TWI539617B - Processing system and method for depositing thin film of solar cell substrate - Google Patents

Processing system and method for depositing thin film of solar cell substrate Download PDF

Info

Publication number
TWI539617B
TWI539617B TW101130472A TW101130472A TWI539617B TW I539617 B TWI539617 B TW I539617B TW 101130472 A TW101130472 A TW 101130472A TW 101130472 A TW101130472 A TW 101130472A TW I539617 B TWI539617 B TW I539617B
Authority
TW
Taiwan
Prior art keywords
liquid
substrate
chemical
cover
unit
Prior art date
Application number
TW101130472A
Other languages
Chinese (zh)
Other versions
TW201409736A (en
Inventor
Bo-Qing You
Chuan-Yi Chen
Fuchs Bettina
Thomas Leitz Daniel
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to TW101130472A priority Critical patent/TWI539617B/en
Priority to DE102013108240.8A priority patent/DE102013108240B4/en
Publication of TW201409736A publication Critical patent/TW201409736A/en
Application granted granted Critical
Publication of TWI539617B publication Critical patent/TWI539617B/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125—Process of deposition of the inorganic material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67075—Apparatus for fluid treatment for etching for wet etching
    • H01L21/67086—Apparatus for fluid treatment for etching for wet etching with the semiconductor substrates being dipped in baths or vessels
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/6776—Continuous loading and unloading into and out of a processing chamber, e.g. transporting belts within processing chambers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1828—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof the active layers comprising only AIIBVI compounds, e.g. CdS, ZnS, CdTe
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/543—Solar cells from Group II-VI materials

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Thermal Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Electromagnetism (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Photovoltaic Devices (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Chemically Coating (AREA)
  • Weting (AREA)

Description

太陽能電池之基板沉積薄膜之處理系統及方法 Processing system and method for substrate deposition film of solar cell

一種基板處理系統及基板處理方法，尤其是涉及一種可大幅減少藥液供給量及提升薄膜沉積均一性的太陽能電池之基板沉積薄膜之處理系統及其處理方法。 The invention relates to a substrate processing system and a substrate processing method, in particular to a processing system for a substrate deposition film of a solar cell which can greatly reduce the supply amount of the chemical liquid and improve the uniformity of film deposition, and a processing method thereof.

現今電子工業迅速發展，許多電子產品都需要應用到物理沉積技術或化學沉積技術。另外全世界面臨石油能源耗竭、成本高昂及環保等問題，造成太陽能與氫能源燃料電池的需求與日遽增，由於太陽能電池製造時，必須在一基材上構成多種沉積層(薄膜)，才能有效的發揮其功能，足見沉積製程係為電子產業及民生產業一個極為重要的關鍵技術。 Nowadays, the electronics industry is developing rapidly, and many electronic products need to be applied to physical deposition technology or chemical deposition technology. In addition, the world faces the problems of petroleum energy depletion, high cost and environmental protection, which has led to an increase in the demand for solar and hydrogen energy fuel cells. Since solar cells are manufactured, it is necessary to form a plurality of deposition layers (films) on a substrate. Effectively exerting its functions, it is obvious that the deposition process is an extremely important key technology for the electronics industry and the civilian production industry.

習知的化學浴沉積(Chemical Bath Deposition，CBD)製程及其設備，亦係為沉積技術之一，其係將表面預作處理的一基材(例如不鏽鋼板等)浸入化學藥液中持續一定時間，在該基材表面沉積形成半導體薄膜。但習知的化學浴沉積設備，係將基材完全浸入化學藥液之中，如此將導致該基材雙面都成膜，然而該基材實際應用上只需要其中一面已足，多餘部分形同資源的浪費，並導致製造成本增加。 The conventional Chemical Bath Deposition (CBD) process and its equipment are also one of the deposition techniques, which are used to immerse a substrate (such as a stainless steel plate) that has been pretreated on the surface into a chemical liquid. At a time, a semiconductor film is deposited on the surface of the substrate. However, the conventional chemical bath deposition equipment completely immerses the substrate into the chemical liquid, which will result in the film forming on both sides of the substrate. However, the practical application of the substrate only requires one of the sides, the excess portion The waste of the same resources and the increase in manufacturing costs.

因此，如何創作出一種化學鍍浴沉積設備，以使該化學鍍浴沉積設備可在撓性基材的單面進行化學鍍浴沉積，並能適時進行加熱處理，將是本發明所欲積極揭露之處。 Therefore, how to create an electroless plating bath deposition apparatus, so that the electroless plating bath deposition apparatus can perform electroless plating bath deposition on one side of the flexible substrate, and can be heat-treated at a proper time, which will be actively disclosed by the present invention. Where.

本發明之主要目的在於提供一種太陽能電池之基板沉積薄膜之處理系統，其中利用藥液蓋與基板密閉蓋合以圍置出具有侷限空間之藥液盒，如此只需注入足使可均勻覆蓋在基板的藥液，再對藥液盒進行加熱處理，即能促使薄膜均勻地沉積於基板上，如此可大幅減少藥液使用量，又藥液在藥液盒中時皆恆接觸到基板表面，致使沉積於基板上之薄膜均勻性更為統一。 The main object of the present invention is to provide a substrate deposition film processing system for a solar cell, wherein the liquid chemical cap and the substrate are tightly closed to enclose a liquid chemical cartridge having a confined space, so that only the injection foot can be uniformly covered. The liquid medicine of the substrate and the heat treatment of the liquid medicine cartridge can promote the uniform deposition of the film on the substrate, so that the amount of the liquid medicine can be greatly reduced, and the liquid medicine is always in contact with the surface of the substrate in the liquid medicine cartridge. The uniformity of the film deposited on the substrate is more uniform.

本發明之另一目的在於提供一種太陽能電池之基板沉積薄膜之處理系統，其進一步具有將藥液蓋自基板處理系統之出口側再載送回基板處理系統之出口側之機制，如此可循環重複利用藥液蓋，大幅節省藥液用量，並提升處理效率。 Another object of the present invention is to provide a substrate deposition film processing system for a solar cell, which further has a mechanism for reloading the liquid chemical cap from the exit side of the substrate processing system to the exit side of the substrate processing system, so that the cycle can be repeated The use of the liquid cover greatly saves the amount of liquid medicine and improves the processing efficiency.

本發明的另一目的在於提供一種基板沉積薄膜之處理方法，洗淨及乾燥待處理之一基板；將一藥液蓋罩蓋於該基板之該無效區，並使該藥液蓋與該基板相固定密合以形成具有一侷限空間的一密封結構體；將一藥液注入於該藥液盒之內，以使該基板之該處理區皆覆蓋有該藥液；對已注入有該藥液的該藥液盒進行加熱處理，以於該基板之處理區沉積出一薄膜；在形成該薄膜後將該藥液自該藥液盒傾倒出去；解除該藥液蓋對該基板的固定關係；將該藥液蓋自該基板上轉移出去給下一片待處理基板的罩蓋使用；以及洗淨及乾燥已與該藥液蓋分開的該基板。 Another object of the present invention is to provide a substrate deposition film processing method for cleaning and drying a substrate to be processed; covering a liquid chemical cover to the ineffective area of the substrate, and making the liquid chemical cover and the substrate The phase is fixedly closed to form a sealed structure having a confined space; a chemical solution is injected into the liquid chemical cartridge such that the processing area of the substrate is covered with the chemical liquid; The liquid cartridge of the liquid is heated to deposit a film in the processing area of the substrate; after the film is formed, the liquid is poured out from the liquid cartridge; and the fixing relationship of the liquid cover to the substrate is released. The liquid cover is transferred from the substrate to the cover of the next substrate to be processed; and the substrate that has been separated from the liquid cover is washed and dried.

