TWI478774B - Priming processing method and priming processing device - Google Patents

Priming processing method and priming processing device Download PDF

Info

Publication number
TWI478774B
TWI478774B TW099118171A TW99118171A TWI478774B TW I478774 B TWI478774 B TW I478774B TW 099118171 A TW099118171 A TW 099118171A TW 99118171 A TW99118171 A TW 99118171A TW I478774 B TWI478774 B TW I478774B
Authority
TW
Taiwan
Prior art keywords
roller
coating
film
liquid
slit nozzle
Prior art date
Application number
TW099118171A
Other languages
Chinese (zh)
Other versions
TW201105424A (en
Inventor
Yukihiro Wakamoto
Kei Tashiro
Eiichi Ueda
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of TW201105424A publication Critical patent/TW201105424A/en
Application granted granted Critical
Publication of TWI478774B publication Critical patent/TWI478774B/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0204—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to the edges of essentially flat articles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0208—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to separate articles
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)

Description

預塗處理方法及預塗處理裝置Precoating treatment method and precoating treatment device

本發明係關於一種預塗處理方法及預塗處理裝置，用於非旋轉塗佈法之塗佈處理，於狹縫噴嘴的噴吐口附近作為塗佈處理之事前準備形成塗布液之液體膜。The present invention relates to a precoating treatment method and a precoating treatment apparatus for coating treatment by a non-rotating coating method, and preparing a liquid film for forming a coating liquid before the coating treatment in the vicinity of the ejection opening of the slit nozzle.

進行LCD等平面顯示器(FPD)製程中之光微影程序時，頻繁使用令包含狹縫狀噴吐口之長條形狹縫噴嘴進行掃描，在被處理基板(例如玻璃基板)上塗佈光阻液之非旋轉塗佈法。When performing a photolithography process in a flat panel display (FPD) process such as LCD, a long slit nozzle including a slit-like ejection port is frequently used for scanning, and a photoresist is coated on a substrate to be processed (for example, a glass substrate). Non-rotating coating method of liquid.

如此之非旋轉塗佈法中，防止光阻乾燥膜膜厚之不均一性或塗佈不均勻時，於塗佈掃描中在基板上所噴吐之光阻液沿掃描方向繞到狹縫噴嘴背面側而形成之彎月面宜沿噴嘴長邊方向，在水平一直線上一致，為此緊接在塗佈掃描開始前以適量之光阻液無間隙地占滿狹縫噴嘴之噴吐口與基板之間之塗佈間隙係必要條件。為滿足此要件，作為塗佈掃描之事前準備，需自狹縫噴嘴之噴吐口起涵蓋背面下端部進行形成光阻液液體膜之預塗處理。In such a non-spin coating method, when the film thickness of the photoresist drying film is prevented from being uneven or the coating is uneven, the photoresist liquid discharged on the substrate during the coating scan is wound in the scanning direction to the back surface of the slit nozzle. The meniscus formed on the side should be along the long side of the nozzle and be consistent on the horizontal line. For this reason, the appropriate amount of photoresist is used to fill the nozzle of the slit nozzle and the substrate immediately before the start of the coating scan. The coating gap between them is a necessary condition. In order to satisfy this requirement, as a preparation for coating scanning, it is necessary to perform a precoating process for forming a liquid film of a photoresist liquid from the ejection opening of the slit nozzle to cover the lower end portion of the back surface.

代表性的預塗處理法係在塗佈處理部附近水平設置狹縫噴嘴與長度同等或在其以上之圓筒狀預塗滾子，狹縫噴嘴隔著微小的間隙靠近與預塗滾子頂部對向之位置並噴吐光阻液，其後預塗滾子馬上沿既定方向旋轉。如此，噴吐於預塗滾子頂部附近之光阻液迴繞至狹縫噴嘴背面下部並捲取在預塗滾子外周面上，光阻液液體膜以分為狹縫噴嘴側與預塗滾子側之形態切離。光阻液液體膜自噴嘴噴吐口起涵蓋背面下端部殘留於狹縫噴嘴。In a typical precoating treatment method, a slit nozzle is provided horizontally in the vicinity of the coating treatment portion, and a cylindrical precoated roller having the same length or more than the slit nozzle is placed close to the top of the precoated roller with a slight gap therebetween. The opposite position is sprayed with the photoresist, and then the pre-coated roller is immediately rotated in the predetermined direction. Thus, the photoresist liquid spouted near the top of the pre-coating roller is wound back to the lower portion of the back surface of the slit nozzle and wound up on the outer peripheral surface of the pre-coating roller, and the photoresist liquid film is divided into a slit nozzle side and a pre-coated roller. The shape of the side is cut off. The photoresist liquid film covers the lower end of the back surface from the nozzle spout and remains in the slit nozzle.

以往一般的預塗處理裝置不僅包含使預塗滾子旋轉驅動之旋轉機構，亦包含用以清洗預塗滾子之刮刀或清洗噴嘴及乾燥噴嘴等，一旦結束1次預塗處理，其後處理中即藉由旋轉機構使預塗滾子連續旋轉，以刮刀自預塗滾子外周面刮下光阻液，自清洗噴嘴及乾燥噴嘴分別朝預塗滾子外周面噴送清洗液及乾燥氣體。The conventional precoating treatment apparatus includes not only a rotating mechanism that rotationally drives the precoat roller, but also a scraper, a washing nozzle, a drying nozzle, and the like for cleaning the precoated roller, and once the precoating process is completed once, the post processing is performed. In the middle, the pre-coating roller is continuously rotated by the rotating mechanism, the photoresist is scraped off from the outer peripheral surface of the pre-coating roller by the scraper, and the cleaning liquid and the drying gas are sprayed from the cleaning nozzle and the drying nozzle toward the outer peripheral surface of the pre-coating roller, respectively. .

然而，於1次預塗處理為承接並捲取自狹縫噴嘴噴吐之光阻液而使用之預塗滾子上的區域隨著狹縫噴嘴或預塗滾子之尺寸不同，而不需預塗滾子全周(360°)，通常僅需半周(180°)以下，1/4周(90°)以下或是1/5周(72°)以下即可亦有可能。然而，以往一般的預塗處理裝置每當實行預塗處理即作為後處理如上述令預塗滾子連續旋轉，對預塗滾子外周面整體(全周)噴送清洗液，故有大量使用清洗液(通常係稀釋劑)之問題。However, the area on the precoated roller used for receiving and winding the photoresist from the slit nozzle in one precoating process is different depending on the size of the slit nozzle or the precoated roller. It is also possible to apply the roller for all weeks (360°), usually only half a week (180°) or less, 1/4 week (90°) or less, or 1/5 (72°) or less. However, in the conventional precoating treatment apparatus, the precoating treatment is performed as a post-treatment, and the pre-coating roller is continuously rotated as described above, and the cleaning liquid is sprayed on the entire outer peripheral surface of the pre-coating roller (full circumference), so that it is used in a large amount. The problem with cleaning fluids (usually thinners).

為解決此問題，本案申請人於專利文獻1中揭示一種預塗處理法，為進行1次預塗處理，令狹縫噴嘴之噴吐口與預塗滾子上端隔著既定間隙對向，一定量之處理液或塗佈液(例如光阻液)自狹縫噴嘴噴吐，並令預塗滾子恰旋轉既定旋轉角，使用預塗滾子半周以下之部分表面區域於該預塗處理，在連續既定次數之預塗處理結束後橫跨全周集中清洗預塗滾子外周面。In order to solve this problem, the applicant of the present application disclosed a precoating treatment method in Patent Document 1, in which the pre-coating treatment is performed once, and the ejection opening of the slit nozzle and the upper end of the pre-coated roller are opposed to each other by a predetermined gap, a certain amount. The treatment liquid or the coating liquid (for example, the photoresist liquid) is spouted from the slit nozzle, and the pre-coating roller is rotated at a predetermined rotation angle, and a part of the surface area of the pre-coated roller half a week or less is used in the pre-coating treatment, in continuous After the predetermined number of precoating treatments are completed, the outer peripheral surface of the precoated roller is collectively cleaned across the entire circumference.

此預塗處理法沿預塗滾子之周向分割其外周面成複數，依序分配此等分割區域(部分表面區域)使用於連續既定次數之預塗處理，其後橫跨全周一併清洗預塗滾子外周面。此一併清洗處理藉由旋轉機構使預塗滾子連續旋轉，並同時使清洗機構與乾燥部作動，橫跨全周集中清洗預塗滾子外周面，於進行各預塗處理時不需用以將捲取於預塗滾子表面之塗佈液液體膜刮下之刮刀，可節省預塗處理後於清洗處理時消耗之清洗液，且亦可防止清洗處理時產生微粒。The precoating process divides the outer peripheral surface of the pre-coating roller into a plurality in the circumferential direction, and sequentially distributes the divided regions (partial surface regions) for a predetermined number of precoating processes, and then traverses all Mondays and cleans Pre-coat the outer surface of the roller. In the cleaning process, the pre-coating roller is continuously rotated by the rotating mechanism, and at the same time, the cleaning mechanism and the drying portion are actuated, and the outer peripheral surface of the pre-coated roller is collectively cleaned across the entire circumference, and is not required for each pre-coating process. The scraper which scrapes off the liquid film of the coating liquid which is taken up on the surface of the pre-coated roller can save the cleaning liquid which is consumed during the cleaning treatment after the pre-coating treatment, and can also prevent the generation of fine particles during the cleaning treatment.

【先前技術文獻】[Previous Technical Literature]

【專利文獻】[Patent Literature]

【專利文獻1】日本特開2007-237046[Patent Document 1] Japanese Special Opening 2007-237046

本發明係本案申請人於上述專利文獻1所揭示之預塗處理法之改良版，且以獨特的觀點亦顧慮到預塗處理之產出或是可靠度，並同時實現更為節省預塗處理中使用之清洗液。The present invention is an improved version of the precoating process disclosed by the applicant in the above Patent Document 1, and also takes into consideration the output or reliability of the precoating treatment from a unique viewpoint, and at the same time achieves more saving precoating treatment. The cleaning solution used in the process.

亦即，本發明提供一種預塗處理方法及預塗處理裝置，可保障預塗處理的可靠度，並同時進一步削減清洗液之使用量。That is, the present invention provides a precoating treatment method and a precoating treatment apparatus which can ensure the reliability of the precoating treatment and at the same time further reduce the amount of the cleaning liquid used.

本發明第1觀點中的預塗處理方法係用來在用於非旋轉塗佈法塗佈處理之狹縫噴嘴的噴吐口附近，作為塗佈處理之事前準備形成塗佈液液體膜，其特徵在於包含：第1程序，為進行1次分之預塗處理，令該狹縫噴嘴的噴吐口隔著既定間隙平行對向水平配置之圓筒狀或圓柱狀預塗滾子頂部，使該狹縫噴嘴噴吐一定量塗佈液再使該預塗滾子旋轉，在該預塗滾子外周面上捲取一部分該經噴吐之塗佈液；第2程序，使該預塗滾子外周面上所捲取之塗佈液液體膜乾燥以作為第1乾燥膜；第3程序，為進行另1次分之預塗處理，錯開該第1乾燥膜，令該狹縫噴嘴的噴吐口隔著既定間隙平行對向於該預塗滾子頂部，使該狹縫噴嘴噴吐一定量塗佈液再使該預塗滾子旋轉，在該預塗滾子外周面上與該第1乾燥膜不同之區域捲取一部分該經噴吐之塗佈液；及第4程序，藉由清洗之方式一併去除該預塗滾子外周面上所附著之液體膜或乾燥膜。The precoating treatment method according to the first aspect of the present invention is for preparing a coating liquid film as a coating treatment before the ejection opening of the slit nozzle used for the non-rotation coating coating treatment. In the first program, the first step of the pre-coating process is performed, and the nozzle of the slit nozzle is placed in parallel with the predetermined gap to face the top of the cylindrical or cylindrical pre-coated roller horizontally. The slit nozzle ejects a certain amount of the coating liquid and then rotates the precoat roller, and a part of the sprayed coating liquid is taken up on the outer peripheral surface of the precoated roller; and the second program is used to make the precoated roller outer peripheral surface The coiled liquid film of the coating liquid is dried to be the first dry film, and the third step is to perform the precoating process for another division, and the first dry film is shifted to make the ejection opening of the slit nozzle interspersed. The gap is parallel to the top of the pre-coated roller, and the slit nozzle ejects a certain amount of the coating liquid to rotate the pre-coating roller, and the outer peripheral surface of the pre-coated roller is different from the first dry film. Scooping a portion of the sprayed coating liquid; and the fourth procedure by means of cleaning The liquid film or the dried film attached to the outer peripheral surface of the precoated roller is also removed.

且本發明第1觀點中的預塗處理裝置係用來在用於非旋轉塗佈法塗佈處理之狹縫噴嘴的噴吐口附近，作為塗佈處理之事前準備形成塗布液液體膜，其特徵在於包含：圓筒狀或圓柱狀預塗滾子，水平配置於既定位置；旋轉機構，使該預塗滾子繞著其中心軸旋轉；清洗機構，為清洗該預塗滾子外周面而噴送清洗液；排氣機構，用以使該預塗滾子周圍強制排氣；及控制部，控制該旋轉機構、該清洗機構及該排氣機構之各動作；且為進行1次分之預塗處理，令該狹縫噴嘴的噴吐口隔著既定間隙平行對向於該預塗滾子頂部，使該狹縫噴嘴噴吐一定量塗佈液再藉由該旋轉機構使該預塗滾子旋轉，在該預塗滾子外周面上捲取一部分該經噴吐之塗佈液，藉由該旋轉機構捲取該塗佈液後仍持續使該預塗滾子旋轉，使在該預塗滾子外周面上所捲取之塗佈液液體膜乾燥，以作為第1乾燥膜，為進行另1次分之預塗處理，錯開該第1乾燥膜，令該狹縫噴嘴的噴吐口隔著既定間隙平行對向於該預塗滾子頂部，使該狹縫噴嘴噴吐一定量塗佈液再使該預塗滾子旋轉，在該預塗滾子外周面上與該第1乾燥膜不同之區域捲取一部分該經噴吐之塗佈液，所希望次數之該預塗處理結束後，藉由該旋轉機構使預塗滾子旋轉，並同時使該清洗機構與該排氣機構作動，藉由清洗之方式一併去除該預塗滾子外周面上所附著之液體膜或乾燥膜。Further, the precoating treatment apparatus according to the first aspect of the present invention is for preparing a coating liquid film as a coating process in the vicinity of a discharge port of a slit nozzle for a non-rotation coating method. The invention comprises: a cylindrical or cylindrical pre-coated roller disposed horizontally at a predetermined position; a rotating mechanism for rotating the pre-coated roller about a central axis thereof; and a cleaning mechanism for spraying the outer peripheral surface of the pre-coated roller Sending a cleaning liquid; an exhausting mechanism for forcibly exhausting the pre-coated roller; and a control unit for controlling each operation of the rotating mechanism, the cleaning mechanism, and the exhausting mechanism; The coating process is such that the ejection opening of the slit nozzle is parallel to the top of the precoat roller via a predetermined gap, and the slit nozzle ejects a certain amount of coating liquid and then rotates the precoat roller by the rotating mechanism. And a part of the sprayed coating liquid is taken up on the outer circumferential surface of the pre-coated roller, and the pre-coated roller is continuously rotated after the coating liquid is taken up by the rotating mechanism, so that the pre-coated roller is rotated The liquid film of the coating liquid taken up on the outer peripheral surface is dried to In order to perform the first pre-coating process for the first dry film, the first dry film is shifted, and the ejection opening of the slit nozzle is parallel to the top of the pre-coated roller with a predetermined gap therebetween. The slit nozzle ejects a predetermined amount of the coating liquid and rotates the precoat roller, and a part of the sprayed coating liquid is taken up in a region different from the first dry film on the outer peripheral surface of the precoated roller, and the desired number of times After the pre-coating process is completed, the pre-coating roller is rotated by the rotating mechanism, and the cleaning mechanism and the exhausting mechanism are simultaneously actuated, and the outer peripheral surface of the pre-coated roller is removed by cleaning. Liquid film or dry film.

依上述第1觀點之預塗處理方法或處理裝置，作為使用預塗滾子外周面上所希望之區域實施之1次分的預塗處理之結果，使殘留(附著)於該區域內之塗佈液液體膜乾燥以作為第1乾燥膜，且使用預塗滾子外周面上與第1乾燥膜不同之區域實施後續之預塗處理。第1乾燥膜固定於既定區域內而固持在該處，故即使於其附近實施後續之預塗處理亦不會自第1乾燥膜受到影響(干擾)。The precoating treatment method or the processing apparatus according to the first aspect described above is used as a result of a precoating treatment performed once in a desired region on the outer peripheral surface of the precoated roller, and the coating is left (attached) in the region. The cloth liquid film is dried to be the first dry film, and the subsequent precoating treatment is performed using a region different from the first dry film on the outer peripheral surface of the precoated roller. Since the first dry film is fixed in a predetermined region and held there, even if the subsequent precoating treatment is performed in the vicinity thereof, it is not affected (interference) from the first dry film.

第1乾燥膜宜藉由自然乾燥以半乾狀態形成。因此，宜在預塗滾子上捲取一部分塗佈液後，預塗滾子仍持續保持旋轉，使塗佈液自然乾燥。藉由如此之自然乾燥法，各乾燥膜可以半乾狀態一併清洗處理之，易於沖掉乾燥膜，可削減清洗液使用量。The first dried film is preferably formed in a semi-dry state by natural drying. Therefore, it is preferable to roll a part of the coating liquid on the pre-coated roller, and the pre-coating roller continues to rotate, so that the coating liquid is naturally dried. By such a natural drying method, each of the dried films can be cleaned in a semi-dry state, and the dried film can be easily washed away, and the amount of the cleaning liquid can be reduced.

一併清洗時，宜使預塗滾子旋轉，並同時僅對預塗滾子外周面中附著有液體膜或乾燥膜之區域噴送清洗液，藉此可進一步削減清洗液使用量。When cleaning together, it is preferable to rotate the pre-coating roller and simultaneously spray the cleaning liquid only to the area where the liquid film or the dried film adheres to the outer peripheral surface of the pre-coating roller, thereby further reducing the amount of the cleaning liquid used.

且在一併清洗前，宜先對預塗滾子外周面上所附著之液體膜或乾燥膜之範圍及膜厚進行測定，根據該測定結果可決定一併清洗時清洗液之使用量。藉此，可進一步削減清洗液使用量。Before the cleaning, the range of the liquid film or the dried film attached to the outer peripheral surface of the pre-coated roller should be measured first, and the amount of the cleaning liquid used in the cleaning can be determined according to the measurement result. Thereby, the amount of the cleaning liquid used can be further reduced.

