TWI633294B - Concentration measuring device - Google Patents
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- TWI633294B TWI633294B TW105126104A TW105126104A TWI633294B TW I633294 B TWI633294 B TW I633294B TW 105126104 A TW105126104 A TW 105126104A TW 105126104 A TW105126104 A TW 105126104A TW I633294 B TWI633294 B TW I633294B
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- 238000001514 detection method Methods 0.000 claims abstract description 43
- 238000004364 calculation method Methods 0.000 claims abstract description 32
- 239000012530 fluid Substances 0.000 claims abstract description 20
- 238000005259 measurement Methods 0.000 claims description 30
- 238000000034 method Methods 0.000 claims description 16
- 238000004458 analytical method Methods 0.000 claims description 7
- 238000002347 injection Methods 0.000 claims description 7
- 239000007924 injection Substances 0.000 claims description 7
- 238000012545 processing Methods 0.000 claims description 2
- 238000010521 absorption reaction Methods 0.000 description 14
- 238000001228 spectrum Methods 0.000 description 14
- 239000007789 gas Substances 0.000 description 12
- 238000012937 correction Methods 0.000 description 10
- 230000003287 optical effect Effects 0.000 description 6
- 239000012788 optical film Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 3
- 239000013307 optical fiber Substances 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000002835 absorbance Methods 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 235000013405 beer Nutrition 0.000 description 1
- 238000009529 body temperature measurement Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000009429 electrical wiring Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 238000005375 photometry Methods 0.000 description 1
- 108091008695 photoreceptors Proteins 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000000870 ultraviolet spectroscopy Methods 0.000 description 1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/3103—Atomic absorption analysis
