TWI626402B

TWI626402B - Light projection device

Info

Publication number: TWI626402B
Application number: TW106111149A
Authority: TW
Inventors: 王正
Original assignee: 誠益光電科技股份有限公司
Priority date: 2017-03-31
Filing date: 2017-03-31
Publication date: 2018-06-11
Also published as: TW201837367A

Abstract

本發明公開一種光線投射裝置，其包括一透鏡單元、一反射單元及一發光單元。透鏡單元具有一透鏡焦點及一透鏡光軸，且透鏡光軸通過一基準平面。反射單元包括一第一反射結構及一第二反射結構，第一反射結構具有一第一焦點以及一第二焦點。第二反射結構具有一第一焦點以及一第二焦點。發光單元的一第一發光結構對應第一反射結構的第一焦點。發光單元的一第二發光結構對應第二反射結構的第一焦點。第一發光結構所產生的一第一投射光線能朝向第一反射結構的方向以及基準平面的方向投射，第二發光結構所產生的一第二投射光線能朝向第二反射結構的方向以及基準平面的方向投射。藉此，本發明達到了提高聚光效率的效果。 The invention discloses a light projection device, which comprises a lens unit, a reflection unit and a light-emitting unit. The lens unit has a lens focus and a lens optical axis, and the lens optical axis passes through a reference plane. The reflective unit includes a first reflective structure and a second reflective structure, the first reflective structure having a first focus and a second focus. The second reflective structure has a first focus and a second focus. A first light emitting structure of the light emitting unit corresponds to a first focus of the first reflective structure. A second light emitting structure of the light emitting unit corresponds to a first focus of the second reflective structure. A first projected light generated by the first light emitting structure can be projected toward a direction of the first reflective structure and a direction of the reference plane, and a second projected light generated by the second light emitting structure can face the direction of the second reflective structure and the reference plane The direction of the projection. Thereby, the present invention achieves an effect of improving the light collecting efficiency.

Description

光線投射裝置 Light projection device

本發明係有關於一種光線投射裝置，尤指一種能提高聚光效率的光線投射裝置。 The invention relates to a light projection device, in particular to a light projection device capable of improving the efficiency of collecting light.

首先，現有技術不論是汽車車燈(遠燈或是遠燈輔助燈)或是探照燈等的訴求都是要求聚光，以達到遠距離照射之目的。 First of all, the prior art, whether it is a car headlight (a long-range or a high-beam auxiliary light) or a searchlight, is required to collect light to achieve long-distance illumination.

然而，現有技術的光線投射裝置的聚光效果並不佳，因此，如何提供一種利用能夠具有高效率集光效果的光線投射裝置，以克服上述的缺陷，已然成為該項所屬技術領域人士所欲解決的重要課題。 However, the concentrating effect of the prior art ray-casting device is not good. Therefore, how to provide a ray-casting device capable of having a high-efficiency concentrating effect to overcome the above-mentioned drawbacks has become a desire of those skilled in the art. An important issue to solve.

本發明所要解決的技術問題在於，針對現有技術的不足提供一種光線投射裝置。 The technical problem to be solved by the present invention is to provide a light projection device for the deficiencies of the prior art.

為了解決上述的技術問題，本發明所採用的其中一技術方案是，提供一種光線投射裝置，其包括一透鏡單元、一反射單元以及一發光單元。所述透鏡單元具有一透鏡焦點以及一通過所述透鏡焦點的透鏡光軸，所述透鏡光軸通過一基準平面且平行於所述基準平面，所述基準平面具有一第一外側面以及一相對於所述第一外側面的第二外側面。所述反射單元包括一第一反射結構以及一第二反射結構，所述第一反射結構具有一位於鄰近所述第一外側面且位於所述第一外側面以外的第一焦點以及對應所述第一反射結構的所述第一焦點的一第二焦點，所述第二反射結構具有一位於鄰近所述第二外側面且位於所述第二外側面以外的第一焦點以及一對應所述第二反射結構的所述第一焦點的第二焦點。所述發光單元包括一第一發光結構以及一第二發光結構，所述第一發光結構對應所述第一反射結構的所述第一焦點，且所述第一發光結構設置於鄰近所述第一外側面且位於所述第一外側面以外的位置，所述第二發光結構對應所述第二反射結構的所述第一焦點，且所述第二發光結構設置於鄰近所述第二外側面且位於所述第二外側面以外的位置，其中，所述第一發光結構所產生的一第一投射光線能朝向所述第一反射結構的方向以及所述基準平面的方向投射，所述第二發光結構所產生的一第二投射光線能朝向所述第二反射結構的方向以及所述基準平面的方向投射。 In order to solve the above technical problem, one of the technical solutions adopted by the present invention is to provide a light projection device including a lens unit, a reflection unit and a light-emitting unit. The lens unit has a lens focus and a lens optical axis passing through the lens focus, the lens optical axis passes through a reference plane and is parallel to the reference plane, the reference plane has a first outer side and a relative a second outer side of the first outer side. The reflective unit includes a first reflective structure and a second reflective structure, the first reflective structure having a first focus adjacent to the first outer side and outside the first outer side and corresponding to the a second focus of the first focus of the first reflective structure, the second reflective structure having a first focus adjacent to the second outer side and outside the second outer side And a second focus corresponding to the first focus of the second reflective structure. The light emitting unit includes a first light emitting structure and a second light emitting structure, the first light emitting structure corresponding to the first focus of the first reflective structure, and the first light emitting structure is disposed adjacent to the first An outer side surface at a position other than the first outer side surface, the second light emitting structure corresponding to the first focus of the second reflective structure, and the second light emitting structure disposed adjacent to the second outer side a side surface and a position other than the second outer side surface, wherein a first projected light generated by the first light emitting structure is projected toward a direction of the first reflective structure and a direction of the reference plane, A second projected light generated by the second light emitting structure can be projected toward the direction of the second reflective structure and the direction of the reference plane.

本發明的有益效果在於，本發明實施例所提供的光線投射裝置，其能利用“所述第一發光結構所產生的一第一投射光線能朝向所述第一反射結構的方向以及所述基準平面的方向投射，所述第二發光結構所產生的一第二投射光線能朝向所述第二反射結構的方向以及所述基準平面的方向投射”的技術方案，而達到“提高集光(聚光)效率”的效果。 The illuminating device of the present invention is capable of utilizing "the direction in which a first projected ray generated by the first illuminating structure can be directed toward the first reflecting structure and the reference Projecting in a planar direction, a second projection light generated by the second illumination structure can be projected toward the direction of the second reflective structure and the direction of the reference plane, thereby achieving "increasing the collection (concentration) Light) efficiency effect.

為使能更進一步瞭解本發明的特徵及技術內容，請參閱以下有關本發明的詳細說明與附圖，然而所提供的附圖僅提供參考與說明用，並非用來對本發明加以限制。 For a better understanding of the features and technical aspects of the present invention, reference should be made to the accompanying drawings.

U‧‧‧光線投射裝置 U‧‧‧ray projection device

1‧‧‧透鏡單元 1‧‧‧ lens unit

1a‧‧‧透鏡焦點 1a‧‧‧ lens focus

11‧‧‧收光錐面 11‧‧‧ Receiving cone

111‧‧‧第一延伸段 111‧‧‧First extension

112‧‧‧第二延伸段 112‧‧‧Second extension

113‧‧‧第三延伸段 113‧‧‧ third extension

2‧‧‧反射單元 2‧‧‧Reflecting unit

2S‧‧‧反射表面 2S‧‧·reflective surface

21‧‧‧第一反射結構 21‧‧‧First reflection structure

21a‧‧‧第一焦點 21a‧‧‧First focus

21b‧‧‧第二焦點 21b‧‧‧second focus

21c‧‧‧第一端點 21c‧‧‧first endpoint

21d‧‧‧第二端點 21d‧‧‧second endpoint

21e‧‧‧頂點 21e‧‧‧ vertex

22‧‧‧第二反射結構 22‧‧‧second reflective structure

22a‧‧‧第一焦點 22a‧‧‧First focus

22b‧‧‧第二焦點 22b‧‧‧second focus

22c‧‧‧第一端點 22c‧‧‧first endpoint

22d‧‧‧第二端點 22d‧‧‧second endpoint

22e‧‧‧頂點 Vertex of 22e‧‧‧

23‧‧‧第三反射結構 23‧‧‧ Third reflection structure

23a‧‧‧第一焦點 23a‧‧‧First focus

23b‧‧‧第二焦點 23b‧‧‧second focus

24‧‧‧第四反射結構 24‧‧‧fourth reflection structure

25‧‧‧第一弧面反射結構 25‧‧‧First curved surface reflection structure

25a‧‧‧焦點 25a‧‧ Focus

26‧‧‧第二弧面反射結構 26‧‧‧Second curved reflection structure

26a‧‧‧焦點 26a‧‧ Focus

27‧‧‧延伸反射結構 27‧‧‧Extended reflection structure

271‧‧‧第一延伸反射部 271‧‧‧First extended reflection

272‧‧‧第二延伸反射部 272‧‧‧Second extended reflection

3‧‧‧發光單元 3‧‧‧Lighting unit

31‧‧‧第一發光結構 31‧‧‧First light-emitting structure

311‧‧‧第一發光面 311‧‧‧ first luminous surface

32‧‧‧第二發光結構 32‧‧‧Second light structure

321‧‧‧第二發光面 321‧‧‧second luminous surface

33‧‧‧第三發光結構 33‧‧‧The third luminous structure

331‧‧‧第三發光面 331‧‧‧ third luminous surface

34‧‧‧第四發光結構 34‧‧‧fourth light-emitting structure

S‧‧‧基準平面 S‧‧‧Datum plane

S1‧‧‧第一外側面 S1‧‧‧ first outer side

S2‧‧‧第二外側面 S2‧‧‧ second outer side

A‧‧‧透鏡光軸 A‧‧‧ lens optical axis

P11‧‧‧第一投射光線 P11‧‧‧first projected light

P12‧‧‧第一射出光線 P12‧‧‧The first shot of light

P21‧‧‧第二投射光線 P21‧‧‧second projected light

P22‧‧‧第二射出光線 P22‧‧‧Second shot light

P31‧‧‧第三投射光線 P31‧‧‧ Third projected light

R11‧‧‧第一反射光線 R11‧‧‧First reflected light

R12‧‧‧第一照射光線 R12‧‧‧first illumination

R21‧‧‧第二反射光線 R21‧‧‧second reflected light

R22‧‧‧第二照射光線 R22‧‧‧second illumination

R31‧‧‧第三反射光線 R31‧‧‧ third reflected light

D1‧‧‧第一法線方向 D1‧‧‧first normal direction

D2‧‧‧第二法線方向 D2‧‧‧ second normal direction

D3‧‧‧第三法線方向 D3‧‧‧ third normal direction

T1‧‧‧第一軸線 T1‧‧‧first axis

T2‧‧‧第二軸線 T2‧‧‧second axis

T3‧‧‧第三軸線 T3‧‧‧ third axis

G1‧‧‧第一切線 G1‧‧‧ first tangent

G2‧‧‧第二切線 G2‧‧‧second tangent

G3‧‧‧第三切線 G3‧‧‧ third tangent

PA‧‧‧預設軸線 PA‧‧‧Preset axis

PS‧‧‧預設平面 PS‧‧‧Preset plane

PC‧‧‧預設錐面 PC‧‧‧Preset cone

M‧‧‧交叉點 M‧‧‧ intersection

J0‧‧‧交錯點 J0‧‧‧Interlaced point

J1‧‧‧第一交點 J1‧‧‧ first intersection

J2‧‧‧第二交點 J2‧‧‧ second intersection

J3‧‧‧第三交點 J3‧‧‧ third intersection

L0‧‧‧預定距離 L0‧‧‧Predetermined distance

L1‧‧‧第一距離 L1‧‧‧ first distance

L2‧‧‧第二距離 L2‧‧‧Second distance

L3‧‧‧第三距離 L3‧‧‧ third distance

W11‧‧‧第一短距離 W11‧‧‧First short distance

W12‧‧‧第一長距離 W12‧‧‧First long distance

W21‧‧‧第二短距離 W21‧‧‧Second short distance

W22‧‧‧第二長距離 W22‧‧‧Second long distance

N1‧‧‧第一端點距離 N1‧‧‧first endpoint distance

N2‧‧‧第二端點距離 N2‧‧‧second endpoint distance

V1‧‧‧第一垂直距離 V1‧‧‧first vertical distance

V2‧‧‧第二垂直距離 V2‧‧‧second vertical distance

E1‧‧‧第一預定軸線 E1‧‧‧first predetermined axis

E2‧‧‧第二預定軸線 E2‧‧‧second predetermined axis

E3‧‧‧第三預定軸線 E3‧‧‧ third predetermined axis

θ1‧‧‧第一預定角度 Θ1‧‧‧first predetermined angle

θ2‧‧‧第二預定角度 Θ2‧‧‧second predetermined angle

θ3‧‧‧第三預定角度 Θ3‧‧‧ third predetermined angle

α1‧‧‧第一切角 11‧‧‧first cut angle

α2‧‧‧第二切角 22‧‧‧second cut angle

α3‧‧‧第三切角 Α3‧‧‧3rd cut angle

β‧‧‧預設角度 β‧‧‧Preset angle

γ‧‧‧收光錐角 γ‧‧‧Lighting cone angle

HH‧‧‧水平軸線 HH‧‧‧ horizontal axis

VV‧‧‧垂直軸線 VV‧‧‧vertical axis

X、Y、Z‧‧‧方向 X, Y, Z‧‧ Direction

圖1為本發明第一實施例光線投射裝置的其中一立體示意圖。 1 is a perspective view of one of the ray projection devices of the first embodiment of the present invention.

圖2為本發明第一實施例光線投射裝置的另外一立體示意圖。 2 is another perspective view of a light projection device according to a first embodiment of the present invention.

圖3為圖2的III-III剖面線的側視剖面示意圖。 Fig. 3 is a side cross-sectional view showing the line III-III of Fig. 2;

圖4為圖3的IV部分的局部放大示意圖。 Fig. 4 is a partially enlarged schematic view showing a portion IV of Fig. 3.

圖5為光線投射裝置的第一發光結構及第二發光結構分別對第一反射結構及第二反射結構所產生的光型投影示意圖。 FIG. 5 is a schematic diagram showing light projections of a first light-emitting structure and a second light-emitting structure of the light-emitting device for the first reflective structure and the second reflective structure, respectively.

圖6為本發明第二實施例光線投射裝置的其中一立體示意圖。 FIG. 6 is a perspective view of a light projection device according to a second embodiment of the present invention.

圖7為本發明第二實施例光線投射裝置的另外一立體示意圖。 FIG. 7 is another perspective view of a light projection device according to a second embodiment of the present invention.

圖8為本發明第二實施例延伸反射結構與第一反射結構及第二反射結構位置分佈的其中一立體示意圖。 FIG. 8 is a perspective view showing the positional distribution of the extended reflection structure and the first reflective structure and the second reflective structure according to the second embodiment of the present invention.

圖9為本發明第二實施例延伸反射結構與第一反射結構及第二反射結構位置分佈的另外一立體示意圖。 FIG. 9 is another perspective view showing the positional distribution of the extended reflection structure and the first reflective structure and the second reflective structure according to the second embodiment of the present invention.

圖10為本發明第三實施例光線投射裝置的其中一立體示意圖。 FIG. 10 is a perspective view of a light projection device according to a third embodiment of the present invention.

圖11為本發明第三實施例光線投射裝置的另外一立體示意圖。 FIG. 11 is another perspective view of a light projection device according to a third embodiment of the present invention.

圖12為圖11的XII-XII剖面線的側視剖面示意圖。 Fig. 12 is a side cross-sectional view showing the line XII-XII of Fig. 11;

圖13為第二實施例的第一發光結構及第二發光結構分別對第二弧面反射結構及第一弧面反射結構所產生的光型示意圖。 FIG. 13 is a schematic diagram showing light patterns generated by the first light-emitting structure and the second light-emitting structure of the second embodiment on the second curved surface reflection structure and the first curved surface reflection structure, respectively.

圖14為本發明第四實施例光線投射裝置的其中一立體示意圖。 FIG. 14 is a perspective view of a light projection device according to a fourth embodiment of the present invention.

圖15為本發明第四實施例光線投射裝置的另外一立體示意圖。 Figure 15 is another perspective view of a light projection device according to a fourth embodiment of the present invention.