本發明第2觀點中的預塗處理方法係用來在用於非旋轉塗佈法塗佈處理之狹縫噴嘴的噴吐口附近，作為塗佈處理之事前準備形成塗佈液液體膜，其特徵在於包含：第1程序，令該塗佈處理用狹縫噴嘴或是非塗佈處理用之另一狹縫噴嘴隔著既定間隙與水平配置之圓筒狀或圓柱狀預塗滾子頂部平行對向，使該狹縫噴嘴噴吐塗佈液並使該預塗滾子旋轉，在該預塗滾子外周面上捲取一部分或全部該經噴吐之塗佈液；第2程序，使該預塗滾子外周面上所捲取之塗佈液液體膜乾燥以作為第1層乾燥膜；第3程序，為進行1次分之預塗處理，使該第1層乾燥膜位於該預塗滾子頂部，令該塗佈處理用狹縫噴嘴的噴吐口隔著既定間隙平行對向於該預塗滾子頂部，使該狹縫噴嘴噴吐一定量塗佈液再使該預塗滾子旋轉，在該第1層乾燥膜上捲取一部分該經噴吐之塗佈液；及第4程序，藉由清洗之方式一併去除該預塗滾子外周面上所附著之液體膜或乾燥膜。The precoating treatment method according to the second aspect of the present invention is for preparing a coating liquid film as a coating treatment before the ejection opening of the slit nozzle used for the non-rotation coating coating treatment. The first program includes a slit nozzle for coating treatment or another slit nozzle for non-coating processing, which is parallel to the horizontally disposed cylindrical or cylindrical precoated roller top with a predetermined gap therebetween. And spraying the coating liquid onto the slit nozzle to rotate the precoat roller, and winding a part or all of the sprayed coating liquid on the outer circumferential surface of the precoat roller; and the second program is to roll the precoat roll The liquid film of the coating liquid taken up on the outer peripheral surface of the sub-surface is dried to serve as the first layer of the dried film; and the third step is to perform the pre-coating treatment once, so that the first layer of the dried film is placed on top of the pre-coated roller. And the ejection opening of the slit nozzle for coating treatment is parallel to the top of the precoat roller via a predetermined gap, and the slit nozzle ejects a predetermined amount of the coating liquid to rotate the precoat roller. a part of the sprayed coating liquid is taken up on the first layer of the dried film; and the fourth program, The manner by the cleaning roller is removed together with the pre-coat liquid film or a film adhered to the dried outer peripheral surface.

本發明第2觀點中的預塗處理裝置係用來在用於非旋轉塗佈法塗佈處理之狹縫噴嘴的噴吐口附近，作為塗佈處理之事前準備形成塗布液液體膜，其特徵在於包含：圓筒狀或圓柱狀預塗滾子，水平配置於既定位置；旋轉機構，使該預塗滾子繞著其中心軸旋轉；清洗機構，為清洗該預塗滾子外周面而噴送清洗液；排氣機構，用以使該預塗滾子周圍強制排氣；及控制部，控制該旋轉機構、該清洗機構及該排氣機構之各動作；且令該塗佈處理用狹縫噴嘴或是非塗佈處理用之另一狹縫噴嘴隔著既定間隙平行對向於該預塗滾子頂部，令該狹縫噴嘴噴吐塗佈液並藉由該旋轉機構使該預塗滾子旋轉，在該預塗滾子外周面上捲取一部分或全部該經噴吐之塗佈液，令該排氣機構保持未啟動，藉由該旋轉機構捲取該塗佈液後該預塗滾子仍持續旋轉，使在該預塗滾子外周面上所捲取之塗佈液液體膜乾燥，以作為第1層乾燥膜，為進行1次分之預塗處理，使該第1層乾燥膜位於該預塗滾子頂部，令該狹縫噴嘴的噴吐口隔著既定間隙平行對向於該預塗滾子頂部，使該狹縫噴嘴噴吐一定量塗佈液再藉由該旋轉機構使該預塗滾子旋轉，在該第1層乾燥膜上捲取一部分該經噴吐之塗佈液，所希望次數之該預塗處理結束後，藉由該旋轉機構使預塗滾子旋轉，並同時令該清洗機構及該排氣機構作動，藉由清洗之方式一併去除該預塗滾子外周面上所附著之液體膜或乾燥膜。The precoating treatment apparatus according to the second aspect of the present invention is intended to form a coating liquid film as a coating liquid before the coating treatment in the vicinity of the ejection opening of the slit nozzle used for the non-rotation coating coating treatment. The utility model comprises: a cylindrical or cylindrical pre-coated roller disposed horizontally at a predetermined position; a rotating mechanism for rotating the pre-coated roller around a central axis thereof; and a cleaning mechanism for spraying the outer peripheral surface of the pre-coated roller a cleaning liquid; an exhausting mechanism for forcibly exhausting the pre-coated roller; and a control unit for controlling each operation of the rotating mechanism, the cleaning mechanism, and the exhausting mechanism; and the slit for coating processing The nozzle or another slit nozzle for non-coating treatment is parallel to the top of the pre-coated roller via a predetermined gap, so that the slit nozzle ejects the coating liquid and rotates the pre-coated roller by the rotating mechanism And a part or all of the sprayed coating liquid is taken up on the outer circumferential surface of the pre-coated roller, so that the exhaust mechanism remains unactivated, and the pre-coated roller remains after the coating liquid is taken up by the rotating mechanism. Continuously rotating on the outer circumference of the pre-coated roller The coiled coating liquid film is dried to serve as a first layer of dried film, and the first layer of the dried film is placed on top of the precoated roller so that the slit nozzle is The spout is parallel to the top of the pre-coated roller with a predetermined gap, and the slit nozzle ejects a certain amount of the coating liquid, and then rotates the pre-coated roller by the rotating mechanism on the first layer of the dried film. Taking a part of the sprayed coating liquid, after the desired number of times of the precoating process, the pre-coating roller is rotated by the rotating mechanism, and the cleaning mechanism and the exhausting mechanism are simultaneously actuated by cleaning In this manner, the liquid film or the dried film attached to the outer peripheral surface of the precoated roller is removed.

依上述第2觀點之預塗處理方法或處理裝置，於作為某1次分之預塗處理之結果在預塗滾子外周面上形成之第1層乾燥膜上實施後續之另一預塗處理，藉此在第1層乾燥膜上重複捲取第2層液體膜。在此，相較於預塗滾子外周面上所捲取之第1層液體膜之長度(沿周向尺寸)，第1層乾燥膜上所捲取之第2層液體膜之長度(沿周向尺寸)相當短。藉此，於預塗滾子一周內亦可使第2層液體膜捲取之次數(預塗處理次數)多於第1層液體膜捲取之次數(預塗處理次數)。又，第1層及第2層之各液體膜(或乾燥膜)可藉由一併清洗同時去除之。藉此，於預塗滾子上可不***清洗處理而持續實施之預塗處理次數可大幅增加，亦可實現一併清洗時清洗液使用量進一步之大幅削減。According to the pre-coating treatment method or the processing apparatus of the second aspect, the subsequent precoating treatment is performed on the first layer of the dried film formed on the outer peripheral surface of the precoated roller as a result of the precoating treatment of the first time. Thereby, the second layer liquid film is repeatedly wound up on the first layer dried film. Here, the length of the second liquid film taken up on the first layer of the dried film is compared with the length of the first layer of the liquid film taken up on the outer peripheral surface of the precoated roller (in the circumferential direction) The circumferential dimension) is quite short. Thereby, the number of times the second layer liquid film is wound up (the number of precoating processes) can be made more than the number of times the first layer of liquid film is wound (the number of precoating processes) in one week of the precoating roller. Further, each of the liquid films (or the dried film) of the first layer and the second layer can be simultaneously removed by washing together. As a result, the number of precoating processes that can be continuously performed without inserting the cleaning process on the precoat roller can be greatly increased, and the amount of the cleaning liquid used can be further reduced.

作為較佳之一態樣，上述第2觀點中預塗處理方法內該第1程序為進行1次分之預塗處理，令該塗佈處理用狹縫噴嘴的噴吐口隔著既定間隙平行對向於該預塗滾子頂部，使該狹縫噴嘴噴吐一定量塗佈液再使該預塗滾子旋轉，在該預塗滾子外周面上捲取一部分該經噴吐之塗佈液。In a preferred embodiment of the second aspect, in the precoating method, the first step is a precoating process in which the slit nozzle of the coating process is parallel to each other via a predetermined gap. At the top of the precoat roller, the slit nozzle sprays a predetermined amount of the coating liquid to rotate the precoat roller, and a part of the sprayed coating liquid is taken up on the outer peripheral surface of the precoated roller.

且第1層乾燥膜宜藉由自然乾燥以半乾狀態形成之。因此，在預塗滾子外周面上捲取一部分塗佈液後，預塗滾子宜仍持續保持旋轉，排氣機構維持未啟動以使塗佈液膜自然乾燥。藉由如此之自然乾燥法，各乾燥膜可以半乾狀態一併清洗處理之，易於沖掉乾燥膜，可降低清洗液使用量。And the first layer of the dried film is preferably formed in a semi-dry state by natural drying. Therefore, after a part of the coating liquid is taken up on the outer peripheral surface of the pre-coated roller, the pre-coating roller should continue to rotate, and the exhaust mechanism is maintained unactivated to naturally dry the coating liquid film. By such a natural drying method, each of the dried films can be cleaned in a semi-dry state, and the dried film can be easily washed away, and the amount of the cleaning liquid can be reduced.

作為較佳之另一態樣，上述第2觀點中預塗處理方法在該第2程序與該第3程序之間包含：第5程序，對該第1層乾燥膜膜厚分布特性進行測定；及第6程序，根據該膜厚分布特性測定結果，於該第1層乾燥膜膜厚均一性超過一定基準時，提出主旨為容許實行該第3程序之判定結果，於該第1層乾燥膜膜厚均一性未超過該基準時，提出主旨為應中止實行該第3程序之判定結果。According to another aspect of the present invention, in the second aspect, the precoating treatment method includes: a fifth program for measuring a film thickness distribution characteristic of the first layer of the dried film between the second program and the third program; In the sixth procedure, based on the measurement result of the film thickness distribution characteristic, when the uniformity of the film thickness of the first layer of the dried film exceeds a certain standard, it is proposed that the result of the determination of the third process is permitted, and the film is dried on the first layer. When the thickness uniformity does not exceed the criterion, the main purpose is to determine the result of the determination that the third procedure should be suspended.

且上述第2觀點中預塗處理裝置包含用以對該預塗滾子上乾燥膜之膜厚進行測定之膜厚測定部，藉由該膜厚測定部對該第1層乾燥膜之膜厚分布特性進行測定，根據該膜厚分布特性測定結果，於該第1層乾燥膜之膜厚均一性超過一定基準時，在該第1層乾燥膜上實行預塗處理，於該第1層乾燥膜之膜厚均一性未超過該基準時，中止在該第1層乾燥膜上進行預塗處理。Further, in the second aspect, the precoating treatment apparatus includes a film thickness measuring unit for measuring a film thickness of the dried film on the precoat roller, and the film thickness of the first layer dried film by the film thickness measuring unit According to the measurement result of the film thickness distribution property, when the uniformity of the film thickness of the first layer of the dried film exceeds a certain standard, a precoating treatment is performed on the first layer of the dried film, and the first layer is dried. When the film thickness uniformity of the film does not exceed the standard, the precoating treatment is stopped on the first layer dried film.

如此，藉由具有針對於後續之預塗處理中預定是承接由狹縫噴嘴噴吐之塗佈液之基底之第1層乾燥膜之膜質狀態(膜厚均一性)進行檢查之功能，可提升預塗處理之產出或是可靠度。In this way, by having a function of inspecting the film quality state (film thickness uniformity) of the first layer dry film which is intended to receive the coating liquid sprayed by the slit nozzle in the subsequent precoating process, the preheating can be improved. The output of the coating treatment or reliability.

且依較佳之又一態樣，該第3程序中沿周向之塗佈液捲取尺寸未達到該第1程序中沿周向之塗佈液捲取尺寸的1/2。如上述，相較於預塗滾子外周面上所捲取之第1層液體膜之長度(沿周向尺寸)，第1層乾燥膜上所捲取之第2層液體膜之長度(沿周向尺寸)相當(通常在1/2以下)短。According to still another preferred aspect, the coating liquid winding size in the circumferential direction in the third step does not reach 1/2 of the coating liquid winding size in the circumferential direction in the first step. As described above, the length of the second liquid film taken up on the first layer of the dried film (along the circumferential dimension) compared to the length of the first layer of the liquid film wound on the outer peripheral surface of the precoated roller (along The circumferential dimension is quite short (usually below 1/2).

此時，依較佳之一態樣，使在第3程序中於第1層乾燥膜上所捲取之塗佈液液體膜乾燥以作為第2層第1乾燥膜。其後，使用與此第2層第1乾燥膜不同之區域在第1層乾燥膜上進行又1次分之預塗處理，於此區域內捲取塗佈液(第2層第2液體膜)。其後於一併清洗時同時沖掉第1層乾燥膜與第2層第1乾燥膜及第2液體膜(或第2乾燥膜)。At this time, in a preferred embodiment, the coating liquid film wound on the first layer dried film in the third step is dried to be the second layer first dried film. Thereafter, a pre-coating treatment is performed on the first layer of the dried film in a region different from the second layer of the first dry film, and the coating liquid is wound in the region (the second layer of the second liquid film). ). Thereafter, the first layer of the dried film and the second layer of the first dried film and the second liquid film (or the second dried film) are simultaneously washed away while being washed together.

依較佳之另一態樣，使在第3程序中於第1層乾燥膜上所捲取之塗佈液液體膜乾燥以作為第2層乾燥膜。其後，使用該第2層乾燥膜進行再1次分之預塗處理，於該區域內捲取塗佈液(第3層液體膜)。其後於一併清洗時同時沖掉第1層乾燥膜、第2層乾燥膜與第3層液體膜(乾燥膜)第1乾燥膜。According to another preferred embodiment, the coating liquid film wound on the first layer of the dried film in the third step is dried to form a second layer dried film. Thereafter, the second layer of the dried film was used to carry out the precoating treatment once again, and the coating liquid (the third layer liquid film) was taken up in this region. Thereafter, the first dry film, the second dry film, and the third liquid film (dry film) first dried film were simultaneously washed away while being washed together.

且一併清洗(第4程序)時，宜使預塗滾子旋轉，並同時僅對預塗滾子外周面中附著有液體膜或乾燥膜之區域噴送清洗液。藉此，可進一步削減一併清洗時清洗液之使用量。且亦可在一併清洗前，先對預塗滾子外周面上所附著之各液體膜或乾燥膜之範圍及膜厚進行測定，根據此測定結果決定一併清洗時清洗液之使用量，藉此，可更促進一併清洗時清洗液使用量之削減。When cleaning together (fourth procedure), it is preferable to rotate the pre-coating roller and simultaneously eject the cleaning liquid only to the area where the liquid film or the dried film adheres to the outer peripheral surface of the pre-coating roller. Thereby, the amount of the cleaning liquid used in the cleaning can be further reduced. Moreover, before the cleaning, the range and thickness of each liquid film or dried film attached to the outer surface of the pre-coated roller are measured, and the amount of the cleaning liquid used in the cleaning is determined according to the measurement result. Thereby, the reduction in the amount of the cleaning liquid used in the cleaning can be further promoted.

本發明第3觀點中的預塗處理方法係用來在用於非旋轉塗佈法塗佈處理之狹縫噴嘴的噴吐口附近，作為塗佈處理之事前準備形成塗佈液液體膜，其特徵在於包含：第1程序，為進行1次分之預塗處理，令該狹縫噴嘴的噴吐口隔著既定間隙與水平配置之圓筒狀或圓柱狀預塗滾子頂部平行對向，使該狹縫噴嘴噴吐一定量塗佈液再使該預塗滾子旋轉，在該預塗滾子外周面上捲取一部分該經噴吐之塗佈液；第2程序，使在該第1程序中於該預塗滾子外周面上所捲取之塗佈液液體膜乾燥以作為第1層第1乾燥膜；第3程序，為進行另1次分之預塗處理，錯開該第1層第1乾燥膜，令該狹縫噴嘴的噴吐口隔著既定間隙平行對向於該預塗滾子頂部，使該狹縫噴嘴噴吐一定量塗佈液再使該預塗滾子旋轉，在該預塗滾子外周面上與該第1乾燥膜不同之區域捲取一部分該經噴吐之塗佈液；第4程序，使在該第3程序中於該預塗滾子外周面上所捲取之塗佈液液體膜乾燥，以作為第1層第2乾燥膜；第5程序，為進行又1次分之預塗處理，使該第1層第1或第2乾燥膜位於該預塗滾子頂部，令該狹縫噴嘴的噴吐口隔著既定間隙平行對向於該預塗滾子頂部，使該狹縫噴嘴噴吐一定量塗佈液再使該預塗滾子旋轉，在該第1層第1或第2乾燥膜上捲取一部分該經噴吐之塗佈液；及第6程序，藉由清洗之方式一併去除該預塗滾子外周面上所附著之所有薄膜。The precoating treatment method according to the third aspect of the present invention is for preparing a coating liquid film as a coating treatment before the ejection opening of the slit nozzle used for the non-rotation coating coating treatment. The first program includes a first pre-coating process for causing the jet nozzle of the slit nozzle to be parallel to the horizontally disposed cylindrical or cylindrical precoated roller top with a predetermined gap therebetween. a slit nozzle sprays a predetermined amount of the coating liquid, and then rotates the precoat roller, and a part of the sprayed coating liquid is taken up on the outer peripheral surface of the precoated roller; and the second program is used in the first program. The coating liquid film wound on the outer peripheral surface of the precoated roller is dried to be the first first dry film; the third process is to perform the first precoating process, and the first layer is first shifted. Drying the film so that the ejection opening of the slit nozzle faces the top of the precoat roller in parallel with a predetermined gap, and the slit nozzle ejects a certain amount of the coating liquid to rotate the precoat roller. Rolling a part of the sprayed coating liquid on a peripheral surface of the roller different from the first dry film In the fourth program, the coating liquid film wound on the outer peripheral surface of the precoated roller in the third program is dried to be the first layer of the second dry film, and the fifth program is performed once again. And pre-coating treatment, wherein the first layer or the first drying film of the first layer is located at the top of the pre-coating roller, so that the ejection opening of the slit nozzle is parallel to the top of the pre-coated roller through a predetermined gap, so that Dissipating a predetermined amount of the coating liquid by the slit nozzle, and rotating the precoat roller, and winding a part of the sprayed coating liquid on the first layer or the first dry film of the first layer; and the sixth program The cleaning method removes all the films attached to the outer peripheral surface of the precoated roller.