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
- G01J3/0218—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using optical fibers
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- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/10—Arrangements of light sources specially adapted for spectrometry or colorimetry
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- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
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- G—PHYSICS
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- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
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- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
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- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
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- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
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- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
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- G01J1/00—Photometry, e.g. photographic exposure meter
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- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
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Abstract
本發明係一種濃度測定裝置,其中,具備:至少一個的光源,和為了放入被測定流體的測定單元,和使前述光源的光,分歧成入射至前述測定單元內之入射光與未入射至前述測定單元內之非入射光的分歧器,和為了檢測前述入射光則通過前述測定單元的透過光之透過光檢測器,和為了檢測前述非入射光的非入射光檢測器,和使用前述非入射光檢測器之檢測信號,而補正前述透過光檢測器的檢測信號的演算部。
Description
本發明係有關依據吸收光光度法的原理,而為了測定氣體濃度之濃度測定裝置。
以往,知道有:於半導體製造裝置,加以組裝於供給有機金屬(MO)氣體等之原料氣體的氣體供給線,測定氣體供給線中的氣體濃度之濃度測定裝置。
在這種濃度測定裝置中,自光源而入射特定波長的光至加以設置於氣體供給線的測定單元,而經由在通過測定單元內時,以光檢測器而檢測接受經由氣體的吸收的光而測定吸收光度,再自吸收光度求得濃度。
但經由溫度等周邊環境的影響,或光源的產生強度或光檢測器(受光元件)的受光強度之波動等,而對於測定濃度產生有誤差。為了維持測定精確度而必須校正,但半導體製造裝置之氣體供給線係為了避免污染之混入,而有必要避免與外部接觸之同時進行校正。
因此,加以提案有將流動被測定流體之測定用單元,和具有與此測定用單元同等之特性而流動校正用流體之校
正用單元,選擇性地切換兩單元之中之一個單元,具有將光投光的光源,和將通過前述單元內的光進行受光之受光器的聯機式濃度測定裝置(例如,專利文獻1等)。