圖16為本發明第四實施例光線投射裝置的後視示意圖。 Figure 16 is a rear elevational view of a ray casting device in accordance with a fourth embodiment of the present invention.

圖17為圖16的XVII-XVII剖面線的剖面示意圖。 Figure 17 is a schematic cross-sectional view taken along line XVII-XVII of Figure 16;

圖18為圖16的XVIII-XVIII剖面線的剖面示意圖。 Figure 18 is a schematic cross-sectional view taken along the line XVIII-XVIII of Figure 16;

圖19為本發明第五實施例光線投射裝置的其中一立體示意圖。 Figure 19 is a perspective view of a light projection device according to a fifth embodiment of the present invention.

圖20為本發明第五實施例光線投射裝置的另外一立體示意圖。 20 is another perspective view of a light projection device according to a fifth embodiment of the present invention.

以下是通過特定的具體實例來說明本發明所公開有關“光線投射裝置”的實施方式，本領域技術人員可由本說明書所公開的內容瞭解本發明的優點與效果。本發明可通過其他不同的具體實施例加以施行或應用，本說明書中的各項細節也可基於不同觀點與應用，在不悖離本發明的精神下進行各種修飾與變更。另外，本發明的附圖僅為簡單示意說明，並非依實際尺寸的描繪，予以聲明。以下的實施方式將進一步詳細說明本發明的相關技術內容，但所公開的內容並非用以限制本發明的技術範圍。 The following is a specific embodiment to illustrate the implementation of the "light projection device" disclosed in the present invention, and those skilled in the art can understand the advantages and effects of the present invention from the contents disclosed in the specification. The present invention may be carried out or applied in various other specific embodiments, and various modifications and changes can be made without departing from the spirit and scope of the invention. In addition, this The drawings of the invention are merely illustrative, and are not intended to The following embodiments will further explain the related technical content of the present invention, but the disclosure is not intended to limit the technical scope of the present invention.

應理解，雖然本文中可能使用術語第一、第二、第三等來描述各種元件或信號等，但這些元件或信號不應受這些術語限制。這些術語乃用以區分一元件與另一元件，或者一信號與另一信號。另外，如本文中所使用，術語“或”視實際情況可能包括相關聯的列出項目中的任一個或者多個的所有組合。 It will be understood that, although the terms first, second, third, etc. may be used herein to describe various elements or signals, etc., these elements or signals are not limited by these terms. These terms are used to distinguish one element from another, or a signal and another. Also, as used herein, the term "or" may include all combinations of any one or more of the associated listed items.

[第一實施例] [First Embodiment]

首先，請參閱圖1至圖3所示，圖1及圖2分別為本發明第一實施例光線投射裝置U的立體示意圖，圖3為本發明第一實施例光線投射裝置U的側視剖面示意圖。本發明提供一種光線投射裝置U，其包括一透鏡單元1、一反射單元2以及一發光單元3。須說明的是，為便於理解本發明，附圖中僅呈現主要元件，同時反射單元2主要是以一弧面進行說明，所屬技術領域人員，當可了解現有光線投射裝置U的結構組成，且了解附圖中所呈現的反射單元2為實際產品結構上的反射面。接著，優選地，反射單元2包括至少兩個反射結構或多個反射結構，第一實施例將以兩個反射結構(第一反射結構21及第二反射結構22)進行說明，然而，在其他實施方式中(例如第四實施例以及第五實施例中反射單元2可包括三個以上的反射結構)。另外，優選地，發光單元3也包括至少兩個發光結構或多個發光結構，以下第一實施例將以兩個發光結構(第一發光結構31及第二發光結構32)進行說明。舉例來說，第一反射結構21及第二反射結構22可分別由多個不同曲率之曲面或單一曲面所組成，例如可通過以橢圓為基礎的曲面或曲率組成反射結構。此外，第一發光結構31及第二發光結構32可分別設置在一電路基板(圖中未標號)，例如印刷電路板(Printed circuit board，PCB)或金屬電路板(Metal Core PCB，MCPCB)上，本發明不以此為限。進一步來說，第一發光結構31及第二發光結構32可以為一半導體電子元件，例如，發光二極體(Light-emitting diode，LED)或是雷射發光二極體雷射二極體(Laser Diode，LD)，然本發明不以此為限。另外，優選地，第一發光結構31及第二發光結構32可以為能產生面光源發光元件，同時，發光二極體的發光面大小可以為2毫米*2毫米以下，然本發明不以此為限。換句話說，在其他實施方式中，發光二極體的發光面大小可以為1.06毫米*1.06毫米，或者是0.75毫米*0.75毫米。值得說明的是，本發明所提供的光線投射裝置U優選可應用於汽車頭燈的遠燈或是遠燈輔助燈，此外，由於本發明所提供的光線投射裝置U的光線聚焦能力效率佳，因此，在其他實施方式中，也可以應用於探照燈等須要產生光線聚焦效果的產品。 First, referring to FIG. 1 to FIG. 3, FIG. 1 and FIG. 2 are respectively a perspective view of a ray projection device U according to a first embodiment of the present invention, and FIG. 3 is a side cross-sectional view of a ray projection device U according to a first embodiment of the present invention. schematic diagram. The invention provides a light projection device U comprising a lens unit 1, a reflection unit 2 and a light-emitting unit 3. It should be noted that, in order to facilitate the understanding of the present invention, only the main components are presented in the drawings, and the reflecting unit 2 is mainly described by a curved surface, and those skilled in the art can understand the structural composition of the existing light projection device U, and It is understood that the reflecting unit 2 presented in the drawings is a reflecting surface on the actual product structure. Next, preferably, the reflection unit 2 includes at least two reflective structures or a plurality of reflective structures, and the first embodiment will be described with two reflective structures (the first reflective structure 21 and the second reflective structure 22), however, in other In an embodiment (for example, the reflection unit 2 in the fourth embodiment and the fifth embodiment may include three or more reflection structures). In addition, preferably, the light emitting unit 3 also includes at least two light emitting structures or a plurality of light emitting structures, and the following first embodiment will be described with two light emitting structures (the first light emitting structure 31 and the second light emitting structure 32). For example, the first reflective structure 21 and the second reflective structure 22 may be respectively composed of a plurality of curved surfaces of different curvatures or a single curved surface, for example, the reflective structure may be composed of an ellipse-based curved surface or curvature. In addition, the first light emitting structure 31 and the second light emitting structure 32 may be respectively disposed on a circuit substrate (not labeled in the drawing), such as a printed circuit board (Printed circuit). On the board, PCB) or metal circuit board (MCPCB), the invention is not limited thereto. Further, the first light emitting structure 31 and the second light emitting structure 32 may be a semiconductor electronic component, such as a light-emitting diode (LED) or a laser light emitting diode (second). Laser Diode, LD), but the invention is not limited thereto. In addition, preferably, the first light emitting structure 31 and the second light emitting structure 32 may be capable of generating a surface light source light emitting element, and at the same time, the light emitting surface of the light emitting diode may have a size of 2 mm * 2 mm or less, but the present invention does not Limited. In other words, in other embodiments, the light emitting surface of the light emitting diode may have a size of 1.06 mm * 1.06 mm, or 0.75 mm * 0.75 mm. It should be noted that the light projection device U provided by the present invention is preferably applicable to a headlight or a high beam auxiliary lamp of an automobile headlight. In addition, since the light projection device U provided by the present invention has high light focusing ability, Therefore, in other embodiments, it can also be applied to a product such as a searchlight that requires a light focusing effect.

承上述，請複參閱圖1至圖3所示，透鏡單元1具有一透鏡焦點1a以及一通過透鏡焦點1a的透鏡光軸A，透鏡光軸A可通過一基準平面S且平行於基準平面S，也就是說，透鏡光軸A可重合於基準平面S。進一步來說，基準平面S具有一第一外側面S1以及一相對於第一外側面S1的第二外側面S2，也就是說，第一外側面S1以及第二外側面S2為基準平面S的兩相反表面。須特別說明的是，本發明中的基準平面S為一虛擬之平面，基準平面S主要是為了進一步界定出透鏡單元1、反射單元2以及發光單元3所定義。舉例來說，基準平面S可與水平面(圖中未示出)呈相互平行設置或垂直設置，然而，在其他實施方式中，基準平面S也可以與水平面呈傾斜設置，本發明不以此為限制。 In the above, as shown in FIG. 1 to FIG. 3, the lens unit 1 has a lens focus 1a and a lens optical axis A passing through the lens focus 1a. The lens optical axis A can pass through a reference plane S and is parallel to the reference plane S. That is, the lens optical axis A may coincide with the reference plane S. Further, the reference plane S has a first outer side S1 and a second outer side S2 with respect to the first outer side S1, that is, the first outer side S1 and the second outer side S2 are reference planes S. Two opposite surfaces. It should be particularly noted that the reference plane S in the present invention is a virtual plane, and the reference plane S is mainly defined to further define the lens unit 1, the reflection unit 2, and the light-emitting unit 3. For example, the reference plane S may be disposed parallel to or perpendicular to the horizontal plane (not shown). However, in other embodiments, the reference plane S may also be disposed obliquely to the horizontal plane, and the present invention does not limit.

承上述，請複參閱圖1至圖3所示，反射單元2可包括一第一反射結構21以及一第二反射結構22，以本發明實施例來說，第二反射結構22的整體形狀及特徵可與第一反射結構21相同，然本發明不以此為限。因此，當第一反射結構21及第二反射結構22 的整體形狀及特徵彼此相同時，第一反射結構21及第二反射結構22大致上可以透鏡光軸A作為幾何中心而呈等角分佈。進一步來說，第一反射結構21具有一位於鄰近第一外側面S1且位於第一外側面S1以外的第一焦點21a以及對應第一反射結構21的第一焦點21a的一第二焦點21b。換句話說，若是以圖3作為說明，第一反射結構21的第一焦點21a可以位於基準平面S的第一外側面S1以上。此外，第二反射結構22具有一位於鄰近第二外側面S2且位於第二外側面S2以外的第一焦點22a以及一對應第二反射結構22的第一焦點22a的第二焦點22b。換句話說，若是以圖3作為說明，第二反射結構22的第一焦點22a可以位於基準平面S的第二外側面S2以下。另外，第一反射結構21可具有三個反曲點(圖中未標號)，且第二反射結構22可具有三個反曲點(圖中未標號)。須特別說明的是，優選地，以本發明實施例而言，第一反射結構21與第二反射結構22之間可不具有明暗截止線遮板(cut-off plate)或是其他為了改變光線投射裝置U所產生的光型的結構(例如楔形結構)。 The reflective unit 2 can include a first reflective structure 21 and a second reflective structure 22, and the overall shape of the second reflective structure 22 and the embodiment of the present invention are as described above. The features may be the same as the first reflective structure 21, but the invention is not limited thereto. Therefore, when the first reflective structure 21 and the second reflective structure 22 When the overall shape and characteristics are identical to each other, the first reflective structure 21 and the second reflective structure 22 may be substantially equiangularly distributed with the optical axis A of the lens as a geometric center. Further, the first reflective structure 21 has a first focus 21a located adjacent to the first outer side S1 and located outside the first outer side S1 and a second focus 21b corresponding to the first focus 21a of the first reflective structure 21. In other words, as illustrated in FIG. 3, the first focus 21a of the first reflective structure 21 may be located above the first outer side S1 of the reference plane S. In addition, the second reflective structure 22 has a first focus 22a adjacent to the second outer side S2 and located outside the second outer side S2 and a second focus 22b corresponding to the first focus 22a of the second reflective structure 22. In other words, as illustrated in FIG. 3, the first focus 22a of the second reflective structure 22 may be located below the second outer side S2 of the reference plane S. In addition, the first reflective structure 21 may have three inflection points (not labeled in the figure), and the second reflective structure 22 may have three inflection points (not labeled in the figure). It should be noted that, in the embodiment of the present invention, there may be no cut-off plate between the first reflective structure 21 and the second reflective structure 22 or other to change the ray projection. The structure of the light type produced by the device U (for example, a wedge structure).

藉此，如圖3所示，第一反射結構21及第二反射結構22分別位於基準平面S的兩相反側邊。優選地，第一反射結構21的第二焦點21b可位於透鏡光軸A上或者是鄰近於透鏡光軸A，第二反射結構22的第二焦點22b可位於透鏡光軸A上或者是鄰近於透鏡光軸A。更優選地，第一反射結構21的第二焦點21b、第二反射結構22的第二焦點22b以及透鏡焦點1a三者可相互重合。值得一提的是，第一反射結構21以及第二反射結構22可彼此相互連接，且透鏡光軸A及基準平面S可通過第一反射結構21以及第二反射結構22之間的連接處。 Thereby, as shown in FIG. 3, the first reflective structure 21 and the second reflective structure 22 are respectively located on opposite sides of the reference plane S. Preferably, the second focus 21b of the first reflective structure 21 may be located on the optical axis A of the lens or adjacent to the optical axis A of the lens, and the second focus 22b of the second reflective structure 22 may be located on the optical axis A of the lens or adjacent to Lens optical axis A. More preferably, the second focus 21b of the first reflective structure 21, the second focus 22b of the second reflective structure 22, and the lens focus 1a may coincide with each other. It is worth mentioning that the first reflective structure 21 and the second reflective structure 22 can be connected to each other, and the lens optical axis A and the reference plane S can pass through the connection between the first reflective structure 21 and the second reflective structure 22.

承上述，請複參閱圖3所示，發光單元3可包括一第一發光結構31以及一第二發光結構32，第一發光結構31可對應第一反射結構21的第一焦點21a，且第一發光結構31可設置於鄰近第一外側面S1且位於第一外側面S1以外的位置。此外，第二發光結構32可對應第二反射結構22的第一焦點22a，且第二發光結構32可設置於鄰近第二外側面S2且位於第二外側面S2以外的位置。換句話說，若是以圖3作為說明，第一發光結構31可以位於基準平面S的第一外側面S1以上，且第二發光結構32可以位於基準平面S的第二外側面S2以下。藉此，第一發光結構31及第二發光結構32分別位於基準平面S的兩相反側邊。優選地，第一發光結構31或第一發光結構31的第一發光面311可鄰近於第一反射結構21的第一焦點21a或直接設置在第一反射結構21的第一焦點21a上，而第二發光結構32或第二發光結構32的第二發光面321可鄰近於第二反射結構22的第一焦點22a或直接設置在第二反射結構22的第一焦點22a上。本發明將以第一發光結構31設置在第一反射結構21的第一焦點21a上，且第二發光結構32設置在第二反射結構22的第一焦點22a上的實施方式進行說明。 The light-emitting unit 3 can include a first light-emitting structure 31 and a second light-emitting structure 32. The first light-emitting structure 31 can correspond to the first focus 21a of the first reflective structure 21, and the first A light emitting structure 31 can be disposed adjacent to the first The outer side surface S1 is located at a position other than the first outer side surface S1. In addition, the second light emitting structure 32 may correspond to the first focus 22a of the second reflective structure 22, and the second light emitting structure 32 may be disposed adjacent to the second outer side S2 and located outside the second outer side S2. In other words, as illustrated in FIG. 3, the first light emitting structure 31 may be located above the first outer side surface S1 of the reference plane S, and the second light emitting structure 32 may be located below the second outer side surface S2 of the reference plane S. Thereby, the first light emitting structure 31 and the second light emitting structure 32 are respectively located on opposite sides of the reference plane S. Preferably, the first light emitting surface 31 of the first light emitting structure 31 or the first light emitting structure 31 may be adjacent to the first focus 21a of the first reflective structure 21 or directly disposed on the first focus 21a of the first reflective structure 21, and The second light emitting surface 321 of the second light emitting structure 32 or the second light emitting structure 32 may be adjacent to the first focus 22a of the second reflective structure 22 or directly disposed on the first focus 22a of the second reflective structure 22. The present invention will be described with an embodiment in which the first light emitting structure 31 is disposed on the first focus 21a of the first reflective structure 21 and the second light emitting structure 32 is disposed on the first focus 22a of the second reflective structure 22.