其中，從該基板上轉移出去的該藥液蓋可經由鹽酸去除附著於該藥液蓋的該藥液，再經清水潔淨後轉移給下一片基板之罩蓋使用。 The liquid chemical cap transferred from the substrate can be removed by using hydrochloric acid to remove the chemical solution attached to the chemical liquid cover, and then cleaned by water to be transferred to the cover of the next substrate.

以下配合圖式及元件符號對本發明之實施方式做更詳細的說明，俾使熟習該項技藝者在研讀本說明書後能據以實施。 The embodiments of the present invention will be described in more detail below with reference to the drawings and the <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt;

參閱示意顯示本發明之一實施例的第一圖，其係太陽能電池之基板沉積薄膜之處理系統的系統各單元連接示意圖。本實施例係有關一種太陽能電池之基板處理系統，其可連續性地在基板上沉積薄膜，尤其本實施例提供一種可大幅減少藥液使用量，並確保薄膜沉積均一性的基板處理系統。 Reference is made to the first diagram of an embodiment of the present invention, which is a schematic diagram of the connection of various units of a system for processing a substrate deposited film of a solar cell. The present embodiment relates to a substrate processing system for a solar cell, which can continuously deposit a thin film on a substrate. In particular, the present embodiment provides a substrate processing system capable of greatly reducing the amount of liquid used and ensuring uniformity of film deposition.

在本實施例中，該太陽能電池之基板處理系統可可包含有一基板預洗單元1、一藥液蓋轉移單元2、一供液單元3、一化學鍍浴單元5、一藥液排出單元6、及一基板終洗單元9。於本發明之其他若干實施例中，該太陽能電池之基板處理系統可僅包含上述單元之其中一單元、或其組合，亦可包含非上述所提及之單元。 In this embodiment, the substrate processing system of the solar cell may include a substrate pre-washing unit 1, a liquid chemical cap transfer unit 2, a liquid supply unit 3, an electroless plating bath unit 5, and a liquid chemical discharge unit 6. And a substrate final washing unit 9. In other embodiments of the present invention, the substrate processing system of the solar cell may include only one of the above units, or a combination thereof, or may include a unit other than those mentioned above.

參閱示意顯示本發明之一實施例的第二A圖，其係太陽能電池之基板沉積薄膜之處理系統的基板平面示意圖，參閱示意顯示本發明之一實施例的第二B圖，其係第二A圖之側面示意圖。 Referring to FIG. 2A, which is a schematic diagram showing a substrate of a processing system for depositing a thin film of a solar cell, FIG. 2 is a second schematic view showing an embodiment of the present invention. A side view of the figure A.

該基板預洗單元1係用以接收待薄膜沉積處理之一基板100，並將該基板100預作清洗及乾燥後再傳送出去，該基板100具有具有一無效區110a及一處理區110b，該無效區110a為該基板100之周邊無法受到沉積處理的區域，該處理區110b則是該基板100之未被該無效區110a所涵蓋之區域。 The substrate pre-washing unit 1 is configured to receive a substrate 100 to be subjected to a thin film deposition process, and the substrate 100 is pre-cleaned and dried, and the substrate 100 has an ineffective area 110a and a processing area 110b. The ineffective area 110a is an area in which the periphery of the substrate 100 cannot be subjected to deposition processing, and the processing area 110b is an area of the substrate 100 that is not covered by the ineffective area 110a.

參閱示意顯示本發明之一實施例的第三圖，其係太陽能電池之基板沉積薄膜之處理系統的系統平面示意圖，並配合第一圖所示。其中基板預洗單元1可包含有至少一個清洗裝置1a及至少一個乾燥裝置1b，該至少一個清洗裝置1a可以是一個空氣幕簾(AIR CURTAIN)、一個空氣吸入單元、一個滾輪刷與噴灑器、一個去離子水噴嘴、一風刀或其他適當的清洗裝置，該至少一個乾燥裝置1b係用於乾燥已清洗過之基板100，該至少一個乾燥裝置1b可以是一風刀或其他適當的乾燥裝置。 Referring to the third drawing, which is a schematic view showing an embodiment of the present invention, which is a schematic plan view of a system for processing a substrate deposited film of a solar cell, and is shown in the first figure. The substrate pre-washing unit 1 may include at least one cleaning device 1a and at least one drying device 1b, which may be an air curtain (AIR CURTAIN), an air suction unit, a roller brush and a sprayer, a deionized water nozzle, a wind knife or other suitable cleaning device for drying the cleaned substrate 100, the at least one drying device 1b may be an air knife or other suitable drying device .

參閱示意顯示本發明之一實施例的第四圖，其係藥液蓋與基板封組 後之剖面示意圖，並請配合第一圖及第三圖所示。於本實施例中，該藥液蓋轉移單元2可包含一藥液蓋轉移裝置21及兩滑軌23，該兩滑軌23為相互並列的設置，該兩滑軌23之兩端分別對應於一藥液蓋固定段2a及一藥液蓋脫離段2b，該藥液蓋轉移裝置21則裝組於該兩滑軌23之間，並可於該兩滑軌23的兩端來回移動以轉移一藥液蓋200，其中該藥液蓋轉移裝置21可以是一機械手臂，該機械手臂可以是真空吸附式的機械手臂(Vacuum robot)。 Referring to a fourth diagram showing an embodiment of the present invention, the liquid cover and the substrate are sealed. The schematic diagram of the rear section, please match the first and third figures. In this embodiment, the liquid chemical cap transfer unit 2 can include a liquid chemical cap transfer device 21 and two slide rails 23, and the two slide rails 23 are arranged side by side, and the two ends of the two slide rails 23 respectively correspond to a liquid chemical cap fixing section 2a and a liquid chemical cap releasing section 2b, the liquid chemical cap transfer device 21 is assembled between the two sliding rails 23, and can be moved back and forth at both ends of the two sliding rails 23 to transfer A liquid chemical cap 200, wherein the liquid chemical cap transfer device 21 can be a mechanical arm, which can be a vacuum suction type robot robot.

該藥液蓋轉移裝置21係用於當該基板100停留於該藥液蓋固定段2a時，將該藥液蓋200轉移至該基板100之該無效區110a，以使該藥液蓋200可與該基板100固定密合，而當該基板100停留於該藥液蓋脫離段2b時，該藥液蓋轉移裝置21則解除該藥液蓋200對該基板100的固定關係，並將該藥液蓋200從該藥液蓋脫離段2b轉移至該藥液蓋固定段2a。 The liquid chemical cap transfer device 21 is configured to transfer the chemical liquid cover 200 to the ineffective area 110a of the substrate 100 when the substrate 100 stays in the liquid chemical cap fixing portion 2a, so that the liquid chemical cover 200 can be The substrate 100 is fixedly attached to the substrate 100, and when the substrate 100 stays in the liquid chemical cap release section 2b, the liquid chemical cap transfer device 21 releases the fixed relationship of the chemical liquid cover 200 to the substrate 100, and the drug is fixed. The liquid cap 200 is transferred from the liquid chemical cap release section 2b to the liquid chemical cap fixing section 2a.