[專利文獻1]日本特開2000-206045號公報
但上述以往的濃度測定裝置係既然對於測定用單元與校正用單元必須使用同一光源及同一受光器,測定的單元切換則成為必要之故,構造則成為複雜,而有無法作為在即時之測定的問題。
因此,本發明之主要目的係提供:構造未成為複雜,可在即時,精確度佳地補正測定濃度的誤差之濃度測定裝置者。
為了達成上述目的,有關本發明之濃度測定裝置之第1形態係具備:至少一個的光源,和為了放入被測定流體的測定單元,和使前述光源的光,分歧成入射至前述測定單元內之入射光與未入射至前述測定單元內之非入射光的分歧器,和檢測前述入射光則通過前述測定單元的透過光之透過光檢測器,和檢測前述非入射光的非入射光檢測
器,和使用前述非入射光檢測器之檢測信號,而補正前述透過光檢測器的檢測信號的演算部。
另外,有關本發明之濃度測定裝置之第2形態係在上述第1形態中,更具備:前述光源則包含發射各不同波長光之複數的光源,將前述複數之發光元件所發射之不同的複數波長的光,在由前述分歧器使其分歧之前,進行合波之至少一個的合波器。
另外,有關本發明之濃度測定裝置之第3形態係具備:發射各不同波長的光之複數的光源,和為了放入被測定流體的測定單元,和合波前述複數之光源所發射之複數的不同波長之前述光的至少一個之合波器,和為了檢測所合波的前述光則通過前述測定單元之透過光的透過光檢測器,和加以設置於前述合波器,將前述光源的光之一部分,作為未入射至於前述測定單元的非入射光而取出之非入射光檢測口,和使用前述非入射光檢測口的檢測信號,而補正前述透過光檢測器的檢測信號的演算部。
有關本發明之濃度測定裝置之第4形態係在上述第3形態中,於前述非入射光檢測口,更加以設置為了通過前述非入射光的縫隙。
有關本發明之濃度測定裝置之第5形態係在上述第1或第3形態中,前述演算部則經由依據下述式的演算處理,而補正前述透過光檢測器的檢測信號。
Icor=Icell×(Iref,0/Iref)
但在上式中,Icor係所補正之前述透過光檢測器的光
強度,而Iref,0係由前述非入射光檢測器所檢測之前述非入射光的初期強度,Icell係由前述透過光檢測器所檢出之測定時的光強度,Iref係由前述非入射光檢測器所檢出之測定時的光強度。
有關本發明之濃度測定裝置之第6形態係在上述第2或第3形態中,具備流動不同頻率之驅動電流於前述複數光源各自之振盪電路裝置。
有關本發明之濃度測定裝置之第7形態係在上述第6形態中,經由前述演算部之演算處理,則包含將前述透過光檢測器的檢測信號,使用快速傅立葉轉換而進行頻率解析之處理。
有關本發明之濃度測定裝置之第8形態係在上述第6形態中,經由前述演算部之演算處理,則包含將前述非入射的檢測信號,使用快速傅立葉轉換而進行頻率解析之處理。
有關本發明之濃度測定裝置之第9形態係在上述第1形態中,前述光源則包含發光紫外光的光源。
有關本發明之濃度測定裝置之第10形態係在上述第1形態中,前述演算部則對於前述非入射光檢測器的檢測信號無變化的情況,係未補正前述透過光檢測器的檢測信號。
如根據本發明,無須校正用單元,而經由使用前述非
入射光之檢測信號而補正透過光檢測器的檢測信號之時,可在即時補正測定濃度,維持測定精確度者。
1、1A‧‧‧濃度測定裝置
4‧‧‧測定單元
6‧‧‧透過光檢測器
7‧‧‧非入射光檢測器
8a‧‧‧演算部
12、13、14、15‧‧‧光源
16‧‧‧分歧器
17、17A、18、19‧‧‧合波器
17d‧‧‧非入射光檢測口
17s‧‧‧縫隙
G‧‧‧被測定流體
L1‧‧‧入射光
L2‧‧‧非入射光
圖1
顯示經由本發明之濃度測定裝置的第1實施形態之概略構成圖。
圖2
顯示於流動不同頻率之驅動電流於波長不同之各複數光源情況所產生之光的波形的波形圖。
圖3
顯示經由合波器而合波具有圖2之不同波長的複數之波形之光的波形的波形圖。
圖4
顯示將圖3所示之波形資料,經由快速傅立葉轉換而進行頻率解析後之振幅頻譜之頻譜圖。
圖5
顯示經由本發明之濃度測定裝置的第2實施形態之概略構成圖。
圖6
顯示前述第2實施形態之構成要素的合波器之一個的內部構造之擴大圖。
對於有關本發明之濃度測定裝置之第1實施形態,於以下,參照圖1~圖4而加以說明。
濃度測定裝置1係如參照圖1,具備:為了流動被測定流體的測定單元4,和光源12~15,和將光源12~15的光,分歧成入射至測定單元4內之入射光L1與未入射至測定單元4內之非入射光L2的分歧器16,和檢測通過測定單元4之透過光的透過光檢測器6,和檢測非入射光L2之非入射光檢測器7,和使用非入射光檢測器7之檢測信號的變化而補正透過光檢測器6之檢測信號的演算部8a。