承上述，請複參閱圖3所示，第一發光結構31所產生的一第一投射光線P11能朝向第一反射結構21的方向以及基準平面S的方向投射，且第二發光結構32所產生的一第二投射光線P21能朝向第二反射結構22的方向以及基準平面S的方向投射。換句話說，以本發明實施例而言，第一發光結構31所產生的第一投射光線P11以及第二發光結構32所產生的第二投射光線P21是朝向透鏡光軸A的方向射出且是朝斜後方的方向射出。進一步來說，第一發光結構31可具有一第一發光面311，且第一投射光線P11能沿著第一發光面311的一第一法線方向D1朝向第一反射結構21的方向以及基準平面S的方向投射。也就是說，第一法線方向D1是朝向透鏡單元1的斜下後方延伸而出。另外，第二發光結構32可具有一第二發光面321，且第二發光結構32所產生的一第二投射光線P21能沿著第二發光面321的一第二法線方向D2朝向第二反射結構22的方向以及基準平面S的方向投射。也就是說，第二法線方向D2是朝向透鏡單元1的斜上後方延伸而出。 As shown in FIG. 3 , a first projected light ray P11 generated by the first light emitting structure 31 can be projected toward the direction of the first reflective structure 21 and the direction of the reference plane S, and the second light emitting structure 32 is generated. A second projected ray P21 can be projected toward the direction of the second reflective structure 22 and the direction of the reference plane S. In other words, in the embodiment of the present invention, the first projected light P11 generated by the first light emitting structure 31 and the second projected light P21 generated by the second light emitting structure 32 are emitted toward the optical axis A of the lens and are Shoot in the direction of the rear. Further, the first light emitting structure 31 can have a first light emitting surface 311, and the first projected light ray P11 can face the direction of the first reflective structure 21 along a first normal direction D1 of the first light emitting surface 311 and the reference. The direction of the plane S is projected. That is, the first normal direction D1 extends toward the obliquely lower rear side of the lens unit 1. In addition, the second light emitting structure 32 can have a second light emitting surface 321 , and a second projected light P21 generated by the second light emitting structure 32 can face the second normal direction D2 along the second light emitting surface 321 . The direction of the reflective structure 22 and the direction of the reference plane S are projected. In other words, the second The normal direction D2 extends toward the upper and lower sides of the lens unit 1.

藉此，如圖3所示，第一投射光線P11通過第一反射結構21的反射，可以形成一通過第一反射結構21的第二焦點21b的第一反射光線R11，且第二投射光線P21通過第二反射結構22的反射，可以形成一通過第二反射結構22的第二焦點22b的第二反射光線R21。 Thereby, as shown in FIG. 3, the first projected light ray P11 is reflected by the first reflective structure 21, and a first reflected ray R11 passing through the second focus 21b of the first reflective structure 21 can be formed, and the second projected ray P21 is formed. By the reflection of the second reflective structure 22, a second reflected ray R21 passing through the second focus 22b of the second reflective structure 22 can be formed.

接著，請複參閱圖3並一併參閱圖4所示，透鏡單元1可具有一收光錐面11(或可稱收光錐角γ，一般為小於90度)。以本發明實施例而言，收光錐面11的角度可介於50度至90度之間，且透鏡單元1的透鏡直徑的尺寸可介於30毫米至100毫米之間，然本發明不以此為限。須特別說明的是，此處所定義的透鏡直徑，是指透鏡出光面的圓弧曲線朝向入光面的方向的自然延伸，並與入光面交接的虛擬輪廓所形成的圓徑之直徑尺寸大小，換句話說，雖然本發明附圖中的透鏡單元1的透鏡出光面具有完全延伸至入光面的圓弧曲線，然而，在其他的實施方式中，透鏡單元1可以經過修整裁切，以符合所要設置的位置大小，且經過修整裁切後的透鏡單元1仍具有介於30毫米至100毫米之間的透鏡直徑。另外，須說明的是，收光錐面11所指的是透鏡焦點1a延伸至透鏡單元1的入光面所形成的錐形狀範圍。也就是說，每個透鏡單元1可隨設計特性而有著不同的收光錐面11的範圍，例如圓錐錐面所圍繞的範圍。進一步來說，為便於說明，以下以收光錐面11所具有的一第一延伸段111以及一第二延伸段112進行說明。第一延伸段111及第二延伸段112為由收光錐面11延伸而出的延伸線段，且第一延伸段111及第二延伸段112的延伸方向與延伸至透鏡單元1的入光面上的收光錐面11的方向相反。此外，第一延伸段111可對應第一反射結構21的第一焦點21a，第二延伸段112可對應第二反射結構22的第一焦點22a。舉例來說，第一反射結構21的第一焦點21a可鄰近於第一延伸段111設置，第二反射結構22的第一焦點22a可鄰近於第二延伸段112設置。優選地，第一反射結構21的第一焦點21a以及第二反射結構22的第一焦點22a都位於第一延伸段111以及第二延伸段112所圍繞的範圍之間，又或者是第一延伸段111可通過第一反射結構21的第一焦點21a且第二延伸段112可通過第二反射結構22的第一焦點22a，然本發明不以此為限。進一步來說，優選地，以本發明實施例而言，第一發光面311可與第一延伸段111平行，第二發光面321可與第二延伸段112平行。更優選地，第一發光面311可與第一延伸段111平行且切齊，且第一延伸段111可通過第一反射結構21的第一焦點21a，第二發光面321可與第二延伸段112平行且切齊，且第二延伸段112可通過第二反射結構22的第一焦點22a，然本發明不以為限。在其他實施方式中，第一發光面311可與第一延伸段111呈非平行設置，第二發光面321可與第二延伸段112呈非平行設置，然而，第一發光面311的第一法線方向D1仍然是朝向第一反射結構21的方向以及基準平面S的方向投射，且第二發光面321的第二法線方向D2仍然是朝向第二反射結構22的方向以及基準平面S的方向投射。 Next, referring to FIG. 3 and referring to FIG. 4 together, the lens unit 1 may have a light collecting cone surface 11 (or may be called a light cone angle γ, generally less than 90 degrees). In the embodiment of the present invention, the angle of the light collecting cone 11 may be between 50 degrees and 90 degrees, and the lens diameter of the lens unit 1 may be between 30 mm and 100 mm, although the invention does not This is limited to this. It should be specially noted that the lens diameter defined herein refers to the diameter of the diameter of the circular diameter formed by the virtual contour of the arc-shaped surface of the lens toward the light-incident surface and the virtual contour intersecting the light-incident surface. In other words, although the lens exit surface of the lens unit 1 in the drawing of the present invention has a circular arc curve extending completely to the light incident surface, in other embodiments, the lens unit 1 may be trimmed and cut to The lens unit 1 after trimming and cutting still has a lens diameter of between 30 mm and 100 mm in accordance with the position to be set. In addition, it should be noted that the light-receiving tapered surface 11 refers to a range of a tapered shape in which the lens focus 1a extends to the light-incident surface of the lens unit 1. That is to say, each lens unit 1 can have a different range of the light collecting cone 11 depending on the design characteristics, such as the range surrounded by the conical cone. Further, for convenience of explanation, a first extension 111 and a second extension 112 which are provided by the light-receiving cone 11 will be described below. The first extension segment 111 and the second extension segment 112 are extension lines extending from the light-receiving tapered surface 11 , and the extending direction of the first extension segment 111 and the second extension segment 112 and the light-incident surface extending to the lens unit 1 The direction of the upper collecting cone 11 is opposite. Further, the first extension 111 may correspond to the first focus 21a of the first reflective structure 21, and the second extension 112 may correspond to the first focus 22a of the second reflective structure 22. For example, the first focus 21a of the first reflective structure 21 can be disposed adjacent to the first extended segment 111, The first focus 22a of the two reflective structures 22 can be disposed adjacent to the second extension 112. Preferably, the first focus 21a of the first reflective structure 21 and the first focus 22a of the second reflective structure 22 are both located between the range surrounded by the first extension 111 and the second extension 112, or are the first extension The segment 111 can pass through the first focus 21a of the first reflective structure 21 and the second extension 112 can pass through the first focus 22a of the second reflective structure 22, but the invention is not limited thereto. Further, preferably, in the embodiment of the present invention, the first light emitting surface 311 may be parallel to the first extending portion 111, and the second light emitting surface 321 may be parallel to the second extending portion 112. More preferably, the first light emitting surface 311 may be parallel and aligned with the first extending portion 111, and the first extending portion 111 may pass through the first focus portion 21a of the first reflective structure 21, and the second light emitting surface 321 may extend with the second extending portion The segments 112 are parallel and aligned, and the second extension 112 can pass through the first focus 22a of the second reflective structure 22, although the invention is not limited thereto. In other embodiments, the first light emitting surface 311 can be disposed non-parallel with the first extending portion 111, and the second light emitting surface 321 can be disposed non-parallel with the second extending portion 112, however, the first of the first light emitting surface 311 The normal direction D1 is still projected toward the direction of the first reflective structure 21 and the direction of the reference plane S, and the second normal direction D2 of the second light-emitting surface 321 is still the direction toward the second reflective structure 22 and the reference plane S. Directional projection.

接著，請複參閱圖3及圖4所示，光線投射裝置U還可進一步包括一第一軸線T1以及一第二軸線T2，第一軸線T1能通過第一反射結構21的第一焦點21a與透鏡光軸A，第二軸線T2能通過第二反射結構22的第一焦點22a與透鏡光軸A。進一步來說，第一軸線T1大致垂直於第一延伸段111，第二軸線T2大致垂直於第二延伸段112。舉例來說，若是以第一發光面311與第一延伸段111平行設置且第二發光面321與第二延伸段112平行設置的實施方式來說，第一軸線T1的延伸方向大致與第一法線方向D1相同，且第二軸線T2的延伸方向大致與第二法線方向D2相同，然本發明不以此為限。 Then, as shown in FIG. 3 and FIG. 4, the ray projection device U further includes a first axis T1 and a second axis T2, and the first axis T1 can pass through the first focus 21a of the first reflective structure 21 and The lens optical axis A, the second axis T2 can pass through the first focus 22a of the second reflective structure 22 and the lens optical axis A. Further, the first axis T1 is substantially perpendicular to the first extension 111 and the second axis T2 is substantially perpendicular to the second extension 112. For example, if the first light emitting surface 311 is disposed in parallel with the first extending portion 111 and the second light emitting surface 321 is disposed in parallel with the second extending portion 112, the extending direction of the first axis T1 is substantially the same as the first The normal direction D1 is the same, and the extending direction of the second axis T2 is substantially the same as the second normal direction D2, but the invention is not limited thereto.

承上述，請複參閱圖1及圖4所示，反射單元2還進一步包括一位於第一反射結構21與第二反射結構22上的反射表面2S，且第一投射光線P11及第二投射光線P21都是朝向反射表面2S投射。接著，透鏡光軸A與所述反射表面之間具有一交錯點J0，以本發明實施例來說，交錯點J0的位置也位於第一反射結構21及第二反射結構22之間。進一步來說，如圖4所示，第一軸線T1與透鏡光軸A之間可具有一第一交點J1，第二軸線T2與透鏡光軸A之間具有一第二交點J2，交錯點J0至透鏡焦點1a之間的一預定距離L0小於第一交點J1至透鏡焦點1a之間的一第一距離L1，交錯點J0至透鏡焦點1a之間的預定距離L0小於第二交點J2至透鏡焦點1a之間的一第二距離L2。換句話說，第一交點J1及第二交點J2的位置會落在交錯點J0的後方。 In view of the above, please refer to FIG. 1 and FIG. 4, and the reflection unit 2 is further packaged. A reflective surface 2S on the first reflective structure 21 and the second reflective structure 22 is included, and both the first projected light P11 and the second projected light P21 are projected toward the reflective surface 2S. Next, there is a staggered point J0 between the optical axis A of the lens and the reflective surface. In the embodiment of the present invention, the position of the interlaced point J0 is also located between the first reflective structure 21 and the second reflective structure 22. Further, as shown in FIG. 4, the first axis T1 and the lens optical axis A may have a first intersection J1, and the second axis T2 and the lens optical axis A have a second intersection J2, and the intersection point J0. A predetermined distance L0 between the lens focus 1a is smaller than a first distance L1 between the first intersection J1 and the lens focus 1a, and the predetermined distance L0 between the interlaced point J0 and the lens focus 1a is smaller than the second intersection J2 to the lens focus A second distance L2 between 1a. In other words, the positions of the first intersection J1 and the second intersection J2 will fall behind the interlaced point J0.

承上述，請複參閱圖4所示，為便於說明，圖4中不標示出第一投射光線P11、第二投射光線P21、第一反射光線R11以及第二反射光線R21。詳細來說，交錯點J0與第一反射結構21的第一焦點21a之間可具有一第一預定軸線E1，交錯點J0與第二反射結構22的第一焦點22a之間具有一第二預定軸線E2。第一預定軸線E1與第一軸線T1之間可具有一介於7度至31度之間的第一預定角度θ1，優選地，第一預定角度θ1可介於10.5度至27.5度之間，更優選地，第一預定角度θ1可介於13.5度至24.5度之間，第二預定軸線E2與第二軸線T2之間可具有一介7度至31度之間的第二預定角度θ2，優選地，第二預定角度θ2可介於10.5度至27.5度之間，更優選地，第二預定角度θ2可介於13.5度至24.5度之間。另外，交錯點J0與第一交點J1之間的距離可大於7毫米(millimeter，mm)，且交錯點J0與第二交點J2之間的距離可大於7毫米。須說明的是，上述第一預定軸線E1、第二預定軸線E2的定義主要是為說明第一反射結構21的第一焦點21a以及第二反射結構22的第一焦點22a的位置。 Referring to the above, please refer to FIG. 4. For convenience of description, the first projected light P11, the second projected light P21, the first reflected light R11, and the second reflected light R21 are not indicated in FIG. In detail, the interlaced point J0 and the first focus 21a of the first reflective structure 21 may have a first predetermined axis E1, and the interlaced point J0 and the first focus 22a of the second reflective structure 22 have a second predetermined Axis E2. The first predetermined axis E1 and the first axis T1 may have a first predetermined angle θ1 between 7 degrees and 31 degrees. Preferably, the first predetermined angle θ1 may be between 10.5 degrees and 27.5 degrees. Preferably, the first predetermined angle θ1 may be between 13.5 degrees and 24.5 degrees, and the second predetermined axis E2 and the second axis T2 may have a second predetermined angle θ2 between 7 degrees and 31 degrees, preferably The second predetermined angle θ2 may be between 10.5 degrees and 27.5 degrees, and more preferably, the second predetermined angle θ2 may be between 13.5 degrees and 24.5 degrees. In addition, the distance between the interlaced point J0 and the first intersection J1 may be greater than 7 mm (millimeter, mm), and the distance between the interlaced point J0 and the second intersection J2 may be greater than 7 mm. It should be noted that the definitions of the first predetermined axis E1 and the second predetermined axis E2 are mainly for explaining the positions of the first focus 21a of the first reflective structure 21 and the first focus 22a of the second reflective structure 22.

接著，請複參閱圖4所示，一第一切線G1能通過交錯點J0 且與第一反射結構21的反射面(位於第一反射結構21上的反射表面2S)相切，且第一切線G1與透鏡光軸A之間可具有介於47度至64.5度之間的第一切角α1，優選地，第一切角α1可介於50度至61.5度之間，更優選地，第一切角α1可介於53度至58.5度之間。一第二切線G2能通過交錯點J0且與第二反射結構22的反射面(位於第二反射結構22上的反射表面2S)相切，且第二切線G2與透鏡光軸A之間可具有介於47度至64.5度之間的第二切角α2，優選地，第二切角α2可介於50度至61.5度之間，更優選地，第二切角α2可介於53度至58.5度之間。 Next, please refer to FIG. 4, a first tangent G1 can pass through the interlaced point J0. And tangential to the reflective surface of the first reflective structure 21 (the reflective surface 2S on the first reflective structure 21), and the first tangent G1 and the optical axis A of the lens may have a relationship between 47 degrees and 64.5 degrees. The first cut angle α1, preferably, the first cut angle α1 may be between 50 degrees and 61.5 degrees, and more preferably, the first cut angle α1 may be between 53 degrees and 58.5 degrees. A second tangent line G2 can pass through the interlacing point J0 and is tangent to the reflecting surface of the second reflecting structure 22 (the reflecting surface 2S on the second reflecting structure 22), and the second tangent line G2 and the lens optical axis A can have a second chamfer angle α2 between 47 degrees and 64.5 degrees, preferably, the second chamfer angle α2 may be between 50 degrees and 61.5 degrees, and more preferably, the second chamfer angle α2 may be between 53 degrees and Between 58.5 degrees.

