TWI450029B - 金屬嵌入光罩及其製造方法 - Google Patents
金屬嵌入光罩及其製造方法 Download PDFInfo
- Publication number
- TWI450029B TWI450029B TW101134458A TW101134458A TWI450029B TW I450029 B TWI450029 B TW I450029B TW 101134458 A TW101134458 A TW 101134458A TW 101134458 A TW101134458 A TW 101134458A TW I450029 B TWI450029 B TW I450029B
- Authority
- TW
- Taiwan
- Prior art keywords
- metal
- substrate
- reticle
- manufacturing
- embedded
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
- G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G03F1/46—Antireflective coatings
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
- G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Optical Elements Other Than Lenses (AREA)
- Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW101134458A TWI450029B (zh) | 2012-09-20 | 2012-09-20 | 金屬嵌入光罩及其製造方法 |
KR1020130109543A KR101505317B1 (ko) | 2012-09-20 | 2013-09-12 | 금속-임베디드 포토마스크 및 그 제조 방법 |
CN201310415053.5A CN103676467B (zh) | 2012-09-20 | 2013-09-12 | 金属嵌入光罩及其制造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW101134458A TWI450029B (zh) | 2012-09-20 | 2012-09-20 | 金屬嵌入光罩及其製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201413371A TW201413371A (zh) | 2014-04-01 |
TWI450029B true TWI450029B (zh) | 2014-08-21 |
Family
ID=50314470
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW101134458A TWI450029B (zh) | 2012-09-20 | 2012-09-20 | 金屬嵌入光罩及其製造方法 |
Country Status (3)
Country | Link |
---|---|
KR (1) | KR101505317B1 (ko) |
CN (1) | CN103676467B (ko) |
TW (1) | TWI450029B (ko) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105742414A (zh) * | 2016-02-26 | 2016-07-06 | 海迪科(南通)光电科技有限公司 | 一种微纳pss制备用软膜及其制造方法 |
CN105609607A (zh) * | 2016-02-26 | 2016-05-25 | 海迪科(南通)光电科技有限公司 | 一种微纳pss制备用软膜结构 |
CN105576097A (zh) * | 2016-02-26 | 2016-05-11 | 海迪科(南通)光电科技有限公司 | 一种纳米软膜光刻制备微纳pss的方法 |
CN109445243A (zh) * | 2018-12-21 | 2019-03-08 | 苏州瑞而美光电科技有限公司 | 一种光刻掩膜版及其制备方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW201208974A (en) * | 2010-08-23 | 2012-03-01 | Univ Nat Cheng Kung | Manufacturing method of micro/nano-particle and micro/nano-particle unit |
US20120217621A1 (en) * | 2011-01-19 | 2012-08-30 | International Business Machines Corporation | Structure and method for hard mask removal on an soi substrate without using cmp process |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0674223B1 (en) * | 1994-02-14 | 1997-05-02 | International Business Machines Corporation | An attenuating phase-shift mask structure and fabrication method |
JPH10333318A (ja) * | 1997-06-03 | 1998-12-18 | Dainippon Printing Co Ltd | 位相シフトフォトマスク及びその製造方法 |
KR20060079957A (ko) * | 2005-01-04 | 2006-07-07 | 삼성에스디아이 주식회사 | 포토리소그래피용 연질 포토마스크, 그 제조방법, 이를채용한 패턴 형성 방법 |
CN101382715A (zh) * | 2008-10-20 | 2009-03-11 | 友达光电股份有限公司 | 像素结构、显示面板、光电装置的制造方法 |
CN101598894B (zh) * | 2009-07-07 | 2011-07-27 | 友达光电股份有限公司 | 光掩膜、薄膜晶体管元件及制作薄膜晶体管元件的方法 |
-
2012
- 2012-09-20 TW TW101134458A patent/TWI450029B/zh active
-
2013
- 2013-09-12 KR KR1020130109543A patent/KR101505317B1/ko active IP Right Grant
- 2013-09-12 CN CN201310415053.5A patent/CN103676467B/zh active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW201208974A (en) * | 2010-08-23 | 2012-03-01 | Univ Nat Cheng Kung | Manufacturing method of micro/nano-particle and micro/nano-particle unit |
US20120217621A1 (en) * | 2011-01-19 | 2012-08-30 | International Business Machines Corporation | Structure and method for hard mask removal on an soi substrate without using cmp process |
Non-Patent Citations (1)
Title |
---|
Jhih-Nan Yan and Yung-Chun Lee, Fabrication of metal embedded photo-mask for sub-micrometer scaled photolithography and patterning sapphire substrate, NEMS 2012, Kyoto, JAPAN, March 5-8,2012 * |
Also Published As
Publication number | Publication date |
---|---|
TW201413371A (zh) | 2014-04-01 |
KR101505317B1 (ko) | 2015-03-23 |
CN103676467A (zh) | 2014-03-26 |
CN103676467B (zh) | 2019-05-21 |
KR20140038309A (ko) | 2014-03-28 |
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