TWI561935B - Exposure apparatus and device manufacturing method - Google Patents
Exposure apparatus and device manufacturing methodInfo
- Publication number
- TWI561935B TWI561935B TW099120064A TW99120064A TWI561935B TW I561935 B TWI561935 B TW I561935B TW 099120064 A TW099120064 A TW 099120064A TW 99120064 A TW99120064 A TW 99120064A TW I561935 B TWI561935 B TW I561935B
- Authority
- TW
- Taiwan
- Prior art keywords
- exposure apparatus
- device manufacturing
- manufacturing
- exposure
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
Landscapes
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Public Health (AREA)
- Epidemiology (AREA)
- Environmental & Geological Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US21845009P | 2009-06-19 | 2009-06-19 | |
US12/818,644 US8355116B2 (en) | 2009-06-19 | 2010-06-18 | Exposure apparatus and device manufacturing method |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201106113A TW201106113A (en) | 2011-02-16 |
TWI561935B true TWI561935B (en) | 2016-12-11 |
Family
ID=43356840
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW099120064A TWI561935B (en) | 2009-06-19 | 2010-06-21 | Exposure apparatus and device manufacturing method |
Country Status (7)
Country | Link |
---|---|
US (1) | US8355116B2 (zh) |
EP (2) | EP2443516B1 (zh) |
JP (1) | JP5348629B2 (zh) |
KR (3) | KR102130964B1 (zh) |
CN (1) | CN102460305B (zh) |
TW (1) | TWI561935B (zh) |
WO (1) | WO2010147244A2 (zh) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102080875B1 (ko) | 2013-01-23 | 2020-04-16 | 삼성디스플레이 주식회사 | 스테이지 이송 장치 및 이를 이용한 스테이지 위치 측정 방법 |
JP6774031B2 (ja) * | 2015-03-25 | 2020-10-21 | 株式会社ニコン | レイアウト方法、マーク検出方法、露光方法、計測装置、露光装置、並びにデバイス製造方法 |
NL2016877A (en) | 2015-06-18 | 2016-12-22 | Asml Holding Nv | An apparatus including a gas gauge and method of operating the same |
JP6631871B2 (ja) * | 2015-08-31 | 2020-01-15 | 株式会社リコー | 光加工装置 |
KR20180059814A (ko) * | 2015-09-30 | 2018-06-05 | 가부시키가이샤 니콘 | 노광 장치, 플랫 패널 디스플레이의 제조 방법, 및 디바이스 제조 방법 |
WO2021040269A1 (ko) | 2019-08-30 | 2021-03-04 | (주) 엘지화학 | (메트)아크릴레이트 그라프트 공중합체를 포함하는 열가소성 수지 조성물 및 이의 제조방법 |
EP4372790A1 (de) * | 2022-11-18 | 2024-05-22 | Dr. Johannes Heidenhain GmbH | Positioniereinrichtung |
Citations (2)
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US20080094594A1 (en) * | 2006-09-29 | 2008-04-24 | Nikon Corporation | Movable body system, pattern formation apparatus, exposure apparatus and exposure method, and device manufacturing method |
EP1950793A1 (en) * | 2005-10-05 | 2008-07-30 | Nikon Corporation | Exposure apparatus and exposure method |
Family Cites Families (39)
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JPS57117238A (en) | 1981-01-14 | 1982-07-21 | Nippon Kogaku Kk <Nikon> | Exposing and baking device for manufacturing integrated circuit with illuminometer |
US4780617A (en) | 1984-08-09 | 1988-10-25 | Nippon Kogaku K.K. | Method for successive alignment of chip patterns on a substrate |
