TWI455783B - 雷射加工方法及其所形成的加工件 - Google Patents
雷射加工方法及其所形成的加工件 Download PDFInfo
- Publication number
- TWI455783B TWI455783B TW101100095A TW101100095A TWI455783B TW I455783 B TWI455783 B TW I455783B TW 101100095 A TW101100095 A TW 101100095A TW 101100095 A TW101100095 A TW 101100095A TW I455783 B TWI455783 B TW I455783B
- Authority
- TW
- Taiwan
- Prior art keywords
- laser beam
- distribution
- overlap ratio
- depth
- region
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/0869—Devices involving movement of the laser head in at least one axial direction
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
- B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
- B23K26/0626—Energy control of the laser beam
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Laser Beam Processing (AREA)
- Planar Illumination Modules (AREA)
Claims (3)
- 一種雷射加工方法,包含下列步驟:提供一加工件,該加工件具有一第一局部區域;以及施加一第一雷射光束至該第一局部區域,以在該第一局部區域中形成一第一網點,其中該第一雷射光束的複數雷射脈衝在該第一局部區域中具有一第一特定重疊率分佈以使該第一網點具有一特定深度分佈,該第一局部區域包括一高重疊率分佈區域以及一低重疊率分佈區域,該第一特定重疊率分佈包括一第一脈衝重疊率以及一第二脈衝重疊率,該第一雷射光束以該第一脈衝重疊率在該高重疊率分佈區域加工,且以該第二脈衝重疊率在該低重疊率分佈區域加工,其中該第一脈衝重疊率大於該第二脈衝重疊率。
- 如申請專利範圍第1項所述的方法,其中該第一局部區域包含一第一位置以及一第二位置,該加工件更具有一第二局部區域,該第二局部區域包含一第三位置以及一第四位置,該方法更包含下列步驟:施加該第一雷射光束於該第一位置;移動該第一雷射光束至該第二位置,其中該第一雷射光束施加到該第一局部區域的該第一特定重疊率分佈係由緊密到稀疏;停止該第一雷射光束,以形成該第一網點;施加一第二雷射光束於該第三位置;移動該第二雷射光束至該第四位置,其中該第二雷射光束施加到該第二局部區域的一第二特定重疊率分佈係由緊密到稀疏;以及停止該第二雷射光束,以形成一第二網點。
- 如申請專利範圍第1項所述的方法,其中: 該加工件為一鋼模、模仁、以及導光板的其中之一;該特定深度分佈是對稱深度分佈和非對稱深度分佈的其中之一;該第一雷射光束在高重疊率分佈區域中造成該特定深度分佈具有一第一最大深度,且在該低重疊率分佈區域中造成該特定深度分佈具有一第一深度,其中該第一最大深度大於該第一深度;該雷射光束每秒所輸出的能量是固定的;以及該雷射光束與該加工件的一平面垂直。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW101100095A TWI455783B (zh) | 2012-01-02 | 2012-01-02 | 雷射加工方法及其所形成的加工件 |
JP2012137624A JP5738805B2 (ja) | 2012-01-02 | 2012-06-19 | レーザー加工方法及びそれにより形成された加工物 |
KR1020120066027A KR101501073B1 (ko) | 2012-01-02 | 2012-06-20 | 레이저 가공 방법 및 그것에 의해 형성된 가공물 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW101100095A TWI455783B (zh) | 2012-01-02 | 2012-01-02 | 雷射加工方法及其所形成的加工件 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201328809A TW201328809A (zh) | 2013-07-16 |
TWI455783B true TWI455783B (zh) | 2014-10-11 |
Family
ID=48991916
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW101100095A TWI455783B (zh) | 2012-01-02 | 2012-01-02 | 雷射加工方法及其所形成的加工件 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP5738805B2 (zh) |
KR (1) | KR101501073B1 (zh) |
TW (1) | TWI455783B (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI561325B (en) * | 2014-08-01 | 2016-12-11 | Au Optronics Corp | Display module manufacturing method and display module |
TWI677733B (zh) * | 2015-06-01 | 2019-11-21 | 凌暉科技股份有限公司 | 雙面顯示器 |
CN105738713A (zh) * | 2016-02-24 | 2016-07-06 | 江苏德大自动化设备有限公司 | 人体静电释放远程控制***、装置及其使用的静电监测仪 |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11320156A (ja) * | 1998-05-11 | 1999-11-24 | Ricoh Microelectronics Co Ltd | レーザによる加工方法及び装置 |
