TWI452255B - Optical encoder and the optical device thereof and the measuring method thereof - Google Patents
Optical encoder and the optical device thereof and the measuring method thereof Download PDFInfo
- Publication number
- TWI452255B TWI452255B TW100103253A TW100103253A TWI452255B TW I452255 B TWI452255 B TW I452255B TW 100103253 A TW100103253 A TW 100103253A TW 100103253 A TW100103253 A TW 100103253A TW I452255 B TWI452255 B TW I452255B
- Authority
- TW
- Taiwan
- Prior art keywords
- biconcave lens
- displacements
- rays
- optical
- light
- Prior art date
Links
Landscapes
- Optical Transform (AREA)
- Length Measuring Devices By Optical Means (AREA)
Description
本發明係有關於一種光學量測裝置，特別是有關於一種光學編碼器及其光學裝置與量測方法。The present invention relates to an optical measuring device, and more particularly to an optical encoder and an optical device and measuring method thereof.
現今光學尺所使用的量測方法大多為光柵光學編碼法，而依其所應用之物理特性的不同，大略可分為幾何式光學尺與繞射式光學尺。幾何式光學尺是採用疊紋或光柵投影方式進行位移量測，量測位移解析度最高只能到100nm，若要提高其量測解析度，必須將光柵密度提高，但當光柵條紋密度超過125條/mm時，由於光柵之繞射效應變得極為明顯，將會造成量測訊號之訊號雜訊比(signal-to-noise ratio；SNR)降低，進而影響量測之精準度，因此幾何式光學尺的光柵節距存在繞射的限制，使其無法進一步提高量測解析度；而繞射式光學尺由於繞射光對於光柵之角度公差特別靈敏，一來使得其光機系統的安裝甚為困難，二來其光柵相對於光學頭之間的微小機具運動 偏擺亦可能造成位移量測上的誤差，雖然透過電子的訊號補償及細分割技術可以大幅提高雷射光學尺的位移量測解析度達次奈米等級，但也因此犧牲了光學頭與光柵尺之間原本所具有的對位公差，相對地增加使用上的限制。Most of the measurement methods used in optical tapes today are grating optical coding methods, and depending on the physical characteristics of the applications, they can be roughly classified into geometric optical scales and diffraction optical scales. The geometric optical scale is measured by displacement using a double-stack or grating projection. The resolution of the displacement can only be up to 100 nm. To improve the measurement resolution, the grating density must be increased, but when the grating stripe density exceeds 125. When the strip/mm is used, the diffraction effect of the grating becomes extremely obvious, which will cause the signal-to-noise ratio (SNR) of the measurement signal to decrease, thereby affecting the accuracy of the measurement, so the geometry The grating pitch of the optical scale has a diffraction limitation, which makes it impossible to further improve the measurement resolution. The diffraction optical scale is particularly sensitive to the angular tolerance of the grating due to the diffracted light, so that the installation of the optical system is very Difficult, second, the movement of the grating relative to the micro-machine between the optical head The yaw may also cause errors in the displacement measurement. Although the signal compensation and fine segmentation techniques of the electrons can greatly improve the displacement measurement resolution of the laser optical scale to the nanometer level, the optical head and the grating are sacrificed. The alignment tolerance originally possessed between the rulers relatively increases the use limit.
有鑑於上述之缺點，本發明係提供一種光學編碼器及其光學裝置與量測方法，其可以改進習知量測位移解析度限制之問題。In view of the above disadvantages, the present invention provides an optical encoder and an optical device and measurement method thereof, which can improve the problem of the conventional measurement displacement resolution limitation.
本發明之目的之一，係藉由厚透鏡方程式推導出透鏡之曲率半徑與其放大倍率的關係，並透過調整透鏡之光線出射面的曲率半徑，以補償光線經透鏡放大後的差異，藉此設計一具有良好放大效能之光學透鏡。One of the objects of the present invention is to derive the relationship between the radius of curvature of the lens and its magnification by a thick lens equation, and to adjust the radius of curvature of the light exit surface of the lens to compensate for the difference in the magnification of the light through the lens. An optical lens with good amplification performance.