接著，請複參閱圖4所示，第一反射結構21的第一焦點21a與第二反射結構22的第一焦點22a之間的連線定義為一預設軸線PA，預設軸線PA與透鏡光軸A可大致呈垂直設置，或者是預設軸線PA與透鏡光軸A之間具有一介於80度至100度之間的預設角度β，優選地，預設角度β可介於85度至95度之間，更優選地，預設角度β可為90度。換句話說，當第二反射結構22的整體形狀及特徵與第一反射結構21相同時，預設軸線PA與透鏡光軸A可大致呈垂直設置，因此，對於光線投射裝置U所產生的光型而言，位於水平軸線HH以上的光型及位於水平軸線HH以下的光型能大致相同且相互對稱。然而，在其他實施方式中，第二反射結構22的整體形狀及特徵與第一反射結構21不同時，預設軸線PA可與透鏡光軸A之間具有介於80度至100度之間的預設角度β，且使得預設軸線PA傾斜於透鏡光軸A(圖中未示出)。進一步來說，預設軸線PA與透鏡光軸A之間可具有一交叉點M，交錯點J0可位於第一交點J1與交叉點M之間。此外，交錯點J0可位於第二交點J2與交叉點M之間。 Next, referring to FIG. 4, the line between the first focus 21a of the first reflective structure 21 and the first focus 22a of the second reflective structure 22 is defined as a predetermined axis PA, a preset axis PA and a lens. The optical axis A may be disposed substantially vertically, or the preset axis PA and the lens optical axis A have a predetermined angle β between 80 degrees and 100 degrees. Preferably, the preset angle β may be between 85 degrees. Between 95 degrees, more preferably, the preset angle β may be 90 degrees. In other words, when the overall shape and characteristics of the second reflective structure 22 are the same as those of the first reflective structure 21, the preset axis PA and the lens optical axis A may be disposed substantially perpendicularly, and thus, the light generated by the light projection device U In the type, the light pattern located above the horizontal axis HH and the light pattern located below the horizontal axis HH are substantially the same and symmetrical to each other. However, in other embodiments, when the overall shape and characteristics of the second reflective structure 22 are different from the first reflective structure 21, the preset axis PA may be between 80 degrees and 100 degrees from the optical axis A of the lens. The angle β is preset, and the preset axis PA is inclined to the lens optical axis A (not shown). Further, the preset axis PA and the lens optical axis A may have an intersection M, and the interlaced point J0 may be located between the first intersection J1 and the intersection M. Further, the interlaced point J0 may be located between the second intersection J2 and the intersection M.

接著，請複參閱圖1、圖3及圖4所示，第一反射結構21具有一鄰近於第一反射結構21的第一焦點21a的頂點21e，第一反射結構21的頂點21e至第一反射結構21的第一焦點21a之間具有一第一短距離W11，第一反射結構21的第一焦點21a至第一反射結構21的第二焦點21b之間具有一第一長距離W12。以本發明實施例而言，第一長距離W12可大於第一短距離W11，第一長距離W12與第一短距離W11之間的比值可介於1.8至3.8之間，優選地，第一長距離W12與第一短距離W11之間的比值可介於2.1至3.5之間，更優選地，第一長距離W12與第一短距離W11之間的比值可介於2.42至3.2之間，然本發明不以此為限。 Next, referring to FIG. 1, FIG. 3 and FIG. 4, the first reflective structure 21 has a vertex 21e adjacent to the first focus 21a of the first reflective structure 21, and the vertex 21e of the first reflective structure 21 is first to Between the first focus 21a of the reflective structure 21 There is a first short distance W11, and a first long distance W12 between the first focus 21a of the first reflective structure 21 and the second focus 21b of the first reflective structure 21. In the embodiment of the present invention, the first long distance W12 may be greater than the first short distance W11, and the ratio between the first long distance W12 and the first short distance W11 may be between 1.8 and 3.8, preferably, the first The ratio between the long distance W12 and the first short distance W11 may be between 2.1 and 3.5, and more preferably, the ratio between the first long distance W12 and the first short distance W11 may be between 2.42 and 3.2. However, the invention is not limited thereto.

承上述，請複參閱圖3及圖4所示，進一步來說，第二反射結構22具有一鄰近於第二反射結構22的第一焦點22a的頂點22e，第二反射結構22的頂點22e至第二反射結構22的第一焦點22a之間具有一第二短距離W21，第二反射結構22的第一焦點22a至第二反射結構22的第二焦點22b之間具有一第二長距離W22。以本發明實施例而言，第二長距離W22大於第二短距離W21，第二長距離W22與第二短距離W21的比值可介於1.8至3.8之間，優選地，第二長距離W22與第二短距離W21之間的比值可介於2.1至3.5之間，更優選地，第二長距離W22與第二短距離W21之間的比值可介於2.42至3.2之間，然本發明不以此為限。 In view of the above, please refer to FIG. 3 and FIG. 4, further, the second reflective structure 22 has a vertex 22e adjacent to the first focus 22a of the second reflective structure 22, and the apex 22e of the second reflective structure 22 is The first focus 22a of the second reflective structure 22 has a second short distance W21 between the first focus 22a of the second reflective structure 22 and the second focus 22b of the second reflective structure 22 has a second long distance W22. . In the embodiment of the present invention, the second long distance W22 is greater than the second short distance W21, and the ratio of the second long distance W22 to the second short distance W21 may be between 1.8 and 3.8, preferably, the second long distance W22 The ratio between the second short distance W21 and the second short distance W21 may be between 2.1 and 3.5, and more preferably, the ratio between the second long distance W22 and the second short distance W21 may be between 2.42 and 3.2. Not limited to this.

接著，請複參閱圖1及圖3所示，第一反射結構21可具有一第一端點21c、一相對於第一反射結構21的第一端點21c的第二端點21d以及一頂點21e。進一步來說，第一反射結構21的第一端點21c及第二端點21d為第一反射結構21與基準平面S之間的交點。另外，第一反射結構21的第一端點21c至第一反射結構21的第二端點21d之間具有一第一端點距離N1，第一反射結構21的頂點21e至透鏡光軸A之間具有一第一垂直距離V1。舉例來說，第一端點距離N1與第一垂直距離V1的比值介於0.7至1.8之間。優選地，第一端點距離N1與第一垂直距離V1的比值可介於0.9至1.55之間，更優選地，第一端點距離N1大於第一垂直距離V1，例如第一端點距離N1與第一垂直距離V1的比值可介於 1.19至1.32之間，然本發明不以此為限。 Next, referring to FIG. 1 and FIG. 3, the first reflective structure 21 may have a first end point 21c, a second end point 21d relative to the first end point 21c of the first reflective structure 21, and a vertex. 21e. Further, the first end point 21c and the second end point 21d of the first reflective structure 21 are intersections between the first reflective structure 21 and the reference plane S. In addition, a first end point distance N1 between the first end point 21c of the first reflective structure 21 and the second end point 21d of the first reflective structure 21, the apex 21e of the first reflective structure 21 to the optical axis A of the lens There is a first vertical distance V1 between them. For example, the ratio of the first endpoint distance N1 to the first vertical distance V1 is between 0.7 and 1.8. Preferably, the ratio of the first endpoint distance N1 to the first vertical distance V1 may be between 0.9 and 1.55, and more preferably, the first endpoint distance N1 is greater than the first vertical distance V1, for example, the first endpoint distance N1 The ratio to the first vertical distance V1 can be Between 1.19 and 1.32, the invention is not limited thereto.

承上述，請複參閱圖1及圖3所示，第二反射結構22具有一第一端點22c、一相對於第二反射結構22的第一端點22c的第二端點22d以及一頂點22e。進一步來說，第二反射結構22的第一端點22c及第二端點22d為第二反射結構22與基準平面S之間的交點。另外，第二反射結構22的第一端點22c至第二反射結構22的第二端點22d之間具有一第二端點距離N2，第二反射結構22的頂點22e至透鏡光軸A之間具有一第二垂直距離V2。舉例來說，第二端點距離N2與第二垂直距離V2的比值可介於0.7至1.8之間。優選地，第二端點距離N2與第二垂直距離V2的比值可介於0.9至1.55之間，更優選地，第二端點距離N2大於第二垂直距離V2，例如第二端點距離N2與第二垂直距離V2的比值可介於1.19至1.32之間，然本發明不以此為限。 In the above, as shown in FIG. 1 and FIG. 3, the second reflective structure 22 has a first end point 22c, a second end point 22d relative to the first end point 22c of the second reflective structure 22, and a vertex. 22e. Further, the first end point 22c and the second end point 22d of the second reflective structure 22 are intersections between the second reflective structure 22 and the reference plane S. In addition, a second end point distance N2 between the first end point 22c of the second reflective structure 22 and the second end point 22d of the second reflective structure 22, the apex 22e of the second reflective structure 22 to the optical axis A of the lens There is a second vertical distance V2 between. For example, the ratio of the second endpoint distance N2 to the second vertical distance V2 may be between 0.7 and 1.8. Preferably, the ratio of the second end point distance N2 to the second vertical distance V2 may be between 0.9 and 1.55, and more preferably, the second end point distance N2 is greater than the second vertical distance V2, for example, the second end point distance N2 The ratio of the second vertical distance V2 may be between 1.19 and 1.32, but the invention is not limited thereto.

接著，請參閱圖5所示，圖5為第一發光結構31及第二發光結構32分別對第一反射結構21及第二反射結構22所產生的光型投影示意圖。藉此，通過第一反射結構21及第二反射結構22的反射，發光單元3所產生的光型能在水平軸線HH上且介於±5度的範圍之間，同時，在垂直軸線VV上且介於±5度的範圍之間。優選地，發光單元3所產生的光型能在水平軸線HH上且介於±3度的範圍之間，同時，在垂直軸線VV上且介於±3度的範圍之間。值得說明的是，光強最強處將位於水平軸線HH與垂直軸線VV之間的交錯點且位於±0.75度的範圍之間。 Next, referring to FIG. 5 , FIG. 5 is a schematic diagram of light patterns generated by the first light-emitting structure 31 and the second light-emitting structure 32 on the first reflective structure 21 and the second reflective structure 22 , respectively. Thereby, by the reflection of the first reflective structure 21 and the second reflective structure 22, the light pattern generated by the light emitting unit 3 can be on the horizontal axis HH and between ±5 degrees, and at the same time on the vertical axis VV. And between the range of ± 5 degrees. Preferably, the light pattern produced by the light-emitting unit 3 can be between the horizontal axis HH and between ±3 degrees, and at the same time on the vertical axis VV and between ±3 degrees. It is worth noting that the strongest light intensity will be located at the intersection between the horizontal axis HH and the vertical axis VV and lies between the range of ±0.75 degrees.

[第二實施例] [Second embodiment]

首先，請參閱圖6及圖7所示，圖6及圖7分別為本發明第二實施例光線投射裝置U的立體示意圖。由圖6及圖7與圖1及圖2的比較可知，本發明第二實施例與第一實施例最大的差別在於：第二實施例的反射單元2還進一步包括一延伸反射結構27。延伸反射結構27可連接於第一反射結構21及第二反射結構22。須說明的是，第一反射結構21、第二反射結構22、第一發光結構31以及第二發光結構32等特徵與前述第一實施例相仿，在此容不再贅述。 First, referring to FIG. 6 and FIG. 7, FIG. 6 and FIG. 7 are respectively perspective views of a ray projection device U according to a second embodiment of the present invention. 6 and FIG. 7 and FIG. 1 and FIG. 2, the greatest difference between the second embodiment of the present invention and the first embodiment is that the reflection unit 2 of the second embodiment further includes an extended reflection structure 27. The extended reflection structure 27 is connectable to the first reflective structure 21 and the second reflective structure 22. It should be noted that the features of the first reflective structure 21, the second reflective structure 22, the first light emitting structure 31, and the second light emitting structure 32 are similar to those of the foregoing first embodiment, and are not described herein again.

接著，請複參閱圖6及圖7所示，延伸反射結構27可包括一連接於第一反射結構21的第一延伸反射部271以及一連接於第二反射結構22的第二延伸反射部272。基準平面S可位於第一延伸反射部271以及第二延伸反射部272之間，第一延伸反射部271可設置於鄰近第一外側面S1且位於第一外側面S1以外的位置，第二延伸反射部272可設置於鄰近第二外側面S2且位於第二外側面S2以外的位置。另外，第一延伸反射部271及第二延伸反射部272可通過以橢圓為基礎的曲面或曲率所組成。優選地，第一延伸反射部271的曲面曲率與第一反射結構21相同，而第二延伸反射部272的曲面曲率與第二反射結構22相同，然本發明不以此為限。換句話說，第一延伸反射部271是第一反射結構21的橢球反射面的延伸，第二延伸反射部272是第二反射結構22的橢球反射面的延伸。 Next, as shown in FIG. 6 and FIG. 7 , the extended reflection structure 27 may include a first extended reflection portion 271 connected to the first reflection structure 21 and a second extended reflection portion 272 connected to the second reflection structure 22 . . The reference plane S may be located between the first extended reflection portion 271 and the second extended reflection portion 272. The first extended reflection portion 271 may be disposed adjacent to the first outer side surface S1 and located outside the first outer side surface S1, and the second extension The reflecting portion 272 may be disposed at a position adjacent to the second outer side surface S2 and located outside the second outer side surface S2. In addition, the first extended reflection portion 271 and the second extended reflection portion 272 may be composed of a curved surface or curvature based on an ellipse. Preferably, the curvature of the curved surface of the first extended reflecting portion 271 is the same as that of the first reflective structure 21, and the curvature of the curved surface of the second extended reflecting portion 272 is the same as that of the second reflective structure 22, but the invention is not limited thereto. In other words, the first extended reflection portion 271 is an extension of the ellipsoidal reflection surface of the first reflection structure 21, and the second extension reflection portion 272 is an extension of the ellipsoidal reflection surface of the second reflection structure 22.

承上述，請參閱圖8及圖9所示，圖8及圖9為本發明第二實施例延伸反射結構與第一反射結構及第二反射結構位置分佈的立體示意圖。為進一步說明延伸反射結構27的設置位置，圖8及圖9中進一步以收光錐面11以及一預設錐面PC進行說明。預設錐面PC為一相對且對稱於收光錐面11的假想錐面。詳細來說，第一反射結構21以及第二反射結構22位於預設錐面PC的範圍中。也就是說，第一反射結構21以及第二反射結構22的大小及位置是通過透鏡單元1的收光錐面11而定義。另外，延伸反射結構27則是位於預設錐面PC以外的區域。通過延伸反射結構27的設置，可以提升光線投射裝置U整體的組裝便利性且提升發光單元3的光線利用性。 Referring to FIG. 8 and FIG. 9 , FIG. 8 and FIG. 9 are schematic perspective views showing the position distribution of the extended reflection structure, the first reflection structure and the second reflection structure according to the second embodiment of the present invention. To further illustrate the arrangement position of the extended reflection structure 27, the light-receiving tapered surface 11 and a predetermined tapered surface PC are further illustrated in FIGS. 8 and 9. The preset tapered surface PC is an imaginary tapered surface that is opposite and symmetrical to the light collecting cone surface 11. In detail, the first reflective structure 21 and the second reflective structure 22 are located in the range of the preset tapered surface PC. That is, the size and position of the first reflective structure 21 and the second reflective structure 22 are defined by the light-receiving tapered surface 11 of the lens unit 1. In addition, the extended reflection structure 27 is an area located outside the preset tapered surface PC. By extending the arrangement of the reflection structure 27, the assembly convenience of the entire light projection device U can be improved and the light utilization of the light-emitting unit 3 can be improved.

[第三實施例] [Third embodiment]

首先，請參閱圖10至圖12所示，圖10及圖11分別為本發明第三實施例光線投射裝置U的立體示意圖，圖12為本發明第三實施例光線投射裝置U的側視剖面示意圖。由圖10及圖11與圖1及圖2的比較可知，第三實施例與第一實施例最大的差別在於：第三實施例所提供的光線投射裝置U還進一步包括一第一弧面反射結構25以及一第二弧面反射結構26。第一弧面反射結構25以及一第二弧面反射結構26可用於增加第一發光結構31及第二發光結構32所產生的光線的再利用性。須說明的是，第一反射結構21、第二反射結構22第一發光結構31以及第二發光結構32等特徵與前述第一實施例相仿，在此容不再贅述。 First, referring to FIG. 10 to FIG. 12, FIG. 10 and FIG. 11 are respectively a perspective view of a ray casting device U according to a third embodiment of the present invention, and FIG. 12 is a side cross-sectional view of a ray casting device U according to a third embodiment of the present invention. schematic diagram. 10 and FIG. 11 and FIG. 1 and FIG. 2, the maximum difference between the third embodiment and the first embodiment is that the ray projection device U provided by the third embodiment further includes a first curved surface reflection. Structure 25 and a second curved reflective structure 26. The first curved reflective structure 25 and the second curved reflective structure 26 can be used to increase the reusability of the light generated by the first light emitting structure 31 and the second light emitting structure 32. It should be noted that the features of the first reflective structure 21, the second reflective structure 22, the first light emitting structure 31, and the second light emitting structure 32 are similar to those of the foregoing first embodiment, and are not described herein again.

