TWI576753B - Touch panel - Google Patents

Touch panel Download PDF

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Publication number
TWI576753B
TWI576753B TW105115628A TW105115628A TWI576753B TW I576753 B TWI576753 B TW I576753B TW 105115628 A TW105115628 A TW 105115628A TW 105115628 A TW105115628 A TW 105115628A TW I576753 B TWI576753 B TW I576753B
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Taiwan
Prior art keywords
sensing electrode
touch panel
electrode array
layer
easy
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TW105115628A
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Chinese (zh)
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TW201627847A (en
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大谷純生
栗城匡志
野村秀昭
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富士軟片股份有限公司
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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0445—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using two or more layers of sensing electrodes, e.g. using two layers of electrodes separated by a dielectric layer
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices

Description

觸控面板Touch panel

本案是有關於反射色度優異的感測（sensor）電極陣列（array）、使用於投影型靜電容量方式的觸控面板（touch panel）的較佳的感測電極陣列、感測電極陣列的使用方法、製造方法以及觸控面板。The present invention relates to a sensor electrode array excellent in reflection chromaticity, a preferred sensing electrode array used in a projection type electrostatic capacitance type touch panel, and a sensing electrode array. Method, manufacturing method, and touch panel.

一般而言，靜電容量方式的觸控面板是位置輸入裝置，該位置輸入裝置捕捉人的指尖與導電膜之間的靜電容量的變化，從而對指尖的位置進行檢測，上述靜電容量方式的觸控面板有表面型觸控面板與投影型觸控面板。表面型觸控面板的構造簡單，但難以同時對2個點以上的接觸（多點觸控（multi touch））進行偵測。另一方面，投影型觸控面板是多個電極排列為矩陣（matrix）狀而構成，更具體而言，多個第1電極群沿著水平方向排列，隔著絕緣層，多個第2電極群沿著垂直方向排列，從而構成投影型觸控面板，該投影型觸控面板為如下的構成，即，利用多個第1電極群以及多個第2電極群來依序逐步對容量變化進行檢測，藉此，可檢測出多點觸控。In general, a capacitive touch panel is a position input device that captures a change in electrostatic capacitance between a fingertip of a person and a conductive film to detect the position of the fingertip. The touch panel has a surface type touch panel and a projection type touch panel. The surface type touch panel has a simple structure, but it is difficult to detect more than two points of contact (multi touch) at the same time. On the other hand, the projection type touch panel is configured such that a plurality of electrodes are arranged in a matrix shape, and more specifically, a plurality of first electrode groups are arranged in the horizontal direction, and a plurality of second electrodes are interposed via an insulating layer. The group is arranged in a vertical direction to constitute a projection type touch panel. The projection type touch panel has a configuration in which a plurality of first electrode groups and a plurality of second electrode groups are used to sequentially perform capacity change. Detection, whereby multi-touch can be detected.

近年來，對於如上所述的觸控面板，多點觸控與大畫面化的需求增強，正在開發上述投影型的靜電容量方式的觸控面板。逐步使用透明導電體即氧化銦錫（Indium Tin Oxide，ITO）等作為電極材料，但對於大畫面化所需的電極細線化而言，上述電極材料的電阻高，此成為細線化以及觸控面板響應性的阻礙。為了解決上述問題，正在開發如下的技術，該技術是對金、銀、以及銅等的金屬薄膜進行微細加工，藉由不會被觸控者看到的線寬的導電性細線來構成電極群（專利文獻1）。In recent years, with respect to the touch panel as described above, the demand for multi-touch and large screen is increasing, and the above-described projection type electrostatic capacitance type touch panel is being developed. Indium Tin Oxide (ITO), which is a transparent conductor, is used as an electrode material. However, the electrode material has a high electrical resistance for thinning of the electrode required for large screen, which is a thin line and a touch panel. Responsive obstacles. In order to solve the above problems, a technique is being developed in which a metal thin film such as gold, silver, or copper is microfabricated, and an electrode group is formed by a conductive thin line of a line width which is not seen by a touch person. (Patent Document 1).

又，關於利用金屬薄膜時的微妙的金屬色、及光澤對畫面產生的影響的問題，於專利文獻2中已揭示有對金屬表面進行黑色化處理的方法，但耐久性不充分。Further, in the case of the problem of the effect of the subtle metallic color and the gloss on the screen when the metal thin film is used, Patent Document 2 discloses a method of blackening the metal surface, but the durability is insufficient.

即便可藉由金屬薄膜的微細加工來形成低電阻的導電性細線，實際上，亦難以不使金屬細線產生剝離或斷裂而穩定地製造大面積的電極圖案（pattern）。又，如下的問題或色調變動的問題亦尚未解決，上述問題是指對於觸控面板形成之後的環境變化，形成的金屬細線會引起遷移（migration），使觸控面板的響應性下降。Even if a low-resistance conductive thin wire can be formed by microfabrication of a metal thin film, it is difficult to stably produce a large-area electrode pattern without peeling or breaking the metal thin wires. Further, the following problems or problems of color tone change have not yet been solved. The above-mentioned problem refers to a change in the environment after the formation of the touch panel, and the formed thin metal wires cause migration and decrease the responsiveness of the touch panel.

[先前技術文獻][Previous Technical Literature]

[專利文獻][Patent Literature]

[專利文獻1]國際專利公開第2010/014683號小冊子[Patent Document 1] International Patent Publication No. 2010/014683

[專利文獻2]日本專利特開2006-344163號公報[Patent Document 2] Japanese Patent Laid-Open Publication No. 2006-344163

本發明是考慮了如上所述的問題而成的發明，本發明的目的在於提供如下的觸控面板，該觸控面板即便面積大，響應性亦優異，且使用有能夠實現多點觸控的金屬細線電極。又，本發明的目的在於提供如下的觸控面板，該觸控面板的反射色調於整個畫面中穩定。又，本發明的其他目的在於提供如下的觸控面板，該觸控面板使用有對於高溫高濕等的環境變動表現得穩定的金屬細線電極。又，本發明的另一目的在於提供如下的觸控面板，該觸控面板可穩定地製造，品質穩定且使用有金屬細線電極。 The present invention has been made in view of the above problems, and an object of the present invention is to provide a touch panel which is excellent in responsiveness even when the area is large, and which is capable of realizing multi-touch. Metal thin wire electrode. Moreover, it is an object of the present invention to provide a touch panel whose reflective color tone is stable throughout the entire screen. Further, another object of the present invention is to provide a touch panel using a metal thin wire electrode which is stable against environmental fluctuations such as high temperature, high humidity, and the like. Further, another object of the present invention is to provide a touch panel which can be stably manufactured, has stable quality, and uses a metal thin wire electrode.

1)一種觸控面板，包括第一感測電極陣列，該觸控面板的特徵在於：上述第一感測電極陣列是將導電性金屬細線圖案化而形成於透明基板上，上述第一感測電極陣列的反射色度L*a*b*的L*為6~13，a*為-0.7~1.5，b*為-5.0~1.2。 1) A touch panel comprising a first sensing electrode array, wherein the first sensing electrode array is formed by patterning a conductive metal thin line on a transparent substrate, the first sensing The reflection chromaticity L*a*b* of the electrode array has an L* of 6 to 13, a* of -0.7 to 1.5, and b* of -5.0 to 1.2.

2)如項1所述之觸控面板，其特徵在於：更包括第二感測電極陣列，上述第一感測電極陣列與第二感測電極陣列正交地排列。 The touch panel of claim 1, further comprising a second sensing electrode array, wherein the first sensing electrode array and the second sensing electrode array are orthogonally arranged.

3)如項1所述之觸控面板，其特徵在於：於上述已圖案化的導電性金屬細線與上述透明基板之間具有至少1個以上的易黏接層。 The touch panel according to Item 1, characterized in that at least one or more adhesive layers are provided between the patterned conductive metal thin wires and the transparent substrate.

4)如項1所述之觸控面板，其特徵在於：上述觸控面板為靜電容量方式的觸控面板。 The touch panel of claim 1, wherein the touch panel is a capacitive touch panel.

5)一種靜電容量方式的觸控面板，正交地排列有第一感測電極陣列與第二感測電極陣列，該靜電容量方式的觸控面板的特徵在於：配置於觸控者側的第一感測電極陣列，是將導電性金屬細線圖案化而形成於具有易黏接層的透明基板上。 5) A touch panel of an electrostatic capacitance type, wherein a first sensing electrode array and a second sensing electrode array are orthogonally arranged, and the capacitive touch panel is characterized in that: A sensing electrode array is formed by patterning conductive metal thin wires on a transparent substrate having an easy adhesion layer.

6)如項1或項5所述之觸控面板，其特徵在於：上述已圖案化的導電性金屬細線於觸控面側具有黑化層。 The touch panel according to Item 1 or Item 5, wherein the patterned conductive metal thin wires have a blackening layer on the touch surface side.

7)如項6所述之觸控面板，其特徵在於：上述黑化層的表面粗糙度Ra為0.15以下。 The touch panel according to Item 6, wherein the blackening layer has a surface roughness Ra of 0.15 or less.

8)如項5所述之靜電容量方式的觸控面板，其特徵在於：上述第一感測電極陣列的反射色度L*a*b*的L*為6~13，a*為-0.7~1.5，b*為-5.0~1.2。 The touch panel of the electrostatic capacitance type according to Item 5, wherein the reflection chromaticity L*a*b* of the first sensing electrode array has an L* of 6 to 13 and an* of -0.7. ~1.5, b* is -5.0~1.2.

9)如項2至項5中任一項所述之觸控面板，其特徵在於：構成上述第一感測電極陣列的感測電極是包含由上述導電性金屬細線所形成網格(mesh)的鑽石(diamond)構造的連續體或帶狀體，構成上述第二感測電極陣列的感測電極是與構成上述第一感測電極陣列的感測電極相同的構造或條狀(bar)構造。 The touch panel of any one of item 2 to 5, wherein the sensing electrode constituting the first sensing electrode array comprises a mesh formed by the conductive metal thin wires. a continuum or strip of diamond structure, the sensing electrodes constituting the second sensing electrode array are the same structure or bar structure as the sensing electrodes constituting the first sensing electrode array .

10)如項2至項5中任一項所述之觸控面板，其特徵在於：當對正交地排列的上述第一感測電極陣列與第二感測電極陣列進行透視時，已圖案化的導電性金屬細線於整個觸控面形成大致均一的格子花紋。 The touch panel of any one of item 2 to 5, wherein when the first sensing electrode array and the second sensing electrode array arranged orthogonally are fluoroscopy, the pattern is patterned The conductive conductive metal wires form a substantially uniform lattice pattern over the entire touch surface.

11)如項1或項5所述之觸控面板，其特徵在於：上述導電性金屬細線是使用光微影(photolithography)的方法或雷射剝蝕（laser ablation）的方法，將金屬薄膜層圖案化為線寬為1000 nm至8000 nm的細線圖案。The touch panel of item 1 or 5, wherein the conductive metal thin wire is a method of photolithography or laser ablation, and the metal thin film layer pattern is used. It is a thin line pattern with a line width of 1000 nm to 8000 nm.

12）如項1或項5所述之觸控面板，其特徵在於：上述導電性金屬細線的寬度為厚度的2.5倍以上。The touch panel according to Item 1 or Item 5, wherein the width of the conductive metal thin wires is 2.5 times or more the thickness.

13）如項3或項5所述之觸控面板，其特徵在於：上述透明基板包含聚酯樹脂，上述易黏接層包含聚酯樹脂、丙烯酸樹脂或胺酯樹脂，於上述易黏接層中添加有交聯劑。The touch panel according to Item 3 or 5, wherein the transparent substrate comprises a polyester resin, and the easy-adhesion layer comprises a polyester resin, an acrylic resin or an amine ester resin, and the easy adhesion layer A crosslinking agent is added thereto.

14）如項13所述之觸控面板，其特徵在於：上述易黏接層包含第一易黏接層與第二易黏接層，與上述透明基板相接的第一易黏接層包含聚酯樹脂，第二易黏接層包含丙烯酸樹脂或胺酯樹脂。The touch panel of claim 13, wherein the easy adhesion layer comprises a first easy adhesion layer and a second easy adhesion layer, and the first easy adhesion layer connected to the transparent substrate comprises The polyester resin, the second easy-adhesion layer comprises an acrylic resin or an amine ester resin.

15）如項13所述之觸控面板，其特徵在於：上述交聯劑為噁唑啶（oxazolidine）化合物、環氧化合物、或異氰酸酯化合物。The touch panel according to Item 13, wherein the crosslinking agent is an oxazolidine compound, an epoxy compound, or an isocyanate compound.

16）如項14所述之觸控面板，其特徵在於：上述交聯劑為噁唑啶化合物、環氧化合物、或異氰酸酯化合物。The touch panel according to Item 14, wherein the crosslinking agent is an oxazolidine compound, an epoxy compound, or an isocyanate compound.

[發明的效果][Effects of the Invention]

如以上的說明所述，根據本發明的感測電極陣列、感測電極陣列的使用方法以及觸控面板，可獲得如下的觸控面板，該觸控面板即便面積大，響應性亦優異，可實現多點觸控，且對於高溫高濕等的環境變動表現得穩定，而且可獲得可穩定地製造且品質穩定的觸控面板。As described in the above description, according to the sensing electrode array, the sensing electrode array, and the touch panel of the present invention, the following touch panel can be obtained, and the touch panel has excellent responsiveness even if the area is large. Multi-touch is achieved, and it is stable against environmental changes such as high temperature and high humidity, and a touch panel that can be stably manufactured and has stable quality can be obtained.

為讓本發明的上述特徵和優點能更明顯易懂，下文特舉實施例，並配合所附圖式作詳細說明如下。The above described features and advantages of the invention will be apparent from the following description.

如上述「發明所欲解決的問題」項所述，本發明是如下的發明，該發明的目的在於提供如下的觸控面板，該觸控面板即便面積大，響應性亦優異，且使用有可實現多點觸控的金屬細線電極，而且上述發明的目的在於提供如下的觸控面板，該觸控面板的反射色調於整個畫面中穩定，且對於高溫高濕等的環境變動亦表現得穩定，可穩定地製造且品質穩定。As described in the above-mentioned "Problems to be Solved by the Invention", the present invention is an invention which aims to provide a touch panel which is excellent in responsiveness and excellent in use even in a large area. A metal thin wire electrode for realizing multi-touch, and an object of the above invention is to provide a touch panel having a reflection color that is stable throughout the entire screen and stable to environmental changes such as high temperature and high humidity. It can be manufactured stably and has stable quality.

以下，詳細地對上述本發明的觸控面板進行說明。再者，於本說明書中，「～」是作為如下的意思而被使用，該意思是包含「～」前後所揭示的數值作為下限值以及上限值。Hereinafter, the touch panel of the present invention described above will be described in detail. In the present specification, "~" is used as the following meaning, and the meaning is a numerical value disclosed before and after "~" as a lower limit and an upper limit.

圖1（a）、圖1（b）表示第一本發明的觸控面板10的剖面圖，該圖1（a）、圖1（b）例示了多層構成的靜電容量方式觸控面板，該多層構成的靜電容量方式觸控面板自圖1（a）的上側的觸控者側起，包含：構成觸控面的透明材料層16、兼作為絕緣層的黏著層19、第一感測電極陣列11、易黏接層18、透明基板15、兼作為絕緣層的黏著層19'、第二感測電極陣列12、易黏接層18'、透明基板15'、黏著層19"、以及剝離薄膜（film）17。圖1（a）、圖1（b）的下部的黏著層與剝離薄膜是用以使本發明的觸控面板附著於影像顯示裝置等的要件，且亦可不存在該要件。圖1（b）的構成與圖1（a）的構成的不同點在於：易黏接層、感測電極陣列、以及黏著層呈對稱地積層於透明基板15的兩個面。1(a) and 1(b) are cross-sectional views showing a touch panel 10 according to a first aspect of the present invention, and FIGS. 1(a) and 1(b) illustrate a multi-layered electrostatic capacitance type touch panel. The multi-layered electrostatic capacitance type touch panel comprises, from the upper toucher side of FIG. 1( a ), a transparent material layer 16 constituting a touch surface, an adhesive layer 19 serving as an insulating layer, and a first sensing electrode. The array 11, the easy-adhesion layer 18, the transparent substrate 15, the adhesive layer 19' serving as an insulating layer, the second sensing electrode array 12, the easy-adhesion layer 18', the transparent substrate 15', the adhesive layer 19", and the peeling Film 17. The adhesive layer and the release film in the lower portion of FIGS. 1(a) and 1(b) are required for attaching the touch panel of the present invention to an image display device or the like, and may not exist. The configuration of FIG. 1(b) differs from the configuration of FIG. 1(a) in that the easy-adhesion layer, the sensing electrode array, and the adhesive layer are symmetrically laminated on both faces of the transparent substrate 15.