且本發明第3觀點中的預塗處理裝置係用來在用於非旋轉塗佈法塗佈處理之狹縫噴嘴的噴吐口附近，作為塗佈處理之事前準備形成塗布液液體膜，其特徵在於包含：圓筒狀或圓柱狀預塗滾子，水平配置於既定位置；旋轉機構，使該預塗滾子繞著其中心軸旋轉；清洗機構，為清洗該預塗滾子外周面而噴送清洗液；排氣機構，用以使該預塗滾子周圍強制排氣；及控制部，控制該旋轉機構、該清洗機構及該排氣機構之各動作；且為進行1次分之預塗處理，令該狹縫噴嘴的噴吐口隔著既定間隙平行對向於該預塗滾子頂部，使該狹縫噴嘴噴吐一定量塗佈液再藉由該旋轉機構使該預塗滾子旋轉，在該預塗滾子外周面上捲取一部分該經噴吐之塗佈液，令該排氣機構保持未啟動，藉由該旋轉機構捲取該塗佈液後該預塗滾子仍持續旋轉，使在該預塗滾子外周面上所捲取之塗佈液液體膜乾燥，以作為第1層第1乾燥膜，為進行另1次分之預塗處理，錯開該第1乾燥膜，令該狹縫噴嘴的噴吐口隔著既定間隙平行對向於該預塗滾子頂部，使該狹縫噴嘴噴吐一定量塗佈液再藉由該旋轉機構使該預塗滾子旋轉，在該預塗滾子外周面上與該第1乾燥膜不同之區域捲取一部分該經噴吐之塗佈液，令該排氣機構保持未啟動，藉由該旋轉機構捲取該塗佈液後仍使該預塗滾子旋轉，使在該預塗滾子外周面上所捲取之塗佈液液體膜乾燥，以作為第1層第2乾燥膜，為進行又1次分之預塗處理，使該第1層第1或第2乾燥膜位於該預塗滾子頂部，令該狹縫噴嘴的噴吐口隔著既定間隙平行對向於該預塗滾子頂部，使該狹縫噴嘴噴吐一定量塗佈液再藉由該旋轉機構使該預塗滾子旋轉，在該第1層第1或第2乾燥膜上捲取一部分該經噴吐之塗佈液，所希望次數之該預塗處理結束後，藉由該旋轉機構使預塗滾子旋轉，並同時令該清洗機構及該排氣機構作動，藉由清洗之方式一併去除該預塗滾子外周面上所附著之所有薄膜。Further, the precoating treatment apparatus according to the third aspect of the present invention is for preparing a coating liquid film as a coating liquid before the ejection nozzle of the slit nozzle for the non-rotation coating coating treatment. The invention comprises: a cylindrical or cylindrical pre-coated roller disposed horizontally at a predetermined position; a rotating mechanism for rotating the pre-coated roller about a central axis thereof; and a cleaning mechanism for spraying the outer peripheral surface of the pre-coated roller Sending a cleaning liquid; an exhausting mechanism for forcibly exhausting the pre-coated roller; and a control unit for controlling each operation of the rotating mechanism, the cleaning mechanism, and the exhausting mechanism; The coating process is such that the ejection opening of the slit nozzle is parallel to the top of the precoat roller via a predetermined gap, and the slit nozzle ejects a certain amount of coating liquid and then rotates the precoat roller by the rotating mechanism. And a part of the sprayed coating liquid is taken up on the outer circumferential surface of the pre-coated roller, so that the exhaust mechanism remains unactivated, and the pre-coated roller continues to rotate after the coating liquid is taken up by the rotating mechanism. To take up the outer peripheral surface of the pre-coated roller The liquid film of the coating liquid is dried to be the first dry film of the first layer, and the first drying film is shifted, and the first dry film is shifted so that the ejection openings of the slit nozzles are parallel to each other with a predetermined gap therebetween. Disposing a predetermined amount of the coating liquid on the top of the pre-coating roller, and rotating the pre-coating roller by the rotating mechanism, and the outer peripheral surface of the pre-coated roller is different from the first dry film. A portion of the sprayed coating liquid is taken up to keep the exhaust mechanism unactivated, and the precoat roller is rotated after the coating liquid is taken up by the rotating mechanism to make the outer circumference of the precoated roller The liquid film of the coating liquid taken up on the surface is dried to be the first dry film of the first layer, and the precoating process is performed once again, so that the first or second dry film of the first layer is located in the precoating. The top of the roller is such that the ejection opening of the slit nozzle is parallel to the top of the pre-coating roller with a predetermined gap therebetween, so that the slit nozzle ejects a certain amount of coating liquid and then the pre-coated roller is rotated by the rotating mechanism. Rotating, winding a part of the sprayed coating liquid on the first or second dry film of the first layer, the desired number of times After the coating process is completed, the pre-coating roller is rotated by the rotating mechanism, and at the same time, the cleaning mechanism and the exhausting mechanism are actuated, and all the attached surfaces on the outer peripheral surface of the pre-coated roller are removed by cleaning. film.

依上述第3觀點之預塗處理方法或處理裝置，在預塗滾子外周面上不***清洗而進行複數次預塗處理，每次皆作為後處理進行乾燥程序在預塗滾子外周面上形成第1層第1及第2乾燥膜。又，在第1層第1或第2乾燥膜上亦實施後續之另一預塗處理，藉此在第1層第1或第2乾燥膜上重複捲取第2層液體膜。在此，相較於預塗滾子外周面上所捲取之液體膜之長度(沿周向尺寸)，第1層乾燥膜上所捲取之第2層液體膜之長度(沿周向尺寸)相當短。藉此，於預塗滾子一周內第2層液體膜捲取之次數(預塗處理次數)亦可多於第1層液體膜捲取之次數(預塗處理次數)。第1層及第2層各液體膜(或是乾燥膜)可藉由一併清洗同時去除之。According to the pre-coating treatment method or the processing apparatus according to the third aspect described above, the pre-coating treatment is performed on the outer peripheral surface of the pre-coated roller without performing the cleaning, and the drying process is performed on the outer peripheral surface of the pre-coated roller each time as a post-treatment. The first layer first and second dry films are formed. Further, another subsequent precoating treatment is performed on the first layer or the first dry film of the first layer, whereby the second layer liquid film is repeatedly wound up on the first layer or the first dry film of the first layer. Here, the length of the second liquid film taken up on the first layer of the dried film (in the circumferential direction) compared to the length of the liquid film taken up on the outer peripheral surface of the precoated roller (in the circumferential direction) ) quite short. Thereby, the number of times the second liquid film is taken up (the number of precoating processes) in one week of the precoat roller can be more than the number of times the first layer of liquid film is wound (the number of precoating processes). The first and second liquid films (or dried films) can be removed by washing them together.

依上述第3觀點之預塗處理方法或預塗處理裝置與上述第2觀點之預塗處理方法或預塗處理裝置相同，亦可大幅增加在預塗滾子上可不***清洗處理而連續實施之預塗處理次數，亦可實現一併清洗時清洗液使用量進一步大幅之削減。The precoating treatment method or the precoating treatment apparatus according to the third aspect described above can be similarly applied to the precoating treatment method or the precoating treatment apparatus according to the second aspect, and can be continuously applied to the precoat roller without being inserted into the cleaning treatment. The number of precoating treatments can also achieve a further substantial reduction in the amount of cleaning fluid used in the cleaning process.

本發明第4觀點中的預塗處理裝置係用來在用於非旋轉塗佈法塗佈處理之狹縫噴嘴的噴吐口附近，作為塗佈處理之事前準備形成塗布液液體膜，其特徵在於包含：預塗處理部，為進行1次分之預塗處理，令該狹縫噴嘴的噴吐口隔著既定間隙平行對向於該預塗滾子頂部，使該狹縫噴嘴噴吐一定量塗佈液再使該預塗滾子旋轉，在該預塗滾子外周面上捲取一部分塗佈液；膜厚測定部，用以對該預塗滾子外周面上所捲取之塗佈液液體膜或其乾燥膜之膜厚分布特性進行測定；及噴嘴噴吐功能判定部，根據由該膜厚測定部獲得之膜厚分布特性測定結果，判定該狹縫噴嘴之噴吐功能良否。The precoating treatment apparatus according to the fourth aspect of the present invention is for forming a coating liquid film as a coating liquid before the coating process in the vicinity of the ejection opening of the slit nozzle used for the non-spin coating coating process. The precoating treatment unit is configured to perform a precoating process for one time, so that the ejection orifice of the slit nozzle is parallel to the top of the precoat roller across a predetermined gap, and the slit nozzle is sprayed with a certain amount of coating. The liquid further rotates the precoat roller, and a part of the coating liquid is taken up on the outer circumferential surface of the precoat roller; the film thickness measuring portion is used to apply the coating liquid liquid wound on the outer circumferential surface of the precoat roller. The film thickness distribution characteristic of the film or the dried film thereof is measured, and the nozzle ejection function determining unit determines whether the ejection function of the slit nozzle is good or not based on the measurement result of the film thickness distribution characteristic obtained by the film thickness measuring unit.

依上述構成，可自實施預塗處理後在預塗滾子上所捲取之塗佈液液體膜或其乾燥膜之膜厚分布特性判定狹縫噴嘴之噴吐功能良否，故可提升塗佈處理之產出或是可靠度。According to the above configuration, the film thickness distribution characteristic of the liquid film of the coating liquid or the dried film which is taken up on the precoated roller after the precoating treatment can be determined whether the ejection function of the slit nozzle is good or not, so that the coating treatment can be improved. Output or reliability.

依本發明之預塗處理方法或預塗處理裝置，藉由如上述之構成及作用，可保障預塗處理之可靠度，並同時進一步削減清洗液之使用量。According to the precoating treatment method or the precoating treatment apparatus of the present invention, the reliability of the precoating treatment can be ensured by the above-described constitution and action, and the amount of the cleaning liquid can be further reduced.

以下，參照附圖說明本發明之較佳實施形態。Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings.

[預塗處理裝置之構成][Composition of precoating treatment device]

圖1中顯示本發明一實施形態內預塗處理裝置之構成。組裝此預塗處理裝置於例如LCD製程用光微影程序中進行非旋轉塗佈法之光阻塗佈處理之光阻塗佈裝置(未經圖示)內，為進行光阻塗佈處理配置被處理基板於進行載置或是浮升輸送之塗佈平台(未經圖示)附近。Fig. 1 shows the configuration of a precoating treatment apparatus according to an embodiment of the present invention. The precoating treatment apparatus is assembled, for example, in a photoresist coating apparatus (not shown) which performs a photoresist coating treatment by a non-rotation coating method in a photolithography program for LCD process, and is configured for photoresist coating processing. The substrate to be processed is in the vicinity of a coating platform (not shown) that is placed or floated.

圖示之預塗處理裝置中，殼體10由在上表面具有狹縫狀開口部12之長條形框體所構成，藉由軸承(未經圖示)以水平且可旋轉之方式支持所收納之預塗滾子14，俾其頂部隔著開口部12於上方露出。In the illustrated precoating apparatus, the casing 10 is constituted by an elongated frame having a slit-like opening 12 on the upper surface, and is supported by a bearing (not shown) in a horizontal and rotatable manner. The pre-coated roller 14 is housed, and the top portion thereof is exposed above the opening portion 12.

預塗滾子14係例如不鏽鋼所構成之圓筒狀或圓柱狀滾子，具有一定外徑(例如100~150mm)與後述涵蓋狹縫噴嘴72全長之長度。殼體10亦可例如以不鏽鋼製作。The precoated roller 14 is a cylindrical or cylindrical roller composed of, for example, stainless steel, and has a constant outer diameter (for example, 100 to 150 mm) and a length that covers the entire length of the slit nozzle 72 to be described later. The housing 10 can also be made, for example, of stainless steel.

於殼體10內，自預塗滾子14頂部(最上部)起至底部(最下部)，在沿正的旋轉方向(圖1中係順時針)前進途中，最好是在旋轉角位置90°~180°之區間內，設有清洗機構16之清洗噴嘴。此清洗噴嘴宜由長條形2流體噴射噴嘴18所構成，以涵蓋預塗滾子14全長之長度與其平行配置，經由配管20、22連接清洗液供給部24及氣體供給部26。於配管20、22途中分別設有開閉閥28、30。In the housing 10, from the top (uppermost) to the bottom (lowermost) of the pre-coating roller 14, in the forward direction of rotation (clockwise in Fig. 1), preferably at the rotational angular position 90 A cleaning nozzle of the cleaning mechanism 16 is provided in the interval of °~180°. The cleaning nozzle is preferably constituted by an elongated two-fluid injection nozzle 18, and is disposed in parallel with the length of the entire length of the precoat roller 14, and is connected to the cleaning liquid supply portion 24 and the gas supply portion 26 via the pipes 20, 22. On/off valves 28 and 30 are provided in the middle of the pipes 20 and 22, respectively.

清洗預塗滾子14時，開啟開閉閥28、30，2流體噴射噴嘴18自清洗液供給部24及氣體供給部26分別接收清洗液(例如稀釋劑)及氣體(例如空氣或氮氣)所希望之流量，於噴嘴內混合清洗液與氣體，自狹縫或多孔型噴吐口以噴射流之方式朝預塗滾子14外周面噴送。清洗控制部25控制清洗液供給部24、氣體供給部26及開閉閥28、30，特別是可在後述來自主控制部70之指示下個別且任意地控制清洗液及氣體之流量。When the pre-coating roller 14 is cleaned, the opening and closing valves 28 and 30 are opened, and the fluid ejection nozzles 18 are required to receive a cleaning liquid (for example, a diluent) and a gas (for example, air or nitrogen) from the cleaning liquid supply unit 24 and the gas supply unit 26, respectively. At the flow rate, the cleaning liquid and the gas are mixed in the nozzle, and are sprayed toward the outer peripheral surface of the pre-coating roller 14 by a jet from the slit or the porous ejection port. The cleaning control unit 25 controls the cleaning liquid supply unit 24, the gas supply unit 26, and the opening and closing valves 28 and 30. Specifically, the flow rate of the cleaning liquid and the gas can be individually and arbitrarily controlled under the instruction from the main control unit 70, which will be described later.

於開口部12與清洗機構16之間之區間，殼體10之內壁留下不接觸預塗滾子14外周面程度的微小間隙接近預塗滾子14外周面，而成為霧氣遮蔽部32。清洗預塗滾子14時於2流體噴射噴嘴18周圍產生之霧氣不通過霧氣遮蔽部32之間隙朝開口部12側離開，在此受到隔離。In the section between the opening portion 12 and the cleaning mechanism 16, the inner wall of the casing 10 leaves a small gap which does not contact the outer peripheral surface of the precoat roller 14 so as to approach the outer peripheral surface of the precoat roller 14, and becomes the mist shielding portion 32. When the pre-coating roller 14 is cleaned, the mist generated around the two-fluid jet nozzle 18 does not pass through the gap of the mist shielding portion 32 toward the opening portion 12 side, and is isolated therefrom.

於殼體10內，以預塗滾子14為中心霧氣遮蔽部32及清洗機構16之相反側，設有霧氣導入部34、抽吸口36及強制乾燥部38。In the casing 10, a mist introduction portion 34, a suction port 36, and a forced drying portion 38 are provided on the opposite side of the pre-coating roller 14 as the center mist shielding portion 32 and the cleaning mechanism 16.

霧氣導入部34宜設於自預塗滾子14頂部沿旋轉方向旋轉角位置180°~270°之區間內。圖示構成例之霧氣導入部34於該區間內具有在殼體10內壁與預塗滾子14外周面之間形成之霧氣導入用間隙40。The mist introduction portion 34 is preferably provided in a section that is rotated from the top of the precoat roller 14 by an angular position of 180 to 270 in the rotational direction. The mist introduction portion 34 of the illustrated configuration has a mist introduction gap 40 formed between the inner wall of the casing 10 and the outer circumferential surface of the precoat roller 14 in this section.

強制乾燥部38宜設於自預塗滾子14頂部沿旋轉方向旋轉角位置270°~360°之區間內。圖示構成例之強制乾燥部38於該區間內具有在殼體10內壁與預塗滾子14外周面之間形成之液體甩除用間隙42。The forced drying portion 38 is preferably provided in a range of 270° to 360° from the top of the pre-coating roller 14 in the rotational direction. The forced drying portion 38 of the illustrated configuration has a liquid removing gap 42 formed between the inner wall of the casing 10 and the outer peripheral surface of the precoat roller 14 in this section.

抽吸口36經由真空通路44及真空導管46，通往包含例如真空泵或吸氣風扇(未經圖示)及霧氣捕集器或過濾器等之真空裝置48。於真空通路44終端附近，設有藉由排氣閥控制部50開閉控制之排氣阻尼器52。一旦使真空裝置48導通，令排氣阻尼器52為開啟狀態，霧氣導入部34及強制乾燥部38即作動，霧氣導入用氣流及液體甩除用氣流分別於霧氣導入用間隙40及液體甩除用間隙42自外流往吸氣口36。一旦關閉排氣阻尼器52，即使已使真空裝置48導通，吸氣口36中亦不及於真空，霧氣導入部34及強制乾燥部38會呈斷開狀態。The suction port 36 leads to a vacuum device 48 including, for example, a vacuum pump or an intake fan (not shown), a mist trap, a filter, or the like via the vacuum passage 44 and the vacuum duct 46. An exhaust damper 52 that is opened and closed by the exhaust valve control unit 50 is provided in the vicinity of the end of the vacuum passage 44. When the vacuum device 48 is turned on, the exhaust damper 52 is turned on, and the mist introducing portion 34 and the forced drying portion 38 are activated, and the mist introducing airflow and the liquid removing airflow are removed in the mist introducing gap 40 and the liquid, respectively. The gap 42 is used to flow from the outside to the suction port 36. When the exhaust damper 52 is closed, even if the vacuum device 48 is turned on, the suction port 36 is not in a vacuum, and the mist introduction portion 34 and the forced drying portion 38 are in an off state.

於此預塗處理裝置中，用以強制使預塗滾子14周圍排氣之排氣機構45如上述，包含霧氣導入部34、抽吸口36、強制乾燥部38、真空裝置48、排氣閥控制部50及排氣阻尼器52。In the precoating apparatus, the exhaust mechanism 45 for forcibly exhausting the periphery of the precoat roller 14 includes the mist introduction portion 34, the suction port 36, the forced drying portion 38, the vacuum device 48, and the exhaust gas as described above. Valve control unit 50 and exhaust damper 52.

於殼體10之底，預塗滾子14正下方之位置形成有排放口54。此排放口54經由排液管56通往排放槽58。At the bottom of the casing 10, a discharge port 54 is formed at a position directly below the pre-coating roller 14. This discharge port 54 leads to the discharge groove 58 via the drain pipe 56.

於此預塗處理裝置中，用以使預塗滾子14旋轉之旋轉機構65包含馬達60、旋轉控制部62及編碼器64。馬達60宜由伺服馬達所構成，此旋轉驅動軸經由例如帶輪或傳動皮帶等傳動機構(未經圖示)連接預塗滾子14之旋轉軸。旋轉控制部62不僅可控制馬達60之基本動作(旋轉、停止、速度控制等)，亦可藉由編碼器64任意控制馬達60之旋轉量及旋轉角度位置。In the precoating apparatus, the rotating mechanism 65 for rotating the precoat roller 14 includes a motor 60, a rotation control unit 62, and an encoder 64. The motor 60 is preferably constituted by a servo motor that is coupled to the rotating shaft of the pre-coated roller 14 via a transmission mechanism (not shown) such as a pulley or a drive belt. The rotation control unit 62 can control not only the basic operation (rotation, stop, speed control, and the like) of the motor 60, but also the rotation amount and the rotation angle position of the motor 60 by the encoder 64.

於此預塗處理裝置中，設有用以測定預塗滾子14上光阻膜膜厚之膜厚測定部67。膜厚測定部67包含膜厚感測器66及膜厚運算部68。In the precoating apparatus, a film thickness measuring unit 67 for measuring the film thickness of the photoresist film on the precoat roller 14 is provided. The film thickness measuring unit 67 includes a film thickness sensor 66 and a film thickness calculating unit 68.