詳細來說，請複參閱圖10至圖12所示，第一弧面反射結構25以及第二弧面反射結構26可連接於第一反射結構21及第二反射結構22，或者是使得第一弧面反射結構25以及第二弧面反射結構26不連接於第一反射結構21及第二反射結構22。另外，須說明的是，附圖中為了凸顯第一反射結構21以及第二反射結構22的形狀，因此，將第一弧面反射結構25以及第二弧面反射結構26與第一反射結構21及第二反射結構22分離表示。進一步來說，第一弧面反射結構25可設置於鄰近第一外側面S1且位於第一外側面S1以外的位置，第二弧面反射結構26可設置於鄰近第二外側面S2且位於第二外側面S2以外的位置。第一弧面反射結構25以及第二弧面反射結構26主要的作用在於進一步增加第一發光結構31及第二發光結構32所產生的光線的再利用性，雖然大部分通過第一弧面反射結構25及第二弧面反射結構26反射後所產生的光線並未投射到透鏡單元1中，但是，通過第一弧面反射結構25及第二弧面反射結構26反射後所產生的光線仍然能夠進一步地被利用。 In detail, referring to FIG. 10 to FIG. 12, the first curved reflective structure 25 and the second curved reflective structure 26 may be connected to the first reflective structure 21 and the second reflective structure 22, or may be made first. The curved reflecting structure 25 and the second curved reflecting structure 26 are not connected to the first reflective structure 21 and the second reflective structure 22. In addition, it should be noted that in order to highlight the shapes of the first reflective structure 21 and the second reflective structure 22, the first curved reflective structure 25 and the second curved reflective structure 26 and the first reflective structure 21 are And the second reflective structure 22 is separated and represented. Further, the first curved surface reflection structure 25 may be disposed adjacent to the first outer side surface S1 and located outside the first outer side surface S1, and the second curved surface reflection structure 26 may be disposed adjacent to the second outer side surface S2 and located at the The position other than the outer side S2. The first curved surface reflecting structure 25 and the second curved surface reflecting structure 26 mainly serve to further increase the reusability of the light generated by the first light emitting structure 31 and the second light emitting structure 32, although most of the first curved surface reflection The light generated by the reflection of the structure 25 and the second curved reflecting structure 26 is not projected into the lens unit 1, but the light generated by the reflection of the first curved reflecting structure 25 and the second curved reflecting structure 26 is still Can be further utilized.

優選地，如圖12所示，以本發明實施例而言，第一弧面反射結構25及第二弧面反射結構26可以為由拋物曲面或曲率所組成的反射結構，因此，投射到第一弧面反射結構25及第二弧面反射結構26上的光線可以分別平行於第一弧面反射結構25的光軸(圖中未標號，光軸位置與透鏡光軸A重合)及第二弧面反射結構26的光軸(圖中未標號，光軸位置與透鏡光軸A重合)而投射而出。然而，須特別說明的是，在其他實施例中，第一弧面反射結構25及第二弧面反射結構26也可以為具有非拋物曲率所組成的反射結構。換句話說，只要第一弧面反射結構25及第二弧面反射結構26能分別接收到第二發光結構32及第一發光結構31的光線，都可以進一步地被利用。 Preferably, as shown in FIG. 12, in the embodiment of the present invention, the first curved reflective structure 25 and the second curved reflective structure 26 may be a reflective structure composed of a parabolic curved surface or a curvature, and therefore, projected to the first The light on the arcuate reflecting structure 25 and the second arc reflecting structure 26 may be parallel to the optical axis of the first arc reflecting structure 25 (not labeled in the figure, the optical axis position coincides with the optical axis A of the lens) and the second The optical axis of the arcuate reflection structure 26 (not numbered in the drawing, the position of the optical axis coincides with the optical axis A of the lens) is projected. However, it should be particularly noted that in other embodiments, the first curved reflective structure 25 and the second curved reflective structure 26 may also be reflective structures having non-parabolic curvature. In other words, as long as the first curved surface reflecting structure 25 and the second curved reflecting structure 26 can receive the light of the second light emitting structure 32 and the first light emitting structure 31, respectively, they can be further utilized.

承上述，請複參閱圖12，當第一弧面反射結構25及第二弧面反射結構26為拋物曲面或曲率所組成的反射結構，第一弧面反射結構25可具有一焦點25a，第二弧面反射結構26可具有一焦點26a，第一發光結構31可對應於第二弧面反射結構26的焦點26a，第二發光結構32可對應於第一弧面反射結構25的焦點25a。詳細來說，第一發光結構31鄰近於第二弧面反射結構26的焦點26a或直接設置在第二弧面反射結構26的焦點26a上，而第二發光結構32鄰近於第一弧面反射結構25的焦點25a或直接設置在第一弧面反射結構25的焦點25a上。本發明將以第一發光結構31設置在第二弧面反射結構26的焦點26a上，且第二發光結構32設置在第一弧面反射結構25的焦點25a上的實施方式進行說明。換句話說，第一弧面反射結構25的焦點25a可以與第二反射結構22的第一焦點22a重合，且第二弧面反射結構26的焦點26a可以與第一反射結構21的第一焦點21a重合。 Referring to FIG. 12, when the first curved surface reflection structure 25 and the second curved surface reflection structure 26 are reflective structures composed of a parabolic curved surface or a curvature, the first curved surface reflection structure 25 may have a focus 25a, The two-arc reflection structure 26 can have a focus 26a, the first illumination structure 31 can correspond to the focus 26a of the second arcuate reflection structure 26, and the second illumination structure 32 can correspond to the focus 25a of the first arcuate reflection structure 25. In detail, the first light emitting structure 31 is adjacent to the focus 26a of the second curved reflecting structure 26 or directly disposed on the focus 26a of the second curved reflecting structure 26, and the second light emitting structure 32 is adjacent to the first curved surface reflecting The focus 25a of the structure 25 is disposed directly on the focus 25a of the first curved reflective structure 25. The present invention will be described with an embodiment in which the first light emitting structure 31 is disposed on the focal point 26a of the second curved reflecting structure 26, and the second light emitting structure 32 is disposed on the focal point 25a of the first curved reflecting structure 25. In other words, the focus 25a of the first curved reflective structure 25 may coincide with the first focus 22a of the second reflective structure 22, and the focus 26a of the second curved reflective structure 26 may be the first focus of the first reflective structure 21. 21a coincides.

藉此，如圖12所示，第一發光結構31所產生的一第一射出光線P12能朝向第二弧面反射結構26的方向投射，第二發光結構32所產生的一第二射出光線P22能朝向第一弧面反射結構25的方向投射。接著，第一射出光線P12能通過第二弧面反射結構26的反射，以形成一第一照射光線R12，而第二射出光線P22能通過第一弧面反射結構25的反射，以形成一第二照射光線R22。另外，須特別說明的是，投射到第一反射結構21及第二反射結構22上的光線與前述第一實施例相仿，在此容不再贅述。換句話說，第三實施例中所說明的第一弧面反射結構25以及第二弧面反射結構26可應用於各個實施例中。 Therefore, as shown in FIG. 12, a first emitted light P12 generated by the first light emitting structure 31 can be projected toward the second arc reflecting structure 26, and a second emitted light P22 generated by the second light emitting structure 32. a square that can face the first curved surface reflecting structure 25 Projection. Then, the first emitted light P12 can be reflected by the second curved reflecting structure 26 to form a first illuminated light R12, and the second emitted light P22 can be reflected by the first curved reflective structure 25 to form a first The second illuminating light R22. In addition, it should be particularly noted that the light rays projected onto the first reflective structure 21 and the second reflective structure 22 are similar to those of the foregoing first embodiment, and are not described herein again. In other words, the first curved reflective structure 25 and the second curved reflective structure 26 illustrated in the third embodiment can be applied to various embodiments.

請參閱圖13所示，圖13為第一發光結構31及第二發光結構32分別對第二弧面反射結構26及第一弧面反射結構25所產生的光型示意圖。須特別說明的是，在此光型示意圖中是以第一弧面反射結構25以及第二弧面反射結構26為拋物曲面進行舉例。由於投射到拋物面上的光線能通過拋物面的反射而形成平行光，藉此，第三實施例所提供的光線投射裝置U優選可應用於探照燈等須要長距離光照射的產品。 Referring to FIG. 13 , FIG. 13 is a schematic diagram of light patterns generated by the first light-emitting structure 31 and the second light-emitting structure 32 respectively on the second curved surface reflection structure 26 and the first curved surface reflection structure 25 . It should be particularly noted that in the light pattern diagram, the first curved surface reflecting structure 25 and the second curved surface reflecting structure 26 are parabolic curved surfaces. Since the light projected onto the paraboloid can form parallel light by the reflection of the paraboloid, the light projection device U provided by the third embodiment can be preferably applied to a product such as a searchlight that requires long-distance light irradiation.

[第四實施例] [Fourth embodiment]

首先，請參閱圖14至圖17所示，圖14及圖15分別為本發明第四實施例光線投射裝置U的立體示意圖，圖17及圖18分別為圖16的側視轉正剖面示意圖。由圖14及圖15與圖1及圖2的比較可知，第四實施例與第一實施例最大的差別在於：第四實施例所提供的光線投射裝置U還進一步包括一第三反射結構23，且發光單元3還進一步包括一第三發光結構33。舉例來說，以本發明第三實施例而言，第一反射結構21、第二反射結構22以及第三反射結構23的整體形狀及特徵可彼此相同，因此，第一反射結構21、第二反射結構22以及第三反射結構23大致上可以透鏡光軸A作為幾何中心而呈等角分佈。同時，第一發光結構31、第二發光結構32及第三發光結構33大致上也可以透鏡光軸A作為幾何中心而呈等角分佈。另外，第一反射結構21、第二反射結構22以及第三反射結構23彼此相互連接，且透鏡光軸A通過第一反射結構21、第二反射結構22以及第三反射結構23的連接處。 First, referring to FIG. 14 to FIG. 17, FIG. 14 and FIG. 15 are respectively a perspective view of a ray projection device U according to a fourth embodiment of the present invention, and FIGS. 17 and 18 are respectively a side elevational cross-sectional view of FIG. 16. 14 and FIG. 15 and FIG. 1 and FIG. 2, the maximum difference between the fourth embodiment and the first embodiment is that the ray projection device U provided by the fourth embodiment further includes a third reflective structure 23 . And the light emitting unit 3 further includes a third light emitting structure 33. For example, in the third embodiment of the present invention, the overall shapes and features of the first reflective structure 21, the second reflective structure 22, and the third reflective structure 23 may be identical to each other, and thus, the first reflective structure 21, the second The reflective structure 22 and the third reflective structure 23 are substantially equiangularly distributed with the optical axis A of the lens as a geometric center. Meanwhile, the first light emitting structure 31, the second light emitting structure 32, and the third light emitting structure 33 may also be substantially equiangularly distributed as the geometric center of the lens optical axis A. In addition, the first reflective structure 21, the second reflective structure 22, and The third reflective structures 23 are connected to each other, and the lens optical axis A passes through the junction of the first reflective structure 21, the second reflective structure 22, and the third reflective structure 23.

另外，請複參閱圖14至圖18所示，須特別說明的是，第四實施例與第一實施例最大的差別僅在於第四實施例中進一步增加了第三反射結構23及第三發光結構33，且第一反射結構21、第二反射結構22以及第三反射結構23大致上可以透鏡光軸A作為幾何中心而呈等角分佈。因此，第一反射結構21、第二反射結構22、第一發光結構31以及第二發光結構32等特徵都與前述第一實施例相仿。同時，第一反射光線R11、第二反射光線R21、收光錐面11、第一軸線T1、第二軸線T2、第一預定軸線E1以及第二預定軸線E2等定義也都是與前述第一實施例相仿，在此容不再贅述。 In addition, referring to FIG. 14 to FIG. 18, it should be particularly noted that the greatest difference between the fourth embodiment and the first embodiment is that the third reflective structure 23 and the third illumination are further added in the fourth embodiment. The structure 33, and the first reflective structure 21, the second reflective structure 22, and the third reflective structure 23 are substantially equiangularly distributed with the lens optical axis A as a geometric center. Therefore, the features of the first reflective structure 21, the second reflective structure 22, the first light emitting structure 31, and the second light emitting structure 32 are similar to those of the foregoing first embodiment. At the same time, the first reflected light R11, the second reflected light R21, the light collecting cone 11, the first axis T1, the second axis T2, the first predetermined axis E1, and the second predetermined axis E2 are also defined as the first The embodiments are similar and will not be described again here.

承上述，請複參閱圖14至圖18所示，以下僅針對不同於第一實施例的部分進行說明。藉此，如圖17所示，第一反射結構21的第一焦點21a、第二反射結構22的第一焦點22a以及第三反射結構23的第一焦點23a所構成的平面可定義為一預設平面PS，預設平面PS可與基準平面S之間具有一介於80度至100度之間的預設角度β，優選地，預設角度β可介於85度至95度之間，更優選地，預設角度β可為90度。以本發明實施例而言，預設平面PS可與基準平面S大致呈垂直設置，然本發明不以此為限。另外，須特別說明的是，沿著圖16的XVII-XVII剖線的轉正剖面示意圖(如圖17所示)所形成的附圖內容將會與圖3大致相同，在此容不再贅述。 In view of the above, please refer to FIG. 14 to FIG. 18, and only the portions different from the first embodiment will be described below. Thereby, as shown in FIG. 17, the plane formed by the first focus 21a of the first reflective structure 21, the first focus 22a of the second reflective structure 22, and the first focus 23a of the third reflective structure 23 may be defined as a pre- The plane PS is provided, and the preset plane PS can have a preset angle β between 80 degrees and 100 degrees with the reference plane S. Preferably, the preset angle β can be between 85 degrees and 95 degrees. Preferably, the preset angle β may be 90 degrees. In the embodiment of the present invention, the preset plane PS may be disposed substantially perpendicular to the reference plane S, but the invention is not limited thereto. In addition, it should be particularly noted that the drawings formed by the schematic cross-sectional view (shown in FIG. 17) along the line XVII-XVII of FIG. 16 will be substantially the same as FIG. 3 and will not be further described herein.

接著，如圖18所示，詳細來說，第三反射結構23具有一位於鄰近第一外側面S1且位於第一外側面S1以外的第一焦點23a以及對應第三反射結構23的第一焦點23a的一第二焦點23b。另外，第三發光結構33可對應第三反射結構23的第一焦點23a，且第三發光結構33可設置於鄰近第一外側面S1且位於第一外側面 S1以外的位置。同時，第三發光結構33所產生的一第三投射光線P31能朝向第三反射結構23的方向以及基準平面S的方向投射。優選地，第一反射結構21的第二焦點21b可位於透鏡光軸A上或者是鄰近於透鏡光軸A，第二反射結構22的第二焦點可位於透鏡光軸A上或者是鄰近於透鏡光軸A，第三反射結構23的第二焦點23b位於透鏡光軸A上或者是鄰近於透鏡光軸A。藉此，第一反射結構21的第二焦點21b、第二反射結構22的第二焦點22b、第三反射結構23的第二焦點23b以及透鏡焦點1a四者可相互重合，或者是第一反射結構21的第二焦點21b、第二反射結構22的第二焦點22b以及第三反射結構23的第二焦點23b的連線可以形成一虛擬平面。 Next, as shown in FIG. 18, in detail, the third reflective structure 23 has a first focus 23a located adjacent to the first outer side S1 and located outside the first outer side S1 and a first focus corresponding to the third reflective structure 23. A second focus 23b of 23a. In addition, the third light emitting structure 33 may correspond to the first focus 23a of the third reflective structure 23, and the third light emitting structure 33 may be disposed adjacent to the first outer side S1 and located on the first outer side A location other than S1. At the same time, a third projected light ray P31 generated by the third light emitting structure 33 can be projected toward the direction of the third reflective structure 23 and the direction of the reference plane S. Preferably, the second focus 21b of the first reflective structure 21 may be located on the optical axis A of the lens or adjacent to the optical axis A of the lens, and the second focus of the second reflective structure 22 may be located on the optical axis A of the lens or adjacent to the lens. The optical axis A, the second focus 23b of the third reflective structure 23 is located on the optical axis A of the lens or adjacent to the optical axis A of the lens. Thereby, the second focus 21b of the first reflective structure 21, the second focus 22b of the second reflective structure 22, the second focus 23b of the third reflective structure 23, and the lens focus 1a may coincide with each other or be the first reflection. The line connecting the second focus 21b of the structure 21, the second focus 22b of the second reflective structure 22, and the second focus 23b of the third reflective structure 23 may form a virtual plane.

