TWI601231B - Wet processing device - Google Patents
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- TWI601231B TWI601231B TW105136507A TW105136507A TWI601231B TW I601231 B TWI601231 B TW I601231B TW 105136507 A TW105136507 A TW 105136507A TW 105136507 A TW105136507 A TW 105136507A TW I601231 B TWI601231 B TW I601231B
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Description
本發明關於一種製程裝置，尤其是適用於面板產業和半導體產業之溼式製程裝置。 The present invention relates to a process apparatus, particularly a wet process apparatus suitable for use in the panel industry and the semiconductor industry.
在面板產業以及半導體產業中，溼式製程發展的已經相當成熟。然而，受限於現有的機構設計，在實際操作中仍存在許多問題。舉例來說，溼式製程需要持續施加不同的液體至一基板，舉例而言，在一容器中可能採用A蝕刻液體對該基板進行蝕刻，在相鄰的另一容器中可能採用純水對該基板進行清洗。一般而言，是讓該基板在多個儲存有不同液體的容器中依序傳遞與移動，然而，為了確保液體不會從一容器帶至另一容器而產生彼此汙染的狀況，必須利用液體移除裝置(俗稱風刀)在基板離開每一個容器時，能夠不帶走該容器中的液體至另一容器中，以避免造成汙染以及產品的瑕疵。 In the panel industry and the semiconductor industry, the development of wet processes has become quite mature. However, due to the limitations of existing institutional designs, there are still many problems in actual operation. For example, a wet process requires continuous application of different liquids to a substrate. For example, the substrate may be etched with an A etch liquid in one container, and pure water may be used in another adjacent container. The substrate is cleaned. In general, the substrate is sequentially transferred and moved in a plurality of containers in which different liquids are stored. However, in order to ensure that the liquid does not get contaminated from one container to another, liquid migration must be utilized. In addition to the device (commonly known as air knife), when the substrate leaves each container, it is possible to remove the liquid in the container into another container to avoid contamination and flaws in the product.
參考第1至2圖，第1圖繪示現有技術的濕式製程裝置10之示意圖。第2繪示現有技術的濕式製程裝置10之剖面側視圖。該濕式製程裝置10包括一第一容器11以及一主液體移除單元15。該第一容器11包括一第一側壁19的一開口12，用於讓一基板14沿著第一軸13從該開口12離開或進入該第一容器10。該主液體移除單元15設置在該第一容器11內部靠近該第一 側壁19與該開口12之區域，並且該主液體移除單元15包括一第一風口16。該第一風口16的方向21是朝左下方(以該第一軸13為準，約為225度，一般而言，該方向21會介於180-270度)，以便將在該基板14上的液體18吹除。然而，該側壁19設有該開口12使得該側壁19較為脆弱，無法用於固定該主液體移除單元15。因此只能夠將該主液體移除單元15通過其他的內壁進行固定作業，進而使該主液體移除單元15無法固定在該側壁11上。因此，通常會在該主液體移除單元15的上方加裝一導板17，該導板17能夠避免該液體18在該主液體移除單元15與該側壁11之間的空隙滴落至該基板14。雖然可以避免該導板17上方的該液體18滴落至該基板14上，但是隨著時間經過，多少仍然會在該導板17以及該側壁11的間隙中累積液體18，進而滴落在該基板14上的技術問題。 Referring to Figures 1 through 2, FIG. 1 is a schematic view of a prior art wet process apparatus 10. FIG. 2 is a cross-sectional side view showing the wet process apparatus 10 of the prior art. The wet process apparatus 10 includes a first container 11 and a main liquid removal unit 15. The first container 11 includes an opening 12 of a first side wall 19 for allowing a substrate 14 to exit or enter the first container 10 along the first axis 13. The main liquid removing unit 15 is disposed inside the first container 11 near the first The side wall 19 and the area of the opening 12, and the main liquid removal unit 15 includes a first tuyere 16. The direction 21 of the first tuyere 16 is toward the lower left side (according to the first axis 13 and is about 225 degrees, in general, the direction 21 will be between 180 and 270 degrees) so as to be on the substrate 14. The liquid 18 is blown off. However, the side wall 19 is provided with the opening 12 such that the side wall 19 is relatively fragile and cannot be used to fix the main liquid removing unit 15. Therefore, the main liquid removing unit 15 can only be fixed by the other inner wall, so that the main liquid removing unit 15 cannot be fixed to the side wall 11. Therefore, a guide plate 17 is generally disposed above the main liquid removing unit 15, and the guide plate 17 can prevent the liquid 18 from dripping into the gap between the main liquid removing unit 15 and the side wall 11 to the Substrate 14. Although it is possible to prevent the liquid 18 above the guide plate 17 from dripping onto the substrate 14, as time passes, the liquid 18 will still accumulate in the gap between the guide plate 17 and the side wall 11, and then drip in the Technical problems on the substrate 14.
