparatus, the film forming liquid 116 is supplied to the outer peripheral faces 111b and 111b of the coating disks 111 and 111 through the supply disks 113 and 113, and then adheres to the outer peripheral faces of the coating disks 111 and 111. Since the film forming liquid 116 of 111b and 111b is applied to the end faces 130a and 130a of the printed circuit board 130, the supply state of the film forming liquid 116 to the outer peripheral surface 111b of the coating disk 111 is likely to vary.

為了使相對於塗敷圓盤111的外周面111b 的膜形成液116的供給狀態穩定，需要將膜形成液116的黏度調整到比較高(不垂落的程度)，從而就存在難以使膜厚薄且難以均勻塗敷的問題。 In order to make the outer peripheral surface 111b with respect to the coating disk 111 The supply state of the film forming liquid 116 is stable, and it is necessary to adjust the viscosity of the film forming liquid 116 to a relatively high level (not to fall), and there is a problem that it is difficult to make the film thickness thin and difficult to apply uniformly.

另一方面，為了應對各種電子器械之薄型化和小型化，近年來，對於厚度為數十μm至數百μm程度之薄型覆銅層壓板(亦稱封裝基板)的需要高漲。對於這種薄型基板，僅在基板端面塗敷膜形成液係不容易的，希望能夠在基板之包括端面的周緣部，例如塗敷成邊框狀之類的形態。 On the other hand, in recent years, in order to cope with the reduction in size and size of various electronic devices, in recent years, there has been an increase in demand for a thin copper-clad laminate (also referred to as a package substrate) having a thickness of several tens of μm to several hundreds of μm. In such a thin substrate, it is not easy to apply a film forming liquid to the end surface of the substrate, and it is desirable to apply a shape such as a frame to the peripheral portion including the end surface of the substrate.

但是上述塗敷裝置係僅在印刷基板130之端面130a塗敷膜形成液116之構成，有不能在基板之包括端面的周緣部薄且均勻地將膜形成液塗敷成邊框狀的問題。 However, the coating apparatus is configured such that the film forming liquid 116 is applied only to the end surface 130a of the printed circuit board 130, and there is a problem that the film forming liquid cannot be applied to the peripheral portion of the substrate including the end surface thinly and uniformly.

專利文獻1 國際公開第2010/137418號 Patent Document 1 International Publication No. 2010/137418

本發明係鑒於上述課題而完成者，其目的在於提供一種能夠在基板之包括端面的周緣部以較薄且均勻的膜厚塗敷膜形成液，能夠穩定形成膜厚變動小的塗膜的塗敷裝置、塗敷頭及塗敷方法。 The present invention has been made in view of the above-described problems, and an object of the present invention is to provide a coating liquid which can coat a film having a thin and uniform film thickness on a peripheral portion including an end surface of a substrate, and can stably form a coating film having a small film thickness variation. Application device, coating head and coating method.

為了實現上述目的，本發明之塗敷裝置(1)，係在基板之包括端面的周緣部塗敷液體之塗敷裝置，其特徵在於，具有：支撐手段，支撐前述基板；塗敷手段，包括具有能夠***前述基板之端部的空隙而相向配置的一 對塗敷頭；移動手段，使該塗敷手段移動；液體供給手段，對前述一對塗敷頭供給膜形成液；控制手段，係在前述一對塗敷頭之前述空隙內***有被前述支撐手段支撐的前述基板的端部之狀態下，控制前述移動手段，以使前述一對塗敷頭沿著前述基板之周緣部移動；前述一對塗敷頭係具備在該一對塗敷頭之相對面積存前述膜形成液之液體積存部、及將在通過該液體積存部後之前述基板之端部所附著之前述膜形成液塗敷加工成薄膜狀之塗工部。 In order to achieve the above object, a coating apparatus (1) of the present invention is a coating apparatus for applying a liquid to a peripheral portion of an end surface of a substrate, comprising: a supporting means for supporting the substrate; and a coating means including a one having a gap that can be inserted into an end portion of the substrate to face each other a coating head; a moving means for moving the coating means; and a liquid supply means for supplying a film forming liquid to the pair of coating heads; and a control means for inserting into the gap of the pair of coating heads The moving means is controlled such that the pair of coating heads move along the peripheral edge portion of the substrate in a state in which the end portion of the substrate supported by the supporting means is supported; and the pair of coating heads are provided on the pair of coating heads The liquid storage portion of the film forming liquid and the coating portion for coating the film forming liquid adhered to the end portion of the substrate after passing through the liquid storage portion into a film shape.

根據上述塗敷裝置(1)，能夠在前述一對塗敷頭之前述空隙內***被前述支撐手段支撐的前述基板的端部之狀態下，一邊為前述一對塗敷頭的前述液體積存部供給前述膜形成液的同時，一邊使前述一對塗敷頭沿著前述基板之周緣部移動。亦即，將前述基板端部通過前述液體積存部所積存之前述膜形成液後，能夠一邊在前述塗工部將附著在前述基板端部之前述膜形成液塗敷加工成薄膜狀，一邊使前述一對塗敷頭沿著前述基板之周緣部移動。 According to the coating apparatus (1), the liquid storage portion of the pair of coating heads can be placed in a state in which the end portion of the substrate supported by the supporting means is inserted into the gap of the pair of coating heads. While the film forming liquid is supplied, the pair of coating heads are moved along the peripheral edge portion of the substrate. In other words, the film forming liquid which is deposited in the liquid volume storage portion after the end portion of the substrate is coated with the film forming liquid adhered to the end portion of the substrate in the coating portion can be formed into a film shape. The pair of coating heads are moved along a peripheral edge portion of the substrate.

另外，由於係使前述基板之端部通過前述液體積存部所積存之前述膜形成液之構成，所以能夠前述膜形成液充分附著在該基板之端部，能夠使前述膜形成液毫無不均勻地附著在前述基板的端部之狀態後，在前述塗工部塗敷成薄膜狀。 Further, since the end portion of the substrate is configured to pass through the film forming liquid accumulated in the liquid storage portion, the film forming liquid can be sufficiently adhered to the end portion of the substrate, and the film forming liquid can be made uneven. After adhering to the end of the substrate, the coating portion is applied in a film shape.

因此，能夠在前述基板之周緣部的上下表面以及前述基板之端面(側面)薄且均勻地塗敷前述膜形成液。另外，能夠持續進行膜厚變動等塗膜品質偏差小的塗敷，能夠精 度良好地在前述基板之周緣部形成邊框狀的均質的塗膜。從而，在能夠防止由於前述基板端面部分的損壞引起之塵埃的發生之同時，還能夠藉由前述塗膜強化前述基板之周緣部，能夠提高前述基板的操作性，能夠降低前述基板之不良產品之產生率。 Therefore, the film forming liquid can be thinly and uniformly applied to the upper and lower surfaces of the peripheral portion of the substrate and the end surface (side surface) of the substrate. In addition, it is possible to continue coating with a small variation in film quality such as variations in film thickness. A uniform coating film having a frame shape is formed on the peripheral portion of the substrate. Therefore, it is possible to prevent the occurrence of dust due to the damage of the end surface portion of the substrate, and to enhance the peripheral portion of the substrate by the coating film, thereby improving the operability of the substrate and reducing the defective product of the substrate. Production rate.

另外，本發明之塗敷裝置(2)，其特徵在於，在前述塗敷裝置(1)中，前述塗工部具備用來抹平附著在前述基板端部之前述膜形成液的抹子部、及用來刮取通過該抹子部後的附著於前述基板之端部之多餘的前述膜形成液的刮取部。 Further, in the coating device (2) according to the present invention, in the coating device (1), the coating portion includes a trowel portion for smoothing the film forming liquid adhered to the end portion of the substrate And a scraping portion for scraping the excess film forming liquid adhered to the end portion of the substrate after passing through the trowel portion.

根據上述塗敷裝置(2)，由於具備前述抹子部和前述刮取部，所以在將通過前述液體積存部之前述基板端部所附著之前述膜形成液塗成均勻之膜厚後，能夠確實地刮掉附著在前述基板之多餘的前述膜形成液，能夠薄且均勻地塗敷前述膜形成液。 According to the coating device (2), since the squeegee portion and the scraping portion are provided, the film forming liquid adhered to the end portion of the substrate through the liquid reservoir can be uniformly coated. The excess film forming liquid adhering to the substrate is surely scraped off, and the film forming liquid can be applied thinly and uniformly.

另外本發明之塗敷裝置(3)，其特徵在於，在上述塗敷裝置(1)或者(2)中，前述塗敷手段具備用來使前述一對塗敷頭旋轉之旋轉轉機構部。 Further, in the coating device (3) of the present invention, in the coating device (1) or (2), the coating means includes a rotation mechanism portion for rotating the pair of coating heads.

根據上述塗敷裝置(3)，由於藉由前述旋轉機構部，能夠使前述一對塗敷頭旋轉，例如，在給矩形基板之周緣部塗敷膜形成液時，能夠使前述一對塗敷頭相對於該基板端面的朝向設定為在前述基板的各個邊都為同樣朝向，從而能夠在前述基板的各邊都在相同狀態下進行穩定的塗敷。 According to the coating device (3), the pair of coating heads can be rotated by the rotation mechanism portion. For example, when a film forming liquid is applied to a peripheral portion of a rectangular substrate, the pair of coatings can be applied. The orientation of the head with respect to the end surface of the substrate is set to be the same direction on each side of the substrate, so that stable coating can be performed in the same state on each side of the substrate.

另外本發明之塗敷裝置(4)，其特徵在於，在上述塗敷裝置(3)中，在前述旋轉機構部上裝設有使前述一對塗敷頭沿水平方向滑動之滑動機構部。 Further, in the coating device (4) of the present invention, in the coating device (3), a sliding mechanism portion that slides the pair of coating heads in the horizontal direction is attached to the rotating mechanism portion.

根據上述塗敷裝置(4)，能夠使前述一對塗敷頭相對於前述旋轉機構部在水平方向滑動移動。因此能夠更加高精度地進行前述一對塗敷頭的位置的微調整，例如在前述一對塗敷頭之前述空隙內***前述基板端部的寬度的微調整等，以及相對於前述基板端面之前述一對塗敷頭的位置控制。 According to the coating device (4), the pair of coating heads can be slidably moved in the horizontal direction with respect to the rotating mechanism portion. Therefore, fine adjustment of the position of the pair of coating heads can be performed with higher precision, for example, fine adjustment of the width of the end portion of the substrate inserted into the gap of the pair of coating heads, and the like, and the end surface of the substrate Position control of the aforementioned pair of coating heads.

另外本發明之塗敷裝置(5)，其特徵在於，在上述塗敷裝置(1)或者(2)中，在前述支撐手段之周圍配設複數個前述塗敷手段，前述移動手段係使前述複數個塗敷手段沿著由前述支撐手段所支撐的基板的邊移動之手段，前述控制手段係控制前述移動手段使前述複數個塗敷手段沿著前述基板之邊移動的手段。 Further, in the coating device (5) according to the present invention, in the coating device (1) or (2), a plurality of the coating means are disposed around the supporting means, and the moving means is the aforementioned The plurality of coating means move along the side of the substrate supported by the supporting means, and the control means controls the means for moving the plurality of coating means along the side of the substrate.

根據上述塗敷裝置(5)，能夠利用前述複數個塗敷手段對前述基板之周緣部進行塗敷，能夠大幅地縮短塗敷前述基板之全部周邊之時間，能夠提高塗敷步驟之效率。 According to the coating apparatus (5), the peripheral edge portion of the substrate can be coated by the plurality of coating means, and the time for applying the entire periphery of the substrate can be greatly shortened, and the efficiency of the coating step can be improved.

另外本發明之塗敷裝置(6)，其特徵在於，在上述塗敷裝置(5)中，前述移動手段具備複數個能夠在前述基板之邊方向和與該邊方向交叉的方向之2個方向上移動的2軸直線移動機構。 Further, in the coating device (6) of the present invention, in the coating device (5), the moving means includes a plurality of directions which are in a direction which can be in a direction of the side of the substrate and a direction intersecting the side direction. A 2-axis linear movement mechanism that moves up.

根據上述塗敷裝置(6)，通過藉由前述2軸 直線移動機構使前述各塗敷手段在2軸方向移動，能夠以穩定之操作反覆塗敷前述基板各個邊。 According to the above coating device (6), by the aforementioned two axes The linear movement mechanism moves the respective coating means in the two-axis direction, and the respective sides of the substrate can be repeatedly applied in a stable operation.

另外，本發明之塗敷裝置(7)，其特徵在於，在上述任一塗敷裝置(1)至(6)中，具備收容前述膜形成液之液體收容部、配設於前述一對塗敷頭下方之液體接受部、及將該液體接受部所接受之前述膜形成液移送至前述液體收容部之移送手段。 Further, the coating device (7) of the present invention is characterized in that, in any of the coating devices (1) to (6), a liquid accommodating portion for accommodating the film forming liquid is disposed and disposed on the pair of coating materials The liquid receiving portion below the application head and the transfer means for transferring the film forming liquid received by the liquid receiving portion to the liquid storage portion.

根據上述塗敷裝置(7)，自前述一對塗敷頭漏下的前述膜形成液能夠在前述液體接受部被接住，藉由前述移送手段移送至前述液體收容部，所以能夠循環反覆使用前述膜形成液，能夠毫無浪費地使用前述膜形成液。 According to the coating device (7), the film forming liquid leaked from the pair of coating heads can be caught by the liquid receiving portion, and can be transferred to the liquid containing portion by the transfer means, so that it can be recycled and used repeatedly. In the film forming liquid described above, the film forming liquid can be used without waste.

另外，本發明之塗敷裝置(8)，其特徵在於，在上述任一塗敷裝置(1)至(7)中，更具備塗敷頭用保護具，前述塗敷頭用保護具係具備與前述一對塗敷頭之前述空隙相抵接之墊部、配設於該墊部下方之液體接受部以及支撐前述墊部和前述液體接受部之支撐部，前述塗敷頭用保護具係設置於前述一對塗敷頭之退避位置。 Further, in the coating device (8) of the present invention, the coating device (1) to (7) further includes a protective device for a coating head, and the protective device for the coating head is provided a pad portion that abuts against the gap between the pair of coating heads, a liquid receiving portion disposed under the pad portion, and a supporting portion that supports the pad portion and the liquid receiving portion, and the coating head protection device is provided In the retracted position of the pair of coating heads.

根據上述塗敷裝置(8)，在前述一對塗敷頭退避至指定之退避位置時，前述一對塗敷頭之前述空隙部分能夠與前述塗敷頭用保護具之前述墊部相抵接。因此，能夠防止在前述空隙部分產生前述膜形成液的乾燥或者由於該乾燥引起之液體堵塞的發生，能夠在沒有前述膜形成液的乾燥或者液體堵塞之良好狀態下持續進行對前述基板之塗敷。 According to the coating device (8), when the pair of coating heads are retracted to the designated retracting position, the gap portion of the pair of coating heads can abut against the pad portion of the coating head protector. Therefore, it is possible to prevent the drying of the film forming liquid or the occurrence of liquid clogging due to the drying in the void portion, and it is possible to continuously apply the substrate without the drying of the film forming liquid or the liquid clogging. .

另外，本發明之塗敷裝置(9)，其特徵在於，在上述任一塗敷裝置(1)至(8)中，具備用來使塗敷於前述基板之周緣部的前述膜形成液乾燥之乾燥手段。 Further, the coating device (9) of the present invention is characterized in that, in any of the coating devices (1) to (8), the film forming liquid applied to the peripheral edge portion of the substrate is dried. Drying means.

根據上述塗敷裝置(9)，藉由前述乾燥手段，能夠在塗敷前述膜形成液後立即使前述膜形成液乾燥，能夠提高之後之作業性，另外能夠提高防止前述膜形成液剝離等塗敷不良的效果。 According to the coating apparatus (9), the film forming liquid can be dried immediately after the film forming liquid is applied by the drying means, and the workability after the film forming liquid can be improved, and the film forming liquid can be prevented from being peeled off. Poor effect.

另外，本發明之塗敷裝置(10)，其特徵在於，在上述任一塗敷裝置(1)至(9)中，具備將被前述支撐手段支撐前的基板定位到指定位置的定位手段，以及將被該定位手段所定位後之基板移載到前述支撐手段，然後將塗覆有前述膜形成液的基板從前述支撐手段移送的基板移載手段。 Further, the coating device (10) of the present invention is characterized in that, in any of the above coating devices (1) to (9), a positioning means for positioning a substrate before being supported by the supporting means at a predetermined position is provided. And a substrate transfer means for transferring the substrate positioned by the positioning means to the supporting means and then transferring the substrate coated with the film forming liquid from the supporting means.

根據上述塗敷裝置(10)，由於係在前述定位手段進行前述基板之定位後，利用前述基板移載手段將該基板移載至前述支撐手段，所以被前述移載手段移載之基板之位置精度高，能夠進行前述膜形成液之塗敷寬度無偏差的精度高的塗敷。 According to the coating apparatus (10), after the positioning means performs the positioning of the substrate, the substrate is transferred to the supporting means by the substrate transfer means, and the position of the substrate transferred by the transfer means is moved. With high precision, it is possible to perform coating with high precision in which the coating width of the film forming liquid is not varied.

另外本發明之塗敷裝置(11)，其特徵在於，在上述塗敷裝置(10)中，前述基板移載手段具備第1基板保持部和第2基板保持部，藉由前述第1基板保持部與前述第2基板保持部，能夠並行地進行將前述基板朝前述支撐手段移載之動作和將前述基板從前述支撐手段移送之動作。 Further, in the coating device (11) of the present invention, the substrate transfer device includes a first substrate holding portion and a second substrate holding portion, and is held by the first substrate. The second substrate holding portion and the second substrate holding portion can perform an operation of transferring the substrate toward the support means and an operation of transferring the substrate from the support means in parallel.

根據上述塗敷裝置(11)，由於能夠同時進行將塗敷前的基板向前述支撐手段移載的動作和將塗敷後的基板從前述支撐手段移送的動作，所以能夠提高基板之運送效率。 According to the coating apparatus (11), the operation of transferring the substrate before coating to the supporting means and the operation of transferring the coated substrate from the supporting means can be performed simultaneously, so that the substrate transport efficiency can be improved.

另外本發明之塗敷頭(1)，係用來在基板之包含端面的周緣部塗敷液體之塗敷頭，其特徵在於，具備：具有能夠***前述基板之端部的空隙而相向配置的上側頭與下側頭；前述上側頭係具備在與前述下側頭的相對面形成的上側液體積存部、用來對該上側液體積存部供給膜形成液之液體供給路、及與該上側液體積存部並列設置之上側抹子部和與該上側抹子部並列設置之上側刮取部；前述下側頭具備與前述上側液體積存部相對的部位形成的下側液體積存部、和與該下側液體積存部並列設置的下側抹子部、及與該下側抹子部並列設置的下側刮取部。 Further, the coating head (1) of the present invention is an application head for applying a liquid to a peripheral portion including an end surface of a substrate, and is characterized in that the coating head is provided with a gap that can be inserted into an end portion of the substrate and is opposed to each other. An upper head and a lower head; the upper head system includes an upper liquid volume portion formed on a surface opposite to the lower head, a liquid supply path for supplying a film forming liquid to the upper liquid volume, and the upper liquid An upper trowel portion is disposed in parallel with the storage portion, and an upper side scraping portion is provided in parallel with the upper trowel portion; the lower head includes a lower liquid storage portion formed at a portion facing the upper liquid storage portion, and the lower portion The lower trowel portion provided in parallel with the side liquid storage portion and the lower side scraping portion provided in parallel with the lower trowel portion.

根據上述塗敷頭(1)，從前述液體供給路為前述上側液體積存部供給前述液體膜形成液，能夠形成在前述上側液體積存部與前述下側液體積存部積存前述膜形成液之狀態。然後在前述上側頭與前述下側頭之前述空隙中***前述基板端部，藉由使前述基板端部通過前述上側液體積存部與前述下側液體積存部所積存之前述膜形成液，能夠在前述基板的端部，毫無不均勻地充分地附著前述膜形成液。 In the above-described coating head (1), the liquid film forming liquid is supplied from the liquid supply path to the upper liquid storage portion, and the film forming liquid can be stored in the upper liquid storage portion and the lower liquid storage portion. Then, the substrate end portion is inserted into the gap between the upper side head and the lower head, and the substrate forming portion is formed by passing the substrate end portion through the upper liquid storage portion and the lower liquid storage portion. The film forming liquid is sufficiently adhered to the end portion of the substrate without unevenness.

然後，在前述上側抹子部與前述下側抹子部，抹平附著在前述基板端部之前述膜形成液，塗成均勻膜厚，然後 在前述上側刮取部與前述下側刮取部，能夠將附著在前述基板之多餘的前述膜形成液刮掉，能夠形成膜厚變動等少的薄膜狀的塗膜。 Then, the upper trowel portion and the lower trowel portion are smoothed to the film forming liquid adhered to the end portion of the substrate, and coated to a uniform film thickness, and then In the upper side scraping portion and the lower side scraping portion, the excess film forming liquid adhering to the substrate can be scraped off, and a film-form coating film having a small film thickness variation or the like can be formed.

因此，能夠在前述基板之周緣部的上下表面以及前述基板的端面(側面)薄且均勻地塗敷前述膜形成液，能夠在前述基板的周緣部精度良好地形成邊框狀的均質的塗膜。 Therefore, the film forming liquid can be thinly and uniformly applied to the upper and lower surfaces of the peripheral portion of the substrate and the end surface (side surface) of the substrate, and a uniform coating film having a frame shape can be accurately formed on the peripheral portion of the substrate.

另外本發明之塗敷頭(2)，其特徵在於，在上述塗敷頭(1)中，在前述上側抹子部以及前述下側抹子部之抹子面形成複數個微小的溝。 Further, in the coating head (2) of the present invention, in the coating head (1), a plurality of minute grooves are formed on the upper surface of the upper trowel portion and the lower trowel portion.

根據上述塗敷頭(2)，由於在前述上側抹子部以及前述下側抹子部之抹子面形成有複數個微小溝，所以由於前述膜形成液之表面張力，前述膜形成液能夠容易地在前述抹子面展開，從而能夠容易地穩定地形成薄且均勻的膜厚。 According to the coating head (2), since a plurality of minute grooves are formed on the trowel surface of the upper trowel portion and the lower trowel portion, the film forming liquid can be easily formed by the surface tension of the film forming liquid. The ground surface is unfolded on the aforementioned trowel surface, so that a thin and uniform film thickness can be easily formed stably.

另外本發明之塗敷頭(3)，其特徵在於，在上述塗敷頭(1)或者(2)中，前述上側抹子部係以可裝卸於前述上側頭的方式構成，前述下側抹子部係以可裝卸於前述下側頭之方式構成。 Further, in the coating head (3) of the present invention, in the coating head (1) or (2), the upper trowel portion is configured to be detachably attached to the upper head, and the lower side wiper is provided. The sub-section is configured to be detachable from the lower head.

根據上述塗敷頭(3)，可根據需要在前述上側頭以及前述下側頭分別裝卸前述上側抹子部以及前述下側抹子部。另外，能夠安裝與塗膜之膜厚等相應的前述上側抹子部以及前述下側抹子部，能夠精度良好地進行膜厚調整，另外，能夠容易地進行維護。 According to the coating head (3), the upper trowel portion and the lower trowel portion can be attached and detached to the upper head and the lower head, respectively, as needed. In addition, the upper trowel portion and the lower trowel portion corresponding to the film thickness of the coating film and the like can be attached, and the film thickness can be accurately adjusted, and maintenance can be easily performed.