本發明之目的之一，係利用透鏡將光線放大的方式使得1奈米(nm)之原始位移可被透鏡擴大至光偵測器所能感測到的位移，並藉由光偵測器將光訊號轉換成電子訊號，進而判別其實際之移動距離。One of the objects of the present invention is to use a lens to amplify the light so that the original displacement of 1 nanometer (nm) can be enlarged by the lens to the displacement sensed by the photodetector, and the photodetector will The optical signal is converted into an electronic signal to determine its actual moving distance.
本發明揭露一種光學編碼器，其包含：一移動裝置，係具有複數個光柵用以將一光線細小化成複數個第一光線，其中此移動裝置可以改變此複數個第一光線從相對應的第一位置到相對應的第二位置以產生複數個第一位移；一光學裝置，係讓此複數個第一光線直接透射以放大成複數個第二光線，並且放大此複數個第一位移成複數個第二位移；以及一光感測器，係接收此複數個第二光線並且轉換成相對應的電子訊號，藉此量測此複數個第二位移以判別此複數個第一位移。The present invention discloses an optical encoder comprising: a moving device having a plurality of gratings for thinning a light into a plurality of first rays, wherein the moving device can change the plurality of first rays from the corresponding first a position to a corresponding second position to generate a plurality of first displacements; an optical device for directly transmitting the plurality of first rays to a plurality of second rays, and amplifying the plurality of first displacements into a plurality And a second sensor; and receiving the plurality of second rays and converting the corresponding second signals to the plurality of second signals to determine the plurality of second displacements to determine the plurality of first displacements.
前述之光學編碼器，其中所述之移動裝置係包含一單軸移動平台。The optical encoder described above, wherein the mobile device comprises a single axis mobile platform.
前述之光學編碼器，其中所述之光線包含由一雷射光源所產生。The optical encoder described above, wherein the light comprises a laser source.
前述之光學編碼器，其中所述之第一位移包含1奈米。The optical encoder of the foregoing, wherein the first displacement comprises 1 nanometer.
前述之光學編碼器，其中所述之光學裝置包含一雙凹透鏡，此雙凹透鏡的放大率與此雙凹透鏡的曲率半徑關係為：
前述之光學編碼器，其中所述之第二位移包含50奈米。The aforementioned optical encoder wherein the second displacement comprises 50 nm.
前述之光學編碼器，其中所述之光感測器的解析度包含50奈米。The optical encoder described above, wherein the resolution of the photosensor comprises 50 nm.
本發明亦揭露一種光學裝置，用於一光學編碼器以協助量測包括1奈米等級的位移，此光學裝置包含：一雙凹透鏡，讓複數個第一光線直接透射以放大成為複數個第二光線，並且放大此複數個第一光線從相對應的第一位置移動到相對應的第二位置所產生的複數個第一位移成為複數個第二位移；其中，此光學編碼器利用一光感測器接收此複數個第二光線並且轉換成相對應的電子訊號輸出，藉此量測此複數個第二位移以判別此複數個第一位移。The invention also discloses an optical device for an optical encoder to assist in measuring a displacement including a 1 nm class, the optical device comprising: a double concave lens for directly transmitting a plurality of first rays to be amplified into a plurality of second Light, and amplifying the plurality of first displacements generated by moving the plurality of first rays from the corresponding first position to the corresponding second position into a plurality of second displacements; wherein the optical encoder utilizes a light sensation The detector receives the plurality of second rays and converts them into corresponding electronic signal outputs, thereby measuring the plurality of second displacements to determine the plurality of first displacements.
前述之光學裝置，其中所述之複數個第一光線係由具有 複數個光柵的一移動裝置將一光線細小化所形成，此光線係由一雷射光源所產生。The optical device of the foregoing, wherein the plurality of first light rays are A moving device of a plurality of gratings is formed by miniaturizing a light generated by a laser source.