綜上所述，基於該側壁11的結構問題，無法將該主液體移除單元15固定在該側壁11上。即使能夠將該主液體移除單元15固定在該側壁11上，仍有可能在該主液體移除單元15與該側壁之間累積該液體18，進而滴落在該基板14上的技術問題。 In summary, based on the structural problem of the side wall 11, the main liquid removing unit 15 cannot be fixed to the side wall 11. Even if the main liquid removing unit 15 can be fixed to the side wall 11, there is a possibility that the liquid 18 is accumulated between the main liquid removing unit 15 and the side wall, thereby dropping the technical problem on the substrate 14.
上述的技術問題產生的原因主要在於：現有技術均是把每一個容器作為一個單位，卻受限於開口處的側壁強度較弱而無法將液體移除單元貼近該側壁設置，因而無法有效解決靠近該側壁的液體累積進而濺灑至相鄰容器的技術問題。 The above technical problems are mainly caused by the fact that in the prior art, each container is used as a unit, but the side wall of the opening is limited to be weak, and the liquid removing unit cannot be disposed close to the side wall, so that the near solution cannot be effectively solved. The technical problem of liquid accumulation on the side walls and thus spilling into adjacent containers.
因此，有必要提供一種溼式製程裝置，以解決上述之問題。 Therefore, it is necessary to provide a wet process apparatus to solve the above problems.
有鑑於此，本發明目的在於提供一種溼式製程裝置，藉由將 兩個相鄰容器作為一個單元，因此液體移除單元無法固定在開口處的側壁的技術問題便不復存在。所採用的技術方案為將液體移除單元設置在兩個容器中間的開口處，避免將該液體移除單元固定於該開口的側壁上造成不穩定，又可以完整的緊靠在該側壁上，避免液體移除單元與側壁間產生液體累積，同時在開口處設置兩組噴嘴，使兩個容器內部的液體不會交叉汙染。 In view of the above, an object of the present invention is to provide a wet process apparatus by The problem of the technical problem that the liquid removing unit cannot be fixed to the side wall at the opening is lost as two adjacent containers as one unit. The technical solution adopted is that the liquid removing unit is disposed at the opening in the middle of the two containers, so as to prevent the liquid removing unit from being fixed on the side wall of the opening to cause instability, and can completely abut the side wall. Liquid accumulation between the liquid removal unit and the side wall is avoided, and two sets of nozzles are provided at the opening so that the liquid inside the two containers is not cross-contaminated.
為達成上述目的，本發明提供一種濕式製程裝置，其包括一第一容器、一第二容器以及一主液體移除單元。 To achieve the above object, the present invention provides a wet process apparatus comprising a first container, a second container, and a main liquid removal unit.
