TWI467256B

TWI467256B - A mothod of fabricating polymer waveguides

Info

Publication number: TWI467256B
Application number: TW101149223A
Authority: TW
Inventors: Kuen Cherng Lin; Yu Cheng Lin; Wei Ching Chuang; Way Yu Lee
Original assignee: Touching Intellectual Property Consultant Company
Priority date: 2007-05-09
Filing date: 2007-05-09
Publication date: 2015-01-01
Also published as: TW201333563A

Description

一種高分子波導的製作方法Method for manufacturing polymer waveguide

本發明係屬於積體光學與光波導元件或晶片製作之技術領域。The present invention is in the technical field of integrated optical and optical waveguide components or wafer fabrication.

以積體光路製作光電晶片，儼然成為未來光信號處理及寬頻光通信技術的未來趨勢。積體光路的基本功能元素係為光波導，而高分子材料因為具備以下的優點，而成為光波導元件製作上極具潛力的材料與技術之一，也因而為各國研究開發的重點方向：(1)極低的傳輸損失，(2)可透過分子設計或經由摻雜技術(doping)而調整其光學性質，(3)良好的物理性質：適當的流動性、良好的基材相容性、極佳的元件結構適應性、很大的光學非線性以應用於主動性元件，(4)相當簡單的製程技術。The production of optoelectronic chips with integrated optical paths has become the future trend of optical signal processing and broadband optical communication technology. The basic functional elements of the integrated optical path are optical waveguides, and the polymer materials have become one of the most promising materials and technologies for the fabrication of optical waveguide components because of the following advantages, and thus are the focus of research and development in various countries: 1) very low transmission loss, (2) tunable optical properties through molecular design or doping, (3) good physical properties: proper fluidity, good substrate compatibility, Excellent component structure adaptability, large optical nonlinearity for active components, and (4) fairly simple process technology.

製作高分子光波導最常採用的方法之一，係在矽基材上方沉積一層氧化矽(SiO₂ )薄膜，接著再此氧化矽薄膜中，以電漿蝕刻出波導的圖案，然後在其上塗覆一層折射率較高的高分子材料作為導光層；將超溢部分的高分子蝕刻去，直到達原氧化矽表面，接著又再塗覆一層折射率較低的高分子材料，將高分子光波導完全埋入氧化矽中。這種方法的缺點是波導的側邊常是非垂直的，且其表面常是皺摺不平的，這是此類蝕刻技術必然的後果；而在高分子塗覆的過程也偶會發生氣泡，而導致光波傳輸時的散射現象。其他的習知製作高分子光波導的技術包括：光學交互鏈結法 (photo-cross-linking)、反應式離子蝕刻法(reactive ion etching)、雷射光束寫入法、電子束寫入法(Electron-beam writing)、熱浮雕法(Hot embossing)、微轉印鑄模法(Microtransfer molding)等。但是這些習知技術仍存在一些尚待克服的缺點，如：唇裂(Lip)問題、波導的基材和核芯在某些技術只能限用於某些材料，而非普遍可適用於各類的材料。而另外，LIGA(Lithographie Galvanik Abformung)技術的缺點在於需要很厚的光阻層，才足以獲得品質良好的鑄模。由於光的滲透深度隨著光波長的減小而增加，只有波長極短的同步幅射光才能在LIGA結構的厚光阻層上雕塑出深寬比佳的波導圖案，而這樣的光源取得困難。因此，高分子光波導研究發明的焦點方向逐漸走向結合鑄模技術的類LIGA(LIGA-like)製程。One of the most commonly used methods for fabricating a polymeric optical waveguide is to deposit a layer of yttrium oxide (SiO ₂ ) film over the ruthenium substrate, and then etch the ruthenium film with a plasma pattern and then coat it on the ruthenium oxide film. A polymer material having a higher refractive index is coated as a light guiding layer; the polymer of the overfilled portion is etched until the surface of the original cerium oxide is reached, and then a polymer material having a lower refractive index is further coated to polymerize The optical waveguide is completely buried in the yttrium oxide. The disadvantage of this method is that the sides of the waveguide are often non-perpendicular, and the surface is often wrinkled, which is an inevitable consequence of such etching techniques; in the process of polymer coating, occasionally bubbles occur, and Causes scattering phenomena when light waves are transmitted. Other conventional techniques for fabricating polymeric optical waveguides include: photo-cross-linking, reactive ion etching, laser beam writing, and electron beam writing ( Electron-beam writing), hot embossing, microtransfer molding, and the like. However, these conventional techniques still have some shortcomings to be overcome, such as: lip crack problem, the substrate and core of the waveguide can only be used for certain materials in some technologies, and not universally applicable to various types. s material. In addition, LIGA (Lithographie Galvanik Abformung) technology has the disadvantage that a thick photoresist layer is required to obtain a good quality mold. Since the penetration depth of light increases with the decrease of the wavelength of light, only the synchronous radiation light with a very short wavelength can sculpt the waveguide pattern with a good aspect ratio on the thick photoresist layer of the LIGA structure, and such a light source is difficult to obtain. . Therefore, the focus of the invention of the polymer optical waveguide research is gradually moving toward the LIGA-like process of the molding technology.