KR20020086131A (ko) * | 2001-05-11 | 2002-11-18 | 주식회사 엘에스텍 | 비대칭 도광패턴부를 가지는 면광원 장치 |
KR20080001775A (ko) * | 2006-06-30 | 2008-01-04 | 주식회사 한광옵토 | 도광판과 이를 이용한 백라이트 유닛 |
TW200903063A (en) * | 2007-06-26 | 2009-01-16 | Lumitex Inc | Transparent light emitting members and method of manufacture |
TW201019003A (en) * | 2008-11-03 | 2010-05-16 | Univ Nat Cheng Kung | Backlight module, light guide plate for backlight module and method for making the same |
US20100320179A1 (en) * | 2007-10-16 | 2010-12-23 | Hideki Morita | Method for Creating Trench in U Shape in Brittle Material Substrate, Method for Removing Process, Method for Hollowing Process and Chamfering Method Using Same |
TW201116902A (en) * | 2009-11-10 | 2011-05-16 | Hortek Crystal Co Ltd | Laser processing device |
JP2011233285A (ja) * | 2010-04-26 | 2011-11-17 | Toppan Printing Co Ltd | 導光板、バックライトユニット及び表示装置 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100938643B1 (ko) * | 2007-11-27 | 2010-01-28 | 주식회사 옵토메카 | 복합렌즈 성형장치 및 방법 |
JP2010103068A (ja) * | 2008-10-27 | 2010-05-06 | Kuroda Denki Kk | 導光板の製造方法、導光板及び光源装置 |
JP5424910B2 (ja) * | 2010-01-21 | 2014-02-26 | トリニティ工業株式会社 | 加飾部品の製造方法、部品の加飾方法 |
-
2012
- 2012-01-02 TW TW101100095A patent/TWI455783B/zh not_active IP Right Cessation
- 2012-06-19 JP JP2012137624A patent/JP5738805B2/ja not_active Expired - Fee Related
- 2012-06-20 KR KR1020120066027A patent/KR101501073B1/ko not_active IP Right Cessation
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11320156A (ja) * | 1998-05-11 | 1999-11-24 | Ricoh Microelectronics Co Ltd | レーザによる加工方法及び装置 |
KR20020086131A (ko) * | 2001-05-11 | 2002-11-18 | 주식회사 엘에스텍 | 비대칭 도광패턴부를 가지는 면광원 장치 |
KR20080001775A (ko) * | 2006-06-30 | 2008-01-04 | 주식회사 한광옵토 | 도광판과 이를 이용한 백라이트 유닛 |
TW200903063A (en) * | 2007-06-26 | 2009-01-16 | Lumitex Inc | Transparent light emitting members and method of manufacture |
US20100320179A1 (en) * | 2007-10-16 | 2010-12-23 | Hideki Morita | Method for Creating Trench in U Shape in Brittle Material Substrate, Method for Removing Process, Method for Hollowing Process and Chamfering Method Using Same |
TW201019003A (en) * | 2008-11-03 | 2010-05-16 | Univ Nat Cheng Kung | Backlight module, light guide plate for backlight module and method for making the same |
TW201116902A (en) * | 2009-11-10 | 2011-05-16 | Hortek Crystal Co Ltd | Laser processing device |
JP2011233285A (ja) * | 2010-04-26 | 2011-11-17 | Toppan Printing Co Ltd | 導光板、バックライトユニット及び表示装置 |
Also Published As
Publication number | Publication date |
---|---|
JP5738805B2 (ja) | 2015-06-24 |
TW201328809A (zh) | 2013-07-16 |
KR101501073B1 (ko) | 2015-03-10 |
KR20130079100A (ko) | 2013-07-10 |
JP2013139050A (ja) | 2013-07-18 |
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MM4A | Annulment or lapse of patent due to non-payment of fees |