上述圖1（a）表示將上部電極與下部電極形成於不同的透明基板上時的較佳構成，圖1（b）表示在一塊透明基板的表背面形成第一感測電極陣列與第二感測電極陣列時的較佳構成。Fig. 1(a) shows a preferred configuration when the upper electrode and the lower electrode are formed on different transparent substrates, and Fig. 1(b) shows the formation of the first sensing electrode array and the second sense on the front and back surfaces of a transparent substrate. A preferred configuration for the electrode array.

再者，圖中雖未顯示，但第一感測電極陣列的配置方向、與第二感測電極陣列的配置方向是設定為隔著透明基板而彼此正交地配置，且採用可對多點觸控進行檢測的構成。Further, although not shown in the drawing, the arrangement direction of the first sensing electrode array and the arrangement direction of the second sensing electrode array are set to be orthogonal to each other across the transparent substrate, and a multi-point can be adopted. The composition of the touch detection.

以下，依序對上述感測電極中所使用的材料以及電極的製造方法進行說明。Hereinafter, the materials used in the above-described sensing electrodes and the method of manufacturing the electrodes will be described in order.

[透明材料層、透明基板][Transparent material layer, transparent substrate]

上述構成觸控面的透明材料層16、及透明基板15、15'中所使用的透明的材料可為相同的材料，亦可分別使用不同的材料，可使用塑膠薄膜（plastic film）、塑膠板、以及玻璃（glass）板等。較佳為根據各個用途來適當地對層的厚度進行選擇。上述材料較佳為具有可撓性。The transparent material layer 16 constituting the touch surface and the transparent material used in the transparent substrate 15 and 15' may be the same material, or different materials may be used, and a plastic film or a plastic plate may be used. And glass plates, etc. It is preferred to appropriately select the thickness of the layer in accordance with each use. The above materials are preferably flexible.

作為上述塑膠薄膜以及塑膠板的原料，例如可使用聚對苯二甲酸乙二醇酯（Polyethylene Terephthalate，PET）、聚萘二甲酸乙二醇酯（Polyethylene Naphthalate，PEN）等的聚酯類；聚乙烯（Polyethylene，PE）、聚丙烯（Polypropylene，PP）、聚苯乙烯、以及乙烯醋酸乙烯酯（Ethylene Vinyl Acetate，EVA）等的聚烯烴類；乙烯系樹脂；此外，可使用聚碳酸酯（Polycarbonate，PC）、聚醯胺、聚醯亞胺、丙烯酸樹脂、以及三乙醯纖維素（Triacetylcellulose，TAC）等。As a raw material of the plastic film and the plastic sheet, for example, a polyester such as polyethylene terephthalate (PET) or polyethylene naphthalate (PEN) can be used; Polyolefin (PE), Polypropylene (PP), Polystyrene, Ethylene Vinyl Acetate (EVA), etc.; Vinyl resin; in addition, polycarbonate (Polycarbonate) , PC), polyamine, polyimine, acrylic resin, and triacetyl cellulose (TAC).

作為較佳的材料，PET（熔點：258℃）、PEN（熔點：269℃）、PE（熔點：135℃）、PP（熔點：163℃）、聚苯乙烯（熔點：230℃）、聚氯乙烯（熔點：180℃）、聚偏二氯乙烯（熔點：212℃）或TAC（熔點：290℃）等的熔點約為290℃以下的塑膠薄膜或塑膠板較佳，根據光透射性或加工性等的觀點，PET尤佳。薄膜或板的厚度較佳為50 µm至300 µm。Preferred materials are PET (melting point: 258 ° C), PEN (melting point: 269 ° C), PE (melting point: 135 ° C), PP (melting point: 163 ° C), polystyrene (melting point: 230 ° C), polychlorinated A plastic film or a plastic plate having a melting point of about 290 ° C or lower, such as ethylene (melting point: 180 ° C), polyvinylidene chloride (melting point: 212 ° C) or TAC (melting point: 290 ° C), is preferably light transmissive or processed. From the point of view of sex, PET is especially good. The thickness of the film or sheet is preferably from 50 μm to 300 μm.

為了防止由觸控引起的污垢、塵土的附著，上述構成觸控面的透明材料層16亦可設置防污層。又，亦可設置抗反射層，該抗反射層用以對由外部光線的反射所引起的畫面的模糊度進行改良。關於上述增設層，可利用抗反射薄膜或防眩薄膜的領域中的眾所周知的技術（日本專利特表2005-535934號、日本專利特開2007-301970號等）。In order to prevent the adhesion of dirt and dust caused by the touch, the transparent material layer 16 constituting the touch surface may be provided with an antifouling layer. Further, an anti-reflection layer for improving the blurriness of the image caused by reflection of external light may be provided. As the above-mentioned additional layer, a well-known technique in the field of an antireflection film or an antiglare film can be used (Japanese Patent Laid-Open Publication No. 2005-535934, Japanese Patent Laid-Open No. 2007-301970, etc.).

[易黏接層中所使用的材料與層的形成方法][Methods for forming materials and layers used in easy adhesion layers]

本發明的易黏接層18、18'於透明基板上包括一層或二層易黏接層，於該層中含有黏合劑（binder）樹脂、交聯劑以及添加劑。The easy-adhesion layer 18, 18' of the present invention comprises one or two layers of easy-adhesion layers on the transparent substrate, and the layer contains a binder resin, a crosslinking agent and an additive.

本發明中所使用的黏合劑樹脂並無特別的限制，但可較佳地使用（a）丙烯酸樹脂、（b）聚胺酯樹脂、（c）聚酯樹脂、以及（d）橡膠系樹脂等的聚合物（polymer）。The binder resin used in the present invention is not particularly limited, but polymerization of (a) an acrylic resin, (b) a polyurethane resin, (c) a polyester resin, and (d) a rubber-based resin or the like can be preferably used. Polymer.

（a）丙烯酸樹脂是以丙烯酸、甲基丙烯酸以及該兩者的衍生物為成分的聚合物。作為具體性例示，可列舉如下的聚合物，該聚合物是以丙烯酸、甲基丙烯酸、甲基丙烯酸甲酯、丙烯酸乙酯、丙烯酸丁酯、2-丙烯酸乙基己酯、丙烯酸醯胺、丙烯腈、以及羥基丙烯酸酯等為主成分，對可與上述主成分共聚的單體（例如苯乙烯、二乙烯基苯等）進行共聚而成。(a) The acrylic resin is a polymer containing acrylic acid, methacrylic acid, and derivatives of the two. Specific examples include polymers of acrylic acid, methacrylic acid, methyl methacrylate, ethyl acrylate, butyl acrylate, ethylhexyl acrylate, decyl acrylate, and propylene. A nitrile or a hydroxy acrylate is used as a main component, and a monomer copolymerizable with the above main component (for example, styrene or divinylbenzene) is copolymerized.

（b）聚胺酯樹脂是於主鏈中包括胺基甲酸酯鍵結的聚合物的總稱，且通常是藉由聚異氰酸酯與多元醇的反應而獲得。聚異氰酸酯有TDI、MDI、NDI、TODI、HDI、以及IPDI等，多元醇有乙二醇、丙二醇、丙三醇、以及己三醇等。又，亦可使用如下的聚合物作為本發明的異氰酸酯，該聚合物是對藉由聚異氰酸酯與多元醇的反應而獲得的聚胺酯聚合物進行鏈延長處理，使分子量增大而成。關於以上所述的聚異氰酸酯、多元醇以及鏈延長處理，例如已揭示於「聚胺酯樹脂手冊」（岩田敬治編，日刊工業新聞社，昭和62年發行）中。(b) The polyurethane resin is a general term for a polymer including a urethane bond in a main chain, and is usually obtained by a reaction of a polyisocyanate with a polyol. The polyisocyanate is TDI, MDI, NDI, TODI, HDI, and IPDI, and the polyols include ethylene glycol, propylene glycol, glycerin, and hexanetriol. Further, as the isocyanate of the present invention, a polymer obtained by subjecting a polyaminoester polymer obtained by a reaction between a polyisocyanate and a polyhydric alcohol to a chain extension treatment to increase the molecular weight may be used. The polyisocyanate, the polyhydric alcohol, and the chain extension treatment described above are disclosed, for example, in the "Handbook of Polyurethane Resin" (Iwata Keiji, Nikkan Kogyo Shimbun, issued in Showa 62).

（c）聚酯樹脂是於主鏈中包括酯鍵結的聚合物的總稱，且通常是藉由多羧酸與多元醇的反應而獲得。多羧酸例如有富馬酸、亞甲基丁二酸、己二酸、癸二酸、對苯二甲酸、以及間苯二甲酸等，多元醇例如可列舉上述醇。關於聚酯樹脂以及該聚酯樹脂的原料，例如已揭示於「聚酯樹脂手冊」（滝山榮一郎著，日刊工業新聞社，昭和63年發行）中。(c) The polyester resin is a general term for a polymer including an ester bond in a main chain, and is usually obtained by a reaction of a polycarboxylic acid with a polyhydric alcohol. Examples of the polycarboxylic acid include fumaric acid, methylene succinic acid, adipic acid, sebacic acid, terephthalic acid, and isophthalic acid. Examples of the polyhydric alcohol include the above alcohols. The polyester resin and the raw material of the polyester resin are disclosed, for example, in the "Polyester Resin Handbook" (written by Daisuke Eiyama, Nikkan Kogyo Shimbun, issued in Showa 63).

本發明中的（d）橡膠系樹脂是指合成橡膠中的二烯系合成橡膠。具體例有聚丁二烯、苯乙烯-丁二烯共聚物、苯乙烯-丁二烯-丙烯腈共聚物、苯乙烯-丁二烯-二乙烯基苯共聚物、丁二烯-丙烯腈共聚物、以及聚氯丁二烯等。關於橡膠系樹脂，例如已揭示於「合成橡膠手冊」（神原周等人編集，（股）朝倉書店，昭和42年發行）中。The (d) rubber-based resin in the present invention means a diene-based synthetic rubber in a synthetic rubber. Specific examples are polybutadiene, styrene-butadiene copolymer, styrene-butadiene-acrylonitrile copolymer, styrene-butadiene-divinylbenzene copolymer, butadiene-acrylonitrile copolymerization. And polychloroprene, etc. The rubber-based resin has been disclosed, for example, in the "Synthetic Rubber Handbook" (edited by Shinohara et al., (share) Asakura Bookstore, issued in Showa 42).

作為本發明中所使用的交聯劑，例如可列舉環氧化合物、噁唑啉化合物、三聚氰胺化合物、以及異氰酸酯化合物。Examples of the crosslinking agent used in the present invention include an epoxy compound, an oxazoline compound, a melamine compound, and an isocyanate compound.

作為本發明中所使用的環氧化合物，可列舉多聚環氧化合物、二環氧化合物、單環氧化合物、以及縮水甘油胺化合物等，作為多聚環氧化合物，例如可列舉山梨糖醇、聚縮水甘油醚、聚丙三醇聚縮水甘油醚、季戊四醇聚縮水甘油醚、二丙三醇聚縮水甘油醚、三縮水甘油基三(2-羥乙基)異氰酸酯、丙三醇聚縮水甘油醚、以及三羥甲基丙烷聚縮水甘油醚；作為二環氧化合物，例如可列舉新戊二醇二縮水甘油醚、1,6-己二醇二縮水甘油醚、間苯二酚二縮水甘油醚、乙二醇二縮水甘油醚、聚乙二醇二縮水甘油醚、丙二醇二縮水甘油醚、聚丙二醇二縮水甘油醚、以及聚丁二醇二縮水甘油醚；作為單環氧化合物，例如可列舉烯丙基環氧丙基醚、2-乙基己基縮水甘油醚、苯基縮水甘油醚；作為縮水甘油胺化合物，可列舉N,N,N',N',-四縮水甘油基-間二甲苯二胺、1,3-雙(N,N-縮水甘油基胺基)環己烷等。Examples of the epoxy compound used in the present invention include a polyepoxy compound, a diepoxy compound, a monoepoxy compound, and a glycidylamine compound. Examples of the polyepoxy compound include sorbitol. Polyglycidyl ether, polyglycerol polyglycidyl ether, pentaerythritol polyglycidyl ether, diglycerol polyglycidyl ether, triglycidyl tris(2-hydroxyethyl) isocyanate, glycerol polyglycidyl ether, And a trimethylolpropane polyglycidyl ether; examples of the diepoxy compound include neopentyl glycol diglycidyl ether, 1,6-hexanediol diglycidyl ether, and resorcinol diglycidyl ether. Ethylene glycol diglycidyl ether, polyethylene glycol diglycidyl ether, propylene glycol diglycidyl ether, polypropylene glycol diglycidyl ether, and polybutylene glycol diglycidyl ether; as a monoepoxy compound, for example, an alkene Propyl epoxypropyl ether, 2-ethylhexyl glycidyl ether, phenyl glycidyl ether; as a glycidylamine compound, N, N, N', N', - tetraglycidyl-m-xylene Diamine, 1,3-double (N, N- Glycidylamino)cyclohexane or the like.