前述之光學裝置，其中所述之雙凹透鏡的放大率與此雙凹透鏡的曲率半徑關係為：
前述之光學裝置，其中所述之第一位移包含1奈米。The optical device of the foregoing, wherein the first displacement comprises 1 nanometer.
前述之光學裝置，其中所述之第二位移包含50奈米。The optical device described above, wherein the second displacement comprises 50 nm.
前述之光學裝置，其中所述之光感測器的解析度包含50奈米。The optical device described above, wherein the resolution of the photo sensor comprises 50 nm.
本發明更揭露一種光學編碼器量測方法，其包含：利用 具有複數個光柵的一移動裝置將一光線細小化成複數個第一光線，其中此移動裝置可以改變此複數個第一光線從相對應的第一位置到相對應的第二位置以產生複數個第一位移；利用一光學裝置讓此複數個第一光線直接透射以放大成複數個第二光線，並且放大此複數個第一位移成為複數個第二位移；以及利用一光感測器接收此複數個第二光線並且轉換成相對應的電子訊號輸出，藉此，量測此複數個第二位移以判別此複數個第一位移。The invention further discloses an optical encoder measuring method, which comprises: utilizing A moving device having a plurality of gratings reduces a light into a plurality of first rays, wherein the moving device can change the plurality of first rays from the corresponding first position to the corresponding second position to generate a plurality of a displacement; using an optical device to directly transmit the plurality of first rays to a plurality of second rays, and amplifying the plurality of first rays into a plurality of second displacements; and receiving the plurality of pixels by using a photo sensor The second light is converted into a corresponding electronic signal output, whereby the plurality of second displacements are measured to determine the plurality of first displacements.
前述之光學編碼器量測方法，其中所述之移動裝置包含一單軸移動平台。The optical encoder measuring method described above, wherein the mobile device comprises a single axis mobile platform.
前述之光學編碼器量測方法，其中所述之光線包含由一雷射光源所產生。The optical encoder measuring method described above, wherein the light is included by a laser light source.
前述之光學編碼器量測方法，其中所述之第一位移包含1奈米。The optical encoder measuring method described above, wherein the first displacement comprises 1 nm.
前述之光學編碼器量測方法，其中所述之光學裝置包含
一雙凹透鏡，而此雙凹透鏡的放大率與此雙凹透鏡的曲率半徑關係為：
前述之光學編碼器量測方法，其中所述之第二位移包含50奈米。The optical encoder measuring method described above, wherein the second displacement comprises 50 nm.
前述之光學編碼器量測方法，其中所述之光感測器的解析度包含50奈米。The optical encoder measuring method described above, wherein the resolution of the photo sensor comprises 50 nm.
本發明將詳細描述一些實施例如下。然而，除了所揭露之實施例外，本發明亦可以廣泛地運用在其他之實施例施行。本發明之範圍並不受該些實施例之限定，乃以其後之申請專利範圍為準。而為提供更清楚之描述及使熟悉該項技藝者能理解 本發明之發明內容，圖示內各部分並沒有依照其相對之尺寸而繪圖，某些尺寸與其他相關尺度之比例會被突顯而顯得誇張，且不相關之細節部分亦未完全繪出，以求圖示之簡潔。The invention will be described in detail below with some embodiments. However, the invention may be applied to other embodiments in addition to the disclosed embodiments. The scope of the present invention is not limited by the embodiments, and the scope of the appended claims shall prevail. To provide a clearer description and to familiarize the artist with the understanding In the inventive content of the present invention, the parts in the drawings are not drawn according to their relative sizes, and the ratio of some sizes to other related scales is highlighted and exaggerated, and the irrelevant details are not completely drawn. Seek the simplicity of the illustration.