另外，本發明之塗敷頭(4)，其特徵在於， 在上述任一塗敷頭(1)至(3)中，前述上側頭具備固定於前述下側頭之固定構件和相對於該固定構件以在上下方向上可進行位置調整之方式安裝的移動構件，前述上側液體積存部係形成在前述移動構件，前述上側抹子部與前述上側刮取部係設置在前述移動構件。 Further, the coating head (4) of the present invention is characterized in that In any of the above coating heads (1) to (3), the upper head includes a fixing member fixed to the lower head and a moving member that is attached to the fixing member so as to be positionally adjustable in the vertical direction. The upper liquid volume storage portion is formed in the moving member, and the upper smearing portion and the upper side scraping portion are provided on the moving member.

根據上述塗敷頭(4)，因為係相對於前述固定構件能夠在上下方向移動前述移動構件，進行位置調整的方式安裝的，所以可根據所塗敷之基板的厚度與形成的塗膜的膜厚，任意調整前述移動構件之高度位置，能夠針對各種各樣厚度之基板，進行各種各樣膜厚的塗敷。 According to the coating head (4), since the moving member can be moved in the vertical direction with respect to the fixing member and the position is adjusted, the film can be formed according to the thickness of the coated substrate. The thickness of the moving member can be arbitrarily adjusted, and the coating can be applied to various substrates of various thicknesses.

另外，本發明之塗敷頭(5)，其特徵在於，在上述任一塗敷頭(1)至(3)中，前述上側頭具備固定於前述下側頭之固定構件、及相對於該固定構件以在上下方向可進行位置調整之方式安裝的2個移動構件，前述上側液體積存部係形成於前述固定構件，在與前述上側液體積存部並列設置的一個移動構件設置有前述上側抹子部，在與前述一個移動構件並列設置的另一個移動構件設置有前述上側刮取部。 Further, in the coating head (5) of the present invention, in any one of the coating heads (1) to (3), the upper head includes a fixing member fixed to the lower head, and the fixing member The fixing member is provided with two moving members that are positionally adjustable in the vertical direction, and the upper liquid storage portion is formed in the fixing member, and the upper side trowel is provided in one moving member provided in parallel with the upper liquid storage portion. The other moving member provided in parallel with the one moving member is provided with the upper side scraping portion.

根據上述塗敷頭(5)，由於能夠相對於前述固定構件，以在上下方向上移動進行位置調整之方式分別安裝前述一個移動構件與前述另一個移動構件，所以可根據所塗敷之基板的厚度或者形成之塗膜的厚度，分別調整裝設有前述上側抹子部之前述一個移動構件與裝有前述上側刮取部之前述另一個移動構件的高度位置，能夠相對於 各種各樣厚度之基板，進行各種各樣膜厚的塗敷。 According to the coating head (5), since the one moving member and the other moving member can be respectively attached to the fixing member so as to be moved in the vertical direction, the movable member can be attached to the substrate. The thickness or the thickness of the formed coating film is adjusted to a height position of the one moving member in which the upper trowel portion is mounted and the other moving member in which the upper side scraping portion is mounted, respectively. Coatings of various thicknesses are applied to various film thicknesses.

另外，本發明之塗敷頭(6)，其特徵在於，在上述任一塗敷頭(1)至(3)中，前述上側頭具備固定於前述下側頭之固定構件、相對於該固定構件以在上下方向可進行位置調整之方式安裝的移動構件，該移動構件在藉由賦予勢能手段向下方賦予勢能之狀態安裝於前述固定構件，前述上側液體積存部、前述上側抹子部與前述上側刮取部係設置在前述移動構件。 Further, in the coating head (6) of the present invention, in any one of the coating heads (1) to (3), the upper head has a fixing member fixed to the lower head, and is fixed relative to the fixing head a moving member that is attached to a position in the vertical direction, and the moving member is attached to the fixing member in a state in which a potential energy is applied downward by a potential energy means, and the upper liquid storage portion and the upper trowel portion are The upper scraping portion is provided in the aforementioned moving member.

根據上述塗敷頭(6)，由於能夠相對於前述固定構件，以在上下方向上可進行調整位置的方式安裝前述移動構件，所以能夠根據所塗敷之基板的厚度或者形成之塗膜的厚度，任意調整前述移動構件的高度位置，從而能夠相對於各種厚度之基板，進行各種膜厚之塗敷。進而由於前述移動構件係通過前述賦予勢能手段以向下方被賦予勢能之狀態安裝於前述固定構件，所以能夠使前述上側頭與前述下側頭的空隙尺寸保持為一定寬度，只要係在該空隙尺寸範圍內，即使基板之厚度不同，也能夠進行適當的塗敷。 According to the coating head (6), since the moving member can be attached to the fixing member so as to be positionable in the vertical direction, the thickness of the coated substrate or the thickness of the formed coating film can be formed. By adjusting the height position of the moving member arbitrarily, it is possible to apply various film thicknesses to the substrates of various thicknesses. Further, since the moving member is attached to the fixing member in a state in which the potential energy is applied downward by the potential energy supply means, the gap between the upper head and the lower head can be kept constant, as long as the gap size is set. Within the range, even if the thickness of the substrate is different, appropriate coating can be performed.

另外本發明之塗敷頭(7)，其特徵在於，在上述塗敷頭(6)中，前述移動構件具有第1構件與第2構件，前述第1構件係相對於前述固定構件以在上下方向上可進行調整位置之方式安裝者，前述第2構件係通過前述賦予勢能手段在朝下方被賦予勢能的狀態下安裝於前述第1構件者，前述上側液體積存部、前述上側抹子部、及前 述上側刮取部係設置在前述第2構件。 Further, in the coating head (7) of the present invention, in the coating head (6), the moving member has a first member and a second member, and the first member is upper and lower with respect to the fixing member. The second member is attached to the first member in a state in which a potential energy is applied downward by the potential energy supply means, and the upper liquid storage portion and the upper trowel portion are attached to the first member. And before The upper scraping portion is provided in the second member.

根據上述塗敷頭(7)，藉由前述第1構件能夠容易地進行相對於前述固定構件調整上下方向的安裝位置，另外，由於能夠在僅使前述基板端部所***的前述第2構件被朝下賦予勢能之狀態下安裝，所以藉由設置於前述第2構件上之前述上側抹子部與前述上側刮取部，對於厚度不同之基板也能夠薄且均勻地塗敷前述膜形成液。 According to the coating head (7), the first member can easily adjust the mounting position in the vertical direction with respect to the fixing member, and the second member that can be inserted only in the end portion of the substrate can be Since the upper side smear portion and the upper side scraping portion provided on the second member are attached in a state in which the potential energy is applied downward, the film forming liquid can be thinly and uniformly applied to the substrate having different thicknesses.

另外，本發明之塗敷頭(8)，其特徵在於，在上述任一塗敷頭(1)至(7)中，前述上側頭具備排出前述膜形成液之液體排出路。 Further, in the coating head (8) of the present invention, in any one of the coating heads (1) to (7), the upper head has a liquid discharge path for discharging the film forming liquid.

根據上述塗敷頭(8)，能夠將供給至前述上側液體積存部之多餘的前述膜形成液由前述液體排出路適當地排出，從而能夠防止從前述上側頭與前述下側頭之前述空隙部分有不要的液體垂下等。 According to the coating head (8), the excess film forming liquid supplied to the upper liquid storage portion can be appropriately discharged from the liquid discharge path, thereby preventing the gap portion from the upper head and the lower head. There are unwanted liquids hanging down and so on.

另外，本發明之塗敷方法(1)，係在基板之包括端面之周緣部塗敷膜形成液之塗敷方法，其特徵在於，具有：在具有可***前述基板之端部之空隙而相向配置的一對塗敷頭之前述空隙內，***前述基板端部之步驟；在對前述一對塗敷頭之相對面所形成的液體積存部供給前述膜形成液之同時，使前述一對塗敷頭沿著前述基板的周緣部移動，在該基板之周緣部形成塗膜的塗敷步驟；該塗敷步驟具備藉由與前述液體積存部並列設置的塗工部，將通過前述液體積存部後之前述基板所附著之前述膜形成液塗敷成薄膜狀的步驟。 Further, the coating method (1) of the present invention is a coating method of coating a film forming liquid on a peripheral portion including an end surface of a substrate, and has a gap which is inserted into an end portion of the substrate and faces each other. a step of inserting the end portion of the substrate into the gap of the pair of coating heads disposed; and supplying the film forming liquid to the liquid volume portion formed on the opposite surface of the pair of coating heads a coating step of forming a coating film on a peripheral portion of the substrate along a peripheral portion of the substrate; the coating step includes a coating portion disposed in parallel with the liquid reservoir, and passing through the liquid reservoir The film forming liquid to which the substrate is attached is coated in a film form.

根據上述塗敷方法(1)，能夠在前述基板之周緣部的上下表面以及前述基板端面薄且均勻地塗敷前述膜形成液，能夠在前述基板之周緣部精度良好地形成邊框狀之塗膜。因此，能夠防止由於前述基板端面部分的損壞所引起之塵埃的發生，同時能夠藉由塗膜使前述基板得以強化，能夠提高前述基板之操作性。 According to the coating method (1), the film forming liquid can be thinly and uniformly applied to the upper and lower surfaces of the peripheral portion of the substrate and the end surface of the substrate, and the coating film having a frame shape can be accurately formed on the peripheral portion of the substrate. . Therefore, it is possible to prevent the occurrence of dust due to the damage of the end surface portion of the substrate, and it is possible to strengthen the substrate by the coating film, and it is possible to improve the operability of the substrate.

另外本發明之塗敷方法(2)，其特徵在於，在上述塗敷方法(1)中，使用複數個前述塗敷頭同時並行地對前述基板之各邊進行塗敷。 Further, in the coating method (2) of the present invention, in the coating method (1), each of the sides of the substrate is simultaneously coated in parallel using a plurality of the coating heads.

根據上述塗敷方法(2)，由於係利用複數個前述塗敷頭同時並行地對前述基板之各邊進行塗敷，所以能夠大幅地縮短塗敷前述基板全部周邊的時間，能夠提高前述塗敷步驟的效率。 According to the coating method (2), since the respective sides of the substrate are simultaneously and simultaneously coated by a plurality of the coating heads, the time for applying the entire periphery of the substrate can be greatly shortened, and the coating can be improved. The efficiency of the steps.

1、1A‧‧‧塗敷裝置 1, 1A‧‧‧ coating device

10、10A‧‧‧支撐台 10, 10A‧‧‧ support table

11‧‧‧固定導軌 11‧‧‧Fixed rails

12‧‧‧運送導軌 12‧‧‧Transportation rails

13‧‧‧升降機構 13‧‧‧ Lifting mechanism

20、20A、20B、20C、20D‧‧‧塗敷單元 20, 20A, 20B, 20C, 20D‧‧‧ coating unit

21、21A‧‧‧塗敷頭 21, 21A‧‧‧ coating head

22、22C、22G‧‧‧上側頭 22, 22C, 22G‧‧‧ upper head

22A、22D、22H‧‧‧固定構件 22A, 22D, 22H‧‧‧ fixed components

22B、22E、22F、22I‧‧‧移動構件 22B, 22E, 22F, 22I‧‧‧ moving components

22a、28a‧‧‧傾斜引導部 22a, 28a‧‧‧ tilt guide

22b、28b、28h‧‧‧上側液體積存部 22b, 28b, 28h‧‧‧ upper fluid volume

22c、28c‧‧‧上側抹子構件(上側抹子部) 22c, 28c‧‧‧ upper trowel member (upper trowel)

22d、28d‧‧‧上側刮刀部(上側刮取部) 22d, 28d‧‧‧ upper scraper section (upper scraping section)

22e、23f‧‧‧液體排出溝 22e, 23f‧‧‧ liquid discharge ditch

22f、28i、28m‧‧‧通孔 22f, 28i, 28m‧‧‧ through holes

22h、22n、23h‧‧‧安裝孔 22h, 22n, 23h‧‧‧ mounting holes

22i、28u‧‧‧液體供給路 22i, 28u‧‧‧ liquid supply road

22j‧‧‧注入孔 22j‧‧‧ injection hole

22k‧‧‧凹部 22k‧‧‧ recess

22m、28n、29k‧‧‧螺栓 22m, 28n, 29k‧‧‧ bolts

22q‧‧‧上側抹子構件(上側抹子部) 22q‧‧‧Upper trowel member (upper trowel)

23、23A‧‧‧下側頭 23, 23A‧‧‧ lower head

23a‧‧‧傾斜引導部 23a‧‧‧Tilting Guide

23b‧‧‧下側液體積存部 23b‧‧‧Underside fluid storage

23c‧‧‧下側抹子構件(下側抹子部) 23c‧‧‧Bottom trowel member (lower trowel)

23d‧‧‧下側刮刀部(下側刮取部) 23d‧‧‧Bottom scraper section (lower scraping section)

23g‧‧‧吊設構件 23g‧‧‧ hanging components

23i‧‧‧螺孔 23i‧‧‧ screw holes

23j‧‧‧孔部 23j‧‧‧ Hole Department

24、24A‧‧‧液體接受部 24, 24A‧‧‧ Liquid Acceptance Department

24a‧‧‧接受盤 24a‧‧‧ Acceptance

24d‧‧‧接口 24d‧‧‧ interface

25‧‧‧支撐部 25‧‧‧Support

26‧‧‧連接螺栓 26‧‧‧Connecting bolts

27‧‧‧塗敷頭用保護具 27‧‧‧Protective head for coating head

27a‧‧‧台座 27a‧‧‧ pedestal

27b‧‧‧帶狀板 27b‧‧‧Strip plate

27c‧‧‧墊單元 27c‧‧‧mat unit

27d‧‧‧安裝部 27d‧‧‧Installation Department

27e‧‧‧延設片 27e‧‧‧ Extension

27f‧‧‧墊保持部 27f‧‧‧Material Maintenance Department

27g‧‧‧墊構件 27g‧‧‧pad components

28e‧‧‧片簧構件 28e‧‧‧Spring Member

28f‧‧‧推壓部 28f‧‧‧Pushing Department

28g‧‧‧突起部 28g‧‧‧protrusion

28j‧‧‧片簧安裝部 28j‧‧ ‧ leaf spring installation

28n、29k‧‧‧螺栓 28n, 29k‧‧‧ bolts

28o‧‧‧連接構件 28o‧‧‧Connecting components

28p、28r、28w‧‧‧凹部 28p, 28r, 28w‧‧‧ recess

28q‧‧‧凸部 28q‧‧‧ convex

28x‧‧‧抹子面 28x‧‧‧Small noodles

29a、29b‧‧‧螺栓孔 29a, 29b‧‧‧ bolt holes

29c、29e‧‧‧長孔 29c, 29e‧‧‧ long hole

29d‧‧‧螺栓安裝孔 29d‧‧‧Bolt mounting hole

30‧‧‧旋轉機構部 30‧‧‧Rotating Mechanism Department

31‧‧‧連接構件 31‧‧‧Connecting components

32‧‧‧旋轉馬達 32‧‧‧Rotary motor

32a、33a‧‧‧旋轉軸 32a, 33a‧‧‧Rotary axis

33‧‧‧旋轉軸部 33‧‧‧Rotary shaft

34‧‧‧旋轉臂 34‧‧‧Rotating arm

34a‧‧‧臂部 34a‧‧‧arm

35‧‧‧滑動機構 35‧‧‧Sliding mechanism

36‧‧‧連接構件 36‧‧‧Connecting members

40、40A、40B、40C、40D‧‧‧移動單元 40, 40A, 40B, 40C, 40D‧‧‧ mobile units

41、46‧‧‧X軸氣缸 41, 46‧‧‧X-axis cylinder

42、48‧‧‧Y軸氣缸 42, 48‧‧‧Y-axis cylinder

47‧‧‧X軸滑塊 47‧‧‧X-axis slider

43、49‧‧‧Y軸滑塊 43, 49‧‧‧Y-axis slider

44‧‧‧引導部 44‧‧‧Guide Department

50、50A、50B、50C、50D‧‧‧液體供給單元 50, 50A, 50B, 50C, 50D‧‧‧ liquid supply unit

51‧‧‧膜形成液 51‧‧‧ Film Formation Fluid

52‧‧‧液體收容部 52‧‧‧Liquid accommodating department

53、56‧‧‧泵 53, 56‧‧ ‧ pump

54、55‧‧‧管 54, 55‧‧‧ tube

60、60A‧‧‧乾燥爐 60, 60A‧‧‧ drying oven

61‧‧‧隔熱材料 61‧‧‧Insulation materials

62‧‧‧鰭狀加熱器 62‧‧‧Fin heater

63‧‧‧供給配管 63‧‧‧Supply piping

64‧‧‧空氣泵 64‧‧‧Air pump

70、70A‧‧‧控制部 70, 70A‧‧‧Control Department

80、80A‧‧‧操作部 80, 80A‧‧‧Operation Department

81‧‧‧液晶操作面板 81‧‧‧LCD operation panel

90‧‧‧確定位置部 90‧‧‧Determining the location department

91‧‧‧傳送部 91‧‧‧Transportation Department

92‧‧‧定位引導部 92‧‧‧ Positioning Guide

300‧‧‧基板移載部 300‧‧‧Substrate Transfer Department

301‧‧‧第1基板保持部 301‧‧‧1st substrate holding unit

302‧‧‧第2基板保持部 302‧‧‧2nd substrate holding unit

303‧‧‧水平移動機構 303‧‧‧ horizontal moving mechanism

304‧‧‧垂直移動機構 304‧‧‧Vertical moving mechanism

305‧‧‧吸著保持部 305‧‧‧Sucking and holding department

第1圖係為了顯示本發明實施形態(1)之塗敷裝置的內部構造而省略框體所顯示的側視圖。 Fig. 1 is a side view showing the internal structure of the coating apparatus according to the embodiment (1) of the present invention, and the side view of the casing is omitted.

第2圖係為了顯示實施形態(1)之塗敷裝置的內部構造而省略框體所顯示的前視圖。 Fig. 2 is a front view showing the inside of the coating device in which the coating device of the embodiment (1) is displayed, and the frame is omitted.

第3圖係第2圖中從箭頭A方向觀看之塗敷頭的前視圖。 Fig. 3 is a front view of the applicator head viewed from the direction of arrow A in Fig. 2.

第4圖係第3圖中沿IV-IV線之剖面圖。 Figure 4 is a cross-sectional view taken along line IV-IV in Figure 3.

第5圖係第3圖中沿V-V線之剖面圖。 Fig. 5 is a cross-sectional view taken along line V-V in Fig. 3.

第6圖係上側頭之分解底面圖。 Figure 6 is an exploded bottom view of the upper side.

第7圖係第3圖中沿VII-VII線的剖面圖。 Fig. 7 is a cross-sectional view taken along line VII-VII in Fig. 3.

第8圖係實施形態(1)之塗敷裝置的塗敷頭退避至塗敷頭用保護具的位置時的俯視圖。 Fig. 8 is a plan view showing a state in which the coating head of the coating device of the embodiment (1) is retracted to the position of the protective member for the coating head.

第9圖係第8圖中從箭頭C方向觀看之塗敷頭用保護具的前視圖。 Fig. 9 is a front view of the protector for a coating head viewed from the direction of the arrow C in Fig. 8.

第10圖係用來說明實施形態實施形態(1)之塗敷裝置的塗敷頭動作的俯視圖。 Fig. 10 is a plan view for explaining the operation of the applicator head of the coating device of the embodiment (1).

第11圖係顯示使用實施形態實施形態(1)之塗敷裝置所塗敷的基板之周緣部附近的圖，(a)係部分斜視圖，(b)係(a)中沿b-b線的剖視圖。 Fig. 11 is a view showing the vicinity of a peripheral portion of a substrate coated with a coating apparatus according to an embodiment (1), (a) a partial oblique view, and (b) a cross-sectional view taken along line bb in (a). .

第12圖係顯示構成另外的實施形態實施形態之塗敷頭的上側頭的構造的圖，(a)係底面圖，(b)係俯視圖。 Fig. 12 is a view showing a structure constituting an upper head of an applicator head according to another embodiment of the present invention, wherein (a) is a bottom view and (b) is a plan view.

第13圖係為了顯示實施形態實施形態(2)之塗敷裝置的內部構造而省略了框體所顯示的俯視圖。 Fig. 13 is a plan view showing the internal structure of the coating apparatus according to the embodiment (2), and the frame is omitted.

第14圖係為了顯示實施形態實施形態(2)之塗敷裝置的內部構造而省略了框體所顯示的側視圖。 Fig. 14 is a side view showing the internal structure of the coating apparatus according to the embodiment (2), and the side view of the casing is omitted.

第15圖係第14圖中從箭頭A1方向觀看之塗敷頭的前視圖。 Fig. 15 is a front view of the applicator head viewed from the direction of arrow A1 in Fig. 14.

第16圖係第15圖中沿XVI-XVI線之剖視圖。 Figure 16 is a cross-sectional view taken along line XVI-XVI in Figure 15.

第17圖係第15圖中沿XVII-XVII線之剖視圖。 Figure 17 is a cross-sectional view taken along line XVII-XVII in Figure 15.

第18圖係第15圖中沿XVIII-XVIII線之剖視圖。 Figure 18 is a cross-sectional view taken along line XVIII-XVIII in Figure 15.

第19圖係上側頭之分解底面圖。 Figure 19 is an exploded bottom view of the upper side.

第20圖係上側頭之分解主視圖。 Figure 20 is an exploded front view of the upper side head.

第21圖係第15圖中沿XXI-XXI的剖面圖。 Figure 21 is a cross-sectional view taken along line XXI-XXI in Figure 15.

第22圖係為了說明實施形態實施形態(2)之塗敷裝置的塗敷頭動作之俯視圖。 Fig. 22 is a plan view showing the operation of the applicator head of the coating device of the embodiment (2).

第23圖係習知的塗敷裝置的概略側視圖。 Figure 23 is a schematic side view of a conventional coating apparatus.

第24圖係為了顯示以往之塗敷裝置的內部結構，而省略了框體所顯示的概略主視圖。 Fig. 24 is a schematic front view showing the internal structure of the conventional coating apparatus, and the frame is omitted.

以下依據附圖，說明本發明之塗敷裝置、塗敷頭以及塗敷方法之實施形態。第1圖係為了顯示實施形態(1)之塗敷裝置之內部構造而省略框體所顯示的側視圖，第2圖係為了顯示塗敷裝置之內部構造而省略框體所顯示的前視圖。 Embodiments of the coating device, the coating head, and the coating method of the present invention will be described below with reference to the accompanying drawings. Fig. 1 is a side view showing the internal structure of the coating apparatus of the embodiment (1), and the side view shown in the frame is omitted. Fig. 2 is a front view showing the inside of the coating device in order to show the internal structure of the coating device.

塗敷裝置1包括支撐基板2之支撐台10、具備由上側頭22與下側頭23組成的一對塗敷頭21的塗敷單元20以及使塗敷單元20移動之移動單元40而構成。 The coating device 1 includes a support table 10 that supports the substrate 2, a coating unit 20 that includes a pair of coating heads 21 composed of an upper head 22 and a lower head 23, and a moving unit 40 that moves the coating unit 20.