膜厚感測器66設置或配置於開口部12附近，俾不干擾狹縫噴嘴72，自該位置以非接觸式，亦即光學式測定正前方於預塗滾子14外周面上所附著之光阻膜或其液體膜之膜厚。作為另一構成例，亦可藉由例如支持臂等以可動之方式支持膜厚感測器66，於狹縫噴嘴72遠離殼體10之開口部12時，令膜厚感測器66對準開口部12上。The film thickness sensor 66 is disposed or disposed in the vicinity of the opening portion 12 so as not to interfere with the slit nozzle 72, and is attached to the outer peripheral surface of the precoat roller 14 from the position in a non-contact manner, that is, optically determined. The film thickness of the photoresist film or its liquid film. As another configuration example, the film thickness sensor 66 may be movably supported by, for example, a support arm or the like, and the film thickness sensor 66 may be aligned when the slit nozzle 72 is away from the opening portion 12 of the casing 10. On the opening portion 12.

膜厚運算部68將膜厚感測器66之輸出信號輸入，運算預塗滾子14上光阻液膜之膜厚測定值。宜沿預塗滾子14之軸方向以一定間隔配置複數個膜厚感測器66成一列，不僅沿預塗滾子14之周向，沿軸方向亦可測定光阻液膜之膜厚分布特性。將藉由膜厚測定部67獲得之膜厚測定值或是膜厚分布特性測定值送往主控制部70。The film thickness calculation unit 68 inputs the output signal of the film thickness sensor 66, and calculates the film thickness measurement value of the photoresist film on the precoat roller 14. Preferably, a plurality of film thickness sensors 66 are arranged in a row at a certain interval along the axial direction of the precoat roller 14, and not only the circumferential direction of the precoat roller 14, but also the film thickness distribution of the photoresist film can be measured along the axial direction. characteristic. The film thickness measurement value or the film thickness distribution characteristic measurement value obtained by the film thickness measurement unit 67 is sent to the main control unit 70.

主控制部70包含按照既定軟體動作之微電腦，統合控制此預塗處理裝置內清洗機構16、排氣機構45、旋轉機構65及膜厚測定部67之動作。於圖示之構成例中，主控制部70直接控制真空裝置48、膜厚感測器66及膜厚運算部68各動作，並藉由清洗控制部25、排氣閥控制部50及旋轉控制部62控制2流體噴射噴嘴18、排氣阻尼器52及馬達60各動作。且主控制部70藉由旋轉機構65之旋轉控制部62可掌握或是控制預塗滾子14之旋轉量及旋轉角位置。The main control unit 70 includes an operation of controlling the cleaning mechanism 16, the exhaust mechanism 45, the rotating mechanism 65, and the film thickness measuring unit 67 in the precoating device in a microcomputer that operates in accordance with a predetermined software. In the configuration example shown in the drawing, the main control unit 70 directly controls the operations of the vacuum device 48, the film thickness sensor 66, and the film thickness calculation unit 68, and the cleaning control unit 25, the exhaust valve control unit 50, and the rotation control are directly controlled. The portion 62 controls the two fluid ejection nozzles 18, the exhaust damper 52, and the motor 60 to operate. Further, the main control unit 70 can grasp or control the rotation amount and the rotation angle position of the precoat roller 14 by the rotation control unit 62 of the rotation mechanism 65.

且主控制部70統合控制此預塗處理裝置內整體之程序，並至少就關於預塗處理而言，控制該光阻塗佈裝置中所包含之光阻塗佈處理用狹縫噴嘴72所有動作。Further, the main control unit 70 integrates and controls the entire program in the precoating processing apparatus, and controls all the movements of the slit coating nozzles 72 for the photoresist coating process included in the photoresist coating apparatus at least with respect to the precoating process. .

亦即於該光阻塗佈裝置中，狹縫噴嘴72由噴嘴移動機構74支持，且可輸送至預先設定之空間內任意之位置，定位於任意位置。且於狹縫噴嘴72中，自光阻供給部76經由光阻供給管78供給光阻液。在此，於光阻供給管78設有開閉閥80。就關於預塗處理而言，主控制部70藉由噴嘴移動機構74、光阻供給部76、開閉閥80，控制狹縫噴嘴72之移動或定位，及光阻液噴吐動作。That is, in the photoresist coating apparatus, the slit nozzle 72 is supported by the nozzle moving mechanism 74, and can be transported to any position in a predetermined space to be positioned at an arbitrary position. Further, in the slit nozzle 72, the photoresist liquid is supplied from the photoresist supply portion 76 via the photoresist supply tube 78. Here, the shutter supply valve 78 is provided with an opening and closing valve 80. In the precoating process, the main control unit 70 controls the movement or positioning of the slit nozzle 72 and the photoresist liquid discharge operation by the nozzle moving mechanism 74, the photoresist supply unit 76, and the opening and closing valve 80.

[預塗處理方法之第1實施例][First Embodiment of Precoating Treatment Method]

其次就圖2~圖8，說明以此預塗處理裝置可實施之預塗處理方法之第1實施例。Next, a first embodiment of a precoating treatment method which can be carried out by this precoating apparatus will be described with reference to Figs. 2 to 8.

於組裝有此預塗處理裝置之該光阻塗佈裝置中，每當在塗佈平台上基板一片分之塗佈處理結束，作為下一塗佈處理之事前準備即以此預塗處理裝置進行1次分的預塗處理。In the photoresist coating apparatus in which the precoating apparatus is assembled, the coating process is completed one by one on the coating platform, and the precoating apparatus is used as the preparation for the next coating process. One-time pre-coating treatment.

圖2中顯示預塗滾子14外周面橫跨全周重設成潔淨狀態，再進行一開始(第1次)的預塗處理時之各階段。圖3中以時間軸上的波形顯示圖2之預塗處理動作中預塗滾子14之旋轉速度。Fig. 2 shows the stages in which the outer peripheral surface of the precoat roller 14 is reset to the clean state over the entire circumference, and the precoating process at the beginning (first time) is performed. The rotation speed of the precoat roller 14 in the precoating operation of Fig. 2 is shown by the waveform on the time axis in Fig. 3.

於此第1次預塗處理中，首先如圖1所示，藉由噴嘴移動機構74使狹縫噴嘴72定位，俾狹縫噴嘴72之噴吐口與預塗滾子14頂部隔著既定間隙(例如數十~數百μm)平行對向。此時，清洗機構16當然保持未啟動，排氣機構45亦保持未啟動。In the first precoating process, first, as shown in FIG. 1, the slit nozzle 72 is positioned by the nozzle moving mechanism 74, and the ejection opening of the slit nozzle 72 and the top of the precoat roller 14 are separated by a predetermined gap ( For example, tens to hundreds of μm) parallel alignment. At this time, the cleaning mechanism 16 of course remains unactuated, and the exhaust mechanism 45 remains unactuated.

其次如圖2之I(噴吐)所示，令預塗滾子14靜止，直接藉由光阻供給部76對狹縫噴嘴72噴吐一定量光阻液R。Next, as shown in FIG. 2, I (spray), the precoat roller 14 is made to stand still, and a certain amount of photoresist R is ejected to the slit nozzle 72 directly by the photoresist supply unit 76.

此光阻液噴吐之動作於一定時間(圖3之t0 ~t1 )內進行。由狹縫噴嘴72之噴吐口噴吐之光阻液R之液體抵達預塗滾子14頂部附近再沿周向朝周圍擴散。This action of the photoresist is performed in a certain period of time (t 0 to t 1 in Fig. 3). The liquid of the photoresist R which is ejected from the ejection opening of the slit nozzle 72 reaches the vicinity of the top of the precoat roller 14 and spreads toward the periphery in the circumferential direction.

接著，藉由旋轉機構65於既定時間點(圖3之時點t1 )令預塗滾子14之旋轉動作開始，如圖2之II(捲取)所示，光阻液R迴繞至狹縫噴嘴72之背面下端部72a，光阻液R捲取於預塗滾子14外周面上。在此，捲取光阻液R時之旋轉速度Va 宜相對較低，俾不會招致過快切斷光阻液R之液體膜，可選擇例如圓周速度數十mm/秒。Next, the rotating action of the pre-coating roller 14 is started by the rotating mechanism 65 at a predetermined time point (the point t 1 in FIG. 3), as shown in FIG. 2 (capping), the photoresist liquid R is wound back to the slit. The back surface lower end portion 72a of the nozzle 72 is wound around the outer peripheral surface of the precoat roller 14. Here, the rotational speed V a when the photoresist R is wound up is preferably relatively low, and the liquid film of the photoresist R is not cut too quickly, and for example, a peripheral speed of several tens of mm/second can be selected.

接著，於既定時間點(圖3之時點t2 )迅速提高預塗滾子14之旋轉速度。藉此，如圖2之III(切離)所示，切離光阻液R之液體膜，分成狹縫噴嘴72側與預塗滾子14側。此時，若使狹縫噴嘴72上昇，即可更為順暢且確實地於既定部位分離光阻液膜。如此，光阻液之液體膜RF自噴嘴噴吐口起涵蓋背面下端部72a殘留於狹縫噴嘴72。另一方面，於預塗滾子14外周面上，如上述殘留有經捲取之光阻液之液體膜RM1 。此光阻液膜RM1 之沿周向捲取尺寸於旋轉角度範圍內可設定為例如70°~75°。Next, the rotational speed of the precoat roller 14 is rapidly increased at a predetermined time point (time point t 2 in Fig. 3). Thereby, as shown in FIG. 2 (cut-away), the liquid film cut away from the photoresist R is divided into the slit nozzle 72 side and the precoat roller 14 side. At this time, if the slit nozzle 72 is raised, the photoresist liquid film can be separated more smoothly and surely at a predetermined portion. As described above, the liquid film RF of the photoresist liquid remains in the slit nozzle 72 from the nozzle ejection opening, covering the back lower end portion 72a. On the other hand, on the outer peripheral surface of the precoat roller 14, the liquid film RM 1 of the wound photoresist liquid remains as described above. The circumferential winding size of the photoresist film RM 1 may be set to, for example, 70 to 75 in the range of the rotation angle.

於此實施例中，切離光阻液膜RM1 後，亦如圖2之IV(自然乾燥)所示預塗滾子14持續維持旋轉。此時，預塗滾子14之旋轉速度如以圖3之實線V所示，可持續維持緊接於切離光阻液膜後(圖3之時點t3 )之速度Vb (例如圓周速度數百mm/秒)，或是亦可如以假想線(短劃線)V’所示切換為不同速度(例如圓周速度數十mm/秒)。又，於此自然乾燥(IV)期間內，排氣機構45亦保持未啟動。In this embodiment, after the photoresist film RM 1 is cut away, the precoat roller 14 is continuously maintained in rotation as shown in FIG. 2 (naturally dry). At this time, the rotation speed of the precoat roller 14 is as shown by the solid line V of FIG. 3, and the speed V b (for example, the circumference) immediately after the cutting off the photoresist film (point t 3 in FIG. 3 ) can be continuously maintained. The speed is hundreds of mm/sec., or it can be switched to different speeds as indicated by an imaginary line (dash line) V' (for example, a peripheral speed of several tens of mm/sec). Also, during this natural drying (IV) period, the exhaust mechanism 45 remains unactuated.

於此實施例中，如此截取預塗滾子14上所捲取之光阻液膜RM1 後，預塗滾子14亦持續維持旋轉，藉此動作，可使2個重要效果奏效。In this embodiment, after the photoresist film RM 1 taken up on the pre-coated roller 14 is cut off, the pre-coating roller 14 is continuously maintained in rotation, whereby two important effects can be achieved.

第1效果可防止預塗滾子14上所捲取之光阻液膜RM1 之液體垂滴。亦即，於捲取(II)及切離(III)動作中，預塗滾子14上的光阻液膜RM1 自預塗滾子14頂部沿周向朝底部移動。The first effect prevents liquid dripping of the photoresist film RM 1 wound up on the precoat roller 14. That is, in the winding (II) and the cutting (III) operation, the photoresist liquid film RM 1 on the precoat roller 14 moves from the top of the precoat roller 14 toward the bottom in the circumferential direction.

假設在此預塗滾子14若停止旋轉，沿周向朝下之力即會因重力持續作用於光阻液膜RM1 ，光阻液膜RM1 會於預塗滾子14外周面上朝下垂滴(擴散)。使用狹縫噴嘴之非旋轉塗佈塗佈法中，通常係使用20cp以下的低黏度光阻液，故於預塗滾子上如上述易於發生光阻液膜之液體垂滴。It is assumed that if the pre-coating roller 14 stops rotating, the force directed downward in the circumferential direction will continue to act on the photoresist film RM 1 due to gravity, and the photoresist film RM 1 will hang down on the outer peripheral surface of the pre-coating roller 14 (diffusion). In the non-spin coating method using a slit nozzle, a low-viscosity photoresist of 20 cp or less is usually used, so that liquid dripping of the photoresist film is liable to occur on the pre-coated roller as described above.

然而，於此實施例中，藉由預塗滾子14不停止而持續維持旋轉，實質上可取消對光阻液膜RM1 作用之重力作用(引發液體垂滴之力)，預塗滾子14上所捲取之光阻液膜RM1 不因液體垂滴而擴散，以表面張力靜止於既定區域(分割區域)內。However, in this embodiment, the rotation of the pre-coating roller 14 is continued without stopping, and the gravity acting on the photoresist film RM 1 (the force that causes the liquid dripping) can be substantially eliminated, and the pre-coating roller The photoresist film RM 1 taken up on the 14 is not diffused by the liquid dripping, and is kept stationary in a predetermined region (divided region) with surface tension.

作為第2效果，藉由停止排氣機構45，持續維持預塗滾子14旋轉，可在短時間內高效率地使預塗滾子14上所捲取之光阻液膜RM1 自然乾燥。As a second effect, the exhaust gas by stopping means 45, the pre-coat roller 14 is rotated continuously maintained promoter, may be pre-coated in a short time so that the rollers are efficiently wound on the photoresist film 14 RM 1-dried.

亦即，若使排氣機構45導通，令預塗滾子14旋轉，預塗滾子14上的光阻液膜RM1 於強制乾燥部38之間隙42中即會因逆風而承受巨大的應力，導致易於降低膜厚均一性。特別是於強制乾燥部38之間隙42內施加於光阻液膜RM1 逆風之壓力若沿軸方向有差異，在光阻液膜RM1 表面即會易於沿周向造成條紋狀之凹凸。若停止排氣機構45，於預塗滾子14旋轉中其外周面上的光阻液膜RM1 通過間隙42時亦不需承受逆風之壓力，可接受同等於在大氣中以靜止狀態放置時之自然乾燥。That is, when the exhaust unit 45 is turned on, so that the roller 14 is rotated precoat, the precoat roller RM photoresist film 141 on the forced drying portion 38 of the gap 42 due to headwind i.e. under great stress , resulting in easy reduction of film thickness uniformity. In particular the forced drying portion 42 of the gap 38 is applied to the photoresist film RM upwind pressure of 1 if there are differences in the axial direction, i.e., the surface of the photoresist film RM 1 may be easily caused in the circumferential direction of the streak-like irregularities. If the exhaust mechanism 45 is stopped, the photoresist film RM 1 on the outer peripheral surface of the precoat roller 14 does not need to withstand the pressure of the upwind when passing through the gap 42 and can be equally accepted when placed in the atmosphere in a static state. It is naturally dry.

如此，於預塗滾子14上光阻液膜RM1 因自然乾燥膜的內部保持液狀而膜的表層部乾燥固化，呈半乾或微乾狀態。一旦呈如此之半乾狀態，預塗滾子14之旋轉即使停止，於光阻液膜RM1 亦不會發生液體垂滴。Thus, in the surface layer portion on the pre-coated roller 14 a photoresist film due to natural internal RM 1 holding a liquid film is dried and cured film was dried, it was slightly dry or semi-dry state. Once the form is so dry state, rotation of the roller 14 of the precoat even stopped, in the photoresist film RM 1 also dropping the liquid does not occur.

於此實施形態中，為與自然乾燥程序前完全呈液態的液體膜區別，稱自然乾燥程序後呈半乾狀態之光阻液膜RMi (i=1、2、3‧‧)為光阻乾燥膜[RMi ]。In this embodiment, the photoresist film RM i (i=1, 2, 3‧‧) which is in a semi-dry state after the natural drying process is distinguished from the liquid film which is completely liquid before the natural drying process. Dry film [RM i ].

如上述藉由使預塗滾子14旋轉對光阻液膜RM1 所進行之自然乾燥(IV)需花費一定時間(圖3之t3 ~t4 )進行。於此期間內，藉由噴嘴移動機構74將狹縫噴嘴72送往塗佈平台，以在此進行基板一片分的光阻塗佈處理。又，光阻塗佈處理一旦結束，狹縫噴嘴72即再回到此預塗處理裝置，如圖1所示，進行定位，俾該噴吐口隔著既定間隙與預塗滾子14頂部平行對向。The natural drying (IV) performed on the photoresist film RM 1 by rotating the precoat roller 14 as described above takes a certain time (t 3 to t 4 in Fig. 3). During this period, the slit nozzle 72 is sent to the coating stage by the nozzle moving mechanism 74 to perform a photoresist coating process on the substrate. Moreover, once the photoresist coating process is completed, the slit nozzle 72 is returned to the precoating processing apparatus, and as shown in FIG. 1, positioning is performed, and the ejection opening is parallel to the top of the precoat roller 14 with a predetermined gap therebetween. to.

圖4中顯示進行第2次預塗處理時之各階段。於此第2次預塗處理中，如圖4之I(噴吐)所示，錯開前一次(第1次)之預塗處理由預塗滾子14所捲取之第1光阻乾燥膜[RM1 ]，而在該預塗滾子14頂部與狹縫噴嘴72噴吐口對向之狀態下，令狹縫噴嘴72噴吐一定量光阻液R。Fig. 4 shows the stages in the second precoating process. In the second precoating treatment, as shown in FIG. 4 (Ip), the first photoresist drying film which is wound by the precoat roller 14 is offset from the previous (first) precoating process [ RM 1 ], and the slit nozzle 72 ejects a certain amount of the photoresist R in a state where the top of the precoat roller 14 and the slit nozzle 72 are opposed to each other.

接著，如圖4所示，以與第1次預塗處理時相同之動作及時間點依序進行光阻液R之捲取(II)、切離(III)、自然乾燥(IV)各程序。Next, as shown in FIG. 4, the steps of winding (II), cutting away (III), and naturally drying (IV) of the photoresist R are sequentially performed in the same operation and time point as in the first precoating process. .

此時亦與第1次預塗處理時相同，藉由捲取(II)及切離(III)之程序，在預塗滾子14外周面上以既定沿周向尺寸(旋轉角度範圍70°~75°)捲取光阻液R，形成光阻液膜RM2 。又，持續維持預塗滾子14旋轉並自切離(III)轉變至自然乾燥(IV)動作，不引起液體垂滴，於既定區域內使光阻液膜RM2 自然乾燥。如此在預塗滾子14外周面上與第1光阻乾燥膜[RM1 ]不同之區域內，通常在沿旋轉方向設定於下游側旁之分割區域內，作為附隨於本次(第2次)預塗處理之殘餘物，以既定沿周向尺寸(70°~75°)形成第2光阻乾燥膜[RM2 ]。At this time, also in the same manner as in the first precoating process, the circumferential direction dimension (rotation angle range of 70°) is set on the outer circumferential surface of the precoat roller 14 by the procedure of winding (II) and cutting away (III). ~75°) Winding off the photoresist R to form a photoresist film RM 2 . Further, the rotation of the precoat roller 14 is continuously maintained and the self-cutting (III) transition to the natural drying (IV) operation is performed, and the liquid dripping liquid is not caused, and the photoresist liquid film RM 2 is naturally dried in a predetermined region. In the region where the outer circumferential surface of the precoat roller 14 is different from the first photoresist dried film [RM 1 ], it is usually set in the divided region along the downstream side in the rotation direction as the present (second) The residue of the precoating treatment forms a second photoresist dried film [RM 2 ] with a predetermined circumferential dimension (70° to 75°).