其中該藥液蓋固定段2a係接收從該基板預洗單元1所傳送過來的該基板100，並將已相固定密合的該藥液蓋200與該基板100傳送出去。其中該藥液蓋200對該基板100的固定係可藉由在該藥液蓋200上設置一連動機構總成來加以達成，該連動機構總成可直接或間接受該藥液蓋轉移裝置21之控制而作動，以使該藥液蓋200可固定或脫離於該基板100。為方便說明本發明內容，故在此不予詳述。 The liquid chemical cap fixing section 2a receives the substrate 100 conveyed from the substrate pre-washing unit 1, and transports the chemical liquid cap 200 that has been fixedly adhered to the substrate 100. The fixing of the liquid crystal cover 200 to the substrate 100 can be achieved by providing a linkage mechanism assembly on the liquid chemical cover 200. The linkage mechanism assembly can directly or indirectly receive the chemical liquid cover transfer device 21 The control is actuated to allow the liquid chemical cap 200 to be fixed or detached from the substrate 100. The contents of the present invention are described for convenience, and therefore will not be described in detail herein.

其中該藥液蓋200可具有至少一注藥口210及至少一排藥口220，該藥液蓋200僅接觸於該基板100之該無效區110a的部份，該藥液蓋200與該基板100共同圍置出具有一侷限空間310的一密封結構體，該侷限空間於沉積處理時包含一藥液以沉積一薄膜，在此將相固定密合而圍構出該侷限空間310的該藥液蓋200與該基板100定義為一藥液盒300。 The liquid chemical cover 200 can have at least one injection port 210 and at least one row of medicine ports 220. The liquid chemical cover 200 only contacts a portion of the ineffective area 110a of the substrate 100, and the liquid chemical cover 200 and the substrate 100 collectively enclosing a sealed structure having a confined space 310, the confined space containing a chemical liquid during deposition processing to deposit a film, wherein the phase is fixedly closed to surround the confined space 310 The liquid cover 200 and the substrate 100 are defined as a liquid chemical cartridge 300.

參閱示意顯示本發明之一實施例的第五圖，其係太陽能電池之基板沉積薄膜之處理系統之供液單元示意圖。該供液單元3係接收自該藥液蓋固定段2a傳送過來的該藥液盒300，且其用於將一藥液4注入於該藥液盒之內，以使該基板100之該處理區110b皆覆蓋有該藥液4，其中該供液單元3可包含一供液裝置31，該供液裝置31可經由該注藥 口210將該藥液4注入於該藥液盒300之內。值得注意的是，相較於習知進行化學鍍浴的方式，本發明並不需耗費大量的藥液，只需提供適當藥液量的藥液4於基板100上，此因透過本發明所提供的方法，藥液4只會留置該基板100之待沉積薄膜的該處理區110b之上。 Referring to the fifth drawing, which is a schematic view showing an embodiment of the present invention, which is a schematic diagram of a liquid supply unit of a processing system for depositing a substrate of a solar cell. The liquid supply unit 3 receives the liquid chemical cartridge 300 transferred from the liquid chemical cap fixing section 2a, and is used for injecting a chemical liquid 4 into the liquid chemical cartridge to enable the processing of the substrate 100. The liquid layer 4 is covered with the liquid medicine 4, wherein the liquid supply unit 3 can include a liquid supply device 31 through which the liquid supply device 31 can be injected The mouth 210 injects the drug solution 4 into the drug solution cartridge 300. It is to be noted that the present invention does not require a large amount of liquid medicine compared to the conventional method of performing an electroless plating bath, and it is only necessary to provide a liquid medicine 4 of a suitable chemical amount on the substrate 100. In the method provided, the chemical solution 4 will only remain on the processing region 110b of the substrate 100 to be deposited.

參閱示意顯示本發明之一實施例的第六圖，其係太陽能電池之基板沉積薄膜之處理系統之化學鍍浴單元示意圖，參閱示意顯示本發明之一實施例的第七圖，其係藥液盒於化學鍍浴單元中的狀態示意圖。該化學鍍浴單元5係用於接收並傳送已注入有該藥液4的該藥液盒300，藉由傳送該密封結構體同時以一加熱處理方法對該藥液盒300進行加熱處理，藉使該藥液4在該基板100的處理區110b上產生化學沉積反應，以於該基板100之該處理區110b上進行薄膜沉積製程，當形成一薄膜後該化學鍍浴單元5再將該藥液盒300傳送出去。 BRIEF DESCRIPTION OF THE DRAWINGS FIG. 6 is a schematic view showing an embodiment of an embodiment of the present invention, which is a schematic diagram of an electroless plating bath unit of a substrate deposition film processing system for a solar cell, and a seventh embodiment of an embodiment of the present invention, which is a liquid medicine. Schematic diagram of the state of the cartridge in the electroless plating bath unit. The electroless plating bath unit 5 is configured to receive and transport the liquid chemical cartridge 300 into which the chemical liquid 4 has been injected, and heat the chemical liquid cartridge 300 by transferring the sealing structure while a heat treatment method. The chemical solution 4 is subjected to a chemical deposition reaction on the processing region 110b of the substrate 100 to perform a thin film deposition process on the processing region 110b of the substrate 100. After forming a film, the chemical plating bath unit 5 further applies the drug. The liquid cartridge 300 is delivered.

其中該化學鍍浴單元5可由一傳送裝置51及一熱水浴槽53所構成，該傳送裝置51係設置於該熱水浴槽53之中，以接收自該供液單元3傳送而來的該藥液盒300。該熱水浴槽53較佳地為一封閉式的槽體結構，該熱水浴槽53之內存放有一熱水浴531，該熱水浴531具有一液面5311，該熱水浴531的溫度可藉由一加熱器(圖面未顯示)調整控制，該加熱處理方法具體為在熱水浴531中藉該傳送裝置51中傳送該藥液盒300之方法。 The electroless plating bath unit 5 can be composed of a conveying device 51 and a hot water bath 53. The conveying device 51 is disposed in the hot water bath 53 to receive the medicine delivered from the liquid supply unit 3. Liquid cartridge 300. The hot water bath 53 is preferably a closed tank structure, and a hot water bath 531 is stored in the hot water bath 53. The hot water bath 531 has a liquid surface 5311, and the temperature of the hot water bath 531 can be The control is adjusted by a heater (not shown) which is specifically a method of transferring the liquid cartridge 300 in the conveying device 51 in the hot water bath 531.

其中，該液面5311不得高過該至少一注藥口210及該至少一排藥口220，以防止熱水浴531的熱水流入該藥液盒300之中，或者可如第七圖所示，令該藥液盒300的下半部浸泡於該熱水浴531之中，如此在基板100之上的藥液4可直接受到基板100之下的熱水浴531的加熱作用，進而使藥液4產生穩定的化學作用，使得化學鍍浴之薄膜沉積反應更加全面，所沉積出的薄膜厚度更加均一，其中該熱水浴槽53係可設置成一迴轉型的型態，如ㄇ字型等，該傳送裝置51於兩直角處則分別設置有轉向裝置(圖面未顯示)，以使該藥液盒300可迴轉輸送以朝著該藥液蓋脫離段2b移動。 The liquid surface 5311 must not be higher than the at least one injection port 210 and the at least one row of the medicine port 220 to prevent hot water of the hot water bath 531 from flowing into the liquid medicine cartridge 300, or as shown in the seventh figure. The lower half of the liquid chemical cartridge 300 is immersed in the hot water bath 531, so that the chemical liquid 4 on the substrate 100 can be directly heated by the hot water bath 531 under the substrate 100, thereby The chemical liquid 4 produces a stable chemical action, so that the film deposition reaction of the electroless plating bath is more comprehensive, and the thickness of the deposited film is more uniform, wherein the hot water bath 53 can be set into a rotary type, such as a ㄇ type. The conveying device 51 is respectively provided with steering devices (not shown) at two right angles, so that the liquid cartridge 300 can be swivelly conveyed to move toward the liquid chemical cap release section 2b.