DE4033556A1 (de) * | 1990-10-22 | 1992-04-23 | Suess Kg Karl | Messanordnung fuer x,y,(phi)-koordinatentische |
JP3412704B2 (ja) | 1993-02-26 | 2003-06-03 | 株式会社ニコン | 投影露光方法及び装置、並びに露光装置 |
JP3221823B2 (ja) * | 1995-11-24 | 2001-10-22 | キヤノン株式会社 | 投影露光装置およびこれを用いた露光方法ならびに半導体製造方法 |
WO1999031462A1 (fr) * | 1997-12-18 | 1999-06-24 | Nikon Corporation | Platine et appareil d'exposition |
CN100578876C (zh) | 1998-03-11 | 2010-01-06 | 株式会社尼康 | 紫外激光装置以及使用该紫外激光装置的曝光装置和曝光方法 |
AU2747999A (en) | 1998-03-26 | 1999-10-18 | Nikon Corporation | Projection exposure method and system |
JP2001102429A (ja) * | 1999-07-29 | 2001-04-13 | Nikon Corp | ステージ装置およびそれを備えた検査装置 |
WO2001035168A1 (en) | 1999-11-10 | 2001-05-17 | Massachusetts Institute Of Technology | Interference lithography utilizing phase-locked scanning beams |
SG124257A1 (en) | 2000-02-25 | 2006-08-30 | Nikon Corp | Exposure apparatus and exposure method capable of controlling illumination distribution |
US6437463B1 (en) | 2000-04-24 | 2002-08-20 | Nikon Corporation | Wafer positioner with planar motor and mag-lev fine stage |
US20020041377A1 (en) | 2000-04-25 | 2002-04-11 | Nikon Corporation | Aerial image measurement method and unit, optical properties measurement method and unit, adjustment method of projection optical system, exposure method and apparatus, making method of exposure apparatus, and device manufacturing method |
DE10043315C1 (de) * | 2000-09-02 | 2002-06-20 | Zeiss Carl | Projektionsbelichtungsanlage |
US6611316B2 (en) | 2001-02-27 | 2003-08-26 | Asml Holding N.V. | Method and system for dual reticle image exposure |
US20030085676A1 (en) | 2001-06-28 | 2003-05-08 | Michael Binnard | Six degree of freedom control of planar motors |
TW529172B (en) | 2001-07-24 | 2003-04-21 | Asml Netherlands Bv | Imaging apparatus |
US6927505B2 (en) * | 2001-12-19 | 2005-08-09 | Nikon Corporation | Following stage planar motor |
KR100927560B1 (ko) | 2002-01-29 | 2009-11-23 | 가부시키가이샤 니콘 | 이미지 형성 상태 조정 시스템, 노광 방법 및 노광 장치, 그리고 프로그램 및 정보 기록 매체 |
JP4146673B2 (ja) * | 2002-06-18 | 2008-09-10 | 株式会社 液晶先端技術開発センター | 露光方法及び装置 |
DE60335595D1 (de) | 2002-11-12 | 2011-02-17 | Asml Netherlands Bv | Lithographischer Apparat mit Immersion und Verfahren zur Herstellung einer Vorrichtung |
KR20130010039A (ko) | 2002-12-10 | 2013-01-24 | 가부시키가이샤 니콘 | 노광 장치 및 디바이스 제조 방법 |
TWI338912B (en) | 2003-05-12 | 2011-03-11 | Nikon Corp | Stage device and exposing device |
JP2005268608A (ja) * | 2004-03-19 | 2005-09-29 | Sumitomo Heavy Ind Ltd | ステージ装置 |
WO2005093792A1 (ja) | 2004-03-25 | 2005-10-06 | Nikon Corporation | 露光装置及び露光方法、並びにデバイス製造方法 |
JP5130714B2 (ja) | 2004-04-09 | 2013-01-30 | 株式会社ニコン | 移動体の駆動方法、ステージ装置、露光装置、露光方法、及びデバイス製造方法 |
EP1794650A4 (en) | 2004-09-30 | 2008-09-10 | Nikon Corp | OPTICAL PROJECTION DEVICE AND EXPOSURE DEVICE |
CN101180706A (zh) * | 2005-10-05 | 2008-05-14 | 株式会社尼康 | 曝光装置及曝光方法 |
JP4771068B2 (ja) | 2005-12-02 | 2011-09-14 | 日本電気株式会社 | 推定方法及び推定システム及びプログラム |
WO2007077925A1 (ja) * | 2005-12-28 | 2007-07-12 | Nikon Corporation | パターン形成方法及びパターン形成装置、並びにデバイス製造方法 |
