TWI484527B - - Google Patents
Info
- Publication number
- TWI484527B TWI484527B TW101151245A TW101151245A TWI484527B TW I484527 B TWI484527 B TW I484527B TW 101151245 A TW101151245 A TW 101151245A TW 101151245 A TW101151245 A TW 101151245A TW I484527 B TWI484527 B TW I484527B
- Authority
- TW
- Taiwan
Links
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210175897.2A CN103456591B (zh) | 2012-05-31 | 2012-05-31 | 自动频率调谐源和偏置射频电源的电感耦合等离子处理室 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201349280A TW201349280A (zh) | 2013-12-01 |
| TWI484527B true TWI484527B (zh) | 2015-05-11 |
Family
ID=49738844
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW101151245A TW201349280A (zh) | 2012-05-31 | 2012-12-28 | 自動頻率調諧源和偏置射頻電源的電感耦合等離子處理室 |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN103456591B (zh) |
| TW (1) | TW201349280A (zh) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI667487B (zh) * | 2016-09-29 | 2019-08-01 | 美商超精細研究股份有限公司 | 射頻線圈調諧方法及裝置 |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI647735B (zh) * | 2013-03-15 | 2019-01-11 | 美商蘭姆研究公司 | 使用模型化以建立與電漿系統相關的離子能量 |
| CN106298419B (zh) * | 2015-05-18 | 2018-10-16 | 中微半导体设备(上海)有限公司 | 电感耦合等离子体处理***及处理方法 |
| CN106298418B (zh) * | 2015-05-18 | 2018-10-16 | 中微半导体设备(上海)有限公司 | 电感耦合等离子体处理***及处理方法 |
| CN104849598B (zh) * | 2015-05-25 | 2018-04-10 | 上海美诺福科技股份有限公司 | 一种射频发生器的控制电路与检测*** |
| US10347464B2 (en) * | 2015-09-15 | 2019-07-09 | Lam Research Corporation | Cycle-averaged frequency tuning for low power voltage mode operation |
| CN110416047B (zh) * | 2018-04-27 | 2021-03-02 | 北京北方华创微电子装备有限公司 | 射频阻抗匹配的方法及装置、半导体处理设备 |
| US11355325B2 (en) | 2020-05-28 | 2022-06-07 | Applied Materials, Inc. | Methods and systems for monitoring input power for process control in semiconductor process systems |
| CN113065237B (zh) * | 2021-03-19 | 2022-11-08 | 四川英杰电气股份有限公司 | 一种自动设置调频边界的方法和射频电源 |
| CN114446758B (zh) * | 2022-01-21 | 2024-04-12 | 北京北方华创微电子装备有限公司 | 半导体工艺腔室及半导体工艺方法 |
| CN114724945A (zh) * | 2022-05-18 | 2022-07-08 | 北京屹唐半导体科技股份有限公司 | 等离子体氮化掺杂方法和装置及半导体器件 |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030192646A1 (en) * | 2002-04-12 | 2003-10-16 | Applied Materials, Inc. | Plasma processing chamber having magnetic assembly and method |
| TW200829087A (en) * | 2006-11-22 | 2008-07-01 | Pearl Kogyo Co Ltd | High frequency power source device and supply method of high frequency power |
| TW200903625A (en) * | 2007-07-04 | 2009-01-16 | Advanced Micro Fab Equip Inc | Multi-station decoupled reactive ion etch chamber |
| US20100089319A1 (en) * | 2008-10-09 | 2010-04-15 | Applied Materials, Inc. | Rf return path for large plasma processing chamber |
| TW201108866A (en) * | 2009-08-17 | 2011-03-01 | Advanced Micro Fab Equip Inc | Plasma processing chamber having switchable bias frequency and a switchable match network therefore |
| US20110135844A1 (en) * | 2009-11-17 | 2011-06-09 | Applied Materials, Inc. | Large area plasma processing chamber with at-electrode rf matching |
| CN201962350U (zh) * | 2010-11-09 | 2011-09-07 | 中微半导体设备(上海)有限公司 | 一种原位清洁第iii族元素和第v族元素化合物沉积反应腔的装置 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR0170387B1 (ko) * | 1989-10-03 | 1999-03-30 | 제임스 조셉 드롱 | 고주파 반도체 웨이퍼 가공장치 및 방법 |
| US5688357A (en) * | 1995-02-15 | 1997-11-18 | Applied Materials, Inc. | Automatic frequency tuning of an RF power source of an inductively coupled plasma reactor |
| TW200300649A (en) * | 2001-11-27 | 2003-06-01 | Alps Electric Co Ltd | Plasma processing apparatus, its driving method, matching circuit design system, and plasma processing method |
| CN1871373A (zh) * | 2003-06-19 | 2006-11-29 | 等离子控制***有限公司 | 等离子体生成设备和方法以及具有可调工作周期的rf驱动电路 |
-
2012
- 2012-05-31 CN CN201210175897.2A patent/CN103456591B/zh active Active
- 2012-12-28 TW TW101151245A patent/TW201349280A/zh unknown
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030192646A1 (en) * | 2002-04-12 | 2003-10-16 | Applied Materials, Inc. | Plasma processing chamber having magnetic assembly and method |
| TW200829087A (en) * | 2006-11-22 | 2008-07-01 | Pearl Kogyo Co Ltd | High frequency power source device and supply method of high frequency power |
| TW200903625A (en) * | 2007-07-04 | 2009-01-16 | Advanced Micro Fab Equip Inc | Multi-station decoupled reactive ion etch chamber |
| US20100089319A1 (en) * | 2008-10-09 | 2010-04-15 | Applied Materials, Inc. | Rf return path for large plasma processing chamber |
| TW201108866A (en) * | 2009-08-17 | 2011-03-01 | Advanced Micro Fab Equip Inc | Plasma processing chamber having switchable bias frequency and a switchable match network therefore |
| US20110135844A1 (en) * | 2009-11-17 | 2011-06-09 | Applied Materials, Inc. | Large area plasma processing chamber with at-electrode rf matching |
| CN201962350U (zh) * | 2010-11-09 | 2011-09-07 | 中微半导体设备(上海)有限公司 | 一种原位清洁第iii族元素和第v族元素化合物沉积反应腔的装置 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI667487B (zh) * | 2016-09-29 | 2019-08-01 | 美商超精細研究股份有限公司 | 射頻線圈調諧方法及裝置 |
| TWI685668B (zh) * | 2016-09-29 | 2020-02-21 | 美商超精細研究股份有限公司 | 磁共振成像系統，以及搭配該磁共振成像系統使用之調諧系統 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103456591A (zh) | 2013-12-18 |
| TW201349280A (zh) | 2013-12-01 |
| CN103456591B (zh) | 2016-04-06 |