本發明係為一種簡單的製作高分子光波導之方法，係為類似LIGA複製處理的方法，屬於應用軟式平板印刷的方法，利用二階段鑄模工序，主模子先以負型光阻做成，並接著轉印成聚二甲基矽氧烷模子，然後以此聚二甲基矽氧烷之矽樹酯橡膠模子作為戳印，將最後的波導圖案再轉印至環氧樹酯上，以達到複製法製作高分子波導的目的。本發明所採用的環氧樹酯在經過紫外光照射後是可固化定型的。利用本發明製作之高分子波導具有以下優點：(1)良好的波導圖案轉印效果，(2)低傳輸損失的波導特性，(3)製作成本低廉，具未來量產之潛力。此技術將可應用於積體光路或光波導元件與晶片的製程中。The invention relates to a simple method for fabricating a polymer optical waveguide, which is a method similar to LIGA copy processing, and belongs to a method for applying soft lithography, which uses a two-stage molding process, and the main mold is first made of a negative photoresist, and Subsequently, it is transferred into a polydimethyl siloxane mold, and then the polydimethyl methoxy oxane rubber mold is used as a stamp, and the final waveguide pattern is re-transferred onto the epoxy resin to achieve The purpose of making a polymer waveguide by the replication method. The epoxy resin used in the present invention is curable and shaped after exposure to ultraviolet light. The polymer waveguide produced by the invention has the following advantages: (1) good waveguide pattern transfer effect, (2) waveguide characteristics with low transmission loss, and (3) low production cost and potential for mass production in the future. This technology will be applied to the integrated light path Or in the process of optical waveguide components and wafers.

按諸精於本技藝者所熟知不同方式，雖參考較佳實施例已說明本發明，但對於精於本技藝者至為明顯可完成不同改變或修改，係仍在本發明範圍之內；本發明係欲廣泛地保護被保護在所附專利申請範圍及其精神之內。The present invention has been described with reference to the preferred embodiments thereof, and it is obvious to those skilled in the art that various changes or modifications may be made without departing from the scope of the invention. The invention is intended to be broadly protected and protected within the scope and spirit of the appended claims.

在實施方式之較佳實施例中，負型光阻和UV環氧樹酯為扮演重要中介角色的二種材料；所採用的光阻為SU-8，因為SU-8的分子量小，易溶解於溶劑中，且在近紫外光的波段具有良好的透光性，適用於產生良好的深寬比(aspect ratio)的光波導圖案。而為了減低波導核芯與其覆蓋層之間因材質不同的熱膨脹造成的殘餘應力，波導核芯與其覆蓋層採用了折射率相類似的高分子材料，在本較佳實施例中則選用了OG169和OG146之Epoxy公司所生產的環氧樹酯，其折射率在632.8奈米的波長下分別為1.5413和1.5201，因此本最佳實施例之高分子光波導將適用於光纖通信或感測器的應用，能有效地減低Fresnel反射對光信號造成的干擾與損耗。In a preferred embodiment of the embodiment, the negative photoresist and the UV epoxy resin are two materials that play an important intermediate role; the photoresist used is SU-8 because the molecular weight of SU-8 is small and soluble. It has good light transmittance in a solvent and in the near-ultraviolet light band, and is suitable for an optical waveguide pattern which produces a good aspect ratio. In order to reduce the residual stress caused by different thermal expansion between the waveguide core and its cover layer, the waveguide core and its cover layer are made of a polymer material having a similar refractive index. In the preferred embodiment, OG169 is used. The epoxy resin produced by Epoxy of OG146 has a refractive index of 1.5413 and 1.5201 at a wavelength of 632.8 nm, respectively. Therefore, the polymer optical waveguide of the preferred embodiment will be suitable for fiber communication or sensor applications. It can effectively reduce the interference and loss caused by Fresnel reflection on optical signals.