另外，塗敷裝置1上裝設有對一對塗敷頭21供給含有樹脂成分之膜形成液51之液體供給單元50、用來乾燥塗敷於基板2上之膜形成液51之乾燥爐60、及對裝置各部分之驅動進行控制之控制部70以及操作部80。 Further, the coating device 1 is provided with a liquid supply unit 50 that supplies a film forming liquid 51 containing a resin component to a pair of coating heads 21, and a drying furnace 60 for drying the film forming liquid 51 applied to the substrate 2. And a control unit 70 and an operation unit 80 that control the driving of each part of the device.

支撐台10係配設於與基板2之運送方向相平行配設的運送導軌12之間。運送軌道12係藉由線性機構等，以能夠在固定導軌11上滑動移動的方式構成，固定導軌11與基板2之運送方向平行配設。支撐台10被升降機構13以可以升降之方式支撐，升降機構13係安裝在支撐構件14，支撐構件14係設置在固定導軌11之間。固定 導軌11係固定於未圖示之框體。 The support table 10 is disposed between the transport rails 12 disposed in parallel with the transport direction of the substrate 2. The transport rail 12 is configured to be slidable on the fixed rail 11 by a linear mechanism or the like, and the fixed rail 11 is disposed in parallel with the transport direction of the substrate 2. The support table 10 is supported by the elevating mechanism 13 so as to be movable up and down, the elevating mechanism 13 is attached to the support member 14, and the support member 14 is disposed between the fixed rails 11. fixed The guide rail 11 is fixed to a casing (not shown).

運送導軌12在固定導軌11上滑動移動，則載置於運送導軌12之基板2被運送到支撐台10上方，接下來升降機構13運行，則位於比運送導軌11的上表面還向下的支撐台10上升，在基板2被支撐在支撐台10的上的狀態下，上升之指定的塗敷位置。另外，塗敷後，升降機構12運行，支撐台10下降，基板2被載置至運送軌道12上。 When the transport rail 12 slides on the fixed rail 11, the substrate 2 placed on the transport rail 12 is transported above the support table 10, and then the lift mechanism 13 operates to be supported downward from the upper surface of the transport rail 11. The stage 10 is raised, and the specified application position is raised in a state where the substrate 2 is supported on the support table 10. Further, after the application, the elevating mechanism 12 is operated, the support table 10 is lowered, and the substrate 2 is placed on the transport rail 12.

另外，在支撐台10上設有吸著機構(未圖示)，能夠使基板2吸著於支撐台10的上表面。就吸著機構而言，係可採用在支撐台10設置複數個空氣吸氣孔，這些空氣吸氣孔透過氣管與真空泵連接之構成等。 Further, a suction mechanism (not shown) is provided on the support table 10, so that the substrate 2 can be attracted to the upper surface of the support table 10. In the case of the absorbing mechanism, a plurality of air suction holes may be provided in the support table 10, and the air suction holes are connected to the vacuum pump through the air pipe.

移動單元40係由使塗敷單元20在2軸(XY軸)方向水平移動的2軸(XY軸)直線運動機構所構成，包括固定於未圖示之框體的X軸氣缸41、一端側以能夠滑動移動的方式與X軸氣缸41連接的Y軸氣缸42、使Y軸氣缸42滑動移動之Y軸滑塊43、及支撐Y軸氣缸42的另一端一側的支撐引導部44而構成。在Y軸滑塊43安裝有塗敷單元20。支撐引導部44係固定於未圖示之框體。Y軸氣缸42以及Y軸滑塊43的運行係由控制部70控制。 The moving unit 40 is constituted by a two-axis (XY-axis) linear motion mechanism that horizontally moves the coating unit 20 in the two-axis (XY-axis) direction, and includes an X-axis cylinder 41 fixed to a casing (not shown) and one end side. The Y-axis cylinder 42 that is slidably coupled to the X-axis cylinder 41, the Y-axis slider 43 that slides the Y-axis cylinder 42, and the support guide 44 that supports the other end of the Y-axis cylinder 42 are configured. . A coating unit 20 is attached to the Y-axis slider 43. The support guide portion 44 is fixed to a frame (not shown). The operation of the Y-axis cylinder 42 and the Y-axis slider 43 is controlled by the control unit 70.

塗敷單元20包括旋轉機構部30以及一對塗敷頭21而構成。旋轉機構部30係包括與Y軸滑塊43連接的連接構件31、安裝於連接構件31上的旋轉馬達32、與向垂直方向延伸之旋轉馬達32的旋轉軸32a連接的旋轉軸 部33、及一端與旋轉軸部33連接的旋轉臂34而構成，能夠以旋轉馬達32的旋轉軸32a為中心使一對塗敷頭21旋轉。 The coating unit 20 includes a rotating mechanism portion 30 and a pair of coating heads 21 . The rotation mechanism unit 30 includes a connection member 31 connected to the Y-axis slider 43, a rotation motor 32 attached to the connection member 31, and a rotation shaft connected to the rotation shaft 32a of the rotation motor 32 extending in the vertical direction. The portion 33 and the rotating arm 34 having one end connected to the rotating shaft portion 33 are configured to rotate the pair of coating heads 21 around the rotating shaft 32a of the rotary motor 32.

旋轉軸部33係包括旋轉軸33a、及以可旋轉之方式支撐旋轉軸33a的滾軸軸承(未圖示)而構成，旋轉軸33a的上端一側與旋轉馬達32的旋轉軸32a連接，旋轉軸33a的下端一側與旋轉臂34連接。 The rotating shaft portion 33 includes a rotating shaft 33a and a roller bearing (not shown) that rotatably supports the rotating shaft 33a. The upper end side of the rotating shaft 33a is connected to the rotating shaft 32a of the rotary motor 32, and is rotated. The lower end side of the shaft 33a is connected to the rotating arm 34.

旋轉臂34係具備在水平方向延伸設置的臂部34a，在臂部34a的下表面中間部設有滑動機構35，該滑動機構35係用來使一對塗敷頭21在臂部34a的較長一邊的方向(水平方向)滑動移動者。滑動機構35係由電動式直線移動引導機構等所構成，在滑動機構35上安裝有用來安裝一對塗敷頭21的連接構件36。 The rotating arm 34 includes an arm portion 34a extending in the horizontal direction, and a sliding mechanism 35 for aligning the pair of coating heads 21 on the arm portion 34a is provided at an intermediate portion of the lower surface of the arm portion 34a. Slide the mover in the direction of the long side (horizontal direction). The slide mechanism 35 is constituted by an electric linear movement guide mechanism or the like, and a connection member 36 for attaching the pair of coating heads 21 is attached to the slide mechanism 35.

另外，用來檢測旋轉臂34的旋轉停止位置的探測器(例如字型光敏探測器)(未圖示)係以90度的間隔配設在旋轉軸部33的周圍，旋轉臂34旋轉90度，則設置在旋轉臂34的遮光板(未圖示)就會遮住前述探測器的受光部，從而檢測出停止位置。 In addition, a detector for detecting the rotational stop position of the rotating arm 34 (for example The type photosensitive detector (not shown) is disposed around the rotating shaft portion 33 at an interval of 90 degrees, and when the rotating arm 34 is rotated by 90 degrees, the light shielding plate (not shown) provided on the rotating arm 34 is provided. The light receiving portion of the probe is blocked to detect the stop position.

接著就構成塗敷單元20之一對塗敷頭21進行說明。第3圖係第2圖中從箭頭A方向觀看一對塗敷頭21的前視圖，第4圖係在第3圖中沿IV-IV線之剖面圖。第5圖係第3圖中沿V-V線之剖視圖，顯示上側頭底面(與下側頭的相對面)，第6圖係上側頭的分解底面圖。另外，第7圖係第3圖中沿VII-VII線之剖面圖，顯示下側頭的 上表面(與上側頭的相對面)。另外，圖中之箭頭B顯示塗敷頭21之移動方向。 Next, the coating head 21 will be described as one of the coating units 20. Fig. 3 is a front view of a pair of coating heads 21 viewed from the direction of arrow A in Fig. 2, and Fig. 4 is a sectional view taken along line IV-IV in Fig. 3. Fig. 5 is a cross-sectional view taken along line V-V in Fig. 3, showing the upper head bottom surface (opposing surface opposite to the lower head), and Fig. 6 is an exploded bottom view of the upper side head. In addition, Fig. 7 is a sectional view taken along line VII-VII in Fig. 3, showing the lower side head Upper surface (opposite to the upper side). Further, an arrow B in the figure shows the moving direction of the coating head 21.

塗敷頭21包括具有能夠***基板2端部之空隙的上下相對向配置的上側頭22和下側頭23而構成。在塗敷頭21的下表面配設有固定在下側頭23上的液體接受部24。塗敷頭21以及液體接受部24係由具有耐腐蝕性的不鏽鋼等金屬材料形成。另外，塗敷頭21表面(至少在膜形成液的流路面)上，被施以陶瓷加工等表面加工。 The coating head 21 includes an upper head 22 and a lower head 23 which are disposed to face the gap of the end portion of the substrate 2 so as to be vertically opposed to each other. A liquid receiving portion 24 fixed to the lower head 23 is disposed on the lower surface of the coating head 21. The coating head 21 and the liquid receiving portion 24 are formed of a metal material such as stainless steel having corrosion resistance. Further, the surface of the coating head 21 (at least on the flow path of the film forming liquid) is subjected to surface processing such as ceramic processing.

如第5圖，第6圖所示，上側頭22係包括固定於下側頭23的固定構件22A、及相對於固定構件22A以上下方向可以移動之方式固定的移動構件22B而構成。可***基板2端部的空隙係形成於上側頭22的移動構件22B與下側頭23之間，固定構件22A與下側頭23的相對面相鄰接被固定。 As shown in Fig. 5 and Fig. 6, the upper head 22 includes a fixing member 22A fixed to the lower head 23 and a moving member 22B fixed to the fixing member 22A so as to be movable in the vertical direction. The gap into which the end portion of the substrate 2 can be inserted is formed between the moving member 22B of the upper head 22 and the lower head 23, and the opposing faces of the fixing member 22A and the lower head 23 are adjacently fixed.

在移動構件22B的底面併設有傾斜引導部22a、上側液體積存部22b、上側抹子構件(抹子部)22c、及上側刮刀部(刮取部)22d(互相緊挨著設置)。在固定構件22A的底面形成有上側液體積存部22b、從上側液體積存部22b至通過固定構件22A背面的液體排出溝22e、及用來使固定於下側頭23上的螺栓構件(未圖示)通過的通孔22f。 On the bottom surface of the moving member 22B, an inclined guide portion 22a, an upper liquid storage portion 22b, an upper trowel member (trowel portion) 22c, and an upper blade portion (scraping portion) 22d (which are disposed next to each other) are provided. The upper side liquid storage portion 22b, the upper liquid storage portion 22b, the liquid discharge groove 22e passing through the back surface of the fixing member 22A, and the bolt member for fixing to the lower head 23 are formed on the bottom surface of the fixing member 22A (not shown). Pass through hole 22f.

另外，在固定構件22A的背面形成有供給膜形成液51的接口22g的安裝孔22h，安裝孔22h係與內部形成的液體供給路22i相連，液體供給路22i係與形成 於移動構件22B的上側液體積存部22b的注入孔22j相連，從而形成膜形成液51被供給至上側液體積存部22b的構成。 Further, a mounting hole 22h for supplying the interface 22g of the film forming liquid 51 is formed on the back surface of the fixing member 22A, and the mounting hole 22h is connected to the liquid supply path 22i formed inside, and the liquid supply path 22i is formed and formed. The injection holes 22j of the upper liquid volume storage portion 22b of the moving member 22B are connected to each other, thereby forming a configuration in which the film forming liquid 51 is supplied to the upper liquid storage portion 22b.

傾斜引導部22a係為了容易在上側頭22與下側頭23的空隙內引導基板2的端部而設置者，且形成為相對於水平面傾斜30度左右的構造。 The inclined guide portion 22a is provided so as to easily guide the end portion of the substrate 2 in the gap between the upper head 22 and the lower head 23, and is formed to have a structure inclined by about 30 degrees with respect to the horizontal plane.

與傾斜引導部22a並列設置的上側液體積存部22b橫跨移動構件22B與固定構件22A，亦即，從移動構件22B的正面一側端部起至固定構件22A的中央附近，形成為近似矩形的淺溝狀。 The upper liquid storage portion 22b provided in parallel with the inclined guide portion 22a spans the moving member 22B and the fixing member 22A, that is, from the front end side of the moving member 22B to the vicinity of the center of the fixing member 22A, and is formed to be approximately rectangular. Shallow groove shape.

在上側液體積存部22b上形成的注入孔22j，能夠由未圖示之螺絲構件分別蓋上蓋子，當在基板2端部所塗敷的液膜的寬度較窄時(3mm至5mm時)，靠近固定構件22A的注入孔22j蓋上蓋子(未圖示)，當給基板2端部所塗敷的液體膜的寬度較寬時(5mm至10mm時)，能夠在2個注入孔22j上都不蓋蓋子的狀態下使用，從而能夠根據基板2端部所塗敷的液體膜的寬度，調整注入量和注入位置。 The injection hole 22j formed in the upper liquid volume storage portion 22b can be covered by a screw member (not shown), and when the width of the liquid film applied to the end portion of the substrate 2 is narrow (3 mm to 5 mm), The injection hole 22j close to the fixing member 22A is covered with a cover (not shown), and when the width of the liquid film applied to the end portion of the substrate 2 is wide (5 mm to 10 mm), it can be applied to both of the injection holes 22j. The use is carried out without covering the lid, so that the injection amount and the injection position can be adjusted according to the width of the liquid film applied to the end portion of the substrate 2.

在移動構件22B的上側液體積存部22b的旁邊形成有凹部22k，在凹部22k的靠近上側液體積存部22b的位置配設上側抹子構件22c，形成凹部22k的後端的壁部作為上側刮刀部22d發揮作用的構成。 A concave portion 22k is formed beside the upper liquid storage portion 22b of the moving member 22B, an upper smear member 22c is disposed at a position close to the upper liquid storage portion 22b of the concave portion 22k, and a wall portion forming the rear end of the concave portion 22k is used as the upper side scraping portion 22d. The composition of the role.

上側抹子構件22c係與上側液體積存部22b並列設置，且具有將附著在基板2的膜形成液51進行密接 密接且塗成均勻膜厚的功能，在俯視時呈近似正方形的板狀金屬構件形成抹子面221和螺栓22m的安裝孔22n，藉由螺栓22m以可裝卸的方式固定在移動構件22B的凹部22k。 The upper trowel member 22c is provided in parallel with the upper liquid storage portion 22b, and has the film forming liquid 51 attached to the substrate 2 in close contact with each other. The function of adhering and coating a uniform film thickness, the plate-shaped metal member having an approximately square shape in plan view forms the mounting hole 22n of the wiper surface 221 and the bolt 22m, and is detachably fixed to the concave portion of the moving member 22B by the bolt 22m. 22k.

在抹子面221上，在與塗敷頭21的移動方向B相平行的方向形成有複數個微小溝(例如剖面為V字狀的溝)。微小溝的間隔與深度係可根據所使用之膜形成液51的黏度等特性或者膜厚等進行適當設定。例如，在形成10μm至50μm程度的塗膜時，較佳為較佳為使用溝中心間隔設定為0.2mm至0.3mm程度，溝深度設定為0.05mm至0.1mm程度者。 On the trowel surface 221, a plurality of minute grooves (for example, grooves having a V-shaped cross section) are formed in a direction parallel to the moving direction B of the coating head 21. The interval and depth of the microgrooves can be appropriately set depending on characteristics such as viscosity of the film forming liquid 51 to be used, film thickness, and the like. For example, when forming a coating film of about 10 μm to 50 μm, it is preferable to use a groove center interval of about 0.2 mm to 0.3 mm and a groove depth of about 0.05 mm to 0.1 mm.

上側刮刀22d具有刮掉通過上側抹子構件22c之附著在基板2上的多餘的膜形成液51的作用，形成使凹部22k的後端壁部相對於與塗敷頭21(移動構件22B)的正面垂直相交的面，傾斜一定角度θ1(例如30度前後)的狀態。由於該傾斜，能夠使從基板2端部上表面刮掉的膜形成液51刮到基板2的端面一側，能夠控制膜形成液51的塗敷寬度為一定值。另外，為使構成上側刮刀部22d的刀部的高度比上側液體積存部22b的堤部分上表面還低100μm程度(為使空隙寬)，對前述刀部進行削刮加工。另外，前述刀部的高度能夠根據塗膜厚度進行設定。 The upper blade 22d has a function of scraping off the excess film forming liquid 51 adhered to the substrate 2 by the upper side smear member 22c, and forms the rear end wall portion of the concave portion 22k with respect to the coating head 21 (moving member 22B). The surface perpendicular to the front surface is inclined at a certain angle θ 1 (for example, around 30 degrees). Due to this inclination, the film forming liquid 51 scraped off from the upper surface of the end portion of the substrate 2 can be scraped to the end surface side of the substrate 2, and the coating width of the film forming liquid 51 can be controlled to a constant value. Further, in order to make the height of the blade portion constituting the upper blade portion 22d lower than the upper surface of the bank portion of the upper liquid storage portion 22b by about 100 μm (to make the gap wide), the blade portion is subjected to a shaving process. Further, the height of the blade portion can be set in accordance with the thickness of the coating film.

液體排出溝22e係形成為從上側液體積存部22b之固定構件22A一側端部起通過固定構件22A的背面，且供給至上側液體積存部22b的多餘的膜形成液51 會自液體排出溝22e排出至外部。 The liquid discharge groove 22e is formed as an excess film forming liquid 51 that passes through the back surface of the fixing member 22A from the end portion of the fixing member 22A of the upper liquid storage portion 22b and is supplied to the upper liquid storage portion 22b. It is discharged to the outside from the liquid discharge groove 22e.

另外，如第3圖所示，在上側頭22的移動構件22B的正面，在2個部位，形成縱方形長的長孔22o，在與長孔22o相對面的固定構件22A的側面，分別形成螺孔(未圖示)，移動構件22B係由螺栓22p固定在固定構件22A。通過長孔22o，能夠使移動構件22B相對於固定構件22A，在上下方向上移動，能夠上下微調整移動構件22B的固定位置以形成與塗敷之基板2的厚度相適應的空隙。 Further, as shown in Fig. 3, on the front surface of the moving member 22B of the upper head 22, elongated long holes 22o are formed at two locations, and the side faces of the fixing members 22A facing the long holes 22o are respectively formed. A screw hole (not shown) and a moving member 22B are fixed to the fixing member 22A by a bolt 22p. The long hole 22o allows the moving member 22B to move in the vertical direction with respect to the fixing member 22A, and the fixed position of the moving member 22B can be finely adjusted up and down to form a gap corresponding to the thickness of the coated substrate 2.

如第7圖所示，在下側頭23的上表面，並列設置傾斜引導部23a、下側液體積存部23b、下側抹子部23c、下側刮刀部23d，另外，更形成有安裝孔23e，係用來固定通過上側頭22的通孔22f的螺栓(未圖示)的。進而，在下側頭23上表面，豎立設置吊設構件23g，係用來將塗敷頭21吊設於支撐部25，在下側頭23的背面，形成用來安裝液體接受部24的安裝孔23h和液體排出溝23f。在棒狀之吊設構件23g的上部形成有用來安裝連接螺栓26的螺孔23i。 As shown in Fig. 7, the inclined guide portion 23a, the lower liquid storage portion 23b, the lower trowel portion 23c, and the lower blade portion 23d are provided in parallel on the upper surface of the lower head 23, and a mounting hole 23e is further formed. It is used to fix a bolt (not shown) that passes through the through hole 22f of the upper head 22. Further, on the upper surface of the lower head 23, a hanging member 23g is provided to hang the coating head 21 on the support portion 25, and a mounting hole 23h for mounting the liquid receiving portion 24 is formed on the back surface of the lower head 23. And the liquid discharge groove 23f. A screw hole 23i for attaching the connecting bolt 26 is formed in an upper portion of the rod-shaped hanging member 23g.

傾斜引導部23a係為了在上側頭22與下側頭23的空隙間容易引導基板2端部而設置者，為相對於水平面呈前後傾斜30度的構造。 The inclined guide portion 23a is provided so as to easily guide the end portion of the substrate 2 between the gaps of the upper head 22 and the lower head 23, and has a structure that is inclined forward and backward by 30 degrees with respect to the horizontal plane.

與傾斜引導部23a並列設置的下側液體積存部23b，係自下側頭23的正面側端部起到中央附近形成為近似矩形的淺的溝形狀，在與上側液體積存部22b相對向的位置形成為同樣的大小。 The lower side liquid storage portion 23b which is provided in parallel with the inclined side guide portion 23a is formed in a shallow groove shape which is formed in a substantially rectangular shape from the front end portion of the lower side head 23, and is opposed to the upper side liquid storage portion 22b. The position is formed to the same size.

與下側頭23之下側液體積存部23b鄰接形成孔部23j，在孔部23j的靠下側液體積存部23b的部位配設有下側抹子部23c，孔部23j的後端的壁部作為下側刮刀部23d發揮作用。 A hole portion 23j is formed adjacent to the lower side liquid storage portion 23b of the lower head 23, and a lower trowel portion 23c and a wall portion at the rear end of the hole portion 23j are disposed at a portion of the lower side liquid storage portion 23b of the hole portion 23j. It functions as the lower blade portion 23d.

下側抹子構件23c係與下側液體積存部23b並列設置，且具有使附著在基板2上之膜形成液51密接塗成均勻膜厚的作用，在細板狀金屬構件上形成抹子面23k和螺栓23l的安裝孔23m，藉由螺栓23l以可裝卸的方式固定在下側頭23的上表面所形成的凹部23n。 The lower trowel member 23c is provided in parallel with the lower liquid storage portion 23b, and has a function of adhering the film forming liquid 51 adhering to the substrate 2 to a uniform film thickness, and forming a smearing surface on the thin metal member. The mounting hole 23m of the 23k and the bolt 23l is detachably fixed to the recess 23n formed on the upper surface of the lower head 23 by the bolt 23l.

在抹子面23k上，在與塗敷頭21的移動方向B平行的方向形成有複數個的微小溝(例如剖面為V字狀的溝)。微小溝的間隔和深度係可根據所使用之膜形成液51的黏度等的特性或者膜厚等適當調整。例如，在形成10μm至50μm程度的塗膜時，較佳為使用溝的中心間隔設定為0.2至0.3mm程度，溝的深度設定為0.05mm至0.1mm程度者。 On the trowel surface 23k, a plurality of minute grooves (for example, grooves having a V-shaped cross section) are formed in a direction parallel to the moving direction B of the coating head 21. The interval and depth of the microgrooves can be appropriately adjusted depending on the characteristics such as the viscosity of the film forming liquid 51 to be used, the film thickness, and the like. For example, when forming a coating film of about 10 μm to 50 μm, it is preferable to set the center interval of the groove to about 0.2 to 0.3 mm, and the depth of the groove to be about 0.05 mm to 0.1 mm.