該第一容器，包括一第一側壁的一第一開口，用於讓一基板沿著第一軸從該第一開口離開或進入該第一容器。該第一容器用於對該基板施加第一液體。該第二容器，包括一第二側壁的一第二開口，該第二開口對應該第一開口設置，該第二開口用於讓該基板相應地沿著該第一軸從該第二開口進入或離開該第二容器。該第二容器用於對該基板施加第二液體。該主液體移除單元設置於該第一容器的該第一側壁至該第一開口，並包括複數個第一噴嘴，設置在該第一液體移除單元位於該第一開口周圍的部份。該些第一噴嘴用於將該第一液體吹往該第一容器內部。 The first container includes a first opening of a first side wall for allowing a substrate to exit or enter the first container along the first axis. The first container is for applying a first liquid to the substrate. The second container includes a second opening of the second sidewall, the second opening is disposed corresponding to the first opening, and the second opening is configured to allow the substrate to enter from the second opening along the first axis Or leave the second container. The second container is for applying a second liquid to the substrate. The main liquid removing unit is disposed on the first side wall of the first container to the first opening, and includes a plurality of first nozzles disposed at a portion of the first liquid removing unit around the first opening. The first nozzles are used to blow the first liquid to the interior of the first container.
在一較佳實施例中，該第一液體移除單元設置於該基板的上方。 In a preferred embodiment, the first liquid removal unit is disposed above the substrate.
在一較佳實施例中，該些第一噴嘴的方向與該第一軸的第一夾角介於180-270度。 In a preferred embodiment, the first nozzles have a first angle of the first nozzle that is between 180 and 270 degrees.
在一較佳實施例中，該第一液體移除單元進一步延伸至該第二開口，並包括複數個第二噴嘴，設置在該第一液體移除單元相對應該第 二開口周圍的部份，該些第二噴嘴用於在將該第二液體吹往該第二容器內部。 In a preferred embodiment, the first liquid removing unit further extends to the second opening, and includes a plurality of second nozzles disposed corresponding to the first liquid removing unit a portion around the opening, the second nozzles for blowing the second liquid into the interior of the second container.
在一較佳實施例中，該濕式製程裝置還包括一固定裝置，用於將該第一液體移除單元在該第二容器的部分與該第二容器相固定。 In a preferred embodiment, the wet process apparatus further includes a securing means for securing the first liquid removal unit to the second container at a portion of the second container.
在一較佳實施例中，該些第二噴嘴的方向與該第一軸的第二夾角介於270-360度。 In a preferred embodiment, the second nozzle has a second angle of 270-360 degrees with the first axis.
在一較佳實施例中，該濕式製程裝置還包括一第二液體移除單元，設置於該第二容器的一第二側壁至該第二開口，該第一液體移除單元與該第二液體移除單元在該第一開口以及該第二開口處相連接。 In a preferred embodiment, the wet process apparatus further includes a second liquid removal unit disposed on a second sidewall of the second container to the second opening, the first liquid removal unit and the first Two liquid removal units are coupled at the first opening and the second opening.
在一較佳實施例中，該第二液體移除單元還包括複數個第二噴嘴，設置在該第二液體移除單元相對應該第二開口周圍的部份，該些第二噴嘴用於將該第二液體吹往該第二容器內部。 In a preferred embodiment, the second liquid removing unit further includes a plurality of second nozzles disposed at a portion of the second liquid removing unit corresponding to the second opening, the second nozzles for The second liquid is blown into the interior of the second container.
在一較佳實施例中，該些第二噴嘴的方向與該第一軸的第二夾角介於270-360度。 In a preferred embodiment, the second nozzle has a second angle of 270-360 degrees with the first axis.
在一較佳實施例中，該濕式製程裝置還包括一氣體供應源用於藉由該第一液體移除單元提供該些第一噴嘴以及藉由該第二液體移除單元提供該些第二噴嘴潔淨乾燥氣體。 In a preferred embodiment, the wet processing apparatus further includes a gas supply source for providing the first nozzles by the first liquid removal unit and providing the first nozzles by the second liquid removal unit Two nozzles clean the dry gas.