依本法之較佳實施例步驟如下，請參考圖1：The steps of the preferred embodiment according to the present method are as follows, please refer to FIG. 1:

1.先將500微米厚的玻璃基材先切割成2公分x4公分的長方形，並加以標準洗淨程序。1. First cut a 500 micron thick glass substrate into a 2 cm x 4 cm rectangle and apply a standard cleaning procedure.

2.以旋轉塗佈法覆塗上一層6微米厚的負型光阻劑SU-8，製程條件為2000rpm的速率旋轉20秒，且旋轉速率是逐漸增加的，以使所塗佈薄膜能有良好的均勻表面。此薄膜先以烤箱於90℃烘烤120秒，以烘除高分子薄膜內多餘的溶劑，然後使用紫外光光罩對準儀透過事先設計好的光波導圖案光罩而進行曝照：近紫外光光譜(光波長350-450奈米)，能量密度為100mW/cm² 。如圖1(a)所示。2. A 6 μm thick negative photoresist SU-8 was applied by spin coating, and the process was rotated at a rate of 2000 rpm for 20 seconds, and the rotation rate was gradually increased so that the coated film could have Good uniform surface. The film is first baked in an oven at 90 ° C for 120 seconds to remove excess solvent from the polymer film, and then exposed through a pre-designed optical waveguide pattern mask using an ultraviolet ray aligner: near-ultraviolet The light spectrum (light wavelength 350-450 nm) has an energy density of 100 mW/cm ² . As shown in Figure 1 (a).

3.曝照後的樣本以光阻劑相對應的顯影液浸泡顯影30秒，烘乾即可得波導的圖案負型。此負型光阻圖案將作為母模，以利後續應用類似戳印方法的微鑄模(micromolding)技術，轉印圖案到其他高分子薄膜上。如圖1(b)所示。但同一基材上可同時製作2個以上不同尺寸的波導圖案3. The exposed sample is immersed and developed with the developer corresponding to the photoresist for 30 seconds, and dried to obtain the negative pattern of the waveguide. This negative photoresist pattern will be used as a master mold to facilitate the subsequent application of a micromolding technique similar to the stamping method to transfer the pattern onto other polymer films. As shown in Figure 1 (b). However, two or more waveguide patterns of different sizes can be simultaneously fabricated on the same substrate.

4.將稀釋的聚二甲基矽氧烷(PDMS)均勻地塗佈到光阻圖案上，經過一小時的90℃烘烤，PDMS薄膜已成型而易於剝除。如圖1(c)所示。4. The diluted polydimethyl siloxane (PDMS) was uniformly applied to the photoresist pattern, and after one hour of baking at 90 ° C, the PDMS film was formed to be easily peeled off. As shown in Figure 1 (c).

5.由光阻表面上剝下PDMS薄膜，以作為後續的PDMS鑄模。如圖1(d)所示。5. Peel off the PDMS film from the photoresist surface as a subsequent PDMS mold. As shown in Figure 1 (d).

6.將PDMS薄膜緊密貼於玻璃基材的表面。如圖1(e)所示。6. The PDMS film is adhered to the surface of the glass substrate. As shown in Figure 1 (e).