下側刮刀部23d具有刮掉通過下側液體積存部23b以及下側抹子構件23c之附著在基板2的多餘的膜形成液51的功能，使孔部23j的後端壁部相對於與塗敷頭21(下側頭23)正面垂直相交的面，向後方一側傾斜指定角度θ2(例如30度前後)的狀態。由於該傾斜，能夠將從基板2端部下表面刮掉的膜形成液51刮到基板2的端面一側，從孔部23j流入液體接受部24，能夠將塗敷液51之塗敷寬度控制為一定值。另外，為了使構成下側刮刀部23d 的刀部的高度，比下側液體積存部23b的堤部分上表面還低10μm程度(為使空隙寬)，對前述刀部進行削刮加工。另外，前述刀部之高度係能夠根據塗膜之厚度進行設定。 The lower blade portion 23d has a function of scraping off the excess film forming liquid 51 adhering to the substrate 2 through the lower liquid storage portion 23b and the lower smear member 23c, and the rear end wall portion of the hole portion 23j is coated with respect to the same. The surface on which the front surface 21 (lower side head 23) perpendicularly intersects is inclined to the rear side by a predetermined angle θ 2 (for example, before and after 30 degrees). Due to this inclination, the film forming liquid 51 scraped off from the lower surface of the end portion of the substrate 2 can be scraped onto the end surface side of the substrate 2, and can flow from the hole portion 23j into the liquid receiving portion 24, whereby the coating width of the coating liquid 51 can be controlled to A certain value. In addition, in order to make the height of the blade portion constituting the lower blade portion 23d lower than the upper surface of the bank portion of the lower liquid storage portion 23b by 10 μm (to make the gap wide), the blade portion is subjected to a shaving process. Further, the height of the blade portion can be set in accordance with the thickness of the coating film.

液體排出溝23f係形成於下側頭23之背面近似中央處，從上側頭22之液體排出溝22e排出之膜形成液51通過液體排出溝23f流入下方之液體接受部24。 The liquid discharge groove 23f is formed at the center of the back surface of the lower head 23, and the film forming liquid 51 discharged from the liquid discharge groove 22e of the upper head 22 flows into the liquid receiving portion 24 below through the liquid discharge groove 23f.

液體接受部24係具備俯視時呈矩形之接受盤24a和自接受盤24a之一側面起向上方延伸設置的安裝板24b，安裝板24b之上部係藉由未圖示之螺栓安裝於下側頭23背面之安裝孔23h。接受盤24a底面所形成之回收口24c係透過接口24d與管55連接。為了使回收口24c側朝下，將接受盤24a以略微傾斜之狀態安裝在下側頭23。 The liquid receiving portion 24 includes a receiving plate 24a having a rectangular shape in plan view and a mounting plate 24b extending upward from one side surface of the receiving plate 24a. The upper portion of the mounting plate 24b is attached to the lower head by a bolt (not shown). 23 mounting hole 23h on the back. The recovery port 24c formed on the bottom surface of the receiving tray 24a is connected to the tube 55 through the interface 24d. In order to bring the recovery port 24c side down, the receiving tray 24a is attached to the lower head 23 in a slightly inclined state.

另外，在塗敷頭21之退避位置(第10圖之A位置)，設置有塗敷頭用保護具27。第8圖係顯示在使塗敷頭21退避至塗敷頭用保護具27位置時的狀態的俯視圖，第9圖係第8圖中從C方向觀看之局部前視圖。 Further, at the retracted position of the coating head 21 (the position A in FIG. 10), the coating head protector 27 is provided. Fig. 8 is a plan view showing a state in which the application head 21 is retracted to the position of the application head protector 27, and Fig. 9 is a partial front view seen from the direction C in Fig. 8.

塗敷頭用保護具27包括在塗敷裝置1內之未圖示的台部所設置的台座27a、在台座27a上豎立設置的側面近似L字形狀之帶狀板27b和安裝於帶狀板27b上部之墊單元27c而構成。在台座27a的底面，設有未圖示之磁鐵，藉由該磁鐵固定於前述台部。 The coating head protector 27 includes a pedestal 27a provided in a table portion (not shown) in the coating device 1, a strip-shaped plate 27b which is erected on the pedestal 27a and has an approximately L-shaped side, and is attached to the strip plate. 27b is formed by the upper pad unit 27c. A magnet (not shown) is provided on the bottom surface of the pedestal 27a, and the magnet is fixed to the table portion by the magnet.

墊單元27c係包括安裝於帶狀板27b之帶狀板安裝部27d、自安裝部27d的一側邊上部朝俯視時呈傾斜方向延伸設置的延設片27e、在安裝部27d的上部以及 延設片27e上各自安裝的墊保持部27f、被各墊保持部27f所保持之墊構件27g、以及配設在安裝部27d的下端之俯視時呈矩形之接受盤形狀之液體接受部27h而構成。 The pad unit 27c includes a strip-shaped board attaching portion 27d attached to the strip-shaped plate 27b, an extended piece 27e extending from an upper side of the mounting portion 27d in an inclined direction in a plan view, and an upper portion of the mounting portion 27d and The pad holding portion 27f attached to each of the extended pieces 27e, the pad member 27g held by each pad holding portion 27f, and the liquid receiving portion 27h which is disposed in a rectangular receiving disk shape in a plan view at the lower end of the mounting portion 27d Composition.

安裝部27d上端部與延設片27e所成的角度θ3設置為與塗敷頭21正面(通過基板的面)與刮刀部(22d、23d)所成的角θ4大致相同，墊構件27g與塗敷頭21正面之空隙部分以及刮刀部(22d、23d)之空隙部分相抵接。 The angle θ 3 between the upper end portion of the attachment portion 27d and the extension piece 27e is set to be substantially the same as the angle θ 4 formed by the front surface of the application head 21 (the surface passing through the substrate) and the blade portions (22d, 23d), and the pad member 27g The gap portion of the front surface of the coating head 21 and the gap portion of the blade portions (22d, 23d) abut against each other.

墊保持部27f的開口部形成為近似字形。墊構件27g係由海綿等具有吸收液體性能之多孔質體所構成，以可裝卸之方式嵌入於墊保持部27f。墊構件27g為近似長方體形狀，所以藉由改變嵌入墊保持部27f的面，即能夠將墊構件27g側面的4個面作為與塗敷頭21相抵接的面。 The opening of the pad holding portion 27f is formed to be approximate Glyph. The pad member 27g is made of a porous body having a liquid absorbing property such as a sponge, and is detachably fitted in the pad holding portion 27f. Since the pad member 27g has a substantially rectangular parallelepiped shape, the four faces of the side surface of the pad member 27g can be used as a surface that abuts against the coating head 21 by changing the surface of the pad holding portion 27f.

液體供給單元50包括收收容膜形成液51之液體收容部52、從液體收容部52通過管54對塗敷頭21供給膜形成液51之電動式泵53、以及將液體接受部24所接受的膜形成液51通過管55進行移送(回收)到液體收容部52之電動式泵56而構成。藉由液體供給單元50，液體收容部52之膜形成液51係經由泵53以及管54，被供給至塗敷頭21之上側頭22，液體接受部24所接受之膜形成液51係經由管55以及泵56被回收到液體收容部52。 The liquid supply unit 50 includes a liquid accommodating portion 52 that accommodates the film forming liquid 51, an electric pump 53 that supplies the film forming liquid 51 from the liquid accommodating portion 52 to the coating head 21 through the tube 54, and a liquid receiving portion 24 that is received by the liquid receiving portion 24. The film forming liquid 51 is configured to be transferred (recovered) to the electric pump 56 of the liquid storage unit 52 through the tube 55. By the liquid supply unit 50, the film forming liquid 51 of the liquid accommodating portion 52 is supplied to the upper side head 22 of the coating head 21 via the pump 53 and the tube 54, and the film forming liquid 51 received by the liquid receiving portion 24 is passed through the tube. The pump 55 and the pump 56 are recovered to the liquid accommodating portion 52.

作為膜形成液51係可使用在基板處理步驟(蝕刻步驟或者鍍敷步驟等)中具有不剝離的特性(對於酸以及/或者鹼的耐性)，對於基板表面之附著性等優異的混 合有複數種樹脂成分者，例如相對於水性溶媒的溶劑，含有水性聚氨酯樹脂、水性苯乙烯樹脂以及水性增黏劑之塗層劑等根據目的用途所調製的液劑。另外，根據塗敷膜厚，調整合適的塗敷膜形成液51之黏度，例如在膜厚薄時，較佳為降低黏度。 As the film forming liquid 51, it is possible to use a non-peeling property (resistance to an acid and/or a base) in a substrate processing step (such as an etching step or a plating step), and it is excellent in adhesion to a substrate surface or the like. In the case of a plurality of resin components, for example, a solvent containing an aqueous polyurethane resin, an aqueous styrene resin, and a coating agent for an aqueous tackifier, which is prepared according to the intended use, may be used. Further, the viscosity of the coating film forming liquid 51 is adjusted in accordance with the thickness of the coating film. For example, when the film thickness is small, the viscosity is preferably lowered.

另外，如第1圖所示，在塗敷單元20後方設有乾燥爐60。由塗敷單元20所塗敷的基板2被放置到運送導軌12上，運送至乾燥爐60內，經過指定的乾燥時間後，從乾燥爐60中運出。 Further, as shown in Fig. 1, a drying furnace 60 is provided behind the coating unit 20. The substrate 2 coated by the coating unit 20 is placed on the transport rail 12, transported into the drying oven 60, and transported out of the drying oven 60 after a predetermined drying time.

在乾燥爐60之內壁面配設有隔熱材料61，在乾燥爐60內以井字形配設棒狀之鰭片加熱器62，在乾燥爐60內的內側面上，環周邊設有供給配管63，在該供給配管63上以一定間隔形成有用來將空氣送入乾燥爐60內的供給孔(未圖示)。供給配管63係與乾燥爐60外部的空氣泵64相連。 A heat insulating material 61 is disposed on the inner wall surface of the drying furnace 60, and a rod-shaped fin heater 62 is disposed in a well shape in the drying furnace 60, and a supply pipe is provided around the inner side of the drying furnace 60. 63. A supply hole (not shown) for feeding air into the drying furnace 60 is formed at a predetermined interval in the supply pipe 63. The supply pipe 63 is connected to an air pump 64 outside the drying furnace 60.

控制部70具有進行運送導軌12之滑動移動控制、移動單元40之XY軸直線移動控制、塗敷單元20之旋轉．滑動移動控制、通過升降機構13之支撐台10之升降控制、吸附控制、液體供給單元50的泵53、56之驅動控制以及乾燥爐60之溫度控制等對塗敷裝置1的各個構件進行控制的功能，包括微型多用計算機、驅動線路、記憶部以及電源部等(都未圖示)而構成。另外，控制部70係可由1個或者複數個控制單元所構成。 The control unit 70 has a sliding movement control for the transport rail 12, an XY axis linear movement control of the moving unit 40, and a rotation of the coating unit 20. The sliding movement control, the lifting control of the support table 10 by the lifting mechanism 13, the adsorption control, the driving control of the pumps 53, 56 of the liquid supply unit 50, and the temperature control of the drying furnace 60, etc., control the respective components of the coating device 1. The functions include a micro versatile computer, a drive line, a memory unit, and a power supply unit (all not shown). Further, the control unit 70 may be constituted by one or a plurality of control units.

另外，控制部70具有在一對塗敷頭21(上 側頭22與下側頭23)之空隙內***被支撐台10支撐的基板2端部，在該狀態下，使一對塗敷頭21沿著基板2之周緣部移動而驅動控制移動單元40和塗敷單元20的各個構件的作用。 In addition, the control unit 70 has a pair of coating heads 21 (on The end of the substrate 2 supported by the support table 10 is inserted into the gap between the side head 22 and the lower head 23). In this state, the pair of coating heads 21 are moved along the peripheral edge portion of the substrate 2 to drive and control the moving unit 40. And the function of the respective members of the coating unit 20.

操作部80具備液晶操作面板81，安裝於框體(未圖示)上。通過液晶操作面板81，能夠進行塗敷裝置1各個構件之運行條件的設定、各個構件的運行指示、運行模式(手動、自動等)切換等各種操作。通過操作面板81所輸入的操作信號或者設定信號被傳送到控制部70等。 The operation unit 80 includes a liquid crystal operation panel 81 and is attached to a casing (not shown). The liquid crystal operation panel 81 can perform various operations such as setting of operating conditions of each member of the coating apparatus 1, operation instruction of each member, and switching of an operation mode (manual, automatic, etc.). The operation signal or the setting signal input through the operation panel 81 is transmitted to the control unit 70 or the like.

例如，在操作部80，能夠進行藉由移動單元40之XY軸直線移動機構使塗敷單元20水平移動的速度、藉由液體供給單元50的泵53的輸送膜形成液51的速度等運行條件的設定、藉由乾燥爐60的鰭狀加熱器62的爐內溫度設定或者乾燥時間設定等。 For example, in the operation unit 80, the speed at which the coating unit 20 is horizontally moved by the XY-axis linear movement mechanism of the moving unit 40, and the operating conditions such as the speed of the transport film forming liquid 51 of the pump 53 of the liquid supply unit 50 can be performed. The setting is set by the furnace temperature setting or the drying time setting of the fin heater 62 of the drying furnace 60.

以下說明使用實施形態(1)之塗敷裝置1，為基板2之周緣部塗敷膜形成液51之塗敷方法。另外，雖然對作為被塗敷對象係使用矩形之薄形(數十μm至數百μm)的覆銅層壓基板之情況進行說明，但是被塗敷對象並不限定為此，還可以將鋁基板等各種基板作為被塗敷對象。另外，使用實施形態(1)之塗敷裝置1的塗敷方法係可採用作為基板製造步驟之一個步驟。 A coating method in which the film forming liquid 51 is applied to the peripheral edge portion of the substrate 2 by using the coating device 1 of the embodiment (1) will be described below. In addition, although a case where a rectangular thin plate (tens of μm to several hundreds of μm) of a copper-clad laminate substrate is used as a target to be coated is described, the object to be coated is not limited thereto, and aluminum may be used. Various substrates such as a substrate are used as objects to be coated. Further, the coating method using the coating device 1 of the embodiment (1) can be employed as one step of the substrate manufacturing step.

首先，進行一對塗敷頭21(上側頭22與下側頭23)之空隙的調整以及設定。亦即，將與考慮被塗敷對象之線路版2的厚度、塗膜厚度等因素後決定的空隙尺 寸(例如基板厚+10μm)相對應的空隙量規(未圖示)夾在上側頭22之移動構件22B與下側頭23之間，用螺栓22p將移動構件22B固定在固定構件22A上。然後拔出前述空隙量規，結束塗敷頭21的空隙的調整及設定，用連接螺栓26將塗敷頭21安裝到支撐部25上。 First, the adjustment and setting of the gap between the pair of coating heads 21 (the upper head 22 and the lower head 23) are performed. That is, the gap rule determined after considering factors such as the thickness of the circuit board 2 to be coated, the thickness of the coating film, and the like A gap gauge (not shown) corresponding to the inch (e.g., substrate thickness + 10 μm) is interposed between the moving member 22B of the upper head 22 and the lower head 23, and the moving member 22B is fixed to the fixing member 22A by the bolt 22p. Then, the gap gauge is pulled out, the adjustment and setting of the gap of the coating head 21 are completed, and the coating head 21 is attached to the support portion 25 by the connecting bolts 26.

然後，在被移動到搬入一側的運送導軌12的指定位置上載置基板2，操縱操作部80，使運送導軌12在塗敷單元20一側滑動移動。 Then, the substrate 2 is placed on a predetermined position of the transport rail 12 that has been moved to the loading side, and the operation unit 80 is manipulated to slide the transport rail 12 on the side of the coating unit 20.

運送導軌12移動，則基板2被運送到支撐台10上方的位置時，運送導軌12的移動停止；接著升降機構13運行，支撐台10上升，基板2被支撐在支撐台10上，進而支撐台10上升到指定位置(塗敷單元20的一對塗敷頭21的空隙的高度的位置)。另外，吸附機構(未圖示)也運行，基板2以被吸附之狀態支撐在支撐台10。 When the transport rail 12 moves, when the substrate 2 is transported to a position above the support table 10, the movement of the transport rail 12 is stopped; then the elevating mechanism 13 is operated, the support table 10 is raised, and the substrate 2 is supported on the support table 10, thereby supporting the table 10 is raised to the designated position (the position of the height of the gap of the pair of coating heads 21 of the coating unit 20). Further, an adsorption mechanism (not shown) also operates, and the substrate 2 is supported on the support table 10 in a state of being adsorbed.

在接下來之塗敷步驟中，保持基板2之端部***在一對塗敷頭21的空隙之狀態，在為一對塗敷頭21的液體積存部(上側液體積存部22b與下側液體積存部23b)供給膜形成液51的同時，使一對塗敷頭21沿著基板2之4個邊的周緣部移動。 In the next coating step, the end portion of the holding substrate 2 is inserted into the gap of the pair of coating heads 21, and is in the liquid volume portion of the pair of coating heads 21 (the upper liquid volume portion 22b and the lower liquid) The reservoir portion 23b) supplies the film forming liquid 51, and moves the pair of coating heads 21 along the peripheral edge portions of the four sides of the substrate 2.

第10圖係用來說明使用一對塗敷頭21對基板2之周緣部進行塗敷之塗敷步驟的圖。圖中虛線顯示一對塗敷頭21的移動軌跡。 Fig. 10 is a view for explaining a coating step of applying a peripheral portion of the substrate 2 by using a pair of coating heads 21. The broken line in the figure shows the movement trajectory of the pair of coating heads 21.

塗敷頭21在指定之退避位置A的位置，被調整為塗敷頭21之前進方向與基板2端面(右邊2a)的朝向一致。 At the position of the designated retracted position A, the application head 21 is adjusted so that the advancement direction of the application head 21 coincides with the orientation of the end surface (right side 2a) of the substrate 2.

首先，使移動單元40之Y軸氣缸42沿著X軸氣缸41向a方向移動，由此一對塗敷頭21向a方向移動，在第10圖所示之基板2的右邊2a之周緣部塗敷膜形成液51。 First, the Y-axis cylinder 42 of the moving unit 40 is moved in the a direction along the X-axis cylinder 41, whereby the pair of coating heads 21 are moved in the a direction, and the peripheral portion of the right side 2a of the substrate 2 shown in Fig. 10 is shown. The film forming liquid 51 is applied.

亦即，驅動泵53，在對上側頭22之液體供給路22i供給膜形成液51的同時，將基板2a端部***一對塗敷頭21之空隙，在上側液體積存部22b與下側液體積存部23b內裝滿膜形成液51之狀態下，移動一對塗敷頭21。另外，在塗敷時，為了使基板2端部不會從一對塗敷頭21之空隙中超出來，對一對塗敷頭21的位置進行控制。 In other words, the drive pump 53 supplies the film forming liquid 51 to the liquid supply path 22i of the upper head 22, and inserts the end portion of the substrate 2a into the gap between the pair of coating heads 21, and the upper liquid storage portion 22b and the lower liquid. In a state where the film forming liquid 51 is filled in the reservoir portion 23b, the pair of coating heads 21 are moved. Further, at the time of coating, the position of the pair of coating heads 21 is controlled so that the end portions of the substrate 2 do not protrude from the gaps of the pair of coating heads 21.

一對塗敷頭21到達B位置(基板2的角部前方)時，設在塗敷單元20的旋轉臂34上的滑動機構35運行，使一對塗敷頭21朝離開基板2的方向(d方向)滑動移動數mm程度，一對塗敷頭21從基板2離開，結束基板右邊2a的塗敷。另外，在B位置使一對塗敷頭21從基板2離開係為了防止對基板角部重複塗敷2次膜形成液51，也可以在B位置，不使一對塗敷頭21從基板2離開，而塗敷基板右邊2a整體。 When the pair of coating heads 21 reaches the B position (before the corner of the substrate 2), the sliding mechanism 35 provided on the rotating arm 34 of the coating unit 20 operates to bring the pair of coating heads 21 away from the substrate 2 ( The d direction) is moved by a few mm, and the pair of coating heads 21 are separated from the substrate 2, and the application of the right side 2a of the substrate is completed. Further, the pair of coating heads 21 are separated from the substrate 2 at the B position. In order to prevent the film forming liquid 51 from being applied twice to the corners of the substrate, the pair of coating heads 21 may not be separated from the substrate 2 at the B position. Leave and apply the entire right side of the substrate 2a.

然後驅動移動單元40之Y軸氣缸42以及Y軸滑塊43，將一對塗敷頭21移動至C位置後，將被滑動機構35滑動移動的一對塗敷頭21返回到原來的位置，驅動旋轉機構部30之旋轉馬達32，將旋轉臂34向左旋轉90度，使基板2的端面(上邊2b)的朝向與一對塗敷頭21的前進方向一致。 Then, the Y-axis cylinder 42 and the Y-axis slider 43 of the moving unit 40 are driven to move the pair of coating heads 21 to the C position, and then the pair of coating heads 21 that are slidably moved by the sliding mechanism 35 are returned to the original position. The rotary motor 32 of the rotation mechanism unit 30 is driven to rotate the rotary arm 34 to the left by 90 degrees so that the direction of the end surface (upper side 2b) of the substrate 2 coincides with the advancing direction of the pair of coating heads 21.

然後驅動移動單元40之Y軸氣缸42以及Y軸滑塊43，將一對塗敷頭調到D位置，使Y軸滑塊43沿著Y軸氣缸42在b方向移動，從而使一對塗敷頭21朝b方向移動，以與基板右邊2a同樣的動作在基板上邊2b之周緣部塗敷膜形成液51。 Then, the Y-axis cylinder 42 and the Y-axis slider 43 of the moving unit 40 are driven to adjust the pair of coating heads to the D position, and the Y-axis slider 43 is moved along the Y-axis cylinder 42 in the b direction, thereby making a pair of coatings. The application head 21 is moved in the b direction, and the film forming liquid 51 is applied to the peripheral edge portion of the upper side 2b of the substrate in the same operation as the right side 2a of the substrate.

一對塗敷頭21到達E位置(基板2的角部前方)，與在上述B位置時的動作同樣地，使設在塗敷單元20之旋轉臂34上的滑動機構35運行，將一對塗敷頭21朝離開基板2的方向滑動移動數mm，一對塗敷頭21從基板2離開，結束基板上邊2b的塗敷。 The pair of coating heads 21 reach the E position (before the corner of the substrate 2), and the sliding mechanism 35 provided on the rotating arm 34 of the coating unit 20 is operated in the same manner as in the above-described B position, and a pair is applied. The coating head 21 is slid by a few mm in a direction away from the substrate 2, and the pair of coating heads 21 are separated from the substrate 2, and the application of the upper side 2b of the substrate is completed.

然後，驅動移動單元40使一對塗敷頭21移動至F位置後，用滑動機構35使被滑動移動的一對塗敷頭21回到原來之位置，驅動旋轉機構部30之旋轉馬達32，使旋轉臂34向左旋轉90度，使基板2端面(左邊2c)的朝向與一對塗敷頭21的前進方向一致。 Then, after the driving unit 40 is driven to move the pair of coating heads 21 to the F position, the pair of coating heads 21 that are slidably moved back to the original position by the slide mechanism 35, and the rotation motor 32 of the rotation mechanism unit 30 is driven. The rotating arm 34 is rotated 90 degrees to the left so that the direction of the end surface (left side 2c) of the substrate 2 coincides with the advancing direction of the pair of coating heads 21.