本發明中所使用的噁唑啉化合物較佳為含有噁唑啉基的聚合物。可藉由含有加成聚合性噁唑啉基的單體單獨製作此種聚合物，或可藉由與其他單體聚合而製作此種聚合物。含有加成聚合性噁唑啉基的單體可列舉2-乙烯基-2-噁唑啉、2-乙烯基-4-甲基-2-噁唑啉、2-乙烯基-5-甲基-2-噁唑啉、2-異丙烯基-2-噁唑啉、2-異丙烯基-4-甲基-2-噁唑啉、以及2-異丙烯基-5-乙基-2-噁唑啉等，可使用上述一種含有加成聚合性噁唑啉基的單體，或可使用2種以上的含有加成聚合性噁唑啉基的單體的混合物。其中，2-異丙烯基-2-噁唑啉於工業方面亦易於獲得，因此較佳。其他單體只要是可與含有加成聚合性噁唑啉基的單體共聚的單體，則無限制，例如可列舉丙烯酸烷基酯、甲基丙烯酸烷基酯（烷基為甲基、乙基、n-丙基、異丙基、n-丁基、異丁基、t-丁基、2-乙基己基、及環己基）等的(甲基)丙烯酸酯((metha) acrylic acid ester)類；丙烯酸、甲基丙烯酸、亞甲基丁二酸、馬來酸、富馬酸、巴豆酸、苯乙烯磺酸及其鹽（鈉鹽、鉀鹽、銨鹽、及第三胺鹽等）等的不飽和羧酸類；丙烯腈、甲基丙烯腈等的不飽和腈類；丙烯醯胺、甲基丙烯醯胺、N-烷基丙烯醯胺、N-烷基甲基丙烯醯胺、N,N-二烷基丙烯醯胺、及N,N-二烷基甲基丙烯酸酯（烷基為甲基、乙基、n-丙基、異丙基、n-丁基、異丁基、t-丁基、2-乙基己基、及環己基等）等的不飽和醯胺基類；乙酸乙烯酯、丙酸乙烯酯等的乙烯酯類；甲基乙烯醚、乙基乙烯醚等的乙烯醚類；伸乙基、丙烯等的α-烯烴類；氯乙烯、偏二氯乙烯、及氟乙烯等的含鹵素α,β-不飽和單體類；以及苯乙烯、α-甲基苯乙烯等的α,β-不飽和芳香族單體等，可使用上述一種單體，或可使用2種以上的單體。The oxazoline compound used in the present invention is preferably a oxazoline group-containing polymer. Such a polymer may be produced by a monomer containing an addition polymerizable oxazoline group, or may be produced by polymerization with another monomer. Examples of the monomer having an addition polymerizable oxazoline group include 2-vinyl-2-oxazoline, 2-vinyl-4-methyl-2-oxazoline, and 2-vinyl-5-methyl group. -2-oxazoline, 2-isopropenyl-2-oxazoline, 2-isopropenyl-4-methyl-2-oxazoline, and 2-isopropenyl-5-ethyl-2- As the oxazoline or the like, a monomer containing an addition polymerizable oxazoline group or a mixture of two or more monomers containing an addition polymerizable oxazoline group can be used. Among them, 2-isopropenyl-2-oxazoline is also industrially easy to obtain, and thus is preferable. The other monomer is not particularly limited as long as it is a monomer copolymerizable with a monomer having an addition polymerizable oxazoline group, and examples thereof include an alkyl acrylate and an alkyl methacrylate (alkyl group is methyl group, and ethyl group). (meth)acrylic acid ester (meth) acrylate, n-propyl, isopropyl, n-butyl, isobutyl, t-butyl, 2-ethylhexyl, and cyclohexyl) ); acrylic acid, methacrylic acid, methylene succinic acid, maleic acid, fumaric acid, crotonic acid, styrene sulfonic acid and salts thereof (sodium, potassium, ammonium, and tertiary amine salts, etc.) Or unsaturated carboxylic acids; unsaturated nitriles such as acrylonitrile and methacrylonitrile; acrylamide, methacrylamide, N-alkyl acrylamide, N-alkyl methacrylamide, N,N-dialkyl acrylamide, and N,N-dialkyl methacrylate (alkyl is methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl Unsaturated guanamine groups such as t-butyl, 2-ethylhexyl, and cyclohexyl; vinyl esters such as vinyl acetate and vinyl propionate; methyl vinyl ether, ethyl vinyl ether, etc. Vinyl ethers And α-olefins such as propylene; halogen-containing α,β-unsaturated monomers such as vinyl chloride, vinylidene chloride and vinyl fluoride; and α,β- such as styrene and α-methylstyrene; As the unsaturated aromatic monomer or the like, one type of the above monomers may be used, or two or more types of monomers may be used.

本發明中所使用的三聚氰胺化合物較佳為如下的化合物以及上述化合物的混合物，上述化合物是使作為低級醇的甲醇、乙醇、及異丙醇等與對三聚氰胺與甲醛進行縮合所得的羥甲基三聚氰胺衍生物發生反應而醚化所得。作為羥甲基三聚氰胺衍生物，例如可列舉單羥甲基三聚氰胺、二羥甲基三聚氰胺、三羥甲基三聚氰胺、四羥甲基三聚氰胺、五羥甲基三聚氰胺、以及六羥甲基三聚氰胺等。The melamine compound used in the present invention is preferably a compound obtained by mixing methanol, ethanol, and isopropanol as a lower alcohol with methylol melamine obtained by condensing melamine with formaldehyde, and a mixture of the above compounds. The derivative is reacted and etherified. Examples of the methylol melamine derivative include monomethylol melamine, dimethylol melamine, trimethylol melamine, tetramethylol melamine, pentamethylol melamine, and hexamethylol melamine.

作為本發明中所使用的異氰酸酯化合物，例如可列舉甲苯二異氰酸酯、二苯基甲烷-4,4'-二異氰酸酯、間氯過氧苯甲酸、六亞甲基-1,6-二異氰酸酯、1,6-二異氰酸酯己烷、甲苯二異氰酸酯與己三醇的加成物、甲苯二異氰酸酯與三羥甲基丙烷的加成物、多元醇改性二苯基甲烷-4,4'-二異氰酸酯、碳二醯亞胺改性二苯基甲烷-4,4'-二異氰酸酯、異佛爾酮二異氰酸酯、1,5-萘二異氰酸酯、3,3'-二甲苯基-4,4'二異氰酸酯、3,3'二甲基二苯基甲烷-4,4'-二異氰酸酯、以及間苯基二異氰酸酯等。Examples of the isocyanate compound used in the present invention include toluene diisocyanate, diphenylmethane-4,4'-diisocyanate, m-chloroperoxybenzoic acid, hexamethylene-1,6-diisocyanate, and 1 , 6-diisocyanate hexane, adduct of toluene diisocyanate and hexanetriol, adduct of toluene diisocyanate and trimethylolpropane, polyol modified diphenylmethane-4,4'-diisocyanate , carbodiimide modified diphenylmethane-4,4'-diisocyanate, isophorone diisocyanate, 1,5-naphthalene diisocyanate, 3,3'-dimethylphenyl-4,4' Isocyanate, 3,3' dimethyldiphenylmethane-4,4'-diisocyanate, and m-phenyl diisocyanate.

對於可添加於易黏接層的交聯劑的添加量而言，相對於黏合劑，較佳為以1 wt%～100 wt%的範圍來進行添加，5 wt%～50 wt%的範圍更佳。若添加量少於1 wt%，則黏接性不充分，另一方面，若添加量超過100 wt%，則表面狀態有可能會變差。The amount of the crosslinking agent which can be added to the easy-adhesion layer is preferably from 1 wt% to 100 wt%, and from 5 wt% to 50 wt%, more preferably in the range of from 1 wt% to 100 wt%. good. When the amount added is less than 1% by weight, the adhesion is insufficient. On the other hand, if the amount added exceeds 100% by weight, the surface state may be deteriorated.

可根據各個目的而將各種添加劑使用於本發明的易黏接層，例如可使用日本專利特開2007-203635號的段落27～段落29所揭示的折射率調整用的微粒子、上述專利的段落30所揭示的捲繞為輥狀時的黏接防止用的消光劑或潤滑劑、以及上述專利的段落32所揭示的塗佈性改良用的各種界面活性劑等。Various additives may be used for the easy-adhesion layer of the present invention for each purpose, and for example, fine particles for refractive index adjustment disclosed in paragraphs 27 to 29 of JP-A-2007-203635, paragraph 30 of the above patent may be used. The matting agent or lubricant for preventing adhesion in the case of being wound into a roll, and the various surfactants for improving the applicability disclosed in paragraph 32 of the above patent.

為了表現出對於透明基板的易黏接性，易黏接層亦可包含雙層的構成，即第一易黏接層與第二易黏接層。In order to exhibit the easy adhesion to the transparent substrate, the easy-adhesion layer may also comprise a double-layered structure, that is, the first easy-adhesion layer and the second easy-adhesion layer.

於雙層構成的情形時，若設為如下的構成，即，與透明基板相接的第一易黏接層包含聚酯，且第二易黏接層包含丙烯酸樹脂或胺酯樹脂，則容易表現出易黏接性。第一易黏接層與第二易黏接層中所使用的交聯劑較佳為噁唑啶化合物、環氧化合物、或異氰酸酯化合物。由於第二易黏接層成為最外層，因此，較佳為使用潤滑劑。In the case of a two-layer structure, the first easy-adhesion layer that is in contact with the transparent substrate contains polyester, and the second easy-adhesion layer contains an acrylic resin or an amine ester resin, which is easy. It shows easy adhesion. The crosslinking agent used in the first easy-adhesion layer and the second easy-adhesion layer is preferably a oxazolidine compound, an epoxy compound, or an isocyanate compound. Since the second easy-adhesion layer becomes the outermost layer, it is preferred to use a lubricant.

第一易黏接層的厚度較佳為30 nm以上且為300 nm以下，更佳為65 nm以上且為150 nm以下。於上述第一易黏接層的厚度不足30 nm的情形時，透明基板與第1層的黏接性有可能不充分。若上述第一易黏接層的厚度超過300 nm，則第1層的表面狀態有可能會變差，因此不佳。The thickness of the first easy-adhesion layer is preferably 30 nm or more and 300 nm or less, more preferably 65 nm or more and 150 nm or less. When the thickness of the first easy-adhesion layer is less than 30 nm, the adhesion between the transparent substrate and the first layer may be insufficient. If the thickness of the first easy-adhesion layer exceeds 300 nm, the surface state of the first layer may be deteriorated, which is not preferable.

第二易黏接層的厚度並無特別的限制，但為了一面確保優異的透明性，一面實現易黏接性，上述第二易黏接層的厚度較佳為10 nm以上且為5000 nm以下，更佳為20 nm以上且為1500 nm以下。若第2層的厚度不足10 nm，則與上層之間的黏接性有可能不充分，另一方面，若厚度超過5000 nm，則表面狀態有可能會變差。The thickness of the second easy-adhesion layer is not particularly limited, but the thickness of the second easy-adhesion layer is preferably 10 nm or more and 5000 nm or less in order to ensure excellent adhesion while ensuring excellent transparency. More preferably, it is 20 nm or more and 1500 nm or less. When the thickness of the second layer is less than 10 nm, the adhesion to the upper layer may be insufficient. On the other hand, if the thickness exceeds 5000 nm, the surface state may be deteriorated.

較佳為藉由塗佈來設置本發明的易黏接層。然而，形成塗佈層的方法並無特別的限制，可使用棒式塗佈機（bar coater）塗佈、斜板式塗佈機（slide coater）塗佈等的眾所周知的方法。再者，當形成第一層與第二層時，可使用相同的方法，亦可使用不同的方法。又，當形成第二層時，可與第一層同時進行塗佈之後，使該第一層與第二層乾燥，亦可對第一層進行塗佈且使該第一層乾燥之後，對第二層進行塗佈。It is preferred to provide the easy-adhesion layer of the present invention by coating. However, the method of forming the coating layer is not particularly limited, and a well-known method such as a bar coater coating or a slide coater coating can be used. Further, when the first layer and the second layer are formed, the same method may be used, or a different method may be used. Moreover, when the second layer is formed, the first layer and the second layer may be dried after being coated simultaneously with the first layer, or the first layer may be coated and the first layer may be dried, The second layer is coated.

可將不具有導電性的黏接劑使用於兼作為絕緣層的黏著層19、19'。存在多種黏接劑，其中，可使用丙烯酸樹脂系、環氧樹脂系、苯酚樹脂系、以及乙烯基樹脂系等。用以形成層的方法並無特別的限制，可使用網版（screen）印刷法等。An adhesive having no conductivity can be used for the adhesive layers 19, 19' which also serve as an insulating layer. There are various kinds of adhesives, and among them, an acrylic resin, an epoxy resin, a phenol resin, a vinyl resin, or the like can be used. The method for forming the layer is not particularly limited, and a screen printing method or the like can be used.

圖2（a）～圖2（d）表示第二本發明的觸控面板10的剖面圖，圖2（a）表示本發明的第一感測電極陣列11形成於透明基板15上的情形，圖2（b）表示第一感測電極陣列11與第二感測電極陣列12以與圖1（a）、圖1（b）相同的方式積層的情形。再者，圖中雖未顯示，但第一感測電極陣列的配置方向、與第二感測電極陣列的配置方向是設定為隔著透明基板而彼此正交地配置，且採用可實現多點觸控的構成。2(a) to 2(d) are cross-sectional views showing a second touch panel 10 of the present invention, and Fig. 2(a) is a view showing a state in which the first sensing electrode array 11 of the present invention is formed on a transparent substrate 15. Fig. 2(b) shows a case where the first sensing electrode array 11 and the second sensing electrode array 12 are laminated in the same manner as in Figs. 1(a) and 1(b). Further, although not shown in the drawing, the arrangement direction of the first sensing electrode array and the arrangement direction of the second sensing electrode array are set to be orthogonal to each other across the transparent substrate, and multiple points can be realized. The composition of the touch.

圖2（c）以及圖2（d）表示如下的情形，即，於圖2（b）的2個層的電極上設置有構成觸控面板所必需的層，且形成有與圖1（a）及圖1（b）相同的觸控面板。2(c) and 2(d) show a case where the layers necessary for the touch panel are provided on the electrodes of the two layers of FIG. 2(b), and are formed with FIG. 1 (a). ) The same touch panel as in Figure 1 (b).

上述第二本發明中所使用的[透明材料層、透明基板]、[易黏接層]的材料以及形成方法可使用第一本發明的項中所說明的材料以及形成方法。The material of the [transparent material layer, transparent substrate], [easy adhesion layer] used in the second invention described above and the method of forming the same can be used as described in the first aspect of the invention.

[反射色度][reflective chromaticity]

本發明的感測電極陣列的導電性金屬層具有固有的反射色，因此，必須儘可能地將反射色調整為中性色（neutral），較佳為對反射色度進行調整，使L*a*b*表色系統（color specification system）中的L*為6～13，a*為-0.7～1.5，b*為-5.0～1.2。The conductive metal layer of the sensing electrode array of the present invention has an inherent reflected color. Therefore, it is necessary to adjust the reflected color to a neutral color as much as possible, and it is preferable to adjust the reflected chromaticity so that L*a In the *b* color specification system, L* is 6 to 13, a* is -0.7 to 1.5, and b* is -5.0 to 1.2.

更佳為，L*為6～12，a*為-0.6～1.2，b*為-4.8～1.0。More preferably, L* is 6 to 12, a* is -0.6 to 1.2, and b* is -4.8 to 1.0.

再者，L*a*b*表色系統是國際照明委員會（Commission Internationale de l'Eclairage，CIE）於1976年製定的表色方法，本發明中的L*值、a*值、以及b*值是根據JIS-Z8729：1994所規定的方法來進行測定所得的值。JIS-Z8729的測定方法有利用反射的測定方法、以及利用透射的測定方法，但於本實施形態中，使用利用反射來進行測定所得的值。Furthermore, the L*a*b* color system is a color scheme developed by the Commission Internationale de l'Eclairage (CIE) in 1976, and the L* value, a* value, and b* in the present invention. The value is a value measured by a method defined in JIS-Z8729:1994. The measurement method of JIS-Z8729 includes a measurement method using reflection and a measurement method using transmission. However, in the present embodiment, a value obtained by measurement using reflection is used.

關於L*a*b*表色系統中的L*值、a*值、以及b*值，眾所周知，L*值表示明度，a*值與b*值表示色相與彩度。具體而言，若a*值的符號為正，則表示紅色的色相，若a*值的符號為負，則表示綠色的色相。若b*值的符號為正，則為黃色的色相，若b*值的符號為負，則為藍色的色相。又，a*值與b*值均是絕對值越大，則表示顏色的彩度越大且顏色越鮮豔，絕對值越小，則表示彩度越小。於本發明中，a*值自清晰的紅色系朝儘可能小的值變更，且b*值自清晰的黃色朝微不足道的藍色變更，藉此，意圖獲得易於識別的觸控面板。測定方法的詳情揭示於實例的項中。Regarding the L* value, the a* value, and the b* value in the L*a*b* color system, it is known that the L* value represents brightness, and the a* value and b* value represent hue and chroma. Specifically, if the sign of the a* value is positive, the hue of red is indicated, and if the sign of the a* value is negative, the hue of green is indicated. If the sign of the b* value is positive, it is a yellow hue, and if the sign of the b* value is negative, it is a blue hue. Further, the larger the a* value and the b* value are, the larger the absolute value is, and the greater the chroma of the color is, the more vivid the color is. The smaller the absolute value is, the smaller the chroma is. In the present invention, the a* value is changed from a clear red color to a value as small as possible, and the b* value is changed from a clear yellow to a negligible blue color, whereby an easily recognizable touch panel is intended. Details of the assay method are disclosed in the examples.

