TWI548954B - Close the exposure device - Google Patents

Close the exposure device Download PDF

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Publication number
TWI548954B
TWI548954B TW103124825A TW103124825A TWI548954B TW I548954 B TWI548954 B TW I548954B TW 103124825 A TW103124825 A TW 103124825A TW 103124825 A TW103124825 A TW 103124825A TW I548954 B TWI548954 B TW I548954B
Authority
TW
Taiwan
Prior art keywords
substrate
mask
holding portion
recesses
exposure
Prior art date
Application number
TW103124825A
Other languages
English (en)
Chinese (zh)
Other versions
TW201510675A (zh
Inventor
Hideki Okatani
Tsunemitsu Torigoe
Atsushi Masuzoe
Nobuhito Saji
Original Assignee
V Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by V Technology Co Ltd filed Critical V Technology Co Ltd
Publication of TW201510675A publication Critical patent/TW201510675A/zh
Application granted granted Critical
Publication of TWI548954B publication Critical patent/TWI548954B/zh

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW103124825A 2013-07-18 2014-07-18 Close the exposure device TWI548954B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013149334 2013-07-18
JP2014145815A JP6376871B2 (ja) 2013-07-18 2014-07-16 密着露光装置

Publications (2)

Publication Number Publication Date
TW201510675A TW201510675A (zh) 2015-03-16
TWI548954B true TWI548954B (zh) 2016-09-11

Family

ID=52631881

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103124825A TWI548954B (zh) 2013-07-18 2014-07-18 Close the exposure device

Country Status (2)

Country Link
JP (1) JP6376871B2 (ja)
TW (1) TWI548954B (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016180868A (ja) * 2015-03-24 2016-10-13 富士フイルム株式会社 露光用治具および露光方法
JP6663252B2 (ja) * 2016-03-01 2020-03-11 株式会社アドテックエンジニアリング プリント基板用露光装置
JP2020013958A (ja) * 2018-07-20 2020-01-23 キヤノン株式会社 インプリント装置、インプリント方法、及び、物品製造方法
JP6789368B2 (ja) * 2019-12-25 2020-11-25 株式会社アドテックエンジニアリング プリント基板用露光装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006091647A (ja) * 2004-09-27 2006-04-06 Fuji Photo Film Co Ltd 密着露光用フォトマスク
JP2012226129A (ja) * 2011-04-20 2012-11-15 Toppan Printing Co Ltd フォトマスク
JP2013070042A (ja) * 2011-09-09 2013-04-18 Nsk Technology Co Ltd 密着露光装置及び密着露光方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS542675A (en) * 1977-06-08 1979-01-10 Nec Corp Exposure device
JPS5435681A (en) * 1977-08-24 1979-03-15 Sharp Corp Alignment device
JPS5874340U (ja) * 1981-11-13 1983-05-19 富士写真光機株式会社 密着露光装置
JPS60189746A (ja) * 1984-03-10 1985-09-27 Canon Inc 露光装置
US5160959A (en) * 1991-12-09 1992-11-03 Massachusetts Institute Of Technology Device and method for the alignment of masks
JPH0758191A (ja) * 1993-08-13 1995-03-03 Toshiba Corp ウェハステージ装置
JPH11111819A (ja) * 1997-09-30 1999-04-23 Asahi Kasei Micro Syst Co Ltd ウェハーの固定方法及び露光装置
JP2004029063A (ja) * 2002-06-21 2004-01-29 Adtec Engineeng Co Ltd 密着型露光装置
US7607647B2 (en) * 2007-03-20 2009-10-27 Kla-Tencor Technologies Corporation Stabilizing a substrate using a vacuum preload air bearing chuck
JP5617239B2 (ja) * 2009-12-25 2014-11-05 富士通株式会社 保護膜付きレジストパターン形成用部材とその製造方法、及びレジストパターンの製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006091647A (ja) * 2004-09-27 2006-04-06 Fuji Photo Film Co Ltd 密着露光用フォトマスク
JP2012226129A (ja) * 2011-04-20 2012-11-15 Toppan Printing Co Ltd フォトマスク
JP2013070042A (ja) * 2011-09-09 2013-04-18 Nsk Technology Co Ltd 密着露光装置及び密着露光方法

Also Published As

Publication number Publication date
JP6376871B2 (ja) 2018-08-22
TW201510675A (zh) 2015-03-16
JP2015038981A (ja) 2015-02-26

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