請參照第一圖，其為本發明之一較佳實施例100的概略方塊圖。一移動裝置120，具有複數個光柵用以將由一光源110所產生之一光線112細小化成複數個第一光線122，其中移動裝置120可以改變複數個第一光線122從相對應的第一位置(例如實線箭頭122)到相對應的第二位置(例如虛線箭頭122)以產生複數個第一位移△S。在本實施例中，光源110可以是一同調光源(例如：雷射二極體)；移動裝置120可以是一單軸移動平台；而第一位移△S則包含最小1奈米的位移。此外，為了圖示簡潔及說明方便，第一、第二光線122、132僅繪出少許部分加以說明，並非用以限制本發明之實施。Please refer to the first figure, which is a schematic block diagram of a preferred embodiment 100 of the present invention. A mobile device 120 having a plurality of gratings for finening one of the light rays 112 generated by a light source 110 into a plurality of first light rays 122, wherein the mobile device 120 can change the plurality of first light rays 122 from the corresponding first position ( For example, solid arrow 122) to a corresponding second position (eg, dashed arrow 122) to produce a plurality of first displacements ΔS. In this embodiment, the light source 110 can be a coherent light source (eg, a laser diode); the mobile device 120 can be a single axis mobile platform; and the first displacement ΔS includes a displacement of at least 1 nanometer. In addition, for the sake of brevity and convenience of description, the first and second light rays 122, 132 are only illustrated in a few parts, and are not intended to limit the implementation of the present invention.
一光學裝置130，讓複數個一光線122直接透射以放大成複數個第二光線132，並放大複數個第一位移△S成複數個第二位移△S’。在本實施例中，第二位移△S’包含50奈米的位移；光學裝置130包含一雙凹透鏡，此雙凹透鏡的放大率與此雙凹透鏡的曲率半徑關係為：
一光感測器140，接收複數個第二光線132並將其轉換成相對應的電子訊號輸出，藉此量測複數個第二位移△S’以判別複數個第一位移△S實際距離。在本實施例中，光感測器140的解析度包含50奈米且其偵測長度為25公分。A photo sensor 140 receives a plurality of second rays 132 and converts them into corresponding electronic signal outputs, thereby measuring a plurality of second displacements ΔS' to determine a plurality of first displacements ΔS actual distances. In this embodiment, the resolution of the photo sensor 140 includes 50 nm and the detection length is 25 cm.
本實施例之工作原理為，先將單色雷射光進行細小化後當作光源，置於單軸移動平台上，並將經細小化之雷射光射入由光學透鏡所構成的光學裝置，利用透鏡可以將雷射光放大的特性，使得1奈米之原始位移可以被透鏡擴大至光偵測器所能感測到的位移(因現今之光偵測器尚無法感測到1nm的位移，因此若欲使光偵測器可以感測到1nm的位移，勢必要將1nm的位移放大至光偵測器所能感測到的大小)，再藉由光偵測器將光訊號轉換成電子訊號，進而判別其實際之移動距離。The working principle of the embodiment is that the monochromatic laser light is firstly reduced and used as a light source, placed on a single-axis moving platform, and the fined laser light is incident on an optical device composed of optical lenses, and utilized. The lens can amplify the laser light so that the original displacement of 1 nm can be enlarged by the lens to the displacement that the photodetector can sense (because the current photodetector can not sense the displacement of 1 nm, therefore If the photodetector can sense the displacement of 1 nm, it is necessary to amplify the displacement of 1 nm to the size that can be sensed by the photodetector, and then convert the optical signal into an electronic signal by the photodetector. And then determine its actual moving distance.
請參照第二圖，其為本發明一較佳光學裝置130實施例示意圖，其中光學裝置130為一雙凹透鏡，在此僅以一光線做說明，並非用以限制本發明之實施。當經細小化的第一光線從第一位置S移動到第二位置S1 並產生第一位移△S時，其經雙凹透鏡放大成第二光線透射至影像端的位置亦相對從第一影像位置S’位移至第二影像位置S1 ’並產生第二位移△S’。Please refer to the second figure, which is a schematic diagram of an embodiment of a preferred optical device 130. The optical device 130 is a double concave lens, and only a light is used for illustration, which is not intended to limit the implementation of the present invention. When the thinned first light is moved from the first position S to the second position S 1 and the first displacement ΔS is generated, the position of the second light transmitted to the image end by the biconcave lens is also relative to the position from the first image position. S' is displaced to the second image position S 1 'and produces a second displacement ΔS'.