然後，藉由驅動移動單元40，將一對塗敷頭21調到G位置，並使Y軸氣缸42沿著X軸氣缸41在c方向移動，而使一對塗敷頭21在c方向移動，與基板上邊2b同樣的動作，在基板左邊2c之周緣部塗敷膜形成液51。 Then, by driving the moving unit 40, the pair of coating heads 21 are adjusted to the G position, and the Y-axis cylinders 42 are moved in the c direction along the X-axis cylinders 41, and the pair of coating heads 21 are moved in the c direction. The film forming liquid 51 is applied to the peripheral portion of the left side 2c of the substrate in the same operation as the upper side 2b of the substrate.

一對塗敷頭21到達H位置(基板2的角部前方)，與上述B位置時之動作同樣地，使設在塗敷單元20之旋轉臂34上的滑動機構35運行，使一對塗敷頭21朝離開基板2的方向滑動移動數mm程度，一對塗敷頭21從基 板2離開，結束基板左邊2c的塗敷。 The pair of coating heads 21 reach the H position (before the corner of the substrate 2), and the sliding mechanism 35 provided on the rotating arm 34 of the coating unit 20 is operated in the same manner as in the above-described operation at the B position, so that a pair of coatings is applied. The application head 21 is slidably moved by a few mm in a direction away from the substrate 2, and a pair of coating heads 21 are driven from the base. The plate 2 is separated to terminate the application of the left side 2c of the substrate.

然後驅動移動單元40，將一對塗敷頭21移動至I位置後，利用滑動機構35使被滑動移動了的一對塗敷頭21回到原來的位置，驅動旋轉機構部30的旋轉馬達32，將旋轉臂34向左旋轉90度，使基板2端面(下邊2d)的朝向與塗敷頭21的前進方向一致。 Then, the moving unit 40 is driven to move the pair of coating heads 21 to the I position, and the pair of coating heads 21 that have been slidably moved back to the original position by the slide mechanism 35, and the rotary motor 32 of the rotating mechanism portion 30 is driven. The rotating arm 34 is rotated 90 degrees to the left so that the orientation of the end surface (lower side 2d) of the substrate 2 coincides with the advancing direction of the coating head 21.

然後，藉由驅動移動單元40，將一對塗敷頭21調到J位置，並使Y軸滑塊43沿著Y軸氣缸42在d方向移動，而使一對塗敷頭21在d方向移動，與基板左邊2c同樣的動作，在基板下邊2d的周緣部塗敷膜形成液51。 Then, by driving the moving unit 40, the pair of coating heads 21 are adjusted to the J position, and the Y-axis slider 43 is moved in the d direction along the Y-axis cylinder 42, and the pair of coating heads 21 are oriented in the d direction. The movement is performed in the same manner as the left side 2c of the substrate, and the film forming liquid 51 is applied to the peripheral portion of the lower side 2d of the substrate.

一對塗敷頭21到達K位置(基板2的角部前方)，則與在上述B位置時同樣的動作，使設在塗敷單元20的旋轉臂34上的滑動機構35運行，將一對塗敷頭21向離開基板2的方向滑動移動數mm程度，一對塗敷頭21從基板2離開，結束基板下邊2d的塗敷，然後驅動移動單元40，將一對塗敷頭21移動至L位置後，將被滑動機構35所滑動移動的塗敷頭21返回到原來的位置，結束基板2的4個邊的塗敷作業。 When the pair of coating heads 21 reaches the K position (the front side of the corner portion of the substrate 2), the sliding mechanism 35 provided on the rotating arm 34 of the coating unit 20 is operated in the same manner as in the above-described B position, and a pair is operated. The coating head 21 is slidably moved by a few mm in a direction away from the substrate 2, the pair of coating heads 21 are separated from the substrate 2, the application of the lower side 2d of the substrate is finished, and then the moving unit 40 is driven to move the pair of coating heads 21 to After the L position, the application head 21 that has been slid by the slide mechanism 35 is returned to the original position, and the application work of the four sides of the substrate 2 is completed.

接著驅動塗敷單元20之旋轉馬達32，旋轉塗敷頭21，使基板2之端面(右邊2a)的朝向與塗敷頭21的前進方向一致，驅動移動單元40之Y軸氣缸42以及Y軸滑塊43，將一對塗敷頭21調到A位置。 Next, the rotary motor 32 of the coating unit 20 is driven to rotate the coating head 21 so that the direction of the end surface (right side 2a) of the substrate 2 coincides with the advancing direction of the coating head 21, and the Y-axis cylinder 42 and the Y-axis of the moving unit 40 are driven. The slider 43 adjusts the pair of coating heads 21 to the A position.

在A位置設置有塗敷頭用保護具27。塗敷頭用保護具27之墊構件27g與塗敷頭21之正面(基板2所 通過的面)以及刮刀部22d、23d的空隙抵接，能夠防止液體從前述空隙漏出以及乾燥。 A protective head protector 27 is provided at the A position. The pad member 27g of the protective head 27 for the coating head and the front surface of the coating head 21 (substrate 2 The passing surface) and the gaps of the blade portions 22d and 23d are in contact with each other, thereby preventing liquid from leaking and drying from the gap.

上述塗敷步驟結束後，接著進行乾燥步驟。首先塗敷結束後，升降機構13運行，支撐台10向下降下，基板2被載置到運送導軌12。然後運送導軌12向乾燥爐60方向滑動移動，基板2被運送到設定為指定溫度的乾燥爐60內。指定的乾燥時間經過後，運送導軌12移動，基板2從乾燥爐60搬出，結束乾燥步驟。 After the above coating step is completed, a drying step is then carried out. After the application is completed, the elevating mechanism 13 is operated, the support table 10 is lowered, and the substrate 2 is placed on the transport rail 12. Then, the conveyance rail 12 is slidably moved in the direction of the drying furnace 60, and the substrate 2 is conveyed to the drying furnace 60 set to a predetermined temperature. After the specified drying time elapses, the transport rail 12 moves, the substrate 2 is carried out from the drying furnace 60, and the drying step is completed.

第11圖係顯示使用實施形態1之塗敷裝置所塗敷的基板2之周緣部附近的圖，(a)係局部立體圖，(b)係(a)中沿b-b線之剖面圖。 Fig. 11 is a view showing the vicinity of the peripheral edge portion of the substrate 2 coated by the coating apparatus of the first embodiment, wherein (a) is a partial perspective view, and (b) is a cross-sectional view taken along line b-b in (a).

在基板2之周緣部，由樹脂成分構成之塗膜51a形成為邊框狀(端面及上下表面)。藉由一對塗敷頭21之空隙的設定、上側抹子構件22c以及下側抹子構件23c之抹子面的溝形狀、上側刮刀部22d以及下側刮刀部23d的刀部的高度位置、一對塗敷頭21的移動速度、膜形成液51的黏度等的調整，即能夠將塗膜51a的乾燥後之膜厚控制在10μm至60μm程度。另外，上下表面的塗敷寬度能夠通過一對塗敷頭21與基板2的端部之重疊寬度進行調整，即可調整在1mm至10mm程度內。 A coating film 51a made of a resin component is formed in a frame shape (end surface and upper and lower surfaces) at the peripheral portion of the substrate 2. The setting of the gap between the pair of coating heads 21, the groove shape of the upper surface of the upper trowel member 22c and the lower trowel member 23c, the height position of the blade portion of the upper blade portion 22d and the lower blade portion 23d, The adjustment of the moving speed of the pair of coating heads 21, the viscosity of the film forming liquid 51, and the like, that is, the film thickness after drying of the coating film 51a can be controlled to about 10 μm to 60 μm. Further, the application width of the upper and lower surfaces can be adjusted by the overlapping width of the pair of coating heads 21 and the end portions of the substrate 2, and can be adjusted to be within the range of 1 mm to 10 mm.

根據上述實施形態(1)之塗敷裝置(1)，能夠在一對塗敷頭21之空隙內***由支撐台10支撐的基板2端部之狀態下，一邊為一對塗敷頭21的液體積存部22b、23b供給膜形成液51，一邊使一對塗敷頭21沿著基板2之 周緣部移動。亦即，基板2端部通過液體積存部22b、23b所積存之膜形成液51後，能夠利用塗工部的抹子構件22c、23c以及刮刀部22b、23b，將基板2端部所附著的膜形成液51塗敷加工成薄膜狀，同時使一對塗敷頭21沿著基板2之周緣部移動。 According to the coating device (1) of the above embodiment (1), the end portions of the substrate 2 supported by the support table 10 can be inserted into the gaps of the pair of coating heads 21, and the pair of coating heads 21 can be used. The liquid storage portions 22b and 23b supply the film forming liquid 51 while the pair of coating heads 21 are placed along the substrate 2 The peripheral part moves. In other words, after the end of the substrate 2 passes through the film forming liquid 51 accumulated in the liquid storage portions 22b and 23b, the end portions of the substrate 2 can be attached by the trowel members 22c and 23c of the coating portion and the blade portions 22b and 23b. The film forming liquid 51 is applied and processed into a film shape, and the pair of coating heads 21 are moved along the peripheral edge portion of the substrate 2.

另外，由於係基板2端部通過積存於液體積存部22b、23b之膜形成液51的構成，所以不受由於泵53的動脈等引起之供給量變動的影響，能夠使膜形成液51充分地附著在基板2之端部，能夠在基板2之端部無不均勻地附著膜形成液51的狀態下，通過抹子構件22c、23c，平整成薄且均勻的膜厚後，在刮刀部22d、23d，將附著的多餘的膜形成液刮掉。 In addition, since the end portion of the base material 2 passes through the film forming liquid 51 which is stored in the liquid storage portions 22b and 23b, the film forming liquid 51 can be sufficiently prevented from being affected by fluctuations in the supply amount due to the artery or the like of the pump 53. The blade portion 22d is attached to the end portion of the substrate 2 so that the film forming liquid 51 can be unevenly attached to the end portion of the substrate 2, and the thickness of the film can be made thin by the trowel members 22c and 23c. , 23d, scrape off the excess film forming liquid that has adhered.

因此能夠在基板2的周緣部的上下表面以及基板2的端面(側面)薄且均勻地塗敷膜形成液51。另外，能夠持續進行膜厚變動等的塗膜品質的偏差少的塗敷，能夠在基板2的周緣部精度良好地形成邊框狀的均質的塗膜。因此能夠防止基板2端面部分的損壞所引起的塵埃的發生，同時能夠通過塗膜強化基板2的周緣部，能夠提高後面步驟之基板2的使用性，降低基板2的不良發生率。 Therefore, the film forming liquid 51 can be thinly and uniformly applied to the upper and lower surfaces of the peripheral portion of the substrate 2 and the end surface (side surface) of the substrate 2. In addition, it is possible to continuously apply a coating having a small variation in coating film quality such as a film thickness variation, and it is possible to form a uniform coating film having a frame shape with high precision on the peripheral edge portion of the substrate 2 . Therefore, it is possible to prevent the occurrence of dust due to damage of the end surface portion of the substrate 2, and it is possible to strengthen the peripheral portion of the substrate 2 by the coating film, thereby improving the usability of the substrate 2 in the subsequent step and reducing the occurrence rate of the substrate 2.

另外，藉由使用對酸或者鹼具有耐性的膜形成液51，即能夠實現基板處理步驟(蝕刻步驟和鍍敷步驟等)的作業性的提升和成本的降低。例如藉由使用具有鍍敷耐性的膜形成液51，能夠防止在基板2之周緣部的鍍敷 的附著，即能夠進行基板周緣部的遮蔽，且能夠實現遮蔽作業效率的提高。 In addition, by using the film forming liquid 51 which is resistant to an acid or a base, workability improvement and cost reduction of a substrate processing step (such as an etching step and a plating step) can be achieved. For example, by using the film forming liquid 51 having plating resistance, plating on the peripheral portion of the substrate 2 can be prevented. The adhesion of the substrate can be shielded, and the shielding work efficiency can be improved.

另外，根據塗敷裝置(1)，因為藉由旋轉機構部30能夠使一對塗敷頭21旋轉，所以在為矩形之基板2的周緣部塗敷膜形成液51時，能夠使一對塗敷頭21相對於基板2端面的朝向設定為在基板2之各邊時都一樣，由此能夠在基板2的各邊都在同樣狀態下進行穩定的塗敷。 Further, according to the coating device (1), since the pair of coating heads 21 can be rotated by the rotation mechanism unit 30, when the film forming liquid 51 is applied to the peripheral edge portion of the rectangular substrate 2, a pair of coating can be applied. The orientation of the application head 21 with respect to the end surface of the substrate 2 is set to be the same on each side of the substrate 2, whereby stable application can be performed in the same state on each side of the substrate 2.

另外，藉由滑動機構35能夠使一對塗敷頭21相對於旋轉機構部30在水平方向滑動移動。因此，能夠藉由相對於基板2的端面的一對塗敷頭21的位置控制，來高精度地進行一對塗敷頭21的位置的微調整，例如***一對塗敷頭21的空隙之基板2端部的寬度的微調整等。 Further, the pair of coating heads 21 can be slidably moved in the horizontal direction with respect to the rotation mechanism portion 30 by the slide mechanism 35. Therefore, it is possible to accurately perform the fine adjustment of the positions of the pair of application heads 21 by the positional control of the pair of application heads 21 with respect to the end faces of the substrate 2, for example, the gaps of the pair of application heads 21 are inserted. Fine adjustment of the width of the end portion of the substrate 2, and the like.

另外，由於在塗敷頭21的下方設有液體接受部24，所以從塗敷頭21漏出的膜形成液51在液體接受部24被接住，在接受盤24a所積存的膜形成液51通過管55被液體收容部52回收，所以能夠循環反覆使用膜形成液51，能夠毫無浪費地使用膜形成液51。 Further, since the liquid receiving portion 24 is provided below the coating head 21, the film forming liquid 51 leaking from the coating head 21 is caught by the liquid receiving portion 24, and the film forming liquid 51 accumulated in the receiving tray 24a passes. Since the tube 55 is recovered by the liquid accommodating portion 52, the film forming liquid 51 can be used in a cycle, and the film forming liquid 51 can be used without waste.

另外，由於在一對塗敷頭21的退避位置設置塗敷頭用保護具27，所以在退避位置，能夠使一對塗敷頭21的空隙部分與塗敷頭用保護具27的墊構件27g抵接。所以能夠防止在一對塗敷頭21的空隙部分產生膜形成液51的乾燥或者液體堵塞，能夠持續進行為基板2的塗敷。 In addition, since the coating head protector 27 is provided at the retracted position of the pair of coating heads 21, the gap portion of the pair of coating heads 21 and the pad member 27g of the coating head protector 27 can be provided at the retracted position. Abut. Therefore, it is possible to prevent drying of the film forming liquid 51 or liquid clogging in the gap portion of the pair of coating heads 21, and the application of the substrate 2 can be continued.

另外，由於塗敷裝置1具備乾燥爐60，所 以通過乾燥爐60，能夠在塗敷膜形成液51後，立即乾燥膜形成液，能夠提高其後的作業性，還能提高防止膜形成液51的剝離等塗敷不良的效果。另外，能夠適用於塗敷裝置1的被塗敷對象之基板的種類沒有特別限定，由厚度為數百μm至數十μm程度的薄狀板或者膜狀的各種材質構成的基板都可以非常合適的適用。 In addition, since the coating device 1 is provided with a drying furnace 60, By the drying furnace 60, the film forming liquid can be dried immediately after the film forming liquid 51 is applied, and the workability after the film forming liquid can be improved, and the effect of preventing coating failure such as peeling of the film forming liquid 51 can be improved. In addition, the type of the substrate to be coated which can be applied to the coating device 1 is not particularly limited, and a substrate made of a thin plate or a film of various materials having a thickness of several hundreds to several tens of μm can be suitably used. Applicable.

另外，在實施形態(1)之塗敷裝置1中，就移動單元40由包括X軸氣缸41、Y軸氣缸42、Y軸滑塊43以及支持引導部44的2軸(XY軸)直線移動機構構成的形態進行了說明，但移動單元40的形態不限定與此形態，在另外的實施形態之塗敷裝置中還可採用例如具備XY軸機器人式直線移動機構或者多關節式機器人機構等各種移動單元(移動手段)。 Further, in the coating device 1 of the embodiment (1), the moving unit 40 is linearly moved by the two axes (XY axes) including the X-axis cylinder 41, the Y-axis cylinder 42, the Y-axis slider 43, and the support guide 44. The form of the mechanism configuration has been described. However, the form of the moving unit 40 is not limited to this embodiment. In the coating device of another embodiment, for example, an XY-axis robot type linear motion mechanism or a multi-joint robot mechanism may be used. Mobile unit (moving means).

另外，根據上述實施形態(1)之塗敷方法，在基板製造步驟中，能夠在基板2之周緣部的上下表面以及前述基板的端面(側面)薄且均勻地塗敷膜形成液51，能夠精度良好地在基板2之周緣部形成邊框狀的塗膜。因此，在基板製造步驟中能夠防止由於基板2的端面部分的損壞而引起的塵埃的發生，同時還能夠藉由塗膜增強基板2的周緣部，能夠提高後步驟之基板2的操作性，能夠降低基板的不良發生率。 Further, according to the coating method of the above-described embodiment (1), in the substrate manufacturing step, the film forming liquid 51 can be thinly and uniformly applied to the upper and lower surfaces of the peripheral portion of the substrate 2 and the end surface (side surface) of the substrate. A frame-shaped coating film is formed on the peripheral portion of the substrate 2 with high precision. Therefore, in the substrate manufacturing step, generation of dust due to damage of the end surface portion of the substrate 2 can be prevented, and the peripheral portion of the substrate 2 can be reinforced by the coating film, whereby the operability of the substrate 2 in the subsequent step can be improved. Reduce the incidence of defects in the substrate.

另外，在上述實施形態(1)之塗敷頭21中，係上側頭22之移動構件22B相對於固定構件22A以上下方向可移動之方式構成，但上側頭22之構成不限定於此狀 態，亦可為移動構件22B固著於固定構件22A之構成。另外，還可以採用第12圖所示之構造。 Further, in the coating head 21 of the above-described embodiment (1), the moving member 22B of the upper head 22 is configured to be movable in the vertical direction with respect to the fixing member 22A, but the configuration of the upper head 22 is not limited thereto. The state may be such that the moving member 22B is fixed to the fixing member 22A. In addition, the configuration shown in Fig. 12 can also be employed.

第12圖係顯示構成另外的實施形態之塗敷頭的上側頭22C之構造的圖，(a)係底面圖，(b)係俯視圖。另外，對與上述實施形態(1)之塗敷頭21的上側頭22具有相同功能之構成構件標示相同符號，此處省略對其說明。 Fig. 12 is a view showing the structure of the upper head 22C constituting the coating head of the other embodiment, (a) is a bottom view, and (b) is a plan view. In addition, constituent members having the same functions as those of the upper head 22 of the coating head 21 of the above-described embodiment (1) are denoted by the same reference numerals and will not be described.

另外的實施形態之塗敷頭的上側頭22C包括固定構件22D與2個移動構件22E、22F而構成，係相對於固定構件22D，使2個移動構件22E、22F能夠分別在上下方向上移動而固定的構成。 The upper head 22C of the coating head of the other embodiment includes the fixing member 22D and the two moving members 22E and 22F, and the two moving members 22E and 22F are movable in the vertical direction with respect to the fixing member 22D. Fixed composition.

固定構件22D的底面形成有傾斜引導部22a和上側液體積存部22b，在與固定構件22D的上側液體積存部22b並列設置之一個移動構件22E底面形成有上側抹子構件22q，在與移動構件22E並列設置的另一個移動構件22F的底面形成有上側刮刀部22r。 The bottom surface of the fixing member 22D is formed with an inclined guide portion 22a and an upper liquid storage portion 22b, and an upper smear member 22q is formed on the bottom surface of one of the moving members 22E provided in parallel with the upper liquid storage portion 22b of the fixing member 22D, and the moving member 22E is formed. The bottom surface of the other moving member 22F arranged in parallel is formed with an upper side scraper portion 22r.

形成有上側抹子構件22q的移動構件22E被螺栓22s以在上下方向上可移動的方式固定於固定構件22D，形成有上側刮刀部22r的移動構件22F被螺栓22t以在上下方向可移動的方式固定在移動構件22E。在與上側頭22C相對應的下側頭，可採用與上述下側頭23同樣構成者。 The moving member 22E on which the upper trowel member 22q is formed is fixed to the fixing member 22D so as to be movable in the vertical direction by the bolt 22s, and the moving member 22F in which the upper blade portion 22r is formed is movable in the vertical direction by the bolt 22t. It is fixed to the moving member 22E. The lower head corresponding to the upper head 22C can be configured similarly to the lower head 23 described above.

根據上述另外的實施形態之塗敷頭，由於上側頭22C具備固定構件22D以及2個移動構件22E、22F，所以能夠將具有上側抹子構件22q之移動構件22E與具有上 側刮刀部22r之移動構件22F各自以在上下方向可移動的方式固定於固定構件22D上。因此能夠根據塗敷基板2的厚度和塗膜的厚度，各自調整移動構件22E與移動構件22F的高度位置，能夠針對各種厚度的基板進行各種膜厚之塗敷。 According to the coating head of the above-described other embodiment, since the upper head 22C includes the fixing member 22D and the two moving members 22E and 22F, the moving member 22E having the upper trowel member 22q can have the upper member The moving members 22F of the side scraper portions 22r are each fixed to the fixing member 22D so as to be movable in the vertical direction. Therefore, the height position of the moving member 22E and the moving member 22F can be adjusted according to the thickness of the coating substrate 2 and the thickness of the coating film, and coating of various thicknesses can be performed for the substrates of various thicknesses.

另外，在上述實施形態(1)之塗敷頭21中，上側頭22與下側頭23的空隙係根據所塗敷之基板事先固定好的，但在其他實施形態中，還可以採用空隙開閉式機構，該空隙開閉式機構係藉由操作部80在控制部70內輸入所塗敷基板的厚度等條件，在塗敷頭21上設置使上側頭22之移動構件22B升降的機構，與往基板2的***時間相配合，為了在上側頭22與下側頭23之間形成指定的空隙(與輸入值基板的厚度相適應的空隙)而機械地上下移動上側頭22之移動構件22B，形成前述空隙。 Further, in the coating head 21 of the above-described embodiment (1), the gap between the upper head 22 and the lower head 23 is fixed in advance according to the substrate to be coated, but in other embodiments, the gap may be opened and closed. In the gap opening and closing mechanism, the operation unit 80 inputs a condition such as the thickness of the coated substrate in the control unit 70, and the coating head 21 is provided with a mechanism for moving the moving member 22B of the upper head 22 up and down. The insertion time of the substrate 2 is matched, and the moving member 22B of the upper head 22 is mechanically moved up and down to form a predetermined gap (a gap corresponding to the thickness of the input value substrate) between the upper head 22 and the lower head 23, thereby forming The aforementioned gap.