承上述，請複參閱圖18所示，第三發光結構33具有一第三發光面331，且第三投射光線P31能沿著第三發光面331的一第三法線方向D3朝向第三反射結構23的方向以及基準平面S的方向投射。接著，第三投射光線P31通過第三反射結構23的反射，可以形成一通過第三反射結構23的第二焦點23b的第三反射光線R31。 As shown in FIG. 18, the third light emitting structure 33 has a third light emitting surface 331, and the third projected light P31 can be directed toward the third reflection along a third normal direction D3 of the third light emitting surface 331. The direction of the structure 23 and the direction of the reference plane S are projected. Then, the third projected light P31 is reflected by the third reflective structure 23 to form a third reflected light R31 passing through the second focus 23b of the third reflective structure 23.

承上述，請複參閱圖18所示，光線投射裝置U還可進一步包括一第三軸線T3，第三軸線T3能通過第三反射結構23的第一焦點23a與透鏡光軸A。同時，透鏡單元1的一收光錐面11還進一步包括一第三延伸段113，第三延伸段113可對應第三反射結構23的第一焦點23a，且第三軸線T3可大致垂直於第三延伸段113。進一步來說，如圖17及圖18所示，第一反射結構21的第一焦點21a、第二反射結構22的第一焦點22a以及第三反射結構23的第一焦點23a都位於第一延伸段111、第二延伸段112以及第三延伸段113之間。優選地，以本發明實施例而言，第一延伸段111可通過第一反射結構21的第一焦點21a、第二延伸段112可通過第二反射結構22的第一焦點22a且第三延伸段113可通過第三反射結構23的第一焦點23a。 In view of the above, as shown in FIG. 18, the light projection device U may further include a third axis T3 that can pass through the first focus 23a of the third reflective structure 23 and the lens optical axis A. At the same time, a light collecting cone 11 of the lens unit 1 further includes a third extending portion 113, the third extending portion 113 can correspond to the first focus 23a of the third reflective structure 23, and the third axis T3 can be substantially perpendicular to the first Three extensions 113. Further, as shown in FIG. 17 and FIG. 18, the first focus 21a of the first reflective structure 21, the first focus 22a of the second reflective structure 22, and the first focus 23a of the third reflective structure 23 are all located at the first extension. Between the segment 111, the second extension 112, and the third extension 113. Preferably, in the embodiment of the present invention, the first extension 111 can pass through the first focus 21a of the first reflective structure 21, and the second extension 112 can pass through the first focus 22a and the third extension of the second reflective structure 22. Segment 113 can pass the third reflection The first focus 23a of the structure 23.

承上述，請複參閱圖14及圖18所示，反射單元2還進一步包括一位於第一反射結構21、第二反射結構22以及第三反射結構23上的反射表面2S，透鏡光軸A與反射表面2S之間可具有一交錯點J0，第三軸線T3與透鏡光軸A之間可具有一第三交點J3，且交錯點J0至透鏡焦點1a之間的預定距離L0小於第三交點J3至透鏡焦點1a之間的一第三距離L3。進一步來說，交錯點J0與第三反射結構23的第一焦點23a之間可具有一第三預定軸線E3，且第三預定軸線E3與第三軸線T3之間可具有一介於7度至31度之間的第三預定角度θ3，優選地，第三預定角度θ3可介於10.5度至27.5度之間，更優選地，第三預定角度θ3可介於13.5度至24.5度之間。進一步來說，預設平面PS與透鏡光軸A之間可具有一交叉點M，交錯點J0可位於第一交點J1與交叉點M之間。此外，交錯點J0可位於第二交點J2與交叉點M之間。再者，交錯點J0可位於第三交點J3與交叉點M之間。 In the above, as shown in FIG. 14 and FIG. 18, the reflection unit 2 further includes a reflective surface 2S on the first reflective structure 21, the second reflective structure 22, and the third reflective structure 23, and the optical axis A of the lens There may be a staggered point J0 between the reflective surface 2S, a third intersection J3 between the third axis T3 and the optical axis A of the lens, and a predetermined distance L0 between the interlaced point J0 and the lens focus 1a is smaller than the third intersection J3. A third distance L3 to between the lens focus 1a. Further, the interlaced point J0 and the first focus 23a of the third reflective structure 23 may have a third predetermined axis E3, and the third predetermined axis E3 and the third axis T3 may have a distance between 7 degrees and 31. The third predetermined angle θ3 between degrees, preferably, the third predetermined angle θ3 may be between 10.5 degrees and 27.5 degrees, and more preferably, the third predetermined angle θ3 may be between 13.5 degrees and 24.5 degrees. Further, the preset plane PS and the lens optical axis A may have an intersection M, and the interlace point J0 may be located between the first intersection J1 and the intersection M. Further, the interlaced point J0 may be located between the second intersection J2 and the intersection M. Furthermore, the interlaced point J0 may be located between the third intersection J3 and the intersection M.

承上述，請複參閱圖17及圖18所示，一第一切線G1能通過交錯點J0且與第一反射結構21相切，且第一切線G1與透鏡光軸A之間可具有介於47度至64.5度之間的第一切角α1，一第二切線G2能通過交錯點J0且與第二反射結構22相切，且第二切線G2與透鏡光軸A之間具有介於47度至64.5度之間的第二切角α2，一第三切線G3能通過交錯點J0且與第三反射結構23相切，且第三切線G3與透鏡光軸A之間具有介於47度至64.5度之間的第三切角α3。進一步來說，優選地，第一切角α1、第二切角α2以及第三切角α3可介於50度至61.5度之間，更優選地，第一切角α1、第二切角α2以及第三切角α3可介於53度至58.5度之間。 In the above, as shown in FIG. 17 and FIG. 18, a first tangent line G1 can pass through the interlaced point J0 and is tangent to the first reflective structure 21, and the first tangent line G1 and the lens optical axis A can have A first tangent angle α1 between 47 degrees and 64.5 degrees, a second tangent line G2 can pass through the interlaced point J0 and is tangent to the second reflective structure 22, and the second tangent line G2 and the optical axis A of the lens are interposed. A second tangent angle α2 between 47 degrees and 64.5 degrees, a third tangent line G3 can pass through the interlaced point J0 and is tangent to the third reflective structure 23, and the third tangent line G3 and the lens optical axis A have a A third cut angle α3 between 47 degrees and 64.5 degrees. Further, preferably, the first cut angle α1, the second cut angle α2, and the third cut angle α3 may be between 50 degrees and 61.5 degrees, and more preferably, the first cut angle α1 and the second cut angle α2 And the third cut angle α3 may be between 53 degrees and 58.5 degrees.

[第五實施例] [Fifth Embodiment]

首先，請參閱圖19及圖20所示，圖19及圖20分別為本發明第五實施例光線投射裝置U的立體示意圖。由圖19及圖20與圖1及圖2的比較可知，第五實施例與第一實施例最大的差別在於：第五實施例所提供的光線投射裝置U還進一步包括一第三反射結構23以及一第四反射結構24，且發光單元3還進一步包括一第三發光結構33以及一第四發光結構34。再者，由圖19及圖20與圖14及圖15的比較可知，第五實施例與第四實施例最大的差別在於：第五實施例所提供的光線投射裝置U還進一步包括一第四反射結構24以及一第四發光結構34。換句話說，第五實施例中所提供的光線投射裝置U中的第一反射結構21、第二反射結構22、第三反射結構23以及第四反射結構24大致上可以透鏡光軸A作為幾何中心而呈等角分佈。同時，第一發光結構31、第二發光結構32、第三發光結構33以及第四發光結構34大致上也可以透鏡光軸A作為幾何中心而呈等角分佈。另外，第一反射結構21、第二反射結構22、第三反射結構23以及第四反射結構24彼此相互連接，且透鏡光軸A通過第一反射結構21、第二反射結構22、第三反射結構23以及第四反射結構24的連接處。 First, please refer to FIG. 19 and FIG. 20, and FIG. 19 and FIG. 20 are respectively A perspective view of a light projection device U of a fifth embodiment. It can be seen from the comparison between FIG. 19 and FIG. 20 and FIG. 1 and FIG. 2 that the maximum difference between the fifth embodiment and the first embodiment is that the ray projection device U provided by the fifth embodiment further includes a third reflective structure 23 . And a fourth reflective structure 24, and the light emitting unit 3 further includes a third light emitting structure 33 and a fourth light emitting structure 34. Furthermore, the comparison between FIG. 19 and FIG. 20 and FIG. 14 and FIG. 15 shows that the maximum difference between the fifth embodiment and the fourth embodiment is that the ray projection device U provided by the fifth embodiment further includes a fourth The reflective structure 24 and a fourth light emitting structure 34. In other words, the first reflective structure 21, the second reflective structure 22, the third reflective structure 23, and the fourth reflective structure 24 in the ray-projecting device U provided in the fifth embodiment can substantially be the lens optical axis A as a geometry. The center is equiangular. Meanwhile, the first light emitting structure 31, the second light emitting structure 32, the third light emitting structure 33, and the fourth light emitting structure 34 may also be substantially equiangularly distributed as the geometric center of the lens optical axis A. In addition, the first reflective structure 21, the second reflective structure 22, the third reflective structure 23, and the fourth reflective structure 24 are connected to each other, and the optical axis A of the lens passes through the first reflective structure 21, the second reflective structure 22, and the third reflection. The junction of the structure 23 and the fourth reflective structure 24.

另外，請複參閱圖19及圖20所示，須特別說明的是，第五實施例與第四實施例最大的差別僅在於第五實施例中進一步增加了第四反射結構24及第四發光結構34，而第一反射結構21、第二反射結構22、第三反射結構23、第一發光結構31、第二發光結構32以及第三發光結構33等特徵都與前述第四實施例相仿，在此容不再贅述。 In addition, please refer to FIG. 19 and FIG. 20, it should be particularly noted that the greatest difference between the fifth embodiment and the fourth embodiment is that the fourth reflection structure 24 and the fourth illumination are further increased in the fifth embodiment. The structure 34, and the features of the first reflective structure 21, the second reflective structure 22, the third reflective structure 23, the first light emitting structure 31, the second light emitting structure 32, and the third light emitting structure 33 are similar to the foregoing fourth embodiment. I will not repeat them here.

承上述，請複參閱圖19及圖20所示，以下僅針對不同於第一實施例及第四實施例的部分進行說明。第四反射結構24具有一位於鄰近第二外側面S2且位於第二外側面S2以外的第一焦點(圖中未示出)以及對應第四反射結構24的第一焦點的一第二焦點(圖中未示出)，第四發光結構34可對應第四反射結構24的第一焦點，且第四發光結構34設置於鄰近第二外側面S2且位於第二外側面S2以外的位置。藉此，第四發光結構所產生的一第四投射光線(圖中未示出)能朝向第四反射結構24的方向以及基準平面S的方向投射。優選地，第四發光結構34可設置於第四反射結構24的第一焦點上。另外，第四反射結構24的第二焦點可位於透鏡光軸A上或者是鄰近於透鏡光軸A。優選地，第一反射結構21的第二焦點21b、第二反射結構22的第二焦點22b、第三反射結構23的第二焦點23b、第四反射結構24的第二焦點以及透鏡焦點1a可相互重合。 In view of the above, please refer to FIG. 19 and FIG. 20, and only parts different from the first embodiment and the fourth embodiment will be described below. The fourth reflective structure 24 has a first focus (not shown) adjacent to the second outer side S2 and outside the second outer side S2 and a second focus corresponding to the first focus of the fourth reflective structure 24 ( The fourth light emitting structure 34 can correspond to the first focus of the fourth reflective structure 24, and the fourth light emitting structure 34 is disposed adjacent to the second outer side S2 and located at the second outer A position other than the side S2. Thereby, a fourth projected light (not shown) generated by the fourth light emitting structure can be projected toward the direction of the fourth reflective structure 24 and the direction of the reference plane S. Preferably, the fourth light emitting structure 34 may be disposed on the first focus of the fourth reflective structure 24. Additionally, the second focus of the fourth reflective structure 24 can be on the optical axis A of the lens or adjacent to the optical axis A of the lens. Preferably, the second focus 21b of the first reflective structure 21, the second focus 22b of the second reflective structure 22, the second focus 23b of the third reflective structure 23, the second focus of the fourth reflective structure 24, and the lens focus 1a may Coincident with each other.

另外，值得說明的是，圖19及圖20的轉正剖面(圖中未示出)也可以具有如同前述實施例的各個特徵。因此，第五實施例中所提供的光線投射裝置U還可以進一步包括一通過第四反射結構24的第一焦點與透鏡光軸A的第四軸線(圖中未示出)，且透鏡單元1的收光錐面11也可以進一步包括一對應第四反射結構24的第一焦點第四延伸段(圖中未示出)，且第四軸線大致垂直於第四延伸段。再者，第一反射結構21的第一焦點21a、第二反射結構22的第一焦點22a、第三反射結構23的第一焦點23a以及第四反射結構24的第一焦點都位於第一延伸段111、第二延伸段112、第三延伸段113以及第四延伸段之間，或者是第一延伸段111可通過第一反射結構21的第一焦點21a、第二延伸段112可通過第二反射結構22的第一焦點22a、第三延伸段113可通過第三反射結構23的第一焦點23a且第四延伸段可通過第四反射結構24的第一焦點。進一步來說，第四軸線與透鏡光軸A之間可具有一第四交點(圖中未示出)，交錯點J0至透鏡焦點1a之間的預定距離L0小於第四交點至透鏡焦點1a之間的一第四距離(圖中未示出)。此外，交錯點J0與第四反射結構24的第一焦點之間具有一第四預定軸線(圖中未示出)，第四預定軸線與第四軸線之間同樣可具有一介於7度至31度之間的第四預定角度(圖中未示出)，優選地，第四預定角度可介於10.5度至27.5度之間，更優選地，第四預定角度可介於 13.5度至24.5度之間。 In addition, it is worth noting that the positive cross section (not shown) of Figs. 19 and 20 may also have various features as in the foregoing embodiments. Therefore, the ray-projecting device U provided in the fifth embodiment may further include a fourth axis (not shown) passing through the first focus of the fourth reflective structure 24 and the lens optical axis A, and the lens unit 1 The light collecting cone 11 may further include a first focus fourth extension (not shown) corresponding to the fourth reflective structure 24, and the fourth axis is substantially perpendicular to the fourth extension. Furthermore, the first focus 21a of the first reflective structure 21, the first focus 22a of the second reflective structure 22, the first focus 23a of the third reflective structure 23, and the first focus of the fourth reflective structure 24 are all located at the first extension. Between the segment 111, the second extension 112, the third extension 113, and the fourth extension, or the first extension 111 can pass through the first focus 21a and the second extension 112 of the first reflective structure 21 The first focus 22a, the third extension 113 of the second reflective structure 22 may pass through the first focus 23a of the third reflective structure 23 and the fourth extension may pass through the first focus of the fourth reflective structure 24. Further, the fourth axis and the lens optical axis A may have a fourth intersection (not shown), and the predetermined distance L0 between the interlaced point J0 and the lens focus 1a is smaller than the fourth intersection to the lens focus 1a. A fourth distance between the two (not shown). In addition, there is a fourth predetermined axis (not shown) between the staggered point J0 and the first focus of the fourth reflective structure 24, and the fourth predetermined axis and the fourth axis may also have a distance between 7 degrees and 31. a fourth predetermined angle between degrees (not shown), preferably, the fourth predetermined angle may be between 10.5 degrees and 27.5 degrees, and more preferably, the fourth predetermined angle may be between 13.5 degrees to 24.5 degrees.