參閱示意顯示本發明之一實施例的第八圖，其係太陽能電池之基板沉積薄膜之處理系統之藥液排出單元示意圖。參閱示意顯示本發明之 一實施例的第九圖，其係藥液排出單元呈傾斜狀態之示意圖。該藥液排出單元6接收由該化學鍍浴單元5傳送過來之該藥液盒300，當該藥液盒300停滯於該藥液排出單元6之上時，將該藥液盒300之內的藥液4從該排藥口220傾倒出去，其中該藥液排出單元6可包含有一輸送平台61、一固定轉軸63及一舉升裝置65，在該輸送平台61之底部的中間處裝設有該固定轉軸63，該固定轉軸63之下方可接設一固定桿631，該固定桿631用以固持該固定轉軸63，該輸送平台61於靠該排藥口220側之下方設置有一舉升裝置65。 Referring to the eighth drawing of an embodiment of the present invention, a schematic diagram of a liquid discharging unit of a processing system for depositing a substrate of a solar cell is shown. Referring to the schematic representation of the invention A ninth drawing of an embodiment is a schematic view showing a state in which the drug solution discharge unit is in an inclined state. The liquid medicine discharge unit 6 receives the liquid chemical cartridge 300 conveyed by the chemical plating bath unit 5, and when the liquid chemical cartridge 300 is stagnated on the chemical liquid discharge unit 6, the liquid chemical cartridge 300 is inside the liquid chemical cartridge 300. The liquid medicine 4 is poured out from the medicine discharge port 220, wherein the liquid medicine discharge unit 6 can include a conveying platform 61, a fixed rotating shaft 63 and a lifting device 65, which is installed at the middle of the bottom of the conveying platform 61. A fixing shaft 631 is disposed below the fixed rotating shaft 63. The fixing rod 631 is configured to hold the fixed rotating shaft 63. The lifting platform 65 is disposed below the side of the medicine discharging port 220 with a lifting device 65. .

當該藥液盒300到達並停滯於該輸送平台61上方的一定位時，該舉升裝置65即將該輸送平台61之靠近該排藥口220的一側降下至可使該排藥口220可將該藥液4排出的程度，以使該藥液4如第九圖之箭頭所示從該排藥口220流出。為可更順利地排走該藥液4，可將該藥液蓋之與該排藥口220同側之壁面配置成一斜面型態，如第九圖所示。更可在該藥液排出單元6的周邊進一步配置一藥液回收槽67，該藥液回收槽67須設置於對應於該排藥口220將該藥液4排出的位置，以便對該藥液4進行回收。 When the liquid cartridge 300 reaches and stagnates in a position above the transport platform 61, the lifting device 65 lowers the side of the transport platform 61 close to the medicine discharge port 220 to enable the medicine discharge port 220 to be The chemical solution 4 is discharged to such an extent that the chemical solution 4 flows out from the discharge port 220 as indicated by the arrow in the ninth figure. In order to drain the liquid medicine 4 more smoothly, the wall surface of the liquid medicine cover on the same side as the medicine discharge port 220 may be arranged in a sloped shape as shown in FIG. Further, a chemical liquid recovery tank 67 is further disposed around the liquid medicine discharge unit 6, and the chemical liquid recovery tank 67 is disposed at a position corresponding to the medicine discharge port 220 to discharge the liquid medicine 4, so as to discharge the liquid medicine. 4 for recycling.

值得注意的是，該藥液蓋轉移單元2係橋設於本實施例之迴轉型基板處理系統的內部，因此並不需額外的配置空間，且可將該藥液蓋轉移裝置21以一直線方式來回移動，如此可以提高藥液蓋200的回轉率，進而增進處理效率。該基板終洗裝置9則用於清洗及乾燥由該藥液蓋脫離段2b傳送過來的該基板100。 It should be noted that the liquid chemical cap transfer unit 2 is bridged inside the rotary substrate processing system of the present embodiment, so that no additional configuration space is required, and the liquid chemical cap transfer device 21 can be in a straight line manner. Moving back and forth, the rate of rotation of the liquid chemical cap 200 can be increased, thereby improving the processing efficiency. The substrate final washing device 9 is used to clean and dry the substrate 100 transported from the liquid chemical cap release section 2b.

參閱示意顯示本發明之一實施例的第十圖，其係太陽能電池之基板沉積薄膜之處理系統之較佳實施例示意圖。本實施例之太陽能電池之基板沉積薄膜之處理系統之可進一步包含有一基板沖洗裝置7，該基板沖洗裝置7係設置於該藥液蓋脫離段2b，該基板沖洗裝置7用於當該藥液蓋轉移裝置21將該藥液蓋200從該基板100上轉移出去後對該基板100進行沖洗，以去除仍殘留於該基板100上之藥液4。 DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Referring to the drawings, FIG. 10 is a schematic view showing a preferred embodiment of a processing system for depositing a substrate of a solar cell. The substrate deposition film processing system of the solar cell of the embodiment may further include a substrate rinsing device 7 disposed on the medicinal liquid cap detaching section 2b, and the substrate rinsing device 7 is used for the medicinal liquid The lid transfer device 21 transfers the chemical liquid cap 200 from the substrate 100, and then rinses the substrate 100 to remove the chemical liquid 4 remaining on the substrate 100.

另外，本實施例之太陽能電池之基板沉積薄膜之連續型處理系統還可進一步設置有一藥液蓋清洗槽10及一藥液蓋潔淨槽20，該藥液蓋清洗槽10的內含溶液可以是一鹽酸浴，該藥液蓋潔淨槽20的內含溶液 可以是一清水浴，該藥液蓋清洗槽10及該藥液蓋潔淨槽20係設置於該藥液蓋固定段2a及該藥液蓋脫離段2b之間，以供該藥液蓋轉移裝置21將該藥液蓋200依序送入至該藥液蓋清洗槽10及該藥液蓋潔淨槽20之中，藉以利用該鹽酸浴清洗去除附著於該藥液蓋200的藥液4，接著再利用該清水浴潔淨該藥液蓋200。 In addition, the continuous processing system for the substrate deposition film of the solar cell of the present embodiment may further be provided with a liquid chemical cap cleaning tank 10 and a chemical liquid lid cleaning tank 20, and the liquid solution cap cleaning tank 10 may have a solution a hydrochloric acid bath, the solution containing the solution containing the cleaning tank 20 The liquid cover cleaning tank 10 and the liquid cover cleaning tank 20 are disposed between the liquid chemical cap fixing section 2a and the liquid chemical cap release section 2b for the chemical liquid cover transfer device. 21, the liquid chemical cap 200 is sequentially sent to the chemical liquid cap cleaning tank 10 and the chemical liquid cap cleaning tank 20, whereby the chemical liquid 4 attached to the chemical liquid cap 200 is removed by washing with the hydrochloric acid bath, and then The liquid chemical cover 200 is then cleaned by the water bath.

參閱示意顯示本發明之一實施例的第十一圖，其係太陽能電池之基板沉積薄膜之處理方法的流程圖。依據前述之太陽能電池之基板沉積薄膜之連續型處理系統，本發明之一實施例亦提供一種太陽能電池之基板沉積薄膜之處理方法。如第十一圖的步驟S10所示，首先清洗及乾燥待處理之一基板100，該基板100具有一無效區110a及一處理區110b，該無效區110a為該基板100之周邊無法受到沉積處理的區域，該處理區110b則是該基板100之未被該無效區110a所涵蓋之區域，如第二A圖及第二B圖所示。 Referring to the eleventh diagram showing an embodiment of the present invention, which is a flow chart of a method of processing a substrate deposited film of a solar cell. According to the continuous processing system of the substrate deposition film of the solar cell, an embodiment of the present invention also provides a method for processing a substrate deposition film of a solar cell. As shown in step S10 of FIG. 11 , a substrate 100 to be processed is first cleaned and dried. The substrate 100 has an ineffective area 110a and a processing area 110b. The inactive area 110a is not subject to deposition processing on the periphery of the substrate 100. The processing area 110b is the area of the substrate 100 that is not covered by the ineffective area 110a, as shown in FIG. 2A and FIG.