相較於先前技術，本發明藉由將兩個相鄰容器作為一個單元，因此液體移除單元無法固定在開口處的側壁的技術問題便不復存在。所採用的技術方案為將液體移除單元設置在兩個容器中間的開口處，避免將該液體移除單元固定於該開口的側壁上造成不穩定，又可以完整的緊靠在該側壁上，避免液體移除單元與側壁間產生液體累積，同時在開口處設 置兩組噴嘴，使兩個容器內部的液體不會交叉汙染。 Compared to the prior art, the present invention eliminates the technical problem that the liquid removing unit cannot be fixed to the side wall at the opening by using two adjacent containers as one unit. The technical solution adopted is that the liquid removing unit is disposed at the opening in the middle of the two containers, so as to prevent the liquid removing unit from being fixed on the side wall of the opening to cause instability, and can completely abut the side wall. Avoid liquid accumulation between the liquid removal unit and the side wall, and set at the opening Set two sets of nozzles so that the liquid inside the two containers is not cross-contaminated.
10、100、200‧‧‧濕式製程裝置 10, 100, 200‧‧‧ Wet process equipment
11、110‧‧‧第一容器 11, 110‧‧‧ first container
12‧‧‧開口 12‧‧‧ openings
13、130‧‧‧第一軸 13, 130‧‧‧ first axis
14、140‧‧‧基板 14, 140‧‧‧ substrate
15‧‧‧主液體移除單元 15‧‧‧Main liquid removal unit
120‧‧‧第一液體移除單元 120‧‧‧First liquid removal unit
160‧‧‧第一開口 160‧‧‧ first opening
16、122‧‧‧第一噴嘴 16, 122‧‧‧ first nozzle
17‧‧‧導板 17‧‧‧ Guide
18‧‧‧液體 18‧‧‧Liquid
19、112‧‧‧第一側壁 19, 112‧‧‧ first side wall
124‧‧‧第一夾角 124‧‧‧First angle
210‧‧‧第二容器 210‧‧‧Second container
212‧‧‧第二側壁 212‧‧‧ second side wall
220‧‧‧第二液體移除單元 220‧‧‧Second liquid removal unit
222‧‧‧第二噴嘴 222‧‧‧second nozzle
224‧‧‧第二夾角 224‧‧‧second angle
260‧‧‧第二開口 260‧‧‧ second opening
290‧‧‧固定裝置 290‧‧‧Fixed devices
320‧‧‧氣體供應源 320‧‧‧ gas supply
第1圖，繪示現有技術的濕式製程裝置之示意圖；第2圖，繪示現有技術的濕式製程裝置之剖面側視圖；第3圖，繪示本發明的第一較佳實施例的濕式製程裝置之部分剖面示意圖；第4圖，繪示第3圖之剖面側視圖；第5圖，繪示本發明的第一夾角以及第二夾角的示意圖；第6圖，繪示本發明的第二較佳實施例的濕式製程裝置之部分剖面示意圖；以及第7圖，繪示第6圖之剖面側視圖。 1 is a schematic view showing a wet processing apparatus of the prior art; FIG. 2 is a cross-sectional side view showing a wet processing apparatus of the prior art; and FIG. 3 is a view showing a first preferred embodiment of the present invention. FIG. 4 is a cross-sectional side view showing a third embodiment; FIG. 5 is a schematic view showing a first angle and a second angle of the present invention; and FIG. 6 is a view showing the present invention. A partial cross-sectional view of a wet process apparatus of a second preferred embodiment; and a seventh cross-sectional side view of FIG.
以下參照附圖詳細說明的實施例將會使得本發明的優點和特徵以及實現這些優點和特徵的方法更加明確。但是，本發明不局限於以下所公開的實施例，本發明能夠以互不相同的各種方式實施，以下所公開的實施例僅用於使本發明的公開內容更加完整，有助於本發明所屬技術領域的普通技術人員能夠完整地理解本發明之範疇，本發明是根據申請專利範圍而定義。在說明書全文中，相同的附圖標記表示相同的裝置元件。 The embodiments described in detail below with reference to the drawings will make the advantages and features of the invention, and the methods of the inventions. However, the present invention is not limited to the embodiments disclosed below, and the present invention can be implemented in various ways that are different from each other. The embodiments disclosed below are only for making the disclosure of the present invention more complete and contributing to the present invention. A person of ordinary skill in the art can fully understand the scope of the present invention, which is defined in accordance with the scope of the patent application. Throughout the specification, the same reference numerals denote the same device elements.