[感測電極陣列的構造][Configuration of Sensing Electrode Array]

圖3是對本發明的第一感測電極陣列11進行說明的圖，利用2根導電性細線，沿著X方向將正交格子狀的網格予以連結，構成一根電極。此種電極沿著Y方向排列，形成電極陣列。此處，關於X方向、Y方向，將製作觸控面板時的觸控畫面的縱方向定義為X方向，將橫方向定義為Y方向。圖3的網格構造為正方格子且外形亦大致為正方形，自電極方向所見的外形為菱形。於上述網格的外形部分，形成有由i表示的導電性的短線。圖4是對本發明的第二感測電極陣列12進行說明的圖，利用2根導電性細線，沿著Y方向將正交格子狀的網格予以連結，除此以外，與第一感測電極陣列11相同。3 is a view for explaining the first sensing electrode array 11 of the present invention, in which two orthogonal conductive lines are used to connect orthogonal grid-like grids along the X direction to form one electrode. Such electrodes are arranged in the Y direction to form an electrode array. Here, in the X direction and the Y direction, the vertical direction of the touch screen when the touch panel is produced is defined as the X direction, and the horizontal direction is defined as the Y direction. The grid of Fig. 3 is constructed as a square lattice and has a substantially square shape, and the shape seen from the electrode direction is a diamond shape. A short line of conductivity indicated by i is formed in the outline portion of the above-mentioned mesh. 4 is a view for explaining the second sensing electrode array 12 of the present invention, in which two orthogonal conductive lines are used to connect orthogonal grid-like grids in the Y direction, and the first sensing electrode is connected to the first sensing electrode. Array 11 is the same.

圖5表示對上述第一感測電極陣列與第二感測電極陣列進行正交配置時的透視圖，於整個觸控面，形成有導電性細線的大致均一的格子花紋。感測電極的部分通稱為鑽石構造，在處於電極之間且隔著電極的非導電部，配置有不與電極導通的導電性細線i。若在隔著電極的非導電部未配置有上述導電性細線i，則由於電極部與非導電部的反射率、折射率、以及極小的色調的差異等，非導電部的圖案有可能會被看到，因此，配置不導通的細線i。圖3～圖5的不導通的細線i被記載為孤立的導線，但亦可將上述細線i另外連結於電極，且用以對寄生電容進行控制。FIG. 5 is a perspective view showing a configuration in which the first sensing electrode array and the second sensing electrode array are arranged orthogonally, and a substantially uniform lattice pattern of conductive thin wires is formed on the entire touch surface. The portion of the sensing electrode is generally referred to as a diamond structure, and a conductive thin wire i that is not electrically connected to the electrode is disposed between the electrodes and the non-conductive portion interposed between the electrodes. When the conductive thin wire i is not disposed in the non-conductive portion interposed between the electrodes, the pattern of the non-conductive portion may be affected by the difference in reflectance, refractive index, and extremely small color tone between the electrode portion and the non-conductive portion. See, therefore, configure a thin line i that is not conductive. The non-conducting thin wires i of FIGS. 3 to 5 are described as isolated wires, but the thin wires i may be separately connected to the electrodes and used to control the parasitic capacitance.

格子狀的網格構造的導電性細線的線寬較佳為0.5 µm以上且為10 µm以下，更佳為1 µm以上且為8 µm以下，進而更佳為2 µm以上且為5 µm以下。將上述導電性細線的線寬設為0.5 µm以上且為10 µm以下，藉此，可易於加工且可防止產生干涉條紋。The line width of the conductive thin wires having a lattice-like mesh structure is preferably 0.5 μm or more and 10 μm or less, more preferably 1 μm or more and 8 μm or less, and still more preferably 2 μm or more and 5 μm or less. By setting the line width of the above-mentioned conductive thin wire to 0.5 μm or more and 10 μm or less, it is easy to process and interference fringes can be prevented.

構成網格的格子的一條邊的長度較佳為100 µm以上且為600 µm以下，進而較佳為150 µm以上且為350 µm以下。將上述格子的一條邊的長度設為100 µm以上且為600 µm以下，藉此，可兼顧光的透射性與低電阻值。The length of one side of the lattice constituting the mesh is preferably 100 μm or more and 600 μm or less, and more preferably 150 μm or more and 350 μm or less. The length of one side of the lattice is set to 100 μm or more and 600 μm or less, whereby the light transmittance and the low resistance value can be achieved.

為了避免由高週波驅動引起的導通，隔著電極的非導電部的寬度較佳為50 µm以上，更佳為100 µm以上，進而較佳為150 µm以上且為350 µm以下。In order to avoid conduction due to high-cycle driving, the width of the non-conductive portion interposed between the electrodes is preferably 50 μm or more, more preferably 100 μm or more, further preferably 150 μm or more and 350 μm or less.

感測電極陣列的電極的間隔較佳為2 mm以上且為8 mm以下，進而較佳為3 mm以上且為7 mm以下。The interval between the electrodes of the sensing electrode array is preferably 2 mm or more and 8 mm or less, and more preferably 3 mm or more and 7 mm or less.

圖6～圖8是表示與圖3～圖5的鑽石構造的電極圖案不同的帶狀構造的電極圖案的圖。6 to 8 are views showing electrode patterns of a strip structure different from the electrode patterns of the diamond structure of Figs. 3 to 5 .

圖6表示帶狀的第一感測電極陣列，且例示了如下的情形，即，構成陣列的電極r-i沿著Y方向延伸，且沿著X方向排列有i個電極r-i。圖中的rw表示感測電極r-i的寬度，rd表示感測電極之間的非導電性的邊界區域的寬度。Fig. 6 shows a strip-shaped first sensing electrode array, and exemplifies a case where the electrodes r-i constituting the array extend in the Y direction, and i electrodes r-i are arranged along the X direction. Rw in the figure represents the width of the sensing electrode r-i, and rd represents the width of the boundary region of the non-electroconductive between the sensing electrodes.

於圖6中，電極r-i為如下的細部構造，即，將4根沿著Y方向延伸的直線狀的細線予以連結，且包含多根將上述4根細線予以連結的X方向的連結線c。以如下的方式來設置連結線c，即，即便4根沿著Y方向延伸的直線狀的細線中的任一根細線發生斷裂等的故障，亦不會損害作為感測電極的功能。於上述連結線c的延長線上形成有導電性的細線的短線i。該短線i是不與電極連結的孤立的線。再者，於圖6中，將4根構成一個電極的直線狀的細線予以連結，可根據以下所揭示的電極之間的距離與細線之間的距離進行選擇。In FIG. 6, the electrode r-i has a detailed structure in which four linear thin wires extending in the Y direction are connected, and a plurality of connecting lines c in the X direction that connect the four thin wires are included. The connection line c is provided in such a manner that even if any one of the four linear thin wires extending in the Y direction is broken or the like, the function as the sensing electrode is not impaired. A short line i of a conductive thin wire is formed on the extension line of the connecting line c. This stub i is an isolated line that is not connected to the electrodes. Further, in Fig. 6, four linear thin wires constituting one electrode are connected, and the distance between the electrodes and the distance between the thin wires as disclosed below can be selected.

圖7表示帶狀的第二感測電極陣列，且例示了如下的情形，即，構成陣列的電極c-j沿著X方向延伸，且沿著Y方向排列有j個電極c-j。圖中的cw表示感測電極c-j的寬度，cd表示感測電極之間的非導電性的邊界區域的寬度。除此以外的條件與上述第一感測電極陣列中的條件相同。然而，亦可根據觸控面板的縱橫比等來將上述cw與cd予以變更。Fig. 7 shows a strip-shaped second sensing electrode array, and exemplifies a case where the electrodes c-j constituting the array extend in the X direction, and j electrodes c-j are arranged along the Y direction. Cw in the figure represents the width of the sensing electrode c-j, and cd represents the width of the boundary region of the non-electroconductive between the sensing electrodes. The conditions other than this are the same as those in the above-described first sensing electrode array. However, the above cw and cd may be changed according to the aspect ratio of the touch panel or the like.

圖8表示對上述第一感測電極陣列與第二感測電極陣列進行正交配置時的透視圖，於整個觸控面，形成有導電性細線的大致均一的格子花紋。於第一感測電極陣列與第二感測電極陣列未重疊的部分，以將上述第一感測電極陣列與第二感測電極陣列的間隙予以填埋的方式，配置有連結線c以及孤立的短線i。以於整個觸控面形成導電性細線的大致均一的格子花紋的方式，配置連結線c以及孤立的短線i，使得不會產生視認性上的問題。亦可將上述細線i另外連結於電極，且用以對寄生電容進行控制。FIG. 8 is a perspective view showing a configuration in which the first sensing electrode array and the second sensing electrode array are arranged orthogonally, and a substantially uniform lattice pattern of conductive thin wires is formed on the entire touch surface. Between the first sensing electrode array and the second sensing electrode array, the gap between the first sensing electrode array and the second sensing electrode array is buried, and the connecting line c is isolated and isolated. Short line i. The connecting line c and the isolated short line i are disposed so that the entire touch surface forms a substantially uniform lattice pattern of the conductive thin wires, so that no problem in visibility is caused. The thin wire i may be additionally connected to the electrode and used to control the parasitic capacitance.

構成帶狀的感測電極陣列的各個電極的細線、連結部c的細線、以及孤立短線i的細線的線寬較佳為0.5 µm以上且為10 µm以下，更佳為1 µm以上且為8 µm以下，進而較佳為2 µm以上且為5 µm以下。將上述細線的線寬設為0.5 µm以上且為10 µm以下，藉此，可易於加工且可防止產生干涉條紋。The line width of the thin line of each electrode constituting the strip-shaped sensing electrode array, the thin line of the connecting portion c, and the thin line of the isolated short line i is preferably 0.5 μm or more and 10 μm or less, more preferably 1 μm or more and 8 It is preferably not more than 2 μm and not more than 5 μm. The line width of the thin line is set to 0.5 μm or more and 10 μm or less, whereby the processing can be easily performed and interference fringes can be prevented from occurring.

構成電極的細線的間隔較佳為100 µm以上且為600µm以下，進而較佳為150 µm以上且為350 µm以下。將上述細線的間隔設為100 µm以上且為600 µm以下，藉此，可兼顧光的透射性與低電阻值。The interval between the thin wires constituting the electrode is preferably 100 μm or more and 600 μm or less, and more preferably 150 μm or more and 350 μm or less. The interval between the thin lines is set to 100 μm or more and 600 μm or less, whereby the light transmittance and the low resistance value can be achieved.

為了避免由高週波驅動引起的導通，隔著電極的非導電部的寬度cd、rd較佳為50 µm以上，更佳為100 µm以上，進而較佳為150 µm以上且為350 µm以下。In order to avoid conduction due to high-cycle driving, the widths cd and rd of the non-conductive portions interposed between the electrodes are preferably 50 μm or more, more preferably 100 μm or more, further preferably 150 μm or more and 350 μm or less.

感測電極陣列的電極的間隔（rw＋rd或cw＋cd）較佳為2 mm以上且為8 mm以下，進而較佳為3 mm以上且為7 mm以下。The interval (rw+rd or cw+cd) of the electrodes of the sensing electrode array is preferably 2 mm or more and 8 mm or less, and more preferably 3 mm or more and 7 mm or less.

圖9（a）、圖9（b）是於作為本發明的觸控面板的形態的圖1（a）及圖1（b）、圖2（c）及圖2（d）的第一感測電極陣列11與第二感測電極陣列12的觸控者側表面設置有黑化層20及20'的圖。圖9（b）的第二感測電極陣列的黑化層設置於易黏接層與電極陣列之間。9(a) and 9(b) are first senses of Figs. 1(a) and 1(b), 2(c) and 2(d) as a form of the touch panel of the present invention. A map of the blackening layers 20 and 20' is provided on the toucher side surfaces of the electrode array 11 and the second sensing electrode array 12. The blackening layer of the second sensing electrode array of FIG. 9(b) is disposed between the easy-adhesion layer and the electrode array.

於本發明中，黑化層是為了實現如下的目的而設置的層，上述目的例如為使由形成導電性金屬細線的導電性金屬所具有的金屬光澤產生的著色、高反射率所引起的觸控面板畫面的模糊度緩和；或防止導電性金屬的腐蝕或遷移。黑化層的顏色較佳為可實質上被識別為黑色的顏色，但只要可抑制金屬光澤，則亦不一定必須為純黑色。根據上述目的，黑化層的位置較佳為處於與導電性金屬層相接的觸控者側。根據上述觀點，與圖9（b）的第二感測電極陣列的黑化層相比較，圖9（a）的第二感測電極陣列的黑化層的位置構成在防止腐蝕或遷移的方面更佳。In the present invention, the blackening layer is a layer provided for the purpose of achieving the following object, for example, the coloring and high reflectance caused by the metallic luster of the conductive metal forming the conductive metal thin wires. The blur of the control panel screen is moderated; or the corrosion or migration of conductive metal is prevented. The color of the blackening layer is preferably a color that can be substantially recognized as black, but it does not necessarily have to be pure black as long as the metallic luster can be suppressed. According to the above object, the position of the blackening layer is preferably on the toucher side that is in contact with the conductive metal layer. According to the above point of view, the position of the blackening layer of the second sensing electrode array of FIG. 9(a) is configured to prevent corrosion or migration as compared with the blackening layer of the second sensing electrode array of FIG. 9(b). Better.

[感測電極的材料][Material of sensing electrode]

以下，對可形成本發明的第一感測電極及第二感測電極的導電性材料進行說明。Hereinafter, a conductive material capable of forming the first sensing electrode and the second sensing electrode of the present invention will be described.

先前，使用ITO等的具有光透射性的導電性材料作為構成感測電極的材料，但本發明的感測電極利用10 µm以下的導電性細線，因此，必須使用電阻比先前的ITO等的電阻更低的材料，且較佳為使用導電性高的金屬或合金。作為此種金屬，例如可列舉銅、銀、金、鉑、鈀、鎳、錫、鋁、鈷、銠、銥、鐵、釕、鋨、錳、鉬、鎢、鈮、鉭、鈦、鉍、銻、以及鉛等。上述金屬中，根據導電性優異的觀點，銅、銀、金、鉑、鈀、鎳、錫、鋁以及這些金屬的合金較佳。Conventionally, a light-transmitting conductive material such as ITO is used as a material constituting the sensing electrode. However, the sensing electrode of the present invention uses a conductive thin wire of 10 μm or less. Therefore, it is necessary to use a resistor having a resistance higher than that of the prior ITO or the like. Lower materials, and preferably using highly conductive metals or alloys. Examples of such a metal include copper, silver, gold, platinum, palladium, nickel, tin, aluminum, cobalt, ruthenium, osmium, iron, ruthenium, osmium, manganese, molybdenum, tungsten, ruthenium, osmium, titanium, iridium,锑, and lead. Among the above metals, copper, silver, gold, platinum, palladium, nickel, tin, aluminum, and an alloy of these metals are preferred from the viewpoint of excellent conductivity.

當利用上述金屬或合金來形成電極時，可利用以下的A）～C）所揭示的材料與方法。於本發明中，A）與B）的材料與方法尤佳。When the electrode is formed using the above metal or alloy, the materials and methods disclosed in the following A) to C) can be utilized. In the present invention, materials and methods of A) and B) are particularly preferred.

A）金屬箔或薄膜的利用。A) Utilization of metal foil or film.