第13圖係為了顯示實施形態(2)之塗敷裝置內部構造而省略了框體所顯示的俯視圖，第14圖係為了顯示塗敷裝置內部機構而省略了框體所顯示的側視圖。另外，對與第1至9圖所顯示之實施形態(1)之塗敷裝置具有相同功能之構成構件標示相同符號，此處處省略對其的說明。 Fig. 13 is a plan view showing the inside of the coating device in the embodiment (2), and the plan view shown in the frame is omitted. Fig. 14 is a side view showing the inside of the coating device in order to show the internal mechanism of the coating device. In addition, constituent members having the same functions as those of the coating device of the embodiment (1) shown in the first to ninth aspects are denoted by the same reference numerals, and the description thereof will be omitted.

在實施形態(1)之塗敷裝置1中，對配設有一個塗敷單元20的形態，即對使用一個塗敷單元20塗敷基板2之4邊的形態進行了說明。實施形態(2)之塗敷裝置1A中，配設有複數個塗敷單元，具體地4台塗敷單元20A、 20B、20C、20D配設於支撐台10A之周圍，成為基板2之4個邊被4台塗敷單元20A、20B、20C、20D同時進行塗敷之形態。 In the coating apparatus 1 of the embodiment (1), a configuration in which one coating unit 20 is disposed, that is, a configuration in which four sides of the substrate 2 are coated by one coating unit 20 has been described. In the coating device 1A of the embodiment (2), a plurality of coating units, specifically, four coating units 20A, 20B, 20C, and 20D are disposed around the support table 10A, and the four sides of the substrate 2 are simultaneously coated by the four coating units 20A, 20B, 20C, and 20D.

塗敷裝置1A具備定位部90、塗敷部200以及乾燥部600。 The coating device 1A includes a positioning portion 90, a coating portion 200, and a drying portion 600.

定位部90係為了在將基板2移動載置至塗敷部200的支撐台10A上之前一步，進行基板2之定位而設置者。定位部90具備將基板2運送到指定位置的傳送部91和對運送到指定位置的基板2進行定位(位置調整)的定位引導部92。 The positioning unit 90 is provided to position the substrate 2 one step before the substrate 2 is moved and placed on the support table 10A of the coating unit 200. The positioning unit 90 includes a transport unit 91 that transports the substrate 2 to a predetermined position, and a positioning guide unit 92 that positions (positions) the substrate 2 transported to the designated position.

在定位部90的基板2的定位步驟中，在傳送部91將基板2運送(搬入)至指定位置後，藉由在傳送部91之滾輪91a之間以可以升降之方式配設的基板提起部91b，將基板2處於暫且從滾輪91a提起之狀態。然後，將在傳送部91的兩側所設置的定位引導部92朝夾住基板2的方向移動，定位引導部92將基板2夾住，將基板2配置到指定位置後結束。定位引導部92的內側面配設有不會劃傷基板2的用來把持基板2之構件。 In the positioning step of the substrate 2 of the positioning unit 90, after the transport unit 91 transports (loads) the substrate 2 to the designated position, the substrate lifting portion that can be lifted and lowered between the rollers 91a of the transport portion 91 is provided. 91b, the substrate 2 is temporarily lifted from the roller 91a. Then, the positioning guide portion 92 provided on both sides of the conveying portion 91 is moved in the direction in which the substrate 2 is sandwiched, the positioning guide portion 92 sandwiches the substrate 2, and the substrate 2 is placed at a predetermined position, and is finished. The inner side surface of the positioning guide portion 92 is provided with a member for holding the substrate 2 without scratching the substrate 2.

由定位部90定位之基板2係藉由具備複數個吸著保持具305之基板移載部300，從定位部90移載至支撐台10A，基板2係以被吸著保持在吸著保持具305上的狀態，被載置到支撐台10A。 The substrate 2 positioned by the positioning unit 90 is transferred from the positioning unit 90 to the support table 10A by the substrate transfer unit 300 including a plurality of suction holders 305, and the substrate 2 is held by the suction holder. The state on 305 is placed on the support table 10A.

塗敷部200具備支撐基板2之支撐台10A、配設於支撐台10A周圍之4台塗敷單元20A、20B、20C、 20D和分別使支撐塗敷單元20A、20B、20C、20D沿著支撐台10A的邊移動之4台移動單元40A、40B、40C、40D。在各塗敷單元20A、20B、20C、20D上裝設有具有上側頭22G以及下側頭23A之一對塗敷頭21A。 The coating unit 200 includes a support table 10A that supports the substrate 2, and four coating units 20A, 20B, and 20C that are disposed around the support table 10A. 20D and four moving units 40A, 40B, 40C, 40D that respectively support the supporting coating units 20A, 20B, 20C, and 20D along the sides of the support table 10A. An application head 21A having one of the upper head 22G and the lower head 23A is attached to each of the coating units 20A, 20B, 20C, and 20D.

另外，在塗敷部200上，裝設有為塗敷單元20A、20B、20C、20D各塗敷頭21A供給含樹脂成分之膜形成液51的液體供給單元50A、50B、50C、50D。 Further, the application unit 200 is provided with liquid supply units 50A, 50B, 50C, and 50D that supply the resin-containing film forming liquid 51 to the coating heads 21A of the coating units 20A, 20B, 20C, and 20D.

乾燥部600具備運送從塗敷部200移送過來的基板2之傳送部12A以及對被塗敷到基板2之膜形成液51進行乾燥的乾燥爐60A。乾燥爐60A具備與第1圖所示之乾燥爐60相同的功能。在傳送部12A，例如採用薄板條傳送，將基板2放在薄板條(板子)上時，使基板2之周緣部不接觸薄板條來設定各薄板條的寬度和間隔。 The drying unit 600 includes a conveying unit 12A that conveys the substrate 2 transferred from the coating unit 200, and a drying furnace 60A that dries the film forming liquid 51 applied to the substrate 2. The drying furnace 60A has the same function as the drying furnace 60 shown in Fig. 1 . In the transport portion 12A, for example, a thin strip is used for transport, and when the substrate 2 is placed on a thin strip (board), the peripheral portion of the substrate 2 is not in contact with the thin strip to set the width and interval of each thin strip.

另外，塗敷裝置1A具備對定位部90、塗敷部200、基板移載部300、乾燥部600等裝置各部的驅動進行控制的控制部70A，以及用來操作各個構件的操作部80A。 Further, the coating device 1A includes a control unit 70A that controls driving of each unit of the positioning unit 90, the application unit 200, the substrate transfer unit 300, and the drying unit 600, and an operation unit 80A for operating each member.

基板移載部300具有將基板2從定位部90移載到塗敷部200以及從塗敷部200移送至乾燥部900的功能。基板移載部300具備第1基板保持部301、第2基板保持部302、使第1基板保持部301以及第2基板保持部302在基板運送方向往復移動之水平移動機構303、使第1基板保持部301以及第2基板保持部302在垂直方向往復移動之垂直移動機構304。另外，在第1基板保持部 301以及第2基板保持部302上配設用來吸著保持基板2之吸著保持具305。吸著保持具305係由吸著噴嘴等構成，藉由未圖示之空氣管與真空泵連接。 The substrate transfer unit 300 has a function of transferring the substrate 2 from the positioning unit 90 to the application unit 200 and transferring it from the application unit 200 to the drying unit 900. The substrate transfer unit 300 includes a first substrate holding unit 301, a second substrate holding unit 302, a horizontal movement mechanism 303 that reciprocates the first substrate holding unit 301 and the second substrate holding unit 302 in the substrate transport direction, and a first substrate. The vertical movement mechanism 304 that reciprocates the holding portion 301 and the second substrate holding portion 302 in the vertical direction. In addition, in the first substrate holding portion The absorbing holder 305 for absorbing and holding the substrate 2 is disposed on the 301 and the second substrate holding portion 302. The absorbing holder 305 is constituted by a suction nozzle or the like, and is connected to a vacuum pump by an air tube (not shown).

第1基板保持部301以及第2基板保持部302係藉由水平移動機構303以及垂直移動機構304，同時進行將基板2從定位部90向支撐台10A移載的動作以及將基板2從支撐台10A向乾燥部600移送的動作而構成的。 The first substrate holding portion 301 and the second substrate holding portion 302 simultaneously perform the operation of transferring the substrate 2 from the positioning portion 90 to the support table 10A and the substrate 2 from the support table by the horizontal movement mechanism 303 and the vertical movement mechanism 304. 10A is configured to be transferred to the drying unit 600.

接著說明塗敷部200之構成。支撐台10A被台部3以支柱4支撐。移動單元40A、40B、40C、40D係以圍著支撐台10A的樣態配設。移動單元40A、40B、40C、40D係由使塗敷單元20A、20B、20C、20D在2軸(XY軸)方向水平移動的2軸(XY軸)直線移動機構所構成。 Next, the configuration of the coating unit 200 will be described. The support table 10A is supported by the table portion 3 with the pillars 4. The moving units 40A, 40B, 40C, and 40D are disposed around the support table 10A. The moving units 40A, 40B, 40C, and 40D are constituted by a two-axis (XY-axis) linear movement mechanism that horizontally moves the coating units 20A, 20B, 20C, and 20D in the two-axis (XY-axis) direction.

移動單元40A、40B、40C、40D係分別具備與支撐台10A的邊相平行配設的X軸氣缸46、滑動移動X軸氣缸46的X軸滑塊47、安裝於X軸滑塊47上之Y軸氣缸48以及滑動移動Y軸氣缸48之Y軸滑塊49。在移動單元40A、40B、40C、40D之Y軸滑塊49分別安裝塗敷單元20A、20B、20C、20D。X軸滑塊47以及Y軸滑塊49的動作係由控制部70A所控制。 The moving units 40A, 40B, 40C, and 40D each include an X-axis cylinder 46 disposed in parallel with the side of the support table 10A, an X-axis slider 47 that slides the X-axis cylinder 46, and is mounted on the X-axis slider 47. The Y-axis cylinder 48 and the Y-axis slider 49 of the sliding Y-axis cylinder 48 are slid. The coating units 20A, 20B, 20C, and 20D are attached to the Y-axis sliders 49 of the moving units 40A, 40B, 40C, and 40D, respectively. The operations of the X-axis slider 47 and the Y-axis slider 49 are controlled by the control unit 70A.

塗敷單元20A、20B、20C、20D係分別具備安裝於Y軸滑塊49之塗敷頭安裝構件37以及安裝於塗敷頭安裝構件37的塗敷頭21A。 The coating units 20A, 20B, 20C, and 20D each include an coating head mounting member 37 attached to the Y-axis slider 49 and an application head 21A attached to the coating head mounting member 37.

接著，就分別設置於塗敷單元20A、20B、20C、20D之塗敷頭21A進行說明。第15圖係第14圖中從 箭頭A1方向觀看時的塗敷頭21A的正面圖，第16圖係第15圖中沿XVI-XVI線之剖面圖，第17圖係第15圖中沿XVII-XVII線之剖面圖。第18圖係第15圖中沿XVIII-XVIII線之剖面圖，顯示上側頭的底面(與下側頭的相對面)，第19圖係上側頭之分解底面圖。第20圖係上側頭之分解前視圖。另外，第21圖，係第15圖中沿XXI-XXI線的剖面圖，顯示下側頭的上表面(與上側頭的相對面)。另外，第15圖、第21圖所示之箭頭B1，顯示塗敷頭21A的移動方向。 Next, the coating heads 21A provided in the coating units 20A, 20B, 20C, and 20D will be described. Figure 15 is from Figure 14 The front view of the coating head 21A when viewed in the direction of the arrow A1, Fig. 16 is a cross-sectional view taken along line XVI-XVI in Fig. 15, and Fig. 17 is a cross-sectional view taken along line XVII-XVII in Fig. 15. Figure 18 is a cross-sectional view taken along line XVIII-XVIII of Figure 15, showing the bottom surface of the upper head (opposite side to the lower head), and Figure 19 is an exploded bottom view of the upper head. Figure 20 is an exploded front view of the upper side head. Further, Fig. 21 is a cross-sectional view taken along line XXI-XXI in Fig. 15, showing the upper surface of the lower head (opposite side with the upper head). Further, the arrow B1 shown in Fig. 15 and Fig. 21 shows the moving direction of the coating head 21A.

一對塗敷頭21A包括具有能夠***基板2端部之空隙的上下互相相向設置的上側頭22G與下側頭23A而構成。塗敷頭21A的下方配設有液體接受部24A。塗敷頭21A以及液體接受部24A係由具有耐腐蝕性的不鏽鋼等金屬材料所形成。另外，下側頭23A以及液體接受部24A之構成，與第7圖所示之下側頭23以及液體接受部24大致相同，對具有相同功能之構成構件標示相同符號，此處省略對其說明。 The pair of coating heads 21A includes an upper head 22G and a lower head 23A which are disposed to face each other in the gap of the end portion of the substrate 2 so as to be opposed to each other. A liquid receiving portion 24A is disposed below the coating head 21A. The coating head 21A and the liquid receiving portion 24A are formed of a metal material such as stainless steel having corrosion resistance. In addition, the configuration of the lower head 23A and the liquid receiving portion 24A is substantially the same as that of the lower head 23 and the liquid receiving portion 24 shown in Fig. 7, and constituent members having the same functions are denoted by the same reference numerals, and the description thereof will be omitted. .

另外，在塗敷頭21A之表面(至少係膜形成液之流路面)，施加陶瓷加工等表面加工。藉由該表面加工，能夠提高膜形成液51在塗敷時向塗敷頭21A黏附的防止效果，另外塗敷後，能夠容易地進行自塗敷頭21A上剝離膜形成液51以及洗淨作業，能夠提高維護性。 Further, surface processing such as ceramic processing is applied to the surface of the coating head 21A (at least the flow path of the film forming liquid). By the surface processing, the effect of preventing the adhesion of the film forming liquid 51 to the coating head 21A during coating can be enhanced, and after the application, the film forming liquid 51 can be easily peeled off from the coating head 21A and the cleaning operation can be easily performed. Can improve maintenance.

上側頭22G如第18、19、20圖所示，包括固定於下側頭23A之固定構件22H以及相對於固定構件 22H，以能夠在上下方向進行位置調整(滑動移動)的方式安裝的移動構件22I而構成。 The upper head 22G includes the fixing member 22H fixed to the lower head 23A and the fixing member as shown in Figs. 18, 19, and 20 22H is configured by a moving member 22I that can be attached in a vertical direction (sliding movement).

移動構件22I具備第1構件22J與第2構件22K。第1構件22J係以相對於固定構件22H能夠在上下方向進行位置調整(滑動移動)的方式安裝。第2構件22K以被作為賦予勢能手段之片簧構件28e(參照第16圖)向下方向賦予勢能(推壓)的狀態，且安裝於第1構件22J。在第1構件22J與第2構件22K之間配設有近似凹形形狀的墊圈構件(金屬板)22L。 The moving member 22I includes the first member 22J and the second member 22K. The first member 22J is attached so as to be positionally adjustable (sliding movement) in the vertical direction with respect to the fixing member 22H. The second member 22K is attached to the first member 22J in a state in which the leaf spring member 28e (see FIG. 16) serving as the potential energy means is given a potential energy (pressing) in the downward direction. A washer member (metal plate) 22L having a substantially concave shape is disposed between the first member 22J and the second member 22K.

在第2構件22K的底面並列設置有傾斜引導部28a、上側液體積存部28b、上側抹子構件(抹子部)28c以及上側刮刀部(刮取部)28d。在形成有上側刮刀部28d的一側，延伸設置有由片簧構件28e所賦予勢能(推壓)的推壓部28f。在推壓部28f的平面(上表面)上，設有被片簧構件28e所推壓的突起部28g(參照第16圖)。突起部28g由螺絲構件構成，可以藉由螺絲所擰入的量進行突起部28g的高度調整。藉由突起部28g的高度調整，即能夠調整片簧構件28e的推壓力，且能夠調整上側頭22G與下側頭23A之間的空隙。 An inclined guide portion 28a, an upper liquid storage portion 28b, an upper trowel member (trowel portion) 28c, and an upper blade portion (scraping portion) 28d are arranged in parallel on the bottom surface of the second member 22K. On the side where the upper blade portion 28d is formed, a pressing portion 28f that is biased (pressed) by the leaf spring member 28e is extended. On the plane (upper surface) of the pressing portion 28f, a projection 28g pressed by the leaf spring member 28e is provided (see Fig. 16). The protruding portion 28g is constituted by a screw member, and the height of the protruding portion 28g can be adjusted by the amount of screwing. The height of the protrusion 28g can be adjusted, that is, the pressing force of the leaf spring member 28e can be adjusted, and the gap between the upper head 22G and the lower head 23A can be adjusted.

在第1構件22J的底面形成有上側液體積存部28h和用來使吊設構件23g通過的通孔28i，在通孔28i所形成的一側延設(彎曲形成)有片簧安裝部28j。片簧構件28e的一端部藉由螺絲構件28k(參照第16圖)安裝在片簧安裝部28j的平面(上表面)，片簧構件28e的另一端，係以推 壓第2構件22k的推壓部28f之突起部28g的形式構成者。片簧構件28e的彈簧乘數考慮上側頭22G與下側頭23A的空隙、基板2的厚度、塗膜的厚度等，為得到所希望的塗膜而適宜設定。 The upper liquid storage portion 28h and the through hole 28i through which the hanging member 23g passes are formed on the bottom surface of the first member 22J, and the leaf spring mounting portion 28j is extended (bently formed) on the side formed by the through hole 28i. One end portion of the leaf spring member 28e is attached to the plane (upper surface) of the leaf spring mounting portion 28j by a screw member 28k (refer to Fig. 16), and the other end of the leaf spring member 28e is pushed The protrusion 28g of the pressing portion 28f of the second member 22k is formed in the form of a projection. The spring multiplier of the leaf spring member 28e is appropriately set in consideration of the gap between the upper head 22G and the lower head 23A, the thickness of the substrate 2, the thickness of the coating film, and the like in order to obtain a desired coating film.

在固定構件22H的底面大致中央部，從固定構件22H的正面一側起通過背面一側，形成液體排出溝28l，在固定構件22H的兩端部形成通孔28m。螺栓28n插在通孔28m，藉由螺栓28n，固定構件22H固定於下側頭23A。 At a substantially central portion of the bottom surface of the fixing member 22H, a liquid discharge groove 28l is formed from the front side of the fixing member 22H through the back side, and a through hole 28m is formed at both end portions of the fixing member 22H. The bolt 28n is inserted into the through hole 28m, and the fixing member 22H is fixed to the lower head 23A by the bolt 28n.

如第20圖所示，在固定構件22H的正面大致中央部，形成有凹部28p，在該凹部28p配置有用來將膜形成液51供給至第2構件22K的管狀連接構件28o(參照第17圖)。在固定構件的正面(與第1構件22J的相對面)，於上下方向形成凸部28q，在凸部28q的高度方向中央部形成螺栓孔29a，另外，在橫跨凹部28p一側的正面部形成有螺栓孔29b。 As shown in Fig. 20, a concave portion 28p is formed in a substantially central portion of the front surface of the fixing member 22H, and a tubular connecting member 28o for supplying the film forming liquid 51 to the second member 22K is disposed in the concave portion 28p (see Fig. 17). ). The front surface of the fixing member (the surface facing the first member 22J) is formed with the convex portion 28q in the vertical direction, the bolt hole 29a is formed in the central portion in the height direction of the convex portion 28q, and the front portion is formed on the side of the concave portion 28p. A bolt hole 29b is formed.

在第1構件22J的正面大致中央部，形成有配置了連接構件28o的凹部28r。另外，在第1構件22J的背面(與固定構件22H的相對面)形成有與固定構件22H的凸部28q相配合之溝部28s。在溝部28s的高度方向中央部，縱向長的長孔29c形成於與固定構件22H的螺栓孔29a相對面的位置。在長孔29c的上表面形成螺栓安裝孔29d，另外，在橫跨凹部28r的一側的上部，縱向長的長孔29e形成於與固定構件22H的螺栓孔29b相對面的位置。 A concave portion 28r in which the connecting member 28o is disposed is formed at a substantially central portion of the front surface of the first member 22J. Further, a groove portion 28s that engages with the convex portion 28q of the fixing member 22H is formed on the back surface of the first member 22J (the surface opposite to the fixing member 22H). In the central portion in the height direction of the groove portion 28s, a vertically long long hole 29c is formed at a position facing the bolt hole 29a of the fixing member 22H. A bolt attachment hole 29d is formed in the upper surface of the long hole 29c, and a longitudinally long hole 29e is formed in a portion facing the bolt hole 29b of the fixing member 22H at an upper portion of the side across the recess 28r.

在第2構件22K的背面一側形成有***部28t，連接構件28o頂端部插在該***部28t中。***部28t與在第2構件22K內部所形成的液體供給路28u連接，液體供給路28u與在上側液體積存部28b上所形成的注入孔28v相連。通過液體供給路28u以及注入孔28v，膜形成液51被供給到上側液體積存部28b。 An insertion portion 28t is formed on the back side of the second member 22K, and the distal end portion of the connection member 28o is inserted into the insertion portion 28t. The insertion portion 28t is connected to the liquid supply path 28u formed inside the second member 22K, and the liquid supply path 28u is connected to the injection hole 28v formed in the upper liquid storage portion 28b. The film forming liquid 51 is supplied to the upper liquid storage portion 28b through the liquid supply path 28u and the injection hole 28v.

另外，在第2構件22K的正面，在與第1構件22J的長孔29c相對面的位置形成有縱向長的長孔29f，該長孔29f位於傾斜引導部28a的上方，上側抹子構件28c的上方所形成的縱向長的長孔29h形成在第1構件22J的長孔29e的相對面的位置。另外，在長孔29f上，螺栓安裝孔29g形成於第1構件22J的螺栓安裝孔29d相對面的位置。 Further, on the front surface of the second member 22K, a longitudinally long hole 29f is formed at a position facing the long hole 29c of the first member 22J, and the long hole 29f is located above the inclined guide portion 28a, and the upper trowel member 28c The longitudinally long long hole 29h formed above is formed at a position opposite to the long hole 29e of the first member 22J. Further, in the long hole 29f, the bolt attachment hole 29g is formed at a position opposing the surface of the bolt attachment hole 29d of the first member 22J.

在墊圈構件22L的正面左右2個部位，在與第1構件22J的長孔29c、29e相對面的位置形成有螺栓插通孔29i、29j。 Bolt insertion holes 29i and 29j are formed at two positions on the left and right sides of the front surface of the gasket member 22L at positions facing the long holes 29c and 29e of the first member 22J.

第2構件22K的傾斜引導部28a係為了在上側頭22G與下側頭23A之空隙內容易引導基板2的端部而設置者，且為相對於水平面向下方傾斜30度左右的構造。 The inclined guide portion 28a of the second member 22K is provided so as to easily guide the end portion of the substrate 2 in the gap between the upper head 22G and the lower head 23A, and is inclined downward by about 30 degrees with respect to the horizontal surface.