參考第3-5圖。第3圖，繪示本發明的第一較佳實施例的濕式製程裝置100之部分剖面示意圖。第4圖，繪示第3圖之剖面側視圖。第5圖，繪示本發明的第一夾角124以及第二夾角224的示意圖。 Refer to Figure 3-5. 3 is a partial cross-sectional view showing the wet process apparatus 100 of the first preferred embodiment of the present invention. Fig. 4 is a cross-sectional side view showing Fig. 3. FIG. 5 is a schematic view showing the first angle 124 and the second angle 224 of the present invention.
該濕式製程裝置100包括一第一容器110、一第二容器210、一主液體移除單元120、一固定裝置290以及一氣體供應源320。該第一容器110包括一第一側壁112的一第一開口160，用於讓一基板140沿著第一軸130從該第一開口160離開或進入該第一容器110。在後續說明中，假設該基板140是由左而右離開該第一容器110。該第二容器210包括一第二側壁212的一第二開口260，該第二開口260對應該第一開口160設置，該第二開口260用於讓該基板140相應地沿著該第一軸130從該第二開口260進入或離開該第二容器210。該第一容器110用於對該基板140施加第一液體。該第二容器260用於對該基板140施加第二液體。基本上該第一液體以及該第二液體是不同的，舉例而言，該第一液體是蝕刻液而該第二液體是純水，兩種液體的混合均會對製程產生不良的影響。 The wet process apparatus 100 includes a first container 110, a second container 210, a main liquid removal unit 120, a fixture 290, and a gas supply source 320. The first container 110 includes a first opening 160 of the first sidewall 112 for allowing a substrate 140 to exit the first opening 160 or enter the first container 110 along the first axis 130. In the following description, it is assumed that the substrate 140 is separated from the first container 110 by the left and right. The second container 210 includes a second opening 260 of the second sidewall 212. The second opening 260 is disposed corresponding to the first opening 160. The second opening 260 is configured to allow the substrate 140 to be along the first axis. 130 enters or exits the second container 210 from the second opening 260. The first container 110 is for applying a first liquid to the substrate 140. The second container 260 is for applying a second liquid to the substrate 140. Basically, the first liquid and the second liquid are different. For example, the first liquid is an etching liquid and the second liquid is pure water, and mixing of the two liquids may adversely affect the process.
該主液體移除單元120設置於該第一容器110的該第一側壁112、該第一開口160以及該第二開口260，並包括複數個第一噴嘴122以及複數個第二噴嘴222，各別設置在該第一液體移除單元120位於該第一開口160周圍的部份以及該第一液體移除單元120相對應該第二開口260周圍的部份。該些第一噴嘴122用於將該第一液體吹往該第一容器110內部。該些第二噴222嘴用於在將該第二液體吹往該第二容器210內部。 The main liquid removing unit 120 is disposed on the first sidewall 112, the first opening 160 and the second opening 260 of the first container 110, and includes a plurality of first nozzles 122 and a plurality of second nozzles 222, each of which The portion of the first liquid removing unit 120 located around the first opening 160 and the portion of the first liquid removing unit 120 corresponding to the second opening 260 are disposed. The first nozzles 122 are used to blow the first liquid into the interior of the first container 110. The second spray 222 is configured to blow the second liquid into the interior of the second container 210.
在本較佳實施例中，該第一液體移除單元是緊靠著該第一側壁112設置於該第一基板140的上方，詳細地，緊靠在該第一開口160以及該第二開口260的上方設置，因此，該些第一噴嘴122的方向與該第一軸130的第一夾角124介於180-270度，因此能夠將該第一液體吹向左側(第一容器的內部)；該些第二噴嘴222的方向與該第一軸130的第二夾角224介於270-360 度，因此能夠將該第二液體吹向右側(第二容器的內部)。 In the preferred embodiment, the first liquid removing unit is disposed above the first substrate 140 against the first sidewall 112, and in detail, abuts the first opening 160 and the second opening. The upper portion of the first nozzle 122 is between 180 and 270 degrees, so that the first liquid can be blown to the left side (the inside of the first container). The direction of the second nozzles 222 and the second angle 224 of the first shaft 130 are between 270 and 360. Therefore, the second liquid can be blown to the right side (the inside of the second container).