當用作薄膜時，首先，藉由真空蒸鍍法、濺鍍（sputtering）法、離子鍍（ion plating）法、以及電鍍法等，或利用鍍金法或金屬箔的貼合等，於基材上形成上述金屬或合金的金屬薄膜。該金屬薄膜的厚度並無特別的限定，但例如為100 nm至3000 nm。接著，對上述金屬薄膜實施以下的圖案化而形成網格電極。當藉由光蝕刻（photo etching）來形成上述網格圖案時，於金屬薄膜上形成光阻（photoresist）膜，使用光罩（photo mask）來曝光，且利用顯影液來顯影，藉此，形成光阻膜的網格圖案。藉由蝕刻液來對上述光阻膜的網格圖案進行蝕刻，將光阻膜予以剝離除去，藉此，形成包含細金屬線的網格圖案。或者當藉由印刷光阻劑來形成上述網格圖案時，利用網版印刷、凹版（gravure）印刷、以及噴墨（ink jet）等的方法，將光阻膜的網格圖案印刷至金屬薄膜上，藉由蝕刻液來對金屬薄膜中的光阻劑包覆部以外的部分進行蝕刻，將光阻膜予以剝離，藉此，形成金屬細線的網格圖案。When used as a film, first, by a vacuum deposition method, a sputtering method, an ion plating method, a plating method, or the like, or a plating method using a gold plating method or a metal foil, etc. A metal thin film of the above metal or alloy is formed thereon. The thickness of the metal thin film is not particularly limited, but is, for example, 100 nm to 3000 nm. Next, the metal thin film was subjected to the following patterning to form a grid electrode. When the mesh pattern is formed by photo etching, a photoresist film is formed on the metal film, exposed using a photo mask, and developed with a developing solution, thereby forming A grid pattern of the photoresist film. The mesh pattern of the photoresist film is etched by an etching solution, and the photoresist film is removed and removed, whereby a mesh pattern including fine metal wires is formed. Or when the grid pattern is formed by printing a photoresist, the grid pattern of the photoresist film is printed to the metal film by a method such as screen printing, gravure printing, and ink jet. Then, a portion other than the photoresist coating portion in the metal thin film is etched by the etching liquid, and the photoresist film is peeled off, whereby a mesh pattern of the metal thin wires is formed.

B）藉由包含導電性的奈米（nano）粒子的墨水（ink）（或漿料（paste））來印刷上述網格圖案的方法。B) A method of printing the above-described mesh pattern by an ink (or a paste) containing conductive nano particles.

導電性奈米粒子除了可使用上述金屬的微粒子之外，亦可使用碳（carbon）。導電性奈米粒子較佳為金、銀、鈀、鉑、銅、碳、或包含上述金屬的混合物的粒子。奈米粒子的平均粒徑為2 µm以下，較佳為200 nm至500 nm，在形成網格圖案的方面，粒徑比先前的微米（micron）粒子的粒徑更小的粒子較佳。可使用網版印刷法或凹版印刷法來印刷網格圖案。As the conductive nanoparticle, in addition to the fine particles of the above metal, carbon may be used. The conductive nanoparticle is preferably gold, silver, palladium, platinum, copper, carbon, or a particle containing a mixture of the above metals. The average particle diameter of the nanoparticles is 2 μm or less, preferably 200 nm to 500 nm, and particles having a particle diameter smaller than that of the previous micron particles are preferable in terms of forming a mesh pattern. The grid pattern can be printed using screen printing or gravure printing.

墨水（或漿料）所含的導電材料亦可並非為金屬粒子而是導電性纖維。於本案中，包含金屬線（wire）、被稱為奈米線（nanowire）的纖維狀的物質、中空構造的管（tube）、以及奈米管（nanotube）在內，稱為導電性纖維。金屬奈米線的平均短軸長度（有時稱為「平均短軸直徑」、「平均直徑」）較佳為100 nm以下，更佳為1 nm～50 nm，進而較佳為10 nm～40 nm，尤佳為15 nm～35 nm。當使用導電性纖維來形成導電層時，例如可將日本專利特開2009-215594、日本專利特開2009-242880、日本專利特開2009-299162、日本專利特開2010-84173、日本專利特開2010-87105、以及日本專利特開2010-86714所揭示的技術加以組合來形成上述導電層。The conductive material contained in the ink (or slurry) may not be a metal particle but a conductive fiber. In the present case, a conductive fiber is referred to as a wire, a fibrous material called a nanowire, a tube having a hollow structure, and a nanotube. The average minor axis length of the metal nanowire (sometimes referred to as "average short axis diameter" and "average diameter") is preferably 100 nm or less, more preferably 1 nm to 50 nm, and further preferably 10 nm to 40. Nm, especially 15 nm to 35 nm. When a conductive fiber is used to form a conductive layer, for example, Japanese Patent Laid-Open No. 2009-215594, Japanese Patent Laid-Open No. 2009-242880, Japanese Patent Laid-Open No. 2009-299162, Japanese Patent Laid-Open No. 2010-84173, and Japanese Patent Laid-Open The above-described conductive layers are formed by combining the techniques disclosed in Japanese Patent Laid-Open No. 2010-86714.

C）方法，該方法是使用照片中所使用的鹵化銀照片感光材料，對該材料實施網格圖案曝光之後，進行顯影、定影處理，利用顯影銀來獲得導電性的細線圖案。C) A method of using a silver halide photo-sensitive material used in a photograph, subjecting the material to a grid pattern exposure, performing development and fixing treatment, and obtaining a conductive thin line pattern by developing silver.

本發明中的獲得導電性的細線圖案的方法根據感光材料與顯影處理的形態，包含如下所述的3個形態。The method for obtaining a conductive fine line pattern in the present invention includes three aspects as described below depending on the form of the photosensitive material and the development treatment.

（1）形態：對不包含物理顯影核的感光性鹵化銀黑白感光材料進行化學顯影或熱顯影，使金屬銀部形成於該感光材料上。(1) Morphology: Chemical development or thermal development of a photosensitive silver halide black-and-white photosensitive material not containing a physical development core, and a metal silver portion is formed on the photosensitive material.

（2）形態：對在鹵化銀乳劑層中包含物理顯影核的感光性鹵化銀黑白感光材料進行溶解物理顯影，使金屬銀部形成於該感光材料上。(2) Form: A photosensitive silver halide black-and-white photosensitive material containing a physical development core in a silver halide emulsion layer is subjected to dissolution physical development to form a metal silver portion on the photosensitive material.

（3）形態：使不包含物理顯影核的感光性鹵化銀黑白感光材料、與具有包含物理顯影核的非感光性層的顯像片（sheet）重疊，且進行擴散轉印顯影，使金屬銀部形成於非感光性顯像片上。(3) Form: a photosensitive silver halide black-and-white photosensitive material not containing a physical development core is superposed on a sheet having a non-photosensitive layer containing a physical development nucleus, and diffusion-transfer development is performed to make metallic silver The portion is formed on the non-photosensitive display.

上述（1）的形態為一體型黑白顯影類型（type），於感光材料上形成光透射性導電膜等的透光性導電性膜。獲得的顯影銀為化學顯影銀或熱顯影銀，由於細絲（filament）的比表面積高，於後續的電鍍或物理顯影過程中，活性高。The form of the above (1) is an integrated black-and-white development type, and a light-transmitting conductive film such as a light-transmitting conductive film is formed on the photosensitive material. The obtained developed silver is chemically developed silver or thermally developed silver, and the activity is high in the subsequent plating or physical development due to the high specific surface area of the filament.

對於上述（2）的形態而言，於曝光部中，物理顯影核近緣的鹵化銀粒子溶解而沈積於顯影核上，藉此，於感光材料上形成光透射性導電性膜等的透光性導電性膜。上述上述（2）的形態亦為一體型黑白顯影類型。顯影作用為物理顯影核上的析出作用，因此，活性高，但顯影銀為比表面積小的球形。In the aspect of the above (2), in the exposed portion, silver halide grains having a physical development core close to the edge are dissolved and deposited on the developing core, thereby forming a light transmissive conductive film or the like on the photosensitive material. Conductive film. The above aspect (2) is also an integrated black and white development type. The developing action is a precipitation action on the physical development nucleus, and therefore, the activity is high, but the developed silver has a spherical shape with a small specific surface area.

對於上述（3）的形態而言，於未曝光部中，鹵化銀粒子溶解且擴散，從而沈積於顯像片上的顯影核上，藉此，於顯像片上形成光透射性導電性膜等的透光性導電性膜。上述（3）的形態為所謂的分離類型（separate type），且為自感光材料將顯像片予以剝離來使用的形態。In the form of the above (3), the silver halide particles are dissolved and diffused in the unexposed portion, and are deposited on the developing core on the developing sheet, whereby a light-transmitting conductive film or the like is formed on the developing sheet. A light-transmitting conductive film. The form of the above (3) is a so-called separate type, and is a form in which a developing sheet is peeled off from a photosensitive material.

任一個形態均可選擇負（negative）型顯影處理以及反轉顯影處理中的任一種顯影（於擴散轉印方式的情形時，使用直接正（autopositive）型感光材料作為感光材料，藉此，可實現負型顯影處理）。Any of the negative development type development processing and the reverse development processing may be selected in any of the forms (in the case of the diffusion transfer method, an autopositive type photosensitive material is used as the photosensitive material, whereby Achieve negative development processing).

此處所謂的化學顯影、熱顯影、溶解物理顯影、以及擴散轉印顯影表示如業界通常使用的用語所述的意思，且解說於照片化學的一般教科書例如菊地真一著的「照片化學」（共立出版社，1955年發行）、C.E.K.Mees編的「攝影法理論第四版（The Theory of Photographic Processes，4thed.）」（Mcmillan社，1977年發行）。本案為與液體處理相關的發明，但亦可參考應用熱顯影方式作為其他顯影方式的技術。例如，可應用日本專利特開2004-184693號、日本專利特開2004-334077號、以及日本專利特開2005-010752號的各公報所揭示的技術。The chemical development, thermal development, dissolved physical development, and diffusion transfer development referred to herein mean the meanings as used in the industry, and are explained in the general textbooks of photochemistry, such as "Photo Chemistry" (Kyoritsu) The publishing house, issued in 1955), The Theory of Photographic Processes (4thed.) edited by CEK Mees (Mcmillan, 1977). This case is an invention related to liquid processing, but it is also possible to refer to a technique in which a thermal development method is applied as another development method. For example, the techniques disclosed in the respective publications of JP-A-2004-184693, JP-A-2004-334077, and JP-A-2005-010752 can be applied.

又，關於本發明中所使用的材料與導電性圖案的製法，可使用網格狀的電磁波屏蔽（shield）膜的發明即日本專利特開2006-352073號的揭示與技術、以及靜電容量方式的觸控面板的發明即日本專利特願2009-265467號的揭示與技術。Further, as for the method for producing the material and the conductive pattern used in the present invention, a method of forming a grid-shaped electromagnetic wave shield film, that is, the disclosure and technology of Japanese Patent Laid-Open No. 2006-352073, and the electrostatic capacity method can be used. The invention of the touch panel is disclosed and disclosed in Japanese Patent Application No. 2009-265467.

[感測電極的形成方法][Method of forming a sensing electrode]

接著，對本發明的第一感測電極及第二感測電極的形成方法進行說明。Next, a method of forming the first sensing electrode and the second sensing electrode of the present invention will be described.

首先，一面參照圖10（a）～圖10（e），一面對利用金屬箔或薄膜（上述A））作為形成電極的材料時的形成方法進行說明。圖10（a）是兼作為絕緣層的透明基體15，且是例如約100 µm的PET薄膜。潔淨化該薄膜的表面，接著在該薄膜的表面設置金屬或合金的薄層21（圖10（b））。設置薄層的方法有真空製膜法與化學製膜法，但於膜薄的情形時，可使用蒸鍍法等的真空製膜法。濺鍍法或離子鍍法與蒸鍍法相比較，易於獲得導電性佳的膜且為較佳的方法。於膜厚超過500 nm的情形時，可使用電解電鍍法或無電解電鍍法，能夠以低成本來製膜，故而較佳。First, a method of forming a metal foil or a film (the above A) as a material for forming an electrode will be described with reference to FIGS. 10(a) to 10(e). Fig. 10 (a) is a transparent substrate 15 which also serves as an insulating layer, and is, for example, a PET film of about 100 μm. The surface of the film is cleaned, and then a thin layer 21 of metal or alloy is provided on the surface of the film (Fig. 10(b)). The method of providing the thin layer may be a vacuum film forming method or a chemical film forming method. However, when the film is thin, a vacuum film forming method such as a vapor deposition method can be used. Compared with the vapor deposition method, the sputtering method or the ion plating method is easy to obtain a film having good conductivity and is a preferred method. When the film thickness exceeds 500 nm, electrolytic plating or electroless plating can be used, and film formation can be performed at low cost, which is preferable.

金屬可使用上述（1）所揭示的材料，但較佳為使用銀、銅、鋁或這些金屬的合金。可使用濺鍍法等作為薄層的形成方法，但亦可為其他方法。形成的金屬的薄層的厚度越薄，則越不易剝離，因此較佳，但若上述金屬的薄層的厚度薄，則電阻會變高，作為觸控面板的響應性會變差，因此，上述金屬的薄層的厚度較佳為0.1 µm以上且為3 µm以下，更佳為0.2 µm以上且為2 µm以下。為了防止剝離，較佳為將「線寬/厚度」的比率設為2.5以上，進而較佳為將上述比率設為4以上。As the metal, the material disclosed in the above (1) can be used, but it is preferred to use silver, copper, aluminum or an alloy of these metals. A sputtering method or the like can be used as a method of forming a thin layer, but other methods are also possible. The thinner the thickness of the thin metal layer to be formed, the more difficult it is to peel off. Therefore, when the thickness of the thin metal layer is thin, the electric resistance is increased, and the responsiveness of the touch panel is deteriorated. The thickness of the thin layer of the above metal is preferably 0.1 μm or more and 3 μm or less, more preferably 0.2 μm or more and 2 μm or less. In order to prevent peeling, it is preferable to set the ratio of "line width/thickness" to 2.5 or more, and it is more preferable to set the ratio to 4 or more.

接著，於上述已形成的金屬薄膜上形成光阻膜，使用光罩（根據圖3、圖4、圖6、以及圖7等，該光罩為產生遮罩作用的構件）來曝光，且利用顯影液來顯影，藉此，形成硬化的光阻膜的網格圖案。藉由蝕刻液來對上述網格圖案進行蝕刻，將硬化的光阻膜予以剝離除去，藉此，形成包含細金屬線的網格圖案（圖10（c））。圖10（c）的31表示形成的網格圖案的導電性細線。Next, a photoresist film is formed on the formed metal thin film, and a photomask (the photomask is a member that generates a mask according to FIGS. 3, 4, 6, and 7, etc.) is used for exposure, and is utilized. The developer is developed to thereby form a mesh pattern of the cured photoresist film. The mesh pattern is etched by an etching solution, and the cured photoresist film is peeled off and removed, whereby a mesh pattern including fine metal wires is formed (FIG. 10(c)). 31 of Fig. 10(c) shows conductive thin wires of the formed mesh pattern.

接著，於上述已形成的感測電極上設置包覆層32（圖10（d））。於本發明中，將上述包覆層稱為黑化層。該黑化層具有不使金屬或合金的金屬光澤顯眼的視覺性功能，且具有因防止金屬銹蝕及防止遷移而使耐久性提高的功能。以下，另外對上述黑化層（包覆層）的材料進行說明。黑化層（包覆層）的厚度較佳為5 µm以下，更佳為3 µm以下，尤佳為0.2 µm以上且為2 µm以下。Next, a cladding layer 32 is provided on the above-described formed sensing electrode (Fig. 10(d)). In the present invention, the above coating layer is referred to as a blackening layer. The blackening layer has a visual function that does not make the metallic luster of the metal or alloy conspicuous, and has a function of improving durability by preventing metal corrosion and preventing migration. Hereinafter, the material of the blackening layer (coating layer) will be described. The thickness of the blackening layer (cladding layer) is preferably 5 μm or less, more preferably 3 μm or less, and particularly preferably 0.2 μm or more and 2 μm or less.

接著，除去上述黑化層（包覆層）的不將電極細線予以包覆的視認部上的黑化層，藉此，可形成視認性、耐久性優異的網格圖案的電極（圖10（e））。Then, the blackened layer on the visible portion of the blackened layer (coating layer) which does not cover the electrode thin wires is removed, whereby an electrode having a mesh pattern excellent in visibility and durability can be formed (FIG. 10 (FIG. 10) e)).