測定單元4係具備:加以對向配置於兩端之光入射窗3與光出射窗5,和被測定流體的流入口4a及流出口4b。光入射窗3及光出射窗5係對於紫外光等而言亦具有耐性,適合使用於機械性.化學性安定之藍寶石玻璃,但亦可使用其他安定的素材,例如石英玻璃。
光源12~15係使各不同波長的光產生的LED,對於各自加以流動不同頻率的驅動電流。如後述,透過光檢測器6及非入射光檢測器7則無法檢測波長的不同之故,作為呈經由流動不同頻率之驅動電流於各光源12~15之時,可自透過光檢測器6及非入射光檢測器7所檢測之檢測信號,區別不同波長之光源12~15。
在圖示例中,光源12的光波長係365nm、光源13的光波長係310nm、光源14的光波長係280nm、光源15的光波長係255nm、而光源12之驅動電流的頻率係
216Hz,光源13之驅動電流的頻率係192Hz,光源14之驅動電流的頻率係168Hz,光源15之驅動電流的頻率係144Hz。圖2係顯示光源12~15的各波形。
光源12~15所發射的複數的波長的光係由WDM(波長分割多重方式)之合波器17~19而各加以合波。合波器17係合波光源12的光與光源13的光而輸出合波光A。合波器18係對於合波光A,合波光源14的光而輸出合波光B。合波器19係對於合波光B,合波光源15的光而作為合波光C。隨之,對於合波光C係包含有4個不同的波長。圖3係顯示以光二極體而檢出之合波光C的波形。
合波光C係通過光纖2而加以導光,藉由未圖示之準直器而加以作為平行光,透過光入射窗3,加以入射至測定單元4內。符號20係流動不同頻率之驅動電流至各光源12~15之振盪電路裝置。
通過測定單元4的光係透過出射窗5而由透過光檢測器6加以受光。透過光檢測器6係作為受光元件,加以使用光二極體,光電晶體電阻器等之光感測器。透過光檢測器6係加以照射通過測定單元4之透過光時,將對於透過光作為比例之電壓的檢測信號,通過配線6a而輸出至控制演算部8。
在圖示例中,於測定單元4,加以設置有透過光檢測器6,但為了迴避自測定單元內的氣體傳達至透過光檢測器6之受光元件的熱的影響,而亦可將測定單元4之透過光,藉由連接於測定單元4之光出射窗5的外側之準直器
及光纖(未圖示),由配置於自測定單元4遠離之位置的受光元件,而加以受光者。
分歧器16係將合波C的光之一部分(例如,25~35%之特定比例),作為未入射至測定單元4內之非入射光L2而使其分歧。作為分歧之非入射光L2係經由光纖21而加以傳送,由非入射光檢測器7加以受光。非入射光檢測器7之檢測信號係作為電性信號而通過電性配線22而加以輸出至控制演算部8。非入射光檢測器7係可具備與透過光檢測器6同樣的受光元件者。
在控制演算部8之演算部8a中,依據吸收光光度法,自經由透過光檢測器6所檢出之透過光的檢出信號,演算被測定流體的濃度。控制演算部8係將所算出之濃度顯示於液晶面板等之顯示部9。
透過光檢測器6係檢測加以合波複數之頻率的光,但合波後的光之檢測信號係加以A/D變換,作為數位信號而加以傳送至演算部8a,在演算部8a,經由快速傅立葉轉換而加以頻率解析,變換成各頻率成分之振幅頻譜。圖4係顯示經由快速傅立葉轉換之頻率解析後的振幅頻譜的頻譜圖。在圖4中,橫軸之頻率係顯示驅動電流的頻率,而縱軸的振幅係顯示光強度。圖4係呈未流動具有吸光特性的被測定流體的狀態,或者流動光的吸收無之氮氣的狀態地,顯示光的吸收無之狀態(以下,稱為「無吸收狀態」)。當將作為被測定流體的有機金屬材料,流動於測定單元4時,在圖4的頻譜圖中,有吸收之波長的頻率的
振幅則減少。
從有吸收之波長的振幅頻譜的振幅變化,經由依據朗伯-比爾定律,求取吸收光度Aλ之下述式(1),可算出吸收光度Aλ。
Aλ=log10(I0/I)=αLC....(1)
但,I0係入射至測定單元之前述入射光的強度,I係通過測定單元之透過光的強度,α係莫耳吸收光係數(m2/mol)、L係測定單元之光路長度(m)、C係濃度(mol/m3)。莫耳吸收光係數α係經由物質而決定的係數。
即,將上述(1)之(I0/I),看作圖4所示之振幅頻譜的前述無吸收狀態之振幅的峰值(P0)與振幅頻譜之濃度測定時的振幅之峰值(P)之變化(P0/P),可求得吸收光度Aλ。如求得吸收光度Aλ時,可自上述(1)求得被測定流體的濃度C者。
振幅頻譜的前述無吸收狀態之振幅的峰值(P0)係可對於各驅動電流的頻率,預先記憶於控制演算部8內之記憶體等。
經由加以分歧合波光之非入射光L2之非入射光檢測器7的檢出信號,亦加以A/D變換,作為數位信號而加以傳送至演算部8a,在演算部8a,經由快速傅立葉轉換而加以頻率解析,變換成各頻率成分之振幅頻譜。振幅頻譜之振幅的峰值之初期值(S0)係對於各頻率,加以記錄至控制演算部8內的記憶體等,而加以使用於後述之濃度補
正等。