考量該第一側壁112以及該第二側壁222均不適合用於固定該第一液體移除單元120，該第一液體移除單元120在該第一容器110的部分固定在該第一容器110的上方側壁，該第一液體移除單元120在該第二容器210的部分亦是藉由該固定裝置290採用吊掛或其他方式固定在上方的側壁。需要提醒的是，在其他較佳實施例中，亦可採用不同的固定方式或不同的側壁進行該第一液體移除單元120的固定。 It is considered that the first side wall 112 and the second side wall 222 are not suitable for fixing the first liquid removing unit 120, and the first liquid removing unit 120 is fixed to the first container 110 at a portion of the first container 110. In the upper side wall, the portion of the first liquid removing unit 120 in the second container 210 is also suspended or otherwise fixed to the upper side wall by the fixing device 290. It should be noted that in other preferred embodiments, the fixing of the first liquid removing unit 120 may be performed by using different fixing methods or different side walls.
該氣體供應源320用於藉由該第一液體移除單元120提供該些第一噴嘴122以及該些第二噴嘴222一潔淨乾燥氣體(clean dry air,CDA)。 The gas supply source 320 is configured to provide the first nozzles 122 and the second nozzles 222 with a clean dry air (CDA) by the first liquid removal unit 120.
參考第6-7圖。第6圖，繪示本發明的第二較佳實施例的濕式製程裝置200之部分剖面示意圖。第7圖，繪示第6圖之剖面側視圖。本較佳實施例與第一較佳實施例的差異在於：該濕式製程裝置200還包括一第二液體移除單元220，設置於該第二容器210的一第二側壁212至該第二開口260，該第一液體移除單元120與該第二液體移除單元220在該第一開口160以及該第二開口260處相連接。 Refer to Figure 6-7. FIG. 6 is a partial cross-sectional view showing the wet process apparatus 200 of the second preferred embodiment of the present invention. Fig. 7 is a cross-sectional side view showing Fig. 6. The difference between the preferred embodiment and the first preferred embodiment is that the wet processing apparatus 200 further includes a second liquid removing unit 220 disposed on a second side wall 212 to the second side of the second container 210. The opening 260, the first liquid removing unit 120 and the second liquid removing unit 220 are connected at the first opening 160 and the second opening 260.
考量該第一側壁112以及該第二側壁222均不適合用於固定該第一液體移除單元120，該第一液體移除單元120在該第一容器110的部分固定在該第一容器110的上方側壁，該第二液體移除單元220在該第二容器210的部分亦是藉由該固定在上方的側壁。需要提醒的是，在其他較佳實施例中，亦可採用不同的固定方式或不同的側壁進行該第一液體移除單元120以及該第二液體移除單元220的固定。至於該第一液體移除單元120以及該第二液體移除單元220之間可以採用螺絲或其他固定方式進行固定，並不以 此為限。 It is considered that the first side wall 112 and the second side wall 222 are not suitable for fixing the first liquid removing unit 120, and the first liquid removing unit 120 is fixed to the first container 110 at a portion of the first container 110. The upper side wall, the portion of the second liquid removing unit 220 in the second container 210 is also secured by the upper side wall. It should be noted that in other preferred embodiments, the fixing of the first liquid removing unit 120 and the second liquid removing unit 220 may be performed by using different fixing manners or different sidewalls. As for the first liquid removal unit 120 and the second liquid removal unit 220, screws or other fixing means may be used for fixing, and This is limited.
該氣體供應源320用於藉由該第一液體移除單元120提供該些第一噴嘴122以及藉由該第二液體移除單元220提供該些第二噴嘴222一潔淨乾燥氣體。 The gas supply source 320 is configured to provide the first nozzles 122 by the first liquid removal unit 120 and the second nozzles 222 to provide a clean dry gas by the second liquid removal unit 220.