當使用包含導電性的奈米粒子的墨水（或漿料）時（上述B）），可將上述網格圖案直接印刷至兼作為絕緣層的透明基體層。於印刷之後，當根據需要，於進行熱處理等而形成的金屬圖案上設置黑化層時，可進行與上述相同的處理。When an ink (or slurry) containing conductive nanoparticles is used (B) above, the above-described mesh pattern can be directly printed onto a transparent substrate layer which also serves as an insulating layer. After the printing, when a blackening layer is provided on the metal pattern formed by heat treatment or the like as needed, the same treatment as described above can be performed.

[黑化層中所使用的材料與層的形成方法][Method of Forming Materials and Layers Used in Blackening Layer]

構成本發明的黑化層的主成分為選自鎳、鉻、鋅、錫、以及銅中的元素的至少一種化合物即可，可具有導電性，亦可不具有導電性。除了本發明的方法之外，亦可組合地使用染色法等的方法。The main component constituting the blackening layer of the present invention may be at least one compound selected from the group consisting of nickel, chromium, zinc, tin, and copper, and may or may not have conductivity. In addition to the method of the present invention, a method such as a dyeing method may be used in combination.

作為本發明中的黑化層的較佳的積層方法的例子，可列舉電鍍處理與化學蝕刻（chemical etching）法。Examples of a preferred lamination method of the blackened layer in the present invention include a plating treatment and a chemical etching method.

電鍍處理只要是眾所周知的被稱為黑色電鍍的處理，則無特別的限制，可列舉黑色鎳電鍍、黑色鉻電鍍、黑色Sn-Ni合金電鍍、Sn-Ni-Cu合金電鍍、以及黑色鋅鉻酸鹽（chromate）處理等作為例子。具體而言，可使用日本化學產業（股）製造的黑色電鍍浴（商品名為NIKKA BLACK，Sn-ni合金系）、（股）金屬化學工業製造的黑色電鍍浴（商品名為黑鉻（ebony chrome）85系列，Cr系）、DIPSOL（股）製的鉻酸鹽劑（商品名為ZB-541，鍍鋅黑色鉻酸鹽劑）。電鍍法可為無電解電鍍、電解電鍍中的任一種方法，可採用緩和的條件，亦可為高速電鍍。關於電鍍厚度，只要可識別出黑色，則厚度並無限定，但通常的電鍍厚度較佳為5 µm以下。The plating treatment is not particularly limited as long as it is a well-known treatment called black plating, and examples thereof include black nickel plating, black chrome plating, black Sn-Ni alloy plating, Sn-Ni-Cu alloy plating, and black zinc chromic acid. A chromate treatment or the like is taken as an example. Specifically, a black electroplating bath (trade name: NIKKA BLACK, Sn-ni alloy system) manufactured by Nippon Chemical Industry Co., Ltd., and a black electroplating bath manufactured by the metal chemical industry (trade name: black chrome (ebony) can be used. Chrome (85 series, Cr series), DIPSOL (stock) made of chromate (trade name ZB-541, galvanized black chromate). The electroplating method may be any one of electroless plating and electrolytic plating, and may be a mild condition or a high-speed electroplating. Regarding the plating thickness, the thickness is not limited as long as black can be recognized, but the usual plating thickness is preferably 5 μm or less.

於本發明中，亦可對導電性金屬部的一部分進行氧化處理或硫化處理而形成黑色部。例如於導電性金屬部為銅的情形時，作為銅表面的黑化處理劑的例子，可使用MELTEX（股）製造的商品名：ENPLATE MB438A、B；三菱瓦斯化學（股）製造的商品名：nPE-900；MEC（股）製造的商品名：MEC etch BOND BO-7770V；ISOLATE化學研究所製造的商品名：COPPER BLACK CuO、COPPER BLACK CuS、及硒系的COPPER BLACK no.65等。除了上述之外，當然例如亦可對硫化物進行處理而產生硫化氫（H22S），將銅的表面黑化為硫化銅（CuS）。對於上述處理而言，只要可識別為黑色，則厚度並無限定，但通常上述厚度較佳為3 µm以下，進而較佳為0.2 µm～2 µm。In the present invention, a part of the conductive metal portion may be subjected to an oxidation treatment or a vulcanization treatment to form a black portion. For example, when the conductive metal portion is copper, as an example of the blackening treatment agent for the copper surface, a product name manufactured by MELTEX Co., Ltd.: ENPLATE MB438A, B; Mitsubishi Gas Chemical Co., Ltd. may be used: nPE-900; MEC (stock) manufactured by MEC etch BOND BO-7770V; trade name manufactured by ISOLATE Chemical Research Institute: COPPER BLACK CuO, COPPER BLACK CuS, and selenium-based COPPER BLACK no. 65. In addition to the above, of course, the sulfide may be treated to generate hydrogen sulfide (H22S), and the surface of the copper may be blackened to copper sulfide (CuS). The thickness of the above treatment is not limited as long as it can be recognized as black. However, the thickness is usually preferably 3 μm or less, and more preferably 0.2 μm to 2 μm.

於本發明中，為了使感測電極陣列獲得所期望的反射色度，較佳為以2個步驟以上的步驟來進行黑化處理。例如較佳為於氧化處理之後進行還原處理，具體而言，利用含有亞氯酸鈉或過硫酸鈉等的氧化劑的鹼性水溶液來進行處理之後，利用含有二甲胺硼烷、硼氫化鈉、以及福馬林等的還原劑的溶液來進行處理。一般認為：前者是藉由使表面變粗糙來增加黑色調，後者是將因前者處理而變得不穩定的表面狀態予以穩定化，藉此，成為較佳的形態。In the present invention, in order to obtain a desired reflection chromaticity of the sensing electrode array, it is preferable to perform the blackening treatment in steps of two or more steps. For example, it is preferred to carry out a reduction treatment after the oxidation treatment, and specifically, after treatment with an alkaline aqueous solution containing an oxidizing agent such as sodium chlorite or sodium persulfate, the dimethylamine borane and sodium borohydride are used. A solution of a reducing agent such as formalin is used for the treatment. It is considered that the former is to increase the black tone by roughening the surface, and the latter is stabilized by the surface state which is unstable by the former treatment, thereby achieving a preferable form.

上述黑化層的表面較佳為具有某程度的表面粗糙度（Ra）。Ra較佳為0.15 µm以下，更佳為0.05 µm～0.14 µm。若Ra超過0.15 µm，則耐磨性或密著性有時會變差，因此不佳。The surface of the blackening layer preferably has a certain degree of surface roughness (Ra). Ra is preferably 0.15 μm or less, more preferably 0.05 μm to 0.14 μm. When Ra exceeds 0.15 μm, abrasion resistance or adhesion may be deteriorated, which is not preferable.

Ra的測定法大致分為呈直線地利用觸針來對面進行測定的方法（觸針）、以及光學性地進行測定的方法（光切斷法、光線反射法），亦可利用上述兩種方法中的任一種方法來進行測定。The measurement method of Ra is roughly classified into a method (a stylus) for measuring the surface by a straight line using a stylus, and a method for optically measuring (light cutting method or light reflection method), and the above two methods may be used. Either method is used for the measurement.

當導電性細線的線寬狹窄，且無法確保測定區域（area）時，除了將曝光區域擴大之外，以相同的操作來對已製作的導電性固體部分進行測定，且計算出Ra。When the line width of the conductive thin wires was narrow and the measurement area could not be secured, the prepared conductive solid portion was measured by the same operation except that the exposure region was enlarged, and Ra was calculated.

對應於使用觸控面板的影像顯示裝置的大型化，亦要求觸控面板本身實現大型化。對於大型化，電極必須實現低電阻化，並且電極之間的寄生電容必須降低，因此，若將擬（dummy）電極配置於電極之間，則有效果。擬電極是不與感測電極連接的孤立的電極群。然而，對於擬電極而言，為了對寄生電容進行控制，亦可將孤立短線予以連結而形成抽出線。Corresponding to the enlargement of the image display device using the touch panel, the touch panel itself is required to be enlarged. For the enlargement, the electrodes must be low-resistance, and the parasitic capacitance between the electrodes must be lowered. Therefore, it is effective to arrange the dummy electrodes between the electrodes. The pseudo electrode is an isolated electrode group that is not connected to the sensing electrode. However, for the pseudo electrode, in order to control the parasitic capacitance, the isolated short lines may be connected to form an extraction line.

[實例][Example]

以下，列舉本發明的實例來更具體地對本發明進行說明。再者，在不脫離本發明的宗旨的範圍內，可適當地將以下的實例所示的材料、使用量、比例、處理內容、以及處理順序等予以變更。因此，不應根據以下所示的具體例來限定性地對本發明的範圍進行解釋。Hereinafter, the invention will be more specifically described by exemplifying the examples of the invention. Further, the materials, the amounts used, the ratios, the processing contents, the processing order, and the like shown in the following examples can be appropriately changed without departing from the scope of the invention. Therefore, the scope of the invention should not be construed as being limited by the specific examples shown below.

首先，對本發明的實例中的評價方法進行說明。First, the evaluation method in the example of the present invention will be described.

[反射色度的測定法][Measurement of reflection chromaticity]

將樣本（sample）放置於英國陶瓷研究協會（British Ceramic Research Association，BCRA）黑瓷磚（tile）（光澤版）上，自0°方向進行照射，對以45°方向所接受的光的分光反射率進行測定。The sample was placed on a black tile (glossy version) of the British Ceramic Research Association (BCRA), irradiated from the 0° direction, and the spectral reflectance of the light received in the 45° direction was measured. The measurement was carried out.

再者，較佳的瓷磚為阪田油墨股份有限公司（SAKATA INX ENG.CO.,LTD.）製造的BCRA黑瓷磚（光澤版），關於黑瓷磚的反射色度，L*為3.6，a＊為-0.9，b*為-0.6。可使用格靈達麥克貝斯（Gretag Macbeth）製造的Spectro Eye LT作為反射濃度計。Further, the preferred tile is a BCRA black tile (glossy plate) manufactured by SAKATA INX ENG. CO., LTD., and the reflection chromaticity of the black tile is L* 3.6, a* is -0.9, b* is -0.6. A Spectro Eye LT manufactured by Gretag Macbeth can be used as a reflection densitometer.

[耐磨性的評價][Evaluation of wear resistance]

利用極細纖維的布即東麗（TORAY）製造的「TORAYSEE」，以500 g的負荷來往返地對樣本進行10次擦拭。以如下的5個階段來對擦拭之後的樣本進行評價。 1：完全無變化。 2：擦痕微弱且少量。 3：擦痕微弱，且整體上產生擦痕。 4：擦痕強且少量。 5：擦痕強，且整體上產生擦痕。The TORAYSEE made by TORAY, a cloth made of ultrafine fibers, was wiped back and forth 10 times with a load of 500 g. The samples after wiping were evaluated in the following five stages. 1: No change at all. 2: The scratches are weak and small. 3: The scratches are weak, and scratches are generated as a whole. 4: The scratches are strong and small. 5: The scratches are strong, and scratches are generated as a whole.

[密著的評價][close evaluation]

利用交叉切割（cross cut）法來對樣本的密著性進行評價，以如下的5個階段來對接下來的樣本進行評價。 1：完全無剝離。 2：於5%以下的部分中有剝離。 3：於超過5%且為10%以下的部分中有剝離。 4：於超過10%且為50%以下的部分中有剝離。 5：於超過50%的部分中有剝離。The adhesion of the sample was evaluated by a cross cut method, and the next sample was evaluated in the following five stages. 1: No peeling at all. 2: Peeling is in a portion of 5% or less. 3: Peeling is carried out in a portion exceeding 5% and not more than 10%. 4: Peeling in a portion exceeding 10% and being 50% or less. 5: Peeling in more than 50% of the parts.

[表面粗糙度Ra的評價][Evaluation of Surface Roughness Ra]

於試料上設置5 cm×5 cm的固體曝光的區域，使用MITUTOYO股份有限公司製造的小形表面粗糙度測定機SURF TEST SJ-301來進行測定。A solid exposed area of 5 cm × 5 cm was placed on the sample, and the measurement was performed using a small surface roughness measuring machine SURF TEST SJ-301 manufactured by MITUTOYO Co., Ltd.

實例1Example 1

[形成有雙層構成的易黏接層的透明基板A的製造][Manufacture of Transparent Substrate A Forming Easy-Adhesive Layer of Double Layer]

對厚度為100 µm的聚對苯二甲酸乙二醇酯（以下記載為PET）薄膜支持體的兩個面進行電暈（corona）放電處理之後，藉由棒式塗佈法來將下述的第1層塗佈液塗佈至上述兩個面，使上述第1層塗佈液乾燥，從而形成第1層。然後，藉由棒式塗佈法來將下述的第2層塗佈液塗佈至已形成的第1層的表面，使上述第2層塗佈液乾燥，藉此來製造PET薄膜，該PET薄膜於薄膜的兩個面包括雙層構成的易黏接層。再者，第1層、第2層的乾燥之後的厚度分別為0.08 µm、0.09 µm。After corona discharge treatment was performed on both faces of a polyethylene terephthalate (hereinafter referred to as PET) film support having a thickness of 100 μm, the following method was applied by a bar coating method. The first layer coating liquid is applied to the above two surfaces, and the first layer coating liquid is dried to form a first layer. Then, the second layer coating liquid described below is applied to the surface of the formed first layer by a bar coating method, and the second layer coating liquid is dried to produce a PET film. The PET film comprises an easy-adhesion layer composed of two layers on both sides of the film. Further, the thicknesses of the first layer and the second layer after drying were 0.08 μm and 0.09 μm, respectively.

第1層塗佈液體的組成 ・聚酯樹脂黏合劑（大日本油墨化學工業（股）製造，FINETEX ES650，固形物為29 wt%）       49.7質量份 ・作為交聯劑的環氧系化合物（長瀨化成（股）製造，DENACOL EX-314）         相對於樹脂黏合劑為6 wt% ・界面活性劑A（三洋化成工業（股），SANDET BL，固形物10 wt%，陰離子性）                2.3質量份 ・界面活性劑B（三洋化成工業（股），NAROACTY HN-100，固形物為5%，非離子性）        5.36質量份 ・作為消光劑A的氧化矽微粒子分散液（日本AEROSIL（股）製造，OX-50的水分散物，固形物為10%） 2.4質量份 ・作為消光劑B的膠體氧化矽分散液（日產化學（股）製造，SNOWTEX-XL，固形物為10%）      4.6質量份 以整體達到1000質量份的方式，添加蒸餾水來進行調製。Composition of the first layer coating liquid, polyester resin binder (manufactured by Dainippon Ink Chemicals Co., Ltd., FINETEX ES650, solid content: 29 wt%) 49.7 parts by mass, epoxy compound as a crosslinking agent (long濑化成(股)Manufacture, DENACOL EX-314) 6 wt% based on resin binder ・Interfacial agent A (Sanyo Chemical Industry Co., Ltd., SANDET BL, solid content 10 wt%, anionic) 2.3 parts by mass Surfactant B (Sanyo Chemical Industry Co., Ltd., NAROACTY HN-100, solid content 5%, nonionic) 5.36 parts by mass ・Oxidized cerium microparticle dispersion as matting agent A (Manufactured by AEROSIL Co., Ltd., OX) -50 water dispersion, solid content: 10%) 2.4 parts by mass ・Colloidal cerium oxide dispersion as matting agent B (manufactured by Nissan Chemical Co., Ltd., SNOWTEX-XL, solid content: 10%) 4.6 parts by mass To 1000 parts by mass, distilled water was added for preparation.