7.將上述樣本PDMS鑄模面朝下，而與另一片載玻片中間隔著400微米厚的墊片(spacer)相面對著緊壓，如圖1(f)所示，而形成一縫隙空間；接著將黏性低的UV環氧樹酯(OG146)以精密尖端注射器由上述樣本的間隙開口注入，而高分子溶液會因毛細效應而充佈滿整個縫隙空間。然後以紫外光(波長300-400 nm，光能量密度100mW/cm² )曝照1-2分鐘，使得UV環氧樹酯固化成型。如圖1(f)所示。7. Place the sample PDMS mold face down, and face the other spacer with a spacer of 400 μm thick, as shown in Figure 1 (f), forming a gap. Space; then the low viscosity UV epoxy resin (OG146) is injected into the gap opening of the above sample with a precision tip injector, and the polymer solution fills the gap space due to the capillary effect. Then, ultraviolet light (wavelength 300-400 nm, light energy density 100 mW/cm ² ) was exposed for 1-2 minutes to cure the UV epoxy resin. As shown in Figure 1 (f).

8.環氧樹酯(OG146)固化成型後，與PDMS之間的附著微弱，PDMS模子可輕易地從成型的環氧樹酯上剝除，而留下形成凹槽的環氧樹酯(厚度約400微米)將作為光波導的覆蓋層。如圖1(g)所示。8. After curing of epoxy resin (OG146), the adhesion to PDMS is weak, and the PDMS mold can be easily stripped from the formed epoxy resin, leaving the grooved epoxy resin (thickness). About 400 microns) will act as a cover for the optical waveguide. As shown in Figure 1 (g).

9.將類似的UV環氧樹酯(OG169)注入此凹槽中，以形成波導的核芯部分。如圖1(h)所示。而由於旋轉塗佈法可能會在波導核芯區域之外形成一層厚的覆蓋層，而造成較大的傳輸損失；因此本發明另提出改良的方法：在圖1(h)-1(k)中，先將一薄層的PDMS塗佈至另一片玻璃基材上，烘乾後，此二玻璃基材樣本覆蓋有高分子薄膜或圖案的那一面將面對面相向地密合緊壓，於是在兩者之間形成一長方形的坑道，甚至在凹槽之外的介面縫隙可能形成圖自行剖面的坑道。9. A similar UV epoxy resin (OG169) is injected into the recess to form the core portion of the waveguide. As shown in Figure 1 (h). However, since the spin coating method may form a thick cover layer outside the waveguide core region, causing a large transmission loss; therefore, the present invention further proposes an improved method: in Fig. 1(h)-1(k) First, a thin layer of PDMS is applied to another glass substrate, and after drying, the side of the two glass substrate samples covered with the polymer film or pattern will face and face each other tightly, so that A rectangular tunnel is formed between the two, and even the interface gap outside the groove may form a tunnel with a self-section.

10.滴一小滴UV環氧樹酯在此坑道樣本的一端面，在曝照紫外光後，固化而完成坑道其中一端開口的密封。接著在真空反應室中，將樣本浸入或另一開口端面朝下置入第二種環氧樹酯(OG169)溶液中；當真空反應室內氣壓達到低於10mTorr時，通入氬氣(Ar)以迫使環氧樹酯(OG169)流體進入樣本坑道中。如圖1(i)所示。10. Drop a small drop of UV epoxy resin on one end of the tunnel sample, after exposure to UV light, solidify to complete the seal at one end of the tunnel. Then, in the vacuum reaction chamber, the sample is immersed or the other end face is placed downward into the second epoxy resin (OG169) solution; when the pressure in the vacuum reaction chamber reaches less than 10 mTorr, argon gas is introduced (Ar) ) to force the epoxy resin (OG169) fluid into the sample tunnel. As shown in Figure 1 (i).

11.將樣本以紫外光曝照，以使環氧樹酯(OG169)固化成型。如圖 1(j)所示。11. The sample is exposed to ultraviolet light to cure the epoxy resin (OG169). As shown 1(j) is shown.

12.將外覆的玻璃載片移除，並剝除PDMS薄膜，則此高分子光波導的核芯部分已完成。如圖1(k)所示。12. The core portion of the polymeric optical waveguide is completed by removing the overlying glass slide and stripping the PDMS film. As shown in Figure 1 (k).

13.為了避免波導核芯部分的表面直接接觸空氣，造成空氣吸收損失及介質不連續面造成的散射損失，本發明在光波導的核芯之上加一層覆蓋層。光波導覆蓋層部分的製作：製作方法類似步驟7的圖F，將上述樣本之高分子膜面朝上，而與另一片載玻片中間隔著800微米厚的墊片相面對著緊壓，以固定兩片玻璃，並在二者之間形成一縫隙空間；接著將UV環氧樹酯(OG146)以精密尖端注射器由上述樣本的間隙開口注入，藉由毛細效應而充佈滿整個縫隙空間。然後以紫外光曝照，使得UV環氧樹酯成型。如圖1(l)所示。13. In order to avoid direct contact of the surface of the waveguide core portion with air, resulting in loss of air absorption and scattering loss caused by discontinuous surfaces of the medium, the present invention adds a coating layer over the core of the optical waveguide. Fabrication of the optical waveguide cover layer portion: the fabrication method is similar to that of the step F of the step 7, in which the polymer film of the sample is faced upward, and the other glass slide is faced with a spacer of 800 μm thick. To fix two sheets of glass and form a gap space between them; then, UV epoxy resin (OG146) is injected into the gap opening of the sample by a precision tip injector to fill the gap by capillary effect. space. The UV epoxy resin is then shaped by exposure to ultraviolet light. As shown in Figure 1 (l).

14.環氧樹酯(OG146)成型後，第二片之上載玻片從成型的環氧樹酯上剝除，留下800微米厚的環氧樹酯覆蓋層，而將通道光波導的導波核芯完全包覆在高分子材料的覆蓋層之中，此即為本法最後結果的高分子光波導。如圖1(m)所示。14. After the epoxy resin (OG146) is formed, the second slide of the slide is stripped from the formed epoxy resin, leaving an 800 μm thick epoxy resin coating layer and guiding the channel optical waveguide. The core of the wave is completely coated in the covering layer of the polymer material, which is the polymer optical waveguide which is the final result of the present method. As shown in Figure 1 (m).

唯以上所述者，僅為本發明之較佳實施例，當不能以之限制本發明的範圍。即大凡依本發明申請專利範圍所做之均等變化及修飾，仍將不失本發明之要義所在，亦不脫離本發明之精神和範圍，故都應視為本發明的進一步實施狀況。The above is only the preferred embodiment of the present invention, and the scope of the present invention is not limited thereto. It is to be understood that the scope of the present invention is not limited by the spirit and scope of the present invention, and should be considered as a further embodiment of the present invention.

按附圖內所述說明本專利之較佳實例，為了瞭解可使用特定術語。但本發明並不欲限定於所選定之特定術語，且其應了解每一特定術語係包括所有可以相同方式操作以完成相同目的之技術。Preferred examples of the patent are described in the accompanying drawings in which specific terms may be used. However, the invention is not intended to be limited to the specific terms selected, and it is understood that each specific term includes all techniques that can operate in the same manner to accomplish the same.

圖1之主要元件符號說明：The main component symbols in Figure 1 illustrate:

111‧‧‧紫外光曝照111‧‧‧UV exposure

112‧‧‧圖案光罩112‧‧‧pattern mask

113‧‧‧光阻劑113‧‧‧ photoresist

114‧‧‧玻璃基材114‧‧‧ glass substrate

121‧‧‧顯影並烘乾後之波導的圖案負型121‧‧‧Down pattern of waveguide after development and drying

131‧‧‧均勻塗佈之聚二甲基矽氧烷(PDMS)膜131‧‧‧Uniformly coated polydimethyloxane (PDMS) membrane

141‧‧‧成型後剝除之PDMS薄膜141‧‧‧PDMS film stripped after molding

151‧‧‧另一片玻璃基材151‧‧‧Another glass substrate

161‧‧‧墊片161‧‧‧shims

162‧‧‧另一片玻璃載玻片162‧‧‧Another glass slide

163‧‧‧由樣本的間隙開口注入UV環氧樹酯(OG146)163‧‧‧Injection of UV epoxy resin (OG146) from the gap opening of the sample

171‧‧‧成型而剝除之凹槽環氧樹酯171‧‧‧Formed and stripped grooved epoxy resin

181‧‧‧另一片玻璃基材181‧‧‧Another glass substrate

182‧‧‧PDMS薄膜182‧‧‧PDMS film

183‧‧‧欲形成光波導之凹槽坑道183‧‧‧To form a grooved tunnel for optical waveguides

191‧‧‧真空反應室191‧‧‧vacuum reaction chamber

192‧‧‧樣本作用區192‧‧‧sample area

193‧‧‧支撐器193‧‧‧Support

194‧‧‧環氧樹酯(OG169)溶液194‧‧‧Epoxy resin (OG169) solution

195‧‧‧抽真空195‧‧‧vacuum

201‧‧‧環氧樹酯(OG169)固化成型201‧‧‧Epoxy resin (OG169) curing molding

202‧‧‧紫外光曝照202‧‧‧ UV exposure

211‧‧‧墊片211‧‧‧shims

212‧‧‧另一片玻璃基材212‧‧‧Another glass substrate

213‧‧‧注入UV環氧樹酯(OG146)213‧‧‧Injection of UV epoxy resin (OG146)

所有附圖係用於圖例說明本新型之實例，且連圖說明可更明顯闡明本發明之原則。The drawings are used to illustrate the examples of the present invention, and the accompanying drawings illustrate the principles of the invention.

圖1(a-m)：本發明之高分子光波導製作流程示意圖。Fig. 1 (a-m) is a schematic view showing the manufacturing process of the polymer optical waveguide of the present invention.