根據厚透鏡方程式，透鏡焦距與透鏡入射面及出射面曲率半徑的關係：
因此當第一光線從第一位置S移動到第二位置S1
時，其經透鏡放大成第二光線並透射至影像端的第一影像位置S’與第二影像位置S1
’可表示成：
請先參照第五圖，其為本發明之一較佳實施例流程圖，並請同時參照第一、第二圖。在步驟502中，利用具有複數個光柵的移動裝置120將光線112細小化成複數個第一光線122，其中移動裝置120可改變複數個第一光線122從相對應的第一位置(例如實線箭頭122)到相對應的第二位置(例如虛線箭頭122)以產生複數個第一位移△S。其中，移動裝置120係包含一單軸移動平台；光線112係由雷射光源110所產生；且第一位移△S係包含最小1奈米的位移。Please refer to the fifth figure, which is a flow chart of a preferred embodiment of the present invention, and please refer to the first and second figures at the same time. In step 502, the light ray 112 is thinned into a plurality of first ray 122 by a mobile device 120 having a plurality of gratings, wherein the mobile device 120 can change the plurality of first ray 122 from the corresponding first position (eg, a solid arrow) 122) to a corresponding second position (eg, dashed arrow 122) to generate a plurality of first displacements ΔS. The mobile device 120 includes a single-axis mobile platform; the light 112 is generated by the laser light source 110; and the first displacement ΔS includes a displacement of at least 1 nanometer.
在步驟504中，利用光學裝置130讓複數個第一光線122直接透射以放大成複數個第二光線132，並且放大複數個第一位移△S成複數個第二位移△S’。其中，光學裝置130係包含一雙凹透鏡，此雙凹透鏡的放大率與曲率半徑關係為：
在步驟506中，利用光感測器140接收複數個第二光線132並且將其轉換成相對應的電子訊號輸出，藉此量測複數個第二位移△S’以判別複數個第一位移△S。其中，光感測器140的解析度包含50奈米且其偵測長度包含25公分，然不限定於此。In step 506, the plurality of second light rays 132 are received by the light sensor 140 and converted into corresponding electronic signal outputs, thereby measuring a plurality of second displacements ΔS' to determine a plurality of first displacements Δ. S. The resolution of the photo sensor 140 includes 50 nm and the detection length thereof is 25 cm, but is not limited thereto.
請參照第三圖，其為本發明之一較佳實施例之光線折射模擬圖，其表示當光線移動時，其影像經過光學裝置130折射投影在光感測器140端的模擬示意圖。Please refer to the third figure, which is a light refraction simulation diagram of a preferred embodiment of the present invention, which shows a schematic diagram of the image projected through the optical device 130 at the end of the photosensor 140 when the light is moved.
請參照第四圖，其為本發明之較佳實施例之透鏡放大率與光線位置及影像位置的關係曲線圖。其中，曲線1表示雙凹透鏡之光線入射面與出射面的曲率半徑分別為-6.25mm與12.5mm；曲線2表示雙凹透鏡之光線入射面與出射面的曲率半徑分別為-6.25mm與6.25mm；以及曲線3表示雙凹透鏡之光線入射面與出射面的曲率半徑分別為-6.25mm與-12.5mm。並且，曲線1、2、3的影像距離分別為380mm、160mm 以及1260mm。因此，根據第四圖之關係曲線所示，例如：從光學設計軟體LightTools所模擬的曲線1可知其雙凹透鏡放大倍率為50倍，可使第一光線1奈米的第一位移被放大成第二光線50奈米的第二位移於光感測器表面，藉此量測第二位移即可判別第一位移，進而提高量測精準度。發明人在此要強調的是，上述之資料及數據係僅用以說明本發明，並非用以限制本發明之實施。Please refer to the fourth figure, which is a graph showing the relationship between the lens magnification and the position of the light and the position of the image according to a preferred embodiment of the present invention. Wherein, curve 1 indicates that the radius of curvature of the incident surface and the exit surface of the biconcave lens are respectively −6.25 mm and 12.5 mm; and curve 2 indicates that the radius of curvature of the incident surface and the exit surface of the biconcave lens are −6.25 mm and 6.25 mm, respectively; And curve 3 indicates that the radius of curvature of the incident surface and the exit surface of the biconcave lens are -6.25 mm and -12.5 mm, respectively. Moreover, the image distances of curves 1, 2, and 3 are 380 mm and 160 mm, respectively. And 1260mm. Therefore, according to the relationship curve of the fourth figure, for example, from the curve 1 simulated by the optical design software LightTools, the magnification of the biconcave lens is 50 times, and the first displacement of the first light 1 nm is enlarged to the first The second displacement of the two rays of 50 nm is on the surface of the photosensor, thereby measuring the second displacement to determine the first displacement, thereby improving the measurement accuracy. The inventors hereby emphasize that the above information and data are only used to illustrate the invention and are not intended to limit the implementation of the invention.