第2層塗佈液體的組成 ・丙烯酸樹脂黏合劑（MMA59 mol%，St9 mol%，2EHA26 mol%，HEMA5 mol%，AA1 mol%的乳膠，固形物濃度為28 wt%）                      62.7質量份 ・作為交聯劑的環氧系化合物（長瀨化成（股）製造，DENACOL EX-314）     相對於上述樹脂黏合劑為6 wt% ・上述的消光劑A                    2.7質量份 ・上述的消光劑B                    4.6質量份 ・界面活性劑A                      1.9質量份 ・界面活性劑B                     5.36質量份 ・潤滑劑（中京油脂（股），巴西棕櫚蠟分散物 SELOSOL524 固形物為3 wt%）            7.6質量份 以整體達到1000質量份的方式，添加蒸餾水來進行調製。Composition of the second layer coating liquid ・Acrylic resin binder (MMA59 mol%, St9 mol%, 2EHA26 mol%, HEMA5 mol%, AA1 mol% latex, solid content concentration: 28 wt%) 62.7 parts by mass Epoxy-based compound (manufactured by Nagase Chemical Co., Ltd., DENACOL EX-314) is 6 wt% based on the above-mentioned resin binder. 2.7 parts by mass of the above-mentioned matting agent A. 4.6 parts by mass of the above-mentioned matting agent B. Surfactant A 1.9 parts by mass, surfactant B 5.36 parts by mass, lubricant (Zhongjing Grease (share), carnauba wax dispersion SELOSOL 524 solid content: 3 wt%) 7.6 parts by mass to 1000 mass parts as a whole, Distilled water was added for preparation.

[本發明的感測電極陣列的製造][Manufacture of Sensing Electrode Array of the Present Invention]

於上述形成有易黏接層的透明基板A的易黏接層的一個面上，藉由電鍍法而形成銅的薄膜。電鍍是於無電解電鍍之後，進行電解電鍍，形成厚度為2 µm的銅的薄層。A film of copper is formed by electroplating on one surface of the easy-adhesion layer of the transparent substrate A on which the easy-adhesion layer is formed. Electroplating is performed by electroless plating after electroless plating to form a thin layer of copper having a thickness of 2 μm.

接著，於上述已形成的銅薄膜上形成光阻膜，使用光罩來對該光阻膜進行曝光，利用顯影液來顯影，藉此，形成硬化的光阻膜的網格圖案。於圖6中，光罩是導電性細線的寬度設為5 µm，且細線的間距（pitch）設為300 µm的圖案，且該光罩是設為藉由曝光來使導電性細線的部分的光阻劑硬化而成的圖案。使用蝕刻液來對上述圖案進行蝕刻，然後，將硬化的光阻膜予以剝離除去，藉此，形成包含圖6的圖案的導電性細線的感測電極陣列。Next, a photoresist film is formed on the formed copper thin film, and the photoresist film is exposed using a photomask, and developed by a developing solution, thereby forming a mesh pattern of the cured photoresist film. In FIG. 6, the mask is a pattern in which the width of the conductive thin wires is 5 μm, and the pitch of the thin lines is 300 μm, and the mask is a portion in which the conductive thin wires are exposed by exposure. A pattern obtained by hardening a photoresist. The pattern is etched using an etching solution, and then the cured photoresist film is peeled off, whereby a sensing electrode array including conductive thin wires of the pattern of FIG. 6 is formed.

接著，於以上已製作的圖6的感測電極陣列的包含銅薄膜的導電性細線部分設置黑化層。於本實例中，將形成有上述感測電極陣列的透明基板浸漬於硫化氫液體，僅使銅薄膜的表面成為硫化銅的黑色，形成實例1的感測電極陣列。Next, a blackening layer is provided on the portion of the conductive thin wire including the copper thin film of the sensing electrode array of FIG. 6 which has been produced above. In the present example, the transparent substrate on which the above-described sensing electrode array was formed was immersed in a hydrogen sulfide liquid, and only the surface of the copper thin film became black of copper sulfide, and the sensing electrode array of Example 1 was formed.

實例2Example 2

實例1的電極的形狀為圖6的帶狀，相對於此，於實例2中，電極的形狀設為圖3的鑽石狀，並且將導電性細線的線寬設為6 µm，除此以外，實施與實例1相同的操作，製作實例2的感測電極陣列。The shape of the electrode of Example 1 is the strip shape of FIG. 6, whereas in the example 2, the shape of the electrode is set to the diamond shape of FIG. 3, and the line width of the conductive thin wire is set to 6 μm. The same operation as in Example 1 was carried out to fabricate the sensing electrode array of Example 2.

實例3Example 3

將實例2的導電性細線的間距設為500 µm，除此以外，實施與實例2相同的操作，製作實例3的感測電極陣列。The sensing electrode array of Example 3 was produced by performing the same operation as in Example 2 except that the pitch of the conductive thin wires of Example 2 was set to 500 μm.

實例4Example 4

代替實例1中所使用的形成有易黏接層的透明基板A，使用日本專利特公平5-74463號的實例1所揭示的積層聚酯薄膜（稱為透明基板B），除此以外，實施與實例1相同的操作，製作實例4的感測電極陣列。再者，透明基板B的積層聚酯薄膜於重組層（本案的易黏接層）中包含三聚氰胺系交聯劑NIKALAC MW-12LF（三和化學（股）製造）。In place of the transparent substrate A on which the easy-adhesion layer is formed, which is used in the example 1, the laminated polyester film (referred to as a transparent substrate B) disclosed in Example 1 of Japanese Patent Publication No. 5-74463 is used. The sensing electrode array of Example 4 was fabricated in the same manner as in Example 1. Further, the laminated polyester film of the transparent substrate B contains a melamine-based crosslinking agent NIKALAC MW-12LF (manufactured by Sanwa Chemical Co., Ltd.) in a reconstituted layer (adhesive layer of the present invention).

實例5Example 5

利用濺鍍法來形成實例2的銅薄膜，將該銅薄膜的厚度設為0.2 µm，將電極的導電性細線的寬度設為3 µm，且將上述電極的導電性細線的間距設為200 µm，除此以外，實施與實例2相同的操作，製作實例5的感測電極陣列。The copper thin film of Example 2 was formed by a sputtering method, the thickness of the copper thin film was set to 0.2 μm, the width of the conductive thin wires of the electrode was set to 3 μm, and the pitch of the conductive thin wires of the above electrodes was set to 200 μm. Except for this, the same operation as in Example 2 was carried out to fabricate the sensing electrode array of Example 5.

實例6Example 6

代替實例1的透明基板A的易黏接層中所使用的環氧系化合物DENACOL EX-314，相對於樹脂黏合劑，使用6 wt%的三聚氰胺系化合物（三和化學（股）製造的NIKALAC MW-12LF），除此以外，實施與實例1相同的操作，製作實例6的感測電極陣列。In place of the epoxy compound DENACOL EX-314 used in the easy-adhesion layer of the transparent substrate A of Example 1, 6 wt% of a melamine-based compound (NIKALAC MW manufactured by Sanwa Chemical Co., Ltd.) was used with respect to the resin binder. Except for this, the same operation as in Example 1 was carried out, and the sensing electrode array of Example 6 was fabricated.

實例7Example 7

代替實例1的透明基板A的易黏接層中所使用的環氧系化合物DENACOL EX-314，相對於樹脂黏合劑，使用6 wt%的甲苯二異氰酸酯與三羥甲基丙烷的加成物，除此以外，實施與實例1相同的操作，製作實例7的感測電極陣列。再者，為了溶解交聯劑，將易黏接層塗佈液中的一部分的水置換為丙酮。In place of the epoxy compound DENACOL EX-314 used in the easy-adhesion layer of the transparent substrate A of Example 1, 6 wt% of an adduct of toluene diisocyanate and trimethylolpropane was used with respect to the resin binder, Except for this, the same operation as in Example 1 was carried out to fabricate the sensing electrode array of Example 7. Further, in order to dissolve the crosslinking agent, a part of the water in the easy-adhesion layer coating liquid was replaced with acetone.

實例8Example 8

代替實例1的透明基板A的易黏接層中所使用的環氧系化合物DENACOL EX-314，相對於樹脂黏合劑，使用6 wt%的2-乙烯基-2-噁唑啉單體與甲基丙烯酸甲酯的共聚物，除此以外，實施與實例1相同的操作，製作實例8的感測電極陣列。再者，為了溶解交聯劑，將易黏接層塗佈液中的一部分的水置換為丙酮。In place of the epoxy compound DENACOL EX-314 used in the easy-adhesion layer of the transparent substrate A of Example 1, 6 wt% of 2-vinyl-2-oxazoline monomer and A were used with respect to the resin binder. Except for the copolymer of methyl acrylate, the same operation as in Example 1 was carried out to produce the sensing electrode array of Example 8. Further, in order to dissolve the crosslinking agent, a part of the water in the easy-adhesion layer coating liquid was replaced with acetone.

實例9Example 9

將實例1的導電性細線的線寬設為5.5 µm，除此以外，實施與實例1相同的操作，製作實例9的感測電極陣列。The sensing electrode array of Example 9 was fabricated by performing the same operation as in Example 1 except that the line width of the conductive thin wires of Example 1 was set to 5.5 μm.

實例10Example 10

將實例1的導電性細線的線寬設為4 µm，除此以外，實施與實例1相同的操作，製作實例10的感測電極陣列。The sensing electrode array of Example 10 was fabricated by performing the same operation as in Example 1 except that the line width of the conductive thin wires of Example 1 was set to 4 μm.

比較例1Comparative example 1

於實例1的第二易黏接層中不使用交聯劑，除此以外，實施與實例1相同的操作，製作比較例1的感測電極陣列。A sensing electrode array of Comparative Example 1 was produced by performing the same operation as in Example 1 except that no crosslinking agent was used in the second easy-adhesion layer of Example 1.

比較例2Comparative example 2

將比較例1的導電性細線的線寬設為3 µm，除此以外，實施與比較例1相同的操作，製作比較例2的感測電極陣列。The same operation as in Comparative Example 1 was carried out except that the line width of the conductive thin wires of Comparative Example 1 was 3 μm, and the sensing electrode array of Comparative Example 2 was produced.

比較例3Comparative example 3

將實例4的透明基板B的三聚氰胺系交聯劑予以除去，除此以外，實施與實例4相同的操作，製作比較例3的感測電極陣列。The same procedure as in Example 4 was carried out except that the melamine-based crosslinking agent of the transparent substrate B of Example 4 was removed, and a sensing electrode array of Comparative Example 3 was produced.

上述實例與比較例的試料的密著性歸納於表1中。The adhesion of the samples of the above examples and comparative examples is summarized in Table 1.

[表1] [Table 1]

根據以上的結果，必須於易黏接層中添加交聯劑，尤其若使用環氧系、三聚氰胺系、異氰酸酯系、以及噁唑啉系的交聯劑，則可對透明基材與銅薄層的密著性進行改良。又，亦已確認：只要導電性細線的線寬為厚度的2.5倍以上，則可對密著性進行改良。According to the above results, it is necessary to add a crosslinking agent to the easy-adhesion layer, and in particular, if an epoxy-based, melamine-based, isocyanate-based, or oxazoline-based crosslinking agent is used, a transparent substrate and a thin layer of copper can be used. The adhesion is improved. Further, it has been confirmed that the adhesion can be improved as long as the line width of the conductive thin wires is 2.5 times or more the thickness.

實例21Example 21

於實例1中已製作的透明基板A（包括雙層構成的易黏接層）的易黏接層的一個面上，藉由電鍍法而形成銅的薄膜。電鍍是於無電解電鍍之後，進行電解電鍍，形成厚度為2 µm的銅的薄層。使用與實例1相同的方法，於上述銅薄膜上，形成包含圖6的圖案（導電性細線的寬度為5 µm，細線的間距為300 µm）的導電性細線的感測電極陣列。將該感測電極陣列設為試料21-1。於該感測電極陣列的包含銅薄膜的導電性細線部分，藉由下述的還原處理或氧化處理方法而設置黑化層。A film of copper was formed by electroplating on one surface of the easy-adhesion layer of the transparent substrate A (including the two-layer easy-adhesion layer) which was produced in Example 1. Electroplating is performed by electroless plating after electroless plating to form a thin layer of copper having a thickness of 2 μm. A sensing electrode array including the conductive thin wires of the pattern of FIG. 6 (the width of the conductive thin wires was 5 μm, and the pitch of the fine wires was 300 μm) was formed on the copper film in the same manner as in Example 1. This sensing electrode array was set as the sample 21-1. The blackened layer is provided by the reduction treatment or the oxidation treatment method described below in the portion of the conductive thin wire including the copper thin film of the sensing electrode array.

[黑化處理方法之一] 處理條件：於40℃的下述液體中浸漬3分鐘，然後洗淨。 液體的組成：硼氫化鈉  3.8 g 添加1升的水。[One of blackening treatment methods] Treatment conditions: immersed in the following liquid at 40 ° C for 3 minutes, and then washed. Composition of the liquid: sodium borohydride 3.8 g Add 1 liter of water.

[黑化處理方法之二] 處理條件：於85℃的下述液體中浸漬4分鐘，然後洗淨。 液體的組成：亞氯酸鈉  55 g 氫氧化鈉  15 g 磷酸三鈉  10 g 添加1升的水。[Blackening treatment method 2] Treatment conditions: immersed in the following liquid at 85 ° C for 4 minutes, and then washed. Composition of the liquid: sodium chlorite 55 g sodium hydroxide 15 g trisodium phosphate 10 g Add 1 liter of water.

將對上述試料21-1實施上述黑化處理方法之一所得的試料設為21-2。又，將對上述試料21-1實施上述黑化處理方法之二所得的試料設為21-3。將進一步對上述試料21-3實施上述黑化處理方法之一所得的試料設為21-4。對以上述方式獲得的試料21-1至試料21-4的反射色度、密著性、以及耐磨性進行測試，將測試的結果表示於表2中。The sample obtained by performing one of the above blackening treatment methods on the sample 21-1 was set to 21-2. Further, the sample obtained by subjecting the sample 21-1 to the blackening treatment method described above was 21-3. The sample obtained by further performing one of the above blackening treatment methods on the sample 21-3 described above was set to 21-4. The reflection chromaticity, the adhesion, and the abrasion resistance of the sample 21-1 to the sample 21-4 obtained in the above manner were tested, and the results of the test are shown in Table 2.

[表2] [Table 2]

根據以上的結果，已知：為了獲得所期望的反射色度，當利用氧化還原處理來進行黑化處理時，與還原處理相比較，氧化處理更佳，進而較佳為於氧化處理之後實施還原處理。又，已知：對於試料21-3、試料21-4而言，與密著性、及稱為耐磨性的耐久性相關的性能亦已被改良。From the above results, it is known that in order to obtain a desired reflection chromaticity, when the blackening treatment is performed by the redox treatment, the oxidation treatment is more preferable than the reduction treatment, and further preferably, the reduction treatment is carried out after the oxidation treatment. deal with. Further, it has been known that the samples 21-3 and 21-4 have improved properties relating to adhesion and durability called abrasion resistance.

實例31Example 31

於實例1已製作的透明基板A（包括雙層構成的易黏接層）的易黏接層的一個面上，藉由電鍍法而形成銅的薄膜。電鍍是於無電解電鍍之後，進行電解電鍍，形成厚度為2 µm的銅的薄層。使用與實例1相同的方法，於上述銅薄膜上，形成包含圖6的圖案（導電性細線的寬度為5 µm，細線的間距為300 µm）的導電性細線的感測電極陣列。將該感測電極陣列設為試料31-1。於該感測電極陣列的包含銅薄膜的導電性細線部分，實施下述利用電鍍的黑化處理，設置黑化層。A film of copper was formed by electroplating on one surface of the easy-adhesion layer of the transparent substrate A (including the two-layer easy-adhesion layer) which was produced in Example 1. Electroplating is performed by electroless plating after electroless plating to form a thin layer of copper having a thickness of 2 μm. A sensing electrode array including the conductive thin wires of the pattern of FIG. 6 (the width of the conductive thin wires was 5 μm, and the pitch of the fine wires was 300 μm) was formed on the copper film in the same manner as in Example 1. This sensing electrode array was set to sample 31-1. A blackening layer was formed by performing a blackening treatment by electroplating on the portion of the conductive thin wire including the copper thin film of the sensing electrode array.

[黑化處理方法之三][The third method of blackening treatment]

處理條件：浸漬於40℃的下述電鍍液，以3.2 A/cm電鍍0.5分鐘，然後洗淨。Processing conditions: The following plating solution was immersed at 40 ° C, electroplated at 3.2 A / cm for 0.5 minutes, and then washed.

電鍍液體的組成（補充液亦為相同的組成） 硫酸鎳六水合物                         123 g 硫氰酸銨                                17 g 硫酸鋅七水合物                           3 g 硫酸鈉                                  16 g 添加水                                  1升 pH（利用硫酸與氫氧化鈉來進行調整）5.0The composition of the plating liquid (the replenishing liquid is also the same composition) Nickel sulfate hexahydrate 123 g Ammonium thiocyanate 17 g Zinc sulfate heptahydrate 3 g Sodium sulfate 16 g Adding water 1 liter of pH (using sulfuric acid and sodium hydroxide) Make adjustments) 5.0

[黑化處理方法之四] 處理條件：浸漬於40℃的下述電鍍液，以3.2 A/cm來電鍍0.5分鐘，然後洗淨。 電鍍液體的組成（補充液亦為相同的組成） 硫酸鎳六水合物                         123 g 硫氰酸銨                                17 g 硫酸鋅七水合物                          28 g 硫酸鈉                                  16 g 添加水                                  1升 pH（利用硫酸與氫氧化鈉來進行調整）5.0[Fourth blackening treatment method] Treatment conditions: The following plating solution was immersed in 40 ° C, electroplated at 3.2 A/cm for 0.5 minute, and then washed. Composition of electroplating liquid (replenishment liquid is also the same composition) Nickel sulfate hexahydrate 123 g Ammonium thiocyanate 17 g Zinc sulfate heptahydrate 28 g Sodium sulfate 16 g Add water 1 liter of pH (using sulfuric acid and sodium hydroxide) Make adjustments) 5.0

將對上述試料31-1實施上述黑化處理方法之三所得的試料設為31-2。又，將對上述試料31-1實施上述黑化處理方法之四所得的試料設為31-3。將進一步對上述試料31-3實施上述黑化處理方法之三所得的試料設為31-4。又，將如下的試料設為31-5，該試料是使用市售的鉻系黑色電鍍浴，以3.2 A/cm來對上述試料31-1電鍍0.5分鐘，然後洗淨所得的試料。The sample obtained by performing the above-described blackening treatment method on the sample 31-1 was set to 31-2. Further, the sample obtained by subjecting the sample 31-1 to the fourth blackening treatment method was 31-3. The sample obtained by further performing the above-described blackening treatment method on the sample 31-3 was set to 31-4. In addition, the sample was set to 31-5, and the sample was plated at 3.2 A/cm for 0.5 minutes using a commercially available chromium-based black plating bath, and the obtained sample was washed.

對以上述方式獲得的試料31-1至試料31-5的反射色度、密著性、以及耐磨性進行測試，將測試的結果表示於表3中。The reflection chromaticity, the adhesion, and the abrasion resistance of the sample 31-1 to the sample 31-5 obtained in the above manner were tested, and the results of the test are shown in Table 3.

[表3] [table 3]

根據以上的結果，當利用電鍍來進行黑化處理時，為了獲得所期望的反射色度，較佳為利用硫酸鋅七水合物的高濃度液來進行處理，進而較佳為利用硫酸鋅七水合物的低濃度液與高濃度液來進行二階段處理。一般認為硫酸鋅七水合物的高濃度液的處理具有使表面變粗糙的作用。然而，由於電鍍效率不充分，因此，一般認為如下的形態為最佳的結果，該形態是指利用電鍍效率佳的硫酸鋅七水合物的低濃度液來進行處理之後，利用硫酸鋅七水合物的高濃度液來進行處理。According to the above results, when the blackening treatment is performed by electroplating, in order to obtain a desired reflection chromaticity, it is preferably treated with a high concentration liquid of zinc sulfate heptahydrate, and further preferably using zinc sulfate heptahydrate. The low concentration liquid of the substance and the high concentration liquid are subjected to a two-stage treatment. It is considered that the treatment of the high concentration liquid of zinc sulfate heptahydrate has the effect of roughening the surface. However, since the plating efficiency is insufficient, it is generally considered that the following form is an optimum result. This form refers to the use of zinc sulfate heptahydrate after treatment with a low concentration liquid of zinc sulfate heptahydrate having excellent plating efficiency. The high concentration liquid is processed.

又，可藉由上述二階段處理來獲得具有耐久性的金屬細線電極。於金屬細線電極的表面設置氧化膜，或實施利用電鍍處理的低反射處理，例如利用黑色鉻來防止反射等已揭示於日本專利特開2006-344163號中，但並無與耐久性相關的揭示。Further, a metal thin wire electrode having durability can be obtained by the above two-stage process. An oxide film is provided on the surface of the metal thin wire electrode, or a low reflection process by a plating process, for example, using black chrome to prevent reflection, etc., is disclosed in Japanese Patent Laid-Open No. 2006-344163, but there is no disclosure relating to durability. .

將上述試料31-4以及試料31-5於60℃、RH90%的環境下保存500小時，然後在通常的環境下保存24小時之後，進行與表3相同的測定。結果，可知：對於試料31-4，僅觀測出誤差範圍的變動，而對於試料31-5，L＊增加至15.0為止，Ra亦增加至0.20為止，朝本發明中的不佳的色度、與不佳的表面粗糙度的方向發生了變動。The sample 31-4 and the sample 31-5 were stored in an environment of 60 ° C and RH 90% for 500 hours, and then stored in a normal environment for 24 hours, and then the same measurement as in Table 3 was carried out. As a result, it was found that in the sample 31-4, only the fluctuation of the error range was observed, and in the sample 31-5, L* was increased to 15.0, and Ra was also increased to 0.20, which was a poor chromaticity in the present invention. The direction with poor surface roughness has changed.

雖然本發明已以實施例揭露如上，然其並非用以限定本發明，任何所屬技術領域中具有通常知識者，在不脫離本發明的精神和範圍內，當可作些許的更動與潤飾，故本發明的保護範圍當視後附的申請專利範圍所界定者為準。Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention, and any one of ordinary skill in the art can make some changes and refinements without departing from the spirit and scope of the present invention. The scope of the invention is defined by the scope of the appended claims.

10‧‧‧本發明的觸控面板
11‧‧‧第一感測電極陣列
12‧‧‧第二感測電極陣列
15、15'‧‧‧透明基板
16‧‧‧成為觸控面的透明材料層
17‧‧‧剝離薄膜
18、18'‧‧‧易黏接層
19、19'、19"‧‧‧黏接劑層/黏著層
20、20'‧‧‧黑化層
21‧‧‧感測電極的形成層/薄層
31‧‧‧網格狀的感測電極
32‧‧‧感測電極的包覆層
33‧‧‧網格狀的感測電極的包覆層
cb‧‧‧表示處於下部電極層的感測電極的電極之間的非導電性的邊界區域。
cd‧‧‧表示感測電極之間的非導電性的邊界區域的寬度
c-j‧‧‧表示下部電極層的感測電極的序號
cw‧‧‧表示下部電極層的感測電極的電極寬度
i‧‧‧孤立導線/導電性細線/細線
rb‧‧‧表示處於上部電極層的感測電極的電極之間的非導電性的邊界區域
rd‧‧‧表示處於上部電極層的感測電極的電極之間的非導電性的邊界區域的寬度
r-i‧‧‧表示上部電極層的感測電極的序號
rw‧‧‧表示上部電極層的感測電極的電極寬度10‧‧‧ Touch panel of the present invention
11‧‧‧First sensing electrode array
12‧‧‧Second sensing electrode array
15, 15'‧‧‧ Transparent substrate
16‧‧‧Become the transparent material layer of the touch surface
17‧‧‧Release film
18, 18'‧‧‧Easy bonding layer
19, 19', 19" ‧ ‧ adhesive layer / adhesive layer
20, 20'‧‧‧ blackening layer
21‧‧‧Shaping electrode layer/thin layer
31‧‧‧Grid-like sensing electrodes
32‧‧‧The coating of the sensing electrode
33‧‧‧Wrapped coating of grid-shaped sensing electrodes
Cb‧‧‧ indicates a non-conductive boundary region between the electrodes of the sensing electrodes of the lower electrode layer.
Cd‧‧‧ indicates the width of the non-conductive boundary region between the sensing electrodes
Cj‧‧‧ indicates the serial number of the sensing electrode of the lower electrode layer
Cw‧‧‧ indicates the electrode width of the sensing electrode of the lower electrode layer
i‧‧‧Isolated wire / conductive thin wire / thin wire
Rb‧‧‧ indicates the non-conductive boundary region between the electrodes of the sensing electrodes of the upper electrode layer
Rd‧‧‧ indicates the width of the non-conductive boundary region between the electrodes of the sensing electrodes of the upper electrode layer
Ri‧‧‧ indicates the serial number of the sensing electrode of the upper electrode layer
Rw‧‧‧ indicates the electrode width of the sensing electrode of the upper electrode layer

圖1（a）、圖1（b）是本發明的觸控面板的剖面圖。 圖2（a）～圖2（d）是本發明的感測電極陣列與觸控面板的剖面圖。 圖3是本發明的第一感測電極陣列11的排列圖。 圖4是本發明的第二感測電極陣列12的排列圖。 圖5是對本發明的第一感測電極陣列與第二感測電極陣列進行正交配置時的自觸控者側所見的透視圖。 圖6是本發明的其他第一感測電極陣列11的排列圖。 圖7是本發明的其他第二感測電極陣列12的排列圖。 圖8是對本發明的其他第一感測電極陣列與第二感測電極陣列進行正交配置時的自觸控者側所見的透視圖。 圖9（a）、圖9（b）是本發明的包括黑化層的觸控面板的剖面圖。 圖10（a）～圖10（e）是本發明的黑化層的形成方法的一例。1(a) and 1(b) are cross-sectional views of a touch panel of the present invention. 2(a) to 2(d) are cross-sectional views of the sensing electrode array and the touch panel of the present invention. FIG. 3 is an arrangement diagram of the first sensing electrode array 11 of the present invention. 4 is a layout view of a second sensing electrode array 12 of the present invention. FIG. 5 is a perspective view of the self-toucher side when the first sensing electrode array and the second sensing electrode array of the present invention are orthogonally arranged. FIG. 6 is an arrangement diagram of other first sensing electrode arrays 11 of the present invention. FIG. 7 is an arrangement diagram of other second sensing electrode arrays 12 of the present invention. FIG. 8 is a perspective view of the self-toucher side when the other first sensing electrode array and the second sensing electrode array of the present invention are orthogonally arranged. 9(a) and 9(b) are cross-sectional views of a touch panel including a blackening layer of the present invention. 10(a) to 10(e) are examples of a method of forming a blackened layer of the present invention.

10‧‧‧本發明的觸控面板 10‧‧‧ Touch panel of the present invention

11‧‧‧第一感測電極陣列 11‧‧‧First sensing electrode array

12‧‧‧第二感測電極陣列 12‧‧‧Second sensing electrode array

15、15'‧‧‧透明基板 15, 15'‧‧‧ Transparent substrate

16‧‧‧成為觸控面的透明材料層 16‧‧‧Become the transparent material layer of the touch surface

17‧‧‧剝離薄膜 17‧‧‧Release film

18、18'‧‧‧易黏接層 18, 18'‧‧‧Easy bonding layer

19、19'、19"‧‧‧黏接劑層 19, 19', 19" ‧ ‧ adhesive layer

Claims (9)

一種靜電容量方式的觸控面板，正交地排列有第一感測電極陣列與第二感測電極陣列，該靜電容量方式的觸控面板的特徵在於：配置於觸控者側的第一感測電極陣列，是將導電性金屬細線圖案化而形成於具有易黏接層的透明基板上，於上述易黏接層中添加有交聯劑，其中上述導電性金屬細線的寬度為厚度的2.5倍以上。 An electrostatic capacitance type touch panel is arranged with a first sensing electrode array and a second sensing electrode array orthogonally. The electrostatic capacitance type touch panel is characterized by: a first feeling disposed on the toucher side The electrode array is formed by patterning a conductive metal thin wire on a transparent substrate having an easy adhesion layer, and a crosslinking agent is added to the easy adhesion layer, wherein the width of the conductive metal thin wire is 2.5 of a thickness. More than double. 如申請專利範圍第1項所述之靜電容量方式的觸控面板，其中上述第一感測電極陣列及上述第二感測電極陣列的反射色度L*a*b*的L*為6~13，a*為-0.7~1.5，b*為-5.0~1.2。 The touch panel of the electrostatic capacity type according to the first aspect of the invention, wherein the L* of the reflection chromaticity L*a*b* of the first sensing electrode array and the second sensing electrode array is 6~ 13, a* is -0.7~1.5, and b* is -5.0~1.2. 如申請專利範圍第1項所述之靜電容量方式的觸控面板，其中構成上述第一感測電極陣列的感測電極是包含由上述導電性金屬細線所形成網格的鑽石構造的連續體或帶狀體，構成上述第二感測電極陣列的感測電極是與構成上述第一感測電極陣列的感測電極相同的構造或條狀構造。 The electrostatic capacitance type touch panel according to claim 1, wherein the sensing electrode constituting the first sensing electrode array is a continuum of a diamond structure including a mesh formed by the conductive metal thin wires or The stripe, the sensing electrode constituting the second sensing electrode array described above is of the same configuration or strip configuration as the sensing electrode constituting the first sensing electrode array. 如申請專利範圍第1項所述之靜電容量方式的觸控面板，其中當對正交地排列的上述第一感測電極陣列與上述第二感測電極陣列進行透視時，已圖案化的上述導電性金屬細線於整個觸控面形成實質上均一的格子花紋。 The touch panel of the electrostatic capacitance type according to claim 1, wherein when the first sensing electrode array and the second sensing electrode array arranged orthogonally are fluoroscopy, the patterned The conductive metal thin wires form a substantially uniform lattice pattern over the entire touch surface. 如申請專利範圍第1項所述之靜電容量方式的觸控面板，其中上述導電性金屬細線是使用光微影的方法或雷射剝蝕的 方法，將金屬薄膜層圖案化為線寬為1000nm至8000nm的細線圖案。 The electrostatic capacitance type touch panel according to claim 1, wherein the conductive metal thin wire is a method using light lithography or laser ablation In the method, the metal thin film layer is patterned into a thin line pattern having a line width of 1000 nm to 8000 nm. 如申請專利範圍第1項所述之靜電容量方式的觸控面板，其中上述透明基板包含聚酯樹脂，上述易黏接層包含聚酯樹脂、丙烯酸樹脂或胺酯樹脂。 The electrostatic capacitance type touch panel according to claim 1, wherein the transparent substrate comprises a polyester resin, and the easy-adhesion layer comprises a polyester resin, an acrylic resin or an amine ester resin. 如申請專利範圍第6項所述之靜電容量方式的觸控面板，其中上述易黏接層包含第一易黏接層與第二易黏接層，與上述透明基板相接的上述第一易黏接層包含聚酯樹脂，上述第二易黏接層包含丙烯酸樹脂或胺酯樹脂。 The touch panel of the electrostatic capacitance type according to the sixth aspect of the invention, wherein the easy-adhesive layer comprises a first easy-bonding layer and a second easy-bonding layer, and the first easy-to-contact layer is connected to the transparent substrate The adhesive layer comprises a polyester resin, and the second easy-adhesion layer comprises an acrylic resin or an urethane resin. 如申請專利範圍第6項所述之靜電容量方式的觸控面板，其中上述交聯劑為噁唑啶化合物、環氧化合物、或異氰酸酯化合物。 The electrostatic capacitance type touch panel according to claim 6, wherein the crosslinking agent is a oxazolidine compound, an epoxy compound, or an isocyanate compound. 如申請專利範圍第7項所述之靜電容量方式的觸控面板，其中上述交聯劑為噁唑啶化合物、環氧化合物、或異氰酸酯化合物。 The electrostatic capacitance type touch panel according to claim 7, wherein the crosslinking agent is a oxazolidine compound, an epoxy compound, or an isocyanate compound.
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