[實施例的有益效果] [Advantageous Effects of Embodiments]

本發明的有益效果在於，本發明實施例所提供的光線投射裝置U能利用“第一發光結構31所產生的一第一投射光線P11能朝向第一反射結構21的方向以及基準平面S的方向投射，第二發光結構32所產生的一第二投射光線P21能朝向第二反射結構22的方向以及基準平面S的方向投射”的技術方案，而達到“提高集光(聚光)效率”的效果。 The illuminating device U according to the embodiment of the present invention can utilize the direction in which the first projection ray P11 generated by the first illuminating structure 31 can face the first reflecting structure 21 and the direction of the reference plane S. Projecting, a second projection ray P21 generated by the second illuminating structure 32 can be projected toward the direction of the second reflective structure 22 and the direction of the reference plane S, and achieves "increasing the concentration (concentration) efficiency" effect.

以上所述僅為本發明的優選可行實施例，並非因此侷限本發明的專利範圍，所以全部運用本發明說明書及附圖內容所做的等效技術變化，均包含於本發明的保護範圍內。 The above description is only a preferred embodiment of the present invention, and is not intended to limit the scope of the present invention. Therefore, all equivalents of the present invention are included in the scope of the present invention.

Claims

一種光線投射裝置，其包括：一透鏡單元，所述透鏡單元具有一透鏡焦點以及一通過所述透鏡焦點的透鏡光軸，所述透鏡光軸通過一基準平面且平行於所述基準平面，所述基準平面具有一第一外側面以及一相對於所述第一外側面的第二外側面；一反射單元，所述反射單元包括一第一反射結構以及一第二反射結構，所述第一反射結構具有一位於鄰近所述第一外側面且位於所述第一外側面以外的第一焦點以及對應所述第一反射結構的所述第一焦點的一第二焦點，所述第二反射結構具有一位於鄰近所述第二外側面且位於所述第二外側面以外的第一焦點以及一對應所述第二反射結構的所述第一焦點的第二焦點；以及一發光單元，所述發光單元包括一第一發光結構以及一第二發光結構，所述第一發光結構對應所述第一反射結構的所述第一焦點，且所述第一發光結構設置於鄰近所述第一外側面且位於所述第一外側面以外的位置，所述第二發光結構對應所述第二反射結構的所述第一焦點，且所述第二發光結構設置於鄰近所述第二外側面且位於所述第二外側面以外的位置，其中，所述第一發光結構所產生的一第一投射光線能朝向所述第一反射結構的方向以及所述基準平面的方向投射，所述第二發光結構所產生的一第二投射光線能朝向所述第二反射結構的方向以及所述基準平面的方向投射；其中，所述第一發光結構具有一第一發光面，且所述第一投射光線能沿著所述第一發光面的一第一法線方向朝向所述第一反射結構的方向以及所述基準平面的方向投射，所述第二發光結構具有一第二發光面，且所述第二發光結構所產生的一第二投射光線能沿著所述第二發光面的一第二法線方向朝向所述第二反射結構的方向以及所述基準平面的方向投射。 A light projection device comprising: a lens unit having a lens focus and a lens optical axis passing through a focus of the lens, the lens optical axis passing through a reference plane and parallel to the reference plane The reference plane has a first outer side surface and a second outer side surface opposite to the first outer side surface; a reflecting unit, the reflecting unit includes a first reflecting structure and a second reflecting structure, the first The reflective structure has a first focus adjacent to the first outer side and outside the first outer side and a second focus corresponding to the first focus of the first reflective structure, the second reflection The structure has a first focus adjacent to the second outer side and outside the second outer side and a second focus corresponding to the first focus of the second reflective structure; and a light emitting unit The light emitting unit includes a first light emitting structure and a second light emitting structure, the first light emitting structure corresponding to the first focus of the first reflective structure, and the first hair The structure is disposed adjacent to the first outer side surface and located at a position other than the first outer side surface, the second light emitting structure corresponds to the first focus of the second reflective structure, and the second light emitting structure is disposed a position adjacent to the second outer side surface and outside the second outer side surface, wherein a first projected light generated by the first light emitting structure is capable of facing a direction of the first reflective structure and the reference Projecting in a planar direction, a second projected light generated by the second light emitting structure can be projected toward a direction of the second reflective structure and a direction of the reference plane; wherein the first light emitting structure has a first a light emitting surface, and the first projected light can be projected along a first normal direction of the first light emitting surface toward a direction of the first reflective structure and a direction of the reference plane, the second light emitting structure Having a second light emitting surface, and the second light emitting structure is produced A second projected light can be projected along a second normal direction of the second light emitting surface toward a direction of the second reflective structure and a direction of the reference plane.

如請求項1所述的光線投射裝置，其中，所述第一反射結構的所述第一焦點與所述第二反射結構的所述第一焦點之間的連線定義為一預設軸線，所述預設軸線與所述透鏡光軸之間具有一介於80度至100度之間的預設角度。 The ray-projecting device of claim 1, wherein a line between the first focus of the first reflective structure and the first focus of the second reflective structure is defined as a predetermined axis, The predetermined axis and the optical axis of the lens have a predetermined angle between 80 degrees and 100 degrees.

如請求項1所述的光線投射裝置，其中，所述第一投射光線通過所述第一反射結構的反射，以形成一通過所述第一反射結構的所述第二焦點的第一反射光線，所述第二投射光線通過所述第二反射結構的反射，以形成一通過所述第二反射結構的所述第二焦點的第二反射光線。 The ray-projecting device of claim 1, wherein the first projected ray is reflected by the first reflective structure to form a first reflected ray passing through the second focus of the first reflective structure And the second projected light is reflected by the second reflective structure to form a second reflected light passing through the second focus of the second reflective structure.

如請求項1所述的光線投射裝置，其中，一第一軸線能通過所述第一反射結構的所述第一焦點與所述透鏡光軸，且一第二軸線能通過所述第二反射結構的所述第一焦點與所述透鏡光軸，其中，所述透鏡單元具有一收光錐面，所述收光錐面具有一第一延伸段以及一第二延伸段，所述第一延伸段對應所述第一反射結構的所述第一焦點，所述第二延伸段對應所述第二反射結構的所述第一焦點，其中，所述第一軸線大致垂直於所述第一延伸段，所述第二軸線大致垂直於所述第二延伸段。 The ray-projecting device of claim 1, wherein a first axis is capable of passing the first focus of the first reflective structure and the optical axis of the lens, and a second axis is capable of passing the second reflection The first focus of the structure and the optical axis of the lens, wherein the lens unit has a light-receiving cone surface, the light-receiving cone mask has a first extension and a second extension, the first The extension segment corresponds to the first focus of the first reflective structure, the second extension segment corresponds to the first focus of the second reflective structure, wherein the first axis is substantially perpendicular to the first focus An extension, the second axis being substantially perpendicular to the second extension.

如請求項4所述的光線投射裝置，其中，所述第一反射結構的所述第一焦點以及所述第二反射結構的所述第一焦點都位於所述第一延伸段以及所述第二延伸段之間或者是所述第一延伸段通過所述第一反射結構的所述第一焦點且所述第二延伸段通過所述第二反射結構的所述第一焦點。 The ray-projecting device of claim 4, wherein the first focus of the first reflective structure and the first focus of the second reflective structure are both located in the first extension and the first Between the two extensions or the first extension passes the first focus of the first reflective structure and the second extension passes the first focus of the second reflective structure.

如請求項4所述的光線投射裝置，其中，所述反射單元還進一步包括一位於所述第一反射結構與所述第二反射結構上的反射表面，所述透鏡光軸與所述反射表面之間具有一交錯點，其中，所述第一軸線與所述透鏡光軸之間具有一第一交點，所述第二軸線與所述透鏡光軸之間具有一第二交點，所述交錯點至所述透鏡焦點之間的一預定距離小於所述第一交點至所述透鏡焦點之間的一第一距離，所述交錯點至所述透鏡焦點之間的所述預定距離小於所述第二交點至所述透鏡焦點之間的一第二距離。 The ray-projecting device of claim 4, wherein the reflecting unit further comprises a reflective surface on the first reflective structure and the second reflective structure, the optical axis of the lens and the reflective surface Having a point of intersection between them a first intersection between the first axis and the optical axis of the lens, a second intersection between the second axis and the optical axis of the lens, the staggered point to the focus of the lens a predetermined distance therebetween is less than a first distance between the first intersection point and the lens focus, the predetermined distance between the stagger point and the lens focus being less than the second intersection point to the lens A second distance between the focus.

如請求項6所述的光線投射裝置，其中，所述交錯點與所述第一反射結構的所述第一焦點之間具有一第一預定軸線，所述交錯點與所述第二反射結構的所述第一焦點之間具有一第二預定軸線，其中，所述第一預定軸線與所述第一軸線之間具有一介於7度至31度之間的第一預定角度，所述第二預定軸線與所述第二軸線之間具有一介於7度至31度之間的第二預定角度。 The ray-projecting device of claim 6, wherein the interlaced point and the first focus of the first reflective structure have a first predetermined axis, the staggered point and the second reflective structure The first focus has a second predetermined axis therebetween, wherein the first predetermined axis and the first axis have a first predetermined angle between 7 degrees and 31 degrees, the first The second predetermined axis and the second axis have a second predetermined angle between 7 degrees and 31 degrees.

如請求項4所述的光線投射裝置，其中，所述第一反射結構的所述第一焦點與所述第二反射結構的所述第一焦點之間的連線定義為一預設軸線，所述預設軸線與所述透鏡光軸之間具有一交叉點，其中，所述反射單元還進一步包括一位於所述第一反射結構與所述第二反射結構上的反射表面，所述透鏡光軸與所述反射表面之間具有一交錯點，其中，所述第一軸線與所述透鏡光軸之間具有一第一交點，所述交錯點位於所述第一交點與所述交叉點之間。 The ray-projecting device of claim 4, wherein a line between the first focus of the first reflective structure and the first focus of the second reflective structure is defined as a predetermined axis, The predetermined axis has an intersection with the optical axis of the lens, wherein the reflective unit further comprises a reflective surface on the first reflective structure and the second reflective structure, the lens An optical fiber has a staggered point with the reflective surface, wherein the first axis has a first intersection with the optical axis of the lens, and the staggered point is located at the first intersection and the intersection between.

如請求項8所述的光線投射裝置，其中，所述第二軸線與所述透鏡光軸之間具有一第二交點，所述交錯點位於所述第二交點與所述交叉點之間。 The ray-projecting device of claim 8, wherein the second axis has a second intersection with the optical axis of the lens, the staggered point being between the second intersection and the intersection.

如請求項1所述的光線投射裝置，其中，所述第一反射結構的所述第二焦點位於所述透鏡光軸上或者是鄰近於所述透鏡光軸，所述第二反射結構的所述第二焦點位於所述透鏡光軸上或者是鄰近於所述透鏡光軸。 The ray-projecting device of claim 1, wherein the second focus of the first reflective structure is on the optical axis of the lens or adjacent to the optical axis of the lens, the second reflective structure The second focus is on the optical axis of the lens or adjacent to the optical axis of the lens.

如請求項1所述的光線投射裝置，其中，所述第一反射結構的所述第二焦點、所述第二反射結構的所述第二焦點以及所述透鏡焦點三者相互重合。 The ray-projecting device of claim 1, wherein the second focus of the first reflective structure, the second focus of the second reflective structure, and the lens focus coincide with each other.

如請求項1所述的光線投射裝置，其中，所述第一反射結構以及所述第二反射結構彼此相互連接，且所述透鏡光軸通過所述第一反射結構以及所述第二反射結構的連接處。 The ray-projecting device of claim 1, wherein the first reflective structure and the second reflective structure are connected to each other, and the optical axis of the lens passes through the first reflective structure and the second reflective structure Connection.

如請求項1所述的光線投射裝置，其中，所述第一發光結構鄰近於所述第一反射結構的所述第一焦點或直接設置在所述第一反射結構的所述第一焦點上，所述第二發光結構鄰近於所述第二反射結構的所述第一焦點或者是直接設置在所述第二反射結構的所述第一焦點上。 The ray-projecting device of claim 1, wherein the first light-emitting structure is adjacent to the first focus of the first reflective structure or directly disposed on the first focus of the first reflective structure The second light emitting structure is adjacent to the first focus of the second reflective structure or directly disposed on the first focus of the second reflective structure.

如請求項1所述的光線投射裝置，其中，所述反射單元還進一步包括一第一弧面反射結構以及一第二弧面反射結構，所述第一弧面反射結構設置於鄰近所述第一外側面且位於所述第一外側面以外的位置，所述第二弧面反射結構設置於鄰近所述第二外側面且位於所述第二外側面以外的位置。 The ray-projecting device of claim 1, wherein the reflecting unit further comprises a first curved reflecting structure and a second curved reflecting structure, wherein the first curved reflecting structure is disposed adjacent to the first An outer side surface is located at a position other than the first outer side surface, and the second curved surface reflecting structure is disposed adjacent to the second outer side surface and at a position other than the second outer side surface.

如請求項14所述的光線投射裝置，其中，所述第一弧面反射結構以及所述第二弧面反射結構具有拋物曲率，所述第一弧面反射結構具有一焦點，所述第二弧面反射結構具有一焦點，所述第一發光結構對應於所述第二弧面反射結構的所述焦點，所述第二發光結構對應於所述第一弧面反射結構的所述焦點。 The ray-projecting device of claim 14, wherein the first curved surface reflection structure and the second curved surface reflection structure have a parabolic curvature, the first curved surface reflection structure has a focus, and the second The arcuate reflective structure has a focus, the first illumination structure corresponding to the focus of the second arcuate reflective structure, and the second illumination structure corresponding to the focus of the first arcuate reflective structure.

如請求項14所述的光線投射裝置，其中，所述第一發光結構所產生的一第一射出光線能朝向所述第二弧面反射結構的方向投射，所述第二發光結構所產生的一第二射出光線能朝向所述第一弧面反射結構的方向投射，其中，所述第一射出光線通過所述第二弧面反射結構的反射，以形成一第一照射光線，所述第二射出光線通過所述第一弧面反射結構的反射，以形成一第二照射光線。 The ray-projecting device of claim 14, wherein a first emitted light generated by the first light-emitting structure is projected toward a direction of the second curved reflective structure, and the second light-emitting structure generates a second emitted light can be projected toward the direction of the first curved reflective structure, wherein the first emitted light passes through the reflection of the second curved reflective structure to form a first illumination light, The second emitted light passes through the reflection of the first curved reflecting structure to form a second illumination light.

如請求項1所述的光線投射裝置，其中，所述透鏡單元具有一收光錐面，所述反射單元還進一步包括一延伸反射結構，所述第一反射結構以及所述第二反射結構位於所述收光錐面的範圍中。 The ray-projecting device of claim 1, wherein the lens unit has a light-receiving cone, the reflection unit further comprising an extended reflection structure, the first reflection structure and the second reflection structure being located In the range of the light collecting cone.

如請求項17所述的光線投射裝置，其中，所述延伸反射結構的曲面曲率與所述第一反射結構或所述第二反射結構相同。 The ray-projecting device of claim 17, wherein the curved curvature of the extended reflective structure is the same as the first reflective structure or the second reflective structure.

如請求項17所述的光線投射裝置，其中，所述反射單元還進一步包括一位於所述第一反射結構與所述第二反射結構上的反射表面，所述透鏡光軸與所述反射表面之間具有一交錯點，其中，一第一切線能通過所述交錯點且與所述第一反射結構相切，且所述第一切線與所述透鏡光軸之間具有介於47度至64.5度之間的第一切角，一第二切線能通過所述交錯點且與所述第二反射結構相切，且所述第二切線與所述透鏡光軸之間具有介於47度至64.5度之間的第二切角。 The ray-projecting device of claim 17, wherein the reflecting unit further comprises a reflective surface on the first reflective structure and the second reflective structure, the optical axis of the lens and the reflective surface Having a staggered point therebetween, wherein a first tangent line can pass through the staggered point and is tangent to the first reflective structure, and the first tangent line and the optical axis of the lens have a relationship between 47 a first chamfer angle between 64.5 degrees, a second tangent line can pass through the staggered point and be tangent to the second reflective structure, and the second tangent line is between the optical axis of the lens A second cut angle between 47 degrees and 64.5 degrees.

如請求項1所述的光線投射裝置，其中，所述第一反射結構具有一鄰近於所述第一反射結構的所述第一焦點的頂點，所述第一反射結構的所述頂點至所述第一反射結構的所述第一焦點之間具有一第一短距離，所述第一反射結構的所述第一焦點至所述第一反射結構的所述第二焦點之間具有一第一長距離，其中，所述第一長距離大於所述第一短距離，所述第一長距離與所述第一短距離的比值介於1.8至3.8之間。 The ray-projecting device of claim 1, wherein the first reflective structure has an apex adjacent to the first focus of the first reflective structure, the apex of the first reflective structure a first short distance between the first focus of the first reflective structure, and a first between the first focus of the first reflective structure and the second focus of the first reflective structure a long distance, wherein the first long distance is greater than the first short distance, and a ratio of the first long distance to the first short distance is between 1.8 and 3.8.