111‧‧‧紫外光曝照111‧‧‧UV exposure

112‧‧‧圖案光罩112‧‧‧pattern mask

113‧‧‧光阻劑113‧‧‧ photoresist

114‧‧‧玻璃基材114‧‧‧ glass substrate

151‧‧‧另一片玻璃基材151‧‧‧Another glass substrate

161‧‧‧墊片161‧‧‧shims

162‧‧‧另一片玻璃載玻片162‧‧‧Another glass slide

181‧‧‧另一片玻璃基材181‧‧‧Another glass substrate

182‧‧‧PDMS薄膜182‧‧‧PDMS film

191‧‧‧真空反應室191‧‧‧vacuum reaction chamber

192‧‧‧樣本作用區192‧‧‧sample area

193‧‧‧支撐器193‧‧‧Support

194‧‧‧環氧樹酯(OG169)溶液194‧‧‧Epoxy resin (OG169) solution

195‧‧‧抽真空195‧‧‧vacuum

202‧‧‧紫外光曝照202‧‧‧ UV exposure

211‧‧‧墊片211‧‧‧shims

212‧‧‧另一片玻璃基材212‧‧‧Another glass substrate

Claims

一種製作光波導的方法，其包括下列步驟：形成一光阻層於一第一硬質基板上；利用光微影蝕刻技術及一具有光波導圖案的光罩，圖案化該光阻層而使該光阻層上形成該光波導的負型圖案；形成一第一高分子層於該光阻層上，並將該第一高分子層自該光阻層上分離而使該第一高分子層上形成該光波導圖案，其中該第一高分子層之組成材料在成型後易於自該光阻層上剝除；貼附該第一高分子層於一第二硬質基板上；設置一間隔墊物(spacer)於該第二硬質基板與一第三硬質基板之間，並面對面施壓於該第二與第三硬質基板，藉以在該第一高分子層與該第三硬質基板之間形成一第一縫隙空間；形成一第二高分子層，其填滿該第一縫隙空間，其中該第二高分子層之組成材料可經紫外光曝照而固化；將該第二高分子層自該第一高分子層上分離，而使該第二高分子層上形成該光波導的負型圖案；形成一第四高分子層於一第四硬質基板上；面對面貼合該第三與第四硬質基板，並施壓以在該第二高分子層與該第四高分子層之間形成一第二縫隙空間；在一真空反應室中，將上述該第三與第四硬質基板之組合、浸入含有一第三高分子層之組成材料的溶液中，其中該第三高分子層之組成材料可經紫外光曝照而固化；使該真空反應室內的氣壓低於10mTorr，再通入一氣體以迫使上述含有該第三高分子層之組成材料的溶液進入該第二縫隙空間；固化上述含有該第三高分子層之組成材料的溶液，以形成該第三高分子層；以及移除該第四高分子層及該第四硬質基板，藉以將該第三高分子層形成於該第二高分子層上的該光波導負型圖案中；以及移除該第三硬質基板，使得餘留的該第二高分子層及該第三高分子層形成該光波導。 A method of fabricating an optical waveguide, comprising the steps of: forming a photoresist layer on a first hard substrate; patterning the photoresist layer by using a photolithographic etching technique and a photomask having an optical waveguide pattern Forming a negative pattern of the optical waveguide on the photoresist layer; forming a first polymer layer on the photoresist layer, and separating the first polymer layer from the photoresist layer to form the first polymer layer Forming the optical waveguide pattern, wherein the constituent material of the first polymer layer is easily stripped from the photoresist layer after molding; attaching the first polymer layer to a second hard substrate; and providing a spacer Spacer between the second hard substrate and a third hard substrate, and is pressed face to face on the second and third hard substrates, thereby forming a gap between the first polymer layer and the third hard substrate a first gap space; forming a second polymer layer filling the first gap space, wherein the constituent material of the second polymer layer can be cured by ultraviolet light exposure; the second polymer layer is self-contained Separating the first polymer layer to make the second high score Forming a negative pattern of the optical waveguide on the layer; forming a fourth polymer layer on a fourth hard substrate; bonding the third and fourth hard substrates face to face, and applying pressure to the second polymer layer Forming a second gap space between the fourth polymer layers; and combining the third and fourth hard substrates in a vacuum reaction chamber, Immersed in a solution containing a constituent material of a third polymer layer, wherein the constituent material of the third polymer layer is cured by ultraviolet light exposure; the gas pressure in the vacuum reaction chamber is lower than 10 mTorr, and then a gas is introduced. Forming a solution containing the constituent material of the third polymer layer into the second gap space; curing the solution containing the constituent material of the third polymer layer to form the third polymer layer; and removing the solution a fourth polymer layer and the fourth hard substrate, wherein the third polymer layer is formed in the optical waveguide negative pattern on the second polymer layer; and the third hard substrate is removed, so that the remaining The second polymer layer and the third polymer layer form the optical waveguide.

如申請專利範圍第1項所述的方法，其中該光阻層包括一負型光阻。 The method of claim 1, wherein the photoresist layer comprises a negative photoresist.

如申請專利範圍第2項所述的方法，其中該光阻層包括一SU-8光阻劑。 The method of claim 2, wherein the photoresist layer comprises a SU-8 photoresist.

如申請專利範圍第1項所述的方法，其中該第一高分子層包括一聚二甲基矽氧烷之矽樹酯橡膠高分子材料。 The method of claim 1, wherein the first polymer layer comprises a polydimethyl methoxyoxane eucalyptus rubber polymer material.

如申請專利範圍第1項所述的方法，其中該第四高分子層包括一聚二甲基矽氧烷之矽樹酯橡膠高分子材料。 The method of claim 1, wherein the fourth polymer layer comprises a polydimethyl methoxy alkane eucalyptus rubber polymer material.

如申請專利範圍第1項所述的方法，其中該第二高分子層包括一環氧樹酯之高分子材料，該第三高分子層包括另一環氧樹酯之高分子材料。 The method of claim 1, wherein the second polymer layer package A polymer material comprising an epoxy resin, the third polymer layer comprising a polymer material of another epoxy resin.

如申請專利範圍第1項所述的方法，其中該間隔墊物的尺寸大於或等於400微米。 The method of claim 1, wherein the spacer has a size greater than or equal to 400 microns.

如申請專利範圍第1項所述的方法，其中之形成該第二高分子層的步驟包括：將含有該第二高分子層之組成材料的溶液以一注射器注入該第一縫隙空間，並藉由毛細效應而使上述含有該第二高分子層之組成材料的溶液充滿該第一縫隙空間。 The method of claim 1, wherein the forming the second polymer layer comprises: injecting a solution containing the constituent material of the second polymer layer into the first gap space by a syringe, and borrowing The solution containing the constituent material of the second polymer layer is filled with the first gap space by the capillary effect.