接著，如第十一圖的步驟S20所示，將一藥液蓋200罩蓋於該基板100之該無效區110a，並使該藥液蓋200與該基板100相固定密合以形成具有一侷限空間310的一密封結構體，其中該藥液蓋200具有至少一注藥口210及至少一排藥口220，在此將相固定密合而圍構出該侷限空間310的該藥液蓋200與該基板100定義為一藥液盒300，其結果可參照第四圖。 Then, as shown in step S20 of FIG. 11 , a liquid chemical cover 200 is covered on the ineffective area 110 a of the substrate 100 , and the liquid chemical cover 200 is fixedly bonded to the substrate 100 to form a a sealed structure of the confined space 310, wherein the liquid chemical cover 200 has at least one injection port 210 and at least one row of medicine ports 220, where the liquid cover of the confined space 310 is enclosed and fixed The substrate 100 and the substrate 100 are defined as a liquid chemical cartridge 300, and the results can be referred to the fourth figure.

接著，如第十一圖的步驟S30所示，將一藥液4注入於該藥液盒300之內，以使該基板100之該處理區110b皆覆蓋有該藥液4，其結果可參照第五圖。接著，如第十一圖的步驟S40所示，對已注入有該藥液4的該藥液盒300進行加熱處理，以於該基板100之該處理區110b沉積出一薄膜。 Next, as shown in step S30 of FIG. 11 , a chemical solution 4 is injected into the liquid chemical cartridge 300 so that the processing area 110b of the substrate 100 is covered with the chemical liquid 4, and the result can be referred to Fifth picture. Next, as shown in step S40 of Fig. 11, the liquid chemical cartridge 300 to which the chemical liquid 4 has been injected is subjected to heat treatment to deposit a film on the processing region 110b of the substrate 100.

接著，進入第十一圖的步驟S50，在形成該薄膜後將該藥液4自該藥液盒300傾倒出去，接著進入第十一圖的步驟S60，解除該藥液蓋200對該基板100的固定關係，接著進入第十一圖的步驟S70，將該藥液蓋200自該基板100上轉移出去以供下一片待處理基板的罩蓋使用，最後進入第十一圖的步驟S80，清洗及乾燥已與該藥液蓋200分開的該基板100。 Next, proceeding to step S50 of FIG. 11 , after the film is formed, the chemical solution 4 is poured out from the liquid chemical cartridge 300, and then proceeds to step S60 of FIG. 11 to release the liquid chemical cap 200 to the substrate 100. The fixed relationship, then proceeds to step S70 of the eleventh figure, the liquid chemical cap 200 is transferred from the substrate 100 for use by the cover of the next substrate to be processed, and finally proceeds to step S80 of the eleventh figure, and is cleaned. And drying the substrate 100 that has been separated from the liquid chemical cap 200.

其中，從該基板100上轉移出去的該藥液蓋200可先浸泡於一藥液蓋清洗槽10之中藉以清洗去除附著於該藥液蓋200的該藥液4，接著再浸泡於一藥液蓋潔淨槽20藉以潔淨該藥液蓋200再轉移給下一片待處理基板之罩蓋使用，該藥液蓋清洗槽10的內含溶液可以是一鹽酸浴，而該藥液蓋潔淨槽20的內含溶液可以是一清水浴。 The liquid chemical cap 200 transferred from the substrate 100 may be first immersed in a liquid chemical cap cleaning tank 10 to clean and remove the chemical liquid 4 attached to the chemical liquid cover 200, and then immersed in a medicine. The liquid cover cleaning tank 20 is used to clean the liquid chemical cover 200 and then transferred to the next substrate to be treated. The liquid solution cover cleaning tank 10 may be a hydrochloric acid bath, and the liquid cleaning tank 20 The internal solution can be a clear water bath.

以上所述者僅為用以解釋本發明之較佳實施例，並非企圖據以對本發明做任何形式上之限制，是以，凡有在相同之發明精神下所作有關本發明之任何修飾或變更，皆仍應包括在本發明意圖保護之範疇。 The above is only a preferred embodiment for explaining the present invention, and is not intended to limit the present invention in any way, and any modifications or alterations to the present invention made in the spirit of the same invention. All should still be included in the scope of the intention of the present invention.

1‧‧‧基板預洗單元 1‧‧‧Substrate pre-wash unit

1a‧‧‧清洗裝置 1a‧‧‧cleaning device

1b‧‧‧乾燥裝置 1b‧‧‧Drying device

2‧‧‧藥液蓋轉移單元 2‧‧‧Drug cover transfer unit

21‧‧‧藥液蓋轉移裝置 21‧‧‧Drug cover transfer device

23‧‧‧滑軌 23‧‧‧Slide rails

2a‧‧‧藥液蓋固定段 2a‧‧‧Drug cover fixed section

2b‧‧‧藥液蓋脫離段 2b‧‧‧Drug cover off section

7‧‧‧基板沖洗裝置 7‧‧‧Substrate flushing device

3‧‧‧供液單元 3‧‧‧liquid supply unit

31‧‧‧供液裝置 31‧‧‧Liquid supply device

4‧‧‧藥液 4‧‧‧ liquid

5‧‧‧化學鍍浴單元 5‧‧‧Chemical bath unit

51‧‧‧傳送裝置 51‧‧‧Transportation device

53‧‧‧熱水浴槽 53‧‧‧ hot water bath

531‧‧‧熱水浴 531‧‧‧Hot bath

5311‧‧‧液面 5311‧‧‧ liquid level

6‧‧‧藥液排出單元 6‧‧‧Drug discharge unit

61‧‧‧輸送平台 61‧‧‧Conveying platform

63‧‧‧固定轉軸 63‧‧‧Fixed shaft

631‧‧‧固定桿 631‧‧‧Fixed rod

65‧‧‧舉升裝置 65‧‧‧ Lifting device

67‧‧‧藥液回收槽 67‧‧‧Drug recovery tank

9‧‧‧基板終洗裝置 9‧‧‧Substrate final washing device

10‧‧‧藥液蓋清洗槽 10‧‧‧Drug cover cleaning tank

20‧‧‧藥液蓋潔淨槽 20‧‧‧Drug cover clean tank

100‧‧‧基板 100‧‧‧Substrate

110a‧‧‧無效區 110a‧‧ Invalid area

110b‧‧‧處理區 110b‧‧‧Processing area

200‧‧‧藥液蓋 200‧‧‧ liquid cover

210‧‧‧注藥口 210‧‧‧ injection port

220‧‧‧排藥口 220‧‧‧ Discharge

300‧‧‧藥液盒 300‧‧‧ liquid cartridge

310‧‧‧侷限空間 310‧‧‧ confined space

第一圖為本發明之一實施例之太陽能電池之基板沉積薄膜之處理系統的系統各單元連接示意圖。 The first figure is a schematic diagram showing the connection of each unit of the system of the substrate deposition film processing system of the solar cell according to an embodiment of the present invention.

第二A圖為本發明之一實施例之太陽能電池之基板沉積薄膜之處理系統的基板平面示意圖。 2A is a schematic plan view of a substrate of a processing system for a substrate deposition film of a solar cell according to an embodiment of the present invention.

第二B圖為本發明之一實施例之第二A圖之側面示意圖。 Figure 2B is a side elevational view of a second embodiment of an embodiment of the present invention.

第三圖為本發明之一實施例之太陽能電池之基板沉積薄膜之處理系統的系統平面示意圖。 The third figure is a schematic plan view of a system for processing a substrate deposited film of a solar cell according to an embodiment of the present invention.

第四圖為本發明之一實施例之藥液蓋與基板封組後之剖面示意圖。 The fourth figure is a schematic cross-sectional view of the liquid chemical cap and the substrate after being sealed according to an embodiment of the present invention.

第五圖為本發明之一實施例之太陽能電池之基板沉積薄膜之處理系統之供液單元示意圖。 Figure 5 is a schematic view of a liquid supply unit of a substrate deposition film processing system for a solar cell according to an embodiment of the present invention.

第六圖為本發明之一實施例之太陽能電池之基板沉積薄膜之處理系統之化學鍍浴單元示意圖。 Figure 6 is a schematic view showing an electroless plating bath unit of a substrate deposition film processing system for a solar cell according to an embodiment of the present invention.

第七圖為本發明之一實施例之藥液盒於化學鍍浴單元中的狀態示意圖。 Figure 7 is a schematic view showing the state of a liquid chemical cartridge in an electroless plating bath unit according to an embodiment of the present invention.

第八圖為本發明之一實施例之太陽能電池之基板沉積薄膜之處理系統之藥液排出單元示意圖。 Figure 8 is a schematic view showing a liquid discharging unit of a processing system for a substrate deposition film of a solar cell according to an embodiment of the present invention.

第九圖為本發明之一實施例之藥液排出單元呈傾斜狀態之示意圖。 The ninth drawing is a schematic view showing the liquid medicine discharge unit in an inclined state according to an embodiment of the present invention.

第十圖為本發明之一實施例之太陽能電池之基板沉積薄膜之處理系統之較佳實施例示意圖。 Figure 11 is a schematic view showing a preferred embodiment of a substrate deposition film processing system for a solar cell according to an embodiment of the present invention.

第十一圖為本發明之一實施例的太陽能電池之基板沉積薄膜之處理方法的流程圖。 11 is a flow chart showing a method of processing a substrate deposition film of a solar cell according to an embodiment of the present invention.

1‧‧‧基板預洗單元 1‧‧‧Substrate pre-wash unit

1a‧‧‧清洗裝置 1a‧‧‧cleaning device

1b‧‧‧乾燥裝置 1b‧‧‧Drying device

2‧‧‧藥液蓋轉移單元 2‧‧‧Drug cover transfer unit

21‧‧‧藥液蓋轉移裝置 21‧‧‧Drug cover transfer device

23‧‧‧滑軌 23‧‧‧Slide rails

2a‧‧‧藥液蓋固定段 2a‧‧‧Drug cover fixed section

2b‧‧‧藥液蓋脫離段 2b‧‧‧Drug cover off section

3‧‧‧供液單元 3‧‧‧liquid supply unit

31‧‧‧供液裝置 31‧‧‧Liquid supply device

5‧‧‧化學鍍浴單元 5‧‧‧Chemical bath unit

6‧‧‧藥液排出單元 6‧‧‧Drug discharge unit

61‧‧‧輸送平台 61‧‧‧Conveying platform

9‧‧‧基板終洗單元 9‧‧‧Substrate final wash unit

Claims (16)

一種太陽能電池之基板沉積薄膜之處理系統，其係用以處理一基板，該基板具有一無效區及一處理區，該無效區為該基板之周邊無法受到沉積處理的區域，該處理區則為該基板未被該無效區所涵蓋的區域，該基板於沉積處理時與一藥液蓋結合成具有一侷限空間的一密封結構體，該侷限空間於沉積處理時包含一藥液以沉積一薄膜，該處理系統包含：一供液單元，其用於將該藥液注入於所傳送過來的該密封結構體之內，以使該基板之該處理區皆覆蓋有該藥液；一化學鍍浴單元，設置於該供液單元之後，其係用於接收並傳送自該供液單元傳送而來的該密封結構體，並於該基板之該處理區上藉由傳送該密封結構體而沉積出該薄膜，當該薄膜形成後該化學鍍浴單元再將該密封結構體傳送出去，該化學鍍浴單元更包含一熱水浴槽，該熱水浴槽係設置成一迴轉型的型態；一藥液排出單元，設置於該化學鍍浴單元之後，其係用以接收由該化學鍍浴單元傳送過來之該密封結構體，並將該密封結構體之內的該藥液排出；及一藥液蓋轉移單元，設置於該供液單元之前並設置於該藥液排出單元之後，該藥液蓋轉移單元係用以當該基板進入該供液單元前將該藥液蓋轉移至該基板之該無效區，以使該藥液蓋與該基板固定密合成具有該侷限空間的該密封結構體，而當該基板離開該藥液排出單元後則將該密封結構體分成該基板及該藥液蓋，並將該藥液蓋轉移至該供液單元之前以供固定密合該密封結構體。 A substrate deposition film processing system for a solar cell, which is used for processing a substrate having an ineffective area and a processing area, wherein the inactive area is an area in which the periphery of the substrate cannot be subjected to deposition processing, and the processing area is The substrate is not covered by the ineffective region, and the substrate is combined with a liquid chemical cap to form a sealed structure having a confined space during the deposition process, the confined space containing a chemical liquid for depositing a film during the deposition process The processing system includes: a liquid supply unit for injecting the chemical solution into the sealed structure to be transferred, so that the processing area of the substrate is covered with the chemical liquid; an electroless plating bath a unit, disposed after the liquid supply unit, for receiving and conveying the sealing structure conveyed from the liquid supply unit, and depositing on the processing area of the substrate by transferring the sealing structure The film, after the film is formed, the electroless plating bath unit further conveys the sealing structure, the electroless plating bath unit further comprises a hot water bath, the hot water bath is arranged in a rotary type a liquid discharging unit, disposed after the electroless plating bath unit, for receiving the sealing structure conveyed by the electroless plating bath unit, and discharging the liquid medicine in the sealing structure And a liquid lid transfer unit disposed before the liquid supply unit and disposed after the liquid medicine discharge unit, wherein the liquid lid transfer unit is configured to transfer the liquid cover before the substrate enters the liquid supply unit And the ineffective area of the substrate, so that the chemical liquid cover and the substrate are fixedly combined to form the sealing structure having the confined space, and when the substrate leaves the liquid discharging unit, the sealing structure is divided into the substrate And the liquid chemical cover, and transferring the liquid chemical cover to the liquid supply unit for fixing and sealing the sealing structure. 依據申請專利範圍第1項所述之太陽能電池之基板沉積薄膜之處理系統，其中該藥液蓋轉移單元係設置於該供液單元之前並設置於該藥液排出單元之後，該藥液蓋轉移單元包含一藥液蓋轉移裝置、滑軌、 一藥液蓋固定段、一藥液蓋脫離段，其中該滑軌之兩端分別連接該藥液蓋固定段及該藥液蓋脫離段，該藥液蓋固定段及該藥液蓋脫離段分別連接該供液單元及該藥液排出單元，而該藥液蓋轉移裝置則裝設於該滑軌之兩端之間，該藥液蓋轉移裝置並可於該滑軌之兩端來回移動，該藥液蓋轉移裝置係用於當該基板停留於該藥液蓋固定段時將該藥液蓋轉移至該基板之該無效區，以使該藥液蓋與該基板固定密合成具有該侷限空間的該密封結構體，而當該基板停留於該藥液蓋脫離段時則將該密封結構體分成該基板及該藥液蓋，並將該藥液蓋從該藥液蓋脫離段轉移至該藥液蓋固定段，該藥液蓋固定段及該藥液蓋脫離段係用以分別接收所傳送過來的該基板。 The processing system for a substrate deposition film of a solar cell according to claim 1, wherein the liquid chemical cap transfer unit is disposed before the liquid supply unit and disposed after the chemical liquid discharge unit, and the liquid chemical cover is transferred. The unit includes a liquid cover transfer device, a slide rail, a liquid chemical cap fixing section and a liquid chemical cap releasing section, wherein the two ends of the sliding rail are respectively connected to the liquid chemical cap fixing section and the chemical liquid cap releasing section, the liquid chemical cap fixing section and the liquid chemical cap releasing section The liquid supply unit and the liquid medicine discharge unit are respectively connected, and the liquid cover transfer device is installed between the two ends of the slide rail, and the liquid cover transfer device can move back and forth between the slide rails The liquid cover transfer device is configured to transfer the liquid cover to the ineffective area of the substrate when the substrate stays in the fixed portion of the liquid cover, so that the chemical cover is fixedly combined with the substrate. Limiting the sealing structure of the space, and when the substrate stays in the detachment section of the liquid cover, dividing the sealing structure into the substrate and the liquid cover, and transferring the liquid cover from the liquid cover To the liquid chemical cap fixing section, the liquid chemical cap fixing section and the chemical liquid cap releasing section are respectively configured to receive the transferred substrate. 依據申請專利範圍第2項所述之太陽能電池之基板沉積薄膜之處理系統，其中該藥液蓋固定段及該藥液蓋脫離段之間進一步設置有一藥液蓋清洗槽及一藥液蓋潔淨槽，該藥液蓋清洗槽的內含溶液是一鹽酸浴，而該藥液蓋潔淨槽的內含溶液是一清水浴，該藥液蓋轉移裝置將該藥液蓋依序送入至該藥液蓋清洗槽及該藥液蓋潔淨槽之中，藉以利用該鹽酸浴清洗去除附著於該藥液蓋的藥液，接著利用該清水浴潔淨該藥液蓋。 The processing system for a substrate deposited film of a solar cell according to the second aspect of the invention, wherein the liquid chemical cap cleaning section and the liquid chemical cap release section are further provided with a chemical liquid cap cleaning tank and a liquid chemical cap cleaning a tank, the liquid solution of the liquid tank cleaning tank is a hydrochloric acid bath, and the liquid solution of the liquid tank cleaning tank is a water bath, and the liquid lid transfer device sequentially feeds the liquid lid to the The chemical solution lid cleaning tank and the chemical liquid lid cleaning tank are used to clean and remove the chemical solution attached to the chemical liquid lid by using the hydrochloric acid bath, and then the chemical liquid lid is cleaned by the water bath. 依據申請專利範圍第2項所述之太陽能電池之基板沉積薄膜之處理系統，其中，該藥液蓋轉移裝置是一機械手臂或一真空吸附式機械手臂。 The processing system for a substrate deposited film of a solar cell according to claim 2, wherein the liquid lid transfer device is a mechanical arm or a vacuum adsorption type mechanical arm. 依據申請專利範圍第2項所述之太陽能電池之基板沉積薄膜之處理系統，其中該藥液蓋轉移單元更包含有一基板沖洗裝置，該基板沖洗裝置設置於該藥液蓋脫離段，該基板沖洗裝置用於當該藥液蓋轉移裝置將該藥液蓋從該基板上轉移出去後對該基板進行沖洗，以去除仍殘留於該基板上之該藥液。 The processing system for a substrate deposition film of a solar cell according to claim 2, wherein the liquid chemical cap transfer unit further comprises a substrate rinsing device, wherein the substrate rinsing device is disposed in the detachment section of the liquid chemical cap, the substrate rinsing The device is configured to flush the substrate after the liquid lid transfer device removes the liquid cover from the substrate to remove the liquid remaining on the substrate. 依據申請專利範圍第2項所述之太陽能電池之基板沉積薄膜之處理 系統，其中該藥液蓋轉移單元更包含一滑軌，該兩滑軌為相互並列的設置，而該藥液蓋轉移裝置則裝設於該兩滑軌之間。 Processing of substrate deposition film of solar cell according to claim 2 of the patent application scope The system, wherein the liquid cover transfer unit further comprises a slide rail, the two slide rails are arranged side by side, and the liquid lid transfer device is installed between the two slide rails. 依據申請專利範圍第1項所述之太陽能電池之基板沉積薄膜之處理系統，更包含：一基板預洗單元，該基板預洗單元係設置於該供液單元之前，該基板預洗單元係用於清洗及乾燥待處理的該基板；及一基板終洗單元，該基板終洗單元係設置於該藥液排出單元之後，該基板終洗單元係用於清洗及乾燥所傳送過來之該基板。 The substrate deposition film processing system for a solar cell according to claim 1, further comprising: a substrate pre-washing unit, the substrate pre-washing unit is disposed before the liquid supply unit, and the substrate pre-washing unit is used And cleaning and drying the substrate to be processed; and a substrate final washing unit, the substrate final washing unit is disposed after the chemical liquid discharging unit, wherein the substrate final washing unit is used for cleaning and drying the transferred substrate. 依據申請專利範圍第7項所述之太陽能電池之基板沉積薄膜之處理系統，該基板預洗單元更包含：至少一個清洗裝置，其為一個空氣幕簾、一個空氣吸入單元、一個滾輪刷與噴灑器、一個去離子水噴嘴或一風刀之至少其中之一。 The substrate pre-washing unit of the solar cell according to claim 7, wherein the substrate pre-washing unit further comprises: at least one cleaning device, which is an air curtain, an air suction unit, a roller brush and a spray At least one of a deionized water nozzle or a wind knife. 依據申請專利範圍第1項所述之太陽能電池之基板沉積薄膜之處理系統，其中，該化學鍍浴單元更包含一傳送裝置，該傳送裝置係設置於該熱水浴槽之中，該熱水浴槽之內存放有一熱水浴，藉此於傳送該密封結構體時利用該熱水浴加熱該密封結構體。 The processing system for a substrate deposited film of a solar cell according to claim 1, wherein the electroless plating bath unit further comprises a conveying device disposed in the hot water bath, the hot water bath A hot water bath is stored therein to heat the sealed structure using the hot water bath when the sealing structure is transferred. 依據申請專利範圍第1項所述之太陽能電池之基板沉積薄膜之處理系統，其中該藥液蓋具有至少一注藥口及至少一排藥口，藉此當該密封結構體位於該藥液排出單元時，使該藥液從該排藥口排出。 The processing system for a substrate deposited film of a solar cell according to claim 1, wherein the liquid chemical cap has at least one injection port and at least one row of medicine ports, whereby the sealing structure is located at the liquid medicine discharge In the case of the unit, the liquid medicine is discharged from the medicine discharge port. 依據申請專利範圍第10項所述之太陽能電池之基板沉積薄膜之處理系統，其中，該藥液蓋與該排藥口同側之壁面可配置成一斜面型態。 The processing system for a substrate deposited film of a solar cell according to claim 10, wherein the wall surface of the liquid chemical cover and the side of the medicine discharge port are disposed in a sloped shape. 依據申請專利範圍第11項所述之太陽能電池之基板沉積薄膜之處理系統，其中，該藥液排出單元至少包含有一輸送平台、一固定轉軸、一固定桿及一舉升裝置，其中在該輸送平台之底部的中間處裝設有該固定轉軸，該固定轉軸之下方接設該固定桿，該固定桿用以固持該固定轉軸，該輸送平台於靠該排藥口側之下方設置有一舉升裝置。 The processing system for a substrate deposited film of a solar cell according to claim 11, wherein the liquid discharging unit comprises at least a conveying platform, a fixed rotating shaft, a fixing rod and a lifting device, wherein the conveying platform The fixed rotating shaft is disposed at a middle of the bottom of the fixed rotating shaft, and the fixing rod is used for holding the fixed rotating shaft, and the lifting platform is provided with a lifting device below the medicine discharging port side . 依據申請專利範圍第11項所述之太陽能電池之基板沉積薄膜之處理系統，其中，該藥液排出單元進一步配置有一藥液回收槽，該藥液回收槽設置於該排藥口將該藥液排出的對應處。 The processing system for a substrate deposited film of a solar cell according to claim 11, wherein the liquid discharging unit is further provided with a liquid recovery tank, and the liquid recovery tank is disposed at the medicine discharge port. The corresponding place of discharge. 一種太陽能電池之基板沉積薄膜之處理方法，其係適用於如申請專利範圍第1項所述之處理系統，該處理系統為一迴轉型基板處理系統，包含：經由一藥液蓋轉移單元，將該藥液蓋罩蓋於該基板之該無效區，並使該藥液蓋與該基板相固定密合以形成具有一侷限空間的一密封結構體，其中該藥液蓋轉移單元係橋設於該迴轉型基板處理系統的內部；將該藥液注入於該密封結構體之內，以使該基板之該處理區皆覆蓋有該藥液；對已注入有該藥液的該密封結構體進行沉積處理，以於該基板之處理區沉積出該薄膜；在形成該薄膜後將該藥液自該密封結構體傾倒出去；經由該藥液蓋轉移單元，解除該藥液蓋對該基板的固定關係；及將該藥液蓋自該基板上轉移出去以供下一片待處理基板罩蓋使用。 A method for processing a substrate deposited film of a solar cell, which is suitable for use in a processing system as described in claim 1, wherein the processing system is a rotary substrate processing system, comprising: a transfer unit via a liquid lid The liquid chemical cover covers the ineffective area of the substrate, and the chemical liquid cover is fixedly fixed to the substrate to form a sealing structure having a confined space, wherein the liquid chemical cap transfer unit is bridged The inside of the rotary substrate processing system; the chemical solution is injected into the sealing structure such that the processing area of the substrate is covered with the chemical liquid; and the sealing structure body to which the medical liquid has been injected is performed a deposition process for depositing the film in the processing region of the substrate; and after the film is formed, the drug solution is poured out from the sealing structure; and the liquid cover is released from the substrate by the liquid cover transfer unit Relationship; and transferring the liquid cover from the substrate for use in the next substrate cover to be treated. 依據申請專利範圍第14項所述之太陽能電池之基板沉積薄膜之處理方法，更包含：清洗及乾燥待處理之基板；對已注入有該藥液的該密封結構體進行加熱處理，以於該基板之處理區沉積出一薄膜；以及清洗及乾燥已與該藥液蓋分開的該基板。 The method for processing a substrate deposited film of a solar cell according to claim 14, further comprising: cleaning and drying the substrate to be processed; and heat-treating the sealed structure into which the chemical solution has been injected to A film is deposited in the processing area of the substrate; and the substrate that has been separated from the liquid chemical cover is cleaned and dried. 依據申請專利範圍第15項所述之太陽能電池之基板沉積薄膜之處理方法，其中從該基板上轉移出去的該藥液蓋可先浸泡於一藥液蓋清洗槽之中，藉以清洗去除附著於該藥液蓋的該藥液，接著再浸泡於一藥液蓋潔淨槽中，藉以潔淨該藥液蓋再轉移給下一片待處理基板之罩蓋使用，該藥液蓋清洗槽的內含溶液是一鹽酸浴，而該藥液蓋潔淨槽 的內含溶液是一清水浴。 According to the method for processing a substrate deposited film of a solar cell according to claim 15, wherein the liquid chemical cap transferred from the substrate can be first immersed in a liquid cleaning tank to clean and remove the coating. The liquid solution of the liquid medicine cover is then immersed in a liquid cleaning tank to clean the liquid liquid cover and then transferred to the cover of the next substrate to be treated, and the liquid solution cover cleaning solution is contained therein. Is a hydrochloric acid bath, and the liquid cover is clean The internal solution is a clear water bath.
TW101130472A 2012-08-22 2012-08-22 Processing system and method for depositing thin film of solar cell substrate TWI539617B (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
TW101130472A TWI539617B (en) 2012-08-22 2012-08-22 Processing system and method for depositing thin film of solar cell substrate
DE102013108240.8A DE102013108240B4 (en) 2012-08-22 2013-07-31 Thin film processing system and method in chemical bath deposition on solar cell substrates

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW101130472A TWI539617B (en) 2012-08-22 2012-08-22 Processing system and method for depositing thin film of solar cell substrate

Publications (2)

Publication Number Publication Date
TW201409736A TW201409736A (en) 2014-03-01
TWI539617B true TWI539617B (en) 2016-06-21

Family

ID=50069697

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101130472A TWI539617B (en) 2012-08-22 2012-08-22 Processing system and method for depositing thin film of solar cell substrate

Country Status (2)

Country Link
DE (1) DE102013108240B4 (en)
TW (1) TWI539617B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112848196A (en) * 2021-01-07 2021-05-28 淮北中易光电科技有限公司 Photovoltaic reflective film

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102005025123B4 (en) 2005-05-30 2009-04-16 Sulfurcell Solartechnik Gmbh Process and device for the wet-chemical treatment of large-area substrates, in particular for the production of solar cells
TWM418398U (en) 2011-08-10 2011-12-11 Manz Taiwan Ltd Elevation Conveying type Chemical bath deposition apparatus
CN202359199U (en) 2011-08-10 2012-08-01 亚智科技股份有限公司 Lifting conveying type chemical bath deposition equipment

Also Published As

Publication number Publication date
TW201409736A (en) 2014-03-01
DE102013108240B4 (en) 2023-06-22
DE102013108240A1 (en) 2014-02-27

Similar Documents

Publication Publication Date Title
CN108074842B (en) Substrate wet processing device
CN105214890A (en) Roll coater
JP4875173B2 (en) Substrate holding device and substrate holding method
JP6829645B2 (en) Cleaning method in electroplating equipment and electroplating equipment
TW200939325A (en) Substrate treating apparatus and substrate treating method
TWI521630B (en) Substrate treatment device and substrate treatment method
TWI571322B (en) Substrate cleaning device and cleaning method
TWI609417B (en) Substrate plating apparatus and substrate plating method
JPH04154122A (en) Apparatus and method for treatment of substrate
CN108267929A (en) The cleaning method and device of mask plate
JP2007533125A (en) Method for cleaning and etching a substrate having a transparent and conductive oxide layer and apparatus for carrying out the method
CN106876300A (en) Substrate board treatment and substrate processing method using same
TWI468543B (en) Substrate transfer and processing system and substrate transfer and processing methods
TWI539617B (en) Processing system and method for depositing thin film of solar cell substrate
JP2019071382A (en) Substrate cleaning method
KR20010082586A (en) Ultrasonic processing device and electronic parts fabrication method using the same
JP5006245B2 (en) Method and apparatus for manufacturing chalcopyrite thin film solar cell
CN103633184B (en) The processing system of the substrate deposition thin film of solaode and method
JP3830272B2 (en) Substrate plating equipment
TW502306B (en) Process for producing a substrate and plating apparatus
TW202405994A (en) Substrate treating apparatus
US20110124149A1 (en) Method and device for coating a carrier for thin-film solar cells
KR100467915B1 (en) Substrate holder, and system for cleaning and drying same
TW200525584A (en) Thermal processing apparatus and a thermal processing method
KR101052821B1 (en) Substrate processing apparatus and method