由非入射光檢測器7所檢測之非入射光L2係未通過測定單元4之故,未接受到經由被測定流體的吸收。對於自以非入射光檢測器7所檢測的光之初期強度(Iref,0)經時後之測定時的以非入射光檢測器7所檢測之光強度(Iref)之變化率(Iref/Iref,0),係認為經由代表溫度之周圍環境的變化,光學元件的經年劣化,光源之驅動安定為止之發光強度變化,光入射光檢測器的受光強度變化等者。隨之,經由將前述變化率(Iref/Iref,0)的倒數(Iref,0/Iref),乘算於透過光檢測器6之測定時的光強度(Icell)之時,可補正透過光檢測器6之檢測信號者。
隨之,演算部8a係可依據下述式(2)而補正透過光檢測器6之檢測信號者。
Icor=Icell×(Iref,0/Iref)...(2)
但在上式(2)中,Icor係所補正之透過光檢測器6的光強度,而Iref,0係由非入射光檢測器7所檢測之非入射光L2的初期強度,Icell係由透過光檢測器6所檢出之測定時的光強度,Iref係由非入射光檢測器7所檢測之測定時的光強度。然而,初期強度Iref,0係可與上述之振幅的峰值(P0)之測定同時期加以測定。
另外,有著構成機器的溫度依存性及被測定流體的溫度變動之故,於適當處設置溫度檢測器,經由所測定之溫度而可修正輸出值(溫度測定值)。
在本實施形態中,如上述,非入射光檢測器7之檢測
信號係經由快速傅立葉轉換而加以變換成振幅頻譜。非入射光檢測器7之振幅頻譜的峰值之初期值(S0)係如上述,加以記憶於記憶體等。經由時間經過之光學元件的經年劣化等,而以非入射光檢測器7檢測之光強度降低時,振幅頻譜的峰值(S)則降低。此變化率(S/S0)係可看作上述式(2)所示之光強度的變化率(Iref/Iref,0)。隨之,經由對於以透過光檢測器6所檢測的光強度(Icell),乘算變化率(S/S0)之倒數(S0/S)之時,可得到所補正之透過光檢測器6的光強度(Icor)。
將透過光檢測器6所檢測的光強度(Icell),以上述之振幅頻譜的濃度測定時之振幅的峰值(P)進行置換,代入至上述式(1)時,可計算經由下述式(3)所補正之濃度。
log10(P0/(P×(S0/S)))=αLC....(3)
在本實施形態中,對於4波長之各自,可進行補正。經由氣體的種類而吸收頻譜有所差異之故,經由組合有吸收光的波長與無吸收光之波長之時,成為可更高精確度測定濃度。經由測定之氣體種類,係並非對於所有各波長進行補正,而僅對於複數波長之中之必要的波長,例如,4波長之中僅對於2種類的波長進行補正亦可。所補正的濃度係可加以顯示於顯示部9。
演算部8a係對於非入射光檢測器7之檢測信號無變化的情況,係可作為未補正透過光檢測器6之檢測信號者。在此,對於檢測信號無變化的情況,係對於檢測信號
無變動之情況之外,有檢測信號的變動則在一定範圍(容許範圍)內之情況。
然而,有著構成機器的溫度依存性及被測定流體的溫度變動之故,於適當處設置溫度檢測器,可經由所測定之溫度而修正輸出值(濃度測定值)者。
如根據具有上述構成之濃度測定裝置,無須另外設置校正用單元,而經由使用非入射光檢測器7之檢測信號的變化而補正透過光檢測器之檢測信號之時,可以即時補正測定濃度,而長時間維持測定精確度。
另外,經由程式處理而軟體性地定義補正方法,可經由程式之改寫而修正補正程式之故,補正之擴張性為高。另外,經由使用同型的電路,以相同時間而測定透過光檢測器6與非入射光檢測器7之時,可加上逐次強度補正,而可提高補正精確度者。
接著,對於本發明之第2實施形態,參照圖5及圖6加以說明。然而,對於與上述第1實施形態同樣的構成要素,附上同符號而省略詳細的說明。圖5係顯示第2實施形態之濃度測定裝置,而圖6係顯示圖5所示之合波器17A之內部構造的擴大圖。
參照圖5而具備於第2實施形態之合波器17A係成為經由光學膜17f而合波來自光源12、13的光L12、L13之構成,而追加側的光L13係由對於光學膜17f而在45度傾斜的狀態接觸光L13者,90度彎曲,與另外波長的光L12加以合波。符號17c係顯示視準透鏡等之集光透鏡。
此時,光學膜17f係未反射光L13之所有的光,而其中之幾個光L13m係透過光學膜17f而前進。同樣地,成為合波光A之根源的光L12係透過光學膜17f而前進,但未100%透過,而其中之幾個光L12m係經由光學膜17f而加以反轉。前進在此光學膜17f的光L13m及以光學膜17f加以反轉的光L12m係作為參照光(未入射至測定單元4之非入射光),自非入射光檢測口17d加以取出,由非入射光檢測器7加以檢測。
另外,將非入射光L2,自合波器17A脫離至外部時,為了排除在合波器17A內散射的光,而將縫隙17s,於非入射光檢測口17d,加以設置至光入射側。然而,設置於合波器之非入射光檢測口係有複數合波器之情況,設置於哪個合波器亦可,而均可為1個或複數。