以上所述僅為本發明之較佳實施例而已，並非用以限定本發明之申請專利範圍；凡其他為脫離本發明所揭示之精神下所完成之等效改變或修飾，均應包含在下述之申請專利範圍。The above are only the preferred embodiments of the present invention, and are not intended to limit the scope of the present invention; all other equivalent changes or modifications made in the spirit of the present invention should be included in the following. The scope of the patent application.
100‧‧‧本發明之一較佳實施例概略方塊圖100‧‧‧A schematic block diagram of a preferred embodiment of the present invention
110‧‧‧光源110‧‧‧Light source
112‧‧‧光線112‧‧‧Light
120‧‧‧移動裝置120‧‧‧Mobile devices
122‧‧‧第一光線122‧‧‧First light
130‧‧‧光學裝置130‧‧‧Optical device
132‧‧‧第二光線132‧‧‧second light
140‧‧‧光感測器140‧‧‧Light sensor
△S‧‧‧第一位移△S‧‧‧First displacement
△S’‧‧‧第二位移△S’‧‧‧second displacement
F‧‧‧焦點F‧‧‧ focus
f‧‧‧焦距F‧‧•focal length
d‧‧‧透鏡厚度d‧‧‧Lens thickness
S‧‧‧光線第一位置S‧‧‧Light first position
S1 ‧‧‧光線第二位置S 1 ‧‧‧Light second position
S’‧‧‧影像第一位置S’‧‧· image first position
S1 ’‧‧‧影像第二位置S 1 '‧‧‧ image second position
h‧‧‧光線至透鏡距離h‧‧‧Light to lens distance
h’‧‧‧透鏡至影像距離H’‧‧‧Lens to image distance
第一圖係本發明之一較佳實施例概略方塊圖；第二圖係本發明之一較佳光學裝置實施例示意圖；第三圖係本發明之一較佳實施例光線折射模擬示意圖；第四圖係本發明之較佳實施例透鏡放大率與光線位置及影像位置的關係曲線圖；以及第五圖係本發明之一較佳實施例流程圖。1 is a schematic block diagram of a preferred embodiment of the present invention; a second diagram is a schematic diagram of a preferred optical device embodiment of the present invention; and a third diagram is a schematic diagram of a light refraction simulation of a preferred embodiment of the present invention; 4 is a graph showing the relationship between lens magnification and light position and image position in a preferred embodiment of the present invention; and a fifth diagram showing a flow chart of a preferred embodiment of the present invention.