第3次預塗處理省略圖示，而以與上述第1次及第2次預塗處理相同之程序及動作進行。結果，在與第1及第2光阻乾燥膜[RM1 ]、[RM2 ]不同之區域內，通常在沿旋轉方向設定於第2光阻乾燥膜[RM2 ]下游側旁之分割區域內，作為附隨於第3次預塗處理之殘餘物，以既定沿周向尺寸(70°~75°)形成第3光阻乾燥膜[RM3 ]。The third precoating process is omitted from the illustration, and is performed in the same procedure and operation as the first and second precoating processes described above. As a result, in a region different from the first and second photoresist dried films [RM 1 ] and [RM 2 ], the divided region is usually set in the rotation direction on the downstream side of the second photoresist dried film [RM 2 ]. Inside, as a residue accompanying the third precoating treatment, a third photoresist dried film [RM 3 ] was formed with a predetermined circumferential dimension (70° to 75°).

又，於第3次預塗處理結束之時點，第3光阻乾燥膜[RM3 ]雖已如上述因自然乾燥而呈半乾狀態，但第1及第2光阻乾燥膜[RM1 ]、[RM2 ]仍依然保持半乾狀態。亦即，第1及第2光阻乾燥膜[RM1 ]、[RM2 ]於預塗滾子14上完全未接受強制乾燥處理或加熱處理，故即使自然乾燥之時間長達數倍仍尚維持半乾狀態。Further, at the time when the third precoating treatment is completed, the third photoresist dried film [RM 3 ] is in a semi-dry state due to natural drying as described above, but the first and second photoresist dried films [RM 1 ] [RM 2 ] still remains semi-dry. That is, the first and second photoresist dried films [RM 1 ] and [RM 2 ] are not subjected to forced drying treatment or heat treatment on the precoat roller 14, so that even if the natural drying time is several times longer, Maintain a semi-dry state.

於此第1實施例中，預塗滾子14外周面橫跨全周重設為潔淨狀態，再連續進行既定次數，例如4次預塗處理，緊接於其後預塗滾子14進行一併清洗(外周面全周之潔淨化)。In the first embodiment, the outer circumferential surface of the precoat roller 14 is cleaned across the entire circumference, and is continuously carried out for a predetermined number of times, for example, four times of precoating treatment, and immediately after the precoat roller 14 is collectively cleaned. (The outer circumference is cleaned throughout the week).

圖5中顯示預塗滾子14於一周內進行最後(第4次)預塗處理及緊接於其後之一併清洗處理時之各階段。圖6中以時間軸上的波形顯示圖5預塗處理動作及一併清洗處理動作中預塗滾子14之旋轉速度。Fig. 5 shows the stages in which the precoat roller 14 is subjected to the last (fourth) precoating treatment in one week and immediately after one of the cleaning treatments. In Fig. 6, the rotation speed of the precoat roller 14 in the precoating operation and the collective cleaning operation in Fig. 5 is shown by the waveform on the time axis.

於最後(第4次)預塗處理中亦如圖5所示，光阻液R之噴吐(I)、捲取(II)及切離(III)各程序與第1次~第3次各預塗處理時相同，在預塗滾子14外周面上沿旋轉方向第3光阻乾燥膜[RM3 ]下游側旁的分割區域內捲取有光阻液膜RM4 。In the final (fourth) precoating process, as shown in FIG. 5, the processes of the ejection (I), the winding (II), and the cutting (III) of the photoresist R are the same from the first to the third. In the precoating process, the photoresist film RM 4 is wound up in the divided region on the outer peripheral surface of the precoated roller 14 in the rotational direction of the downstream side of the third photoresist drying film [RM 3 ].

然而，切離(III)後卻跳過自然乾燥(IV)程序，持續維持預塗滾子14旋轉，轉變為清洗(V)程序。於此清洗(V)程序中，令清洗機構16及排氣機構45作動。However, after cutting away from (III), the natural drying (IV) procedure is skipped, and the pre-coating roller 14 is continuously rotated to be converted into a cleaning (V) program. In the cleaning (V) program, the cleaning mechanism 16 and the exhaust mechanism 45 are actuated.

又，於清洗(V)程序開始前，主控制部70藉由旋轉機構65及膜厚測定部67，測定在預塗滾子14上所附著之光阻乾燥膜[RM1 ]、[RM2 ]、[RM3 ]及光阻液膜RM4 之範圍(面積)及膜厚，根據此測定結果以運算之方式決定清洗(V)程序中清洗液之使用量。例如，可以在預塗滾子14上所附著之所有光阻膜(液體膜或乾燥膜)的總光阻量(範圍×膜厚)為基準值，決定清洗液使用量為等於該基準值(總光阻量)之數值。Further, before the start of the cleaning (V) program, the main control unit 70 measures the dried photoresist film [RM 1 ], [RM 2 ] attached to the precoat roller 14 by the rotating mechanism 65 and the film thickness measuring unit 67. The range (area) and film thickness of the [RM 3 ] and the photoresist film RM 4 are determined according to the measurement results, and the amount of the cleaning liquid used in the cleaning (V) program is determined by calculation. For example, the total photoresist amount (range × film thickness) of all the photoresist films (liquid film or dried film) attached to the pre-coated roller 14 may be a reference value, and the amount of the cleaning liquid used may be determined to be equal to the reference value ( The total amount of photoresist).

且就關於光阻膜測定而言，通常在預塗滾子14上係重複相同之預塗處理，故亦可視附著於各分割區域之光阻膜[RM1 ]、[RM2 ]、[RM3 ]、RM4 的範圍及膜厚相同，僅測定其中之一，例如[RM1 ]之範圍(面積)及膜厚即可。Further, as for the measurement of the photoresist film, the same precoating process is usually repeated on the precoat roller 14, so that the photoresist film [RM 1 ], [RM 2 ], [RM) attached to each of the divided regions can also be used. 3 ], the range of RM 4 and the film thickness are the same, and only one of them can be measured, for example, the range (area) of [RM 1 ] and the film thickness.

作為清洗(V)程序中較佳之一態樣，主控制部70令旋轉機構65與清洗機構16連動(合作)，進行控制，俾2流體噴射噴嘴18僅對在預塗滾子14外周面全周中附著有光阻膜[RM1 ]、[RM2 ]、[RM3 ]、RM4 之區域噴送清洗液及空氣之2流體噴射流。在此，清洗液之流量或是使用量如上述根據光阻膜之測定決定之。As a preferred aspect of the cleaning (V) program, the main control unit 70 causes the rotation mechanism 65 to interlock with the cleaning mechanism 16 to perform control, and the 流体2 fluid ejection nozzle 18 is only for the outer peripheral surface of the pre-coating roller 14 In the middle of the week, the photoresist film [RM 1 ], [RM 2 ], [RM 3 ], and the area of RM 4 were sprayed with the cleaning liquid and the air 2 fluid jet. Here, the flow rate or the amount of the cleaning liquid is determined as described above based on the measurement of the photoresist film.

如此，藉由自2流體噴射噴嘴18所噴射之2流體噴射流強大的衝擊力，當然可輕易沖掉剛附著在預塗滾子14外周面上之光阻液膜RM4 ，亦可輕易沖掉半乾狀態之光阻乾燥膜[RM1 ]、[RM2 ]、[RM3 ]，其中多半混在清洗液中流往正下方的排放口54，其餘則化為霧氣ma於附近飛散。如此於一併清洗中在2流體噴射噴嘴18周圍產生之霧氣ma內朝上方飄起者由霧氣遮蔽部32所遮蔽，大致不會朝殼體10之開口部12側離開。Thus, by the strong impact force of the 2 fluid jets ejected from the 2 fluid jet nozzles 18, the photoresist film RM 4 which has just adhered to the outer peripheral surface of the precoat roller 14 can be easily washed away, and can be easily washed. The semi-dry state photoresist dried film [RM 1 ], [RM 2 ], [RM 3 ] is mostly mixed in the cleaning liquid to the discharge port 54 directly below, and the rest is turned into a mist ma scattered nearby. When the mist is generated upward in the mist ma generated around the two fluid jet nozzles 18 during the collective cleaning, the mist shielding portion 32 is shielded from the mist shielding portion 32, and is not substantially separated from the opening portion 12 side of the casing 10.

另一方面，於排氣機構45中開啟排氣阻尼器52，經由真空導管46、真空通路44及抽吸口36對霧氣導入部34及強制乾燥部38供給來自真空裝置48之真空。On the other hand, the exhaust damper 52 is opened in the exhaust mechanism 45, and the vacuum from the vacuum device 48 is supplied to the mist introduction portion 34 and the forced drying portion 38 via the vacuum conduit 46, the vacuum passage 44, and the suction port 36.

如圖7所示，霧氣導入部34自間隙40下端將在2流體噴射噴嘴18周圍產生之霧氣ma吸入其中，霧氣ma於間隙40中沿預塗滾子14外周面順著旋轉方向流動，再將自間隙40上端於抽吸口36出現的霧氣ma送往真空裝置48。強制乾燥部38將空氣自上方之大氣空間經由開口部12吸入間隙42中，於間隙42中沿預塗滾子14外周令空氣與旋轉方向逆向流動，以空氣壓力刮除殘留在預塗滾子14外周面之液體以使其液滴化，將自間隙42下端於抽吸口36出現的霧氣mb送往真空裝置48。如此，利用真空令與旋轉方向逆向之氣流沖擊預塗滾子14外周面以甩除液體，直接以真空回收因此液體甩除產生之霧氣mb，故乾燥效率高且可防止霧氣飛散。As shown in Fig. 7, the mist introducing portion 34 sucks the mist ma generated around the two fluid jet nozzles 18 from the lower end of the gap 40, and the mist ma flows along the outer peripheral surface of the precoat roller 14 in the gap 40 in the direction of rotation. The mist ma appearing from the upper end of the gap 40 at the suction port 36 is sent to the vacuum device 48. The forced drying unit 38 draws air from the upper atmospheric space into the gap 42 through the opening portion 12, and flows the air in the gap 42 along the outer circumference of the precoat roller 14 to reverse the direction of rotation, and scrapes off the residual coating roller at the air pressure. The liquid on the outer peripheral surface of 14 is dropletized, and the mist mb emerging from the lower end of the gap 42 at the suction port 36 is sent to the vacuum device 48. In this way, the vacuum is applied to the outer peripheral surface of the pre-coated roller 14 by the air flow in the opposite direction to the direction of rotation to remove the liquid, and the liquid is directly recovered by vacuum, so that the liquid is removed by the mist mb, so that the drying efficiency is high and the mist can be prevented from scattering.

如上述於清洗(V)程序開始再經過既定時間時(圖6之時點t5 )，使清洗機構16斷開，停止2流體噴射清洗。其後維持預塗滾子14連續旋轉，僅使排氣機構45(霧氣導入部34及強制乾燥部38)之動作持續，切換為橫跨全周以真空力使預塗滾子14外周面乾燥之強制乾燥(VI)程序。又，經過既定時間後，關閉排氣阻尼器52，使排氣機構45斷開以停止乾燥處理，藉此結束一併清洗處理之全程序。As in the above-described cleaning (V) and then after a predetermined time when the program starts (FIG. 6 point of t 5), the cleaning mechanism 16 is disconnected, the cleaning fluid jet 2 is stopped. Thereafter, the precoat roller 14 is continuously rotated, and only the operation of the exhaust mechanism 45 (the mist introduction portion 34 and the forced drying portion 38) is continued, and the outer peripheral surface of the precoat roller 14 is dried by vacuum force across the entire circumference. Forced drying (VI) procedure. Further, after a predetermined period of time, the exhaust damper 52 is closed, and the exhaust mechanism 45 is turned off to stop the drying process, thereby ending the entire process of the collective cleaning process.

又，就產距一致之觀點而言，一併清洗處理中包含清洗(V)及強制乾燥(VI)之全處理時間(圖6之t3 ~t6 )宜設定為與自然乾燥(IV)之處理時間(圖3之t3 ~t4 )同長(例如60秒)。此時，清洗(V)之處理時間(圖6之t3 ~t5 )可設定為例如20秒，強制乾燥(VI)之處理時間(圖6之t5 ~t6 )可設定為例如40秒。Moreover, in terms of the uniform production distance, the total processing time (t 3 ~ t 6 in Fig. 6) including cleaning (V) and forced drying (VI) in the cleaning process should be set to be naturally dry (IV). The processing time (t 3 ~ t 4 in Fig. 3) is the same length (for example, 60 seconds). At this time, the processing time of cleaning (V) (t 3 to t 5 in FIG. 6 ) can be set to, for example, 20 seconds, and the processing time of forced drying (VI) (t 5 to t 6 in FIG. 6 ) can be set to, for example, 40. second.

如上述，依此第1實施例，沿預塗滾子14周向分割其外周面為複數(例如4個)，分配各分割區域給連續之既定次數(4次)預塗處理使用，於除最後(第4次)預塗處理外各預塗處理中，在捲取光阻液液體膜RMi 後仍持續維持預塗滾子14旋轉，藉此動作，可防止光阻液膜RMi 之液體垂滴，固持光阻液膜RMi 於各分割(分配)區域內，並可在短時間內高效率地使光阻液膜RMi 自然乾燥，而成半乾狀態之光阻乾燥膜[RMi ]。As described above, according to the first embodiment, the outer peripheral surface of the precoat roller 14 is divided into a plurality of (for example, four) outer circumferential surfaces, and each divided region is allocated for a predetermined number of times (four times) of precoating treatment. the last (fourth) processing of each outer precoating precoating process, after coiling the liquid film photoresists RM i and maintained at the pre-coat roller 14 is rotated, whereby the operation to prevent the resist film RM i The liquid dripping liquid holds the photoresist film RM i in each divided (distributed) region, and can effectively dry the photoresist film RM i in a short time to form a semi-dry state photoresist dried film [ RM i ].

如此，可防止於預塗滾子14上光阻液膜RMi 之液體垂滴，故無污染旁邊的未使用分割區域之虞，因此後續之預塗處理不會因前面的預塗處理而受到影響，可提升預塗處理之再現性及可靠度。In this way, the liquid dripping of the photoresist liquid film RM i on the pre-coating roller 14 can be prevented, so that there is no entanglement of the unused divided region next to the contamination, so the subsequent pre-coating treatment is not affected by the previous pre-coating treatment. The effect can improve the reproducibility and reliability of the precoating process.

且附著在預塗滾子14上的各光阻液膜RMi 可作為藉由自然乾燥呈半乾狀態的光阻乾燥膜[RMi ]，或是以完全液體狀的狀態清洗，故易於沖洗，可減輕清洗機構16之負擔，減少清洗液之使用量。And each of the photoresist liquid films RM i attached to the pre-coating roller 14 can be used as a dry film (RM i ) which is dried in a semi-dry state by natural drying, or can be washed in a completely liquid state, so that it is easy to rinse. The burden on the cleaning mechanism 16 can be reduced, and the amount of cleaning liquid used can be reduced.

且於一併清洗時，僅對預塗滾子14外周面中附著有光阻膜[RM1 ]、[RM2 ]、[RM3 ]、RM4 之區域噴送適量之清洗液，故可進一步削減清洗液之使用量。When cleaning together, only a proper amount of the cleaning liquid is sprayed on the outer peripheral surface of the precoat roller 14 to which the photoresist film [RM 1 ], [RM 2 ], [RM 3 ], and RM 4 are adhered. Further reduce the amount of cleaning liquid used.

又，圖示例中預塗滾子14外周面係分割為4，1次預塗處理中沿周向之光阻液捲取尺寸為70°~75°。然而，分割數及捲取尺寸可係任意者，例如每1次沿周向捲取尺寸亦可在70°以下即可，分割預塗滾子14外周面為5，連續5次使用。且在預塗滾子14外周面上橫跨一周所設定之複數分割區域之間預塗處理所使用之順序係任意者(順序不同)，不與排列順序一致亦可。Further, in the illustrated example, the outer peripheral surface of the precoat roller 14 is divided into four, and the circumferential resistivity of the photoresist is taken up to 70° to 75° in the precoating process. However, the number of divisions and the size of the winding may be any. For example, the winding size may be 70° or less per circumferential direction, and the outer circumferential surface of the divided precoat roller 14 may be 5 for five consecutive uses. Further, the order of the precoating process between the plurality of divided regions set on the outer circumferential surface of the precoated roller 14 is different (the order is different), and may not coincide with the arrangement order.

圖8中以立體圖顯示上述依第1實施例預塗處理方法之大致程序。Fig. 8 is a perspective view showing the outline of the above-described precoating processing method according to the first embodiment.

[預塗處理方法之第2實施例][Second Embodiment of Precoating Treatment Method]

其次就圖9~圖12，說明可以此預塗處理裝置實施之預塗處理方法第2實施例。Next, a second embodiment of the precoating treatment method which can be carried out by the precoating apparatus will be described with reference to Figs. 9 to 12 .

此第2實施例係使在預塗滾子14上可不***清洗處理而連續進行之預塗處理次數飛躍性地增加之方法。此實施例中，至使用預塗滾子14外周面，於一周內最後(第4次)之預塗處理中將捲取在預塗滾子14上的光阻液之液體膜RM4 切離之步驟(圖5之III(切離))止，與第1實施例經歷相同之處理。In the second embodiment, the number of precoating processes which are continuously performed without the cleaning process being inserted into the precoat roller 14 is drastically increased. In this embodiment, the liquid film RM 4 of the photoresist liquid wound on the precoat roller 14 is cut away from the outer peripheral surface of the precoated roller 14 in the last (fourth) precoating process in one week. The step (III of Fig. 5 (cutaway)) is the same as that of the first embodiment.

於第2實施例中，此後非一併清洗(V)，而係與第1次~第3次預塗處理時相同轉變為自然乾燥(IV)程序。結果，在預塗滾子14外周面上，於第3光阻乾燥膜[RM3 ]與第1光阻乾燥膜[RM1 ]之間所設定之分割區域內，作為附隨於第4次預塗處理之殘餘物，以既定沿周向尺寸(70°~75°)形成第4光阻乾燥膜[RM4 ]。In the second embodiment, the cleaning (V) was not performed at the same time, and the natural drying (IV) procedure was changed in the same manner as in the first to third precoating treatments. As a result, the outer peripheral surface of the precoat roller 14 is attached to the fourth time in the divided region set between the third photoresist dried film [RM 3 ] and the first photoresist dried film [RM 1 ]. The residue of the precoating treatment forms a fourth photoresist dried film [RM 4 ] with a predetermined circumferential dimension (70° to 75°).

接著，如圖9所示，主控制部70藉由旋轉機構65及膜厚測定部67，測定附著在預塗滾子14上的所有光阻乾燥膜[RM1 ]、[RM2 ]、[RM3 ]、[RM4 ]之各膜厚分布特性。如上述清洗(V)前的膜厚測定係用來決定清洗液之使用量，故精度不需過高，但此時膜厚分布特性直接關係到預塗處理之可靠度(再現性)故宜盡量以高精度測定之。Next, as shown in FIG. 9, the main control unit 70 measures all of the photoresist dried films [RM 1 ], [RM 2 ], and [ [ ] on the precoat roller 14 by the rotation mechanism 65 and the film thickness measuring unit 67. Film thickness distribution characteristics of RM 3 ] and [RM 4 ]. If the film thickness measurement before cleaning (V) is used to determine the amount of cleaning liquid used, the accuracy is not too high, but the film thickness distribution characteristics are directly related to the reliability (reproducibility) of the precoating process. Try to measure it with high precision.

亦即，於此第2實施例中，形成在預塗滾子14外周面上的第1層光阻乾燥膜[RM1 ]、[RM2 ]、[RM3 ]、[RM4 ]係用於承接在後續預塗處理中自狹縫噴嘴72噴吐之光阻液R之基底。此基底膜之膜厚均一性(平坦度)不僅影響捲取於其上的光阻液膜之均一性(平坦度)，亦影響殘留於狹縫噴嘴72噴吐口側之光阻液膜RF的均一性，甚至影響光阻塗佈處理中塗佈在基板上的光阻膜之膜厚均一性。That is, in the second embodiment, the first layer of the photoresist dried film [RM 1 ], [RM 2 ], [RM 3 ], and [RM 4 ] formed on the outer peripheral surface of the precoat roller 14 is used. The substrate of the photoresist R that is ejected from the slit nozzle 72 in the subsequent precoating process is received. The film thickness uniformity (flatness) of the base film not only affects the uniformity (flatness) of the photoresist film taken up thereon, but also affects the photoresist film RF remaining on the ejection opening side of the slit nozzle 72. Uniformity even affects the film thickness uniformity of the photoresist film coated on the substrate in the photoresist coating process.

關於此點，自然乾燥(IV)程序不因強制乾燥而在預塗滾子14上對光阻液膜RMi施加應力，故通常可獲得膜厚均一性(平坦度)優異之光阻乾燥膜[RMi]。然而，若有來自周圍所不希望的壓力或是振動等擾動，或於狹縫噴嘴72之噴吐功能發生異常，即亦有可能導致光阻乾燥膜[RMi]之膜厚均一性(平坦度)不佳。於此實施形態中，為確保預塗處理之精度及再現性萬無一失，如上述使旋轉機構65及膜厚測定部67作動，就所有光阻乾燥膜[RM1 ]、[RM2 ]、[RM3 ]、[RM4 ]檢查其膜厚均一性。In this regard, the natural drying (IV) procedure does not apply stress to the photoresist film RMi on the precoat roller 14 by forced drying, so that a photoresist dried film excellent in film thickness uniformity (flatness) is generally obtained [ RMi]. However, if there is an undesired pressure or vibration disturbance from the surroundings, or an abnormality in the ejection function of the slit nozzle 72, the film thickness uniformity (flatness) of the photoresist dried film [RMi] may be caused. Not good. In this embodiment, in order to ensure the accuracy and reproducibility of the precoating process, the shutter mechanism 65 and the film thickness measuring unit 67 are actuated as described above, and all the photoresist dried films [RM 1 ], [RM 2 ], [RM 3 ], [RM 4 ] check the film thickness uniformity.

更詳細而言，膜厚均一性超過既定基準時，主控制部70根據膜厚分布特性之測定結果，判定該光阻乾燥膜[RMi ]係可使用於後續其他預塗處理之良品。然而，膜厚均一性未超過該基準時，判定該光阻乾燥膜[RMi ]係不可使用於後續預塗處理之不良品。以下說明中，所有第1層光阻乾燥膜[RM1 ]、[RM2 ]、[RM3 ]、[RM4 ]皆受到可使用(良品)之認可。More specifically, when the film thickness uniformity exceeds a predetermined standard, the main control unit 70 determines that the photoresist dried film [RM i ] can be used for subsequent good pre-coating treatment based on the measurement result of the film thickness distribution characteristics. However, when the film thickness uniformity did not exceed the standard, it was judged that the photoresist dried film [RM i ] could not be used for the defective product of the subsequent precoating treatment. In the following description, all of the first-layer photoresist dried films [RM 1 ], [RM 2 ], [RM 3 ], and [RM 4 ] are approved for use (good).

圖10中顯示第2實施例內，在已形成於預塗滾子14外周面上的第1光阻乾燥膜[RM1 ]上進行後續，例如第5次預塗處理時之各階段。Fig. 10 shows the stages in the second embodiment in which the first photoresist drying film [RM 1 ] which has been formed on the outer peripheral surface of the precoat roller 14 is subsequently subjected to, for example, the fifth precoating treatment.

於此第5次預塗處理中，首先使第1層之第1光阻乾燥膜[RM1 ]位於預塗滾子14頂部，藉由噴嘴移動機構74使狹縫噴嘴72定位，俾狹縫噴嘴72之噴吐口隔著既定間隙(例如數十~數百μm)與預塗滾子14頂部平行對向。In the fifth precoating process, first, the first photoresist dried film [RM 1 ] of the first layer is placed on the top of the precoat roller 14, and the slit nozzle 72 is positioned by the nozzle moving mechanism 74. The ejection opening of the nozzle 72 is parallel to the top of the precoat roller 14 with a predetermined gap (for example, several tens to several hundreds of μm).

其次如圖10之I(噴吐)所示，令預塗滾子14靜止，直接藉由光阻供給部76令狹縫噴嘴72噴吐一定量光阻液R。Next, as shown in FIG. 10 (Ig), the precoat roller 14 is made to stand still, and the slit nozzle 72 is directly ejected by the photoresist supply portion 76 by a certain amount of the photoresist liquid R.

此光阻液噴吐之動作於一定時間(圖3之t0 ~t1 )內進行。由狹縫噴嘴72噴吐口噴吐之光阻液R之液體抵達預塗滾子14頂部，亦即第1層之第1光阻乾燥膜[RM1 ]上，再沿周向於周圍擴散。This action of the photoresist is performed in a certain period of time (t 0 to t 1 in Fig. 3). The liquid of the photoresist R that is ejected from the spout nozzle 72 reaches the top of the precoat roller 14, that is, the first photoresist dried film [RM 1 ] of the first layer, and then diffuses around the circumference.

接著，藉由旋轉機構65於既定時間點使預塗滾子14開始旋轉，如圖10之II(捲取)所示，光阻液R迴繞至狹縫噴嘴72背面下端部72a，在第1光阻乾燥膜[RM1 ]上捲取光阻液R。Next, the pre-coating roller 14 is rotated by the rotating mechanism 65 at a predetermined time point, and as shown in FIG. 10 (capping), the photoresist liquid R is wound back to the rear lower end portion 72a of the slit nozzle 72, at the first The photoresist R is wound up on the photoresist dried film [RM 1 ].

在此，由狹縫噴嘴72噴吐之光阻液R易於附著於係同一材質之第1光阻乾燥膜[RM1 ]，故捲取時間(圖3之t1 ~t2 )相當程度較在預塗滾子14外周面上捲取時短。藉此，因切離(III)程序殘留於第1光阻乾燥膜[RM1 ]側的光阻液膜rm1 相較於在預塗滾子14外周面上進行切離(III)時膜厚大且長度短(沿周向捲取尺寸)。又，殘留於狹縫噴嘴72側之光阻液膜RF與在預塗滾子14外周面上進行截取(III)時大致相同。Here, the photoresist R that is ejected by the slit nozzle 72 is liable to adhere to the first photoresist dried film [RM 1 ] of the same material, so the winding time (t 1 to t 2 in FIG. 3 ) is considerably higher. The pre-coated roller 14 is short when it is taken up on the outer peripheral surface. Thereby, the photoresist film rm 1 remaining on the side of the first photoresist dried film [RM 1 ] due to the excision (III) procedure is cut away from the outer peripheral surface of the precoat roller 14 (III). Thick and short (winding in the circumferential direction). Further, the photoresist film RF remaining on the slit nozzle 72 side is substantially the same as when the outer peripheral surface of the precoat roller 14 is cut (III).

作為一例，第1層光阻乾燥膜[RM1 ]之沿周向捲取尺寸為40mm時，於本次(第5次)預塗處理捲取在第1層光阻乾燥膜[RM1 ]上的第2層光阻液R之液體膜rm1 沿周向捲取尺寸可在10mm以下。又，於預塗處理捲取在預塗滾子14側的光阻液膜之膜厚通常在數μm以下，故即使多層重疊捲取，實質上亦不會對狹縫噴嘴72與預塗滾子14之間之間隙間隔(數十~數百μm)造成影響。As an example, when the first layer of the photoresist dried film [RM 1 ] has a circumferential winding size of 40 mm, the current (5th) precoating process is performed on the first layer of the photoresist dried film [RM 1 ]. The liquid film rm 1 of the second layer of the photoresist R on the upper side can be wound up to 10 mm or less in the circumferential direction. Further, the thickness of the photoresist film wound on the side of the precoat roller 14 in the precoating process is usually several micrometers or less. Therefore, even if the multilayer is wound up, the slit nozzle 72 and the precoat roller are not substantially applied. The gap interval between the sub-14s (tens to hundreds of μm) has an effect.

切離(III)程序後，與第1層時的預塗處理之情形相同，預塗滾子14持續保持旋轉並轉變為自然乾燥(IV)程序，經過既定時間後預塗滾子14停止旋轉。其結果，於預塗滾子14第1層第1光阻乾燥膜[RM1 ]上，作為附隨於第5次預塗處理之殘餘物，以既定沿周向尺寸(例如約18°)形成第2層第1光阻乾燥膜[rm1 ]。After the cutting off (III) procedure, as in the case of the precoating treatment at the first layer, the precoat roller 14 continues to rotate and is converted into a natural drying (IV) program, and the precoated roller 14 stops rotating after a predetermined time. . As a result, on the first layer of the first photoresist dried film [RM 1 ] of the precoat roller 14, as a residue accompanying the fifth precoating treatment, with a predetermined circumferential dimension (for example, about 18°) A second layer first photoresist dried film [rm 1 ] was formed.

後續之第6次及第7次預塗處理亦藉由與上述第5次預塗處理完全相同之程序，分別在第1層第2光阻乾燥膜[RM2 ]及第3光阻乾燥膜[RM3 ]上進行。The subsequent sixth and seventh precoating treatments were also carried out in the first layer of the second photoresist dried film [RM 2 ] and the third photoresist dried film by the same procedure as the above fifth precoating treatment. Performed on [RM 3 ].

藉此，於預塗滾子14第1層第2光阻乾燥膜[RM2 ]上，作為附隨於第6次預塗處理之殘餘物，以與上述大致相同之沿周向尺寸(約18°)形成第2層第2光阻乾燥膜[rm2 ]。且在第1層第3光阻乾燥膜[RM3 ]上，作為附隨於第7次預塗處理之殘餘物，以與上述大致相同之沿周向尺寸(約18°)形成第2層第3光阻乾燥膜[rm3 ]。Thereby, on the first layer of the second photoresist dried film [RM 2 ] of the precoat roller 14 as a residue attached to the sixth precoating treatment, approximately the same circumferential dimension as described above (about 18°) A second layer second photoresist dried film [rm 2 ] was formed. And on the first layer of the third photoresist dried film [RM 3 ], as the residue attached to the seventh precoating treatment, the second layer is formed in the circumferential direction (about 18°) substantially the same as described above. The third photoresist dried film [rm 3 ].

於此第2實施例中，如圖11所示，在以第8次預塗處理於第1層第4光阻乾燥膜[RM4 ]上捲取第2層光阻液膜rm4 後，預塗滾子14馬上進行一併清洗(外周面全周潔淨化)。In the second embodiment, as shown in FIG. 11, after the second layer photoresist film rm 4 is wound up on the first layer fourth photoresist dried film [RM 4 ] by the eighth precoating treatment, The pre-coating roller 14 is immediately cleaned together (the outer peripheral surface is cleaned all the way).

亦即，如圖11所示，於第8次預塗處理中，光阻液R之噴吐(I)、捲取(II)及切離(III)各程序亦與第5次~第7次預塗處理時相同，在第1層第4光阻乾燥膜[RM4 ]上捲取光阻液膜rm4 。That is, as shown in FIG. 11, in the eighth precoating process, the processes of the ejection (I), the winding (II), and the cutting (III) of the photoresist R are also the fifth to seventh times. In the precoating process, the photoresist film rm 4 was wound up on the first layer of the fourth photoresist dried film [RM 4 ].

然而，在切離(III)後，卻跳過自然乾燥(IV)程序，預塗滾子14持續維持旋轉，轉變為清洗(V)程序。於此清洗(V)程序，令清洗機構16及排氣機構45作動。However, after the cut-off (III), the natural drying (IV) procedure is skipped, and the pre-coating roller 14 continues to maintain rotation, which is converted into a cleaning (V) program. In this cleaning (V) program, the cleaning mechanism 16 and the exhaust mechanism 45 are actuated.

此時，於清洗(V)程序開始前，主控制部70亦藉由旋轉機構65及膜厚測定部67，測定預塗滾子14上所附著之第1層光阻乾燥膜[RM1 ]、[RM2 ]、[RM3 ]、[RM4 ]、第2層光阻乾燥膜[rm1 ]、[rm2 ]、[rm3 ]及光阻液膜rm4 之範圍(面積)及膜厚，根據此測定結果，藉由運算決定清洗(V)程序中清洗液之使用量。例如，可以預塗滾子14上所附著之所有光阻膜(液體膜或乾燥膜)之總光阻量(範圍×膜厚)為基準值，決定例如清洗液使用量為等於該基準值(總光阻量)之數值。At this time, before the start of the cleaning (V) program, the main control unit 70 also measures the first layer of the photoresist drying film [RM 1 ] attached to the precoat roller 14 by the rotating mechanism 65 and the film thickness measuring unit 67. , [RM 2 ], [RM 3 ], [RM 4 ], the second layer of photoresist dried film [rm 1 ], [rm 2 ], [rm 3 ] and the range (area) of the photoresist film rm 4 and The film thickness is determined by the calculation, and the amount of the cleaning liquid used in the cleaning (V) program is determined by calculation. For example, the total photoresist amount (range × film thickness) of all the photoresist films (liquid film or dried film) attached to the roller 14 may be pre-coated as a reference value, and it is determined, for example, that the amount of the cleaning liquid used is equal to the reference value ( The total amount of photoresist).

此第2實施例之一併清洗處理中清洗(V)及強制乾燥(VI)之程序基本上可分別係與上述第1實施例之一併清洗處理中清洗(V)及強制乾燥(VI)之程序同一內容之製程。The procedure of cleaning (V) and forced drying (VI) in one of the second embodiments and the cleaning process can be basically performed in one of the above-described first embodiments and in the cleaning process (V) and forced drying (VI). The process of the same content of the program.

依此第2實施例，不僅包含上述第1實施例中之作用效果全部，在第1層光阻乾燥膜[RM1 ]、[RM2 ]、[RM3 ]、[RM4 ]上亦重複實施後續之預塗處理，集中進行預塗滾子14之一併清洗處理，故亦可使清洗液使用量之削減效果倍增。According to the second embodiment, not only the effects of the first embodiment described above but also the first layer of the photoresist dried film [RM 1 ], [RM 2 ], [RM 3 ], and [RM 4 ] are repeated. By performing the subsequent precoating treatment and concentrating one of the precoat rollers 14 and cleaning the mixture, the effect of reducing the amount of the cleaning liquid can be doubled.

圖12中以立體圖顯示依上述第2實施例預塗處理方法之大致程序。Fig. 12 is a perspective view showing a rough procedure of the precoating treatment method according to the second embodiment.

[變形例及其他實施例][Modifications and Other Embodiments]

上述第2實施例中，不僅可任意選擇在預塗滾子14外周面上橫跨一周經捲取之第1層複數光阻乾燥膜[RMi ]之個數及捲取順序，亦可例如圖13所示，任意選擇在第1層光阻乾燥膜[RMi ]上經捲取之第2層光阻液膜rmi 之個數及捲取順序。In the second embodiment, the number of the first plurality of photoresist dried films [RM i ] wound up and wound up on the outer circumferential surface of the precoated roller 14 and the winding order may be arbitrarily selected, for example, As shown in Fig. 13, the number of the second layer photoresist film rm i wound up on the first layer photoresist dried film [RM i ] and the winding order are arbitrarily selected.

且於第2實施例，亦可在第1層光阻乾燥膜[RMi ]上進行第2層分之預塗處理，再於與該第1層光阻乾燥膜[RMi ]不同之區域，在預塗滾子14外周面上進行另一第1層分之預塗處理。Further, in the second embodiment, the second layer of the precoating treatment may be performed on the first layer of the photoresist dried film [RM i ], and further in a region different from the first layer of the photoresist dried film [RM i ]. Another pre-coating treatment of the first layer is performed on the outer peripheral surface of the pre-coating roller 14.

且於第2實施例中，如上述，在1次分之預塗處理內，相較於預塗滾子14外周面上所形成之第1層光阻液膜RM之沿周向捲取尺寸，第1層光阻乾燥膜上所形成之第2層光阻液膜rm之沿周向捲取尺寸相當(數分之一以下)短。因此，例如圖14所示，首先在預塗滾子14外周面上，為形成基底膜，宜大致橫跨全周形成第1層光阻液膜RM，藉由與上述相同之自然乾燥使其為光阻乾燥膜[RM]。於此第1層光阻乾燥膜[RM]，亦即基底膜上，可沿周向較短地分割分割區域，以實施相當多(例如10次以上)的預塗處理。Further, in the second embodiment, as described above, in the one-time precoating process, the circumferentially retracting dimension of the first layer of the photoresist film RM formed on the outer peripheral surface of the precoated roller 14 is obtained. The second layer photoresist film rm formed on the first layer of the photoresist dried film has a short circumferential winding size (a fraction or less). Therefore, for example, as shown in Fig. 14, first, on the outer peripheral surface of the precoat roller 14, in order to form the base film, it is preferable to form the first layer of the photoresist liquid film RM substantially across the entire circumference, and to make it the same natural drying as described above. Dry film for photoresist [RM]. On the first layer of the photoresist dried film [RM], that is, on the base film, the divided regions can be divided in the circumferential direction to perform a considerable number of (for example, 10 or more) precoating treatments.

又，於用以在預塗滾子14外周面上形成基底膜(第1層光阻膜)之處理中，可令預塗滾子14朝與通常相反的方向旋轉，且亦可不使用光阻塗佈用狹縫噴嘴72而代之以專屬之其他狹縫噴嘴於例如預塗處理裝置。Further, in the process for forming the base film (the first layer photoresist film) on the outer circumferential surface of the precoat roller 14, the precoat roller 14 can be rotated in the opposite direction to the normal direction, and the photoresist can be omitted. The coating slit nozzle 72 is replaced by a dedicated slit nozzle, for example, in a precoat processing apparatus.

且於預塗滾子14，在如上述形成之第2層光阻乾燥膜[rm]上亦可實施後續之預塗處理，捲取第3層光阻液膜。且亦可重疊4層以上以實施多數次預塗處理。Further, in the precoat roller 14, a subsequent precoating treatment may be performed on the second layer photoresist dried film [rm] formed as described above, and the third layer photoresist film may be wound up. It is also possible to superpose four or more layers to carry out a plurality of precoating treatments.

於一併清洗處理中，清洗液之使用量雖會增加，但亦可於預塗滾子14外周面全周噴送清洗液。In the collective cleaning process, although the amount of the cleaning liquid used is increased, the cleaning liquid may be sprayed over the entire circumference of the outer surface of the pre-coating roller 14.

預塗處理裝置內各部構成或功能亦不由上述實施形態限定。例如於清洗機構16亦可使用或併用2流體噴射噴嘴以外之清洗工具，例如刮刀，排氣機構45各部，特別是強制乾燥部38之構成可進行各種變形。The configuration or function of each part in the precoating apparatus is not limited by the above embodiment. For example, the cleaning mechanism 16 may use or use a cleaning tool other than the two fluid ejection nozzles, for example, a doctor blade, and various portions of the exhaust mechanism 45, particularly the forced drying portion 38, may be variously modified.

上述實施形態之預塗處理裝置中，亦可利用對作為預塗處理之結果，殘留在預塗滾子上的光阻液膜(或乾燥膜)之膜厚分布特性進行測定之構成及功能(圖9)，檢查狹縫噴嘴72側之光阻噴吐功能(特別是沿狹縫長邊方向噴吐流之均一性)，以提升光阻塗佈處理之產出或是可靠度。In the precoating apparatus of the above-described embodiment, the composition and function of measuring the film thickness distribution characteristics of the photoresist film (or dried film) remaining on the precoat roller as a result of the precoating treatment can be used. Fig. 9), the photoresist discharge function on the side of the slit nozzle 72 (especially the uniformity of the jet flow along the longitudinal direction of the slit) is checked to improve the yield or reliability of the photoresist coating process.

作為本發明中之塗佈液，除光阻液以外，可係例如層間絕緣材料、介電材料、配線材料等塗佈液，亦可係各種化學液、顯影液或潤洗液等。本發明中被處理基板不限於LCD基板，亦可係其他平面顯示器用基板、半導體晶圓、CD基板、光罩、印刷基板等。The coating liquid in the present invention may be, for example, a coating liquid such as an interlayer insulating material, a dielectric material or a wiring material, or may be a chemical liquid, a developing solution or a rinse liquid, in addition to the photoresist. The substrate to be processed in the present invention is not limited to an LCD substrate, and may be another substrate for a flat panel display, a semiconductor wafer, a CD substrate, a photomask, a printed substrate, or the like.

ma、mb．．．霧氣Ma, mb. . . Fog

R．．．光阻液R. . . Photoresist

RF、RM、RM1 、RM2 、RM4 、rm1 、rm4 ．．．光阻液膜(光阻液之液體膜)RF, RM, RM 1 , RM 2 , RM 4 , rm 1 , rm 4 . . . Photoresist film (liquid film of photoresist)

[RM]、[RM1 ]、[RM2 ]、[RM3 ]、[RM4 ]、[rm1 ]、[rm2 ]、[rm3 ]．．．光阻乾燥膜[RM], [RM 1 ], [RM 2 ], [RM 3 ], [RM 4 ], [rm 1 ], [rm 2 ], [rm 3 ]. . . Photoresist dry film

t1 、t2 、t3 、t5 ．．．時點t 1 , t 2 , t 3 , t 5 . . . Time

V’．．．假想線(短劃線)V’. . . Imaginary line (dash)

Va ．．．旋轉速度V a . . . spinning speed

Vb ．．．速度V b . . . speed

V．．．實線V. . . solid line

10．．．殼體10. . . case

12．．．開口部12. . . Opening

14．．．預塗滾子14. . . Pre-coated roller

16．．．清洗機構16. . . Cleaning mechanism

18．．．2流體噴射噴嘴18. . . 2 fluid injection nozzle

20、22．．．配管20, 22. . . Piping

24．．．清洗液供給部twenty four. . . Cleaning liquid supply unit

25．．．清洗控制部25. . . Cleaning control department

26．．．氣體供給部26. . . Gas supply department

28、30、80．．．開閉閥28, 30, 80. . . Open and close valve

32．．．霧氣遮蔽部32. . . Fog shelter

34．．．霧氣導入部34. . . Fog introduction

36．．．抽吸口(吸氣口)(真空口)36. . . Suction port (suction port) (vacuum port)

38．．．強制乾燥部38. . . Forced drying department

40．．．霧氣導入用間隙40. . . Fog introduction gap

42．．．液體甩除用間隙42. . . Liquid removal gap

44．．．真空通路44. . . Vacuum path

45．．．排氣機構45. . . Exhaust mechanism

46．．．真空導管46. . . Vacuum conduit

48．．．真空裝置48. . . Vacuum device

50．．．排氣閥控制部50. . . Exhaust valve control unit

52．．．排氣阻尼器52. . . Exhaust damper

54．．．排放口54. . . exhaustion hole

56．．．排液管56. . . Drain tube

58．．．排放槽58. . . Drainage tank

60．．．馬達60. . . motor

62．．．旋轉控制部62. . . Rotation control unit

64．．．編碼器64. . . Encoder

65．．．旋轉機構65. . . Rotating mechanism

66．．．膜厚感測器66. . . Film thickness sensor

67．．．膜厚測定部67. . . Film thickness measurement unit

68．．．膜厚運算部68. . . Film thickness calculation unit

70．．．主控制部70. . . Main control department

72．．．狹縫噴嘴72. . . Slit nozzle

72a．．．狹縫噴嘴72之背面下端部72a. . . The lower end of the back surface of the slit nozzle 72

74．．．噴嘴移動機構74. . . Nozzle moving mechanism

76．．．光阻供給部76. . . Photoresist supply unit

78．．．光阻供給管78. . . Photoresist supply tube

圖1係顯示本發明一實施形態中預塗處理裝置之構成圖。Fig. 1 is a view showing the configuration of a precoating treatment apparatus according to an embodiment of the present invention.

圖2係示意顯示實施例中進行第1次預塗處理時各階段圖。Fig. 2 is a view schematically showing stages at the time of performing the first precoating treatment in the examples.

圖3係圖2之預塗處理動作中以時間軸上的波形顯示預塗滾子旋轉速度圖。Fig. 3 is a graph showing the rotational speed of the precoated roller by the waveform on the time axis in the precoating operation of Fig. 2.

圖4係示意顯示進行第2次預塗處理時各階段圖。Fig. 4 is a view schematically showing each stage of the second precoating process.

圖5係示意顯示於預塗滾子一周內進行最後(第4次)之預塗處理及緊接於其後之一併清洗處理時各階段圖。Fig. 5 is a view schematically showing the stages of the final (fourth) precoating process and one of the subsequent precoating rolls in one week and the cleaning process.

圖6係圖2之預塗處理動作及一併清洗處理中以時間軸上的波形顯示預塗滾子旋轉速度圖。Fig. 6 is a graph showing the rotational speed of the precoat roller by the waveform on the time axis in the precoating operation and the collective cleaning process of Fig. 2.

圖7係用以說明清洗程序中預塗處理裝置之作用圖。Figure 7 is a diagram for explaining the action of the precoat processing apparatus in the cleaning process.

圖8係顯示第1實施例中預塗處理方法大致程序之立體圖。Fig. 8 is a perspective view showing a rough procedure of the precoating treatment method in the first embodiment.

圖9係顯示用以測定第1層光阻乾燥膜膜厚分布特性之重要部位構成及作用圖。Fig. 9 is a view showing the configuration and operation of an important portion for measuring the film thickness distribution characteristics of the first-layer photoresist drying film.

圖10係示意顯示在第1層光阻乾燥膜上進行第1次預塗處理時各階段圖。Fig. 10 is a view schematically showing stages at the time of performing the first precoating treatment on the first layer photoresist dried film.

圖11係示意顯示在第1層光阻乾燥膜上進行最後的預塗處理及緊接於其後的一併清洗處理時各階段圖。Fig. 11 is a view schematically showing the stages of the final precoating treatment on the first layer of the photoresist dried film and the subsequent cleaning treatment immediately thereafter.

圖12係顯示第1實施例中預塗處理方法大致程序之立體圖。Fig. 12 is a perspective view showing a rough procedure of a precoating treatment method in the first embodiment.

圖13係示意顯示一變形例中進行預塗處理時各階段圖。Fig. 13 is a view schematically showing the stages of the precoating process in a modification.

圖14係顯示於另一變形例在預塗滾子上形成基底膜(第1層光阻膜)，於其上實施預塗處理之方法圖。Fig. 14 is a view showing a method of forming a base film (first layer photoresist film) on a precoat roller in another modification, and performing a precoating treatment thereon.

RF、RM1 ．．．光阻液膜(光阻液之液體膜)RF, RM 1 . . . Photoresist film (liquid film of photoresist)

R．．．光阻液R. . . Photoresist

14．．．預塗滾子14. . . Pre-coated roller

72．．．狹縫噴嘴72. . . Slit nozzle

72a．．．狹縫噴嘴72之背面下端部72a. . . The lower end of the back surface of the slit nozzle 72

Claims (13)

一種預塗處理方法，用來在非旋轉塗佈法塗佈處理所採用之狹縫噴嘴的噴吐口附近，形成塗佈液液體膜，以作為塗佈處理之事前準備，其特徵在於包含：第1程序，為進行1次分之預塗處理，令該狹縫噴嘴的噴吐口隔著既定間隙平行對向於水平配置之圓筒狀或圓柱狀預塗滾子的頂部，使該狹縫噴嘴噴吐一定量塗佈液再使該預塗滾子旋轉，在該預塗滾子外周面上捲取一部分該經噴吐出之塗佈液；第2程序，令在該第1程序開始之該預塗滾子之旋轉不停地持續進行，使該預塗滾子外周面上所捲取之塗佈液液體膜自然乾燥以作為第1乾燥膜；第3程序，為進行另1次分之預塗處理，錯開該第1乾燥膜，使該狹縫噴嘴的噴吐口隔著既定間隙平行對向於該預塗滾子頂部，令該狹縫噴嘴噴吐一定量塗佈液再使該預塗滾子旋轉，在該預塗滾子外周面上與該第1乾燥膜不同之區域捲取一部分該經噴吐之塗佈液；及第4程序，藉由清洗之方式一併去除附著於該預塗滾子外周面上的液體膜或乾燥膜。 A precoating treatment method for forming a coating liquid film in the vicinity of a discharge port of a slit nozzle used in a non-spin coating method for preparing a coating process, which is characterized in that: In the first step, the pre-coating process is performed once, so that the ejection nozzle of the slit nozzle is parallel to the top of the cylindrical or cylindrical pre-coated roller horizontally disposed with a predetermined gap therebetween, so that the slit nozzle Spraying a predetermined amount of the coating liquid to rotate the pre-coating roller, and winding a part of the sprayed coating liquid on the outer peripheral surface of the pre-coated roller; the second program, the pre-starting of the first program The rotation of the coating roller is continuously continued, and the liquid film of the coating liquid taken up on the outer peripheral surface of the pre-coated roller is naturally dried to be the first dry film; the third procedure is to perform another sub-predetermination. By coating, the first dry film is staggered, and the ejection opening of the slit nozzle is parallel to the top of the precoat roller via a predetermined gap, and the slit nozzle is sprayed with a certain amount of the coating liquid to make the precoat roll Sub-rotation, a region different from the first dry film on the outer circumferential surface of the pre-coated roller Winding a portion of the coating liquid through the ejection; fourth program, by way of cleaning adhered to the precoat is removed together with the liquid film or a roller outer peripheral surface of the dried film. 如申請專利範圍第1項之預塗處理方法，其中，於該第4程序，令該預塗滾子旋轉，並同時僅對該預塗滾子外周面中附著有液體膜或乾燥膜之區域噴送清洗液。 The method of pre-coating treatment according to claim 1, wherein in the fourth step, the pre-coating roller is rotated, and at the same time, only the area of the outer peripheral surface of the pre-coated roller is attached with a liquid film or a dried film. Spray the cleaning solution. 一種預塗處理方法，用來在非旋轉塗佈法塗佈處理所採用之狹縫噴嘴的噴吐口附近，形成塗佈液液體膜，以作為塗佈處理之事前準備，其特徵在於包含：第1程序，令該塗佈處理用狹縫噴嘴或是非塗佈處理用之另一狹縫噴嘴隔著既定間隙平行對向於水平配置之圓筒狀或圓柱狀預塗滾子頂部，使該狹縫噴嘴噴吐塗佈液並使該預塗滾子旋轉，在該預塗滾子外周面上捲取一部分或全部該經噴吐之塗佈液； 第2程序，令在該第1程序開始之該預塗滾子之旋轉不停地持續進行，使該預塗滾子外周面上所捲取之塗佈液液體膜自然乾燥以作為第1層乾燥膜；第3程序，為進行1次分之預塗處理，使該第1層乾燥膜位於該預塗滾子頂部，令該塗佈處理用狹縫噴嘴的噴吐口隔著既定間隙平行對向於該預塗滾子頂部，使該狹縫噴嘴噴吐一定量塗佈液再使該預塗滾子旋轉，在該第1層乾燥膜上捲取一部分該經噴吐之塗佈液；及第4程序，藉由清洗之方式一併去除該預塗滾子外周面上所附著之液體膜或乾燥膜。 A precoating treatment method for forming a coating liquid film in the vicinity of a discharge port of a slit nozzle used in a non-spin coating method for preparing a coating process, which is characterized in that: In the first step, the slit nozzle for coating treatment or the other slit nozzle for non-coating treatment is placed in parallel with the predetermined gap to face the horizontally disposed cylindrical or cylindrical precoated roller top, so that the slit a slit nozzle sprays the coating liquid and rotates the precoat roller, and winds a part or all of the sprayed coating liquid on the outer peripheral surface of the precoat roller; In the second program, the rotation of the precoat roller starting from the first program is continuously continued, and the coating liquid film wound on the outer peripheral surface of the precoat roller is naturally dried to be the first layer. a drying film; the third step is to perform a pre-coating treatment for one time, and the first layer of the dried film is placed on the top of the pre-coating roller so that the ejection opening of the slit nozzle for coating treatment is parallel to the predetermined gap Advancing the top of the pre-coating roller, causing the slit nozzle to eject a certain amount of the coating liquid, and rotating the pre-coating roller, and winding a part of the sprayed coating liquid on the first layer of the dried film; 4 Procedure, by removing the liquid film or the dried film attached to the outer peripheral surface of the precoated roller by washing. 如申請專利範圍第3項之預塗處理方法，其中，於該第4程序，令該預塗滾子旋轉，並同時僅對該預塗滾子外周面中附著有液體膜或乾燥膜之區域噴送清洗液。 The method of pre-coating treatment according to claim 3, wherein in the fourth step, the pre-coating roller is rotated, and at the same time, only the area of the outer surface of the pre-coating roller to which the liquid film or the dried film is adhered Spray the cleaning solution. 如申請專利範圍第3項之預塗處理方法，其中，設有用以使該預塗滾子周圍強制排氣之排氣機構，令該排氣機構於該第1、第2及第3程序停止，而於該第4程序使其作動。 The method of pre-coating treatment according to claim 3, wherein an exhaust mechanism for forcibly exhausting the pre-coated roller is provided, and the exhaust mechanism is stopped at the first, second, and third programs. And in the fourth program to make it act. 一種預塗處理方法，用來在非旋轉塗佈法塗佈處理所採用之狹縫噴嘴的噴吐口附近，形成塗佈液液體膜，以作為塗佈處理之事前準備，其特徵在於包含：第1程序，為進行1次分之預塗處理，令該狹縫噴嘴的噴吐口隔著既定間隙與水平配置之圓筒狀或圓柱狀預塗滾子頂部平行對向，使該狹縫噴嘴噴吐一定量塗佈液再使該預塗滾子旋轉，在該預塗滾子外周面上捲取一部分該經噴吐之塗佈液；第2程序，使在該第1程序中於該預塗滾子外周面上所捲取之塗佈液液體膜乾燥以作為第1層第1乾燥膜；第3程序，為進行另1次分之預塗處理，錯閉該第1層第1乾燥膜，令該狹縫噴嘴的噴吐口隔著既定間隙平行對向於該預塗滾子頂部，使該狹縫噴嘴噴吐一定量塗佈液再使該預塗滾子旋轉，在該預塗滾子外周面上與該第1乾燥膜不同之區域捲取一部分該經噴吐之塗佈液； 第4程序，使在該第3程序中於該預塗滾子外周面上所捲取之塗佈液液體膜乾燥，以作為第1層第2乾燥膜；第5程序，為進行又1次分之預塗處理，使該第1層第1或第2乾燥膜位於該預塗滾子頂部，令該狹縫噴嘴的噴吐口隔著既定間隙平行對向於該預塗滾子頂部，使該狹縫噴嘴噴吐一定量塗佈液再使該預塗滾子旋轉，在該第1層第1或第2乾燥膜上捲取一部分該經噴吐之塗佈液；及第6程序，藉由清洗之方式一併去除附著於該預塗滾子外周面上之液體膜或乾燥膜。 A precoating treatment method for forming a coating liquid film in the vicinity of a discharge port of a slit nozzle used in a non-spin coating method for preparing a coating process, which is characterized in that: In the first step, the pre-coating treatment is performed once, so that the ejection opening of the slit nozzle is parallel to the top of the cylindrical or cylindrical pre-coated roller horizontally disposed with a predetermined gap therebetween, so that the slit nozzle is spouted. a predetermined amount of the coating liquid is further rotated by the precoating roller, and a part of the sprayed coating liquid is taken up on the outer peripheral surface of the precoated roller; and a second program is performed in the first program. The liquid film of the coating liquid taken up on the outer peripheral surface of the sub-surface is dried to be the first dry film of the first layer, and the third step is to perform the pre-coating treatment of the other layer to block the first dry film of the first layer. The ejection nozzle of the slit nozzle is parallel to the top of the precoat roller via a predetermined gap, and the slit nozzle ejects a certain amount of the coating liquid to rotate the precoat roller, and the precoat roller is rotated around the precoat roller. Forming a portion of the sprayed coating liquid on a surface different from the first dry film; In the fourth program, the coating liquid film wound on the outer peripheral surface of the precoated roller in the third program is dried to be the first layer of the second dry film, and the fifth program is performed once again. And pre-coating treatment, wherein the first layer or the first drying film of the first layer is located at the top of the pre-coating roller, so that the ejection opening of the slit nozzle is parallel to the top of the pre-coated roller through a predetermined gap, so that Dissipating a predetermined amount of the coating liquid by the slit nozzle, and rotating the precoat roller, and winding a part of the sprayed coating liquid on the first layer or the first dry film of the first layer; and the sixth program The cleaning method removes the liquid film or the dried film attached to the outer peripheral surface of the precoated roller. 如申請專利範圍第6項之預塗處理方法，其中，於該第6程序中，令該預塗滾子旋轉，並同時僅對該預塗滾子外周面中附著有液體膜或乾燥膜之區域噴送清洗液。 The method of pre-coating treatment according to claim 6, wherein in the sixth program, the pre-coating roller is rotated, and at the same time, only the liquid film or the dried film is adhered to the outer peripheral surface of the pre-coated roller. The area is sprayed with cleaning fluid. 如申請專利範圍第6項之預塗處理方法，其中設有用以使該預塗滾子周圍強制排氣之排氣機構，該排氣機構於該第1至第5程序停止，而於該第6程序令其作動。 The precoating method of claim 6, wherein an exhaust mechanism for forcibly exhausting the pre-coated roller is provided, and the exhausting mechanism is stopped at the first to fifth programs, and the 6 procedures to make it work. 一種預塗處理裝置，用來在非旋轉塗佈法塗佈處理所採用之狹縫噴嘴的噴吐口附近，形成塗布液液體膜，以作為塗佈處理之事前準備，其特徵在於包含：圓筒狀或圓柱狀預塗滾子，水平配置於既定位置；旋轉機構，使該預塗滾子繞著其中心軸旋轉；清洗機構，為清洗該預塗滾子外周面而噴送清洗液；排氣機構，用以使該預塗滾子周圍強制排氣；及控制部，用以控制該旋轉機構、該清洗機構及該排氣機構之各動作；且為進行1次分之預塗處理，令該狹縫噴嘴的噴吐口隔著既定間隙平行對向於該預塗滾子頂部，使該狹縫噴嘴噴吐一定量塗佈液再藉由該旋轉機構使該預塗滾子旋轉，在該預塗滾子外周面上捲取一部分該經噴吐之塗佈液， 藉由該旋轉機構捲取該塗佈液後仍持續使該預塗滾子不停地旋轉，使在該預塗滾子外周面上所捲取之塗佈液液體膜自然乾燥，以作為第1乾燥膜，為進行另1次分之預塗處理，錯開該第1乾燥膜，令該狹縫噴嘴的噴吐口隔著既定間隙平行對向於該預塗滾子頂部，使該狹縫噴嘴噴吐一定量塗佈液再使該預塗滾子旋轉，在該預塗滾子外周面上與該第1乾燥膜不同之區域捲取一部分該經噴吐之塗佈液，於所希望次數之該預塗處理結束後，藉由該旋轉機構使預塗滾子旋轉，並同時使該清洗機構與該排氣機構作動，藉由清洗之方式一併去除附著於該預塗滾子外周面上之液體膜或乾燥膜。 A precoating treatment device for forming a liquid film of a coating liquid in the vicinity of a discharge port of a slit nozzle used in a non-spin coating method for coating treatment, which is characterized in that it comprises: a cylinder a cylindrical or cylindrical pre-coated roller horizontally disposed at a predetermined position; a rotating mechanism that rotates the pre-coated roller about a central axis thereof; and a cleaning mechanism that sprays the cleaning liquid for cleaning the outer peripheral surface of the pre-coated roller; a gas mechanism for forcibly exhausting the pre-coated roller; and a control portion for controlling each operation of the rotating mechanism, the cleaning mechanism and the exhausting mechanism; and for performing a pre-coating treatment for one time, The ejection opening of the slit nozzle is parallel to the top of the precoat roller via a predetermined gap, and the slit nozzle ejects a certain amount of the coating liquid, and the precoat roller is rotated by the rotating mechanism. A part of the sprayed coating liquid is taken up on the outer peripheral surface of the pre-coated roller. After the coating liquid is taken up by the rotating mechanism, the precoat roller is continuously rotated, and the liquid film of the coating liquid wound on the outer peripheral surface of the precoated roller is naturally dried. 1 drying the film, in order to perform another pre-coating process, the first dry film is shifted, and the ejection opening of the slit nozzle is parallel to the top of the pre-coated roller with a predetermined gap therebetween, and the slit nozzle is made Spraying a predetermined amount of the coating liquid to rotate the pre-coating roller, and winding a part of the sprayed coating liquid on the outer peripheral surface of the pre-coated roller from a region different from the first dry film, the desired number of times After the pre-coating process is completed, the pre-coating roller is rotated by the rotating mechanism, and simultaneously the cleaning mechanism and the exhausting mechanism are actuated, and the outer peripheral surface of the pre-coated roller is removed by cleaning. Liquid film or dry film. 如申請專利範圍第9項之預塗處理裝置，其中，在使該塗佈液液體膜乾燥時，令該排氣機構停止。 The precoating treatment apparatus according to claim 9, wherein the venting mechanism is stopped when the coating liquid film is dried. 如申請專利範圍第9或10項之預塗處理裝置，其中，該清洗機構僅對該預塗滾子外周面中附著有液體膜或乾燥膜之區域噴送清洗液。 The precoating treatment apparatus according to claim 9 or 10, wherein the cleaning mechanism sprays the cleaning liquid only to the region of the outer peripheral surface of the precoat roller to which the liquid film or the dried film adheres. 一種預塗處理裝置，用來在非旋轉塗佈法塗佈處理所採用之狹縫噴嘴的噴吐口附近，形成塗布液液體膜，以作為塗佈處理之事前準備，其特徵在於包含：圓筒狀或圓柱狀之預塗滾子，水平配置於既定位置；旋轉機構，使該預塗滾子繞著其中心軸旋轉；清洗機構，為清洗該預塗滾子之外周面而噴送清洗液；排氣機構，用以使該預塗滾子周圍強制排氣；及控制部，控制該旋轉機構、該清洗機構及該排氣機構之各動作；且令該塗佈處理用狹縫噴嘴或是非塗佈處理用之另一狹縫噴嘴隔著既定間隙平行對向於該預塗滾子頂部，令該狹縫噴嘴噴吐塗佈液並藉由該旋轉機構使該預塗滾子旋轉，在該預塗滾子外周面上捲取一部分或全部該經噴吐之塗佈液， 令該排氣機構保持未啟動，藉由該旋轉機構捲取該塗佈液後該預塗滾子仍持續旋轉，使在該預塗滾子外周面上所捲取之塗佈液液體膜乾燥，以作為第1層乾燥膜，為進行1次分之預塗處理，使該第1層乾燥膜位於該預塗滾子頂部，令該狹縫噴嘴的噴吐口隔著既定間隙平行對向於該預塗滾子頂部，使該狹縫噴嘴噴吐一定量塗佈液再藉由該旋轉機構使該預塗滾子旋轉，在該第1層乾燥膜上捲取一部分該經噴吐之塗佈液，所希望次數之該預塗處理結束後，藉由該旋轉機構使預塗滾子旋轉，並同時令該清洗機構及該排氣機構作動，藉由清洗之方式一併去除該預塗滾子外周面上所附著之液體膜或乾燥膜。 A precoating treatment device for forming a liquid film of a coating liquid in the vicinity of a discharge port of a slit nozzle used in a non-spin coating method for coating treatment, which is characterized in that it comprises: a cylinder a pre-coated roller of a shape or a cylinder, horizontally disposed at a predetermined position; a rotating mechanism that rotates the pre-coated roller about a central axis thereof; and a cleaning mechanism that sprays the cleaning liquid for cleaning the outer surface of the pre-coated roller a venting mechanism for forcibly exhausting the pre-coated roller; and a control unit for controlling each operation of the rotating mechanism, the cleaning mechanism, and the venting mechanism; and the slit nozzle for the coating treatment or The other slit nozzle for the non-coating treatment is parallel to the top of the precoat roller via a predetermined gap, and the slit nozzle ejects the coating liquid and rotates the precoat roller by the rotating mechanism. Rolling a part or all of the sprayed coating liquid on the outer peripheral surface of the precoated roller, The venting mechanism is kept unactivated, and after the coating liquid is taken up by the rotating mechanism, the pre-coating roller continues to rotate, so that the coating liquid film wound on the outer circumferential surface of the pre-coated roller is dried. For the first layer of the dried film, the first layer of the dried film is placed on the top of the precoated roller so that the first nozzle drying nozzle is placed in parallel with the predetermined gap. Disposing the top of the roller, causing the slit nozzle to eject a certain amount of the coating liquid, and rotating the pre-coating roller by the rotating mechanism, and winding a part of the sprayed coating liquid on the first layer of the dried film After the pre-coating process is completed for a desired number of times, the pre-coating roller is rotated by the rotating mechanism, and at the same time, the cleaning mechanism and the exhausting mechanism are actuated, and the pre-coated roller is removed by cleaning. A liquid film or a dried film attached to the outer peripheral surface. 一種預塗處理裝置，用來在非旋轉塗佈法塗佈處理所採用之狹縫噴嘴的噴吐口附近，形成塗布液之液體膜，以作為塗佈處理之事前準備，其特徵在於包含：圓筒狀或圓柱狀預塗滾子，水平配置於既定位置；旋轉機構，使該預塗滾子繞著其中心軸旋轉；清洗機構，為清洗該預塗滾子外周面而噴送清洗液；排氣機構，用以使該預塗滾子周圍強制排氣；及控制部，控制該旋轉機構、該清洗機構及該排氣機構之各動作；且為進行1次分之預塗處理，令該狹縫噴嘴的噴吐口隔著既定間隙平行對向於該預塗滾子頂部，使該狹縫噴嘴噴吐一定量塗佈液再藉由該旋轉機構使該預塗滾子旋轉，在該預塗滾子外周面上捲取一部分該經噴吐之塗佈液，令該排氣機構保持未啟動，藉由該旋轉機構捲取該塗佈液後該預塗滾子仍持續旋轉，使在該預塗滾子外周面上所捲取之塗佈液液體膜乾燥，以作為第1層第1乾燥膜，為進行另1次分之預塗處理，錯開該第1乾燥膜，令該狹縫噴嘴的噴吐口隔著既定間隙平行對向於該預塗滾子頂部，使該狹縫噴嘴噴吐一定量塗佈液再藉由該旋轉機構使該預塗滾子旋轉， 在該預塗滾子外周面上與該第1乾燥膜不同之區域捲取一部分該經噴吐之塗佈液，令該排氣機構保持未啟動，藉由該旋轉機構捲取該塗佈液後仍使該預塗滾子旋轉，使在該預塗滾子外周面上所捲取之塗佈液液體膜乾燥，以作為第1層第2乾燥膜，為進行又1次分之預塗處理，使該第1層第1或第2乾燥膜位於該預塗滾子頂部，令該狹縫噴嘴的噴吐口隔著既定間隙平行對向於該預塗滾子頂部，使該狹縫噴嘴噴吐一定量塗佈液再藉由該旋轉機構使該預塗滾子旋轉，在該第1層第1或第2乾燥膜上捲取一部分該經噴吐之塗佈液，所希望次數之該預塗處理結束後，藉由該旋轉機構使預塗滾子旋轉，並同時令該清洗機構及該排氣機構作動，藉由清洗之方式一併去除該預塗滾子外周面上所附著之液體膜或乾燥膜。A precoating treatment device for forming a liquid film of a coating liquid in the vicinity of a discharge port of a slit nozzle used in a non-spin coating method for coating treatment, which is characterized in that it comprises: a circle a cylindrical or cylindrical pre-coated roller horizontally disposed at a predetermined position; a rotating mechanism for rotating the pre-coated roller about a central axis thereof; and a cleaning mechanism for spraying the cleaning liquid for cleaning the outer peripheral surface of the pre-coated roller; a venting mechanism for forcibly exhausting the pre-coated roller; and a control unit for controlling each operation of the rotating mechanism, the cleaning mechanism, and the venting mechanism; and performing a pre-coating treatment for one time The ejection opening of the slit nozzle is parallel to the top of the precoat roller via a predetermined gap, and the slit nozzle ejects a certain amount of the coating liquid, and the precoat roller is rotated by the rotating mechanism. Rolling a part of the sprayed coating liquid on the outer peripheral surface of the coating roller to keep the exhaust mechanism unactivated, and the precoat roller continues to rotate after the coating liquid is taken up by the rotating mechanism, so that The coating liquid taken up on the outer peripheral surface of the pre-coated roller The liquid film is dried to be the first dry film of the first layer, and the first dry film is shifted, and the first dry film is shifted so that the discharge port of the slit nozzle is parallel to the predetermined gap. Coating the top of the roller, causing the slit nozzle to eject a certain amount of coating liquid, and rotating the pre-coating roller by the rotating mechanism, a part of the sprayed coating liquid is taken up in a region different from the first dry film on the outer circumferential surface of the precoated roller, so that the exhaust mechanism is not activated, and the coating liquid is taken up by the rotating mechanism. The precoat roller is still rotated, and the coating liquid film wound on the outer peripheral surface of the precoated roller is dried to be the first layer of the second dry film, and the precoating process is performed once again. The first layer or the second drying film of the first layer is located at the top of the pre-coating roller, so that the ejection opening of the slit nozzle is parallel to the top of the pre-coated roller through a predetermined gap, and the slit nozzle is spouted. A predetermined amount of the coating liquid is further rotated by the rotating mechanism, and a part of the sprayed coating liquid is wound up on the first layer or the first dry film of the first layer, and the precoating is performed a desired number of times. After the treatment is completed, the pre-coating roller is rotated by the rotating mechanism, and at the same time, the cleaning mechanism and the exhausting mechanism are actuated, and the liquid film attached to the outer peripheral surface of the pre-coated roller is removed by cleaning. Or dry the film.
TW099118171A 2009-06-05 2010-06-04 Priming processing method and priming processing device TWI478774B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009135634A JP5154510B2 (en) 2009-06-05 2009-06-05 Priming processing method and priming processing apparatus

Publications (2)

Publication Number Publication Date
TW201105424A TW201105424A (en) 2011-02-16
TWI478774B true TWI478774B (en) 2015-04-01

Family

ID=43260880

Family Applications (1)

Application Number Title Priority Date Filing Date
TW099118171A TWI478774B (en) 2009-06-05 2010-06-04 Priming processing method and priming processing device

Country Status (4)

Country Link
JP (1) JP5154510B2 (en)
KR (1) KR101518522B1 (en)
CN (1) CN101905209B (en)
TW (1) TWI478774B (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5154510B2 (en) 2009-06-05 2013-02-27 東京エレクトロン株式会社 Priming processing method and priming processing apparatus
JP5361657B2 (en) * 2009-10-22 2013-12-04 東京エレクトロン株式会社 Priming processing method and priming processing apparatus
JP5204164B2 (en) * 2010-08-03 2013-06-05 東京エレクトロン株式会社 Coating apparatus and nozzle priming method
CN102698609B (en) * 2012-05-31 2014-06-25 南京工业大学 Device for semi-continuously preparing composite membrane and composite membrane preparation process thereof
CN104216231B (en) * 2013-06-05 2019-02-12 中芯国际集成电路制造(上海)有限公司 Apparatus for coating and coating method
EP3357588B1 (en) * 2015-09-30 2021-07-21 Suntory Holdings Limited Preform coating device and preform coating method
CN111491744A (en) 2017-12-25 2020-08-04 三得利控股株式会社 Preform coating apparatus
CN113600429A (en) * 2021-08-27 2021-11-05 合肥国轩高科动力能源有限公司 Composite coating die head

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000015177A (en) * 1998-07-02 2000-01-18 Nkk Corp Coating of outside surface of metal tube and device therefor
JP2001310147A (en) * 2000-05-02 2001-11-06 Tokyo Ohka Kogyo Co Ltd Pre-delivering apparatus and pre-delivering method for slit coater
JP2004121980A (en) * 2002-10-02 2004-04-22 Toppan Printing Co Ltd Method and apparatus for preliminary discharge
TWI259109B (en) * 2004-03-18 2006-08-01 Dainippon Screen Mfg Slit nozzle and substrate processing apparatus
TWI265831B (en) * 2003-11-18 2006-11-11 Dainippon Screen Mfg Substrate processing apparatus, slit nozzle, structure for determining degree of liquid filling in body to be filled, and structure for determining degree of air mixed in body to be filled
JP2007237046A (en) * 2006-03-07 2007-09-20 Tokyo Electron Ltd Priming treatment method and priming treatment apparatus

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4455102B2 (en) * 2004-03-10 2010-04-21 大日本スクリーン製造株式会社 Substrate processing equipment
JP4429073B2 (en) * 2004-05-20 2010-03-10 東京応化工業株式会社 Pre-discharge device for slit coater
CN101032714A (en) * 2006-03-08 2007-09-12 住友化学株式会社 Pre-treatment apparatus for application film formation device, application film formation device and application film formation method
JP2008049226A (en) * 2006-08-22 2008-03-06 Tokyo Ohka Kogyo Co Ltd Preliminary discharge device
JP5154510B2 (en) 2009-06-05 2013-02-27 東京エレクトロン株式会社 Priming processing method and priming processing apparatus

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000015177A (en) * 1998-07-02 2000-01-18 Nkk Corp Coating of outside surface of metal tube and device therefor
JP2001310147A (en) * 2000-05-02 2001-11-06 Tokyo Ohka Kogyo Co Ltd Pre-delivering apparatus and pre-delivering method for slit coater
JP2004121980A (en) * 2002-10-02 2004-04-22 Toppan Printing Co Ltd Method and apparatus for preliminary discharge
TWI265831B (en) * 2003-11-18 2006-11-11 Dainippon Screen Mfg Substrate processing apparatus, slit nozzle, structure for determining degree of liquid filling in body to be filled, and structure for determining degree of air mixed in body to be filled
TWI259109B (en) * 2004-03-18 2006-08-01 Dainippon Screen Mfg Slit nozzle and substrate processing apparatus
JP2007237046A (en) * 2006-03-07 2007-09-20 Tokyo Electron Ltd Priming treatment method and priming treatment apparatus

Also Published As

Publication number Publication date
JP2010279907A (en) 2010-12-16
CN101905209B (en) 2014-03-19
KR20100131374A (en) 2010-12-15
JP5154510B2 (en) 2013-02-27
CN101905209A (en) 2010-12-08
KR101518522B1 (en) 2015-05-07
TW201105424A (en) 2011-02-16

Similar Documents

Publication Publication Date Title
TWI478774B (en) Priming processing method and priming processing device
US8887657B2 (en) Film forming system and method using application nozzle
JP2006503433A (en) Spin coating method and spin coating apparatus having pressure sensor
JP2001310147A (en) Pre-delivering apparatus and pre-delivering method for slit coater
KR20010086065A (en) System and method for coating of substrates
US9855579B2 (en) Spin dispenser module substrate surface protection system
TW201637733A (en) Coating method and coating apparatus
TWI496628B (en) Priming processing method and priming processing device
WO2014092160A1 (en) Substrate liquid processing apparatus and substrate liquid processing method
TWI478775B (en) Priming processing method and priming processing device
JP5197836B2 (en) Priming processing method and priming processing apparatus
JP4487628B2 (en) Coating device with cleaning device
JP2002143749A (en) Rotary coater
JP5197829B2 (en) Priming processing method and priming processing apparatus
JP3597612B2 (en) Applicator for coating liquid on substrate
JP5562315B2 (en) Priming processing method and priming processing apparatus
JP5378586B2 (en) Priming processing method and priming processing apparatus
JPH0444217Y2 (en)
JP2002134388A (en) Resist discharge opening cleaning method and apparatus, and resist applying method and apparatus
JPH09122560A (en) Spin coater
JPH11239755A (en) Method and device for coating liquid
JPH0729789A (en) Coating device
JP2001179157A (en) Coating nozzle for liquid and coating device and coating method
JP2557932Y2 (en) Chemical supply nozzle with nozzle cleaning mechanism
JP2022087527A (en) Liquid processing method and liquid processing device