通過本發明將該些第一噴嘴122以及該些第二噴嘴222分別設置在該第一開口160以及該第二開口260處，即便在該第一液體移除單元120與該第一側壁112以及該第二側壁212之間仍然產生了液體累積，仍舊可以藉由相對位於該第一側壁112以及該第二側壁212外側的該些第一噴嘴122以及該些第二噴嘴222將該第一液體以及該第二液體分別地吹向該第一容器110以及該第二容器210內部，避免液體的交互汙染。 The first nozzle 122 and the second nozzles 222 are respectively disposed at the first opening 160 and the second opening 260 by the present invention, even in the first liquid removing unit 120 and the first sidewall 112 The liquid accumulation still occurs between the second side walls 212, and the first liquid can still be used by the first nozzles 122 and the second nozzles 222 located outside the first side wall 112 and the second side wall 212. And the second liquid is separately blown into the first container 110 and the second container 210 to avoid mutual contamination of the liquid.
本發明藉由將兩個相鄰容器作為一個單元，因此液體移除單元無法固定在開口處的側壁的技術問題便不復存在。所採用的技術方案為將液體移除單元設置在兩個容器中間的開口處，避免將該液體移除單元固定於該開口的側壁上造成不穩定，又可以完整的緊靠在該側壁上，避免液體移除單元與側壁間產生液體累積，同時在開口處設置兩組噴嘴，使兩個容器內部的液體不會交叉汙染。 The present invention eliminates the technical problem that the liquid removing unit cannot be fixed to the side wall at the opening by using two adjacent containers as one unit. The technical solution adopted is that the liquid removing unit is disposed at the opening in the middle of the two containers, so as to prevent the liquid removing unit from being fixed on the side wall of the opening to cause instability, and can completely abut the side wall. Liquid accumulation between the liquid removal unit and the side wall is avoided, and two sets of nozzles are provided at the opening so that the liquid inside the two containers is not cross-contaminated.
雖然本發明已用較佳實施例揭露如上，然其並非用以限定本發明，本發明所屬技術領域中具有通常知識者，在不脫離本發明之精神和範圍內，當可作各種之更動與潤飾，因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。 While the invention has been described above in terms of the preferred embodiments, the invention is not intended to limit the invention, and the invention may be practiced without departing from the spirit and scope of the invention. The scope of protection of the present invention is therefore defined by the scope of the appended claims.
100‧‧‧濕式製程裝置 100‧‧‧wet process unit
110‧‧‧第一容器 110‧‧‧First container
112‧‧‧第一側壁 112‧‧‧First side wall
120‧‧‧第一液體移除單元 120‧‧‧First liquid removal unit
122‧‧‧第一噴嘴 122‧‧‧First nozzle
130‧‧‧第一軸 130‧‧‧first axis
140‧‧‧基板 140‧‧‧Substrate
160‧‧‧第一開口 160‧‧‧ first opening
210‧‧‧第二容器 210‧‧‧Second container
212‧‧‧第二側壁 212‧‧‧ second side wall
222‧‧‧第二噴嘴 222‧‧‧second nozzle
260‧‧‧第二開口 260‧‧‧ second opening
290‧‧‧固定裝置 290‧‧‧Fixed devices
320‧‧‧氣體供應源 320‧‧‧ gas supply
Claims (10)
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| TW105136507A TWI601231B (en) | 2016-11-09 | 2016-11-09 | Wet processing device |
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| TW105136507A TWI601231B (en) | 2016-11-09 | 2016-11-09 | Wet processing device |
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| TWI601231B true TWI601231B (en) | 2017-10-01 |
| TW201818489A TW201818489A (en) | 2018-05-16 |
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| TW (1) | TWI601231B (en) |
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| TW201508834A (en) * | 2013-08-16 | 2015-03-01 | Unimicron Technology Corp | Etching apparatus |
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| TW201508834A (en) * | 2013-08-16 | 2015-03-01 | Unimicron Technology Corp | Etching apparatus |
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