100‧‧‧本發明之一較佳實施例概略方塊圖100‧‧‧A schematic block diagram of a preferred embodiment of the present invention
110‧‧‧光源110‧‧‧Light source
112‧‧‧光線112‧‧‧Light
120‧‧‧移動裝置120‧‧‧Mobile devices
122‧‧‧第一光線122‧‧‧First light
130‧‧‧光學裝置130‧‧‧Optical device
132‧‧‧第二光線132‧‧‧second light
140‧‧‧光感測器140‧‧‧Light sensor
△S‧‧‧第一位移△S‧‧‧First displacement
△S’‧‧‧第二位移△S’‧‧‧second displacement
Claims (16)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW100103253A TWI452255B (en) | 2011-01-28 | 2011-01-28 | Optical encoder and the optical device thereof and the measuring method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW100103253A TWI452255B (en) | 2011-01-28 | 2011-01-28 | Optical encoder and the optical device thereof and the measuring method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201231912A TW201231912A (en) | 2012-08-01 |
| TWI452255B true TWI452255B (en) | 2014-09-11 |
Family
ID=47069432
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW100103253A TWI452255B (en) | 2011-01-28 | 2011-01-28 | Optical encoder and the optical device thereof and the measuring method thereof |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TWI452255B (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4912322A (en) * | 1986-08-15 | 1990-03-27 | Mitutoyo Mfg. Co., Ltd. | Optical type displacement detecting device |
| TW201030322A (en) * | 2009-02-06 | 2010-08-16 | Nikon Corp | Encoder |
-
2011
- 2011-01-28 TW TW100103253A patent/TWI452255B/en not_active IP Right Cessation
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4912322A (en) * | 1986-08-15 | 1990-03-27 | Mitutoyo Mfg. Co., Ltd. | Optical type displacement detecting device |
| TW201030322A (en) * | 2009-02-06 | 2010-08-16 | Nikon Corp | Encoder |
Non-Patent Citations (2)
| Title |
|---|
| Yuan, B., Yan, H. M., & Cao, X. Q. (2009). A new subdivision method for grating-based displacement sensor using imaging array. Optics and Lasers in Engineering, 47(1), 90-95. * |
| Zhang, D., Luo, M., & Arola, D. D. (2006). Displacement/strain measurements using an optical microscope and digital image correlation. Optical Engineering, 45(3), 033605-033605 * |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201231912A (en) | 2012-08-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US10624720B1 (en) | Imaging apparatus with temperature compensation | |
| CN101403650B (en) | Differential confocal combination ultra-long focal length measuring method and apparatus | |
| JP2913984B2 (en) | Tilt angle measuring device | |
| CN100504287C (en) | Surface plasma resonance measurement mechanism and method thereof | |
| CN108871278B (en) | Liquid surface reflection type double-shaft photoelectric level meter and method | |
| CN101187783A (en) | Focusing and leveling measuring system and its measuring method | |
| CN102519510A (en) | Calibration device and calibration method of position sensitive sensor | |
| CN101788267B (en) | Optical micrometric displacement sensor based on two sets of sub-wavelength gratings | |
| JP2007173614A (en) | Micro fabricating device | |
| CN102012215B (en) | Digital image-based noncontact optical strain measurement method and strain gauge | |
| CN101201548B (en) | Measuring system and method for focusing and leveling | |
| JP4422206B2 (en) | Ranging device and ranging method | |
| US7327474B2 (en) | Method and apparatus for measuring displacement of an object | |
| TWI452255B (en) | Optical encoder and the optical device thereof and the measuring method thereof | |
| JP2007010556A (en) | Optical range finding sensor, and equipment provided therewith | |
| JP5264847B2 (en) | Ranging device, lens system, and imaging device | |
| CN103994722B (en) | Grating accurate measurement structure based on self-focusing principle and measuring method | |
| Saito et al. | A single lens micro-angle sensor | |
| Lim et al. | A novel one-body dual laser profile based vibration compensation in 3D scanning | |
| Cheng et al. | A 3-DoF motion error measurement system based on film interferometry | |
| TWI357970B (en) | Optical measuring system | |
| CN112986961A (en) | Transmitting module, electronic equipment and distance measuring method | |
| JP2011043438A (en) | Reflective photoelectric encoder | |
| CN101285735A (en) | Hartmann sensor for expanding dynamic range by separating integral inclination of wave surface | |
| Matsak et al. | A method of measuring the diameter of a wide-aperture beam of laser radiation |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |