TWI634385B - 感放射線性樹脂組成物、光阻圖型形成方法、酸產生物及化合物 - Google Patents

感放射線性樹脂組成物、光阻圖型形成方法、酸產生物及化合物 Download PDF

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Publication number
TWI634385B
TWI634385B TW103117641A TW103117641A TWI634385B TW I634385 B TWI634385 B TW I634385B TW 103117641 A TW103117641 A TW 103117641A TW 103117641 A TW103117641 A TW 103117641A TW I634385 B TWI634385 B TW I634385B
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TW
Taiwan
Prior art keywords
group
radiation
monovalent
compound
resin composition
Prior art date
Application number
TW103117641A
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English (en)
Chinese (zh)
Other versions
TW201447485A (zh
Inventor
冨岡寛
木元孝和
淺野裕介
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Jsr股份有限公司
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Publication of TW201447485A publication Critical patent/TW201447485A/zh
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Publication of TWI634385B publication Critical patent/TWI634385B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
TW103117641A 2013-05-20 2014-05-20 感放射線性樹脂組成物、光阻圖型形成方法、酸產生物及化合物 TWI634385B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013-106643 2013-05-20
JP2013106643 2013-05-20

Publications (2)

Publication Number Publication Date
TW201447485A TW201447485A (zh) 2014-12-16
TWI634385B true TWI634385B (zh) 2018-09-01

Family

ID=52456668

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103117641A TWI634385B (zh) 2013-05-20 2014-05-20 感放射線性樹脂組成物、光阻圖型形成方法、酸產生物及化合物

Country Status (2)

Country Link
KR (1) KR102248827B1 (ko)
TW (1) TWI634385B (ko)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016158994A1 (ja) * 2015-03-31 2016-10-06 富士フイルム株式会社 パターン形成方法、フォトマスクの製造方法及び電子デバイスの製造方法
EP3605228B1 (en) * 2017-03-30 2022-02-09 JSR Corporation Radiation sensitive composition and resist pattern forming method

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003344994A (ja) * 2002-05-28 2003-12-03 Fuji Photo Film Co Ltd 感光性樹脂組成物
TW201437756A (zh) * 2013-01-28 2014-10-01 Shinetsu Chemical Co 圖案形成方法及光阻組成物

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08146610A (ja) 1994-11-17 1996-06-07 Nippon Zeon Co Ltd レジスト組成物及びそれを用いたパターン形成方法
JP3991462B2 (ja) 1997-08-18 2007-10-17 Ｊｓｒ株式会社 感放射線性樹脂組成物
US6136501A (en) 1998-08-28 2000-10-24 Shipley Company, L.L.C. Polymers and photoresist compositions comprising same
JP2003114523A (ja) * 2001-08-02 2003-04-18 Sumitomo Chem Co Ltd 化学増幅型ポジ型レジスト組成物
JP2003149812A (ja) * 2001-11-08 2003-05-21 Fuji Photo Film Co Ltd ポジ型感光性組成物
JP5655786B2 (ja) * 2009-09-11 2015-01-21 Jsr株式会社 感放射線性組成物

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003344994A (ja) * 2002-05-28 2003-12-03 Fuji Photo Film Co Ltd 感光性樹脂組成物
TW201437756A (zh) * 2013-01-28 2014-10-01 Shinetsu Chemical Co 圖案形成方法及光阻組成物

Also Published As

Publication number Publication date
KR102248827B1 (ko) 2021-05-07
KR20140136398A (ko) 2014-11-28
TW201447485A (zh) 2014-12-16

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