與傾斜引導部28a並列設置的上側液體積存部28b係形成為淺的溝狀，且與第1構件22J的上側液體積存部28h相連接。在上側液體積存部28b形成的注入孔22v係可用未圖示的螺絲構件將其單獨地蓋上蓋子。在基板2的端部所塗敷的液膜寬度窄的時候(3mm至5mm)， 靠近第1構件22J的注入孔22v蓋上蓋子(未圖示)，在基板2的端部塗敷之液膜的寬度寬的時候(5mm至10mm)，2個注入孔22v係可不蓋蓋子使用。藉由該構造，可根據基板2端部所塗敷之液膜的寬度，調整注入量與注入位置。 The upper liquid storage portion 28b provided in parallel with the inclined guide portion 28a is formed in a shallow groove shape, and is connected to the upper liquid storage portion 28h of the first member 22J. The injection hole 22v formed in the upper liquid volume storage portion 28b can be individually covered with a screw member (not shown). When the width of the liquid film applied to the end of the substrate 2 is narrow (3 mm to 5 mm), The injection hole 22v close to the first member 22J is covered with a cover (not shown), and when the width of the liquid film applied to the end portion of the substrate 2 is wide (5 mm to 10 mm), the two injection holes 22v can be used without the cover. . With this configuration, the injection amount and the injection position can be adjusted in accordance with the width of the liquid film applied to the end portion of the substrate 2.

在第2構件22K的上側液體積存部28b的旁邊形成有凹部28w，在凹部28w的靠近上側液體積存部28b配設有上側抹子構件28c，凹部28w的後端的壁部係作為上側刮刀部28d發揮作用。 A concave portion 28w is formed beside the upper liquid storage portion 28b of the second member 22K, and an upper smear member 28c is disposed adjacent to the upper liquid storage portion 28b of the concave portion 28w, and the wall portion of the rear end of the concave portion 28w is the upper side scraping portion 28d. Play a role.

上側抹子構件28c係上側液體積存部28b並列設置，具有將附著於基板2之膜形成液51密接，塗敷成均勻膜厚的功能，在平面看近似正方形的板狀金屬構件上形成抹子面28x和螺栓28y的安裝孔28z，藉由螺栓28y以可以脫卸之方式面，安裝於第2構件22K的凹部28w上。抹子面28x形成為平坦面，能夠適用在與塗敷頭21A的移動方向B1相平行的方向上形成有複數個微小溝(例如剖面為V字狀的溝)者。 The upper smear member 28c is provided in parallel with the upper side liquid storage portion 28b, and has a function of adhering the film forming liquid 51 adhering to the substrate 2 to a uniform film thickness, and forming a trowel on a plate-like metal member which is approximately square in plan view. The mounting hole 28z of the surface 28x and the bolt 28y is detachably attached to the recess 28w of the second member 22K by the bolt 28y. The trowel surface 28x is formed into a flat surface, and can be applied to a plurality of minute grooves (for example, grooves having a V-shaped cross section) formed in a direction parallel to the moving direction B1 of the coating head 21A.

上側刮刀部28d具有刮掉通過了上側抹子構件28c的基板2上所附著的多餘的膜形成液51的功能，為使凹部28w的後端壁部相對於與塗敷頭21A(第2構件22K)的正面垂直相交的面，向後方一側傾斜指定角度θ1(例如30度左右)的狀態。另外，為使構成上側刮刀28d的刀部的高度，比上側液體積存部28b的堤部分的上表面還低10μm程度(使空隙變大)，對前述刀部進行削刮加工。另外，前述刀部的高度可以根據塗膜的厚度進行設定。 The upper blade portion 28d has a function of scraping off the excess film forming liquid 51 adhered to the substrate 2 that has passed through the upper smear member 28c, so that the rear end wall portion of the concave portion 28w is opposed to the coating head 21A (second member) 22K) The front surface perpendicularly intersects the surface, and is inclined to the rear side by a predetermined angle θ 1 (for example, about 30 degrees). In addition, the height of the blade portion constituting the upper blade 28d is reduced by about 10 μm (the gap is increased) from the upper surface of the bank portion of the upper liquid storage portion 28b, and the blade portion is subjected to a shaving process. Further, the height of the above-mentioned blade portion can be set in accordance with the thickness of the coating film.

上述之上側頭22G的各個構件的組成構造係第2構件22K藉由螺栓29k以藉由軸可以旋轉之方式支撐在第1構件22J上，第1構件22J藉由螺栓29l、29m固定於固定構件22H的構成。 The constituent structure of each member of the upper side head 22G is supported by the second member 22K by the bolt 29k so as to be rotatable by the shaft, and the first member 22J is fixed to the fixing member by the bolts 29l, 29m. The composition of 22H.

將第2構件22K安裝於第1構件22J的步驟係從正面一側將螺栓29k(例如具備頭部、圓柱狀腰部和頂端螺絲部的外螺絲式脫料螺栓)***第2構件22K的螺栓安裝孔29g，將螺栓29k的頂端螺絲部擰進到第1構件22J的螺栓安裝孔29d。 The step of attaching the second member 22K to the first member 22J is performed by inserting a bolt 29k (for example, an external screw type discharge bolt having a head portion, a cylindrical waist portion, and a distal end screw portion) into the second member 22K from the front side. The hole 29g screws the top end screw portion of the bolt 29k into the bolt mounting hole 29d of the first member 22J.

將第1構件22J安裝於固定構件22H的步驟係在第2構件22K與第1構件22J之間(第1構件22J的正面一側)配設墊圈構件22L，將螺栓29l藉由第2構件22K的長孔29f、墊圈22L的通孔29i以及第1構件22H的長孔29c，使固定構件22H的凸部28q與第1構件22H的溝部28s相吻合的狀態下，輕輕地將螺栓29l的先端部擰入固定構件22H的螺栓孔29a。接著使螺栓29m通過第2構件22K的長孔29h、墊圈構件22L的通孔29j以及第1構件22H的長孔29e，將螺栓29m的頂端部輕輕地擰入固定構件22H的螺栓孔29b。 The step of attaching the first member 22J to the fixing member 22H is such that a washer member 22L is disposed between the second member 22K and the first member 22J (on the front side of the first member 22J), and the bolt 29l is provided by the second member 22K. The long hole 29f, the through hole 29i of the washer 22L, and the long hole 29c of the first member 22H are arranged such that the convex portion 28q of the fixing member 22H matches the groove portion 28s of the first member 22H, and the bolt 29l is gently The tip end portion is screwed into the bolt hole 29a of the fixing member 22H. Next, the bolt 29m is passed through the long hole 29h of the second member 22K, the through hole 29j of the washer member 22L, and the long hole 29e of the first member 22H, and the tip end portion of the bolt 29m is gently screwed into the bolt hole 29b of the fixing member 22H.

接著確定第1構件22J(移動構件22I)之相對於固定構件22H的安裝位置(此外，位置調整量係被長孔29c、29e的長度限制)，定位後，進一步擰入螺栓29l、29m，將第1構件22J(移動構件22I)固定於固定構件22H。設定墊圈構件22L，能夠在用螺栓29l、29m將第1構件22J固 定於固定構件22H時，防止第1構件22J的位置偏移。 Next, the mounting position of the first member 22J (moving member 22I) with respect to the fixing member 22H is determined (in addition, the position adjustment amount is limited by the length of the long holes 29c, 29e), and after positioning, the bolts 29l, 29m are further screwed, and The first member 22J (moving member 22I) is fixed to the fixing member 22H. The washer member 22L is set, and the first member 22J can be fixed by the bolts 29l and 29m. When the fixing member 22H is fixed, the positional deviation of the first member 22J is prevented.

根據上述之上側頭22G的組成構造，藉由第1構件22J的長孔29c、29e，能夠使移動構件22I(第1構件22J以及第2構件22K)相對於固定構件22H在上下方向移動，且能夠進行上側頭22G與下側頭23A的空隙調整。 According to the configuration of the upper side head 22G, the moving member 22I (the first member 22J and the second member 22K) can be moved in the vertical direction with respect to the fixing member 22H by the long holes 29c and 29e of the first member 22J, and The gap adjustment of the upper head 22G and the lower head 23A can be performed.

另外，第2構件22K係由螺栓29k被軸以可旋轉之方式支撐於第1構件22J(以可以來回轉動的方式被軸所支撐)，螺栓29l、29m的頭部係分別位於在長孔29f、29h的上部，推壓部28f係藉由片簧構件28e成為被向下方賦予勢能的狀態(換言之，即第2構件22K的下端面從上側液體積存部28b朝著上側刮刀部28d稍微向下方傾斜的狀態)。 Further, the second member 22K is rotatably supported by the first member 22J by the shaft 29k (supported by the shaft so as to be rotatable back and forth), and the head portions of the bolts 29l, 29m are respectively located at the long hole 29f. In the upper portion of 29h, the pressing portion 28f is in a state in which potential energy is applied downward by the leaf spring member 28e (in other words, the lower end surface of the second member 22K is slightly downward from the upper liquid storage portion 28b toward the upper blade portion 28d). Tilted state).

因此，以螺栓29k為支點，在長孔29f、29h所限制之範圍內，能夠使第2構件22K抵抗片簧構件28e的賦予勢能力向上方)來回轉動，所以能夠使上側頭22G與下側頭23A的空隙尺寸保持為一定寬度，且能夠對應厚度不同的基板。 Therefore, with the bolt 29k as a fulcrum, the second member 22K can be rotated back and forth against the imparting force of the leaf spring member 28e within the range restricted by the long holes 29f and 29h, so that the upper head 22G and the lower side can be made. The gap size of the head 23A is kept constant and can correspond to substrates having different thicknesses.

下側頭23A係如第21圖所示，在上表面併設有傾斜引導部23a、下側液體積存部23b、下側抹子構件23c以及下側刮刀部23d。另外，在下側頭23A的上表面，形成有安裝孔23e，該安裝孔係用來固定通過了固定構件22H的通孔28m的螺栓28n的，進而在下側頭23A上表面，豎立設置有用來在安裝構件37上吊設塗敷頭21A的吊設構件23g。另外，在下側頭23A的背面形成用來安裝液體 接受部24A的安裝孔23h和液體排出溝23f。在棒狀的吊設構件23g的上部，形成用來安裝連接螺栓26(參照第14圖)的螺孔23i。 As shown in Fig. 21, the lower head 23A is provided with an inclined guide portion 23a, a lower liquid storage portion 23b, a lower trowel member 23c, and a lower blade portion 23d on the upper surface. Further, on the upper surface of the lower head 23A, a mounting hole 23e for fixing the bolt 28n passing through the through hole 28m of the fixing member 22H is formed, and further, the upper surface of the lower head 23A is erected for The hanging member 23g of the coating head 21A is suspended from the mounting member 37. In addition, a liquid for mounting the liquid is formed on the back surface of the lower head 23A. The mounting hole 23h of the receiving portion 24A and the liquid discharge groove 23f. A screw hole 23i for attaching the connecting bolt 26 (see Fig. 14) is formed on the upper portion of the rod-shaped hanging member 23g.

液體接受部23A具備俯視時呈矩形之接受盤24a、以及從接受盤24a的一側面起向上方延伸設置的安裝板24b，安裝板24b的上部係藉由未圖示的螺栓等安裝於下側頭23A背面的安裝孔23h。在接受盤24a的底面所形成的回收口24c，透過接口24d與管55連接。接受盤24a係以回收口24c一側向下之方式，在略微傾斜的狀態下安裝於下側頭23。 The liquid receiving portion 23A includes a receiving plate 24a having a rectangular shape in a plan view, and a mounting plate 24b extending upward from a side surface of the receiving plate 24a. The upper portion of the mounting plate 24b is attached to the lower side by a bolt or the like (not shown). The mounting hole 23h on the back of the head 23A. The recovery port 24c formed on the bottom surface of the receiving tray 24a is connected to the tube 55 through the interface 24d. The receiving tray 24a is attached to the lower head 23 in a state of being slightly inclined with the recovery port 24c side being downward.

另外，在各塗敷頭21A的退避位置，分別配置塗敷頭用保護具27A。塗敷頭用保護具27A的主要構件係與第8、9圖所示之形式大致相同，所以這裡省略對其說明，塗敷頭用保護具27A係藉由升降機構27i(參照第14圖)，在塗敷時下降到支撐台10A的下方，退避時上升至塗敷頭21A的位置，墊子單元27c的墊構件27g會與塗敷頭21A的正面的空隙部分以及刮刀部分(28d、23d)的空隙部分相抵接。 Further, the application head protector 27A is disposed at each of the retracted positions of the respective application heads 21A. The main components of the applicator head protector 27A are substantially the same as those shown in Figs. 8 and 9, and therefore the description thereof is omitted here, and the applicator head protector 27A is supported by the elevating mechanism 27i (see Fig. 14). When it is applied, it descends to the lower side of the support table 10A, and when it is retracted, it rises to the position of the application head 21A, and the pad member 27g of the mat unit 27c and the gap portion of the front surface of the application head 21A and the blade portion (28d, 23d) The gap portions are abutted.

液體供給單元50A、50B、50C、50D包括收容膜形成液51之液體收容部52、從液體收容部52通過管54為各塗敷頭21A供給膜形成液51之電動式泵53以及將各液體接受部24A所接受的膜形成液51通過管55移送(回收)到液體收容部之電動式泵56而構成。藉由液體供給單元50A、50B、50C、50D，液體收容部52之膜形成液51 係藉由泵53以及管54被供給到各塗敷頭21A的上側頭22G，各液體接受部24A所接受之膜形成液51係藉由管55以及泵56被回收至液體收容部52。 The liquid supply units 50A, 50B, 50C, and 50D include a liquid storage unit 52 that houses the film formation liquid 51, an electric pump 53 that supplies the film formation liquid 51 from the liquid storage unit 52 through the tube 54 to each application head 21A, and each liquid. The film forming liquid 51 received by the receiving portion 24A is configured by transferring (recovering) the electric pump 56 to the liquid accommodating portion via the tube 55. The film forming liquid 51 of the liquid containing portion 52 by the liquid supply units 50A, 50B, 50C, 50D The upper side head 22G of each of the application heads 21A is supplied to the upper head 22G of each of the application heads 21A by the pump 53 and the tube 54, and the film forming liquid 51 received by each of the liquid receiving portions 24A is collected by the tube 55 and the pump 56 to the liquid storage unit 52.

另外，藉由各塗敷單元20A、20B、20C、20D所塗敷之基板2，係藉由基板移載部300被移送至傳送部12A，然後被運送到乾燥爐60A內，經過指定的乾燥時間後，從乾燥爐60A運出。乾燥爐60A係可使用與乾燥爐60相同構成者。 Further, the substrate 2 coated by each of the coating units 20A, 20B, 20C, and 20D is transferred to the transfer unit 12A by the substrate transfer unit 300, and then transported to the drying furnace 60A, and is subjected to specified drying. After the time, it is carried out from the drying furnace 60A. The drying furnace 60A can be configured to be the same as the drying furnace 60.

控制部70A具有進行定位部90的運送、定位控制、藉由基板移載部300的基板2的移載控制、移動單元40A、40B、40C、40D之XY軸直線動作控制、液體供給單元50A、50B、50C50D的泵53、56之驅動控制、以及乾燥爐60A的溫度控制等塗敷裝置1A各個部分的控制之功能，包括微型計算機、驅動線路、記憶部以及電源部等(均未圖示)而構成。另外，控制部70A可以由一個或者複數個控制單元(例如搬入．定位控制用、塗敷部控制用、乾燥爐用等)構成。 The control unit 70A includes transporting and positioning control of the positioning unit 90, transfer control of the substrate 2 by the substrate transfer unit 300, XY-axis linear operation control of the moving units 40A, 40B, 40C, and 40D, and a liquid supply unit 50A. The functions of controlling the respective portions of the coating device 1A such as the drive control of the pumps 53 and 56 of the 50B and 50C50D and the temperature control of the drying furnace 60A include a microcomputer, a drive line, a memory unit, and a power supply unit (none of which are shown). And constitute. Further, the control unit 70A may be constituted by one or a plurality of control units (for example, for loading, positioning control, coating unit control, drying oven, etc.).

另外，控制部70A具有驅動控制移動單元40A、40B、40C、40D，使在各塗敷頭21A(上側頭22G與下側頭23A)的空隙內分別***被支撐台10A所支撐的基板2的4個邊的狀態下使各塗敷頭21A沿著基板2的周緣部移動的功能。 Further, the control unit 70A includes drive control moving units 40A, 40B, 40C, and 40D so as to be inserted into the substrate 2 supported by the support table 10A in the gap between each of the application heads 21A (the upper head 22G and the lower head 23A). The function of moving the respective coating heads 21A along the peripheral edge portion of the substrate 2 in the state of four sides.

操作部80A具備液晶操作面板81，且安裝於框體(未圖示)。藉由液晶操作面板81，能夠進行塗敷裝 置1A的各個構件的動作條件的設定、各個構件的動作指示、動作模式(手動．自動等)切換等各種操作。由操作面板81所輸入的操作信號和設定信號被發送至控制部70A等。 The operation unit 80A includes a liquid crystal operation panel 81 and is attached to a housing (not shown). Coating can be performed by the liquid crystal operation panel 81 Various operations such as setting of operating conditions of each member of the 1A, an operation instruction of each member, and switching of an operation mode (manual, automatic, etc.) are performed. The operation signal and the setting signal input from the operation panel 81 are transmitted to the control unit 70A or the like.

例如在操作部80A中，能夠進行藉由移動單元40A、40B、40C、40D的XY軸直線移動機構的塗敷單元20A、20B、20C、20D的水平移動速度、藉由液體供給單元50A、50B、50C、50D的各個泵53的膜形成液51的輸送速度等運行條件的設定、乾燥爐60A的鰭狀加熱器62的爐內溫度設定以及乾燥時間設定等。 For example, in the operation unit 80A, the horizontal movement speed of the coating units 20A, 20B, 20C, and 20D by the XY-axis linear movement mechanism of the moving units 40A, 40B, 40C, and 40D can be performed by the liquid supply units 50A and 50B. The setting of the operating conditions such as the conveying speed of the film forming liquid 51 of each of the pumps 53 of 50C and 50D, the setting of the furnace temperature of the fin heater 62 of the drying furnace 60A, and the setting of the drying time.

接著說明使用實施形態(2)之塗敷裝置1A對基板2之周緣部塗敷膜形成液51之塗敷方法。另外，作為被塗敷對象，係就使用矩形的薄形(數十μm至數百μm)覆銅層壓板的情形進行了說明，但被塗敷對象不限定於此，還可以係鋁基板、玻璃基板等各種基板作為被塗敷對象。另外，使用實施形態(2)的塗敷裝置1A的塗敷方法，可作為基板製造步驟之一個步驟(內部步驟)而使用。 Next, a method of applying the film forming liquid 51 to the peripheral edge portion of the substrate 2 by the coating device 1A of the embodiment (2) will be described. In addition, although a rectangular thin (tens of μm to several hundreds μm) copper-clad laminate is used as the object to be coated, the object to be coated is not limited thereto, and an aluminum substrate may be used. Various substrates such as a glass substrate are used as objects to be coated. Further, the coating method using the coating device 1A of the embodiment (2) can be used as one step (internal step) of the substrate manufacturing step.

首先，進行塗敷頭21A(一對上側頭22G與下側頭23A)的空隙的調整與設定。亦即，將考慮被塗敷對象之基板2的厚度、塗膜厚度等後所決定的空隙尺寸(例如基板厚+10至500μm)相對應的空隙量規(未圖示)夾在上側頭22G之移動構件22I(第2構件22K)與下側頭23A之間，用螺栓29I、29m將第1構件22J固定於固定構件22H。然後拔掉前述空隙量規，結束塗敷頭21A的空隙的調整與設定，用連接螺栓26將塗敷頭21A安裝在安裝構件35。由 於上側頭22G的推壓部28f被片簧構件28e賦予向下的勢能(推壓)，所以上側頭22G的第2構件22K的下端面成為，自上側液體積存部28b起朝上側刮刀部28d略微向下傾斜的狀態。 First, the adjustment and setting of the gap between the application head 21A (the pair of upper head 22G and the lower head 23A) are performed. In other words, a gap gauge (not shown) corresponding to the gap size (for example, substrate thickness + 10 to 500 μm) determined by the thickness of the substrate 2 to be coated, the thickness of the coating film, and the like is sandwiched between the upper head 22G. Between the moving member 22I (second member 22K) and the lower head 23A, the first member 22J is fixed to the fixing member 22H by bolts 29I and 29m. Then, the gap gauge is removed, the adjustment and setting of the gap of the coating head 21A is completed, and the coating head 21A is attached to the mounting member 35 by the connecting bolts 26. by The pressing portion 28f of the upper head 22G is biased downward by the leaf spring member 28e. Therefore, the lower end surface of the second member 22K of the upper head 22G is directed upward from the upper liquid reservoir 28b toward the upper blade portion 28d. Slightly tilted down.

在基板搬入步驟中，首先用定位部90的傳送部91將基板2運送到指定位置，使基板提起部91b運行(上升)，將滾輪91a上的基板2暫且提起後，定位引導部92運行，以輕輕地夾著基板2側面的方式進行定位，然後，基板提起部91b運行(下降)，將基板2載置於滾輪91a。接著基板移載部300的垂直移動機構304運行，以吸附保持具305吸附基板2的狀態向上方提起，使水平移動機構303運行，水平移動到支撐台10A的上方後，垂直移動機構304運行，基板2保持被吸附保持具305吸附保持的狀態，被載置到支撐台10A的上方。 In the substrate loading step, first, the substrate 2 is transported to a predetermined position by the transport portion 91 of the positioning portion 90, the substrate lift portion 91b is moved (raised), and the substrate 2 on the roller 91a is temporarily lifted, and then the positioning guide portion 92 is operated. Positioning is performed so as to gently sandwich the side surface of the substrate 2, and then the substrate lifting portion 91b is operated (dropped), and the substrate 2 is placed on the roller 91a. Then, the vertical movement mechanism 304 of the substrate transfer unit 300 is operated to lift up the state in which the adsorption holder 305 adsorbs the substrate 2, and the horizontal movement mechanism 303 is operated to move horizontally to the upper side of the support table 10A, and then the vertical movement mechanism 304 is operated. The substrate 2 is held and held by the adsorption holder 305, and is placed above the support table 10A.

接下來的塗敷步驟係保持基板2端部***塗敷頭21A的空隙之狀態下，一邊為4台塗敷頭21A的液體積存部(上側液體積存部28b、28h與下側液體積存部23b)供給膜形成液51一邊使4台塗敷頭21A沿著基板2各邊的周緣部移動之步驟。 In the next coating step, the liquid storage portion (the upper liquid storage portions 28b and 28h and the lower liquid storage portion 23b) of the four application heads 21A are held while the end portion of the substrate 2 is inserted into the gap of the application head 21A. The film forming liquid 51 is supplied while moving the four coating heads 21A along the peripheral edge portion of each side of the substrate 2.

第22圖係用來說明用4台塗敷頭21A對基板2的周緣部進行塗敷之塗敷步驟的模式圖。圖中之虛線顯示各塗敷頭21A的移動軌跡。由於係任一個塗敷頭21A都進行同樣的動作，所以這裡對設置在塗敷單元20A之塗敷頭21A的動作進行說明。 Fig. 22 is a schematic view for explaining a coating step of applying a peripheral portion of the substrate 2 by four coating heads 21A. The broken line in the figure shows the movement trajectory of each of the coating heads 21A. Since the same operation is performed for any of the application heads 21A, the operation of the application head 21A provided in the coating unit 20A will be described here.

在指定之退避位置的A位置，調整塗敷頭21A，使基板2的端面(右邊2a)的朝向與塗敷頭21A的前進方向一致。 At the A position of the designated retracted position, the application head 21A is adjusted so that the direction of the end surface (right side 2a) of the substrate 2 coincides with the advancing direction of the coating head 21A.