如請求項20所述的光線投射裝置，其中，所述第二反射結構具有一鄰近於所述第二反射結構的所述第一焦點的頂點，所述第二反射結構的所述頂點至所述第二反射結構的所述第一焦點之間具有一第二短距離，所述第二反射結構的所述第一焦點至所述第二反射結構的所述第二焦點之間具有一第二長距離，其中，所述第二長距離大於所述第二短距離，所述第二長距離與所述第二短距離的比值介於1.8至3.8之間。 The ray-projecting device of claim 20, wherein the second reflective structure has an apex adjacent to the first focus of the second reflective structure, the apex of the second reflective structure a second short distance between the first focus of the second reflective structure, and a first between the first focus of the second reflective structure and the second focus of the second reflective structure a second long distance, wherein the second long distance is greater than the second short distance, and a ratio of the second long distance to the second short distance is between 1.8 and 3.8.

如請求項1所述的光線投射裝置，其中，所述第一反射結構具有一第一端點、一相對於所述第一反射結構的所述第一端點的第二端點以及一頂點，其中，所述第一反射結構的所述第一端點至所述第一反射結構的所述第二端點之間具有一第一端點距離，所述第一反射結構的所述頂點至所述透鏡光軸之間具有一第一垂直距離，所述第一端點距離與所述第一垂直距離的比值介於0.7至1.8之間。 The ray-projecting device of claim 1, wherein the first reflective structure has a first end point, a second end point relative to the first end point of the first reflective structure, and a vertex Wherein the first end point of the first reflective structure to the second end point of the first reflective structure has a first end point distance, the vertex of the first reflective structure There is a first vertical distance between the optical axes of the lenses, and the ratio of the first end distance to the first vertical distance is between 0.7 and 1.8.

如請求項22所述的光線投射裝置，其中，所述第二反射結構具有一第一端點、一相對於所述第二反射結構的所述第一端點的第二端點以及一頂點，其中，所述第二反射結構的所述第一端點至所述第二反射結構的所述第二端點之間具有一第二端點距離，所述第二反射結構的所述頂點至所述透鏡光軸之間具有一第二垂直距離，所述第二端點距離與所述第二垂直距離的比值介於0.7至1.8之間。 The ray-projecting device of claim 22, wherein the second reflective structure has a first end point, a second end point relative to the first end point of the second reflective structure, and a vertex Having a second endpoint distance between the first end of the second reflective structure and the second end of the second reflective structure, the apex of the second reflective structure There is a second vertical distance between the optical axes of the lenses, and the ratio of the second end distance to the second vertical distance is between 0.7 and 1.8.

如請求項1所述的光線投射裝置，其中，所述反射單元還進一步包括一第三反射結構，所述發光單元還進一步包括一第三發光結構，所述第三反射結構具有一位於鄰近所述第一外側面且位於所述第一外側面以外的第一焦點以及對應所述第三反射結構的所述第一焦點的一第二焦點，所述第三發光結構對應所述第三反射結構的所述第一焦點，且所述第三發光結構設置於鄰近所述第一外側面且位於所述第一外側面以外的位置，其中，所述第三發光結構所產生的一第三投射光線能朝向所述第三反射結構的方向以及所述基準平面的方向投射。 The ray-projecting device of claim 1, wherein the reflecting unit further comprises a third reflective structure, the light-emitting unit further comprising a third light-emitting structure, the third reflective structure having a adjacent a first outer surface and a first focus outside the first outer side and a second focus corresponding to the first focus of the third reflective structure, the third light emitting structure corresponding to the third reflection The first focus of the structure, and the third light emitting structure is disposed adjacent to the first outer side and at a position other than the first outer side, wherein the third light emitting structure generates a third The projected light can be projected toward the direction of the third reflective structure and the direction of the reference plane.

如請求項24所述的光線投射裝置，其中，所述第一反射結構的所述第一焦點、所述第二反射結構的所述第一焦點以及所述第三反射結構的第一焦點所構成的平面定義為一預設平面，所述預設平面與所述基準平面之間具有一介於80度至100度之間的預設角度。 The ray-projecting device of claim 24, wherein the first focus of the first reflective structure, the first focus of the second reflective structure, and a first focus of the third reflective structure The formed plane is defined as a preset plane, and the preset plane and the reference plane have a preset angle between 80 degrees and 100 degrees.

如請求項24所述的光線投射裝置，其中，所述第三發光結構具有一第三發光面，且所述第三投射光線能沿著所述第三發光面的一第三法線方向朝向所述第三反射結構的方向以及所述基準平面的方向投射，其中，所述第三投射光線通過所述第三反射結構的反射，以形成一通過所述第三反射結構的所述第二焦點的第三反射光線。 The ray-projecting device of claim 24, wherein the third illuminating structure has a third illuminating surface, and the third projected ray can be oriented along a third normal direction of the third illuminating surface a direction of the third reflective structure and a direction of the reference plane, wherein the third projected light passes through the reflection of the third reflective structure to form a second through the third reflective structure The third reflected light of the focus.

如請求項24所述的光線投射裝置，其中，一第一軸線能通過所述第一反射結構的所述第一焦點與所述透鏡光軸，一第二軸線能通過所述第二反射結構的所述第一焦點與所述透鏡光軸，且一第三軸線能通過所述第三反射結構的所述第一焦點與所述透鏡光軸，其中，所述透鏡單元具有一收光錐面，所述收光錐面具有一第一延伸段、一第二延伸段以及一第三延伸段，所述第一延伸段對應所述第一反射結構的所述第一焦點，所述第二延伸段對應所述第二反射結構的所述第一焦點，所述第三延伸段對應所述第三反射結構的所述第一焦點，其中，所述第一軸線大致垂直於所述第一延伸段，所述第二軸線大致垂直於所述第二延伸段，且所述第三軸線大致垂直於所述第三延伸段。 The ray-projecting device of claim 24, wherein a first axis is capable of passing the first focus of the first reflective structure and the optical axis of the lens, and a second axis is capable of passing the second reflective structure The first focus and the optical axis of the lens, and a third axis capable of passing the first focus of the third reflective structure and the optical axis of the lens, wherein the lens unit has a light collecting cone The light-receiving cone mask has a first extension, a second extension, and a third extension, the first extension corresponding to the first focus of the first reflective structure, the first a second extension corresponding to the first focus of the second reflective structure, the third extension corresponding to the first focus of the third reflective structure, wherein the first axis is substantially perpendicular to the first An extension, the second axis being substantially perpendicular to the second extension, and the third axis being substantially perpendicular to the third extension.

如請求項27所述的光線投射裝置，其中，所述第一反射結構的所述第一焦點、所述第二反射結構的所述第一焦點以及所述第三反射結構的第一焦點都位於所述第一延伸段、所述第二延伸段以及所述第三延伸段之間，或者是所述第一延伸段通過所述第一反射結構的所述第一焦點、所述第二延伸段通過所述第二反射結構的所述第一焦點且所述第三延伸段通過所述第三反射結構的所述第一焦點。 The ray-projecting device of claim 27, wherein the first focus of the first reflective structure, the first focus of the second reflective structure, and the first focus of the third reflective structure are both Located between the first extension, the second extension, and the third extension, or the first extension, the first focus, the second of the first reflective structure The extension passes through the first focus of the second reflective structure and the third extension passes through the first focus of the third reflective structure.

如請求項27所述的光線投射裝置，其中，所述反射單元還進一步包括一位於所述第一反射結構、所述第二反射結構以及所述第三反射結構上的反射表面，所述透鏡光軸與所述反射表面之間具有一交錯點，其中，所述第一軸線與所述透鏡光軸之間具有一第一交點，所述第二軸線與所述透鏡光軸之間具有一第二交點，所述第三軸線與所述透鏡光軸之間具有一第三交點，所述交錯點至所述透鏡焦點之間的一預定距離小於所述第一交點至所述透鏡焦點之間的一第一距離，所述交錯點至所述透鏡焦點之間的所述預定距離小於所述第二交點至所述透鏡焦點之間的一第二距離，所述交錯點至所述透鏡焦點之間的所述預定距離小於所述第三交點至所述透鏡焦點之間的一第三距離。 The ray-projecting device of claim 27, wherein the reflecting unit further comprises a reflective surface on the first reflective structure, the second reflective structure, and the third reflective structure, the lens Optical axis and the reflective surface Between the first axis and the optical axis of the lens, a first intersection, the second axis and the optical axis of the lens have a second intersection, the a third intersection between the triaxial axis and the optical axis of the lens, a predetermined distance between the staggered point and the focal point of the lens being less than a first distance between the first intersection point and the focal point of the lens, The predetermined distance between the staggered point to the lens focus is less than a second distance between the second intersection to the lens focus, the predetermined point between the staggered point and the lens focus The distance is less than a third distance between the third intersection to the focus of the lens.

如請求項29所述的光線投射裝置，其中，所述交錯點與所述第一反射結構的所述第一焦點之間具有一第一預定軸線，所述交錯點與所述第二反射結構的所述第一焦點之間具有一第二預定軸線，所述交錯點與所述第三反射結構的所述第一焦點之間具有一第三預定軸線，其中，所述第一預定軸線與所述第一軸線之間具有一介於7度至31度之間的第一預定角度，所述第二預定軸線與所述第二軸線之間具有一介於7度至31度之間的第二預定角度，所述第三預定軸線與所述第三軸線之間具有一介於7度至31度之間的第三預定角度。 The ray-projecting device of claim 29, wherein the interlaced point and the first focus of the first reflective structure have a first predetermined axis, the staggered point and the second reflective structure Between the first focal points having a second predetermined axis, the staggered point and the first focus of the third reflective structure having a third predetermined axis, wherein the first predetermined axis The first axis has a first predetermined angle between 7 degrees and 31 degrees, and the second predetermined axis and the second axis have a second between 7 degrees and 31 degrees The predetermined angle, the third predetermined axis and the third axis have a third predetermined angle between 7 degrees and 31 degrees.

如請求項27所述的光線投射裝置，其中，所述第一反射結構的所述第一焦點、所述第二反射結構的所述第一焦點以及所述第三反射結構的所述第一焦點所構成的平面定義為一預設平面，所述預設平面與所述透鏡光軸之間具有一交叉點，其中，所述反射單元還進一步包括一位於所述第一反射結構與所述第二反射結構上的反射表面，所述透鏡光軸與所述反射表面之間具有一交錯點，其中，所述第一軸線與所述透鏡光軸之間具有一第一交點，所述交錯點位於所述第一交點與所述交叉點之間。 The ray-projecting device of claim 27, wherein the first focus of the first reflective structure, the first focus of the second reflective structure, and the first of the third reflective structure The plane formed by the focus is defined as a predetermined plane, and the preset plane has an intersection with the optical axis of the lens, wherein the reflecting unit further comprises a first reflective structure and the first reflective structure a reflective surface on the second reflective structure, the lens optical axis and the reflective surface having an interlaced point, wherein the first axis and the optical axis of the lens have a first intersection, the interlacing A point is located between the first intersection and the intersection.

如請求項24所述的光線投射裝置，其中，所述第一反射結構的所述第二焦點位於所述透鏡光軸上或者是鄰近於所述透鏡光軸，所述第二反射結構的所述第二焦點位於所述透鏡光軸上或者是鄰近於所述透鏡光軸，所述第三反射結構的所述第二焦點位於所述透鏡光軸上或者是鄰近於所述透鏡光軸。 The ray-projecting device of claim 24, wherein the first reflective structure The second focus is located on the optical axis of the lens or adjacent to the optical axis of the lens, and the second focus of the second reflective structure is located on or adjacent to the optical axis of the lens a second focus of the third reflective structure on the optical axis of the lens or adjacent to the optical axis of the lens.

如請求項24所述的光線投射裝置，其中，所述第一反射結構的所述第二焦點、所述第二反射結構的所述第二焦點、所述第三反射結構的所述第二焦點以及所述透鏡焦點四者相互重合。 The ray-projecting device of claim 24, wherein the second focus of the first reflective structure, the second focus of the second reflective structure, and the second of the third reflective structure The focus and the focus of the lens coincide with each other.

如請求項24所述的光線投射裝置，其中，所述第一反射結構、所述第二反射結構以及所述第三反射結構彼此相互連接，且所述透鏡光軸通過所述第一反射結構、所述第二反射結構以及所述第三反射結構的連接處。 The ray-projecting device of claim 24, wherein the first reflective structure, the second reflective structure, and the third reflective structure are connected to each other, and the optical axis of the lens passes through the first reflective structure a junction of the second reflective structure and the third reflective structure.

如請求項24所述的光線投射裝置，其中，所述反射單元還進一步包括一位於所述第一反射結構、所述第二反射結構以及所述第三反射結構上的反射表面，所述透鏡光軸與所述反射表面之間具有一交錯點，其中，一第一切線能通過所述交錯點且與所述第一反射結構相切，且所述第一切線與所述透鏡光軸之間具有介於47度至64.5度之間的第一切角，一第二切線能通過所述交錯點且與所述第二反射結構相切，且所述第二切線與所述透鏡光軸之間具有介於47度至64.5度之間的第二切角，一第三切線能通過所述交錯點且與所述第三反射結構相切，且所述第三切線與所述透鏡光軸之間具有介於47度至64.5度之間的第三切角。 The ray-projecting device of claim 24, wherein the reflecting unit further comprises a reflective surface on the first reflective structure, the second reflective structure, and the third reflective structure, the lens An optical fiber has an interlacing point with the reflective surface, wherein a first tangent line can pass through the interlaced point and is tangent to the first reflective structure, and the first tangent line and the lens light a first chamfer between the shafts between 47 degrees and 64.5 degrees, a second tangent line passing through the interlaced points and tangential to the second reflective structure, and the second tangent line and the lens a second chamfer angle between 47 degrees and 64.5 degrees between the optical axes, a third tangent line passing through the interlaced point and being tangent to the third reflective structure, and the third tangent line and the The lens optical axis has a third chamfer between 47 degrees and 64.5 degrees.

如請求項24所述的光線投射裝置，其中，所述反射單元還進一步包括一第四反射結構，所述發光單元還進一步包括一第四發光結構，所述第四反射結構具有一位於鄰近所述第二外側面且位於所述第二外側面以外的第一焦點以及對應所述第四反射結構的所述第一焦點的一第二焦點，所述第四發光結構對應所述第四反射結構的所述第一焦點，且所述第四發光結構設置於鄰近所述第二外側面且位於所述第二外側面以外的位置，其中，所述第四發光結構所產生的一第四投射光線能朝向所述第四反射結構的方向以及所述基準平面的方向投射。 The ray-projecting device of claim 24, wherein the reflecting unit further comprises a fourth reflective structure, the light-emitting unit further comprising a fourth light-emitting structure, the fourth reflective structure having a adjacent a first outer focus and a second focus outside the second outer side and a second focus corresponding to the first focus of the fourth reflective structure, the fourth light emitting structure corresponding to the fourth reflection The first focus of the structure, and the fourth illumination structure is set a position adjacent to the second outer side surface and outside the second outer side surface, wherein a fourth projected light generated by the fourth light emitting structure can face the direction of the fourth reflective structure and the reference The direction of the plane is projected.

如請求項1所述的光線投射裝置，其中，一第一軸線能通過所述第一反射結構的所述第一焦點與所述透鏡光軸，且一第二軸線能通過所述第二反射結構的所述第一焦點與所述透鏡光軸，其中，所述第一軸線與所述透鏡光軸之間具有一第一交點，所述第二軸線與所述透鏡光軸之間具有一第二交點，其中，所述第一軸線的延伸方向大致與所述第一法線方向相同，且所述第二軸線的延伸方向大致與所述第二法線方向相同。 The ray-projecting device of claim 1, wherein a first axis is capable of passing the first focus of the first reflective structure and the optical axis of the lens, and a second axis is capable of passing the second reflection The first focus of the structure and the optical axis of the lens, wherein a first intersection between the first axis and the optical axis of the lens, and a relationship between the second axis and the optical axis of the lens a second intersection, wherein the extending direction of the first axis is substantially the same as the first normal direction, and the extending direction of the second axis is substantially the same as the second normal direction.