經由合波器17A之上述構成,第2實施形態之濃度測定裝置1A,係成為無須如第1實施形態之濃度測定裝置1所具備之分歧器16。第2實施形態之其他構成係因與上述第1實施形態同樣之故,省略詳細之說明。
本發明係並非加以限定解釋於上述實施形態者,而在未脫離本發明之內容的範圍,可做種種變更。例如,加以使用於測定的光係亦可利用紫外範圍以外的波長範圍的光。
另外,作為光源係亦可使用LED以外的發光元件,例如LD(雷射二極體)者。透過光檢測器6及非入射光檢測器7係不限於光二極體,而亦可使用其他的受光元
件,例如光電晶體電阻器者。
另外,在上述第1實施形態中,使用複數不同波長之合波光於光源,但亦可利用單一波長的光源,而此情況,可省略合波器與快速傅立葉轉換。
另外,在上述實施形態中,例示流動被測定流體於測定單元之構成,但亦可作為封閉收容被測定流體之測定單元而檢測濃度之構成者。
更且,在上述實施形態中,係顯示使用非入射光檢測器7之檢測的非入射光L2之初期強度與測定時之光強度的變化而補正透過光檢測器6之檢測信號的例,但補正的方法係未加以限定於此。例如,亦可使用加減算光強度變化之差分的方法,規格化光強度的方法,或者,利用對於光強度變化的時間之傾斜的方法者。
Claims (9)
- 一種濃度測定裝置,其特徵為具備:至少一個的光源,和為了放入被測定流體的測定單元,和使前述光源的光,分歧成入射至前述測定單元內之入射光與未入射至前述測定單元內之非入射光的分歧器,和為了檢測前述入射光通過前述測定單元的透過光之透過光檢測器,和為了檢測前述非入射光的非入射光檢測器,和使用前述非入射光檢測器之檢測信號,而補正前述透過光檢測器的檢測信號的演算部;前述演算部則經由依據下述式的演算處理,而補正前述透過光檢測器的檢測信號,Icor=Icell×(Iref,0/Iref)但在上式中,Icor係所補正之前述透過光檢測器的光強度,而Iref,0係由前述非入射光檢測器所檢測之前述非入射光的初期強度,Icell係由前述透過光檢測器所檢測之前述透過光的測定時的光強度,Iref係由前述非入射光檢測器所檢測之前述非入射光的測定時的光強度。
- 如申請專利範圍第1項記載之濃度測定裝置,其中,更具備:前述光源係包含發射各不同波長的前述光之複數的光源,將前述複數之光源所發射之不同的複數波長的前述光,在由前述分歧器使其分歧之前,進行合波之至少一個 的合波器。
- 如申請專利範圍第1項記載之濃度測定裝置,其中,前述光源則包含發光紫外光的發光元件。
- 如申請專利範圍第1項記載之濃度測定裝置,其中,前述演算部在前述非入射光檢測器的檢測信號無變化的情況,不補正前述透過光檢測器的檢測信號。
- 一種濃度測定裝置,其特徵為具備:發射各不同波長的光之複數的光源,和為了放入被測定流體的測定單元,和合波前述複數之光源所發射之複數的不同波長之前述光的至少一個之合波器,和為了檢測所合波的前述光通過前述測定單元之透過光的透過光檢測器,和加以設置於前述合波器,將前述光源的光之一部分,作為未入射至前述測定單元的非入射光而取出之非入射光檢測口,和使用前述非入射光檢測口的檢測信號,而補正前述透過光檢測器的檢測信號的演算部;前述演算部則經由依據下述式的演算處理,而補正前述透過光檢測器的檢測信號,Icor=Icell×(Iref,0/Iref)但在上式中,Icor係所補正之前述透過光檢測器的光強度,而Iref,0係由前述非入射光檢測器所檢測之前述非入射光的初期強度,Icell係由前述透過光檢測器所檢測之 前述透過光的測定時的光強度,Iref係由前述非入射光檢測器所檢測之前述非入射光的測定時的光強度。
- 如申請專利範圍第5項記載之濃度測定裝置,其中,於前述非入射光檢測口,更加以設置為了通過前述非入射光的縫隙。
- 如申請專利範圍第2項或第5項記載之濃度測定裝置,其中,更具備:對於前述複數之各光源,流動不同頻率之驅動電流的振盪電路裝置。
- 如申請專利範圍第7項記載之濃度測定裝置,其中,經由前述演算部之演算處理,則包含將前述透過光檢測器的檢測信號,使用快速傅立葉轉換而進行頻率解析之處理。
- 如申請專利範圍第6項記載之濃度測定裝置,其中,經由前述演算部之演算處理,則包含將前述非入射光的檢測信號,使用快速傅立葉轉換而進行頻率解析之處理。
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JP2021028614A (ja) * | 2019-08-09 | 2021-02-25 | 東亜ディーケーケー株式会社 | 光学装置 |
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