首先，驅動移動單元40A的X軸滑塊47，使Y軸氣缸48沿著X軸氣缸46在a方向移動，由此使塗敷頭21A向a方向移動，為第22圖之基板2右邊2a的周緣部塗敷膜形成液51。 First, the X-axis slider 47 of the moving unit 40A is driven to move the Y-axis cylinder 48 in the a direction along the X-axis cylinder 46, thereby moving the coating head 21A in the a direction to the right side 2a of the substrate 2 of FIG. The peripheral portion is coated with a film forming liquid 51.

亦即，驅動泵53，在一邊為上側頭22G的液體供給路28u供給膜形成液51，一邊將基板右邊2a端部***塗敷頭21A的空隙，在上側液體積存部28b與下側液體積存部23b內充滿膜形成液51的狀態下，水平移動塗敷頭21A。另外，在塗敷時，控制塗敷頭21A的位置，使得基板2的端部不會從塗敷頭21A的空隙超出來。另外，在驅動X軸滑塊47時，進行驅動升降機構27i，使塗敷頭用保護具27a下降的控制。 In other words, the drive pump 53 supplies the film forming liquid 51 to the liquid supply path 28u of the upper head 22G, and inserts the end portion of the right side 2a of the substrate into the gap of the application head 21A, and stores the upper liquid reservoir 28b and the lower liquid reservoir. In a state where the film forming liquid 51 is filled in the portion 23b, the applicator head 21A is horizontally moved. Further, at the time of coating, the position of the application head 21A is controlled so that the end portion of the substrate 2 does not protrude from the gap of the application head 21A. Further, when the X-axis slider 47 is driven, control is performed to drive the elevating mechanism 27i to lower the coating head protector 27a.

塗敷頭21A到達B位置(基板2的角部通過的位置)，則移動單元40A的Y軸滑塊49運行，使塗敷頭21A在離開基板2的方向(d方向)滑動移動到C位置。 When the coating head 21A reaches the B position (the position at which the corner portion of the substrate 2 passes), the Y-axis slider 49 of the moving unit 40A operates to slide the coating head 21A in the direction away from the substrate 2 (d direction) to the C position. .

然後，驅動移動單元40A的X軸滑塊47，使塗敷頭21A滑動移動至D位置後，驅動Y軸滑塊49使塗敷單元20A滑動移動至退避位置(A位置)。在塗敷單元20A移動到退避位置之前，驅動升降機構27i，進行使塗敷頭用保護具27A上升的控制，則塗敷單元20A到達退避位置時，墊構件27g會與塗敷頭21A相抵接。 Then, the X-axis slider 47 of the moving unit 40A is driven to slide the application head 21A to the D position, and then the Y-axis slider 49 is driven to slide the coating unit 20A to the retracted position (A position). Before the application unit 20A is moved to the retracted position, the elevating mechanism 27i is driven to perform control for raising the application head protector 27A. When the application unit 20A reaches the retracted position, the pad member 27g abuts against the application head 21A. .

在塗敷單元20A對基板右邊2a進行塗敷作業的同時，併行地進行移動單元40A、40B、40C、40D等各部的驅動控制來進行通過塗敷單元20B對基板上邊2b的塗敷作業，藉由塗敷單元20C對基板左邊2c的塗敷作業，並藉由塗敷單元20D對基板下邊2d的塗敷作業。 While the coating unit 20A performs the coating operation on the right side 2a of the substrate, the driving control of each of the moving units 40A, 40B, 40C, and 40D is performed in parallel to perform the coating operation on the upper side 2b of the substrate by the coating unit 20B. The coating operation by the coating unit 20C on the left side 2c of the substrate is performed by the coating unit 20D on the lower side 2d of the substrate.

在上述塗敷步驟中，對基板2的4個邊的塗敷作業結束後，接著進行乾燥步驟。 In the above coating step, after the coating operation of the four sides of the substrate 2 is completed, the drying step is followed.

塗敷結束後，保持基板2被基板移載部300之吸附保持具305所吸附之狀態，將基板2提起，使其水平移動至傳送部12A的上方後，將其移載至傳送部12A。然後，藉由傳送部12A將基板2運送到乾燥爐60A內。經過指定的乾燥時間後，基板2從乾燥爐60A搬出，結束乾燥步驟。在基板2之周緣部，由樹脂成分構成的塗膜形成為邊框狀(端面及上下表面)。 After the application is completed, the substrate 2 is held by the adsorption holder 305 of the substrate transfer unit 300, and the substrate 2 is lifted up and moved horizontally above the transfer unit 12A, and then transferred to the transfer unit 12A. Then, the substrate 2 is transported into the drying furnace 60A by the transport portion 12A. After the specified drying time, the substrate 2 is carried out from the drying furnace 60A, and the drying step is completed. A coating film made of a resin component is formed in a frame shape (end surface and upper and lower surfaces) in the peripheral portion of the substrate 2.

根據上述實施形態(2)之塗敷裝置1A，能夠利用4台塗敷頭21A同時併行地對基板2的4個邊進行塗敷，所以能夠縮短塗敷時間。因此，能夠在基板製造生產線中以線內的方式導入，能夠維持高的生產效率。另外，由於在基板2之周緣部形成有塗膜，所以能夠提高其後之基板加工步驟的操作性，另外還能夠降低不良產品的發生，藉由使用塗敷裝置1A，即能夠減低基板之製造成本。 According to the coating apparatus 1A of the above embodiment (2), the four sides of the substrate 2 can be simultaneously and simultaneously coated by the four coating heads 21A, so that the coating time can be shortened. Therefore, it can be introduced in-line in the substrate manufacturing line, and high production efficiency can be maintained. Further, since the coating film is formed on the peripheral portion of the substrate 2, the operability of the subsequent substrate processing step can be improved, and the occurrence of defective products can be reduced, and the substrate can be manufactured by using the coating device 1A. cost.

另外，根據實施形態(2)之塗敷頭21A，上側頭22G包含固定構件22H、第1構件22J以及第2構件22K而構成，藉由第1構件22J的長孔29c、29e，即能夠 使移動構件22I(第1構件22J以及第2構件22K)相對於固定構件22H在上下方向移動(位置調整)，能夠容易地進行上側頭22G與下側頭23A之空隙的調整。另外，根據上側頭22G的組成構造，能夠以螺栓29k為支點，在長孔29f、29h所限制的範圍內，使第2構件22K對抗與片簧構件28e之附加的勢力(在向上方向)來回轉動，所以能夠使上側頭22G與下側頭23A的空隙尺寸保持在一定寬度，能夠應對厚度不同的基板。 Further, according to the coating head 21A of the embodiment (2), the upper head 22G includes the fixing member 22H, the first member 22J, and the second member 22K, and the long holes 29c and 29e of the first member 22J can When the moving member 22I (the first member 22J and the second member 22K) is moved in the vertical direction (position adjustment) with respect to the fixing member 22H, the adjustment of the gap between the upper head 22G and the lower head 23A can be easily performed. Further, according to the configuration of the upper head 22G, the second member 22K can be made to oppose the additional force (in the upward direction) with the leaf spring member 28e within the range restricted by the long holes 29f and 29h with the bolt 29k as a fulcrum. Since it is rotated, the gap size of the upper head 22G and the lower head 23A can be maintained at a constant width, and it is possible to cope with substrates having different thicknesses.

以上就本發明之實施形態進行了說明，但是本發明不限定為上述實施形態，在不脫離本發明之要旨的範圍內，可對本發明之實施形態施以各種變形或者變更，該變形或者變更也包括在本發明之技術範圍內。另外，本發明實施形態所記載的作用以及效果只不過係列舉了由本發明所產生的最合適的作用以及效果，本發明之作用以及效果不限定為本發明之實施形態所記載的範圍內。 The embodiments of the present invention have been described above, but the present invention is not limited to the above-described embodiments, and various modifications and changes may be made to the embodiments of the present invention without departing from the spirit and scope of the invention. It is included in the technical scope of the present invention. In addition, the actions and effects described in the embodiments of the present invention are merely the most suitable actions and effects produced by the present invention, and the actions and effects of the present invention are not limited to the scope described in the embodiments of the present invention.

本發明係可在印刷基板、金屬基板、包裝基板、玻璃基板等使用各種基板之電子器械產業等領域被廣泛應用。 The present invention can be widely applied to fields such as a printed circuit board, a metal substrate, a packaging substrate, and a glass substrate using various substrates such as the electronic device industry.

Claims (21)

一種塗敷裝置，係在基板之包括端面之周緣部塗敷液體，該塗敷裝置包括：支撐手段，支撐前述基板；塗敷手段，具備相向配置的一對塗敷頭，前述一對塗敷頭具有能夠***前述基板之端部的空隙；移動手段，係使該塗敷手段移動；液體供給手段，係對前述一對塗敷頭供給膜形成液；以及控制手段，在前述一對塗敷頭之前述空隙內***有由前述支撐手段支撐的前述基板之端部之狀態下，控制前述移動手段使前述一對塗敷頭沿著前述基板之周緣部移動；前述一對塗敷頭係在該一對塗敷頭之相對面具備用來積存前述膜形成液的液體積存部、以及將通過該液體積存部後之前述基板之端部所附著的前述膜形成液塗敷加工成薄膜狀的塗工部。 A coating device for applying a liquid to a peripheral portion of an end surface of a substrate, the coating device comprising: a supporting means for supporting the substrate; and a coating means comprising a pair of coating heads disposed opposite to each other, the pair of coatings The head has a gap into which the end portion of the substrate can be inserted; the moving means moves the coating means; the liquid supply means supplies the film forming liquid to the pair of coating heads; and the control means, the pair of coating means In a state in which the end portion of the substrate supported by the supporting means is inserted into the gap, the moving means controls the pair of coating heads to move along the peripheral edge portion of the substrate; the pair of coating heads are attached to The opposing surface of the pair of coating heads is provided with a liquid reservoir for storing the film forming liquid, and the film forming liquid adhered to the end portion of the substrate after passing through the liquid reservoir is coated into a film shape. Painter. 如申請專利範圍第1項所述之塗敷裝置，其中，前述塗工部具備：抹平前述基板之端部所附著之前述膜形成液之抹子部；以及用來刮掉通過該抹子部後之前述基板之端部所附著之多餘的前述膜形成液的刮取部。 The coating device according to claim 1, wherein the coating unit includes: a smear portion that smoothes the film forming liquid adhered to an end portion of the substrate; and a scraping portion for scraping through the trowel A scraping portion of the excess film forming liquid adhered to the end portion of the substrate. 如申請專利範圍第1項或第2項所述之塗敷裝置，其 中，前述塗敷手段具備用來使前述一對塗敷頭旋轉之旋轉機構部。 A coating device according to claim 1 or 2, wherein The coating means includes a rotating mechanism portion for rotating the pair of coating heads. 如申請專利範圍第3項所述之塗敷裝置，其中，在前述旋轉機構部裝設有使前述一對塗敷頭沿水平方向滑動之滑動機構部。 The coating device according to claim 3, wherein the rotating mechanism portion is provided with a sliding mechanism portion that slides the pair of coating heads in the horizontal direction. 如申請專利範圍第1項或第2項所述之塗敷裝置，其中，在前述支撐手段之周圍配設複數個前述塗敷手段；前述移動手段係用來使前述複數個塗敷手段沿著被前述支撐手段支撐之基板的邊移動的機構；前述控制手段係用來控制前述移動手段，以使前述複數個塗敷手段沿著前述基板的邊移動的機構。 The coating device according to claim 1 or 2, wherein a plurality of the coating means are disposed around the supporting means; and the moving means is for causing the plurality of coating means along a mechanism for moving a side of the substrate supported by the support means; and the control means is for controlling the moving means to move the plurality of coating means along the side of the substrate. 如申請專利範圍第5項所述之塗敷裝置，其中，前述移動手段具備複數個可在前述基板的邊方向和與該邊方向交叉之方向的2個方向移動的2軸直線移動機構。 The coating apparatus according to claim 5, wherein the moving means includes a plurality of two-axis linear movement mechanisms movable in two directions of a side direction of the substrate and a direction intersecting the side direction. 如申請專利範圍第1項或第2項所述之塗敷裝置，係具有收容前述膜形成液之液體收容部、配設於前述一對塗敷頭下方的液體接受部、以及將該液體接受部所接受之前述膜形成液移送至前述液體收容部之移送手段。 The coating device according to claim 1 or 2, further comprising a liquid accommodating portion for accommodating the film forming liquid, a liquid receiving portion disposed under the pair of coating heads, and receiving the liquid The film forming liquid received by the part is transferred to the transfer means of the liquid containing portion. 如申請專利範圍第1項或第2項所述之塗敷裝置，係更具有塗敷頭用保護具，前述塗敷頭用保護具具備：與前述一對塗敷頭之前述空隙相抵接之墊部；配設在該墊部下方之液體接受部；及支撐前述墊部以及前述液體接受部之支撐部；該塗敷頭用保護具係設置於前述一對塗敷頭之退 避位置。 The coating device according to the first or second aspect of the invention, further comprising a protective device for a coating head, wherein the protective device for the coating head has a contact with the gap between the pair of coating heads a pad portion; a liquid receiving portion disposed under the pad portion; and a supporting portion supporting the pad portion and the liquid receiving portion; the coating head protecting device is disposed on the pair of coating heads Avoid the location. 如申請專利範圍第1項或第2項所述之塗敷裝置，係具備用來使塗敷於前述基板之周緣部的前述膜形成液乾燥的乾燥手段。 The coating device according to the first or second aspect of the invention is characterized in that the coating device for drying the film forming liquid applied to the peripheral portion of the substrate is provided. 如申請專利範圍第1項或第2項所述之塗敷裝置，係具備：定位手段，用來將在被前述支撐手段支撐前的前述基板定位於指定位置；基板移載手段，用來將由前述定位手段所定位後的基板移載到前述支撐手段，以及將塗敷有前述膜形成液的基板從前述支撐手段移送。 The coating device according to claim 1 or 2, further comprising: positioning means for positioning the substrate before being supported by the supporting means at a predetermined position; and substrate transfer means for The substrate positioned by the positioning means is transferred to the supporting means, and the substrate coated with the film forming liquid is transferred from the supporting means. 如申請專利範圍第10項所述之塗敷裝置，其中，前述基板移載手段具備第1基板保持部和第2基板保持部；藉由前述第1基板保持部和前述第2基板保持部，形成並行地進行將前述基板移載到前述支撐手段之動作和將前述基板從前述支撐手段移送之動作的構成。 The coating device according to claim 10, wherein the substrate transfer device includes a first substrate holding portion and a second substrate holding portion, and the first substrate holding portion and the second substrate holding portion are The operation of transferring the substrate to the support means and the operation of transferring the substrate from the support means are performed in parallel. 一種塗敷頭，用來在基板之包括端面之周緣部塗敷液體，該塗敷頭係具備相向配置之上側頭和下側頭，前述上側頭與前述下側頭具有能夠***前述基板之端部之空隙；前述上側頭具備：形成在與前述下側頭的相對面之上側液體積存部、用來對該上側液體積存部供給膜形成液之液體供給路、與該上側液體積存部並列設置之上側 抹子部、以及與該上側抹子部並列設置之上側刮取部；前述下側頭具備：形成在與前述上側液體積存部相對向的部位之下側液體積存部、與該下側液體積存部並列設置之下側抹子部、以及與該下側抹子部並列設置的下側刮取部。 An application head for applying a liquid to a peripheral portion of an end surface of a substrate, the coating head having a top side and a lower side opposite to each other, wherein the upper side and the lower head have an end insertable into the substrate The upper side head includes: a liquid supply portion formed on the surface opposite to the lower head, a liquid supply path for supplying the film forming liquid to the upper liquid storage portion, and a liquid supply path in parallel with the upper liquid storage portion Upper side a trowel portion and an upper side scraping portion disposed in parallel with the upper trowel portion; wherein the lower head portion includes a lower liquid storage portion that is formed in a portion facing the upper liquid storage portion, and the lower liquid storage portion The lower side trowel portion and the lower side scraping portion provided in parallel with the lower trowel portion are arranged side by side. 如申請專利範圍第12項所述之塗敷頭，其中，在前述上側抹子部及/或前述下側抹子部之抹子面形成有複數個微小溝。 The coating head according to claim 12, wherein a plurality of minute grooves are formed on the trowel surface of the upper trowel portion and/or the lower trowel portion. 如申請專利範圍第12項所述之塗敷頭，其中，前述上側抹子部係以可裝卸於前述上側頭之方式構成，前述下側抹子部係以可裝卸於前述下側頭之方式構成。 The coating head according to claim 12, wherein the upper trowel portion is detachably attached to the upper head, and the lower trowel portion is detachably attached to the lower head. Composition. 如申請專利範圍第12至14項中任一項所述之塗敷頭，其中，前述上側頭具備固定於前述下側頭之固定構件、及相對於該固定構件以能夠在上下方向進行位置調整之方式安裝的移動構件；前述上側液體積存部係形成於前述移動構件；前述上側抹子部與前述上側刮取部係設置於前述移動構件。 The coating head according to any one of claims 12 to 14, wherein the upper head includes a fixing member fixed to the lower head, and is positionally adjustable in the vertical direction with respect to the fixing member. The moving member to be attached; the upper liquid storage portion is formed in the moving member; and the upper smearing portion and the upper scraping portion are provided on the moving member. 如申請專利範圍第12至14項中任一項所述之塗敷頭，其中，前述上側頭具備固定於前述下側頭之固定構件、及相對於該固定構件以能夠在上下方向進行位置調整之方式安裝的2個移動構件； 前述上側液體積存部係形成於前述固定構件；在與前述上側液體積存部並列設置之一個移動構件係設有前述上側抹子部，在與前述一個移動構件並列設置之另一個移動構件係設有前述上側刮取部。 The coating head according to any one of claims 12 to 14, wherein the upper head includes a fixing member fixed to the lower head, and is positionally adjustable in the vertical direction with respect to the fixing member. 2 moving parts installed in the manner; The upper liquid storage portion is formed in the fixing member, and the upper trowel portion is provided in one moving member provided in parallel with the upper liquid storage portion, and is provided in another moving member provided in parallel with the one moving member. The upper side scraping portion. 如申請專利範圍第12至14項中任一項所述之塗敷頭，其中，前述上側頭係具備固定於前述下側頭之固定構件、及相對於該固定構件以在上下方向能夠進行位置調整之方式安裝的移動構件；該移動構件係在藉由賦予勢能手段向下方賦予勢能的狀態下，安裝於前述固定構件；前述上側液體積存部、前述上側抹子部、及前述上側刮取部係設置於前述移動構件。 The coating head according to any one of claims 12 to 14, wherein the upper head system includes a fixing member fixed to the lower head and a position that can be positioned in the vertical direction with respect to the fixing member a moving member mounted to be adjusted; the moving member is attached to the fixing member in a state in which a potential energy is applied downward by a potential energy means; the upper liquid storage portion, the upper trowel portion, and the upper side scraping portion It is provided in the aforementioned moving member. 如申請專利範圍第17項所述之塗敷頭，其中，前述移動構件具備第1構件和第2構件；前述第1構件係以相對於前述固定構件以在上下方向能夠進行位置調整之方式安裝者；前述第2構件係在藉由前述賦予勢能手段向下方賦予勢能的狀態下，安裝於前述第1構件者；前述上側液體積存部、前述上側抹子部、及前述上側刮取部係設置於前述第2構件。 The coating head according to claim 17, wherein the moving member includes a first member and a second member, and the first member is attached to the fixing member so as to be positionally adjustable in the vertical direction. The second member is attached to the first member in a state where the potential energy is applied downward by the potential energy supply means, and the upper liquid storage portion, the upper trowel portion, and the upper scraping portion are provided. In the aforementioned second member. 如申請專利範圍第12至14項中任一項所述之塗敷頭，其中，前述上側頭係具備排出前述膜形成液之液體排出 路。 The coating head according to any one of claims 12 to 14, wherein the upper head system is provided with a liquid discharge for discharging the film forming liquid road. 一種塗敷方法，係在基板之包括端面之周緣部塗敷膜形成液之塗敷方法，該塗敷方法包括：在具有能夠***前述基板之端部之空隙而相向配置的一對塗敷頭之前述空隙內，***前述基板之端部之步驟；及在對形成於前述一對塗敷頭之相對面的液體積存部供給前述膜形成液的同時，使前述一對塗敷頭沿著前述基板之周緣部移動，在該基板之周緣部形成塗膜之塗敷步驟；該塗敷步驟包括藉由與前述液體積存部並列設置之塗工部，將通過前述液體積存部後之前述基板所附著的前述膜形成液塗敷加工成薄膜狀的步驟。 A coating method is a method of applying a film forming liquid to a peripheral portion of a substrate including an end surface, the coating method comprising: a pair of coating heads disposed to face each other with a gap that can be inserted into an end portion of the substrate a step of inserting the end portion of the substrate into the gap; and supplying the film forming liquid to the liquid volume portion formed on the opposite surface of the pair of coating heads, and causing the pair of coating heads to be along the a step of coating a peripheral portion of the substrate to form a coating film on a peripheral portion of the substrate; the coating step includes: coating the substrate through the liquid volume portion by a coating portion disposed in parallel with the liquid volume portion The attached film forming liquid is coated and processed into a film shape. 如申請專利範圍第20項所述之塗敷方法，其中，使用複數個前述塗敷頭同時並行地對前述基板之各邊進行塗敷。 The coating method according to claim 20, wherein each of the sides of the substrate is simultaneously coated in parallel using a plurality of the coating heads.
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Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6677664B2 (en) * 2017-02-24 2020-04-08 株式会社エナテック Coating device and coating method
CN109926269B (en) * 2017-12-15 2020-12-29 大连康展机电工程有限公司 Automatic gluing device for gluing joint surface of rear cover of axle assembly and using method
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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004160419A (en) * 2002-11-15 2004-06-10 Brother Ind Ltd Adhesive applicator and ink-jet head manufacturing method
JP2005028227A (en) * 2003-07-08 2005-02-03 Nordson Corp Coating method for liquid or fused substance, and nozzle
TWI249435B (en) * 2001-12-03 2006-02-21 Tokyo Ohka Kogyo Co Ltd Coating film forming device, coating film forming method and wafer tray
JP2010234364A (en) * 2009-03-10 2010-10-21 Suntool Corp Method for sealing edge portion of double-layer product

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002244470A (en) 2001-02-21 2002-08-30 Canon Inc Image forming device and fixing device
JP3701882B2 (en) * 2001-05-25 2005-10-05 株式会社 日立インダストリイズ Paste applicator
JP2003181366A (en) * 2001-12-17 2003-07-02 Konica Corp Bar coating method
JPWO2010137418A1 (en) 2009-05-26 2012-11-12 株式会社エナテック Coating apparatus, coating tool, coating method, and film forming liquid

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI249435B (en) * 2001-12-03 2006-02-21 Tokyo Ohka Kogyo Co Ltd Coating film forming device, coating film forming method and wafer tray
JP2004160419A (en) * 2002-11-15 2004-06-10 Brother Ind Ltd Adhesive applicator and ink-jet head manufacturing method
JP2005028227A (en) * 2003-07-08 2005-02-03 Nordson Corp Coating method for liquid or fused substance, and nozzle
JP2010234364A (en) * 2009-03-10 2010-10-21 Suntool Corp Method for sealing edge portion of double-layer product

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