EP2963498B8 (en) | 2006-01-19 | 2017-07-26 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
US7511799B2 (en) * | 2006-01-27 | 2009-03-31 | Asml Netherlands B.V. | Lithographic projection apparatus and a device manufacturing method |
CN101385122B (zh) | 2006-02-21 | 2010-12-08 | 株式会社尼康 | 图案形成装置、标记检测装置、曝光装置、图案形成方法、曝光方法及组件制造方法 |
KR101549709B1 (ko) | 2006-11-09 | 2015-09-11 | 가부시키가이샤 니콘 | 유지 장치, 위치 검출 장치 및 노광 장치, 이동 방법, 위치검출 방법, 노광 방법, 검출계의 조정 방법, 그리고 디바이스 제조 방법 |
WO2008061186A2 (en) * | 2006-11-15 | 2008-05-22 | Zygo Corporation | Distance measuring interferometer and encoder metrology systems for use in lithography tools |
US7903866B2 (en) * | 2007-03-29 | 2011-03-08 | Asml Netherlands B.V. | Measurement system, lithographic apparatus and method for measuring a position dependent signal of a movable object |
US8773635B2 (en) * | 2008-12-19 | 2014-07-08 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
US8294878B2 (en) * | 2009-06-19 | 2012-10-23 | Nikon Corporation | Exposure apparatus and device manufacturing method |
WO2011052703A1 (en) * | 2009-10-30 | 2011-05-05 | Nikon Corporation | Exposure apparatus and device manufacturing method |
-
2010
- 2010-06-18 US US12/818,644 patent/US8355116B2/en active Active
- 2010-06-21 CN CN201080027247.2A patent/CN102460305B/zh active Active
- 2010-06-21 JP JP2011550371A patent/JP5348629B2/ja active Active
- 2010-06-21 EP EP10731613.5A patent/EP2443516B1/en active Active
- 2010-06-21 KR KR1020197026517A patent/KR102130964B1/ko active IP Right Grant
- 2010-06-21 TW TW099120064A patent/TWI561935B/zh active
- 2010-06-21 WO PCT/JP2010/060924 patent/WO2010147244A2/en active Application Filing
- 2010-06-21 EP EP19216979.5A patent/EP3657258A1/en active Pending
- 2010-06-21 KR KR1020177032662A patent/KR102022788B1/ko active IP Right Grant
- 2010-06-21 KR KR1020127001443A patent/KR101799118B1/ko active IP Right Grant
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1950793A1 (en) * | 2005-10-05 | 2008-07-30 | Nikon Corporation | Exposure apparatus and exposure method |
US20080094594A1 (en) * | 2006-09-29 | 2008-04-24 | Nikon Corporation | Movable body system, pattern formation apparatus, exposure apparatus and exposure method, and device manufacturing method |
Also Published As
Publication number | Publication date |
---|---|
KR101799118B1 (ko) | 2017-11-17 |
EP2443516B1 (en) | 2020-01-01 |
WO2010147244A3 (en) | 2011-08-04 |
CN102460305A (zh) | 2012-05-16 |
KR102022788B1 (ko) | 2019-11-04 |
KR20190107752A (ko) | 2019-09-20 |
KR102130964B1 (ko) | 2020-07-07 |
US20110007290A1 (en) | 2011-01-13 |
JP2012531031A (ja) | 2012-12-06 |
TW201106113A (en) | 2011-02-16 |
KR20120031074A (ko) | 2012-03-29 |
WO2010147244A2 (en) | 2010-12-23 |
US8355116B2 (en) | 2013-01-15 |
EP3657258A1 (en) | 2020-05-27 |
KR20170128619A (ko) | 2017-11-22 |
CN102460305B (zh) | 2016-01-27 |
JP5348629B2 (ja) | 2013-11-20 |
EP2443516A2 (en) | 2012-04-25 |
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